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JPS57119348A - Hard mask - Google Patents

Hard mask

Info

Publication number
JPS57119348A
JPS57119348A JP660481A JP660481A JPS57119348A JP S57119348 A JPS57119348 A JP S57119348A JP 660481 A JP660481 A JP 660481A JP 660481 A JP660481 A JP 660481A JP S57119348 A JPS57119348 A JP S57119348A
Authority
JP
Japan
Prior art keywords
transparent glass
glass substrate
mask
substrate
caused
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP660481A
Other languages
Japanese (ja)
Inventor
Yaichiro Watakabe
Tadao Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP660481A priority Critical patent/JPS57119348A/en
Publication of JPS57119348A publication Critical patent/JPS57119348A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To obtain a hard mask having a long lifetime, by putting the 2nd transparent glass substrate on a pattern formed with a mask material which is patterned on the 1st transparent glass substrate. CONSTITUTION:A mask material of chrome is stuck on a transparent glass substrate 1 by a conventional method like the vapor deposition, etc. to carry out the patterning. Then a transparent glass substrate 3 of a material same as or different from the substrate 1 is put on the substrate 1 and then heated to fuse and adhere the substrates 1 and 3 together. Thus a transparent glass substrate 11 is obtained. In such way, a sandwich structure is secured for to eliminate the flaws which is caused through the inspection and photoengraving processes and the separation of the chrome due to the charge-up which is caused by the mask washing. Furthermore the mirror inversion of the mask is facilitated by exchanging the upper and lower glass substrates if the degree of plane is obtained for the lower transparent glass substrate.
JP660481A 1981-01-17 1981-01-17 Hard mask Pending JPS57119348A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP660481A JPS57119348A (en) 1981-01-17 1981-01-17 Hard mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP660481A JPS57119348A (en) 1981-01-17 1981-01-17 Hard mask

Publications (1)

Publication Number Publication Date
JPS57119348A true JPS57119348A (en) 1982-07-24

Family

ID=11642942

Family Applications (1)

Application Number Title Priority Date Filing Date
JP660481A Pending JPS57119348A (en) 1981-01-17 1981-01-17 Hard mask

Country Status (1)

Country Link
JP (1) JPS57119348A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61182042A (en) * 1985-02-07 1986-08-14 Mitsubishi Electric Corp Photomask
JPS6257260U (en) * 1985-09-26 1987-04-09
JPS62161250U (en) * 1986-04-03 1987-10-14
EP1168085A2 (en) * 2000-06-19 2002-01-02 Canon Kabushiki Kaisha Reference plate for exposure apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61182042A (en) * 1985-02-07 1986-08-14 Mitsubishi Electric Corp Photomask
JPH0546534B2 (en) * 1985-02-07 1993-07-14 Mitsubishi Electric Corp
JPS6257260U (en) * 1985-09-26 1987-04-09
JPS62161250U (en) * 1986-04-03 1987-10-14
EP1168085A2 (en) * 2000-06-19 2002-01-02 Canon Kabushiki Kaisha Reference plate for exposure apparatus
EP1168085A3 (en) * 2000-06-19 2005-12-07 Canon Kabushiki Kaisha Reference plate for exposure apparatus

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