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JPS5612726A - Method of mask alignment - Google Patents

Method of mask alignment

Info

Publication number
JPS5612726A
JPS5612726A JP8712379A JP8712379A JPS5612726A JP S5612726 A JPS5612726 A JP S5612726A JP 8712379 A JP8712379 A JP 8712379A JP 8712379 A JP8712379 A JP 8712379A JP S5612726 A JPS5612726 A JP S5612726A
Authority
JP
Japan
Prior art keywords
aligning
film
mask
thickness
chromium
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8712379A
Other languages
Japanese (ja)
Inventor
Takeshi Yoshizawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP8712379A priority Critical patent/JPS5612726A/en
Publication of JPS5612726A publication Critical patent/JPS5612726A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To facilitate the removal of an unnecessary light screening film by making the thickness of an aligning light screening mask thick in the case the aligning light screening film is deposited on the recessed portion of the light screening pattern of a mask at the time of aligning the photomask. CONSTITUTION:In the case there is a recessed portion 5 in a cromium mask pattern 3 of about 800Angstrom provided on a glass substrate 2 at the time of aligning the chromium mask, a posiresist film 4 having the thickness of 5,000Angstrom is applied on the mask at first. Then, an aligning window 7 is formed by illuminating light 6 on the posiresist film 4 on the recessed position 5. Thereafter, an aligning chromium film 1 is deposited to the thickness more than twice as large as the thickness of the mask pattern 3. Then, the posiresist film 4 is resolved, and the unnecessary aligning chromium film is liberated and removed with a nylon brush and the like. Since the thickness of the aligning film is larger than that of the mask pattern, the liberated aligning chromium film can be readily removed with the nylon brush.
JP8712379A 1979-07-10 1979-07-10 Method of mask alignment Pending JPS5612726A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8712379A JPS5612726A (en) 1979-07-10 1979-07-10 Method of mask alignment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8712379A JPS5612726A (en) 1979-07-10 1979-07-10 Method of mask alignment

Publications (1)

Publication Number Publication Date
JPS5612726A true JPS5612726A (en) 1981-02-07

Family

ID=13906172

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8712379A Pending JPS5612726A (en) 1979-07-10 1979-07-10 Method of mask alignment

Country Status (1)

Country Link
JP (1) JPS5612726A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60154368U (en) * 1984-03-27 1985-10-15 三菱電機株式会社 hydraulic jack

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60154368U (en) * 1984-03-27 1985-10-15 三菱電機株式会社 hydraulic jack

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