JP6406580B2 - Transparent electrode, touch panel, display device with touch position detection function, and manufacturing method of transparent electrode - Google Patents

Description

  The present invention relates to a transparent electrode. The present invention also relates to a touch panel provided with a transparent electrode. The present invention also relates to a display device with a touch position detection function obtained by combining a touch panel and a display device. The present invention also relates to a method for manufacturing a transparent electrode.

  Today, touch panel devices are widely used as input means. The touch panel device includes a touch panel, a control circuit that detects a contact position on the touch panel, wiring, and an FPC (flexible printed circuit board). In many cases, the touch panel device is used together with the display device as an input means for various devices including a display device such as a liquid crystal display or an organic EL display (for example, a ticket vending machine, an ATM device, a mobile phone, a game machine). It has been. In such a device, the touch panel is arranged on the display surface of the display device, thereby enabling extremely direct input to the display device, particularly the position coordinates of the display image and information associated with the position coordinates. Input is possible. The area of the touch panel that faces the display area of the display device is transparent, and this area of the touch panel constitutes an active area that can detect the contact position (or approach position).

  As a touch panel, a projected capacitive coupling type touch panel is known. In a capacitively coupled touch panel, a parasitic capacitance is newly generated when an external conductor (typically a finger) whose position is to be detected contacts (or approaches) the touch panel via a dielectric. The position of the external conductor on the touch panel is detected on the basis of the change in capacitance caused by the parasitic capacitance. Such a projected capacitively coupled touch panel includes, for example, a transparent electrode including a transparent base material such as PET and a plurality of conductive patterns provided on the transparent base material. The conductive pattern is made of, for example, a transparent conductive material made of ITO (indium tin oxide) having translucency and conductivity.

  In addition, in order to reduce the electrical resistance value of the conductive pattern and thereby improve the detection accuracy of the touch position, a metal material such as silver or copper having higher conductivity than the transparent conductive material is used as a material constituting the conductive pattern. It has been proposed to use (see, for example, Patent Document 1). However, since these metal materials are opaque, when the conductive pattern is made of a metal material, the conductive pattern has an opening for transmitting the image light from the display device at an appropriate ratio. For example, the conductive pattern is composed of conductive wires arranged in a mesh shape.

JP 2013-169712 A

  However, metal materials such as copper exhibit a metallic luster while having high conductivity. For this reason, when an untreated metal material is used as a conducting wire, the visibility of the image light from the display device is hindered by the metallic luster of the conducting wire. In particular, copper exhibits a reddish color peculiar to copper, so that it is more conspicuous than other metal materials such as silver, and this hinders the visibility of image light from the display device.

  In order to reduce such metallic luster peculiar to copper, for example, in the above-mentioned Patent Document 1, it is proposed to reduce the metallic luster of the conductive wire by providing a low reflective layer made of copper nitride on the surface of the metal layer. Has been.

  By the way, as a method of manufacturing a flexible wiring substrate such as a flexible substrate, the above-described low reflection layer or metal layer is formed on a long resin substrate supplied and conveyed by a roll-to-roll method. A method of forming a long wiring substrate by forming the wiring substrate and winding the wiring substrate in a roll shape is conceivable. In such a roll-to-roll system, an acrylic resin layer is formed as a hard coat layer on the surface in order to improve the slipperiness between the guide roller and the base material and to prevent the wiring board from being scratched. Substrates are used. In this case, when the low reflection layer is formed on the acrylic resin layer, the adhesion between the base material and the low reflection layer made of copper nitride is lowered as compared with the case where the base material and the low reflection layer are in direct contact. As a result, it is conceivable that the conductive wire is peeled off from the base material in a subsequent process such as peeling of the protective film. Here, the “roll-to-roll method” means that a long belt-like flexible substrate is unwound and conveyed from a take-up (roll), supplied, subjected to predetermined processing, and then taken up ( A processing method of winding into a roll) form. The acrylic resin is typically a cured product of an ultraviolet curable acrylic resin.

  The present invention has been made in consideration of such points. An object of the present invention is to provide a transparent electrode, a touch panel, a display device with a touch position detection function, and a method for manufacturing the transparent electrode, in which adhesion between a base material and a low reflection layer is improved.

The transparent electrode according to the present invention comprises:
A transparent substrate;
An acrylic resin layer provided on the transparent substrate;
A plurality of conductive patterns provided on the acrylic resin layer;
With
The conductive pattern is a conductive wire having a light shielding property, and is composed of conductive wires arranged in a mesh shape so that an opening is formed between the conductive wires,
The conducting wire is
A body layer made of a metal material;
A low reflective layer made of copper nitride, disposed between the main body layer and the acrylic resin layer;
Including
Between the low reflection layer and the acrylic resin layer, an adhesion layer containing Cu constituting CuOH that is in direct contact with both the low reflection layer and the acrylic resin layer is interposed.
In the transparent electrode according to the present invention, in the adhesion layer, a ratio of the number of Cu atoms constituting CuOH to the number of unreacted Cu atoms may be 0.1 or more.
The touch panel according to the present invention includes any of the above-described transparent electrodes according to the present invention.
A display device according to the present invention comprises:
A display device;
A touch panel according to the present invention described above, disposed on the display surface of the display device;
Is provided.
The method for producing a transparent electrode according to the present invention includes:
Forming a low reflection layer made of copper nitride on an acrylic resin layer provided on a transparent substrate;
Forming a main body layer made of a metal material on the low reflection layer;
A plurality of conductive wires, each of which is a light-shielding conductive wire formed by etching the main body layer and the low-reflection layer, the conductive wires being arranged in a mesh shape so that an opening is formed between the conductive wires. Forming a pattern;
With
Before the step of forming the low-reflection layer, a copper target is sputtered using an AC discharge with a frequency of 30 kHz to 2 MHz, so that it adheres directly to the acrylic resin layer and contains Cu constituting CuOH. Forming a layer,
In the step of providing the low reflection layer, the low reflection layer is formed by directly adhering to the adhesion layer.

  According to the present invention, the adhesion between the substrate and the low reflection layer can be improved.

FIG. 1 is a plan view showing a transparent electrode in the first embodiment of the present invention. 2A is an enlarged plan view showing a conductive pattern in a portion surrounded by an alternate long and short dash line denoted by reference numeral II in FIG. FIG. 2B is an enlarged plan view showing a modification of the conductive pattern. FIG. 3 is a cross-sectional view showing a case where the transparent electrode is cut along line III in FIG. 2A. FIG. 4 is an enlarged cross-sectional view of the transparent substrate and the conductor shown in FIG. FIGS. 5A to 5D are views for explaining a method of manufacturing a transparent electrode. 6A to 6C are diagrams for explaining a method for manufacturing a transparent electrode. FIG. 7 is a cross-sectional view showing the lead wire of the transparent electrode in the second embodiment of the present invention. FIG. 8 is a development view showing a display device with a touch position detection function in the third embodiment of the present invention. FIG. 9 is a plan view showing a touch panel in the display device with a touch position detection function of FIG. FIG. 10 is an enlarged plan view showing a conductive pattern in a portion surrounded by a one-dot chain line denoted by reference numeral XVI in FIG. 11 is a cross-sectional view showing a case where the touch panel is cut along the line XVII in FIG. 12 is an enlarged cross-sectional view of a part of the touch panel shown in FIG. FIG. 13 is a cross-sectional view showing a modification of the touch panel according to the third embodiment of the present invention. FIG. 14 is a cross-sectional view showing a modification of the touch panel according to the third embodiment of the present invention. FIG. 15 is a cross-sectional view showing a modification of the touch panel according to the fourth embodiment of the present invention. FIG. 16 is a diagram showing a modification of the cross-sectional shape of the conducting wire arranged on the display device side. FIG. 17 is a cross-sectional view showing a transparent electrode according to the fourth embodiment of the present invention. FIG. 18 is an enlarged cross-sectional view showing a part of the transparent electrode shown in FIG. FIG. 19 is a schematic view showing a configuration of a sputtering apparatus used when forming the low reflective layer. 20 is a graph showing the results of measurement using TOF-SIMS in the sample of Example 2. FIG. FIG. 21 is a diagram for explaining a phenomenon in which defects are generated by DC discharge.

Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. Note that, in the drawings attached to the present specification, for the sake of easy understanding of the drawings, the scale and the vertical / horizontal dimension ratio are appropriately changed and exaggerated from those of the actual ones.
<First Embodiment>

  Hereinafter, a first embodiment of the present invention will be described with reference to FIGS.

  First, with reference to FIG. 1, the transparent electrode 31 in this Embodiment is demonstrated. FIG. 1 is a plan view showing the transparent electrode 31 when viewed from the observer side.

  Here, an example in which the transparent electrode 31 is configured for a projection-type capacitively coupled touch panel will be described. Note that the “capacitive coupling” method is also referred to as “capacitance” method, “capacitance coupling” method, or the like in the technical field of the touch panel. It is treated as a term synonymous with the “capacitive coupling” method. A typical capacitive coupling type touch panel has a conductive pattern, and when an external conductor (typically a human finger) approaches the touch panel, the electrical conductivity of the external conductor and the touch panel is reduced. A capacitor (capacitance) is formed between these patterns. Based on the change in the electrical state accompanying the formation of the capacitor, the position coordinates of the position where the external conductor is approaching on the touch panel are specified.

  As shown in FIG. 1, the transparent electrode 31 includes a base film 32 and a plurality of conductive patterns 41 provided on the base film 32. As shown in FIG. 1, each conductive pattern 41 has a rectangular outline shape, and the long side of the rectangle extends in a strip shape in the vertical direction of FIG. The plurality of conductive patterns 41 are arranged at a constant arrangement pitch in a direction orthogonal to the direction in which each conductive pattern 41 extends. The arrangement pitch of the conductive patterns 41 is determined according to the resolution required for the detection of the touch position, and is several mm, for example.

  As shown in FIG. 1, the base film 32 of the transparent electrode 31 includes a rectangular active area Aa1 corresponding to a region where the touch position can be detected, and a rectangular frame-shaped inactive located around the active area Aa1. Area Aa2. The active area Aa1 and the inactive area Aa2 are respectively divided in accordance with the active area and the inactive area of the display device of the display device with a touch position detection function 10 described later.

  The conductive pattern 41 described above is disposed in the active area Aa1. Further, in the inactive area Aa2, a plurality of frame wirings 43 electrically connected to the respective conductive patterns 41 and a plurality of frame wirings arranged near the outer edge of the base film 32 and electrically connected to each frame wiring 43 are provided. Terminal portion 44.

  Next, the pattern shape of the conductive pattern 41 will be described with reference to FIG. 2A. 2A is a plan view showing a conductive pattern 41 in a portion surrounded by a one-dot chain line denoted by reference numeral II in FIG. As shown in FIG. 2A, the conductive pattern 41 is a conductive wire 51 having light shielding properties and electrical conductivity, and is composed of conductive wires 51 arranged in a mesh shape so that openings 51a are formed between the conductive wires 51. Has been.

  The ratio of the area occupied by the opening 51a (hereinafter referred to as the aperture ratio) in the total area of the conductive pattern 41 is sufficiently high, so that the image light from the display device can be transmitted through the transparent electrode 31 with an appropriate transmittance. As long as it can pass through the active area Aa1, the size and shape of the conducting wire 51 are not particularly limited. For example, in the example shown in FIG. 2A, the conductive pattern 41 is configured by arranging conductive wires 51 formed in a rectangular shape along a predetermined direction. The aperture ratio is appropriately set according to the characteristics of the image light emitted from the display device.

  The line width of the conducting wire 51 is set according to the required aperture ratio, the invisibility of the conductive pattern, etc. For example, the width of the conducting wire 51 is set within a range of 1 μm to 10 μm, more preferably within a range of 2 μm to 7 μm. Has been. The arrangement pitch P1 of the conductive wires 51 extending in parallel with each other is also set according to the required aperture ratio. As a result, the influence of the conductive wire 51 on the image visually recognized by the observer can be reduced to a negligible level, that is, sufficient invisibility can be obtained.

  Although FIG. 2A shows an example in which the conductive pattern 41 is configured by arranging the conductive wires 51 whose opening portions are formed in a rectangular shape along a predetermined direction, the present invention is not limited thereto. . For example, as illustrated in FIG. 2B, the conductive pattern 41 may be configured by arranging the conductive wires 51 whose opening portions are formed in a rhombus shape along a predetermined direction. In this embodiment, as shown in FIGS. 2A and 2B, the number of openings 51a of the conductive pattern 41 is two in the direction orthogonal to the extending direction of the conductive pattern 41 (the left-right direction in the figure). However, the number of arrangements in the present invention is not limited to two, and the number is arranged as appropriate according to the resolution of detecting the position of the touch panel, the sensitivity, the invisibility of the conductive pattern, and the like.

  Next, the layer configuration of the transparent electrode 31 will be described with reference to FIGS. 3 and 4. 3 is a cross-sectional view showing a case where the transparent electrode 31 is cut along the line III in FIG. 2A. FIG. 4 is an enlarged cross-sectional view showing the base film 32 and the conductive wire 51 shown in FIG. is there.

  As shown in FIG. 3, the transparent electrode 31 includes a transparent base film 32 and a conductive pattern 41 including a conductive wire 51 provided on the surface of the base film 32. In the present specification, “transparent” means that the light transmittance is sufficiently high and the other side can be seen through. Specifically, for example, the visible light transmittance is 50% or more, more preferably 80% or more, and still more preferably 90% or more.

  The base film 32 is for supporting patterns and wiring such as the conductive pattern 41 and the frame wiring 43 described above. As shown in FIG. 4, the base film 32 includes a transparent base material 33 that can transmit image light from the display device, and an acrylic resin provided between the transparent base material 33 and the conductive wire 51 of the conductive pattern 41. A layer 35a. The base film 32 may further include an acrylic resin layer 35b provided on the side of the transparent base 33 opposite to the side facing the conductive wire 51. Moreover, between the transparent base material 33 and each acrylic resin layer 35a, 35b, the primer layer for improving the adhesiveness between the transparent base material 33, the acrylic resin layer 35a, and the acrylic resin layer 35b 34a and primer layer 34b may be interposed.

  As a material constituting the transparent base material 33, a material having transparency and flexibility is used, and for example, a synthetic resin (plastic) is used. Examples of synthetic resins include polyester resins such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), polyolefin resins such as polypropylene (PP) and cycloolefin polymer (COP), polycarbonate (PC) resin, and triacetyl cellulose. A resin having flexibility and transparency such as a cellulose resin such as (TAC) is used. The thickness of the base film is about 20 to 5000 μm.

  The acrylic resin layers 35a and 35b have a function of enhancing the scratch resistance against scratches that may be caused by friction with the guide roller when the transparent electrode 31 is manufactured by the roll-to-roll method, This is a layer provided to realize a function of adjusting optical characteristics such as transmittance and reflectance. An acrylic resin is used as a material constituting the acrylic resin layers 35a and 35b. As the acrylic resin, those having sufficient scratch resistance and transparency are preferable, and as a typical one satisfying these conditions, an ionizing radiation type acrylic resin that is cured by a crosslinking reaction or a polymerization reaction by ionizing radiation irradiation is used. Can be mentioned. As such an ionizing radiation curable acrylic resin, a (meth) acrylate prepolymer or a (meth) acrylate monomer having a polymerizable functional group such as a (meth) acryloyl group or a (meth) acryloyloxy group in the molecule is used. It is done. Examples of the (meth) acrylate prepolymer include prepolymers such as urethane (meth) acrylate, epoxy (meth) acrylate, and polyester (meth) acrylate. Examples of the (meth) acrylate monomer include ethylene glycol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, and dipentaerythritol hexa (meth) methacrylate. Examples include a polymer. (Here, “(meth) acryloyl group”, “(meth) acrylate” and the like mean “acryloyl group or methacryloyl group” and “acrylate or methacrylate”, respectively). These prepolymers and monomers are Depending on the required performance such as scratch resistance, flexibility, coating suitability, etc., one or more of the above prepolymers may be mixed as appropriate, and the above monomers may be used alone or in combination of two or more. Alternatively, one or more of the above prepolymers and one or more of the above monomers may be mixed and used. Moreover, when using ultraviolet rays or visible rays as ionizing radiation, 0.1-5 mass of photoinitiators, such as a benzotriazole type compound and a benzophenone type compound, with respect to 100 mass parts of these prepolymers and monomers. Add about 1 part. In order to improve the scratch resistance, fine particles having a particle size of 0.1 to 5 μm are added as fillers (fillers) in the acrylic resin. The fine particles used are inorganic particles composed of silica (silicon oxide), alumina (aluminum oxide), calcium carbonate, barium sulfate, etc., and organic particles such as acrylic resin, urethane resin, silicon resin, fluorine resin, and melamine resin. it can. The addition amount of the fine particles can be about 0.1 to 30% by mass in the undercoat layer composition. The thickness of the acrylic resin layers 35a and 35b can be set to about 1 to 5 μm in a dry and cured state. As ionizing radiation, charged particle beams such as ultraviolet rays, visible rays, electromagnetic waves such as X-rays, electron beams, and alpha rays can be used. In this embodiment, a cured product of an ultraviolet curable acrylic resin composition comprising an acrylate prepolymer, an acrylate monomer, and a benzotriazole photoinitiator is used.

  The acrylic resin layer 35a may be composed of a plurality of layers. For example, although not shown, the acrylic resin layer 35a includes a first acrylic resin layer and a second acrylic resin layer provided between the first acrylic resin layer and the transparent substrate 33. You may go out. In this case, preferably, the refractive index of the first acrylic resin layer is in the range of 1.58 to 1.75, and the refractive index of the second acrylic resin layer is 1.50 to 1.60. And the refractive index of the first acrylic resin layer is larger than the refractive index of the second acrylic resin layer. Thereby, the acrylic resin layer 35a can be provided with not only a function as the above-mentioned hard coat layer but also a function of adjusting optical characteristics such as transmittance and reflectance. As the material constituting the first acrylic resin layer, a material obtained by dispersing particles or fillers made of a high refractive index material such as niobium oxide or zirconium in a base acrylic resin can be used. Moreover, an acrylic resin etc. may be used as a material which comprises a 2nd acrylic resin layer.

  Similarly, the acrylic resin layer 35b may also be composed of a plurality of layers. For example, although not shown, the acrylic resin layer 35b includes a first acrylic resin layer and a second acrylic resin layer provided between the first acrylic resin layer and the transparent substrate 33. You may go out. In this case, preferably, the refractive index of the first acrylic resin layer is in the range of 1.58 to 1.75, and the refractive index of the second acrylic resin layer is 1.50 to 1.60. And the refractive index of the first acrylic resin layer is larger than the refractive index of the second acrylic resin layer. As a result, as in the case of the acrylic resin layer 35a, the acrylic resin layer 35b has not only the function as the hard coat layer described above but also the function of adjusting optical characteristics such as transmittance and reflectance. Can do. As a material constituting the first acrylic resin layer and the second acrylic resin layer, the same material as that of the acrylic resin layer 35a can be used.

  In addition, the refractive index shown in this specification means the refractive index with respect to light with a wavelength of 500 nm unless otherwise specified.

  Of the acrylic resin layers 35a and 35b, the acrylic resin layer located on the observer side of the transparent base material 33 is referred to as an “observer side acrylic resin layer”, and the acrylic resin layer located on the opposite side. This may be referred to as “display device side acrylic resin layer”. As will be described later, the conducting wire 51 may be positioned on the viewer side of the base film 32 or may be positioned on the display device side of the base film 32. Accordingly, the acrylic resin layer 35a may be an “observer side acrylic resin layer” and the acrylic resin layer 35b may be a “display device side acrylic resin layer”, or the acrylic resin layer 35b may be an “observer”. The acrylic resin layer 35a may become the “display side acrylic resin layer”.

  Next, the layer structure of the conducting wire 51 will be described. As shown in FIG. 4, the conducting wire 51 includes a conducting wire forming layer 52 </ b> A having a low reflection layer 54 and a main body layer 53 arranged in this order from the base film 32 side.

  The main body layer 53 is a layer for mainly realizing electrical conductivity in the conductive wire 51. The main body layer 53 in the present invention is configured to have a thickness of, for example, 0.2 μm or less, more specifically, in a range of 0.02 μm to 0.2 μm. Thereby, it can suppress that the thickness of the conducting wire 51 whole becomes large, and it can suppress that external light and video light are reflected in the side surface of the conducting wire 51 by this. For this reason, the visibility in the display device to which the transparent electrode 31 is attached can be sufficiently ensured.

On the other hand, reducing the thickness of the main body layer 53 can lead to an increase in the electrical resistance value of the conducting wire 51. Here, in the present embodiment, a metal material having a specific resistance equal to or lower than a desired value is used as a material constituting the main body layer 53. For example, the specific resistance is 4.0 × 10 ⁻⁶ (Ωm). The following metal materials are used. Thereby, the electrical resistance value of the conducting wire 51 can be made sufficiently low. For example, the sheet resistance value of the main body layer 53 can be set to 0.3Ω / □ or less. In the present invention, for example, gold, silver, copper, platinum, aluminum, or the like, as a metal material having a specific resistance of 4.0 × 10 ⁻⁶ (Ωm) or less for constituting the main body layer 53, A material (metal simple substance, metal alloy, etc.) containing 90% by weight or more of a metal such as tin can be used. In the present embodiment, a material containing 99% by weight of copper can be used.

  By the way, metal materials, such as copper, show a metallic luster, while having high electroconductivity. For this reason, when an untreated metal material is used as the conducting wire 51, the visibility of the image light from the display device is hindered by the metallic luster of the conducting wire. In particular, copper exhibits a reddish color peculiar to copper, so that it is more conspicuous than other metal materials such as silver, and this hinders the visibility of image light from the display device.

  In order to relieve such a metallic luster peculiar to copper, a thin low reflection layer 54 in which the metallic luster is suppressed as compared with the main body layer 53 is provided on the surface of the main body layer 53. Hereinafter, the low reflection layer 54 will be described.

  The low reflection layer 54 is a layer made of copper nitride. Copper nitride may further contain oxygen atoms. As the copper nitride, for example, a copper compound containing 10 to 15 atomic% nitrogen, 10 to 15 atomic% oxygen, and 70 to 80 atomic% copper may be used. In the low reflection layer 54 configured using such copper nitride, the metallic luster is reduced compared to the metallic luster in the main body layer 53, and in particular, the reddish color peculiar to copper is present. In particular, the reddish color peculiar to copper is reduced. For this reason, it can suppress that the visibility of an image | video falls by the reflected light from the conducting wire 51. FIG.

  Further, the low reflection layer 54 has a smaller thickness than the main body layer 53. Specifically, the thickness of the low reflection layer 54 is in the range of 10 nm to 60 nm. It is possible to suppress an increase in the thickness of the lead wire, and thereby it is possible to suppress the reflection of external light and video light on the side surface of the conductive wire 51.

  Moreover, the reflectance of the light in the conducting wire 51 can also be lowered by setting the thickness of the low reflection layer 54 within the range of 10 nm to 60 nm. Examples of this reason include, but are not limited to, thin film interference that occurs in the low reflective layer 54. Thin film interference is a phenomenon in which light reflected on one surface of the low reflective layer 54 interferes with light reflected on the other surface of the low reflective layer 54. By setting the thickness of the low reflection layer 54 within the above-mentioned range of 10 to 60 nm, it is considered that thin film interference occurs so as to weaken the reflected light, thereby reducing the light reflectivity in the conductive wire 51. obtain.

  A method for forming the thin low-reflection layer 54 as described above is not particularly limited, and a known thin film forming method such as a sputtering method, a vacuum evaporation method, a CVD method, an ion plating method, an electron beam method or the like is used. be able to. For example, when a sputtering method is used, a desired composition can be obtained by applying discharge power to a target made of copper in an environment where nitrogen gas or both nitrogen gas and oxygen gas controlled to a predetermined partial pressure exists. A layer made of the above-described copper nitride can be obtained.

  By the way, as mentioned in the column of the problem to be solved by the invention, when the low reflection layer 54 is formed on the acrylic resin layer 35a, the transparent substrate 53 and the low reflection layer 54 are in direct contact with each other. In addition, the adhesion between the transparent substrate 53 and the low reflection layer 54 is reduced. As a result, it is considered that the conductive wire 51 is peeled off from the base film 52 in a subsequent process such as peeling of the protective film.

  As a result of intensive studies in consideration of such problems, the present inventors have directly applied both the low reflection layer 54 and the acrylic resin layer 35a between the low reflection layer 54 and the acrylic resin layer 35a. It was confirmed that the adhesion between the transparent base material 33 and the low reflection layer 54 can be improved by interposing the adhesion layer 55 containing Cu constituting CuOH. Hereinafter, the adhesion layer 55 will be described.

  The adhesion layer 55 is a layer made of copper nitride containing Cu constituting CuOH. Cu constituting CuOH means a copper atom chemically bonded to an OH group. In the adhesion layer 55, the ratio of the number of Cu atoms constituting CuOH to the number of unreacted Cu atoms (that is, pure copper atoms not chemically bonded to other atoms or molecules) is 0.1 or more. Is preferred. When the present inventors confirmed, if the ratio of Cu which comprises CuOH in the contact | adherence layer 55 is this range, it can suppress effectively that the conducting wire 51 will peel from the base film 52. FIG.

  Incidentally, TOF-SIMS (time-of-flight secondary ion analyzer) is known as an apparatus for analyzing the chemical structure of a sample. TOF-SIMS can obtain a mass spectrum of a sample surface by irradiating the sample surface with a primary ion beam and analyzing secondary ions sputtered from the sample surface with a time-of-flight mass spectrometer. is there. Here, the secondary ions sputtered from the sample surface are molecular ions that maintain the chemical structure of the sample surface or fragments in which chemical bonds are partially cleaved.

  Therefore, whether or not Cu constituting CuOH is contained in the layer interposed between the low reflection layer 54 and the acrylic resin layer 35a is detected by secondary ions corresponding to CuOH by measurement using TOF-SIMS. It can be determined whether or not it is done. Further, the ratio of the number of Cu atoms constituting CuOH to the number of unreacted Cu atoms is normalized by the detection intensity of secondary ions corresponding to Cu by the detection intensity of secondary ions corresponding to CuOH. Can be sought.

  Returning to FIG. 1, the frame wiring 43 and the terminal portion 44 connected to the conductive pattern 41 are provided for extracting a signal from the conductive pattern 41 to the outside of the transparent electrode 31. As long as signals can be appropriately transmitted, the specific configurations of the frame wiring 43 and the terminal portion 44 are not particularly limited. For example, the frame wiring 43 and the terminal portion 44 may be formed at the same time as the conducting wire 51 with the same layer configuration as the conducting wire 51.

  Next, a method of manufacturing the transparent electrode 31 having the above configuration will be described with reference to FIGS. 5 (a) to 5 (d) and FIGS. 6 (a) to 6 (c).

  First, as shown in FIG. 5A, a base film 32 is prepared. As described above, the base film 32 includes the transparent base 33, the acrylic resin layer 35a and the acrylic resin layer 35b provided on both sides of the transparent base 33, the transparent base 33 and the acrylic base, respectively. The primer layer 34a and the primer layer 34b provided between the resin layer 35a and the acrylic resin layer 35b are included.

  An example of a method for producing the substrate film 32 will be described. First, a long transparent substrate 33 provided with a primer layer 34a and a primer layer 34b on both sides is prepared. Next, an acrylic resin layer 35a is formed on the primer layer 34a, and an acrylic resin layer 35b is formed on the primer layer 34b. For example, the acrylic resin layers 35a and 35b can be formed by coating a coating liquid containing an acrylic resin on the primer layers 34a and 34b using a coater. At this time, as the coater, a coater that can sufficiently ensure the flatness of the acrylic resin layers 35a and 35b is preferably used. For example, a die coater is used. In addition, the leveling agent for improving the flatness of acrylic resin layer 35a, 35b may be contained in the coating liquid for forming acrylic resin layer 35a, 35b. Thus, for example, it is possible to suppress the occurrence of defects such as pinholes when the conductive wire 51 layer is formed on the acrylic resin layer 35a.

  After preparing the base film 32, as shown in FIG. 5 (b), an adhesion layer 55 containing Cu constituting CuOH is formed on the acrylic resin layer 35a directly in contact with the acrylic resin layer 35a. To do. The adhesion layer 55 containing Cu constituting CuOH is made of, for example, copper using an AC discharge with a frequency of 30 kHz to 2 MHz in an atmosphere containing nitrogen gas (hereinafter, also referred to as a specific frequency AC discharge or an AC discharge). It can be formed by sputtering the target. A copper target may be sputtered using an AC discharge and a DC discharge (hereinafter also referred to as DC discharge) having a frequency of 30 kHz to 2 MHz in combination. In addition to nitrogen gas, oxygen gas may be further introduced.

  FIG. 19 shows an example of the configuration of the sputtering apparatus 20 used for forming the adhesion layer 55. In the example shown in FIG. 19, the sputtering apparatus 20 includes a pair of copper targets 21 a and 21 b, an AC power supply 22 having a frequency of 30 kHz to 2 MHz electrically connected to each target 21 a and 21 b, and each target 21 a and 21 b. And a main roller 23 that supports the base film 32 at a position facing it and transports the base film 32 in a predetermined transport direction.

  Among these, each of the targets 21 a and 21 b has an elongated shape extending in the width direction of the base film 32, and is disposed at a distance from the transport direction of the base film 32.

  The AC power supply 22 generally reverses AC voltage having a frequency in a specific frequency band (frequency 30 kHz to 2 MHz, 50 kHz in this embodiment) extending from a long wave band to a medium wave band, which is generally referred to in wireless engineering, to a pair of targets 21 a and 21 b. It is comprised so that it may apply with a phase. As the AC power source 22, for example, an AC power source (50 kHz, automatic matching) manufactured by Huttinger can be suitably used.

  While applying argon gas, nitrogen gas or both nitrogen gas and oxygen gas to the sputtering apparatus 20 at a predetermined flow rate, by applying a discharge voltage of a specific frequency from each AC power source 22 to each target 21a, 21b, Plasma is generated alternately on the targets 21a and 21b. Then, argon ions in the plasma sputter the targets 21a and 21b, and copper atoms emitted from the targets 21a and 21b enter the base film 32. The copper atoms released from the targets 21a and 21b can react with nitrogen gas or oxygen gas to form copper nitride or copper oxide before reaching the base film 32.

  Here, when the sputtered particles are an insulating material, the insulating film is deposited on the anode electrode such as the earth shield 24, so that the anode disappears and the discharge becomes unstable. In order to prevent this, the AC power source 22 prevents the disappearance of the anode by applying a voltage so that the pair of targets 21a and 21b alternately become anode electrodes.

  In sputtering using such alternating current discharge at a specific frequency, the energy of copper atoms sputtered from the targets 21a and 21b is higher than in sputtering using DC discharge. For this reason, when the sputtered copper atoms are incident on the surface of the acrylic resin layer 35a of the base film 32, they are easily mixed with the acrylic resin layer 35a. When the sputtered copper atoms are incident on the surface of the acrylic resin layer 35a and chemically bonded to the OH groups contained in the acrylic resin layer 35a, the Cu atoms are in close contact with the acrylic resin layer 35a and constitute CuOH. An adhesion layer 55 containing can be formed.

  In addition, as shown in FIG. 21, in the case of sputtering using DC discharge, the base film side is negatively charged (charged), and the charged charge flows through the metal layer on the base film and is grounded. It is discharged as current from the guide roller. Here, if a filler is added to the acrylic resin layer 35a to improve the slipperiness, the top of the filler becomes a contact and current concentrates, so that a high temperature is generated and the substrate film has a concave defect. Occur.

  On the other hand, in sputtering using alternating current discharge, since the circuit is closed between the pair of targets 21a and 21b and the alternating current power source 22, the base film 32 side is prevented from being negatively charged. It can suppress that a concave defect generate | occur | produces in the material film 32. FIG.

  Next, as shown in FIG. 5C, the low reflection layer 54 is formed by directly adhering to the adhesion layer 55. Then, as shown in FIG. 5D, the main body layer 53 is formed on the low reflection layer 54. As a method for forming the low reflection layer 54 and the main body layer 53, a thin film forming method such as a sputtering method can be used as described above.

  In this way, a laminate 60 (also referred to as a blank) as a base material for producing the transparent electrode 31 is obtained. The laminate 60 includes a base film 32 and a conductive wire forming layer 52 </ b> A provided on the base film 32. The conducting wire forming layer 52 </ b> A includes an adhesion layer 55, a low reflection layer 54, and a main body layer 53 that are sequentially arranged from the base film 32 side.

  After the laminated body 60 is prepared, as shown in FIG. 6A, a photosensitive resist layer 71 is formed in a predetermined pattern on the conductor forming layer 52A. The photosensitive resist layer 71 has photosensitivity to light in a specific wavelength range, for example, ultraviolet rays. The type of the photosensitive resist layer 71 is not particularly limited. For example, a photodissolvable photosensitive resist layer may be used, or a photocurable photosensitive resist layer may be used. Here, an example in which a photodissolvable photosensitive resist layer is used will be described.

  The photosensitive resist layer 71 is formed in a pattern corresponding to the pattern of the conductive wire 51. The photosensitive resist layer 71 is, for example, by first coating a photosensitive resist material on the surface of the laminate 60 using a coater, and then exposing and developing the photosensitive resist material in a predetermined pattern. A photosensitive resist layer 71 having a predetermined pattern shape is formed.

  Next, as shown in FIG. 6B, the main body layer 53, the low reflection layer 54, and the adhesion layer 55 are etched using the photosensitive resist layer 71 as a mask. As described above, all of the main body layer 53, the low reflection layer 54, and the adhesion layer 55 are configured to include copper. For this reason, the main body layer 53, the low reflection layer 54, and the adhesion layer 55 can be simultaneously etched using an etching solution capable of dissolving copper. For example, an aqueous ferric chloride solution is used as the etching solution.

  Next, the photosensitive resist layer 71 remaining on the main body layer 55 is washed with a chemical solution for dissolving and removing the photosensitive resist layer 71 and subjected to film removal. As a result, the photosensitive resist layer 71 can be removed as shown in FIG. In this way, the conductive wire forming layer 52A having the main body layer 53, the low reflection layer 54, and the adhesion layer 55 is patterned, and the transparent electrode 31 including the conductive wire 51 formed therefrom can be obtained.

  Here, according to the present embodiment, as described above, the conductive wire 51 includes the main body layer 53 containing 90% by weight or more of copper, and the low reflection layer 54 made of copper nitride provided on the surface of the main body layer 53. And. For this reason, the low reflection layer 54 can suppress reddish light from reaching the observer due to the metallic luster of copper. Further, since the adhesion layer 55 containing Cu constituting CuOH is interposed between the low reflection layer 54 and the acrylic resin layer 35a, the adhesion between the low reflection layer 54 and the acrylic resin layer 35a. Has improved. Thereby, it can suppress that the conducting wire 51 peels from the base film 32 in post processes, such as protective film peeling. Furthermore, since all of the main body layer 53, the low reflection layer 54, and the adhesion layer 55 contain copper, when producing the transparent electrode 31 from the laminate 60, an etching solution capable of selectively dissolving copper is used. Thus, the conductor layer 51 can be formed by simultaneously etching the main body layer 53, the low reflection layer 54, and the adhesion layer 55 of the stacked body 60. For this reason, the man-hour required in order to produce the transparent electrode 31 can be made small.

<Second Embodiment>
Next, a second embodiment of the present invention will be described with reference to FIG. In the second embodiment shown in FIG. 7, the same parts as those in the first embodiment are denoted by the same reference numerals, and detailed description thereof is omitted. Moreover, when it is clear that the effect obtained in the first embodiment can be obtained in the present embodiment, the description thereof may be omitted.

  FIG. 7 is an enlarged cross-sectional view showing the transparent electrode 31 according to the present embodiment, and corresponds to FIG. 4 in the first embodiment described above. As shown in FIG. 7, in the present embodiment, the conducting wire 51 is a conducting wire forming layer 52 </ b> B having an adhesion layer 55, a low reflection layer 54, a main body layer 53, and a low reflection layer 54 arranged in this order from the base film 32 side. Is included.

  The main body layer 53, the low reflection layer 54, and the adhesion layer 55 are the same as the main layer 53, the low reflection layer 54, and the adhesion in the first embodiment described above except that the positional relationship with the base film 32 is different. Same as layer 55.

  According to the present embodiment, in addition to the low reflection layer 54 provided between the main body layer 53 and the base film 32, the conducting wire 51 includes a surface facing the base film 32 among the main layer 53. Includes a low-reflection layer 54 provided on the opposite surface. For this reason, the occurrence of light reflection can be suppressed on both sides of the main body layer 53. Thereby, it is possible to sufficiently ensure the visibility of the video.

<Third Embodiment>
Next, a third embodiment of the present invention will be described with reference to FIGS. In the present embodiment, a display device with a touch position detection function obtained by combining a touch panel including the above-described transparent electrode 31 and a display device will be described. In the present embodiment, the same parts as those in the above-described embodiments are denoted by the same reference numerals, and detailed description thereof is omitted. In addition, when it is clear that the operational effects obtained in each embodiment can be obtained also in this embodiment, the description thereof may be omitted.

  FIG. 8 is a development view showing the display device 10 with a touch position detection function. As shown in FIG. 8, the display device 10 with a touch position detection function is configured by combining a touch panel 30 and a display device 15 such as a liquid crystal display or an organic EL display.

  The illustrated display device 15 is configured as a flat panel display. The display device 15 includes a display panel 16 having a display surface 16 a and a display control unit (not shown) connected to the display panel 16. The display panel 16 includes an active area A1 that can display an image, and an inactive area (also referred to as a frame area) A2 that is disposed outside the active area A1 so as to surround the active area A1. . The display control unit processes information regarding the video to be displayed, and drives the display panel 16 based on the video information. The display panel 16 displays a predetermined image on the display surface 16a based on a control signal from the display control unit. That is, the display device 15 plays a role as an output device that outputs information such as characters and drawings as video.

  As shown in FIG. 8, a protective plate 12 having translucency may be further provided on the viewer side of the touch panel 30, that is, the side opposite to the display device 15. For example, the protective plate 12 is bonded to the surface of the touch panel 30 on the viewer side with an adhesive layer or the like. The protective plate 12 is for preventing damage to the pattern of the touch panel 30 and the display device 15 due to contact with an external conductor such as a finger, and is also referred to as a so-called front plate.

  As shown in FIG. 8, the touch panel 30 is bonded to the display surface 16a of the display device 15 via, for example, an adhesive layer (not shown). The touch panel 30 is configured by combining two transparent electrodes 31. In FIG. 8, the see-through electrode arranged on the viewer side is represented by reference numeral 31A, and the see-through electrode arranged on the display device side from the see-through electrode 31A is represented by reference numeral 31B. In the following description, the transparent electrode labeled 31A is also referred to as a first transparent electrode 31A, and the transparent electrode labeled 31B is also referred to as a second transparent electrode 31B.

  FIG. 9 is a plan view showing the touch panel 30 when viewed from the observer side. In FIG. 9, the constituent elements of the first transparent electrode 31A are represented by solid lines, and the constituent elements of the second transparent electrode 31B are represented by dotted lines.

  As shown in FIG. 9, each of the first transparent electrode 31A and the second transparent electrode 31B includes a plurality of conductive patterns 41 extending in a predetermined direction. Here, the first transparent electrode 31A and the second transparent electrode 31B are arranged so that the respective conductive patterns 41 extend in directions intersecting each other. For example, the first transparent electrode 31A is arranged such that the conductive pattern 41 extends along the first direction D1. On the other hand, the 2nd transparent electrode 31B is arrange | positioned so that the conductive pattern 41 may extend along the 2nd direction D2 orthogonal to the 1st direction D1.

  FIG. 10 is an enlarged plan view showing the conductive pattern 41 in the portion surrounded by the alternate long and short dash line labeled XVI in FIG. As shown in FIG. 10, the conductive pattern 41 of the first transparent electrode 31 </ b> A and the conductive pattern 41 of the second transparent electrode 31 </ b> B are each composed of conductive wires 51 arranged in a mesh shape.

  11 is a cross-sectional view showing a case where the touch panel 30 is cut along the line XVII in FIG. As shown in FIG. 11, the touch panel 30 has the first perspective view so that both the lead wire 51 of the first transparent electrode 31 </ b> A and the lead wire 51 of the second transparent electrode 31 </ b> B are located on the display device side of the base film 32. 31A and the second transparent electrode 31B are combined. Note that an adhesive layer 38 or the like may be interposed between the first transparent electrode 31A and the second transparent electrode 31B.

  12 is an enlarged cross-sectional view of a part of the touch panel 30 shown in FIG. As shown in FIG. 12, both the conducting wire 51 of the first transparent electrode 31A and the conducting wire 51 of the second transparent electrode 31B include the above-described conducting wire forming layer 52A. Here, as shown in FIG. 12, the conducting wire forming layer 52 </ b> A includes a main body layer 53 and a low reflection layer 54 provided on the viewer side of the main body layer 53. For this reason, it can suppress that the external light which injected into the touch panel 30 from the observer side is reflected by the conducting wire 51, and returns to the observer side. Thereby, it can suppress that the conducting wire 51 is visually recognized by an observer, and this can suppress that the visibility of the image from the display device 15 is hindered by the conducting wire 51.

  In addition, as described above, the low reflection layer 54 of the conductive wire forming layer 52A and the acrylic resin layer of the base film 32 are in close contact with both the low reflection layer 54 and the acrylic resin layer. Layer 55 is interposed. Thereby, the adhesiveness of the low reflection layer 54 and an acrylic resin layer is improving, and it can suppress that the conducting wire 51 peels from the base film 32 by the impact from the outside.

  Further, as described above, the main body layer 53 of the conductive wire forming layer 52A is configured to have a thickness of 0.2 μm or less. In this embodiment, it is 0.1 nm. For this reason, it can suppress that the light which injected into the touch panel 30 along the direction inclined from the normal line direction of the base film 32 is reflected by the side surface of 52 A of conducting wire formation layers. Thereby, it can suppress that the side of the conducting wire 51 is visually recognized by an observer, and that the video light from the display device is hindered by the side of the conducting wire 51. Accordingly, the visibility of the video can be improved.

  Various changes can be made to the above-described embodiment. Hereinafter, modified examples will be described with reference to the drawings. In the following description and the drawings used in the following description, the same reference numerals as those used for the corresponding parts in the above embodiment are used for the parts that can be configured in the same manner as the above embodiment. The duplicated explanation is omitted. In addition, when it is clear that the operational effects obtained in the above-described embodiment can be obtained in the modified example, the description thereof may be omitted.

  FIG. 12 shows an example in which both the conductive wire 51 of the first transparent electrode 31A and the conductive wire 51 of the second transparent electrode 31B include the conductive wire forming layer 52A. However, the present invention is not limited to this, and the conducting wire 51 of the first transparent electrode 31A may include the conducting wire forming layer 52B described above. That is, the conducting wire 51 of the first transparent electrode 31A may be configured by either the conducting wire forming layer 52A or the conducting wire forming layer 52B. Similarly, the conducting wire 51 of the second transparent electrode 31B may be constituted by either the conducting wire forming layer 52A or the conducting wire forming layer 52B.

  For example, FIG. 13 shows an example in which both the conductive wire 51 of the first transparent electrode 31A and the conductive wire 51 of the second transparent electrode 31B include the conductive wire forming layer 52B. As shown in FIG. 13, the conductive wire forming layer 52 </ b> B includes a low reflection layer 54 provided on the display device side of the main body layer 53. Therefore, the image light from the display device 15 incident on the touch panel 30 is reflected by the conductive wire 51 and returns to the display device 15 side, and then reflected again by the components of the display device 15 and reaches the observer as noise light. Can be suppressed.

  Further, in the above-described embodiment and each of the above-described modifications, both the conductive wire 51 of the first transparent electrode 31A and the conductive wire 51 of the second transparent electrode 31B are located on the display device side of the base film 32. However, the present invention is not limited to this. For example, as shown in FIG. 14, the conducting wire 51 of the first transparent electrode 31A is located on the viewer side of the base film 32, while the conducting wire 51 of the second transparent electrode 31B is an indication of the base film 32. It may be located on the device side.

  Also in the example illustrated in FIG. 14, the type of the conductive wire forming layer constituting the conductive wire 51 of the first transparent electrode 31A and the conductive wire 51 of the second transparent electrode 31B is not particularly limited. That is, the conducting wire 51 of the first transparent electrode 31A may be configured by either the conducting wire forming layer 52A or the conducting wire forming layer 52B. Similarly, the conducting wire 51 of the second transparent electrode 31B may be constituted by either the conducting wire forming layer 52A or the conducting wire forming layer 52B. In the example shown in FIG. 14, the lead wire forming layer 52 </ b> B is preferably adopted as the lead wire forming layer constituting the lead wire 51 of the first transparent electrode 31 </ b> A. In this case, since the low reflection layer 54 exists on the observer side of the main body layer 53 of the conducting wire 51, external light incident on the touch panel 30 from the observer side is caused by the main body layer 53 of the conducting wire 51 of the first transparent electrode 31A. It can suppress that it reflects and returns to the observer side.

  As shown in FIG. 15, the conducting wire 51 of the first transparent electrode 31 </ b> A is located on the display device side of the base film 32, while the conducting wire 51 of the second transparent electrode 31 </ b> B is an observation of the base film 32. It may be located on the person side.

  Also in the example shown in FIG. 15, the type of the conductive wire forming layer constituting the conductive wire 51 of the first transparent electrode 31A and the conductive wire 51 of the second transparent electrode 31B is not particularly limited. That is, the conducting wire 51 of the first transparent electrode 31A may be configured by either the conducting wire forming layer 52A or the conducting wire forming layer 52B. Similarly, the conducting wire 51 of the second transparent electrode 31B may be constituted by either the conducting wire forming layer 52A or the conducting wire forming layer 52B. In the example shown in FIG. 15, the lead wire forming layer 52B is preferably used as the lead wire forming layer constituting the lead wire 51 of the second transparent electrode 31B. In this case, since the low reflection layer 54 exists on the observer side of the main body layer 53 of the conducting wire 51, external light incident on the touch panel 30 from the observer side is caused by the main body layer 53 of the conducting wire 51 of the second transparent electrode 31B. It can suppress that it reflects and returns to the observer side.

  Next, a preferable example of the cross-sectional shape of the conducting wire 51 when the conducting wire 51 is provided on the display device side of the base film 32 will be described with reference to FIG. In FIG. 16, an example in which the conducting wire 51 is configured from the conducting wire forming layer 52A will be described. However, the present invention is not limited thereto, and the conducting wire 51 may be configured from the conducting wire forming layer 52B.

  As shown in FIG. 16, the conductive wire forming layer 52 </ b> A of the conductive wire 51 has a tapered shape that tapers toward the display device 15. In this case, the external light L incident on the touch panel 30 along the direction inclined from the normal direction of the base film 32 is not incident on the side surface of the conductor 51 due to the tapered shape of the conductor formation layer 52A. You can escape to the side. For this reason, it can further suppress that external light is reflected by the conducting wire 51 and returns to the observer side.

  The specific taper shape of the conductive wire forming layer 52A is appropriately set according to the assumed degree of inclination of external light, and the normal direction of the base film 32 and the side surface of the conductive wire 51 are formed, for example. The angle is in the range of 10 ° to 30 °.

  In addition, although the some modification with respect to this Embodiment mentioned above has been demonstrated, naturally, it can also apply combining a some modification suitably.

<Fourth embodiment>
Next, a fourth embodiment of the present invention will be described with reference to FIGS. In the present embodiment, an example in which the conductive wires 51 are provided on both sides of the base film 32 will be described. In the present embodiment, the same parts as those in the above-described embodiments are denoted by the same reference numerals, and detailed description thereof is omitted. In addition, when it is clear that the operational effects obtained in each embodiment can be obtained also in this embodiment, the description thereof may be omitted.

  As shown in FIG. 17, the transparent electrode 31 includes a base film 32, a conductive wire 51 provided on an observer-side surface (first surface) 32 a of the base film 32, and a display of the base film 32. And a conductor 51 provided on the device side surface (second surface) 32b. The conductive pattern 41 made of the conductive wire 51 on the first surface 32a side and the conductive pattern 41 made of the conductive wire 51 on the second surface 32b side are provided so as to cross each other. For example, in the figure, the conductive pattern 41 on the first surface 32a extends in a direction orthogonal to the paper surface, and the conductive pattern 41 on the second surface 32b extends in a direction parallel to the paper surface. For this reason, according to the present embodiment, the touch panel 30 can be configured by the single transparent electrode 31.

  18 is an enlarged cross-sectional view of a part of the transparent electrode 31 shown in FIG. As shown in FIG. 18, the conducting wire 51 provided on the first surface 32a of the base film 32 includes the conducting wire forming layer 52B described above. Moreover, the conducting wire 51 provided on the second surface 32b of the base film 32 includes the conducting wire forming layer 52A described above. For this reason, it can suppress that the external light which injected into the touch panel 30 from the observer side is reflected by the conducting wire 51, and returns to the observer side. Thereby, it can suppress that the conducting wire 51 is visually recognized by an observer, and this can suppress that the visibility of the image from the display device 15 is hindered by the conducting wire 51.

  In FIG. 18, the conducting wire 51 provided on the first surface 32a of the base film 32 includes a conducting wire forming layer 52B, and the conducting wire 51 provided on the second surface 32b of the base film 32 includes a conducting wire forming layer 52A. An example is shown. However, it is not restricted to this, The conducting wire 51 provided on the 1st surface 32a of the base film 32 may contain the above-mentioned conducting wire formation layer 52A. That is, the conducting wire 51 provided on the first surface 32a of the base film 32 may be configured by either the conducting wire forming layer 52A or the conducting wire forming layer 52B. Similarly, the conducting wire 51 provided on the second surface 32b of the base film 32 may be constituted by either the conducting wire forming layer 52A or the conducting wire forming layer 52B.

  Preferably, a conductive wire forming layer 52A is employed as the conductive wire forming layer constituting the conductive wire 51 provided on the first surface 32a of the base film 32. In this case, since the low reflection layer 54 exists on the observer side of the main body layer 53 of the conducting wire 51, external light incident on the touch panel 30 from the observer side is caused by the main body layer 53 of the conducting wire 51 of the first transparent electrode 31A. It can suppress that it reflects and returns to the observer side.

  In addition, although the some modification with respect to this Embodiment mentioned above has been demonstrated, naturally, it can also apply combining a some modification suitably.

  EXAMPLES Next, although an Example demonstrates this invention further more concretely, this invention is not limited to description of a following example, unless the summary is exceeded.

Example 1
As shown to Fig.6 (a), the sample of the laminated body 60 containing the base film 32 and the conducting wire formation layer 52A provided on the base film 32 was prepared. The conducting wire forming layer 52 </ b> A includes an adhesion layer 55, a low reflection layer 54, and a main body layer 53 that are arranged in this order from the base film 32 side. The adhesion layer 55 is in close contact with both the low reflection layer 54 and the acrylic resin layer 35 a of the base film 32. As a material constituting the transparent substrate 33 of the substrate film 32, a biaxially stretched PET film having a thickness of 50 μm was used. Materials constituting the acrylic resin layers 35a and 35b of the base film 32 include ultraviolet light from a monomer having an acryloyl group in the molecule, a prepolymer having an acryloyl group in the molecule, and a benzotriazole photoinitiator. A curable acrylic resin obtained by crosslinking and curing by ultraviolet irradiation was used. As a material constituting the main body layer 53, copper having a purity (copper content) of 99% by mass was used. As a material constituting the low reflection layer 54 and the adhesion layer 55, a copper compound made of copper nitride containing oxygen atoms was used. As specific samples, the discharge power applied to the copper target at the time of forming the adhesion layer 54 was both AC power and DC power, and the following three types differing only in AC discharge power were prepared.
Sample 1: AC power 8.4 kW DC power 4.2 kW
Sample 2: AC power 12.3 kW DC power 4.2 kW
Sample 3: AC power 10.1 kW DC power 4.2 kW

  For comparison, a laminate in which a layer made of copper nitride (hereinafter referred to as an adhesion-corresponding layer) is formed without using an AC discharge but using a DC discharge with a power of 4.2 kW instead of the adhesion layer 55 is used. Prepared as a comparative sample.

  Next, each sample was subjected to an adhesion evaluation test by a cross-cut method defined in JIS K5600-5-6, and classified according to 0 to 5 evaluation points according to the test results. Here, 5 points were given when 50% or more of all the cells were peeled off, and 0 points were given when there were no peelings in any grid eye. Moreover, 2 points or less (5-15% of all the meshes) or less were set as the pass.

  In each sample, the film formation conditions of the adhesion layer 55 or the adhesion-corresponding layer and the test results by the cross-cut method are summarized in Table 1 below.

  As shown in Table 1, in each of Samples 1 to 3 in which the adhesion layer 55 was formed using AC discharge, the test result by the cross-cut method was 2 points or less (peeling area was 15% or less of all squares). It was. On the other hand, in the comparative sample using a DC discharge instead of the adhesion layer 55 but forming an adhesion equivalent layer made of copper nitride without using an AC discharge at a specific frequency, the test result by the cross-cut method is 3 points or more (peeling) The area was over 15% of all squares). Therefore, it can be said that it is very effective to provide the adhesion layer 55 in close contact with both the low reflection layer 54 and the acrylic resin layer 35a in improving the adhesion between the conductive wire and the base film.

(Example 2)
Similarly to Example 1, as shown in FIG. 5A, a sample of a laminate 60 including a base film 32 and a conductive wire forming layer 52A provided on the base film 32 was prepared. As specific samples, samples 21 and 22 of different lots were prepared.

  For comparison, a laminate in which an adhesion equivalent layer made of copper nitride was formed instead of the adhesion layer 55 using DC discharge but without using AC discharge at a specific frequency was prepared as Comparative Samples 1 to 3. . Comparative samples 1 to 3 are also samples obtained from different lots.

  Next, in the same manner as in Example 1, each sample was subjected to an adhesion evaluation test by the cross-cut method defined in JIS K5600-5-6, and 0 to 5 evaluation points were obtained according to the test results. Classified by.

  Moreover, the detection intensity | strength of the secondary ion corresponding to CuOH and the secondary ion corresponding to Cu was measured with respect to passage of time by the measurement using TOF-SIMS with respect to each sample. FIG. 20 shows the change over time in the detected intensity of secondary ions corresponding to CuOH in each sample. In FIG. 20, the vertical axis is a value obtained by normalizing the detection intensity of secondary ions corresponding to CuOH with the detection intensity of secondary ions corresponding to the unreacted pure Cu component as a base material, that is, (corresponding to CuOH). Detection intensity of secondary ions) / (detection intensity of secondary ions corresponding to Cu) × 100. The horizontal axis indicates the passage of time. In the measurement using TOF-SIMS, since the sample surface is sputtered by the primary ion beam and scraped, the measurement region moves in the depth direction from the sample surface as time passes. Therefore, the horizontal axis in FIG. 20 indicates the position (measurement depth) in the depth direction of the measurement site. In FIG. 20, the measurement depth at which a peak value obtained by normalizing the detection intensity of the secondary ion corresponding to CuOH with the detection intensity of the secondary ion corresponding to Cu is obtained is as follows. It is considered that it corresponds to the vicinity of the interface with the resin layer 35a, that is, the region of the close contact layer 55 or close contact equivalent layer.

  In each sample, the discharge conditions at the time of forming the adhesion layer 55 or the adhesion-corresponding layer, the test result by the cross-cut method, and the detection intensity of secondary ions corresponding to CuOH are secondary ions corresponding to unreacted pure Cu. The peak values normalized by the detected intensity are summarized in Table 2 below.

  As shown in Table 2, in the samples 21 and 22 in which the adhesion layer 55 was formed using AC discharge, the test result by the cross-cut method was 2 points or less. On the other hand, in Comparative Samples 1 to 3 in which an adhesion equivalent layer made of copper nitride was used instead of the adhesion layer 55 but using DC discharge but no AC discharge, the test results by the cross-cut method were all three points. That was all. Therefore, it can be said that it is very effective to provide the adhesion layer 55 in close contact with both the low reflection layer 54 and the acrylic resin layer 35a in improving the adhesion between the conductive wire and the base film.

  Moreover, in the samples 21 and 22 in which the adhesion layer 55 is formed using AC discharge, the peak of the value obtained by standardizing the detection intensity of the secondary ion corresponding to CuOH with the detection intensity of the secondary ion corresponding to Cu. The value was 10 or more. On the other hand, in Comparative Samples 1 to 3 in which an adhesion equivalent layer made of copper nitride was formed without using AC discharge instead of the adhesion layer 55, detection of secondary ions corresponding to CuOH was performed. The peak value of the value normalized by the detection intensity of the secondary ion corresponding to Cu was 8 or less. Therefore, it can be said that the ratio of the number of Cu atoms constituting CuOH to the number of unreacted Cu atoms in the adhesion layer 55 formed using AC discharge is 0.1 or more.

  Considering the above results comprehensively, the ratio of the number of Cu atoms constituting CuOH to the number of unreacted Cu atoms in the adhesion layer 55 is 0 in improving the adhesion between the conductor and the base film. It can be said that it is preferably 1 or more.

DESCRIPTION OF SYMBOLS 10 Display apparatus with a touch position detection function 15 Display apparatus 20 Sputtering apparatus 21a, 21b Copper target 22 AC power supply 23 Main roller 24 Earth shield 30 Touch panel 31 Transparent electrode 32 Base film 33 Transparent base material 34a, 34b Primer layer 35a, 35b Acrylic resin layer 41 Conductive pattern 51 Conductive wire 52A Conductive wire forming layer 52B Conductive wire forming layer 53 Main body layer 54 Low reflection layer 55 Adhesion layer 60 Laminate

Claims (5)

A transparent substrate;
An acrylic resin layer provided on the transparent substrate;
A plurality of conductive patterns provided on the acrylic resin layer;
With
The conductive pattern is a conductive wire having a light shielding property, and is composed of conductive wires arranged in a mesh shape so that an opening is formed between the conductive wires,
The conducting wire is
A body layer made of a metal material;
A low reflective layer made of copper nitride, disposed between the main body layer and the acrylic resin layer,
Cu formed between the low reflection layer and the acrylic resin layer by sputtering using alternating current discharge and in direct contact with both the low reflection layer and the acrylic resin layer to form CuOH. A see-through electrode in which an adhesion layer including the electrode is interposed.   2. The transparent electrode according to claim 1, wherein in the adhesion layer, a ratio of the number of Cu atoms constituting CuOH to the number of unreacted Cu atoms is 0.1 or more.   A touch panel comprising the transparent electrode according to claim 1. A display device;
The touch panel according to claim 3, which is disposed on a display surface of the display device,
A display device with a touch position detection function. Forming a low reflection layer made of copper nitride on an acrylic resin layer provided on a transparent substrate;
Forming a main body layer made of a metal material on the low reflection layer;
A plurality of conductive wires, each of which is a light-shielding conductive wire formed by etching the main body layer and the low-reflection layer, the conductive wires being arranged in a mesh shape so that an opening is formed between the conductive wires. Forming a pattern;
With
Before the step of forming the low-reflection layer, a copper target is sputtered using an AC discharge with a frequency of 30 kHz to 2 MHz, so that it adheres directly to the acrylic resin layer and contains Cu constituting CuOH. Forming a layer,
In the step of providing the low reflection layer, the transparent electrode is formed by directly adhering to the adhesion layer to form the low reflection layer.

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