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DE69511810D1 - Optische Halbleitervorrichtung und Herstellungsverfahren - Google Patents

Optische Halbleitervorrichtung und Herstellungsverfahren

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Publication number
DE69511810D1
DE69511810D1 DE69511810T DE69511810T DE69511810D1 DE 69511810 D1 DE69511810 D1 DE 69511810D1 DE 69511810 T DE69511810 T DE 69511810T DE 69511810 T DE69511810 T DE 69511810T DE 69511810 D1 DE69511810 D1 DE 69511810D1
Authority
DE
Germany
Prior art keywords
manufacturing
optical device
semiconductor optical
semiconductor
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69511810T
Other languages
English (en)
Other versions
DE69511810T2 (de
Inventor
Fumihiko Kobayashi
Takeo Miyazawa
Hidefumi Mori
Jun-Ichi Nakano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP23280894A external-priority patent/JP3215908B2/ja
Priority claimed from JP32034194A external-priority patent/JPH08181382A/ja
Priority claimed from JP32475594A external-priority patent/JP3256772B2/ja
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Application granted granted Critical
Publication of DE69511810D1 publication Critical patent/DE69511810D1/de
Publication of DE69511810T2 publication Critical patent/DE69511810T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/18Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18344Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] characterized by the mesa, e.g. dimensions or shape of the mesa
    • H01S5/18347Mesa comprising active layer
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    • G02B6/00Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
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    • G02B6/12Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122Basic optical elements, e.g. light-guiding paths
    • G02B6/125Bends, branchings or intersections
    • GPHYSICS
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    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/015Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction
    • G02F1/025Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on semiconductor elements having potential barriers, e.g. having a PN or PIN junction in an optical waveguide structure
    • HELECTRICITY
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    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/15Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission
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    • H01S5/183Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL]
    • H01S5/18344Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only vertical cavities, e.g. vertical cavity surface-emitting lasers [VCSEL] characterized by the mesa, e.g. dimensions or shape of the mesa
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    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
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    • GPHYSICS
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    • G02B2006/12166Manufacturing methods
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    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
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  • Physics & Mathematics (AREA)
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DE69511810T 1994-09-28 1995-09-27 Optische Halbleitervorrichtung und Herstellungsverfahren Expired - Fee Related DE69511810T2 (de)

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JP23280894A JP3215908B2 (ja) 1994-09-28 1994-09-28 半導体装置の作製方法
JP32034194A JPH08181382A (ja) 1994-12-22 1994-12-22 半導体装置
JP32475594A JP3256772B2 (ja) 1994-12-27 1994-12-27 光半導体装置およびその製造方法

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US5783844A (en) 1998-07-21
US6949394B2 (en) 2005-09-27
EP0704913B1 (de) 1999-09-01
EP0955681A3 (de) 2000-11-29
US6403986B1 (en) 2002-06-11
EP0704913A2 (de) 1996-04-03
DE69511810T2 (de) 2000-05-18
US20040038434A1 (en) 2004-02-26
US6790697B2 (en) 2004-09-14
US20020094598A1 (en) 2002-07-18
EP0955681A2 (de) 1999-11-10
EP0704913A3 (de) 1997-03-19

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