WO2022131191A1 - 組成物、膜、光学フィルタ、固体撮像素子、画像表示装置および赤外線センサ - Google Patents
組成物、膜、光学フィルタ、固体撮像素子、画像表示装置および赤外線センサ Download PDFInfo
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- WO2022131191A1 WO2022131191A1 PCT/JP2021/045750 JP2021045750W WO2022131191A1 WO 2022131191 A1 WO2022131191 A1 WO 2022131191A1 JP 2021045750 W JP2021045750 W JP 2021045750W WO 2022131191 A1 WO2022131191 A1 WO 2022131191A1
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14625—Optical elements or arrangements associated with the device
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
- H01L31/02327—Optical elements or arrangements associated with the device the optical elements being integrated or being directly associated to the device, e.g. back reflectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
- H01L27/14649—Infrared imagers
Definitions
- the present invention relates to a composition containing an infrared absorber and a curable compound.
- the present invention also relates to a film, an optical filter, a solid-state image sensor, an image display device, and an infrared sensor using the above-mentioned composition.
- CCD charge-coupled device
- CMOS complementary metal oxide semiconductor
- CCD charge-coupled device
- CMOS complementary metal oxide semiconductor
- These solid-state image pickup devices use a silicon photodiode having a sensitivity to infrared rays in the light receiving portion thereof. Therefore, an infrared cut filter may be provided to correct the luminosity factor.
- the infrared cut filter is manufactured using a composition containing an infrared absorber and a curable compound.
- an infrared transmission filter is also manufactured using a composition containing an infrared absorber and a curable compound.
- the infrared absorber in the infrared transmission filter, the infrared region of the light (infrared ray) transmitted by the infrared transmission filter can be shifted to the longer wavelength side.
- an optical filter such as an infrared cut filter or an infrared transmission filter is formed by using a composition containing an infrared absorber and a curable compound.
- Patent Document 1 describes a compound in which a pyrol ring having 6 to 20 units is bonded via a methine group having an aryl group which may have a substituent to form a ring, and the entire ring is formed.
- the invention relating to the two photon absorbing material used is described.
- a compound represented by the formula (1) and a compound other than the compound represented by the formula (1) are used as the infrared absorber.
- a porphyrin compound in which the number of ⁇ electrons forming the shortest ring that can resonate around the metal atom is (4n + 2) in the metal atom (n is an integer of 6 to 15). It was found that by using a metal complex coordinated with the above-mentioned metal complex and one containing a compound other than the above-mentioned metal complex, a film having excellent shielding property of infrared rays in a wide wavelength range and excellent heat resistance and light resistance can be formed. , The present invention has been completed. Therefore, the present invention provides the following.
- the infrared absorber is a composition containing a compound represented by the formula (1) and a compound other than the compound represented by the formula (1).
- Ar 11 to Ar 14 each independently represent a 5-membered nitrogen-containing aromatic ring which may be condensed to form a polycyclic aromatic ring.
- Y 11 to Y 16 independently represent a nitrogen atom or CR Y11
- RY 11 represents a hydrogen atom or a substituent.
- X 11 and X 12 independently represent a nitrogen atom or CR X 11, and RX 11 represents a hydrogen atom or substituent.
- Z 11 to Z 14 independently represent a carbon atom or a nitrogen atom, respectively.
- M 11 and M 12 each represent a metal atom to which the ligand may be coordinated independently.
- the bond shown by the dotted line between Z 11 and M 11 represents a covalent bond when Z 11 is a carbon atom and a coordinate or covalent bond when Z 11 is a nitrogen atom.
- the bond shown by the dotted line between Z 12 and M 12 represents a covalent bond when Z 12 is a carbon atom and a coordinate or covalent bond when Z 12 is a nitrogen atom.
- the bond shown by the dotted line between Z 13 and M 12 represents a covalent bond when Z 13 is a carbon atom and a coordinate or covalent bond when Z 13 is a nitrogen atom.
- the bond shown by the dotted line between Z 14 and M 11 represents a covalent bond when Z 14 is a carbon atom and a coordinate or covalent bond when Z 14 is a nitrogen atom.
- the bond shown by the dotted line between M 11 and N represents a coordinate bond or a covalent bond.
- the bond shown by the dotted line between M 12 and N represents a coordinate bond or a covalent bond.
- the compound other than the compound represented by the above formula (1) is a compound having a maximum absorption wavelength on the shorter wavelength side than the compound represented by the above formula (1), according to ⁇ 1>.
- the compound represented by the above formula (1) is at least one selected from the compound represented by the formula (1-1) and the compound represented by the formula (1-2), ⁇ 1>.
- Ar 11 to Ar 14 independently form a 5-membered nitrogen-containing aromatic ring which may be condensed to form a polycyclic aromatic ring.
- Y 11 to Y 16 independently represent a nitrogen atom or CR Y11
- RY 11 represents a hydrogen atom or a substituent.
- X 11 and X 12 independently represent a nitrogen atom or CR X 11, and RX 11 represents a hydrogen atom or substituent.
- M 11 and M 12 each represent a metal atom to which the ligand may be coordinated independently.
- the bonds shown by the dotted line between M 11 and N represent coordinate bonds, and the bonds shown by the solid line represent covalent bonds.
- the bond shown by the dotted line between M 12 and N represents a coordinate bond, and the bond shown by a solid line represents a covalent bond.
- the infrared absorber is a metal complex in which a porphyrin compound having (4n + 2) ⁇ electrons constituting the shortest ring that can resonate around the metal atom is coordinated with the metal atom, and a metal complex other than the metal complex.
- Compositions containing compounds; n is an integer of 6 to 15.
- composition according to ⁇ 5> wherein the compound other than the metal complex is a compound having a maximum absorption wavelength on the shorter wavelength side than the metal complex.
- the composition according to ⁇ 5> or ⁇ 6> wherein the maximum absorption wavelength of the metal complex exists in the wavelength range of 1200 to 1500 nm.
- the curable compound contains a resin having an acid group.
- the curable compound contains a polymerizable compound.
- composition according to any one of ⁇ 1> to ⁇ 9>, wherein the curable compound contains a resin having a glass transition temperature of 150 ° C. or higher ⁇ 11> A film obtained by using the composition according to any one of ⁇ 1> to ⁇ 10>.
- ⁇ 15> An infrared sensor including the film according to ⁇ 11>.
- the present invention it is possible to provide a composition, a film, an optical filter, a solid-state image sensor, an image display device, and an infrared sensor capable of forming a film having excellent heat resistance, light resistance, and infrared shielding property.
- the contents of the present invention will be described in detail.
- "to” is used to mean that the numerical values described before and after it are included as the lower limit value and the upper limit value.
- the notation not describing substitution and non-substitution also includes a group having a substituent (atomic group) as well as a group having no substituent (atomic group).
- the "alkyl group” includes not only an alkyl group having no substituent (unsubstituted alkyl group) but also an alkyl group having a substituent (substituted alkyl group).
- the term "exposure” includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams, unless otherwise specified.
- Examples of the light used for exposure include the emission line spectrum of a mercury lamp, far ultraviolet rays typified by an excima laser, extreme ultraviolet rays (EUV light), X-rays, active rays such as electron beams, or radiation.
- EUV light extreme ultraviolet rays
- (meth) acrylate” represents both acrylate and methacrylate, or either
- “(meth) acrylic” represents both acrylic and methacrylic, or either.
- Acryloyl "represents both acryloyl and / or methacryloyl.
- weight average molecular weight and number average molecular weight are defined as polystyrene-equivalent values in gel permeation chromatography (GPC) measurements.
- GPC gel permeation chromatography
- Me in the chemical formula represents a methyl group
- Et represents an ethyl group
- Bu represents a butyl group
- Ph represents a phenyl group.
- infrared rays refer to light (electromagnetic waves) having a wavelength of 700 to 2500 nm.
- the total solid content means the total mass of all the components of the composition excluding the solvent.
- the pigment means a coloring material that is difficult to dissolve in a solvent.
- the term "process" is included in this term not only as an independent process but also as long as the intended action of the process is achieved even if it cannot be clearly distinguished from other processes. ..
- the first aspect of the composition of the present invention is a composition containing an infrared absorber and a curable compound, wherein the infrared absorber is a compound represented by the formula (1) and the formula (1). It is characterized by containing a compound other than the compound represented by.
- the second aspect of the composition of the present invention is a composition containing an infrared absorber and a curable compound, wherein the infrared absorber is the shortest capable of resonating with a metal atom at the outer periphery of the metal atom. It is characterized by containing a metal complex coordinated with a porphyrin compound having (4n + 2) ⁇ electrons constituting the ring of No. 1 and a compound other than the above-mentioned metal complex. n is an integer of 6 to 15.
- the compound represented by the above formula (1) and the above-mentioned metal complex (hereinafter, both are also collectively referred to as a specific infrared absorbing compound) have heat resistance due to the rigidity of the molecule derived from the multidentate metal center. And has excellent light resistance. Further, since the above-mentioned specific infrared absorbing compound has a wide ⁇ -conjugated system, the maximum absorption wavelength exists on the longer wavelength side, and the infrared ray shielding property on the relatively long wavelength side is excellent.
- the infrared absorber by using the above-mentioned specific infrared absorbing compound and a compound other than the specific infrared absorbing compound (hereinafter, also referred to as other infrared absorbing compounds) in combination as the infrared absorber, it has excellent heat resistance and light resistance. At the same time, it is possible to form a film having excellent shielding properties for infrared rays in a wider wavelength range. That is, according to the composition of the present invention, it is possible to form a film having excellent heat resistance, light resistance and infrared shielding property.
- the composition of the present invention can be used as a composition for an optical filter.
- the optical filter include an infrared cut filter and an infrared transmission filter.
- the composition of the present invention is preferably used for an infrared sensor. More specifically, it is preferably used as a composition for the above-mentioned optical filter of an infrared sensor having an optical filter.
- the composition of the present invention comprises an infrared absorber.
- the infrared absorber used in the composition of the present invention contains a compound represented by the formula (1) and a compound other than the compound represented by the formula (1), or is a metal atom and the outer periphery of the metal atom. Includes a metal complex coordinated with a porphyrin compound (n is an integer of 6 to 15) having (4n + 2) ⁇ electrons constituting the shortest ring that can be resonated with.
- n is an integer of 6 to 15
- 4n + 2 4n + 2 ⁇ electrons constituting the shortest ring that can be resonated with.
- the compound represented by the formula (1) and the above-mentioned metal complex are collectively referred to as a specific infrared absorbing compound.
- the metal complex used as a specific infrared absorbing compound is a porphyrin compound (n is an integer of 6 to 15) in which the number of ⁇ electrons constituting the shortest ring that can resonate with the metal atom is (4n + 2). Is a coordinated compound.
- Examples of the metal atom coordinated by the porphyrin compound include Mg, Al, Si, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Mo, Ru, Rh, Pd, Ag, Pt, Au.
- Examples thereof include Er and the like, and from the viewpoint of the chemical stability of the metal complex, it is preferably a metal atom of Group 3 to 14, and it is preferably a metal atom of Group 3 to 14 and a metal atom of the third or fourth period. More preferred.
- a ligand may be coordinated to these metal atoms.
- ligand examples include heterocyclic compounds (eg, pyridine, pyrimidine, imidazole, pyrazole, triazole, tetrazole, quinoline, 1,10-phenanthroline, etc.), protonic compounds (eg, water, methanol, ethanol, etc.), amine compounds.
- heterocyclic compounds eg, pyridine, pyrimidine, imidazole, pyrazole, triazole, tetrazole, quinoline, 1,10-phenanthroline, etc.
- protonic compounds eg, water, methanol, ethanol, etc.
- amine compounds examples include amine compounds.
- Examples of the porphyrin compound include compounds having a structure in which a pyrrole ring is bonded via a methine group which may have a substituent to form a ring.
- the number of pyrrole rings constituting the porphyrin ring contained in the porphyrin compound is preferably 6 to 12, more preferably 6 to 8, and even more preferably 6.
- Specific examples of the porphyrin ring include a hexaphyrin ring, a heptaphyrin ring, an octaphyrin ring, a nonaphyrin ring, decafylins, an undecaphyrin ring, and a dodecaphyrin ring.
- the porphyrin ring of the porphyrin compound may have a substituent. Examples of the substituent include the substituent T described later. Further, adjacent substituents may be bonded to each other to form a ring.
- the metal complex used as the specific infrared absorbing compound is preferably a compound represented by the formula (1) described later.
- Ar 11 to Ar 14 each independently represent a 5-membered nitrogen-containing aromatic ring which may be condensed to form a polycyclic aromatic ring.
- Y 11 to Y 16 independently represent a nitrogen atom or CR Y11
- RY 11 represents a hydrogen atom or a substituent.
- X 11 and X 12 independently represent a nitrogen atom or CR X 11, and RX 11 represents a hydrogen atom or substituent.
- Z 11 to Z 14 independently represent a carbon atom or a nitrogen atom, respectively.
- M 11 and M 12 each represent a metal atom to which the ligand may be coordinated independently.
- the bond shown by the dotted line between Z 11 and M 11 represents a covalent bond when Z 11 is a carbon atom and a coordinate or covalent bond when Z 11 is a nitrogen atom.
- the bond shown by the dotted line between Z 12 and M 12 represents a covalent bond when Z 12 is a carbon atom and a coordinate or covalent bond when Z 12 is a nitrogen atom.
- the bond shown by the dotted line between Z 13 and M 12 represents a covalent bond when Z 13 is a carbon atom and a coordinate or covalent bond when Z 13 is a nitrogen atom.
- the bond shown by the dotted line between Z 14 and M 11 represents a covalent bond when Z 14 is a carbon atom and a coordinate or covalent bond when Z 14 is a nitrogen atom.
- the bond shown by the dotted line between M 11 and N represents a coordinate bond or a covalent bond.
- the bond shown by the dotted line between M 12 and N represents a coordinate bond or a covalent bond.
- Ars 11 to Ar 14 of the formula (1) each independently represent a 5-membered nitrogen-containing aromatic ring which may be condensed to form a polycyclic aromatic ring.
- the nitrogen-containing aromatic ring represented by Ar 11 to Ar 14 include a pyrrole ring, an imidazole ring, a pyrazole ring, an oxazole ring, a thiazole ring, a triazole ring, a tetrazole ring, and a fused ring containing these rings.
- Examples of the fused ring include an indole ring, an isoindole ring, a benzimidazole ring, a benzoxazole ring, a benzothiazole ring, a benzotriazole ring, a purine ring and the like.
- the nitrogen-containing aromatic ring represented by Ar 11 to Ar 14 is preferably a pyrrole ring or a condensed ring containing these rings, and more preferably a pyrrole ring.
- the nitrogen-containing aromatic ring represented by Ar 11 to Ar 14 may have a substituent. Examples of the substituent include the groups mentioned as the substituent T described later, and a halogen atom, an alkoxy group, an aryloxy group, an alkoxycarbonyl group or an aminocarbonyl group are preferable.
- Y 11 to Y 16 of the formula (1) independently represent a nitrogen atom or CR Y11 , and are preferably CR Y11 .
- RY11 represents a hydrogen atom or a substituent.
- the substituent represented by RY11 include the groups mentioned as the substituent T described later, preferably an alkyl group, an aryl group or a heteroaryl group, and more preferably an aryl group. These groups may further have a substituent.
- Examples of the further substituent include the group mentioned as the substituent T described later, and a halogen atom, an alkyl group, an alkoxy group, an aryloxy group, an alkoxycarbonyl group or an aminocarbonyl group are preferable.
- RY 11 may be bonded to the substituent to form a ring.
- X 11 and X 12 of the formula (1) independently represent a nitrogen atom or CR X 11 .
- substituent represented by RX11 include the groups listed as the substituent T described later, and an alkyl group or an aryl group is preferable.
- Z 11 to Z 14 of the formula (1) independently represent a carbon atom or a nitrogen atom. It is preferable that one of Z 11 and Z 12 is a carbon atom and the other is a nitrogen atom. Further, it is preferable that one of Z 13 and Z 14 is a carbon atom and the other is a nitrogen atom.
- X 11 , X 12 , Z 11 , Z 12 , Z 13 and Z 14 is preferably the first and second embodiments shown below, which are chemically stable and more excellent.
- the first aspect is more preferable because heat resistance and light resistance can be obtained.
- First embodiment X 11 and X 12 are carbon atoms, one of Z 11 and Z 12 is a carbon atom, the other is a nitrogen atom, and one of Z 13 and Z 14 is a carbon atom. , The other is a nitrogen atom.
- Second aspect A mode in which X 11 and X 12 are nitrogen atoms and Z 11 to Z 14 are carbon atoms.
- the metal atoms represented by M 11 and M 12 in the formula (1) include Mg, Al, Si, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Mo, Ru, Rh, Pd, and Ag. , Pt, Au, Er and the like, preferably group 3 to 14 metal atoms from the viewpoint of chemical stability of the metal complex, and group 3 to 14 and third or fourth period metal. It is more preferably an atom.
- a ligand may be coordinated to these metal atoms.
- ligand examples include heterocyclic compounds (eg, pyridine, pyrimidine, imidazole, pyrazole, triazole, tetrazole, quinoline, 1,10-phenanthroline, etc.), protonic compounds (eg, water, methanol, ethanol, etc.), amine compounds.
- heterocyclic compounds eg, pyridine, pyrimidine, imidazole, pyrazole, triazole, tetrazole, quinoline, 1,10-phenanthroline, etc.
- protonic compounds eg, water, methanol, ethanol, etc.
- amine compounds examples include amine compounds.
- the metal atom represented by M 11 and the metal atom represented by M 12 in the formula (1) may be different, but are preferably the same from the viewpoint of ease of manufacture.
- substituent T examples include the following groups.
- Halogen atom eg, fluorine atom, chlorine atom, bromine atom, iodine atom
- alkyl group preferably an alkyl group having 1 to 30 carbon atoms
- alkenyl group preferably an alkenyl group having 2 to 30 carbon atoms
- alkynyl group Preferably an alkynyl group having 2 to 30 carbon atoms
- an aryl group preferably an aryl group having 6 to 30 carbon atoms
- a heteroaryl group preferably a heteroaryl group having 1 to 30 carbon atoms
- an amino group preferably an amino group.
- Amino group having 0 to 30 carbon atoms alkoxy group (preferably alkoxy group having 1 to 30 carbon atoms), aryloxy group (preferably aryloxy group having 6 to 30 carbon atoms), heteroaryloxy group (preferably carbon).
- a heteroaryloxy group having a number of 1 to 30 an acyl group (preferably an acyl group having 2 to 30 carbon atoms), an alkoxycarbonyl group (preferably an alkoxycarbonyl group having 2 to 30 carbon atoms), and an aryloxycarbonyl group (preferably an acyl group having 2 to 30 carbon atoms).
- an acylamino group having 2 to 30 carbon atoms an aminocarbonylamino group (preferably an aminocarbonylamino group having 2 to 30 carbon atoms), an alkoxycarbonylamino group (preferably an alkoxycarbonylamino group having 2 to 30 carbon atoms).
- Aryloxycarbonylamino group (preferably aryloxycarbonylamino group having 7 to 30 carbon atoms), sulfamoyl group (preferably sulfamoyl group having 0 to 30 carbon atoms), sulfamoylamino group (preferably 0 to 30 carbon atoms).
- Sulfamoylamino group carbamoyl group (preferably carbamoyl group having 1 to 30 carbon atoms), alkylthio group (preferably alkylthio group having 1 to 30 carbon atoms), arylthio group (preferably arylthio group having 6 to 30 carbon atoms).
- heteroarylthio group preferably a heteroarylthio group having 1 to 30 carbon atoms
- alkylsulfonyl group preferably an alkylsulfonyl group having 1 to 30 carbon atoms
- alkylsulfonylamino group preferably 1 to 30 carbon atoms
- 30 alkylsulfonylamino groups preferably arylsulfonylamino groups with 6 to 30 carbon atoms
- arylsulfonylamino groups preferably arylsulfonylamino groups with 6 to 30 carbon atoms
- heteroaryls preferably arylsulfonylamino groups with 6 to 30 carbon atoms
- a ruhonyl group (preferably a heteroarylsulfonylamino group having 1 to 30 carbon atoms), a heteroarylsulfonylamino group (preferably a heteroarylsulfonylamino group having 1 to 30 carbon atoms), an alkylsulfinyl group (preferably a heteroarylsulfonylamino group having 1 to 30 carbon atoms).
- Alkyl sulfinyl group arylsulfinyl group (preferably arylsulfinyl group having 6 to 30 carbon atoms), heteroarylsulfinyl group (preferably heteroarylsulfinyl group having 1 to 30 carbon atoms), ureido group (preferably 1 to 30 carbon atoms).
- ureido groups hydroxy group, nitro group, carboxyl group, sulfo group, phosphoric acid group, carboxylic acid amide group, sulfonic acid amide group, imide group, phosphino group, mercapto group, cyano group, alkylsulfino group, aryl Sulfino group, arylazo group, heteroarylazo group, phosphinyl group, phosphinyloxy group, phosphinylamino group, silyl group, hydrazino group, imino group.
- These groups may further have a substituent if they are further substitutable groups. Further examples of the substituent include the group described in Substituent T described above.
- the compound represented by the formula (1) is preferably at least one selected from the compound represented by the formula (1-1) and the compound represented by the formula (1-2).
- the composition of the present invention may contain only one of the compound represented by the formula (1-1) and the compound represented by the formula (1-2) as the compound represented by the formula (1). It may contain a compound represented by the formula (1-1) and a compound represented by the formula (1-2), respectively.
- the crystallinity of the compound may be lowered to improve the storage stability of the composition. It is possible to form a film in which the generation of foreign substances is suppressed.
- the content of the compound represented by the formula (1-1) is the content of the compound represented by the formula (1-2).
- Ar 11 to Ar 14 independently form a 5-membered nitrogen-containing aromatic ring which may be condensed to form a polycyclic aromatic ring.
- Y 11 to Y 16 independently represent a nitrogen atom or CR Y11
- RY 11 represents a hydrogen atom or a substituent.
- X 11 and X 12 independently represent a nitrogen atom or CR X 11, and RX 11 represents a hydrogen atom or substituent.
- M 11 and M 12 each represent a metal atom to which the ligand may be coordinated independently.
- the bonds shown by the dotted line between M 11 and N represent coordinate bonds, and the bonds shown by the solid line represent covalent bonds.
- the bond shown by the dotted line between M 12 and N represents a coordinate bond, and the bond shown by a solid line represents a covalent bond.
- Ar 11 to Ar 14 , Y 11 to Y 16 , X 11 , X 12 , M 11 and M 12 are the Ar 11 to Ar 14 in the formula (1). It is synonymous with Y 11 to Y 16 , X 11 , X 12 , M 11 and M 12 , and the preferred range is also the same.
- the compound represented by the formula (1-1) is preferably a compound represented by the formula (1-1-1).
- the compound represented by the formula (1-2) is preferably a compound represented by the formula (1-2-1).
- Y 11 to Y 16 independently represent a nitrogen atom or CR Y11
- RY 11 represents a hydrogen atom or a substituent
- X 11 and X 12 independently represent a nitrogen atom or CR X 11, and RX 11 represents a hydrogen atom or substituent.
- R Ar1 to R Ar4 each independently represent a substituent, and R Ar1 to R Ar4 may be bonded to RY11 to form a ring.
- n1 to n4 independently represent integers of 0 to 2, respectively.
- M 11 and M 12 each represent a metal atom to which the ligand may be coordinated independently.
- the bonds shown by the dotted line between M 11 and N represent coordinate bonds, and the bonds shown by the solid line represent covalent bonds.
- the bond shown by the dotted line between M 12 and N represents a coordinate bond, and the bond shown by a solid line represents a covalent bond.
- Y11 to Y16 , X11, X12 , M11 and M12 of the formulas ( 1-1-1 ) and ( 1-2-1 ) are Y11 to Y16 , X11 of the formula ( 1 ). , X 12 , M 11 and M 12 , and the preferred range is the same.
- Examples of the substituent represented by R Ar1 to R Ar4 include the groups mentioned in the above-mentioned substituent T, and are preferably a halogen atom, an alkyl group, an alkoxy group, an aryloxy group, an alkoxycarbonyl group or an aminocarbonyl group.
- N1 to n4 each independently represent an integer of 0 to 2, preferably 0 or 1, and more preferably 0.
- the compound represented by the formula (1-1) is preferably a compound represented by the formula (1-1-2).
- the compound represented by the formula (1-2) is preferably a compound represented by the formula (1-2-2).
- Y 11 to Y 16 independently represent a nitrogen atom or CR Y11
- RY 11 represents a hydrogen atom or a substituent.
- R Ar1 to R Ar4 each independently represent a substituent, and R Ar1 to R Ar4 may be bonded to RY11 to form a ring.
- n1 to n4 independently represent integers of 0 to 2, respectively. When n1 is 2, two R Ar1s may be bonded to each other to form a ring.
- M 11 and M 12 each represent a metal atom to which the ligand may be coordinated independently.
- the bonds shown by the dotted line between M 11 and N represent coordinate bonds, and the bonds shown by the solid line represent covalent bonds.
- the bond shown by the dotted line between M 12 and N represents a coordinate bond, and the bond shown by a solid line represents a covalent bond.
- Y11 to Y16 , M11 and M12 of the formulas ( 1-1-2 ) and ( 1-2-2 ) are synonymous with Y11 to Y16 , M11 and M12 of the formula ( 1 ). Yes, and the preferred range is the same.
- R Ar1 to R Ar4 and n1 to n4 of the formulas (1-1-2) and (1-2-2) are R Ar1 to R Ar1 to the formulas (1-1-1) and (1-2-1). It is synonymous with R Ar4 and n1 to n4, and the preferred range is also the same.
- the compound represented by the formula (1-1) is preferably a compound represented by the formula (1-1-3).
- the compound represented by the formula (1-2) is preferably a compound represented by the formula (1-2-3).
- RY21 to RY26 independently represent hydrogen atoms or substituents, respectively.
- R Ar1 to R Ar4 each independently represent a substituent and represent a substituent.
- n1 to n4 independently represent integers of 0 to 2, respectively.
- R Ar1 and RY 26 may be combined to form a ring.
- R Ar2 and RY 23 may be combined to form a ring.
- R Ar3 and RY 23 may be combined to form a ring.
- R Ar4 and RY 26 may be combined to form a ring.
- n1 two R Ar1s may be bonded to each other to form a ring.
- n2 two R Ar2s may be bonded to each other to form a ring.
- n3 two R Ar3s may be bonded to each other to form a ring.
- n4 two R Ar4s may be bonded to each other to form a ring.
- M 11 and M 12 each represent a metal atom to which the ligand may be coordinated independently.
- the bonds shown by the dotted line between M 11 and N represent coordinate bonds, and the bonds shown by the solid line represent covalent bonds.
- the bond shown by the dotted line between M 12 and N represents a coordinate bond, and the bond shown by a solid line represents a covalent bond.
- M 11 and M 12 of the formulas (1-1-3) and (1-2-3) are synonymous with M 11 and M 12 of the formula (1), and the preferable range is also the same.
- R Ar1 to R Ar4 and n1 to n4 of the formulas (1-1-3) and (1-2-3) are R Ar1 to R Ar1 to the formulas (1-1-1) and the formula (1-2-1). It is synonymous with R Ar4 and n1 to n4, and the preferred range is also the same.
- Examples of the substituent represented by RY21 to RY26 of the formula (1-1-3) and the formula (1-2-3) include the group mentioned as the above-mentioned substituent T, and an alkyl group, an aryl group or a hetero.
- aryl group it is preferably an aryl group, more preferably an aryl group.
- These groups may further have a substituent.
- the further substituent include the group mentioned as the above-mentioned substituent T, and a halogen atom, an alkyl group, an alkoxy group, an aryloxy group, an alkoxycarbonyl group or an aminocarbonyl group are preferable.
- the maximum absorption wavelength of the specific infrared absorbing compound is preferably in the wavelength range of 1200 to 1500 nm, more preferably in the wavelength range of 1300 to 1500 nm, and even more preferably in the wavelength range of 1400 to 1500 nm. ..
- the slope of the long wavelength end of the absorption spectrum of the specific infrared absorbing compound is steep.
- the difference between the absorption maximum wavelength of 0.5 on the long wavelength side and the absorption maximum wavelength is preferably 200 nm or less, more preferably 150 nm or less, and more preferably 100 nm or less. Is more preferable.
- the molar extinction coefficient ( ⁇ ) of the specific infrared absorbing compound is high.
- the molar absorption coefficient at the absorption maximum wavelength is preferably 20,000 or more, more preferably 50,000 or more, and even more preferably 100,000 or more.
- the specific infrared absorbing compound can be used as either a pigment or a dye.
- Specific examples of the specific infrared absorbing compound include compounds having the following structures.
- Mes represents a 2,4,6-trimethylphenyl group (mesitylene group), and Ph represents a phenyl group.
- the porphyrin compound coordinated to the metal atom of A001 to A017 is a porphyrin compound having a 26 ⁇ electron-based porphyrin ring.
- C 12 H 25 of A008 is linear.
- the infrared absorber used in the composition of the present invention contains a compound other than the above-mentioned specific infrared absorbing compound (hereinafter, also referred to as another infrared absorbing compound).
- the other infrared absorbing compound may be a compound having a maximum absorption wavelength on the longer wavelength side than the specific infrared absorbing compound, but is excellent in shielding infrared rays in a wide wavelength range and more excellent in light resistance.
- the other infrared absorbing compound is preferably a compound having a maximum absorption wavelength on the short wavelength side of the specific infrared absorbing compound because it can form a cured film.
- the difference between the maximum absorption wavelength of the specific infrared absorbing compound and the maximum absorption wavelength of other infrared absorbing compounds is preferably 100 to 400 nm, more preferably 150 to 400 nm, and further preferably 200 to 400 nm. preferable.
- the maximum absorption wavelength of the other infrared absorbing compound is preferably in the wavelength range of 600 to 1350 nm, more preferably in the wavelength range of 650 to 1350 nm, and in the wavelength range of 700 to 1300 nm. Is more preferable.
- the other infrared absorbing compound may be a dye or a pigment.
- Other infrared absorbing compounds include pyrrolopyrrole compounds, cyanine compounds, squarylium compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterylene compounds, merocyanine compounds, croconium compounds, oxonols compounds, iminium compounds, dithiol compounds, triarylmethane compounds, and pyromethene compounds. , Azomethine compound, anthraquinone compound, dibenzofuranone compound, dithiolene metal complex, metal oxide, metal boride, etc., and pyrrolopyrrole compound because a film having high resistance and more heat resistance and light resistance can be obtained.
- Squalylium compound, croconium compound or phthalocyanine compound is preferable.
- the pyrrolopyrrole compound include the compounds described in paragraphs 0016 to 0058 of JP2009-263614, the compounds described in paragraphs 0037-0052 of JP2011-066731A, and International Publication No. 2015/166783. Examples thereof include the compounds described in paragraphs 0010 to 0033.
- the squarylium compound include the compounds described in paragraphs 0044 to 0049 of Japanese Patent Laid-Open No. 2011-208101, the compounds described in paragraphs 0060 to 0061 of Japanese Patent No. 6065169, and paragraph numbers 0040 of International Publication No. 2016/181987.
- Examples of the cyanine compound are described in JP-A-2009-108267, paragraphs 0044 to 0045, and JP-A-2002-194040, paragraphs 0026-0030, and JP-A-2015-172004.
- Examples of the croconium compound include the compounds described in JP-A-2017-082029.
- Examples of the iminium compound include the compound described in JP-A-2008-528706, the compound described in JP-A-2012-02239, the compound described in JP-A-2007-09260, and International Publication No. 2018/043564. Examples thereof include the compounds described in paragraphs 0048 to 0063 of. Examples of the phthalocyanine compound include the compound described in paragraph No. 0093 of JP2012-077153, the oxytitanium phthalocyanine described in JP2006-343631, and paragraphs 0013 to 0029 of JP2013-195480. , The vanadium phthalocyanine compound described in Japanese Patent No. 6081771, and the compound described in International Publication No. 2020/071470.
- Examples of the naphthalocyanine compound include the compound described in paragraph No. 0093 of JP2012-07715.
- Examples of the dithiolene metal complex include the compounds described in Japanese Patent No. 5733804.
- Examples of the metal oxide include indium tin oxide, antimonthine oxide, zinc oxide, Al-doped zinc oxide, fluorine-doped tin dioxide, niobium-doped titanium dioxide, tungsten oxide and the like. For details of tungsten oxide, paragraph number 0080 of JP-A-2016-006476 can be referred to, and the contents thereof are incorporated in the present specification.
- Examples of the metal boride include lanthanum hexaboride.
- Examples of commercially available lanthanum hexaboride products include LaB 6 -F (manufactured by Nippon Shinkinzoku Co., Ltd.). Further, as the metal boride, the compound described in International Publication No. 2017/11394 can also be used. Examples of commercially available indium tin oxide products include F-ITO (manufactured by DOWA Hi-Tech Co., Ltd.).
- Examples of other infrared absorbing compounds include the squarylium compound described in JP-A-2017-197437, the squarylium compound described in JP-A-2017-025311, the squarylium compound described in International Publication No. 2016/154782, and patents.
- Amide-linked squarylium compound a compound having a pyrrole bis-type squarylium skeleton or a croconium skeleton described in JP-A-2017-141215, a dihydrocarbazole-type squarylium compound described in JP-A-2017-082029, JP-A-2017.
- the content of the infrared absorber is preferably 0.5 to 80% by mass in the total solid content of the composition of the present invention.
- the upper limit is preferably 75% by mass or less, and more preferably 70% by mass or less.
- the lower limit is preferably 1% by mass or more, more preferably 3% by mass or more.
- the content of the specific infrared absorbing compound is preferably 0.5% by mass or more, more preferably 2% by mass or more, and further preferably 4% by mass or more in the total solid content of the composition.
- the upper limit of the content of the specific infrared absorbing compound is preferably 80% by mass or less, more preferably 70% by mass or less, and further preferably 60% by mass or less.
- the composition of the present invention may contain only one specific infrared absorbing compound, or may contain two or more of them. When two or more kinds are contained, it is preferable that the total amount thereof is within the above range.
- the content of the other infrared absorbing compound is preferably 1 to 500 parts by mass with respect to 100 parts by mass of the specific infrared absorbing compound.
- the upper limit is preferably 300 parts by mass or less, and more preferably 200 parts by mass or less.
- the lower limit is preferably 10 parts by mass or more, more preferably 30 parts by mass or more.
- the composition of the present invention may contain only one type of other infrared absorbing compound, or may contain two or more types. When two or more kinds are contained, it is preferable that the total amount thereof is within the above range.
- the composition of the present invention contains a curable compound.
- the curable compound include polymerizable compounds and resins.
- the resin may be a non-polymerizable resin (a resin having no polymerizable group) or a polymerizable resin (a resin having a polymerizable group).
- the polymerizable group include an ethylenically unsaturated bond-containing group, a cyclic ether group, a methylol group, an alkoxymethyl group and the like.
- Examples of the ethylenically unsaturated bond-containing group include a vinyl group, a vinylphenyl group, a (meth) allyl group, a (meth) acryloyl group, a (meth) acryloyloxy group, a (meth) acryloylamide group, and the like (meth). Allyl groups, (meth) acryloyl groups and (meth) acryloyloxy groups are preferred, and (meth) acryloyloxy groups are more preferred.
- Examples of the cyclic ether group include an epoxy group and an oxetanyl group, and an epoxy group is preferable.
- the polymerizable compound preferably contains a polymerizable monomer.
- the curable compound it is preferable to use a compound containing at least a resin.
- a resin and a polymerizable monomer (monomer type polymerizable compound) as the curable compound, and the resin and ethylenic property are used. It is more preferable to use a polymerizable monomer (monomer type polymerizable compound) having an unsaturated bond-containing group.
- polymerizable compound examples include a compound having an ethylenically unsaturated bond-containing group, a compound having a cyclic ether group, a compound having a methylol group, and a compound having an alkoxymethyl group.
- a compound having an ethylenically unsaturated bond-containing group can be preferably used as a radically polymerizable compound.
- the compound having a cyclic ether group can be preferably used as a cationically polymerizable compound.
- Examples of the resin type polymerizable compound include a resin containing a repeating unit having a polymerizable group.
- the molecular weight of the monomer-type polymerizable compound is preferably less than 2000, more preferably 1500 or less.
- the lower limit of the molecular weight of the polymerizable monomer is preferably 100 or more, and more preferably 200 or more.
- the weight average molecular weight (Mw) of the resin-type polymerizable compound is preferably 2000 to 2000000.
- the upper limit of the weight average molecular weight is preferably 1,000,000 or less, and more preferably 500,000 or less.
- the lower limit of the weight average molecular weight is preferably 3000 or more, and more preferably 5000 or more.
- the compound having an ethylenically unsaturated bond-containing group as a polymerizable monomer is preferably a 3- to 15-functional (meth) acrylate compound, and more preferably a 3- to 6-functional (meth) acrylate compound. Specific examples thereof include paragraph numbers 0995 to 0108 of JP2009-288705, paragraphs 0227 of JP2013-029760, paragraphs 0254 to 0257 of JP2008-292970, and paragraphs 0254 to 0257 of JP2013-253224.
- Examples of the compound having an ethylenically unsaturated bond-containing group include dipentaerythritol tri (meth) acrylate (commercially available KAYARAD D-330; manufactured by Nippon Kayaku Co., Ltd.) and dipentaerythritol tetra (meth) acrylate (commercially available).
- KAYARAD D-320 manufactured by Nippon Kayaku Co., Ltd.
- dipentaerythritol penta (meth) acrylate commercially available KAYARAD D-310; manufactured by Nihon Kayaku Co., Ltd.
- dipentaerythritol hexa (meth) ) Acrylate (as a commercial product, KAYARAD DPHA; manufactured by Nippon Kayaku Co., Ltd., NK ester A-DPH-12E; manufactured by Shin-Nakamura Chemical Industry Co., Ltd.)
- the (meth) acryloyl group of these compounds is ethylene glycol and / Or a compound having a structure bonded via a propylene glycol residue (for example, SR454, SR499 commercially available from Sartmer) and the like.
- Examples of the compound having an ethylenically unsaturated bond-containing group include diglycerin EO (ethylene oxide) modified (meth) acrylate (commercially available M-460; manufactured by Toa Synthetic) and pentaerythritol tetraacrylate (Shin-Nakamura Chemical Industry Co., Ltd.).
- diglycerin EO ethylene oxide
- meth methacrylate
- pentaerythritol tetraacrylate Shin-Nakamura Chemical Industry Co., Ltd.
- NK Ester A-TMMT (manufactured by Nippon Kayaku Co., Ltd.), 1,6-hexanediol diacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), DPHA-40H ( Nippon Kayaku Co., Ltd.), Aronix TO-2349 (Toa Synthetic Co., Ltd.), NK Oligo UA-7200 (Shin-Nakamura Chemical Industry Co., Ltd.), 8UH-1006, 8UH-1012 (Taisei Fine Chemical Co., Ltd.) ), Light acrylate POB-A0, UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, LINK-202UA (all manufactured by Kyoeisha Chemical Co., Ltd.), etc. are used. You can also do it.
- Examples of the compound having an ethylenically unsaturated bond-containing group include trimethylolpropane tri (meth) acrylate, trimethylolpropane propylene oxide-modified tri (meth) acrylate, trimethylolpropane ethylene oxide-modified tri (meth) acrylate, and isocyanuric acid. It is also preferable to use a trifunctional (meth) acrylate compound such as an ethylene oxide-modified trimethylolpropane (meth) acrylate or pentaerythritol trimethylolpropane (meth) acrylate.
- trifunctional (meth) acrylate compounds include Aronix M-309, M-310, M-321, M-350, M-360, M-313, M-315, M-306, and M-305. , M-303, M-452, M-450 (manufactured by Toagosei Co., Ltd.), NK ester A9300, A-GLY-9E, A-GLY-20E, A-TMM-3, A-TMM-3L, A -TMM-3LM-N, A-TMPT, TMPT (manufactured by Shin Nakamura Chemical Industry Co., Ltd.), KAYARAD GPO-303, TMPTA, THE-330, TPA-330, PET-30 (manufactured by Nippon Kayaku Co., Ltd.) And so on.
- a compound having an ethylenically unsaturated bond-containing group a compound having an acid group such as a carboxyl group, a sulfo group and a phosphoric acid group can also be used.
- Examples of commercially available products of such compounds include Aronix M-305, M-510, M-520, Aronix TO-2349 (manufactured by Toagosei Co., Ltd.) and the like.
- a compound having a caprolactone structure can also be used.
- the description in paragraphs 0042 to 0045 of JP2013-253224A can be referred to, and the content thereof is incorporated in the present specification.
- Examples of the compound having a caprolactone structure include DPCA-20, DPCA-30, DPCA-60, DPCA-120, etc., which are commercially available from Nippon Kayaku Co., Ltd. as the KAYARAD DPCA series.
- a compound having an ethylenically unsaturated bond-containing group and an alkyleneoxy group can also be used.
- Such a compound is preferably a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group and / or a propyleneoxy group, and is a compound having an ethylenically unsaturated bond-containing group and an ethyleneoxy group. It is more preferable to have a 3 to 6 functional (meth) acrylate compound having 4 to 20 ethyleneoxy groups.
- SR-494 manufactured by Sartmer
- KAYARAD TPA-330 Japan
- KAYARAD TPA-330 Japan
- a polymerizable compound having a fluorene skeleton can also be used.
- examples of commercially available products include Ogsol EA-0200 and EA-0300 (manufactured by Osaka Gas Chemical Co., Ltd., (meth) acrylate monomer having a fluorene skeleton).
- the compound having an ethylenically unsaturated bond-containing group it is also preferable to use a compound that does not substantially contain an environmentally regulatory substance such as toluene.
- an environmentally regulatory substance such as toluene.
- commercially available products of such compounds include KAYARAD DPHA LT and KAYARAD DPEA-12 LT (manufactured by Nippon Kayaku Co., Ltd.).
- Examples of the compound having a cyclic ether group include a compound having an epoxy group, a compound having an oxetanyl group, and the like, and a compound having an epoxy group is preferable.
- Examples of the compound having an epoxy group include a compound having 1 to 100 epoxy groups in one molecule.
- the upper limit of the number of epoxy groups may be, for example, 10 or less, or 5 or less.
- the lower limit of the number of epoxy groups is preferably two or more.
- Examples of the compound having an epoxy group include paragraph numbers 0034 to 0036 of JP2013-011869, paragraph numbers 0147 to 0156 of JP2014-043556, and paragraph numbers 0083 to 0092 of JP2014-089408.
- the described compound, the compound described in JP-A-2017-179172 can also be used, and the contents thereof are incorporated in the present specification.
- the compound having a cyclic ether group may be a low molecular weight compound (for example, a molecular weight of less than 1000) or a polymer compound (for example, a molecular weight of 1000 or more, and in the case of a polymer, a weight average molecular weight of 1000 or more).
- the weight average molecular weight of the cyclic ether group is preferably 200 to 100,000, more preferably 500 to 50,000.
- the upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5000 or less, and even more preferably 3000 or less.
- Examples of the compound having a cyclic ether group include the compounds described in paragraphs 0034 to 0036 of JP2013-011869, the compounds described in paragraphs 0147 to 0156 of JP2014-043556, and JP-A-2014.
- the compounds described in paragraphs 805 to 0092 of JP-A-089408 and the compounds described in JP-A-2017-179172 can also be used.
- Examples of the compound having a methylol group include a compound in which the methylol group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring.
- Examples of the compound having an alkoxymethyl group include a compound in which an alkoxymethyl group is bonded to a nitrogen atom or a carbon atom forming an aromatic ring.
- Compounds in which an alkoxymethyl group or a methylol group is bonded to a nitrogen atom include alkoxymethylated melamine, methylolated melamine, alkoxymethylated benzoguanamine, methylolated benzoguanamine, alkoxymethylated glycoluril, methylolated glycoluril, and alkoxymethylated.
- Urea, methylolated urea and the like are preferred.
- the compounds described in paragraphs 0134 to 0147 of JP-A-2004-295116 and paragraphs 095 to 0126 of JP-A-2014-089408 can also be used.
- a resin in the composition of the present invention, can be used as the curable compound. It is preferable to use a curable compound containing at least a resin.
- the resin is blended, for example, for the purpose of dispersing a pigment or the like in a composition or for a binder.
- a resin mainly used for dispersing a pigment or the like in a composition is also referred to as a dispersant.
- such an application of the resin is an example, and the resin can be used for purposes other than such an application.
- the resin having a polymerizable group also corresponds to a polymerizable compound.
- the weight average molecular weight of the resin is preferably 3000 to 2000000.
- the upper limit is preferably 1,000,000 or less, more preferably 500,000 or less.
- the lower limit is preferably 4000 or more, more preferably 5000 or more.
- the resin examples include (meth) acrylic resin, epoxy resin, en-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, polyarylene ether phosphine oxide resin, and polyimide resin.
- examples thereof include polyamide resin, polyamideimide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, vinyl acetate resin, polyvinyl alcohol resin, polyvinyl acetal resin, polyurethane resin, and polyurea resin.
- One of these resins may be used alone, or two or more thereof may be mixed and used.
- a norbornene resin is preferable from the viewpoint of improving heat resistance.
- Examples of commercially available norbornene resins include the ARTON series manufactured by JSR Corporation (for example, ARTON F4520).
- the resin the resin described in Examples of International Publication No. 2016/08864, the resin described in JP-A-2017-0572565, the resin described in JP-A-2017-032685, and the Japanese Patent Application Laid-Open No. 2017-032685.
- the resin it is also preferable to use a resin having a glass transition temperature of 150 ° C. or higher. According to this aspect, the heat resistance and light resistance of the film can be enhanced. Further, it is possible to enhance the heat resistance of the pattern shape when the pattern is formed (suppression of deterioration of the rectangularity of the pattern due to heating).
- the glass transition temperature of the resin is preferably 160 ° C. or higher, more preferably 180 ° C. or higher.
- Tg glass transition temperature
- Tg is the glass transition temperature (unit) of the resin.
- K glass transition temperature (unit: K) of the homopolymer of each monomer
- W1 to Wn represent the mass fraction of each monomer in all the monomer components.
- a resin having an acid group examples include a carboxyl group, a phosphoric acid group, a sulfo group, and a phenolic hydroxy group. These acid groups may be only one kind or two or more kinds.
- the resin having an acid group can also be used as a dispersant.
- the acid value of the resin having an acid group is preferably 30 to 500 mgKOH / g.
- the lower limit is preferably 50 mgKOH / g or more, and more preferably 70 mgKOH / g or more.
- the upper limit is preferably 400 mgKOH / g or less, more preferably 200 mgKOH / g or less, further preferably 150 mgKOH / g or less, and most preferably 120 mgKOH / g or less.
- a resin containing a repeating unit derived from a compound represented by the formula (ED1) and / or a compound represented by the formula (ED2) (hereinafter, these compounds may be referred to as “ether dimer”) is used. It is also preferable to include it.
- R 1 and R 2 each independently represent a hydrocarbon group having 1 to 25 carbon atoms which may have a hydrogen atom or a substituent.
- R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms.
- the description in JP-A-2010-168539 can be referred to.
- paragraph number 0317 of JP2013-209760A can be referred to, and this content is incorporated in the present specification.
- the resin it is also preferable to use a resin having a polymerizable group.
- the polymerizable group is preferably an ethylenically unsaturated bond-containing group and a cyclic ether group, and more preferably an ethylenically unsaturated bond-containing group.
- R 1 represents a hydrogen atom or a methyl group
- R 21 and R 22 each independently represent an alkylene group
- n represents an integer of 0 to 15.
- the alkylene group represented by R 21 and R 22 preferably has 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms, further preferably 1 to 3 carbon atoms, and particularly preferably 2 or 3 carbon atoms.
- n represents an integer of 0 to 15, preferably an integer of 0 to 5, more preferably an integer of 0 to 4, and even more preferably an integer of 0 to 3.
- Examples of the compound represented by the formula (X) include ethylene oxide of paracumylphenol or propylene oxide-modified (meth) acrylate.
- Examples of commercially available products include Aronix M-110 (manufactured by Toagosei Co., Ltd.).
- the resin preferably contains a resin as a dispersant.
- the dispersant include an acidic dispersant (acidic resin) and a basic dispersant (basic resin).
- the acidic dispersant (acidic resin) represents a resin in which the amount of acid groups is larger than the amount of basic groups.
- the acidic dispersant (acidic resin) a resin having an acid group content of 70 mol% or more is preferable when the total amount of the acid group and the basic group is 100 mol%.
- the acid group of the acidic dispersant (acidic resin) is preferably a carboxyl group.
- the acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH / g.
- the basic dispersant represents a resin in which the amount of basic groups is larger than the amount of acid groups.
- a resin in which the amount of basic groups exceeds 50 mol% is preferable when the total amount of the amount of acid groups and the amount of basic groups is 100 mol%.
- the basic group contained in the basic dispersant is preferably an amino group.
- the resin used as the dispersant is a graft resin.
- the description in paragraphs 0025 to 0094 of JP2012-255128A can be referred to, and the contents thereof are incorporated in the present specification.
- the resin used as the dispersant is a polyimine-based dispersant containing a nitrogen atom in at least one of the main chain and the side chain.
- the polyimine-based dispersant has a main chain having a partial structure having a functional group of pKa14 or less, a side chain having 40 to 10,000 atoms, and a basic nitrogen atom in at least one of the main chain and the side chain.
- the resin to have is preferable.
- the basic nitrogen atom is not particularly limited as long as it is a nitrogen atom exhibiting basicity.
- the description in paragraphs 0102 to 0166 of JP2012-255128A can be referred to, and the content thereof is incorporated in the present specification.
- the resin used as the dispersant is a resin having a structure in which a plurality of polymer chains are bonded to the core portion.
- a resin include dendrimers (including star-shaped polymers).
- specific examples of the dendrimer include the polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP2013-043962.
- the resin used as the dispersant is also preferably a resin containing a repeating unit having an ethylenically unsaturated bond-containing group in the side chain.
- the content of the repeating unit having an ethylenically unsaturated bond-containing group in the side chain is preferably 10 mol% or more, more preferably 10 to 80 mol%, and 20 to 70 in all the repeating units of the resin. It is more preferably mol%.
- block copolymers (EB-1) to (EB-9) described in paragraph Nos. 0219 to 0221 of Japanese Patent No. 6432077, and resins described in JP-A-2018-087939 polyester imine having a polyester side chain described in WO2016 / 104803, a block copolymer described in WO2019 / 125940, and a block polymer having an acrylamide structural unit described in JP-A-2020-06667.
- Block polymers having an acrylamide structural unit described in JP-A-2020-066688, dispersants described in International Publication No. 2016/104803, resins described in JP-A-2019-095548, and the like can also be used.
- Dispersants are also available as commercial products, and specific examples thereof include DISPERBYK series manufactured by Big Chemie Japan, SOLSPERSE series manufactured by Japan Lubrizol, Efka series manufactured by BASF, and Ajinomoto Fine-Techno (Ajinomoto Fine Techno). Examples include the Ajispar series manufactured by Co., Ltd. Further, the product described in paragraph number 0129 of JP2012-137564A and the product described in paragraph number 0235 of JP2017-194662 can also be used as a dispersant.
- the content of the curable compound is preferably 1 to 95% by mass in the total solid content of the composition.
- the lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, further preferably 7% by mass or more, and particularly preferably 10% by mass or more.
- the upper limit is preferably 94% by mass or less, more preferably 90% by mass or less, further preferably 85% by mass or less, and particularly preferably 80% by mass or less.
- the content of the polymerizable compound is preferably 1 to 85% by mass in the total solid content of the composition.
- the lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more.
- the upper limit is preferably 80% by mass or less, more preferably 70% by mass or less.
- the content of the polymerizable monomer is preferably 1 to 50% by mass based on the total solid content of the composition.
- the lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more.
- the upper limit is preferably 30% by mass or less, more preferably 20% by mass or less.
- the content of the compound having an ethylenically unsaturated bond-containing group is 1 to 70 mass by mass in the total solid content of the composition. % Is preferable.
- the lower limit is preferably 2% by mass or more, more preferably 3% by mass or more, and even more preferably 5% by mass or more.
- the upper limit is preferably 65% by mass or less, more preferably 60% by mass or less.
- the content of the resin is preferably 1 to 85% by mass in the total solid content of the composition.
- the lower limit is preferably 2% by mass or more, more preferably 5% by mass or more, further preferably 7% by mass or more, and particularly preferably 10% by mass or more.
- the upper limit is preferably 80% by mass or less, more preferably 75% by mass or less, further preferably 70% by mass or less, and particularly preferably 40% by mass or less.
- the content of the resin as a dispersant is preferably 0.1 to 40% by mass in the total solid content of the composition.
- the upper limit is preferably 25% by mass or less, more preferably 20% by mass or less.
- the lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more.
- the content of the resin as the dispersant is preferably 1 to 100 parts by mass with respect to 100 parts by mass of the above-mentioned specific infrared absorbing compound.
- the upper limit is preferably 80 parts by mass or less, more preferably 75 parts by mass or less.
- the lower limit is preferably 2.5 parts by mass or more, and more preferably 5 parts by mass or more.
- composition of the present invention may contain only one type of curable compound, or may contain two or more types. When two or more curable compounds are contained, the total amount thereof is preferably in the above range.
- the composition of the present invention can further contain a dye derivative.
- Dye derivatives are used as dispersion aids.
- the dye derivative include compounds having a structure in which an acid group or a basic group is bonded to the dye skeleton.
- the pigment skeletons constituting the pigment derivatives include squarylium pigment skeleton, pyrolopyrrolop pigment skeleton, diketopyrrolopyrrole pigment skeleton, quinacridone pigment skeleton, anthraquinone pigment skeleton, dianthraquinone pigment skeleton, benzoisoindole pigment skeleton, and thiazine indigo pigment skeleton.
- Azo pigment skeleton, quinophthalone pigment skeleton, phthalocyanine pigment skeleton, naphthalocyanine pigment skeleton, dioxazine pigment skeleton, perylene pigment skeleton, perinone pigment skeleton, benzoimidazolone pigment skeleton, benzothiazole pigment skeleton, benzoimidazole pigment skeleton and benzoxazole pigment skeleton The squarylium pigment skeleton, the pyrolopyrrolop pigment skeleton, the diketopyrrolopyrrole pigment skeleton, the phthalocyanine pigment skeleton, the quinacridone pigment skeleton and the benzoimidazolone pigment skeleton are preferable, and the squarylium pigment skeleton and the pyrolopyrrolop pigment skeleton are more preferable.
- Examples of the acid group include a carboxyl group, a sulfo group, a phosphoric acid group, a boronic acid group, a carboxylic acid amide group, a sulfonic acid amide group, an imic acid group and salts thereof.
- alkali metal ions Li + , Na + , K + , etc.
- alkaline earth metal ions Ca 2+ , Mg 2+ , etc.
- ammonium ions imidazolium ions, pyridinium ions, etc.
- Examples include phosphonium ion.
- the carboxylic acid amide group a group represented by -NHCOR X1 is preferable.
- sulfonic acid amide group a group represented by -NHSO 2 RX2 is preferable.
- imidic acid group a group represented by -SO 2 NHSO 2 R X3 , -CONHSO 2 R X4 , -CONHCOR X5 or -SO 2 NHCOR X6 is preferable, and -SO 2 NHSO 2 R X3 is more preferable.
- RX1 to RX6 independently represent an alkyl group or an aryl group, respectively.
- the alkyl group and aryl group represented by RX1 to RX6 may have a substituent.
- the substituent is preferably a halogen atom, more preferably a fluorine atom.
- Examples of the basic group include an amino group, a pyridinyl group and a salt thereof, a salt of an ammonium group, and a phthalimidemethyl group.
- Examples of the atom or atomic group constituting the salt include hydroxide ion, halogen ion, carboxylate ion, sulfonic acid ion, and phenoxide ion.
- Examples of the dye derivative include the compound described in JP-A-56-118462, the compound described in JP-A-63-246674, the compound described in JP-A No. 01-217777, and JP-A-03-009961. , The compound described in JP-A-03-026767, the compound described in JP-A-03-153780, the compound described in JP-A-03-045662, and JP-A-04-285669. , The compound described in JP-A-06-145546, the compound described in JP-A-06-212588, the compound described in JP-A-06-240158, and the compound described in JP-A-10-030063. , Japanese Patent Application Laid-Open No.
- the content of the dye derivative is preferably 1 to 50 parts by mass with respect to 100 parts by mass of the above-mentioned specific infrared absorbing compound.
- the lower limit is preferably 3 parts by mass or more, and more preferably 5 parts by mass or more.
- the upper limit is preferably 40 parts by mass or less, more preferably 30 parts by mass or less. Only one kind of dye derivative may be used, or two or more kinds may be used. When two or more types are used, the total amount is preferably in the above range.
- the composition of the present invention preferably contains a solvent.
- the solvent include water and an organic solvent, and an organic solvent is preferable.
- the organic solvent include ester-based solvents, ketone-based solvents, alcohol-based solvents, amide-based solvents, ether-based solvents, hydrocarbon-based solvents and the like.
- paragraph No. 0223 of International Publication No. 2015/166779 can be referred to, the contents of which are incorporated herein.
- an ester solvent substituted with a cyclic alkyl group and a ketone solvent substituted with a cyclic alkyl group can also be preferably used.
- organic solvent examples include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2 -Heptanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethylcarbitol acetate, butylcarbi Tall acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, 3-methoxy-N, N-dimethylpropanamide, 3-butoxy-N, N-di
- aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) as organic solvents may need to be reduced for environmental reasons (for example, 50 parts by mass (parts) with respect to the total amount of organic solvent. Per millision) or less, 10 mass ppm or less, or 1 mass ppm or less).
- an organic solvent having a low metal content it is preferable to use an organic solvent having a low metal content, and the metal content of the organic solvent is preferably, for example, 10 mass ppb (parts per billion) or less. If necessary, an organic solvent at the mass ppt (parts per tension) level may be used, and such an organic solvent is provided by, for example, Toyo Synthetic Co., Ltd. (The Chemical Daily, November 13, 2015).
- Examples of the method for removing impurities such as metals from the organic solvent include distillation (molecular distillation, thin film distillation, etc.) and filtration using a filter.
- the filter pore diameter of the filter used for filtration is preferably 10 ⁇ m or less, more preferably 5 ⁇ m or less, and even more preferably 3 ⁇ m or less.
- the filter material is preferably polytetrafluoroethylene, polyethylene or nylon.
- the organic solvent may contain isomers (compounds having the same number of atoms but different structures). Further, only one kind of isomer may be contained, or a plurality of kinds may be contained.
- the content of peroxide in the organic solvent is preferably 0.8 mmol / L or less, and more preferably substantially free of peroxide.
- the content of the solvent in the composition is preferably 10 to 97% by mass.
- the lower limit is preferably 30% by mass or more, more preferably 40% by mass or more, further preferably 50% by mass or more, further preferably 60% by mass or more, and 70% by mass. The above is particularly preferable.
- the upper limit is preferably 96% by mass or less, and more preferably 95% by mass or less.
- the composition may contain only one type of solvent, or may contain two or more types of solvent. When two or more kinds are contained, it is preferable that the total amount thereof is within the above range.
- the composition of the present invention contains a polymerizable compound
- the photopolymerization initiator is not particularly limited and may be appropriately selected from known photopolymerization initiators. For example, a compound having photosensitivity to light rays in the ultraviolet region to the visible region is preferable.
- the photopolymerization initiator is preferably a photoradical polymerization initiator.
- photopolymerization initiator examples include halogenated hydrocarbon derivatives (for example, compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazoles, oxime compounds, organic peroxides, and thio compounds. , Ketone compounds, aromatic onium salts, ⁇ -hydroxyketone compounds, ⁇ -aminoketone compounds and the like.
- the photopolymerization initiator is a trihalomethyltriazine compound, a benzyldimethylketal compound, an ⁇ -hydroxyketone compound, an ⁇ -aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, or a triarylimidazole.
- Dimer, onium compound, benzothiazole compound, benzophenone compound, acetophenone compound, cyclopentadiene-benzene-iron complex, halomethyloxadiazole compound and 3-aryl substituted coumarin compound are preferable, and oxime compound and ⁇ -hydroxyketone compound are preferable.
- ⁇ -Aminoketone compound, and a compound selected from an acylphosphine compound are more preferable, and an oxime compound is further preferable.
- the photopolymerization initiator the compound described in paragraphs 0065 to 0111 of JP-A-2014-130173, the compound described in Japanese Patent No. 6301489, MATERIAL STAGE 37-60p, vol. 19, No. Peroxide-based photopolymerization initiator described in 3, 2019, photopolymerization initiator described in International Publication No. 2018/221177, photopolymerization initiator described in International Publication No. 2018/110179, JP-A-2019-043864.
- Examples thereof include the above-mentioned aminoacetophenone-based initiators having an oxazolidine group, the oxime-based photopolymerization initiators described in JP-A-2013-190459, and the contents thereof are incorporated in the present specification.
- ⁇ -hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, Omnirad 127 (above, IGM Resins B.V.), Irgacure 184, Irgacure 1173, Irgacure27, Irgacure29. (Manufactured by the company) and the like.
- Commercially available ⁇ -aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (above, IGM Resins BV), Irgacure 907, Irgacure 369, Irgacure 369, Irger Made) and so on.
- acylphosphine compounds examples include Omnirad 819, Omnirad TPO (above, manufactured by IGM Resins BV), Irgacure 819, and Irgacure TPO (above, manufactured by BASF).
- Examples of the oxime compound include the compound described in JP-A-2001-233842, the compound described in JP-A-2000-080068, the compound described in JP-A-2006-342166, and J. Am. C. S. The compound according to Perkin II (1979, pp. 1653-1660), J. Mol. C. S. The compound described in Perkin II (1979, pp. 156-162), the compound described in the Journal of Photopolisr Science and Technology (1995, pp. 202-232), the compound described in JP-A-2000-066385, the compound described in JP-A-2000-066385.
- oxime compound examples include 3-benzoyloxyiminobutane-2-one, 3-acetoxyiminobutane-2-one, 3-propionyloxyiminobutane-2-one, 2-acetoxyiminopentane-3-one, and the like.
- an oxime compound having a fluorene ring can also be used.
- Specific examples of the oxime compound having a fluorene ring include the compound described in JP-A-2014-137466, the compound described in Japanese Patent No. 6636081, and the compound described in Korean Patent Publication No. 10-2016-0109444. Will be.
- an oxime compound having a skeleton in which at least one benzene ring of the carbazole ring is a naphthalene ring can also be used.
- Specific examples of such an oxime compound include the compounds described in International Publication No. 2013/083505.
- an oxime compound having a fluorine atom can also be used as the photopolymerization initiator.
- Specific examples of the oxime compound having a fluorine atom are described in the compounds described in JP-A-2010-262028, compounds 24, 36-40 described in JP-A-2014-500852, and JP-A-2013-164471.
- Compound (C-3) and the like can be mentioned.
- an oxime compound having a nitro group can be used as the photopolymerization initiator.
- the oxime compound having a nitro group is also preferably a dimer.
- Specific examples of the oxime compound having a nitro group include the compounds described in paragraphs 0031 to 0047 of JP2013-114249A and paragraphs 0008-0012 and 0070-0079 of JP-A-2014-137466. Examples thereof include the compound described in paragraphs 0007 to 0025 of Japanese Patent No. 4223071, ADEKA ARKULS NCI-831 (manufactured by ADEKA Corporation).
- an oxime compound having a benzofuran skeleton can also be used.
- Specific examples include OE-01 to OE-75 described in International Publication No. 2015/036910.
- an oxime compound in which a substituent having a hydroxy group is bonded to the carbazole skeleton can also be used.
- Examples of such a photopolymerization initiator include the compounds described in International Publication No. 2019/088055.
- the oxime compound is preferably a compound having a maximum absorption wavelength in the wavelength range of 350 to 500 nm, and more preferably a compound having a maximum absorption wavelength in the wavelength range of 360 to 480 nm.
- the molar extinction coefficient of the oxime compound at a wavelength of 365 nm or a wavelength of 405 nm is preferably high, more preferably 1000 to 300,000, further preferably 2000 to 300,000, and more preferably 5000 to 200,000. It is particularly preferable to have.
- the molar extinction coefficient of a compound can be measured using a known method. For example, it is preferable to measure at a concentration of 0.01 g / L using an ethyl acetate solvent with a spectrophotometer (Cary-5 spectrophotometer manufactured by Varian).
- a bifunctional or trifunctional or higher functional photoradical polymerization initiator may be used as the photopolymerization initiator.
- two or more radicals are generated from one molecule of the photoradical polymerization initiator, so that good sensitivity can be obtained.
- the crystallinity is lowered, the solubility in a solvent or the like is improved, the precipitation is less likely to occur with time, and the stability of the composition with time can be improved.
- Specific examples of the bifunctional or trifunctional or higher functional photo-radical polymerization initiator include Japanese Patent Publication No. 2010-527339, Japanese Patent Publication No. 2011-524436, International Publication No.
- the photoinitiator described in paragraphs 0020 to 0033, the photopolymerization initiator (A) described in paragraphs 0017 to 0026 of JP-A-2017-151342, is described in Japanese Patent No. 6469669. Examples thereof include an oxime ester-based photoinitiator.
- the content of the photopolymerization initiator is preferably 0.1 to 40% by mass, more preferably 0.5 to 35% by mass, still more preferably 1 to 30% by mass in the total solid content of the composition.
- the composition may contain only one kind of photopolymerization initiator, or may contain two or more kinds of photopolymerization initiators. When two or more kinds are contained, it is preferable that the total amount thereof is within the above range.
- composition of the present invention contains a compound having a cyclic ether group
- a curing agent examples include amine compounds, acid anhydride compounds, amide compounds, phenol compounds, polyvalent carboxylic acids, thiol compounds and the like.
- Specific examples of the curing agent include succinic acid, trimellitic acid, pyromellitic acid, N, N-dimethyl-4-aminopyridine, pentaerythritol tetrakis (3-mercaptopropionate) and the like.
- the curing agent the compounds described in paragraphs 0072 to 0078 of JP-A-2016-07520 and the compounds described in JP-A-2017-036379 can also be used.
- the content of the curing agent is preferably 0.01 to 20 parts by mass, more preferably 0.01 to 10 parts by mass, and 0.1 to 6.0 parts by mass with respect to 100 parts by mass of the compound having a cyclic ether group. Is even more preferable.
- the composition of the present invention can contain a chromatic colorant.
- the chromatic colorant means a colorant other than the white colorant and the black colorant.
- the chromatic colorant is preferably a colorant having absorption in a wavelength range of 400 nm or more and less than 650 nm.
- the chromatic colorant examples include a red colorant, a green colorant, a blue colorant, a yellow colorant, a purple colorant, and an orange colorant.
- the chromatic colorant may be a pigment or a dye. Pigments and dyes may be used in combination. Further, the pigment may be either an inorganic pigment or an organic pigment. Further, as the pigment, an inorganic pigment or a material in which a part of the organic-inorganic pigment is replaced with an organic chromophore can also be used. By replacing inorganic pigments and organic-inorganic pigments with organic chromophores, hue design can be facilitated.
- the average primary particle size of the pigment is preferably 1 to 200 nm.
- the lower limit is preferably 5 nm or more, more preferably 10 nm or more.
- the upper limit is preferably 180 nm or less, more preferably 150 nm or less, still more preferably 100 nm or less.
- the primary particle size of the pigment can be obtained from an image photograph obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of the primary particles of the pigment is obtained, and the corresponding circle-equivalent diameter is calculated as the primary particle diameter of the pigment.
- the average primary particle size in the present invention is an arithmetic average value of the primary particle size for the primary particles of 400 pigments.
- the primary particles of the pigment refer to independent particles without aggregation.
- the chromatic colorant preferably contains a pigment.
- the content of the pigment in the chromatic colorant is preferably 50% by mass or more, more preferably 70% by mass or more, further preferably 80% by mass or more, and further preferably 90% by mass or more. Is particularly preferred. Examples of the pigment include those shown below.
- a halogenated zinc phthalocyanine having an average of 10 to 14 halogen atoms in one molecule, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms. Pigments can also be used. Specific examples include the compounds described in International Publication No. 2015/118720. Further, as a green colorant, the compound described in Chinese Patent Application No. 1069090227, the phthalocyanine compound having a phosphoric acid ester as a ligand according to International Publication No. 2012/102395, and Japanese Patent Application Laid-Open No. 2019-008014. The phthalocyanine compound of JP-A-2018-180023, the compound described in JP-A-2019-038958, the core-shell dye described in JP-A-2020-076955, and the like can also be used.
- an aluminum phthalocyanine compound having a phosphorus atom can also be used. Specific examples thereof include the compounds described in paragraph numbers 0022 to 0030 of JP2012-247591A and paragraph numbers 0047 of JP2011-157478A.
- JP-A-2013-209435 the quinophthalone compound described in JP-A-2013-181015
- the quinophthalone compound described in JP-A-2013-061622 A quinophthalone compound described in JP2013-032486, a quinophthalone compound described in JP2012-226110A, a quinophthalone compound described in JP-A-2008-074987, and a quinophthalone compound described in JP-A-2008-081565.
- a red colorant As a red colorant, a diketopyrrolopyrrole compound in which at least one bromine atom is substituted in the structure described in JP-A-2017-201384, and a diketopyrrolopyrrole compound described in paragraphs 0016 to 0022 of Patent No. 6248838. , Diketopyrrolopyrrole compound described in WO2012 / 102399, diketopyrrolopyrrole compound described in WO2012 / 117965, naphtholazo compound described in JP2012-229344, patent No. 6516119.
- the descriptions of Japanese Patent No. 6561862, Japanese Patent No. 6413872, Japanese Patent No. 6281345, and Japanese Patent Application Laid-Open No. 2020-026503 can be referred to. Incorporated herein.
- the pyrrolopyrrole pigment the crystallite size in the plane direction corresponding to the maximum peak in the X-ray diffraction pattern among the eight planes ( ⁇ 1 ⁇ 1 ⁇ 1) of the crystal lattice planes is 140 ⁇ or less. It is also preferable to use some. Further, it is also preferable to set the physical characteristics of the pyrrolopyrrole pigment as described in paragraphs 0028 to 0073 of JP-A-2020-097744.
- Dyes can also be used as the chromatic colorant.
- the dye is not particularly limited, and known dyes can be used.
- pyrazole azo dyes for example, pyrazole azo dyes, anilino azo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benziliden dyes, oxonol dyes, pyrazolotriazole azo dyes, pyridone azo dyes, cyanine dyes, phenothiazines.
- Examples thereof include dyes, pyropyrazole azomethine dyes, xanthene dyes, phthalocyanine dyes, benzopyran dyes, indigo dyes, and pyromethene dyes.
- the dyes include a thiazole compound described in JP-A-2012-158649, an azo compound described in JP-A-2011-184493, an azo compound described in JP-A-2011-145540, and a Korean published patent No. 10.
- a thiazole compound described in JP-A-2012-158649 an azo compound described in JP-A-2011-184493
- an azo compound described in JP-A-2011-145540 an azo compound described in JP-A-2011-145540
- Korean published patent No. 10 -The triarylmethane dye polymer described in Japanese Patent Application Laid-Open No. 2020-0028160 and the xanthene compound described in JP-A-2020-117638 can also be preferably used.
- the chromatic colorant the phthalocyanine compound described in International Publication No. 2020/174991 can be used.
- the content of the chromatic colorant is preferably 1 to 50% by mass in the total solid content of the composition of the present invention.
- the composition of the present invention contains two or more kinds of chromatic colorants, it is preferable that the total amount thereof is within the above range.
- the composition of the present invention may also contain a coloring material that transmits infrared rays to block visible light (hereinafter, also referred to as a coloring material that blocks visible light).
- a composition containing a coloring material that blocks visible light is preferably used as a composition for forming an infrared transmission filter.
- the color material that blocks visible light is preferably a color material that absorbs light in the wavelength range from purple to red. Further, the color material that blocks visible light is preferably a color material that blocks light in the wavelength region of 450 to 650 nm. Further, the color material that blocks visible light is preferably a color material that transmits light having a wavelength of 900 to 1500 nm.
- the coloring material that blocks visible light preferably satisfies at least one of the following requirements (A) and (B).
- B Contains an organic black colorant.
- Examples of the chromatic colorant include those described above.
- Examples of the organic black colorant include bisbenzofuranone compound, azomethin compound, perylene compound, azo compound and the like, and bisbenzofuranone compound and perylene compound are preferable.
- Examples of the bisbenzofuranone compound include the compounds described in JP-A-2010-534726, JP-A-2012-515233, JP-A-2012-515234, etc., for example, as "Irgaphor Black” manufactured by BASF. It is available.
- Examples of the perylene compound include the compounds described in paragraphs 0016 to 0020 of JP-A-2017-226821, C.I. I. Pigment Black 31, 32 and the like can be mentioned.
- Examples of the azomethin compound include the compounds described in JP-A No. 01-17601, JP-A-02-0346664, and the like, and can be obtained as, for example, "Chromofine Black A1103" manufactured by Dainichiseika.
- Examples of the combination of chromatic colorants in the case of forming black color by the combination of two or more kinds of chromatic colorants include the following embodiments (1) to (8).
- the content of the coloring material that blocks visible light is preferably 1 to 50% by mass in the total solid content of the composition.
- the lower limit is preferably 5% by mass or more, more preferably 10% by mass or more, further preferably 20% by mass or more, and particularly preferably 30% by mass or more.
- the composition of the present invention preferably contains a surfactant.
- a surfactant various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone-based surfactant can be used.
- the surfactant is preferably a silicone-based surfactant or a fluorine-based surfactant. Examples of the surfactant include the surfactant described in paragraph Nos. 0238 to 0245 of International Publication No. 2015/16677, and the surfactant described in JP-A-2020-008634, and the contents thereof are described in the present invention. Incorporated into the specification.
- fluorine-based surfactant examples include the surfactants described in paragraphs 0060 to 0064 of Japanese Patent Laid-Open No. 2014-041318 (paragraphs 0060 to 0064 of International Publication No. 2014/017669) and the like, Japanese Patent Application Laid-Open No. 2011-.
- the surfactants described in paragraphs 0117 to 0132 of Japanese Patent Application Laid-Open No. 132503 and the surfactants described in JP-A-2020-008634 are mentioned, and the contents thereof are incorporated in the present specification.
- fluorine-based surfactants include, for example, Megafax F-171, F-172, F-173, F-176, F-177, F-141, F-142, F-143, F-144. , F-437, F-475, F-477, F-479, F-482, F-554, F-555-A, F-556, F-557, F-558, F-559, F-560.
- a fluorine-based surfactant an acrylic compound having a molecular structure having a functional group containing a fluorine atom and in which a portion of the functional group containing a fluorine atom is cut off and the fluorine atom volatilizes when heat is applied is also available.
- a fluorine-based surfactant include the Megafuck DS series manufactured by DIC Corporation (The Chemical Daily (February 22, 2016), Nikkei Sangyo Shimbun (February 23, 2016)), for example, Megafuck. DS-21 can be mentioned.
- fluorine-based surfactant it is also preferable to use a polymer of a fluorine atom-containing vinyl ether compound having a fluorinated alkyl group or a fluorinated alkylene ether group and a hydrophilic vinyl ether compound.
- a fluorine-based surfactant include the fluorine-based surfactants described in JP-A-2016-216602, the contents of which are incorporated in the present specification.
- a block polymer can also be used as the fluorine-based surfactant.
- a fluorine-based surfactant it has a repeating unit derived from a (meth) acrylate compound having a fluorine atom and 2 or more (preferably 5 or more) alkyleneoxy groups (preferably ethyleneoxy groups and propyleneoxy groups) (meth).
- a fluorine-containing polymer compound containing a repeating unit derived from an acrylate compound can also be preferably used.
- the fluorine-containing surfactants described in paragraphs 0016 to 0037 of JP-A-2010-032698 and the following compounds are also exemplified as the fluorine-based surfactants used in the present invention.
- the weight average molecular weight of the above compounds is preferably 3000 to 50,000, for example 14000.
- % indicating the ratio of the repeating unit is mol%.
- a fluorine-based surfactant a fluorine-containing polymer having an ethylenically unsaturated bond-containing group in the side chain can also be used. Specific examples thereof include the compounds described in paragraphs 0050 to 0090 and 0289 to 0295 of JP2010-164965, Megafuck RS-101, RS-102, RS-718K, manufactured by DIC Corporation. RS-72-K and the like can be mentioned. Further, as the fluorine-based surfactant, the compounds described in paragraphs 0015 to 0158 of JP-A-2015-117327 can also be used.
- a fluorine-containing imide salt compound represented by the formula (fi-1) is also preferable to use as a surfactant.
- m represents 1 or 2
- n represents an integer of 1 to 4
- a represents 1 or 2
- X a + represents a-valent metal ion, primary ammonium ion, and first. Represents a secondary ammonium ion, a tertiary ammonium ion , a quaternary ammonium ion or NH 4+ .
- Nonionic surfactants include glycerol, trimethylolpropane, trimethylolethane, their ethoxylates and propoxylates (eg, glycerol propoxylates, glycerol ethoxylates, etc.), polyoxyethylene lauryl ethers, polyoxyethylene stearyl ethers, etc.
- cationic surfactant examples include tetraalkylammonium salt, alkylamine salt, benzalkonium salt, alkylpyridium salt, imidazolium salt and the like. Specific examples thereof include dihydroxyethylstearylamine, 2-heptadecenyl-hydroxyethylimidazoline, lauryldimethylbenzylammonium chloride, cetylpyridinium chloride, stealamidemethylpyridium chloride and the like.
- Anionic surfactants include dodecylbenzene sulfonic acid, sodium dodecylbenzene sulfonate, sodium lauryl sulfate, sodium alkyldiphenyl ether disulfonate, sodium alkylnaphthalene sulfonate, sodium dialkyl sulfosuccinate, sodium stearate, potassium oleate, sodium dioctyl.
- Sulfonate sodium polyoxyethylene alkyl ether sulfate, sodium polyoxyethylene alkylate sulfate, sodium polyoxyethylene alkylphenyl ether sulfate, sodium dialkyl sulfosuccinate, sodium stearate, sodium oleate, t-octylphenoxyethoxypolyethoxyethyl Examples include sodium sulfate.
- Silicone-based surfactants include DC3PA, SH7PA, DC11PA, SH21PA, SH28PA, SH29PA, SH30PA, SH8400, SH 8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, SF 84 -Specialty Materials Co., Ltd.), TSF-4300, TSF-4445, TSF-4460, TSF-4452 (all manufactured by Momentive Performance Materials Co., Ltd.), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (above, manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-333, BYK-3760, BYK-UV3510 (above, Big Chemie) (Manufactured by the company) and the like.
- a compound having the following structure can also be used as the silicone-based surfactant.
- the content of the surfactant is preferably 0.001 to 1% by mass, more preferably 0.001 to 0.5% by mass, still more preferably 0.001 to 0.2% by mass in the total solid content of the composition. ..
- the composition may contain only one type of surfactant, or may contain two or more types of surfactant. When two or more kinds are contained, it is preferable that the total amount thereof is within the above range.
- the composition of the present invention can contain a polymerization inhibitor.
- the polymerization inhibitor include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis (3-methyl-6-tert-butylphenol), and the like.
- examples thereof include 2,2'-methylenebis (4-methyl-6-t-butylphenol) and N-nitrosophenylhydroxyamine salt (ammonium salt, first cerium salt, etc.), and p-methoxyphenol is preferable.
- the content of the polymerization inhibitor is preferably 0.0001 to 5% by mass based on the total solid content of the composition.
- the composition may contain only one type of polymerization inhibitor, or may contain two or more types. When two or more kinds are contained, it is preferable that the total amount thereof is within the above range.
- the composition of the present invention can contain a silane coupling agent.
- the silane coupling agent means a silane compound having a hydrolyzable group and other functional groups.
- the hydrolyzable group refers to a substituent that is directly linked to a silicon atom and can form a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction.
- the hydrolyzable group include a halogen atom, an alkoxy group, an acyloxy group and the like, and an alkoxy group is preferable. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group.
- Examples of the functional group other than the hydrolyzable group include a vinyl group, a styryl group, a (meth) acryloyl group, a mercapto group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group, an isocyanate group and a phenyl group. And the like, the (meth) acryloyl group and the epoxy group are preferable.
- Examples of the silane coupling agent include the compounds described in paragraphs 0018 to 0036 of JP2009-288703 and the compounds described in paragraphs 0056 to 0066 of JP2009-242604. Incorporated in the specification.
- the content of the silane coupling agent is preferably 0.01 to 15.0% by mass, more preferably 0.05 to 10.0% by mass, based on the total solid content of the composition.
- the composition may contain only one kind of silane coupling agent, or may contain two or more kinds of silane coupling agents. When two or more kinds are contained, it is preferable that the total amount thereof is within the above range.
- the composition of the present invention can contain an ultraviolet absorber.
- the ultraviolet absorber include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, and triazine compounds. Specific examples of such compounds include paragraph numbers 0038 to 0052 of JP2009-217221A, paragraph numbers 0052 to 0072 of JP2012-208374A, and paragraph numbers 0317 to JP2013-066814. 0334, the compounds described in paragraphs 0061 to 0080 of JP 2016-162946 are mentioned, and their contents are incorporated in the present specification.
- UV-503 manufactured by Daito Kagaku Co., Ltd.
- Tinuvin series manufactured by BASF
- Uvinul series examples of the benzotriazole compound
- the MYUA series made of Miyoshi Oil & Fat (The Chemical Daily, February 1, 2016).
- the ultraviolet absorber is a compound described in paragraphs 0049 to 0059 of Japanese Patent No. 6268967, a compound described in paragraph numbers 0059 to 0076 of International Publication No. 2016/181987, and International Publication No. 2020/137819.
- the thioaryl group-substituted benzotriazole type ultraviolet absorber described in 1 can also be used.
- the content of the ultraviolet absorber is preferably 0.01 to 30% by mass, more preferably 0.05 to 25% by mass, based on the total solid content of the composition.
- the composition may contain only one type of ultraviolet absorber, or may contain two or more types. When two or more kinds are contained, it is preferable that the total amount thereof is within the above range.
- the composition of the present invention can contain an antioxidant.
- the antioxidant include phenol compounds, phosphite ester compounds, thioether compounds and the like.
- the phenol compound any phenol compound known as a phenolic antioxidant can be used.
- Preferred phenolic compounds include hindered phenolic compounds.
- a compound having a substituent at a site (ortho position) adjacent to the phenolic hydroxy group is preferable.
- a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms is preferable.
- the antioxidant a compound having a phenol group and a phosphite ester group in the same molecule is also preferable.
- a phosphorus-based antioxidant can also be preferably used.
- a phosphorus-based antioxidant Tris [2-[[2,4,8,10-tetrakis (1,1-dimethylethyl) dibenzo [d, f] [1,3,2] dioxaphosphepine-6] -Il] Oxy] Ethyl] amine, Tris [2-[(4,6,9,11-tetra-tert-butyldibenzo [d, f] [1,3,2] dioxaphosphepin-2-yl] ) Oxy] ethyl] amine, ethylbis phosphite (2,4-di-tert-butyl-6-methylphenyl) and the like.
- antioxidants include, for example, Adekastab AO-20, Adekastab AO-30, Adekastab AO-40, Adekastab AO-50, Adekastab AO-50F, Adekastab AO-60, Adekastab AO-60G, and Adekastab AO-80. , ADEKA STAB AO-330 (above, manufactured by ADEKA Corporation) and the like. Further, as the antioxidant, the compound described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, the compound described in International Publication No. 2017/006600, and the compound described in International Publication No. 2017/1604024 are used. It can also be used.
- the content of the antioxidant is preferably 0.01 to 20% by mass, more preferably 0.3 to 15% by mass, based on the total solid content of the composition.
- the composition may contain only one type of antioxidant, or may contain two or more types. When two or more kinds are contained, it is preferable that the total amount thereof is within the above range.
- compositions of the present invention include sensitizers, cure accelerators, fillers, thermosetting accelerators, plasticizers and other auxiliaries (eg, conductive particles, defoamers, flame retardants, leveling). Agents, peeling accelerators, fragrances, surface tension modifiers, chain transfer agents, etc.) may be contained. By appropriately containing these components, properties such as film physical characteristics can be adjusted. These components are described in, for example, paragraph No. 0183 or later of JP2012-003225A (paragraph number 0237 of the corresponding US Patent Application Publication No. 2013/0034812), paragraph 2008-250074. The description of numbers 0101 to 0104, 0107 to 0109, etc.
- the composition of the present invention may contain a latent antioxidant, if necessary.
- the latent antioxidant is a compound in which the site that functions as an antioxidant is protected by a protecting group, and is heated at 100 to 250 ° C. or at 80 to 200 ° C. in the presence of an acid / base catalyst. This includes compounds in which the protecting group is desorbed and functions as an antioxidant.
- Examples of the latent antioxidant include compounds described in International Publication No. 2014/021023, International Publication No. 2017/030005, and JP-A-2017-008219.
- Examples of commercially available products of latent antioxidants include ADEKA ARKULS GPA-5001 (manufactured by ADEKA Corporation).
- the storage container for the composition of the present invention is not particularly limited, and a known storage container can be used.
- a storage container for the purpose of suppressing impurities from being mixed into raw materials and compositions, a multi-layer bottle in which the inner wall of the container is composed of 6 types and 6 layers of resin and a bottle in which 6 types of resin are composed of 7 layers are used. It is also preferable to use it. Examples of such a container include the container described in Japanese Patent Application Laid-Open No. 2015-123351.
- the inner wall of the container is preferably made of glass or stainless steel for the purpose of preventing metal elution from the inner wall of the container, improving the stability of the composition over time, and suppressing the deterioration of the components.
- composition of the present invention can be prepared by mixing the above-mentioned components.
- all the components may be dissolved or dispersed in a solvent at the same time to prepare the composition, or if necessary, two or more solutions or dispersions in which each component is appropriately mixed may be prepared in advance. They may be prepared and mixed at the time of use (at the time of application) to prepare a composition.
- a process of dispersing the pigment may be included.
- the mechanical force used for dispersing the pigment includes compression, squeezing, impact, shearing, cavitation and the like.
- Specific examples of these processes include bead mills, sand mills, roll mills, ball mills, paint shakers, microfluidizers, high speed impellers, sand grinders, flow jet mixers, high pressure wet atomization, ultrasonic dispersion and the like.
- the process and disperser for dispersing pigments are "Dispersion Technology Complete Works, Published by Information Organization Co., Ltd., July 15, 2005" and "Dispersion technology centered on suspension (solid / liquid dispersion system) and industrial". Practical application The process and disperser described in Paragraph No. 0022 of Japanese Patent Application Laid-Open No.
- the pigment may be miniaturized in the salt milling step.
- the materials, equipment, processing conditions, etc. used in the salt milling step for example, the descriptions in JP-A-2015-194521 and JP-A-2012-046629 can be referred to.
- any filter that has been conventionally used for filtration or the like can be used without particular limitation.
- fluororesins such as polytetrafluoroethylene (PTFE) and polyvinylidene fluoride (PVDF), polyamide resins such as nylon (eg, nylon-6, nylon-6,6), and polyolefin resins such as polyethylene and polypropylene (PP).
- PTFE polytetrafluoroethylene
- PVDF polyvinylidene fluoride
- nylon eg, nylon-6, nylon-6,6)
- polyolefin resins such as polyethylene and polypropylene (PP).
- filters using materials such as (including high-density, ultra-high molecular weight polyethylene resin).
- polypropylene (including high-density polypropylene) and nylon are preferable.
- the pore diameter of the filter is preferably 0.01 to 7.0 ⁇ m, more preferably 0.01 to 3.0 ⁇ m, and even more preferably 0.05 to 0.5 ⁇ m. If the pore diameter of the filter is within the above range, fine foreign matter can be removed more reliably.
- the nominal value of the filter manufacturer can be referred to.
- various filters provided by Nippon Pole Co., Ltd. DFA4201NXEY, DFA4201NAEY, DFA4201J006P, etc.
- Advantech Toyo Co., Ltd. Japan Entegris Co., Ltd. (formerly Nippon Microlith Co., Ltd.), KITZ Microfilter Co., Ltd., etc.
- KITZ Microfilter Co., Ltd. etc.
- a fiber-like filter medium As the filter.
- the fiber-like filter medium include polypropylene fiber, nylon fiber, glass fiber and the like.
- examples of commercially available products include SBP type series (SBP008, etc.), TPR type series (TPR002, TPR005, etc.) and SHPX type series (SHPX003, etc.) manufactured by Roki Techno Co., Ltd.
- filters for example, a first filter and a second filter
- the filtration with each filter may be performed only once or twice or more.
- filters having different pore diameters may be combined within the above-mentioned range.
- the filtration with the first filter may be performed only on the dispersion liquid, and after mixing the other components, the filtration may be performed with the second filter.
- the film of the present invention is obtained from the above-mentioned composition of the present invention.
- the film of the present invention can be preferably used as an optical filter.
- the use of the optical filter is not particularly limited, and examples thereof include an infrared cut filter and an infrared transmission filter.
- the infrared cut filter include an infrared cut filter on the light receiving side of the solid-state image sensor (for example, for an infrared cut filter for a wafer level lens) and an infrared cut filter on the back surface side (opposite to the light receiving side) of the solid-state image sensor.
- Infrared cut filter for ambient light sensor for example, an illuminance sensor that adjusts the color tone of the display by detecting the illuminance and color tone of the environment where the information terminal device is placed, and a color correction sensor that adjusts the color tone. Be done. In particular, it can be preferably used as an infrared cut filter on the light receiving side of the solid-state image sensor. Examples of the infrared transmission filter include a filter that shields visible light and can selectively transmit infrared rays having a specific wavelength or higher.
- the average value of the transmittance of light having a wavelength of 800 nm or more and less than 1000 nm is less than 10%, and the average value of the transmittance of light having a wavelength of 1000 nm or more and less than 1500 nm is less than 5%.
- the average value of the transmittance of light having a wavelength of 800 nm or more and less than 1000 nm is preferably less than 5%, more preferably less than 3%, and even more preferably less than 1%.
- the average value of the transmittance of light having a wavelength of 1000 nm or more and less than 1500 nm is preferably less than 3%, more preferably less than 2%, and even more preferably less than 1%.
- the average value of the transmittance of light having a wavelength of 1500 nm or more and less than 2000 nm is preferably less than 10%, and more preferably less than 5%.
- the film of the present invention may have a pattern or may be a film without a pattern (flat film). Further, the film of the present invention may be laminated on a support and used, or the film of the present invention may be peeled off from the support and used. Examples of the support include a semiconductor base material such as a silicon substrate and a transparent base material.
- a charge-coupled device (CCD), a complementary metal oxide semiconductor (CMOS), a transparent conductive film, or the like may be formed on the semiconductor base material used as the support. Further, a black matrix that separates each pixel may be formed on the semiconductor base material. Further, a base layer may be formed on the surface of the semiconductor base material. The surface contact angle of the base layer is preferably 20 to 70 ° when measured with diiodomethane. Further, it is preferably 30 to 80 ° when measured with water.
- the transparent base material used as a support is not particularly limited as long as it is made of a material capable of transmitting at least visible light.
- a base material made of a material such as glass or resin can be mentioned.
- the resin include polyester resins such as polyethylene terephthalate and polybutylene terephthalate, polyolefin resins such as polyethylene, polypropylene and ethylene vinyl acetate copolymers, norbornene resins, polyacrylates and acrylic resins such as polymethylmethacrylate, urethane resins and vinyl chloride resins. , Fluorine resin, polycarbonate resin, polyvinyl butyral resin, polyvinyl alcohol resin and the like.
- Examples of the glass include soda lime glass, borosilicate glass, non-alkali glass, quartz glass, and glass containing copper.
- Examples of the copper-containing glass include copper-containing phosphate glass and copper-containing fluoride glass.
- As the glass containing copper a commercially available product can also be used. Examples of commercially available copper-containing glass include NF-50 (manufactured by AGC Technoglass Co., Ltd.) and the like.
- the thickness of the film of the present invention can be appropriately adjusted according to the purpose.
- the thickness of the film is preferably 20 ⁇ m or less, more preferably 10 ⁇ m or less, still more preferably 5 ⁇ m or less.
- the lower limit of the film thickness is preferably 0.1 ⁇ m or more, more preferably 0.2 ⁇ m or more.
- the film of the present invention can also be used in combination with a color filter containing a chromatic colorant.
- the color filter can be produced by using a coloring composition containing a chromatic colorant.
- the color filter is arranged on the optical path of the film of the present invention.
- the film of the present invention may be formed on a support different from the support on which the color filter is formed.
- Other members for example, a microlens, a flattening layer, etc. constituting the solid-state image sensor may be interposed between the film and the color filter.
- the film of the present invention can be used for solid-state image pickup devices such as CCD (charge-coupled device) and CMOS (complementary metal oxide semiconductor), and various devices such as infrared sensors and image display devices.
- CCD charge-coupled device
- CMOS complementary metal oxide semiconductor
- the film of the present invention can be produced through a step of applying the composition of the present invention.
- Examples of the support include those described above.
- a method for applying the composition a known method can be used. For example, a drop method (drop cast); a slit coat method; a spray method; a roll coat method; a rotary coating method (spin coating); a cast coating method; a slit and spin method; a pre-wet method (for example, JP-A-2009-145395). Methods described in the publication); Inkjet (for example, on-demand method, piezo method, thermal method), ejection system printing such as nozzle jet, flexographic printing, screen printing, gravure printing, reverse offset printing, metal mask printing, etc. Various printing methods; transfer method using a mold or the like; nano-imprint method and the like can be mentioned.
- the method of application in inkjet is not particularly limited, and is, for example, the method shown in "Expandable / usable inkjet-infinite possibilities seen in patents-, published in February 2005, Sumi Betechno Research" (especially from page 115). Page 133), JP-A-2003-262716, JP-A-2003-185831, JP-A-2003-261827, JP-A-2012-126830, JP-A-2006-169325, and the like. Can be mentioned.
- the composition layer formed by applying the composition may be dried (prebaked).
- the prebake temperature is preferably 150 ° C. or lower, more preferably 120 ° C. or lower, still more preferably 110 ° C. or lower.
- the lower limit can be, for example, 50 ° C. or higher, or 80 ° C. or higher.
- the prebake time is preferably 10 seconds to 3000 seconds, more preferably 40 to 2500 seconds, and even more preferably 80 to 220 seconds. Drying can be performed on a hot plate, an oven, or the like.
- the film manufacturing method may further include a step of forming a pattern.
- the pattern forming method include a pattern forming method using a photolithography method and a pattern forming method using a dry etching method, and a pattern forming method using a photolithography method is preferable.
- the film of the present invention is used as a flat film, it is not necessary to perform the step of forming a pattern.
- the process of forming the pattern will be described in detail.
- the pattern forming method in the photolithography method includes a step of exposing the composition layer formed by applying the composition of the present invention in a pattern (exposure step) and developing and removing the composition layer of the unexposed portion. It is preferable to include a step of forming a pattern (development step). If necessary, a step of baking the developed pattern (post-baking step) may be provided. Hereinafter, each step will be described.
- the composition layer is exposed in a pattern.
- the composition layer can be exposed in a pattern by exposing the composition layer through a mask having a predetermined mask pattern using a stepper exposure machine, a scanner exposure machine, or the like. As a result, the exposed portion can be cured.
- Examples of radiation (light) that can be used for exposure include g-line and i-line. Further, light having a wavelength of 300 nm or less (preferably light having a wavelength of 180 to 300 nm) can also be used. Examples of the light having a wavelength of 300 nm or less include KrF line (wavelength 248 nm) and ArF line (wavelength 193 nm), and KrF line (wavelength 248 nm) is preferable. Further, a long wave light source having a diameter of 300 nm or more can also be used.
- pulse exposure is an exposure method of a method in which light irradiation and pause are repeated in a cycle of a short time (for example, a millisecond level or less).
- the irradiation amount is, for example, preferably 0.03 to 2.5 J / cm 2 , more preferably 0.05 to 1.0 J / cm 2 .
- the oxygen concentration at the time of exposure can be appropriately selected, and in addition to the oxygen concentration performed in the atmosphere, for example, in a low oxygen atmosphere having an oxygen concentration of 19% by volume or less (for example, 15% by volume, 5% by volume, or substantially). It may be exposed in an oxygen-free environment), or may be exposed in a high oxygen atmosphere (for example, 22% by volume, 30% by volume, or 50% by volume) in which the oxygen concentration exceeds 21% by volume.
- the exposure illuminance can be set as appropriate, and is usually selected from the range of 1000 W / m 2 to 100,000 W / m 2 (for example, 5000 W / m 2 , 15,000 W / m 2 , or 35,000 W / m 2 ). Can be done.
- the oxygen concentration and the exposure illuminance may be appropriately combined with each other, and for example, the illuminance may be 10,000 W / m 2 when the oxygen concentration is 10% by volume, the illuminance may be 20000 W / m 2 when the oxygen concentration is 35% by volume, and the like.
- the composition layer in the unexposed portion of the exposed composition layer is developed and removed to form a pattern.
- the development and removal of the composition layer in the unexposed portion can be performed using a developing solution.
- the composition layer of the unexposed portion in the exposure step is eluted in the developer, and only the photocured portion remains on the support.
- the temperature of the developer is preferably, for example, 20 to 30 ° C.
- the development time is preferably 20 to 180 seconds. Further, in order to improve the residue removability, the steps of shaking off the developer every 60 seconds and supplying a new developer may be repeated several times.
- Examples of the developing solution include organic solvents and alkaline developing solutions, and alkaline developing solutions are preferably used.
- the alkaline developer an alkaline aqueous solution (alkaline developer) obtained by diluting an alkaline agent with pure water is preferable.
- the alkaline agent include ammonia, ethylamine, diethylamine, dimethylethanolamine, diglycolamine, diethanolamine, hydroxyamine, ethylenediamine, tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, and tetrabutylammonium hydroxide.
- Ethyltrimethylammonium hydroxide Ethyltrimethylammonium hydroxide, benzyltrimethylammonium hydroxide, dimethylbis (2-hydroxyethyl) ammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo [5.4.0] -7-undecene and other organic substances.
- alkaline compounds examples include alkaline compounds and inorganic alkaline compounds such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, sodium silicate and sodium metasilicate.
- the alkaline agent a compound having a large molecular weight is preferable in terms of environment and safety.
- the concentration of the alkaline agent in the alkaline aqueous solution is preferably 0.001 to 10% by mass, more preferably 0.01 to 1% by mass.
- the developer may further contain a surfactant.
- a surfactant a nonionic surfactant is preferable.
- the developer may be once produced as a concentrated solution and diluted to a concentration required for use.
- the dilution ratio is not particularly limited, but can be set in the range of, for example, 1.5 to 100 times. It is also preferable to wash (rinse) with pure water after development.
- the rinsing is performed by supplying the rinsing liquid to the developed composition layer while rotating the support on which the developed composition layer is formed. It is also preferable to move the nozzle for discharging the rinse liquid from the central portion of the support to the peripheral edge of the support. At this time, when moving the nozzle from the central portion of the support to the peripheral portion, the nozzle may be moved while gradually reducing the moving speed. By rinsing in this way, in-plane variation of the rinse can be suppressed. Further, the same effect can be obtained by gradually reducing the rotation speed of the support while moving the nozzle from the central portion of the support to the peripheral portion.
- Additional exposure processing and post-baking are post-development curing treatments to complete the curing.
- the heating temperature in the post-bake is, for example, preferably 100 to 240 ° C, more preferably 200 to 240 ° C.
- Post-baking can be performed continuously or in batch using a heating means such as a hot plate, a convection oven (hot air circulation type dryer), or a high frequency heater so that the above conditions are met for the developed film. can.
- the light used for the exposure is preferably light having a wavelength of 400 nm or less. Further, the additional exposure process may be performed by the method described in Korean Patent Publication No. 10-2017-0122130.
- the composition layer formed by applying the above composition on the support is cured to form a cured product layer, and then the photoresist layer patterned on the cured product layer is formed. Then, using the patterned photoresist layer as a mask, the cured product layer can be dry-etched with an etching gas. In forming the photoresist layer, it is preferable to perform a prebaking treatment.
- the description in paragraphs 0010 to 0067 of JP2013-064993 can be referred to, and this content is incorporated in the present specification.
- the optical filter of the present invention has the above-mentioned film of the present invention.
- Examples of the optical filter include an infrared cut filter and an infrared transmission filter.
- the optical filter of the present invention may further have a copper-containing layer, a dielectric multilayer film, an ultraviolet absorbing layer, and the like, in addition to the film of the present invention described above.
- the ultraviolet absorbing layer include the absorbing layer described in paragraphs 0040 to 0070 and 0119 to 0145 of International Publication No. 2015/09960.
- the dielectric multilayer film include the dielectric multilayer films described in paragraphs 0255 to 0259 of JP-A-2014-041318.
- a glass substrate made of copper-containing glass (copper-containing glass substrate) or a layer containing a copper complex (copper complex-containing layer) can also be used.
- Examples of the copper-containing glass substrate include copper-containing phosphate glass and copper-containing fluoride glass.
- Examples of commercially available copper-containing glass products include NF-50 (manufactured by AGC Techno Glass Co., Ltd.), BG-60, BG-61 (all manufactured by Schott AG), CD5000 (manufactured by HOYA Corporation), and the like.
- the solid-state image sensor of the present invention includes the film of the present invention described above.
- the configuration of the solid-state image sensor is not particularly limited as long as it has the film of the present invention and functions as a solid-state image sensor. For example, the following configuration can be mentioned.
- a transfer electrode made of a plurality of photodiodes and polysilicon etc. constituting the light receiving area of the solid-state image sensor, and the light shielding part made of tungsten or the like having only the light receiving portion of the photodiode opened on the photodiode and the transfer electrode.
- It has a film, has a device protective film made of silicon nitride or the like formed so as to cover the entire surface of the light-shielding film and the photodiode light-receiving part on the light-shielding film, and has the film of the present invention on the device protective film.
- a configuration having a condensing means for example, a microlens or the like; the same applies hereinafter) on the device protective film under the film of the present invention (on the side closer to the support), or condensing on the film of the present invention.
- the color filter may have a structure in which a film forming each pixel is embedded in a space partitioned by a partition wall, for example, in a grid pattern.
- the partition wall preferably has a lower refractive index than each pixel. Examples of the image pickup apparatus having such a structure include the apparatus described in JP-A-2012-227478 and JP-A-2014-179757.
- the image display device of the present invention includes the film of the present invention.
- Examples of the image display device include a liquid crystal display device and an organic electroluminescence (organic EL) display device.
- organic EL organic electroluminescence
- the image display device for example, “Electronic Display Device (Akio Sasaki, Kogyo Chosakai Co., Ltd., published in 1990)", “Display Device (Junaki Ibuki, Sangyo Tosho Co., Ltd., 1989)” Issuance) ”and so on.
- the liquid crystal display device is described in, for example, “Next Generation Liquid Crystal Display Technology (edited by Tatsuo Uchida, Kogyo Chosakai Co., Ltd., published in 1994)”.
- the liquid crystal display device to which the present invention can be applied is not particularly limited, and can be applied to, for example, various types of liquid crystal display devices described in the above-mentioned "next-generation liquid crystal display technology".
- the image display device may have a white organic EL element.
- the white organic EL element preferably has a tandem structure.
- Japanese Patent Application Laid-Open No. 2003-045676 supervised by Akiyoshi Mikami, "Frontiers of Organic EL Technology Development-High Brightness, High Precision, Long Life, Know-how Collection-", Technical Information Association, It is described on pages 326 to 328, 2008 and the like.
- the spectrum of white light emitted by the organic EL element preferably has a strong maximum emission peak in the blue region (430 to 485 nm), the green region (530 to 580 nm), and the yellow region (580 to 620 nm). In addition to these emission peaks, those having a maximum emission peak in the red region (650 to 700 nm) are more preferable.
- the infrared sensor of the present invention includes the film of the present invention described above.
- the configuration of the infrared sensor is not particularly limited as long as it functions as an infrared sensor.
- an embodiment of the infrared sensor of the present invention will be described with reference to the drawings.
- reference numeral 110 is a solid-state image sensor.
- An infrared cut filter 111 and an infrared transmission filter 114 are arranged on the image pickup region of the solid-state image sensor 110.
- a color filter 112 is arranged on the infrared cut filter 111.
- a microlens 115 is arranged on the incident light h ⁇ side of the color filter 112 and the infrared transmission filter 114.
- the flattening layer 116 is formed so as to cover the microlens 115.
- the infrared cut filter 111 can be formed by using the composition of the present invention.
- the color filter 112 is a color filter on which pixels that transmit and absorb light having a specific wavelength in the visible region are formed, and is not particularly limited, and a conventionally known color filter for pixel formation can be used. For example, a color filter in which red (R), green (G), and blue (B) pixels are formed is used. For example, the description in paragraphs 0214 to 0263 of JP2014-043556 can be referred to, and this content is incorporated in the present specification.
- the characteristics of the infrared transmission filter 114 are selected according to the emission wavelength of the infrared LED used.
- the infrared transmission filter 114 can be formed by using the composition of the present invention.
- an infrared cut filter (another infrared cut filter) different from the infrared cut filter 111 may be further arranged on the flattening layer 116.
- Other infrared cut filters include those having a copper-containing layer and / or a dielectric multilayer film. These details include those mentioned above. Further, as another infrared cut filter, a dual bandpass filter may be used.
- Bu represents a butyl group
- Ph represents a phenyl group
- Mes represents a 2,4,6-trimethylphenyl group (mesitylene group)
- Tf represents a trifluoromethylsulfonyl group.
- a column temperature of 40 ° C. 10 ⁇ L of a tetrahydrofuran solution having a sample concentration of 0.1% by mass was injected into the column, and tetrahydrofuran was flown as an elution solvent at a flow rate of 0.35 mL / min, and RI (differential refractometer) was applied.
- the sample peak was detected by a detector, and the calculation was performed using a calibration curve prepared using standard polystyrene.
- Dispersion IR1 2 parts by mass of compound A103 (infrared absorber, maximum absorption wavelength 960 nm) having the following structure, 0.4 parts by mass of pigment derivative IS-2, 1.6 parts by mass of dispersant D-2, and propylene glycol monomethyl.
- Dispersion IR2 2 parts by mass of compound A105 (infrared absorber, maximum absorption wavelength 810 nm) having the following structure, 0.4 parts by mass of pigment derivative B1, 1.6 parts by mass of dispersant D-1, and propylene glycol monomethyl ether acetate. Mix and disperse 6 parts by mass with a bead mill (high pressure disperser with decompression mechanism NANO-3000-10 (manufactured by Nippon BEE Co., Ltd.)) using zirconia beads having a diameter of 0.3 mm for 3 hours. The dispersion IR2 was prepared.
- Dispersion IR3 2 parts by mass of compound 106 (infrared absorber, maximum absorption wavelength 830 nm) having the following structure, 0.4 parts by mass of pigment derivative IS-6, 1.6 parts by mass of dispersant D-1, and propylene glycol monomethyl.
- Dispersion Bk1 12.59 parts by mass of Irgaphor Black (BASF, black colorant), 4.4 parts by mass of dispersant D-3, and 83.01 parts by mass of propylene glycol monomethyl ether acetate are mixed and 0.3 mm.
- a dispersion liquid Bk1 was prepared by mixing and dispersing for 3 hours with a bead mill (high pressure disperser NANO-3000-10 with decompression mechanism (manufactured by Nippon BEE Co., Ltd.)).
- Dispersion Blue1 C. I. 12.59 parts by mass of Pigment Blue 16 (blue colorant), 4.4 parts by mass of dispersant D-3, and 83.01 parts by mass of propylene glycol monomethyl ether acetate are mixed, and zirconia having a diameter of 0.3 mm is mixed.
- a dispersion liquid Blue1 was prepared by mixing and dispersing for 3 hours with a bead mill (high pressure disperser NANO-3000-10 with decompression mechanism (manufactured by Nippon BEE Co., Ltd.)).
- Dispersion Yellow1 11 parts by mass of the metal azo pigment 1 (yellow colorant) described later, 1.59 parts by mass of the pigment derivative B1, 4.4 parts by mass of the dispersant D-3, and 83.01 parts of propylene glycol monomethyl ether acetate. Mix parts by mass and mix and disperse for 3 hours with a bead mill (high pressure disperser NANO-3000-10 with decompression mechanism (manufactured by Nippon BEE Co., Ltd.)) using zirconia beads having a diameter of 0.3 mm. The dispersion Yellow1 was prepared.
- Metal azo pigment 1 Metal azo pigment 1 produced by the following method 46.2 g of diazobarbituric acid and 38.4 g of barbituric acid were added to 1100 g of distilled water at 85 ° C. Next, an aqueous potassium hydroxide solution was added to this solution to adjust the pH to about 5, and then the mixture was stirred for 90 minutes to produce an azobarbituric acid precursor. Then, 1500 g of distilled water at 82 ° C. was added to the above-mentioned azobarbituric acid precursor. Then, 10 g of 30% hydrochloric acid was added dropwise. Then 79.4 g of melamine was added.
- a mixture of 0.282 mol of about 25% zinc chloride solution and 0.0015 mol of about 30% copper (II) chloride solution was then added dropwise. Then, the solution to which these were added was kept at a temperature of 82 ° C. for 3 hours, and then KOH was added to adjust the pH to about 5.5. Then, the temperature of this solution was raised to 90 ° C., and 100 g of distilled water was added to dilute the solution while maintaining the temperature at 90 ° C. Then, 21 g of 30% hydrochloric acid was added dropwise to this solution, and then heat-treated at a temperature of 90 ° C. for 12 hours. Next, an aqueous potassium hydroxide solution was added to the solution after the heat treatment to adjust the pH to about 5. The pigment was then isolated from this solution on a suction filter, washed, dried in a vacuum drying cabinet at 80 ° C. and then ground in a standard laboratory mill for about 2 minutes to produce the metal azo pigment 1.
- Pigment derivative IS-2 A compound having the following structure
- Pigment derivative IS-6 A compound having the following structure
- Pigment derivative B1 A compound having the following structure
- Dispersant D-1 Resin having the following structure (the numerical value added to the main chain is the molar ratio, and the numerical value added to the side chain is the number of repeating units. Weight average molecular weight 24000).
- Dispersant D-2 Resin having the following structure (the numerical value added to the main chain is the molar ratio, and the numerical value added to the side chain is the number of repeating units. Weight average molecular weight 21000)
- Dispersant D-3 Resin having the following structure (the numerical value added to the main chain is the molar ratio, and the numerical value added to the side chain is the number of repeating units. Weight average molecular weight 24000).
- composition Materials other than the solvents shown in the table below are mixed at the ratio shown in the table below, and the solvent shown in the table below is added to adjust the solid content concentration to 20% by mass, and then the mixture is stirred to make nylon with a pore size of 0.45 ⁇ m.
- the composition was prepared by filtering with a filter (manufactured by Nippon Pole Co., Ltd.).
- the numerical value in the compounding amount column in the table is the value of the mass part in the solid content conversion value.
- A101 Compound A101 having the following structure (maximum absorption wavelength 1090 nm)
- A102 Compound A102 having the following structure (maximum absorption wavelength 790 nm)
- A104 Compound A104 having the following structure (maximum absorption wavelength 800 nm)
- B001 Polymethyl methacrylate (weight average molecular weight 24000, dispersion 1.8, glass transition temperature 75 ° C)
- B002 Resin having the following structure (resin having an acid group. The numerical value added to the main chain is the molar ratio of the repeating unit. Weight average molecular weight 20000, dispersity 1.9, glass transition temperature 100 ° C.)
- B003 Resin having the following structure (resin having an acid group. The numerical value added to the main chain is the molar ratio of the repeating unit, weight average molecular weight 15000, dispersion degree 2.1, glass transition temperature 120 ° C.).
- B004 Resin having the following structure (polyimide resin, weight average molecular weight 25000, dispersity 2.2, glass transition temperature 310 ° C.)
- M-1 Aronix M-305 (Mixture of pentaerythritol triacrylate and pentaerythritol tetraacrylate manufactured by Toagosei Co., Ltd. The content of pentaerythritol triacrylate is 55% by mass to 63% by mass).
- M-2 KAYARAD RP-1040 (manufactured by Nippon Kayaku Co., Ltd., ethylene oxide-modified pentaerythritol tetraacrylate)
- M-3 Aronix M-510 (manufactured by Toagosei Co., Ltd., polybasic acid-modified acrylic oligomer)
- C-1 Irgure OXE01 (BASF, oxime ester-based initiator)
- C-2 Irgure OXE02 (BASF, oxime ester-based initiator)
- F-1 Megafuck RS-72-K (manufactured by DIC Corporation, fluorine-based surfactant)
- F-2 Compound with the following structure (weight average molecular weight 14000,% value indicating the ratio of repeating units is mol%)
- F-3 KF-6001 (manufactured by Shin-Etsu Chemical Co., Ltd., both-terminal carbinol-modified polydimethylsiloxane, hydroxyl value 62 mgKOH / g)
- U-1 Uvinul3050 (made by BASF, UV absorber)
- U-2 Tinuvin477 (made by BASF, hydroxyphenyltriazine-based UV absorber)
- U-3 Tinuvin326 (made by BASF, UV absorber)
- the transmittance in the wavelength range of 400 to 2000 nm was measured using an ultraviolet-visible near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Tech Co., Ltd.), and the wavelength was 800 nm.
- Average transmittance in the range of 1000 nm or more (average transmittance 1), average transmittance in the wavelength range of 1000 nm or more and less than 1500 nm (average transmittance 2), and average transmittance in the wavelength range of 1500 nm or more and less than 2000 nm.
- the values (average transmittance 3) were obtained, and the infrared shielding property was evaluated according to the following criteria.
- B The average value of transmittance is 5% or more and less than 10%
- C The average value of transmittance is 10% or more
- the transmittance of the glass substrate on which the above film was formed was measured in the wavelength range of 400 to 2000 nm using an ultraviolet-visible near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Technologies Corporation). Next, the glass substrate on which the above film was formed was irradiated with light at 100,000 lux for 20 hours (equivalent to 2 million lux ⁇ h) using a xenon lamp, and then the transmittance of the film after irradiation with the xenon lamp was measured. ..
- the amount of change in transmittance ( ⁇ T1) at each wavelength in the wavelength range of 800 to 2000 nm before and after irradiation with a xenon lamp was determined, and the light resistance was evaluated according to the following criteria based on the largest value of ⁇ T1 in the entire measurement wavelength range. .. The smaller the value of ⁇ T1, the better the light resistance.
- Change of transmittance ( ⁇ T1)
- the transmittance of the glass substrate on which the above film was formed was measured in the wavelength range of 400 to 1600 nm using an ultraviolet-visible near-infrared spectrophotometer (U-4100, manufactured by Hitachi High-Technologies Corporation). Next, the glass substrate on which the above film was formed was heated at 200 ° C. for 10 minutes using a hot plate.
- the amount of change in transmittance ( ⁇ T2) at each wavelength in the wavelength range of 1000 to 1500 nm before and after heating was determined, and the heat resistance was evaluated according to the following criteria based on the largest value of ⁇ T2 in the entire measurement wavelength range. The smaller the value of ⁇ T2, the better the heat resistance.
- a pattern (pixel) was formed by heating at 200 ° C. for 5 minutes on a hot plate.
- the glass substrate on which the pixels were formed was observed with a microscope at a magnification of 10000 times, and the pattern forming property was evaluated according to the following evaluation criteria.
- the composition of the example was able to form a film having excellent heat resistance, light resistance and infrared shielding property.
- 110 Solid-state image sensor
- 111 Infrared cut filter
- 112 Color filter
- 114 Infrared transmission filter
- 115 Microlens
- 116 Flattening layer
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Abstract
Description
上記赤外線吸収剤は、式(1)で表される化合物と、上記式(1)で表される化合物以外の化合物を含む、組成物;
Y11~Y16は、それぞれ独立して、窒素原子またはCRY11を表し、RY11は水素原子または置換基を表し、
X11およびX12は、それぞれ独立して、窒素原子またはCRX11を表し、RX11は水素原子または置換基を表し、
Z11~Z14は、それぞれ独立して、炭素原子または窒素原子を表し、
M11およびM12はそれぞれ独立して配位子が配位していてもよい金属原子を表し、
Z11とM11との間に点線で示されている結合は、Z11が炭素原子の場合は共有結合を表し、Z11が窒素原子の場合は配位結合または共有結合を表し、
Z12とM12との間に点線で示されている結合は、Z12が炭素原子の場合は共有結合を表し、Z12が窒素原子の場合は配位結合または共有結合を表し、
Z13とM12との間に点線で示されている結合は、Z13が炭素原子の場合は共有結合を表し、Z13が窒素原子の場合は配位結合または共有結合を表し、
Z14とM11との間に点線で示されている結合は、Z14が炭素原子の場合は共有結合を表し、Z14が窒素原子の場合は配位結合または共有結合を表し、
M11とNとの間の点線で示されている結合は、配位結合または共有結合を表し、
M12とNとの間の点線で示されている結合は、配位結合または共有結合を表す。
<2> 上記式(1)で表される化合物以外の化合物は、上記式(1)で表される化合物よりも短波長側に極大吸収波長が存在する化合物である、<1>に記載の組成物。
<3> 上記式(1)で表される化合物は、式(1-1)で表される化合物および式(1-2)で表される化合物から選ばれる少なくとも1種である、<1>または<2>に記載の組成物;
Y11~Y16は、それぞれ独立して、窒素原子またはCRY11を表し、RY11は水素原子または置換基を表し、
X11およびX12は、それぞれ独立して、窒素原子またはCRX11を表し、RX11は水素原子または置換基を表し、
M11およびM12はそれぞれ独立して配位子が配位していてもよい金属原子を表し、
M11とNとの間の点線で示されている結合は配位結合を表し、実線で示されている結合は共有結合を表し、
M12とNとの間の点線で示されている結合は配位結合を表し、実線で示されている結合は共有結合を表す。
<4> 上記式(1)で表される化合物の極大吸収波長は、波長1200~1500nmの範囲に存在する、<1>~<3>のいずれか1つに記載の組成物。
<5> 赤外線吸収剤と、硬化性化合物とを含有する組成物であって、
上記赤外線吸収剤は、金属原子に、上記金属原子の外周で共鳴可能な最短の環を構成するπ電子数が(4n+2)個であるポルフィリン化合物が配位した金属錯体と、上記金属錯体以外の化合物を含む組成物;
nは6~15の整数である。
<6> 上記金属錯体以外の化合物は、上記金属錯体よりも短波長側に極大吸収波長が存在する化合物である、<5>に記載の組成物。
<7> 上記金属錯体の極大吸収波長は、波長1200~1500nmの範囲に存在する、<5>または<6>に記載の組成物。
<8> 上記硬化性化合物は、酸基を有する樹脂を含む、<1>~<7>のいずれか1つに記載の組成物。
<9> 上記硬化性化合物は、重合性化合物を含む、<1>~<8>のいずれか1つに記載の組成物。
<10> 上記硬化性化合物は、ガラス転移温度が150℃以上の樹脂を含む、<1>~<9>のいずれか1つに記載の組成物。
<11> <1>~<10>のいずれか1つに記載の組成物を用いて得られる膜。
<12> <11>に記載の膜を含む光学フィルタ。
<13> <11>に記載の膜を含む固体撮像素子。
<14> <11>に記載の膜を含む画像表示装置。
<15> <11>に記載の膜を含む赤外線センサ。
本明細書において、「~」とはその前後に記載される数値を下限値および上限値として含む意味で使用される。
本明細書における基(原子団)の表記において、置換および無置換を記していない表記は、置換基を有さない基(原子団)と共に置換基を有する基(原子団)をも包含する。例えば、「アルキル基」とは、置換基を有さないアルキル基(無置換アルキル基)のみならず、置換基を有するアルキル基(置換アルキル基)をも包含する。
本明細書において「露光」とは、特に断らない限り、光を用いた露光のみならず、電子線、イオンビーム等の粒子線を用いた描画も露光に含める。また、露光に用いられる光としては、水銀灯の輝線スペクトル、エキシマレーザに代表される遠紫外線、極紫外線(EUV光)、X線、電子線等の活性光線または放射線が挙げられる。
本明細書において、「(メタ)アクリレート」は、アクリレートおよびメタクリレートの双方、または、いずれかを表し、「(メタ)アクリル」は、アクリルおよびメタクリルの双方、または、いずれかを表し、「(メタ)アクリロイル」は、アクリロイルおよびメタクリロイルの双方、または、いずれかを表す。
本明細書において、重量平均分子量および数平均分子量は、ゲルパーミエーションクロマトグラフィ(GPC)測定でのポリスチレン換算値として定義される。
本明細書において、化学式中のMeはメチル基を表し、Etはエチル基を表し、Buはブチル基を表し、Phはフェニル基を表す。
本明細書において、赤外線とは、波長700~2500nmの光(電磁波)をいう。
本明細書において、全固形分とは、組成物の全成分から溶剤を除いた成分の総質量をいう。
本明細書において、顔料とは、溶剤に対して溶解しにくい色材を意味する。
本明細書において「工程」との語は、独立した工程だけではなく、他の工程と明確に区別できない場合であってもその工程の所期の作用が達成されれば、本用語に含まれる。
本発明の組成物の第1の態様は、赤外線吸収剤と、硬化性化合物とを含有する組成物であって、赤外線吸収剤は、式(1)で表される化合物と、式(1)で表される化合物以外の化合物を含むことを特徴とする。
また、本発明の組成物の第2の態様は、赤外線吸収剤と、硬化性化合物とを含有する組成物であって、赤外線吸収剤は、金属原子に、金属原子の外周で共鳴可能な最短の環を構成するπ電子数が(4n+2)個であるポルフィリン化合物が配位した金属錯体と、前述の金属錯体以外の化合物を含むことを特徴とする。nは6~15の整数である。
本発明の組成物は赤外線吸収剤を含む。本発明の組成物に用いられる赤外線吸収剤は、式(1)で表される化合物と、式(1)で表される化合物以外の化合物を含むか、あるいは、金属原子に、金属原子の外周で共鳴可能な最短の環を構成するπ電子数が(4n+2)個であるポルフィリン化合物(nは6~15の整数である)が配位した金属錯体を含む。以下、式(1)で表される化合物と、上述した金属錯体とを合わせて特定赤外線吸収化合物ともいう。
まず、特定赤外線吸収化合物として用いられる金属錯体について説明する。
Y11~Y16は、それぞれ独立して、窒素原子またはCRY11を表し、RY11は水素原子または置換基を表し、
X11およびX12は、それぞれ独立して、窒素原子またはCRX11を表し、RX11は水素原子または置換基を表し、
Z11~Z14は、それぞれ独立して、炭素原子または窒素原子を表し、
M11およびM12はそれぞれ独立して配位子が配位していてもよい金属原子を表し、
Z11とM11との間に点線で示されている結合は、Z11が炭素原子の場合は共有結合を表し、Z11が窒素原子の場合は配位結合または共有結合を表し、
Z12とM12との間に点線で示されている結合は、Z12が炭素原子の場合は共有結合を表し、Z12が窒素原子の場合は配位結合または共有結合を表し、
Z13とM12との間に点線で示されている結合は、Z13が炭素原子の場合は共有結合を表し、Z13が窒素原子の場合は配位結合または共有結合を表し、
Z14とM11との間に点線で示されている結合は、Z14が炭素原子の場合は共有結合を表し、Z14が窒素原子の場合は配位結合または共有結合を表し、
M11とNとの間の点線で示されている結合は、配位結合または共有結合を表し、
M12とNとの間の点線で示されている結合は、配位結合または共有結合を表す。
第1の態様:X11およびX12が炭素原子であり、Z11およびZ12のいずれか一方が炭素原子で、他方が窒素原子であり、Z13およびZ14のいずれか一方が炭素原子で、他方が窒素原子である態様。
第2の態様:X11およびX12が窒素原子で、Z11~Z14が炭素原子である態様。
式(1)のM11が表す金属原子とM12が表す金属原子は、異なっていてもよいが製造の容易性の観点から同一であることが好ましい。
Y11~Y16は、それぞれ独立して、窒素原子またはCRY11を表し、RY11は水素原子または置換基を表し、
X11およびX12は、それぞれ独立して、窒素原子またはCRX11を表し、RX11は水素原子または置換基を表し、
M11およびM12はそれぞれ独立して配位子が配位していてもよい金属原子を表し、
M11とNとの間の点線で示されている結合は配位結合を表し、実線で示されている結合は共有結合を表し、
M12とNとの間の点線で示されている結合は配位結合を表し、実線で示されている結合は共有結合を表す。
X11およびX12は、それぞれ独立して、窒素原子またはCRX11を表し、RX11は水素原子または置換基を表し、
RAr1~RAr4は、それぞれ独立して置換基を表し、RAr1~RAr4はRY11と結合して環を形成していてもよく、
n1~n4はそれぞれ独立して0~2の整数を表し、
n1が2の場合、2個のRAr1同士は結合して環を形成していてもよく、
n2が2の場合、2個のRAr2同士は結合して環を形成していてもよく、
n3が2の場合、2個のRAr3同士は結合して環を形成していてもよく、
n4が2の場合、2個のRAr4同士は結合して環を形成していてもよく、
M11およびM12はそれぞれ独立して配位子が配位していてもよい金属原子を表し、
M11とNとの間の点線で示されている結合は配位結合を表し、実線で示されている結合は共有結合を表し、
M12とNとの間の点線で示されている結合は配位結合を表し、実線で示されている結合は共有結合を表す。
RAr1~RAr4は、それぞれ独立して置換基を表し、RAr1~RAr4はRY11と結合して環を形成していてもよく、
n1~n4はそれぞれ独立して0~2の整数を表し、
n1が2の場合、2個のRAr1同士は結合して環を形成していてもよく、
n2が2の場合、2個のRAr2同士は結合して環を形成していてもよく、
n3が2の場合、2個のRAr3同士は結合して環を形成していてもよく、
n4が2の場合、2個のRAr4同士は結合して環を形成していてもよく、
M11およびM12はそれぞれ独立して配位子が配位していてもよい金属原子を表し、
M11とNとの間の点線で示されている結合は配位結合を表し、実線で示されている結合は共有結合を表し、
M12とNとの間の点線で示されている結合は配位結合を表し、実線で示されている結合は共有結合を表す。
RAr1~RAr4は、それぞれ独立して置換基を表し、
n1~n4はそれぞれ独立して0~2の整数を表し、
n1が1または2の場合、RAr1とRY26は結合して環を形成していてもよく、
n2が1または2の場合、RAr2とRY23は結合して環を形成していてもよく、
n3が1または2の場合、RAr3とRY23は結合して環を形成していてもよく、
n4が1または2の場合、RAr4とRY26は結合して環を形成していてもよく、
n1が2の場合、2個のRAr1同士は結合して環を形成していてもよく、
n2が2の場合、2個のRAr2同士は結合して環を形成していてもよく、
n3が2の場合、2個のRAr3同士は結合して環を形成していてもよく、
n4が2の場合、2個のRAr4同士は結合して環を形成していてもよく、
M11およびM12はそれぞれ独立して配位子が配位していてもよい金属原子を表し、
M11とNとの間の点線で示されている結合は配位結合を表し、実線で示されている結合は共有結合を表し、
M12とNとの間の点線で示されている結合は配位結合を表し、実線で示されている結合は共有結合を表す。
式(1-1-3)および式(1-2-3)のRY21~RY26が表す置換基としては、上述した置換基Tとして挙げた基が挙げられ、アルキル基、アリール基またはヘテロアリール基であることが好ましく、アリール基であることがより好ましい。これらの基は、更に置換基を有してもよい。更なる置換基としては、上述した置換基Tとして挙げた基が挙げられ、ハロゲン原子、アルキル基、アルコキシ基、アリールオキシ基、アルコキシカルボニル基またはアミノカルボニル基であることが好ましい。
本発明の組成物に用いられる赤外線吸収剤は、上述した特定赤外線吸収化合物以外の化合物(以下、他の赤外線吸収化合物ともいう)を含む。
本発明の組成物は硬化性化合物を含有する。硬化性化合物としては、重合性化合物、樹脂等が挙げられる。樹脂は、非重合性の樹脂(重合性基を有さない樹脂)であってもよく、重合性の樹脂(重合性基を有する樹脂)であってもよい。重合性基としては、エチレン性不飽和結合含有基、環状エーテル基、メチロール基、アルコキシメチル基などが挙げられる。エチレン性不飽和結合含有基としては、ビニル基、ビニルフェニル基、(メタ)アリル基、(メタ)アクリロイル基、(メタ)アクリロイルオキシ基、(メタ)アクリロイルアミド基などが挙げられ、(メタ)アリル基、(メタ)アクリロイル基および(メタ)アクリロイルオキシ基が好ましく、(メタ)アクリロイルオキシ基がより好ましい。環状エーテル基としては、エポキシ基、オキセタニル基などが挙げられ、エポキシ基が好ましい。重合性化合物は重合性モノマーを含むものであることが好ましい。
重合性化合物としては、エチレン性不飽和結合含有基を有する化合物、環状エーテル基を有する化合物、メチロール基を有する化合物、アルコキシメチル基を有する化合物等が挙げられる。エチレン性不飽和結合含有基を有する化合物はラジカル重合性化合物として好ましく用いることができる。また、環状エーテル基を有する化合物は、カチオン重合性化合物として好ましく用いることができる。
本発明の組成物は、硬化性化合物として樹脂を用いることができる。硬化性化合物は、樹脂を少なくとも含むものを用いることが好ましい。樹脂は、例えば、顔料等を組成物中で分散させる用途や、バインダーの用途で配合される。なお、主に顔料等を組成物中で分散させるために用いられる樹脂を分散剤ともいう。ただし、樹脂のこのような用途は一例であって、このような用途以外を目的として樹脂を使用することもできる。なお、重合性基を有する樹脂は、重合性化合物にも該当する。
1/Tg=(W1/Tg1)+(W2/Tg2)+・・・+(Wn/Tgn)
上記式は、樹脂が、モノマー1、モノマー2、・・・・、モノマーnのn種類のモノマー成分から構成される場合の計算式であり、上記式中、Tgは樹脂のガラス転移温度(単位:K)を表し、Tg1~Tgnは各モノマーのホモポリマーのガラス転移温度(単位:K)を表し、W1~Wnは各モノマーの全モノマー成分中の質量分率を表す。
本発明の組成物は、更に色素誘導体を含有することができる。色素誘導体は分散助剤として用いられる。色素誘導体としては、色素骨格に酸基または塩基性基が結合した構造を有する化合物が挙げられる。
本発明の組成物は、溶剤を含有することが好ましい。溶剤としては、水、有機溶剤が挙げられ、有機溶剤であることが好ましい。有機溶剤としては、エステル系溶剤、ケトン系溶剤、アルコール系溶剤、アミド系溶剤、エーテル系溶剤、炭化水素系溶剤などが挙げられる。これらの詳細については、国際公開第2015/166779号の段落番号0223を参酌でき、この内容は本明細書に組み込まれる。また、環状アルキル基が置換したエステル系溶剤、環状アルキル基が置換したケトン系溶剤も好ましく用いることもできる。有機溶剤の具体例としては、ポリエチレングリコールモノメチルエーテル、ジクロロメタン、3-エトキシプロピオン酸メチル、3-エトキシプロピオン酸エチル、エチルセロソルブアセテート、乳酸エチル、ジエチレングリコールジメチルエーテル、酢酸ブチル、3-メトキシプロピオン酸メチル、2-ヘプタノン、3-ペンタノン、4-ヘプタノン、シクロヘキサノン、2-メチルシクロヘキサノン、3-メチルシクロヘキサノン、4-メチルシクロヘキサノン、シクロヘプタノン、シクロオクタノン、酢酸シクロヘキシル、シクロペンタノン、エチルカルビトールアセテート、ブチルカルビトールアセテート、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、3-メトキシ-N,N-ジメチルプロパンアミド、3-ブトキシ-N,N-ジメチルプロパンアミド、プロピレングリコールジアセテート、3-メトキシブタノール、メチルエチルケトン、ガンマブチロラクトン、スルホラン、アニソール、1,4-ジアセトキシブタン、ジエチレングリコールモノエチルエーテルアセタート、二酢酸ブタン-1,3-ジイル、ジプロピレングリコールメチルエーテルアセタート、ジアセトンアルコール、2-メトキシプロピルアセテート、2-メトキシ-1-プロパノール、イソプロピルアルコールなどが挙げられる。ただし有機溶剤としての芳香族炭化水素類(ベンゼン、トルエン、キシレン、エチルベンゼン等)は、環境面等の理由により低減したほうがよい場合がある(例えば、有機溶剤全量に対して、50質量ppm(parts per million)以下とすることもでき、10質量ppm以下とすることもでき、1質量ppm以下とすることもできる)。
本発明の組成物が重合性化合物を含む場合、本発明の組成物は更に光重合開始剤を含有することが好ましい。光重合開始剤としては、特に制限はなく、公知の光重合開始剤の中から適宜選択することができる。例えば、紫外線領域から可視領域の光線に対して感光性を有する化合物が好ましい。光重合開始剤は、光ラジカル重合開始剤であることが好ましい。
本発明の組成物が環状エーテル基を有する化合物を含む場合、硬化剤をさらに含むことが好ましい。硬化剤としては、例えばアミン化合物、酸無水物化合物、アミド化合物、フェノール化合物、多価カルボン酸、チオール化合物などが挙げられる。硬化剤の具体例としては、コハク酸、トリメリット酸、ピロメリット酸、N,N-ジメチル-4-アミノピリジン、ペンタエリスリトールテトラキス(3-メルカプトプロピオネート)などが挙げられる。硬化剤は、特開2016-075720号公報の段落番号0072~0078に記載の化合物、特開2017-036379号公報に記載の化合物を用いることもできる。
本発明の組成物は、有彩色着色剤を含有することができる。本発明において、有彩色着色剤とは、白色着色剤および黒色着色剤以外の着色剤を意味する。有彩色着色剤は、波長400nm以上650nm未満の範囲に吸収を有する着色剤が好ましい。
C.I.Pigment Orange 2,5,13,16,17:1,31,34,36,38,43,46,48,49,51,52,55,59,60,61,62,64,71,73等(以上、オレンジ色顔料)、
C.I.Pigment Red 1,2,3,4,5,6,7,9,10,14,17,22,23,31,38,41,48:1,48:2,48:3,48:4,49,49:1,49:2,52:1,52:2,53:1,57:1,60:1,63:1,66,67,81:1,81:2,81:3,83,88,90,105,112,119,122,123,144,146,149,150,155,166,168,169,170,171,172,175,176,177,178,179,184,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,269,270,272,279,291,294(キサンテン系、Organo Ultramarine、Bluish Red),295(モノアゾ系),296(ジアゾ系),297(アミノケトン系)等(以上、赤色顔料)、
C.I.Pigment Green 7,10,36,37,58,59,62,63,64(フタロシアニン系),65(フタロシアニン系),66(フタロシアニン系)等(以上、緑色顔料)、
C.I.Pigment Violet 1,19,23,27,32,37,42,60(トリアリールメタン系),61(キサンテン系)等(以上、紫色顔料)、
C.I.Pigment Blue 1,2,15,15:1,15:2,15:3,15:4,15:6,16,22,29,60,64,66,79,80,87(モノアゾ系),88(メチン系)等(以上、青色顔料)。
有彩色着色剤として、国際公開第2020/174991号に記載のフタロシアニン化合物を用いることができる。
本発明の組成物は、赤外線を透過させて可視光を遮光する色材(以下、可視光を遮光する色材ともいう)を含有することもできる。可視光を遮光する色材を含む組成物は、赤外線透過フィルタ形成用の組成物として好ましく用いられる。
(A):2種類以上の有彩色着色剤を含み、2種以上の有彩色着色剤の組み合わせで黒色を形成している。
(B):有機系黒色着色剤を含む。
(1)黄色着色剤、青色着色剤、紫色着色剤および赤色着色剤を含有する態様。
(2)黄色着色剤、青色着色剤および赤色着色剤を含有する態様。
(3)黄色着色剤、紫色着色剤および赤色着色剤を含有する態様。
(4)黄色着色剤および紫色着色剤を含有する態様。
(5)緑色着色剤、青色着色剤、紫色着色剤および赤色着色剤を含有する態様。
(6)紫色着色剤およびオレンジ色着色剤を含有する態様。
(7)緑色着色剤、紫色着色剤および赤色着色剤を含有する態様。
(8)緑色着色剤および赤色着色剤を含有する態様。
本発明の組成物は界面活性剤を含有することが好ましい。界面活性剤としては、フッ素系界面活性剤、ノニオン系界面活性剤、カチオン系界面活性剤、アニオン系界面活性剤、シリコーン系界面活性剤などの各種界面活性剤を使用することができる。界面活性剤はシリコーン系界面活性剤またはフッ素系界面活性剤であることが好ましい。界面活性剤については、国際公開第2015/166779号の段落番号0238~0245に記載された界面活性剤、特開2020-008634号公報に記載された界面活性剤が挙げられ、これらの内容は本明細書に組み込まれる。
本発明の組成物は重合禁止剤を含有することができる。重合禁止剤としては、ハイドロキノン、p-メトキシフェノール、ジ-tert-ブチル-p-クレゾール、ピロガロール、tert-ブチルカテコール、ベンゾキノン、4,4’-チオビス(3-メチル-6-tert-ブチルフェノール)、2,2’-メチレンビス(4-メチル-6-t-ブチルフェノール)、N-ニトロソフェニルヒドロキシアミン塩(アンモニウム塩、第一セリウム塩等)が挙げられ、p-メトキシフェノールが好ましい。重合禁止剤の含有量は、組成物の全固形分中、0.0001~5質量%が好ましい。組成物は重合禁止剤を1種のみ含んでいてもよく、2種以上含んでいてもよい。2種以上含む場合は、それらの合計量が上記範囲となることが好ましい。
本発明の組成物はシランカップリング剤を含有することができる。本明細書において、シランカップリング剤は、加水分解性基とそれ以外の官能基とを有するシラン化合物を意味する。また、加水分解性基とは、ケイ素原子に直結し、加水分解反応および縮合反応の少なくともいずれかによってシロキサン結合を生じ得る置換基をいう。加水分解性基としては、例えば、ハロゲン原子、アルコキシ基、アシルオキシ基などが挙げられ、アルコキシ基が好ましい。すなわち、シランカップリング剤は、アルコキシシリル基を有する化合物が好ましい。また、加水分解性基以外の官能基としては、例えば、ビニル基、スチリル基、(メタ)アクリロイル基、メルカプト基、エポキシ基、オキセタニル基、アミノ基、ウレイド基、スルフィド基、イソシアネート基、フェニル基などが挙げられ、(メタ)アクリロイル基およびエポキシ基が好ましい。シランカップリング剤は、特開2009-288703号公報の段落番号0018~0036に記載の化合物、特開2009-242604号公報の段落番号0056~0066に記載の化合物が挙げられ、これらの内容は本明細書に組み込まれる。シランカップリング剤の含有量は、組成物の全固形分中0.01~15.0質量%が好ましく、0.05~10.0質量%がより好ましい。組成物はシランカップリング剤を1種のみ含んでいてもよく、2種以上含んでいてもよい。2種以上含む場合は、それらの合計量が上記範囲となることが好ましい。
本発明の組成物は、紫外線吸収剤を含有することができる。紫外線吸収剤としては、共役ジエン化合物、アミノジエン化合物、サリシレート化合物、ベンゾフェノン化合物、ベンゾトリアゾール化合物、アクリロニトリル化合物、ヒドロキシフェニルトリアジン化合物、インドール化合物、トリアジン化合物などが挙げられる。このような化合物の具体例としては、特開2009-217221号公報の段落番号0038~0052、特開2012-208374号公報の段落番号0052~0072、特開2013-068814号公報の段落番号0317~0334、特開2016-162946号公報の段落番号0061~0080に記載された化合物が挙げられ、これらの内容は本明細書に組み込まれる。紫外線吸収剤の市販品としては、例えば、UV-503(大東化学(株)製)、BASF社製のTinuvinシリーズ、Uvinul(ユビナール)シリーズなどが挙げられる。また、ベンゾトリアゾール化合物としては、ミヨシ油脂製のMYUAシリーズ(化学工業日報、2016年2月1日)が挙げられる。また、紫外線吸収剤は、特許第6268967号公報の段落番号0049~0059に記載された化合物、国際公開第2016/181987号の段落番号0059~0076に記載された化合物、国際公開第2020/137819号に記載されたチオアリール基置換ベンゾトリアゾール型紫外線吸収剤を用いることもできる。紫外線吸収剤の含有量は、組成物の全固形分中0.01~30質量%が好ましく、0.05~25質量%がより好ましい。組成物は紫外線吸収剤を1種のみ含んでいてもよく、2種以上含んでいてもよい。2種以上含む場合は、それらの合計量が上記範囲となることが好ましい。
本発明の組成物は、酸化防止剤を含有することができる。酸化防止剤としては、フェノール化合物、亜リン酸エステル化合物、チオエーテル化合物などが挙げられる。フェノール化合物としては、フェノール系酸化防止剤として知られる任意のフェノール化合物を使用することができる。好ましいフェノール化合物としては、ヒンダードフェノール化合物が挙げられる。フェノール性ヒドロキシ基に隣接する部位(オルト位)に置換基を有する化合物が好ましい。前述の置換基としては炭素数1~22の置換又は無置換のアルキル基が好ましい。また、酸化防止剤は、同一分子内にフェノール基と亜リン酸エステル基を有する化合物も好ましい。また、酸化防止剤は、リン系酸化防止剤も好適に使用することができる。リン系酸化防止剤としてはトリス[2-[[2,4,8,10-テトラキス(1,1-ジメチルエチル)ジベンゾ[d,f][1,3,2]ジオキサホスフェピン-6-イル]オキシ]エチル]アミン、トリス[2-[(4,6,9,11-テトラ-tert-ブチルジベンゾ[d,f][1,3,2]ジオキサホスフェピン-2-イル)オキシ]エチル]アミン、亜リン酸エチルビス(2,4-ジ-tert-ブチル-6-メチルフェニル)などが挙げられる。酸化防止剤の市販品としては、例えば、アデカスタブ AO-20、アデカスタブ AO-30、アデカスタブ AO-40、アデカスタブ AO-50、アデカスタブ AO-50F、アデカスタブ AO-60、アデカスタブ AO-60G、アデカスタブ AO-80、アデカスタブ AO-330(以上、(株)ADEKA製)などが挙げられる。また、酸化防止剤は、特許第6268967号公報の段落番号0023~0048に記載された化合物、国際公開第2017/006600号に記載された化合物、国際公開第2017/164024号に記載された化合物を使用することもできる。酸化防止剤の含有量は、組成物の全固形分中0.01~20質量%であることが好ましく、0.3~15質量%であることがより好ましい。組成物は酸化防止剤を1種のみ含んでいてもよく、2種以上含んでいてもよい。2種以上含む場合は、それらの合計量が上記範囲となることが好ましい。
本発明の組成物は、必要に応じて、増感剤、硬化促進剤、フィラー、熱硬化促進剤、可塑剤及びその他の助剤類(例えば、導電性粒子、消泡剤、難燃剤、レベリング剤、剥離促進剤、香料、表面張力調整剤、連鎖移動剤など)を含有してもよい。これらの成分を適宜含有させることにより、膜物性などの性質を調整することができる。これらの成分は、例えば、特開2012-003225号公報の段落番号0183以降(対応する米国特許出願公開第2013/0034812号明細書の段落番号0237)の記載、特開2008-250074号公報の段落番号0101~0104、0107~0109等の記載を参酌でき、これらの内容は本明細書に組み込まれる。また、本発明の組成物は、必要に応じて、潜在酸化防止剤を含有してもよい。潜在酸化防止剤としては、酸化防止剤として機能する部位が保護基で保護された化合物であって、100~250℃で加熱するか、又は酸/塩基触媒存在下で80~200℃で加熱することにより保護基が脱離して酸化防止剤として機能する化合物が挙げられる。潜在酸化防止剤としては、国際公開第2014/021023号、国際公開第2017/030005号、特開2017-008219号公報に記載された化合物が挙げられる。潜在酸化防止剤の市販品としては、アデカアークルズGPA-5001((株)ADEKA製)等が挙げられる。
本発明の組成物の収容容器としては、特に限定はなく、公知の収容容器を用いることができる。また、収容容器として、原材料や組成物中への不純物混入を抑制することを目的に、容器内壁を6種6層の樹脂で構成する多層ボトルや6種の樹脂を7層構造にしたボトルを使用することも好ましい。このような容器としては例えば特開2015-123351号公報に記載の容器が挙げられる。また、容器内壁は、容器内壁からの金属溶出を防ぎ、組成物の経時安定性を高めたり、成分変質を抑制するなどの目的で、ガラス製やステンレス製などにすることも好ましい。
本発明の組成物は、前述の成分を混合して調製できる。組成物の調製に際しては、全成分を同時に溶剤に溶解または分散して組成物を調製してもよいし、必要に応じては、各成分を適宜配合した2つ以上の溶液または分散液をあらかじめ調製し、使用時(塗布時)にこれらを混合して組成物として調製してもよい。
次に、本発明の膜について説明する。本発明の膜は、上述した本発明の組成物から得られるものである。本発明の膜は、光学フィルタとして好ましく用いることができる。光学フィルタの用途は、特に限定されないが、赤外線カットフィルタ、赤外線透過フィルタなどが挙げられる。赤外線カットフィルタとしては、例えば、固体撮像素子の受光側における赤外線カットフィルタ(例えば、ウエハーレベルレンズに対する赤外線カットフィルタ用など)、固体撮像素子の裏面側(受光側とは反対側)における赤外線カットフィルタ、環境光センサー用の赤外線カットフィルタ(例えば、情報端末装置が置かれた環境の照度や色調を感知してディスプレイの色調を調整する照度センサーや、色調を調整する色補正用センサー)などが挙げられる。特に、固体撮像素子の受光側における赤外線カットフィルタとして好ましく用いることができる。赤外線透過フィルタとしては、可視光を遮光し、特定の波長以上の赤外線を選択的に透過可能なフィルタが挙げられる。
本発明の膜は、本発明の組成物を塗布する工程を経て製造できる。
フォトリソグラフィ法でのパターン形成方法は、本発明の組成物を塗布して形成した組成物層に対しパターン状に露光する工程(露光工程)と、未露光部の組成物層を現像除去してパターンを形成する工程(現像工程)と、を含むことが好ましい。必要に応じて、現像されたパターンをベークする工程(ポストベーク工程)を設けてもよい。以下、各工程について説明する。
ドライエッチング法でのパターン形成は、上記組成物を支持体上に塗布して形成した組成物層を硬化して硬化物層を形成し、次いで、この硬化物層上にパターニングされたフォトレジスト層を形成し、次いで、パターニングされたフォトレジスト層をマスクとして硬化物層に対してエッチングガスを用いてドライエッチングするなどの方法で行うことができる。フォトレジスト層の形成においては、プリベーク処理を施すことが好ましい。ドライエッチング法でのパターン形成については、特開2013-064993号公報の段落番号0010~0067の記載を参酌でき、この内容は本明細書に組み込まれる。
本発明の光学フィルタは、上述した本発明の膜を有する。光学フィルタの種類としては、赤外線カットフィルタおよび赤外線透過フィルタなどが挙げられる。
本発明の固体撮像素子は、上述した本発明の膜を含む。固体撮像素子の構成としては、本発明の膜を有する構成であり、固体撮像素子として機能する構成であれば特に限定はない。例えば、以下のような構成が挙げられる。
本発明の画像表示装置は、本発明の膜を含む。画像表示装置としては、液晶表示装置や有機エレクトロルミネッセンス(有機EL)表示装置などが挙げられる。画像表示装置の定義や詳細については、例えば「電子ディスプレイデバイス(佐々木昭夫著、(株)工業調査会、1990年発行)」、「ディスプレイデバイス(伊吹順章著、産業図書(株)平成元年発行)」などに記載されている。また、液晶表示装置については、例えば「次世代液晶ディスプレイ技術(内田龍男編集、(株)工業調査会、1994年発行)」に記載されている。本発明が適用できる液晶表示装置に特に制限はなく、例えば、上記の「次世代液晶ディスプレイ技術」に記載されている色々な方式の液晶表示装置に適用できる。画像表示装置は、白色有機EL素子を有するものであってもよい。白色有機EL素子としては、タンデム構造であることが好ましい。有機EL素子のタンデム構造については、特開2003-045676号公報、三上明義監修、「有機EL技術開発の最前線-高輝度・高精度・長寿命化・ノウハウ集-」、技術情報協会、326~328ページ、2008年などに記載されている。有機EL素子が発光する白色光のスペクトルは、青色領域(430~485nm)、緑色領域(530~580nm)及び黄色領域(580~620nm)に強い極大発光ピークを有するものが好ましい。これらの発光ピークに加え更に赤色領域(650~700nm)に極大発光ピークを有するものがより好ましい。
本発明の赤外線センサは、上述した本発明の膜を含む。赤外線センサの構成としては、赤外線センサとして機能する構成であれば特に限定はない。以下、本発明の赤外線センサの一実施形態について、図面を用いて説明する。
樹脂の重量平均分子量の測定は、測定装置としてHPC-8220GPC(東ソー(株)製)、ガードカラムとしてTSKguardcolumn SuperHZ-L、カラムとしてTSKgel SuperHZM-M、TSKgel SuperHZ4000、TSKgel SuperHZ3000、TSKgel SuperHZ2000を直結したカラムを用い、カラム温度を40℃にして、試料濃度0.1質量%のテトラヒドロフラン溶液をカラムに10μL注入し、溶出溶剤としてテトラヒドロフランを毎分0.35mLの流量でフローさせ、RI(示差屈折率)検出装置にて試料ピークを検出し、標準ポリスチレンを用いて作製した検量線を用いて計算した。
(分散液IR1)
下記構造の化合物A103(赤外線吸収剤、極大吸収波長960nm)の2質量部と、顔料誘導体IS-2の0.4質量部と、分散剤D-2の1.6質量部と、プロピレングリコールモノメチルエーテルアセテートの6質量部を混合し、0.3mm径のジルコニアビーズを使用して、ビーズミル(減圧機構付き高圧分散機NANO-3000-10(日本ビーイーイー(株)製))で、3時間、混合および分散して分散液IR1を調製した。
下記構造の化合物A105(赤外線吸収剤、極大吸収波長810nm)の2質量部と、顔料誘導体B1の0.4質量部と、分散剤D-1の1.6質量部と、プロピレングリコールモノメチルエーテルアセテートの6質量部を混合し、0.3mm径のジルコニアビーズを使用して、ビーズミル(減圧機構付き高圧分散機NANO-3000-10(日本ビーイーイー(株)製))で、3時間、混合および分散して分散液IR2を調製した。
下記構造の化合物106(赤外線吸収剤、極大吸収波長830nm)の2質量部と、顔料誘導体IS-6の0.4質量部と、分散剤D-1の1.6質量部と、プロピレングリコールモノメチルエーテルアセテートの6質量部を混合し、0.3mm径のジルコニアビーズを使用して、ビーズミル(減圧機構付き高圧分散機NANO-3000-10(日本ビーイーイー(株)製))で、3時間、混合および分散して分散液IR3を調製した。
Irgaphor Black(BASF社製、黒色着色剤)の12.59質量部と、分散剤D-3の4.4質量部と、プロピレングリコールモノメチルエーテルアセテートの83.01質量部を混合し、0.3mm径のジルコニアビーズを使用して、ビーズミル(減圧機構付き高圧分散機NANO-3000-10(日本ビーイーイー(株)製))で、3時間、混合および分散して分散液Bk1を調製した。
C.I.ピグメントブルー16(青色着色剤)の12.59質量部と、分散剤D-3の4.4質量部と、プロピレングリコールモノメチルエーテルアセテートの83.01質量部を混合し、0.3mm径のジルコニアビーズを使用して、ビーズミル(減圧機構付き高圧分散機NANO-3000-10(日本ビーイーイー(株)製))で、3時間、混合および分散して分散液Blue1を調製した。
後述する金属アゾ顔料1(黄色着色剤)の11質量部と、顔料誘導体B1の1.59質量部と、分散剤D-3の4.4質量部と、プロピレングリコールモノメチルエーテルアセテートの83.01質量部を混合し、0.3mm径のジルコニアビーズを使用して、ビーズミル(減圧機構付き高圧分散機NANO-3000-10(日本ビーイーイー(株)製))で、3時間、混合および分散して分散液Yellow1を調製した。
46.2gのジアゾバルビツール酸および38.4gのバルビツール酸を、85℃の蒸留水の1100g中に添加した。次いで、この溶液に水酸化カリウム水溶液を添加してpHを約5とした後、90分間攪拌してアゾバルビツール酸前駆体を製造した。次いで、上記のアゾバルビツール酸前駆体に、82℃の蒸留水の1500gを添加した。次いで、10gの30%塩酸を滴下により添加した。次いで、79.4gのメラミンを添加した。次いで、0.282モルの約25%塩化亜鉛溶液と、0.0015モルの約30%塩化銅(II)溶液との混合物を滴下により添加した。次いで、これらを添加した溶液を82℃の温度で3時間保持した後、KOHを添加してpHを約5.5とした。次いで、この溶液の温度を90℃に昇温し、90℃の温度を維持しつつ、100gの蒸留水を添加して希釈した。次いで、この溶液に21gの30%塩酸を滴下により添加した後、90℃の温度で12時間加熱処理した。次いで、加熱処理後の溶液に水酸化カリウム水溶液を添加してpHを約5とした。次いで、この溶液から顔料を吸引フィルタ上で単離し、洗浄し、80℃での真空乾燥キャビネット中で乾燥させた後、標準実験室ミルで約2分間すり潰して金属アゾ顔料1を製造した。
下記表に示す溶剤以外の素材を下記表に示す割合で混合し、下記表に示す溶剤を加えて固形分濃度が20質量%となるように調整した後、撹拌し、孔径0.45μmのナイロン製フィルタ(日本ポール(株)製)でろ過して、組成物を調製した。表中の配合量欄の数値は固形分換算値での質量部の値である。
[式(1)で表される化合物]
A001:下記構造の化合物(極大吸収波長1470nm)
A002:下記構造の化合物(極大吸収波長1470nm)
A003:下記構造の化合物(極大吸収波長1730nm)
A004:下記構造の化合物(極大吸収波長1470nm)
A005:下記構造の化合物(極大吸収波長1410nm)
A101:下記構造の化合物A101(極大吸収波長1090nm)
A102:下記構造の化合物A102(極大吸収波長790nm)
A104:下記構造の化合物A104(極大吸収波長800nm)
IR1、IR2、IR3、Bk1、Blue1、Yellow1:上述した分散液IR1、IR2、IR3、Bk1、Blue1、Yellow1
B001:ポリメタクリル酸メチル(重量平均分子量24000、分散度1.8、ガラス転移温度75℃)
B002:下記構造の樹脂(酸基を有する樹脂。主鎖に付記した数値は繰り返し単位のモル比である。重量平均分子量20000、分散度1.9、ガラス転移温度100℃)
M-1:アロニックスM-305(東亞合成(株)製、ペンタエリスリトールトリアクリレートとペンタエリスリトールテトラアクリレートとの混合物。ペンタエリスリトールトリアクリレートの含有量が55質量%~63質量%である。)
M-2:KAYARAD RP-1040(日本化薬(株)製、エチレンオキサイド変性ペンタエリスリトールテトラアクリレート)
M-3:アロニックスM-510(東亞合成(株)製、多塩基酸変性アクリルオリゴマー)
C-1:Irgacure OXE01(BASF社製、オキシムエステル系開始剤)
C-2:Irgacure OXE02(BASF社製、オキシムエステル系開始剤)
F-1:メガファックRS-72-K(DIC(株)製、フッ素系界面活性剤)
F-2: 下記構造の化合物(重量平均分子量14000、繰り返し単位の割合を示す%の数値はモル%である)
G-1:p-メトキシフェノール
U-1:Uvinul3050(BASF製、紫外線吸収剤)
U-2:Tinuvin477(BASF製、ヒドロキシフェニルトリアジン系紫外線吸収剤)
U-3:Tinuvin326(BASF製、紫外線吸収剤)
S001:プロピレングリコールモノメチルエーテルアセテート
S002:プロピレングリコールモノメチルエーテル
各組成物をガラス基材に、製膜後の膜厚が1.0μmとなるようにスピンコート塗布し、i線ステッパー露光装置FPA-3000i5+(Canon(株)製)を用い、1000mJ/cm2の露光量で全面露光した。次いで、ホットプレートを用いて、200℃で2分間加熱し、膜を製造した。
上記の膜を製膜したガラス基材について、紫外可視近赤外分光光度計(U-4100、(株)日立ハイテク製)を用いて波長400~2000nmの範囲の透過率を測定し、波長800nm以上1000nm未満の範囲の透過率の平均値(平均透過率1)、波長1000nm以上1500nm未満の範囲の透過率の平均値(平均透過率2)および波長1500nm以上2000nm未満の範囲の透過率の平均値(平均透過率3)をそれぞれ求めて、以下の基準で赤外線遮蔽性を評価した。
A:透過率の平均値が5%未満である
B:透過率の平均値が5%以上10%未満である
C:透過率の平均値が10%以上である
上記の膜を製膜したガラス基材について、紫外可視近赤外分光光度計(U-4100、(株)日立ハイテク製)を用いて波長400~2000nmの範囲の透過率を測定した。次に、上記の膜を製膜したガラス基材を、キセノンランプを用い10万luxで20時間光照射(200万lux・h相当)したのち、キセノンランプ照射後の膜の透過率を測定した。キセノンランプ照射前後での波長800~2000nmの範囲における各波長での透過率変化量(ΔT1)を求め、測定波長域全体でのΔT1の最も大きい値に基づき、以下の基準で耐光性を評価した。ΔT1の値が小さいほうが耐光性が良好である。
透過率変化(ΔT1)=|キセノンランプ照射前の膜の透過率-キセノンランプ照射後の膜の透過率|
A:ΔT1が3%未満である
B:ΔT1が3%以上5%未満である
C:ΔT1が5%以上である
上記の膜を製膜したガラス基材について、紫外可視近赤外分光光度計(U-4100、(株)日立ハイテク製)を用いて、波長400~1600nmの範囲で透過率を測定した。次に、上記の膜を製膜したガラス基材を、ホットプレートを用いて200℃で10分間加熱した。加熱前後での波長1000~1500nmの範囲における各波長での透過率変化量(ΔT2)を求め、測定波長域全体でのΔT2の最も大きい値に基づき、以下の基準で耐熱性を評価した。ΔT2の値が小さいほうが耐熱性が良好である。
透過率変化(ΔT2)=|加熱前の膜の透過率-加熱後の膜の透過率|
A:ΔT2が5%未満である
B:ΔT2が5%以上10%未満である
C:ΔT2が10%以上である
各組成物をガラス基材上に、製膜後の膜厚が1.0μmとなるようにスピンコート塗布し、その後ホットプレートで、100℃で2分間加熱した。次いで、i線ステッパー露光装置FPA-3000i5+(Canon(株)製)を用い、1μmのベイヤーパターンを有するマスクを介して1000mJ/cm2の露光量で露光した。次いで、水酸化テトラメチルアンモニウム(TMAH)0.3質量%水溶液を用い、23℃で60秒間パドル現像を行った。その後、スピンシャワーにてリンスを行い、さらに純水にて水洗した後に、ホットプレートで、200℃で5分間加熱してパターン(画素)を形成した。画素が形成されたガラス基材について、顕微鏡を用いて10000倍の倍率で観察し、下記評価基準に従ってパターン形成性を評価した。
A:パターンを形成できた
B:パターンを形成できない
Claims (15)
- 赤外線吸収剤と、硬化性化合物とを含有する組成物であって、
前記赤外線吸収剤は、式(1)で表される化合物と、前記式(1)で表される化合物以外の化合物を含む、組成物;
Y11~Y16は、それぞれ独立して、窒素原子またはCRY11を表し、RY11は水素原子または置換基を表し、
X11およびX12は、それぞれ独立して、窒素原子またはCRX11を表し、RX11は水素原子または置換基を表し、
Z11~Z14は、それぞれ独立して、炭素原子または窒素原子を表し、
M11およびM12はそれぞれ独立して配位子が配位していてもよい金属原子を表し、
Z11とM11との間に点線で示されている結合は、Z11が炭素原子の場合は共有結合を表し、Z11が窒素原子の場合は配位結合または共有結合を表し、
Z12とM12との間に点線で示されている結合は、Z12が炭素原子の場合は共有結合を表し、Z12が窒素原子の場合は配位結合または共有結合を表し、
Z13とM12との間に点線で示されている結合は、Z13が炭素原子の場合は共有結合を表し、Z13が窒素原子の場合は配位結合または共有結合を表し、
Z14とM11との間に点線で示されている結合は、Z14が炭素原子の場合は共有結合を表し、Z14が窒素原子の場合は配位結合または共有結合を表し、
M11とNとの間の点線で示されている結合は、配位結合または共有結合を表し、
M12とNとの間の点線で示されている結合は、配位結合または共有結合を表す。 - 前記式(1)で表される化合物以外の化合物は、前記式(1)で表される化合物よりも短波長側に極大吸収波長が存在する化合物である、請求項1に記載の組成物。
- 前記式(1)で表される化合物は、式(1-1)で表される化合物および式(1-2)で表される化合物から選ばれる少なくとも1種である、請求項1または2に記載の組成物;
Y11~Y16は、それぞれ独立して、窒素原子またはCRY11を表し、RY11は水素原子または置換基を表し、
X11およびX12は、それぞれ独立して、窒素原子またはCRX11を表し、RX11は水素原子または置換基を表し、
M11およびM12はそれぞれ独立して配位子が配位していてもよい金属原子を表し、
M11とNとの間の点線で示されている結合は配位結合を表し、実線で示されている結合は共有結合を表し、
M12とNとの間の点線で示されている結合は配位結合を表し、実線で示されている結合は共有結合を表す。 - 前記式(1)で表される化合物の極大吸収波長は、波長1200~1500nmの範囲に存在する、請求項1~3のいずれか1項に記載の組成物。
- 赤外線吸収剤と、硬化性化合物とを含有する組成物であって、
前記赤外線吸収剤は、金属原子に、前記金属原子の外周で共鳴可能な最短の環を構成するπ電子数が(4n+2)個であるポルフィリン化合物が配位した金属錯体と、前記金属錯体以外の化合物を含む組成物;
nは6~15の整数である。 - 前記金属錯体以外の化合物は、前記金属錯体よりも短波長側に極大吸収波長が存在する化合物である、請求項5に記載の組成物。
- 前記金属錯体の極大吸収波長は、波長1200~1500nmの範囲に存在する、請求項5または6に記載の組成物。
- 前記硬化性化合物は、酸基を有する樹脂を含む、請求項1~7のいずれか1項に記載の組成物。
- 前記硬化性化合物は、重合性化合物を含む、請求項1~8のいずれか1項に記載の組成物。
- 前記硬化性化合物は、ガラス転移温度が150℃以上の樹脂を含む、請求項1~9のいずれか1項に記載の組成物。
- 請求項1~10のいずれか1項に記載の組成物を用いて得られる膜。
- 請求項11に記載の膜を含む光学フィルタ。
- 請求項11に記載の膜を含む固体撮像素子。
- 請求項11に記載の膜を含む画像表示装置。
- 請求項11に記載の膜を含む赤外線センサ。
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