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JPS63213925A - Boat loader system for semiconductor wafer heat treatment furnace - Google Patents

Boat loader system for semiconductor wafer heat treatment furnace

Info

Publication number
JPS63213925A
JPS63213925A JP62048014A JP4801487A JPS63213925A JP S63213925 A JPS63213925 A JP S63213925A JP 62048014 A JP62048014 A JP 62048014A JP 4801487 A JP4801487 A JP 4801487A JP S63213925 A JPS63213925 A JP S63213925A
Authority
JP
Japan
Prior art keywords
quartz
boat
gap
heat treatment
semiconductor wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62048014A
Other languages
Japanese (ja)
Inventor
Yoshiaki Tsuchiya
土屋 善昭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62048014A priority Critical patent/JPS63213925A/en
Publication of JPS63213925A publication Critical patent/JPS63213925A/en
Pending legal-status Critical Current

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To enable easily correcting the gap between the center of a quartz boat and the quartz tube in a heat treatment furnace by driving a supporter which supports a quartz rod which pushes the quartz boat in the direction of inserting the quartz boat and in a perpendicular direction. CONSTITUTION:If a gap exceeding a tolerance occurs when a quartz boat 3 is inserted in a quartz tube 6, the gap is detected by screening the transmitted light of transmission type sensors 2a-2h by a semiconductor wafer 8. When the gap is detected, a quartz rod supporter 5 is moved in the direction in which the gap is made, the tip of the quartz boat 8 is moved to the opposite direction of the quartz rod supporter 5 and the gap is corrected. When the gap is corrected and the light of projectors 2a-2h arrives at the light receivers 2a'-2h' of the transmission type sensors, a correction operation is finished and the quartz rod supporter 5 is moved to the middle point between an original position and a corrected position by a quartz rod supporter drive unit 1. During the correction operation, the insertion of the quartz boat 3 is continued, but if the gap of the quartz boat 3 is not corrected and the other transmission type sensors detect the gap, the quartz boat 3 is drawn out after stop.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、半導体ウェー−・熱処理炉内に半導体ウェー
ハを積載したボートの挿入及び引き出し動作を行なうボ
ートローダシステムに関するものでるる。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a boat loader system for inserting and pulling out a boat loaded with semiconductor wafers into a semiconductor wafer/heat treatment furnace.

〔従来の技術〕[Conventional technology]

従来、この瞳の半導体ウェーハ熱処理炉用ボートローダ
システムとしては、熱処理炉内に半導体ウェーハを挿入
するときは、半導体ウェーハを石英ホードに積載し、ボ
ートの一端をボートローダを用いて押すことにより、半
導体ウェーハを熱処理位置に挿入していた。
Conventionally, in this boat loader system for a semiconductor wafer heat treatment furnace, when inserting a semiconductor wafer into a heat treatment furnace, the semiconductor wafer is loaded onto a quartz hoard, and one end of the boat is pushed using a boat loader. A semiconductor wafer was inserted into a heat treatment position.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上述した従来の半導体ウェーハ熱処理炉用ボートローダ
システムは、石英棒2石英ボートの熱変形、ボートロー
ダの駆@軸の歪与、調努の不備などにより、半導体ウェ
ーハを積載した石英ボートと炉体内の石英管の中心が合
致しないため、石英ボートが石英管内で傾いた状態で挿
入が行なわれる場合があり、石英ボートの1頃さが一足
の角度全越えた場合は、石英ボートが倒れウェーハ割れ
の原因となる。ボートローダシステムの、]lluは、
熱処理炉内に石英ボー1−’を挿入して、石英ボートの
石英管内での傾き、中心のズレを最小にすべく位[道調
整を行なうため、この調整に多くの時間を要するという
欠点がある。
In the conventional boat loader system for semiconductor wafer heat treatment furnaces described above, due to thermal deformation of the quartz rods and the quartz boat, distortion of the drive shaft of the boat loader, and inadequate adjustment, the quartz boat loaded with semiconductor wafers and the inside of the furnace were damaged. Because the centers of the quartz tubes do not match, the quartz boat may be inserted at an angle within the quartz tube. If the quartz boat's angle exceeds the full angle, the quartz boat may fall and crack the wafer. It causes. ]llu of the boat loader system is
The quartz bowl 1-' is inserted into the heat treatment furnace, and the quartz boat is adjusted to its position in order to minimize the inclination and center deviation within the quartz tube.The drawback is that this adjustment takes a lot of time. be.

また、熱処理炉に使用される石英ボート、石英管、石英
棒等の石英治具は、定期的に洗浄を行なう必要があるた
め、前述の位置調整も洗浄する毎に行なう必要があり、
その結果、半導体ウェーハ熱処理炉における調整のため
の停止時間が長くなるという欠点がるる。
In addition, quartz jigs such as quartz boats, quartz tubes, and quartz rods used in heat treatment furnaces need to be cleaned regularly, so the above-mentioned position adjustment needs to be done every time they are cleaned.
As a result, there is a drawback that the downtime for adjustment in the semiconductor wafer heat treatment furnace becomes long.

不発明の目的は、半導体ウェーハ熱処理炉内に半導体ウ
ェーハを積載したボートの挿入及び引き出し動作の際に
、石英ボートの中心と熱処理炉内の石英管のズレ全16
正することがでさ、半導体ウェーハを積載した石英ボー
トの安定した挿入及び引き出しを行うCとが出来る半導
体ウェーハ熱処理炉用ボートローダシステムを提供する
ことにある。
The purpose of the invention is to prevent a total of 16 deviations between the center of the quartz boat and the quartz tube inside the heat treatment furnace when the boat loaded with semiconductor wafers is inserted into and pulled out of the semiconductor wafer heat treatment furnace.
An object of the present invention is to provide a boat loader system for a semiconductor wafer heat treatment furnace that can stably insert and pull out a quartz boat loaded with semiconductor wafers.

〔問題点を解決するための手段〕[Means for solving problems]

本発明の半導体ウェーハ熱処理炉用ボートローダシステ
ムは、半導体ウェーハを積載した石英ボートを挿入方向
の駆動の他に石英ボートを押す石英棒全支持する部分を
石英ボートの挿入方向と直角方向に駆動する機構を有し
ている。なお石英ボートの中心と熱処理炉内の石英管の
中心とのズレを検出する機構を付加することにより上記
ズレを最小にすることができる。
The boat loader system for a semiconductor wafer heat treatment furnace of the present invention not only drives a quartz boat loaded with semiconductor wafers in the insertion direction, but also drives the entire supporting portion of the quartz rod that pushes the quartz boat in a direction perpendicular to the insertion direction of the quartz boat. It has a mechanism. Note that the above-mentioned deviation can be minimized by adding a mechanism for detecting the deviation between the center of the quartz boat and the center of the quartz tube in the heat treatment furnace.

〔実施例〕〔Example〕

次に、本発明の実施例について図面全参照して説明する
。第1図は本発明の一実施例の平面図であり、第2図は
第1図の正面図でめる。第1図及び第2図において、元
字弐透過センサー2a〜2hは、石英管6の中心線の廷
長巌から等距離に石英皿9と石英管60間に、上下に九
が透過する様に投・党元部をズJにして配置され、これ
全複数個、間隔をあけて取付けられる。取付距離は、半
導体ウェーハ8の半径に石英ボートが倒れない範囲とし
ての許容1直を刃口えた1直とする。
Next, embodiments of the present invention will be described with reference to all the drawings. FIG. 1 is a plan view of one embodiment of the present invention, and FIG. 2 is a front view of FIG. 1. In FIGS. 1 and 2, the original 2 transmission sensors 2a to 2h are located between the quartz plate 9 and the quartz tube 60 at an equal distance from the central line of the quartz tube 6, so that 9 is transmitted vertically. They are arranged with the casting and party parts in a square shape, and multiple pieces of these are installed at intervals. The mounting distance is set to 1 straight, which is the radius of the semiconductor wafer 8 and the permissible 1 straight as a range in which the quartz boat does not fall.

石英管6へ石英ボート3を挿入時に前記計容範囲金越え
たズレが生じた場合、透過型センサー2a〜2hの透過
元を半導体ウェーハ8が遮光することにより、ズレを検
出する。ズレが検出されると、石英棒支持部5をズレが
生じ之万同に移動することにより、半導体ウェーハを積
載した石英ボート8先端部を石英棒支持部5と逆方向に
移動感せ、ズレを修正する。石英ボート3のズレが修正
され、透過型センサー受元部2 a/〜2h’に投光部
2a〜2hの元が到達すれば、修正動fil:’e終了
し、石英棒支持部5を駆動部1により元の位置と修正位
置の中間点に移動させる。修正動作中、石英ボート3の
挿入idM行するが、石英ボート3のズレが1じ正され
ず、他の透過式センサーがズレを検出した場合、石英ボ
ート3を停止後、引き出す。
When the quartz boat 3 is inserted into the quartz tube 6, if a deviation exceeding the measurement range occurs, the deviation is detected by blocking the transmission source of the transmission type sensors 2a to 2h with the semiconductor wafer 8. When a misalignment is detected, the quartz rod support 5 is moved in the same direction as the misalignment, causing the tip of the quartz boat 8 loaded with semiconductor wafers to move in the opposite direction to the quartz bar support 5, thereby detecting the misalignment. Correct. When the misalignment of the quartz boat 3 is corrected and the sources of the light projecting parts 2a to 2h reach the transmission type sensor receiving parts 2a/ to 2h', the correction movement fil:'e is completed and the quartz rod support part 5 is The drive unit 1 moves it to an intermediate point between the original position and the corrected position. During the correction operation, the quartz boat 3 is inserted idM, but if the displacement of the quartz boat 3 is not corrected by one bit and another transmission type sensor detects the displacement, the quartz boat 3 is stopped and then pulled out.

これら一連の動作により、石英ボート3の中心と石英″
#6の中心のズレを最小の状態に保ちながら熱処理炉内
の石英管6に石英ボートを挿入できるものである。
Through these series of operations, the center of the quartz boat 3 and the quartz "
The quartz boat can be inserted into the quartz tube 6 in the heat treatment furnace while keeping the center shift of #6 to a minimum.

第3図は、本発明の他の実施例の平面図でるる。FIG. 3 is a plan view of another embodiment of the invention.

半導体ウェーハを積載した石英ボート3を熱処理炉内の
石英管6への挿入時に石英ボート3の石英管6に対する
ズレを石英棒4の左右両側に取り付けられた、圧力セン
サー1oの圧力差として検出し、石英棒支持部5を圧力
差が一定の値以下に抑えるように駆動・制御する。この
実施例では、石英棒支持部5に加わる力全検出するため
、石英ボートのズレを迅速に検知・修正でさる利点があ
る。
When a quartz boat 3 loaded with semiconductor wafers is inserted into a quartz tube 6 in a heat treatment furnace, the displacement of the quartz boat 3 with respect to the quartz tube 6 is detected as a pressure difference between pressure sensors 1o attached to both left and right sides of a quartz rod 4. , the quartz rod support part 5 is driven and controlled so that the pressure difference is suppressed to a certain value or less. In this embodiment, since the entire force applied to the quartz rod support portion 5 is detected, there is an advantage that displacement of the quartz boat can be quickly detected and corrected.

〔発明の効果〕〔Effect of the invention〕

以上説明したように不発明は、半導体ウェーハ熱処理炉
用ボートローダシステムに半導体ウェーハ全積載し次石
英ボートの挿入方向と、挿入方向に直角に石英棒支持部
を駆動できるので石英ボートの中心と熱処理炉内の石英
管の中心ズレ全容易に修正でき安定した挿入ができる。
As explained above, the present invention is capable of loading all semiconductor wafers into a boat loader system for a semiconductor wafer heat treatment furnace, and then driving the quartz rod support in the insertion direction of the quartz boat and at right angles to the insertion direction. Any misalignment of the quartz tube in the furnace can be easily corrected, allowing stable insertion.

なおズレ恢出磯構全付加し石英ボートと石英管のズレを
監視しながら駆動することにより石英ボートの中心と熱
処理炉内の石英管の中心のズレを修正し、ボートローダ
システムにおける半導体ウェーハ全積載した石英ボート
のより安定した挿入を行なうことができる。
By adding the entire quartz boat and the quartz tube and driving the quartz boat while monitoring the quartz tube, we can correct the misalignment between the center of the quartz boat and the center of the quartz tube in the heat treatment furnace, and remove all the semiconductor wafers in the boat loader system. More stable insertion of loaded quartz boats can be achieved.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、本発明の半導体ウェーハ熱処理炉用ボートロ
ーダシステムの一実施例の平面図、第2図は第1図の正
面図、第3図は本発明の他の実施例の平面図、第4図は
従来の半導体ウェーハ熱処理炉用ボートローダシステム
の平面図である。 】・・・石英棒支持部駆動部、2・・・光学式透過型セ
ンサー、2a〜2h・・・透過型センサー投元部、2a
′〜2h/・・・透過型センサー受九部、3・・・石英
ボート、4・・・石英棒、5・・・石英棒支持部、6・
・・石英管、7・・・ボートステーション、8・・・半
導体ウェーハ、9・・・ボートローダ枢動部、10・・
・圧力センサー、11・・・透過′7t、元町。
FIG. 1 is a plan view of an embodiment of a boat loader system for a semiconductor wafer heat treatment furnace of the present invention, FIG. 2 is a front view of FIG. 1, and FIG. 3 is a plan view of another embodiment of the present invention. FIG. 4 is a plan view of a conventional boat loader system for a semiconductor wafer heat treatment furnace. ]...Quartz rod support part drive part, 2...Optical transmission type sensor, 2a to 2h...Transmission type sensor throwing part, 2a
'~2h/... Transmissive sensor receiver 9 part, 3... Quartz boat, 4... Quartz rod, 5... Quartz rod support part, 6...
...Quartz tube, 7...Boat station, 8...Semiconductor wafer, 9...Boat loader pivoting part, 10...
・Pressure sensor, 11...transmission '7t, Motomachi.

Claims (2)

【特許請求の範囲】[Claims] (1)半導体ウェーハ熱処理炉に半導体ウェーハの挿入
及び引き出しを行なうボートローダシステムにおいて、
半導体ウェーハを積載したボート挿入時に、石英棒支持
部をボート挿入方向の他にボート挿入方向と直角方向に
駆動できることを特徴とする半導体ウェーハ熱処理炉用
ボートローダシステム。
(1) In a boat loader system that inserts and pulls out semiconductor wafers into a semiconductor wafer heat treatment furnace,
A boat loader system for a semiconductor wafer heat treatment furnace, characterized in that when a boat loaded with semiconductor wafers is inserted, a quartz rod support part can be driven not only in the boat insertion direction but also in a direction perpendicular to the boat insertion direction.
(2)石英ボートと石英管の中心のズレを検出するズレ
検出機構を付加したことを特徴とする特許請求の範囲第
(1)項記載の半導体ウェーハ熱処理炉用ボートローダ
システム。
(2) The boat loader system for a semiconductor wafer heat treatment furnace according to claim (1), further comprising a displacement detection mechanism for detecting a displacement between the centers of the quartz boat and the quartz tube.
JP62048014A 1987-03-02 1987-03-02 Boat loader system for semiconductor wafer heat treatment furnace Pending JPS63213925A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62048014A JPS63213925A (en) 1987-03-02 1987-03-02 Boat loader system for semiconductor wafer heat treatment furnace

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62048014A JPS63213925A (en) 1987-03-02 1987-03-02 Boat loader system for semiconductor wafer heat treatment furnace

Publications (1)

Publication Number Publication Date
JPS63213925A true JPS63213925A (en) 1988-09-06

Family

ID=12791451

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62048014A Pending JPS63213925A (en) 1987-03-02 1987-03-02 Boat loader system for semiconductor wafer heat treatment furnace

Country Status (1)

Country Link
JP (1) JPS63213925A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011152510A1 (en) * 2010-06-04 2011-12-08 信越化学工業株式会社 Heat-treatment furnace

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011152510A1 (en) * 2010-06-04 2011-12-08 信越化学工業株式会社 Heat-treatment furnace
JP2012015501A (en) * 2010-06-04 2012-01-19 Shin Etsu Chem Co Ltd Heat treatment furnace
CN103038865A (en) * 2010-06-04 2013-04-10 信越化学工业株式会社 Heat-treatment furnace
AU2011259931B2 (en) * 2010-06-04 2014-09-11 Shin-Etsu Chemical Co., Ltd. Heat-treatment furnace
US9799535B2 (en) 2010-06-04 2017-10-24 Shin-Etsu Chemical Co., Ltd. Heat-treatment furnace

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