JPH07142553A - Method and equipment for sensing position wafer in boat - Google Patents
Method and equipment for sensing position wafer in boatInfo
- Publication number
- JPH07142553A JPH07142553A JP15936693A JP15936693A JPH07142553A JP H07142553 A JPH07142553 A JP H07142553A JP 15936693 A JP15936693 A JP 15936693A JP 15936693 A JP15936693 A JP 15936693A JP H07142553 A JPH07142553 A JP H07142553A
- Authority
- JP
- Japan
- Prior art keywords
- boat
- wafer
- wafers
- position detection
- sensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は縦型拡散CVD装置等の
半導体製造装置におけるボート側ウェーハ位置検知方法
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a boat side wafer position detecting method in a semiconductor manufacturing apparatus such as a vertical diffusion CVD apparatus.
【0002】[0002]
【従来の技術】半導体製造装置の1つに縦型拡散CVD
装置がある。この装置はカセットに装填されたウェーハ
を移載機によってボートに移載し、該ボートを炉内の反
応室へ挿入して加熱反応させるものである。通常、ウェ
ーハカセットからボートへウェーハ移載機により移載す
る場合、移載機を制御している主制御部に、カセットの
ウェーハ位置及び枚数に対し、ボートのウェーハ挿入位
置を登録しなければならない。2. Description of the Related Art Vertical diffusion CVD is one of semiconductor manufacturing devices.
There is a device. In this apparatus, a wafer loaded in a cassette is transferred to a boat by a transfer machine, and the boat is inserted into a reaction chamber in a furnace for heating reaction. Normally, when transferring from a wafer cassette to a boat by a wafer transfer machine, the wafer insertion position of the boat must be registered for the wafer position and the number of wafers in the cassette in the main control unit that controls the transfer machine. .
【0003】カセットのウェーハ位置及び枚数はカセッ
トステージに載せたウェーハカセットに対し、ウェーハ
検知センサを垂直方向に相対的に走査させ、ウェーハ検
知を行う。その方法の1例として、特願平2−3446
9号(特開平3−237739号)公報に記載されてい
る方法がある。あるいは、カセットステージからカセッ
トを複数列、多段に収納するカセットストッカにカセッ
トを載せ、移載機の昇降テーブルに取付けたウェーハ検
知センサを使う方法の1例として、特願平2−1789
42号(特開平4−67283号)公報に記載されてい
る方法があり、これらの方法などにより、カセットのウ
ェーハ位置及び枚数の自動検知及び登録が可能である。The wafer position and the number of wafers in the cassette are detected by relatively scanning the wafer detection sensor in the vertical direction with respect to the wafer cassette mounted on the cassette stage. As an example of the method, Japanese Patent Application No. 2-3446
There is a method described in Japanese Patent Application Laid-Open No. 3-237739. Alternatively, as an example of a method of mounting a cassette on a cassette stocker that stores a plurality of cassettes from the cassette stage in multiple rows and using a wafer detection sensor attached to a lifting table of a transfer machine, Japanese Patent Application No. 2-1789
There is a method described in Japanese Patent Laid-Open No. 42-67283 (Japanese Patent Laid-Open No. 4-67283), and these methods and the like can automatically detect and register the wafer position and the number of wafers in the cassette.
【0004】ボートのウェーハ挿入位置(ウェーハピッ
チ間隔及び搭載枚数)登録は、従来、カセット内ウェー
ハをツィーザで取り出し、石英ボートに移載するに当
り、正確にボート上の溝部分に入れるため、実際にウェ
ーハあるいは相当品を使用して移載動作をさせて、人間
の目視により、図3に示すように石英ボート2の所定の
溝、例えば最上,最下位の溝にウェーハ1を1枚挿入
し、最適位置を探し出し基準値として主制御部(メイン
コントローラ)に登録し、また、ウェーハピッチ間隔及
び搭載枚数は主制御部(メインコントローラ)に接続さ
れている操作部13から入力する。この後、ボート各溝
に、プロセス,ダミー,モニターウェーハを挿入載置,
反応室に挿入,加熱反応させるが、幾度と石英ボートを
使用している間に、該石英ボートは熱変形をおこし、反
応室から引き出すことになる。Conventionally, the wafer insertion positions (wafer pitch interval and number of mounted wafers) of the boat are registered because the wafers in the cassette are taken out by the tweezers and accurately placed in the groove portions on the boat when they are transferred to the quartz boat. Then, a wafer or an equivalent product is used to perform a transfer operation, and as shown in FIG. 3, one wafer 1 is inserted into a predetermined groove of the quartz boat 2, for example, the uppermost groove and the lowermost groove, by human visual inspection. The optimum position is registered in the main control unit (main controller) as a search reference value, and the wafer pitch interval and the number of mounted wafers are input from the operation unit 13 connected to the main control unit (main controller). After this, process, dummy and monitor wafers are inserted and placed in each groove of the boat.
Although the quartz boat is inserted into the reaction chamber and reacted by heating, the quartz boat is deformed by heat during the use of the quartz boat, and the quartz boat is pulled out from the reaction chamber.
【0005】[0005]
【発明が解決しようとする課題】上記従来例にあって
は、ボート2からウェーハ1を、移載機3のツィーザ3
Aにより引き出す場合に、搬送エラー(吸着エラー等)
を起こす場合があり、最悪の場合には、ウェーハ1とツ
ィーザ3Aが接触し、ボートへのウェーハ挿入時の場合
にボート2とウェーハ1が接触し衝突して、ウェーハ1
あるいはボート2の破損につながり、移載の正しい機能
が果たせないという課題がある。又、移載機3のボート
2へのウェーハ1挿入のポジション登録は、人の目視,
感等,人手により最下位置のボート2の溝にウェーハ1
を触れないように挿入出来る位置を探し出し、それを人
の手により主制御部に登録するという方法を採っている
ため、ウェーハ挿入の調整に熟練した技術と多大な時間
を必要とするという課題がある。In the above-mentioned conventional example, the wafer 1 is transferred from the boat 2 to the tweezer 3 of the transfer machine 3.
Transport error (adsorption error, etc.) when pulling out by A
In the worst case, the wafer 1 and the tweezers 3A come into contact with each other, and when the wafer is inserted into the boat, the boat 2 and the wafer 1 come into contact with each other and collide with each other.
Alternatively, there is a problem that the boat 2 is damaged and the correct function of transfer cannot be performed. In addition, the position registration for inserting the wafer 1 into the boat 2 of the transfer machine 3 is performed by the human eyes,
Feeling, etc., manually put the wafer 1 in the groove of the boat 2 at the lowest position.
Since the method is to find a position where the wafer can be inserted without touching it and register it in the main control unit by hand, it requires a skill and a lot of time to adjust the wafer insertion. is there.
【0006】[0006]
【課題を解決するための手段】本発明は上記の課題を解
決するためになされたもので、自動的にボートへのウェ
ーハ挿入位置を探し出し、主制御部に登録を行うことが
できるボート側ウェーハ位置検知方法及び装置を提供し
ようとするものである。即ち、本発明方法及び装置は図
1に示すように、移載機3を上昇,下降し、既に主制御
部6に登録されているボート2の最上部,最下部など各
部3枚のウェーハ1U,1Dを移載機3に取付けたウェ
ーハ位置検知センサ4により検知し、実測値と登録の値
(ボート最上部,最下部のウェーハの距離、各部3枚の
ウェーハピッチ平均、基準位置のずれ)を比較し、許容
範囲内のずれであれば主制御部6に登録することを特徴
とする。The present invention has been made to solve the above problems, and it is possible to automatically find a wafer insertion position into a boat and register it in the main control unit. An object of the present invention is to provide a position detection method and device. That is, according to the method and apparatus of the present invention, as shown in FIG. 1, the transfer machine 3 is raised and lowered, and the three wafers 1U of each part such as the uppermost part and the lowermost part of the boat 2 already registered in the main control part 6 are provided. , 1D is detected by the wafer position detection sensor 4 attached to the transfer machine 3, and the measured value and the registered value (the distance between the uppermost and lowermost wafers of the boat, the average wafer pitch of three wafers in each part, and the deviation of the reference position) Is compared, and if the deviation is within the allowable range, it is registered in the main control unit 6.
【0007】[0007]
【実施例】図1は本発明方法及び装置の1実施例の構成
を示す説明図、図2(A),(B)はそれぞれ本実施例
におけるウェーハ位置検知の説明図及びボートの説明図
である。本実施例は、図1及び図2に示すように、ボー
ト2の最上部、最下部の各溝に、既に主制御部(メイン
コントローラ)6に登録された基準位置の溝位置、ウェ
ーハピッチをもとに計算し、移載機3で自動的に、ある
いは人為的に3枚のウェーハ1U,1Dをボート2に挿
入する。超音波方式の反射型ウェーハ位置検知センサ4
が取付けられた移載機3を昇降させる移載機昇降機構9
を構成する例えばモータ7により、ネジ軸14を回転さ
せ、これに螺合せしめた昇降テーブル及びこの昇降テー
ブル上の水平方向に移動するツィーザ3Aからなる移載
機3を上昇または下降せしめる構成になっている。5は
キャップである。DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is an explanatory view showing the constitution of one embodiment of the method and apparatus of the present invention, and FIGS. 2 (A) and 2 (B) are an explanatory view of wafer position detection and an explanatory view of a boat in this embodiment, respectively. is there. In the present embodiment, as shown in FIGS. 1 and 2, the groove position of the reference position and the wafer pitch which are already registered in the main control unit (main controller) 6 are set in the uppermost and lowermost grooves of the boat 2, respectively. Based on the calculation, the transfer machine 3 automatically or artificially inserts the three wafers 1U and 1D into the boat 2. Ultrasonic type reflective wafer position detection sensor 4
Transfer device lifting mechanism 9 for lifting the transfer device 3 to which the
The screw shaft 14 is rotated by, for example, the motor 7, which constitutes the above structure, and the transfer machine 3 including the lifting table screwed onto the screw shaft 14 and the tweezers 3A moving in the horizontal direction on the lifting table is moved up or down. ing. 5 is a cap.
【0008】図2に示すごとく、始めに基準位置の溝
が、ボート2の最下部とした場合、反射型ウェーハ位置
検知センサ4を、主制御部6の登録の値に従い、基準位
置より下の位置に移動する。次に図1に示すごとく、モ
ータ7によりセンサ4を上昇させ、実際のセンサ4移動
はロータリエンコーダ8により得られ、図2に示すごと
く、ボート2の最下部の各溝に挿入された3枚のウェー
ハ1Dを検知する。図1に示すごとく、反射型ウェーハ
位置検知センサ4から出力されたウェーハ位置検知(有
無)信号と、ロータリエンコーダ8のセンサ位置検出信
号の値を、ウェーハ検出部10に入力し、とある処理に
より基準位置のずれ、ボート2の最下部の各溝に挿入さ
れたウェーハピッチの平均値が求まる。主制御部6で予
めパラメータとして設定したウェーハ検知幅に対し、そ
の許容範囲に入っているか否か、またウェーハピッチ間
隔が登録されている値の許容範囲に収まっているか判定
する。例えば、特願平3−216325号公報のような
処理が考えられる。As shown in FIG. 2, when the groove at the reference position is the lowermost portion of the boat 2 at the beginning, the reflection type wafer position detection sensor 4 is moved below the reference position according to the value registered in the main controller 6. Move to position. Next, as shown in FIG. 1, the sensor 4 is raised by the motor 7, and the actual movement of the sensor 4 is obtained by the rotary encoder 8. As shown in FIG. Wafer 1D is detected. As shown in FIG. 1, the wafer position detection (presence / absence) signal output from the reflective wafer position detection sensor 4 and the value of the sensor position detection signal of the rotary encoder 8 are input to the wafer detection unit 10, and a certain process is performed. The deviation of the reference position and the average value of the wafer pitch inserted in each groove at the bottom of the boat 2 are obtained. It is determined whether the wafer detection width preset as a parameter by the main control unit 6 is within the permissible range and whether the wafer pitch interval is within the permissible range of the registered value. For example, a process as disclosed in Japanese Patent Application No. 3-216325 can be considered.
【0009】次に反射型ウェーハ位置検知センサ4を、
主制御部6に登録の値に従い、ボート2の最上部の各溝
に挿入された3枚のウェーハ1Uを検知する。これによ
りボート2の最上部,最下部のウェーハ1U,1Dの距
離およびボート2の最上部に挿入されたウェーハピッチ
の平均値が求まり、上記同様の判定が行われる。許容範
囲であれば、主制御部6に、補正データとして登録を行
うことで、より正確に確実にウェーハ搬送が可能であ
る。又、センサ調整状態により、測定値が許容範囲に収
まらない場合には、再度調整を行うが、表示部において
ウェーハ位置検知センサ4の位置調整が表示されるの
で、再調整を容易に行なえる。尚、本実施例ではボート
2の最上部,最下部の3つの各溝にウェーハ1を装填
し、検知用ウェーハを3枚としたが、3枚以上でもよ
く、3枚以上とすることにより、より高精確な検知が行
える。図1に示すように、反応処理、使用中のボートの
検知するウェーハの位置、ウェーハの数はこれに限定さ
れるものではない。また、センサ4は超音波センサに代
えて光反射型センサであってもよく、又反射型でなく透
過型でもよい。Next, the reflection type wafer position detection sensor 4 is
According to the value registered in the main control unit 6, the three wafers 1U inserted in the grooves at the top of the boat 2 are detected. As a result, the distance between the uppermost and lowermost wafers 1U and 1D of the boat 2 and the average value of the wafer pitch inserted in the uppermost portion of the boat 2 are obtained, and the same determination as above is performed. If it is within the allowable range, the wafer can be transferred more accurately and surely by registering it as correction data in the main controller 6. If the measured value does not fall within the allowable range due to the sensor adjustment state, the readjustment is performed again. However, since the position adjustment of the wafer position detection sensor 4 is displayed on the display unit, the readjustment can be easily performed. In this embodiment, the wafer 1 is loaded in each of the three grooves at the uppermost and lowermost portions of the boat 2 and the number of detection wafers is three. However, three or more wafers may be used. More accurate detection is possible. As shown in FIG. 1, the reaction process, the position of the wafer detected by the boat in use, and the number of wafers are not limited to these. Further, the sensor 4 may be a light reflection type sensor instead of the ultrasonic wave sensor, and may be a transmission type instead of a reflection type.
【0010】上記のように本実施例においては、ボート
2の上部,下部にそれぞれウェーハ1U,1Dを3枚ず
つ入れておく。移載機3を上下方向に移動させて、入れ
ておいたウェーハ1U,1Dを移載機3に取り付けたセ
ンサ4で読み取る。読み取った位置データよりウェーハ
1間の平均値を求め、ボート2の溝数に合わせ均等に振
り分ける。この値より、ウェーハ1がボート2に触れず
に挿入載置できる位置の幅を割り出し、その値をウェー
ハ挿入の位置として主制御部6に登録する。本実施例に
よれば、ボート2へのウェーハ1の移載及びボート2か
らのウェーハ1の移載のための位置登録調整時間を大幅
に短縮することができ、かつボート2とツィーザ3A又
はウェーハ1との接触を回避してボート2又はウェーハ
1の破損を防止し、ウェーハ移載を円滑に確実に行うこ
とができることになる。As described above, in this embodiment, three wafers 1U and 1D are placed in the upper and lower portions of the boat 2, respectively. The transfer machine 3 is moved in the vertical direction, and the wafers 1U and 1D that have been placed are read by the sensor 4 attached to the transfer machine 3. An average value between the wafers 1 is obtained from the read position data, and the wafers 1 are evenly distributed according to the number of grooves in the boat 2. From this value, the width of the position where the wafer 1 can be inserted and placed without touching the boat 2 is calculated, and the value is registered in the main controller 6 as the wafer insertion position. According to this embodiment, the position registration adjustment time for transferring the wafer 1 to and from the boat 2 and transferring the wafer 1 from the boat 2 can be significantly shortened, and the boat 2 and the tweezers 3A or the wafer can be shortened. It is possible to prevent the boat 2 or the wafer 1 from being damaged by avoiding contact with the wafer 1, and to transfer the wafer smoothly and surely.
【0011】[0011]
【発明の効果】上述のように本発明によれば、移載機3
を上昇,下降し、既に主制御部6に登録されているボー
ト2の最上部,最下部など各部3枚のウェーハ1U,1
Dを移載機3に取付けたウェーハ位置検知センサ4によ
り検知し、実測値と登録の値(ボート最上部,最下部の
ウェーハの距離、各部3枚のウェーハピッチ平均、基準
位置のずれ)を比較し、許容範囲内のずれであれば主制
御部6に登録することを特徴とする方法及び装置である
ため、ボート2へのウェーハ1の移載及びボート2から
のウェーハ1の移載のための位置登録調整時間を大幅に
短縮することができ、かつボート2とツィーザ3A又は
ウェーハ1との接触を回避してボート2又はウェーハ1
の破損を防止し、ウェーハ移載を円滑に確実に行うこと
ができる。As described above, according to the present invention, the transfer machine 3
The upper and lower parts of the boat 2 which are already registered in the main control unit 6 and are moved up and down, and each of the three wafers 1U, 1
D is detected by the wafer position detection sensor 4 attached to the transfer machine 3, and the measured value and the registered value (the distance between the uppermost and lowermost wafers of the boat, the average wafer pitch of three wafers in each part, and the deviation of the reference position) In comparison, if the deviation is within the allowable range, the method and the device are characterized in that they are registered in the main control unit 6. Therefore, the transfer of the wafer 1 to the boat 2 and the transfer of the wafer 1 from the boat 2 are performed. The position registration adjustment time for the boat 2 or the wafer 1 can be significantly reduced, and the contact between the boat 2 and the tweezers 3A or the wafer 1 can be avoided.
Can be prevented and the wafer can be transferred smoothly and surely.
【図1】本発明方法及び装置の1実施例の構成を示す説
明図である。FIG. 1 is an explanatory diagram showing the configuration of an embodiment of a method and apparatus of the present invention.
【図2】(A),(B)はそれぞれ本実施例におけるウ
ェーハ位置検知の説明図及びボートの説明図である。2A and 2B are an explanatory view of wafer position detection and an explanatory view of a boat in the present embodiment, respectively.
【図3】従来方法及び装置の1例の構成を示す要部の説
明図である。FIG. 3 is an explanatory diagram of a main part showing a configuration of an example of a conventional method and apparatus.
1 ウェーハ 1U (最)上部のウェーハ 1D (最)下部のウェーハ 2 ボート 3 移載機 3A ツィーザ 4 ウェーハ位置検知センサ 6 主制御部(メインコントローラ) 7 駆動部(モータ) 8 センサ位置検出部(ロータリエンコーダ) 9 移載機昇降機構 10 ウェーハ検出部 11 駆動部(モータ)コントローラ 12 駆動部(モータ)ドライバ 1 wafer 1U (uppermost) upper wafer 1D (lowermost) lower wafer 2 boat 3 transfer machine 3A tweezers 4 wafer position detection sensor 6 main control unit (main controller) 7 drive unit (motor) 8 sensor position detection unit (rotary) Encoder) 9 Transfer device lifting mechanism 10 Wafer detection unit 11 Drive unit (motor) controller 12 Drive unit (motor) driver
───────────────────────────────────────────────────── フロントページの続き (72)発明者 池田 和人 東京都港区虎ノ門二丁目3番13号 国際電 気株式会社内 (72)発明者 開発 秀樹 東京都港区虎ノ門二丁目3番13号 国際電 気株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Kazuto Ikeda 2-13-13 Toranomon, Minato-ku, Tokyo Kokusai Electric Co., Ltd. (72) Inventor Development Hideki 2-3-13 Toranomon, Minato-ku, Tokyo International Electric Co., Ltd.
Claims (3)
以上のウェーハ(1U,1D)を挿入載置しておき、こ
の上,下部のウェーハ(1U,1D)を,移載機(3)
を上下方向に移動させてこれに取付けられたウェーハ位
置検知センサ(4)により検知すると共にセンサの移動
をセンサ位置検出部(8)により検出し、ウェーハ位置
検知信号とセンサ位置検出信号をウェーハ検出部(1
0)に入力し、主制御部(6)に予めパラメータとして
設定した値に対し許容範囲にあるかどうか判定すること
を特徴とするボート側ウェーハ位置検知方法。1. Three or more wafers (1U, 1D) are inserted and placed on the upper and lower portions of a boat (2), and the upper and lower wafers (1U, 1D) are transferred by a transfer machine (1). 3)
Is moved up and down, and the wafer position detection sensor (4) attached thereto detects the movement of the sensor by the sensor position detection unit (8) to detect the wafer position detection signal and the sensor position detection signal. Department (1
0), and determines whether or not the value is preset within the main control unit (6) as a parameter and is within an allowable range.
合、その値を補正データとして主制御部(6)に登録
し、その補正データにより移載機(3)の動作を補正す
ることを特徴とする請求項1のボート側ウェーハ位置検
知方法。2. When the value of the wafer position is within the allowable range, the value is registered as correction data in the main control unit (6), and the operation of the transfer machine (3) is corrected by the correction data. The boat-side wafer position detecting method according to claim 1, wherein
載置された3枚以上のウェーハ(1U,1D)を検知す
るウェーハ位置検知センサ(4)を,移載機昇降機構
(9)により昇降される移載機(3)に取付け、該ウェ
ーハ位置検知センサ(4)の移動をセンサ位置検出部
(8)により検出し、ウェーハ位置検知信号とセンサ位
置検出信号をウェーハ検出部(10)に入力して予めパ
ラメータとして設定した値に対し許容範囲内にあるか否
かを判定する主制御部(6),この主制御部(6)の出
力で前記移載機昇降機構(9)の駆動部(7)を制御す
る駆動部コントローラ(11)及び該駆動部コントロー
ラ(11)により駆動部(7)を作動する駆動部ドライ
バ(12)を具備してなるボート側ウェーハ位置検知装
置。3. A transfer device elevating mechanism (9) comprising a wafer position detection sensor (4) for detecting three or more wafers (1U, 1D) inserted and placed on the upper and lower parts of the boat (2), respectively. It is mounted on a transfer machine (3) that is moved up and down by the sensor, and the movement of the wafer position detection sensor (4) is detected by a sensor position detection unit (8). The wafer position detection signal and the sensor position detection signal are detected by the wafer detection unit (10). ) To determine whether or not it is within an allowable range with respect to the value set as a parameter in advance, and the transfer machine lifting mechanism (9) is output by the main controller (6). A boat side wafer position detecting device comprising a drive controller (11) for controlling the drive (7) and a drive driver (12) for operating the drive (7) by the drive controller (11).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15936693A JPH07142553A (en) | 1993-06-29 | 1993-06-29 | Method and equipment for sensing position wafer in boat |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15936693A JPH07142553A (en) | 1993-06-29 | 1993-06-29 | Method and equipment for sensing position wafer in boat |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH07142553A true JPH07142553A (en) | 1995-06-02 |
Family
ID=15692273
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15936693A Pending JPH07142553A (en) | 1993-06-29 | 1993-06-29 | Method and equipment for sensing position wafer in boat |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH07142553A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100431874B1 (en) * | 1995-06-22 | 2004-10-20 | 동경 엘렉트론 주식회사 | Method of Teaching Bicycles of the Subject |
JPWO2006038584A1 (en) * | 2004-10-06 | 2008-05-15 | 株式会社日立国際電気 | Semiconductor manufacturing apparatus and semiconductor device manufacturing method |
JP2009194184A (en) * | 2008-02-15 | 2009-08-27 | Renesas Technology Corp | Method of manufacturing semiconductor apparatus |
JP2010056469A (en) * | 2008-08-29 | 2010-03-11 | Tokyo Electron Ltd | Apparatus and method for heat treatment, and storage medium |
KR20140104912A (en) * | 2013-02-20 | 2014-08-29 | 도쿄엘렉트론가부시키가이샤 | Substrate transfer device, substrate processing apparatus, and substrate accommodation method |
KR20220024899A (en) * | 2019-06-27 | 2022-03-03 | 카와사키 주코교 카부시키 카이샤 | Substrate mapping apparatus, mapping method thereof, and mapping teaching method |
-
1993
- 1993-06-29 JP JP15936693A patent/JPH07142553A/en active Pending
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100431874B1 (en) * | 1995-06-22 | 2004-10-20 | 동경 엘렉트론 주식회사 | Method of Teaching Bicycles of the Subject |
JPWO2006038584A1 (en) * | 2004-10-06 | 2008-05-15 | 株式会社日立国際電気 | Semiconductor manufacturing apparatus and semiconductor device manufacturing method |
US7751922B2 (en) | 2004-10-06 | 2010-07-06 | Hitachi Kokusai Electric Inc. | Semiconductor manufacturing apparatus and manufacturing of a semiconductor device |
JP4555302B2 (en) * | 2004-10-06 | 2010-09-29 | 株式会社日立国際電気 | Semiconductor manufacturing apparatus, semiconductor device manufacturing method, and detection method |
JP2009194184A (en) * | 2008-02-15 | 2009-08-27 | Renesas Technology Corp | Method of manufacturing semiconductor apparatus |
JP2010056469A (en) * | 2008-08-29 | 2010-03-11 | Tokyo Electron Ltd | Apparatus and method for heat treatment, and storage medium |
US8423175B2 (en) | 2008-08-29 | 2013-04-16 | Tokyo Electron Limited | Thermal processing apparatus, thermal processing method, and storage medium |
US8565911B2 (en) | 2008-08-29 | 2013-10-22 | Tokyo Electron Limited | Thermal processing apparatus, thermal processing method, and storage medium |
KR20140104912A (en) * | 2013-02-20 | 2014-08-29 | 도쿄엘렉트론가부시키가이샤 | Substrate transfer device, substrate processing apparatus, and substrate accommodation method |
JP2014160775A (en) * | 2013-02-20 | 2014-09-04 | Tokyo Electron Ltd | Substrate transfer apparatus, substrate processing apparatus and substrate storage method |
KR20220024899A (en) * | 2019-06-27 | 2022-03-03 | 카와사키 주코교 카부시키 카이샤 | Substrate mapping apparatus, mapping method thereof, and mapping teaching method |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5813819A (en) | Substrate transfer apparatus, and method of transferring substrates | |
US6522942B2 (en) | Transfer apparatus for semiconductor process | |
JPH08335622A (en) | Substrate conveyer | |
US6339730B1 (en) | Processing system | |
US7433756B2 (en) | Calibration of high speed loader to substrate transport system | |
KR101245464B1 (en) | Heat treatment apparatus, heat treatment method and storage medium | |
JP4357744B2 (en) | Robot alignment system and alignment method using the system | |
JPH07142553A (en) | Method and equipment for sensing position wafer in boat | |
JP2009049200A (en) | Substrate processing apparatus, substrate processing method and storage medium | |
JPH07260455A (en) | Method and apparatus for positioning of substrate | |
JP3674063B2 (en) | Wafer transfer device | |
JPH05114641A (en) | Semiconductor wafer cassette carrier | |
JP2935060B2 (en) | Semiconductor manufacturing equipment | |
JPH0656228A (en) | Reference position automatic teaching method for conveyng robot | |
JP4580719B2 (en) | Substrate transport apparatus and substrate transport method | |
US20240109197A1 (en) | Transfer system and transfer method | |
JP2882746B2 (en) | Substrate transfer device | |
KR101258251B1 (en) | Transferring robot control system to provent damage of substrate and method for controlling thereof | |
KR20070082144A (en) | Wafer teaching apparatus for overlay equipment and method thereof | |
KR20210092906A (en) | Method and apparatus for transferring substrate | |
JPH04215454A (en) | Attitude controller for wafer cassette | |
JP2966794B2 (en) | Wafer positioning device | |
JPH0590185A (en) | Boat setting state detecting device | |
JPH05238513A (en) | Positioning method for semiconductor wafer storage cassette semiconductor wafer carrier mechanism | |
JPH0530362Y2 (en) |