JP5197836B2 - Priming processing method and priming processing apparatus - Google Patents

Description

  The present invention relates to a priming processing method and a priming processing apparatus for forming a liquid film of a processing liquid as a preparation for coating processing in the vicinity of a discharge port of a slit nozzle used for spinless coating processing.

  In a photolithography process in the manufacturing process of flat panel displays (FPD) such as LCDs, a long slit nozzle having slit-like discharge ports is scanned to apply a resist solution onto a substrate to be processed (for example, a glass substrate). The spinless method is often used.

  In such a spinless method, in order to prevent non-uniformity of the resist dry film thickness and coating unevenness, the resist solution discharged onto the substrate during coating scanning rotates to the back side of the slit nozzle in the scanning direction. It is desirable that the meniscus formed in this way be aligned in a horizontal line in the longitudinal direction of the nozzle. To this end, the coating gap between the slit nozzle outlet and the substrate is closed with an appropriate amount of resist solution immediately before the start of coating scanning. Is a necessary condition. In order to satisfy this requirement, a priming process for forming a liquid film of a resist solution from the discharge port of the slit nozzle to the lower end of the back surface is performed as a preparation for coating scanning.

  In a typical priming method, a cylindrical priming roller having a length equal to or longer than that of the slit nozzle is horizontally installed near the coating processing unit, and is opposed to the top of the priming roller through a minute gap. The resist nozzle is discharged by bringing the slit nozzle close to the position, and immediately after that, the priming roller is rotated in a predetermined direction. Then, the resist solution discharged near the top of the priming roller is wound around the outer peripheral surface of the priming roller so as to wrap around the lower part of the back surface of the slit nozzle, and is divided into a slit nozzle side and a priming roller side. The liquid film is cut off. A liquid film of the resist solution remains on the slit nozzle from the nozzle discharge port to the lower end of the back surface.

  A conventional general priming processing apparatus is provided with not only a rotating mechanism that rotates the priming roller but also a scraper, a cleaning nozzle, and a drying nozzle for cleaning the priming roller. As a process, the priming roller is continuously rotated by a rotating mechanism, the resist solution is scraped off from the outer peripheral surface of the priming roller by a scraper, and the cleaning liquid and the drying gas are sprayed from the cleaning nozzle and the drying nozzle to the outer peripheral surface of the priming roller, respectively. Yes.

  However, the region on the priming roller used for receiving and winding the resist solution discharged from the slit nozzle in one priming process varies depending on the size of the slit nozzle and the priming roller, but the entire circumference of the priming roller ( 360 degrees) is not required, and it is usually less than half a circle (180 degrees), and may be less than 1/4 (90 degrees) or less than 1/5 (72 degrees). However, the conventional general priming processing apparatus sprays the cleaning liquid on the entire outer peripheral surface (all circumferences) of the priming roller by continuously rotating the priming roller as described above every time the priming process is executed. There was a problem of using a large amount of (usually thinner).

  In order to solve this problem, the present applicant, in Patent Document 1, for one priming process, the discharge port of the slit nozzle and the upper end of the priming roller face each other with a predetermined gap therebetween, and the slit nozzle A more constant amount of processing liquid or coating liquid (for example, resist liquid) is discharged and the priming roller is rotated by a predetermined rotation angle, and a partial surface area equal to or less than a half circumference of the priming roller is used for the priming process. A priming method is disclosed in which the outer peripheral surface of the priming roller is collectively cleaned over the entire circumference after a predetermined number of priming processes have been completed.

  In this priming method, the outer peripheral surface of the priming roller is divided into a plurality of circumferential directions, and the divided areas (partial surface areas) are sequentially assigned to a predetermined number of continuous priming processes, and then the priming roller is used. The outer peripheral surface of is collectively cleaned over the entire circumference. In this batch cleaning process, the cleaning mechanism and the drying unit are operated while the priming roller is continuously rotated by the rotating mechanism, and the outer peripheral surface of the priming roller is cleaned all around. In addition, there is no need for a scraper to scrape off the liquid film of the coating liquid wound on the surface of the priming roller, and it is possible to save the cleaning liquid consumed in the cleaning process after the priming process and to generate particles during the cleaning process. Can also be prevented.

JP2007-237046

  The present invention is an improved version of the priming treatment method disclosed by the present applicant in the above-mentioned Patent Document 1 and, from a unique point of view, further improves the cleaning liquid used in the priming treatment while considering the yield or reliability of the priming treatment. To achieve savings.

  That is, the present invention provides a priming processing method and a priming processing apparatus that can further reduce the amount of cleaning liquid used while ensuring the reliability of the priming processing.

In the priming method of the present invention, in a coating process in which a coating liquid is applied onto a substrate to be processed using a long slit nozzle, a liquid film of the coating liquid is prepared near the discharge port of the slit nozzle as a preparation for the coating process. A method of forming a priming process, wherein the slit nozzle is separated by a predetermined gap with respect to a top portion of a cylindrical or columnar priming roller disposed horizontally for a first priming process. A first step of causing the slit nozzles to face each other in parallel and discharging a predetermined amount of the coating liquid to the slit nozzle, and causing the priming roller to reciprocate at a predetermined rotation angle immediately after the coating liquid is discharged. A second step and rotating the priming roller in the forward direction to allow a part of the coating liquid discharged on the outer peripheral surface of the priming roller to A third step of winding as a liquid film, and a first standby for allowing the first coating liquid film wound on the outer peripheral surface of the priming roller to wait until the next priming process is performed. A fourth step of stopping rotation of the priming roller at a rotation angle position for use, and a first step of naturally drying the first coating liquid film on the priming roller at the first rotation angle position for standby. And a sixth step of removing the first coating liquid film on the priming roller by washing.

The priming processing apparatus of the present invention provides a liquid film of a processing liquid as a preparation for the coating process in the vicinity of a discharge port of the slit nozzle in a coating process in which a coating liquid is applied on a substrate to be processed using a long slit nozzle. A priming processing apparatus for forming a cylindrical or columnar priming roller disposed horizontally at a predetermined position, a rotating mechanism for rotating the priming roller about its central axis, and an outer periphery of the priming roller A cleaning mechanism for spraying cleaning liquid to clean the surface, an exhaust mechanism for forcibly exhausting the periphery of the priming roller, and a control unit for controlling the operations of the rotating mechanism, the cleaning unit, and the exhaust unit The top of a cylindrical or columnar priming roller disposed horizontally for a first priming process On the other hand, the discharge port of the slit nozzle is opposed in parallel with a predetermined gap, and a predetermined amount of coating liquid is discharged to the slit nozzle, and immediately after the coating liquid is discharged, a predetermined mechanism is applied to the priming roller by the rotating mechanism. A reciprocating rotational motion is performed at a rotation angle, the priming roller is rotated by the rotation mechanism, and a part of the coating liquid discharged onto the outer peripheral surface of the priming roller is wound as a first coating liquid film The first coating liquid film wound on the outer peripheral surface of the priming roller is placed at a first standby rotation angle position for waiting until the next priming process is performed, The rotation of the priming roller is stopped, the first coating liquid film on the priming roller is naturally dried at the first standby rotation angle position, and the cleaning mechanism The removed by an exhaust system is operated washing the first coating liquid film on the priming roller.

  In the above priming processing method or priming processing apparatus, the coating liquid just discharged onto the priming roller from the slit nozzle is slit by causing the priming roller to perform a preferably low-speed reciprocating rotation immediately after discharging the coating liquid. The nozzle discharge portion (lower end surface) is leveled in the roller circumferential direction, so that a liquid pool is less likely to occur at the end of the liquid film. As a result, the coating liquid film formed on the priming roller does not cause liquid dripping in the middle of moving to the predetermined standby rotation position, and has no liquid reservoir, so when it stops at the standby rotation position In addition, dripping is less likely to occur even in a stationary state. Thus, not only the effects of the priming processing method or the priming processing device of the first aspect can be obtained, but also an effect that the setting range of the standby rotation position can be expanded is obtained.

  Further, in the priming processing method or priming processing apparatus of the present invention, immediately after winding the coating liquid film on the priming roller and separating it, the rotation operation of the priming roller is continued for a predetermined time, and finally, An operation for reaching a predetermined standby rotation position can be preferably employed. As a result, the coating liquid film formed on the priming roller does not cause liquid dripping during the continuous rotation operation, but also stops at the standby rotation position when the film thickness is leveled to some extent during the rotational movement. Even when it is or when it is stationary, it becomes more difficult to cause dripping. As a result, an effect of extending or further expanding the setting range of the standby rotation position can be obtained.

  According to the priming processing method or the priming processing apparatus of the present invention, the amount of the cleaning liquid used can be further reduced while ensuring the reliability of the priming processing by the configuration and operation as described above.

It is a figure which shows the structure of the priming processing apparatus in one Embodiment of this invention. It is a figure which shows typically each step | level when the 1st priming process is performed in a 1st system. It is a figure which shows the rotational speed characteristic of the priming roller in the priming process operation | movement for 1 time in a 1st system with the waveform on a time-axis. It is a figure which shows typically each step | level when the 2nd priming process is performed in a 1st system. It is a figure which shows typically each step | level when the last (4th) priming process and the batch cleaning process immediately after are performed within one rotation of a priming roller in a 1st system. It is a figure which shows the rotational speed characteristic of the priming roller in the priming process operation | movement of FIG. 5, and a package cleaning process with the waveform on a time-axis. It is a figure for demonstrating the effect | action of the priming processing apparatus in a washing | cleaning process. It is a figure which shows typically each step when the 1st priming process is performed in the modification of a 1st system. It is a figure which shows typically each step when the 2nd priming process is performed in the said modification. It is a figure which shows typically each step | level when the 1st priming process is performed in another modification of a 1st system. It is a figure which shows typically each step when the 2nd priming process is performed in the said modification. It is a figure which shows typically each step | level when the 1st priming process is performed in a 1st Example. It is a figure which shows the rotational speed characteristic of the priming roller in the priming process operation | movement for 1 time in a 1st Example with the waveform on a time-axis. It is a figure which shows typically each step | level when the 1st priming process is performed in a 2nd Example. It is a figure which shows the rotational speed characteristic of the priming roller in the priming process operation | movement for 1 time in a 2nd Example with the waveform on a time-axis.

Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.

[Configuration of Priming Processing Device]

  FIG. 1 shows a configuration of a priming processing apparatus according to an embodiment of the present invention. This priming processing apparatus is incorporated in a resist coating apparatus (not shown) that performs spinless resist coating processing in, for example, a photolithography process for an LCD manufacturing process, and places or floats a substrate to be processed for resist coating processing. It arrange | positions near the application | coating stage (not shown) to convey.

  In the illustrated priming apparatus, the housing 10 is formed of a long casing having a slit-like opening 12 on the upper surface, and the top of the priming roller 14 to be accommodated is exposed upward via the opening 12. Are supported horizontally and rotatably by a bearing (not shown).

  The priming roller 14 is a cylindrical or columnar roller made of stainless steel, for example, and has a certain outer diameter (for example, 100 to 150 mm) and a length that covers the entire length of a slit nozzle 72 described later. The housing 10 may also be made of stainless steel, for example.

In the housing 10, the top or top of the priming roller 14 is set to a reference position P ₀ (0 °), and preferably in a rotation direction of a normal rotation (counterclockwise in FIG. 1), a rotation angle position of 90 ° to 180 °. A cleaning nozzle 18 of the cleaning mechanism 16 is provided in the section. The cleaning nozzle 18 is preferably composed of a long two-fluid jet nozzle 18 and is disposed in parallel with the length covering the entire length of the priming roller 14, and is connected to the cleaning liquid supply unit 24 and the gas via pipes 20 and 22. It is connected to the supply unit 26. On-off valves 28 and 30 are provided in the middle of the pipes 24 and 26, respectively.

  When cleaning the priming roller 14, the on-off valves 28 and 30 are opened, and the two-fluid jet nozzle 18 is supplied with cleaning liquid (for example, thinner) and gas (for example, air or nitrogen gas) from the cleaning liquid supply unit 24 and the gas supply unit 26, respectively. Is received at a desired flow rate, and the cleaning liquid and gas are mixed in the nozzle and sprayed onto the outer peripheral surface of the priming roller 16 by a jet flow from a slit or a porous discharge port. The cleaning control unit 25 controls the cleaning liquid supply unit 24, the gas supply unit 26, and the on-off valves 28 and 30, and individually and arbitrarily controls the flow rates of the cleaning liquid and gas under instructions from the main control unit 70 described later. It can be done.

  The section between the opening 12 and the cleaning mechanism 16 is a mist shield 32 that is close to the inner wall of the housing 10 with a slight gap that does not contact the outer peripheral surface of the priming roller 14. The mist generated around the two-fluid jet nozzle 18 when cleaning the priming roller 14 does not go out to the opening 12 side through the gap of the mist shielding portion 32, but is blocked there.

  In the housing 10, a mist drawing part 34, a suction port 36 and a forced drying part 38 are provided on the opposite side of the mist shielding part 32 and the cleaning mechanism 16 around the priming roller 14.

The mist pull-in portion 34 is preferably provided in a section with a rotation angle position of 180 ° to 270 ° in the forward rotation direction with the top of the priming roller 14 as a reference position P ₀ (0 °). The mist pull-in portion 34 in the illustrated configuration example has a mist pull-in gap 40 formed between the inner wall of the housing 10 and the outer peripheral surface of the priming roller 14 in the section.

  The forced drying unit 38 is preferably provided in a section having a rotation angle position of 270 ° to 360 ° on the downstream side of the mist pulling unit 34. The forced drying unit 38 in the illustrated configuration example has a liquid draining gap 42 formed between the inner wall of the housing 10 and the outer peripheral surface of the priming roller 14 in the section.

  The suction port 36 communicates with a vacuum device 48 having, for example, a vacuum pump or an intake fan (not shown) and a mist trap or a filter through a vacuum passage 44 and a vacuum pipe 46. An exhaust damper 52 that is controlled to open and close by the exhaust valve control unit 50 is provided near the end of the vacuum passage 44. When the vacuum device 48 is turned on and the exhaust damper 52 is opened, the mist drawing section 34 and the forced drying section 38 are operated, and the mist drawing gap 40 and the liquid draining gap 42 are connected to the intake port 36 from the outside. An air flow for drawing mist and an air flow for draining flow respectively. When the exhaust damper 52 is closed, even if the vacuum device 48 is turned on, the vacuum does not reach the intake port 36, and the mist drawing part 34 and the forced drying part 38 are turned off.

  In this priming processing apparatus, the exhaust mechanism 45 for forcibly exhausting the surroundings of the priming roller 14 includes the mist drawing part 34, the suction port 36, the forced drying part 38, the vacuum device 48, and the exhaust valve control part as described above. 50 and an exhaust damper 52 are provided.

  A drain port 54 is formed in the bottom of the housing 10 at a position directly below the priming roller 14. The drain port 54 communicates with a drain tank 58 via a drain pipe 56.

  In this priming processing apparatus, a rotation mechanism 65 for rotating the priming roller 14 includes a motor 60, a rotation control unit 62, and an encoder 64. The motor 60 is preferably a servo motor, and its rotational drive shaft is connected to the rotational shaft of the priming roller 14 via a transmission mechanism (not shown) such as a pulley or a transmission belt. The rotation control unit 62 can arbitrarily control not only the basic operation (rotation, stop, speed control, etc.) of the motor 60 but also the rotation amount and rotation angle position of the motor 60 through the encoder 64.

  This priming processing apparatus is provided with a film thickness measuring unit 67 for measuring the film thickness of the resist film on the priming roller 14. The film thickness measurement unit 67 includes a film thickness sensor 66 and a film thickness calculation unit 68.

  The film thickness sensor 66 is installed or disposed in the vicinity of the opening 12 so as not to interfere with the slit nozzle 72, and the film thickness of the resist liquid film adhering to the outer peripheral surface of the priming roller 14 facing directly from the position. Is measured by a non-contact method, that is, an optical method. As another configuration example, the film thickness sensor 66 is movably supported by, for example, a support arm, and the film thickness sensor 66 is positioned on the opening 12 when the slit nozzle 72 moves away from the opening 12 of the housing 10. You may combine them.

  The film thickness calculation unit 68 inputs the output signal of the film thickness sensor 66 and calculates the film thickness measurement value of the resist liquid film on the priming roller 14. Preferably, a plurality of film thickness sensors 66 are arranged in a row at regular intervals in the axial direction of the priming roller 14, and the film thickness distribution characteristics of the resist liquid film can be measured not only in the circumferential direction of the priming roller 14 but also in the axial direction. It is like that. The film thickness measurement value or the film thickness distribution characteristic measurement value obtained by the film thickness measurement unit 67 is sent to the main control unit 70.

  The main control unit 70 includes a microcomputer that operates according to predetermined software, and controls the operations of the cleaning mechanism 16, the exhaust mechanism 45, the rotation mechanism 65, and the film thickness measurement unit 67 in the priming processing apparatus. In the illustrated configuration example, the main control unit 70 directly controls the operations of the vacuum device 48, the film thickness sensor 66, and the film thickness calculation unit 68, and the cleaning control unit 25, the exhaust valve control unit 50, and the rotation control unit 62. The operations of the two-fluid jet nozzle 18, the exhaust damper 52 and the motor 60 are controlled. Further, the main control unit 70 can grasp or control the rotation amount and rotation angle position of the priming roller 14 through the rotation control unit 62 of the rotation mechanism 65.

  The main control unit 70 controls the entire sequence in the priming processing apparatus, and at least for the priming process, all of the slit nozzles 72 for resist coating processing provided in the resist coating apparatus. It is designed to control the operation.

That is, in the resist coating apparatus, the slit nozzle 72 is supported by the nozzle moving mechanism 74 and is transported to an arbitrary position in a preset space and positioned at an arbitrary position. A resist solution is supplied to the slit nozzle 72 from the resist supply unit 76 via a resist supply pipe 78. Here, an opening / closing valve 80 is provided in the resist supply pipe 78. Regarding the priming process, the main control unit 70 controls the movement and positioning of the slit nozzle 72 and the resist solution discharge operation through the nozzle moving mechanism 74, the resist supply unit 76, and the on-off valve 80.

[First method of priming processing method]

  Next, the first method of the priming processing method that can be performed by this priming processing apparatus will be described with reference to FIGS.

  In the resist coating apparatus in which the priming processing apparatus is incorporated, each time a coating process for one substrate is completed on the coating stage, a single priming process is performed by the priming processing apparatus as a preparation for the next coating process. Done.

  FIG. 2 shows each stage when the first (first) priming process is performed after the outer peripheral surface of the priming roller 14 is reset to a clean state over the entire circumference. FIG. 3 shows the rotational speed characteristics of the priming roller 14 in a single priming operation with a waveform on the time axis.

  In this priming process, first, as shown in FIG. 1, the nozzle is set so that the discharge port of the slit nozzle 72 faces the top of the priming roller 14 in parallel with a predetermined gap (for example, several tens to several hundreds μm). The slit nozzle 72 is positioned through the moving mechanism 74. In this scene, the exhaust mechanism 45 as well as the cleaning mechanism 16 is stopped.

Next, as shown in I (discharge / leaving) in FIG. 2, a predetermined time (t _{0 to} t ₁ : 1 second, for example) is spent on the slit nozzle 72 through the resist supply unit 76 while the priming roller 14 is stationary. Then, a certain amount of resist solution R is discharged, and immediately after that, it is left as it is for a predetermined time (t _{1 to} t ₂ : for example, 3 seconds). The resist solution R discharged from the slit nozzle 72 spreads around in the nozzle longitudinal direction and the roller circumferential direction in the vicinity of the discharge port of the slit nozzle 72 and the top of the priming roller 14 during the standing time (t _{1 to} t ₂ ).

Next, the rotation mechanism 65 causes the priming roller 14 to start rotating in the forward direction at a predetermined timing (time t _{2 in} FIG. 3), and the resist solution R is applied to the slit nozzle as shown in II (winding) in FIG. The resist solution R is wound around the first divided region 14 (1) set on the outer peripheral surface of the priming roller 14 so as to wrap around the lower back surface 72 a of 72. Here, the roller rotational speed V _a when winding the resist solution R is a relatively low speed is preferred that order not to cut off urgently a liquid film of the resist solution R, chosen in several 10 mm / sec, for example peripheral speed It is.

Next, the rotational speed of the priming roller 14 is increased at a stroke at a predetermined timing (time point t _{3 in} FIG. 3). As a result, as shown in III (separation) in FIG. 2, the liquid film of the resist solution R is separated and separated into the slit nozzle 72 side and the priming roller 14 side. At this time, if the slit nozzle 72 is raised, the resist liquid film can be separated more smoothly and reliably at a predetermined site. Thus, the resist film liquid film RF remains on the slit nozzle 72 from the nozzle outlet to the lower back end portion 72a.

On the other hand, on the outer peripheral surface of the priming roller 14, liquid film RM ₁ wound resist solution as described above remains as the first resist liquid film (coating liquid film). Here, in the forward rotation direction of the priming roller 14, there is a tendency that a liquid pool portion m ₁ having a cross-sectional shape is formed at the front end portion of the first resist liquid film RM ₁ .

For example, when the outer peripheral surface of the priming roller 14 is divided into four equal parts in the circumferential direction and each divided area 14 (n) (n = 1 to 4) is used for one priming process, each divided area 14 (n) rotating direction winding size of each resist solution film RM _n is formed can be set to the size of the rotation angle range for example 75 ° to 85 ° to.

After the first resist liquid film RM ₁ is cut off from the slit nozzle 72 in this way, the first resist liquid film RM ₁ is shown in IV (stop / standby) in FIG. 2 without stopping the rotation of the priming roller 14. The first standby rotation angle position <P ₁ > is rotated and the rotation of the priming roller 14 is stopped.

In this case, the rotational speed characteristic of the priming roller 14 from the separation of the resist liquid film RM ₁ to the stop (t _{4 to} t ₅ ) can be arbitrarily set, but the separation speed V _b as shown in FIG. to standardized to the characteristics of decelerating at a constant rate from raised to a raised speed V _c (negative acceleration) than is preferred.

In this way, the resist solution does not drip from the first resist liquid film RM ₁ (particularly, the liquid reservoir portion m ₁ ) on the rotating priming roller 14 by gravity, that is, another divided region on the outer peripheral surface of the priming roller 14. The first resist liquid film RM ₁ can be stably moved to the first standby rotation angle position <P ₁ > without contaminating the (unused area).

That is, if the rotation of the priming roller 14 is stopped immediately after the resist liquid film RM _n is cut off, a downward force in the circumferential direction continuously acts on the resist liquid film RM _{n due} to gravity, and the outer periphery of the priming roller 14 The resist liquid film RM _n hangs down or forward on the surface. In the spinless coating method using a slit nozzle, a low viscosity resist solution of 20 cp or less is usually used, so that the resist solution film is liable to drip on the priming roller. However, in this system, by continuing the rotation of the priming roller 14 without stopping, the action of gravity acting on the resist liquid film RM _n (force to induce liquid dripping) is substantially canceled, and the priming roller 14 can be kept stopped in a predetermined area (divided area) in the surface tension without increasing the resist solution film RM _n taken up on by dripping.

As the first standby rotation angle position <P ₁ >, preferably, the center of the first resist liquid film RM ₁ is at the lowermost part of the roller (180 °), as indicated by IV (stop / standby) in FIG. You can select the position to arrive. In this case, the front end of the first resist liquid film RM ₁ is located upstream of the rotation angle position of 225 ° in the circumferential direction of the positive rotation of the priming roller 14, and the rear end of the _first resist liquid film RM ₁ is It falls on the downstream side of the rotation angle position of 135 °.

By keeping the first resist liquid film RM ₁ stationary at the first standby rotation angle position <P ₁ >, even if the liquid moves in the first resist liquid film RM ₁ , In particular, even if the resist solution moves from the liquid reservoir m ₁ to a lower part, it only acts in the direction in which the thickness of the first resist solution film RM ₁ is equalized, and the adjacent divided region (unused) It does not protrude into the area.

Thus, the first resist liquid film RM ₁ remains stationary at the _first standby rotation angle position <P ₁ > on the priming roller 14 for a predetermined time (until the next (second) priming process). t ₄ -t ₅ : for example 40-50 seconds) exposed to ambient air or natural drying.

  During this time, the slit nozzle 72 is sent to the coating stage by the nozzle moving mechanism 74, where it is subjected to resist coating processing for one substrate. When the resist coating process is completed, the slit nozzle 72 returns to the priming apparatus again, and its discharge port is parallel to the top of the priming roller 14 with a predetermined gap as shown in FIG. It positions so that it may oppose.

FIG. 4 shows each stage when the second priming process is performed. Preferably, the first resist solution film RM ₁ downstream neighboring divided regions 14 on the outer peripheral surface of the priming roller 14 (2) is devoted to the second priming. For this purpose, the priming roller 14 is rotated in the positive direction by a predetermined rotation angle immediately before starting the second priming process.

  In the second priming process, as shown in I (discharge / leaving) in FIG. 4, the divided area 14 (2) on the outer peripheral surface of the priming roller 14 (more precisely, the front end of this divided area) is removed. Located at the top of the priming roller 14 and with exactly the same operation and timing as in the first priming process, a certain amount of resist solution R is ejected to the slit nozzle 72 and is left as it is for a predetermined time immediately after.

  Next, as shown in FIG. 4, the steps of winding up the resist solution R (II), separating (III), and stopping / waiting (IV) are sequentially performed with the same operation and timing as in the first priming process. Done.

Also in this case, as in the case of the first priming process, a predetermined circumferential direction size (in the rotational angle range of 75 ° to 75 °) is formed on the outer peripheral surface of the priming roller 14 by the winding (II) and separation (III) steps. 85 °), the resist solution R is wound up to form the second resist solution film RM ₂ . Then, the rotation of the priming roller 14 is continued as it is, and the second resist liquid film RM ₂ is moved from the position (III) to the second standby rotation angle position <P2>.

Thus, the second resist liquid film RM ₂ is used for the second standby without causing the resist liquid to drip from the second resist liquid film RM ₂ (particularly, the liquid reservoir m ₂ ) on the rotating priming roller 14. It can be stably moved to the rotation angle position <P ₂ >.

The second standby rotation angle position <P ₂ > is also preferably set so that the center of the second resist liquid film RM ₂ is at the lowermost part of the roller (180 °), as indicated by IV (stop / standby) in FIG. You can select the position to come. In this case, the front end of the second resist liquid film RM ₂ is located downstream of the position of the rotation angle of 225 ° in the circumferential direction of the positive rotation of the priming roller 14, and the rear end of the _second resist liquid film RM ₂ is It falls in the upstream side of the rotation angle position of 135 °. By keeping the second resist liquid film RM ₂ stationary at the second standby rotation angle position <P ₂ >, even if the liquid moves in the second resist liquid film RM ₂ , It does not protrude into the adjacent divided area (unused area).

The first resist liquid film RM ₁ stands by next to the upstream side of the second resist liquid film RM ₂ in the circumferential direction of the positive rotation of the priming roller 14, that is, within a range of a rotation angle position of 45 ° to 135 °. It will be different. Here, the first resist liquid film RM ₁ has a first standby rotation angle position <P ₁ > between the time when the first priming process is completed and the time when the second priming process is started. Since the liquid film surface has been dried to some extent because it has been subjected to natural drying, the liquid film can remain at a position deviated from the first standby rotation angle position <P ₁ > (within a range of 45 ° to 135 °). It is difficult to sag. Further, temporarily, on the priming roller 14, the resist solution is moved from the front end portion (liquid pool portion m ₁ ) of the first resist liquid film RM ₁ to a lower place (the rear end portion side of the _second resist liquid film RM ₂ ). Even if there is movement (liquid dripping), the location is within the used divided areas 14 (1) to 14 (2), and no trouble occurs (the unused area is not soiled).

Although not shown, the third priming process is performed in exactly the same procedure and operation as the first and second priming processes described above. As a result, a region different from the first and second resist liquid films RM ₁ and RM ₂ on the priming roller 14, usually adjacent to the downstream side of the second resist liquid film RM ₂ in the forward rotation direction. the divided area 14 (3), the third resist solution film RM ₃ is formed at a predetermined circumferential direction size (75 ° to 85 °) as remnants accompanying the priming process the third. The third resist liquid film RM ₃ moves to the third standby rotation angle position <P ₃ > set near the lowermost part of the roller (180 °) immediately after the priming roller 14 is wound, and there. Receive natural drying.

Although not shown, while the third resist liquid film RM ₃ waits on the priming roller 14 at the third standby rotation angle position <P ₃ > at the lowermost part of the roller (180 °), the second resist liquid The film RM ₂ stands by next to the upstream side of the third resist liquid film RM ₃ , that is, in a region having a rotation angle position of 45 ° to 135 °, and the first resist liquid film RM ₁ is the same as the second resist liquid film RM ₁ . Waiting is performed in the region adjacent to the upstream side, that is, the rotation angle position of −45 ° to 45 °.

In this case, the second resist liquid film RM ₂ is the same as the first resist liquid film RM ₁ after the second priming process as described above, and there is no problem of dripping. Further, the central portion of the first resist liquid film RM ₁ is positioned at the uppermost portion of the roller, and the rear end thereof is positioned higher than the adjacent unused region, that is, the fourth divided region 14 (4). However, since the first resist liquid film RM ₁ has been exposed to natural drying for a considerably long time (usually 100 seconds or more), an unused area (from the rear end portion of the _first resist liquid film RM ₁ to the next unused area ( The liquid does not drip into the fourth divided region 14 (4)).

  In this first method, after the outer peripheral surface of the priming roller 14 is reset to a clean state over the entire periphery, the priming process is performed a predetermined number of times, for example, four times, and then the priming roller 14 is collectively cleaned (the entire outer peripheral surface Cleaning of the circumference).

  FIG. 5 shows each stage when the last (fourth) priming process and the immediately following batch cleaning process are performed within one rotation of the priming roller 14. FIG. 6 shows the rotational speed characteristics of the priming roller 14 in the time axis waveform in the priming processing operation and the collective cleaning processing operation of FIG.

Even in the final (fourth) priming process, as shown in FIG. 5, each step of discharging and leaving the resist solution R (I), winding up the resist solution film RM ₄ (II), and separating (III) is 1 is the same as when each priming times th to 3 th, the fourth resist in the fourth divided region 14 on the outer peripheral surface of the downstream side next to the third resist solution film RM ₃ priming roller 14 (4) liquid film RM ₄ is wound up.

  However, after the separation (III), the stop / standby (IV) process is skipped, and the process proceeds to the cleaning (V) process while the rotation of the priming roller 14 is continued. In this cleaning (V) step, the cleaning mechanism 16 and the exhaust mechanism 45 are operated.

Before starting the cleaning (V) process, the main control unit 70 passes through the rotating mechanism 65 and the film thickness measuring unit 67 to form the resist liquid films RM ₁ , RM ₂ , RM attached on the priming roller 14. _3, The range (area) and film thickness of RM ₄ are measured, and the amount of cleaning liquid used in the cleaning (V) step is determined by calculation based on the measurement result. For example, the total resist amount (range / film thickness) of all resist liquid films adhering to the priming roller 14 is set as a reference value, and the amount of cleaning liquid used is determined to be equal to the reference value (total resist amount). Good.

As for the resist solution film measurement, usually because the same priming on priming roller 14 are repeated, the range and the thickness of the resist solution film RM _n attached to each divided region 14 (n) are the same Therefore, it is possible to measure only one of them, for example, the range (area) and film thickness of the first resist liquid film RM ₁ .

As a preferred embodiment in the cleaning (V) process, the main control unit 70 is configured such that the two-fluid jet nozzle 18 is a region or a part where the resist liquid films RM _{1 to} M ₄ are attached to the outer peripheral surface of the priming roller 14. The rotation mechanism 65 and the cleaning mechanism 16 are interlocked (linked) and controlled so that the two-fluid jet flow of the cleaning liquid and air is sprayed only on the surface. Here, the flow rate or amount of use of the cleaning liquid is determined based on the resist film measurement as described above.

Thus, the strong impact of the two-fluid jet ejected from the two-fluid jet nozzles 18, half-dry or semi-dry state by the fourth resist solution film RM ₄ is of course natural drying freshly deposited on the outer peripheral surface of the priming roller 14 All the other resist liquid films RM ₁ , RM ₂ , RM ₃ are easily washed off, and most of them are mixed with the cleaning liquid and fall to the drain port 54 immediately below, and the rest is changed to mist ma in the vicinity. Scatter. Of the mist ma generated around the two-fluid jet nozzle 18 during the collective cleaning, the mist that has risen upward is blocked by the mist shielding portion 32 and hardly comes out to the opening 12 side of the housing 10.

  On the other hand, in the exhaust mechanism 45, the exhaust damper 52 is opened, and the vacuum from the vacuum device 48 is supplied to the mist drawing unit 34 and the forced drying unit 38 via the vacuum pipe 46, the vacuum passage 44 and the suction port 36.

  As shown in FIG. 7, the mist pull-in portion 34 sucks the mist ma generated around the two-fluid jet nozzle 18 from the lower end of the gap 40, and the mist ma is put into the outer peripheral surface of the priming roller 14 in the gap 40. The mist ma that flows in the rotational direction along the upper side of the gap 40 and is discharged from the upper end of the gap 40 to the suction port 36 is sent to the vacuum device 48. The forced drying unit 38 sucks air into the gap 42 from the upper atmospheric space through the opening 12, and flows the air in the gap 42 along the outer periphery of the priming roller 14 in the direction opposite to the rotation direction. The liquid remaining on the outer peripheral surface of the priming roller 14 is scraped off by air pressure to form droplets, and the mist mb that has exited from the lower end of the gap 42 to the suction port 36 is sent to the vacuum device 48. In this way, the vacuum is used to drain the liquid by applying an air flow in the direction opposite to the rotation direction to the outer peripheral surface of the priming roller 14, and the mist mb generated by the liquid draining is recovered as it is by the vacuum. It is highly efficient and can prevent mist from scattering.

When a predetermined time has elapsed since the start of the cleaning (V) process as described above (time t _{G in} FIG. 6), the cleaning mechanism 16 is turned off to stop the two-fluid jet cleaning. After that, while the priming roller 14 is continuously rotated, only the operation of the exhaust mechanism 45 (the mist drawing unit 34 and the forced drying unit 38) is continued, and the outer peripheral surface of the priming roller 14 is forced to dry with vacuum force over the entire circumference. Switch to the drying (VI) process. Then, after a predetermined time has elapsed, the exhaust damper 52 is closed, the exhaust mechanism 45 is turned off, the drying process is stopped, and all the steps of the batch cleaning process are completed.

From the viewpoint of aligning the tact, the total processing time (t ₄ to t _{H in} FIG. 6) including the cleaning (V) and forced drying (VI) in the batch cleaning processing is the time required for movement / standby (IV) ( It is preferably set to the same length (for example, 60 seconds) as t ₄ to t ₆ ) in FIG. In this case, the cleaning (V) processing time (t ₄ to t _{G in} FIG. 6) is set to 20 seconds, for example, and the forced drying (VI) processing time (t _G to t _{H in} FIG. 6) is set to 40 seconds, for example. May be set.

As described above, according to the first method, the outer peripheral surface of the priming roller 14 is divided into a plurality (for example, four) in the circumferential direction, and the divided regions 14 (1) to 14 (4) are continuously provided. Each is assigned to a predetermined number (4 times) of priming processes. In each priming process excluding the final (fourth) priming process, each resist liquid film RM _n is placed on a special standby rotation angle position <P _n > immediately after being wound on the priming roller 14. Then, by waiting at the rotation angle position <P _n > for standby until the next priming process is performed, liquid dripping from each resist liquid film RM _n (particularly, the liquid reservoir portion m _n ) is prevented and natural drying is performed. Can be in a dry or semi-dry state.

In this way, since the resist liquid film RM _n can be prevented from dripping on the priming roller 14, there is no possibility that the adjacent unused divided area is soiled, and therefore the subsequent priming process is affected by the previous priming process. However, the reproducibility and reliability of the priming process can be improved.

Further, since the resist liquid film RM _n adhering to the priming roller 14 is cleaned as a dry-dried resist liquid film by natural drying or in a completely liquid state, it can be easily washed off and the burden on the cleaning mechanism 16 is reduced. In addition, the amount of cleaning liquid used can be reduced.

Further, in the collective cleaning, since an appropriate amount of cleaning liquid is sprayed only to the region where the resist liquid films RM ₁ , RM ₂ , RM ₃ , and RM ₄ are adhered on the outer peripheral surface of the priming roller 14, the usage amount of the cleaning liquid is further increased. Can be reduced.

  In the illustrated example, the outer peripheral surface of the priming roller 14 is divided into four equal parts in the circumferential direction, and the resist liquid winding size in the circumferential direction in one priming process is set to 75 ° to 85 °. However, any number of divisions and take-up sizes are possible. For example, the take-up size per turn may be 72 ° or less, and the outer peripheral surface of the priming roller 14 may be divided into five and used continuously five times. Is possible.

As another preferred example of the standby rotation angle position <P _n >, for example, as shown in FIG. 8 (first priming process) and FIG. 9 (second priming process), the outer peripheral surface of the priming roller 14 it is also possible to wound into the front end of the resist solution film RM _n immediately after cut away to set the rotation angle position as get to the bottom roller. By keeping the resist liquid film RM _n at a stand-by (static) position at the standby rotation angle position <P _n > as shown in the figure, even if the liquid moves in the resist liquid film RM ₁ , The liquid does not collect (stop) in the liquid pool portion _mn and protrude into the divided area (unused area) adjacent to the downstream side.

In short, basically, the standby rotation angle position <P _n > is the rotation angle position (FIGS. 2 and 4) at which the center of the resist liquid film RM _n reaches the bottom of the roller, and the front end of the resist liquid film RM _n It is preferably set within the range of the rotation angle position (FIGS. 8 and 9) that reaches the lowermost part of the roller.

As still another preferred example of the standby rotation angle position <P _n >, for example, as shown in FIG. 10 (first priming process) and FIG. 11 (second priming process), the outer peripheral surface of the priming roller 14 it is also possible to wound into the front end of the resist solution film RM _n immediately after cut to set the rotation angle position as get to the roller top. By keeping a resist solution film RM _n is waiting (still) in the standby rotational angle position, such as shown <P _n>, and most dripping prone liquid reservoir portion m _n resting on a substantially horizontal roller top surface Therefore, it does not protrude from the downstream divided area (unused area).

[First embodiment of priming method]

  Next, with reference to FIGS. 12 and 13, a first embodiment of a priming processing method that can be performed by this priming processing apparatus will be described.

  FIG. 12 shows each stage when the first priming process is performed on the priming roller 14 in the first embodiment. FIG. 13 shows the rotational speed characteristics of the priming roller 14 in a single priming operation with a waveform on the time axis.

The first embodiment is characterized in that no liquid reservoir _mn is generated at the front end of the resist liquid film RM _n wound around the outer peripheral surface of the priming roller 14. As a method therefor, the resist immediately after the discharge step (I), rather than to leave it for a while, as shown in IIA in FIG. 12, first, lower speed than the winding priming roller 14 V _a (e.g. peripheral Rotate in the forward direction at a predetermined rotation angle (for example, 30 ° to 50 °) or for a predetermined time (t ₁ to t _{N in} FIG. 13: for example, about 1.5 seconds) at V _e . That is, after the low-speed forward rotation of the priming roller 14 is stopped, as shown in IIB of FIG. 12, the priming roller 14 is now rotated at the same or similar low speed V _f at substantially the same rotation angle or predetermined time. (t _N ~t in Figure 13 _2: e.g., about 1.5 seconds) is rotated in the reverse direction.

By the reciprocating motion of the priming roller 14 preferably at a low speed, the resist solution R just discharged from the resist nozzle 72 onto the priming roller 14 is leveled in the roller circumferential direction by the discharge portion (lower end surface) of the resist nozzle 72. The liquid pool (m _n ) hardly occurs at the end of the liquid film. As an incidental effect, in the resist nozzle 72, the uniformity of the bead of the resist solution formed in the vicinity of the discharge port is improved.

In this way, the resist solution R is thoroughly leveled in the roller circumferential direction (and also in the nozzle longitudinal direction) around the discharge port of the resist nozzle 72, and then wound with the same operation and timing as the first method described above. The steps of take-off operation (III), separation (IV), and movement / stop (V) to the rotation angle position <P _n > for standby are executed. As a result, a flat resist liquid film RM _n having no liquid pool (m _n ) is wound on the priming roller 14, and the flat resist liquid film RM _n is naturally dried at the standby rotation angle position <P _n >. Exposed to.

In this embodiment, the resist liquid film RM _n formed on the priming roller 14 does not cause liquid dripping in the course of moving to the standby rotation angle position <P _n >, but also has a liquid pool (m _n ). Since there is no liquid dripping, it is even more difficult to cause dripping even when stopped at a standby rotational angle position <P _n > or when it is stationary. That is, an effect that the setting range of the standby rotation angle position <P _n > can be expanded is obtained. For example, as shown in FIG. 12, the position <AP _n > _where the front end of the resist liquid film RM _n arrives at the bottom of the roller, as well as the position _where the front end of the resist liquid film RM _n arrives at the rotational angle position of 270 ° as the limit position. Even with <BP _n >, it is possible to prevent dripping.

As a modified example of the first embodiment, particularly as a modified example related to the reciprocating rotation operation (IIA, IIB) of the priming roller 14, the number of reciprocations is set to two times or more, the reverse rotation is performed first, the forward rotation operation It is possible to set the conditions (speed, time, moving distance, etc.) of the reverse rotation operation independently.

[Second Embodiment of Priming Method]

  Next, a second embodiment of the priming processing method that can be performed by this priming processing apparatus will be described with reference to FIGS.

  FIG. 14 shows each stage when the first priming process is performed on the priming roller 14 in the second embodiment. FIG. 15 shows the rotational speed characteristics of the priming roller 14 in a single priming processing operation as a waveform on the time axis.

This second embodiment, immediately after disconnecting wound a resist solution film RM _n on the priming roller 14, a predetermined time as a constant speed rotational movement of the priming roller 14 (for example, the same speed as the disconnection speed V _a) (T ₄ to t _{J in} FIG. 15: preferably 10 seconds or more) After performing the continuous rotation operation (Q) to be continued, finally (at t _J to t _K in FIG. 15) a predetermined rotation angle position for standby The operation (IV) to reach < _Pn > is performed.

The exhaust mechanism 45 is stopped during the continuous rotation operation (Q). That is, when the evacuation mechanism 45 is turned on and the priming roller 14 is rotated, the resist liquid film RM ₁ on the priming roller 14 is subjected to a large stress due to the back wind in the gap 42 of the forced drying unit 38, and the film thickness uniformity. It is easy to lower. In particular, when there is variation in the axial direction in the counterwind applied to the resist liquid film RM _n in the gap 42 of the forced drying section 38, streaky irregularities extending in the circumferential direction are likely to be attached to the surface of the resist liquid film RM _n . If the exhaust mechanism 45 is stopped, the resist liquid film RM _n on the outer peripheral surface of the priming roller 14 is not subjected to the pressure of the back wind even when passing through the gap 42 during the rotation of the priming roller 14, and is left in the atmosphere in a stationary state. It is possible to receive the natural drying equivalent to the case where it was done more effectively.

Also in the second embodiment, the resist liquid film RM _n formed on the priming roller 14 does not cause liquid dripping during the continuous rotation operation (Q), but also accumulates at the front end during the rotational movement. By leveling the part (m _n ) to some extent, it is more difficult for liquid dripping to occur even when it is stopped at the standby rotational angle position <P _n > or when it is stationary. That is, as in the first embodiment, an effect that the setting range of the standby rotation angle position <P _n > can be expanded is obtained. For example, as shown in FIG. 14, not only the position <AP _n > _where the front end of the resist liquid film RM _n reaches the bottom of the roller, but also the position _where the front end of the resist liquid film RM _n reaches the rotational angle position of 270 ° as the limit position. Even with <BP _n >, it is possible to prevent dripping.

[Other embodiments]

  The second embodiment can be combined with the first embodiment, and in this case, the dripping prevention effect can be further improved by a synergistic action.

  In the collective cleaning process, the amount of cleaning liquid used is increased, but it is also possible to spray the cleaning liquid around the entire outer peripheral surface of the priming roller 14.

  The configuration or function of each unit in the priming processing apparatus is not limited to that of the above-described embodiment. For example, a cleaning tool other than the two-fluid jet nozzle, such as a scraper, can be used or used in the cleaning mechanism 16, and various configurations of each part of the exhaust mechanism 45, particularly the forced drying unit 38, can be modified.

  As the coating solution in the present invention, in addition to the resist solution, for example, a coating solution such as an interlayer insulating material, a dielectric material, and a wiring material can be used. The substrate to be processed in the present invention is not limited to an LCD substrate, and other flat panel display substrates, semiconductor wafers, CD substrates, photomasks, printed substrates and the like are also possible.

DESCRIPTION OF SYMBOLS 10 Housing 14 Priming roller 16 Cleaning mechanism 45 Exhaust mechanism 60 Motor 62 Rotation control part 65 Rotation mechanism 70 Main control part 72 Slit nozzle 76 Resist supply part

Claims (18)

In a priming treatment method for forming a liquid film of a coating liquid as a preparation for the coating process in the vicinity of a discharge port of the slit nozzle in a coating process in which a coating liquid is applied onto a substrate to be processed using a long slit nozzle. There,
For the first priming process for one time, the slit nozzle discharge port is made to face in parallel with a predetermined gap with respect to the top of a horizontally arranged cylindrical or columnar priming roller, and the slit A first step of discharging a certain amount of coating liquid to the nozzle;
A second step of causing the priming roller to perform a reciprocating rotational motion at a predetermined rotational angle immediately after discharging the coating liquid;
A third step of rotating the priming roller in the forward direction to wind up a part of the coating liquid discharged on the outer peripheral surface of the priming roller as a first coating liquid film;
The first coating liquid film wound on the outer peripheral surface of the priming roller is placed at a first standby rotation angle position for waiting until the next priming process is performed, and the priming A fourth step of stopping the rotation of the roller;
A fifth step of naturally drying the first coating liquid film on the priming roller at the first standby rotation angle position;
And a sixth step of removing the first coating liquid film on the priming roller by cleaning.   Between the third step and the fourth step, in order to promote natural drying of the first coating liquid film, the rotation of the priming roller started in the third step is continued for a predetermined time. The priming method according to claim 1, comprising a seventh step.   The first standby rotation angle position includes a rotation angle position at which a rear end of the first coating liquid film reaches the lowermost part of the roller in the forward rotation direction of the priming roller, and the first coating liquid film. The priming processing method according to claim 1, wherein the front end of the roller is within a range of a rotation angle position at which the front end of the roller reaches the lowermost part of the roller.   The first standby rotation angle position includes a rotation angle position where the center of the first coating liquid film reaches the lowermost part of the roller in the forward rotation direction of the priming roller, and a position of the first coating liquid film. The priming processing method according to claim 1, wherein the front end is within a range of a rotation angle position at which the front end reaches the lowermost part of the roller.   The first standby rotation angle position is a position where the front end of the first coating liquid film reaches the top of the roller in the circumferential direction of the positive rotation of the priming roller. Priming method. For another second priming process, the first coating liquid film is removed and the discharge port of the slit nozzle is opposed in parallel with a predetermined gap with respect to the top of the priming roller, An eighth step of discharging a predetermined amount of coating liquid to the slit nozzle;
A ninth step of causing the priming roller to perform a reciprocating rotational motion at a predetermined rotational angle immediately after discharging the coating liquid;
A tenth step of rotating the priming roller in the forward direction and winding up a part of the coating liquid discharged on the outer peripheral surface of the priming roller as a second coating liquid film;
The second coating liquid film wound on the outer peripheral surface of the priming roller is placed at a second standby rotation angle position for waiting until the next priming process is performed, and the priming An eleventh step of stopping the rotation of the roller;
A twelfth step of naturally drying the second coating liquid film on the priming roller at the second standby rotation angle position;
In the sixth step, the first and second coating liquid films on the priming roller are collectively removed by cleaning.
The priming processing method according to any one of claims 1 to 5.   Between the tenth step and the eleventh step, the rotation of the priming roller started in the tenth step is continued as it is for a predetermined time in order to promote natural drying of the second coating liquid film. The priming method according to claim 6, comprising a thirteenth step.   The second standby rotation angle position includes a rotation angle position at which a rear end of the second coating liquid film reaches the lowermost part of the roller in the rotation direction of the positive rotation of the priming roller, and the second coating liquid film. The priming processing method according to claim 6 or 7, wherein the front end of the roller is within a range of a rotation angle position at which the front end of the roller reaches the lowermost part of the roller.   The second rotation angle position for standby includes a rotation angle position where the center of the second coating liquid film reaches the lowermost part of the roller in the rotation direction of the positive rotation of the priming roller, and the second coating liquid film The priming processing method according to claim 6 or 7, wherein the front end is within a range of a rotation angle position at which the front end reaches the lowermost part of the roller.   The second standby rotation angle position is a position where the front end of the second coating liquid film reaches the top of the roller in the circumferential direction of the positive rotation of the priming roller. Priming method.   When the second priming process is a priming process performed after the first priming process, the second coating liquid film is the first coating liquid film in the circumferential direction of the positive rotation of the priming roller. The priming process according to any one of claims 6 to 10, wherein a predetermined region on an outer peripheral surface of the priming roller is filled for the second priming process so as to be formed adjacent to the downstream side of the priming roller. Method.   In the sixth step, the cleaning liquid is sprayed only on a region of the outer peripheral surface of the priming roller to which the coating liquid film is attached while rotating the priming roller. The priming processing method as described.   Prior to the sixth step, the range and thickness of the coating liquid film adhering to the outer peripheral surface of the priming roller are measured, and the amount of cleaning liquid used in the sixth step is determined based on the measurement result. The priming processing method according to any one of claims 6 to 12, which is determined. A priming processing apparatus for forming a liquid film of a processing liquid as a preparation for the coating process in the vicinity of a discharge port of the slit nozzle in a coating process in which a coating liquid is applied onto a substrate to be processed using a long slit nozzle. There,
A cylindrical or columnar priming roller disposed horizontally at a predetermined position;
A rotation mechanism for rotating the priming roller about its central axis;
A cleaning mechanism for spraying a cleaning liquid to clean the outer peripheral surface of the priming roller;
An exhaust mechanism for forcibly exhausting the periphery of the priming roller;
A control unit that controls each operation of the rotation mechanism, the cleaning unit, and the exhaust unit;
For the first priming process for one time, the slit nozzle discharge port is made to face in parallel with a predetermined gap with respect to the top of a horizontally arranged cylindrical or columnar priming roller, and the slit Let the nozzle discharge a certain amount of coating liquid,
Immediately after discharging the coating liquid, the rotating mechanism causes the priming roller to perform a reciprocating rotational motion at a predetermined rotational angle,
The priming roller is rotated by the rotating mechanism, and a part of the coating liquid discharged onto the outer peripheral surface of the priming roller is wound up as a first coating liquid film,
The first coating liquid film wound on the outer peripheral surface of the priming roller is placed at a first standby rotation angle position for waiting until the next priming process is performed, and the priming Stop the rotation of the roller,
Naturally drying the first coating liquid film on the priming roller at the first standby rotation angle position;
Operating the cleaning mechanism and the exhaust mechanism to remove the first coating liquid film on the priming roller by cleaning;
Priming processing device.   In order to promote natural drying of the first coating liquid film after winding the first coating liquid film on the outer peripheral surface of the priming roller until the rotation of the priming roller is stopped, The priming processing apparatus according to claim 14, wherein the rotation of the priming roller is continued for a predetermined time as it is. For another second priming process, the first coating film is removed, and a discharge gap of the slit nozzle is made to face the top of the priming roller in parallel with a predetermined gap therebetween, A certain amount of coating liquid is discharged to the slit nozzle,
Immediately after discharging the coating liquid, the rotating mechanism causes the priming roller to perform a reciprocating rotational motion at a predetermined rotational angle,
The priming roller is rotated by the rotating mechanism, and a part of the coating liquid discharged onto the outer peripheral surface of the priming roller is wound up as a second coating liquid film,
The second coating liquid film wound on the outer peripheral surface of the priming roller is placed at a second standby rotation angle position for waiting until the next priming process is performed, and the priming Stop the rotation of the roller,
Naturally drying the second coating liquid film on the priming roller at the second standby rotation angle position;
The first and second coating liquid films on the priming roller are collectively removed by cleaning with the cleaning mechanism and the exhaust mechanism;
The priming processing apparatus according to claim 14 or 15. A liquid film measuring unit for measuring the range and film thickness of the coating liquid film adhering to the outer peripheral surface of the priming roller;
The cleaning liquid usage determining unit that determines the amount of cleaning liquid to be used for batch removal of the coating liquid film based on the measurement result obtained by the liquid film measuring unit before the batch cleaning. The priming processing apparatus according to any one of the above.   The priming processing apparatus according to any one of claims 14 to 17, wherein the cleaning mechanism sprays the cleaning liquid only on a region of the outer peripheral surface of the priming roller where a coating liquid film is attached.

Images