JP4435050B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP4435050B2 JP4435050B2 JP2005230924A JP2005230924A JP4435050B2 JP 4435050 B2 JP4435050 B2 JP 4435050B2 JP 2005230924 A JP2005230924 A JP 2005230924A JP 2005230924 A JP2005230924 A JP 2005230924A JP 4435050 B2 JP4435050 B2 JP 4435050B2
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- 238000007789 sealing Methods 0.000 claims description 11
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
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- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
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- 229910052751 metal Inorganic materials 0.000 description 2
- 241000272168 Laridae Species 0.000 description 1
- 229910020830 Sn-Bi Inorganic materials 0.000 description 1
- 229910018728 Sn—Bi Inorganic materials 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
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- 238000000206 photolithography Methods 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 230000000191 radiation effect Effects 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
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Description
このような半導体装置のなかでも、電池などの電源からのスイッチングに用いるロードスイッチとして用いられるスイッチング用MOSFETに関しては、小型化、薄型化への要求に加え、放熱効率の向上およびオン抵抗の低減等、性能面での課題がある。
図11(a)乃至(c)は、この先行技術の半導体装置を示す図であり、図11(a)は内部構造の上面図、(b)はA−A断面図、(c)は側面図である。図7に示されるように、樹脂パッケージより露出するリード端子は、パッケージの側面に沿って下方に折り曲げられるいわゆるガルウィングタイプのものであった。
本発明は、前記実情に鑑みてなされたもので、さらなる薄型化を図りつつも、効率よく放熱が可能で、オン抵抗の低減を図ることができる優れた半導体装置を提供することを目的とする。
かかる構成によれば、半導体装置のさらなる薄型化を図ることができる。
かかる構成によれば、プリント基板への実装が容易かつ安定しており、信頼性の高い半導体装置を形成することができる。
かかる構成によれば、半導体チップで発生した熱を効率よく実装されるプリント基板に逃がし、放熱することができる。
かかる構成によれば、プリント基板への実装が容易かつ安定しており、また半導体チップで発生した熱を効率よく基板に逃がし、放熱することができる。
かかる構成によれば、この半導体装置が実装されるプリント基板の配線パターンの配置に自由度を持たせることができ、信頼性の向上を図ることができる。
かかる構成によれば、半導体チップで発生した熱を効率よく逃がし、放熱することができ、パッケージの薄型化を図ることができる。
かかる構成によれば、半導体チップで発生した熱を効率よく逃がし、放熱することができ、またパッケージの薄型化が図れる。
かかる構成によれば、主リードに形成された開孔に樹脂パッケージを構成する封止樹脂が充填されることにより、主リードと樹脂パッケージの接着力を向上させることができる。このため、主リードと樹脂パッケージの界面に入り込んだ空気、水分等が、熱せられることにより膨張し、主リードと樹脂パッケージが剥がれ(火膨れ)てしまうことを防止することができる。
また、フラットリードタイプのため基板実装時に、樹脂パッケージ内に載置された半導体チップと基板の距離は短く、しかも樹脂パッケージの底部が直接基板に接触して固定されるため、半導体チップで発生した熱を効率よく基板に逃がし、すばやく放熱することができ、リードが短いことで、オン抵抗の低減を図ることができる。
また、主パッド部が十分な面積を確保できるため、大きな半導体チップを搭載できることも可能となる。
(実施の形態1)
図1(a)乃至(c)は、本発明の実施の形態1におけるMOSFET(半導体装置)を示す上面図、A−A断面図、側面図である。この半導体装置は、MOSFETを構成する半導体チップ21をフラットタイプリードを備えたリードフレーム22に載置し、樹脂パッケージ23に封止した面実装型の半導体装置を構成するものである。すなわち、この半導体装置は、樹脂パッケージ23と、前記樹脂パッケージ23内部で一体化され、チップ搭載部24を構成する4本の主リード25a、25b、25c、25dと、前記チップ搭載部24に搭載された半導体チップ21と、前記半導体チップ21のソース電極に接続された第1の表面リード26と、ゲート電極に接続された第2の表面リード27と、半導体チップと接触しドレイン電極を含む前記主リード25a、25b、25c、25dが前記樹脂パッケージの底面に沿って外方に延びるようにしたことを特徴とする。
図3(a)に示すように、図2に示したリードフレームのチップ搭載部24にMOSFETを構成する半導体チップ21の裏面が搭載されるように固着し、ボンディングワイヤ29によって半導体チップ21の表面側に形成されたゲート電極と第2の表面リード27とを接続する。
この後、図3(c)に示すようにエポキシ樹脂を用いて樹脂封止を行い半導体装置を形成する。
次に、本発明の実施の形態2について説明する。符号については実施の形態1と同じく付与する。
本実施の形態の半導体装置では、図4(a)上面図、(b)A−A断面図、(c)側面図に示すように、前記主リードは相対向する2辺のうちの1辺から2本(25c、25d)、他の1辺から1本(25a)、前記第1の表面リード26、前記第2の表面リード27が前記樹脂パッケージ23より導出され、主リードは前記樹脂パッケージの中心に対して非対称となるように構成された点で前記実施の形態1と異なるもので、他は前記実施の形態1と同様に形成される。
次に、本発明の実施の形態3について説明する。符号については実施の形態1と同様である。
本実施の形態の半導体装置では、図5(a)上面図、(b)A−A断面図、(c)側面図に示すように、前記主リードは相対向する2辺のうちの1辺から2本(25c、25d)、他の1辺から1本(25e)、前記第1の表面リード26、前記第2の表面リード27が前記樹脂パッケージ23より導出され、前記主リードの他の1辺からのものは、幅広となるように形成された点で、前記実施の形態1と異なるもので、他は前記実施の形態1と同様に形成される。ここでも、主リードは前記樹脂パッケージの中心に対して非対称となるように構成される。
次に、本発明の実施の形態4について説明する。符号については実施の形態1と同じく付与する。
本実施の形態の半導体装置では、図6(a)上面図、(b)A−A断面図、(c)側面図に示すように、前記主リードは相対向する2辺のうちの1辺から1本(25f)、他の1辺から1本(25e)、前記第1の表面リード26、前記第2の表面リード27が前記樹脂パッケージ23より導出され、前記主リードの1辺からのものと、前記主リードの他の1辺からのものとは、各々同じ幅広となるように形成された点で、前記実施の形態1と異なるもので、他は前記実施の形態1と同様に形成される。ここでは、主リード、第1および第2の表面リードはいずれも外部導出領域においては、前記樹脂パッケージの中心に対して、点対称であってかつ、樹脂パッケージの中心軸に対して対称となるように構成される。
次に、本発明の実施の形態5について説明する。本実施の形態の半導体装置では、幅広に形成された主リードに開孔33が形成されている点が、前記実施の形態3と異なるのみで、他は前記実施の形態3と同様に形成される。図7(a)上面図、(b)A−A断面図、(c)側面図に示すように、開孔33は、多数個の丸穴となるように形成される。ここで、符号については実施の形態3と同様である。
尚、前記実施の形態5では、開孔33を複数の丸穴となるように形成したが、図8に示すように長穴より形成しても良い。
次に、本発明の実施の形態7について説明する。本実施の形態の半導体装置では、幅広に形成された各々の主リードに開孔33が形成されている点が、前記実施の形態4と異なるだけで、他は前記実施の形態4と同様に形成される。図9(a)上面図、(b)A−A断面図、(c)側面図に示すように、開孔33は、多数個の丸穴となるように形成される。ここで、符号については実施の形態4と同様である。
尚、前記実施の形態7では、開孔33を複数の丸穴となるように形成したが、図10に示すように長穴より形成しても良い。
なお、前記実施の形態では、MOSFETの実装について説明したが、ディスクリート素子に限定されることなく、ICやLSIなどにも適用可能であることはいうまでもない。
2 主パッド部
3、4、5、6 リード
7、26 第1の表面リード
8、27 第2の表面リード
9、23 樹脂パッケージ
10 ソース電極
11、13 ワイヤ
12 ゲート電極
22 リードフレーム
24 チップ搭載部
25 主リード
28、29 ボンディングワイヤ
31 送り穴
32 サイドバー
33 開孔
Claims (8)
- 樹脂パッケージと、
前記樹脂パッケージ内部で一体化され、チップ搭載部を構成する少なくとも2本の主リードと、
前記チップ搭載部に搭載された半導体チップと、
前記半導体チップの表面に設けられた電極と電気的に接続された第1および第2の表面リードとを含み、
前記主リードは、前記チップ搭載部の相対向する側で互いに幅が異なるように構成され、前記主リードおよび前記第1および第2の表面リードが、前記樹脂パッケージの底面に沿って外方に伸長した半導体装置。 - 請求項1記載の半導体装置であって、
前記主リードおよび前記第1および第2の表面リードは前記樹脂パッケージ内で屈折している半導体装置。 - 請求項1叉は2記載の半導体装置であって、
前記チップ搭載部は、前記樹脂パッケージの上表面側に位置する前記主リードの面に設けられる半導体装置。 - 請求項1乃至3のいずれかに記載の半導体装置であって、
前記主リードは、前記樹脂パッケージの外側で、前記第1の表面リードおよび前記第2の表面リードよりも幅広または間隔が小さくなるように形成された複数のリードを含む半導体装置。 - 請求項1乃至4のいずれかに記載の半導体装置であって、
外部導出領域において、前記第1の表面リードと前記第2の表面リードとは、前記樹脂パッケージの中心線に対して、対称となるように配置される半導体装置。 - 請求項1乃至5のいずれかに記載の半導体装置であって、
前記チップは、前記チップ搭載部にフェースアップで搭載される半導体装置。 - 請求項1乃至6のいずれかに記載の半導体装置であって、
前記樹脂パッケージは、前記チップ上表面から前記樹脂パッケージの上表面までの距離が0.25〜0.40mmとなるように形成された半導体装置。 - 請求項1乃至7のいずれかに記載の半導体装置であって、
前記主リードは開孔を有し、
前記樹脂パッケージを構成する封止樹脂が、前記開孔内に充填されてなる半導体装置。
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