DE69126719D1 - Belichtungsvorrichtung - Google Patents

Belichtungsvorrichtung

Info

Publication number: DE69126719D1
Authority: DE; Germany
Prior art keywords: exposure device; exposure
Prior art date: 1990-03-09
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE69126719T

Other languages

English (en)

Other versions

DE69126719T2 (de

Inventor

Nobutoshi Mizusawa

Ryuichi C O Canon Kabu Ebinuma

Hiroshi Kurosawa

Koji Uda

Takao Kariya

Shunichi Uzawa

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Canon Inc

Original Assignee

Canon Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1990-03-09

Filing date

1991-03-08

Publication date

1997-08-14

1990-03-09 Priority claimed from JP2056674A external-priority patent/JP2843890B2/ja

1990-03-13 Priority claimed from JP2059904A external-priority patent/JP2805238B2/ja

1991-03-08 Application filed by Canon Inc filed Critical Canon Inc

1997-08-14 Publication of DE69126719D1 publication Critical patent/DE69126719D1/de

1997-11-06 Application granted granted Critical

1997-11-06 Publication of DE69126719T2 publication Critical patent/DE69126719T2/de

2011-03-09 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

DE69126719T 1990-03-09 1991-03-08 Belichtungsvorrichtung Expired - Fee Related DE69126719T2 (de)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP2056674A JP2843890B2 (ja)	1990-03-09	1990-03-09	露光装置
JP2059904A JP2805238B2 (ja)	1990-03-13	1990-03-13	露光装置

Publications (2)

Publication Number	Publication Date
DE69126719D1 true DE69126719D1 (de)	1997-08-14
DE69126719T2 DE69126719T2 (de)	1997-11-06

Family

ID=26397634

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE69126719T Expired - Fee Related DE69126719T2 (de)	1990-03-09	1991-03-08	Belichtungsvorrichtung

Country Status (3)

Country	Link
US (2)	US5172402A (de)
EP (1)	EP0446076B1 (de)
DE (1)	DE69126719T2 (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP3168018B2 (ja) *	1991-03-22	2001-05-21	キヤノン株式会社	基板吸着保持方法
JP3184582B2 (ja) *	1991-11-01	2001-07-09	キヤノン株式会社	Ｘ線露光装置およびｘ線露光方法
JP3187581B2 (ja) *	1992-02-10	2001-07-11	キヤノン株式会社	Ｘ線装置、ｘ線露光装置及び半導体デバイス製造方法
JP2840801B2 (ja) *	1992-12-01	1998-12-24	セイコーインスツルメンツ株式会社	座標変換係数の自動設定方法
JPH0772318A (ja) *	1993-04-28	1995-03-17	Canon Inc	反射装置とこれを用いた照明装置や露光装置、並びにデバイス製造方法
JP3167074B2 (ja) *	1993-06-30	2001-05-14	キヤノン株式会社	Ｓｏｒ露光システム及びこれを用いて製造されたマスク
JP3091821B2 (ja) *	1993-09-06	2000-09-25	キヤノン株式会社	露光装置およびデバイス製造方法
JP3101473B2 (ja) *	1993-11-05	2000-10-23	キヤノン株式会社	露光方法及び該露光方法を用いるデバイス製造方法
US5593800A (en) *	1994-01-06	1997-01-14	Canon Kabushiki Kaisha	Mask manufacturing method and apparatus and device manufacturing method using a mask manufactured by the method or apparatus
JPH07321024A (ja) *	1994-05-25	1995-12-08	Canon Inc	位置決め方法およびその装置ならびにこれらを用いた露光装置
JP3287725B2 (ja) *	1994-06-07	2002-06-04	キヤノン株式会社	露光方法とこれを用いたデバイス製造方法
EP0715215B1 (de) *	1994-11-29	2001-05-30	Canon Kabushiki Kaisha	Ausrichtverfahren und Halbleiterbelichtungsverfahren
JP3391940B2 (ja) *	1995-06-26	2003-03-31	キヤノン株式会社	照明装置及び露光装置
JP3894509B2 (ja) *	1995-08-07	2007-03-22	キヤノン株式会社	光学装置、露光装置およびデバイス製造方法
US5740864A (en) *	1996-01-29	1998-04-21	Baker Hughes Incorporated	One-trip packer setting and whipstock-orienting method and apparatus
JP3634487B2 (ja) *	1996-02-09	2005-03-30	キヤノン株式会社	位置合せ方法、位置合せ装置、および露光装置
US5920398A (en) *	1996-03-01	1999-07-06	Canon Kabushiki Kaisha	Surface position detecting method and scanning exposure method using the same
US5930324A (en) *	1996-04-03	1999-07-27	Canon Kabushiki Kaisha	Exposure apparatus and device manufacturing method using the same
US6559465B1 (en) *	1996-08-02	2003-05-06	Canon Kabushiki Kaisha	Surface position detecting method having a detection timing determination
US5739913A (en) *	1996-08-02	1998-04-14	Mrs Technology, Inc.	Non-contact edge detector
JP3337921B2 (ja)	1996-08-23	2002-10-28	キヤノン株式会社	投影露光装置および位置合せ方法
US5917580A (en) *	1996-08-29	1999-06-29	Canon Kabushiki Kaisha	Scan exposure method and apparatus
JP3286184B2 (ja) *	1996-09-25	2002-05-27	キヤノン株式会社	走査露光装置および方法
JP3377165B2 (ja) *	1997-05-19	2003-02-17	キヤノン株式会社	半導体露光装置
JP3977920B2 (ja) *	1998-05-13	2007-09-19	富士通株式会社	半導体装置の製造方法
DE19853588B4 (de) *	1998-11-20	2005-04-21	Leica Microsystems Lithography Gmbh	Halteeinrichtung für ein Substrat
JP2000357643A (ja) *	1999-06-14	2000-12-26	Canon Inc	露光方法及びそれを用いた露光装置
FR2818428A1 (fr) *	2000-12-19	2002-06-21	Ge Med Sys Global Tech Co Llc	Collimateur ajustable
JP3559766B2 (ja) *	2001-02-21	2004-09-02	キヤノン株式会社	走査露光装置及び走査露光方法並びにデバイスの製造方法
KR100531416B1 (ko) *	2003-09-17	2005-11-29	엘지.필립스 엘시디 주식회사	Ｓｌｓ 장비 및 이를 이용한 실리콘 결정화 방법
US7046768B1 (en) *	2003-11-10	2006-05-16	Inspx Llc	Shutter-shield for x-ray protection
CN106725587A (zh) *	2017-01-25	2017-05-31	深圳市通用激光科技有限公司	射线间隔装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS6037616B2 (ja) *	1980-01-24	1985-08-27	理学電機株式会社	Ｘ線リゾグラフイ装置
EP0083394B1 (de) *	1981-12-31	1986-04-09	International Business Machines Corporation	Verfahren und Vorrichtung für die gleichmässige Beleuchtung einer Fläche
JPS60198726A (ja) *	1984-03-23	1985-10-08	Hitachi Ltd	Ｘ線露光装置の露光量調整方法と装置
JP2744245B2 (ja) *	1988-03-25	1998-04-28	キヤノン株式会社	露光装置と露光方法
US5157700A (en) *	1988-09-02	1992-10-20	Canon Kabushiki Kaisha	Exposure apparatus for controlling intensity of exposure radiation
DE68925323T2 (de) *	1988-09-14	1996-05-30	Canon K.K., Tokio/Tokyo	Belichtungssteuerung in einem Röntgenbelichtungsapparat
DE69030348T2 (de) *	1989-10-03	1997-09-04	Canon K.K., Tokio/Tokyo	Belichtungsvorrichtung

1991
- 1991-03-08 DE DE69126719T patent/DE69126719T2/de not_active Expired - Fee Related
- 1991-03-08 US US07/666,649 patent/US5172402A/en not_active Expired - Lifetime
- 1991-03-08 EP EP91301974A patent/EP0446076B1/de not_active Expired - Lifetime
1994
- 1994-02-28 US US08/203,498 patent/US5377251A/en not_active Expired - Fee Related

Also Published As

Publication number	Publication date
US5172402A (en)	1992-12-15
EP0446076A3 (en)	1992-05-13
US5377251A (en)	1994-12-27
EP0446076A2 (de)	1991-09-11
EP0446076B1 (de)	1997-07-09
DE69126719T2 (de)	1997-11-06

Publication	Publication Date	Title
DE69126719D1 (de)	1997-08-14	Belichtungsvorrichtung
DE69120295D1 (de)	1996-07-18	Elektrodeionisierungsvorrichtung
DE69033499D1 (de)	2000-05-11	Belichtungsvorrichtung
DE69126611D1 (de)	1997-07-24	Bilderzeugungsgerät
DE69124438D1 (de)	1997-03-13	Positioniervorrichtung
DE69121930D1 (de)	1996-10-17	Bildaufnahmevorrichtung
DE69130511D1 (de)	1999-01-07	Bilderzeugungsgerät
DE69117682D1 (de)	1996-04-11	Abbildungsvorrichtung
DE69120746D1 (de)	1996-08-14	Bilderzeugungsgerät
DE69033002D1 (de)	1999-04-22	Belichtungsvorrichtung
DE69120897D1 (de)	1996-08-22	Röntgeneinrichtung
DE69117854D1 (de)	1996-04-18	Bilderzeugungsgerät
DE69120029D1 (de)	1996-07-11	Bilderzeugungsgerät
DE69128655D1 (de)	1998-02-19	Belichtungsgerät
DE69127877D1 (de)	1997-11-13	Bildaufnahmevorrichtung
DE69122431D1 (de)	1996-11-07	Bilderzeugungsgerät
DE69132022D1 (de)	2000-04-13	Fotografiervorrichtung
DE69129488D1 (de)	1998-07-02	Bilderzeugungsvorrichtung
DE69115784D1 (de)	1996-02-08	Bilderzeugungsgerät
DE69126456D1 (de)	1997-07-17	Belichtungsgerät
DE69115586D1 (de)	1996-02-01	Bilderzeugungsgerät
DE69115785D1 (de)	1996-02-08	Bilderzeugungsgerät
DE69117865D1 (de)	1996-04-18	Bilderzeugungsgerät
DE69030493D1 (de)	1997-05-22	Belichtungsgerät
DE69131947D1 (de)	2000-03-09	Bilderzeugungsgerät

Legal Events

Date	Code	Title	Description
1998-08-06	8364	No opposition during term of opposition
2006-01-05	8339	Ceased/non-payment of the annual fee