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CN107829068B - Mo-Se-Ta+TiAlTaN软硬复合涂层刀具及其制备方法 - Google Patents

Mo-Se-Ta+TiAlTaN软硬复合涂层刀具及其制备方法 Download PDF

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CN107829068B
CN107829068B CN201711082887.3A CN201711082887A CN107829068B CN 107829068 B CN107829068 B CN 107829068B CN 201711082887 A CN201711082887 A CN 201711082887A CN 107829068 B CN107829068 B CN 107829068B
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邢佑强
高俊涛
吴泽
李晓
孙东科
刘晓军
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Abstract

本发明公开了一种Mo‑Se‑Ta+TiAlTaN软硬复合涂层刀具及其制备方法，该涂层刀具包括刀具基体材料，基体材料为高速钢或硬质合金，由刀具基体到表面涂层依次为Ti+TiN过渡层、TiAlTaN硬涂层、Zr过渡层和Mo‑Se‑Ta软涂层。该涂层刀具的制备方法采用多弧离子镀+中频磁控溅射方式，包括沉积Ti+TiN过渡层、沉积TiAlTaN硬涂层、沉积Zr过渡层和沉积Mo‑Se‑Ta软涂层的步骤。本发明的涂层刀具既具有较高的硬度，又具有良好的润滑性能和低的摩擦系数，同时具有良好的热稳定性、抗氧化性、耐腐蚀性和抗磨损能力；具有广阔的应用前景；制备方法简单、易操作。

Description

Mo-Se-Ta+TiAlTaN软硬复合涂层刀具及其制备方法
技术领域
本发明属于机械切削刀具制造领域，尤其涉及Mo-Se-Ta+TiAlTaN软硬复合涂层刀具及其制备方法。
背景技术
TiN涂层作为一种硬质涂层，已广泛应用于切削刀具、刃具及各种模具表面作为耐磨和耐腐蚀层。然而，作为刀具涂层，切削过程中，TiN涂层表现出了抗氧化温度低，热硬度低等缺点。为提高TiN涂层硬度和热稳定性等，进一步研制出TiSiN、TiCrN及TiAlN等多种硬涂层。然而，作为刀具涂层，切削过程中，硬涂层刀具与工件摩擦系数较高，切削力大，导致切削温度较高，刀具寿命下降，加工工件表面质量受影响。为降低摩擦系数，减小刀具磨损，开发研制出一系列软涂层刀具，但软涂层硬度较低，易于磨损。软硬复合涂层刀具既硬涂层的高硬度，又具有软涂层的自润滑功效，使涂层刀具寿命得到了较大改善。Ta元素作为一种过渡金属元素，具有良好的耐腐蚀性和抗氧化能力([1]Pfeiler M.,et al.Journal ofVacuum Science&Technology A:Vacuum,Surfaces,and Films,2009,27(3):554-560.[2]Rachbauer R.,et al.Surface and Coatings Technology,2012,211:98-103.)。因此，Ta元素的添加不仅能够提高软、硬涂层的热稳定性、抗氧化能力和耐腐蚀能力，同时能够提高软涂层的硬度。
文献(KhetanV.,et al.ACS Applied Materials&Interfaces,2014,6(17):15403-15411.)报道了一种AlTiTaN硬涂层，该涂层与AlTiN涂层相比表现出较好的抗氧化和热稳定性能，非常适合干加工应用场合。中国专利“申请号：201410263737.2”报道了TiSiN-WS2/Zr-WS2软硬复合涂层刀具，该刀具能够降低摩擦系数，减小刀具磨损。中国专利CN200910256536.9报道了一种MoS2/ZrN软硬复合涂层刀具，该刀具既具有较低的摩擦系数，又具有较高的硬度，使涂层刀具的性能有了很大提高。中国专利CN201610819057.3报道了一种W-Se-Zr/ZrSiN软硬复合涂层刀具，该刀具既具有润滑性能，又具有较高硬度和耐磨性能。以上报道的几种软硬复合涂层刀具热稳定性、抗氧化及耐腐蚀性能等有待于进一步提高。目前国内外未见Mo-Se-Ta+TiAlTaN软硬复合涂层刀具的报道。
发明内容
发明目的：本发明提供了一种Mo-Se-Ta+TiAlTaN软硬复合涂层刀具及其制备方法，该涂层刀具提高了现有技术中软硬复合涂层刀具热稳定性、抗氧化及耐腐蚀性能；该制备方法简单、易操作，条件温和、易实现。
技术方案：本发明的Mo-Se-Ta+TiAlTaN软硬复合涂层刀具，包括刀具基体材料，基体材料为高速钢或硬质合金，由刀具基体到表面涂层依次为Ti过渡层、TiN过渡层、TiAlTaN硬涂层、Zr过渡层和Mo-Se-Ta软涂层。
上述Mo-Se-Ta+TiAlTaN软硬复合涂层刀具的制备方法，采用多弧离子镀+中频磁控溅射方式，包括以下步骤：
(1)前处理：将刀具基体材料研磨抛光至镜面，依次放入酒精和丙酮中超声清洗各20-30min，去除表面油渍等污染物，采用真空干燥箱充分干燥后迅速放入镀膜机真空室，真空室本底真空为7.0×10-3Pa，加热至200-250℃，保温30-40min。
(2)离子清洗：通入工作气体Ar2，其压力为0.5-1.5Pa，开启偏压电源，电压700-900V，占空比0.2，辉光放电清洗20-30min；偏压降低至300-600V，开启离子源离子清洗20-30min，开启电弧源Ti靶，偏压500-600V，靶电流40-70A，离子轰击Ti靶1-2min。
(3)沉积Ti过渡层：调整Ar2气压至0.4-0.6Pa，偏压降低至100-300V，电弧镀沉积2-5min。
(4)沉积TiN过渡层：调整工作气压为0.5-0.6Pa，偏压80-150V，Ti靶电流90-110A；开启N2，调整N2流量为150-300sccm，沉积温度为220-260℃，沉积2-10min。
(5)沉积TiAlTaN硬涂层：开启中频Al靶电弧电源，电流调至60-90A，开启Ta靶电源，电流调制40-60A，电弧镀+中频磁控溅射沉积40-60min。
(6)沉积Zr过渡层：关闭Ti靶、Al靶、Ta靶、N2源，调整Ar2气压至0.4-0.6Pa，开启Zr靶，电流调至40-70A，电弧镀沉积3-5min。
(7)沉积Mo-Se-Ta软涂层：关闭Zr靶，偏压调至100-200V，开启MoSe2靶和Ta靶，MoSe2靶电流调至2-4A，Ta靶调至20-40A，沉积80-120min。
(8)后处理：关闭MoSe2靶和Ta靶，关闭偏压电源及气体源，保温30-60min，涂层结束，得到所述Mo-Se-Ta+TiAlTaN软硬复合涂层刀具。
有益效果：1、本发明的涂层刀具综合了硬涂层和软涂层的优点，既具有较高的硬度，又具有良好的润滑性能和低的摩擦系数，同时具有良好的热稳定性、抗氧化性、耐腐蚀性和抗磨损能力；2、可广泛应用于干切削及难加工材料等切削温度较高的切削加工，具有广阔的应用前景；3、制备方法简单、易操作；4、条件温和、易实现；5、刀具使用寿命长。
附图说明
图1是本发明的结构示意图。
具体实施方式
参见图1，本发明一实施例所述的Mo-Se-Ta+TiAlTaN软硬复合涂层刀具，包括刀具基体材料1，所述基体材料1为高速钢或硬质合金，所述基体材料1表面从内到外依次涂有Ti过渡层2、TiN过渡层3、TiAlTaN硬涂层4、Zr过渡层5和Mo-Se-Ta软涂层6。
实施例1
上述Mo-Se-Ta+TiAlTaN软硬复合涂层刀具及其制备方法包括以下步骤：
(1)前处理：将刀具基体材料高速钢研磨抛光至镜面，依次放入酒精和丙酮中超声清洗各20min，去除表面油渍等污染物，采用真空干燥箱充分干燥后迅速放入镀膜机真空室，真空室本底真空为7.0×10-3Pa，加热至220℃，保温30min；
(2)离子清洗：通入工作气体Ar2，其压力为0.8Pa，开启偏压电源，电压750V，占空比0.2，辉光放电清洗20min；偏压降低至400V，开启离子源离子清洗20min，开启电弧源Ti靶，偏压500V，靶电流50A，离子轰击Ti靶2min；
(3)沉积Ti过渡层：调整Ar2气压至0.5Pa，偏压降低至150V，电弧镀沉积2min；
(4)沉积TiN过渡层：调整工作气压为0.5Pa，偏压100V，Ti靶电流90A；开启N2，调整N2流量为180sccm，沉积温度为230℃，沉积5min；
(5)沉积TiAlTaN应涂层：开启中频Al靶电弧电源，电流调至70A，开启Ta靶电源，电流调制40A，电弧镀+中频磁控溅射沉积50min；
(6)沉积Zr过渡层：关闭Ti靶、Al靶、Ta靶、N2源，调整Ar2气压至0.5Pa，开启Zr靶，电流调至50A，电弧镀沉积3min；
(7)沉积Mo-Se-Ta软涂层：关闭Zr靶，偏压调至150V，开启MoSe2靶和Ta靶，MoSe2靶电流调至2A，Ta靶调至25A，沉积90min；
(8)后处理：关闭MoSe2靶和Ta靶，关闭偏压电源及气体源，保温40min，涂层结束，得到以高速钢为基体材料的Mo-Se-Ta+TiAlTaN软硬复合涂层刀具。
实施例2
上述Mo-Se-Ta+TiAlTaN软硬复合涂层刀具及其制备方法包括以下步骤：
(1)前处理：将刀具基体材料硬质合金研磨抛光至镜面，依次放入酒精和丙酮中超声清洗各30min，去除表面油渍等污染物，采用真空干燥箱充分干燥后迅速放入镀膜机真空室，真空室本底真空为7.0×10-3Pa，加热至230℃，保温40min；
(2)离子清洗：通入工作气体Ar2，其压力为1.2Pa，开启偏压电源，电压900V，占空比0.2，辉光放电清洗30min；偏压降低至500V，开启离子源离子清洗30min，开启电弧源Ti靶，偏压580V，靶电流65A，离子轰击Ti靶2min；
(3)沉积Ti过渡层：调整Ar2气压至0.6Pa，偏压降低至200V，电弧镀沉积4min；
(4)沉积TiN过渡层：调整工作气压为0.6Pa，偏压120V，Ti靶电流100A；开启N2，调整N2流量为250sccm，沉积温度为250℃，沉积8min；
(5)沉积TiAlTaN硬涂层：开启中频Al靶电弧电源，电流调至80A，开启Ta靶电源，电流调制60A，电弧镀+中频磁控溅射沉积55min；
(6)沉积Zr过渡层：关闭Ti靶、Al靶、Ta靶、N2源，调整Ar2气压至0.4-0.6Pa，开启Zr靶，电流调至65A，电弧镀沉积4min；
(7)沉积Mo-Se-Ta软涂层：关闭Zr靶，偏压调至180V，开启MoSe2靶和Ta靶，MoSe2靶电流调至4A，Ta靶调至35A，沉积120min；
(8)后处理：关闭MoSe2靶和Ta靶，关闭偏压电源及气体源，保温50min，涂层结束，得到以硬质合金为基体材料的Mo-Se-Ta+TiAlTaN软硬复合涂层刀具。

Claims (1)

1.一种Mo-Se-Ta+TiAlTaN软硬复合涂层刀具的制备方法，所述复合涂层刀具包括刀具基体材料(1)，所述基体材料为高速钢或硬质合金，所述基体材料表面从内到外依次涂有Ti过渡层(2)、TiN过渡层(3)、TiAlTaN硬涂层(4)、Zr过渡层(5)和Mo-Se-Ta软涂层(6)，其特征在于，采用多弧离子镀和中频磁控溅射方式，包括以下步骤：
(1)前处理：将刀具基体材料研磨抛光至镜面，依次放入酒精和丙酮中超声清洗各20-30min，去除表面油渍污染物，采用真空干燥箱充分干燥后迅速放入镀膜机真空室，真空室本底真空为7.0×10-3Pa，加热至200-250℃，保温30-40min；
(2)离子清洗：通入工作气体Ar2，其压力为0.5-1.5Pa，开启偏压电源，电压700-900V，占空比0.2，辉光放电清洗20-30min；偏压降低至300-600V，开启离子源离子清洗20-30min，开启电弧源Ti靶，偏压500-600V，靶电流40-70A，离子轰击Ti靶1-2min；
(3)沉积Ti过渡层：调整Ar2气压至0.4-0.6Pa，偏压降低至100-300V，电弧镀沉积2-5min；
(4)沉积TiN过渡层：调整工作气压为0.5-0.6Pa，偏压80-150V，Ti靶电流90-110A；开启N2，调整N2流量为150-300sccm，沉积温度为220-260℃，沉积2-10min；
(5)沉积TiAlTaN硬涂层：开启中频Al靶电弧电源，电流调至60-90A，开启Ta靶电源，电流调制40-60A，电弧镀+中频磁控溅射沉积40-60min；
(6)沉积Zr过渡层：关闭Ti靶、Al靶、Ta靶、N2源，调整Ar2气压至0.4-0.6Pa，开启Zr靶，电流调至40-70A，电弧镀沉积3-5min；
(7)沉积Mo-Se-Ta软涂层：关闭Zr靶，偏压调至100-200V，开启MoSe2靶和Ta靶，MoSe2靶电流调至2-4A，Ta靶调至20-40A，沉积80-120min；
(8)后处理：关闭MoSe2靶和Ta靶，关闭偏压电源及气体源，保温30-60min，涂层结束，得到所述Mo-Se-Ta+TiAlTaN软硬复合涂层刀具。
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