CN105925941A - TiAlCrN+MoS2/Ti/Al/Cr组合润滑涂层刀具及其制备工艺 - Google Patents
TiAlCrN+MoS2/Ti/Al/Cr组合润滑涂层刀具及其制备工艺 Download PDFInfo
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- 238000002360 preparation method Methods 0.000 title claims abstract description 11
- 238000005516 engineering process Methods 0.000 title claims abstract description 4
- 229910052961 molybdenite Inorganic materials 0.000 title claims abstract 9
- CWQXQMHSOZUFJS-UHFFFAOYSA-N molybdenum disulfide Chemical compound S=[Mo]=S CWQXQMHSOZUFJS-UHFFFAOYSA-N 0.000 title claims abstract 9
- 229910052982 molybdenum disulfide Inorganic materials 0.000 title claims abstract 9
- 230000001050 lubricating effect Effects 0.000 title claims description 47
- 238000005520 cutting process Methods 0.000 title abstract description 11
- 238000000576 coating method Methods 0.000 claims abstract description 97
- 239000011248 coating agent Substances 0.000 claims abstract description 89
- 230000007704 transition Effects 0.000 claims abstract description 51
- 229910000997 High-speed steel Inorganic materials 0.000 claims abstract description 4
- 238000000151 deposition Methods 0.000 claims description 37
- 230000008021 deposition Effects 0.000 claims description 33
- 150000002500 ions Chemical class 0.000 claims description 20
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 20
- 238000007747 plating Methods 0.000 claims description 13
- 238000004140 cleaning Methods 0.000 claims description 12
- 238000007733 ion plating Methods 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 12
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 8
- 239000002131 composite material Substances 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 8
- 238000004544 sputter deposition Methods 0.000 claims description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 4
- 239000012535 impurity Substances 0.000 claims description 4
- 238000012805 post-processing Methods 0.000 claims description 4
- 238000005477 sputtering target Methods 0.000 claims description 4
- 238000001035 drying Methods 0.000 claims description 3
- 229910045601 alloy Inorganic materials 0.000 claims description 2
- 239000000956 alloy Substances 0.000 claims description 2
- 238000002203 pretreatment Methods 0.000 claims description 2
- 238000005461 lubrication Methods 0.000 abstract description 2
- 239000002184 metal Substances 0.000 abstract description 2
- 229910052751 metal Inorganic materials 0.000 abstract description 2
- 239000000314 lubricant Substances 0.000 abstract 6
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 38
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 238000003801 milling Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910010037 TiAlN Inorganic materials 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000008199 coating composition Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000002173 cutting fluid Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 150000004763 sulfides Chemical class 0.000 description 1
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Abstract
本发明属于机械制造金属切削刀具领域，特别是涉及一种TiAlCrN+MoS2/Ti/Al/Cr组合润滑涂层刀具及其制备工艺。TiAlCrN+MoS2/Ti/Al/Cr组合润滑涂层刀具，刀具基体材料为高速钢或硬质合金，刀具表面为MoS2/Ti/Al/Cr润滑涂层，MoS2/Ti/Al/Cr润滑涂层与TiAlCrN硬质涂层之间有Ti/Al/Cr过渡层，TiAlCrN硬质涂层和刀具基体之间依次有Ti/Al/Cr过渡层和Ti过渡层。其综合了TiAlCrN多元硬质涂层和MoS2/Ti/Al/Cr润滑涂层的优点，既具有较高的硬度，又具有润滑作用和较低的摩擦系数，可显著改善和提高涂层刀具的切削性能。
Description
技术领域
本发明属于机械制造金属切削刀具领域，特别是涉及一种TiAlCrN+MoS2/Ti/Al/Cr组合润滑涂层刀具及其制备工艺。
背景技术
根据涂层材料的性质，涂层刀具可分为两大类，即：“高硬度”涂层刀具和“润滑”涂层刀具。“高硬度”涂层刀具其主要优点是硬度高、耐磨性能好，典型的“高硬度”涂层材料有TiN、TiCN、TiAlN和类金刚石等。“润滑”涂层刀具追求的目标是低摩擦系数，典型的“润滑”涂层材料为具有低摩擦系数的固体润滑材料(如：MoS2、WS2、TaS2等硫化物)。当前刀具涂层的发展趋势是：涂层成分趋于多元化和复合化。复合涂层可综合单涂层的优点，复合多涂层及其相关技术的出现，既可提高涂层与基体的结合强度，又兼顾多种单涂层的综合性能，使涂层刀具的性能显著提高。
中国专利(专利号ZL 2006 1 0068975.3)报道了“自润滑复合软涂层刀具及其制备方法”，它是采用中频磁控+多弧法镀膜方法制备的MoS2/Cr复合涂层刀具，刀具表面为MoS2层，MoS2层与刀具基体之间具有Ti过渡层。该刀具在无切削液冷却、润滑的切削过程中，能够在刀具表面能形成具有润滑作用的润滑膜，从而实现刀具自身的润滑功能，但是这种润滑涂层硬度较低而导致刀具涂层尤其是后刀面涂层的使用寿命不长。文献(Acta Materials.2011,59(1):68-74)报道了TiN硬涂层刀具切削加工时的作用机理及使用性能，但是这种硬涂层由于相对较高的摩擦系数，限制了其广泛使用。
发明内容
本发明的目的在于改善现有涂层刀具的综合性能，结合多元硬质涂层和润滑涂层的优点，提供一种TiAlCrN+MoS2/Ti/Al/Cr组合润滑涂层刀具及其制备工艺。
本发明是通过以下方式实现的：
TiAlCrN+MoS2/Ti/Al/Cr组合润滑涂层刀具，刀具基体材料为高速钢或硬质合金，刀具表面为MoS2/Ti/Al/Cr润滑涂层，MoS2/Ti/Al/Cr润滑涂层与TiAlCrN硬质涂层之间有Ti/Al/Cr过渡层，TiAlCrN硬质涂层和刀具基体之间依次有Ti/Al/Cr过渡层和Ti过渡层。
TiAlCrN+MoS2/Ti/Al/Cr组合润滑涂层刀具的制备工艺，沉积方式为电弧离子镀沉积Ti过渡层，然后电弧离子镀+非平衡磁控溅射复合沉积Ti/Al/Cr过渡层、TiAlCrN硬质涂层和Ti/Al/Cr过渡层，中频磁控溅射MoS2、电弧离子镀及非平衡磁控溅射Ti、Al、Cr复合沉积MoS2/Ti/Al/Cr润滑涂层。
沉积MoS2/Ti/Al/Cr润滑涂层时使用两个电弧靶：1个Ti靶，一个Al靶，1个非平衡溅射Cr靶，2个MoS2中频溅射靶。
具体包括以下步骤：
1)前处理：将刀具基体表面抛光，去除表面杂质，然后依次放入酒精和丙酮中，超声清洗，经干燥后迅速放入镀膜机，抽真空至7.0×10-3Pa，加热至300℃，保温30～40min；
2)离子清洗：通Ar气，其压力为1.5Pa，开启偏压电源，电压1000V，占空比0.2，辉光放电清洗15min；降低偏压至700V，开启离子源离子清洗15min，开启Ti靶的电弧源，靶电流50A，偏压400V，离子轰击Ti靶1min；
3)沉积Ti过渡层：Ar气压0.5～0.6Pa，偏压降至250V，Ti靶电流70A，沉积温度250℃，电弧镀Ti过渡层4～5min；
4)沉积Ti/Al/Cr过渡层：Ar气压0.5～0.6Pa，偏压250V，Ti电弧靶电流100A，Al靶电流80A，Cr非平衡磁控溅射靶电流为40A，电弧镀Ti/Al/Cr过渡层5～6min；
5)沉积TiAlCrN硬质涂层：Ar气压0.5Pa，偏压220V，Ti靶的靶电流120A，Al靶电流90A，Cr靶电流50A；开启N2，N2气压为1.2Pa，沉积温度250～260℃，电弧镀TiAlCrN硬质涂层60min；
6)沉积Ti/Al/Cr过渡层：关闭N2，Ti靶电流100A，Al靶电流80A，Cr靶电流50A，沉积Ti/Al/Cr过渡层5min；
7)沉积MoS2/Ti/Al/Cr润滑涂层：开启MoS2靶中频磁控溅射电源，电流2.0A，Ti靶电流60A，Al靶电流50A，Cr靶电流30A，偏压调至230V，沉积温度270～280℃，复合沉积MoS2/Ti/Al/Cr润滑涂层30～40min；
8)后处理：关闭各电源、离子源及气体源，涂层结束。
与现有技术相比，本发明具有如下技术效果：
该刀具的涂层为TiAlCrN硬质涂层和MoS2/Ti/Al/Cr润滑涂层的组合，属于多层结构。基体上的Ti和Ti/Al/Cr过渡层主要是提高组合润滑涂层与刀具基体间的结合性能，MoS2/Ti/Al/Cr润滑涂层与TiAlCrN硬质涂层之间的Ti/Al/Cr过渡层主要是减缓因涂层成分突变造成的层间应力。这种TiAlCrN+MoS2/Ti/Al/Cr组合润滑涂层刀具综合了TiAlCrN多元硬质涂层和MoS2/Ti/Al/Cr润滑涂层的优点，既具有较高的硬度，又具有润滑作用和较低的摩擦系数，可显著改善和提高涂层刀具的切削性能。用这种组合润滑涂层刀具进行干切削时，由于表面MoS2/Ti/Al/Cr涂层本身具有润滑作用，可以减小刀具与切屑之间的摩擦，降低切削力和切削温度15％以上，减小刀具磨损20-25％；同时，该涂层采用电弧镀+中频+非平衡磁控溅射复合镀膜方法复合制备，其中的TiAlCrN高硬度涂层可提高MoS2/Ti/Al/Cr润滑涂层的整体强度，减缓由于MoS2/Ti/Al/Cr涂层本身硬度较低而造成的刀具涂层过早磨损，提高刀具使用寿命30％以上。该组合润滑涂层刀具可广泛应用于材料的干切削加工。
附图说明
图1为本发明的TiAlCrN+MoS2/Ti/Al/Cr组合润滑涂层刀具的涂层结构示意图。
图中：1为刀具基体、2为Ti过渡层、3为Ti/Al/Cr过渡层、4为TiAlCrN硬质涂层、5为Ti/Al/Cr过渡层、6为MoS2/Ti/Al/Cr润滑涂层。
具体实施方式
下面给出本发明的最佳实施例：
实施例1
如图1所示，一种TiAlCrN+MoS2/Ti/Al/Cr组合润滑涂层刀具，该刀具为普通的铣刀片，其基体材料为：硬质合金YT15；涂层材料为：TiAlCrN和MoS2/Ti/Al/Cr；沉积方式为：电弧离子镀沉积Ti过渡层，然后电弧离子镀+非平衡磁控溅射复合沉积Ti/Al/Cr过渡层、TiAlCrN硬质涂层和Ti/Al/Cr过渡层，中频磁控溅射(MoS2)、电弧离子镀及非平衡磁控溅射(Ti、Al、Cr)复合沉积MoS2/Ti/Al/Cr润滑涂层(沉积时使用两个电弧靶：1个Ti靶，一个Al靶，1个非平衡溅射Cr靶，2个MoS2中频溅射靶)，其制备工艺为：
(1)前处理：将YT15硬质合金铣刀片表面抛光，去除表面油污、锈迹等杂质，然后依次放入酒精和丙酮中，超声清洗各30min，去除刀具表面油污和其它附着物，电吹风干燥充分后迅速放入镀膜机，抽真空至7.0×10-3Pa，加热至300℃，保温30～40min；
(2)离子清洗：通Ar气，其压力为1.5Pa，开启偏压电源，电压1000V，占空比0.2，辉光放电清洗15min；降低偏压至700V，开启离子源离子清洗15min，开启Ti靶的电弧源，靶电流50A，偏压400V，离子轰击Ti靶1min；
(3)沉积Ti过渡层：Ar气压0.5～0.6Pa，偏压降至250V，Ti靶电流70A，沉积温度250℃，电弧镀Ti过渡层4～5min；
(4)沉积Ti/Al/Cr过渡层：Ar气压0.5～0.6Pa，偏压250V，Ti电弧靶电流100A，Al靶电流80A，Cr非平衡磁控溅射靶电流为40A，电弧镀Ti/Al/Cr过渡层5～6min；
(5)沉积TiAlCrN硬质涂层：Ar气压0.5Pa，偏压220V，Ti靶的靶电流120A，Al靶电流90A，Cr靶电流50A；开启N2，N2气压为1.2Pa，沉积温度250～260℃，电弧镀TiAlCrN60min；
(6)沉积Ti/Al/Cr过渡层：关闭N2，Ti靶电流100A，Al靶电流80A，Cr靶电流50A，沉积Ti/Al/Cr过渡层5min；
(7)沉积MoS2/Ti/Al/Cr润滑涂层：开启MoS2靶中频磁控溅射电源，电流2.0A，Ti靶电流60A，Al靶电流50A，Cr靶电流30A，偏压调至230V，沉积温度270～280℃，复合沉积MoS2/Ti/Al/Cr 30～40min；
(8)后处理：关闭各电源、离子源及气体源，涂层结束。
实施例2
如图1所示，一种TiAlCrN+MoS2/Ti/Al/Cr组合润滑涂层刀具，该刀具为普通麻花钻，其刀具基体材料为：高速钢W18Cr4V；涂层材料为：TiAlCrN和MoS2/Ti/Al/Cr；沉积方式为：电弧离子镀沉积Ti过渡层，然后电弧离子镀+非平衡磁控溅射复合沉积Ti/Al/Cr过渡层、TiAlCrN硬质涂层和Ti/Al/Cr过渡层，中频磁控溅射(MoS2)、电弧离子镀及非平衡磁控溅射(Ti、Al、Cr)复合沉积MoS2/Ti/Al/Cr润滑涂层(沉积时使用两个电弧靶：1个Ti靶，一个Al靶，1个非平衡溅射Cr靶，2个MoS2中频溅射靶)，其制备工艺为：
(1)前处理：将麻花钻刀具基体表面用1000号砂纸打磨，去除表面油污、锈迹等杂质，然后依次放入酒精和丙酮中，超声清洗各30min，去除刀具表面油污和其它附着物，电吹风干燥充分后迅速放入镀膜机，抽真空至7.0×10-3Pa，加热至300℃，保温30～40min；
(2)离子清洗：通Ar气，其压力为1.5Pa，开启偏压电源，电压1000V，占空比0.2，辉光放电清洗15min；降低偏压至700V，开启离子源离子清洗15min，开启Ti靶的电弧源，靶电流50A，偏压400V，离子轰击Ti靶1min；
(3)沉积Ti过渡层：Ar气压0.5～0.6Pa，偏压降至250V，Ti靶电流70A，沉积温度250℃，电弧镀Ti过渡层4～5min；
(4)沉积Ti/Al/Cr过渡层：Ar气压0.5～0.6Pa，偏压250V，Ti电弧靶电流100A，Al靶电流80A，Cr非平衡磁控溅射靶电流为40A，电弧镀Ti/Al/Cr过渡层5～6min；
(5)沉积TiAlCrN硬质涂层：Ar气压0.5Pa，偏压220V，Ti靶的靶电流120A，Al靶电流90A，Cr靶电流50A；开启N2，N2气压为1.2Pa，沉积温度250～260℃，电弧镀TiAlCrN60min；
(6)沉积Ti/Al/Cr过渡层：关闭N2，Ti靶电流100A，Al靶电流80A，Cr靶电流50A，沉积Ti/Al/Cr过渡层5min；
(7)沉积MoS2/Ti/Al/Cr润滑涂层：开启MoS2靶中频磁控溅射电源，电流2.0A，Ti靶电流60A，Al靶电流50A，Cr靶电流30A，偏压调至230V，沉积温度270～280℃，复合沉积MoS2/Ti/Al/Cr 30～40min；
(8)后处理：关闭各电源、离子源及气体源，涂层结束。
Claims (4)
1.TiAlCrN+MoS2/Ti/Al/Cr组合润滑涂层刀具，刀具基体材料为高速钢或硬质合金，其特征在于，刀具表面为MoS2/Ti/Al/Cr润滑涂层，MoS2/Ti/Al/Cr润滑涂层与TiAlCrN硬质涂层之间有Ti/Al/Cr过渡层，TiAlCrN硬质涂层和刀具基体之间依次有Ti/Al/Cr过渡层和Ti过渡层。
2.如权利要求1所述TiAlCrN+MoS2/Ti/Al/Cr组合润滑涂层刀具的制备工艺，其特征在于，沉积方式为电弧离子镀沉积Ti过渡层，然后电弧离子镀+非平衡磁控溅射复合沉积Ti/Al/Cr过渡层、TiAlCrN硬质涂层和Ti/Al/Cr过渡层，中频磁控溅射MoS2、电弧离子镀及非平衡磁控溅射Ti、Al、Cr复合沉积MoS2/Ti/Al/Cr润滑涂层。
3.根据权利要求2所述的TiAlCrN+MoS2/Ti/Al/Cr组合润滑涂层刀具的制备工艺，其特征在于，沉积MoS2/Ti/Al/Cr润滑涂层时使用两个电弧靶：1个Ti靶，一个Al靶，1个非平衡溅射Cr靶，2个MoS2中频溅射靶。
4.根据权利要求2或3所述的TiAlCrN+MoS2/Ti/Al/Cr组合润滑涂层刀具的制备工艺，其特征在于，具体包括以下步骤：
1)前处理：将刀具基体表面抛光，去除表面杂质，然后依次放入酒精和丙酮中，超声清洗，经干燥后迅速放入镀膜机，抽真空至7.0×10-3Pa，加热至300℃，保温30～40min；
2)离子清洗：通Ar气，其压力为1.5Pa，开启偏压电源，电压1000V，占空比0.2，辉光放电清洗15min；降低偏压至700V，开启离子源离子清洗15min，开启Ti靶的电弧源，靶电流50A，偏压400V，离子轰击Ti靶1min；
3)沉积Ti过渡层：Ar气压0.5～0.6Pa，偏压降至250V，Ti靶电流70A，沉积温度250℃，电弧镀Ti过渡层4～5min；
4)沉积Ti/Al/Cr过渡层：Ar气压0.5～0.6Pa，偏压250V，Ti电弧靶电流100A，Al靶电流80A，Cr非平衡磁控溅射靶电流为40A，电弧镀Ti/Al/Cr过渡层5～6min；
5)沉积TiAlCrN硬质涂层：Ar气压0.5Pa，偏压220V，Ti靶的靶电流120A，Al靶电流90A，Cr靶电流50A；开启N2，N2气压为1.2Pa，沉积温度250～260℃，电弧镀TiAlCrN硬质涂层60min；
6)沉积Ti/Al/Cr过渡层：关闭N2，Ti靶电流100A，Al靶电流80A，Cr靶电流50A，沉积Ti/Al/Cr过渡层5min；
7)沉积MoS2/Ti/Al/Cr润滑涂层：开启MoS2靶中频磁控溅射电源，电流2.0A，Ti靶电流60A，Al靶电流50A，Cr靶电流30A，偏压调至230V，沉积温度270～280℃，复合沉积MoS2/Ti/Al/Cr润滑涂层30～40min；
8)后处理：关闭各电源、离子源及气体源，涂层结束。
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