CN105444116A - Multifunctional lampshade and manufacturing method thereof - Google Patents
Multifunctional lampshade and manufacturing method thereof Download PDFInfo
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- CN105444116A CN105444116A CN201511028921.XA CN201511028921A CN105444116A CN 105444116 A CN105444116 A CN 105444116A CN 201511028921 A CN201511028921 A CN 201511028921A CN 105444116 A CN105444116 A CN 105444116A
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- rete
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F21—LIGHTING
- F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
- F21V3/00—Globes; Bowls; Cover glasses
- F21V3/04—Globes; Bowls; Cover glasses characterised by materials, surface treatments or coatings
- F21V3/06—Globes; Bowls; Cover glasses characterised by materials, surface treatments or coatings characterised by the material
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- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
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Abstract
The invention discloses a multifunctional lampshade and a manufacturing method thereof. The lampshade comprises a substrate, wherein the outer surface of the substrate is sequentially provided with a first film layer, a second film layer, a third film layer, a fourth film layer, a fifth film layer, a sixth film layer, a seventh film layer, an eighth film layer, a ninth film layer, a tenth film layer, and an eleventh film layer from inside to outside; the first film layer, the third film layer and the fifth film layer are trititanium pentoxide layers; the second film layer, the fourth film layer and the sixth film layer are silicon dioxide films; the seventh film layer is a metal layer; the eighth film layer is a nano silver layer; the ninth film layer is an ITO layer; the tenth film layer is a high-hardness layer; and the eleventh film layer is a fluoride layer. The manufacturing method for the multifunctional lampshade comprises the following steps: 1) cleaning the substrate; and 2) coating the outer surface of the substrate. The lampshade disclosed by the invention can effectively filter harmful blue light and can filter dazzle light to effective relieve visual fatigue, and has the functions of sterilizing, preventing radiation, resisting greasy dirt, and the like.
Description
Technical field
The present invention relates to a kind of lampshade technical field, especially relate to a kind of Multifunction lamp shade and manufacture method thereof.
Background technology
Along with the progress of society and the development of science and technology, lighting apparatus extensively enter people work and life in, along with growing to the service time of lighting apparatus (as light fixture) of people, the blue light that these light fixtures send, ultraviolet, the injury of dazzling light to eye eyesight are more and more serious.
The high-energy visible ray of blue light to be wavelength be 400-500nm, blue light directly to penetrate cornea, eyes crystal, through retina, blue light can stimulate retina to produce a large amount of radical ion, make the atrophy of retinal pigment epithelium, and cause the death of photaesthesia cell, retinal pigment epithelium is very strong to the light absorption effect of blue region, absorbs blue ray radiation and can make retinal pigment epithelium atrophy, and this is also the one of the main reasons producing ARM; Blue ray radiation composition is higher larger to cellula visualis injury, and the atrophy of retinal pigment epithelium, can make amphiblestroid image thicken, and can do continuous adjustment, increase the weight of the working strength of ciliary muscle, cause visual fatigue fuzzy image ciliary muscle.Can cause the visual fatigue of people under the effect of ultraviolet and blue light, eyesight can decline gradually, easily causes dry and astringent, early onset cataract, the spontaneous macular diseases such as photophobia, fatigue on ocular vision.
At present, by arranging lampshade outside light fixture, in order to optically focused, weather proof and solve the problem, but the effect of existing lampshade filter blue light is unsatisfactory, in addition, the rarer sterilization of existing lampshade, radiation-resistant function, people are chronically exposed in light environment, healthyly receive great impact.In addition, the greasy dirt in environment and water stain being easy to are left a trace on lampshade, and these vestiges are not easy again to remove very much, have had a strong impact on the outward appearance of lampshade.Therefore, on market in the urgent need to occurring that a kind of lampshade with anti-blue light, anti-glare, sterilization, radiation proof function is to replace existing traditional lampshade.
Summary of the invention
The object of the invention is to for the deficiencies in the prior art, provide a kind of blue light that can effectively prevent to the injury of human body, there is anti-glare, radiation proof, sterilizing function, be suitable for the Multifunction lamp shade that uses night and manufacture method thereof.
For achieving the above object, the present invention is by the following technical solutions:
A kind of Multifunction lamp shade, comprise substrate, the outer surface of described substrate is sequentially provided with the first rete, the second rete, third membrane layer, the 4th rete, the 5th rete, the 6th rete, the 7th rete, the 8th rete, the 9th mold layer, the tenth rete and the 11 rete from the inside to surface; Described first rete, third membrane layer and the 5th rete are five oxidation three titanium layers, and thickness is 10-100nm; Described second rete, the 4th rete and the 6th rete are silicon dioxide layer, and thickness is 50-100nm; Described 7th rete is metal level, and thickness is 5-20nm; Described 8th rete is nano-silver layer, and the thickness of the 8th rete is 5-20nm; Described 9th rete is ITO layer, and the thickness of the 9th rete is 10-100nm; Described tenth rete is high rigidity layer, and thickness is 10-50nm; Described 11 rete is fluoride layer, and the thickness of the 11 rete is 3-10nm.
The film material of described metal level is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, and shaping by electron gun evaporation.
The film material of described nano-silver layer is the oxide of silver, and shaping by electron gun evaporation, and the oxide of described silver is Ag
2o, AgO or Ag
2o
3.
Described fluoride layer is the shaping magnesium fluoride layer of resistance heated evaporation.
The film material of described high rigidity layer is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, and shaping by electron gun evaporation.
Described substrate is by resin or glass ware forming.
When the substrate of described lampshade is by resin forming, the manufacture method of this Multifunction lamp shade specifically comprises the following steps:
1) substrate is cleaned, dry;
2) plated film is carried out to the outer surface of substrate;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silica, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 2.5/S, and the thickness after third membrane layer is finally formed is 10-100nm; Wherein, the film material of described third membrane layer is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 7/S, and the thickness after the 4th rete is finally formed is 50-100nm; Wherein, the film material of described 4th rete is silica, forms silicon dioxide layer;
E, plating the 5th rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 2.5/S, and the thickness after the 5th rete is finally formed is 10-100nm; Wherein, the film material of described 5th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
F, plating the 6th rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 7/S, and the thickness after the 6th rete is finally formed is 50-100nm; Wherein, the film material of described 6th rete is silica, forms silicon dioxide layer;
G, plating the 7th rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 7th rete, be deposited on the surface of the 6th rete in above-mentioned steps F with nanoscale molecular form after the film material evaporation of the 7th rete, the speed simultaneously controlling the 7th rete evaporation is 1/S, thickness after 7th rete is finally formed is 5-20nm, wherein the film material of the 7th rete is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
H, plating the 8th rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 8th rete, wherein the film material of the 8th rete is the oxide of silver, under the effect of electron gun evaporation, the peroxide breaks down of silver is attached to the surface of the 7th rete in above-mentioned steps G with the form of Nano Silver, the speed simultaneously controlling the 8th rete evaporation is 1/S, and the 8th rete finally forms the nano-silver layer that thickness is 5-20nm; The oxide of wherein said silver is Ag
2o, AgO or Ag
2o
3;
I, plating the 9th rete:
Vacuum in vacuum coating cabin is adjusted to and is more than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, adopt the film material of electron gun bombardment the 9th rete, be deposited on the surface of the 8th rete in above-mentioned steps H with nanoscale molecular form after the film material evaporation of the 9th rete, the speed simultaneously controlling the 9th rete evaporation is 1/S, thickness after 9th rete is finally formed is 10-100nm, and wherein the film material of the 9th rete is ITO material, forms ITO layer;
J, plating the tenth rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the tenth rete, be deposited on the surface of the 9th rete in above-mentioned steps I with nanoscale molecular form after the film material evaporation of the tenth rete, the speed simultaneously controlling the tenth rete evaporation is 7/S, and the thickness after the tenth rete is finally formed is 10-50nm; Wherein, the film material of described tenth rete is alundum (Al2O3), zirconia, silica high rigidity crystal or silicon monoxide high rigidity crystal, forms high rigidity layer;
K, plate eleventh floor rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of resistance heated the 11 rete, be deposited on the surface of the tenth rete in above-mentioned steps J with nanoscale molecular form after the film material evaporation of the 11 rete, the speed simultaneously controlling the 11 rete evaporation is 1.5/S, thickness after 11 rete is finally formed is 3-10nm, and wherein the film material of the 11 rete is fluoride, forms fluoride layer.
In described step 1), substrate is cleaned, dry concrete steps are as follows: substrate is placed in vacuum chamber, cleans with the outer surface 2-3 minute of ion gun bombardment substrate.
When the substrate of described lampshade is by glass ware forming, the manufacture method of this Multifunction lamp shade specifically comprises the following steps:
1) substrate is cleaned, dry;
2) plated film is carried out to the outer surface of substrate;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silica, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 2.5/S, and the thickness after third membrane layer is finally formed is 10-100nm; Wherein, the film material of described third membrane layer is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 7/S, and the thickness after the 4th rete is finally formed is 50-100nm; Wherein, the film material of described 4th rete is silica, forms silicon dioxide layer;
E, plating the 5th rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 2.5/S, and the thickness after the 5th rete is finally formed is 10-100nm; Wherein, the film material of described 5th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
F, plating the 6th rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 7/S, and the thickness after the 6th rete is finally formed is 50-100nm; Wherein, the film material of described 6th rete is silica, forms silicon dioxide layer;
G, plating the 7th rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 7th rete, be deposited on the surface of the 6th rete in above-mentioned steps F with nanoscale molecular form after the film material evaporation of the 7th rete, the speed simultaneously controlling the 7th rete evaporation is 1/S, thickness after 7th rete is finally formed is 5-20nm, wherein the film material of the 7th rete is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
H, plating the 8th rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 8th rete, wherein the film material of the 8th rete is the oxide of silver, under the effect of electron gun evaporation, the peroxide breaks down of silver is attached to the surface of the 7th rete in above-mentioned steps G with the form of Nano Silver, the speed simultaneously controlling the 8th rete evaporation is 1/S, and the 8th rete finally forms the nano-silver layer that thickness is 5-20nm; The oxide of wherein said silver is Ag
2o, AgO or Ag
2o
3;
I, plating the 9th rete:
Vacuum in vacuum coating cabin is adjusted to and is more than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, adopt the film material of electron gun bombardment the 9th rete, be deposited on the surface of the 8th rete in above-mentioned steps H with nanoscale molecular form after the film material evaporation of the 9th rete, the speed simultaneously controlling the 9th rete evaporation is 1/S, thickness after 9th rete is finally formed is 10-100nm, and wherein the film material of the 9th rete is ITO material, forms ITO layer;
J, plating the tenth rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the tenth rete, be deposited on the surface of the 9th rete in above-mentioned steps I with nanoscale molecular form after the film material evaporation of the tenth rete, the speed simultaneously controlling the tenth rete evaporation is 7/S, and the thickness after the tenth rete is finally formed is 10-50nm; Wherein, the film material of described tenth rete is alundum (Al2O3), zirconia, silica high rigidity crystal or silicon monoxide high rigidity crystal, forms high rigidity layer;
K, plate eleventh floor rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of resistance heated the 11 rete, be deposited on the surface of the tenth rete in above-mentioned steps J with nanoscale molecular form after the film material evaporation of the 11 rete, the speed simultaneously controlling the 11 rete evaporation is 1.5/S, thickness after 11 rete is finally formed is 3-10nm, and wherein the film material of the 11 rete is fluoride, forms fluoride layer.
In described step 1), substrate is cleaned, dry concrete steps are as follows: substrate is placed in vacuum chamber, cleans with the outer surface 5-10 minute of ion gun bombardment substrate.
The present invention adopts the principle of electron beam vacuum evaporation, there is after utilizing charged particle to accelerate in the electric field the feature of certain kinetic energy, ion is guided into the electrode for being made by the substrate of plated film, and by electron gun with high temperature bombardment by high purity metal or metal oxide, the nano molecular be evaporated makes it move to substrate along certain direction and the final method in deposition on substrate film forming.This invention combine with technique utilizes the trajectory of electron motion in the special distributed controll electric field in magnetic field, improves the technique of plated film with this, make coating film thickness and uniformity controlled, and good, the cohesive force of rete compactness of preparation is strong and high purity.
The present invention's vacuum evaporation on substrate has five oxidation three titanium layers, take full advantage of five oxidation Tritanium/Trititanium crystalline material coating operations good, rete is intensive, evenly, stable, the performances such as stress is little, and five oxidation Tritanium/Trititanium crystalline material in visible light wave range, there is the highest refractive index, good crystallinity, evaporation is stablized, without advantages such as venting and splashes, it is made to be adapted at lampshade substrate being coated with the good multilayer film of anti-reflection property.
The present invention is vacuum evaporation silica layer on substrate, mainly plays a part to increase film adhesion, wearability and impact resistance, can absorb harmful light simultaneously.
Five oxidation three titanium layers of the present invention and silicon dioxide layer cooperatively interact, mainly play the effect of controlled filter wavelength, the present invention is at some five oxidation three titanium layers and the silicon dioxide layers be arranged alternately of lampshade substrate outer surface evaporation, not only effective elimination most purple light and blue light, and can usable reflection harmful light, high light, dazzling light wave, flash light wave by force, reduce the stimulation of injury to human eye retina and shortwave dazzle; The metal level of third membrane layer of the present invention, not only improves anti-blue light effect and definition, and can reflect harmful light, dazzling light wave, flashes light wave etc. by force; The present invention is cooperatively interacted by above-mentioned rete, plays the effects such as absorption, reflection, conversion, filtration, is the wear-resisting core technology of coating on lampshade filter blue light anti-glazing; Meanwhile, by regulating the thickness of above-mentioned each rete, the visible ray making wavelength longer produces coherent interference, thus produces antiglare effect further; Nano-silver layer is set, its strong oxidizing property makes it have sterilizing ability, ensure that the sterilizing ability that lampshade is enough, arranging of ITO layer effectively cuts off harmful electron radiation, ultraviolet and far infrared, serve radiation-resistant effect, the wearability that high rigidity layer effectively can improve lampshade is set in addition, can prevents it from scratching.Fluoride layer is set at the outermost layer of substrate outer surface there is good hydrophobicity and oil-stain-preventing function.
When lampshade substrate of the present invention is by resin forming, the adhesive force of each rete of the lampshade obtained by the inventive method subzero 20 DEG C time is 2-4hrs, and the adhesive force 80 DEG C time is 2-4hrs, when lampshade substrate of the present invention is by glass ware forming, the adhesive force of each rete of the lampshade obtained by manufacture method of the present invention subzero 20 DEG C time is 6-9hrs, and the adhesive force 80 DEG C time is 6-9hrs, multiple retes that lampshade of the present invention is coated with can filter 23 more than 3% harmful blue light effectively, metal level can promote definition and anti-blue light effect effectively simultaneously, thus improve the overall definition of lampshade, good contribution is had for the definition of vision and authenticity, to harmful blue light, the filtration of dazzling light effectively can alleviate visual fatigue, described nano-silver layer is to Escherichia coli, gonococcus, the tens of kinds of pathogenic microorganisms such as chlamydia trachomatis have strong suppression and killing action, and can not drug resistance be produced, arranging of ITO layer effectively cuts off harmful electron radiation, ultraviolet and far infrared, serve radiation-resistant effect, the wearability that high rigidity layer effectively improves lampshade is set in addition, can prevent it from scratching, fluoride layer is set at the outermost layer of substrate outer surface there is good hydrophobicity and oil-stain-preventing function.
Accompanying drawing explanation
Below in conjunction with the drawings and specific embodiments, the present invention is described in further details:
Fig. 1 is the exploded view of Multifunction lamp shade of the present invention.
Detailed description of the invention
As shown in Figure 1, the present invention includes substrate 1, comprise substrate 1, the outer surface of described substrate 1 is sequentially provided with the first rete 2, second rete 3, third membrane layer 4, the 4th rete 5, the 5th rete 6, the 6th rete 7, the 7th rete 8, the 8th rete 9, the 9th mold layer 10, the tenth rete the 11 and the 11 rete 12 from the inside to surface; Described first rete 2, third membrane layer 4 and the 5th rete 6 are five oxidation three titanium layers, and thickness is 10-100nm; Described second rete 3, the 4th rete 5 and the 6th rete 7 are silicon dioxide layer, and thickness is 50-100nm; Described 7th rete 8 is metal level, and thickness is 5-20nm; Described 8th rete 9 is nano-silver layer, and the thickness of the 8th rete 9 is 5-20nm; Described 9th rete 10 is ITO layer, and the thickness of the 9th rete 10 is 10-100nm; Described tenth rete 11 is high rigidity layer, and thickness is 10-50nm; Described 11 rete 12 is fluoride layer, and the thickness of the 11 rete 12 is 3-10nm.
The film material of described metal level is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, and shaping by electron gun evaporation.
The film material of described nano-silver layer is the oxide of silver, and shaping by electron gun evaporation, and the oxide of described silver is Ag
2o, AgO or Ag
2o
3.
Described fluoride layer is the shaping magnesium fluoride layer of resistance heated evaporation.
The film material of described high rigidity layer is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, and shaping by electron gun evaporation.
Described substrate 1 is by resin or glass ware forming.
Embodiment 1:
When the substrate 1 of described lampshade is by resin forming, the manufacture method of described Multifunction lamp shade specifically comprises the following steps:
1) substrate 1 is cleaned, dry: substrate 1 is placed in vacuum chamber, cleans with the outer surface 2-3 minute of ion gun bombardment substrate 1;
2) plated film is carried out to the outer surface of substrate 1;
A, plate the first rete 2:
Vacuum in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete 2, be deposited on the outer surface of substrate 1 with nanoscale molecular form after the film material evaporation of the first rete 2, the speed simultaneously controlling the first rete 2 evaporation is 2.5/S, and the thickness after the first rete 2 is finally formed is 10-100nm; Wherein, the film material of described first rete 2 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete 3:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete 3, be deposited on the surface of the first rete 2 in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete 3, the speed simultaneously controlling the second rete 3 evaporation is 7/S, and the thickness after the second rete 3 is finally formed is 50-100nm; Wherein, the film material of described second rete 3 is silica, forms silicon dioxide layer;
C, plating third membrane layer 4:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer 4, be deposited on the surface of the second rete 3 in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer 4, the speed simultaneously controlling third membrane layer 4 evaporation is 2.5/S, and the thickness after third membrane layer 4 is finally formed is 10-100nm; Wherein, the film material of described third membrane layer 4 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete 5:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete 5, be deposited on the surface of third membrane layer 4 in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete 5, the speed simultaneously controlling the 4th rete 5 evaporation is 7/S, and the thickness after the 4th rete 5 is finally formed is 50-100nm; Wherein, the film material of described 4th rete 5 is silica, forms silicon dioxide layer;
E, plating the 5th rete 6:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete 6, be deposited on the surface of the 4th rete 5 in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete 6, the speed simultaneously controlling the 5th rete 6 evaporation is 2.5/S, and the thickness after the 5th rete 6 is finally formed is 10-100nm; Wherein, the film material of described 5th rete 6 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
F, plating the 6th rete 7:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete 7, be deposited on the surface of the 5th rete 6 in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete 7, the speed simultaneously controlling the 6th rete 7 evaporation is 7/S, and the thickness after the 6th rete 7 is finally formed is 50-100nm; Wherein, the film material of described 6th rete 7 is silica, forms silicon dioxide layer;
G, plating the 7th rete 8:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 7th rete 8, be deposited on the surface of the 6th rete 7 in above-mentioned steps F with nanoscale molecular form after the film material evaporation of the 7th rete 8, the speed simultaneously controlling the 7th rete 8 evaporation is 1/S, thickness after 7th rete 8 is finally formed is 5-20nm, wherein the film material of the 7th rete 8 is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
H, plating the 8th rete 9:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 8th rete 9, wherein the film material of the 8th rete 9 is the oxide of silver, under the effect of electron gun evaporation, the oxide of silver is attached to the surface of the 7th rete 8 in above-mentioned steps G with the form of decomposing Nano Silver, the speed simultaneously controlling the 8th rete 9 evaporation is 1/S, and it is the nano-silver layer of 5-20nm that the 8th rete 9 finally forms thickness; The oxide of wherein said silver is Ag
2o, AgO or Ag
2o
3;
I, plating the 9th rete 10:
Vacuum in vacuum coating cabin is adjusted to and is more than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, adopt the film material of electron gun bombardment the 9th rete 10, be deposited on the surface of the 8th rete 9 in above-mentioned steps H with nanoscale molecular form after the film material evaporation of the 9th rete 10, the speed simultaneously controlling the 9th rete 10 evaporation is 1/S, thickness after 9th rete 10 is finally formed is 10-100nm, and wherein the film material of the 9th rete 10 is ITO material, forms ITO layer;
J, plating the tenth rete 11:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material 11 of electron gun bombardment the tenth rete, be deposited on the surface of the 9th rete 10 in above-mentioned steps I with nanoscale molecular form after the film material evaporation of the tenth rete 11, the speed simultaneously controlling the tenth rete 11 evaporation is 7/S, and the thickness after the tenth rete 11 is finally formed is 10-50nm; Wherein, the film material of described tenth rete 11 is alundum (Al2O3), zirconia, silica high rigidity crystal or silicon monoxide high rigidity crystal, forms high rigidity layer;
K, plate eleventh floor rete 12:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of resistance heated the 11 rete 12, be deposited on the surface of the tenth rete 11 in above-mentioned steps J with nanoscale molecular form after the film material evaporation of the 11 rete 12, the speed simultaneously controlling the 11 rete 12 evaporation is 1.5/S, thickness after 11 rete 12 is finally formed is 3-10nm, and wherein the film material of the 11 rete 12 is fluoride, forms fluoride layer.
The adhesive force of each rete on the lampshade obtained by said method subzero 20 DEG C time is 2-4hrs, adhesive force 80 DEG C time is 2-4hrs, there is very strong adhesive ability, the compactness of each rete is good simultaneously, high purity, this lampshade can filter 23 more than 3% harmful blue light effectively, to harmful blue light, the filtration of dazzling light effectively can alleviate visual fatigue, arranging of ITO layer effectively cuts off harmful electron radiation, ultraviolet and far infrared, serve radiation-resistant effect, the outermost layer of this external substrate outer surface arranges fluoride layer and has good hydrophobicity and oil-stain-preventing function.
Embodiment 2:
When the substrate 1 of described lampshade is by glass ware forming, described manufacture method specifically comprises the following steps:
1) substrate 1 is cleaned, dry: substrate 1 is placed in vacuum chamber, cleans with the outer surface 5-10 minute of ion gun bombardment substrate 1;
2) plated film is carried out to the outer surface of substrate 1;
A, plate the first rete 2:
Vacuum in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete 2, be deposited on the outer surface of substrate 1 with nanoscale molecular form after the film material evaporation of the first rete 2, the speed simultaneously controlling the first rete 2 evaporation is 2.5/S, and the thickness after the first rete 2 is finally formed is 10-100nm; Wherein, the film material of described first rete 2 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete 3:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete 3, be deposited on the surface of the first rete 2 in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete 3, the speed simultaneously controlling the second rete 3 evaporation is 7/S, and the thickness after the second rete 3 is finally formed is 50-100nm; Wherein, the film material of described second rete 3 is silica, forms silicon dioxide layer;
C, plating third membrane layer 4:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer 4, be deposited on the surface of the second rete 3 in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer 4, the speed simultaneously controlling third membrane layer 4 evaporation is 2.5/S, and the thickness after third membrane layer 4 is finally formed is 10-100nm; Wherein, the film material of described third membrane layer 4 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete 5:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete 5, be deposited on the surface of third membrane layer 4 in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete 5, the speed simultaneously controlling the 4th rete 5 evaporation is 7/S, and the thickness after the 4th rete 5 is finally formed is 50-100nm; Wherein, the film material of described 4th rete 5 is silica, forms silicon dioxide layer;
E, plating the 5th rete 6:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete 6, be deposited on the surface of the 4th rete 5 in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete 6, the speed simultaneously controlling the 5th rete 6 evaporation is 2.5/S, and the thickness after the 5th rete 6 is finally formed is 10-100nm; Wherein, the film material of described 5th rete 6 is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
F, plating the 6th rete 7:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete 7, be deposited on the surface of the 5th rete 6 in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete 7, the speed simultaneously controlling the 6th rete 7 evaporation is 7/S, and the thickness after the 6th rete 7 is finally formed is 50-100nm; Wherein, the film material of described 6th rete 7 is silica, forms silicon dioxide layer;
G, plating the 7th rete 8:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 7th rete 8, be deposited on the surface of the 6th rete 7 in above-mentioned steps F with nanoscale molecular form after the film material evaporation of the 7th rete 8, the speed simultaneously controlling the 7th rete 8 evaporation is 1/S, thickness after 7th rete 8 is finally formed is 5-20nm, wherein the film material of the 7th rete 8 is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
H, plating the 8th rete 9:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 8th rete 9, wherein the film material of the 8th rete 9 is the oxide of silver, under the effect of electron gun evaporation, the decomposition of silver is attached to the surface of the 7th rete 8 in above-mentioned steps G with the form of Nano Silver, the speed simultaneously controlling the 8th rete 9 evaporation is 1/S, and it is the nano-silver layer of 5-20nm that the 8th rete 9 finally forms thickness; The oxide of wherein said silver is Ag
2o, AgO or Ag
2o
3;
I, plating the 9th rete 10:
Vacuum in vacuum coating cabin is adjusted to and is more than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, adopt the film material of electron gun bombardment the 9th rete 10, be deposited on the surface of the 8th rete 9 in above-mentioned steps H with nanoscale molecular form after the film material evaporation of the 9th rete 10, the speed simultaneously controlling the 9th rete 10 evaporation is 1/S, thickness after 9th rete 10 is finally formed is 10-100nm, and wherein the film material of the 9th rete 10 is ITO material, forms ITO layer;
J, plating the tenth rete 11:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material 11 of electron gun bombardment the tenth rete, be deposited on the surface of the 9th rete 10 in above-mentioned steps I with nanoscale molecular form after the film material evaporation of the tenth rete 11, the speed simultaneously controlling the tenth rete 11 evaporation is 7/S, and the thickness after the tenth rete 11 is finally formed is 10-50nm; Wherein, the film material of described tenth rete 11 is alundum (Al2O3), zirconia, silica high rigidity crystal or silicon monoxide high rigidity crystal, forms high rigidity layer;
K, plate eleventh floor rete 12:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of resistance heated the 11 rete 12, be deposited on the surface of the tenth rete 11 in above-mentioned steps J with nanoscale molecular form after the film material evaporation of the 11 rete 12, the speed simultaneously controlling the 11 rete 12 evaporation is 1.5/S, thickness after 11 rete 12 is finally formed is 3-10nm, and wherein the film material of the 11 rete 12 is fluoride, forms fluoride layer.
The adhesive force of each rete on the lampshade obtained by said method subzero 20 DEG C time is 6-9hrs, adhesive force 80 DEG C time is 6-9hrs, there is very strong adhesive ability, the compactness of each rete is good simultaneously, high purity, this lampshade can filter 23 more than 3% harmful blue light effectively, to harmful blue light, the filtration of dazzling light effectively can alleviate visual fatigue, arranging of ITO layer effectively cuts off harmful electron radiation, ultraviolet and far infrared, serve radiation-resistant effect, fluoride layer is set at the outermost layer of substrate outer surface there is good hydrophobicity and oil-stain-preventing function.
Claims (10)
1. a Multifunction lamp shade, comprise substrate, it is characterized in that: the outer surface of described substrate is sequentially provided with the first rete, the second rete, third membrane layer, the 4th rete, the 5th rete, the 6th rete, the 7th rete, the 8th rete, the 9th mold layer, the tenth rete and the 11 rete from the inside to surface; Described first rete, third membrane layer and the 5th rete are five oxidation three titanium layers, and thickness is 10-100nm; Described second rete, the 4th rete and the 6th rete are silicon dioxide layer, and thickness is 50-100nm; Described 7th rete is metal level, and thickness is 5-20nm; Described 8th rete is nano-silver layer, and the thickness of the 8th rete is 5-20nm; Described 9th rete is ITO layer, and the thickness of the 9th rete is 10-100nm; Described tenth rete is high rigidity layer, and thickness is 10-50nm; Described 11 rete is fluoride layer, and the thickness of the 11 rete is 3-10nm.
2. a kind of Multifunction lamp shade according to claim 1, it is characterized in that: the film material of described metal level is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, and shaping by electron gun evaporation.
3. a kind of Multifunction lamp shade according to claim 1, is characterized in that: the film material of described nano-silver layer is the oxide of silver, and shaping by electron gun evaporation, and the oxide of described silver is Ag
2o, AgO or Ag
2o
3.
4. a kind of Multifunction lamp shade according to claim 1, is characterized in that: described fluoride layer is the shaping magnesium fluoride layer of resistance heated evaporation.
5. a kind of Multifunction lamp shade according to claim 1, is characterized in that: the film material of described high rigidity layer is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, and shaping by electron gun evaporation.
6. a kind of Multifunction lamp shade according to claim 1, is characterized in that: described substrate is by resin or glass ware forming.
7. the manufacture method of a kind of Multifunction lamp shade according to claim 6, it is characterized in that: when described substrate is by resin forming, described manufacture method specifically comprises the following steps:
1) substrate is cleaned, dry;
2) plated film is carried out to the outer surface of substrate;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silica, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 2.5/S, and the thickness after third membrane layer is finally formed is 10-100nm; Wherein, the film material of described third membrane layer is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 7/S, and the thickness after the 4th rete is finally formed is 50-100nm; Wherein, the film material of described 4th rete is silica, forms silicon dioxide layer;
E, plating the 5th rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 2.5/S, and the thickness after the 5th rete is finally formed is 10-100nm; Wherein, the film material of described 5th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
F, plating the 6th rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 7/S, and the thickness after the 6th rete is finally formed is 50-100nm; Wherein, the film material of described 6th rete is silica, forms silicon dioxide layer;
G, plating the 7th rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 7th rete, be deposited on the surface of the 6th rete in above-mentioned steps F with nanoscale molecular form after the film material evaporation of the 7th rete, the speed simultaneously controlling the 7th rete evaporation is 1/S, thickness after 7th rete is finally formed is 5-20nm, wherein the film material of the 7th rete is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
H, plating the 8th rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 8th rete, wherein the film material of the 8th rete is the oxide of silver, under the effect of electron gun evaporation, the peroxide breaks down of silver is attached to the surface of the 7th rete in above-mentioned steps G with the form of Nano Silver, the speed simultaneously controlling the 8th rete evaporation is 1/S, and the 8th rete finally forms the nano-silver layer that thickness is 5-20nm; The oxide of wherein said silver is Ag
2o, AgO or Ag
2o
3;
I, plating the 9th rete:
Vacuum in vacuum coating cabin is adjusted to and is more than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, adopt the film material of electron gun bombardment the 9th rete, be deposited on the surface of the 8th rete in above-mentioned steps H with nanoscale molecular form after the film material evaporation of the 9th rete, the speed simultaneously controlling the 9th rete evaporation is 1/S, thickness after 9th rete is finally formed is 10-100nm, and wherein the film material of the 9th rete is ITO material, forms ITO layer;
J, plating the tenth rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the tenth rete, be deposited on the surface of the 9th rete in above-mentioned steps I with nanoscale molecular form after the film material evaporation of the tenth rete, the speed simultaneously controlling the tenth rete evaporation is 7/S, and the thickness after the tenth rete is finally formed is 10-50nm; Wherein, the film material of described tenth rete is alundum (Al2O3), zirconia, silica high rigidity crystal or silicon monoxide high rigidity crystal, forms high rigidity layer;
K, plate eleventh floor rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of resistance heated the 11 rete, be deposited on the surface of the tenth rete in above-mentioned steps J with nanoscale molecular form after the film material evaporation of the 11 rete, the speed simultaneously controlling the 11 rete evaporation is 1.5/S, thickness after 11 rete is finally formed is 3-10nm, and wherein the film material of the 11 rete is fluoride, forms fluoride layer.
8. the manufacture method of a kind of Multifunction lamp shade according to claim 7, it is characterized in that: in described step 1), substrate is cleaned, dry concrete steps are as follows: substrate is placed in vacuum chamber, cleans with the outer surface 2-3 minute of ion gun bombardment substrate.
9. the manufacture method of a kind of Multifunction lamp shade according to claim 6, it is characterized in that: when described substrate is by glass ware forming, described manufacture method specifically comprises the following steps:
1) substrate is cleaned, dry;
2) plated film is carried out to the outer surface of substrate;
A, plate the first rete:
Vacuum in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outer surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silica, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 2.5/S, and the thickness after third membrane layer is finally formed is 10-100nm; Wherein, the film material of described third membrane layer is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
D, plating the 4th rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 7/S, and the thickness after the 4th rete is finally formed is 50-100nm; Wherein, the film material of described 4th rete is silica, forms silicon dioxide layer;
E, plating the 5th rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 2.5/S, and the thickness after the 5th rete is finally formed is 10-100nm; Wherein, the film material of described 5th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
F, plating the 6th rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 7/S, and the thickness after the 6th rete is finally formed is 50-100nm; Wherein, the film material of described 6th rete is silica, forms silicon dioxide layer;
G, plating the 7th rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 7th rete, be deposited on the surface of the 6th rete in above-mentioned steps F with nanoscale molecular form after the film material evaporation of the 7th rete, the speed simultaneously controlling the 7th rete evaporation is 1/S, thickness after 7th rete is finally formed is 5-20nm, wherein the film material of the 7th rete is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, copper alloy, kirsite or nickel alloy, forms metal level;
H, plating the 8th rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 8th rete, wherein the film material of the 8th rete is the oxide of silver, under the effect of electron gun evaporation, the peroxide breaks down of silver is attached to the surface of the 7th rete in above-mentioned steps G with the form of Nano Silver, the speed simultaneously controlling the 8th rete evaporation is 1/S, and the 8th rete finally forms the nano-silver layer that thickness is 5-20nm; The oxide of wherein said silver is Ag
2o, AgO or Ag
2o
3;
I, plating the 9th rete:
Vacuum in vacuum coating cabin is adjusted to and is more than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, adopt the film material of electron gun bombardment the 9th rete, be deposited on the surface of the 8th rete in above-mentioned steps H with nanoscale molecular form after the film material evaporation of the 9th rete, the speed simultaneously controlling the 9th rete evaporation is 1/S, thickness after 9th rete is finally formed is 10-100nm, and wherein the film material of the 9th rete is ITO material, forms ITO layer;
J, plating the tenth rete:
The vacuum in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the tenth rete, be deposited on the surface of the 9th rete in above-mentioned steps I with nanoscale molecular form after the film material evaporation of the tenth rete, the speed simultaneously controlling the tenth rete evaporation is 7/S, and the thickness after the tenth rete is finally formed is 10-50nm; Wherein, the film material of described tenth rete is alundum (Al2O3), zirconia, silica high rigidity crystal or silicon monoxide high rigidity crystal, forms high rigidity layer;
K, plate eleventh floor rete:
The vacuum in vacuum coating cabin is kept to be more than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of resistance heated the 11 rete, be deposited on the surface of the tenth rete in above-mentioned steps J with nanoscale molecular form after the film material evaporation of the 11 rete, the speed simultaneously controlling the 11 rete evaporation is 1.5/S, thickness after 11 rete is finally formed is 3-10nm, and wherein the film material of the 11 rete is fluoride, forms fluoride layer.
10. the manufacture method of a kind of Multifunction lamp shade according to claim 9, it is characterized in that: in described step 1), substrate is cleaned, dry concrete steps are as follows: substrate is placed in vacuum chamber, cleans with the outer surface 5-10 minute of ion gun bombardment substrate.
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