CN105425415A - Blue light filtering, dazzling preventing and wear resisting lens and preparation method thereof - Google Patents
Blue light filtering, dazzling preventing and wear resisting lens and preparation method thereof Download PDFInfo
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- CN105425415A CN105425415A CN201511029171.8A CN201511029171A CN105425415A CN 105425415 A CN105425415 A CN 105425415A CN 201511029171 A CN201511029171 A CN 201511029171A CN 105425415 A CN105425415 A CN 105425415A
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- rete
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- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C7/00—Optical parts
- G02C7/10—Filters, e.g. for facilitating adaptation of the eyes to the dark; Sunglasses
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Ophthalmology & Optometry (AREA)
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Abstract
The invention relates to a blue light filtering, dazzling preventing and wear resisting lens and a preparation method thereof. The lens comprises a substrate, and the inner surface and the outer surface of the substrate are provided with first films, second films, third films, fourth films, fifth films, sixth films, seventh films and eighth films sequentially and symmetrically from inside to outside. The first films, the fourth films and the sixth films are titanium oxide layers, and the thickness ranges from 10 nm to 100 nm. The second films, the fifth films and the seventh films are silicon dioxide layers, and the thickness ranges from 50 nm to 100 nm. The third films are metal layers, and the thickness ranges from 5 nm to 20 nm. The eighth films are high-hardness layers, and the thickness ranges from 10 nm to 50 nm. The preparation method comprises the following steps that 1, the substrate is washed; 2, the inner surface and the outer surface of the substrate are coated with the films respectively. The lens can effectively filter out 33% of harmful blue light and dazzling light or above, visual fatigue can be effectively relieved, and the wear resistance of the lens can be remarkably improved through the high-hardness layers.
Description
Technical field
The present invention relates to a kind of lens technology field, especially relate to that a kind of filter blue light anti-glazing is resistance to grind a lens and preparation method thereof.
Background technology
Along with people's culture, the improving constantly of living standard, carrying out of sight protection work, the simple optical device that glasses make as correcting defects of vision or protect eyes, has played important effect in people's sphere of life.Glasses are normally made up of eyeglass and mirror holder, and from eyeglass functionally, it has the light quantity that adjustment enters eyes, increase eyesight, effect such as protection eye-safe and clinical treatment illness in eye etc.
Current eyeglass of a great variety, as TAC polarized lenses common at present, it 100% obstruct can be harmful to light, therefore quite by the favor of consumer, be particularly suitable for outdoor exercises to use, but, in motion process, eyeglass is swiped unavoidably, therefore the rub proofness of eyeglass is also the Consideration that consumer chooses, TAC polarized lenses commercially available at present, the hardness on its surface can only reach H, its wearing quality is 1.5 grades, be easy to be scratched by hard object or break, affect the effect that user observes things, both made troubles to user, but also need often to change, increase use cost, have much room for improvement.
The high-energy visible ray of blue light to be wavelength be 400-500nm, blue light directly to penetrate cornea, eyes crystal, through retina, blue light can stimulate retina to produce a large amount of radical ion, make the atrophy of retinal pigment epithelium, and cause the death of photaesthesia cell, retinal pigment epithelium is very strong to the light absorption effect of blue region, absorbs blue ray radiation and can make retinal pigment epithelium atrophy, and this is also the one of the main reasons producing ARM; Blue ray radiation composition is higher larger to cellula visualis injury, and the atrophy of retinal pigment epithelium, can make amphiblestroid image thicken, and can do continuous adjustment, increase the weight of the working strength of ciliary muscle, cause visual fatigue fuzzy image ciliary muscle.Can cause the visual fatigue of people under the effect of ultraviolet and blue light, eyesight can decline gradually, easily causes dry and astringent, early onset cataract, the spontaneous macular diseases such as photophobia, fatigue on ocular vision.In order to avoid blue light injury, the optical mirror slip with partial filtration blue wave band is invented, and this optical mirror slip is also called anti-blue light eyeglass.Existing anti-blue light eyeglass is mostly utilize the anti-blue light eyeglass adding toner and make in lens materials, the patent No. disclosed in Chinese invention patent is the blue light resistant dark down sunglasses lenses of CN101813832A, utilize the anti-blue light eyeglass made at eyeglass top layer plated film in addition, as CN1564052 patent the blue-light injury proof health lens that discloses.
During driving at night, if opposite driving vehicle adopts powerful car light in violation of rules and regulations, driver will produce dazzling sensation, and within longer a period of time, vision is difficult to recover normal condition, very easily causes traffic hazard.In the case, produce dazzling mechanism is people: when people enters dark place from strong light environment, or from dark place to daylight, and eyes all need experience one section of adaptation time just can see surrounding objects clearly, are correspondingly called dark adatpation and light adaptation.Relevant scientific data shows, this time met the needs of is approximately 5-10min, and adapts to new lightness environment needs 20 completely
-30min.In driving at night process, when opposite vehicle is head-on sailed, driver just has the process of a light adaptation, and when vehicle crosses, has again a scotopic process, very easily causes people's kopiopia.For solving this potential safety hazard, the method that people adopt electronics to combine with optics usually, such as ADS crystalline substance hopes mirror, this product is the upgraded product of automotive sunshade panel, effectively can prevent dazzling, and have the advantage automatically adjusting transmissivity with extraneous light intensity, but it matches with vehicle, if other vehicles are wanted to adopt this product to install separately, greatly reduce its versatility, and this series products is on the high side.
For the problems referred to above, in conjunction with the glasses that people often wear, research and development one can filter blue light, can prevent again dazzling Multifunctional lens from being vital.
Summary of the invention
The object of the invention is to for the deficiencies in the prior art, provide a kind of blue light that can effectively prevent to the injury of human body, have high-wearing feature and anti-glare function, the filter blue light anti-glazing being suitable for using night is resistance to grind a lens and preparation method thereof.
For achieving the above object, the present invention is by the following technical solutions:
A kind of filter blue light anti-glazing is resistance to grind a lens, and comprises substrate, and inside and outside two surfaces of described substrate from the inside to surface symmetry are sequentially provided with the first rete, the second rete, third membrane layer, the 4th rete, the 5th rete, the 6th rete, the 7th rete and the 8th rete; Described first rete, the 4th rete and the 6th rete are five oxidation three titanium layers, and thickness is 10-100nm; Described second rete, the 5th rete and the 7th rete are silicon dioxide layer, and thickness is 50-100nm; Described third membrane layer is metal level, and thickness is 5-20nm; Described 8th rete is high rigidity layer, and thickness is 10-50nm.
The film material of described metal level is gold, silver, platinum, neodymium, copper, zinc or nickel, and shaping by electron gun evaporation.
The film material of described metal level is billon, silver alloy, platinum alloy, neodymium alloy, aldary, kirsite or nickel alloy, and shaping by electron gun evaporation.
The film material of described high rigidity layer is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, and shaping by electron gun evaporation.
Described substrate is by resin or glass ware forming.
The resistance to preparation method ground a lens of filter blue light anti-glazing, when described substrate is by resin forming, described preparation method specifically comprises the following steps:
1) substrate is cleaned, dry;
2) respectively plated film is carried out to inside and outside two surfaces of substrate;
A, plate the first rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 1/S, and the thickness after third membrane layer is finally formed is 5-20nm; Wherein, the film material of described third membrane layer is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, aldary, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 2.5/S, and the thickness after the 4th rete is finally formed is 10-100nm; Wherein, the film material of described 4th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
E, plating the 5th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 7/S, and the thickness after the 5th rete is finally formed is 50-100nm; Wherein, the film material of described 5th rete is silicon dioxide, forms silicon dioxide layer;
F, plating the 6th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 2.5/S, and the thickness after the 6th rete is finally formed is 10-100nm; Wherein, the film material of described 6th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
G, plating the 7th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 7th rete, be deposited on the surface of the 6th rete in above-mentioned steps F with nanoscale molecular form after the film material evaporation of the 7th rete, the speed simultaneously controlling the 7th rete evaporation is 7/S, and the thickness after the 7th rete is finally formed is 50-100nm; Wherein, the film material of described 7th rete is silicon dioxide, forms silicon dioxide layer;
H, plating the 8th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 8th rete, be deposited on the surface of the 7th rete in above-mentioned steps G with nanoscale molecular form after the film material evaporation of the 8th rete, the speed simultaneously controlling the 8th rete evaporation is 7/S, and the thickness after the 8th rete is finally formed is 10-50nm; Wherein, the film material of described 8th rete is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, forms high rigidity layer;
In described step 1), substrate is cleaned, dry concrete steps are as follows: adopt organic cleaning solvent to carry out first wash to substrate, and with ultrasonic assistant cleaning, adopt isopropyl alcohol dry; Before substrate coating, substrate is placed in vacuum chamber and again cleans with the outside surface 2-3 minute of ion gun bombardment substrate.
The resistance to preparation method ground a lens of filter blue light anti-glazing, when described substrate is by glass ware forming, described preparation method specifically comprises the following steps:
1) substrate is cleaned, dry;
2) respectively plated film is carried out to inside and outside two surfaces of substrate;
A, plate the first rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 1/S, and the thickness after third membrane layer is finally formed is 5-20nm; Wherein, the film material of described third membrane layer is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, aldary, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 2.5/S, and the thickness after the 4th rete is finally formed is 10-100nm; Wherein, the film material of described 4th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
E, plating the 5th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 7/S, and the thickness after the 5th rete is finally formed is 50-100nm; Wherein, the film material of described 5th rete is silicon dioxide, forms silicon dioxide layer;
F, plating the 6th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 2.5/S, and the thickness after the 6th rete is finally formed is 10-100nm; Wherein, the film material of described 6th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
G, plating the 7th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 7th rete, be deposited on the surface of the 6th rete in above-mentioned steps F with nanoscale molecular form after the film material evaporation of the 7th rete, the speed simultaneously controlling the 7th rete evaporation is 7/S, and the thickness after the 7th rete is finally formed is 50-100nm; Wherein, the film material of described 7th rete is silicon dioxide, forms silicon dioxide layer;
H, plating the 8th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 8th rete, be deposited on the surface of the 7th rete in above-mentioned steps G with nanoscale molecular form after the film material evaporation of the 8th rete, the speed simultaneously controlling the 8th rete evaporation is 7/S, and the thickness after the 8th rete is finally formed is 10-50nm; Wherein, the film material of described 8th rete is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, forms high rigidity layer;
In described step 1), substrate is cleaned, dry concrete steps are as follows: adopt organic cleaning solvent to carry out first wash to substrate, and with ultrasonic assistant cleaning, adopt isopropyl alcohol dry; Before substrate coating, substrate is placed in vacuum chamber and again cleans with the outside surface 5-10 minute of ion gun bombardment substrate.
The present invention adopts the principle of electron beam vacuum evaporation, there is after utilizing charged particle to accelerate in the electric field the feature of certain kinetic energy, ion is guided into the electrode for being made by the substrate of plated film, and by high purity metal, metal alloy or other oxide that simple substance exists by electron gun with high temperature bombardment, the nano molecular be evaporated makes it move to substrate along certain direction and the final method in deposition on substrate film forming.This invention combine with technique utilizes the trajectory of electron motion in the special distributed controll electric field in magnetic field, improves the technique of plated film with this, make coating film thickness and homogeneity controlled, and good, the cohesive force of rete compactness of preparation is strong and high purity.
The present invention's vacuum evaporation on substrate has some layers five to be oxidized three titanium layers, take full advantage of five oxidation Tritanium/Trititanium crystalline material coating operations good, rete is intensive, evenly, stable, the performances such as stress is little, and five oxidation Tritanium/Trititanium crystalline material in visible light wave range, there is the highest refractive index, good crystallinity, evaporation is stablized, without advantages such as venting and splashes, it is made to be adapted at eyeglass substrate being coated with the good multilayer film of anti-reflection property.
The present invention's vacuum evaporation on substrate has some layers of silicon oxide layer, mainly plays a part to increase film adhesion, wearing quality and impact resistance, can absorb harmful light simultaneously.
Of the present invention five are oxidized three titanium layers and silicon dioxide layer and metal level cooperatively interacts, mainly play the effect of controlled filter blue light, the present invention is at some five oxidation three titanium layers and the silicon dioxide layers be arranged alternately of the inside and outside surperficial evaporation of eyeglass substrate, not only effective elimination most purple light and blue light, and can usable reflection harmful light, high light, dazzling light wave, flash light wave by force, reduce the stimulation of injury to human eye retina and shortwave dazzle; Metal level of the present invention, not only improves anti-blue light effect and sharpness, and can reflect harmful light, dazzling light wave, flashes light wave etc. by force; The present invention is cooperatively interacted by above-mentioned rete, plays the effects such as absorption, reflection, conversion, filtration, is the wear-resisting core technology of glasses lens plated filter blue light anti-glazing; Meanwhile, by regulating the thickness of above-mentioned each rete, the visible ray making wavelength longer produces coherent interference, thus produces antiglare effect further; High rigidity layer is set at the outermost layer on substrate inside and outside surface, effectively improves the wearing quality of eyeglass, can prevent it from scratching.
When eyeglass substrate of the present invention is by resin forming, the adhesion of each rete of the eyeglass obtained by preparation method of the present invention subzero 20 DEG C time is 2-4hrs, and the adhesion 80 DEG C time is 2-4hrs; When eyeglass substrate of the present invention is by glass ware forming, the adhesion of each rete of the eyeglass obtained by preparation method of the present invention subzero 20 DEG C time is 6-9hrs, and the adhesion 80 DEG C time is 6-9hrs; Multiple retes that eyeglass of the present invention is coated with can effective filter 23 more than 3% harmful blue light, metal level can promote sharpness and anti-blue light effect effectively simultaneously, thus improve the overall sharpness of eyeglass, good contribution is had for the sharpness of vision and authenticity, effectively can alleviate visual fatigue to harmful blue light, the filtration of dazzling light, the high rigidity layer of employing can significantly improve the wearing quality of eyeglass.
Accompanying drawing explanation
Below in conjunction with the drawings and specific embodiments, the present invention is described in further details:
Fig. 1 is the resistance to exploded view ground a lens of filter blue light anti-glazing of the present invention.
Embodiment
As shown in Figure 1, the present invention includes substrate 1, inside and outside two surfaces of described substrate 1 from the inside to surface symmetry are sequentially provided with the first rete 2, second rete 3, third membrane layer 4, the 4th rete 5, the 5th rete 6, the 6th rete 7, the 7th rete 8 and the 8th rete 9; Described first rete 2, the 4th rete 5 and the 6th rete 7 are five oxidation three titanium layers, and thickness is 10-100nm; Described second rete 3, the 5th rete 6 and the 7th rete 8 are silicon dioxide layer, and thickness is 50-100nm; Described third membrane layer 4 is metal level, and thickness is 5-20nm; Described 8th rete 9 is high rigidity layer, and thickness is 10-50nm.
The film material of described metal level is gold, silver, platinum, neodymium, copper, zinc or nickel, and shaping by electron gun evaporation.
The film material of described metal level is billon, silver alloy, platinum alloy, neodymium alloy, aldary, kirsite or nickel alloy, and shaping by electron gun evaporation.
The film material of described high rigidity layer is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, and shaping by electron gun evaporation.
Described substrate is by resin or glass ware forming.
Embodiment 1
The resistance to preparation method ground a lens of filter blue light anti-glazing, when described substrate is by resin forming, described preparation method specifically comprises the following steps:
1) substrate is cleaned, dry;
2) respectively plated film is carried out to inside and outside two surfaces of substrate;
A, plate the first rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 1/S, and the thickness after third membrane layer is finally formed is 5-20nm; Wherein, the film material of described third membrane layer is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, aldary, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 2.5/S, and the thickness after the 4th rete is finally formed is 10-100nm; Wherein, the film material of described 4th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
E, plating the 5th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 7/S, and the thickness after the 5th rete is finally formed is 50-100nm; Wherein, the film material of described 5th rete is silicon dioxide, forms silicon dioxide layer;
F, plating the 6th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 2.5/S, and the thickness after the 6th rete is finally formed is 10-100nm; Wherein, the film material of described 6th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
G, plating the 7th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 7th rete, be deposited on the surface of the 6th rete in above-mentioned steps F with nanoscale molecular form after the film material evaporation of the 7th rete, the speed simultaneously controlling the 7th rete evaporation is 7/S, and the thickness after the 7th rete is finally formed is 50-100nm; Wherein, the film material of described 7th rete is silicon dioxide, forms silicon dioxide layer;
H, plating the 8th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 8th rete, be deposited on the surface of the 7th rete in above-mentioned steps G with nanoscale molecular form after the film material evaporation of the 8th rete, the speed simultaneously controlling the 8th rete evaporation is 7/S, and the thickness after the 8th rete is finally formed is 10-50nm; Wherein, the film material of described 8th rete is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, forms high rigidity layer;
In described step 1), substrate is cleaned, dry concrete steps are as follows: adopt organic cleaning solvent to carry out first wash to substrate, and with ultrasonic assistant cleaning, adopt isopropyl alcohol dry; Before substrate coating, substrate is placed in vacuum chamber and again cleans with the outside surface 2-3 minute of ion gun bombardment substrate.
Embodiment 2
The resistance to preparation method ground a lens of filter blue light anti-glazing, when described substrate is by glass ware forming, described preparation method specifically comprises the following steps:
1) substrate is cleaned, dry;
2) respectively plated film is carried out to inside and outside two surfaces of substrate;
A, plate the first rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 1/S, and the thickness after third membrane layer is finally formed is 5-20nm; Wherein, the film material of described third membrane layer is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, aldary, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 2.5/S, and the thickness after the 4th rete is finally formed is 10-100nm; Wherein, the film material of described 4th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
E, plating the 5th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 7/S, and the thickness after the 5th rete is finally formed is 50-100nm; Wherein, the film material of described 5th rete is silicon dioxide, forms silicon dioxide layer;
F, plating the 6th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 2.5/S, and the thickness after the 6th rete is finally formed is 10-100nm; Wherein, the film material of described 6th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
G, plating the 7th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 7th rete, be deposited on the surface of the 6th rete in above-mentioned steps F with nanoscale molecular form after the film material evaporation of the 7th rete, the speed simultaneously controlling the 7th rete evaporation is 7/S, and the thickness after the 7th rete is finally formed is 50-100nm; Wherein, the film material of described 7th rete is silicon dioxide, forms silicon dioxide layer;
H, plating the 8th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 8th rete, be deposited on the surface of the 7th rete in above-mentioned steps G with nanoscale molecular form after the film material evaporation of the 8th rete, the speed simultaneously controlling the 8th rete evaporation is 7/S, and the thickness after the 8th rete is finally formed is 10-50nm; Wherein, the film material of described 8th rete is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, forms high rigidity layer;
In described step 1), substrate is cleaned, dry concrete steps are as follows: adopt organic cleaning solvent to carry out first wash to substrate, and with ultrasonic assistant cleaning, adopt isopropyl alcohol dry; Before substrate coating, substrate is placed in vacuum chamber and again cleans with the outside surface 5-10 minute of ion gun bombardment substrate.
The present invention adopts the principle of electron beam vacuum evaporation, there is after utilizing charged particle to accelerate in the electric field the feature of certain kinetic energy, ion is guided into the electrode for being made by the substrate of plated film, and by high purity metal, metal alloy or other oxide that simple substance exists by electron gun with high temperature bombardment, the nano molecular be evaporated makes it move to substrate along certain direction and the final method in deposition on substrate film forming.This invention combine with technique utilizes the trajectory of electron motion in the special distributed controll electric field in magnetic field, improves the technique of plated film with this, make coating film thickness and homogeneity controlled, and good, the cohesive force of rete compactness of preparation is strong and high purity.
The present invention's vacuum evaporation on substrate has some layers five to be oxidized three titanium layers, take full advantage of five oxidation Tritanium/Trititanium crystalline material coating operations good, rete is intensive, evenly, stable, the performances such as stress is little, and five oxidation Tritanium/Trititanium crystalline material in visible light wave range, there is the highest refractive index, good crystallinity, evaporation is stablized, without advantages such as venting and splashes, it is made to be adapted at eyeglass substrate being coated with the good multilayer film of anti-reflection property.
The present invention's vacuum evaporation on substrate has some layers of silicon oxide layer, mainly plays a part to increase film adhesion, wearing quality and impact resistance, can absorb harmful light simultaneously.
Of the present invention five are oxidized three titanium layers and silicon dioxide layer and metal level cooperatively interacts, mainly play the effect of controlled filter blue light, the present invention is at some five oxidation three titanium layers and the silicon dioxide layers be arranged alternately of the inside and outside surperficial evaporation of eyeglass substrate, not only effective elimination most purple light and blue light, and can usable reflection harmful light, high light, dazzling light wave, flash light wave by force, reduce the stimulation of injury to human eye retina and shortwave dazzle; Metal level of the present invention, not only improves anti-blue light effect and sharpness, and can reflect harmful light, dazzling light wave, flashes light wave etc. by force; The present invention is cooperatively interacted by above-mentioned rete, plays the effects such as absorption, reflection, conversion, filtration, is the wear-resisting core technology of glasses lens plated filter blue light anti-glazing; Meanwhile, by regulating the thickness of above-mentioned each rete, the visible ray making wavelength longer produces coherent interference, thus produces antiglare effect further; High rigidity layer is set at the outermost layer on substrate inside and outside surface, effectively improves the wearing quality of eyeglass, can prevent it from scratching.
When eyeglass substrate of the present invention is by resin forming, the adhesion of each rete of the eyeglass obtained by preparation method of the present invention subzero 20 DEG C time is 2-4hrs, and the adhesion 80 DEG C time is 2-4hrs; When eyeglass substrate of the present invention is by glass ware forming, the adhesion of each rete of the eyeglass obtained by preparation method of the present invention subzero 20 DEG C time is 6-9hrs, and the adhesion 80 DEG C time is 6-9hrs; Multiple retes that eyeglass of the present invention is coated with can effective filter 23 more than 3% harmful blue light, metal level can promote sharpness and anti-blue light effect effectively simultaneously, thus improve the overall sharpness of eyeglass, good contribution is had for the sharpness of vision and authenticity, effectively can alleviate visual fatigue to harmful blue light, the filtration of dazzling light, the high rigidity layer of employing can significantly improve the wearing quality of eyeglass.
More than describe and should not have any restriction to protection scope of the present invention.
Claims (9)
1. a filter blue light anti-glazing is resistance to grinds a lens, comprise substrate, it is characterized in that: inside and outside two surfaces of described substrate from the inside to surface symmetry are sequentially provided with the first rete, the second rete, third membrane layer, the 4th rete, the 5th rete, the 6th rete, the 7th rete and the 8th rete; Described first rete, the 4th rete and the 6th rete are five oxidation three titanium layers, and thickness is 10-100nm; Described second rete, the 5th rete and the 7th rete are silicon dioxide layer, and thickness is 50-100nm; Described third membrane layer is metal level, and thickness is 5-20nm; Described 8th rete is high rigidity layer, and thickness is 10-50nm.
2. a kind of filter blue light anti-glazing according to claim 1 is resistance to grinds a lens, and it is characterized in that: the film material of described metal level is gold, silver, platinum, neodymium, copper, zinc or nickel, and shaping by electron gun evaporation.
3. a kind of filter blue light anti-glazing according to claim 1 is resistance to grinds a lens, and it is characterized in that: the film material of described metal level is billon, silver alloy, platinum alloy, neodymium alloy, aldary, kirsite or nickel alloy, and shaping by electron gun evaporation.
4. a kind of filter blue light anti-glazing according to claim 1 is resistance to grinds a lens, and it is characterized in that: the film material of described high rigidity layer is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, and shaping by electron gun evaporation.
5. a kind of filter blue light anti-glazing according to claim 1 is resistance to grinds a lens, and it is characterized in that: described substrate is by resin or glass ware forming.
6. the resistance to preparation method ground a lens of filter blue light anti-glazing according to claim 5, it is characterized in that: when described substrate is by resin forming, described preparation method specifically comprises the following steps:
1) substrate is cleaned, dry;
2) respectively plated film is carried out to inside and outside two surfaces of substrate;
A, plate the first rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 50-70 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 1/S, and the thickness after third membrane layer is finally formed is 5-20nm; Wherein, the film material of described third membrane layer is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, aldary, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 2.5/S, and the thickness after the 4th rete is finally formed is 10-100nm; Wherein, the film material of described 4th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
E, plating the 5th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 7/S, and the thickness after the 5th rete is finally formed is 50-100nm; Wherein, the film material of described 5th rete is silicon dioxide, forms silicon dioxide layer;
F, plating the 6th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 2.5/S, and the thickness after the 6th rete is finally formed is 10-100nm; Wherein, the film material of described 6th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
G, plating the 7th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 7th rete, be deposited on the surface of the 6th rete in above-mentioned steps F with nanoscale molecular form after the film material evaporation of the 7th rete, the speed simultaneously controlling the 7th rete evaporation is 7/S, and the thickness after the 7th rete is finally formed is 50-100nm; Wherein, the film material of described 7th rete is silicon dioxide, forms silicon dioxide layer;
H, plating the 8th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 50-70 DEG C simultaneously, adopt the film material of electron gun bombardment the 8th rete, be deposited on the surface of the 7th rete in above-mentioned steps G with nanoscale molecular form after the film material evaporation of the 8th rete, the speed simultaneously controlling the 8th rete evaporation is 7/S, and the thickness after the 8th rete is finally formed is 10-50nm; Wherein, the film material of described 8th rete is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, forms high rigidity layer.
7. the resistance to preparation method ground a lens of a kind of filter blue light anti-glazing according to claim 6, it is characterized in that: in described step 1), substrate is cleaned, dry concrete steps are as follows: adopt organic cleaning solvent to carry out first wash to substrate, and with ultrasonic assistant cleaning, adopt isopropyl alcohol dry; Before substrate coating, substrate is placed in vacuum chamber and again cleans with the outside surface 2-3 minute of ion gun bombardment substrate.
8. the resistance to preparation method ground a lens of filter blue light anti-glazing according to claim 5, it is characterized in that: when described substrate is by glass ware forming, described preparation method specifically comprises the following steps:
1) substrate is cleaned, dry;
2) respectively plated film is carried out to inside and outside two surfaces of substrate;
A, plate the first rete:
Vacuum tightness in vacuum coating cabin is adjusted to and is less than or equal to 5.0 × 10
-3handkerchief, and the temperature controlled in vacuum coating cabin is 200-300 DEG C, electron gun is adopted to bombard the film material of the first rete, be deposited on the outside surface of substrate with nanoscale molecular form after the film material evaporation of the first rete, the speed simultaneously controlling the first rete evaporation is 2.5/S, and the thickness after the first rete is finally formed is 10-100nm; Wherein, the film material of described first rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
B, plate the second rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, electron gun is adopted to bombard the film material of the second rete, be deposited on the surface of the first rete in above-mentioned steps A with nanoscale molecular form after the film material evaporation of the second rete, the speed simultaneously controlling the second rete evaporation is 7/S, and the thickness after the second rete is finally formed is 50-100nm; Wherein, the film material of described second rete is silicon dioxide, forms silicon dioxide layer;
C, plating third membrane layer:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment third membrane layer, be deposited on the surface of the second rete in above-mentioned steps B with nanoscale molecular form after the film material evaporation of third membrane layer, the speed simultaneously controlling third membrane layer evaporation is 1/S, and the thickness after third membrane layer is finally formed is 5-20nm; Wherein, the film material of described third membrane layer is gold, silver, platinum, neodymium, copper, zinc, nickel, billon, silver alloy, platinum alloy, neodymium alloy, aldary, kirsite or nickel alloy, forms metal level;
D, plating the 4th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 4th rete, be deposited on the surface of third membrane layer in above-mentioned steps C with nanoscale molecular form after the film material evaporation of the 4th rete, the speed simultaneously controlling the 4th rete evaporation is 2.5/S, and the thickness after the 4th rete is finally formed is 10-100nm; Wherein, the film material of described 4th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
E, plating the 5th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 5th rete, be deposited on the surface of the 4th rete in above-mentioned steps D with nanoscale molecular form after the film material evaporation of the 5th rete, the speed simultaneously controlling the 5th rete evaporation is 7/S, and the thickness after the 5th rete is finally formed is 50-100nm; Wherein, the film material of described 5th rete is silicon dioxide, forms silicon dioxide layer;
F, plating the 6th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 6th rete, be deposited on the surface of the 5th rete in above-mentioned steps E with nanoscale molecular form after the film material evaporation of the 6th rete, the speed simultaneously controlling the 6th rete evaporation is 2.5/S, and the thickness after the 6th rete is finally formed is 10-100nm; Wherein, the film material of described 6th rete is five oxidation Tritanium/Trititaniums, forms five oxidation three titanium layers;
G, plating the 7th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 7th rete, be deposited on the surface of the 6th rete in above-mentioned steps F with nanoscale molecular form after the film material evaporation of the 7th rete, the speed simultaneously controlling the 7th rete evaporation is 7/S, and the thickness after the 7th rete is finally formed is 50-100nm; Wherein, the film material of described 7th rete is silicon dioxide, forms silicon dioxide layer;
H, plating the 8th rete:
The vacuum tightness in vacuum coating cabin is kept to be less than or equal to 5.0 × 10
-3handkerchief, keep the temperature in vacuum coating cabin to be 200-300 DEG C simultaneously, adopt the film material of electron gun bombardment the 8th rete, be deposited on the surface of the 7th rete in above-mentioned steps G with nanoscale molecular form after the film material evaporation of the 8th rete, the speed simultaneously controlling the 8th rete evaporation is 7/S, and the thickness after the 8th rete is finally formed is 10-50nm; Wherein, the film material of described 8th rete is alundum (Al2O3), zirconia, silica crystals or silicon monoxide crystal, forms high rigidity layer.
9. the resistance to preparation method ground a lens of a kind of filter blue light anti-glazing according to claim 8, it is characterized in that: in described step 1), substrate is cleaned, dry concrete steps are as follows: adopt organic cleaning solvent to carry out first wash to substrate, and with ultrasonic assistant cleaning, adopt isopropyl alcohol dry; Before substrate coating, substrate is placed in vacuum chamber and again cleans with the outside surface 5-10 minute of ion gun bombardment substrate.
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106646688A (en) * | 2016-11-21 | 2017-05-10 | 东莞粤恒光学有限公司 | Frosted lens and manufacturing method thereof |
| CN108060390A (en) * | 2017-12-15 | 2018-05-22 | 奥特路（漳州）光学科技有限公司 | A kind of dust-proof lens coating method |
| CN108060396A (en) * | 2017-12-15 | 2018-05-22 | 奥特路（漳州）光学科技有限公司 | A kind of fog-proof lens film plating process |
| CN109270602A (en) * | 2018-12-12 | 2019-01-25 | 深圳菲比特光电科技有限公司 | Composite Coatings film layer, lens barrel, camera lens and capture apparatus |
| CN109930114A (en) * | 2017-12-15 | 2019-06-25 | 奥特路（漳州）光学科技有限公司 | A kind of wear-resisting lens coating method |
| JP2019124935A (en) * | 2018-01-11 | 2019-07-25 | ダローズ クリエーションズ | New ocular lens made of composite material for optical use, and method of manufacturing the same |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101266309A (en) * | 2008-04-25 | 2008-09-17 | 同济大学 | Single peak narrowband reflection filter possessing broad low reflecting bypass belt |
| CN103439760A (en) * | 2013-09-04 | 2013-12-11 | 杏晖光学（厦门）有限公司 | Manufacturing method for blue-ray-resistance lens |
| CN203376492U (en) * | 2013-07-23 | 2014-01-01 | 厦门虹泰光学有限公司 | Blue light-resistant coated eyeglass |
| CN103984120A (en) * | 2014-05-30 | 2014-08-13 | 奥特路（漳州）光学科技有限公司 | Method for manufacturing blue light-resistant optical lens |
-
2015
- 2015-12-31 CN CN201511029171.8A patent/CN105425415A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101266309A (en) * | 2008-04-25 | 2008-09-17 | 同济大学 | Single peak narrowband reflection filter possessing broad low reflecting bypass belt |
| CN203376492U (en) * | 2013-07-23 | 2014-01-01 | 厦门虹泰光学有限公司 | Blue light-resistant coated eyeglass |
| CN103439760A (en) * | 2013-09-04 | 2013-12-11 | 杏晖光学（厦门）有限公司 | Manufacturing method for blue-ray-resistance lens |
| CN103984120A (en) * | 2014-05-30 | 2014-08-13 | 奥特路（漳州）光学科技有限公司 | Method for manufacturing blue light-resistant optical lens |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106646688A (en) * | 2016-11-21 | 2017-05-10 | 东莞粤恒光学有限公司 | Frosted lens and manufacturing method thereof |
| CN108060390A (en) * | 2017-12-15 | 2018-05-22 | 奥特路（漳州）光学科技有限公司 | A kind of dust-proof lens coating method |
| CN108060396A (en) * | 2017-12-15 | 2018-05-22 | 奥特路（漳州）光学科技有限公司 | A kind of fog-proof lens film plating process |
| CN109930114A (en) * | 2017-12-15 | 2019-06-25 | 奥特路（漳州）光学科技有限公司 | A kind of wear-resisting lens coating method |
| JP2019124935A (en) * | 2018-01-11 | 2019-07-25 | ダローズ クリエーションズ | New ocular lens made of composite material for optical use, and method of manufacturing the same |
| CN109270602A (en) * | 2018-12-12 | 2019-01-25 | 深圳菲比特光电科技有限公司 | Composite Coatings film layer, lens barrel, camera lens and capture apparatus |
| CN109270602B (en) * | 2018-12-12 | 2024-04-12 | 深圳菲比特光电科技有限公司 | Composite coating layer, lens barrel, lens and shooting equipment |
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Application publication date: 20160323 |