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USD851613S1 - Target profile for a physical vapor deposition chamber target - Google Patents

Target profile for a physical vapor deposition chamber target Download PDF

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Publication number
USD851613S1
USD851613S1 US29/621,221 US201729621221F USD851613S US D851613 S1 USD851613 S1 US D851613S1 US 201729621221 F US201729621221 F US 201729621221F US D851613 S USD851613 S US D851613S
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United States
Prior art keywords
target
vapor deposition
physical vapor
deposition chamber
profile
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US29/621,221
Inventor
William Johanson
Kirankumar Savandaiah
Anthony Chih-Tang Chan
Siew Kit Hoi
Prashant Prabhakar Prabhu
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Applied Materials Inc
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Applied Materials Inc
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Priority to US29/621,221 priority Critical patent/USD851613S1/en
Assigned to APPLIED MATERIALS SINGAPORE TECHNOLOGY PTE. LTD. reassignment APPLIED MATERIALS SINGAPORE TECHNOLOGY PTE. LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: HOI, SIEW KIT
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: CHAN, ANTHONY CHIH-TANG, JOHANSON, WILLIAM, PRABHU, PRASHANT PRABHAKAR, SAVANDAIAH, KIRANKUMAR
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: APPLIED MATERIALS SINGAPORE TECHNOLOGY PTE. LTD.
Priority to US29/690,617 priority patent/USD894137S1/en
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Publication of USD851613S1 publication Critical patent/USD851613S1/en
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FIG. 1 is a top perspective view of a target profile for a physical vapor deposition chamber target, showing our new design;
FIG. 2 is a bottom perspective view thereof;
FIG. 3 is a top plan view thereof;
FIG. 4 is a bottom plan view thereof;
FIG. 5 is a right side elevational view thereof;
FIG. 6 is a left side elevational view thereof;
FIG. 7 is a front elevational view thereof;
FIG. 8 is a back elevational view thereof; and,
FIG. 9 is an enlarged cross sectional view taken along line 9-9 in FIG. 4.
The dashed lines of the cut line showing the plane upon which FIG. 9 is taken in FIG. 4 forms no part of the claimed design.

Claims (1)

    CLAIM
  1. The ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.
US29/621,221 2017-10-05 2017-10-05 Target profile for a physical vapor deposition chamber target Active USD851613S1 (en)

Priority Applications (2)

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US29/621,221 USD851613S1 (en) 2017-10-05 2017-10-05 Target profile for a physical vapor deposition chamber target
US29/690,617 USD894137S1 (en) 2017-10-05 2019-05-09 Target profile for a physical vapor deposition chamber target

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US29/621,221 USD851613S1 (en) 2017-10-05 2017-10-05 Target profile for a physical vapor deposition chamber target

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USD868124S1 (en) * 2017-12-11 2019-11-26 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD873782S1 (en) * 2016-05-17 2020-01-28 Electro Scientific Industries, Inc Component carrier plate
USD894137S1 (en) * 2017-10-05 2020-08-25 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD902165S1 (en) 2018-03-09 2020-11-17 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD908645S1 (en) * 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD917003S1 (en) * 2018-06-06 2021-04-20 JMA Outdoors, Inc. Simulating target
USD931372S1 (en) * 2020-12-15 2021-09-21 Shenzhen Lingtuowan Technology Co., Ltd. Target toy set
USD933726S1 (en) * 2020-07-31 2021-10-19 Applied Materials, Inc. Deposition ring for a semiconductor processing chamber
USD933725S1 (en) * 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
US11415396B2 (en) 2017-11-06 2022-08-16 JMA Outdoors, Inc. Apparatus for generating a vitals target
US11581166B2 (en) 2020-07-31 2023-02-14 Applied Materials, Inc. Low profile deposition ring for enhanced life
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1010415S1 (en) * 2021-10-27 2024-01-09 Mirka Ltd Backing pad for sander
USD1029602S1 (en) * 2022-01-04 2024-06-04 Noritake Co., Limited Polishing pad dresser
USD1037778S1 (en) * 2022-07-19 2024-08-06 Applied Materials, Inc. Gas distribution plate

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USD868124S1 (en) * 2017-12-11 2019-11-26 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD946638S1 (en) 2017-12-11 2022-03-22 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD902165S1 (en) 2018-03-09 2020-11-17 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD917003S1 (en) * 2018-06-06 2021-04-20 JMA Outdoors, Inc. Simulating target
USD933725S1 (en) * 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD908645S1 (en) * 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD970566S1 (en) 2020-03-23 2022-11-22 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
US11581166B2 (en) 2020-07-31 2023-02-14 Applied Materials, Inc. Low profile deposition ring for enhanced life
USD933726S1 (en) * 2020-07-31 2021-10-19 Applied Materials, Inc. Deposition ring for a semiconductor processing chamber
USD966357S1 (en) 2020-12-02 2022-10-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD931372S1 (en) * 2020-12-15 2021-09-21 Shenzhen Lingtuowan Technology Co., Ltd. Target toy set
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1010415S1 (en) * 2021-10-27 2024-01-09 Mirka Ltd Backing pad for sander
USD1029602S1 (en) * 2022-01-04 2024-06-04 Noritake Co., Limited Polishing pad dresser
USD1037778S1 (en) * 2022-07-19 2024-08-06 Applied Materials, Inc. Gas distribution plate

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