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USD888903S1 - Deposition ring for physical vapor deposition chamber - Google Patents

Deposition ring for physical vapor deposition chamber Download PDF

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Publication number
USD888903S1
USD888903S1 US29/673,685 US201829673685F USD888903S US D888903 S1 USD888903 S1 US D888903S1 US 201829673685 F US201829673685 F US 201829673685F US D888903 S USD888903 S US D888903S
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United States
Prior art keywords
physical vapor
ring
deposition
vapor deposition
chamber
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Active
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US29/673,685
Inventor
David Gunther
Cheng-Hsiung Tsai
Kirankumar Neelasandra Savandaiah
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Applied Materials Inc
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Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to US29/673,685 priority Critical patent/USD888903S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: GUNTHER, David, TSAI, CHENG-HSIUNG, SAVANDAIAH, KIRANKUMAR NEELASANDRA
Priority to TW108303547F priority patent/TWD207532S/en
Priority to JPD2020-4209F priority patent/JP1669283S/ja
Priority to TW108303547D01F priority patent/TWD209650S/en
Priority to JPD2019-13254F priority patent/JP1669226S/ja
Application granted granted Critical
Publication of USD888903S1 publication Critical patent/USD888903S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Description

FIG. 1 is a perspective view of a deposition ring for a physical vapor deposition chamber, according to the novel design.
FIG. 2 is a top plan view thereof.
FIG. 3 is a bottom plan view thereof.
FIG. 4 is a front elevation view thereof.
FIG. 5 is a back elevation view thereof.
FIG. 6 is a left side elevation view thereof.
FIG. 7 is a right side elevation view thereof.
FIG. 8 is a cross-sectional view taken along line 8-8 in FIG. 2.
FIG. 9 is a perspective view of a deposition ring for a physical vapor deposition chamber, according to the novel design.
FIG. 10 is a top plan view thereof.
FIG. 11 is a bottom plan view thereof.
FIG. 12 is a front elevation view thereof.
FIG. 13 is a back elevation view thereof.
FIG. 14 is a left side elevation view thereof.
FIG. 15 is a right side elevation view thereof; and,
FIG. 16 is a cross-sectional view taken along line 16-16 in FIG. 10.
The dashed lines in FIGS. 9-16 represent unclaimed environment forming no part of the claimed design.

Claims (1)

    CLAIM
  1. The ornamental design for a deposition ring for a physical vapor deposition chamber, as shown and described.
US29/673,685 2018-12-17 2018-12-17 Deposition ring for physical vapor deposition chamber Active USD888903S1 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
US29/673,685 USD888903S1 (en) 2018-12-17 2018-12-17 Deposition ring for physical vapor deposition chamber
TW108303547F TWD207532S (en) 2018-12-17 2019-06-17 Deposition ring for pvd chamber
JPD2020-4209F JP1669283S (en) 2018-12-17 2019-06-17
TW108303547D01F TWD209650S (en) 2018-12-17 2019-06-17 Deposition ring for pvd chamber
JPD2019-13254F JP1669226S (en) 2018-12-17 2019-06-17

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/673,685 USD888903S1 (en) 2018-12-17 2018-12-17 Deposition ring for physical vapor deposition chamber

Publications (1)

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USD888903S1 true USD888903S1 (en) 2020-06-30

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US29/673,685 Active USD888903S1 (en) 2018-12-17 2018-12-17 Deposition ring for physical vapor deposition chamber

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US (1) USD888903S1 (en)
JP (2) JP1669283S (en)
TW (2) TWD207532S (en)

Cited By (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD908645S1 (en) * 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
TWD214021S (en) 2020-07-27 2021-09-11 美商應用材料股份有限公司 Edge ring
USD932721S1 (en) * 2020-02-26 2021-10-05 Bway Corporation Container ring
USD933726S1 (en) * 2020-07-31 2021-10-19 Applied Materials, Inc. Deposition ring for a semiconductor processing chamber
USD933725S1 (en) * 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD934315S1 (en) * 2020-03-20 2021-10-26 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD936190S1 (en) * 2020-02-27 2021-11-16 Caterpillar Inc. Ripple seal
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD939695S1 (en) * 2020-12-18 2021-12-28 North Shore Medical, Llc Disposable commode receptacle
USD939694S1 (en) * 2019-11-06 2021-12-28 North Shore Medical, Llc Disposable commode receptacle
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD941371S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD941372S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD942516S1 (en) * 2019-02-08 2022-02-01 Applied Materials, Inc. Process shield for a substrate processing chamber
USD946638S1 (en) 2017-12-11 2022-03-22 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD972101S1 (en) * 2020-05-08 2022-12-06 Bloomy Lotus Ltd Air purifier
US20220406573A1 (en) * 2021-06-18 2022-12-22 Applied Materials, Inc. Process kit having tall deposition ring and smaller diameter electrostatic chuck (esc) for pvd chamber
US11551960B2 (en) 2020-01-30 2023-01-10 Applied Materials, Inc. Helical plug for reduction or prevention of arcing in a substrate support
US11581166B2 (en) 2020-07-31 2023-02-14 Applied Materials, Inc. Low profile deposition ring for enhanced life
USD985741S1 (en) * 2020-11-06 2023-05-09 Kubota Corporation Gland for pipe joints
TWD227909S (en) 2023-04-21 2023-10-01 錩崎勝企業有限公司 Sealing materials for wall faucet covers
US11832770B2 (en) 2019-11-06 2023-12-05 North Shore Medical, Llc Disposable commode receptacle
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1011671S1 (en) 1991-07-02 2024-01-16 Bway Corporation Container
USD1015669S1 (en) 2020-02-26 2024-02-20 Bway Corporation Container ring
US11961723B2 (en) * 2018-12-17 2024-04-16 Applied Materials, Inc. Process kit having tall deposition ring for PVD chamber
US11996315B2 (en) 2020-11-18 2024-05-28 Applied Materials, Inc. Thin substrate handling via edge clamping
USD1032795S1 (en) * 2022-03-03 2024-06-25 Advanced Drainage Systems, Inc. Reducing plate
USD1034493S1 (en) * 2022-11-25 2024-07-09 Ap Systems Inc. Chamber wall liner for a semiconductor manufacturing apparatus
USD1038049S1 (en) * 2020-11-18 2024-08-06 Applied Materials, Inc. Cover ring for use in semiconductor processing chamber
USD1042373S1 (en) 2022-03-18 2024-09-17 Applied Materials, Inc. Sliding ring for an interlocking process kit for a substrate processing chamber
USD1042374S1 (en) * 2022-03-18 2024-09-17 Applied Materials, Inc. Support pipe for an interlocking process kit for a substrate processing chamber
USD1051867S1 (en) * 2020-03-19 2024-11-19 Applied Materials, Inc. Confinement liner for a substrate processing chamber
USD1052546S1 (en) * 2020-12-10 2024-11-26 Nuflare Technology, Inc. Cover ring of top plate for semiconductor manufacturing apparatus
USD1053230S1 (en) 2022-05-19 2024-12-03 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD1055006S1 (en) 2022-03-18 2024-12-24 Applied Materials, Inc. Support ring for an interlocking process kit for a substrate processing chamber
USD1059312S1 (en) * 2022-08-04 2025-01-28 Applied Materials, Inc. Deposition ring of a process kit for semiconductor substrate processing
USD1064005S1 (en) 2022-08-04 2025-02-25 Applied Materials, Inc. Grounding ring of a process kit for semiconductor substrate processing
USD1064818S1 (en) * 2022-08-29 2025-03-04 Bway Corporation Container ring
USD1064817S1 (en) * 2022-08-29 2025-03-04 Bway Corporation Container ring
USD1069054S1 (en) * 2022-08-08 2025-04-01 As America, Inc. Gasket
USD1069863S1 (en) 2022-08-04 2025-04-08 Applied Materials, Inc. Deposition ring of a process kit for semiconductor substrate processing
USD1072774S1 (en) 2021-02-06 2025-04-29 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
US12293902B2 (en) 2018-01-19 2025-05-06 Applied Materials, Inc. Process kit for a substrate support
USD1079661S1 (en) * 2023-08-31 2025-06-17 Kokusai Electric Corporation Susceptor of semiconductor manufacturing apparatus
USD1082728S1 (en) * 2023-01-11 2025-07-08 Nuflare Technology, Inc. Susceptor

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USD244533S (en) * 1975-06-11 1977-05-31 Ite Imperial Corporation Water resistant gasket for conduits and the like
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US20120103257A1 (en) * 2010-10-29 2012-05-03 Applied Materials, Inc. Deposition ring and electrostatic chuck for physical vapor deposition chamber
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USD665491S1 (en) * 2012-01-25 2012-08-14 Applied Materials, Inc. Deposition chamber cover ring
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US9534286B2 (en) 2013-03-15 2017-01-03 Applied Materials, Inc. PVD target for self-centering process shield
US20170002461A1 (en) 2015-07-03 2017-01-05 Applied Materials, Inc. Process kit having tall deposition ring and deposition ring clamp
TWD180764S (en) 2015-06-18 2017-01-11 應用材料股份有限公司 Portion of a physical vapor deposition chamber target
CN206573738U (en) 2017-03-16 2017-10-20 江苏亨通光导新材料有限公司 Low loss fiber
TWD188898S (en) 2016-09-30 2018-03-01 應用材料股份有限公司 Target profile for a physical vapor deposition chamber target
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USD379588S (en) * 1995-03-22 1997-06-03 Greene, Tweed Of Delaware, Inc. Seal
US5863340A (en) 1996-05-08 1999-01-26 Flanigan; Allen Deposition ring anti-rotation apparatus
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US7520969B2 (en) * 2006-03-07 2009-04-21 Applied Materials, Inc. Notched deposition ring
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US8911601B2 (en) * 2010-10-29 2014-12-16 Applied Materials, Inc. Deposition ring and electrostatic chuck for physical vapor deposition chamber
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Cited By (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1011671S1 (en) 1991-07-02 2024-01-16 Bway Corporation Container
USD946638S1 (en) 2017-12-11 2022-03-22 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
US12293902B2 (en) 2018-01-19 2025-05-06 Applied Materials, Inc. Process kit for a substrate support
USD1040304S1 (en) * 2018-12-17 2024-08-27 Applied Materials, Inc. Deposition ring for physical vapor deposition chamber
US11961723B2 (en) * 2018-12-17 2024-04-16 Applied Materials, Inc. Process kit having tall deposition ring for PVD chamber
USD942516S1 (en) * 2019-02-08 2022-02-01 Applied Materials, Inc. Process shield for a substrate processing chamber
USD933725S1 (en) * 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD908645S1 (en) * 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
US11832770B2 (en) 2019-11-06 2023-12-05 North Shore Medical, Llc Disposable commode receptacle
USD939694S1 (en) * 2019-11-06 2021-12-28 North Shore Medical, Llc Disposable commode receptacle
US11551960B2 (en) 2020-01-30 2023-01-10 Applied Materials, Inc. Helical plug for reduction or prevention of arcing in a substrate support
USD1015669S1 (en) 2020-02-26 2024-02-20 Bway Corporation Container ring
USD932721S1 (en) * 2020-02-26 2021-10-05 Bway Corporation Container ring
USD936190S1 (en) * 2020-02-27 2021-11-16 Caterpillar Inc. Ripple seal
USD1051867S1 (en) * 2020-03-19 2024-11-19 Applied Materials, Inc. Confinement liner for a substrate processing chamber
USD941372S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD941371S1 (en) * 2020-03-20 2022-01-18 Applied Materials, Inc. Process shield for a substrate processing chamber
USD934315S1 (en) * 2020-03-20 2021-10-26 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD970566S1 (en) 2020-03-23 2022-11-22 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD972101S1 (en) * 2020-05-08 2022-12-06 Bloomy Lotus Ltd Air purifier
USD1034491S1 (en) * 2020-07-27 2024-07-09 Applied Materials, Inc. Edge ring
TWD214021S (en) 2020-07-27 2021-09-11 美商應用材料股份有限公司 Edge ring
US11581166B2 (en) 2020-07-31 2023-02-14 Applied Materials, Inc. Low profile deposition ring for enhanced life
USD933726S1 (en) * 2020-07-31 2021-10-19 Applied Materials, Inc. Deposition ring for a semiconductor processing chamber
USD985741S1 (en) * 2020-11-06 2023-05-09 Kubota Corporation Gland for pipe joints
USD1038049S1 (en) * 2020-11-18 2024-08-06 Applied Materials, Inc. Cover ring for use in semiconductor processing chamber
US11996315B2 (en) 2020-11-18 2024-05-28 Applied Materials, Inc. Thin substrate handling via edge clamping
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD966357S1 (en) 2020-12-02 2022-10-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1052546S1 (en) * 2020-12-10 2024-11-26 Nuflare Technology, Inc. Cover ring of top plate for semiconductor manufacturing apparatus
USD939695S1 (en) * 2020-12-18 2021-12-28 North Shore Medical, Llc Disposable commode receptacle
USD1072774S1 (en) 2021-02-06 2025-04-29 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
US11581167B2 (en) * 2021-06-18 2023-02-14 Applied Materials, Inc. Process kit having tall deposition ring and smaller diameter electrostatic chuck (ESC) for PVD chamber
US20220406573A1 (en) * 2021-06-18 2022-12-22 Applied Materials, Inc. Process kit having tall deposition ring and smaller diameter electrostatic chuck (esc) for pvd chamber
USD1032795S1 (en) * 2022-03-03 2024-06-25 Advanced Drainage Systems, Inc. Reducing plate
USD1042374S1 (en) * 2022-03-18 2024-09-17 Applied Materials, Inc. Support pipe for an interlocking process kit for a substrate processing chamber
USD1042373S1 (en) 2022-03-18 2024-09-17 Applied Materials, Inc. Sliding ring for an interlocking process kit for a substrate processing chamber
USD1055006S1 (en) 2022-03-18 2024-12-24 Applied Materials, Inc. Support ring for an interlocking process kit for a substrate processing chamber
USD1053230S1 (en) 2022-05-19 2024-12-03 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD1064005S1 (en) 2022-08-04 2025-02-25 Applied Materials, Inc. Grounding ring of a process kit for semiconductor substrate processing
USD1059312S1 (en) * 2022-08-04 2025-01-28 Applied Materials, Inc. Deposition ring of a process kit for semiconductor substrate processing
USD1069863S1 (en) 2022-08-04 2025-04-08 Applied Materials, Inc. Deposition ring of a process kit for semiconductor substrate processing
USD1069054S1 (en) * 2022-08-08 2025-04-01 As America, Inc. Gasket
USD1064818S1 (en) * 2022-08-29 2025-03-04 Bway Corporation Container ring
USD1064817S1 (en) * 2022-08-29 2025-03-04 Bway Corporation Container ring
USD1034493S1 (en) * 2022-11-25 2024-07-09 Ap Systems Inc. Chamber wall liner for a semiconductor manufacturing apparatus
USD1082728S1 (en) * 2023-01-11 2025-07-08 Nuflare Technology, Inc. Susceptor
USD1082731S1 (en) * 2023-01-11 2025-07-08 Nuflare Technology, Inc. Susceptor
USD1082729S1 (en) * 2023-01-11 2025-07-08 Nuflare Technology, Inc. Susceptor cover
TWD227909S (en) 2023-04-21 2023-10-01 錩崎勝企業有限公司 Sealing materials for wall faucet covers
USD1079661S1 (en) * 2023-08-31 2025-06-17 Kokusai Electric Corporation Susceptor of semiconductor manufacturing apparatus

Also Published As

Publication number Publication date
TWD209650S (en) 2021-02-01
JP1669226S (en) 2020-09-28
TWD207532S (en) 2020-10-01
JP1669283S (en) 2020-09-28

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