TWI846345B - Memory device - Google Patents
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- 101100236208 Homo sapiens LTB4R gene Proteins 0.000 description 14
- 102100033374 Leukotriene B4 receptor 1 Human genes 0.000 description 14
- 238000010586 diagram Methods 0.000 description 12
- 230000002159 abnormal effect Effects 0.000 description 10
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- 101000671638 Homo sapiens Vesicle transport protein USE1 Proteins 0.000 description 6
- 102100040106 Vesicle transport protein USE1 Human genes 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 101100437750 Schizosaccharomyces pombe (strain 972 / ATCC 24843) blt1 gene Proteins 0.000 description 4
- 101100437752 Hordeum vulgare BLT4 gene Proteins 0.000 description 2
- RJCRUVXAWQRZKQ-UHFFFAOYSA-N oxosilicon;silicon Chemical compound [Si].[Si]=O RJCRUVXAWQRZKQ-UHFFFAOYSA-N 0.000 description 2
- 229910052814 silicon oxide Inorganic materials 0.000 description 2
- 101100095908 Chlamydomonas reinhardtii SLT3 gene Proteins 0.000 description 1
- 101001121408 Homo sapiens L-amino-acid oxidase Proteins 0.000 description 1
- 101001017969 Homo sapiens Leukotriene B4 receptor 2 Proteins 0.000 description 1
- 101000827703 Homo sapiens Polyphosphoinositide phosphatase Proteins 0.000 description 1
- 102100026388 L-amino-acid oxidase Human genes 0.000 description 1
- 102100033375 Leukotriene B4 receptor 2 Human genes 0.000 description 1
- 102100023591 Polyphosphoinositide phosphatase Human genes 0.000 description 1
- 101150104869 SLT2 gene Proteins 0.000 description 1
- 101100012902 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) FIG2 gene Proteins 0.000 description 1
- 101100233916 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) KAR5 gene Proteins 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007334 memory performance Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
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Abstract
Description
本發明是有關於一種記憶體裝置,且特別是有關於一種可提升記憶體的修復效率的記憶體裝置。The present invention relates to a memory device, and in particular to a memory device capable of improving the repair efficiency of a memory.
在習知的記憶體裝置中,為了確保記憶體裝置的記憶效能,在記憶體裝置製造完成後,會針對記憶體裝置進行測試。例如,可針對記憶體裝置中的記憶胞區塊的區域位元線以及區域源極線間有無發生短路現象進行測試。In conventional memory devices, in order to ensure the memory performance of the memory device, the memory device is tested after the memory device is manufactured. For example, the test may be performed to determine whether a short circuit occurs between a local bit line and a local source line of a memory cell block in the memory device.
在習知的記憶體裝置中,記憶胞區塊中的具有多條的區域位元線以及區域源極線相互交錯排列。為了提高記憶體裝置的生產良率,當記憶胞區塊中有發生一條區域位元線以及一條區域源極線間的短路現象,則整個記憶胞區塊都需要被捨棄,並透過備援記憶胞區塊來進行取代。這樣的修復方法降低了記憶體裝置的硬體使用效能,並容易造成大量電路面積的浪費。In a conventional memory device, a memory cell block has a plurality of regional bit lines and regional source lines arranged in an interlaced manner. In order to improve the production yield of the memory device, when a short circuit occurs between a regional bit line and a regional source line in a memory cell block, the entire memory cell block needs to be abandoned and replaced by a spare memory cell block. Such a repair method reduces the hardware performance of the memory device and easily causes a large amount of circuit area to be wasted.
本發明提供一種記憶體裝置,可提升記憶體的修復效率。The present invention provides a memory device which can improve the repair efficiency of the memory.
本發明的記憶體裝置包括記憶胞區塊、多個第一位元線開關、多個第二位元線開關、第一開關以及第二開關。記憶胞區塊區分為第一子記憶胞區塊以及第二子記憶胞區塊。第一位元線開關分別耦接至第一子記憶胞區塊中的多條第一區域位元線,第一位元線開關並共同耦接至第一子共同位元線。第二位元線開關分別耦接至第二子記憶胞區塊中的多條第二區域位元線,第二位元線開關並共同耦接至第二子共同位元線。第一開關耦接在第一子共同位元線以及共同位元線間,受控於第一控制信號。第二開關耦接在第二子共同位元線以及共同位元線間,受控於第二控制信號。The memory device of the present invention includes a memory cell block, a plurality of first bit line switches, a plurality of second bit line switches, a first switch and a second switch. The memory cell block is divided into a first sub-memory cell block and a second sub-memory cell block. The first bit line switches are respectively coupled to a plurality of first regional bit lines in the first sub-memory cell block, and the first bit line switches are also commonly coupled to the first sub-common bit line. The second bit line switches are respectively coupled to a plurality of second regional bit lines in the second sub-memory cell block, and the second bit line switches are also commonly coupled to the second sub-common bit line. The first switch is coupled between the first sub-common bit line and the common bit line, and is controlled by a first control signal. The second switch is coupled between the second sub-common bit line and the common bit line, and is controlled by a second control signal.
基於上述,在本發明的記憶體裝置中,透過將一記憶體區塊切分為二子記憶胞區塊。並分別在二子記憶胞區塊與共同位元線間設置多個開關。記憶體裝置透過控制上述開關的導通或斷開狀態,可使對應的子記憶胞區塊維持正常工作或停止工作。在當子記憶胞區塊發生異常現象時,則可透過使對應的開關被切斷以停止工作,可有效的提供備援記憶胞區塊來取代發生異常的子記憶胞區塊。如此一來,在本發明的記憶體裝置中,當異常現象發生時,記憶胞區塊可以不用完全被取代。透過切斷對應子記憶胞區塊的開關,可以透過替代記憶胞區塊的一部分,來完成記憶體裝置的修復動作。Based on the above, in the memory device of the present invention, a memory block is divided into two sub-memory cell blocks. And a plurality of switches are respectively set between the two sub-memory cell blocks and the common bit line. The memory device can make the corresponding sub-memory cell block maintain normal operation or stop working by controlling the on or off state of the above-mentioned switches. When an abnormal phenomenon occurs in a sub-memory cell block, the corresponding switch can be cut off to stop working, and a backup memory cell block can be effectively provided to replace the abnormal sub-memory cell block. In this way, in the memory device of the present invention, when an abnormal phenomenon occurs, the memory cell block does not need to be completely replaced. By turning off the switch corresponding to the sub-memory cell block, the memory device can be repaired by replacing part of the memory cell block.
請參照圖1,圖1繪示本發明一實施例的記憶體裝置的示意圖。記憶體裝置20包括多個記憶胞區塊,其中的記憶胞區塊GP1中的記憶胞共用共同位元線GBLi以及共同源極線GSLi,記憶胞區塊GP2的記憶胞共用共同位元線GBLj以及共同源極線GSLj。共同位元線GBLi耦接至感測放大器SA1,而共同位元線GBLj耦接至感測放大器SA2。在另一方面,以記憶胞區塊GP1為例,記憶胞區塊GP1具有多條區域位元線並分別耦接至多個位元線開關BLT。這些位元線開關BLT為兩個群組,其中之一的群組耦接至開關SW1,其中之另一的群組則耦接至開關SW2。開關SW1未耦接至位元線開關BLT的端點則與開關SW2未耦接至位元線開關BLT的端點相互耦接至感測放大器SA1,並與共同位元線GBLi相互耦接。Please refer to FIG. 1, which is a schematic diagram of a memory device according to an embodiment of the present invention. The memory device 20 includes a plurality of memory cell blocks, wherein the memory cells in the memory cell block GP1 share a common bit line GBLi and a common source line GSLi, and the memory cells in the memory cell block GP2 share a common bit line GBLj and a common source line GSLj. The common bit line GBLi is coupled to the sense amplifier SA1, and the common bit line GBLj is coupled to the sense amplifier SA2. On the other hand, taking the memory cell block GP1 as an example, the memory cell block GP1 has a plurality of regional bit lines and is respectively coupled to a plurality of bit line switches BLT. These bit line switches BLT are divided into two groups, one of which is coupled to the switch SW1, and the other is coupled to the switch SW2. The terminal of the switch SW1 not coupled to the bit line switch BLT and the terminal of the switch SW2 not coupled to the bit line switch BLT are mutually coupled to the sense amplifier SA1 and mutually coupled to the common bit line GBLi.
在本實施例中,以單一記憶胞區塊GP1具有八個位元線開關BLT為例,開關SW1可耦接至其中的四個位元線開關BLT,開關SW2則可耦接至另外的四個位元線開關BLT。In this embodiment, taking a single memory cell block GP1 having eight bit line switches BLT as an example, the switch SW1 may be coupled to four of the bit line switches BLT, and the switch SW2 may be coupled to the other four bit line switches BLT.
在本實施例中,若區域位元線BL1與區域源極線SL1相互發生短路時,開關SW1可對應的切斷,而開關SW2維持被導通的狀態。這樣一來,與開關SW1相互耦接的位元線開關BLT,所對應的區域位元線上的記憶胞,將可以被隔絕以不耦接至感測放大器SA1,並被停用。在另一方面,基於開關SW2維持被導通,因此與開關SW2相互耦接的位元線開關BLT,所對應的區域位元線上的記憶胞仍可維持正常動作。也就是說,同一記憶胞區塊GP1中的部分區域位元線上的記憶胞,在有發生區域位元線BL1與區域源極線SL1間的短路現象時,仍可維持正常運作。In the present embodiment, if a short circuit occurs between the regional bit line BL1 and the regional source line SL1, the switch SW1 can be cut off accordingly, while the switch SW2 remains turned on. In this way, the memory cells on the regional bit line corresponding to the bit line switch BLT coupled to the switch SW1 can be isolated so as not to be coupled to the sense amplifier SA1 and be disabled. On the other hand, since the switch SW2 remains turned on, the memory cells on the regional bit line corresponding to the bit line switch BLT coupled to the switch SW2 can still maintain normal operation. In other words, the memory cells on some regional bit lines in the same memory cell block GP1 can still maintain normal operation when a short circuit occurs between the regional bit line BL1 and the regional source line SL1.
與先前技術的記憶體裝置相比較,如下表所示:
其中感測放大器SA1用以使一參考信號與共同位元線GBLi上的電氣信號比較以產生一感測結果。The sense amplifier SA1 is used to compare a reference signal with the electrical signal on the common bit line GBLi to generate a sensing result.
請參照圖2,圖2繪示本發明一實施例的記憶體裝置的電路示意圖。記憶體裝置100包括記憶胞區塊110、位元線開關BLT1~BLT4、位元線開關BLT5~BLT8、開關SW1、開關SW2、源極線開關SLT1~SLT4以及源極線開關SLT5~SLT8。Please refer to Fig. 2, which shows a circuit diagram of a memory device according to an embodiment of the present invention. The memory device 100 includes a memory cell block 110, bit line switches BLT1-BLT4, bit line switches BLT5-BLT8, switch SW1, switch SW2, source line switches SLT1-SLT4 and source line switches SLT5-SLT8.
在本實施例中,記憶胞區塊110可區分為第一子記憶胞區塊111以及第二子記憶胞區塊112。第一子記憶胞區塊111以及第二子記憶胞區塊112中均包括多個記憶胞MC。第一子記憶胞區塊111具有多條區域位元線BL1~BL4以及多條區域源極線SL1~SL4。此外,位元線開關BLT1~BLT4的每一者具有第一端以及第二端。位元線開關BLT1~BLT4的第一端分別耦接至區域位元線BL1~BL4,位元線開關BLT1~BLT4的第二端則共同耦接至第一子共同位元線SGBL1。源極線開關SLT1~SLT4每一者具有第一端以及第二端,源極線開關SLT1~SLT4的第一端分別耦接至區域源極線SL1~SL4,源極線開關SLT1~SLT4的第二端則共同耦接至共同源極線CSL。In the present embodiment, the memory cell block 110 can be divided into a first sub-memory cell block 111 and a second sub-memory cell block 112. The first sub-memory cell block 111 and the second sub-memory cell block 112 each include a plurality of memory cells MC. The first sub-memory cell block 111 has a plurality of regional bit lines BL1-BL4 and a plurality of regional source lines SL1-SL4. In addition, each of the bit line switches BLT1-BLT4 has a first end and a second end. The first ends of the bit line switches BLT1-BLT4 are respectively coupled to the regional bit lines BL1-BL4, and the second ends of the bit line switches BLT1-BLT4 are commonly coupled to the first sub-common bit line SGBL1. Each of the source line switches SLT1 - SLT4 has a first end and a second end. The first ends of the source line switches SLT1 - SLT4 are respectively coupled to the local source lines SL1 - SL4 , and the second ends of the source line switches SLT1 - SLT4 are commonly coupled to the common source line CSL.
第二子記憶胞區塊112具有多條區域位元線BL5~BL8以及多條區域源極線SL5~SL8。此外,位元線開關BLT5~BLT8的每一者具有第一端以及第二端。位元線開關BLT5~BLT8的第一端分別耦接至區域位元線BL5~BL8,位元線開關BLT5~BLT8的第二端則共同耦接至第二子共同位元線SGBL2。源極線開關SLT5~SLT8每一者具有第一端以及第二端,源極線開關SLT5~SLT8的第一端分別耦接至區域源極線SL5~SL8,源極線開關SLT5~SLT8的第二端則共同耦接至共同源極線CSL。The second sub-memory cell block 112 has a plurality of regional bit lines BL5-BL8 and a plurality of regional source lines SL5-SL8. In addition, each of the bit line switches BLT5-BLT8 has a first end and a second end. The first ends of the bit line switches BLT5-BLT8 are respectively coupled to the regional bit lines BL5-BL8, and the second ends of the bit line switches BLT5-BLT8 are commonly coupled to the second sub-common bit line SGBL2. Each of the source line switches SLT5-SLT8 has a first end and a second end, the first ends of the source line switches SLT5-SLT8 are respectively coupled to the regional source lines SL5-SL8, and the second ends of the source line switches SLT5-SLT8 are commonly coupled to the common source line CSL.
在另一方面,開關SW1耦接在第一子共同位元線SGBL1以及共同位元線GBL間。開關SW1並受控於控制信號CT1以被導通或斷開。開關SW2則耦接在第二子共同位元線SGBL2以及共同位元線GBL間。開關SW2並受控於控制信號CT2以被導通或斷開。On the other hand, the switch SW1 is coupled between the first sub-common bit line SGBL1 and the common bit line GBL. The switch SW1 is controlled by the control signal CT1 to be turned on or off. The switch SW2 is coupled between the second sub-common bit line SGBL2 and the common bit line GBL. The switch SW2 is controlled by the control signal CT2 to be turned on or off.
第一子記憶胞區塊111以及第二子記憶胞區塊112並共用多條字元線WL1~WLN。The first sub-memory cell block 111 and the second sub-memory cell block 112 share a plurality of word lines WL1-WLN.
在本實施例中,開關SW1用以控制第一子記憶胞區塊111中的任一記憶胞MC傳送信號至共同位元線GBL的路徑。在當開關SW1導通時,第一子記憶胞區塊111可正常運作。相對的,在當開關SW1被斷開時,第一子記憶胞區塊111中的任一記憶胞MC無法傳送信號至共同位元線GBL。並且,記憶體裝置100中的感測放大器(未繪示)無法透過接收共同位元線GBL上的信號以感測出第一子記憶胞區塊111中的任一記憶胞MC所儲存的資訊。也就是說,當開關SW1被斷開時,第一子記憶胞區塊111的運作可被停止。In the present embodiment, the switch SW1 is used to control the path for any memory cell MC in the first sub-memory cell block 111 to transmit a signal to the common bit line GBL. When the switch SW1 is turned on, the first sub-memory cell block 111 can operate normally. In contrast, when the switch SW1 is turned off, any memory cell MC in the first sub-memory cell block 111 cannot transmit a signal to the common bit line GBL. Moreover, the sense amplifier (not shown) in the memory device 100 cannot sense the information stored in any memory cell MC in the first sub-memory cell block 111 by receiving the signal on the common bit line GBL. That is, when the switch SW1 is turned off, the operation of the first sub-memory cell block 111 can be stopped.
同理,開關SW2用以控制第二子記憶胞區塊112中的任一記憶胞MC傳送信號至共同位元線GBL的路徑。在當開關SW2導通時,第二子記憶胞區塊112可正常運作。相對的,在當開關SW2斷開時,第二子記憶胞區塊112的運作可被停止。Similarly, the switch SW2 is used to control the path for any memory cell MC in the second memory cell block 112 to transmit a signal to the common bit line GBL. When the switch SW2 is turned on, the second memory cell block 112 can operate normally. Conversely, when the switch SW2 is turned off, the operation of the second memory cell block 112 can be stopped.
在本實施例中,透過針對記憶體裝置100執行測試動作,可以獲知第一子記憶胞區塊111以及第二子記憶胞區塊112是否有無發生異常現象。例如,透過測試動作,可以獲知第一子記憶胞區塊111中的區域位元線BL1~BL4的任一者,有無與區域源極線SL1~SL4的任一者發生短路現象。並可獲知第二子記憶胞區塊112中的區域位元線BL5~BL8的任一者,有無與區域源極線SL5~SL8的任一者發生短路現象。根據上述的測試動作的測試結果,記憶體裝置100可產生控制信號CT1以及CT2。並在當第一子記憶胞區塊111中的區域位元線BL1~BL4的任一者,有與區域源極線SL1~SL4的任一者發生短路現象時,產生對應的控制信號CT1以使開關SW1被切斷。而在當第二子記憶胞區塊112中的區域位元線BL5~BL8的任一者,有與區域源極線SL5~SL8的任一者發生短路現象時,記憶體裝置100可產生對應的控制信號CT2以使開關SW2被切斷。In this embodiment, by performing a test operation on the memory device 100, it can be known whether the first sub-memory cell block 111 and the second sub-memory cell block 112 have any abnormality. For example, through the test operation, it can be known whether any of the regional bit lines BL1 to BL4 in the first sub-memory cell block 111 has a short circuit with any of the regional source lines SL1 to SL4. It can also be known whether any of the regional bit lines BL5 to BL8 in the second sub-memory cell block 112 has a short circuit with any of the regional source lines SL5 to SL8. According to the test results of the above test operations, the memory device 100 can generate control signals CT1 and CT2. When any of the local bit lines BL1-BL4 in the first sub-memory cell block 111 is short-circuited with any of the local source lines SL1-SL4, a corresponding control signal CT1 is generated to turn off the switch SW1. When any of the local bit lines BL5-BL8 in the second sub-memory cell block 112 is short-circuited with any of the local source lines SL5-SL8, the memory device 100 may generate a corresponding control signal CT2 to turn off the switch SW2.
附帶一提的,若測試結果指出第一子記憶胞區塊111沒有發生異常現象時,記憶體裝置100可產生對應的控制信號CT1以使開關SW1被導通。若測試結果指出第二子記憶胞區塊112沒有發生異常現象時,記憶體裝置100可產生對應的控制信號CT2以使開關SW2被導通。Incidentally, if the test result indicates that the first sub-memory cell block 111 has no abnormality, the memory device 100 may generate a corresponding control signal CT1 to turn on the switch SW1. If the test result indicates that the second sub-memory cell block 112 has no abnormality, the memory device 100 may generate a corresponding control signal CT2 to turn on the switch SW2.
舉例來說明,在當開關SW1被切斷時,記憶體裝置100可啟用備援記憶胞區塊來取代發生異常的第一子記憶胞區塊111。也就是說,在記憶胞區塊100中,若僅有其中一個子記憶胞區塊(例如第一子記憶胞區塊111)發生異常時,可透過僅切斷開關SW1(維持開關SW2被導通),以執行部分的記憶胞區塊100的取代動作。如此一來,沒有異常狀態的第二子記憶胞區塊112可以維持正常的運作,可提升記憶體裝置100的修復效率。For example, when the switch SW1 is turned off, the memory device 100 can enable the backup memory cell block to replace the abnormal first sub-memory cell block 111. In other words, if only one of the sub-memory cell blocks (e.g., the first sub-memory cell block 111) in the memory cell block 100 is abnormal, the replacement action of part of the memory cell block 100 can be performed by only turning off the switch SW1 (keeping the switch SW2 turned on). In this way, the second sub-memory cell block 112 without abnormal state can maintain normal operation, which can improve the repair efficiency of the memory device 100.
在本實施例中,開關SW1、SW2、位元線開關BLT1~BLT8、源極線開關SLT1~SLT8皆可以為電晶體開關。記憶胞區塊100中的記憶胞MC可以為及式(AND)快閃記憶胞或是反或式(NOR)快閃記憶胞,並以二維或三維的方式進行建構。In this embodiment, switches SW1, SW2, bit line switches BLT1-BLT8, and source line switches SLT1-SLT8 can all be transistor switches. Memory cells MC in the memory cell block 100 can be AND flash memory cells or NOR flash memory cells, and can be constructed in a two-dimensional or three-dimensional manner.
以下請參照圖3,圖3繪示本發明另一實施例的記憶體裝置的示意圖。記憶體裝置200包括記憶胞區塊210以及備援記憶胞區塊220、230。記憶胞區塊210可區分為第一記憶胞子區塊211以及第二記憶胞子區塊212。第一記憶胞子區塊211的多條區域位元線分別透過位元線開關BLT1~BLT4以耦接至第一子共同位元線SGBL1。第二記憶胞子區塊212的多條區域位元線則分別透過位元線開關BLT5~BLT8以耦接至第二子共同位元線SGBL2。開關SW1耦接在第一子共同位元線SGBL1以及共同位元線GBL間,開關SW2則耦接在第二子共同位元線SGBL2以及共同位元線GBL間。此外,第一記憶胞子區塊211的多條區域源極線分別透過源極線開關SLT1~SLT4以耦接至共同源極線CSL。第二記憶胞子區塊212的多條區域源極線則分別透過源極線開關SLT5~SLT8以耦接至共同源極線CSL。Please refer to FIG. 3 below, which is a schematic diagram of a memory device according to another embodiment of the present invention. The memory device 200 includes a memory cell block 210 and spare memory cell blocks 220 and 230. The memory cell block 210 can be divided into a first memory cell sub-block 211 and a second memory cell sub-block 212. The multiple regional bit lines of the first memory cell sub-block 211 are coupled to the first sub-common bit line SGBL1 through bit line switches BLT1 to BLT4, respectively. The multiple regional bit lines of the second memory cell sub-block 212 are coupled to the second sub-common bit line SGBL2 through bit line switches BLT5 to BLT8, respectively. The switch SW1 is coupled between the first sub-common bit line SGBL1 and the common bit line GBL, and the switch SW2 is coupled between the second sub-common bit line SGBL2 and the common bit line GBL. In addition, the multiple regional source lines of the first memory cell block 211 are coupled to the common source line CSL through the source line switches SLT1-SLT4. The multiple regional source lines of the second memory cell block 212 are coupled to the common source line CSL through the source line switches SLT5-SLT8.
在另一方面,備援記憶胞區塊220的多條區域位元線分別耦接至位元線開關BLTB1~BLTB4。備援記憶胞區塊220的多條區域源極線則分別耦接至源極線開關SLTB1~SLTB4,源極線開關SLTB1~SLTB4另共同耦接至共同源極線CSL。位元線開關BLTB1~BLTB4並共同耦接至子共同位元線SGBL3。開關SW3則耦接在子共同位元線SGBL3以及共同位元線GBL間。備援記憶胞區塊230的多條區域位元線分別耦接至位元線開關BLTB5~BLTB8。備援記憶胞區塊230的多條區域源極線則分別耦接至源極線開關SLTB5~SLTB8,源極線開關SLTB5~SLTB8另共同耦接至共同源極線CSL。位元線開關BLTB5~BLTB8並共同耦接至子共同位元線SGBL4。開關SW4則耦接在子共同位元線SGBL4以及共同位元線GBL間。On the other hand, a plurality of regional bit lines of the backup memory cell block 220 are respectively coupled to the bit line switches BLTB1~BLTB4. A plurality of regional source lines of the backup memory cell block 220 are respectively coupled to the source line switches SLTB1~SLTB4, and the source line switches SLTB1~SLTB4 are also commonly coupled to the common source line CSL. The bit line switches BLTB1~BLTB4 are also commonly coupled to the sub-common bit line SGBL3. The switch SW3 is coupled between the sub-common bit line SGBL3 and the common bit line GBL. A plurality of regional bit lines of the backup memory cell block 230 are respectively coupled to the bit line switches BLTB5~BLTB8. The multiple regional source lines of the backup memory cell block 230 are respectively coupled to the source line switches SLTB5-SLTB8, and the source line switches SLTB5-SLTB8 are also commonly coupled to the common source line CSL. The bit line switches BLTB5-BLTB8 are also commonly coupled to the sub-common bit line SGBL4. The switch SW4 is coupled between the sub-common bit line SGBL4 and the common bit line GBL.
在本實施例中,開關SW1~SW4分別受控於控制信號CT1~CT4。其中,當第一記憶胞子區塊211以及第二記憶胞子區塊212的其中之一被測試出有異常狀態時,開關SW1、SW2的其中之一(對應異常狀態的記憶胞子區塊的開關)可以被切斷,開關SW1、SW2的其中之另一(對應沒有異常狀態的記憶胞子區塊的開關)可以保持導通。相對應的,開關SW3可根據控制信號CT3而被導通,並使備援記憶胞區塊220被啟動以取代發生異常狀態的記憶胞子區塊(第一記憶胞子區塊211以及第二記憶胞子區塊212的其中之一)。在此同時,基於第一記憶胞子區塊211以及第二記憶胞子區塊212的其中之另一為正常狀態,因此開關SW4可根據控制信號CT4而被截止,使備援記憶胞區塊230不執行記憶胞子區塊的取代動作。In this embodiment, the switches SW1-SW4 are controlled by control signals CT1-CT4 respectively. When one of the first memory cell block 211 and the second memory cell block 212 is detected to be in an abnormal state, one of the switches SW1 and SW2 (the switch corresponding to the memory cell block in the abnormal state) can be turned off, and the other of the switches SW1 and SW2 (the switch corresponding to the memory cell block in the normal state) can remain turned on. Correspondingly, the switch SW3 can be turned on according to the control signal CT3, and the spare memory cell block 220 is activated to replace the abnormal memory cell block (one of the first memory cell block 211 and the second memory cell block 212). At the same time, based on the fact that the other of the first memory cell block 211 and the second memory cell block 212 is in a normal state, the switch SW4 can be turned off according to the control signal CT4, so that the spare memory cell block 230 does not perform the replacement action of the memory cell block.
在此請注意,備援記憶胞區塊220、230的任一者的電路架構可以與第一記憶胞子區塊211以及第二記憶胞子區塊212其中的任一相同。也就是說,以備援記憶胞區塊220為例,備援記憶胞區塊220中的記憶胞的數量,可以與第一記憶胞子區塊211中的記憶胞的數量相同,而第一記憶胞子區塊211與第二記憶胞子區塊212則具有相同的記憶胞的數量。It should be noted that the circuit structure of any of the spare memory cell blocks 220 and 230 can be the same as that of any of the first memory cell sub-block 211 and the second memory cell sub-block 212. That is, taking the spare memory cell block 220 as an example, the number of memory cells in the spare memory cell block 220 can be the same as the number of memory cells in the first memory cell sub-block 211, and the first memory cell sub-block 211 and the second memory cell sub-block 212 have the same number of memory cells.
另外,在本實施例中,記憶體裝置200可具有更多數量的備援記憶胞區塊220、230,並可針對多個發生異常的記憶胞子區塊執行置換動作,以確保記憶體裝置200的正常運作。In addition, in this embodiment, the memory device 200 may have a larger number of spare memory cell blocks 220 and 230, and may perform replacement operations on a plurality of abnormal memory cell sub-blocks to ensure the normal operation of the memory device 200.
以下請參照圖4,圖4繪示本發明實施例的記憶體裝置的部分架構示意圖。其中,記憶體裝置400中具有多個位元線開關BT1~BT8。位元線開關BT1~BT8兩兩成對進行設置。位元線開關BT1~BT4的一端共同耦接至子共同位元線SGBL1,位元線開關BT5~BT8的一端共同耦接至子共同位元線SGBL2。位元線開關BT1~BT4的另一端分別耦接至區域位元線BL1~BL4,位元線開關BT5~BT8的另一端則可分別耦接至不同的多條位元線(如圖1實施例的位元線BL5~BL8)。Please refer to FIG. 4 below, which shows a partial schematic diagram of the memory device of an embodiment of the present invention. Therein, the memory device 400 has a plurality of bit line switches BT1~BT8. The bit line switches BT1~BT8 are arranged in pairs. One end of the bit line switches BT1~BT4 is commonly coupled to the sub-common bit line SGBL1, and one end of the bit line switches BT5~BT8 is commonly coupled to the sub-common bit line SGBL2. The other ends of the bit line switches BT1~BT4 are respectively coupled to the regional bit lines BL1~BL4, and the other ends of the bit line switches BT5~BT8 can be respectively coupled to different multiple bit lines (such as the bit lines BL5~BL8 of the embodiment of FIG. 1).
此外,開關SW1、SW2成對進行設置。開關SW1耦接在子共同位元線SGBL1以及共同位元線GBL間,開關SW2則耦接在子共同位元線SGBL2以及共同位元線GBL間。基於三維堆疊的架構,共同位元線GBL例如可由第二上金屬層(top metal 2, TM2)來形成。開關SW1、SW2可透過直通矽晶穿孔(Through-Silicon Via, TSV)來耦接至共同位元線GBL。此外,區域位元線BL1~BL4則可由第一上金屬層(top metal 1, TM1)來形成,在高度上可略低於共同位元線GBL。附帶一提的,在本實施例中,區域源極線SL1~SL4可形成在第一上金屬層,共同源極線CSL則可形成在第二上金屬層。In addition, switches SW1 and SW2 are arranged in pairs. Switch SW1 is coupled between sub-common bit line SGBL1 and common bit line GBL, and switch SW2 is coupled between sub-common bit line SGBL2 and common bit line GBL. Based on the three-dimensional stacking structure, common bit line GBL can be formed by the second top metal layer (top metal 2, TM2), for example. Switches SW1 and SW2 can be coupled to common bit line GBL through through-silicon vias (TSV). In addition, regional bit lines BL1~BL4 can be formed by the first top metal layer (top metal 1, TM1), and can be slightly lower in height than common bit line GBL. Incidentally, in this embodiment, the regional source lines SL1-SL4 may be formed on the first upper metal layer, and the common source line CSL may be formed on the second upper metal layer.
以下請參照圖5,圖5繪示本發明另一實施例的記憶體裝置的示意圖。在記憶體裝置500中,記憶胞區塊510可被區分為子記憶胞區塊511、512、513以及514。子記憶胞區塊511透過位元線開關BLT1、BLT2以耦接至開關SW51,再透過開關SW51以耦接至共同位元線GBL,子記憶胞區塊511並透過源極線開關SLT1、SLT2以耦接至共同源極線CSL;子記憶胞區塊512透過位元線開關BLT3、BLT4以耦接至開關SW52,再透過開關SW52以耦接至共同位元線GBL,子記憶胞區塊512並透過源極線開關SLT3、SLT4以耦接至共同源極線CSL;子記憶胞區塊513透過位元線開關BLT5、BLT6以耦接至開關SW53,再透過開關SW53以耦接至共同位元線GBL,子記憶胞區塊513並透過源極線開關SLT5、SLT6以耦接至共同源極線CSL;子記憶胞區塊514透過位元線開關BLT7、BLT8以耦接至開關SW54,再透過開關SW54以耦接至共同位元線GBL,子記憶胞區塊514並透過源極線開關SLT7、SLT8以耦接至共同源極線CSL。5 is a schematic diagram of a memory device according to another embodiment of the present invention. In the memory device 500, a memory cell block 510 can be divided into sub-memory cell blocks 511, 512, 513 and 514. The sub-memory cell block 511 is coupled to the switch SW51 through the bit line switches BLT1 and BLT2, and then coupled to the common bit line GBL through the switch SW51. The sub-memory cell block 511 is also coupled to the common source line CSL through the source line switches SLT1 and SLT2. The sub-memory cell block 512 is coupled to the switch SW52 through the bit line switches BLT3 and BLT4, and then coupled to the common bit line GBL through the switch SW52. The sub-memory cell block 512 is also coupled to the common source line CSL through the source line switches SLT3 and SLT4. The sub-memory cell block 513 is coupled to the switch SW53 through the bit line switches BLT5 and BLT6, and then coupled to the common bit line GBL through the switch SW53. The sub-memory cell block 513 is also coupled to the common source line CSL through the source line switches SLT5 and SLT6. The sub-memory cell block 514 is coupled to the switch SW54 through the bit line switches BLT7 and BLT8, and then coupled to the common bit line GBL through the switch SW54. The sub-memory cell block 514 is also coupled to the common source line CSL through the source line switches SLT7 and SLT8.
相較於圖1實施例的記憶體裝置100,本實施例的記憶體裝置500更細分記憶胞區塊510為更多數量的子記憶胞區塊511~514。如此一來,當子記憶胞區塊511~514的其中之一發生異常現象時,可進針對記憶胞區塊510中更少的部分進行更換來完成修復動作,以效提升記憶體裝置500的使用效能。Compared to the memory device 100 of the embodiment of FIG. 1 , the memory device 500 of the present embodiment further divides the memory cell block 510 into a larger number of sub-memory cell blocks 511 to 514. Thus, when an abnormality occurs in one of the sub-memory cell blocks 511 to 514, a smaller portion of the memory cell block 510 can be replaced to complete the repair operation, thereby effectively improving the performance of the memory device 500.
附帶一提的,在本實施例中,對應子記憶胞區塊511~514,記憶體裝置500中可設置與各個子記憶胞區塊511~514相同電路架構以及記憶胞數量的一個或多個備援記憶胞區塊。在當子記憶胞區塊511~514的其中之一發生異常現象時,可應用備援記憶胞區塊來執行取代動作。Incidentally, in this embodiment, corresponding to the sub-memory cell blocks 511-514, one or more spare memory cell blocks with the same circuit structure and number of memory cells as the sub-memory cell blocks 511-514 can be set in the memory device 500. When an abnormality occurs in one of the sub-memory cell blocks 511-514, the spare memory cell block can be used to perform a replacement action.
關於利用備援記憶胞區塊來取代子記憶胞區塊511~514的其中之一的動作細節,在前述的實施例中已有詳細的說明,此處恕不多贅述。The details of the operation of using the spare memory cell block to replace one of the sub-memory cell blocks 511-514 have been described in detail in the aforementioned embodiments and will not be elaborated here.
以下請參照圖6,圖6繪示本發明一實施例的記憶體裝置的記憶胞的架構示意圖。在本發明實施例的記憶體裝置中,記憶胞區塊中的多個記憶胞MCs可以堆疊的方式來建構,並形成一三維架構的記憶胞串。每一記憶胞可具有氧化矽-氮化矽-氧化矽層ONO以作為絕緣層。並具有通道結構CH以及閘極結構GS。區域位元線BL以及區域源極線SL,分別透過導電插銷PG1、PG2以連接至記憶胞串中的全部記憶胞MCs。Please refer to FIG. 6 below, which shows a schematic diagram of the architecture of a memory cell of a memory device of an embodiment of the present invention. In the memory device of the embodiment of the present invention, multiple memory cells MCs in a memory cell block can be constructed in a stacked manner to form a memory cell string with a three-dimensional structure. Each memory cell can have a silicon oxide-silicon nitride-silicon oxide layer ONO as an insulating layer. And it has a channel structure CH and a gate structure GS. The regional bit line BL and the regional source line SL are connected to all the memory cells MCs in the memory cell string through conductive pins PG1 and PG2, respectively.
在本實施例中,記憶胞MCs可以為反或式(NOR)快閃記憶胞,或者是及式(AND)快閃記憶胞。In this embodiment, the memory cells MCs may be NOR flash memory cells or AND flash memory cells.
值得一提的,在本發明其他實施例中,記憶胞MCs也可以應用二維的方式進行排列,沒有特定的限制。It is worth mentioning that in other embodiments of the present invention, memory cells MCs can also be arranged in a two-dimensional manner without any specific limitation.
綜上所述,本發明透過區分一個記憶胞區塊為多個子記憶胞區塊,並透過分別在子記憶胞區塊以及共同位元線間設置多個開關。當子記憶胞區塊發生異常現象時,可透過切斷對應的開關,並利用備援記憶胞區塊來取代發生異常現象的子記憶胞區塊。如此一來,當記憶胞區塊發生異常現象時,可不需要針對記憶胞區塊進行完整的取代動作,而可透過取代部份的子記憶胞區塊即可完成記憶胞區塊的修復動作,有效提升記憶體裝置的硬體空間的使用效能。In summary, the present invention divides a memory cell block into multiple sub-memory cell blocks, and sets multiple switches between the sub-memory cell blocks and the common bit lines. When an abnormality occurs in a sub-memory cell block, the corresponding switch can be cut off, and the sub-memory cell block with the abnormality can be replaced by the backup memory cell block. In this way, when an abnormality occurs in a memory cell block, it is not necessary to completely replace the memory cell block, but the memory cell block can be repaired by replacing part of the sub-memory cell blocks, effectively improving the use efficiency of the hardware space of the memory device.
20、100、200、300、400、500:記憶體裝置 110、310、510、GP1、GP2:記憶胞區塊 111、211、311:第一子記憶胞區塊 112、212、312:第二子記憶胞區塊 220、230:備援記憶胞區塊 511~514:子記憶胞區塊 BL1~BL8、BL:區域位元線 BLT1~BLT8、BLTB1~BLTB8、BLT:位元線開關 CH:通道結構 CSL、GSLi、GSLj:共同源極線 CT1、CT2、CT3:控制信號 GBL、GBLi、GBLj:共同位元線 GS:閘極結構 MC、MCs:記憶胞 ONO:氧化矽-氮化矽-氧化矽層 PG1、PG2:導電插銷 SA1、SA2:感測放大器 SGBL1、SGBL2、SGBL3、SGBL4:子共同位元線 SL1~SL8、SL:區域源極線 SLT1~SLT8、SLTB1~SLTB8:源極線開關 SW1、SW2、SW3、SW4、SW51~SW54:開關 WL1~WLN:字元線20, 100, 200, 300, 400, 500: memory device 110, 310, 510, GP1, GP2: memory cell block 111, 211, 311: first sub-memory cell block 112, 212, 312: second sub-memory cell block 220, 230: backup memory cell block 511~514: sub-memory cell block BL1~BL8, BL: regional bit line BLT1~BLT8, BLTB1~BLTB8, BLT: bit line switch CH: channel structure CSL, GSLi, GSLj: common source line CT1, CT2, CT3: control signal GBL, GBLi, GBLj: common bit line GS: Gate structure MC, MCs: Memory cells ONO: Silicon oxide-silicon nitride-silicon oxide layer PG1, PG2: Conductive pins SA1, SA2: Sense amplifiers SGBL1, SGBL2, SGBL3, SGBL4: Sub-common bit lines SL1~SL8, SL: Regional source lines SLT1~SLT8, SLTB1~SLTB8: Source line switches SW1, SW2, SW3, SW4, SW51~SW54: Switches WL1~WLN: Word lines
圖1繪示本發明一實施例的記憶體裝置的示意圖。 圖2繪示本發明一實施例的記憶體裝置的電路圖。 圖3繪示本發明另一實施例的記憶體裝置的示意圖。 圖4繪示本發明實施例的記憶體裝置的部分架構示意圖。 圖5繪示本發明另一實施例的記憶體裝置的示意圖。 圖6繪示本發明一實施例的記憶體裝置的記憶胞的架構示意圖。 FIG1 is a schematic diagram of a memory device of an embodiment of the present invention. FIG2 is a circuit diagram of a memory device of an embodiment of the present invention. FIG3 is a schematic diagram of a memory device of another embodiment of the present invention. FIG4 is a schematic diagram of a partial structure of a memory device of an embodiment of the present invention. FIG5 is a schematic diagram of a memory device of another embodiment of the present invention. FIG6 is a schematic diagram of the structure of a memory cell of a memory device of an embodiment of the present invention.
100:記憶體裝置 100: Memory device
110:記憶胞區塊 110: Memory cell block
111:第一子記憶胞區塊 111: First sub-memory cell block
112:第二子記憶胞區塊 112: Second sub-memory cell block
BL1~BL8:區域位元線 BL1~BL8: Regional bit lines
BLT1~BLT8:位元線開關 BLT1~BLT8: bit line switch
CSL:共同源極線 CSL: Common Source Line
CT1、CT2:控制信號 CT1, CT2: control signal
GBL:共同位元線 GBL: Common Bit Line
MC:記憶胞 MC: Memory Cell
SGBL1、SGBL2:子共同位元線 SGBL1, SGBL2: sub-common bit lines
SL1~SL8:區域源極線 SL1~SL8: Regional source line
SLT1~SLT8:源極線開關 SLT1~SLT8: Source line switch
SW1、SW2:開關 SW1, SW2: switch
WL1~WLN:字元線 WL1~WLN: character line
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TWI786831B (en) * | 2021-09-16 | 2022-12-11 | 旺宏電子股份有限公司 | Three dimension memory device |
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US20160172037A1 (en) * | 2014-12-15 | 2016-06-16 | Peter Wung Lee | Novel lv nand-cam search scheme using existing circuits with least overhead |
TWI721824B (en) * | 2019-05-13 | 2021-03-11 | 力旺電子股份有限公司 | Non-volatile memory and memory sector thereof |
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