JP2006512776A5 - - Google Patents
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- JP2006512776A5 JP2006512776A5 JP2004565772A JP2004565772A JP2006512776A5 JP 2006512776 A5 JP2006512776 A5 JP 2006512776A5 JP 2004565772 A JP2004565772 A JP 2004565772A JP 2004565772 A JP2004565772 A JP 2004565772A JP 2006512776 A5 JP2006512776 A5 JP 2006512776A5
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- integrated circuit
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- nand
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- 230000008878 coupling Effects 0.000 claims 5
- 238000010168 coupling process Methods 0.000 claims 5
- 238000005859 coupling reaction Methods 0.000 claims 5
- 239000000758 substrate Substances 0.000 claims 4
Claims (25)
それぞれのNAND列の各々は、その一方端において、関連するグローバルアレイ線にそれぞれのNAND列を結合するための第1のスイッチデバイスを含み、その他方端において、関連するバイアスノードにそれぞれのNAND列を結合するための第2のスイッチデバイスをさらに含み、
第1のNAND列に対する第1のスイッチデバイスおよび第2のNAND列に対する第2のスイッチデバイスは、第1の制御信号に応答し、第1のNAND列に対する第2のスイッチデバイスおよび第2のNAND列に対する第1のスイッチデバイスは、第2の制御信号に応答し、
第1および第2のNAND列は、共通してワード線を共有する、集積回路。 Comprising a memory array in which at least one surface of a memory cell is arranged in a plurality of NAND columns connected in series;
Each NAND string includes, at one end thereof, a first switch device for coupling the respective NAND string to an associated global array line, and at the other end, each NAND string at an associated bias node. A second switch device for coupling
The first switch device for the first NAND string and the second switch device for the second NAND string are responsive to the first control signal and the second switch device and the second NAND for the first NAND string A first switch device for the column is responsive to the second control signal;
An integrated circuit in which the first and second NAND strings share a word line in common.
第1のバイアスノードと、
第2のバイアスノードと、
第1の方向で第1のブロックを横切る複数のグローバルビット線と、
第1の方向とは異なる第2の方向で第1のブロックを横切る複数のワード線と、
複数のワード線の一方側とほぼ平行でありかつ前記一方側に配置された、第1のブロックを横切る第1のブロック選択線と、
複数のワード線の他方側とほぼ平行でありかつ前記他方側に配置された、第1のブロックを横切る第2のブロック選択線と、
各々が、第1のブロック選択線に応答する第1のブロック選択デバイス、複数のワード
線のそれぞれの1つに各々が応答する複数のメモリセルデバイス、および第2のブロック選択線に応答する第2のブロック選択デバイスを含む、複数の直列接続されたNAND列とを含み、
第1の群のNAND列の各々の第1のブロック選択デバイスは、複数のグローバルビット線のそれぞれ1つにそれぞれ結合され、第2の群のNAND列の各々の第1のブロック選択デバイスは、第1のバイアスノードにそれぞれ結合され、
第1の群のNAND列の各々の第2のブロック選択デバイスは、第2のバイアスノードにそれぞれ結合され、第2の群のNAND列の各々の第2のブロック選択デバイスは、複数のグローバルビット線のそれぞれ1つにそれぞれ結合される、請求項15に記載の集積回路。 The memory array is arranged in a plurality of blocks, and a first memory block of the plurality of memory blocks is:
A first bias node;
A second bias node;
A plurality of global bit lines across the first block in a first direction;
A plurality of word lines crossing the first block in a second direction different from the first direction;
A first block selection line that is substantially parallel to one side of the plurality of word lines and disposed on the one side and that crosses the first block;
A second block selection line across the first block and disposed substantially parallel to the other side of the plurality of word lines and on the other side;
A first block select device responsive to a first block select line, a plurality of memory cell devices each responsive to a respective one of the plurality of word lines, and a second responsive to a second block select line A plurality of series connected NAND strings including two block selection devices;
Each first block selection device of each of the first group of NAND columns is coupled to a respective one of the plurality of global bit lines, and each first block selection device of each of the second group of NAND columns is Each coupled to a first bias node;
Each second block selection device of each of the first group of NAND strings is coupled to a second bias node, respectively, and each second block selection device of each of the second group of NAND strings includes a plurality of global bits. The integrated circuit of claim 15, each coupled to a respective one of the lines.
第1のメモリブロックとは異なるメモリアレイのレベル上に配置された第3のメモリブロックを備え、前記第1および第3のメモリブロックは、複数のグローバルビット線、第1のバイアスノード、および第2のバイアスノードを共有し、前記第3のメモリブロックはそれぞれ、
第2の方向でブロックを横切る第3の複数のワード線と、
第3の複数のワード線の一方側とほぼ平行でありかつ前記一方側に配置された、ブロックを横切る第5のブロック選択線と、
第3の複数のワード線の他方側とほぼ平行でありかつ前記他方側に配置された、ブロックを横切る第6のブロック選択線と、
各々が、第5のブロック選択線に応答する第1のブロック選択デバイス、各々が第3の複数のワード線のそれぞれ1つに応答する複数のメモリセルデバイス、および第6のブロック選択線に応答する第2のブロック選択デバイスをそれぞれ含む、第3の複数の直列接続されたNAND列とを含み、
第1の群の第3の複数のNAND列の各々の第1のブロック選択デバイスのそれぞれは、複数のグローバルビット線のそれぞれ1つにそれぞれ結合され、第2の群の第3の複数のNAND列の各々の第1のブロック選択デバイスのそれぞれは、第1のバイアスノードにそれぞれ結合され、
第1の群の第3の複数のNAND列の各々の第2のブロック選択デバイスのそれぞれは、第2のバイアスノードにそれぞれ結合され、第2の群の第3の複数のNAND列の各々の第2のブロック選択デバイスのそれぞれは、複数のグローバルビット線のそれぞれ1つにそれぞれ結合される、請求項19に記載の集積回路。 The memory array includes a three-dimensional memory array having two or more memory levels formed above the substrate, the integrated circuit further comprising:
A third memory block disposed on a level of a memory array different from the first memory block, wherein the first and third memory blocks include a plurality of global bit lines, a first bias node, and a first memory block; Each of the third memory blocks share two bias nodes.
A third plurality of word lines across the block in a second direction;
A fifth block select line across the block, substantially parallel to one side of the third plurality of word lines and disposed on the one side;
A sixth block selection line across the block, substantially parallel to the other side of the third plurality of word lines and disposed on the other side;
Responsive to a first block select device, each responsive to a fifth block select line, a plurality of memory cell devices each responsive to a respective one of a third plurality of word lines, and a sixth block select line A third plurality of series connected NAND strings each including a second block selection device that
Each of the first block selection devices of each of the first group of third plurality of NAND strings is coupled to a respective one of the plurality of global bit lines, respectively, and second group of third plurality of NANDs Each of the first block selection devices in each of the columns is respectively coupled to a first bias node;
Each of the second block selection devices in each of the first group of third plurality of NAND strings is coupled to a second bias node, respectively, and each of the second group of third plurality of NAND strings. The integrated circuit of claim 19, wherein each of the second block selection devices is coupled to a respective one of the plurality of global bit lines.
モリセルトランジスタと構造上同じである、請求項24に記載の集積回路。 25. The integrated circuit of claim 24, wherein the first and second block selection devices of a given NAND string are structurally the same as the memory cell transistors of the given NAND string.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/335,078 US7505321B2 (en) | 2002-12-31 | 2002-12-31 | Programmable memory array structure incorporating series-connected transistor strings and methods for fabrication and operation of same |
US10/335,089 US7005350B2 (en) | 2002-12-31 | 2002-12-31 | Method for fabricating programmable memory array structures incorporating series-connected transistor strings |
PCT/US2003/041446 WO2004061863A2 (en) | 2002-12-31 | 2003-12-29 | Programmable memory array structure incorporating series-connected transistor strings and methods for fabrication and operation of same |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006512776A JP2006512776A (en) | 2006-04-13 |
JP2006512776A5 true JP2006512776A5 (en) | 2007-02-22 |
Family
ID=32716876
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004565772A Withdrawn JP2006512776A (en) | 2002-12-31 | 2003-12-29 | Programmable memory array structure incorporating transistor strings connected in series and method for manufacturing and operating this structure |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2006512776A (en) |
AU (1) | AU2003300007A1 (en) |
WO (1) | WO2004061863A2 (en) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100657910B1 (en) * | 2004-11-10 | 2006-12-14 | 삼성전자주식회사 | Multi-bit flash memory device, method of working the same, and method of fabricating the same |
DE102005017072A1 (en) * | 2004-12-29 | 2006-07-13 | Hynix Semiconductor Inc., Ichon | Charge trap insulator memory device, has float channel, where data are read based on different channel resistance induced to channel depending on polarity states of charges stored in insulator |
US7709334B2 (en) | 2005-12-09 | 2010-05-04 | Macronix International Co., Ltd. | Stacked non-volatile memory device and methods for fabricating the same |
US7473589B2 (en) * | 2005-12-09 | 2009-01-06 | Macronix International Co., Ltd. | Stacked thin film transistor, non-volatile memory devices and methods for fabricating the same |
US7764549B2 (en) | 2005-06-20 | 2010-07-27 | Sandisk 3D Llc | Floating body memory cell system and method of manufacture |
US7317641B2 (en) | 2005-06-20 | 2008-01-08 | Sandisk Corporation | Volatile memory cell two-pass writing method |
US7489546B2 (en) | 2005-12-20 | 2009-02-10 | Micron Technology, Inc. | NAND architecture memory devices and operation |
EP1997148A1 (en) * | 2006-03-20 | 2008-12-03 | STMicroelectronics S.r.l. | Semiconductor field-effect transistor, memory cell and memory device |
KR100806339B1 (en) * | 2006-10-11 | 2008-02-27 | 삼성전자주식회사 | Nand flash memory devices having 3-dimensionally arranged memory cells and methods of fabricating the same |
US7675783B2 (en) * | 2007-02-27 | 2010-03-09 | Samsung Electronics Co., Ltd. | Nonvolatile memory device and driving method thereof |
JP5175526B2 (en) * | 2007-11-22 | 2013-04-03 | 株式会社東芝 | Nonvolatile semiconductor memory device and manufacturing method thereof |
JP5288933B2 (en) * | 2008-08-08 | 2013-09-11 | 株式会社東芝 | Semiconductor memory device and manufacturing method thereof |
JP5322533B2 (en) * | 2008-08-13 | 2013-10-23 | 株式会社東芝 | Nonvolatile semiconductor memory device and manufacturing method thereof |
JP4945609B2 (en) | 2009-09-02 | 2012-06-06 | 株式会社東芝 | Semiconductor integrated circuit device |
KR101547328B1 (en) * | 2009-09-25 | 2015-08-25 | 삼성전자주식회사 | Ferroelectric memory devices and operating method of the same |
JP5395738B2 (en) | 2010-05-17 | 2014-01-22 | 株式会社東芝 | Semiconductor device |
US8755227B2 (en) | 2012-01-30 | 2014-06-17 | Phison Electronics Corp. | NAND flash memory unit, NAND flash memory array, and methods for operating them |
JP2013161878A (en) * | 2012-02-02 | 2013-08-19 | Renesas Electronics Corp | Semiconductor device and semiconductor device manufacturing method |
JP2021141283A (en) | 2020-03-09 | 2021-09-16 | キオクシア株式会社 | Semiconductor storage device |
CN112470225B (en) * | 2020-10-23 | 2022-12-09 | 长江先进存储产业创新中心有限责任公司 | Programming and read biasing and access schemes to improve data throughput of 2-stack 3D PCM memories |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19523775C2 (en) * | 1994-06-29 | 2001-12-06 | Toshiba Kawasaki Kk | Non-volatile semiconductor memory device |
US6163048A (en) * | 1995-10-25 | 2000-12-19 | Cypress Semiconductor Corporation | Semiconductor non-volatile memory device having a NAND cell structure |
KR100206709B1 (en) * | 1996-09-21 | 1999-07-01 | 윤종용 | Cell array structure of multi-bit non-volatile semiconductor memory and fabrication method thereof |
US6888750B2 (en) * | 2000-04-28 | 2005-05-03 | Matrix Semiconductor, Inc. | Nonvolatile memory on SOI and compound semiconductor substrates and method of fabrication |
-
2003
- 2003-12-29 JP JP2004565772A patent/JP2006512776A/en not_active Withdrawn
- 2003-12-29 WO PCT/US2003/041446 patent/WO2004061863A2/en active Application Filing
- 2003-12-29 AU AU2003300007A patent/AU2003300007A1/en not_active Abandoned
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