TWI399342B - Process for the preparation of waste liquid containing tetraalkylammonium ion - Google Patents
Process for the preparation of waste liquid containing tetraalkylammonium ion Download PDFInfo
- Publication number
- TWI399342B TWI399342B TW97115100A TW97115100A TWI399342B TW I399342 B TWI399342 B TW I399342B TW 97115100 A TW97115100 A TW 97115100A TW 97115100 A TW97115100 A TW 97115100A TW I399342 B TWI399342 B TW I399342B
- Authority
- TW
- Taiwan
- Prior art keywords
- resin
- waste liquid
- cation exchange
- ion
- taa
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/42—Treatment of water, waste water, or sewage by ion-exchange
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J39/00—Cation exchange; Use of material as cation exchangers; Treatment of material for improving the cation exchange properties
- B01J39/04—Processes using organic exchangers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J45/00—Ion-exchange in which a complex or a chelate is formed; Use of material as complex or chelate forming ion-exchangers; Treatment of material for improving the complex or chelate forming ion-exchange properties
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2101/00—Nature of the contaminant
- C02F2101/30—Organic compounds
- C02F2101/38—Organic compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
- C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
- C02F2103/40—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from the manufacture or use of photosensitive materials
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Treatment Of Water By Ion Exchange (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007114985 | 2007-04-25 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200906732A TW200906732A (en) | 2009-02-16 |
TWI399342B true TWI399342B (zh) | 2013-06-21 |
Family
ID=39925768
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW97115100A TWI399342B (zh) | 2007-04-25 | 2008-04-24 | Process for the preparation of waste liquid containing tetraalkylammonium ion |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5167253B2 (ko) |
KR (1) | KR101258730B1 (ko) |
CN (1) | CN101652325A (ko) |
TW (1) | TWI399342B (ko) |
WO (1) | WO2008133322A1 (ko) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3528045B2 (ja) * | 2000-07-31 | 2004-05-17 | 株式会社村田製作所 | 積層セラミック電子部品の製造装置 |
JP5062093B2 (ja) * | 2008-08-06 | 2012-10-31 | 栗田工業株式会社 | アミノ基を有する水溶性有機溶媒の回収方法 |
JP5256002B2 (ja) * | 2008-11-25 | 2013-08-07 | オルガノ株式会社 | フォトレジスト現像排水の排水処理システム |
JP2011183298A (ja) * | 2010-03-08 | 2011-09-22 | Sharp Corp | シランカップリング剤を含む溶液の再資源化方法およびそれを用いたシランカップリング剤の製造方法 |
JP7137318B2 (ja) * | 2018-02-22 | 2022-09-14 | オルガノ株式会社 | 被処理液の精製方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI231292B (en) * | 1998-10-30 | 2005-04-21 | Organo Corp | Process and equipment for recovering developer from photoresist development waste and reusing it |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5775152A (en) * | 1980-10-30 | 1982-05-11 | Hitachi Ltd | Regenerating method for granular ion exchange resin and regenerating system thereof |
JPH1099853A (ja) | 1996-09-27 | 1998-04-21 | Kurita Water Ind Ltd | 水酸化テトラアルキルアンモニウム含有水の処理装置 |
JP3671644B2 (ja) | 1998-01-05 | 2005-07-13 | オルガノ株式会社 | フォトレジスト現像廃液の再生処理方法及び装置 |
JP3968678B2 (ja) | 1998-10-26 | 2007-08-29 | オルガノ株式会社 | テトラアルキルアンモニウムイオン含有液の処理方法 |
JP4437383B2 (ja) * | 2001-08-27 | 2010-03-24 | 株式会社日本触媒 | 不飽和有機酸塩の精製方法並びにそれに用いられた弱塩基性陰イオン交換樹脂及び吸着樹脂の再生方法 |
JP3949450B2 (ja) * | 2001-12-27 | 2007-07-25 | 株式会社トクヤマ | 陽イオン交換樹脂又はキレート樹脂の再生方法 |
WO2005102993A1 (ja) * | 2004-04-22 | 2005-11-03 | Adeka Corporation | 酸水溶液の精製方法 |
-
2008
- 2008-04-24 TW TW97115100A patent/TWI399342B/zh not_active IP Right Cessation
- 2008-04-25 WO PCT/JP2008/058026 patent/WO2008133322A1/ja active Application Filing
- 2008-04-25 KR KR1020097018576A patent/KR101258730B1/ko not_active IP Right Cessation
- 2008-04-25 CN CN200880009178A patent/CN101652325A/zh active Pending
- 2008-04-25 JP JP2009511914A patent/JP5167253B2/ja active Active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI231292B (en) * | 1998-10-30 | 2005-04-21 | Organo Corp | Process and equipment for recovering developer from photoresist development waste and reusing it |
Also Published As
Publication number | Publication date |
---|---|
JP5167253B2 (ja) | 2013-03-21 |
WO2008133322A1 (ja) | 2008-11-06 |
TW200906732A (en) | 2009-02-16 |
KR20100014915A (ko) | 2010-02-11 |
KR101258730B1 (ko) | 2013-05-02 |
CN101652325A (zh) | 2010-02-17 |
JPWO2008133322A1 (ja) | 2010-07-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |