SG11201909576XA - Large single crystal diamond and a method of producing the same - Google Patents
Large single crystal diamond and a method of producing the sameInfo
- Publication number
- SG11201909576XA SG11201909576XA SG11201909576XA SG11201909576XA SG 11201909576X A SG11201909576X A SG 11201909576XA SG 11201909576X A SG11201909576X A SG 11201909576XA SG 11201909576X A SG11201909576X A SG 11201909576XA
- Authority
- SG
- Singapore
- Prior art keywords
- single crystal
- international
- crystal diamond
- diamond
- producing
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/04—Diamond
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
- C30B25/20—Epitaxial-layer growth characterised by the substrate the substrate being of the same materials as the epitaxial layer
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/18—Epitaxial-layer growth characterised by the substrate
- C30B25/20—Epitaxial-layer growth characterised by the substrate the substrate being of the same materials as the epitaxial layer
- C30B25/205—Epitaxial-layer growth characterised by the substrate the substrate being of the same materials as the epitaxial layer the substrate being of insulating material
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B33/00—After-treatment of single crystals or homogeneous polycrystalline material with defined structure
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Chemical Vapour Deposition (AREA)
- Carbon And Carbon Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG10201703436V | 2017-04-26 | ||
PCT/SG2018/000003 WO2018199845A1 (en) | 2017-04-26 | 2018-04-27 | Large single crystal diamond and a method of producing the same |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201909576XA true SG11201909576XA (en) | 2019-11-28 |
Family
ID=63917741
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201909576X SG11201909576XA (en) | 2017-04-26 | 2018-04-27 | Large single crystal diamond and a method of producing the same |
Country Status (8)
Country | Link |
---|---|
US (1) | US20200199778A1 (zh) |
EP (1) | EP3615482A4 (zh) |
JP (1) | JP7256753B2 (zh) |
KR (1) | KR102372059B1 (zh) |
CN (1) | CN110914204B (zh) |
SG (1) | SG11201909576XA (zh) |
TW (1) | TWI706061B (zh) |
WO (1) | WO2018199845A1 (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021030557A1 (en) * | 2019-08-13 | 2021-02-18 | Pt Creations | Synthetic diamond jewelry and fabrication method thereof |
CN112030228B (zh) * | 2020-09-11 | 2021-05-18 | 哈尔滨工业大学 | 用于多颗mpcvd单晶金刚石共同生长的桥接控温方法 |
JP2022184075A (ja) * | 2021-05-31 | 2022-12-13 | 国立研究開発法人産業技術総合研究所 | モザイクダイヤモンドウェハと異種半導体との接合体及びその製造方法、並びに、異種半導体との接合体用モザイクダイヤモンドウェハ |
CN114032613B (zh) * | 2021-10-14 | 2023-10-31 | 吉林大学 | 一种提高拼接法生长金刚石单晶拼接缝质量的方法 |
TWI840846B (zh) * | 2022-06-21 | 2024-05-01 | 宋健民 | 一種單晶鑽石晶圓及單晶鑽石的製造方法 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB8810113D0 (en) * | 1988-04-28 | 1988-06-02 | Jones B L | Bonded composite |
US5127983A (en) * | 1989-05-22 | 1992-07-07 | Sumitomo Electric Industries, Ltd. | Method of producing single crystal of high-pressure phase material |
JPH04139091A (ja) * | 1990-09-28 | 1992-05-13 | Toshiba Corp | ダイヤモンドの製造方法 |
US5474021A (en) * | 1992-09-24 | 1995-12-12 | Sumitomo Electric Industries, Ltd. | Epitaxial growth of diamond from vapor phase |
JP3350992B2 (ja) * | 1993-02-05 | 2002-11-25 | 住友電気工業株式会社 | ダイヤモンドの合成方法 |
US6158952A (en) * | 1994-08-31 | 2000-12-12 | Roberts; Ellis Earl | Oriented synthetic crystal assemblies |
US6582513B1 (en) * | 1998-05-15 | 2003-06-24 | Apollo Diamond, Inc. | System and method for producing synthetic diamond |
JP3540256B2 (ja) | 2000-07-25 | 2004-07-07 | マイクロ・ダイヤモンド株式会社 | 単結晶ダイヤモンドをその先端に有したドリル |
GB0221949D0 (en) | 2002-09-20 | 2002-10-30 | Diamanx Products Ltd | Single crystal diamond |
JP4385764B2 (ja) * | 2003-12-26 | 2009-12-16 | 住友電気工業株式会社 | ダイヤモンド単結晶基板の製造方法 |
JP4365251B2 (ja) | 2004-03-31 | 2009-11-18 | 旭ダイヤモンド工業株式会社 | ダイヤモンドスクライバー及びダイヤモンドスクライバーの製造方法 |
JP4461218B2 (ja) | 2005-05-31 | 2010-05-12 | 並木精密宝石株式会社 | 炭素材料の処理方法 |
JP4908409B2 (ja) * | 2005-06-20 | 2012-04-04 | 日本電信電話株式会社 | ダイヤモンド半導体素子およびその製造方法 |
US9133566B2 (en) * | 2005-12-09 | 2015-09-15 | Element Six Technologies Limited | High crystalline quality synthetic diamond |
SG157973A1 (en) * | 2008-06-18 | 2010-01-29 | Indian Inst Technology Bombay | Method for growing monocrystalline diamonds |
JP4849691B2 (ja) * | 2008-12-25 | 2012-01-11 | 独立行政法人産業技術総合研究所 | 大面積ダイヤモンド結晶基板及びその製造方法 |
US20120302045A1 (en) | 2009-12-16 | 2012-11-29 | Hideaki Yamada | Method for producing mosaic diamond |
JP2012031000A (ja) * | 2010-07-29 | 2012-02-16 | Kobe Steel Ltd | 配列化ダイヤモンド膜およびその製造方法 |
JP5601634B2 (ja) * | 2010-11-24 | 2014-10-08 | 住友電気工業株式会社 | 大面積cvdダイヤモンド単結晶の製造方法、及びこれによって得られた大面積cvdダイヤモンド単結晶 |
EP2656374B1 (en) * | 2010-12-23 | 2018-02-21 | Element Six Technologies Limited | Controlling doping of synthetic diamond material |
JP5418621B2 (ja) * | 2012-02-16 | 2014-02-19 | 住友電気工業株式会社 | ダイヤモンド単結晶基板 |
JP6037387B2 (ja) * | 2013-03-01 | 2016-12-07 | 国立研究開発法人産業技術総合研究所 | ダイヤモンドnv光学中心を有するダイヤモンド単結晶 |
RU2577355C1 (ru) * | 2014-09-01 | 2016-03-20 | Федеральное государственное бюджетное учреждение науки Институт радиотехники и электроники им. В.А. Котельникова Российской академии наук | Способ получения монокристаллических алмазных эпитаксиальных пленок большой площади |
CN104911702B (zh) * | 2015-04-29 | 2017-07-28 | 西安交通大学 | 基于自组装工艺的高质量单晶金刚石生长方法 |
GB201511806D0 (en) * | 2015-07-06 | 2015-08-19 | Element Six Uk Ltd | Single crystal synthetic diamond |
EP3326729B1 (en) | 2015-07-22 | 2020-02-26 | Sumitomo Electric Hardmetal Corp. | Diamond drawing die |
-
2018
- 2018-04-26 TW TW107114306A patent/TWI706061B/zh not_active IP Right Cessation
- 2018-04-27 WO PCT/SG2018/000003 patent/WO2018199845A1/en active Search and Examination
- 2018-04-27 CN CN201880028059.8A patent/CN110914204B/zh active Active
- 2018-04-27 US US16/608,168 patent/US20200199778A1/en not_active Abandoned
- 2018-04-27 EP EP18789848.1A patent/EP3615482A4/en not_active Withdrawn
- 2018-04-27 SG SG11201909576X patent/SG11201909576XA/en unknown
- 2018-04-27 KR KR1020197032359A patent/KR102372059B1/ko active IP Right Grant
- 2018-04-27 JP JP2019558709A patent/JP7256753B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP2020518537A (ja) | 2020-06-25 |
CN110914204A (zh) | 2020-03-24 |
US20200199778A1 (en) | 2020-06-25 |
TWI706061B (zh) | 2020-10-01 |
KR102372059B1 (ko) | 2022-03-07 |
KR20190134726A (ko) | 2019-12-04 |
CN110914204B (zh) | 2022-06-03 |
WO2018199845A1 (en) | 2018-11-01 |
EP3615482A4 (en) | 2020-11-25 |
JP7256753B2 (ja) | 2023-04-12 |
TW201842243A (zh) | 2018-12-01 |
EP3615482A1 (en) | 2020-03-04 |
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