KR20200010194A - Transparent conductive film and image display device - Google Patents

Abstract

A transparent conductive film is equipped with a 1st transparent conductive layer, a 1st optical adjustment layer, a transparent base material, a 2nd optical adjustment layer, and a 2nd transparent conductive layer in order. The surface resistance value of a 2nd transparent conductive layer is larger than the surface resistance value of a 1st transparent conductive layer, The surface resistance value of a 1st transparent conductive layer is 10 ohms / square or more, 70 ohms / square or less, and is 2nd transparent The surface resistance of a conductive layer is 50 ohms / square or more and 150 ohms / square or less, and the refractive index of a 2nd optical adjustment layer is lower than the refractive index of a 1st optical adjustment layer.

Description

Transparent conductive film and image display device

The present invention relates to a transparent conductive film and an image display device having the same.

It is known that the image display apparatus provided with a touch panel and an image display element conventionally comprises the film for touch panels in which the transparent conductive layer which consists of indium tin composite oxide (ITO) was formed in the transparent base material. As a film for such touch panels, the double-sided transparent conductive film by which the ITO layer is arrange | positioned on both surfaces of a transparent base material is described in patent document 1, for example.

By the way, since image display elements, such as a liquid crystal cell, generate | occur | produce electromagnetic waves, the electromagnetic shielding effect which shields electromagnetic waves is desired for an image display apparatus. And it is known that the resistive touch panel WHEREIN: The ITO structure which arrange | positioned two ITO films | membrane has the electromagnetic shielding effect (for example, refer nonpatent literature 1).

In particular, in Non-Patent Document 1, in order to lower the resistance value of the ITO film, thickening of the ITO film is required, and as a result, it is described that the light transmittance is lowered. Furthermore, when the resistance value of only one ITO film (for example, about 10 ohms) is made low, even if the resistance value of the other ITO film is made high, it is described that there exists a favorable electromagnetic shielding effect.

And from these results, Non-Patent Document 1 shows that by lowering the resistance value of only one ITO film and increasing the resistance value of the other ITO film, it is possible to suppress a decrease in light transmittance while exhibiting a good electromagnetic shielding effect. It is starting.

Japanese Unexamined Patent Publication No. 2013-99924

 Noda Harada, `` Electromagnetic Shielding Effect of Resistive Touch Panel Sensors '', Transfer E, No. 128, No. 7, 2008, p.312-313

By the way, in the touch panel film (double-sided transparent electroconductive film) used for the electrostatic capacitive system with good durability and few malfunctions, the two ITO layers arrange | positioned at both surfaces are etched in electrode pattern shape. And in order to suppress the visibility of an electrode pattern, an optical adjusting layer is formed between an ITO layer and a transparent base material.

In this case, since a double-sided transparent conductive film is further equipped with an optical adjusting layer, light transmittance falls.

This invention provides the electromagnetic wave shielding effect, and provides the transparent conductive film and image display apparatus which have favorable light transmittance, suppressing the visibility of an electrode pattern.

This invention [1] is equipped with a 1st transparent conductive layer, a 1st optical adjustment layer, a transparent base material, a 2nd optical adjustment layer, and a 2nd transparent conductive layer in order, The surface resistance value of the said 2nd transparent conductive layer is It is larger than the surface resistance value of a said 1st transparent conductive layer, The surface resistance value of a said 1st transparent conductive layer is 10 ohms / square or more and 70 ohms / square or less, The surface resistance value of a said 2nd transparent conductive layer is It is 50 ohms / square or more and 150 ohms / square or less, and the refractive index of the said 2nd optical adjustment layer contains the transparent conductive film smaller than the refractive index of the said 1st optical adjustment layer.

This invention [2] contains the transparent conductive film as described in [1] whose thickness of the said 2nd transparent conductive layer is thinner than the thickness of the said 1st transparent conductive layer.

In the present invention [3], the refractive index of the first optical adjustment layer is 1.65 or more and 1.75 or less, and the refractive index of the second optical adjustment layer is 1.60 or more and 1.70 or less, the transparent conductive film according to [1] or [2]. It includes.

This invention [4] contains the transparent electroconductive film in any one of [1]-[3] characterized in that the thickness of the said 1st optical adjustment layer and the said 2nd optical adjustment layer is 100 nm or less, respectively. Doing.

In the present invention [5], both the first transparent conductive layer and the second transparent conductive layer are patterned, and the first transparent conductive layer has a first pattern elongated in one direction, and the second transparent conductive. The layer has a second pattern elongated in the orthogonal direction orthogonal to the one direction, and the length in one direction of the first pattern is longer than the length in the orthogonal direction of the second pattern, in any one of [1] to [4]. The transparent conductive film of Claim 1 is included.

This invention [6] is an image display apparatus provided with the transparent conductive film in any one of [1]-[5], and the image display element arrange | positioned at the said 1st transparent conductive layer side of the said transparent conductive film. It is included.

According to the transparent conductive film of this invention, a 1st transparent conductive layer, a 1st optical adjustment layer, a transparent base material, a 2nd optical adjustment layer, and a 2nd transparent conductive layer are provided in order. Thus, when the first transparent conductive layer and the second transparent conductive layer are patterned, the visibility of the first transparent conductive layer and the second transparent conductive layer can be suppressed.

In addition, since the surface resistance value of a 1st transparent conductive layer is 10 ohms / square or more and 70 ohms / square or less, a transparent conductive film is equipped with the transparent conductive layer with a small surface resistance value. Therefore, a transparent conductive film can express the favorable electromagnetic shielding effect.

In addition, since the surface resistance value of a 2nd transparent conductive layer is larger than the surface resistance value of a 1st transparent conductive layer, and is 50 ohms / square or more and 150 ohms / square or less, it is a 1st transparent conductive It can be thinner than the layer. In addition, the refractive index of a 2nd optical adjustment layer is lower than the refractive index of a 1st optical adjustment layer. By these, the light transmittance of a transparent conductive film can be improved.

According to the image display device of the present invention, the electromagnetic wave shielding effect is provided, and the light transmitting property is provided while suppressing the visibility of the patterned first transparent conductive layer and the second transparent conductive layer.

BRIEF DESCRIPTION OF THE DRAWINGS The cross section of one Embodiment of the transparent conductive film of this invention is shown.
FIG. 2: shows sectional drawing of the film for touch panels which patterned the transparent conductive film shown in FIG.
3A to 3B are the touch panel films shown in FIG. 2, FIG. 3A is a plan view showing the electrode pattern of the first transparent conductive layer, and FIG. 3B is a bottom view showing the electrode pattern of the second transparent conductive layer. Indicates.
FIG. 4 shows an image display device including the transparent conductive film shown in FIG. 2.
5A-5B is a modification of the touch panel film of the present invention (the form in which the electrode pattern of the transparent conductive layer has a plurality of continuous rectangular patterns), and FIG. 5A is an electrode of the first transparent conductive layer. The top view which shows a pattern, FIG. 5B shows the bottom view which shows the electrode pattern of a 2nd transparent conductive layer.

<One Embodiment of a Transparent Conductive Film>

EMBODIMENT OF THE INVENTION One Embodiment of the transparent conductive film of this invention is described below, referring drawings. In FIG. 1, the up-and-down direction of the paper surface is in the up-down direction (thickness direction, the first direction), the upper surface of the paper is the upper side (one side in the thickness direction, one side in the first direction), and the lower side of the ground is the other side in the thickness direction (the other side, the first direction). Direction the other side). In addition, the left-right direction of a paper surface is a left-right direction (2nd direction, orthogonal direction orthogonal to a 1st direction), and the left side of the paper sheet is the left side (one side of a 2nd direction), and the right side of the paper sheet is the right side (the other side of a 2nd direction). In addition, the paper thickness direction is the depth direction (orthogonal direction orthogonal to the 3rd direction, the 1st direction, and the 2nd direction), the front side just before the paper surface (one side of 3rd direction), and the inside surface of the paper is the back side (third) Direction the other side). Specifically, it is based on the direction arrow of each figure.

1. Transparent conductive film

The transparent conductive film 1 has a film shape (including a sheet shape) having a predetermined thickness, extends in a predetermined direction (plane direction) orthogonal to the thickness direction, and has a flat upper surface and a flat lower surface. The transparent conductive film 1 is one component for manufacturing the base material for touch panels with which an image display apparatus is equipped, for example, and is not an image display apparatus. That is, the transparent conductive film 1 does not contain image display elements, such as a liquid crystal cell, it is a device which makes it distribute | circulate in parts independently and is industrially available.

As specifically, shown in FIG. 1, the transparent conductive film 1 is made of the 1st hard-coat layer 3 arrange | positioned at the upper surface (one side) of the transparent base material 2, and the transparent base material 2, and the agent. 1st optical adjustment layer 4 arrange | positioned at the upper surface of the 1 hard-coat layer 3, the 1st transparent conductive layer 5 arrange | positioned at the upper surface of the 1st optical adjustment layer 4, and the transparent base material 2 2nd hard-coat layer 6 arrange | positioned at the lower surface (the other side), the 2nd optical adjustment layer 7 arrange | positioned at the lower surface of the 2nd hard-coat layer 6, and the 2nd optical adjustment layer 7 It is provided with the 2nd transparent conductive layer 8 arrange | positioned at the lower surface. That is, the transparent conductive film 1 is the 2nd transparent conductive layer 8, the 2nd optical adjustment layer 7, the 2nd hard-coat layer 6, the transparent base material 2, and the 1st hard coat sequentially from the bottom. The layer 3, the 1st optical adjustment layer 4, and the 1st transparent conductive layer 5 are provided.

The transparent conductive film 1 is preferably a second transparent conductive layer 8, a second optical adjustment layer 7, a second hard coat layer 6, a transparent substrate 2, and a first hard coat layer ( 3) and the first optical adjustment layer 4 and the first transparent conductive layer 5. Hereinafter, each layer is explained in full detail.

(Transparent mention)

The transparent base material 2 is a base material which ensures the mechanical strength of the transparent conductive film 1. The transparent base material 2 uses the 1st transparent conductive layer 5 and the 2nd transparent conductive layer 8 to the 1st hard-coat layer 3, the 2nd hard-coat layer 6, and the 1st optical adjustment layer ( 4) and the 2nd optical adjustment layer 7 are supported.

The transparent substrate 2 is, for example, a polymer film having transparency. As a material of a polymer film, For example, polyester resins, such as polyethylene terephthalate (PET), a polybutylene terephthalate, polyethylene naphthalate, For example, (meth) acrylic resins, such as polymethacrylate (acrylic resin) And / or methacryl resins), for example, olefin resins such as polyethylene, polypropylene, cycloolefin polymers (COP), for example, polycarbonate resins, polyethersulfone resins, polyarylate resins, melamine resins, poly Amide resin, polyimide resin, cellulose resin, polystyrene resin, norbornene resin and the like. A polymer film can be used individually or in combination of 2 or more types.

From a viewpoint of transparency, heat resistance, mechanical strength, etc., Preferably, an olefin resin is mentioned, More preferably, COP is mentioned.

The thickness of the transparent base material 2 is 2 micrometers or more, Preferably it is 20 micrometers or more from a viewpoint of mechanical strength, abrasion resistance, the spot property of the film 1a for touch panels, etc., For example, 300 micrometers or less, Preferably it is 150 micrometers or less.

The thickness of the transparent base material 2 can be measured using a micro gauge type thickness meter, for example.

Moreover, the easily bonding layer, an adhesive bond layer, etc. may be formed in the upper surface and / or lower surface of the transparent base material 2 as needed.

(The first hard coat layer)

The first hard coat layer 3 is a scratch protective layer for preventing the scratches from occurring on the transparent conductive film 1 well.

The 1st hard-coat layer 3 has a film shape, and is arrange | positioned so that it may contact with the upper surface of the transparent base material 2, for example on the whole upper surface of the transparent base material 2. More specifically, the first hard coat layer 3 is an upper surface of the transparent substrate 2 and a lower surface of the first optical adjustment layer 4 between the transparent substrate 2 and the first optical adjustment layer 4. It is arranged to contact with.

The first hard coat layer 3 is formed of, for example, a hard coat composition.

The hard coat composition of the 1st hard coat layer 3 contains resin, Preferably it consists only of resin.

As resin, curable resin, a thermoplastic resin (for example, polyolefin resin), etc. are mentioned, For example, curable resin is mentioned.

As curable resin, active energy ray curable resin hardened | cured by irradiation of an active energy ray (specifically, an ultraviolet-ray, an electron beam etc.), for example, the thermosetting resin etc. which harden | cure by heating, are mentioned, Preferably, active energy ray curable resin is mentioned.

Examples of the active energy ray-curable resins include polymers having a functional group having a polymerizable carbon-carbon double bond in a molecule thereof. As such a functional group, a vinyl group, a (meth) acryloyl group (methacryloyl group and / or acryloyl group), etc. are mentioned, for example.

As active energy ray curable resin, (meth) acrylic-type ultraviolet curable resin, such as urethane acrylate and an epoxy acrylate, is mentioned specifically ,.

Moreover, as curable resin other than active energy ray curable resin, thermosetting resins, such as a urethane resin, a melamine resin, an alkyd resin, a siloxane type polymer, an organic silane condensate, are mentioned, for example.

Resin can be used individually or in combination of 2 or more types.

The hard coat composition may contain particles. Thereby, the 1st hard-coat layer 3 can be made into the anti blocking layer which has blocking characteristics.

As particle | grains, an inorganic particle, organic particle | grains, etc. are mentioned. Examples of the inorganic particles include silica particles, for example, metal oxide particles made of zirconium oxide, titanium oxide, zinc oxide, tin oxide, and the like, and carbonate particles such as calcium carbonate and the like. As organic particle | grains, crosslinked acrylic resin particle etc. are mentioned, for example. Particles can be used alone or in combination of two or more.

In addition, the hard coat composition may further contain known additives such as a leveling agent, a thixotropic agent and an antistatic agent.

The refractive index of the first hard coat layer 3 is, for example, 1.40 or more, preferably 1.45 or more, and for example, less than 1.60, preferably 1.55 or less. If the 1st hard-coat layer 3 is the said range, the refractive index of the 1st hard-coat layer 3 can be lower than the refractive index of the 1st optical adjustment layer 4, and the visibility of an electrode pattern can be further suppressed. have.

The refractive index of the hard coat layer (the first hard coat layer 3 and the second hard coat layer 6) can be measured using, for example, a spectroscopic ellipsometer.

The thickness of the first hard coat layer 3 is, for example, 0.1 µm or more, preferably 0.5 µm or more, and, for example, 10 µm or less, preferably from the viewpoint of scratch resistance and visibility suppression of the electrode pattern. Is 5 µm or less.

The thickness of the hard cord layer (the first hard coat layer 3 and the second hard coat layer 6) is based on the waveform of the interference spectrum using an instantaneous multi-metering system (manufactured by Otsuka Electronics Co., Ltd., "MCPD2000"). Can be calculated.

(First optical adjustment layer)

When the 1st optical adjustment layer 4 patterns the 1st transparent conductive layer 5, while ensuring the visibility of the pattern (for example, an electrode pattern), the transparent conductive film 1 ensures the transparency which was excellent. In order to adjust the optical properties (for example, refractive index) of the transparent conductive film 1, it is a layer.

The 1st optical adjustment layer 4 has a film shape, and is arrange | positioned so that it may contact the upper surface of the 1st hard-coat layer 3, for example on the upper surface whole surface of the 1st hard-coat layer 3. More specifically, the first optical adjustment layer 4 is an upper surface of the first hard coat layer 3 and the first transparent conductive material between the first hard coat layer 3 and the first transparent conductive layer 5. It is arranged to contact the lower surface of the layer 5.

The first optical adjustment layer 4 is formed of an optical adjustment composition.

The optical adjustment composition contains resin, for example. The optical adjustment composition preferably contains resin and particles, and more preferably consists only of resin and particles.

Although it does not specifically limit as resin, The thing similar to resin used for a hard-coat composition is mentioned. Resin can be used individually or in combination of 2 or more types. Preferably curable resin, More preferably, active energy ray curable resin is mentioned.

The content ratio of resin is 10 mass% or more, Preferably it is 25 mass% or more with respect to an optical adjustment composition, For example, 95 mass% or less, Preferably it is 60 mass% or less.

As particle | grains, a suitable material can be selected according to the refractive index calculated | required of the 1st optical adjustment layer 4, An inorganic particle, organic particle | grains, etc. are mentioned. Examples of the inorganic particles include silica particles, for example, metal oxide particles composed of zirconium oxide, titanium oxide, zinc oxide, oxidation, and the like, and carbonate particles such as calcium carbonate. As organic particle | grains, crosslinked acrylic resin particle etc. are mentioned, for example. Particles can be used alone or in combination of two or more.

Particles as is, preferably there may be mentioned inorganic particles, more preferably metal oxide particles, there may be mentioned more preferably the zirconium oxide particles (ZnO _2).

The average particle diameter (median diameter) of the particles is, for example, 10 nm or more, preferably 20 nm or more, and, for example, 100 nm or less, preferably 50 nm or less.

The content ratio of the particles is, for example, 5% by mass or more, preferably 40% by mass or more, and, for example, 90% by mass or less, preferably 75% by mass or less with respect to the optical adjustment composition.

The refractive index of the 1st optical adjustment layer 4 is higher than the refractive index of the 2nd optical adjustment layer 7, For example, it is 1.65 or more, Preferably it is 1.70 or more. In addition, about an upper limit, it is 1.80 or less, Preferably it is 1.75 or less. If the refractive index of the 1st optical adjustment layer 4 is the said range, the light transmittance of the transparent conductive film 1 can be made still more favorable.

The refractive index of an optical adjustment layer (1st optical adjustment layer 4 and 2nd optical adjustment layer 7) can be measured using a spectroscopic ellipsometer, for example.

The thickness of the first optical adjustment layer 4 is, for example, 150 nm or less, preferably 100 nm or less, more preferably 85 nm or less, and for example, 10 nm or more, preferably 20 nm or more. to be. If the thickness of the 1st optical adjustment layer 4 is below the said upper limit, the color (especially the color space of La * b *) of the transparent conductive film 1 can be neutralized more reliably. That is, coloring (for example, yellow) of the transparent conductive film 1 can be reduced, and the colorless transparent transparent conductive film 1 can be obtained reliably.

The thickness of the optical adjusting layer (the first optical adjusting layer 4 and the second optical adjusting layer 7) is, for example, the waveform of the interference spectrum using an instantaneous multi-photometric system (manufactured by Otsuka Electronics Co., Ltd., "MCPD2000"). Can be calculated based on

(1st transparent conductive layer)

The 1st transparent conductive layer 5 is a transparent conductive layer for forming in a predetermined | prescribed pattern (for example, electrode pattern) in post processes, such as an etching.

The 1st transparent conductive layer 5 is a top layer of the transparent conductive film 1, has a film shape, and is in the upper surface whole surface of the 1st optical adjustment layer 4 on the upper surface of the 1st optical adjustment layer 4 It is arranged to be in contact.

As a material of the 1st transparent conductive layer 5, it selects from the group which consists of In, Sn, Zn, Ga, Sb, Ti, Si, Zr, Mg, Al, Au, Ag, Cu, Pd, W, for example. And metal oxides containing at least one metal. The metal oxide shown in the said group may be further doped in the metal oxide as needed.

The material of the first transparent conductive layer 5 is preferably an indium-containing oxide such as indium-tin composite oxide (ITO), for example, an antimony-containing oxide such as antimony-tin composite oxide (ATO), or the like. More preferably, an indium containing oxide is mentioned, More preferably, ITO is mentioned. Thereby, the 1st transparent conductive layer 5 can make excellent transparency and electroconductivity compatible.

When using ITO as the material of the first transparent conductive layer 5, the tin oxide (SnO ₂ ) content is, for example, 0.5 mass% or more, based on the total amount of tin oxide and indium oxide (In ₂ O ₃ ), Preferably it is 3 mass% or more, For example, it is 15 mass% or less, Preferably it is 13 mass% or less.

"ITO" may be a complex oxide containing at least indium (In) and tin (Sn), and may contain additional components other than these. As an additional component, metal elements other than In and Sn are mentioned, for example, Zn, Ga, Sb, Ti, Si, Zr, Mg, Al, Au, Ag, Cu, Pd, W, Fe , Pb, Ni, Nb, Cr, Ga and the like.

The first transparent conductive layer 5 may be either crystalline or amorphous. The first transparent conductive layer 5 is preferably made of crystalline, more specifically, a crystalline ITO layer. Thereby, transparency of the 1st transparent conductive layer 5 can be improved, and the surface resistance value of the 1st transparent conductive layer 5 can further be reduced.

The transparent conductive layers (the first transparent conductive layer 5 and the second transparent conductive layer 8) are crystalline, for example, when the transparent conductive layer is an ITO layer, at 20 ° C hydrochloric acid (concentration 5% by mass). After immersion for 15 minutes, it can be judged by washing with water and drying and measuring the resistance between terminals between about 15 mm. Specifically, after immersion, washing with water, and drying in hydrochloric acid (20 ° C, concentration: 5 mass%), the ITO layer is crystalline when the resistance between terminals between 15 mm is 10 kΩ or less.

The surface resistance value of the 1st transparent conductive layer 5 is lower than the surface resistance value of the 2nd transparent conductive layer 8, Specifically, they are 10 ohms / square or more and 70 ohms / square or less. Preferably it is 20 ohms / square or more, More preferably, it is 30 ohms / square or more, Preferably it is 60 ohms / square or less, More preferably, it is 50 ohms / square or less. If the surface resistance value of the 1st transparent conductive layer 5 is the said range, the electromagnetic shielding property and electroconductivity excellent in the transparent conductive film 1 can be expressed.

The surface resistance value of a transparent conductive layer (1st transparent conductive layer 5 and 2nd transparent conductive layer 8) can be measured, for example using the 4-probe method.

The thickness of the first transparent conductive layer 5 is preferably thicker than the thickness of the second transparent conductive layer 8, for example, 30 nm or more, preferably 35 nm or more, and for example, 200 nm. Hereinafter, Preferably it is 100 nm or less, More preferably, it is 60 nm or less. If the thickness of the 1st transparent conductive layer 5 is the said range, the electromagnetic shielding property of the transparent conductive film 1 can be made still more favorable.

The thickness of a transparent conductive layer (1st transparent conductive layer 5 and 2nd transparent conductive layer 8) can be measured, for example by observing the cross section of a transparent conductive layer with a transmission electron microscope (TEM).

(The second hard coat layer)

The second hard coat layer 6 is a scratch protective layer for preventing the scratches from occurring in the transparent conductive film 1 well.

The 2nd hard-coat layer 6 has a film shape, and is arrange | positioned so that it may contact with the lower surface of the transparent base material 2, for example on the whole lower surface of the transparent base material 2. More specifically, the second hard coat layer 6 is a lower surface of the transparent substrate 2 and an upper surface of the second optical adjustment layer 7 between the transparent substrate 2 and the second optical adjustment layer 7. It is arranged to contact with.

The 2nd hard-coat layer 6 is the same layer as the 1st hard-coat layer 3, and has the same structure (thickness, refractive index, etc.) from the same material as the 1st hard-coat layer 3, for example. Thus, the second hard coat layer 6 also has the same shape and the same dimension as the first hard coat layer 3.

(2nd optical adjustment layer)

When the 2nd optical adjustment layer 7 patterns the 2nd transparent conductive layer 8, while ensuring the visibility of the pattern (for example, electrode pattern), the transparency of the transparent conductive film 1 ensures the outstanding transparency In order to adjust the optical properties (for example, refractive index) of the transparent conductive film 1, it is a layer.

The 2nd optical adjustment layer 7 has a film shape, and is arrange | positioned so that it may contact with the lower surface of the 2nd hard-coat layer 6, for example on the whole lower surface of the 2nd hard-coat layer 6. More specifically, the second optical adjustment layer 7 is a lower surface of the second hard coat layer 6 and a second transparent conductive material between the second hard coat layer 6 and the second transparent conductive layer 8. It is arranged to be in contact with the upper surface of the layer 8.

The second optical adjustment layer 7 is formed of an optical adjustment composition. As an optical adjustment composition, the thing similar to what was mentioned above in the 1st optical adjustment layer 4 is mentioned.

The refractive index of the 2nd optical adjustment layer 7 is lower than the refractive index of the 1st optical adjustment layer 4, for example, is 1.70 or less, Preferably it is less than 1.65, More preferably, it is 1.64 or less. In addition, about a minimum, it is 1.55 or more, Preferably it is 1.60 or more. If the refractive index of the 2nd optical adjustment layer 7 is the said range, the light transmittance of the transparent conductive film 1 can be made still more favorable.

The difference in refractive index between the second optical adjustment layer 7 and the first optical adjustment layer 4 is, for example, 0.01 or more, preferably 0.05 or more, and, for example, 0.20 or less, preferably 0.15 or less. . When the difference in refractive index is in the above range, the transparency of the transparent conductive film 1 can be improved or the color can be neutralized.

The thickness of the second optical adjustment layer 7 is, for example, 150 nm or less, preferably 100 nm or less, more preferably 85 nm or less, and for example, 10 nm or more, preferably 20 nm or more. to be. If the thickness of the 2nd optical adjustment layer 7 is below the said upper limit, a hue can be more reliably neutralized.

(2nd transparent conductive layer)

The 2nd transparent conductive layer 8 is a transparent conductive layer for forming in a predetermined | prescribed pattern (for example, electrode pattern) in post processes, such as an etching.

The 2nd transparent conductive layer 8 is the lowest layer of the transparent conductive film 1, has a film shape, and has a lower surface of the 2nd optical adjustment layer 7 on the whole lower surface of the 2nd optical adjustment layer 7 It is arranged to be in contact.

As a material which comprises the 2nd transparent conductive layer 8, the thing similar to what was mentioned above in the 1st transparent conductive layer 5 is mentioned. Preferably ITO. The second transparent conductive layer 8 may be either crystalline or amorphous, but is preferably made of crystalline and more specifically crystalline ITO layer.

The surface resistance value of the 2nd transparent conductive layer 8 is higher than the surface resistance value of the 1st transparent conductive layer 5, Specifically, they are 50 ohms / square or more and 150 ohms / square or less. Preferably it is 60 ohms / square or more, More preferably, it is 70 ohms / square or more, More preferably, it is 100 ohms / square or more, More preferably, it is 120 ohms / square or less. If the surface resistance value of the 2nd transparent conductive layer 8 is the said range, the thickness of the 2nd transparent conductive layer 8 can be made thin, and the light transmittance of the transparent conductive film 1 can be made favorable.

The difference between the surface resistance values of the first transparent conductive layer 5 and the second transparent conductive layer 8 is, for example, 10 Ω / square or more, preferably 20 Ω / square or more, more preferably 40 Ω / square. □ or more, for example, 100 Ω / □ or less, preferably 70 Ω / □ or less.

The thickness of the second transparent conductive layer 8 is preferably thinner than the thickness of the first transparent conductive layer 5, for example, 35 nm or less, preferably 30 nm or less, and for example, 1 nm. As mentioned above, Preferably it is 10 nm or more. If the thickness of the 2nd transparent conductive layer 8 is the said range, the light transmittance of the transparent conductive film 1 can be made still more favorable.

2. Manufacturing Method of Transparent Conductive Film

In order to manufacture the transparent conductive film 1, the transparent base material 2 is prepared first, and then a hard-coat layer (the 1st hard-coat layer 3 and the 2nd hard-coat layer) on both surfaces of the transparent base material 2 is carried out. (6)), an optical adjusting layer (first optical adjusting layer 4 and second optical adjusting layer 7) and a transparent conductive layer (first transparent conductive layer 5 and second transparent conductive layer 8) Form in turn.

For example, first, the dilution liquid which diluted the hard coat composition which forms the 1st hard-coat layer 3 or the 2nd hard-coat layer 6 with the solvent is prepared. Subsequently, this dilution liquid is applied to the upper or lower surface of the transparent base material 2, each dilution liquid is dried, and the hard coat composition is hardened as needed. Thereby, the 1st hard-coat layer 3 is formed in the upper surface of the transparent base material 2, and the 2nd hard-coat layer 6 is formed in the lower surface of the transparent base material 2. As shown in FIG.

Next, the dilution liquid which diluted the optical adjustment composition which forms the 1st optical adjustment layer 4 or the 2nd optical adjustment layer 7 with the solvent is prepared. Subsequently, the dilution liquid is applied to the upper surface of the first hard coat layer 3 or the lower surface of the second hard coat layer 6, and the respective diluting liquids are dried to cure the optical adjustment composition as necessary. Thereby, the 1st optical adjustment layer 4 is formed in the upper surface of the 1st hard-coat layer 3, and the 2nd optical adjustment layer 7 is formed in the lower surface of the 2nd hard-coat layer 6. As shown in FIG. That is, the laminated body of 2nd optical adjustment layer 7 / 2nd hard-coat layer 6 / transparent base material 2 / 1st hard-coat layer 3 / 1st optical adjustment layer 4 is obtained.

Next, the first transparent conductive layer 5 and the second transparent conductive layer 8 are sequentially formed on both surfaces of the laminate by a dry method.

As a dry method, a vacuum vapor deposition method, a sputtering method, an ion plating method, etc. are mentioned, for example. Preferably, a sputtering method is mentioned. By this method, a thin transparent conductive layer can be formed.

As a sputtering method, a bipolar sputtering method, an ECR (electron cyclotron resonance) sputtering method, a magnetron sputtering method, an ion beam sputtering method, etc. are mentioned, for example. Preferably, a magnetron sputtering method is mentioned.

When employ | adopting the sputtering method, the above-mentioned metal oxide etc. which comprise a transparent conductive layer are mentioned as a target material, Preferably ITO is mentioned. The tin oxide concentration of ITO is, for example, 0.5 mass% or more, preferably 3 mass% or more, and, for example, 15 mass% or less, preferably 13 mass, from the viewpoint of durability, crystallization, etc. of the ITO layer. It is% or less.

As a gas, inert gas, such as Ar, is mentioned, for example. Moreover, reactive gas, such as oxygen gas, can be used together as needed. In the case of using a reactive gas together, the flow rate ratio sccm of the reactive gas is not particularly limited, but is, for example, 0.1% by mass or more and 5% by mass or less with respect to the total flow ratio of the sputter gas and the reactive gas.

The atmospheric pressure at the time of sputtering is, for example, 1 Pa or less, preferably 0.1 Pa or more and 0.7 Pa or less, from the viewpoints of suppression of lowering of the sputtering rate and discharge stability.

For example, the power supply may be any of a DC power supply, an AC power supply, an MF power supply, and an RF power supply, or a combination thereof.

At this time, the surface resistance value of each transparent conductive layer can be adjusted by adjusting the thickness of the 1st transparent conductive layer 5 and the 2nd transparent conductive layer 8 formed in a laminated body separately, respectively. . In other words, by increasing the thickness of the transparent conductive layer, the surface resistance value can be lowered, and conversely, by reducing the thickness of the transparent conductive layer, the surface resistance value can be increased. In this invention, formation of each transparent conductive layer is adjusted so that the thickness of the 2nd transparent conductive layer 8 may become thinner than the thickness of the 1st transparent conductive layer 5 preferably.

Thereby, the 2nd transparent conductive layer 8, the 2nd optical adjustment layer 7, the 2nd hard-coat layer 6, the transparent base material 2, the 1st hard-coat layer 3, and the 1st optical adjustment layer ( The transparent conductive film 1 provided with 4) and the 1st transparent conductive layer 5 in this order is obtained.

As needed, heat processing is then performed to the transparent conductive film 1 in air | atmosphere.

Heat treatment can be performed using an infrared heater, oven, etc., for example.

Heating temperature is 100 degreeC or more, for example, Preferably it is 120 degreeC or more, For example, 200 degrees C or less, Preferably it is 160 degrees C or less.

The heating time is appropriately determined depending on the heating temperature, but is, for example, 10 minutes or more, preferably 30 minutes or more, and for example, 5 hours or less, preferably 3 hours or less.

By this heat treatment, each transparent conductive layer can be crystallized and it can be set as desired surface resistance value.

In addition, in this manufacturing method, each layer can be formed with respect to the transparent base material 2 by a roll-to-roll method, for example, or part or all of these layers can also be formed by a batch system (leaf | leaf method). have.

The light transmittance (visibility average transmittance) of the transparent conductive film 1 is 86.0% or more, for example, Preferably it is 86.5% or more. When the light transmittance is in the above range, the transparent transparent conductive film 1 can be reliably obtained.

The color La * of the transparent conductive film 1 is, for example, -1.5 or more, preferably -1.0 or more, and, for example, preferably 1.5 or less, preferably 0.5 or less. Color Lb * is -4.0 or more, Preferably it is -0.5 or more, For example, Preferably it is 4.0 or less, Preferably it is 1.0 or less. If a color is the said range, a colorless transparent transparent conductive film 1 can be obtained reliably.

This transparent conductive film 1 can be used as a film for touch panels, such as an optical system, an ultrasonic system, a capacitive system, and a resistive film system, for example. In particular, it can use suitably as the film for touch panels of a capacitive system (specifically, projection type capacitive system).

3. Film for touch panel

Next, the film 1a for touch panels which is one Embodiment of the transparent conductive film 1 is demonstrated.

As shown in FIG. 2, the film 1a for touch panels is a transparent base material 2, the 1st hard-coat layer 3 arrange | positioned at the upper surface of the transparent base material 2, and the 1st hard-coat layer 3 Disposed on an upper surface of the first optical adjustment layer 4, a patterned first transparent conductive layer 5a disposed on an upper surface of the first optical adjustment layer 4, and a lower surface of the transparent substrate 2. The second hard coat layer 6, the second optical adjustment layer 7 disposed on the bottom surface of the second hard coat layer 6, and the patterning second transparent disposed on the bottom surface of the second optical adjustment layer 7. The conductive layer 8a is provided. That is, the transparent conductive film 1 is patterned from the bottom in order from the 2nd transparent conductive layer 8a, the 2nd optical adjustment layer 7, the 2nd hard-coat layer 6, the transparent base material 2, and the 1st hard The coating layer 3, the 1st optical adjustment layer 4, and the patterning 1st transparent conductive layer 5a are provided. Film 1a for touch panels, Preferably, the patterning 2nd transparent conductive layer 8a, the 2nd optical adjustment layer 7, the 2nd hard-coat layer 6, the transparent base material 2, the 1st hard coat It consists of the layer 3, the 1st optical adjustment layer 4, and the patterning 1st transparent conductive layer 5a.

As shown to FIG. 3A-FIG. 3B, the film 1a for touch panels is long in a left-right direction (one direction, a long side direction), and shows substantially rectangular shape when viewed in a short plane in the front-back direction (another direction, short side direction). Have

The film 1a for touch panels is patterned transparent obtained by patterning (patterning) the transparent conductive layers (1st transparent conductive layer 5 and 2nd transparent conductive layer 8) of the above-mentioned transparent conductive film 1 It is an electroconductive film. Therefore, the 2nd optical adjustment layer 7, the 2nd hard-coat layer 6, the transparent base material 2, the 1st hard-coat layer 3, and the 1st optical adjustment layer 4 of the film 1a for touch panels. ) Is the same as each layer of the transparent conductive film 1 described above.

As shown in FIG. 3A, the patterning 1st transparent conductive layer 5a is equipped with the 1st rectangular pattern 11 extended in the left-right direction as an example of a 1st pattern in the substantially center part in planar view. . Specifically, the patterning 1st transparent conductive layer 5a is equipped with the some 1st rectangular pattern 11 arrange | positioned at intervals mutually in the front-back direction. In addition, the wiring 12 for electrically connecting the first rectangular pattern 11 to an integrated circuit (not shown) is integrally connected to the right end of the first rectangular pattern 11.

As shown in FIG. 3B, the patterning 2nd transparent conductive layer 8a extends in the substantially center part at the bottom face in a 2nd rectangle extended in the front-back direction (orthogonal direction orthogonal to a left-right direction) as an example of a 2nd pattern. The upper pattern 13 is provided. Specifically, the patterned second transparent conductive layer 8a includes a plurality of second rectangular patterns 13 arranged at intervals from each other in the left and right directions. In addition, the wiring 12 for electrically connecting the second rectangular pattern 13 to an integrated circuit (not shown) is integrally connected to the front end or the rear end.

When the 1st rectangular pattern 11 of the patterned 1st transparent conductive layer 5a and the 2nd rectangular pattern 13 of the patterned 2nd transparent conductive layer 8a are projected in the thickness direction (up-down direction), And orthogonal to each other.

The left-right direction length (long side length) of the 1st rectangular pattern 11 of the patterned 1st transparent conductive layer 5a is the front-back direction length of the 2nd rectangular pattern 13 of the patterned 2nd transparent conductive layer 8a. Longer than (long side length). As a result, the surface resistance of the patterned first transparent conductive layer 5a having a long moving distance of the current can be reduced, so that the transfer speed of the current of the patterned first transparent conductive layer 5a can be improved or noise can be reduced. Can be. As a result, the image display apparatus 20 can be enlarged.

As a patterning method, it implements by covering each transparent conductive layer with the mask for forming an electrode pattern, and etching each transparent conductive layer with etching liquid, for example. As etching liquid, an acid is used preferably. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid and phosphoric acid, organic acids such as acetic acid, mixtures thereof, and aqueous solutions thereof.

4. Effect

This transparent conductive film 1 is the 1st transparent conductive layer 5, the 1st optical adjustment layer 4, the transparent base material 2, the 2nd optical adjustment layer 7, and the 2nd transparent conductive layer 8 Since the first transparent conductive layer 5 and the second transparent conductive layer 8 are patterned, the patterned first transparent conductive layer 5a and the patterned second transparent conductive layer 8a (Example For example, the visibility of the electrode pattern can be suppressed.

In addition, since the surface resistance value of the 1st transparent conductive layer 5 is 10 ohms / square or more and 70 ohms / square or less, the transparent conductive film 1 has a 1st transparent conductive layer 5 with a small surface resistance value. ) Is provided on one side. Therefore, this transparent conductive film 1 can express electromagnetic shielding which is comparatively more favorable than the transparent conductive film which equips both surfaces with the transparent conductive layer with high surface resistance value.

Moreover, since the surface resistance value of the 2nd transparent conductive layer 8 is larger than the surface resistance value of the 1st transparent conductive layer 5, and is 50 ohms / square or more and 150 ohms / square or less, it is a 2nd transparent conductive layer (8) can be thinner than the first transparent conductive layer 5. In addition, the refractive index of the 2nd optical adjustment layer 7 is lower than the refractive index of the 1st optical adjustment layer 4. By these surface resistance values and refractive index, the light transmittance of the transparent conductive film 1 can be improved.

In addition, in the film 1a for touch panels in which each transparent conductive layer of this transparent conductive film 1 is patterned, the 1st rectangular pattern 11 in which the patterning 1st transparent conductive layer 5a is long in a left-right direction is 11 ), And the patterned second transparent conductive layer 8a is provided with a second rectangular pattern 13 that is long in the front-rear direction. In addition, the left-right direction length of the 1st rectangular pattern 11 is longer than the front-back direction length of the said 2nd pattern. Therefore, since the surface resistance value of the patterned first transparent conductive layer 5a with a long moving distance of the current can be reduced, the transfer speed of the current of the patterned first transparent conductive layer 5a can be improved or noise can be reduced. Can be. As a result, since the improvement of the electric current speed | rate and the noise reduction as the whole transparent conductive film 1 can be achieved, the image display apparatus 20 can be enlarged.

<Image display device>

Next, one Embodiment of the image display apparatus 20 is demonstrated. As shown in FIG. 4, one Embodiment of the image display apparatus 20 is a transparent protective plate 21, the 1st transparent adhesive layer 22, the film 1a for touch panels, and a 2nd transparent adhesive layer. 23 and the image display element 24 are provided in order. 4, the upper side is the element side, and the lower side is the viewing side.

The transparent protective plate 21 is a layer for protecting the internal members of the image display device 20 such as the image display element 24 against impact or contamination from the outside.

As the transparent protective plate 21, the resin plate which consists of hard resins, such as an acrylic resin and a polycarbonate resin, for example, a glass plate, etc. are mentioned.

The thickness of the transparent protective plate 21 is, for example, 10 µm or more, preferably 500 µm or more, and for example, 10 mm or less, more preferably 5 mm or less.

The 1st transparent adhesive layer 22 is a layer for sticking the transparent protective plate 21 and the film 1a for touch panels. The first transparent pressure-sensitive adhesive layer 22 has a film shape and is disposed on the transparent protective plate 21. More specifically, the first transparent pressure sensitive adhesive layer 22 is formed between the transparent protective plate 21 and the film 1a for the touch panel, and the upper surface of the transparent protective plate 21 and the bottom surface of the film 1a for the touch panel (patterning). It is arrange | positioned so that it may contact with the 2nd transparent conductive layer 8a.

The first transparent pressure sensitive adhesive layer 22 is formed of a transparent pressure sensitive adhesive composition. Although the composition of an adhesive composition is not limited, For example, an acrylic adhesive, a rubber adhesive (butyl rubber etc.), a silicone adhesive, a polyester adhesive, a polyurethane adhesive, a polyamide adhesive, an epoxy adhesive, a vinyl alkyl ether adhesive, A fluororesin adhesive etc. are mentioned.

The thickness (distance from the upper surface of the transparent protective plate 21 to the lower surface of the patterned second transparent conductive layer 8a) of the first transparent adhesive layer 22 is, for example, 1 µm or more, preferably 5 µm or more. For example, it is 300 micrometers or less, Preferably it is 150 micrometers or less, More preferably, it is 50 micrometers or less.

The film 1a for touch panels is arrange | positioned on the 1st transparent adhesive layer 22 so that the patterning 1st transparent conductive layer 5a may be located above and the patterning 2nd transparent conductive layer 8a is located below. . More specifically, in the film 1a for touch panels, the patterning 2nd transparent conductive layer 8a is a 1st transparent adhesive layer () between the 1st transparent adhesive layer 22 and the 2nd transparent adhesive layer 23. 22), and the patterned 1st transparent conductive layer 5a is arrange | positioned so that it may contact the 2nd transparent adhesive layer 23. As shown in FIG.

Moreover, in the upper surface of the film 1a for touch panels, it exposes from the upper surface and the side surface of the 1st rectangular pattern 11 of the patterning 1st transparent conductive layer 5a, and from the patterning 1st transparent conductive layer 5a. The upper surface of the first optical adjustment layer 4 to be in contact with the first transparent pressure-sensitive adhesive layer 22. In the lower surface of the film 1a for touch panels, the lower surface and side surfaces of the second rectangular pattern 13 of the patterned second transparent conductive layer 8a and the agent exposed from the patterned second transparent conductive layer 8a The upper surface of the 2nd optical adjustment layer 7 is in contact with the 2nd transparent adhesive layer 23.

The second transparent pressure sensitive adhesive layer 23 is a layer for bonding the image display element 24 to the touch panel film 1a. The 2nd transparent adhesive layer 23 has a film shape, and is arrange | positioned on the film 1a for touch panels. More specifically, the 2nd transparent adhesive layer 23 is between the film 1a for touch panels and the image display element 24, and the upper surface of the film 1a for touch panels, and the lower surface of the image display element 24. It is arranged to contact with.

The second transparent pressure sensitive adhesive layer 23 is formed of the same pressure sensitive adhesive composition as the first transparent pressure sensitive adhesive layer 22. The thickness of the 2nd transparent adhesive layer 23 is the same as the thickness of the 1st transparent adhesive layer 22.

The image display element 24 is disposed on the second transparent pressure sensitive adhesive layer 23. More specifically, the image display element 24 includes the second transparent pressure sensitive adhesive layer 23 so that the image display surface 25 is lower and the image display surface 25 is in contact with the upper surface of the second transparent pressure sensitive adhesive layer 23. It is arranged on the upper surface of).

As the image display element 24, a liquid crystal cell, organic EL, etc. are mentioned, for example.

Since this image display apparatus 20 is equipped with the film 1a for touch panels, it has an electromagnetic shielding effect, and is patterned 1st transparent conductive layer 5a and patterned 2nd transparent conductive layer 8a (electrode pattern) It has a good light transmittance while suppressing the visibility of). Therefore, a large screen can be achieved.

Moreover, in the image display apparatus 20, the image display element 24 is arrange | positioned at the patterning 1st transparent conductive layer 5a side (upper side). Therefore, the distance between the patterning 1st transparent conductive layer 5a (1st transparent conductive layer 5) with strong electromagnetic shielding effect, and the image display element 24 which produces an electromagnetic wave is narrowed. Therefore, the electromagnetic wave of the image display element 24 can be absorbed more reliably, and the electromagnetic shielding effect as the image display apparatus 20 is excellent.

<Variation example>

(1) In embodiment shown in FIG. 1, the transparent conductive film 1 is the 2nd transparent conductive layer 8, the 2nd optical adjustment layer 7, the 2nd hard-coat layer 6, and transparent from the bottom in order. Although the base material 2, the 1st hard-coat layer 3, the 1st optical adjustment layer 4, and the 1st transparent conductive layer 5 are provided, it is not shown, for example, but a 2nd hard-coat layer ( 6) and the first hard coat layer 3 do not have to be provided. That is, the transparent conductive film 1 is the 2nd transparent conductive layer 8, the 2nd optical adjustment layer 7, the transparent base material 2, the 1st optical adjustment layer 4, and the 1st transparent from the bottom in order It consists of the conductive layer 5.

Preferably, embodiment shown in FIG. 1 is mentioned from a viewpoint of abrasion. The same also applies to the touch panel film 1a and the image display device 20.

(2) In embodiment shown to FIGS. 3A-3B, the patterning 1st transparent conductive layer 5a is equipped with the 1st rectangular pattern 11 long in a left-right direction, and the patterning 2nd transparent conductive layer 8a is Although the 2nd rectangular pattern 13 which is elongate in the front-back direction is provided, for example, although not shown, the patterning 2nd transparent conductive layer 8a makes the 1st rectangular pattern 11 long in the left-right direction. It is provided and the patterning 1st transparent conductive layer 5a may be equipped with the 2nd rectangular pattern 13 long in a front-back direction.

In this embodiment, the left-right direction length of the 1st rectangular pattern 11 of the patterned 2nd transparent conductive layer 8a is the front-back direction of the 2nd rectangular pattern 13 of the patterned 1st transparent conductive layer 5a. Longer than length

Preferably, embodiment shown to FIGS. 3A-3B is mentioned from the point which can improve the current speed and noise of a transparent conductive layer with a long electrode pattern length.

(3) In the embodiment shown to FIG. 3A-3B, the 1st rectangular pattern 11 extended in the left-right direction as an example of a 1st pattern, and the 2nd rectangular pattern extended in the front-back direction as an example of a 2nd pattern ( 13), for example, as shown in FIGS. 5A to 5B, as an example of the first pattern, a plurality of rectangular patterns are formed as the first continuous rectangular pattern 14 in which the left and right directions are continuous, As an example, it may be set as the second continuous square pattern 15 in which a plurality of square patterns are continuous in the front-rear direction.

That is, in embodiment shown to FIGS. 5A-5B, the patterning 1st transparent conductive layer 5a is equipped with the some 1st continuous square pattern 14 arrange | positioned at intervals mutually in the left-right direction. In the first continuous rectangular pattern 14, a plurality of substantially rectangular patterns are disposed on a straight line such that their diagonal lines are along the left and right directions.

The patterning 2nd transparent conductive layer 8a is equipped with two or more 2nd continuous square pattern 15 arrange | positioned at intervals mutually in the front-back direction. In the second continuous rectangular pattern 15, a plurality of substantially rectangular patterns are disposed on a straight line such that their diagonal lines are along the front-back direction.

When the first continuous rectangular pattern 14 of the patterned first transparent conductive layer 5a and the second continuous rectangular pattern 15 of the patterned second transparent conductive layer 8a are projected in the thickness direction, they are mutually different. It is arranged to be orthogonal. Moreover, when projecting in the thickness direction, the 1st continuous rectangular shape so that the rectangular pattern which comprises the 1st continuous rectangular pattern 14 may not overlap with the rectangular pattern which comprises the 2nd continuous rectangular pattern 15. The pattern 14 and the second continuous rectangular pattern 15 are arranged. In addition, when projecting in the thickness direction, the pattern which combined the 1st continuous rectangular pattern 14 and the 2nd continuous rectangular pattern 15 is made so that the whole surface of the substantially center part of the film 1a for touch panels may be covered. The first continuous rectangular pattern 14 and the second continuous rectangular pattern 15 are arranged.

(4) In the image display apparatus 20 shown in FIG. 4, the film 1a for touch panels and the image display element 24 are arrange | positioned so that the image display element 24 may be located in the patterning 1st transparent conductive layer 5a side. Is arranged, but is not shown, for example, but the touch panel film 1a and the image display element 24 are disposed so that the image display element 24 is positioned on the patterning second transparent conductive layer 8a side. It may be. That is, the image display apparatus 20 has the transparent protective plate 21 and the 1st transparent adhesive layer (so that the patterning 1st transparent conductive layer 5a may become lower side, and the patterning 2nd transparent conductive layer 8a may become upper side. 22, the touch panel film 1a, the second transparent pressure sensitive adhesive layer 23, and the image display element 24 may be provided in order from the bottom side.

Preferably, embodiment shown in FIG. 4 is mentioned from a viewpoint of the electromagnetic shielding effect as the whole image display apparatus 20. FIG.

Example

An Example and a comparative example are shown to the following, and this invention is demonstrated to it further more concretely. In addition, this invention is not limited to an Example and a comparative example at all. In addition, specific numerical values, such as a compounding ratio (content ratio), a physical property value, and a parameter used by the following description, are the compounding ratio (content ratio), physical property value, and parameter corresponding to those described in the said "mode for carrying out invention". It may be replaced by the above-described upper limit (number defined by "less than", "less than") or the lower limit value (number defined by "greater than" or "greater than").

(Example 1)

On both sides of the transparent base material (COP film, Japan Zeon company make, brand name "Zenoa ZF-16", thickness 100 micrometers) of a hard-coat composition (acrylic-type ultraviolet curable resin, the DIC company make, "Unidic RS29-120") The dilution liquid was apply | coated using the gravure coater, and it dried by heating at 80 degreeC for 1 minute. Thereafter, ultraviolet rays were irradiated using a high pressure mercury lamp to form first and second hard coat layers (each having a thickness of 1.0 mu m and each refractive index of 1.53). This obtained the laminated body of a 1st hard-coat layer, a transparent base material, and a 2nd hard-coat layer.

Subsequently, the dilution liquid of the optical adjustment composition whose refractive index becomes 1.70 was apply | coated to the surface of the 1st hard-coat layer of a laminated body using the gravure coater, and it heat-dried at 60 degreeC for 1 minute. Thereafter, ultraviolet rays were irradiated using a high pressure mercury lamp to form a first optical adjustment layer (refractive index 1.70, thickness 80 nm). Moreover, except having used the optical adjustment composition whose refractive index becomes 1.64, it carried out similarly to the above, and formed the 2nd optical adjustment layer (refractive index 1.64, thickness 80nm) on the surface of a 2nd hard-coat layer. This obtained the laminated body of a 1st optical adjustment layer, a 1st hard-coat layer, a transparent base material, a 2nd hard-coat layer, and a 1st optical adjustment layer.

Moreover, each optical adjustment composition was prepared by mixing suitably the refractive index adjuster (made by JSR, "Opstar") of refractive index 1.60, and the refractive index adjuster (made by JSR, "Ostar KZ6734") of refractive index 1.74.

Next, the obtained laminated body was put into the sputter apparatus, and the indium tin oxide layer (ITO layer) was laminated | stacked on both surfaces of the laminated body. As gas, the mixed gas which consists of 98% of argon gas and 2% of oxygen was used, and the pressure of atmosphere was 0.4 Pa. Moreover, the sintered compact which consists of indium oxide 90 mass%-tin oxide 10 mass% was used as a target of sputtering. Moreover, the thickness of the 1st transparent conductive layer laminated | stacked on the side of a 1st optical adjustment layer was adjusted so that it might be set to 40 nm, and the thickness of the 2nd transparent conductive layer laminated | stacked on the 2nd optical adjustment layer side was set to 30 nm.

This obtained the transparent conductive film which consists of a 1st transparent conductive layer, a 1st optical adjustment layer, a 1st hard-coat layer, a transparent base material, and a 2nd hard-coat layer, a 1st optical adjustment layer, and a 2nd transparent conductive layer.

Next, the first and second transparent conductive layers were crystallized by heating the transparent conductive film in an oven at 140 ° C. for 90 minutes to manufacture a double-sided transparent conductive film of Example 1.

(Examples 2-9 and Comparative Examples 1-5)

Except having changed the thickness and refractive index of an optical adjustment layer, and the thickness and surface resistance of a transparent conductive layer into the thickness and refractive index of the optical adjustment layer of Table 1, and the thickness and surface resistance of a transparent conductive layer, A transparent conductive film was prepared in the same manner as in Example 1.

(Comparative Example 6)

A transparent conductive film was produced in the same manner as in Example 1 except that the first optical adjustment layer and the second optical adjustment layer were not formed.

The following measurement is performed about the transparent conductive films of each Example and each comparative example, and the result is shown in Table 1.

<Surface resistance>

Using the four-terminal method, the surface resistance (Ω / square) of each transparent conductive layer of the transparent conductive film of each Example and each comparative example was measured.

<Layer thickness>

The thickness of each hard-coat layer and each optical adjustment layer was computed based on the waveform from an interference spectrum using the instantaneous multi-metering system (Otsuka Electronics Co., Ltd. make, "MCPD2000").

The thickness of each transparent conductive layer was measured by observing the cross section which cut | disconnected the transparent conductive film with a transmission electron microscope (TEM).

<Refractive index>

On a transparent film (COP film, Japan Zeon company make, `` Zenooa ZF-16 ''), only the hard coat layer which is a measurement object is formed into a film, and a spectroscopic ellipsometer (JW Wall Inc. make, model number FQTH-100 ) Was used to measure the refractive index.

Moreover, only the optical adjustment layer which is a measurement object was formed into a film on the transparent film (the same as the above), and the refractive index was measured using the spectroscopic ellipsometer (the same as the above).

Moreover, when the adhesiveness of a transparent film, a hard-coat layer, or an optical adjustment layer was poor, surface modification, such as corona treatment, was performed suitably.

<Transmittance, color>

On both surfaces of the transparent conductive film of each Example and each comparative example, the transparent film (Neonto Denko make, model number No.7, thickness 25micrometer) is transparent film (made by Japan Xeon, "Zenoa ZF-14", thickness) 100 micrometers) was bonded together. This obtained the sample for transparency measurement (transparent film / adhesive / transparent conductive film / adhesive / transparent film). Using this spectrophotometer (Murakami Color company make, model number "Dot-3"), the visibility average transmittance and hue a *, b * in wavelength 380-700 nm were measured. The results are shown in Table 1.

<Visibility of electrode pattern>

In the transparent conductive films of each Example and each comparative example, the 1st transparent conductive layer and the 2nd transparent conductive layer were etched using the etching liquid, and it patterned by the electrode pattern of FIGS. 3A-3B. The patterned transparent conductive film was visually recognized from the inclined upper side. The case where the electrode pattern was visually recognized was evaluated as x, and the case where the electrode pattern was hardly visually evaluated was evaluated as ○. The results are shown in Table 1.

In addition, although the said invention was provided in the illustrated embodiment of this invention, this is only a mere illustration and should not be interpreted limitedly. Modifications of the invention which are apparent to those skilled in the art are included in the following claims.

Industrial availability

The transparent conductive film and image display apparatus of this invention can be applied to various industrial products, For example, the transparent conductive film of this invention is used suitably for an image display apparatus etc. provided with a touch panel.

1: transparent conductive film
2: transparent base material
4: first optical adjustment layer
5: first transparent conductive layer
7: second optical adjustment layer
8: second transparent conductive layer
11: first rectangular pattern
13: second rectangle pattern
20: image display device
24: image display element

Claims (6)

It is provided with a 1st transparent conductive layer, a 1st optical adjustment layer, a transparent base material, a 2nd optical adjustment layer, and a 2nd transparent conductive layer one by one,
The surface resistance value of the said 2nd transparent conductive layer is larger than the surface resistance value of the said 1st transparent conductive layer,
The surface resistance of the said 1st transparent conductive layer is 10 ohms / square or more and 70 ohms / square or less,
The surface resistance of the said 2nd transparent conductive layer is 50 ohms / square or more and 150 ohms / square or less,
The refractive index of the said 2nd optical adjustment layer is smaller than the refractive index of the said 1st optical adjustment layer, The transparent conductive film characterized by the above-mentioned. The method of claim 1,
The thickness of a said 2nd transparent conductive layer is thinner than the thickness of a said 1st transparent conductive layer, The transparent conductive film characterized by the above-mentioned. The method of claim 1,
The refractive index of the said 1st optical adjustment layer is 1.65 or more, 1.75 or less,
The refractive index of the said 2nd optical adjustment layer is 1.60 or more and 1.70 or less, The transparent conductive film characterized by the above-mentioned. The method of claim 1,
The thickness of the said 1st optical adjustment layer and the said 2nd optical adjustment layer is 100 nm or less, The transparent conductive film characterized by the above-mentioned. The method of claim 1,
The first transparent conductive layer and the second transparent conductive layer are both patterned,
The first transparent conductive layer has a first pattern long in one direction,
The second transparent conductive layer has a second pattern elongated in an orthogonal direction orthogonal to the one direction,
The one direction length of a said 1st pattern is longer than the orthogonal direction length of a said 2nd pattern, The transparent conductive film characterized by the above-mentioned. The transparent conductive film of Claim 1,
And an image display element disposed on the first transparent conductive layer side of the transparent conductive film.

Images