TWI783994B - Transparent conductive film and image display device - Google Patents

Abstract

The transparent conductive film of the present invention comprises in sequence: a first transparent conductive layer, a first optical adjustment layer, a transparent base material, a second optical adjustment layer and a second transparent conductive layer. The surface resistance value of the second transparent conductive layer is greater than the surface resistance value of the first transparent conductive layer, the surface resistance value of the first transparent conductive layer is not less than 10 Ω/□ and not more than 70 Ω/□, the surface resistance of the second transparent conductive layer The value is not less than 50 Ω/□ and not more than 150 Ω/□, and the refractive index of the second optical adjustment layer is lower than that of the first optical adjustment layer.

Description

Transparent conductive film and image display device

The present invention relates to a transparent conductive film and an image display device equipped with it.

Conventionally, it is known that an image display device including a touch panel and an image display element includes a film for a touch panel in which a transparent conductive layer containing indium tin composite oxide (ITO) is formed on a transparent base material. As such a film for touch panels, for example, Patent Document 1 describes a double-sided transparent conductive film in which ITO layers are arranged on both surfaces of a transparent substrate. In addition, since image display elements such as liquid crystal cells generate electromagnetic waves, an electromagnetic wave shielding effect of shielding electromagnetic waves is desired for image display devices. In addition, in a resistive film type touch panel, it is known that an ITO structure in which two ITO films are opposed to each other has an electromagnetic wave shielding effect (see, for example, Non-Patent Document 1). In particular, Non-Patent Document 1 describes that in order to reduce the resistance value of the ITO film, it is necessary to increase the thickness of the ITO film, but as a result, the light transmittance decreases. In addition, it is described that if only the resistance value of one ITO film is lowered (for example, about 10 Ω), even if the resistance value of the other ITO film is not increased, a good electromagnetic wave shielding effect is obtained. And, based on these results, Non-Patent Document 1 discloses that by reducing the resistance value of only one ITO film and increasing the resistance value of the other ITO film, a good electromagnetic wave shielding effect can be exhibited, and the decrease in light transmittance can be suppressed. Prior Art Documents Patent Documents Patent Document 1: Japanese Patent Laid-Open No. 2013-99924 [Non-Patent Document] [Non-Patent Document 1] Harada Tomoto, "Electromagnetic Wave Shielding Effect of Resistive Film Type Touch Panel Sensor", Electrical On E, Vol. 128 No. 7, 2008, p.312-313

[Problems to be Solved by the Invention] In addition, in a film for a touch panel (transparent conductive film on both sides) that is used in a capacitive system with good durability and less malfunction, the two ITO layers arranged on both sides are etched as follows: electrode pattern shape. And, in order to suppress the visibility of the electrode pattern, an optical adjustment layer is provided between the ITO layer and the transparent substrate. In this case, since the double-sided transparent conductive film further includes an optical adjustment layer, light transmittance decreases. The present invention provides a transparent conductive film and an image display device having electromagnetic wave shielding effect, suppressing the visibility of electrode patterns and having good light transmittance. [Technical means to solve the problem] The present invention [1] includes a transparent conductive film comprising: a first transparent conductive layer, a first optical adjustment layer, a transparent substrate, a second optical adjustment layer, and a second transparent conductive film. Layer, the surface resistance value of the above-mentioned second transparent conductive layer is greater than the surface resistance value of the above-mentioned first transparent conductive layer, the surface resistance value of the above-mentioned first transparent conductive layer is not less than 10 Ω/□ and not more than 70 Ω/□, the above-mentioned second The surface resistance of the transparent conductive layer is not less than 50 Ω/□ and not more than 150 Ω/□, and the refractive index of the second optical adjustment layer is smaller than that of the first optical adjustment layer. The present invention [2] includes the transparent conductive film described in [1], wherein the second transparent conductive layer is thinner than the first transparent conductive layer. The present invention [3] includes the transparent conductive film as described in [1] or [2], wherein the refractive index of the first optical adjustment layer is not less than 1.65 and not more than 1.75, and the refractive index of the second optical adjustment layer is 1.60 or more and 1.70 or less. The present invention [4] includes the transparent conductive film according to any one of [1] to [3], wherein the thicknesses of the first optical adjustment layer and the second optical adjustment layer are both 100 nm or less. The present invention [5] includes the transparent conductive film described in any one of [1] to [4], wherein the first transparent conductive layer and the second transparent conductive layer are patterned, and the first transparent conductive layer It has a long first pattern in one direction, the second transparent conductive layer has a long second pattern in a direction perpendicular to the one direction, and the length of one direction of the first pattern is longer than that of the second pattern. The length in the orthogonal direction of the pattern. The present invention [6] includes an image display device comprising: the transparent conductive film according to any one of [1] to [5], and the first transparent conductive layer disposed on the transparent conductive film side. The image display element. [Effects of the Invention] The transparent conductive film according to the present invention includes, in order, a first transparent conductive layer, a first optical adjustment layer, a transparent substrate, a second optical adjustment layer, and a second transparent conductive layer. Therefore, when the first transparent conductive layer and the second transparent conductive layer are patterned, the visibility of the first transparent conductive layer and the second transparent conductive layer can be suppressed. Moreover, since the surface resistance value of the first transparent conductive layer is not less than 10 Ω/□ and not more than 70 Ω/□, the transparent conductive film has a transparent conductive layer with a small surface resistance value. Therefore, the transparent conductive film can exhibit good electromagnetic wave shielding effect. Again, because the surface resistance value of the 2nd transparent conductive layer is greater than the surface resistance value of the 1st transparent conductive layer, is more than 50 Ω/□ and below 150 Ω/□, so can make the 2nd transparent conductive layer and the 1st transparent conductive layer Relatively thinner. Moreover, the refractive index of the 2nd optical adjustment layer is lower than the refractive index of the 1st optical adjustment layer. Thereby, the light transmittance of a transparent conductive film can be improved. According to the image display device of the present invention, it has an electromagnetic wave shielding effect, suppresses the visibility of the patterned first transparent conductive layer and the second transparent conductive layer, and has good light transmittance.

再者，上述發明係作為本發明之例示之實施形態而提供，但其僅為例示，不應限定性地解釋。藉由該技術領域之業者所明確之本發明之變化例包含於下述申請專利範圍中。 [產生上之可利用性] 本發明之透明導電性膜及圖像顯示裝置可應用於各種工業製品，例如本發明之透明導電性膜可較佳地用於具備觸控面板之圖像顯示裝置等。<One Embodiment of Transparent Conductive Film> One embodiment of the transparent conductive film of the present invention will be described below with reference to the drawings. In Fig. 1, the up and down direction on the paper is the up and down direction (thickness direction, first direction), and the upper side on the paper is the upper side (one side in the thickness direction, one side in the first direction), and the lower side on the paper is the lower side (the other side in the thickness direction) , the other side in the first direction). Also, the left-right direction on the paper is the left-right direction (the second direction, the direction perpendicular to the first direction), and the left side of the paper is the left side (the second direction side), and the right side of the paper is the right side (the other side of the second direction) . Also, the thickness direction of the paper is the depth direction (the third direction, the direction perpendicular to the first direction and the second direction), and the front side of the paper is the front side (the third direction side), and the back side of the paper is the rear side (the first direction). 3 direction to the other side). Specifically, according to the direction arrows in each figure. 1. Transparent conductive film The transparent conductive film 1 is a film shape (including a sheet shape) having a specific thickness, extends in a specific direction (plane direction) perpendicular to the thickness direction, and has a flat upper surface and a flat lower surface. surface. The transparent conductive film 1 is used, for example, as a component for producing a base material for a touch panel included in an image display device, that is, it is not an image display device. That is, the transparent conductive film 1 is an industrially available device distributed as a separate component without including image display elements such as a liquid crystal cell. Specifically, as shown in FIG. 1 , the transparent conductive film 1 includes: a transparent base material 2, a first hard coat layer 3 disposed on the upper surface (one side) of the transparent base material 2, and a first hard coat layer 3 disposed on the first hard coat layer 3. The first optical adjustment layer 4 on the upper surface, the first transparent conductive layer 5 arranged on the upper surface of the first optical adjustment layer 4, and the second hard coat layer 6 arranged on the lower surface (the other side) of the transparent substrate 2 , the second optical adjustment layer 7 arranged on the lower surface of the second hard coat layer 6 , and the second transparent conductive layer 8 arranged on the lower surface of the second optical adjustment layer 7 . That is, the transparent conductive film 1 includes in order from the bottom: the second transparent conductive layer 8, the second optical adjustment layer 7, the second hard coat layer 6, the transparent substrate 2, the first hard coat layer 3, the first optical adjustment layer layer 4, and the first transparent conductive layer 5. The transparent conductive film 1 preferably includes: a second transparent conductive layer 8, a second optical adjustment layer 7, a second hard coat layer 6, a transparent substrate 2, a first hard coat layer 3, a first optical adjustment layer 4 and The first transparent conductive layer 5 . Each layer will be described in detail below. (Transparent base material) The transparent base material 2 is a base material which ensures the mechanical strength of the transparent conductive film 1 . The transparent substrate 2 supports the first transparent conductive layer 5 and the second transparent conductive layer 8 together with the first hard coat layer 3 , the second hard coat layer 6 , the first optical adjustment layer 4 and the second optical adjustment layer 7 . The transparent substrate 2 is, for example, a transparent polymer film. As the material of the polymer film, polyester resins such as polyethylene terephthalate (PET), polybutylene terephthalate, polyethylene naphthalate, etc., such as polymethacrylate Other (meth)acrylic resins (acrylic resin and/or methacrylic resin), such as polyethylene, polypropylene, cycloolefin polymer (COP) and other olefin resins, such as polycarbonate resin, polyether resin , polyarylate resins, melamine resins, polyamide resins, polyimide resins, cellulose resins, polystyrene resins, nor-alene resins, etc. A polymer film can be used individually or in combination of 2 or more types. From the viewpoints of transparency, heat resistance, mechanical strength, etc., an olefin resin is preferable, and COP is more preferable. From the viewpoint of mechanical strength, scratch resistance, dot characteristics of the touch panel film 1a, etc., the thickness of the transparent substrate 2 is, for example, 2 μm or more, preferably 20 μm or more, and, for example, 300 μm or less, relatively Preferably, it is 150 μm or less. The thickness of the transparent substrate 2 can be measured, for example, using a micrometer-type thickness gauge. Furthermore, an easy-bonding layer, an adhesive layer, etc. may be provided on the upper surface and/or the lower surface of the transparent substrate 2 as needed. (First hard coat layer) The first hard coat layer 3 is a scratch protection layer for making the transparent conductive film 1 less likely to be scratched. The 1st hard-coat layer 3 has a film shape, and is arrange|positioned on the whole upper surface of the transparent base material 2 so that it may contact the upper surface of the transparent base material 2, for example. More specifically, the first hard coat layer 3 is disposed between the transparent substrate 2 and the first optical adjustment layer 4 so as to be in contact with the upper surface of the transparent substrate 2 and the lower surface of the first optical adjustment layer 4 . The first hard coat layer 3 is formed of, for example, a hard coat composition. The hard-coat composition of the 1st hard-coat layer 3 contains resin, Preferably it consists only of resin. As resin, curable resin, thermoplastic resin (for example, polyolefin resin) etc. are mentioned, for example, Preferably curable resin is mentioned. Examples of curable resins include active energy ray curable resins cured by irradiation of active energy rays (specifically, ultraviolet rays, electron beams, etc.), thermosetting resins cured by heating, etc. Preferably, an active energy ray-curable resin is used. The active energy ray curable resin includes, for example, a polymer having a functional group having a polymerizable carbon-carbon double bond in the molecule. As such a functional group, a vinyl group, (meth)acryl group (methacryl group and/or acryl group), etc. are mentioned, for example. Specific examples of the active energy ray curable resin include (meth)acrylic ultraviolet curable resins such as urethane acrylate and epoxy acrylate. Moreover, examples of curable resins other than active energy ray curable resins include thermosetting resins such as urethane resins, melamine resins, alkyd resins, siloxane-based polymers, and organosilane condensates. Resin can be used individually or in combination of 2 or more types. The hardcoat composition may contain particles. Thereby, the first hard coat layer 3 can be made into an anti-adhesion layer with anti-adhesion properties. Examples of the particles include inorganic particles, organic particles, and the like. Examples of the inorganic particles include silica particles, metal oxide particles such as zirconia, titanium oxide, zinc oxide, tin oxide, etc., carbonate particles such as calcium carbonate, and the like. As an organic particle, crosslinked acrylic resin particle etc. are mentioned, for example. The particles may be used alone or in combination of two or more. Moreover, well-known additives, such as a leveling agent, a thixotropic agent, and an antistatic agent, may be contained further in a hard-coat composition. The refractive index of the first hard coat layer 3 is, for example, 1.40 or more, preferably 1.45 or more, and, for example, less than 1.60, preferably 1.55 or less. If the first hard coat layer 3 is in the above range, the refractive index of the first hard coat layer 3 can be made lower than the refractive index of the first optical adjustment layer 4, and the visibility of the electrode pattern can be further suppressed. The refractive index of the hard coat layer (the first hard coat layer 3 and the second hard coat layer 6 ) can be measured, for example, using a spectroscopic ellipsometer. From the viewpoint of scratch resistance and suppression of visibility of electrode patterns, the thickness of the first hard coat layer 3 is, for example, 0.1 μm or more, preferably 0.5 μm or more, and for example, 10 μm or less, preferably 5 μm or less . The thickness of the hard coat layer (the first hard coat layer 3 and the second hard coat layer 6 ) can be calculated based on the waveform of the interference spectrum using an instantaneous multi-channel photometry system ("MCPD2000" manufactured by Otsuka Electronics Co., Ltd.). (First Optical Adjustment Layer) The first optical adjustment layer 4 is to suppress the visibility of the pattern (such as an electrode pattern) when the first transparent conductive layer 5 is patterned, and to ensure excellent transparency of the transparent conductive film 1 , and adjust the optical properties (such as refractive index) of the transparent conductive film 1 layer. The first optical adjustment layer 4 has a film shape, and is arranged, for example, on the entire upper surface of the first hard coat layer 3 so as to be in contact with the upper surface of the first hard coat layer 3 . More specifically, the first optical adjustment layer 4 is disposed on the first hard coat layer 3 and the first transparent conductive layer so as to be in contact with the upper surface of the first hard coat layer 3 and the lower surface of the first transparent conductive layer 5. between 5. The first optical adjustment layer 4 is formed of an optical adjustment composition. The optical adjustment composition contains, for example, a resin. The optical adjustment composition preferably contains resin and particles, more preferably consists only of resin and particles. It does not specifically limit as resin, The thing similar to the resin used for a hard-coat composition is mentioned. Resin can be used individually or in combination of 2 or more types. Preferably, a curable resin is used, and more preferably an active energy ray-curable resin is used. The content ratio of the resin is, for example, 10% by mass or more, preferably 25% by mass or more, and, for example, 95% by mass or less, preferably 60% by mass or less with respect to the optical adjustment composition. As the particles, an appropriate material can be selected according to the refractive index required for the first optical adjustment layer 4 , and examples thereof include inorganic particles, organic particles, and the like. Examples of the inorganic particles include silica particles, metal oxide particles such as zirconia, titanium oxide, zinc oxide, oxide, and the like, carbonate particles such as calcium carbonate, and the like. As an organic particle, crosslinked acrylic resin particle etc. are mentioned, for example. The particles may be used alone or in combination of two or more. As the particles, inorganic particles are preferable, metal oxide particles are more preferable, and zirconia particles (ZnO ₂ ) are still more preferable. The average particle diameter (median diameter) of the particles is, for example, 10 nm or more, preferably 20 nm or more, and, for example, 100 nm or less, preferably 50 nm or less. The content ratio of the particles is, for example, 5% by mass or more, preferably 40% by mass or more, and, for example, 90% by mass or less, preferably 75% by mass or less with respect to the optical adjustment composition. The refractive index of the first optical adjustment layer 4 is higher than that of the second optical adjustment layer 7 , for example, not less than 1.65, preferably not less than 1.70. Also, the upper limit is, for example, 1.80 or less, preferably 1.75 or less. If the refractive index of the first optical adjustment layer 4 is in the above-mentioned range, the light transmittance of the transparent conductive film 1 can be further improved. The refractive index of the optical adjustment layer (the first optical adjustment layer 4 and the second optical constituent layer 7 ) can be measured, for example, using a spectroscopic ellipsometer. The thickness of the first optical adjustment layer 4 is, for example, 150 nm or less, preferably 100 nm or less, more preferably 85 nm or less, and for example, 10 nm or more, preferably 20 nm or more. When the thickness of the first optical adjustment layer 4 is not more than the above-mentioned upper limit, the hue (in particular, the color space of La ^* b ^* ) of the transparent conductive film 1 can be more reliably made neutral. That is, the coloring (for example, yellow) of the transparent conductive film 1 can be reduced, and the colorless and transparent transparent conductive film 1 can be obtained reliably. The thickness of the optical adjustment layer (the first optical adjustment layer 4 and the second optical adjustment layer 7 ) can be calculated based on the waveform of the interference spectrum using, for example, an instantaneous multi-channel photometry system ("MCPD2000" manufactured by Otsuka Electronics Co., Ltd.). (First transparent conductive layer) The first transparent conductive layer 5 is a transparent conductive layer for forming a specific pattern (such as an electrode pattern) in subsequent steps such as etching. The first transparent conductive layer 5 is the uppermost layer of the transparent conductive film 1 , has a film shape, and is arranged on the entire upper surface of the first optical adjustment layer 4 so as to be in contact with the upper surface of the first optical adjustment layer 4 . As the material of the first transparent conductive layer 5, for example, a material selected from the group consisting of In, Sn, Zn, Ga, Sb, Ti, Si, Zr, Mg, Al, Au, Ag, Cu, Pd, and W can be cited. Metal oxides of at least one metal. It is also possible to further dope metal atoms shown in the above-mentioned groups in the metal oxide as needed. The material of the first transparent conductive layer 5 is preferably an indium-containing oxide such as indium-tin composite oxide (ITO), an antimony-containing oxide such as antimony-tin composite oxide (ATO), etc. The oxide containing indium is more preferably ITO. Thereby, the first transparent conductive layer 5 can have both excellent transparency and conductivity. When using ITO as the material of the first transparent conductive layer 5, the content of tin oxide (SnO ₂ ) relative to the total amount of tin oxide and indium oxide (In ₂ O ₃ ) is, for example, 0.5% by mass or more, preferably 3 mass % or more, and, for example, 15 mass % or less, preferably 13 mass % or less. "ITO" should just be a composite oxide containing at least indium (In) and tin (Sn), and may contain additional components other than these. Examples of additional components include metal elements other than In and Sn. Specifically, Zn, Ga, Sb, Ti, Si, Zr, Mg, Al, Au, Ag, Cu, Pd, W, Fe, Pb, Ni, Nb, Cr, Ga, etc. The first transparent conductive layer 5 may be either crystalline or amorphous. The first transparent conductive layer 5 preferably includes a crystalline substance, and more specifically, is a crystalline ITO layer. Thereby, the transparency of the first transparent conductive layer 5 can be improved, and the surface resistance value of the first transparent conductive layer 5 can be further reduced. Regarding the transparent conductive layer (the first transparent conductive layer 5 and the second transparent conductive layer 8) being crystalline, for example, when the transparent conductive layer is an ITO layer, it can be dipped in hydrochloric acid (concentration: 5% by mass) at 20°C. After 15 minutes, wash with water, dry, and measure the resistance between terminals at a distance of about 15 mm. Specifically, after immersion in hydrochloric acid (20° C., concentration: 5% by mass), washing with water, and drying, the ITO layer was judged to be crystalline when the inter-terminal resistance of 15 mm was 10 kΩ or less. The surface resistance value of the 1st transparent conductive layer 5 is lower than the surface resistance value of the 2nd transparent conductive layer 8, Specifically, it is 10 Ω/□ or more and 70 Ω/□ or less. It is preferably at least 20 Ω/□, more preferably at least 30 Ω/□, and more preferably at most 60 Ω/□, more preferably at most 50 Ω/□. If the surface resistance value of the first transparent conductive layer 5 is in the above-mentioned range, the transparent conductive film 1 can exhibit excellent electromagnetic wave shielding property and conductivity. The surface resistance value of the transparent conductive layer (the 1st transparent conductive layer 5 and the 2nd transparent conductive layer 8) can be measured using the four-probe method, for example. The thickness of the first transparent conductive layer 5 is preferably thicker than the thickness of the second transparent conductive layer 8, such as more than 30 nm, preferably more than 35 nm, and, for example, less than 200 nm, preferably less than 100 nm, More preferably, it is less than 60 nm. If the thickness of the 1st transparent conductive layer 5 is the said range, the electromagnetic wave shielding property of the transparent conductive film 1 can be made more favorable. The thickness of the transparent conductive layer (the first transparent conductive layer 5 and the second transparent conductive layer 8 ) can be measured, for example, by observing the cross section of the transparent conductive layer with a transmission electron microscope (TEM). (Second Hard Coat Layer) The second hard coat layer 6 is a scratch protection layer for making the transparent conductive film 1 less likely to be scratched. The second hard coat layer 6 has a film shape, and is arranged, for example, on the entire lower surface of the transparent substrate 2 so as to be in contact with the lower surface of the transparent substrate 2 . More specifically, the second hard coat layer 6 is disposed between the transparent substrate 2 and the second optical adjustment layer 7 so as to be in contact with the lower surface of the transparent substrate 2 and the upper surface of the second optical adjustment layer 7 . The second hard coat layer 6 is the same layer as the first hard coat layer 3, for example, is made of the same material as the first hard coat layer 3, and has the same configuration (thickness, refractive index, etc.). Therefore, the second hard coat layer 6 also has the same shape and the same size as the first hard coat layer 3 . (Second Optical Adjustment Layer) The second optical adjustment layer 7 is to suppress the visibility of the pattern (such as an electrode pattern) when the second transparent conductive layer 8 is patterned, and to ensure excellent transparency of the transparent conductive film 1, It is a layer for adjusting the optical properties (for example, refractive index) of the transparent conductive film 1 . The second optical adjustment layer 7 has a film shape, and is arranged, for example, on the entire lower surface of the second hard coat layer 6 so as to be in contact with the lower surface of the second hard coat layer 6 . More specifically, the second optical adjustment layer 7 is disposed on the second hard coat layer 6 and the second transparent conductive layer so as to be in contact with the lower surface of the second hard coat layer 6 and the upper surface of the second transparent conductive layer 8. between 8. The second optical adjustment layer 7 is formed of an optical adjustment composition. Examples of the optical adjustment composition include the same ones as those described above for the first optical adjustment layer 4 . The refractive index of the second optical adjustment layer 7 is lower than that of the first optical adjustment layer 4 , for example, 1.70 or less, preferably less than 1.65, and more preferably 1.64 or less. Also, the lower limit is, for example, 1.55 or more, preferably 1.60 or more. If the refractive index of the second optical adjustment layer 7 is within the above range, the light transmittance of the transparent conductive film 1 can be further improved. The difference in refractive index between the second optical adjustment layer 7 and the first optical adjustment layer 4 is, for example, 0.01 or more, preferably 0.05 or more, and for example, 0.20 or less, preferably 0.15 or less. When the difference in refractive index is within the above range, the transparency of the transparent conductive film 1 can be made favorable, or the hue can be made neutral. The thickness of the second optical adjustment layer 7 is, for example, 150 nm or less, preferably 100 nm or less, more preferably 85 nm or less, and for example, 10 nm or more, preferably 20 nm or more. When the thickness of the second optical adjustment layer 7 is not more than the above-mentioned upper limit, the hue can be more reliably made neutral. (Second Transparent Conductive Layer) The second transparent conductive layer 8 is a transparent conductive layer for forming a specific pattern (such as an electrode pattern) in subsequent steps such as etching. The second transparent conductive layer 8 is the lowermost layer of the transparent conductive film 1 , has a film shape, and is arranged on the entire lower surface of the second optical adjustment layer 7 so as to be in contact with the lower surface of the second optical adjustment layer 7 . As a material which comprises the 2nd transparent conductive layer 8, what was mentioned above in the 1st transparent conductive layer 5 is mentioned. Preferably it is ITO. In addition, the second transparent conductive layer 8 may be either crystalline or amorphous, preferably includes crystalline, and more specifically, is a crystalline ITO layer. The surface resistance value of the 2nd transparent conductive layer 8 is higher than the surface resistance value of the 1st transparent conductive layer 5, Specifically, it is 50 Ω/□ or more and 150 Ω/□ or less. It is preferably at least 60 Ω/□, more preferably at least 70 Ω/□, further preferably at least 100 Ω/□, and more preferably at most 120 Ω/□. If the surface resistance value of the second transparent conductive layer 8 is within the above-mentioned range, the thickness of the second transparent conductive layer 8 can be reduced, and the light transmittance of the transparent conductive film 1 can be improved. The difference between the surface resistance values of the first transparent conductive layer 5 and the second transparent conductive layer 8 is, for example, more than 10 Ω/□, preferably more than 20 Ω/□, more preferably more than 40 Ω/□, and, for example, 100 Ω/□ Ω/□ or less, preferably 70 Ω/□ or less. The thickness of the second transparent conductive layer 8 is preferably thinner than that of the first transparent conductive layer 5, such as 35 nm or less, preferably 30 nm or less, and, for example, 1 nm or more, preferably 10 nm or more. If the thickness of the 2nd transparent conductive layer 8 is the said range, the light transmittance of the transparent conductive film 1 can be made more favorable. 2. Manufacturing method of transparent conductive film When manufacturing transparent conductive film 1, at first, prepare transparent base material 2, then, set hard coat layer (the first hard coat layer 3 and the first hard coat layer 3 and the 2 hard coat layer 6), optical adjustment layer (first optical adjustment layer 4 and second optical adjustment layer 7) and transparent conductive layer (first transparent conductive layer 5 and second transparent conductive layer 8). For example, first, a diluent obtained by diluting the hard coat composition forming the first hard coat layer 3 or the second hard coat layer 6 with a solvent is prepared. Next, this diluted solution is applied to the upper surface or the lower surface of the transparent substrate 2, each diluted solution is dried, and the hard coat composition is cured as necessary. Thereby, the first hard coat layer 3 is provided on the upper surface of the transparent substrate 2 , and the second hard coat layer 6 is provided on the lower surface of the transparent substrate 2 . Next, a diluted solution obtained by diluting the optical adjustment composition forming the first optical adjustment layer 4 or the second optical adjustment layer 7 with a solvent is prepared. Next, this diluted solution is applied on the upper surface of the first hard coat layer 3 or the lower surface of the second hard coat layer 6, and each diluted solution is dried, and the optical adjustment composition is cured as necessary. Thereby, the first optical adjustment layer 4 is provided on the upper surface of the first hard coat layer 3 , and the second optical adjustment layer 7 is provided on the lower surface of the second hard coat layer 6 . That is, a laminate of the second optical adjustment layer 7/second hard coat layer 6/transparent base material 2/first hard coat layer 3/first optical adjustment layer 4 was obtained. Then, the first transparent conductive layer 5 and the second transparent conductive layer 8 were sequentially formed on both surfaces of the above-mentioned laminate by a dry method. As a dry method, a vacuum evaporation method, a sputtering method, an ion plating method, etc. are mentioned, for example. Preferably, a sputtering method is used. A transparent conductive layer of a thin film can be formed by this method. As a sputtering method, a bipolar sputtering method, an ECR (Electron Cyclotron Resonance, electron cyclotron resonance) sputtering method, a magnetron sputtering method, an ion beam sputtering method, etc. are mentioned, for example. Preferably, a magnetron sputtering method is mentioned. When employing a sputtering method, as a target material, the said metal oxide etc. which comprise a transparent conductive layer are mentioned, Preferably ITO is mentioned. From the viewpoint of the durability and crystallization of the ITO layer, the tin oxide concentration of the ITO is, for example, 0.5% by mass or more, preferably 3% by mass or more, and, for example, 15% by mass or less, preferably 13% by mass or less . As gas, inert gas, such as Ar, is mentioned, for example. Moreover, reactive gas, such as oxygen, can be used together as needed. When using a reactive gas together, the flow ratio (sccm) of the reactive gas is not particularly limited, but is, for example, 0.1 flow % or more and 5 flow % or less with respect to the total flow ratio of the sputtering gas and the reactive gas. The gas pressure during sputtering is, for example, 1 Pa or less, preferably 0.1 Pa or more and 0.7 Pa or less, from the viewpoints of suppressing a decrease in the sputtering ratio and discharging stability. For example, the power supply can be any one of DC (Direct Current, direct current) power supply, AC (Alternating Current, alternating current) power supply, MF (Middle Frequency, intermediate frequency) power supply and RF (Radio Frequency, radio frequency) power supply, and can also be the etc. combination. At this time, for example, by individually adjusting the thicknesses of the first transparent conductive layer 5 and the second transparent conductive layer 8 provided in the laminate, the surface resistance value of each transparent conductive layer can be adjusted. That is, by increasing the thickness of the transparent conductive layer, its surface resistance value can be reduced, and conversely, by reducing the thickness of the transparent conductive layer, its surface resistance value can be increased. In the present invention, it is preferable to adjust the formation of each transparent conductive layer so that the thickness of the second transparent conductive layer 8 is thinner than the thickness of the first transparent conductive layer 5 . In this way, the second transparent conductive layer 8, the second optical adjustment layer 7, the second hard coat layer 6, the transparent substrate 2, the first hard coat layer 3, the first optical adjustment layer 4 and the first The transparent conductive film 1 of the transparent conductive layer 5 . If necessary, heat processing is then given to the transparent conductive film 1 in the atmosphere. Heat processing can be implemented using an infrared heater, an oven, etc., for example. The heating temperature is, for example, 100°C or higher, preferably 120°C or higher, and, for example, 200°C or lower, preferably 160°C or lower. The heating time is appropriately determined according to the heating temperature, and is, for example, 10 minutes or more, preferably 30 minutes or more, and, for example, 5 hours or less, preferably 3 hours or less. By this heat treatment, each transparent conductive layer can be crystallized, and can be set to a desired surface resistance value. In addition, in this production method, each layer may be provided on the transparent substrate 2 by, for example, a roll-to-roll method, or a part or all of these layers may be provided by a batch method (sheet-by-sheet method). The light transmittance (perceptual average transmittance) of the transparent conductive film 1 is, for example, 86.0% or more, preferably 86.5% or more. When the light transmittance is within the above-mentioned range, a transparent transparent conductive film 1 can be reliably obtained. The hue La* of the transparent conductive film 1 is, for example, not less than -1.5, preferably not less than -1.0, and, for example, is preferably not more than 1.5, preferably not more than 0.5. The hue Lb* is, for example, -4.0 or more, preferably -0.5 or more, and, for example, is preferably 4.0 or less, preferably 1.0 or less. When the hue is within the above-mentioned range, a colorless and transparent transparent conductive film 1 can be obtained reliably. The transparent conductive film 1 can be used, for example, as a film for touch panels of optical systems, ultrasonic systems, capacitive systems, resistive film systems, and the like. In particular, it can be preferably used as a film for a touch panel of a capacitive type (specifically, a projected type capacitive type). 3. Film for touch panels Next, the film 1a for touch panels which is one embodiment of the transparent conductive film 1 is demonstrated. As shown in FIG. 2, the film 1a for a touch panel includes: a transparent base material 2, a first hard coat layer 3 disposed on the upper surface of the transparent base material 2, and a first hard coat layer disposed on the upper surface of the first hard coat layer 3. The optical adjustment layer 4, the patterned first transparent conductive layer 5a arranged on the upper surface of the first optical adjustment layer 4, the second hard coat layer 6 arranged on the lower surface of the transparent substrate 2, and the second hard coat layer arranged on the second hard coat layer 6, the second optical adjustment layer 7 on the lower surface, and the patterned second transparent conductive layer 8a disposed on the lower surface of the second optical adjustment layer 7. That is, the transparent conductive film 1 includes in order from the bottom: a patterned second transparent conductive layer 8a, a second optical adjustment layer 7, a second hard coat layer 6, a transparent substrate 2, a first hard coat layer 3, a first The optical adjustment layer 4, and the patterned first transparent conductive layer 5a. The touch panel film 1a preferably includes a patterned second transparent conductive layer 8a, a second optical adjustment layer 7, a second hard coat layer 6, a transparent substrate 2, a first hard coat layer 3, and a first optical adjustment layer. 4 and patterning the first transparent conductive layer 5a. As shown in FIGS. 3A to 3B , the touch panel film 1a has a substantially rectangular shape in plan view that is long in the left-right direction (one direction, long-side direction) and short in the front-back direction (the other direction, short-side direction). shape. The touch panel film 1a is a patterned transparent conductive film obtained by patterning the transparent conductive layer (the first transparent conductive layer 5 and the second transparent conductive layer 8 ) of the above-mentioned transparent conductive film 1 . Therefore, the second optical adjustment layer 7, the second hard coat layer 6, the transparent substrate 2, the first hard coat layer 3, and the first optical adjustment layer 4 of the film 1a for a touch panel, and the above-mentioned transparent conductive film 1 The layers are the same. As shown in FIG. 3A , the patterned first transparent conductive layer 5 a has, as an example of the first pattern, a first rectangular pattern 11 extending long in the left-right direction in a substantially central portion in plan view. Specifically, the first patterned transparent conductive layer 5 a includes a plurality of first rectangular patterns 11 arranged at intervals in the front-rear direction. Moreover, the wiring 12 for electrically connecting the first rectangular pattern 11 to an integrated circuit (not shown) is integrally connected to the right end of the first rectangular pattern 11 . The patterned second transparent conductive layer 8a, as shown in FIG. 3B, has a second rectangular pattern 13 extending long in the front-back direction (orthogonal direction perpendicular to the left-right direction) as a second pattern in the substantially central portion in a bottom view. an example. Specifically, the second patterned transparent conductive layer 8 a includes a plurality of second rectangular patterns 13 arranged at intervals in the left-right direction. Moreover, the wiring 12 for electrically connecting the second rectangular pattern 13 to an integrated circuit (not shown) is integrally connected to the front end or the rear end. The first rectangular pattern 11 of the patterned first transparent conductive layer 5a and the second rectangular pattern 13 of the patterned second transparent conductive layer 8a are arranged so as to be orthogonal to each other when projected in the thickness direction (vertical direction). The left-right length (long side length) of the first rectangular pattern 11 of the patterned first transparent conductive layer 5a is longer than the front-back length (long side length) of the second rectangular pattern 13 of the patterned second transparent conductive layer 8a. Thereby, the surface resistance value of the patterned first transparent conductive layer 5a which has a long moving distance of current can be reduced, so the transmission speed of the current of the patterned first transparent conductive layer 5a can be increased, or noise can be reduced. As a result, the image display device 20 can be increased in size. As a patterning method, it implements by covering each transparent conductive layer with the mask for forming an electrode pattern, and etching each transparent conductive layer with etchant, for example. As the etchant, an acid is preferably used. Examples of the acid include inorganic acids such as hydrogen chloride, hydrogen bromide, sulfuric acid, nitric acid, and phosphoric acid, organic acids such as acetic acid, mixtures thereof, and aqueous solutions thereof. 4. Effects The transparent conductive film 1 is provided with the first transparent conductive layer 5, the first optical adjustment layer 4, the transparent substrate 2, the second optical adjustment layer 7 and the second transparent conductive layer 8 in sequence, so in the first When the transparent conductive layer 5 and the second transparent conductive layer 8 are patterned, the visibility of the patterned first transparent conductive layer 5 a and the patterned second transparent conductive layer 8 a (for example, an electrode pattern) can be suppressed. Moreover, the surface resistance value of the first transparent conductive layer 5 is not less than 10 Ω/□ and not more than 70 Ω/□, so the transparent conductive film 1 has the first transparent conductive layer 5 with a small surface resistance value on one side. Therefore, compared with the transparent conductive film having transparent conductive layers with higher surface resistance values on both sides, the transparent conductive film 1 can exhibit relatively good electromagnetic wave shielding property. Again, the surface resistance value of the 2nd transparent conductive layer 8 is greater than the surface resistance value of the 1st transparent conductive layer 5, is more than 50 Ω/□ and below 150 Ω/□, so the 2nd transparent conductive layer 8 can be connected with the first transparent conductive layer The conductive layer 5 is relatively thinner than that. In addition, the refractive index of the second optical adjustment layer 7 is lower than the refractive index of the first optical adjustment layer 4 . The light transmittance of the transparent conductive film 1 can be improved by these surface resistance values and refractive index. Also, in the film 1a for a touch panel in which each transparent conductive layer of the transparent conductive film 1 is patterned, the patterned first transparent conductive layer 5a has a first rectangular pattern 11 that is long in the left-right direction, and the pattern The second transparent conductive layer 8a has a second rectangular pattern 13 that is long in the front-rear direction. Moreover, the length of the left-right direction of the 1st rectangular pattern 11 is longer than the length of the front-back direction of the said 2nd pattern. Therefore, the surface resistance value of the patterned first transparent conductive layer 5a which has a relatively long moving distance of current can be reduced, so that the transmission speed of the current of the patterned first transparent conductive layer 5a can be increased, or noise can be reduced. As a result, the improvement of the current velocity and the reduction of noise can be achieved as a whole of the transparent conductive film 1 , so that the size of the image display device 20 can be increased. <Image Display Device> Next, one embodiment of the image display device 20 will be described. One embodiment of an image display device 20 is shown in FIG. 4 , and includes in order: a transparent protective plate 21, a first transparent adhesive layer 22, a film 1a for a touch panel, a second transparent adhesive layer 23, and an image display device. Display element 24. In addition, in FIG. 4, the upper side is an element side, and the lower side is a viewing side. The transparent protective plate 21 is a layer for protecting the internal components of the image display device 20 such as the image display element 24 from external impact and dirt. As the transparent protective plate 21 , for example, a resin plate made of hard resins such as acrylic resin and polycarbonate resin, a glass plate, or the like can be mentioned, for example. The thickness of the transparent protective plate 21 is, for example, 10 μm or more, preferably 500 μm or more, and, for example, 10 mm or less, more preferably 5 mm or less. The 1st transparent adhesive layer 22 is a layer for bonding the transparent protective plate 21 and the film 1a for touch panels. The first transparent adhesive layer 22 has a film shape and is disposed on the transparent protective plate 21 . More specifically, the first transparent adhesive layer 22 is arranged on the transparent protective plate 21 so as to be in contact with the upper surface of the transparent protective plate 21 and the lower surface (patterned second transparent conductive layer 8a) of the touch panel film 1a. And between the film 1a for touch panels. The first transparent adhesive layer 22 is formed of a transparent adhesive composition. The composition of the adhesive composition is not limited, and examples include: acrylic adhesives, rubber adhesives (butyl rubber, etc.), silicone adhesives, polyester adhesives, polyurethane adhesives, etc. Adhesives, polyamide-based adhesives, epoxy-based adhesives, vinyl alkyl ether-based adhesives, fluororesin-based adhesives, etc. The thickness of the first transparent adhesive layer 22 (the distance from the upper surface of the transparent protective plate 21 to the lower surface of the patterned second transparent conductive 8a) is, for example, more than 1 μm, preferably more than 5 μm, and, for example, 300 μm or less, preferably 150 μm or less, more preferably 50 μm or less. The film 1a for touch panels is arrange|positioned on the 1st transparent adhesive agent layer 22 so that the patterned 1st transparent conductive layer 5a may be located on the upper side, and the patterned 2nd transparent conductive layer 8a may be located on the lower side. More specifically, the touch panel film 1a is in such a manner that the patterned second transparent conductive layer 8a is in contact with the first transparent adhesive layer 22, and the patterned first transparent conductive layer 5a is in contact with the second transparent adhesive layer 23. It is arranged between the first transparent adhesive layer 22 and the second transparent adhesive layer 23 . Also, on the upper surface of the touch panel film 1a, the upper surface and side surfaces of the first rectangular pattern 11 of the patterned first transparent conductive layer 5a, and the first optical adjustment exposed from the patterned first transparent conductive layer 5a. The upper surface of the layer 4 is in contact with the first transparent adhesive layer 22 . On the lower surface of the touch panel film 1a, the lower surface and side surfaces of the second rectangular pattern 13 of the patterned transparent conductive layer 28a, and the second optical adjustment layer 7 exposed from the patterned second transparent conductive layer 8a The upper surface is in contact with the second transparent adhesive layer 23 . The 2nd transparent adhesive layer 23 is a layer for bonding the image display element 24 and the film 1a for touch panels. The 2nd transparent adhesive layer 23 has a film shape, and is arrange|positioned on the film 1a for touch panels. More specifically, the second transparent adhesive layer 23 is disposed on the touch panel film 1a and the image display element 24 so as to be in contact with the upper surface of the touch panel film 1a and the lower surface of the image display element 24 between. The second transparent adhesive layer 23 is formed of the same adhesive composition as that of the first transparent adhesive layer 22 . The thickness of the second transparent adhesive layer 23 is the same as that of the first transparent adhesive layer 22 . The image display element 24 is disposed on the second transparent adhesive layer 23 . More specifically, the image display element 24 is arranged on the second transparent adhesive layer 23 so that the image display surface 25 is on the lower side, and the image display surface 25 is in contact with the upper surface of the second transparent adhesive layer 23 above the surface. As the image display element 24, a liquid crystal cell, an organic EL, etc. are mentioned, for example. Since the image display device 20 includes the film 1a for a touch panel, it has an electromagnetic wave shielding effect, suppresses the visibility of the patterned first transparent conductive layer 5a and the patterned second transparent conductive layer 8a (electrode pattern), and has a good Translucency. Therefore, it is possible to increase the size of the screen. Moreover, in the image display device 20, the image display element 24 is arrange|positioned at the side (upper side) of the patterned 1st transparent conductive layer 5a. Therefore, the distance between the patterned first transparent conductive layer 5 a (first transparent conductive layer 5 ) having a strong electromagnetic wave shielding effect and the image display element 24 that generates electromagnetic waves can be shortened. Therefore, the electromagnetic wave of the image display element 24 can be absorbed more reliably, and the electromagnetic wave shielding effect as the image display device 20 is excellent. <Modifications> (1) In the embodiment shown in FIG. 1 , the transparent conductive film 1 is provided in order from the bottom: a second transparent conductive layer 8 , a second optical adjustment layer 7 , a second hard coat layer 6 , a transparent The substrate 2, the first hard coat layer 3, the first optical adjustment layer 4, and the first transparent conductive layer 5 may not be provided with the second hard coat layer 6 and the first hard coat layer 3, for example, but are not shown in the figure. That is, the transparent conductive film 1 includes the second transparent conductive layer 8 , the second optical adjustment layer 7 , the transparent substrate 2 , the first optical adjustment layer 4 , and the first transparent conductive layer 5 in order from the bottom. From the viewpoint of abrasion resistance, the embodiment shown in FIG. 1 is preferable. Also about the film 1a for touch panels, and the image display device 20, it is the same as above. (2) In the embodiment shown in FIGS. 3A-B , the patterned first transparent conductive layer 5a has a first rectangular pattern 11 that is long in the left-right direction, and the patterned second transparent conductive layer 8a is provided in the front-back direction. The second rectangular pattern 13 is longer, but for example, the patterned second transparent conductive layer 8a can also be provided with the first rectangular pattern 11 longer in the left-right direction, and the patterned first transparent conductive layer 5a is provided in the front-rear direction. The longer second rectangular pattern 13 is not shown. In this embodiment, the length in the left-right direction of the first rectangular pattern 11 of the patterned second transparent conductive layer 8a is longer than the length in the front-back direction of the second rectangular pattern 13 of the patterned first transparent conductive layer 5a. From the viewpoint of increasing the current velocity and noise of the transparent conductive layer with a long electrode pattern length, it is preferable to enumerate the embodiments shown in FIGS. 3A-B . (3) In the embodiment shown in FIGS. 3A to B , as an example of the first pattern, a first rectangular pattern 11 extending in the left-right direction is provided, and as an example of the second pattern, it is provided in the front-rear direction. The extended second rectangular pattern 13, but for example, as shown in Fig. 5A-B, as an example of the first pattern, it can be set as the first continuous rectangular pattern 14 in which a plurality of rectangular patterns are continuous in the left and right direction, as the first continuous rectangular pattern 14. An example of the two patterns is a second continuous rectangular pattern 15 in which a plurality of rectangular patterns are continuous in the front-rear direction. That is, in the embodiment shown in FIGS. 5A-B , the patterned first transparent conductive layer 5a has a plurality of first continuous rectangular patterns 14 arranged at intervals in the left-right direction. In the first continuous rectangular pattern 14, a plurality of substantially rectangular patterns are arranged on a straight line such that the diagonal lines of these are along the left-right direction. The patterned second transparent conductive layer 8a has a plurality of second continuous rectangular patterns 15 arranged at intervals in the front-rear direction. In the second continuous rectangular pattern 15, a plurality of substantially rectangular patterns are arranged on a straight line such that the diagonal lines of these are along the front-back direction. The first continuous rectangular pattern 14 of the patterned first transparent conductive layer 5a and the second continuous rectangular pattern 15 of the patterned second transparent conductive layer 8a are arranged so as to be orthogonal to each other when projected in the thickness direction. Also, the first continuous rectangular pattern 14 and the second continuous rectangular pattern 15 are such that the rectangular pattern constituting the first continuous rectangular pattern 14 does not overlap with the rectangular pattern constituting the second continuous rectangular pattern 15 when projected in the thickness direction. Configured in a repeating pattern. Moreover, the first continuous rectangular pattern 14 and the second continuous rectangular pattern 15 cover the film for a touch panel with a pattern in which the first continuous rectangular pattern 14 and the second continuous rectangular pattern 15 are combined when projected in the thickness direction. The entire surface of the substantially central part of 1a is arranged. (4) In the image display device 20 shown in FIG. 4 , the touch panel film 1a and the image display element 24 are arranged so that the image display element 24 is located on the side of the patterned first transparent conductive layer 5a, but For example, the film 1a for touch panels and the image display element 24 may be arrange|positioned so that the image display element 24 may be located in the patterned 2nd transparent conductive layer 8a side, but it is not shown in figure. That is, the image display device 20 may also be provided with the patterned first transparent conductive layer 5a as the lower side and the patterned second transparent conductive layer 8a as the upper side, and sequentially includes: the transparent protective plate 21, the first transparent adhesive The agent layer 22, the film 1a for touch panels, the 2nd transparent adhesive layer 23, and the image display element 24. From the viewpoint of the electromagnetic wave shielding effect of the image display device 20 as a whole, it is preferable to use the embodiment shown in FIG. 4 . EXAMPLES Hereafter, an Example and a comparative example are shown, and this invention is demonstrated concretely. In addition, this invention is not limited by any Example and a comparative example. In addition, specific numerical values such as the compounding ratio (content ratio), physical property values, and parameters used in the following descriptions can be replaced by the corresponding compounding ratios (content ratios) and physical property values described in the above-mentioned "embodiments" The upper limit value (defined as the value of "below" or "less than") or the lower limit value (defined as the value of "above" or "exceeding") of the corresponding records of parameters, parameters, etc. (Example 1) A diluent of a hard coat composition (acrylic ultraviolet curable resin, "UNIDIC RS29-120" manufactured by DIC Corporation) was coated on a transparent substrate (COP film, Zeon Japan) using a gravure coater. The product name "ZEONOR ZF-16" manufactured by the company, both sides of the thickness of 100 μm), was heated and dried at 80°C for 1 minute. Thereafter, ultraviolet rays were irradiated using a high-pressure mercury lamp to form first and second hard coat layers (each having a thickness of 1.0 μm and each having a refractive index of 1.53). Thereby, the laminated body of a 1st hard-coat layer, a transparent base material, and a 2nd hard-coat layer was obtained. Next, a dilute solution of the optical adjustment composition having a refractive index of 1.70 was applied to the surface of the first hard coat layer of the laminate using a gravure coater, and heat-dried at 60° C. for 1 minute. Thereafter, ultraviolet rays were irradiated with a high-pressure mercury lamp to form a first optical adjustment layer (refractive index: 1.70, thickness: 80 nm). Also, a second optical adjustment layer (refractive index 1.64, thickness 80 nm) was formed on the surface of the second hard coat layer in the same manner as above except that an optical adjustment composition having a refractive index of 1.64 was used. Thereby, a laminate of the first optical adjustment layer, the first hard coat layer, the transparent substrate, the second hard coat layer, and the first optical adjustment layer was obtained. Furthermore, each optical adjustment composition was prepared by mixing a refractive index adjuster with a refractive index of 1.60 ("Opstar" manufactured by JSR Corporation) and a refractive index adjuster with a refractive index of 1.74 ("Opstar-KZ6734" manufactured by JSR Corporation). Prepare by mixing. Then, the obtained laminate was put into a sputtering device, and an indium-tin oxide layer (ITO layer) was layered on both sides of the laminate. As the gas, a mixed gas containing 98% argon and 2% oxygen was used, and the pressure of the environment was set to 0.4 Pa. Moreover, as the target of sputtering, the sintered compact containing 90 mass % of indium oxides - 10 mass % of tin oxides was used. Also, the thickness of the first transparent conductive layer laminated on the first optical adjustment layer side was adjusted to 40 nm, and the thickness of the second transparent conductive layer laminated on the second optical adjustment layer side was adjusted to 30 nm. Thereby, a transparent conductive film comprising the first transparent conductive layer, the first optical adjustment layer, the first hard coat layer, the transparent substrate, the second hard coat layer, the first optical adjustment layer and the second transparent conductive layer was obtained. Next, by heating this transparent conductive film in an oven at 140° C. for 90 minutes, the first and second transparent conductive layers were crystallized, and the double-sided transparent conductive film of Example 1 was produced. (Examples 2-9 and Comparative Examples 1-5) The thickness and refractive index of the optical adjustment layer, and the thickness and surface resistance of the transparent conductive layer were changed to the thickness and refractive index of the optical adjustment layer recorded in Table 1, and Except for the thickness and surface resistance of the transparent conductive layer, a transparent conductive film was produced in the same manner as in Example 1. (Comparative example 6) Except not having provided the 1st optical adjustment layer and the 2nd optical adjustment layer, the transparent conductive film was manufactured by the method similar to Example 1. The following measurement was implemented about the transparent conductive film of each Example and each comparative example, and the result is shown in Table 1. <Surface resistance> Using the four-probe method, the surface resistance (Ω/□) of each transparent conductive layer of the transparent conductive film of each Example and each comparative example was measured. <Thickness of layer> The thickness of each hard coat layer and each optical adjustment layer was calculated based on the waveform from the interference spectrum using an instantaneous multi-channel photometry system ("MCPD2000" manufactured by Otsuka Electronics Co., Ltd.). The thickness of each transparent conductive layer was measured by observing the cut cross-sectional view of the transparent conductive film with a transmission electron microscope (TEM). <Refractive index> On a transparent film (COP film, "ZEONOR ZF-16" manufactured by ZEONOR Co., Ltd.), only a hard coat layer was formed as a measurement object, and a spectroscopic ellipsometer (model FQTH manufactured by JA Woollam Co., Ltd.) was used. -100) to measure the refractive index. Also, only the optical adjustment layer to be measured was formed on a transparent film (same as above), and the refractive index was measured using a spectroscopic ellipsometer (same as above). Furthermore, when the adhesiveness of a transparent film and a hard-coat layer or an optical adjustment layer is poor, surface modification, such as a corona treatment, is suitably performed. <Transmittance, Hue> On both sides of the transparent conductive film of each example and each comparative example, a transparent film (Japan "ZEONOR ZF-14" manufactured by ZEONOR, thickness 100 μm). In this way, a sample (transparent film/adhesive/transparent conductive film/adhesive/transparent film) for transmittance measurement was obtained. Using a spectrophotometer (model "Dot-3" manufactured by Murakami Color Co., Ltd.), the sensitivity average transmittance, and hue a* and b* at a wavelength of 380 to 700 nm were measured for the sample. The results are shown in Table 1. <Visibility of electrode pattern> In the transparent conductive film of each example and each comparative example, the first transparent conductive layer and the second transparent conductive layer were etched using an etchant to pattern the electrode patterns shown in FIGS. 3A-B . The patterned transparent conductive film is viewed from obliquely above. The case where the electrode pattern was clearly recognized was evaluated as x, and the case where the electrode pattern was hardly recognized was evaluated as ◯. Table 1 shows the results. [Table 1]

In addition, the above-mentioned invention is provided as an exemplary embodiment of the present invention, but it is only an illustration and should not be limitedly interpreted. Variations of the present invention that have been identified by persons in the technical field are included in the following patent claims. [Availability in production] The transparent conductive film and image display device of the present invention can be applied to various industrial products. For example, the transparent conductive film of the present invention can be preferably used in an image display device with a touch panel Wait.

1. Transparent conductive film 1a Layer 5a‧‧‧patterned first transparent conductive layer 6‧‧‧second hard coat layer 7‧‧‧second optical adjustment layer 8‧‧‧second transparent conductive layer 8a‧‧‧patterned second transparent conductive layer 11‧‧‧first rectangular pattern 12‧‧‧wiring 13‧‧‧second rectangular pattern 14‧‧‧first continuous rectangular pattern 15‧‧‧second continuous rectangular pattern 20‧‧‧image display Device 21‧‧‧transparent protective plate 22‧‧‧first transparent adhesive layer 23‧‧‧second transparent adhesive layer 24‧‧‧image display element 25‧‧‧image display surface

Fig. 1 shows a cross-sectional view of an embodiment of the transparent conductive film of the present invention. FIG. 2 shows a cross-sectional view of a film for a touch panel in which the transparent conductive film shown in FIG. 1 is patterned. 3A to 3B are films for touch panels shown in FIG. 3 . FIG. 3A shows a top view showing the electrode pattern of the first transparent conductive layer, and FIG. 3B shows a bottom view showing the electrode pattern of the second transparent conductive layer. FIG. 4 shows an image display device including the transparent conductive film shown in FIG. 2 . 5A to 5B are variations of the touch panel film of the present invention (the electrode pattern of the transparent conductive layer has a plurality of continuous rectangular patterns), and FIG. 5A shows a top view showing the electrode pattern of the first transparent conductive layer. FIG. 5B shows a bottom view showing the electrode pattern of the second transparent conductive layer.

1‧‧‧Transparent conductive film

2‧‧‧Transparent substrate

3‧‧‧1st hard coat

4‧‧‧The first optical adjustment layer

5‧‧‧The first transparent conductive layer

6‧‧‧Second Hard Coat

7‧‧‧The second optical adjustment layer

8‧‧‧The second transparent conductive layer

Claims (6)

A transparent conductive film, characterized in that it comprises a first transparent conductive layer, a first optical adjustment layer, a transparent substrate, a second optical adjustment layer and a second transparent conductive layer in sequence, and the surface resistance of the second transparent conductive layer is Greater than the surface resistance value of the above-mentioned first transparent conductive layer, the surface resistance value of the above-mentioned first transparent conductive layer is not less than 10 Ω/□ and not more than 70 Ω/□, and the surface resistance value of the above-mentioned second transparent conductive layer is 50 Ω/□ Above and below 150 Ω/□, and the refractive index of the second optical adjustment layer is lower than the refractive index of the first optical adjustment layer. The transparent conductive film according to claim 1, wherein the thickness of the second transparent conductive layer is thinner than the thickness of the first transparent conductive layer. The transparent conductive film according to claim 1, wherein the refractive index of the first optical adjustment layer is 1.65 to 1.75, and the refractive index of the second optical adjustment layer is 1.60 to 1.70. The transparent conductive film according to claim 1, wherein the thicknesses of the first optical adjustment layer and the second optical adjustment layer are both 100 nm or less. Such as the transparent conductive film of claim 1, wherein both the above-mentioned first transparent conductive layer and the above-mentioned second transparent conductive layer are patterned, the above-mentioned first transparent conductive layer has a first pattern that is longer in one direction, and the above-mentioned second transparent conductive layer The conductive layer has a second pattern that is long in a direction perpendicular to the one direction, and the length in one direction of the first pattern is longer than the length in the orthogonal direction of the second pattern. An image display device characterized by comprising the transparent conductive film according to claim 1, and an image display element disposed on the first transparent conductive layer side of the transparent conductive film.

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