KR100996591B1 - Black matrix high sensitive photoresist composition for liquid crystal display and black matrix prepared by using the same - Google Patents

Abstract

The present invention relates to a black matrix photosensitive resin composition for a liquid crystal display and a black matrix prepared using the same, in particular, a colorant containing a black pigment, an alkali-soluble resin binder, a polyfunctional monomer having an ethylenically unsaturated double bond, a photopolymerization initiator, And a photosensitive resin composition comprising a solvent, wherein a high resolution pattern can be obtained by adjusting the properties of the binder to be used, that is, the ratio of the acid value and the reactive group, and the margin for the process characteristics is improved, so that there is no pattern dropout or residue. Shows pattern characteristics.

Black matrix, liquid crystal display, photosensitive resin composition, alkali-soluble resin binder, acid value, unsaturated double bond

Description

BLACK MATRIX HIGH SENSITIVE PHOTORESIST COMPOSITION FOR LIQUID CRYSTAL DISPLAY AND BLACK MATRIX PREPARED BY USING THE SAME}

1 is a graph showing a change in thickness according to the exposure amount of the photosensitive resin prepared according to an embodiment of the present invention.

2 is a graph showing a pattern change with development time of the photosensitive resin prepared according to an embodiment of the present invention.

The present invention relates to a black matrix photosensitive resin composition for a liquid crystal display and a black matrix manufactured by using the same. More particularly, the optical sensitivity is very high and a stable pattern can be formed even with a small exposure amount while securing a short process margin. Therefore, the present invention relates to a black matrix photosensitive resin composition for a liquid crystal display, which is not only able to reduce the process time and improve the production yield, but also has high light shielding properties and is highly applicable to a large area TV to which brighter backlights are applied.

The pattern by the photosensitive resin composition containing the conventional pigment tends to produce defects during development or by water washing, and if the adhesion of the pattern is improved, the solubility of the non-image portion during development decreases and contamination is likely to occur. This is because the crosslinking density is low and the sensitivity by light is low, and this is due to the narrow development margin at the time of pattern formation by development.

It is common to arrange a grid-like black pattern called a black matrix between color pixels of a color filter for the purpose of improving contrast. In the conventional black matrix, chromium is used. This process requires a high cost in the process of depositing chromium on the entire glass substrate and forming a pattern by etching, and has a high reflectance problem of chromium and environmental pollution by chromium waste liquid. There is a problem that such a problem occurs. For this reason, research into resin black matrices by the pigment dispersion method capable of fine processing has been actively conducted.

The black matrix photosensitive resin composition is a composition made of black by mixing pigments of different colors or pigments. This photosensitive resin composition contains a large amount of pigment which does not dissolve in a developing solution for the purpose of light-shielding, and for such a reason, there exists a problem that developability is not good, a long time development is needed and the required resolution is not obtained. Therefore, improvement of developability is still an important problem in production of color filters of each color including a black matrix.

Although studies have been conducted to produce black compositions with colored pigments other than carbon black, the colored pigments other than carbon black have poor light shielding properties, so the compounding amount must be extremely high, and as a result, the viscosity of the composition increases, making handling difficult. There is a problem in that the strength or adhesion to the substrate is degraded remarkably.

As such, research on the black matrix photosensitive resin composition for liquid crystal display excellent in colorability, hiding power, and insulation property as well as developability is required, and the development of the composition continues.

According to the demands of the industry, many studies are being conducted. As a study on the photosensitive resin composition, Japanese Unexamined Patent Publication No. 2005-156930 describes a color filter composition to which a newly developed binder is applied to improve sensitivity. Patent No. 2005-338328 describes a black resin composition having improved sensitivity by using a high sensitivity photopolymerization initiator. In addition, JP-A-2004-347916 describes a black matrix composition having improved sensitivity by introducing a photopolymerization initiator and an organophosphate compound into the composition. In addition, Japanese Patent Laid-Open No. 2005-215378, Japanese Patent Laid-Open No. 2005-227797, Japanese Patent Laid-Open No. 2005-275218, Japanese Patent Laid-Open No. 2000-227654, Japanese Patent Laid-Open No. 11-326606 Japanese Patent Application Laid-Open No. Hei 11-143056, US Patent No. 5,866,298, Korean Patent No. 2006-0076413, Korean Patent No. 2002-0031093 and the like describe the development of a black matrix.

Recently, the share of liquid crystal displays (LCDs) in the flat panel display field is rapidly expanding. In the LCD field, where existing small and medium-sized mobile displays or monitors were the main focus, the area is shifting to large monitors and TVs. As the glass becomes larger, requests for high sensitivity are emerging to shorten the process time. In addition, as the screen size increases, brightness becomes a problem, and thus a brighter backlight is adopted. As the backlight becomes brighter, the black matrix also requires higher shading characteristics. As the carbon black content used in the composition for improving the light shielding property is continuously increased, the process characteristics of the black mattress are continuously deteriorated. Since carbon black absorbs not only visible light but also ultraviolet light, it is difficult to transmit light to the bottom of the resist film when irradiating UV light for pattern formation. There is a problem in that a T-top pattern is formed. In addition, the amount of energy irradiated to reduce the process time is continuously reduced, making it more difficult to secure a stable pattern.

Therefore, there is a need for further studies on the black matrix photosensitive resin composition capable of improving adhesion to the substrate, excellent development process margin, and high light sensitivity.

In order to solve the problems of the prior art as described above, the present inventors secure high sensitivity during the black matrix process by limiting the amount of acid double and unsaturated double bond of the binder used in the component in the production of the black matrix photosensitive resin composition for liquid crystal display And development margin can be improved and the characteristic of the pattern obtained is found to be excellent.

Accordingly, the present invention provides a black matrix resin composition for a liquid crystal display and a black mattress for a liquid crystal display manufactured using the black matrix resin composition for the liquid crystal display, characterized by using a binder that limits the amount of acid value and unsaturated double bond. It aims to do it.

Moreover, an object of this invention is to provide the liquid crystal display containing the said black matrix for liquid crystal displays.

In order to achieve the said objective, this invention is 100 weight part in the black-matrix photosensitive resin composition for liquid crystal displays,

1) 1 to 40 parts by weight of a colorant including a black pigment;

2) 1 to 20 parts by weight of an alkali-soluble resin binder represented by Formula 1 below;

3) 1 to 20 parts by weight of a multifunctional monomer having an ethylenically unsaturated double bond;

4) 0.1 to 20 parts by weight of the photopolymerization initiator; And

5) 30 to 90 parts by weight of solvent

It provides a black matrix photosensitive resin composition for a liquid crystal display comprising a.

In Formula 1,

R1 is hydrogen or a group which forms a 5-membered carboxylic acid anhydride or imide structure such as succinimide or succinic anhydride,

R 2 is selected from the group consisting of hydrogen, methyl and hydroxy methyl,

R3 and R4 are the same as or different from each other, and each independently hydrogen or methyl,

X is C ₁ Alkyl ester of C ₁₂ , C ₂ substituted with 1-2 hydroxyl groups Alkyl ester of C ₆ , C ₁ - the group of C ₃ alkoxy-substituted C ₂ Alkyl ester of C ₆ , C ₁ substituted with halogen Alkyl ester of C ₆ , C ₁ ~ C ₃ alkoxy poly (n = 2 ~ 30) alkylene group, C ₂ ~ C ₃ of the glycol ester, the C ₁ is substituted by a phenyl group Alkyl ester of C ₆ , C ₁ Phenyl substituted with an alkyl group of C ₆ , C ₁ Phenyl substituted by alkoxy of C ₆ , phenyl substituted by halogen group, C ₁ ~ Alkoxymethyl, glycidyl methyl sidok when the C ₆ (glycidoxy methyl), and R1 and won 5-carboxylic acid anhydride or an imide ring structure of, for example, be selected from the group consisting of forming a maleimide, or maleic anhydride,

Y is C ₀ ~ C ₁₂ alkylene group, is selected from the group consisting of total alkylene ester with a carbon number of 3 to 60 comprising 1 to 10 polyester groups,

으로 이루어지는 군으로부터 선택되며, 여기서 *는 연결부위이고,Z is ethylene, propylene, butylene, 1,2-phenylene, 1,2-cyclohexylene,

It is selected from the group consisting of where * is the connecting portion,

a, b, c and d are molar mixing ratios of A, B, C and D, respectively, a is 10 to 90, b is 0 to 60, c is 0 to 40, and d is 0 to 40.

The coloring agent containing the black pigment of said 1 used for this invention can mix and use carbon black and 1 or more coloring pigments.

As the carbon black, Sisto 5HIISAF-HS, Sisto KH, Sisto 3HHAF-HS, Sisto NH, Sisto 3M, Sisto 300HAF-LS, Sisto 116HMMAF-HS, Sisto 116MAF of Donghae Carbon Co., Ltd. Cysto FMFEF-HS, cysto SOFEF, cysto VGPF, cysto SVHSRF-HS, and cysto SSRF; Mitsubishi Chemical Corporation Diagram Black II, Diagram Black N339, Diagram Black SH, Diagram Black H, Diagram LH, Diagram HA, Diagram SF, Diagram N550M, Diagram M, Diagram E, Diagram G, Diagram R, Diagram N760M, Diagram LR, # 2700, # 2600, # 2400, # 2350, # 2300, # 2200, # 1000, # 980, # 900, MCF88, # 52, # 50, # 47, # 45, # 45L, # 25, # CF9, # 95, # 3030, # 3050, MA7, MA77, MA8, MA11, OIL7B, OIL9B, OIL11B, OIL30B, and OIL31B; Daegu Co., Ltd. PRINTEX-U, PRINTEX-V, PRINTEX-140U, PRINTEX-140V, PRINTEX-95, PRINTEX-85, PRINTEX-75, PRINTEX-55, PRINTEX-45, PRINTEX-300, PRINTEX-35, PRINTEX-25, PRINTEX-200, PRINTEX-40, PRINTEX-30, PRINTEX-3, PRINTEX-A, SPECIAL BLACK-550, SPECIAL BLACK-350, SPECIAL BLACK-250, SPECIAL BLACK-100, and LAMP BLACK-101; RAVEN-1100ULTRA, RAVEN-1080ULTRA, RAVEN-1060ULTRA, RAVEN-1040, RAVEN-1035, RAVEN-1020, RAVEN-1000, RAVEN-890H, RAVEN-890, RAVEN-880ULTRA, RAVEN-860ULTRA, RAVEN-850, RAVEN-820, RAVEN-790ULTRA, RAVEN-780ULTRA, RAVEN-760ULTRA, RAVEN-520, RAVEN-500, RAVEN-460, RAVEN-450, RAVEN-430ULTRA, RAVEN-420, RAVEN-410, RAVEN- 2500ULTRA, RAVEN-2000, RAVEN-1500, RAVEN-1255, RAVEN-1250, RAVEN-1200, RAVEN-1190ULTRA, RAVEN-1170 and the like can be used.

Colorants usable in admixture with the carbon black include carmine 6B (CI 12490), phthalocyanine green (CI 74260), phthalocyanine blue (CI 74160), Mitsubishi carbon black MA100, perylene black (BASF K0084. K0086), cyanine black, Linol yellow (CI 21090), linol yellow GRO (CI 21090), benzidine yellow 4T-564D, Mitsubishi carbon black MA-40, Victoria pure blue (CI 42595), CI PIGMENT RED97, 122, 149, 168, 177, 180, 192, 215, C.I. PIGMENT GREEN 7, 36, C.I. PIGMENT 15: 1, 15: 4, 15: 6, 22, 60, 64, C.I. PIGMENT 83, 139 C.I. PIGMENT VIOLET 23, etc. In addition, a white pigment, a fluorescent pigment, etc. can also be used. In addition, the said coloring agent can also be used individually or in mixture of 2 or more types, so that a color may become black.

The alkali-soluble resin binder represented by Formula 1 of 2) used in the present invention may be composed of the following monomers. Monomers for forming the A portion include benzyl (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, dimethylaminoethyl (meth) acrylate, and isobutyl ( Meta) acrylate, t-butyl (meth) acrylate, cyclohexyl (meth) acrylate, isobornyl (meth) acrylate, ethylhexyl (meth) acrylate, 2-phenoxyethyl (meth) acrylate, tetra Hydroperpril (meth) acrylate, hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydroxy-3-chloropropyl (meth) acrylate, 4-hydroxybutyl ( Meth) acrylate, acyloctyloxy-2-hydroxypropyl (meth) acrylate, glycerol (meth) acrylate, 2-methoxyethyl (meth) acrylate, 3-methoxybutyl (meth) acrylate, ethoxy Sidiethylene glycol (meth) acrylate Y, methoxy triethylene glycol (meth) acrylate, methoxy tripropylene glycol (meth) acrylate, poly (ethylene glycol) methyl ether (meth) acrylate, phenoxydiethylene glycol (meth) acrylate, p-nonyl Phenoxypolyethylene glycol (meth) acrylate, p-nonylphenoxypolypropylene glycol (meth) acrylate, glycidyl (meth) acrylate, tetrafluoropropyl (meth) acrylate, 1,1,1,3 , 3,3-hexafluoroisopropyl (meth) acrylate, octafluoropentyl (meth) acrylate, heptadecafluorodecyl (meth) acrylate, tribromophenyl (meth) acrylate, dicyclo Fentanyl methacrylate, dicyclopentenyl methacrylate, dicyclopentenyl oxyethyl acrylate, isobornyl methacrylate, adamantyl methacrylate, methyl α-hydroxymethyl acrylate , Ethyl α- hydroxymethyl acrylate, unsaturated carboxylic acid esters such as propyl α- hydroxymethyl acrylate, butyl α- hydroxymethyl acrylate; Aromatic vinyls such as styrene, α-methyl styrene, (o, m, p) -vinyl toluene, (o, m, p) -methoxy styrene, (o, m, p) -chloro styrene; Unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether, allyl glycidyl ether; Unsaturated imides such as N-phenyl maleimide, N- (4-chlorophenyl) maleimide, N- (4-hydroxyphenyl) maleimide, and N-cyclohexyl maleimide; One or more selected from the group consisting of maleic anhydride, maleic anhydride such as methyl maleic anhydride and the like can be used, but is not limited thereto.

In Formula 1, monomers for forming the B portion include (meth) acrylic acid, crotonic acid, itaconic acid, maleic acid, fumaric acid, monomethyl maleic acid, 5-norbornene-2-carboxylic acid, and mono-2-((meth) At least one selected from the group consisting of acryloyloxy) ethyl phthalate, mono-2-((meth) acryloyloxy) ethyl succinate, ω-carboxy polycaprolactone mono (meth) acrylate, and the like can be used. However, the present invention is not limited thereto.

In Chemical Formula 1, the C portion polymerizes the monomer for forming the A portion and the monomer for forming the B portion to prepare a polymer consisting of the A portion and the B portion, and is derived from the B portion of the polymer. As a method of introducing the C moiety into the polymer consisting of the A moiety and the B moiety, a method of ring-opening condensation reaction of the acid group of the B moiety and the epoxy group of glycidyl (meth) acrylate may be used. Such condensation reactions can be carried out by methods known in the art.

In addition, in Formula 1, the D portion is derived from the C portion of the polymer consisting of A, B, and C. As a method of introducing the D moiety into the polymer consisting of A, B and C, a method of ring-opening condensation reaction between the hydroxy group and the carboxylic anhydride of the C moiety may be used. Acid anhydrides usable for introducing the D moiety include succinic anhydride, glutaric anhydride, adipic anhydride, phthalic anhydride, hexahydrophthalic anhydride, cis-1,2,3,6-tetrahydrophthalic anhydride , 3,4,5,6-tetrahydrophthalic anhydride, itaconic anhydride, trimellitic anhydride, cis-5-norbornene-endo-2,3-dicarboxylic anhydride, and the like, but are not limited thereto.

2) The alkali-soluble resin binder represented by Formula 1 of the present invention has a range of 5 to 60 when d is less than 0 to 5, and a range of b to 0 to 10 when d is 5 to 40. .

2) The acid value of the alkali-soluble resin binder represented by the formula (1) and the equivalent of the unsaturated double bond are as follows. When d is less than 0 to 5, the preferred acid value is in the range of about 50 to 150 KOH mg / g, the equivalent of unsaturated double bond is 1,000 to 2,500, and the sum of (acid value × 10) and the equivalent of unsaturated double bond is 1,500 to It has a range of 4,000, when d is 5 to 40, the preferred acid value is in the range of about 20 to 80 KOH mg / g, the equivalent of unsaturated double bond is 400 ~ 1,000, (acid value × 10) and unsaturated double bond The sum of equivalents ranges from 500 to 1500. The equivalent of the unsaturated double bond may be represented by the following formula (1).

Double bond equivalent weight  = (Molecular weight of repeating units) / (number of double bonds in repeating units)

Therefore, when the acid value of the alkali-soluble resin binder is P (KOH mg / g) and the double bond equivalent is Q, 50 <P <150, 1000 <Q <2500, 1500 <when d is less than 0 to 5 High sensitivity when (10 x P) + Q <4000 is satisfied and 20 <P <80, 400 <Q <1000, 500 <(10 x P) + Q <1500 when d is 5 to 40 And high optical density (OD) can be realized.

When d is less than 0 to 5, when the acid value is 150 or more (acid value × 10) and the sum of the equivalents of the unsaturated double bond is less than 1,500, the acid value is too high, the development margin is small, and the pattern obtained is too large. If the linearity is poor and cannot be used as a black matrix, and if the sum of (acid value x 10) and the equivalent of the unsaturated double bond is 4,000 or more, the sensitivity characteristic is not good. In addition, when the acid value is 50 or less, it is difficult to obtain a pattern at the time of development, so that it is difficult to obtain a pattern and the development time is long, resulting in poor process characteristics.

When d is 5 to 40, the carboxylic acid group that can be developed by the alkaline developer is not present in the main chain and is directed toward the branched chain, so that the developing characteristic is excellent despite the low acid value. Therefore, when the acid value is 80 or more, excessive phenomenon is likely to occur, pattern dropout occurs, and it becomes difficult to realize high sensitivity.

The weight average molecular weight of the alkali-soluble resin binder is preferably in the range of 1,000 to 200,000, more preferably in the range of 5,000 to 100,000.

Although the said alkali-soluble resin binder can be used individually, it is more preferable to mix and use 2 or more types. The amount used is preferably contained in an amount of 1 to 25 parts by weight based on the total weight of the photosensitive resin composition, and when the content is less than 1 part by weight, the adhesion of the formed film is lowered. And there is a problem that the sensitivity is lowered.

The polyfunctional monomer having an ethylenically unsaturated double bond of 3) used in the present invention may be a compound having a boiling point of 100 ° C. or higher or a functional monomer having caprolactone having at least one or more addition-polymerizable unsaturated groups in a molecule. have.

Examples of the compound having a boiling point of 100 ° C. or higher having at least one or more addition-polymerizable unsaturated groups in the molecule include polyethylene glycol mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, phenoxyethyl (meth) acrylate, and the like. Monofunctional monomer, polyethylene glycol (meth) acrylate, polypropylene glycol (meth) acrylate, trimethylol ethane triacrylate, trimethylol propane triacrylate, neopentyl glycol (meth) acrylate, pentaerythritol tetraacrylic Polyfunctional monomers, such as a latent, pentaerythritol triacrylate, dipentaerythritol pentaacrylate, or dipentaerythritol hexaacrylate, etc. can be used.

In addition, as the polyfunctional monomer incorporating caprolactone, KAYARAD DPCA-20, 30, 60, 120 introduced in dipentaerythritol, KAYARAD TC-110S introduced in tetrahydrofuryl acrylate, or neopentyl glycol hydroxy KAYARAD HX-220, KAYARAD HK-620, etc. introduced to pivalate can be used. Other polyfunctional monomers that can be used include epoxy acrylates of bisphenol A derivatives, novolak-epoxy acrylates, and urethane-based polyfunctional acrylates, such as U-324A, U15HA, and U-4HA.

The polyfunctional monomer which has the said ethylenically unsaturated double bond can also be used individually or in mixture of 2 or more types.

The polyfunctional monomer having an ethylenically unsaturated double bond is preferably included in 1 to 20 parts by weight (5 to 50% by weight based on solids of the resin composition) based on the total weight of the photosensitive resin composition, and the content thereof is 1 part by weight. If it is less than the light sensitivity or the strength of the coating film is lowered, if it exceeds 20 parts by weight, there is a problem that the adhesiveness of the photosensitive resin layer is excessive, the strength of the film is not sufficient and the pattern during development is lost, which is undesirable.

The photopolymerization initiator of 4) used in the present invention is a material which generates radicals by light and triggers crosslinking, and is selected from the group consisting of acetophenone compounds, biimidazole compounds, triazine compounds, and oxime compounds. It is good to mix and use the compound selected above.

Acetophenone compounds which can be used as the photopolymerization initiator include 2-hydroxy-2-methyl-1-phenylpropan-1-one and 1- (4-isopropylphenyl) -2-hydroxy-2-methylpropane- 1-one, 4- (2-hydroxyethoxy) -phenyl- (2-hydroxy-2-propyl) ketone, 1-hydroxycyclohexylphenylketone, benzoinmethyl ether, benzoinethyl ether, benzoin Isobutyl ether, benzoinbutyl ether, 2,2-dimethoxy-2-phenylacetophenone, 2-methyl- (4-methylthio) phenyl-2-morpholino-1-propan-1-one, 2- Benzyl-2-dimethylamino-1- (4-morpholinophenyl) -butan-1-one, 2- (4-bromo-benzyl-2-dimethylamino-1- (4-morpholinophenyl)- Butan-1-one, 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinopropane-1-one, and the like, and the biimidazole compound is 2,2-bis (2). -Chlorophenyl) -4,4 ', 5,5'tetraphenyl biimidazole, 2,2'bis (o-chlorophenyl) -4,4', 5,5'tetrakis (3,4,5- Trimethoxyphenyl) -1,2 biimidazole, 2,2 ' -Bis (2,3-dichlorophenyl) -4,4 ', 5,5'tetraphenyl biimidazole, 2,2'-bis (o-chlorophenyl) -4,4,5,5'-tetraphenyl -1,2'-biimidazole, and the like, and triazine-based compounds include 3- {4- [2,4-bis (trichloromethyl) -s-triazin-6-yl] phenylthio} propionic acid , 1,1,1,3,3,3-hexafluoroisopropyl-3- {4- [2,4-bis (trichloromethyl) -s-triazin-6-yl] phenylthio} propio Nate, ethyl-2- {4- [2,4-bis (trichloromethyl) -s-triazin-6-yl] phenylthio} acetate, 2-epoxyethyl-2- {4- [2,4- Bis (trichloromethyl) -s-triazin-6-yl] phenylthio} acetate, cyclohexyl-2- {4- [2,4-bis (trichloromethyl) -s-triazin-6-yl] Phenylthio} acetate, benzyl-2- {4- [2,4-bis (trichloromethyl) -s-triazin-6-yl] phenylthio} acetate, 3- {chloro-4- [2,4- Bis (trichloromethyl) -s-triazin-6-yl] phenylthio} propionic acid, 3- {4- [2,4-bis (trichloromethyl) -s- Lyazine-6-yl] phenylthio} propionamide, 2,4-bis (trichloromethyl) -6-p-methoxystyryl-s-triazine, 2,4-bis (trichloromethyl) -6 -(1-p-dimethylaminophenyl) -1,3, -butadienyl-s-triazine, 2-trichloromethyl-4-amino-6-p-methoxystyryl-s-triazine and the like There is this. Examples of oxime compounds include 1,2-octadione, -1- (4-phenylthio) phenyl, -2- (o-benzoyloxime) (Shibagai Co., Shijiai 124), ethanone, -1- (9 -Ethyl) -6- (2-methylbenzoyl-3-yl)-, 1- (O-acetyloxime) (SCI) 242 and the like.

The photopolymerization initiator may be used in an amount of 1 to 300 parts by weight based on 100 parts by weight of the total amount of the polyfunctional monomer having the ethylenically unsaturated double bond of 3) and the unsaturated double bond included in the binder in the photosensitive resin composition. It is preferred to use 1 to 30 parts by weight of the phenone compound, 1 to 30 parts by weight of the biimidazole compound, 1 to 30 parts by weight of the triazine compound, and 1 to 30 parts by weight of the oxime compound.

The photopolymerization initiator may further include 0.01 to 10 parts by weight of a photocrosslinker to promote the generation of radicals as an auxiliary component, or 0.01 to 10 parts by weight of a curing accelerator to promote curing.

The photocrosslinking sensitizer is benzophenone, 4,4-bis (dimethylamino) benzophenone, 4,4-bis (diethylamino) benzophenone, 2,4,6-trimethylaminobenzophenone, methyl-o-benzoyl Benzophenone compounds such as benzoate, 3,3-dimethyl-4-methoxybenzophenone, 3,3,4,4-tetra (t-butylperoxycarbonyl) benzophenone; Fluorenone compounds such as 9-florenone, 2-chloro-9-prorenone, and 2-methyl-9-florenone; Thioxanthones such as thioxanthone, 2,4-diethyl thioxanthone, 2-chloro thioxanthone, 1-chloro-4-propyloxy thioxanthone, isopropyl thioxanthone and diisopropyl thioxanthone compound; Xanthone compounds such as xanthone and 2-methylxanthone; Anthraquinone compounds such as anthraquinone, 2-methyl anthraquinone, 2-ethyl anthraquinone, t-butyl anthraquinone, and 2,6-dichloro-9,10-anthraquinone; 9-phenylacridine, 1,7-bis (9-acridinyl) heptane, 1,5-bis (9-acridinylpentane), 1,3-bis (9-acridinyl) propane Acridine-based compounds; Dicarbonyl compounds such as benzyl, 1,7,7-trimethyl-bicyclo [2,2,1] heptane-2,3-dione, 9,10-phenanthrenequinone; Phosphine oxide compounds such as 2,4,6-trimethylbenzoyl diphenylphosphine oxide and bis (2,6-dimethoxybenzoyl) -2,4,4-trimethylpentyl phosphine oxide; Benzophenone compounds such as methyl-4- (dimethylamino) benzoate, ethyl-4- (dimethylamino) benzoate and 2-n-butoxyethyl-4- (dimethylamino) benzoate; 2,5-bis (4-diethylaminobenzal) cyclopentanone, 2,6-bis (4-diethylaminobenzal) cyclohexanone, 2,6-bis (4-diethylaminobenzal) -4- Amino synergists such as methyl-cyclopentanone; 3,3-carbonylvinyl-7- (diethylamino) coumarin, 3- (2-benzothiazolyl) -7- (diethylamino) coumarin, 3-benzoyl-7- (diethylamino) coumarin, 3 -Benzoyl-7-methoxy-coumarin, 10,10-carbonylbis [1,1,7,7-tetramethyl-2,3,6,7-tetrahydro-1H, 5H, 11H-C1] -benzo Coumarin-based compounds such as pyrano [6,7,8-ij] -quinolizine-11-one; Chalcone compounds such as 4-diethylamino chalcone and 4-azidebenzalacetophenone; 2-benzoylmethylene or 3-methyl-b-naphthothiazoline can be used.

Further, as the curing accelerator, 2-mercaptobenzoimidazole, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2,5-dimercapto-1,3,4-thiadiazole, 2- Mercapto-4,6-dimethylaminopyridine, pentaerythritol-tetrakis (3-mercaptopropionate), pentaerythritol-tris (3-mercaptopropionate), pentaerythritol-tetrakis (2-mercapto Acetate), pentaerythritol-tris (2-mercaptoacetate), trimethylolpropane-tris (2-mercaptoacetate), trimethylolpropane-tris (3-mercaptopropionate) and the like can be used.

The solvent of 5) used in the present invention is propylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate in view of solubility, pigment dispersibility, coating properties, etc. , Diethylene glycol dimethyl ether, cyclohexanone, 2-heptanone, 3-heptanone, 2-hydroxyethyl propionate, 3-methyl-3-methoxybutylpropionate, ethyl-3-methoxyprop Cypionate, methyl-3-ethoxypropionate, ethyl-3-ethoxypropionate, butyl acetate, amylpermate, isoamyl acetate, isobutyl acetate, butylpropionate, isopropylbutyrate, ethylbutyrate, Butyl butyrate, ethyl pyruvate, or γ-butyrol acetate, or the like can be used. The said solvent may be used independently, or may mix and use 2 or more types.

The photosensitive resin composition of the present invention may further use 6) primary additives selected from the group consisting of dispersants, adhesion promoters, antioxidants, ultraviolet absorbers, thermal polymerization inhibitors and leveling agents.

The dispersant may be used as a method of internally adding to the pigment in the form of surface treatment of the pigment in advance, or a method of externally adding to the pigment. The dispersant may be a polymeric, nonionic, anionic or cationic dispersant, and examples thereof include polyalkylene glycols and esters thereof, polyoxyalkylene polyhydric alcohols, ester alkylene oxide adducts, and alcohol alkylene oxides. Adducts, sulfonic acid esters, sulfonates, carboxylic acid esters, carboxylates, alkylamide alkylene oxide adducts, alkylamines and the like. These may be used alone or in combination of two or more kinds.

The adhesion promoter is vinyl trimethoxysilane, vinyl triethoxysilane, vinyl tris (2-methoxyethoxy) -silane, N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- ( 2-aminoethyl) -3-aminopropylmethyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidoxypropyltriethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 2- ( 3,4-ethoxy cyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, or 3-mercaptopropyl Trimethoxysilane and the like can be used.

The antioxidant may be 2,2-thiobis (4-methyl-6-t-butylphenol), or 2,6-g, t-butylphenol, and the ultraviolet absorber is 2- (3-t -Butyl-5-methyl-2-hydroxyphenyl) -5-chloro-benzotriazole or alkoxy benzophenone can be used.

In addition, the thermal polymerization inhibitor is hydroquinone, p-methoxyphenol, di-t-butyl-p-cresol, pyrogarol, t-butylcatechol, benzoquinone, 4,4-thiobis (3-methyl-6 -t-butylphenol), 2,2-methylenebis (4-methyl-6-t-butylphenol), 2-mercaptoimidazole, etc. can be used.

In addition, the photosensitive resin composition may further include 7) secondary additives selected from the group consisting of carbon black dispersions, resin binders having functionalities, monomers, radiation-sensitive compounds, and other additives. .

In addition,

1) applying a black matrix photosensitive resin composition for a liquid crystal display according to the invention on a panel; And

2) exposing and developing the applied black matrix photosensitive resin

It provides a black matrix for a liquid crystal display manufactured by a manufacturing method comprising a.

The black matrix for a liquid crystal display according to the present invention has advantages in that it is excellent in developability, light shielding property, and insulation, and has no residue and no display defects due to heat treatment.

The present invention also provides a liquid crystal display comprising the black matrix for the liquid crystal display.

The liquid crystal display may be manufactured by a general manufacturing method known in the art except for including the black matrix for the liquid crystal display of the present invention.

Hereinafter, preferred examples are provided to help understanding of the present invention, but the following examples are merely to illustrate the present invention, and the scope of the present invention is not limited to the following examples.

< Example >

Example  One

Glycidyl in a copolymer of benzyl (meth) acrylate / styrene / N-phenylmaleimide / (meth) acrylic acid with 750 parts by weight of carbon black dispersion (Mikunisa, carbon black content 20%) as a colorant, alkali-soluble resin binder A compound in which the alcohol group generated by adding methacrylate was ring-opened with some succinic anhydride [molar ratio 42 (benzyl (meth) acrylate) / 8 (styrene) / 6 (N-phenylmaleimide) / 20 (glycidyl) Adduct) / 24 (anhydrous succinic acid adduct), Mw = 12,000, acid value 62 KOH mg / g, double bond equivalent 494] 60 parts by weight, dipentaerythritol hexaacrylate as a functional monomer, 10 parts by weight of ethanone, -1- (9-ethyl) -6- (2-methylbenzoyl-3-yl)-, 1- (O-acetyloxime), 2,2'-bis (o-chlorophenyl) 10 parts by weight of -4,4,5,5'-tetraphenyl-1,2'-biimidazole, 10 parts by weight of 4,4-bis (diethylamino) benzophenone, and 5 parts by weight of mercaptobenzothiazole , Adhesion promoter 3-methacrylate were mixed oxy-propyltrimethoxysilane, 5 parts by weight of a leveling agent and 1 part by weight of a solvent of propylene glycol monomethyl ether acetate 510 parts by weight of 3-methoxybutyl acetate, 510 parts by weight. Then, the mixture was stirred for 5 hours to prepare a black matrix photosensitive resin composition.

The photosensitive resin composition solution prepared as described above was spin coated onto glass and subjected to an electrothermal treatment at about 100 ° C. for 2 minutes to form a coating film having a thickness of about 1.29 μm. Then, after cooling at room temperature, the photomask was used to expose the energy at 60 mJ / cm 2 under a high pressure mercury lamp. The exposed substrate was developed by spraying in a 0.04% KOH aqueous solution at a temperature of 25 ° C., washed with pure water, dried, and post-baked in a convection oven at 220 ° C. for 30 minutes.

The coating film pattern obtained as described above had a thickness of 1.1 μm, with no pattern dropout, excellent straightness, clean pattern without contamination of the exposed portion, and an optical density of 4.0 or more. .

<Sensitivity test>

When the exposure amount was changed to 20, 30, 40, 50, 60, 70, 80, 90, 100 mJ / cm 2 using the photosensitive resin composition obtained in Example 1, the change in thickness depending on the exposure amount was 30 More than 90% residual film rate was shown above mJ / cm 2 (FIG. 1).

< Developability (Process Margin) Test>

The photosensitive resin composition obtained in Example 1 was spin coated on glass and subjected to an electrothermal treatment at about 100 ° C. for 2 minutes to form a coating film having a thickness of about 1.29 μm. Then, after cooling at room temperature, it was exposed with an energy of 60 mJ / cm 2 under a high pressure mercury lamp using a photomask. The exposed substrate was developed by spray method in 0.04% aqueous KOH solution at a temperature of 25 ° C. At this time, the development time was adjusted from 60 seconds to 90 seconds to test the process margin. As a result of the experiment, there was almost no change in the line width from the development time of 50 seconds to the passage of 90 seconds, and the stability of the pattern was also maintained (FIG. 2).

Example  2

Glycidyl in a copolymer of benzyl (meth) acrylate / styrene / N-phenylmaleimide / (meth) acrylic acid with 750 parts by weight of a carbon black dispersion (Mikunisa, carbon black content 20%) as a colorant and an alkali-soluble resin binder A compound in which the alcohol group formed by adding methacrylate was ring-opened with some succinic anhydride [molar ratio 42 (benzyl (meth) acrylate) / 8 (styrene) / 6 (N-phenylmaleimide) / 34 (glycidyl addition) Water) / 10 (anhydrous succinic acid adduct), Mw = 10,000, acid value 27 KOH mg / g, double bond equivalent weight 462] 30 parts by weight, benzyl (meth) acrylate / styrene / N-phenylmaleimide / (meth) acrylic acid Polymer [molar ratio 52 (benzyl (meth) acrylate / 8 (styrene) / 6 (N-phenylmaleimide)] / 28 ((meth) acrylic acid) / 6 (glycidyl addition of / acrylic acid-glycidyl methacrylate Water), Mw = 18,000, acid value 106 KOH mg / g, double bond equivalent weight 2,466] 30 parts by weight, dipentaerythritol as a functional monomer 70 parts by weight of acrylate, 10 parts by weight of ethanone, -1- (9-ethyl) -6- (2-methylbenzoyl-3-yl)-, 1- (O-acetyloxime) as a photopolymerization initiator, 2, 10 parts by weight of 2'-bis (o-chlorophenyl) -4,4,5,5'-tetraphenyl-1,2'-biimidazole, 10 parts by weight of 4,4-bis (diethylamino) benzophenone Parts, and 5 parts by weight of mercaptobenzothiazole, 5 parts by weight of 3-methacryloxypropyltrimethoxysilane as an adhesion promoter, and 1 part by weight of leveling agent, 510 parts by weight of propylene glycol monomethyl ether acetate as a solvent, 3- 510 parts by weight of methoxybutyl acetate were mixed, and the mixture was then stirred for 5 hours to prepare a black matrix photosensitive resin composition.

The coating film pattern obtained by carrying out the same method as Example 1 using the photosensitive resin composition prepared as described above had a coating film thickness of 1.1 μm, which showed no dropout of the pattern, showed excellent straightness, and was clean without contamination of the exposed part. The pattern characteristics were shown, and the optical density was 4.0 or more.

Example  3

Compound produced by adding glycidyl methacrylate to a copolymer of benzyl (meth) acrylate / styrene / N-phenylmaleimide / (meth) acrylic acid with an alkali-soluble resin binder [molar ratio 50 (benzyl (meth) acrylate). ) / 8 (styrene) / 6 (N-phenylmaleimide) / 24 ((meth) acrylic acid) / 12 (glycidyl adduct), Mw = 16,000, acid value 87 KOH mg / g, double bond equivalent 1,289] 60 A resin composition consisting of the same component ratios as in Example 1 was prepared except that parts by weight were used.

The coating film pattern obtained by carrying out the same method as Example 1 using the photosensitive resin composition prepared as described above had a coating film thickness of 1.1 μm, which showed no dropout of the pattern, showed excellent straightness, and was clean without contamination of the exposed part. The pattern characteristics were shown, and the optical density was 4.0 or more.

Example  4

10 parts by weight of 1,2-octadione, -1- (4-phenylthio) phenyl, -2- (o-benzoyloxime) as a photopolymerization initiator, 2,2'-bis (o-chlorophenyl) -4,4 10 parts by weight of 5,5'-tetraphenyl-1,2'-biimidazole, 10 parts by weight of 4,4-bis (diethylamino) benzophenone, and 5 parts by weight of mercaptobenzothiazole were used. The black matrix photosensitive resin composition was prepared in the same composition as in Example 1.

The photosensitive resin composition solution prepared as described above was spin-coated on an alkali free glass and subjected to an electrothermal treatment at about 100 ° C. for 2 minutes to form a coating film having a thickness of about 1.3 μm. Then, after cooling at room temperature, the photomask was used to expose it at an energy of 80 mJ / cm 2 under a high pressure mercury lamp. The exposed substrate was developed by spraying in a 0.04% KOH aqueous solution at a temperature of 25 ° C., washed with pure water, dried, and post-baked in a convection oven at 220 ° C. for 30 minutes.

The coating film pattern obtained by carrying out the same method as Example 1 using the photosensitive resin composition prepared as described above had a coating film thickness of 1.1 μm, which showed no dropout of the pattern, showed excellent straightness, and was clean without contamination of the exposed part. The pattern characteristics were shown, and the optical density was 4.0 or more.

Example  5

30 parts by weight of 2-benzyl-2- (dimethylamino) -1- (4-morpholinophenyl) butyl-1-one as the photopolymerization initiator, 2,2'-bis (o-chlorophenyl) -4,4, Except for using 10 parts by weight of 5,5'-tetraphenyl-1,2'-biimidazole, 10 parts by weight of 4,4-bis (diethylamino) benzophenone, and 5 parts by weight of mercaptobenzothiazole A black matrix photosensitive resin composition was prepared in the same composition as in Example 1.

The photosensitive resin composition solution prepared as described above was spin coated on an alkali free glass and subjected to an electrothermal treatment at about 100 ° C. for 2 minutes to form a coating film having a thickness of about 1.37 μm. Then, after cooling at room temperature, the photomask was used to expose it at an energy of 80 mJ / cm 2 under a high pressure mercury lamp. The exposed substrate was developed by spraying in a 0.04% KOH aqueous solution at a temperature of 25 ° C., washed with pure water, dried, and post-baked in a convection oven at 220 ° C. for 30 minutes.

The coating film pattern obtained by carrying out the same method as Example 1 using the photosensitive resin composition prepared as described above had a coating film thickness of 1.1 μm, which showed no dropout of the pattern, showed excellent straightness, and was clean without contamination of the exposed part. Pattern characteristics were shown, and the optical density was 4.0 or more, showing excellent shading characteristics.

Example  6

A compound in which the alcohol group formed by adding glycidyl methacrylate to a copolymer of benzyl (meth) acrylate / styrene / dicyclopentanyl methacrylate / (meth) acrylic acid as a binder and ring-opened with some succinic anhydride [molar ratio 35] (Benzyl (meth) acrylate) / 10 (styrene) / 10 (dicyclopentanyl methacrylate) / 20 (glycidyl adduct) / 25 (anhydrous succinic acid adduct), Mw = 10,000, acid value 63 KOH mg / g, double bond equivalent 492] A black matrix photosensitive resin composition was prepared in the same composition as in Example 1 except that 60 parts by weight of the double bond was used.

The coating film pattern obtained by carrying out the same method as Example 1 using the photosensitive resin composition prepared as described above had a coating film thickness of 1.1 μm, which showed no dropout of the pattern, showed excellent straightness, and was clean without contamination of the exposed part. The pattern characteristics were shown, and the optical density was 4.0 or more.

Comparative example  One

A compound in which the alcohol group formed by adding glycidyl methacrylate to a copolymer of benzyl (meth) acrylate / (meth) acrylic acid as an alkali-soluble resin binder in Example 1 was ring-opened with some succinic anhydride [molar ratio 35 ( Benzyl (meth) acrylate) / 25 (glycidyl adduct) / 40 (succinic anhydride adduct), Mw = 12,000, acid value 89 KOH mg / g, double bond equivalent weight 386] Using the same component as in Example 1, a black matrix photosensitive resin composition was prepared.

The coating film obtained by performing the same method as Example 1 using the photosensitive resin composition manufactured as mentioned above fell out of the pattern by image development, and the favorable pattern characteristic was not acquired.

Comparative example  2

Compound which added glycidyl methacrylate to the copolymer of benzyl (meth) acrylate / (meth) acrylic acid as the alkali-soluble resin binder in Example 1 [molar ratio 55 (benzyl (meth) acrylate) / 20 (( Meta) acrylic acid) / 25 (glycidyl adduct), Mw = 12,000, acid value 65 KOH mg / g, double bond equivalents 686] Black matrix photosensitive A resin composition was prepared.

When the development was carried out in the same manner as in Example 1 using the photosensitive resin composition prepared as described above, the development time was too long to obtain a pattern, and sometimes the straightness and coating film properties of the developed pattern were not good.

Comparative example  3

Compound in which glycidyl methacrylate was added to a copolymer of benzyl (meth) acrylate / (meth) acrylic acid as the alkali-soluble resin binder in Example 1 [molar ratio 55 (benzyl (meth) acrylate) / 40 (( Meta) acrylic acid) / 5 (glycidyl adduct), Mw = 12,000, acid value 157 H mg / g, double bond equivalent weight 2,858] A resin composition was prepared.

When the development was carried out by the same method as in Example 1 using the photosensitive resin composition prepared as described above, the development time was too fast, resulting in dropping of the pattern.

In the present invention, when the acid value of the binder and the amount of the unsaturated double bond in the binder used in the black matrix photosensitive resin composition are present within the range defined in the present invention, the black matrix is produced using the same, even with a small exposure amount. Patterning to realize high OD is possible, and the obtained pattern is excellent in straightness and overall film properties.

Claims (19)

In 100 parts by weight of the black matrix photosensitive resin composition for liquid crystal display, 1) 1 to 40 parts by weight of a colorant including a black pigment; 2) 1 to 20 parts by weight of an alkali-soluble resin binder represented by Formula 1 below; 3) 1 to 20 parts by weight of a multifunctional monomer having an ethylenically unsaturated double bond; 4) 0.1 to 20 parts by weight of the photopolymerization initiator; And 5) 30 to 90 parts by weight of the solvent, The alkali-soluble resin binder satisfies 50 <P <150, 1000 <Q <2500, 1500 <(10 × P) + Q <4000 when d is less than 0 to 5, and d is 5 to 40. Black <RTI ID = 0.0> m <80> </ RTI> <400 <Q <1000, 500 <(10 x P) + Q <1500, wherein P is an acid value (KOH mg / g And Q is the double bond equivalent): [Formula 1]

In Formula 1, R1 is hydrogen or a group which forms a 5-membered ring carboxylic anhydride or imide structure, R 2 is selected from the group consisting of hydrogen, methyl and hydroxy methyl, R3 and R4 are the same as or different from each other, and each independently hydrogen or methyl, X is a C ₁ ~ C ₁₂ alkyl esters, a hydroxy group 1-2 dogs substituted C ₂ ~ C ₆ alkyl esters, C ₁ ~ C for ₃ alkoxy C ₂ ~ C ₆ substituted alkyl esters, halogen-substituted C ₁ to C ₆ alkyl esters, C ₁ to C ₃ alkoxy poly (n = 2 to 30) alkylenes, C ₂ to C ₃ glycol esters, C ₁ to C ₆ alkyl esters substituted with phenyl groups, C Phenyl substituted by C ₁ to C ₆ alkyl group, phenyl substituted by C ₁ to C ₆ alkoxy, phenyl substituted by halogen group, C ₁ to C ₆ alkoxy methyl, glycidoxy methyl, and R 1 and Selected from the group consisting of a 5-membered ring carboxylic anhydride or an imide structure, Y is selected from the group consisting of C ₀ to C ₁₂ alkylene, alkylene esters having 3 to 60 carbon atoms including 1 to 10 ester groups, Z is ethylene, propylene, butylene, 1,2-phenylene, 1,2-cyclohexylene,

It is selected from the group consisting of where * is the connecting portion, a, b, c and d are molar mixing ratios of A, B, C and D, respectively, a is 10 to 90, b is 0 to 60, c is 0 to 40, and d is 0 to 40. The black matrix photosensitive resin composition for liquid crystal display according to claim 1, wherein the colorant containing the black pigment of 1) is mixed with carbon black and one or more colored pigments. The carbon black is Sisto 5HIISAF-HS, Sisto KH, Sisto 3HHAF-HS, Sisto NH, Sisto 3M, Sisto 300HAF-LS, Sisto 116HMMAF-HS , Cysto 116MAF, cysto FMFEF-HS, cysto SOFEF, cysto VGPF, cysto SVHSRF-HS, and cysto SSRF; Mitsubishi Chemical Corporation Diagram Black II, Diagram Black N339, Diagram Black SH, Diagram Black H, Diagram LH, Diagram HA, Diagram SF, Diagram N550M, Diagram M, Diagram E, Diagram G, Diagram R, Diagram N760M, Diagram LR, # 2700, # 2600, # 2400, # 2350, # 2300, # 2200, # 1000, # 980, # 900, MCF88, # 52, # 50, # 47, # 45, # 45L, # 25, # CF9, # 95, # 3030, # 3050, MA7, MA77, MA8, MA11, OIL7B, OIL9B, OIL11B, OIL30B, and OIL31B; Daegu Co., Ltd. PRINTEX-U, PRINTEX-V, PRINTEX-140U, PRINTEX-140V, PRINTEX-95, PRINTEX-85, PRINTEX-75, PRINTEX-55, PRINTEX-45, PRINTEX-300, PRINTEX-35, PRINTEX-25, PRINTEX-200, PRINTEX-40, PRINTEX-30, PRINTEX-3, PRINTEX-A, SPECIAL BLACK-550, SPECIAL BLACK-350, SPECIAL BLACK-250, SPECIAL BLACK-100, and LAMP BLACK-101; RAVEN-1100ULTRA, RAVEN-1080ULTRA, RAVEN-1060ULTRA, RAVEN-1040, RAVEN-1035, RAVEN-1020, RAVEN-1000, RAVEN-890H, RAVEN-890, RAVEN-880ULTRA, RAVEN-860ULTRA, RAVEN-850, RAVEN-820, RAVEN-790ULTRA, RAVEN-780ULTRA, RAVEN-760ULTRA, RAVEN-520, RAVEN-500, RAVEN-460, RAVEN-450, RAVEN-430ULTRA, RAVEN-420, RAVEN-410, RAVEN- Black matrix photosensitive resin composition for liquid crystal display, which is selected from 2500ULTRA, RAVEN-2000, RAVEN-1500, RAVEN-1255, RAVEN-1250, RAVEN-1200, RAVEN-1190ULTRA, and RAVEN-1170. The colorant according to claim 2, which can be used in combination with the carbon black, carmine 6B (CI12490), phthalocyanine green (CI 74260), phthalocyanine blue (CI 74160), Mitsubishi carbon black MA100, perylene black (BASF K0084. K0086) , Cyanine black, linole yellow (CI21090), linole yellow GRO (CI 21090), benzidine yellow 4T-564D, Mitsubishi carbon black MA-40, Victoria pure blue (CI42595), CI PIGMENT RED97, 122, 149, 168, 177, 180, 192, 215, C.I. PIGMENT GREEN 7, 36, C.I. PIGMENT 15: 1, 15: 4, 15: 6, 22, 60, 64, C.I. PIGMENT 83, 139, and C.I. It is selected from PIGMENT VIOLET 23, The black matrix photosensitive resin composition for liquid crystal displays. The method of claim 1, wherein the monomer for forming the A portion of the alkali-soluble resin binder represented by the formula (1) of the 2) is benzyl (meth) acrylate, methyl (meth) acrylate, ethyl (meth) acrylate, butyl (Meth) acrylate, dimethylaminoethyl (meth) acrylate, isobutyl (meth) acrylate, t-butyl (meth) acrylate, cyclohexyl (meth) acrylate, isobornyl (meth) acrylate, ethylhexyl (Meth) acrylate, 2-phenoxyethyl (meth) acrylate, tetrahydroperpril (meth) acrylate, hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 2-hydrate Hydroxy-3-chloropropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, acyloctyloxy-2-hydroxypropyl (meth) acrylate, glycerol (meth) acrylate, 2-methoxyethyl (Meta) acrylic ray , 3-methoxybutyl (meth) acrylate, ethoxydiethylene glycol (meth) acrylate, methoxytriethylene glycol (meth) acrylate, methoxytripropylene glycol (meth) acrylate, poly (ethylene glycol) methyl Ether (meth) acrylate, phenoxydiethylene glycol (meth) acrylate, p-nonylphenoxypolyethylene glycol (meth) acrylate, p-nonylphenoxypolypropylene glycol (meth) acrylate, glycidyl (meth) Acrylate, tetrafluoropropyl (meth) acrylate, 1,1,1,3,3,3-hexafluoroisopropyl (meth) acrylate, octafluoropentyl (meth) acrylate, heptadecafluoro Decyl (meth) acrylate, tribromophenyl (meth) acrylate, dicyclopentanyl methacrylate, dicyclopentenyl methacrylate, dicyclopentenyloxyethyl acrylate, isobornyl meth arc Unsaturated carboxylic acid esters such as relate, adamantylmethacrylate, methyl α-hydroxymethyl acrylate, ethyl α-hydroxymethyl acrylate, propyl α-hydroxymethyl acrylate, butyl α-hydroxymethyl acrylate Ryu; Aromatic vinyls such as styrene, α-methyl styrene, (o, m, p) -vinyl toluene, (o, m, p) -methoxy styrene, (o, m, p) -chloro styrene; Unsaturated ethers such as vinyl methyl ether, vinyl ethyl ether, allyl glycidyl ether; Unsaturated imides such as N-phenyl maleimide, N- (4-chlorophenyl) maleimide, N- (4-hydroxyphenyl) maleimide, and N-cyclohexyl maleimide; The black matrix photosensitive resin composition for liquid crystal displays characterized by using 1 or more types chosen from the group which consists of maleic anhydrides, such as maleic anhydride and methyl maleic anhydride. The monomer for forming the B portion of the alkali-soluble resin binder represented by the formula (1) of (2) is (meth) acrylic acid, crotonic acid, itaconic acid, maleic acid, fumaric acid, monomethyl maleic acid, 5-norbornene 2-carboxylic acid, mono-2-((meth) acryloyloxy) ethyl phthalate, mono-2-((meth) acryloyloxy) ethyl succinate, ω-carboxy polycaprolactone mono (meth) acrylate 1 or more types chosen from the group which consists of etc. are used, The black matrix photosensitive resin composition for liquid crystal displays characterized by the above-mentioned. The method of claim 1, wherein the alkali-soluble resin binder represented by the formula (1) of 2) 1) preparing a polymer consisting of A and B in Chemical Formula 1 by polymerizing a monomer for forming A portion and a monomer for forming B portion of Formula 1; 2) condensation reaction of a part of the B portion of the polymer prepared in step 1) with an epoxy group of glycidyl (meth) acrylate to prepare a polymer consisting of A, B and C in Chemical Formula 1; And 3) reacting a hydroxyl group of a portion of the C portion of the polymer prepared in step 2) with a carboxylic anhydride to form a D portion of the Chemical Formula 1 Black matrix photosensitive resin composition for a liquid crystal display, which is produced by a manufacturing method comprising a. The carboxylic acid anhydride of step 3) is succinic anhydride, glutaric anhydride, adipic anhydride, phthalic anhydride, hexahydrophthalic anhydride, cis-1,2,3,6-tetrahydrophthalic anhydride, 3 Black matrix for liquid crystal displays characterized in that it is selected from, 4,5,6-tetrahydrophthalic anhydride, itaconic anhydride, trimellitic anhydride, and cis-5-norbornene-endo-2,3-dicarboxylic anhydride Photosensitive resin composition. The method of claim 1, wherein the alkali-soluble resin binder represented by the formula (1) of 2) has a range of 5 to 60 when d is less than 0 to 5, b is 0 to 10 when d is 5 to 40 It has the range of the black matrix photosensitive resin composition for liquid crystal displays. delete The black matrix photosensitive resin composition for liquid crystal display according to claim 1, wherein the alkali-soluble resin binder represented by Chemical Formula 1 of 2) has a weight average molecular weight in the range of 1,000 to 200,000. The polyfunctional monomer having an ethylenically unsaturated double bond of 3) is a compound having a boiling point of 100 ° C. or more or a functional monomer containing caprolactone having at least one or more addition-polymerizable unsaturated groups in a molecule. The black matrix photosensitive resin composition for liquid crystal displays characterized by the above-mentioned. The method of claim 1, wherein the photopolymerization initiator of 4) is used by mixing at least one compound selected from the group consisting of acetophenone compounds, biimidazole compounds, triazine compounds, and oxime compounds. Black matrix photosensitive resin composition for liquid crystal display. The black matrix photosensitive resin composition for a liquid crystal display according to claim 1, wherein the 4) photopolymerization initiator further comprises 0.01 to 10 parts by weight of the photocrosslinker, or 0.01 to 10 parts by weight of the curing accelerator. The solvent of claim 1, wherein the solvent of 5) is propylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, diethylene glycol dimethyl ether, cyclohexanone, 2- Heptanone, 3-heptanone, 2-hydroxyethylpropionate, 3-methyl-3-methoxybutylpropionate, ethyl-3-methoxypropionate, methyl-3-ethoxypropionate, Ethyl-3-ethoxypropionate, butyl acetate, amylpermate, isoamyl acetate, isobutyl acetate, butylpropionate, isopropylbutyrate, ethylbutyrate, butylbutyrate, ethylpyruvate, or γ-butyrol acetate Black matrix photosensitive water for liquid crystal display, characterized by using a mixture of two or more of Composition. The method according to claim 1, wherein the black matrix photosensitive resin composition for liquid crystal display further comprises 6) primary additives selected from the group consisting of dispersants, adhesion promoters, antioxidants, ultraviolet absorbers, thermal polymerization inhibitors and leveling agents. The black matrix photosensitive resin composition for liquid crystal displays characterized by the above-mentioned. 7) The secondary additive according to claim 1, wherein the black matrix photosensitive resin composition for liquid crystal display is selected from the group consisting of carbon black dispersions, resin binders having functionalities, monomers, radiation-sensitive compounds, and other additives. It further comprises a black matrix photosensitive resin composition for a liquid crystal display. 1) applying the black matrix photosensitive resin composition for liquid crystal display according to any one of claims 1 to 9 and 11 to 17 to the panel; And 2) exposing and developing the applied black matrix photosensitive resin Black matrix for a liquid crystal display, which is produced by a manufacturing method comprising a. A liquid crystal display comprising the black matrix for liquid crystal display of claim 18.

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