KR100902128B1 - 방열 인쇄회로기판 및 반도체 칩 패키지 - Google Patents
방열 인쇄회로기판 및 반도체 칩 패키지 Download PDFInfo
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- KR100902128B1 KR100902128B1 KR1020070098381A KR20070098381A KR100902128B1 KR 100902128 B1 KR100902128 B1 KR 100902128B1 KR 1020070098381 A KR1020070098381 A KR 1020070098381A KR 20070098381 A KR20070098381 A KR 20070098381A KR 100902128 B1 KR100902128 B1 KR 100902128B1
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- semiconductor chip
- solder resist
- insulating layer
- carbon nanotubes
- impregnated
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 80
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 75
- 229910000679 solder Inorganic materials 0.000 claims abstract description 72
- 239000002041 carbon nanotube Substances 0.000 claims abstract description 71
- 229910021393 carbon nanotube Inorganic materials 0.000 claims abstract description 71
- 230000017525 heat dissipation Effects 0.000 claims abstract description 30
- 239000012778 molding material Substances 0.000 claims abstract description 23
- 238000009413 insulation Methods 0.000 claims abstract description 4
- 238000000034 method Methods 0.000 claims description 14
- 230000005855 radiation Effects 0.000 claims 1
- 238000005476 soldering Methods 0.000 claims 1
- 239000000758 substrate Substances 0.000 abstract description 35
- -1 heat dissipation Inorganic materials 0.000 abstract 1
- 230000008859 change Effects 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 4
- 239000006185 dispersion Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 3
- 230000007257 malfunction Effects 0.000 description 3
- 238000000498 ball milling Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 238000007385 chemical modification Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000014509 gene expression Effects 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000010008 shearing Methods 0.000 description 2
- 238000003892 spreading Methods 0.000 description 2
- 230000007480 spreading Effects 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000002071 nanotube Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000000844 transformation Methods 0.000 description 1
- 238000002525 ultrasonication Methods 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/285—Permanent coating compositions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0201—Thermal arrangements, e.g. for cooling, heating or preventing overheating
- H05K1/0203—Cooling of mounted components
- H05K1/0209—External configuration of printed circuit board adapted for heat dissipation, e.g. lay-out of conductors, coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01019—Potassium [K]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0242—Shape of an individual particle
- H05K2201/026—Nanotubes or nanowires
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/34—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by soldering
- H05K3/3452—Solder masks
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/734—Fullerenes, i.e. graphene-based structures, such as nanohorns, nanococoons, nanoscrolls or fullerene-like structures, e.g. WS2 or MoS2 chalcogenide nanotubes, planar C3N4, etc.
- Y10S977/742—Carbon nanotubes, CNTs
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
Claims (14)
- 표면에 회로패턴이 형성되는 절연층과;상기 절연층에 적층되는 솔더 레지스트를 포함하되,상기 절연층 및 솔더 레지스트에는 탄소나노튜브(carbon nano tube)가 함침되는 것을 특징으로 하는 방열 인쇄회로기판.
- 제1항에 있어서,상기 절연층은 복수 개로 적층되며, 상기 솔더 레지스트는 상기 복수의 절연층의 최외층에 적층되는 것을 특징으로 하는 방열 인쇄회로기판.
- 제1항에 있어서,상기 솔더레지스트에는, 상기 솔더 레지스트의 중량에 대해 0.1 내지 1 중량%의 탄소나노튜브가 함침되는 것을 특징으로 하는 방열 인쇄회로기판.
- 삭제
- 제1항에 있어서,상기 절연층에는, 상기 절연층의 중량에 대해 0.1 내지 1 중량%의 탄소나노튜브가 함침되는 것을 특징으로 하는 방열 인쇄회로기판.
- 반도체 칩과;상기 반도체 칩이 실장되며, 표면에 회로패턴이 형성되는 절연층과;상기 절연층에 적층되는 솔더 레지스트를 더 포함하되,상기 절연층 및 솔더 레지스트에는 탄소나노튜브가 함침되는 것을 특징으로 하는 반도체 칩 패키지.
- 제6항에 있어서,상기 절연층은 복수 개로 적층되며, 상기 솔더 레지스트는 상기 복수의 절연층의 최외층에 적층되는 것을 특징으로 하는 반도체 칩 패키지.
- 제6항에 있어서,상기 솔더레지스트에는, 상기 솔더 레지스트의 중량에 대해 0.1 내지 1 중량%의 탄소나노튜브가 함침되는 것을 특징으로 하는 반도체 칩 패키지.
- 삭제
- 제6항에 있어서,상기 절연층에는, 상기 절연층의 중량에 대해 0.1 내지 1 중량%의 탄소나노튜브가 함침되는 것을 특징으로 하는 반도체 칩 패키지.
- 제6항에 있어서,상기 반도체 칩과 상기 절연층 사이에는 언더필이 더 개재되며,상기 언더필에는 탄소나노튜브(carbon nano tube)가 함침되는 것을 특징으로 하는 반도체 칩 패키지.
- 제11항에 있어서,상기 언더필에는, 상기 언더필의 중량에 대해 0.1 내지 1 중량%의 탄소나노튜브가 함침되는 것을 특징으로 하는 반도체 칩 패키지.
- 제6항에 있어서,상기 반도체 칩을 인캡슐레이팅(encapsulating)하는 몰딩재를 더 포함하되,상기 몰딩재에는 탄소나노튜브가 함침되는 것을 특징으로 하는 반도체 칩 패키지.
- 제13항에 있어서,상기 몰딩재에는, 상기 몰딩재의 중량에 대해 0.1 내지 1 중량%의 탄소나노튜브가 함침되는 것을 특징으로 하는 반도체 칩 패키지.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070098381A KR100902128B1 (ko) | 2007-09-28 | 2007-09-28 | 방열 인쇄회로기판 및 반도체 칩 패키지 |
US12/010,643 US7663226B2 (en) | 2007-09-28 | 2008-01-28 | Heat-releasing printed circuit board and semiconductor chip package |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070098381A KR100902128B1 (ko) | 2007-09-28 | 2007-09-28 | 방열 인쇄회로기판 및 반도체 칩 패키지 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20090032832A KR20090032832A (ko) | 2009-04-01 |
KR100902128B1 true KR100902128B1 (ko) | 2009-06-09 |
Family
ID=40507255
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020070098381A Expired - Fee Related KR100902128B1 (ko) | 2007-09-28 | 2007-09-28 | 방열 인쇄회로기판 및 반도체 칩 패키지 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7663226B2 (ko) |
KR (1) | KR100902128B1 (ko) |
Cited By (1)
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US9386243B2 (en) | 2013-12-27 | 2016-07-05 | Samsung Electronics Co., Ltd. | Lens shading correction method and image signal processing device and image sensor system employing the method |
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KR20080111316A (ko) * | 2007-06-18 | 2008-12-23 | 삼성전기주식회사 | 메탈코어를 갖는 방열 기판 및 그 제조방법 |
KR101077380B1 (ko) * | 2009-07-31 | 2011-10-26 | 삼성전기주식회사 | 인쇄회로기판 및 그 제조방법 |
KR101077359B1 (ko) * | 2009-09-23 | 2011-10-26 | 삼성전기주식회사 | 방열회로기판 및 그 제조방법 |
KR20110037332A (ko) * | 2009-10-06 | 2011-04-13 | 삼성전기주식회사 | 인쇄회로기판 및 그 제조방법 |
KR101692453B1 (ko) * | 2010-03-17 | 2017-01-04 | 삼성전자주식회사 | 전자 장치 |
US10115654B2 (en) * | 2010-06-18 | 2018-10-30 | Palo Alto Research Center Incorporated | Buried thermally conductive layers for heat extraction and shielding |
US8482111B2 (en) | 2010-07-19 | 2013-07-09 | Tessera, Inc. | Stackable molded microelectronic packages |
KR101128063B1 (ko) | 2011-05-03 | 2012-04-23 | 테세라, 인코포레이티드 | 캡슐화 층의 표면에 와이어 본드를 구비하는 패키지 적층형 어셈블리 |
US9105483B2 (en) | 2011-10-17 | 2015-08-11 | Invensas Corporation | Package-on-package assembly with wire bond vias |
US8946757B2 (en) | 2012-02-17 | 2015-02-03 | Invensas Corporation | Heat spreading substrate with embedded interconnects |
US8835228B2 (en) | 2012-05-22 | 2014-09-16 | Invensas Corporation | Substrate-less stackable package with wire-bond interconnect |
US9502390B2 (en) | 2012-08-03 | 2016-11-22 | Invensas Corporation | BVA interposer |
US9167710B2 (en) | 2013-08-07 | 2015-10-20 | Invensas Corporation | Embedded packaging with preformed vias |
US20150076714A1 (en) | 2013-09-16 | 2015-03-19 | Invensas Corporation | Microelectronic element with bond elements to encapsulation surface |
US9379074B2 (en) | 2013-11-22 | 2016-06-28 | Invensas Corporation | Die stacks with one or more bond via arrays of wire bond wires and with one or more arrays of bump interconnects |
US9583456B2 (en) | 2013-11-22 | 2017-02-28 | Invensas Corporation | Multiple bond via arrays of different wire heights on a same substrate |
US9583411B2 (en) | 2014-01-17 | 2017-02-28 | Invensas Corporation | Fine pitch BVA using reconstituted wafer with area array accessible for testing |
US10381326B2 (en) * | 2014-05-28 | 2019-08-13 | Invensas Corporation | Structure and method for integrated circuits packaging with increased density |
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US10490528B2 (en) | 2015-10-12 | 2019-11-26 | Invensas Corporation | Embedded wire bond wires |
US9490222B1 (en) | 2015-10-12 | 2016-11-08 | Invensas Corporation | Wire bond wires for interference shielding |
US10332854B2 (en) | 2015-10-23 | 2019-06-25 | Invensas Corporation | Anchoring structure of fine pitch bva |
US10181457B2 (en) | 2015-10-26 | 2019-01-15 | Invensas Corporation | Microelectronic package for wafer-level chip scale packaging with fan-out |
US10043779B2 (en) | 2015-11-17 | 2018-08-07 | Invensas Corporation | Packaged microelectronic device for a package-on-package device |
US9984992B2 (en) | 2015-12-30 | 2018-05-29 | Invensas Corporation | Embedded wire bond wires for vertical integration with separate surface mount and wire bond mounting surfaces |
TWM524553U (zh) * | 2016-03-21 | 2016-06-21 | Team Expert Man Consulting Service Ltd | 半導體封裝結構 |
US9935075B2 (en) | 2016-07-29 | 2018-04-03 | Invensas Corporation | Wire bonding method and apparatus for electromagnetic interference shielding |
US10299368B2 (en) | 2016-12-21 | 2019-05-21 | Invensas Corporation | Surface integrated waveguides and circuit structures therefor |
US11984422B2 (en) * | 2021-08-06 | 2024-05-14 | Taiwan Semiconductor Manufacturing Co., Ltd. | Semiconductor package and method of forming same |
CN116230675A (zh) * | 2021-12-03 | 2023-06-06 | 群创光电股份有限公司 | 电子装置及其制作方法 |
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2007
- 2007-09-28 KR KR1020070098381A patent/KR100902128B1/ko not_active Expired - Fee Related
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2008
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JP2002171050A (ja) | 1997-04-11 | 2002-06-14 | Ibiden Co Ltd | プリント配線板 |
JP2002009213A (ja) * | 2000-04-17 | 2002-01-11 | Suzuki Sogyo Co Ltd | 熱伝導性シート |
KR20050096311A (ko) * | 2004-03-30 | 2005-10-06 | 주식회사 영은전자 | 방열용 Solder Resist가 코팅된 인쇄회로기판의 제조방법 |
KR20070065789A (ko) * | 2005-12-20 | 2007-06-25 | 피닉스 프리시젼 테크날로지 코포레이션 | 회로판 및 그 제조방법 |
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US9386243B2 (en) | 2013-12-27 | 2016-07-05 | Samsung Electronics Co., Ltd. | Lens shading correction method and image signal processing device and image sensor system employing the method |
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KR20090032832A (ko) | 2009-04-01 |
US20090085193A1 (en) | 2009-04-02 |
US7663226B2 (en) | 2010-02-16 |
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