JPS6430220A - Alignment mark - Google Patents
Alignment markInfo
- Publication number
- JPS6430220A JPS6430220A JP62187190A JP18719087A JPS6430220A JP S6430220 A JPS6430220 A JP S6430220A JP 62187190 A JP62187190 A JP 62187190A JP 18719087 A JP18719087 A JP 18719087A JP S6430220 A JPS6430220 A JP S6430220A
- Authority
- JP
- Japan
- Prior art keywords
- film
- mark
- metallic material
- sputtering process
- resist pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62187190A JPS6430220A (en) | 1987-07-27 | 1987-07-27 | Alignment mark |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62187190A JPS6430220A (en) | 1987-07-27 | 1987-07-27 | Alignment mark |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6430220A true JPS6430220A (en) | 1989-02-01 |
Family
ID=16201681
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62187190A Pending JPS6430220A (en) | 1987-07-27 | 1987-07-27 | Alignment mark |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6430220A (ja) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07183360A (ja) * | 1993-12-22 | 1995-07-21 | Nec Corp | 電子線露光装置の装置較正用基準マーク及び装置較正 方法 |
| US7449790B2 (en) | 2004-08-26 | 2008-11-11 | Hitachi Global Storage Technologies, Inc. | Methods and systems of enhancing stepper alignment signals and metrology alignment target signals |
| US8283792B1 (en) | 2004-08-26 | 2012-10-09 | Hitachi Global Storage Technologies, Netherlands B.V. | Methods and systems for forming an alignment mark with optically mismatched alignment mark stack materials |
-
1987
- 1987-07-27 JP JP62187190A patent/JPS6430220A/ja active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07183360A (ja) * | 1993-12-22 | 1995-07-21 | Nec Corp | 電子線露光装置の装置較正用基準マーク及び装置較正 方法 |
| US7449790B2 (en) | 2004-08-26 | 2008-11-11 | Hitachi Global Storage Technologies, Inc. | Methods and systems of enhancing stepper alignment signals and metrology alignment target signals |
| US8283792B1 (en) | 2004-08-26 | 2012-10-09 | Hitachi Global Storage Technologies, Netherlands B.V. | Methods and systems for forming an alignment mark with optically mismatched alignment mark stack materials |
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