JPS5614238A - Lithographic plate preparation and material for its preparation - Google Patents
Lithographic plate preparation and material for its preparationInfo
- Publication number
- JPS5614238A JPS5614238A JP8957479A JP8957479A JPS5614238A JP S5614238 A JPS5614238 A JP S5614238A JP 8957479 A JP8957479 A JP 8957479A JP 8957479 A JP8957479 A JP 8957479A JP S5614238 A JPS5614238 A JP S5614238A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- hydrophilic
- lithographic plate
- preparation
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Printing Plates And Materials Therefor (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE:To prepare a lithographic plate superior in printing resistance, by subjecting to plasma etching an oleophilic material layer provided on a hydrophilic base surface selectively through a shielding mask. CONSTITUTION:A polyester resin, phenolic resin, or the like is coated on hydrophilic substrate 1, such as an aluminum plate with its face roughened to render it water-retentive, to form a hydrophilic material layer 2 having 1-5mu thickness, desired mask pattern 3 is formed further on layer 2, then this is plasma-etched under about 0.05-few Torr vacuum to remove the hydrophilic material on the nonshielded parts and to disclose the substrate face, and then, mask pattern 3 is removed to form a lithographic plate. An organic material is used in general as a material of said pattern, but the mask performance is enhanced by mixing a 10-70 wt% powder, such as silica or titanium oxide with the mask material.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8957479A JPS5614238A (en) | 1979-07-14 | 1979-07-14 | Lithographic plate preparation and material for its preparation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8957479A JPS5614238A (en) | 1979-07-14 | 1979-07-14 | Lithographic plate preparation and material for its preparation |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5614238A true JPS5614238A (en) | 1981-02-12 |
JPS623416B2 JPS623416B2 (en) | 1987-01-24 |
Family
ID=13974565
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8957479A Granted JPS5614238A (en) | 1979-07-14 | 1979-07-14 | Lithographic plate preparation and material for its preparation |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5614238A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6408755B1 (en) * | 1999-08-31 | 2002-06-25 | Agfa-Gavaert | Method for erasing a lithographic printing master |
DE102005000891B4 (en) * | 2005-01-07 | 2013-09-12 | Robert Bosch Gmbh | Process for producing a structured wafer |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8142987B2 (en) * | 2004-04-10 | 2012-03-27 | Eastman Kodak Company | Method of producing a relief image for printing |
US9799534B1 (en) | 2017-01-04 | 2017-10-24 | International Business Machines Corporation | Application of titanium-oxide as a patterning hardmask |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50102401A (en) * | 1974-01-17 | 1975-08-13 | ||
JPS5444904A (en) * | 1977-08-23 | 1979-04-09 | Fromson H A | Method of making flat printing plate |
-
1979
- 1979-07-14 JP JP8957479A patent/JPS5614238A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50102401A (en) * | 1974-01-17 | 1975-08-13 | ||
JPS5444904A (en) * | 1977-08-23 | 1979-04-09 | Fromson H A | Method of making flat printing plate |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6408755B1 (en) * | 1999-08-31 | 2002-06-25 | Agfa-Gavaert | Method for erasing a lithographic printing master |
DE102005000891B4 (en) * | 2005-01-07 | 2013-09-12 | Robert Bosch Gmbh | Process for producing a structured wafer |
Also Published As
Publication number | Publication date |
---|---|
JPS623416B2 (en) | 1987-01-24 |
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