Nothing Special   »   [go: up one dir, main page]

JPS5614238A - Lithographic plate preparation and material for its preparation - Google Patents

Lithographic plate preparation and material for its preparation

Info

Publication number
JPS5614238A
JPS5614238A JP8957479A JP8957479A JPS5614238A JP S5614238 A JPS5614238 A JP S5614238A JP 8957479 A JP8957479 A JP 8957479A JP 8957479 A JP8957479 A JP 8957479A JP S5614238 A JPS5614238 A JP S5614238A
Authority
JP
Japan
Prior art keywords
mask
hydrophilic
lithographic plate
preparation
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8957479A
Other languages
Japanese (ja)
Other versions
JPS623416B2 (en
Inventor
Satoshi Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP8957479A priority Critical patent/JPS5614238A/en
Publication of JPS5614238A publication Critical patent/JPS5614238A/en
Publication of JPS623416B2 publication Critical patent/JPS623416B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/40Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To prepare a lithographic plate superior in printing resistance, by subjecting to plasma etching an oleophilic material layer provided on a hydrophilic base surface selectively through a shielding mask. CONSTITUTION:A polyester resin, phenolic resin, or the like is coated on hydrophilic substrate 1, such as an aluminum plate with its face roughened to render it water-retentive, to form a hydrophilic material layer 2 having 1-5mu thickness, desired mask pattern 3 is formed further on layer 2, then this is plasma-etched under about 0.05-few Torr vacuum to remove the hydrophilic material on the nonshielded parts and to disclose the substrate face, and then, mask pattern 3 is removed to form a lithographic plate. An organic material is used in general as a material of said pattern, but the mask performance is enhanced by mixing a 10-70 wt% powder, such as silica or titanium oxide with the mask material.
JP8957479A 1979-07-14 1979-07-14 Lithographic plate preparation and material for its preparation Granted JPS5614238A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8957479A JPS5614238A (en) 1979-07-14 1979-07-14 Lithographic plate preparation and material for its preparation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8957479A JPS5614238A (en) 1979-07-14 1979-07-14 Lithographic plate preparation and material for its preparation

Publications (2)

Publication Number Publication Date
JPS5614238A true JPS5614238A (en) 1981-02-12
JPS623416B2 JPS623416B2 (en) 1987-01-24

Family

ID=13974565

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8957479A Granted JPS5614238A (en) 1979-07-14 1979-07-14 Lithographic plate preparation and material for its preparation

Country Status (1)

Country Link
JP (1) JPS5614238A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6408755B1 (en) * 1999-08-31 2002-06-25 Agfa-Gavaert Method for erasing a lithographic printing master
DE102005000891B4 (en) * 2005-01-07 2013-09-12 Robert Bosch Gmbh Process for producing a structured wafer

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8142987B2 (en) * 2004-04-10 2012-03-27 Eastman Kodak Company Method of producing a relief image for printing
US9799534B1 (en) 2017-01-04 2017-10-24 International Business Machines Corporation Application of titanium-oxide as a patterning hardmask

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50102401A (en) * 1974-01-17 1975-08-13
JPS5444904A (en) * 1977-08-23 1979-04-09 Fromson H A Method of making flat printing plate

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50102401A (en) * 1974-01-17 1975-08-13
JPS5444904A (en) * 1977-08-23 1979-04-09 Fromson H A Method of making flat printing plate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6408755B1 (en) * 1999-08-31 2002-06-25 Agfa-Gavaert Method for erasing a lithographic printing master
DE102005000891B4 (en) * 2005-01-07 2013-09-12 Robert Bosch Gmbh Process for producing a structured wafer

Also Published As

Publication number Publication date
JPS623416B2 (en) 1987-01-24

Similar Documents

Publication Publication Date Title
JPS57204133A (en) Manufacture of semiconductor integrated circuit
IE831339L (en) Microelectronic device manufacture
CA2013245A1 (en) X-ray lithography mask and devices made therewith
JPS5614238A (en) Lithographic plate preparation and material for its preparation
JPS5646753A (en) Preparation of gravure lithographic plate
EP0304077A3 (en) Method of forming a fine pattern
EP0385480A3 (en) Aperture pattern printing plate for shadow mask and method of manufacturing the same
JPS6413536A (en) Pattern forming method
CA2441802A1 (en) Thermosensitive plate material for lithographic plate formation, process for producing the same, coating liquid, and lithographic plate
JPS5795053A (en) X-ray window
JPS5544813A (en) Printing method
JPS5559467A (en) Lithographic prate and production thereof
JPS57198632A (en) Fine pattern formation
JPS5568655A (en) Manufacturing method of wiring
WO1997043694A3 (en) Method of producing a stencil mask
JPS57177973A (en) Formation of simulated etching pattern
JPS569736A (en) Photosensitive image forming material
JPS5570904A (en) Nanufacture for cunti-lever for pickup
JPS5661124A (en) Forming method of thin film on substrate having stepped part
JPS5656864A (en) Preparation of lithographic printing form
JPS57141924A (en) Pattern forming method
JPS6413727A (en) Manufacture of semiconductor device
JPS56130751A (en) Manufacture of mask
JPS55124233A (en) Manufacturing method of semiconductor device
JPS55105331A (en) Method for forming electronic-beam resist pattern on electrical insulating material