JP3441322B2 - Substrate processing apparatus and method - Google Patents

Description

Detailed Description of the Invention

[0001]

TECHNICAL FIELD The present invention relates to a semiconductor wafer,
Thin plate substrates such as liquid crystal glass substrates, photomask glass substrates, and optical disc substrates (hereinafter referred to simply as "substrate").
(Referred to as ").

[0002]

2. Description of the Related Art Conventionally, a substrate to be processed is provided in a plurality of processing tanks (processing sections) each including a chemical solution tank containing at least one kind of chemical solution and a washing tank containing at least one pure water. There is known a substrate processing apparatus in which the oxide film on the substrate surface is etched, the resist film is removed, or contaminants on the substrate surface are removed by sequentially immersing the substrate.

When the substrates are sequentially processed in the conventional substrate processing apparatus, the transfer robot sequentially transfers the substrates. Along with the transportation of the substrate, substrate data indicating in which processing bath the substrate exists is stored in a storage unit such as a memory. Based on the substrate data, the transfer robot takes out the substrate from the processing bath in which the substrate is immersed, and automatically transfers the substrate to the next processing bath. Also, in the automatic operation, when the transfer robot takes out the substrate from the processing tank based on the substrate data, the sensor confirms whether or not the substrate actually exists in the processing tank. When the presence of
If the presence of the board is not confirmed, an error is displayed.

In such a conventional substrate processing apparatus,
If the transfer robot cannot operate automatically due to a malfunction that is necessary for automatic operation but does not hinder the manual operation of the transfer robot, such as a sensor failure that confirms the presence of the board The operation is stopped, and the operator manually operates the transfer robot to operate the transfer robot to transfer the substrate.

[0005]

However, in the conventional substrate processing apparatus, when the automatic operation is switched to the manual operation, the program for the automatic operation ends, so that the substrate data of the substrate stored in the memory or the like is lost. Until the sensor disappears and the sensor failure is repaired, or even after the repair is started and the automatic operation is started again, it is unknown in which processing tank the substrate exists, and the transfer robot transfers the substrate. I can't. After all, in the conventional substrate processing apparatus, once the automatic operation is switched to the manual operation, the automatic operation cannot be restarted when the substrate exists in the processing tank, and the operator manually operates the transfer robot from the remote control operation unit. It is necessary to sequentially transport the substrates existing in all the processing baths by operating the above, and to store them in the unloader unit that stores the processed substrates.

[0006] As described above, the apparatus that requires the work of the operator without being able to restart the automatic operation is a problem to be improved from the viewpoint of the efficiency of the substrate manufacturing process.

The present invention has been made in view of the above problems, and an object of the present invention is to provide a substrate processing apparatus capable of switching from automatic operation to manual operation and then to automatic operation again.

[0008]

In order to achieve the above object, the invention according to claim 1 has a plurality of substrates to be processed.
A substrate processing apparatus in which a predetermined series of processing is sequentially performed via a processing tank , and a transfer unit that sequentially transfers the substrates as the processing on the substrates progresses, and a transfer of the substrates by the transfer unit. , Which processing tank the substrate is in
Update means for updating the board data shown, storage means for storing and holding the board data updated by the update means, and detection means for detecting that it has become impossible to sequentially transfer the boards by automatic operation, Transfer means for switching the automatic operation to the manual operation after the detection means detects that it is impossible to sequentially transfer the substrates, and the transfer means .
Driving operation for inputting commands for driving the means
To change the contents stored in the input means and the storage means
Comprising of a changing operation input means, and Oite after being switched to the manual operation of automatic operation by the switching means, the storage means continues to hold the substrate data, input from the drive operation input means
The transfer means transfers the substrate based on the applied drive command,
Change operation input means according to the transfer of the board based on the command
Based on the input update information, the updating means writes in the storage means.
To update the board data that憶hold.

[0009] According to a second aspect of the invention, the substrate processing apparatus according to claim 1, when restarting the automatic operation from the manual operation, with reference to the substrate data stored in the storage unit, the board data Based on this, the automatic operation of the processing on the substrate is continued.

According to a third aspect of the present invention, in the substrate processing apparatus according to the first or second aspect, the processing bath is a chemical.
Provided with a liquid tank and the washing tank, after being switched to the manual operation by the switching means, when the substrate to chemical liquid tank is immersed in, the substrate transfer means based on the driving command is input from the driving operation input means Take out from the chemical solution and carry it to the washing tank.
Based on the update information input from the change operation input means.
Board data stored and held in the storage means by the updating means
Is renewed to the washing tank stage .

The invention according to claim 4 is the substrate to be processed.
Performs a predetermined series of processing sequentially through multiple processing tanks.
A substrate processing method, wherein
Depending on the transfer process, the transfer process
In which processing tank the substrate exists as it is transported
The update process for updating the board data indicating
The board data that has been updated by
Sequential storage and sequential transfer of substrates by automatic operation
And a detection process that detects that
This makes it impossible to transport the boards in sequence.
Switching to switch from automatic operation to manual operation after detecting
Inputs commands for driving the process and board transfer.
Driving operation input step to apply force and contents stored in the storage medium
And a change operation input step for changing
After switching from automatic operation to manual operation,
To retain the board data stored in the storage process.
Based on the drive command input in the drive operation input process.
The board is transported based on the
Based on the update information input in the change operation input process
The board data stored and held in the storage medium.
It

The invention as defined in claim 5 is as set forth in claim 4.
Resumes automatic operation from manual operation in the substrate processing method
Refer to the board data stored in the storage medium
Then, the automatic operation of the processing for the board based on the board data
To continue .

The invention according to claim 6 is the invention according to claim 4 or
The substrate processing method according to claim 5, wherein the processing tank is a chemical
Equipped with a liquid tank and a water washing tank, and can be operated automatically by the switching process.
After switching to manual operation, the substrate is immersed in the chemical bath.
Is input in the drive operation input step
Water is taken out from the chemical bath based on the drive command.
It is transferred to the washing tank and the changes entered in the change operation input process
Based on the new information, the board data stored in the storage medium is retained.
The tank to the water washing tank .

[0014]

[0015]

[0016]

DETAILED DESCRIPTION OF THE INVENTION

<Example of Overall Configuration of Apparatus> FIG. 1 is a schematic plan view showing an example of the overall configuration of a substrate processing apparatus 100 showing an embodiment of the present invention. The device configuration is not limited to this. A cassette containing a plurality of substrates to be processed is placed on the loader L, the substrates are sequentially transferred in the X direction, processed in a plurality of processing tanks (processing units) B, and finally transferred to the unloader UL. At this time, the substrate is transported by the transport robot TR provided on the transport path R in the X direction or (-
It is performed by driving in the X) direction. The number of transfer robots is arbitrary. In addition, the processing form of the substrate is
It does not matter whether it is a single-wafer processing mode in which substrates are processed one by one or a batch processing mode in which a plurality of substrates are processed at one time. Further, in the case of batch processing mode, the substrate transfer mode may be cassette transfer in which the substrate is transferred in a cassette or cassetteless transfer in which only the substrate is transferred.

A plurality of processing baths B of this substrate processing apparatus will be described. First, the substrate discharged from the loader L is immersed in the chemical bath B1 and then rinsed with pure water in the washing bath B2. Then, after the substrate is immersed in the chemical bath B3, it is rinsed again in the washing bath B4. After that, the substrate is further subjected to immersion treatment in the chemical bath B5 and rinsed in the washing bath B6. After that, the substrate is dried by the spin dryer SD and housed in the unloader UL.

To give a concrete example of each of the chemical liquid tanks B1, B3 and B5, in the chemical liquid tank B1, ammonia (NH ₄ O
Ammonia hydrogen peroxide, which is a mixed solution of H), hydrogen peroxide (H ₂ O ₂ ) and pure water (H ₂ O), is placed in the treatment tank as a treatment liquid. This mixed solution is generally known as SC-1 liquid. By immersing the substrate in the chemical bath B1, metal impurities on the substrate surface are removed. Next, the chemical solution tank B3 contains hydrofluoric acid (HF) and is supplied with pure water for dilution. The substrate surface is etched by immersing the substrate in the chemical bath B3.
Then, in the chemical solution tank B5, hydrochloric acid (HCl) and hydrogen peroxide (H
A mixed solution of ₂ O ₂ ) and pure water (H ₂ O) is placed in the processing tank as a processing liquid. This mixed solution is generally SC-
It is known as two liquids. Also in this chemical solution tank B5, impurities adhering to the substrate surface are removed. In addition, other chemicals used include sulfuric acid, nitric acid and phosphoric acid.

Next, FIG. 2 is a schematic plan view showing an example of the overall configuration of the substrate processing apparatus 100 showing the embodiment of the present invention. Note that FIG. 2 shows a case where the substrate is transported in a cassetteless transport mode. First, the transfer robot TR receives the substrate W in the cassette C at the loader L and moves up to a predetermined position. Then, it moves in the X-axis direction to above the chemical liquid tank B1 and descends. In this way, the substrate W is immersed in the chemical bath B1. When immersing the substrate W, a method of immersing the substrate W in the chemical solution while the transfer robot TR holds the substrate W, and the transfer robot TR temporarily transfers the substrate W to a substrate lifter provided in a chemical solution tank B1 (not shown). There is a method in which the substrate lifter immerses the substrate W in a chemical solution, but either method may be used.

After the substrate W is processed in the chemical bath B1 for a predetermined time, the transfer robot TR moves from the chemical bath B1 to the washing bath B2 by moving in the vertical direction and in the X-axis direction.
The substrate is transferred to and immersed in pure water. By this operation, the substrate does not exist in the chemical liquid tank B1,
The transport robot TR receives the substrate of the next cassette and immerses it in the chemical bath B1. In this way, the substrates W are sequentially processed, and the substrates W that have been dried by the spin dry device SD are sequentially stored in the cassette C in the unloader UL by the transport robot TR.

Next, the control mechanism of this apparatus will be described. FIG. 3 is a functional block diagram of the substrate processing apparatus according to this embodiment. As shown in FIG. 3, the main controller 10 for centrally controlling the entire substrate processing apparatus stores a CPU 11 that actually performs overall control, a memory 12 that temporarily stores data, and programs such as processing procedures and parameters. Of the storage disk 13 and an input / output port 14 serving as an interface with an external device, and a display 41 and a keyboard 42 for an operator to input operations are connected to the input / output port 24. Further, the input / output port 14 of the main controller 10 is further equipped with a tank controller 20 for controlling the chemical liquid tank and the washing tank of the plurality of processing tanks B (see FIG. 1) and a master robot controller for controlling the drive of the transfer robot TR. It is connected to 39 .

The tank controller 20 is provided with a CPU 21 and a memory 22. The CPU 21 performs overall management / control of all the processing tanks B, and also plays a role of passing signals to and from other controllers. Further, the memory 22 holds data on all the processing baths B. The memory 22 also stores and holds the substrate data of the substrate such as in which processing bath the substrate is present.

Further, the master robot controller 39
A transport robot TR, a remote controller operation unit 31, and a sensor 32 are connected to the. The remote control operation unit 31 is provided with a switch group, and an operator operates a switch of the switch group to give a drive command to a drive mechanism of the transport robot TR, thereby directly transmitting to the transport robot TR. It is possible to make any operation. The sensor 32 is a sensor that detects whether or not a substrate exists in the processing tank.

The substrate processing apparatus according to the embodiment of the present invention has the above apparatus configuration.

<When a trouble occurs in the transfer robot and automatic operation cannot be performed> In the above configuration, the sensor 3 is used.
Some trouble (abnormality) such as failure of 2 occurred,
A process performed when the transfer robot TR cannot automatically transfer a substrate will be described. As described above, the memory 22 of the bath controller 20 always stores and holds the substrate data indicating in which processing bath the substrate is present as the substrate is transported during the automatic operation. Then, even after some trouble occurs in the transport robot TR and the transport operation of the transport robot TR is switched from the automatic operation to the manual operation, the memory 22 can continue to hold the substrate data of the substrate. Therefore, the trouble is resolved, and when the transfer operation of the transfer robot TR is switched to the automatic operation again, it is possible to continue the substrate processing from the continuation of the time when the trouble occurs.

Further, when a trouble occurs in the transfer robot TR, if the substrate is immersed in the chemical bath, in order to avoid overetching or the like in which the substrate is excessively etched, the chemical bath It is necessary to take out the substrate. At this time, the substrate is taken out by the operator manually operating the transfer robot TR from the remote controller operation unit 31 connected to the master robot controller 39 .

For example, when a trouble occurs while dipping the substrate in the chemical solution tank B3 of FIG. 2, the operator manually operates the transfer robot TR from the remote controller operation unit 31 to move the chemical solution tank B3 to the washing tank. Move to B4. Since the substrate transferred to the water washing tank B4 by manual operation is immersed in pure water, there is no factor such as over-etching which may damage the substrate even when left in the water for a long time.

Therefore, when some trouble occurs and automatic operation of the transfer robot becomes impossible, if the substrate is immersed in the chemical bath, the transfer robot TR is manually operated to move the substrate. Are transported to the washing tank.

By the way, the operator operates the transfer robot TR by a manual operation from the remote controller operation unit 31,
When the trouble is resolved and the automatic operation is possible after the substrate is transferred to another processing tank, the substrate data of the substrate stored in the memory 22 and the processing tank in which the substrate actually exists There is an inconvenience that an error is displayed because the two do not match. Therefore, in the substrate processing apparatus according to the embodiment of the present invention, the operator displays the display 41.
The board data of the board in the memory 22 can be updated by operating the keyboard 42 while confirming the display. The operator uses the keyboard 4
Input information to update the board data from 2. After the CPU 11 of the main controller 10 receives this information, the CPU 11 of the tank controller 20 receives the information via the input / output port 14.
Transfer to PU21. Then, the CPU 21 is configured to rewrite the board data in the memory 22 based on this information.

Therefore, when the operator manually moves the substrate to another processing tank, the operator can change the substrate data in the memory 22 corresponding to the substrate to eliminate the trouble and operate automatically. Even if it becomes possible, since the substrate data of the substrate stored in the memory 22 matches the processing tank in which the substrate actually exists, the automatic operation can be normally performed.

<Processing Sequence> A processing sequence for actually performing the above-described processing will be described. FIG. 4 is a flowchart showing the processing sequence of the substrate processing apparatus of this embodiment. In the figure, the part on the left side of the dotted line is an automatic operation process automatically performed by the substrate processing apparatus, and the part on the right side of the dotted line is a manual operation process accompanied by an operator's operation.

When the apparatus starts up, the CPU 11 of the main controller 10 first determines whether to process the substrate by automatic operation or by manual operation (step S1). Then, if the process by manual operation is performed, the process proceeds to step S13, and if the process by automatic operation is performed, the process proceeds to step S2. In step S2, the parameter n is initialized to "0". This parameter n is a parameter for sequentially carrying and processing the substrates. Then, in step S3, the master robot controller 39 drives the transfer robot TR based on the parameter n to transfer the substrate from the processing tank B (n) to the processing tank B (n).
Transport to (n + 1). Since n = 0 here, the transfer robot TR transfers the substrate from the processing bath B0 to the processing bath B1. The processing tank B0 corresponds to the loader L in FIG. The processing tanks B7 and B8 correspond to the spin dry device SD and the unloader UL in FIG. Then, in step S4, the CP of the tank controller 20
U21 updates the substrate data stored and held in the memory 22 to indicate that the substrate exists in the processing bath B (n) and rewrites it so that the substrate exists in the processing bath B (n + 1). Next, in step S5, it is diagnosed whether or not any trouble has occurred. If some trouble occurs here and it is impossible to continue the automatic operation, the delivery of the substrate from the loader L is interrupted and then the process proceeds to step S8 which is a manual operation process, and no trouble occurs. In that case, the process proceeds to step S6. Then, in step S6, the parameter n is incremented by "1", and the process proceeds to step S7. A step S7 decides whether or not all the processes for the substrate have been completed. That is, if the substrate is accommodated in the unloader UL, the process is terminated, and if the substrate is not accommodated in the unloader UL, the process returns to step S3, the substrate is transported to the next processing tank, and the same procedure is repeated.

Next, the case of manual operation will be described. First, when it is determined that the manual operation is performed in step S1, it is determined whether the operator manually operates the transfer robot TR by remote control operation as shown in step S13, and when the substrate is transferred by the manual operation, As shown in step S14, the operator operates the remote controller operation unit 31 to operate the transport robot TR.
If no remote control operation is performed or if the remote control operation is completed in step S13, the process ends.

If any trouble occurs in step S5, the process is switched to the manual operation. Then, as shown in step S8, the operator determines whether the trouble that occurred can be repaired in a short period of time. Here, the judgment as to whether or not the repair is possible in a short period of time is judged as “NO” when the repair cannot be immediately started due to lack of replacement parts or the like. It is determined to be “YES”. When it is determined to be "NO", step S13
If it is determined to be "YES", the process proceeds to step S9.

Then, in step S9, the operator determines whether or not the substrate is immersed in the chemical bath.
Then, when the substrate is contained in the chemical liquid tank, the operator operates the transfer robot TR from the remote controller operation unit 31 to take out the substrate of the chemical liquid tank and transfer it to the washing tank (step S).
10). At this time, it is preferable that the water rinsing tank which is the destination of transportation is a water rinsing tank on the downstream side of the chemical solution tank in the treatment process. Generally, in such a substrate processing apparatus, as shown in FIG. 1, a chemical bath and a washing bath are alternately provided.
When the substrate immersed in the chemical solution tank in 10 is transferred to the adjacent washing tank on the downstream side (X direction side) (hereinafter, in the case where trouble occurs at the chemical solution tank B3 in FIG. 1). Take for example). Therefore, in this example, when the trouble or the like is solved later and the automatic operation of the apparatus is restarted, it is only necessary to sequentially perform the treatments after the washing bath B4 in which the substrate is immersed.

When the process of step S10 is performed, the process proceeds to step S11. In step S11, the operator performs an operation for updating the board data based on the manual transfer of the board in step S10. The operation at this time is carried out by the operator operating the keyboard 42 while checking the display screen of the display 41 shown in FIG. And the input update information is the CPU
11 is transmitted to the CPU 21. And the CPU 21
Updates the substrate data in the memory 22 from the chemical bath B3 to the washing bath B4 according to the update information. By this operation,
The bath B4 in which the substrate is actually immersed and the information of the bath in which the substrate is immersed indicated by the substrate data match. Further, in step S11, the value of the parameter n is corrected to an appropriate value as the board data is changed. For example, in step S10, the substrate is washed from the loader L to the mth washing tank B.
When moved to m, "n = m-1".

If "NO" is determined in step S9 or if "YES" is determined in step S1
Since the substrate is immersed in the washing tank by performing the processes of 0 and S11, there is no problem even if the substrate is left in this state. Therefore, the operator thereafter starts trouble repair work (step S12).

Then, when the trouble is resolved and the automatic operation can be performed again, after the delivery of the substrate from the loader L is restarted, the process proceeds to step S6 to restart the automatic operation processing. Then, in step S6, the parameter n
Update the value of. In the above example, the substrate retracted to the washing tank B4 restarts the automatic operation from the processing stage after the washing tank B4, that is, the chemical solution tank B5.

As described above, since the sequence part for controlling the automatic operation and the sequence part for controlling the manual operation are incorporated in the processing sequence for performing a series of processes, the substrate data is not lost. And with this board data, some trouble occurred during automatic operation,
When the transfer robot cannot automatically transfer the substrate, it is possible to perform the trouble repair work after once switching to the manual operation, and restart the automatic operation again after the trouble is resolved.

Further, when the automatic operation is interrupted, the substrate data is updated even if the substrate is manually moved to another processing tank in order to avoid overetching or the like.
When the automatic operation is restarted later, the process from the destination is restarted.

<Modification> As a trouble in the above embodiment, the case where the trouble occurs in the transfer robot and the automatic operation cannot be performed has been described.
The present invention can be applied to the case where an abnormality occurs in the temperature or concentration of the chemical liquid tank, in addition to the case where the trouble occurs in item 2 or the like in the transfer robot. That is, when an abnormality in the temperature or concentration of the chemical liquid tank is detected, the automatic operation of the device is interrupted and the operation is switched to the manual operation. Then, the operator manually operates the transfer robot in order to take out the substrate immersed in the chemical solution tank having the abnormal temperature or concentration.
Then, the automatic operation can be restarted later when the abnormality in the temperature and the concentration is eliminated.

Further, when there are a plurality of transfer robots in the substrate processing apparatus, the transfer robot downstream of the transfer robot in which the trouble has occurred continues to transfer the substrates in sequence without interrupting the automatic operation, and the transfer robot is transferred to the unloader UL. The substrate is stored. On the other hand, the transport robot on the upstream side immerses the substrate in the washing tank and stops it. Then, the transfer robot having the trouble is switched to the manual operation, and the operation of transferring the substrate to the washing tank is performed.

Furthermore, the present invention is not only applicable to the substrate processing apparatus of the type in which the substrate is subjected to the immersion processing as shown in the embodiment, but can also be applied to the substrate processing apparatus of other processing modes. Is. In other words, the present invention is applicable if the substrate to be processed is a substrate processing apparatus in which a predetermined series of processing is sequentially performed via a plurality of processing units.

[0044]

As described above, according to the first aspect of the invention, since the substrate data is kept in the storage means even after the automatic operation is switched to the manual operation by the switching means, the automatic operation is performed. If some trouble occurs in the transfer means and it becomes impossible to transfer the substrate automatically, once the operation is switched to manual operation, the trouble is repaired, and after the trouble is resolved, the automatic operation is restarted. It becomes possible to do. Further, after the automatic operation is restarted, the work of the operator is not required, and the efficiency of the substrate manufacturing process can be improved.

According to the second aspect of the present invention, when the automatic operation is restarted from the manual operation, the substrate data stored in the storage means is referred to and the automatic operation of the process for the substrate is performed based on the substrate data. Therefore, the manual operation can be normally switched to the automatic operation.

According to the third aspect of the invention, when the substrate is immersed in the chemical bath after being switched to the manual operation by the switching means, the substrate is transferred based on the drive command input from the drive operation input means. Since the means takes out the substrate from the chemical solution and conveys it to the water washing tank, it is possible to avoid performing excessive processing such as overetching on the substrate.

[0047]

According to the fourth aspect of the present invention, since the substrate data stored in the storage step is kept retained even after the automatic operation is switched to the manual operation in the switching step, some trouble occurs during the automatic operation. When the transfer means cannot automatically transfer the substrate, it is possible to restart the automatic operation again after the trouble is repaired after switching to the manual operation. . Further, after the automatic operation is restarted, the work of the operator is not required, and the efficiency of the substrate manufacturing process can be improved.

According to the fifth aspect of the invention, when the automatic operation is restarted from the manual operation, the substrate data stored in the storage medium is referred to, and the automatic operation of the process for the substrate is performed based on the substrate data. Therefore, the manual operation can be normally switched to the automatic operation.

According to the sixth aspect of the present invention, when the substrate is immersed in the chemical bath, the substrate is taken out from the chemical liquid and conveyed to the washing bath based on the drive command input in the drive operation input step. Thus, it is possible to avoid performing excessive processing such as over-etching on the substrate.

[0051]

[Brief description of drawings]

FIG. 1 is a schematic plan view showing an example of the overall configuration of a substrate processing apparatus showing an embodiment of the present invention.

FIG. 2 is a schematic side view showing an example of the overall configuration of the substrate processing apparatus showing the embodiment of the present invention.

FIG. 3 is a functional block diagram of a substrate processing apparatus that is an embodiment of the present invention.

FIG. 4 is a flowchart showing a processing sequence of the substrate processing apparatus according to the embodiment of the present invention.

[Explanation of symbols]

10 Main Controller 11, 21 CPU 12, 22 Memory 13 Magnetic Disk 14 Input / Output Port 20 Tank Controller 39 Master Robot Controller 31 Remote Controller Operation Section 32 Sensor 41 Display 42 Keyboard 100 Substrate Processing Device TR Transfer Robot B1, B3, B5 Chemical Solution Tank B2 , B4, B6 Washing tank L Loader UL Unloader

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Claims (6)

(57) [Claims] 1. A substrate processing apparatus in which a substrate to be processed is subjected to a predetermined series of processes in sequence through a plurality of processing tanks, and the substrates are sequentially processed as the process progresses on the substrate. A transfer unit that transfers the substrate, and a substrate that moves with the transfer of the substrate by the transfer unit.
Updating means for updating the substrate data indicating whether the substrate is present in the processing tank, storage means for storing and holding the substrate data updated by the updating means, and it is impossible to sequentially convey the substrates by the automatic operation. Driving means for detecting that the automatic operation is switched to the manual operation after detecting that the substrate cannot be sequentially conveyed by the detecting means. Input operation commands
Drive operation input means and change operation for changing the contents stored in the storage means.
Comprising a work input means, and Oite after being switched to the manual operation of automatic operation by said switching means, the storage means continues to hold the substrate data, based on the drive command inputted from the driving operation input means
The transfer means transfers the board, and the change operation input is input in accordance with the transfer of the board based on the command.
Based on the update information input from the means, the update means
Updating the substrate data stored and held in the storage means
The substrate processing apparatus according to claim to Rukoto. The substrate processing apparatus according to claim 1, when restarting the automatic operation from the manual operation, with reference to the substrate data stored in the storage means, the substrate Day
The substrate processing apparatus characterized by continuing the automatic operation of the process with respect to the substrate based on the data. 3. A substrate processing apparatus according to claim 1 or claim 2, wherein the processing tank, provided with a chemical tank and washing tank, after being switched to the manual operation by the switching means, the substrate is chemical tank When the substrate is immersed in the liquid, the transfer unit takes out the substrate from the chemical solution and transfers it to the washing tank based on the drive command input from the drive operation input unit.
Based on the update information input from the change operation input means
The substrate that the updating means stores and holds in the storage means
A substrate processing apparatus , wherein data is updated to the stage of the washing tank . 4. A substrate to be processed passes through a plurality of processing tanks.
Substrate processing method in which a predetermined series of processing is performed sequentially.
The substrate is sequentially processed as the treatment of the substrate progresses.
The transfer process of transferring the plate and the transfer process of the substrate in the transfer process
It is necessary to update the substrate data that indicates whether it is present in the processing tank.
A storage medium that stores the board data updated by the new process and the updating process.
It is impossible to sequentially transfer the substrate by the storage process of storing and holding in the automatic operation.
A detection step of detecting that a capability, that transporting the substrate sequentially by said detecting step
Automatic operation is manually operated after detecting that it becomes impossible
And a command for driving the transfer of the substrate is input.
Driving operation input step and changing operation input for changing the contents stored in the storage medium
It includes a step of switching to the manual operation of automatic operation by the switching step
After being stored, the substrate data stored in the storing step is retained.
Then , based on the drive command input in the drive operation input step,
The substrate is transported based on the above, and the change operation input is performed according to the transportation of the substrate based on the command.
Based on the update information input in the process, the storage medium
To update the board data stored in the body
A characteristic substrate processing method. 5. The substrate processing method according to claim 4.
When the automatic operation is restarted from the manual operation, the
Referring to the board data stored, the substrate Day
The automatic operation of the processing for the substrate based on the
A substrate processing method comprising: 6. The substrate processing according to claim 4 or claim 5.
In the processing method, the processing tank includes a chemical solution tank and a water washing tank, and the automatic operation is switched to the manual operation by the switching step.
If the substrate is immersed in the chemical bath after the
The substrate based on the drive command input in the force process
Is taken out of the chemical solution tank and transferred to the washing tank, and the change operation is performed.
Based on the update information input in the input step,
The substrate data stored and held in a storage medium is stored in the washing tank.
Substrate processing method, characterized by updating to the step (1).