JP2014500520A - 保護層を有する多孔性低屈折率層を備える光学要素 - Google Patents
保護層を有する多孔性低屈折率層を備える光学要素 Download PDFInfo
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- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- SLYCYWCVSGPDFR-UHFFFAOYSA-N octadecyltrimethoxysilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC SLYCYWCVSGPDFR-UHFFFAOYSA-N 0.000 description 1
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- 239000011146 organic particle Substances 0.000 description 1
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G02B1/105—
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B2207/00—Coding scheme for general features or characteristics of optical elements and systems of subclass G02B, but not including elements and systems which would be classified in G02B6/00 and subgroups
- G02B2207/107—Porous materials, e.g. for reducing the refractive index
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
- Y10T428/24967—Absolute thicknesses specified
- Y10T428/24975—No layer or component greater than 5 mils thick
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Laminated Bodies (AREA)
- Optical Elements Other Than Lenses (AREA)
- Polarising Elements (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Surface Treatment Of Glass (AREA)
- Liquid Crystal (AREA)
Abstract
Description
εeff=fεv+(1−f)εb (1)と表現可能な有効誘電率εeffを有する。
neff 2=fnv 2+(1−f)nb 2 (2)と表現可能である。
neff=fnv+(1−f)nb (3)
これらの実施形態では、低屈折率層の有効屈折率は、空隙及び結合剤の屈折率の容積加重平均である。外周条件下で、この空隙は空気を含有し、したがってこの空隙に対する屈折率nvはほぼ1.00である。例えば、空隙の容積分率が約50%である低屈折率層、及び屈折率が約1.5である結合剤は、約1.25の有効屈折率を有する。
Claims (34)
- 光学物品であって、
光学要素と、
前記光学要素上に配設された、1.3以下の有効屈折率を有する低屈折率層であって、該低屈折率層は、結合剤と、該結合剤中に分散された複数の金属酸化物粒子と、複数の相互に接続された空隙とを含む、低屈折率層と、
前記低屈折率層上に配設されたポリマー保護層と、を含み、前記ポリマー保護層が前記光学物品の有効屈折率を10%超増加させることのない、光学物品。 - 前記ポリマー保護層が、有機修飾シリコーン又は熱可塑性シリコーンアクリレートコポリマーから形成される、請求項1に記載の光学物品。
- 前記ポリマー保護層が、少なくとも50,000g/molの平均分子量を有するポリマーから形成される、請求項1又は2に記載の光学物品。
- 前記ポリマー保護層が架橋ポリマーを含む、請求項1〜3に記載の光学物品。
- 前記ポリマー保護層が水性エマルションから形成される、請求項4に記載の光学物品。
- 前記ポリマー保護層が60℃以上のTgを有する熱可塑性ポリマーを含む、請求項1〜3に記載の光学物品。
- 前記ポリマー保護層が感圧接着剤である、請求項1〜6に記載の光学物品。
- 前記ポリマー保護層が、前記保護層中に分散された複数のヘーズ生成粒子を含む、請求項1〜7に記載の光学物品。
- 前記ヘーズ生成粒子が1マイクロメートル以上の平均の横方向寸法を有する、請求項8に記載の光学物品。
- 前記金属酸化物粒子がヒュームドシリカを含む、請求項1〜9に記載の光学物品。
- 前記低屈折率層が1〜20マイクロメートルの範囲の厚さを有し、前記ポリマー保護層が1〜15マイクロメートルの範囲の厚さを有する、請求項1〜10に記載の光学物品。
- 前記結合剤と前記複数の金属酸化物粒子の重量比が1:2以下である、請求項1〜11に記載の光学物品。
- 前記光学物品が少なくとも75%のヘーズ値を有する、請求項1〜12に記載の光学物品。
- 前記光学物品が10%未満のヘーズ値を有する、請求項1〜12に記載の光学物品。
- 前記光学要素が、偏光フィルム、拡散型フィルム、反射型フィルム、位相差フィルム、ライトガイド又は液晶ディスプレイパネルである、請求項1〜14に記載の光学物品。
- 前記光学要素若しくはポリマー保護層上又は前記低屈折率層と前記ポリマー保護層との間に配設された第2の低屈折率層を更に含む、請求項1〜15に記載の光学物品。
- 光学物品であって、
光学要素と、
前記光学要素上に配設された、1.3以下の有効屈折率を有する低屈折率層であって、該低屈折率層は、結合剤と、該結合剤中に分散された複数の金属酸化物粒子と、複数の相互に接続された空隙とを含む、低屈折率層と、
前記低屈折率層上に配設されたポリマー保護層であって、少なくとも50,000g/molの平均分子量を有するポリマーから形成された、ポリマー保護層と、を含む、光学物品。 - 前記ポリマー保護層が架橋ポリマーを含む、請求項17に記載の光学物品。
- 前記ポリマー保護層が、少なくとも100,000g/molの平均分子量を有するポリマーを含む、請求項17又は18に記載の光学物品。
- 前記ポリマー保護層が、少なくとも250,000g/molの平均分子量を有するポリマーを含む、請求項17〜19に記載の光学物品。
- 前記ポリマー保護層が、少なくとも500,000g/molの平均分子量を有するポリマーを含む、請求項17〜20に記載の光学物品。
- 前記ポリマー保護層が、前記保護層中に分散された複数のヘーズ生成粒子を含む、請求項17〜21に記載の光学物品。
- 前記ヘーズ生成粒子が1マイクロメートル以上の平均の横方向寸法を有する、請求項22に記載の光学物品。
- 前記低屈折率層が1〜20マイクロメートルの範囲の厚さを有し、前記ポリマー保護層が1〜15マイクロメートルの範囲の厚さを有する、請求項17〜23に記載の光学物品。
- 前記結合剤と前記複数の金属酸化物粒子の重量比が1:1以下である、請求項17〜24に記載の光学物品。
- 前記光学物品が少なくとも75%のヘーズ値を有する、請求項17〜25に記載の光学物品。
- 前記光学要素が、偏光フィルム、拡散型フィルム、反射型フィルム、位相差フィルム、ライトガイド又は液晶ディスプレイパネルである、請求項17〜26に記載の光学物品。
- 光学物品であって、
光学要素と、
前記光学要素上に配設された、1.3以下の有効屈折率を有する低屈折率層であって、該低屈折率層は、結合剤と、該結合剤中に分散された複数の金属酸化物粒子と、複数の相互に接続された空隙とを含む、低屈折率層と、
前記低屈折率層上に配設されたポリマー保護層であって、架橋ポリマーを含む、ポリマー保護層と、を含む、光学物品。 - 前記低屈折率層が1〜20マイクロメートルの範囲の厚さを有し、前記ポリマー保護層が1〜15マイクロメートルの範囲の厚さを有する、請求項28に記載の光学物品。
- 前記結合剤と前記複数の金属酸化物粒子の重量比が1:2以下である、請求項28又は29に記載の光学物品。
- 前記光学物品が少なくとも75%のヘーズ値を有する、請求項28〜30に記載の光学物品。
- 前記光学要素が、偏光フィルム、拡散型フィルム、反射型フィルム、位相差フィルム、ライトガイド又は液晶ディスプレイパネルである、請求項28〜31に記載の光学物品。
- 前記ポリマー保護層が水性エマルションから形成される、請求項28〜32に記載の光学物品。
- 前記ポリマー保護層が前記光学物品の有効屈折率を10%超増加させることのない、請求項28〜33に記載の光学物品。
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013540290A (ja) * | 2010-10-20 | 2013-10-31 | スリーエム イノベイティブ プロパティズ カンパニー | 光学拡散性低屈折率要素 |
KR20150131499A (ko) * | 2014-05-15 | 2015-11-25 | 미쓰비시 마테리알 가부시키가이샤 | 저굴절률막 형성용 조성물 및 그 제조 방법 그리고 저굴절률막의 형성 방법 |
Families Citing this family (33)
Publication number | Priority date | Publication date | Assignee | Title |
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US9465145B2 (en) | 2010-10-20 | 2016-10-11 | 3M Innovative Properties Company | Low refractive index diffuser element having interconnected voids |
TWI611933B (zh) * | 2011-09-15 | 2018-01-21 | Nitto Denko Corp | 具有接著劑層之影像顯示裝置用單元及使用該單元的影像顯示裝置 |
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US9960389B1 (en) | 2017-05-05 | 2018-05-01 | 3M Innovative Properties Company | Polymeric films and display devices containing such films |
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EP3748221A4 (en) * | 2018-02-02 | 2021-10-13 | Nitto Denko Corporation | LED BACKLIGHT FILM AND LED BACKLIGHT |
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CN116802524A (zh) * | 2020-12-07 | 2023-09-22 | 3M创新有限公司 | 光学膜、光学构造体和显示系统 |
CN116997835A (zh) * | 2021-03-26 | 2023-11-03 | 3M创新有限公司 | 光学膜和光学系统 |
Citations (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH116902A (ja) * | 1997-04-04 | 1999-01-12 | Fuji Photo Film Co Ltd | 反射防止膜およびそれを用いた画像表示装置 |
JPH11281802A (ja) * | 1998-03-31 | 1999-10-15 | Fuji Photo Film Co Ltd | 反射防止膜、反射防止部材及び反射防止部材の製造方法 |
JP2000075105A (ja) * | 1998-06-05 | 2000-03-14 | Fuji Photo Film Co Ltd | 反射防止膜および画像表示装置 |
JP2001100003A (ja) * | 1999-09-28 | 2001-04-13 | Fuji Photo Film Co Ltd | 反射防止膜および画像表示装置 |
JP2001350005A (ja) * | 2000-06-09 | 2001-12-21 | Tomoegawa Paper Co Ltd | 光学シートおよびその製造方法 |
JP2003201443A (ja) * | 2001-10-25 | 2003-07-18 | Matsushita Electric Works Ltd | コーティング材組成物及びそれにより形成された被膜を有する物品 |
WO2004073972A1 (ja) * | 2003-02-21 | 2004-09-02 | Asahi Kasei Kabushiki Kaisha | シリカ含有積層体、及び多孔性シリカ層形成用塗布組成物 |
JP2005352121A (ja) * | 2004-06-10 | 2005-12-22 | Asahi Kasei Corp | 反射防止膜 |
JP2006297680A (ja) * | 2005-04-18 | 2006-11-02 | Hitachi Chem Co Ltd | 低屈折率薄膜及びその製造方法 |
JP2007014949A (ja) * | 2005-07-05 | 2007-01-25 | Gkss Forschungszentrum Geesthacht Gmbh | 複合膜 |
JP2008003243A (ja) * | 2006-06-21 | 2008-01-10 | Fujifilm Corp | 光学シート、並びに光源装置及び表示装置 |
Family Cites Families (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1275208C (en) | 1985-01-25 | 1990-10-16 | Roger W. Lange | Silica coating |
US5204219A (en) | 1987-07-30 | 1993-04-20 | Minnesota Mining And Manufacturing Company | Photographic element with novel subbing layer |
US5154962A (en) | 1988-11-30 | 1992-10-13 | Minnesota Mining And Manufacturing Company | Indicia-receptive low adhesion backsize |
CA2002449C (en) * | 1988-12-05 | 2001-05-08 | Mark A. Strobel | Pressure-sensitive article with priming layer |
US5032460A (en) | 1989-08-14 | 1991-07-16 | Minnesota Mining And Manufacturing Company | Method of making vinyl-silicone copolymers using mercapto functional silicone chain-transfer agents and release coatings made therewith |
US5202190A (en) | 1989-08-14 | 1993-04-13 | Minnesota Mining And Manufacturing Company | Method of making vinyl-silicone copolymers using mercapto functional silicone chain-transfer agents and release coatings made therewith |
DE69215781T2 (de) | 1991-07-26 | 1997-04-03 | Asahi Glass Co Ltd | Aufnahmestreifen für Tintenstrahldrucker |
CA2202834C (en) * | 1996-04-17 | 2001-08-07 | Susumu Fujimori | Water repellent coating composition and coating films and coated articles using the same |
US5919555A (en) | 1996-11-06 | 1999-07-06 | Fuji Photo Film Co., Ltd. | Anti-reflection film and display device having the same |
US5945209A (en) | 1996-11-07 | 1999-08-31 | Fuji Photo Film Co., Ltd. | Anti-reflection film and plasma display panel |
US6156651A (en) | 1996-12-13 | 2000-12-05 | Texas Instruments Incorporated | Metallization method for porous dielectrics |
US6210858B1 (en) | 1997-04-04 | 2001-04-03 | Fuji Photo Film Co., Ltd. | Anti-reflection film and display device using the same |
US6166855A (en) * | 1998-06-05 | 2000-12-26 | Fuji Photo Film Co., Ltd. | Anti-reflection film and display device having the same |
US6096469A (en) | 1999-05-18 | 2000-08-01 | 3M Innovative Properties Company | Ink receptor media suitable for inkjet printing |
US6596375B2 (en) | 2000-03-23 | 2003-07-22 | Tomoegawa Paper Co. | Optical sheet and production process thereof |
US7311961B2 (en) | 2000-10-24 | 2007-12-25 | Ppg Industries Ohio, Inc. | Method of making coated articles and coated articles made thereby |
WO2003035780A1 (fr) * | 2001-10-25 | 2003-05-01 | Matsushita Electric Works, Ltd. | Composition de materiau de revetement et article dote d'un film de revetement forme avec cette derniere |
KR100671990B1 (ko) * | 2001-10-25 | 2007-01-24 | 마츠시다 덴코 가부시키가이샤 | 복합박막 보유기판, 투명도전성막 보유기판 및 면발광체 |
JP4044386B2 (ja) * | 2002-07-31 | 2008-02-06 | Tdk株式会社 | 反射防止フィルム及び反射防止処理された物体 |
CN1754108A (zh) * | 2003-02-06 | 2006-03-29 | Sdc技术-亚洲株式会社 | 制造已经受低反射处理的制品的方法,形成低反射层的溶液和经受低反射处理的制品 |
JP2005227606A (ja) * | 2004-02-13 | 2005-08-25 | Jsr Corp | 位相差フィルム、偏光板、およびこれらを使用した液晶表示素子 |
GB0415211D0 (en) | 2004-07-07 | 2004-08-11 | Eastman Kodak Co | Ink-jet receiver having improved crack resistance |
JP4539322B2 (ja) | 2004-12-20 | 2010-09-08 | セイコーエプソン株式会社 | 画像形成装置および該装置における位相調整方法 |
WO2007037276A1 (ja) * | 2005-09-29 | 2007-04-05 | Dai Nippon Printing Co., Ltd. | 反射防止膜 |
KR100800182B1 (ko) * | 2005-11-08 | 2008-02-01 | 광 석 서 | 발수 방오 처리된 대전방지 보호 테이프 |
JP5098162B2 (ja) * | 2005-12-05 | 2012-12-12 | 日立化成工業株式会社 | 粘着組成物層付き液晶ディスプレイ用光学機能フィルム及びそれを含む液晶ディスプレイ |
WO2008008319A2 (en) | 2006-07-10 | 2008-01-17 | President And Fellows Of Harvard College | Selective sealing of porous dielectric materials |
US20100208349A1 (en) | 2006-07-28 | 2010-08-19 | Robert Beer | Flexible materials for optical applications |
JPWO2008020610A1 (ja) * | 2006-08-18 | 2010-01-07 | 大日本印刷株式会社 | 光学積層体、偏光板及び画像表示装置 |
BRPI0815824A2 (pt) | 2007-08-31 | 2015-02-18 | Nippon Synthetic Chem Ind | Agente de reticulação, polímero de reticulação e seus usos |
JP2009098654A (ja) * | 2007-09-28 | 2009-05-07 | Dainippon Printing Co Ltd | 光学積層体、偏光板及び画像表示装置 |
WO2009062140A2 (en) | 2007-11-08 | 2009-05-14 | Sager Brian M | Improved anti-reflective coating |
EP2231539B1 (de) | 2007-12-05 | 2016-04-13 | Schott AG | Substrat mit einer sol-gel-schicht und verfahren zur herstellung eines verbundmaterials |
KR101758933B1 (ko) * | 2009-04-15 | 2017-07-17 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 광학 필름 |
IN2011CN07418A (ja) | 2009-04-15 | 2015-08-21 | 3M Innovative Properties Co | |
SG189429A1 (en) | 2010-10-20 | 2013-05-31 | 3M Innovative Properties Co | Optically diffuse low refractive index element |
KR101926204B1 (ko) | 2010-10-20 | 2018-12-06 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 나노공극형 중합체 층을 포함하는 광대역 반경면 미러 필름 |
-
2011
- 2011-10-19 TW TW100137957A patent/TWI534458B/zh not_active IP Right Cessation
- 2011-10-20 KR KR20137012507A patent/KR20130129942A/ko active Search and Examination
- 2011-10-20 SG SG2013028592A patent/SG189428A1/en unknown
- 2011-10-20 EP EP11779027.9A patent/EP2630524B1/en not_active Not-in-force
- 2011-10-20 WO PCT/US2011/057006 patent/WO2012054680A1/en active Application Filing
- 2011-10-20 JP JP2013535071A patent/JP2014500520A/ja active Pending
- 2011-10-20 CN CN201180050013.4A patent/CN103168257B/zh active Active
- 2011-10-20 US US13/879,842 patent/US10502869B2/en active Active
-
2017
- 2017-10-05 JP JP2017195026A patent/JP2018032037A/ja active Pending
-
2019
- 2019-05-21 JP JP2019095331A patent/JP7312607B2/ja active Active
Patent Citations (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH116902A (ja) * | 1997-04-04 | 1999-01-12 | Fuji Photo Film Co Ltd | 反射防止膜およびそれを用いた画像表示装置 |
JPH11281802A (ja) * | 1998-03-31 | 1999-10-15 | Fuji Photo Film Co Ltd | 反射防止膜、反射防止部材及び反射防止部材の製造方法 |
JP2000075105A (ja) * | 1998-06-05 | 2000-03-14 | Fuji Photo Film Co Ltd | 反射防止膜および画像表示装置 |
JP2001100003A (ja) * | 1999-09-28 | 2001-04-13 | Fuji Photo Film Co Ltd | 反射防止膜および画像表示装置 |
JP2001350005A (ja) * | 2000-06-09 | 2001-12-21 | Tomoegawa Paper Co Ltd | 光学シートおよびその製造方法 |
JP2003201443A (ja) * | 2001-10-25 | 2003-07-18 | Matsushita Electric Works Ltd | コーティング材組成物及びそれにより形成された被膜を有する物品 |
WO2004073972A1 (ja) * | 2003-02-21 | 2004-09-02 | Asahi Kasei Kabushiki Kaisha | シリカ含有積層体、及び多孔性シリカ層形成用塗布組成物 |
JP4437783B2 (ja) * | 2003-02-21 | 2010-03-24 | 旭化成株式会社 | シリカ含有積層体 |
JP2005352121A (ja) * | 2004-06-10 | 2005-12-22 | Asahi Kasei Corp | 反射防止膜 |
JP2006297680A (ja) * | 2005-04-18 | 2006-11-02 | Hitachi Chem Co Ltd | 低屈折率薄膜及びその製造方法 |
JP2007014949A (ja) * | 2005-07-05 | 2007-01-25 | Gkss Forschungszentrum Geesthacht Gmbh | 複合膜 |
JP2008003243A (ja) * | 2006-06-21 | 2008-01-10 | Fujifilm Corp | 光学シート、並びに光源装置及び表示装置 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013540290A (ja) * | 2010-10-20 | 2013-10-31 | スリーエム イノベイティブ プロパティズ カンパニー | 光学拡散性低屈折率要素 |
KR20150131499A (ko) * | 2014-05-15 | 2015-11-25 | 미쓰비시 마테리알 가부시키가이샤 | 저굴절률막 형성용 조성물 및 그 제조 방법 그리고 저굴절률막의 형성 방법 |
KR102188211B1 (ko) * | 2014-05-15 | 2020-12-08 | 미쓰비시 마테리알 가부시키가이샤 | 저굴절률막 형성용 조성물 및 그 제조 방법 그리고 저굴절률막의 형성 방법 |
Also Published As
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JP2018032037A (ja) | 2018-03-01 |
US20130202867A1 (en) | 2013-08-08 |
SG189428A1 (en) | 2013-05-31 |
TW201232019A (en) | 2012-08-01 |
JP7312607B2 (ja) | 2023-07-21 |
US10502869B2 (en) | 2019-12-10 |
EP2630524B1 (en) | 2021-02-17 |
WO2012054680A1 (en) | 2012-04-26 |
JP2019179245A (ja) | 2019-10-17 |
EP2630524A1 (en) | 2013-08-28 |
CN103168257B (zh) | 2017-03-01 |
CN103168257A (zh) | 2013-06-19 |
TWI534458B (zh) | 2016-05-21 |
KR20130129942A (ko) | 2013-11-29 |
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