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JP2008116470A - Substrate-inspecting device - Google Patents

Substrate-inspecting device Download PDF

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JP2008116470A
JP2008116470A JP2007333290A JP2007333290A JP2008116470A JP 2008116470 A JP2008116470 A JP 2008116470A JP 2007333290 A JP2007333290 A JP 2007333290A JP 2007333290 A JP2007333290 A JP 2007333290A JP 2008116470 A JP2008116470 A JP 2008116470A
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substrate
inspection apparatus
inspected
axis
rotation support
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Makoto Nishizawa
誠 西澤
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Olympus Corp
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Olympus Corp
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Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate-inspection device capable of attaining precise visual inspection for a substrate to be inspected. <P>SOLUTION: The whole of a device body 4, having a substrate holder 10 for holding the substrate to be inspected, is made to be movable along a guide 1a of a base table 1, the device body 4 is made to be rotatable around a Z-axis as the center via a rotary part 6, and further, the substrate holder 10 itself is also to be rotatable around an X-axis orthogonal to the Z-axis as the center via a shaft part 12 having a friction mechanism. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、フラットパネルディスプレイ(FPD)のガラス基板などの外観検査に用いられる基板検査装置に関するものである。   The present invention relates to a substrate inspection apparatus used for visual inspection of a glass substrate of a flat panel display (FPD).

従来、FPDのガラス基板などの基板検査では、ガラス基板を手で保持し、照明光の範囲で移動させながら、ガラス基板表面に照明光を当て、その反射光の光学的変化から基板表面の傷などの欠陥部を観察する外観検査を可能にする方法が知られている。   Conventionally, in the inspection of a substrate such as a glass substrate of an FPD, a glass substrate surface is held by a hand and moved in the range of illumination light while illuminating light is applied to the surface of the glass substrate. There is known a method that enables visual inspection for observing a defective portion such as the above.

ところで、最近、FPD用ガラス基板は、大型画面への対応と、一枚のガラス基板から複数枚の製品を得ることによる効率アップを図ることなどから、ますます大型化してきているが、このようにガラス基板が大型化すると、手で保持することは難しくなり、観察が不可能になっている。   By the way, recently, FPD glass substrates have become larger and larger due to the compatibility with large screens and increased efficiency by obtaining multiple products from a single glass substrate. In addition, when the glass substrate is enlarged, it becomes difficult to hold it by hand, and observation becomes impossible.

そこで、ガラス基板を手に代えて基板ホルダ上に載置し、この基板ホルダを移動させながらガラス基板の外観観察を行なう基板検査装置が考えられている。   In view of this, a substrate inspection apparatus is considered in which a glass substrate is placed on a substrate holder instead of a hand, and the appearance of the glass substrate is observed while moving the substrate holder.

ところが、これまでの基板検査装置では、基板ホルダの移動機構の制約などから手の保持による検査方法と比較してガラス基板移動の自由度がかなり制限され使いづらい欠点があった。   However, the conventional substrate inspection apparatuses have a drawback that the degree of freedom of movement of the glass substrate is considerably limited and difficult to use compared to the inspection method by hand holding due to restrictions on the movement mechanism of the substrate holder.

また、従来の基板検査装置では、検査時の揺動および移動機構を達成するため、ガラス基板の載置方向が決められているが、最近では、スペースの限られた効果なクリーンルームでの利用効率アップの観点からも、いろいろな方向からの載置を可能にしたものが望まれている。   Also, in the conventional substrate inspection apparatus, the mounting direction of the glass substrate is determined in order to achieve a swinging and moving mechanism at the time of inspection, but recently, the use efficiency in a clean room with limited space is effective. From the viewpoint of improvement, it is desired to be able to mount from various directions.

さらにまた、ガラス基板などは、非常に精密なもので、わずかなパーティクルでも欠陥となる。一般のクリーンルームの構造として天井からエアーを床に向かって流し(ダウンフロー)、そのエアーによってパーティクルを床下に流す構造になっている。このため、装置の構造として発生するパーティクルをガラス基板に落ちないようにするため、パーティクル発生源を隔離するか、できる限りガラス基板の下に配置する必要があった。   Furthermore, glass substrates and the like are very precise, and even a few particles can be defective. As a general clean room structure, air flows from the ceiling toward the floor (down flow), and particles are caused to flow under the floor by the air. For this reason, in order to prevent particles generated as a structure of the apparatus from falling on the glass substrate, it is necessary to isolate the particle generation source or to arrange it under the glass substrate as much as possible.

本発明は、上記事情に鑑みてなされたもので、精度の高い被検査基板の外観検査を実現できる基板検査装置を提供することを目的とする。   The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a substrate inspection apparatus capable of realizing an appearance inspection of a substrate to be inspected with high accuracy.

請求項1記載の発明は、照明光により照射されたガラス基板を観察者が目視して前記ガラス基板上の欠陥を検査する基板検査装置において、前記ガラス基板を保持する矩形の基板保持部と、前記基板保持部を水平軸上で回転可能に支持する第1の回転支持手段と、
前記第1の回転支持手段を取り付ける支持台と、前記支持台を前記観察者に対して左右方向に直線移動可能に支持する基台と、を備えたことを特徴としている。1
請求項2記載の発明は、請求項1記載において、更に、前記第1の回転支持手段の前記水平軸と直交する軸上で回転可能に支持する第2の回転支持手段を備えたことを特徹としている。
The invention according to claim 1 is a substrate inspection apparatus in which an observer visually inspects a glass substrate irradiated with illumination light to inspect defects on the glass substrate, and a rectangular substrate holding unit that holds the glass substrate; First rotation support means for rotatably supporting the substrate holder on a horizontal axis;
It is characterized by comprising a support base to which the first rotation support means is attached and a base that supports the support base so as to be linearly movable in the left-right direction with respect to the observer. 1
The invention according to claim 2 is characterized in that, in claim 1, further comprising second rotation support means for rotatably supporting the first rotation support means on an axis orthogonal to the horizontal axis. Toru.

請求項3記載の発明は、請求項2記載において、前記第1の回転支持手段は、前記基板保持部を水平軸上で回転可能に支持する一対の直立枠及び両直立枠の間を連結する水平枠を有し、前記第2の回転支持手段は、前記水平枠の略中央を垂直軸で回転可能に支持する回転部を有することを特徴としている。   According to a third aspect of the present invention, in the second aspect, the first rotation support means connects a pair of upright frames and the upright frames that rotatably support the substrate holding portion on a horizontal axis. It has a horizontal frame, and the 2nd rotation support means has a rotation part which supports the approximate center of the horizontal frame so that rotation is possible on a perpendicular axis.

請求項4記載の発明は、請求項1記載において、更に、前記基板保持部を上下方向に移動させる高さ調節手段を備えたことを特徴としている。   According to a fourth aspect of the present invention, in the first aspect of the present invention, the apparatus further comprises height adjusting means for moving the substrate holding portion in the vertical direction.

請求項5記載の発明は、請求項4記載において、前記高さ調整手段は、前記基板保持部を水平軸上で回転可能に支持する一対の直立枠を伸縮させることを特徹としている。   According to a fifth aspect of the present invention, in the fourth aspect of the present invention, the height adjusting means extends and contracts a pair of upright frames that rotatably support the substrate holding portion on a horizontal axis.

請求項6記載の発明は、請求項4又は5のいずれか記載において、前記高さ調整手段は、前記基板保持部を所定の角度に傾けた状態で観察者の観察し易い高さに合わせることを特徴としている。   A sixth aspect of the present invention is the method according to any one of the fourth or fifth aspects, wherein the height adjusting means is adjusted to a height that is easy for an observer to observe while the substrate holding portion is tilted at a predetermined angle. It is characterized by.

以上述べたように、本発明によれば、基板保持手段上の被検査基板に対し左右および上下の揺動を加えながら自由度の高い動きの下で、外観検査を行なうことができ、精度の高い検査結果を得ることができる。   As described above, according to the present invention, it is possible to perform an appearance inspection with a high degree of freedom while applying left and right and up and down swings to the substrate to be inspected on the substrate holding means. High test results can be obtained.

また、被検査基板をZ軸およびX軸を中心とした回転だけでなく、Y軸を中心とした回転も得られ、さまざまな方向から外観検査を行なうことができるので、さらに精度の高い検査結果を得ることができる。   In addition, the substrate to be inspected can be rotated not only about the Z and X axes, but also about the Y axis, so that the appearance can be inspected from various directions. Can be obtained.

さらに、基板保持手段の上方に障害物が何も存在せず、基板保持面上への被検査基板の載置方向に何らの制約を受けることがないようにできるので、従来の基板の載置方向が決められてしまうような狭いスペースしか確保できないクリーンルームでも、有効に適用することができる。   Furthermore, there is no obstacle above the substrate holding means, and it is possible to prevent any restrictions on the mounting direction of the substrate to be inspected on the substrate holding surface. It can be effectively applied even in a clean room where only a narrow space where the direction is determined can be secured.

さらにまた、移動手段および負荷緩和手段でパーティクルが発生しても基板保持手段に保持される被検査基板に影響を与えないようにできる。   Furthermore, even if particles are generated by the moving means and the load relaxation means, it is possible to prevent the substrate to be inspected held by the substrate holding means from being affected.

以下、本発明の実施の形態を図面に従い説明する。   Hereinafter, embodiments of the present invention will be described with reference to the drawings.

(第1の実施の形態)
図1(a)(b)は、本発明が適用される基板検査装置の概略構成を示している。図において、1は基台で、この基台1は、直線方向に延びるガイド1aと複数の固定脚2を有する。
(First embodiment)
1A and 1B show a schematic configuration of a substrate inspection apparatus to which the present invention is applied. In the figure, reference numeral 1 denotes a base, which has a guide 1a extending in a linear direction and a plurality of fixed legs 2.

このような基台1により装置本体4を支持している。装置本体4は、基台1のガイド1aに沿って移動される支持台5と、この支持台5に突設された軸部5bに複数の軸受け6aを介して回転可能に支持される筒状の回転部6を有している。   The apparatus main body 4 is supported by such a base 1. The apparatus main body 4 has a cylindrical shape that is rotatably supported via a plurality of bearings 6a on a support base 5 that is moved along the guide 1a of the base 1 and a shaft portion 5b that protrudes from the support base 5. The rotating part 6 is provided.

この場合、支持台5は、複数のローラ5aを有していて、ガイド1aに沿って図示矢印方向に移動可能にしている。また、支持部5には、ガイド1aに沿った方向にシリンダ7、8を配置している。これらシリンダ7、8は、ガイド1aに沿った装置本体4の移動のために必要な力とほぼ同じ程度の動作力を有するもので、図示ない左スイッチを押しながら装置本体4を移動させることで、シリンダ7の動作力が加わって軽い力で装置本体4を図示左方向に移動可能とし、同様に、図示ない右スイッチを押しながら装置本体4を移動させることで、シリンダ8の動作力が加わって軽い力で装置本体4を図示右方向に移動可能にしている。これらスイッチを後述する基板支持台9の直立枠9a、9b、好ましくは直立枠9a、9bの取手部に設けると、スイッチの操作性をよくすることができる。   In this case, the support base 5 has a plurality of rollers 5a and is movable along the guide 1a in the direction indicated by the arrow. Further, the support portion 5 is provided with cylinders 7 and 8 in a direction along the guide 1a. These cylinders 7 and 8 have substantially the same operating force as the force required for the movement of the apparatus main body 4 along the guide 1a. By moving the apparatus main body 4 while pressing a left switch (not shown). The operating force of the cylinder 8 can be moved in the left direction in the figure by applying a light force with the operating force of the cylinder 7. Similarly, the operating force of the cylinder 8 is applied by moving the device body 4 while pressing the right switch (not shown). The apparatus body 4 can be moved in the right direction in the figure with a light force. If these switches are provided in the upright frames 9a and 9b of the substrate support base 9, which will be described later, preferably the handle portions of the upright frames 9a and 9b, the operability of the switches can be improved.

回転部6には、基板支持架台9を設けている。この基板支持架台9は、対峙する一対の直立枠9a、9bと、これら直立枠9a、9b間を連結する水平枠9cを有する。水平枠9cの中央部を回転部6に固定し、軸部5bを中心に回転可能になっている。   The rotating unit 6 is provided with a substrate support frame 9. The substrate support base 9 has a pair of upright frames 9a and 9b facing each other and a horizontal frame 9c connecting the upright frames 9a and 9b. The central part of the horizontal frame 9c is fixed to the rotating part 6 and is rotatable about the shaft part 5b.

そして、直立枠9a、9b先端部に、基板保持手段としての基板ホルダ10を設けている。この基板ホルダ10は、FPDのガラス基板などの被検査基板11周縁部をエアーなどを用いて吸着保持するもので、基板ホルダ10の両側縁の中央部をフリクション機構を有する軸部12、12を介して直立枠9a、9bにX軸を中心に回転可能に支持されている。この場合、軸部12、12のフリクション機構は、図2に示すように軸部12の先端部を小径部12aに形成し、この小径部12aにバネ12bを介して直立枠9a(9b)の先端部を挿入するとともに、バネ性を有する押え板12cを介してナット12dにより締付け固定することで、基板ホルダ10を所定角度回転させた状態で、この状態を維持できる程度のフリクションを得られるようにしている。   And the substrate holder 10 as a board | substrate holding means is provided in the upright frame 9a, 9b front-end | tip part. This substrate holder 10 sucks and holds the peripheral portion of a substrate 11 to be inspected such as an FPD glass substrate using air or the like. The central portions of both side edges of the substrate holder 10 are provided with shaft portions 12 and 12 having a friction mechanism. And is supported by the upright frames 9a and 9b so as to be rotatable about the X axis. In this case, as shown in FIG. 2, the friction mechanism of the shaft portions 12 and 12 has the tip portion of the shaft portion 12 formed in the small diameter portion 12a, and the small diameter portion 12a is connected to the upright frame 9a (9b) via the spring 12b. By inserting the tip portion and tightening and fixing with the nut 12d through the presser plate 12c having a spring property, it is possible to obtain friction that can maintain this state when the substrate holder 10 is rotated by a predetermined angle. I have to.

一方、直立枠9a、9bは、伸縮可能な構造になっていて、それぞれシリンダ13、14が埋設されている。これらシリンダ13、14は、被検査基板11を保持した基板ホルダ10の自重とバランスするような押上げ力を有するもので、これらシリンダ13、14の動作力により軽い力で基板ホルダ10を上下動できるようにしている。   On the other hand, the upright frames 9a and 9b have a stretchable structure, and the cylinders 13 and 14 are embedded therein, respectively. These cylinders 13 and 14 have a push-up force that balances the weight of the substrate holder 10 holding the substrate 11 to be inspected. The cylinder holders 10 and 14 move the substrate holder 10 up and down with a light force by the operating force of the cylinders 13 and 14. I can do it.

次に、このように構成した実施の形態の動作を説明する。   Next, the operation of the embodiment configured as described above will be described.

最初に、基板ホルダ10を、Z軸方向に下降させた後に、X軸を中心に水平状態になるまで回転させ、装置本体4を基台1のガイド1aに沿って基板渡し位置まで移動させる。そして、図示しない基板搬送手段より基板ホルダ10上に被検査基板11を載置して図示しない位置決め部材により被検査基板11を所定位置に位置決めし、図示しない基板押え部材により吸着保持させる。   First, after lowering the substrate holder 10 in the Z-axis direction, the substrate holder 10 is rotated until it becomes horizontal about the X-axis, and the apparatus body 4 is moved along the guide 1a of the base 1 to the substrate transfer position. Then, the substrate 11 to be inspected is placed on the substrate holder 10 by the substrate transport means (not shown), the substrate 11 to be inspected is positioned at a predetermined position by a positioning member (not shown), and is sucked and held by a substrate pressing member (not shown).

この状態から、再び装置本体4を基台1のガイド1aに沿って外観観察のためのマクロ照明が用意された観察位置まで移動し、この照明の下で外観検査を行なう。   From this state, the apparatus body 4 is again moved along the guide 1a of the base 1 to an observation position where macro illumination for appearance observation is prepared, and appearance inspection is performed under this illumination.

基板ホルダ10をX軸を中心に回転させて被検査基板11を所定の角度に傾けるとともに、基板支持架台9の直立枠9a、9bの長さを調整して観察者の観察しやすい高さに合わせる。そして、マクロ照明下で被検査基板11上を目視し、基板表面の観察を行なうが、この場合、基板ホルダ10の側部を持って引き押しすると、装置本体4全体がZ軸を中心に回転することで、左右方向の揺動を加えながらの外観観察が可能になり、また、基板ホルダ10の上下端部を持って引き押しすると、基板ホルダ10がX軸を中心にも回転することで、上下方向の揺動を加えながらの外観観察が可能になる。   The substrate holder 10 is rotated around the X axis to incline the substrate 11 to be inspected at a predetermined angle, and the length of the upright frames 9a and 9b of the substrate support base 9 is adjusted so that it can be easily observed by an observer. Match. Then, the surface of the inspected substrate 11 is visually observed under macro illumination, and the surface of the substrate is observed. In this case, when the side of the substrate holder 10 is pulled and pushed, the entire apparatus main body 4 rotates around the Z axis. By doing so, it becomes possible to observe the appearance while adding a horizontal swing, and when the substrate holder 10 is pulled by holding the upper and lower ends, the substrate holder 10 rotates about the X axis. It is possible to observe the appearance while adding vertical swing.

その後、被検査基板11の検査を終了したならば、基板ホルダ10を水平状態になるまで回転させ、検査済み被検査基板11を新たな被検査基板11と取り替え、上述したと同様な動作を繰り返すようになる。   Thereafter, when the inspection of the inspected substrate 11 is completed, the substrate holder 10 is rotated until it becomes horizontal, the inspected inspected substrate 11 is replaced with a new inspected substrate 11, and the same operation as described above is repeated. It becomes like this.

従って、このようにすれば、被検査基板11を保持する基板ホルダ10を有する装置本体4全体を基台1のガイド1aに沿って直線移動可能にするとともに、装置本体4を回転部6を介してZ軸を中心に回転可能とし、さらに、基板ホルダ10自身もフリクション機構を有する軸部12を介してX軸を中心に回転可能に構成したので、手動による独立した操作により、基板ホルダ10上の被検査基板11に対し左右および上下の揺動を加えながら自由度の高い動きの下で、外観検査を行なうことができるようになり、精度の高い検査結果を得ることができる。   Accordingly, in this way, the entire apparatus main body 4 having the substrate holder 10 that holds the substrate 11 to be inspected can be linearly moved along the guide 1 a of the base 1, and the apparatus main body 4 can be moved via the rotating unit 6. Since the substrate holder 10 itself is configured to be rotatable about the X axis via the shaft portion 12 having a friction mechanism, the substrate holder 10 can be rotated by an independent manual operation. The appearance inspection can be performed under a movement with a high degree of freedom while swinging left and right and up and down with respect to the substrate 11 to be inspected, and a highly accurate inspection result can be obtained.

また、基板ホルダ10のX軸中心の回転も、フリクション機構により回転途中で手を放してもその位置に停止できるようになっているので、観察者に対する安全性も十分に確保できる。   Further, since the rotation of the substrate holder 10 about the X axis can be stopped at that position even if the hand is released during the rotation by the friction mechanism, the safety for the observer can be sufficiently secured.

さらに、装置本体4を基台1のガイド1aに沿って移動させる移動手段、基板支持架台9の伸縮可能な直立枠9a、9bを有する移動手段は、これら移動手段の移動負荷を緩和させるシリンダ7、8および13、14とともに、基板ホルダ10の回転中心軸Xより下方に配置されるので、これら移動手段および負荷緩和手段でパーティクルが発生しても基板ホルダ10上の被検査基板11を汚染させることがない。   Further, the moving means for moving the apparatus main body 4 along the guide 1a of the base 1 and the moving means having the upright and retractable frames 9a and 9b of the substrate support base 9 are cylinders 7 for reducing the movement load of these moving means. 8, 8, 13, and 14 are disposed below the rotation center axis X of the substrate holder 10, so that the substrate 11 to be inspected on the substrate holder 10 is contaminated even if particles are generated by these moving means and load relaxation means. There is nothing.

なお、上述した基板ホルダ10では、被検査基板11の周縁部をエアなどを用いて吸着することで保持するようにしているが、例えば被検査基板11が大型になる場合は、図3に示すように被検査基板11の周縁部を吸着する基板吸着部10bを有する枠部10aの他に、被検査基板11の板面を吸着する基板吸着部10bを有する補助保持部10c設けるようにすればよい。こうすれば、被検査基板11全面を平らな状態を保って保持できる。また、被検査基板11が肉厚で重量の大きなものの場合は、図4に示すように基板ホルダ10の被検査基板11周縁部に対応させて、これら周縁部を挟持する固定鍵部10dを設けるとともに、一方側縁に対応させて支持点10fにより回転可能に支持された鍵部10eを設け、最初に固定鍵部10dにより被検査基板11周縁部の三方を保持させ、この状態から回転可能な鍵部10eを回転させて残り一方を保持させるようにしている。このようにすれば、肉厚で重量の大きな被検査基板11についても、確実に保持することができる。   In the substrate holder 10 described above, the peripheral portion of the substrate to be inspected 11 is held by suction using air or the like. For example, when the substrate to be inspected 11 is large, it is shown in FIG. Thus, in addition to the frame portion 10a having the substrate suction portion 10b that sucks the peripheral portion of the substrate 11 to be inspected, the auxiliary holding portion 10c having the substrate suction portion 10b that sucks the plate surface of the substrate 11 to be inspected is provided. Good. In this way, the entire surface of the inspected substrate 11 can be held in a flat state. When the substrate 11 to be inspected is thick and heavy, as shown in FIG. 4, a fixed key portion 10d that clamps these peripheral portions is provided corresponding to the peripheral portions of the substrate 11 to be inspected. In addition, a key portion 10e that is rotatably supported by a support point 10f is provided corresponding to one side edge, and the fixed key portion 10d first holds the three sides of the peripheral portion of the inspected substrate 11 and can rotate from this state. The key part 10e is rotated to hold the remaining one. In this way, it is possible to reliably hold the inspected substrate 11 that is thick and heavy.

(第2の実施の形態)
図5(a)(b)は、本発明の第2の実施の形態の概略構成を示すもので、図1と同一部分には、同符号を付している。
(Second Embodiment)
FIGS. 5A and 5B show a schematic configuration of the second embodiment of the present invention, and the same parts as those in FIG.

この場合、基板ホルダ10は、回転ホルダ15を設け、この回転ホルダ15に被検査基板11を保持可能にしている。回転ホルダ15は、基板ホルダ10面で回転可能になっており、この回転中心は、X軸とZ軸の交点で、かつX軸とZ軸を有する面と垂直な軸Y上である。   In this case, the substrate holder 10 is provided with a rotation holder 15 so that the substrate 11 to be inspected can be held on the rotation holder 15. The rotation holder 15 is rotatable on the surface of the substrate holder 10, and the center of rotation is on the intersection point of the X axis and the Z axis and on the axis Y perpendicular to the plane having the X axis and the Z axis.

このようにすれば、基板ホルダ10上の被検査基板11は、Z軸およびX軸を中心とした回転だけでなく、Y軸を中心とした回転も得られ、さまざまな方向から外観検査を行なうことができるので、さらに精度の高い検査結果を得ることができる。   In this way, the substrate 11 to be inspected on the substrate holder 10 can obtain not only rotation about the Z axis and X axis but also rotation about the Y axis, and performs appearance inspection from various directions. Therefore, it is possible to obtain a test result with higher accuracy.

また、図6に示すように基板支持架台9の直立枠9a、9b先端部にフリクション機構を有する軸部12、12を介して回転可能に支持される基板ホルダ10は、被検査基板11を保持する基板保持面101が、平行になる位置まで回転された時、この基板保持面101が装置本体4の最上部に位置されるようになっており、第1の実施の形態でも同様である。   Further, as shown in FIG. 6, the substrate holder 10 that is rotatably supported through the shaft portions 12, 12 having the friction mechanism at the tips of the upright frames 9 a, 9 b of the substrate support base 9 holds the substrate 11 to be inspected. When the substrate holding surface 101 to be rotated is rotated to a parallel position, the substrate holding surface 101 is positioned at the uppermost part of the apparatus main body 4, and the same applies to the first embodiment.

このようにすれば、基板ホルダ10の基板保持面101周囲に障害物が何も存在せず、基板保持面101上への被検査基板11の載置方向に何らの制約を受けることがなくなるので、従来の基板の載置方向が決められてしまうような狭いスペースしか確保できないクリーンルームでも、有効に適用することができる。   In this way, there is no obstacle around the substrate holding surface 101 of the substrate holder 10, and there is no restriction on the placement direction of the substrate 11 to be inspected on the substrate holding surface 101. In addition, the present invention can be effectively applied even in a clean room in which only a narrow space in which the mounting direction of a conventional substrate is determined can be secured.

なお、上述した実施の形態では、装置本体4を複数の固定脚2で固定するようにしたが、基台1全体をキャスタを用いて移動させるようにしてもよい。このようにすれば、装置本体4を自由に移動でき、被検査基板11を収納しているカセットまたは製造ライン中とマクロ照明下の検査ステーションとの間で被検査基板11を搬送するキャリアとしても使用できる。   In the above-described embodiment, the apparatus main body 4 is fixed by the plurality of fixed legs 2, but the entire base 1 may be moved using a caster. In this way, the apparatus main body 4 can be freely moved, and can be used as a cassette for storing the substrate to be inspected or a carrier for transporting the substrate to be inspected 11 between the production line and the inspection station under macro illumination. Can be used.

本発明の第1の実施の形態の概略構成を示す図。The figure which shows schematic structure of the 1st Embodiment of this invention. 第1の実施に用いられるフリクション機構の概略構成を示す図。The figure which shows schematic structure of the friction mechanism used for 1st implementation. 第1の実施の形態に用いられる基板ホルダの変形例を示す図。The figure which shows the modification of the board | substrate holder used for 1st Embodiment. 第1の実施の形態に用いられる基板ホルダの他の変形例を示す図。The figure which shows the other modification of the substrate holder used for 1st Embodiment. 本発明の第2の実施の形態の概略構成を示す正面図。The front view which shows schematic structure of the 2nd Embodiment of this invention. 本発明の第2の実施の形態の使用状態を示す正面図。The front view which shows the use condition of the 2nd Embodiment of this invention.

符号の説明Explanation of symbols

1…基台、1a…ガイド
2…固定脚、4…装置本体
5…支持台、5a…ローラ
5b…軸部、6…回転部
6a…軸受け、7…シリンダ
8…シリンダ、9…基板支持架台
9a、9b…直立枠、9c…水平枠
10…基板ホルダ、101…基板保持面
10a…枠部、10b…基板吸着部
10c…補助保持部、10d…固定鍵部
10e…鍵部、11…被検査基板
12…軸部、12a…小径部
12b…バネ、12c…押え板
12d…ナット、13.14…シリンダ
15…回転ホルダ、
DESCRIPTION OF SYMBOLS 1 ... Base, 1a ... Guide 2 ... Fixed leg, 4 ... Apparatus main body 5 ... Support stand, 5a ... Roller 5b ... Shaft part, 6 ... Rotating part 6a ... Bearing, 7 ... Cylinder 8 ... Cylinder, 9 ... Substrate support stand 9a, 9b ... Upright frame, 9c ... Horizontal frame 10 ... Substrate holder, 101 ... Substrate holding surface 10a ... Frame portion, 10b ... Substrate adsorption portion 10c ... Auxiliary holding portion, 10d ... Fixed key portion 10e ... Key portion, 11 ... Covered Inspection board 12 ... Shaft part, 12a ... Small diameter part 12b ... Spring, 12c ... Presser plate 12d ... Nut, 13.14 ... Cylinder 15 ... Rotating holder,

Claims (6)

照明光により照射されたガラス基板を観察者が目視して前記ガラス基板上の欠陥を検査する基板検査装置において、
前記ガラス基板を保持する矩形の基板保持部と、
前記基板保持部を水平軸上で回転可能に支持する第1の回転支持手段と、
前記第1の回転支持手段を取り付ける支持台と、
前記支持台を前記観察者に対して左右方向に直線移動可能に支持する基台と、
を備えたことを特徴とする基板検査装置。
In the substrate inspection apparatus in which the observer visually inspects the glass substrate irradiated with the illumination light and inspects the defect on the glass substrate,
A rectangular substrate holder for holding the glass substrate;
First rotation support means for rotatably supporting the substrate holder on a horizontal axis;
A support for mounting the first rotation support means;
A base that supports the support base so as to be linearly movable in the left-right direction with respect to the observer;
A board inspection apparatus comprising:
更に、前記第1の回転支持手段の前記水平軸と直交する軸上で回転可能に支持する第2の回転支持手段を備えたことを特徹とする請求項1記載の基板検査装置。 2. The substrate inspection apparatus according to claim 1, further comprising second rotation support means for rotatably supporting the first rotation support means on an axis orthogonal to the horizontal axis. 前記第1の回転支持手段は、前記基板保持部を水平軸上で回転可能に支持する一対の直立枠及び両直立枠の間を連結する水平枠を有し、前記第2の回転支持手段は、前記水平枠の略中央を垂直軸で回転可能に支持する回転部を有することを特徴とする請求項2記載の基板検査装置。 The first rotation support means has a pair of upright frames that rotatably support the substrate holding portion on a horizontal axis and a horizontal frame that connects between the two upright frames, and the second rotation support means includes: The substrate inspection apparatus according to claim 2, further comprising a rotating unit that rotatably supports a substantially center of the horizontal frame about a vertical axis. 更に、前記基板保持部を上下方向に移動させる高さ調節手段を備えたことを特徴とする請求項1記載の基板検査装置。 The substrate inspection apparatus according to claim 1, further comprising height adjusting means for moving the substrate holding portion in the vertical direction. 前記高さ調整手段は、前記基板保持部を水平軸上で回転可能に支持する一対の直立枠を伸縮させることを特徹とする請求項4記載の基板検査装置。 5. The substrate inspection apparatus according to claim 4, wherein the height adjusting means extends and contracts a pair of upright frames that rotatably support the substrate holding portion on a horizontal axis. 前記高さ調整手段は、前記基板保持部を所定の角度に傾けた状態で観察者の観察し易い高さに合わせることを特徴とする請求項4又は5のいずれかに記載の基板検査装置。 6. The substrate inspection apparatus according to claim 4, wherein the height adjusting unit adjusts the height to be easily observed by an observer in a state where the substrate holding portion is inclined at a predetermined angle.
JP2007333290A 2007-12-25 2007-12-25 Substrate-inspecting device Pending JP2008116470A (en)

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JP08003099A Division JP4121662B2 (en) 1999-03-24 1999-03-24 Board inspection equipment

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JPH01203945A (en) * 1988-02-09 1989-08-16 Tokyo Electron Ltd Inspection instrument
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