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Publication number
JP2005252232A5
JP2005252232A5 JP2004362116A JP2004362116A JP2005252232A5 JP 2005252232 A5 JP2005252232 A5 JP 2005252232A5 JP 2004362116 A JP2004362116 A JP 2004362116A JP 2004362116 A JP2004362116 A JP 2004362116A JP 2005252232 A5 JP2005252232 A5 JP 2005252232A5
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Japan
Prior art keywords
semiconductor film
chip
integrated circuit
forming
thickness
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JP2004362116A
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Japanese (ja)
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JP2005252232A (en
JP5121119B2 (en
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Priority to JP2004362116A priority Critical patent/JP5121119B2/en
Priority claimed from JP2004362116A external-priority patent/JP5121119B2/en
Publication of JP2005252232A publication Critical patent/JP2005252232A/en
Publication of JP2005252232A5 publication Critical patent/JP2005252232A5/ja
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Claims (14)

厚さが0.2μm以下の半導体膜を有する集積回路を備えた、透光性を備えたチップを搭載したことを特徴とするチップ搭載物。 A chip-mounted object on which a light-transmitting chip including an integrated circuit having a semiconductor film having a thickness of 0.2 μm or less is mounted. 厚さが0.2μm以下の半導体膜を有する集積回路を備えた、透光性を備えたチップを搭載したチップ搭載物であって、
前記集積回路は、液滴吐出法又はレーザカット法により形成された回路接続により、選択されるメモリセルを有するROM、を有することを特徴とするチップ搭載物。
A chip-mounted object including a chip having a light-transmitting property, including an integrated circuit having a semiconductor film having a thickness of 0.2 μm or less,
The integrated circuit includes a ROM having a memory cell selected by a circuit connection formed by a droplet discharge method or a laser cut method.
厚さが0.2μm以下の半導体膜を有する集積回路を備えたチップを搭載した、透光性を備えたチップ搭載物であって、
前記集積回路は、液滴吐出法又はレーザカット法により形成された回路接続により、選択されるメモリセルを有する第1ROMと、
フォトリソグラフィー法により形成された回路接続により、選択されるメモリセルを有する第2ROMと、を有することを特徴とするチップ搭載物。
A chip-mounted object having translucency , mounted with a chip including an integrated circuit having a semiconductor film having a thickness of 0.2 μm or less,
The integrated circuit includes a first ROM having memory cells selected by circuit connection formed by a droplet discharge method or a laser cut method;
And a second ROM having a memory cell selected by circuit connection formed by a photolithography method.
厚さが0.2μm以下の半導体膜を有する集積回路を備えたチップを搭載した、透光性を備えたチップ搭載物であって、
前記集積回路は、前記半導体膜の特性ばらつきに基づく固有なデータを格納した書き換え不可能な不揮発性メモリを有することを特徴とするチップ搭載物。
A chip-mounted object having translucency , mounted with a chip including an integrated circuit having a semiconductor film having a thickness of 0.2 μm or less,
The chip mounted product, wherein the integrated circuit has a non-rewritable nonvolatile memory storing unique data based on characteristic variations of the semiconductor film.
請求項4において、前記半導体膜は結晶性半導体膜からなることを特徴とするチップ搭載物。 5. The chip mounted product according to claim 4 , wherein the semiconductor film is made of a crystalline semiconductor film. 厚さが0.2μm以下の半導体膜を有する集積回路と、前記集積回路上に設けられたアンテナと、を有する、透光性を備えたチップを搭載したチップ搭載物であって、
前記アンテナは、前記集積回路と電気的に接続されていることを特徴とするチップ搭載物
An integrated circuit thickness having the following semiconductor film 0.2 [mu] m, to have a, an antenna provided on the integrated circuit, a switch-up payload equipped with chips having translucency ,
A chip-mounted object , wherein the antenna is electrically connected to the integrated circuit.
第1の基板上に設けられ、厚さが0.2μm以下の半導体膜を有する集積回路と、第2の基板上に設けられたアンテナと、を有する、透光性を備えたチップを搭載したチップ搭載物であって、
前記アンテナは、前記集積回路と電気的に接続されていることを特徴とするチップ搭載物
Provided over the first substrate, mounted an integrated circuit having the 0.2μm or less of the semiconductor film thickness, the antenna provided on a second substrate, to have a, a chip with a light-transmitting property a the switch-up mounted object,
A chip-mounted object , wherein the antenna is electrically connected to the integrated circuit.
請求項乃至のいずれか一において、
前記半導体膜は、ガラス基板、石英基板、ステンレス基板、及び可撓性を有する合成樹脂からなる基板のいずれかの絶縁表面上に設けられていることを特徴とするチップ搭載物。
In any one of Claims 1 thru | or 7 ,
The chip mounting object, wherein the semiconductor film is provided on an insulating surface of any of a glass substrate, a quartz substrate, a stainless steel substrate, and a substrate made of a synthetic resin having flexibility.
請求項乃至のいずれか一において、
前記集積回路は、前記半導体膜を有する薄膜トランジスタを有することを特徴とするチップ搭載物
In any one of Claims 1 thru | or 8 ,
The integrated circuit, chip mounting was characterized by having a thin film transistor having the semiconductor film.
厚さが0.2μm以下の半導体膜を形成し、
前記半導体膜を結晶化して結晶性半導体膜を形成し、
前記結晶性半導体膜を有する集積回路を形成し、
前記集積回路を有する、透光性を備えたチップを搭載することを特徴とするチップ搭載物の作製方法。
Forming a semiconductor film having a thickness of 0.2 μm or less;
Crystallizing the semiconductor film to form a crystalline semiconductor film,
Forming an integrated circuit having the crystalline semiconductor film;
A method for manufacturing a chip-mounted object, comprising mounting a chip having translucency, the chip having the integrated circuit.
厚さが0.2μm以下の半導体膜を形成し、
前記半導体膜を結晶化して結晶性半導体膜を形成し、
前記結晶性半導体膜上に、フォトリソグラフィー法を用いて第1の線を形成し、
前記第1の線による回路接続によって選択される第1メモリセルを形成し、且つ前記結晶性半導体膜上に、液滴吐出法又はレーザカット法を用いて第2の線を形成し、
前記第2の線による回路接続によって選択される第2メモリセルを形成して集積回路を形成し、
前記集積回路を有する、透光性を備えたチップを搭載することを特徴とするチップ搭載物の作製方法。
Forming a semiconductor film having a thickness of 0.2 μm or less;
Crystallizing the semiconductor film to form a crystalline semiconductor film,
On the crystalline semiconductor film, forming a first wiring by photolithography,
It said first forming a first memory cell which is selected by a circuit connected by wiring, and on the crystalline semiconductor film, forming a second wiring by a droplet discharging method or a laser cutting method,
Wherein forming a second memory cell which is selected to form an integrated circuit by a circuit connected by a second wiring,
A method for manufacturing a chip-mounted object, comprising mounting a chip having translucency, the chip having the integrated circuit.
厚さが0.2μm以下の半導体膜を形成し、
前記半導体膜をレーザにより結晶化して結晶性半導体膜を形成し、
前記結晶性半導体膜を有する集積回路を形成し、
前記集積回路を有する、透光性を備えたチップを搭載することを特徴とするチップ搭載物の作製方法。
Forming a semiconductor film having a thickness of 0.2 μm or less;
Crystallizing the semiconductor film with a laser to form a crystalline semiconductor film,
Forming an integrated circuit having the crystalline semiconductor film;
A method for manufacturing a chip-mounted object, comprising mounting a chip having translucency, the chip having the integrated circuit.
厚さが0.2μm以下の半導体膜を形成し、
前記半導体膜に接するように金属元素を添加し、加熱することにより結晶化して第1の結晶性半導体膜を形成し、
前記第1の結晶性半導体膜をレーザにより結晶化して第2の結晶性半導体膜を形成し、
前記第2の結晶性半導体膜を有する集積回路を形成し、
前記集積回路を有する、透光性を備えたチップを搭載することを特徴とするチップ搭載物の作製方法。
Forming a semiconductor film having a thickness of 0.2 μm or less;
A metal element is added so as to be in contact with the semiconductor film, and is heated to crystallize to form a first crystalline semiconductor film,
Crystallizing the first crystalline semiconductor film with a laser to form a second crystalline semiconductor film;
Forming an integrated circuit having the second crystalline semiconductor film;
A method for manufacturing a chip-mounted object, comprising mounting a chip having translucency, the chip having the integrated circuit.
請求項12又は13において、
前記レーザの照射方向と、キャリア移動方向とが沿うように、前記半導体膜のチャネル形成領域を形成し、
前記レーザの照射方向と垂直な方向に曲がるように固定して前記チップを搭載することを特徴とするチップ搭載物の作製方法。
In claim 12 or 13 ,
Forming a channel formation region of the semiconductor film so that the laser irradiation direction and the carrier movement direction are along;
A method of manufacturing a chip-mounted object, wherein the chip is mounted while being fixed so as to bend in a direction perpendicular to the laser irradiation direction.
JP2004362116A 2003-12-26 2004-12-15 Chip loading Expired - Fee Related JP5121119B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004362116A JP5121119B2 (en) 2003-12-26 2004-12-15 Chip loading

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2003432343 2003-12-26
JP2003432343 2003-12-26
JP2004030976 2004-02-06
JP2004030976 2004-02-06
JP2004362116A JP5121119B2 (en) 2003-12-26 2004-12-15 Chip loading

Publications (3)

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JP2005252232A JP2005252232A (en) 2005-09-15
JP2005252232A5 true JP2005252232A5 (en) 2007-12-06
JP5121119B2 JP5121119B2 (en) 2013-01-16

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007234001A (en) * 2006-01-31 2007-09-13 Semiconductor Energy Lab Co Ltd Semiconductor device
WO2007088796A1 (en) * 2006-01-31 2007-08-09 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
JP5196212B2 (en) * 2006-03-02 2013-05-15 セイコーエプソン株式会社 Thin film device manufacturing method
JP2008221880A (en) * 2007-03-08 2008-09-25 Willcom Inc Pedal of bicycle having built-in position information transmitting device, and mobile communication system providing position information of bicycle
US7897482B2 (en) * 2007-05-31 2011-03-01 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and manufacturing method thereof
JP2011141856A (en) * 2010-01-08 2011-07-21 Junichi Mizutani Crime prevention method for money
JP7551410B2 (en) 2020-09-11 2024-09-17 株式会社フジシール RFID labels

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JPS63244497A (en) * 1987-03-31 1988-10-11 Texas Instr Japan Ltd Semiconductor device
JPH06196659A (en) * 1992-12-22 1994-07-15 Kawasaki Steel Corp Semiconductor memory
JP2629626B2 (en) * 1994-12-26 1997-07-09 日本電気株式会社 Semiconductor memory device and method of manufacturing the same
JP4042182B2 (en) * 1997-07-03 2008-02-06 セイコーエプソン株式会社 IC card manufacturing method and thin film integrated circuit device manufacturing method
TW586231B (en) * 2001-07-24 2004-05-01 Seiko Epson Corp Transfer method, methods of manufacturing thin film devices and integrated circuits, circuit board and manufacturing method thereof, electro-optical apparatus and manufacturing method thereof, manufacturing methods of IC card and electronic appliance
JP5057619B2 (en) * 2001-08-01 2012-10-24 株式会社半導体エネルギー研究所 Method for manufacturing semiconductor device
JP4159779B2 (en) * 2001-12-28 2008-10-01 株式会社半導体エネルギー研究所 Semiconductor devices, electronic equipment
JP2003209421A (en) * 2002-01-17 2003-07-25 Dainippon Printing Co Ltd Rfid tag having transparent antenna and production method therefor

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