JP2000180881A - Liquid crystal display device and its production - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent the electrolytic corrosion reaction of a transparent electrode and a reflection electrode by forming a reflection part and a transmission part with electrode materials and partially or entirely superposing the electrode materials by way of an interlayer film in the boundary region between them. SOLUTION: A reflection part and a transmission part comprise electrode materials and electrode materials are partially or entirely superposed by way of an interlayer film 7 in the boundary region between them. In order to prevent the direct contact of ITO 2 as the electrode material constituting the transmission part with Al/Mo 4 as the electrode material constituting the reflection part in the boundary region between the transmission part and the reflection part, the interlayer film 7 and the reflection electrode material 4 are patterned, accordingly a photoresist is removed without causing electrolytic corrosion between the ITO 2 as the transparent electrode material and the Al/Mo 4 as the reflection electrode material. When electric charges applied to a liquid crystal layer in the transmission part are somewhat reduced without hindrance, the interlayer film 7 may be formed on the entire surface of the ITO 2 as the electrode material constituting the transmission part.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device used for OA equipment such as a word processor or a personal computer, portable information equipment such as an electronic organizer, or a camera-integrated VTR equipped with a liquid crystal monitor, and a method of manufacturing the same. About.

[0002]

2. Description of the Related Art In recent years, liquid crystal display devices have been used in word processors, personal computers, televisions, video cameras, still cameras, in-vehicle monitors, portable OA equipment, portable game machines, etc. by utilizing the characteristics of being thin and having low power consumption. Widely used.

Such a liquid crystal display device includes a transmissive liquid crystal display device using a transparent electrode such as ITO (Indium Tin Oxide) as a pixel electrode and a reflective liquid crystal display device using a reflective electrode such as a metal as a pixel electrode. There is a liquid crystal display device.

A liquid crystal display device is not a self-luminous display device that emits light by itself unlike a CRT (CRT) or an EL (electroluminescence) device. A lighting device such as a fluorescent tube, a so-called backlight, is arranged behind the device,
The display is performed by the light incident from there. Further, in the case of a reflection type liquid crystal display device, display is performed by reflecting external incident light by a reflection electrode.

Here, in the case of a transmission type liquid crystal display device,
In order to perform display using the backlight as described above,
Although it has the advantage of being able to perform a bright and high-contrast display without being greatly affected by the surrounding brightness, a backlight typically accounts for 50% or more of the total power consumption of a liquid crystal display device. From consuming
There is also a problem that power consumption increases.

Further, in the case of the reflection type liquid crystal display device, since the backlight is not used as described above, it has an advantage that the power consumption can be extremely reduced. There is also a problem that the brightness and contrast of the display are affected by the use environment or use conditions.

As described above, the reflection type liquid crystal display device has a drawback that the visibility is extremely lowered in the use environment such as the surrounding brightness, especially when the external light is dark. On the other hand, the transmissive liquid crystal display device also has a problem in that, when the external light is very bright, the visibility in, for example, clear weather is reduced.

As a means for solving such problems, a liquid crystal display device having both functions of a reflection type and a transmission type has been proposed, for example, in Japanese Patent Application No. 9-201176. The liquid crystal display device proposed by this patent application has a display unit in which a reflective portion that reflects external light and a transmissive portion that transmits light from a backlight are formed in one display pixel. As a transmissive liquid crystal display device that performs display using the light transmitted through the transmissive part from the backlight, and when the external light is dark, a comparison between the light transmitted through the transmissive part from the backlight and the light reflectance As a dual-purpose liquid crystal display device that performs display by using both light reflected by a reflective portion formed by a high film, and a film having a relatively high light reflectance when external light is bright. This is a transflective liquid crystal display device having a configuration that can be used as a reflective liquid crystal display device that performs display using light reflected by a reflecting portion.

[0009] The liquid crystal display device having such a configuration can provide a liquid crystal display device always excellent in visibility regardless of the brightness of external light. In order to realize bright color display with high color purity, it is necessary to increase the intensity of light scattered in a direction perpendicular to the display screen with respect to incident light from all angles. For that purpose, it is necessary to produce a reflection plate having optimal reflection characteristics.
It is necessary to form a concavo-convex that is controlled to have optimal reflection characteristics, and then form a reflector on which a thin film made of a metal film or the like is formed.

[0010] As a practiced method, for example, a photosensitive resin is applied on a substrate, and the photosensitive resin is exposed and developed through a light-shielding means in which circular light-shielding regions are arranged. And forming a plurality of convex portions. Then, an insulating protective film is formed on the convex portion along the shape of the convex portion, and a reflector made of a metal thin film is formed on the insulating protective film.

In addition, when the reflection plate is formed outside the substrate (on the side opposite to the liquid crystal layer) and the double reflection due to the influence of the glass thickness is caused, the reflection plate is formed inside the substrate and the pixel is formed. The problem is solved by using a structure also serving as an electrode, that is, a reflective electrode.

[0012]

In a conventional liquid crystal display device which performs display using reflected light as described above,
As a matter of course, it is preferable that the reflective electrode is made of a material having a high reflectivity. In that sense, Ag is optimal. However, Ag is a material having a high diffusivity into the Si layer.
The problem of diffusion and reaction to the substrate is great.

On the other hand, Al has a low possibility of diffusion and reaction to the underlayer, is widely used for metallization in integrated circuits, and has good characteristics such as etching conditions. Is often done. When a reflective electrode is formed by etching such a reflective electrode film of Al, a wet etching method using an etchant composed of nitric acid + acetic acid + phosphoric acid + water as an etchant is applied.

Further, ITO is often used for the transparent electrode portion and the like in the above-described conventional technology. In order to remove the photoresist (resist) used in the photolithography technology at this time, an amine-based photoresist is used. Is used.

Here, the boundary region between the transparent electrode and the reflective electrode in the above-mentioned transflective liquid crystal display device will be briefly described with reference to the drawings. 9 and 10 are cross-sectional views illustrating a boundary region between a transparent electrode and a reflective electrode in a pixel portion of a conventional liquid crystal display device.

As shown in FIG. 9, a boundary region between a transparent electrode and a reflective electrode in a pixel portion of the conventional liquid crystal display device is composed of ITO2 as a transparent electrode and Al4 as a reflective electrode formed on a substrate 1. Are electrically in contact with each other, or, as shown in FIG. 10, ITO2 as a transparent electrode and Al4 as a reflective electrode further intervene through another metal film 5 (for example, Mo: molybdenum). In general, they are in electrical contact with each other.

However, as described above, ITO and A
It has been found that the following problem occurs when 1 is electrically connected.

This is an electrolytic corrosion reaction that occurs between ITO and Al in a water-washing step of an amine-based stripping liquid → water-washing step for removing a resist when forming a reflective electrode. This electrolytic corrosion reaction is a reaction that occurs because the amine-based stripping solution that has adhered to the substrate in the stripping tank is mixed with water in the washing tank to increase alkalinity.
In other words, this is because ITO and Al are immersed in an alkaline solution in a state of being adjacent to or in contact with each other. As a result, the reflective electrode Al and the transparent electrode I
There are problems that the surface of TO2 is corroded (electrolytic corrosion) and that ITO2, which is a transparent electrode, is reduced and blackened.

As described above, in the conventional liquid crystal display device, ITO and Al are corroded and dissolved in the boundary region between the transparent electrode and the reflective electrode in the pixel portion, and the production yield of the liquid crystal display device is caused by this electrolytic corrosion reaction. Has been greatly reduced.

The present invention has been made in view of the above-mentioned conventional problems, and has as its object to solve the problem of the transparent electrode and the reflective electrode in the pixel portion of the transflective liquid crystal display device. It is an object of the present invention to provide a transflective liquid crystal display device capable of easily improving a production yield by preventing an electrolytic corrosion reaction, and a method for producing the same.

[0021]

A liquid crystal display device according to the present invention for achieving the above object has a structure in which one of a pair of substrates disposed opposite to each other with a liquid crystal layer interposed therebetween is formed on a substrate. In a liquid crystal display device in which a pixel electrode that forms a reflecting portion for reflecting external light and a transmitting portion for transmitting light from the back light source in one pixel is formed, the reflecting portion and the transmitting portion are each formed of an electrode material. These electrode materials are characterized in that they are formed so as to partially or entirely overlap each other via an interlayer film in a boundary region between them.

That is, according to the liquid crystal display device of the present invention, in the boundary region between the transmission part and the reflection part, the electrode material forming the transmission part and the electrode material forming the reflection part are in contact with each other or in another state. In order not to be in a state of being electrically connected via a metal film, etc., by using a structure with an interlayer film between them, the problem of corrosion due to electrolytic corrosion of electrode materials and blackening due to reduction is solved. I have. This is because the electric resistance between the electrode material constituting the transmission part and the electrode material constituting the reflection part is increased by employing the structure with the interlayer film interposed therebetween, and even when immersed in the electrolytic solution, the electrolytic corrosion and It is possible to make reduction less likely to occur.

Further, in the method for manufacturing a liquid crystal display device according to the present invention for achieving the above-mentioned object, the method for manufacturing a liquid crystal display device according to the present invention comprises the steps of: In a method for manufacturing a liquid crystal display device in which a pixel electrode that forms a reflection part that reflects light and a transmission part that transmits light from a back light source in one pixel is formed, at least a region that constitutes the transmission part is included. Patterning a transparent electrode material on one of the substrates, forming an interlayer film on the transparent electrode including at least a region constituting the reflective portion, and forming an interlayer film on the one side substrate; A step of patterning and forming a reflective electrode material in a region constituting the reflective portion.

That is, according to the method of manufacturing a liquid crystal display device of the present invention, misalignment of a photomask or the like occurs at the time of patterning an interlayer film or an electrode material in a boundary region between a transmission portion and a reflection portion. Also, by forming the reflective electrode material on the interlayer film, in a state where the electrode material constituting the transmission portion and the electrode material constituting the reflection portion via the interlayer film,
Since a step of removing the resist such as an amine-based stripping liquid → rinsing with water is performed, it is possible to make it difficult to cause problems due to electrolytic corrosion and reduction even when immersed in an electrolytic solution.

[0025]

(Embodiment 1) Hereinafter, Embodiment 1 of the present invention will be described with reference to the drawings.

FIG. 1 is a sectional view showing the structure of a pixel portion of the liquid crystal display device according to the first embodiment.
3 (a) to 3 (d) and FIGS. 3 (e) to 3 (h) are cross-sectional views showing processes of a transmissive portion and a reflective portion in a pixel portion of the liquid crystal display device according to the first embodiment.

In the transmissive portion and the reflective portion constituting the pixel portion of the liquid crystal display device according to the first embodiment, first, as shown in FIG. 2A, a base coat film of Ta ₂ O is formed on the insulating substrate 1. ₅ , an insulating film such as SiO ₂ is formed (not shown), and then, Al, M
A gate electrode 8 is formed by forming a metal thin film made of o, Ta or the like by a sputtering method and patterning it.

Next, a gate insulating film 10 is laminated on the insulating substrate 1 so as to cover the gate electrode 8 described above. In the first embodiment, the SiNx film is formed to 3000
ÅLaminated to form a gate insulating film 10. In order to enhance the insulating property, the gate electrode 8 is anodized, the anodized film is used as a first gate insulating film 9, and an insulating film 10 such as SiN is formed by a CVD method to form a second insulating film. The film 10 may be used.

Next, the channel layer 11 (amorphous S
i) and the electrode contact layer 12 (amorphous Si or microcrystalline Si doped with an impurity such as phosphorus) are continuously formed on the gate insulating film 10 by the CVD method.
500 ° and 500 ° are laminated, and both Si films of the electrode contact layer 12 and the channel layer 11 are formed by patterning by a dry etching method using a mixed gas of HCl + SF ₆ .

Then, as shown in FIG. 2 (b), a transparent conductive film (ITO) 2, 13 is laminated as an electrode material constituting the transmission portion by sputtering at 1500 ° by a sputtering method, followed by an Al, Mo, Ta film or the like. Are laminated. And by patterning these,
Source electrodes 13 and 14 and drain electrodes 2 and 15 are formed.

Next, as shown in FIG. 2C, an insulating film of SiN or the like is laminated at 3000.degree. By a CVD method and then patterned to form an interlayer film 7. Next, as shown in FIG.

Next, as shown in FIG. 2D, a photosensitive resin film 3 is applied on the interlayer film 7, and after exposing and developing the photosensitive resin 3, a heat treatment is carried out. An uneven portion, a contact portion, and a transmission portion are formed.

Next, as shown in FIG.
On the substrate 1 including the photosensitive resin 3, Al / Mo films 4 and 5 are formed as electrode materials for forming a reflection portion to a thickness of 1000/500 ° by a sputtering method.

Then, as shown in FIG. 3 (f), a photoresist 16 is formed in a predetermined shape on the electrode material constituting the reflecting portion by using a photolithography process. At this time, Mo5 is present between ITO2, which is an electrode material forming the transmitting portion, and Al4, which is an electrode material forming the reflecting portion.
Exists during the development of the photoresist 16,
Even if the electrolyte solution permeates from the film defect portion of No. 14, this M
Since o5 functions as a barrier metal, no electrolytic corrosion reaction occurs.

Further, at this time, when patterning the electrode material constituting the reflecting portion in the next step, it is necessary to prevent direct contact between ITO2 and Al4 / Mo5 in the boundary region between the transmitting portion and the reflecting portion. is there. That is, as shown in the cross-sectional view of FIG. 1, in consideration of the misalignment between the interlayer film 7 and the reflective electrode 4, in the boundary region between the electrode material forming the transmissive portion and the electrode material forming the reflective portion, The photoresist 16 is exposed and developed so that the end of the photoresist 16 is closer to the reflection part than the end of the interlayer film 7.

Next, as shown in FIG. 3 (g), using an etchant composed of nitric acid + acetic acid + phosphoric acid + water, Al / Mo, which is an electrode material constituting the reflecting portion, is simultaneously etched and reflected. Form electrodes.

Finally, as shown in FIG. 3 (h), the photoresist 16 formed by photolithography is removed by using a batch type peeling device, whereby the pixel of the liquid crystal display device according to the first embodiment is removed. The part is completed.

Here, a batch type peeling apparatus used for removing the photoresist 16 formed by the photolithography will be described with reference to FIG. FIGS. 4A to 4C are schematic views showing a batch type photoresist 16 stripping step in the first embodiment.

As shown in FIGS. 4 (a) to 4 (c), the substrate 20 having undergone the above-described steps is treated as an amine with MEA.
The substrate 20 is immersed in a stripping solution 21 containing 60 wt% (monoethanolamine), and then immersed in water 22 to remove the stripping solution 21 on the surface of the substrate 20 and washed with water. At this time, in the process of transporting the substrate 20 from the stripping tank to the washing tank as shown in FIG. 4B, the stripping liquid 21 adheres to the surface of the substrate 20, and the substrate 20 is washed with water. By immersing in the bath, the MEA 21 and the water 22 are mixed on the surface of the substrate 20 to increase the alkalinity.

Therefore, in the conventional liquid crystal display device, when the photoresist 16 is removed,
In the boundary region between the transmission part and the reflection part, since the electrode material ITO2 constituting the transmission part and the electrode material Al4 / Mo5 constituting the reflection part are adjacent to each other, electrolytic corrosion occurs.

However, in the first embodiment, as described above, in the boundary region between the transmission portion and the reflection portion, the region shown in FIG.
As shown in the cross-sectional view, ITO2 as an electrode material forming a transmitting portion and Al4 / as an electrode material forming a reflecting portion.
Since the interlayer film 7 and the reflective electrode materials 4 and 7 are patterned so as not to make direct contact with Mo5, no electrolytic corrosion occurs between ITO as a transparent electrode material and Al as a reflective electrode material. The photoresist 16 can be removed.

If there is no problem even if the electric charge applied to the liquid crystal layer in the transmission part is slightly reduced, the interlayer film 7 may be formed on the entire surface of ITO which is an electrode material constituting the transmission part. In the case of such a configuration, there is an advantage that the retardation between the transmission part and the reflection part can be set to an optimum value by controlling the thickness of the interlayer film 7.

An alignment film is applied to each of the TFT substrate having the pixel portion manufactured as described above and a transparent counter substrate (not shown) on which a transparent electrode is formed, and baked. Then, a rubbing treatment is applied to this alignment film, and spacers are scattered. Then, these two substrates are bonded together with a sealing resin, and liquid crystal is injected by a vacuum injection method to produce a liquid crystal display element. In the first embodiment, in order to operate in the horizontal alignment liquid crystal mode, the rubbing directions are set to be parallel, and a nematic liquid crystal having a positive dielectric anisotropy is injected. Finally, one polarizing plate and one retardation plate are provided on both sides of the liquid crystal display element, respectively, and a backlight is provided on the back surface. Thus, the transflective liquid crystal display device according to the first embodiment is completed.

(Embodiment 2) In Embodiment 1 described above, a method of removing the photoresist 16 formed by photolithography using a batch type peeling apparatus has been described. A method for removing the photoresist 16 formed by photolithography using a single-wafer stripper will be described.

FIGS. 5A to 5D are schematic views showing a step of removing the photoresist 16 according to the second embodiment. The manufacturing process of the liquid crystal display device according to the second embodiment is performed according to the same flow as that of the first embodiment described above, except for the step of removing the photoresist 16.

As shown in FIGS. 5A to 5D, the substrate 20 having undergone the steps of FIGS.
Is MEA (monoethanolamine) as amine
It is immersed in a stripping solution 21 containing 0 wt%, and then immersed in water 22 and washed with water to remove the stripping solution 21 on the surface of the substrate 20. At this time, in a process in which the substrate 20 as shown in FIG.
The surface of the substrate 20 is in a state in which a stripping liquid 21 is attached.
The MEA 21 and the water 22 mix on the surface and the alkalinity increases.

Therefore, in the conventional liquid crystal display device, when the photoresist 16 is removed,
In the boundary region between the transmission part and the reflection part, since the electrode material ITO2 constituting the transmission part and the electrode material Al4 / Mo5 constituting the reflection part are adjacent to each other, electrolytic corrosion occurs. Also, in the second embodiment, as described above, in the boundary region between the transmission part and the reflection part, the
As shown in the cross-sectional view, ITO2 as an electrode material forming a transmitting portion and Al4 / as an electrode material forming a reflecting portion.
Since the interlayer film 7 and the reflective electrode materials 4 and 7 are patterned so as not to make direct contact with Mo5, no electrolytic corrosion occurs between ITO as a transparent electrode material and Al as a reflective electrode material. The photoresist 16 can be removed.

Embodiment 3 Hereinafter, Embodiment 3 of the present invention will be described with reference to the drawings.

FIG. 6 is a sectional view showing the structure of the pixel portion of the liquid crystal display device according to the third embodiment.
(A) to (d) and FIGS. 8 (e) to (g) are cross-sectional views showing processes of a transmission part and a reflection part in a pixel portion of the liquid crystal display device according to the third embodiment.

[0050] In the transmissive portion and the reflective portion in the pixel portion of the liquid crystal display device in the third embodiment, first, as shown in FIG. 7 (a), Ta ₂ O as a base coat film on the insulating substrate 1 ₅ , an insulating film such as SiO ₂ is formed (not shown), and then, Al, M
A gate electrode 8 is formed by forming a metal thin film made of o, Ta or the like by a sputtering method and patterning it.

Next, a gate insulating film 10 is laminated on the insulating substrate 1 so as to cover the gate electrode 8 described above. In the third embodiment, the SiNx film is formed to 3000
ÅLaminated to form a gate insulating film 10. In order to enhance the insulating property, the gate electrode 8 is anodized, the anodized film is used as a first gate insulating film 9, and an insulating film 10 such as SiN is formed by a CVD method to form a second insulating film. The film 10 may be used.

Next, the channel layer 11 (amorphous S
i) and the electrode contact layer 12 (amorphous Si or microcrystalline Si doped with an impurity such as phosphorus) are continuously formed on the gate insulating film 10 by the CVD method.
500 ° and 500 ° are laminated, and both Si films of the electrode contact layer 12 and the channel layer 11 are formed by patterning by a dry etching method using a mixed gas of HCl + SF ₆ .

Thereafter, as shown in FIG. 7 (b), a transparent conductive film (ITO) 2, 13 is laminated as an electrode material constituting a transmission portion by sputtering at 1500 ° by a sputtering method, and subsequently, an Al, Mo, Ta film or the like is formed. Are laminated. And by patterning these,
Source electrodes 13 and 14 and drain electrodes 2 and 15 are formed.

Next, as shown in FIG.
A photosensitive resin film 3 is applied on O2, and the photosensitive resin 3 is exposed and developed, and then heat-treated to form a plurality of uneven portions, contact portions, and transmission portions.

Next, as shown in FIG. 7D, on the substrate 1 containing the photosensitive resin 3, Al / Mo films 4 and 5 as an electrode material constituting a reflection portion are formed by sputtering.
A film is formed with a thickness of 000/500 °.

Then, as shown in FIG. 8E, a photoresist 16 is formed in a predetermined shape on the electrode material constituting the reflecting portion by using a photolithography process. At this time, Mo5 is present between ITO2, which is an electrode material forming the transmitting portion, and Al4, which is an electrode material forming the reflecting portion.
Exists during the development of the photoresist 16,
Even if the electrolyte solution permeates from the film defect portion of No. 14, this M
Since o5 functions as a barrier metal, no electrolytic corrosion reaction occurs.

At this time, when patterning the electrode material constituting the reflective portion in the next step, it is necessary to prevent direct contact between ITO2 and Al4 / Mo5 in the boundary region between the transmissive portion and the reflective portion. is there. That is, as shown in the cross-sectional view of FIG. 6, in consideration of the misalignment between the photosensitive resin 3 and the reflection electrode 4, the boundary region between the electrode material forming the transmission portion and the electrode material forming the reflection portion is considered. The photoresist 16 is exposed and developed so that the end of the photoresist 16 is closer to the reflection part than the end of the photosensitive resin 3.

Next, as shown in FIG. 8 (f), using an etchant composed of nitric acid + acetic acid + phosphoric acid + water, Al / Mo, which is an electrode material constituting the reflecting portion, is simultaneously etched and reflected. Form electrodes.

Finally, as shown in FIG. 8 (g), the photoresist 16 formed by photolithography is removed by using a batch type peeling device, whereby the pixel of the liquid crystal display device according to the third embodiment is removed. The part is completed.

Also in the third embodiment, as described above, in the boundary region between the transmission part and the reflection part, as shown in the sectional view of FIG.
Since the photosensitive resin 3 and the reflective electrode materials 4 and 7 are patterned so that the electrode 2 and the electrode material Al4 / Mo5 constituting the reflective portion do not come into direct contact with each other, the transparent electrode material ITO and the reflective electrode The photoresist 16 can be removed without causing electrolytic corrosion between Al and the material.

[0061]

As described above, according to the liquid crystal display device and the method of manufacturing the same according to the present invention, the electrode material and the reflection portion constituting the transmission portion are formed in the boundary region between the transmission portion and the reflection portion. In order to prevent the electrode material from being in contact with each other or electrically connected via another metal film, etc., the electrode material has a structure with an interlayer film interposed between them, so that the electrode material is corroded by electrolytic corrosion. And the problem of blackening due to reduction. This is because the electric resistance between the electrode material constituting the transmission part and the electrode material constituting the reflection part is increased by employing the structure with the interlayer film interposed therebetween, and even when immersed in the electrolytic solution, the electrolytic corrosion and It is possible to make reduction less likely to occur.

[Brief description of the drawings]

FIG. 1 is an enlarged cross-sectional view showing a configuration of a pixel portion of a liquid crystal display device according to a first embodiment of the present invention.

FIGS. 2A to 2D show Embodiment 1 of the present invention;
FIG. 4 is an enlarged cross-sectional view illustrating a process of a pixel portion of the liquid crystal display device in FIG.

3 (e) to 3 (h) show Embodiment 1 of the present invention.
FIG. 4 is an enlarged cross-sectional view illustrating a process of a pixel portion of the liquid crystal display device in FIG.

FIGS. 4 (a) to 4 (c) show Embodiment 1 of the present invention.
FIG. 4 is a schematic view showing a batch type photoresist stripping step in FIG.

5 (a) to 5 (d) show Embodiment 2 of the present invention.
FIG. 3 is a schematic view showing a single-wafer type photoresist stripping step in FIG.

FIG. 6 is an enlarged sectional view showing a configuration of a pixel portion of a liquid crystal display device according to a third embodiment of the present invention.

FIGS. 7A to 7D show Embodiment 3 of the present invention.
FIG. 4 is an enlarged cross-sectional view illustrating a process of a pixel portion of the liquid crystal display device in FIG.

8 (e) to 8 (g) show Embodiment 3 of the present invention.
FIG. 4 is an enlarged cross-sectional view illustrating a process of a pixel portion of the liquid crystal display device in FIG.

FIG. 9 is a cross-sectional view showing a boundary region between a transparent electrode and a reflective electrode in a pixel portion of a conventional liquid crystal display device.

FIG. 10 is a cross-sectional view showing a boundary region between a transparent electrode and a reflective electrode in a pixel portion of a conventional liquid crystal display device.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Glass substrate 2 Transparent electrode material (ITO) 3 Photosensitive resin film 4 Reflection electrode material (Al) 5 Reflection electrode material (Mo) 6 Transmissive part 7 Insulating film 8 Gate electrode 9 Anodized film 10 Gate insulating film 11 Channel layer 12 Electrode contact layer 13 Source electrode (ITO) 14 Source electrode (Ta) 15 Drain electrode (Ta) 16 Photoresist 20 Substrate 21 Stripper 22 Water

 ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 2H090 HA02 HB07X HC05 HC12 HD05 LA01 LA04 2H091 FA14Y FB08 FC02 FC26 FD04 GA03 GA07 GA13 LA02 LA16 2H092 HA02 HA28 JA26 JA35 JA36 JA44 JB07 KA10 KA12 KA18 MA07 MA08 MA18 MA17 MA24 PA10 PA11

Claims (2)

[Claims] 1. A reflecting portion for reflecting external light and a transmitting portion for transmitting light from a back light source are provided on one of a pair of substrates disposed opposite to each other with a liquid crystal layer interposed therebetween. In a liquid crystal display device in which a pixel electrode formed in one pixel is formed, the reflective portion and the transmissive portion are each formed of an electrode material, and these electrode materials are formed via an interlayer film in a boundary region of each other. A liquid crystal display device formed by partially or entirely overlapping. 2. A reflection portion for reflecting external light and a transmission portion for transmitting light from a rear light source are provided on one of a pair of substrates disposed opposite to each other with a liquid crystal layer interposed therebetween. In a method for manufacturing a liquid crystal display device in which a pixel electrode formed in one pixel is formed, a step of patterning and forming a transparent electrode material on one substrate including at least a region forming a transmission portion; A step of patterning and forming an interlayer film on the transparent electrode including at least a region constituting the reflection section; and a step of patterning and forming a reflection electrode material in a region constituting the reflection section on the interlayer film. And a method for manufacturing a liquid crystal display device.