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DE60333223D1 - Pyrogenes sio2 und dispersion desselben - Google Patents

Pyrogenes sio2 und dispersion desselben

Info

Publication number
DE60333223D1
DE60333223D1 DE60333223T DE60333223T DE60333223D1 DE 60333223 D1 DE60333223 D1 DE 60333223D1 DE 60333223 T DE60333223 T DE 60333223T DE 60333223 T DE60333223 T DE 60333223T DE 60333223 D1 DE60333223 D1 DE 60333223D1
Authority
DE
Germany
Prior art keywords
burner
less
gas
powder
dispersion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60333223T
Other languages
English (en)
Inventor
Martin Moerters
Helmut Mangold
Monika Oswald
Kai Schumacher
Heinz Lach
Gerrit Schneider
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Evonik Operations GmbH
Original Assignee
Evonik Degussa GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Evonik Degussa GmbH filed Critical Evonik Degussa GmbH
Priority to DE60333223T priority Critical patent/DE60333223D1/de
Application granted granted Critical
Publication of DE60333223D1 publication Critical patent/DE60333223D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00Glass compositions
    • C03C3/04Glass compositions containing silica
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F23/00Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
    • B01F23/50Mixing liquids with solids
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/141Preparation of hydrosols or aqueous dispersions
    • C01B33/1415Preparation of hydrosols or aqueous dispersions by suspending finely divided silica in water
    • C01B33/1417Preparation of hydrosols or aqueous dispersions by suspending finely divided silica in water an aqueous dispersion being obtained
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14Colloidal silica, e.g. dispersions, gels, sols
    • C01B33/146After-treatment of sols
    • C01B33/148Concentration; Drying; Dehydration; Stabilisation; Purification
    • C01B33/1485Stabilisation, e.g. prevention of gelling; Purification
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/113Silicon oxides; Hydrates thereof
    • C01B33/12Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C01B33/183Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process by oxidation or hydrolysis in the vapour phase of silicon compounds such as halides, trichlorosilane, monosilane
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/50Agglomerated particles
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/62Submicrometer sized, i.e. from 0.1-1 micrometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/64Nanometer sized, i.e. from 1-100 nanometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/10Solid density
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/12Surface area
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/22Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Dispersion Chemistry (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Silicon Compounds (AREA)
  • Colloid Chemistry (AREA)
  • Medicinal Preparation (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE60333223T 2002-12-17 2003-12-16 Pyrogenes sio2 und dispersion desselben Expired - Lifetime DE60333223D1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE60333223T DE60333223D1 (de) 2002-12-17 2003-12-16 Pyrogenes sio2 und dispersion desselben

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10258857A DE10258857A1 (de) 2002-12-17 2002-12-17 Pyrogen hergestelltes Siliciumdioxid und Dispersion hiervon
PCT/EP2003/014322 WO2004054929A1 (en) 2002-12-17 2003-12-16 Pyrogenic silicon dioxide and a dispersion thereof
DE60333223T DE60333223D1 (de) 2002-12-17 2003-12-16 Pyrogenes sio2 und dispersion desselben

Publications (1)

Publication Number Publication Date
DE60333223D1 true DE60333223D1 (de) 2010-08-12

Family

ID=32477701

Family Applications (2)

Application Number Title Priority Date Filing Date
DE10258857A Ceased DE10258857A1 (de) 2002-12-17 2002-12-17 Pyrogen hergestelltes Siliciumdioxid und Dispersion hiervon
DE60333223T Expired - Lifetime DE60333223D1 (de) 2002-12-17 2003-12-16 Pyrogenes sio2 und dispersion desselben

Family Applications Before (1)

Application Number Title Priority Date Filing Date
DE10258857A Ceased DE10258857A1 (de) 2002-12-17 2002-12-17 Pyrogen hergestelltes Siliciumdioxid und Dispersion hiervon

Country Status (9)

Country Link
US (1) US7722849B2 (de)
EP (1) EP1572587B1 (de)
JP (1) JP4280712B2 (de)
KR (1) KR101030873B1 (de)
CN (1) CN1330570C (de)
AT (1) ATE472510T1 (de)
AU (1) AU2003290058A1 (de)
DE (2) DE10258857A1 (de)
WO (1) WO2004054929A1 (de)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004036602A1 (de) * 2004-07-28 2006-03-23 Degussa Ag Hochgefüllte, wässerige Metalloxid-Dispersion
DE102005001409A1 (de) * 2005-01-12 2006-07-20 Degussa Ag Pyrogen hergestelltes Siliciumdioxidpulver und dieses Pulver enthaltene Silikondichtmasse
DE102005001410A1 (de) * 2005-01-12 2006-07-20 Degussa Ag Pyrogen hergestelltes Siliciumdioxidpulver und Dispersion hiervon
EP1700832A1 (de) 2005-03-09 2006-09-13 Degussa AG Verfahren zur Herstellung von Glas optischer Qualität
EP1700829A1 (de) * 2005-03-09 2006-09-13 Degussa AG Verfahren zum Herstellen eines Glasmonolithes mittels eines Sol-Gel-Verfahrens
EP1700830A1 (de) 2005-03-09 2006-09-13 Novara Technology S.R.L. Prozess für die Herstellung von Monolithen mittels eines Sol-Gel Prozesses
EP1700824A1 (de) 2005-03-09 2006-09-13 Degussa AG Granulate basierend auf pyrogen hergestelles silicon dioxid, sowie Verfahren zu deren Herstellung und Verwendung dergleichen
EP1700828A1 (de) 2005-03-09 2006-09-13 Degussa AG Verfahren zur Herstellung von Glaskörpern ultrahoher Reinheit und optischer Qualität
DE602005003198T2 (de) 2005-03-09 2008-08-28 Degussa Novara Technology S.P.A. Verfahren zur Herstellung von Monolithen durch ein Sol-Gel Verfahren
EP1717202A1 (de) * 2005-04-29 2006-11-02 Degussa AG Sinterwerkstoffe aus Siliciumdioxid
DE102006005093A1 (de) * 2006-02-04 2007-08-09 Degussa Ag Siliciumdioxid und Polycarboxylatether enthaltende Dispersion
DE102006030002A1 (de) * 2006-06-29 2008-01-03 Wacker Chemie Ag Herstellung pyrogener Metalloxide in temperierten Reaktionskammern
DE102006054156A1 (de) * 2006-11-16 2008-05-21 Wacker Chemie Ag Pyrogene Kieselsäure hergestellt in einer Produktions-Anlage mit großer Kapazität
EP1997776B1 (de) * 2007-05-21 2011-02-02 Evonik Degussa GmbH Pyrogen hergestelltes Siliciumdioxid mit niedriger Verdickungswirkung
EP2088128B1 (de) 2007-12-10 2015-04-08 Cristal Materials Corporation Verfahren zur Herstellung von Glasmonolithen über das Sol-Gel-Verfahren
EP2618339A3 (de) * 2010-03-12 2013-10-30 General Cable Technologies Corporation Kabel mit Isolierung mit Mikrooxidpartikeln
DE102013206266A1 (de) * 2013-04-10 2014-10-16 Wacker Chemie Ag Vernetzbare Massen auf der Basis von Organosiliciumverbindungen
CN103712951B (zh) * 2013-12-31 2016-03-09 清华大学深圳研究生院 一种基于三维结构纳米阵列生物芯片的制备方法及其应用
EP3390304B1 (de) 2015-12-18 2023-09-13 Heraeus Quarzglas GmbH & Co. KG Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas
WO2017103153A1 (de) 2015-12-18 2017-06-22 Heraeus Quarzglas Gmbh & Co. Kg Glasfasern und vorformen aus quarzglas mit geringem oh-, cl- und al-gehalt
EP3390296B1 (de) 2015-12-18 2024-09-04 Heraeus Quarzglas GmbH & Co. KG Herstellung eines quarzglaskörpers in einem mehrkammerofen
TWI794150B (zh) 2015-12-18 2023-03-01 德商何瑞斯廓格拉斯公司 自二氧化矽顆粒製備石英玻璃體
JP6940235B2 (ja) 2015-12-18 2021-09-22 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 高融点金属の溶融坩堝内での石英ガラス体の調製
JP6881776B2 (ja) 2015-12-18 2021-06-02 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 不透明石英ガラス体の調製
TWI720090B (zh) 2015-12-18 2021-03-01 德商何瑞斯廓格拉斯公司 於石英玻璃之製備中作為中間物之經碳摻雜二氧化矽顆粒的製備
TWI813534B (zh) 2015-12-18 2023-09-01 德商何瑞斯廓格拉斯公司 利用露點監測在熔融烘箱中製備石英玻璃體
EP3390293B1 (de) 2015-12-18 2023-04-19 Heraeus Quarzglas GmbH & Co. KG Erhöhen des siliziumgehalts bei der herstellung von quarzglas
JP6881777B2 (ja) 2015-12-18 2021-06-02 ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー 合成石英ガラス粒の調製
DE102017203998A1 (de) * 2017-03-10 2017-06-01 Wacker Chemie Ag Verfahren zur Herstellung von pyrogener Kieselsäure
WO2024165387A1 (en) 2023-02-10 2024-08-15 Evonik Operations Gmbh Process for manufacturing oxides

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2620737C2 (de) 1976-05-11 1982-07-29 Wacker-Chemie GmbH, 8000 München Verfahren zum Herstellen von hochdispersem Siliciumdioxid
JPH01234319A (ja) * 1988-03-16 1989-09-19 Nippon Steel Chem Co Ltd 球状シリカの製造方法
DE19530339A1 (de) * 1995-08-18 1997-02-20 Degussa Pyrogene Kieselsäure, Verfahren zu ihrer Herstellung und Verwendung
DE19756840A1 (de) * 1997-01-23 1998-07-30 Degussa Pyrogene Oxide und Verfahren zu ihrer Herstellung
DE19807700A1 (de) * 1998-02-24 1999-08-26 Degussa Fällungskieselsäuregranulate
DE19953029A1 (de) * 1999-11-04 2001-05-17 Degussa Polyester
EP1148026B1 (de) * 2000-04-12 2016-08-10 Evonik Degussa GmbH Dispersionen
US6679945B2 (en) * 2000-08-21 2004-01-20 Degussa Ag Pyrogenically prepared silicon dioxide
EP1182168B1 (de) * 2000-08-21 2004-05-12 Degussa AG Pyrogen hergestelltes Siliciumdioxid
DE10326049A1 (de) 2003-06-10 2004-12-30 Degussa Ag Flammenhydrolytisch hergestelltes Siliciumdioxid, Verfahren zu seiner Herstellung und Verwendung

Also Published As

Publication number Publication date
DE10258857A1 (de) 2004-07-08
EP1572587A1 (de) 2005-09-14
US7722849B2 (en) 2010-05-25
CN1330570C (zh) 2007-08-08
EP1572587B1 (de) 2010-06-30
KR101030873B1 (ko) 2011-04-22
KR20050091725A (ko) 2005-09-15
CN1726170A (zh) 2006-01-25
US20080045411A1 (en) 2008-02-21
AU2003290058A1 (en) 2004-07-09
WO2004054929A1 (en) 2004-07-01
ATE472510T1 (de) 2010-07-15
JP2006509712A (ja) 2006-03-23
JP4280712B2 (ja) 2009-06-17

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