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DE60106675D1 - Verdampfer - Google Patents

Verdampfer

Info

Publication number
DE60106675D1
DE60106675D1 DE60106675T DE60106675T DE60106675D1 DE 60106675 D1 DE60106675 D1 DE 60106675D1 DE 60106675 T DE60106675 T DE 60106675T DE 60106675 T DE60106675 T DE 60106675T DE 60106675 D1 DE60106675 D1 DE 60106675D1
Authority
DE
Germany
Prior art keywords
evaporator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60106675T
Other languages
English (en)
Other versions
DE60106675T2 (de
Inventor
Michael L Timmons
Richard J Colby
Robert Stennick
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
Rohm and Haas Electronic Materials LLC
Original Assignee
Shipley Co Inc
Shipley Co LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Inc, Shipley Co LLC filed Critical Shipley Co Inc
Publication of DE60106675D1 publication Critical patent/DE60106675D1/de
Application granted granted Critical
Publication of DE60106675T2 publication Critical patent/DE60106675T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
    • C23C16/4483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material using a porous body
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
DE60106675T 2000-05-31 2001-05-29 Verdampfer Expired - Lifetime DE60106675T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US20825700P 2000-05-31 2000-05-31
US208257P 2000-05-31

Publications (2)

Publication Number Publication Date
DE60106675D1 true DE60106675D1 (de) 2004-12-02
DE60106675T2 DE60106675T2 (de) 2005-12-01

Family

ID=22773903

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60106675T Expired - Lifetime DE60106675T2 (de) 2000-05-31 2001-05-29 Verdampfer

Country Status (5)

Country Link
US (1) US6607785B2 (de)
EP (1) EP1160355B1 (de)
JP (1) JP4789126B2 (de)
KR (1) KR100794201B1 (de)
DE (1) DE60106675T2 (de)

Families Citing this family (59)

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US6790475B2 (en) * 2002-04-09 2004-09-14 Wafermasters Inc. Source gas delivery
US6921062B2 (en) * 2002-07-23 2005-07-26 Advanced Technology Materials, Inc. Vaporizer delivery ampoule
US7300038B2 (en) * 2002-07-23 2007-11-27 Advanced Technology Materials, Inc. Method and apparatus to help promote contact of gas with vaporized material
US20040134327A1 (en) * 2002-11-20 2004-07-15 Roberto Capodieci Apparatus and method for shaped cutting and slitting of food products
DE10256038A1 (de) * 2002-11-30 2004-06-17 Applied Films Gmbh & Co. Kg Bedampfungsvorrichtung
US6868869B2 (en) * 2003-02-19 2005-03-22 Advanced Technology Materials, Inc. Sub-atmospheric pressure delivery of liquids, solids and low vapor pressure gases
JP4954448B2 (ja) 2003-04-05 2012-06-13 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 有機金属化合物
JP4714422B2 (ja) 2003-04-05 2011-06-29 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． ゲルマニウムを含有するフィルムを堆積させる方法、及び蒸気送達装置
JP4689969B2 (ja) 2003-04-05 2011-06-01 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． Ｉｖａ族およびｖｉａ族化合物の調製
US6909839B2 (en) * 2003-07-23 2005-06-21 Advanced Technology Materials, Inc. Delivery systems for efficient vaporization of precursor source material
US7261118B2 (en) * 2003-08-19 2007-08-28 Air Products And Chemicals, Inc. Method and vessel for the delivery of precursor materials
JP2005272232A (ja) * 2004-03-25 2005-10-06 Canon Inc ダイヤモンドおよび炭素繊維の集合体およびそれらの製造方法
AU2005245634B2 (en) * 2004-05-20 2010-07-01 Akzo Nobel Chemicals International B.V. Bubbler for constant vapor delivery of a solid chemical
US20060037540A1 (en) * 2004-08-20 2006-02-23 Rohm And Haas Electronic Materials Llc Delivery system
US7722720B2 (en) * 2004-12-08 2010-05-25 Rohm And Haas Electronic Materials Llc Delivery device
US20080191153A1 (en) * 2005-03-16 2008-08-14 Advanced Technology Materials, Inc. System For Delivery Of Reagents From Solid Sources Thereof
US7451621B2 (en) * 2005-05-25 2008-11-18 Praxair Technology, Inc. Bubble formation in liquid such as molten glass
DE102005030862B4 (de) * 2005-07-01 2009-12-24 Sintec Keramik Gmbh Erstbenetzungshilfsmaterial für einen Verdampferkörper, seine Verwendung zum Herrichten der Verdampferfläche eines Verdampferkörpers und ein elektrisch beheizbarer keramischer Verdampferkörper
JP4710481B2 (ja) * 2005-08-17 2011-06-29 住友化学株式会社 有機金属化合物供給容器
GB2432371B (en) 2005-11-17 2011-06-15 Epichem Ltd Improved bubbler for the transportation of substances by a carrier gas
US8603580B2 (en) * 2005-11-28 2013-12-10 Msp Corporation High stability and high capacity precursor vapor generation for thin film deposition
US8132794B2 (en) * 2005-11-29 2012-03-13 Air Diffusion Systems Fine bubble delivery for potable water, wastewater, and clean water treatment
JP4527670B2 (ja) * 2006-01-25 2010-08-18 東京エレクトロン株式会社 加熱処理装置、加熱処理方法、制御プログラムおよびコンピュータ読取可能な記憶媒体
US7967911B2 (en) * 2006-04-11 2011-06-28 Applied Materials, Inc. Apparatus and methods for chemical vapor deposition
EP1860208B1 (de) * 2006-05-22 2014-10-15 Rohm and Haas Electronic Materials LLC Schicht Abscheidungsverfahren
KR20090018095A (ko) * 2006-05-30 2009-02-19 우베 고산 가부시키가이샤 유기금속 화합물의 공급 장치
US20080018004A1 (en) * 2006-06-09 2008-01-24 Air Products And Chemicals, Inc. High Flow GaCl3 Delivery
JP5009367B2 (ja) * 2006-06-09 2012-08-22 ソイテック 三塩化ガリウムの大容量送達システム
US20080241805A1 (en) * 2006-08-31 2008-10-02 Q-Track Corporation System and method for simulated dosimetry using a real time locating system
US9109287B2 (en) * 2006-10-19 2015-08-18 Air Products And Chemicals, Inc. Solid source container with inlet plenum
GB2444143B (en) * 2006-11-27 2009-10-28 Sumitomo Chemical Co Apparatus of supplying organometallic compound
JP5437594B2 (ja) 2007-06-05 2014-03-12 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 有機金属化合物
US8142847B2 (en) 2007-07-13 2012-03-27 Rohm And Haas Electronic Materials Llc Precursor compositions and methods
JP4900110B2 (ja) * 2007-07-20 2012-03-21 東京エレクトロン株式会社 薬液気化タンク及び薬液処理システム
US7659414B2 (en) 2007-07-20 2010-02-09 Rohm And Haas Company Method of preparing organometallic compounds
US8348248B2 (en) 2009-03-11 2013-01-08 L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude Bubbling supply system for stable precursor supply
JP5690498B2 (ja) 2009-03-27 2015-03-25 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 基体上に膜を堆積する方法および気化前駆体化合物を送達する装置
US8491720B2 (en) * 2009-04-10 2013-07-23 Applied Materials, Inc. HVPE precursor source hardware
KR200454322Y1 (ko) 2009-08-26 2011-06-28 주식회사 테라세미콘 증착가스 공급장치
EP2339048B1 (de) 2009-09-14 2016-12-07 Rohm and Haas Electronic Materials, L.L.C. Verfahren zum Abscheiden von organometallischen Verbindungen
CN102597310B (zh) 2009-11-02 2015-02-04 西格玛-奥吉奇有限责任公司 固态前体输送组件以及相关方法
US8758515B2 (en) * 2010-08-09 2014-06-24 Rohm And Haas Electronic Materials Llc Delivery device and method of use thereof
WO2012071661A1 (en) * 2010-11-30 2012-06-07 Socpra Sciences Et Genie S.E.C. Epitaxial deposition apparatus, gas injectors, and chemical vapor management system associated therewith
US8997775B2 (en) 2011-05-24 2015-04-07 Rohm And Haas Electronic Materials Llc Vapor delivery device, methods of manufacture and methods of use thereof
US8776821B2 (en) 2011-05-24 2014-07-15 Rohm And Haas Electronic Materials Llc Vapor delivery device, methods of manufacture and methods of use thereof
JP2015519478A (ja) 2012-05-31 2015-07-09 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド バッチ蒸着のための高材料流束によるソース試薬に基づく流体の送出
US9243325B2 (en) 2012-07-18 2016-01-26 Rohm And Haas Electronic Materials Llc Vapor delivery device, methods of manufacture and methods of use thereof
US20140026977A1 (en) * 2012-07-25 2014-01-30 William Kimmerle Chemical precursor bubbler assembly
DE102012021527A1 (de) * 2012-10-31 2014-04-30 Dockweiler Ag Vorrichtung zur Erzeugung eines Gasgemisches
KR101416977B1 (ko) * 2012-12-27 2014-07-08 주식회사 선익시스템 증발원 및 이를 구비한 증착장치
WO2015164029A1 (en) * 2014-04-21 2015-10-29 Entegris, Inc. Solid vaporizer
DE102015108430A1 (de) 2015-05-28 2016-12-01 Dockweiler Ag Vorrichtung zur Erzeugung eines Gases mit einer ringzylindrischen Reaktionskammer
US10041873B2 (en) 2016-05-02 2018-08-07 Kla-Tencor Corporation Porosity measurement of semiconductor structures
US10145674B2 (en) * 2016-05-02 2018-12-04 Kla-Tencor Corporation Measurement of semiconductor structures with capillary condensation
US10281263B2 (en) * 2016-05-02 2019-05-07 Kla-Tencor Corporation Critical dimension measurements with gaseous adsorption
TWI617764B (zh) * 2017-06-06 2018-03-11 江蘇南大光電材料股份有限公司 固體金屬有機化合物的封裝容器
KR102344996B1 (ko) * 2017-08-18 2021-12-30 삼성전자주식회사 전구체 공급 유닛, 기판 처리 장치 및 그를 이용한 반도체 소자의 제조방법
US11166441B2 (en) 2018-07-13 2021-11-09 Versum Materials Us, Llc Vapor delivery container with flow distributor
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Also Published As

Publication number Publication date
US20020078894A1 (en) 2002-06-27
EP1160355B1 (de) 2004-10-27
US6607785B2 (en) 2003-08-19
JP4789126B2 (ja) 2011-10-12
DE60106675T2 (de) 2005-12-01
EP1160355A2 (de) 2001-12-05
EP1160355A3 (de) 2003-10-29
KR100794201B1 (ko) 2008-01-14
JP2002083777A (ja) 2002-03-22
KR20010109202A (ko) 2001-12-08

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Legal Events

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8364 No opposition during term of opposition