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DE10196948T1 - Umgebungsüberwachungsverfahren - Google Patents

Umgebungsüberwachungsverfahren

Info

Publication number
DE10196948T1
DE10196948T1 DE2001196948 DE10196948T DE10196948T1 DE 10196948 T1 DE10196948 T1 DE 10196948T1 DE 2001196948 DE2001196948 DE 2001196948 DE 10196948 T DE10196948 T DE 10196948T DE 10196948 T1 DE10196948 T1 DE 10196948T1
Authority
DE
Germany
Prior art keywords
environmental monitoring
monitoring methods
methods
environmental
monitoring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE2001196948
Other languages
English (en)
Inventor
Michio Niwano
Haruo Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advantest Corp
Original Assignee
Advantest Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corp filed Critical Advantest Corp
Publication of DE10196948T1 publication Critical patent/DE10196948T1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G01N21/552—Attenuated total reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Sampling And Sample Adjustment (AREA)
DE2001196948 2000-12-01 2001-11-26 Umgebungsüberwachungsverfahren Withdrawn DE10196948T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000367291A JP2002168776A (ja) 2000-12-01 2000-12-01 環境モニタ方法及び装置並びに半導体製造装置
PCT/JP2001/010271 WO2002044696A1 (fr) 2000-12-01 2001-11-26 Procede et appareil de surveillance de l'environnement et appareil de production de semi-conducteur

Publications (1)

Publication Number Publication Date
DE10196948T1 true DE10196948T1 (de) 2003-11-13

Family

ID=18837739

Family Applications (1)

Application Number Title Priority Date Filing Date
DE2001196948 Withdrawn DE10196948T1 (de) 2000-12-01 2001-11-26 Umgebungsüberwachungsverfahren

Country Status (5)

Country Link
US (1) US20040056196A1 (de)
JP (1) JP2002168776A (de)
KR (1) KR20020073560A (de)
DE (1) DE10196948T1 (de)
WO (1) WO2002044696A1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002286636A (ja) * 2001-01-19 2002-10-03 Advantest Corp 化学物質検出方法及び装置
US7126121B1 (en) * 2002-06-22 2006-10-24 Purdue Research Foundation Real-time video radiation exposure monitoring system
US7205891B1 (en) 2003-09-19 2007-04-17 Purdue Research Foundation Real-time wireless video exposure monitoring system
US7319942B2 (en) * 2003-11-26 2008-01-15 Raytheon Company Molecular contaminant film modeling tool
US7235795B2 (en) * 2004-08-12 2007-06-26 Applied Materials, Inc. Semiconductor device manufacturing apparatus and a method of controlling a semiconductor device manufacturing process
JP2008515232A (ja) * 2004-09-30 2008-05-08 アドバンスト・マイクロ・ディバイシズ・インコーポレイテッド リソグラフィ露光装置における汚染検出および監視のための方法およびシステム、ならびに調整された雰囲気条件下でのその動作方法
DE102004047677B4 (de) * 2004-09-30 2007-06-21 Advanced Micro Devices, Inc., Sunnyvale Verfahren und System für die Kontaminationserkennung und Überwachung in einer Lithographiebelichtungsanlage und Verfahren zum Betreiben der gleichen unter gesteuerten atomsphärischen Bedingungen
AU2006279340A1 (en) * 2005-08-17 2007-02-22 Nuvo Ventures Llc Method and system for monitoring plant operating capacity
US20070164205A1 (en) * 2006-01-17 2007-07-19 Truche Jean L Method and apparatus for mass spectrometer diagnostics
US20080178734A1 (en) * 2007-01-26 2008-07-31 Lincoln Global, Inc. Inert gas method of environmental control for moisture sensitive solids during storage and processing
JP5453610B2 (ja) * 2007-09-06 2014-03-26 独立行政法人 宇宙航空研究開発機構 測定方法及び測定装置
ATE512389T1 (de) * 2007-10-23 2011-06-15 Imec Erkennung von kontaminationen in euv-systemen
US20100320386A1 (en) * 2009-06-23 2010-12-23 Nordson Corporation Adhesive Sensor for Hot Melt and Liquid Adhesives
US9366601B1 (en) * 2011-03-15 2016-06-14 University Of North Texas Wafer fabrication monitoring/control system and method
US10823661B2 (en) * 2015-08-18 2020-11-03 University Of Cincinnati Analyte sensor and method of use
CN106094002A (zh) * 2016-07-28 2016-11-09 中国船舶重工集团公司第七〇九研究所 一种小型浮标式水体区域γ放射性监测仪
US11295594B2 (en) * 2017-06-09 2022-04-05 Carrier Corporation Chamberless smoke detector with indoor air quality detection and monitoring
US10962285B2 (en) 2018-07-13 2021-03-30 Taiwan Semiconductor Manufacturing Co., Ltd. Wafer drying system
AT523187A1 (de) 2019-11-28 2021-06-15 Anton Paar Gmbh Bestimmung einer Beeinträchtigung einer optischen Oberfläche für IR-Spektroskopie
EP3855162A1 (de) * 2020-01-21 2021-07-28 Omya International AG Lwir-bildgebungssystem zum nachweis einer amorphen und/oder kristallinen struktur von phosphat- und/oder sulfatsalzen auf der oberfläche eines substrats oder innerhalb eines substrats und verwendung des lwir-bildgebungssystems

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5097129A (en) * 1990-12-06 1992-03-17 International Business Machines Corporation Surface contamination detection using infrared-transparent fibers or attenuated total reflection crystals
JP2515343Y2 (ja) * 1991-01-16 1996-10-30 三菱重工業株式会社 光導波路型吸光光度計
JPH05218171A (ja) * 1992-01-30 1993-08-27 Fujitsu Ltd ガス中の有機物除去方法及びその有機物評価方法
JP2000088745A (ja) * 1998-09-11 2000-03-31 Tokyo Gas Co Ltd ガス計測装置およびそれを用いた呼気テスト方法
JP2000206045A (ja) * 1999-01-18 2000-07-28 Horiba Ltd インラインモニタ
JP2000269182A (ja) * 1999-03-16 2000-09-29 Hitachi Ltd 半導体デバイスの製造方法及び製造装置
WO2001013093A1 (fr) * 1999-08-18 2001-02-22 Advantest Corporation Procede et appareil de surveillance de l'environnement
JP2001194306A (ja) * 2000-01-06 2001-07-19 Advantest Corp 化学物質検出方法及び装置
JP2001194297A (ja) * 2000-01-12 2001-07-19 Advantest Corp 環境測定方法及び装置
JP2001343323A (ja) * 2000-05-31 2001-12-14 Advantest Corp 分子種測定方法及び装置

Also Published As

Publication number Publication date
JP2002168776A (ja) 2002-06-14
KR20020073560A (ko) 2002-09-27
US20040056196A1 (en) 2004-03-25
WO2002044696A1 (fr) 2002-06-06

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Legal Events

Date Code Title Description
8110 Request for examination paragraph 44
8139 Disposal/non-payment of the annual fee