CN101526750B - Alignment system for photolithographic device and photolithographic device applying same - Google Patents
Alignment system for photolithographic device and photolithographic device applying same Download PDFInfo
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- CN101526750B CN101526750B CN 200910045241 CN200910045241A CN101526750B CN 101526750 B CN101526750 B CN 101526750B CN 200910045241 CN200910045241 CN 200910045241 CN 200910045241 A CN200910045241 A CN 200910045241A CN 101526750 B CN101526750 B CN 101526750B
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Abstract
The invention provides an alignment system for a photolithographic device, which is used for alignment according to alignment marks on a wafer. The alignment marks are three-period phase grating marks and comprises three gratings with different periods, namely, a first grating, a third grating and a second grating; and an optical deflection structure is arranged on a spectrum surface of an imaging module and used for deflecting positive and negative primary diffracted wave bundles of the third grating in the Y direction of the alignment mark in the Y direction to the X direction or deflecting positive and negative primary diffracted wave bundles of the third grating in the X direction of the alignment mark in the X direction to the Y direction. The alignment system for the photolithographic device utilizes the optical deflection structure to deflect the small-period diffracted wave bundles in the Y (or X) direction to the X (or Y) direction so as to realize alignment scanning in the two directions, improve the energy utilization rate and enable obtained alignment signals to have no obvious inflexion points.
Description
Technical field
The present invention relates to a kind of alignment system, and be particularly related to a kind of alignment system that is used for lithographic equipment.
Background technology
Lithographic equipment of the prior art is mainly used in the manufacturing of integrated circuit (IC) or other microdevice.Critical step is with mask and wafer aligned in the lithographic equipment.After exposing on wafer, the ground floor mask pattern from device, removes, after the PROCESS FOR TREATMENT that wafer is correlated with, carry out the exposure of second layer mask pattern, but for guarantee second layer mask pattern and subsequently the picture of mask pattern mask and wafer accurately need be aimed at respect to the accurate location of exposed mask pattern image on the wafer.IC device by the photoetching technique manufacturing needs multiexposure, multiple exposure to form multilayer circuit in wafer, for this reason, requires the configuration alignment system in the lithographic equipment, realizes the accurate aligning of mask and wafer.When characteristic dimension requires more hour, the requirement of alignment precision and consequent requirement to alignment precision are become strict more.
The alignment system of lithographic equipment, its major function are to realize mask-wafer aligned before the alignment exposure, promptly measure the coordinate (X of wafer in coordinate system of machine
W, Y
W, Φ
WZ), and the coordinate (X of mask in coordinate system of machine
R, Y
R, Φ
RZ), and calculate the position of mask with respect to wafer, to satisfy the requirement of alignment precision.Prior art has two kinds of alignment scheme.A kind of is the TTL technique of alignment that sees through camera lens, the alignment mark of the periodic phase optical grating construction that laser lighting is provided with on wafer, diffraction light or scattered light by the collected wafer alignment marks of the projection objective of lithographic equipment shine on mask alignment mark, and this alignment mark can be amplitude or phase grating.Behind the mask mark detector is set, when scanning wafer under projection objective, surveys the light intensity that sees through the mask mark, the maximal value of detector output is represented correct alignment position.This aligned position provides zero reference for the position measurement of the laser interferometer that is used for monitoring wafer platform position and moves.Another kind is an OA off-axis alignment technology, is positioned at the reference mark of datum plate on a plurality of alignment marks on the wafer and the wafer station by the off-axis alignment systematic survey, realizes that wafer aligned and wafer station aim at; The reference mark of datum plate is aimed at mask alignment mark on the wafer station, realizes mask registration; The position relation of mask and wafer be can obtain thus, mask and wafer aligned realized.
At present, the most alignment so that adopts of lithographic equipment is a grating alignment.Grating alignment is meant that even illumination beam on the grating alignment mark diffraction takes place, and the emergent light behind the diffraction carries the full detail about alignment mark structure.Senior diffracted beam scatters from the phase alignment grating with wide-angle, after filtering zero order beam by spatial filter, gather positive and negative first-order diffraction light beam, the perhaps raising that requires along with CD, gather multi-level diffraction light bundle (comprising senior) simultaneously in picture plane interference imaging, through photodetector and signal Processing, determine the centering adjustment position.
A kind of situation of prior art (referring to Chinese invention patent, application number: CN03164859.2, denomination of invention: the alignment system and the method that are used for etching system), the ATHENA off-axis alignment system of a kind of 4f system architecture that Dutch ASML company is adopted.This alignment system adopts ruddiness, green glow two-source illumination at the Lights section; Adopt voussoir array or wedge group to realize the separation of multi-level diffraction light.At image planes difference coherent imaging.The registration signal of ruddiness and green glow is separated by a polarizing prism.See through the transmitted light intensity of the reference grating in corresponding cycle behind the detection alignment mark multilevel diffraction light coherent imaging, in the alignment mark scanning process, obtain the registration signal of sinusoidal output.Obtain the center of alignment mark by the phase information of the signal of different frequency.The advantage of this scheme is can realize catching automatically and higher alignment precision, but the high order signal in the diffracted beam a little less than.And this method realizes higher alignment precision by high order signal, in the reality along with mark (particularly wafer mark) reflected signal (particularly high order signal) power is low excessively, alignment precision then actually can't utilize high order signal, so can not be provided reliably.
The situation of another kind of prior art is (referring to (2) Chinese invention patent, publication number: 200710044152.1, denomination of invention: a kind of alignment system that is used for lithographic equipment), this alignment system adopts has three periods phase grating of thickness combination, the first-order diffraction light beam that only utilizes these three cycles obtains high alignment precision as registration signal when can realize big capture range.Only use the first-order diffraction light in each cycle, can obtain stronger signal intensity, improve system signal noise ratio.But alignment mark distribution in one line on wafer and datum plate in the alignment system all is unidirectional alignment mark.The corresponding reference mark is divided into eight branches, referring to Fig. 7 A, can bring a lot of deficiencies like this: alignment mark and corresponding reference marker take up room bigger, and this makes that the energy of light source utilization factor is low, and factors such as photoetching process and wafer distortion are bigger to the influence of alignment precision; When the interference image of alignment mark diffracted beam and reference marker scanned, tangible flex point (referring to Fig. 7 B) appearred in the alignment scanning signal intensity that obtains, and this alignment scanning signal is unfavorable for that later stage AGC gain waits coherent signal to handle; Because reference marker medial fascicle reference marker (referring to Fig. 7 A) G3-a and G3-b (or G6-a and G6-b) when a scanning direction scan the interference image of a mark optical grating diffraction light beam jointly, these two branch intermediate blank zones do not have Transmission Fibers and the photodetector after light can enter reference marker, make that the intensity and the signal to noise ratio (S/N ratio) of alignment scanning signal are very low, and can cause two G3-a of reference marker branch and G3-b (or G6-a and G6-b) the phase place mismatch problem to occur, be unfavorable for alignment mark position alignment and signal Processing with respect to the interference image of alignment mark diffracted beam; Two minor cycle reference markers of same direction require to do little under the enough situation of registration signal energy as far as possible, but bring reference marker back Transmission Fibers diameter to diminish simultaneously and the space difficult with the reference marker coupling.
Summary of the invention
The present invention proposes a kind of alignment system that is used for lithographic equipment, can address the above problem.
In order to achieve the above object, the present invention proposes a kind of alignment system that is used for lithographic equipment and comprises light source module, lighting module, image-forming module, acquisition of signal module and processing module.Light source module is used to provide the illuminating bundle of this alignment system.Lighting module is used to transmit illuminating bundle, the alignment mark on the vertical illumination wafer.The positive and negative first-order diffraction light beam of image-forming module collection alignment mark and coherent imaging are in reference marker position.Acquisition of signal module and processing module obtain the positional information of alignment mark by surveying and handling through the aligning light intensity signal after the reference marker imaging.Alignment mark is three periods phase grating phenotypic markers, comprise directions X alignment mark and Y direction alignment mark, described alignment mark comprises the grating of three groups of different cycles: along directions X first grating, along directions X the 3rd grating with along directions X second grating and along Y direction first grating, along Y direction the 3rd grating with along Y direction second grating; The frequency plane of image-forming module is provided with optics deviation structure, this optics deviation structure with the positive and negative first-order diffraction light beam deviation of Y direction the 3rd grating of Y direction alignment mark to directions X, perhaps with the positive and negative first-order diffraction light beam deviation of directions X the 3rd grating of directions X alignment mark to the Y direction.
In order to achieve the above object, the present invention proposes a kind of lithographic equipment, comprises illuminator, is used to transmit exposing light beam; Mask platform is used to support the mask holder of mask, mask pattern is arranged on the mask and have the alignment mark of periodic structure; Projection optical system is used for the mask pattern on the mask is projected to wafer; Chip support and wafer station are used for supporting wafer, and the datum plate that contains reference mark is arranged on the wafer station, have the alignment mark of periodicity optical structure on the wafer; Alignment system is used for wafer aligned and wafer station and aims at, the mask platform that it is arranged on and wafer station between; The coaxial alignment unit is used for mask registration; Catoptron and laser interferometer are used for mask platform and wafer station position measurement; Servo-drive system and drive system; And by the mask platform of master control system control and the servo-drive system and the drive system of wafer station displacement drive.Alignment mark is three periods phase grating phenotypic markers, comprises the grating of three groups of different cycles: first grating, the 3rd grating and second grating; The frequency plane of image-forming module is provided with optics deviation structure, this optics deviation structure with the positive and negative first-order diffraction light beam deviation of Y direction the 3rd grating of Y direction alignment mark to directions X, perhaps with the positive and negative first-order diffraction light beam deviation of directions X the 3rd grating of directions X alignment mark to the Y direction.
Light source module is the laser cell of laser instrument or the modulation of process photoelectricity.
Laser instrument is gas laser or semiconductor laser or solid state laser or fiber laser.
Laser cell comprises radio-frequency (RF) phse modulator and light intensity amplitude modulation unit.
Light source module provides the illuminating bundle of at least two different wave lengths.
Perhaps, light source module provides the illuminating bundle of four different wave lengths, and wherein the wavelength of two illuminating bundles is near infrared or infrared band.
The illuminating bundle of the alignment mark of vertical illumination to the wafer is the S polarized light.
Alignment mark comprises:
The directions X alignment mark comprises successively along directions X:
Directions X first grating had for the first grating cycle;
Directions X the 3rd grating had for the 3rd grating cycle, and
Directions X second grating had for the second grating cycle,
Wherein, the 3rd grating cycle of directions X is less than this first grating cycle of directions X and this second grating cycle of directions X, and
Y direction alignment mark comprises successively along the Y direction:
Y direction first grating had for the first grating cycle;
Y direction the 3rd grating had for the 3rd grating cycle, and
Y direction second grating has second round;
Wherein, the 3rd grating cycle of Y direction is less than this first grating cycle of Y direction and this second grating cycle of Y direction, and
The shape of Y direction alignment mark and directions X alignment mark turn clockwise identical after 90 °.
The position of three groups of gratings in directions X alignment mark or the Y direction alignment mark can be changed arbitrarily.
Image-forming module comprises at least: preceding group of lens, and beam splitter, spatial filter, optics deviation structure, back group lens are with the corresponding reference marker of described alignment mark distribution form.
Spatial filter, have a plurality of filtering hole, only allow to allow the positive and negative first-order diffraction light beam of Y direction the 3rd grating of Y direction second grating, Y direction alignment mark of Y direction first grating, Y direction alignment mark of directions X the 3rd grating of directions X second grating, directions X alignment mark of directions X first grating, directions X alignment mark of directions X alignment mark and Y direction alignment mark pass through from corresponding filtering hole;
Spatial filter is organized the frequency plane between lens and the described back group lens before described.
Optics deviation structure comprises: two catoptrons and two polarization components.Two catoptrons are positioned at the corresponding filtering hole site that the positive and negative first-order diffraction light beam of Y direction the 3rd grating of Y direction alignment mark passes through, and are used to reflect the positive and negative first-order diffraction light beam of Y direction the 3rd grating of Y direction alignment mark to polarization components.Two polarization components, be positioned at the corresponding filtering hole site that the positive and negative first-order diffraction light beam of directions X the 3rd grating of directions X alignment mark passes through, be used to reflect Y direction the 3rd grating of Y direction alignment mark and the positive and negative first-order diffraction light beam of directions X the 3rd grating of Transmission X direction alignment mark.
Perhaps, two catoptrons are positioned at the corresponding filtering hole site that the positive and negative first-order diffraction light beam of directions X the 3rd grating of directions X alignment mark passes through, the positive and negative first-order diffraction of directions X the 3rd grating light beam to two polarization components that is used to reflect the directions X alignment mark.The corresponding filtering hole site that the positive and negative first-order diffraction light beam of Y direction the 3rd grating that two polarization components are positioned at Y direction alignment mark passes through is used to reflect directions X the 3rd grating of directions X alignment mark and the positive and negative first-order diffraction light beam of Y direction the 3rd grating of transmission Y direction alignment mark.
Polarization components comprises:
Half-wave plate; And
Polarizing prism, the angle between the optical axis of this polarizing prism and the optical axis of this half-wave plate is 45 °.
Reference marker comprises five groups of amplitude gratings: first examines grating with reference to grating, the 4th with reference to grating, Wucan with reference to grating, the 3rd with reference to grating, second.
Reference marker comprises successively that along directions X first examines grating and the 3rd with reference to grating with reference to grating, Wucan; Comprise successively that along the Y direction the 4th examines grating, second with reference to grating with reference to grating, Wucan; Wherein, the first grating cycle of examining grating with reference to grating and Wucan with reference to grating, the 3rd is along directions X, second with reference to grating and the 4th with reference to grating cycle of grating along the Y direction.
Perhaps, reference marker comprises successively that along directions X first examines grating and the 3rd with reference to grating with reference to grating, Wucan; Comprise successively that along the Y direction the 4th examines grating, second with reference to grating with reference to grating, Wucan; Wherein, first with reference to grating and the 3rd with reference to grating cycle of grating along directions X, second examines the grating cycle of grating along the Y direction with reference to grating, the 4th with reference to grating and Wucan.
Reference marker is positioned at described image-forming module image planes position.
Wucan examine the grating cycle less than first with reference to grating, the 3rd with reference to grating, second with reference to grating and the 4th cycle with reference to grating.
The directions X first grating interference picture of directions X alignment mark and reference marker first corresponding with reference to grating, the directions X second grating interference picture of directions X alignment mark is corresponding with the 3rd grating of reference marker, the 4th grating of the Y direction first grating interference picture of Y direction alignment mark and reference marker is corresponding, the Y direction second grating interference picture of Y direction alignment mark and reference marker second corresponding with reference to grating, it is corresponding that directions X the 3rd grating interference picture and the Wucan of reference marker of directions X alignment mark examined grating.
Perhaps, the directions X first grating interference picture of directions X alignment mark and reference marker first corresponding with reference to grating, the directions X second grating interference picture of directions X alignment mark is corresponding with the 3rd grating of reference marker, the 4th grating of the Y direction first grating interference picture of Y direction alignment mark and reference marker is corresponding, the Y direction second grating interference picture of Y direction alignment mark and reference marker second corresponding with reference to grating, it is corresponding that Y direction the 3rd grating interference picture and the Wucan of reference marker of Y direction alignment mark examined grating.
Image-forming module make form alignment mark first grating, the 3rd grating and second grating positive and negative first-order diffraction light beam respectively coherent imaging be positioned on the reference marker relevant position of image planes, wafer station move to scan on X and Y through drive systems and is obtained first light signal, the 3rd light signal, second light signal.
Acquisition of signal and processing module are handled first light signal and second light signal, obtain the rough center of alignment mark according to the phase information of first light signal and second light signal; Handle the 3rd light signal,, and obtain the accurate center of alignment mark in conjunction with the rough center of alignment mark according to the phase information of the 3rd light signal.
A kind of alignment system that is used for lithographic equipment that the present invention proposes, employing frequency plane utilize catoptron and polarizing prism with the minor cycle diffracted beam deviation of Y (or X) direction to X (or Y) direction, thereby can realize the alignment scanning of both direction, make to compare in registration signal intensity and signal to noise ratio (S/N ratio) and the prior art and be improved, capacity usage ratio is improved, tangible flex point does not appear in the registration signal that obtains, the signal Processing that helps parts such as later stage acquisition of signal and AGC (Automatic Gain Control) gain, effectively solve the problem that occurs in the prior art to a certain extent, improved alignment precision.
The present invention is directed to the reference marker of alignment mark designs in the alignment system in the prior art deficiency and difficult point, a kind of reference marker that can realize both direction registration signal scan function is provided, compared with prior art, it is one dimension bar shaped grating that the present invention has adopted directions X the 5th grating of reference marker or Y direction the 5th grating, form the reference marker of new model, can realize the alignment scanning of both direction, make to compare in registration signal intensity and signal to noise ratio (S/N ratio) and the prior art to be improved, capacity usage ratio is improved.
Description of drawings
Figure 1 shows that the lithographic equipment structural representation that adopts alignment system of the present invention;
Figure 2 shows that alignment system theory structure synoptic diagram among the present invention;
Fig. 3 A and Fig. 3 B are depicted as used alignment mark structure synoptic diagram among the present invention;
Figure 4 shows that alignment system spatial filter structural representation among the present invention;
The optics deviation structure that the first embodiment of the invention that is depicted as Fig. 5 A adopts;
Fig. 5 B is depicted as the polarization components structural representation of first embodiment of the invention at frequency plane;
Figure 6 shows that the optics deviation structural representation of second embodiment of the invention at frequency plane;
Fig. 7 A and Fig. 7 B are depicted as reference marker synoptic diagram used in the prior art and registration signal scintigram;
Fig. 8 A and Fig. 8 B are depicted as the structural representation and the registration signal scintigram of first embodiment of the invention reference marker;
Figure 9 shows that the structural representation of second embodiment of the invention reference marker;
Figure 10 is through the registration signal intensity synoptic diagram after the gain process in the alignment procedures of the present invention.
Embodiment
In order more to understand technology contents of the present invention, especially exemplified by specific embodiment and cooperate appended graphic being described as follows.
Figure 1 shows that the lithographic equipment structural representation that adopts alignment system of the present invention.
The exposing light beam IL of illuminator 1 uniform irradiation is radiated on the mask 2, includes the mark RM of mask pattern and periodic structure on the mask 2, is used for mask registration.
The position of mask platform 3 in X-Y plane recorded by Doppler's two-frequency laser interferometer 15 precisions by the catoptron 16 that is positioned on the mask platform 3.The positional information of mask platform 3 sends to master control system 12 by laser interferometer 15 through servo-drive system 13, and master control system 12 drives mask platform 3 according to the positional information of mask platform 3 by drive system 14.
Projection optical system 4 (projection objective) is positioned at mask platform shown in Figure 13 belows, and its optical axis AX is parallel to Z-direction.Since adopt two core structures far away and have predetermined scale down as 1/5 or 1/4 refraction type or refractive and reflective optical system as projection optical system, so when the mask pattern on the exposing light beam illuminating mask 2 of illuminator 1 emission, the image that the circuit mask pattern becomes to dwindle on the wafer 6 that is coated with photoresist through projection optical system 4.
The position of wafer station 7 in X-Y plane recorded by Doppler's two-frequency laser interferometer 11 precisions by a catoptron 10 that is positioned on the wafer station, the positional information of wafer station 7 sends to master control system 12 through servo-drive system 13, and master control system 12 is according to the motion of this positional information (or velocity information) by drive system 9 control wafer platforms 7.
Figure 2 shows that alignment system theory structure synoptic diagram among the present invention.
Fig. 2 is the theory structure synoptic diagram of alignment system 5 among Fig. 1.Alignment system 5 mainly is made up of light source module, lighting module, image-forming module, alignment mark, acquisition of signal and processing module (not illustrating separately among the figure) etc.
Light source module provides the laser lighting light beam of a plurality of discrete wavelength, and (wavelength is λ to comprise the laser beam of two discrete wavelength at least
1And λ
2).In other embodiments, light source module also can adopt the laser beam (λ of four discrete wavelength
1, λ
2, λ
3And λ
4), two wavelength are wherein arranged near infrared or infrared band, for example: 532nm, 632.8nm, 785nm and 850nm.
Light source module is the laser cell of laser instrument or the modulation of process photoelectricity.
The employed laser instrument of light source module is gas laser or semiconductor laser or solid state laser or fiber laser.
Light source module includes laser cell, mainly comprises optoisolator, radio-frequency (RF) phse modulator and light intensity amplitude modulator (not shown).
Light source module provides the multi-wavelength illuminating bundle, can suppress the influence of the interference cancellation effect of many process layers generations, improves Technological adaptability.
Lighting module is used for the illuminating bundle of transmission light source module, and the alignment mark on the vertical illumination wafer comprises Transmission Fibers and lamp optical system.
The illuminating bundle of the alignment mark of vertical illumination to the wafer is the S polarized light.
Image-forming module is used for gathering alignment mark 312 (being the wafer alignment marks WM of Fig. 1) positive and negative first-order diffraction light beam on the wafer and the coherent imaging position at reference marker 328,322.Image-forming module mainly comprises: lens 327 are organized in preceding group of lens 311, beam splitter 314, bi-directional beam divider 318, λ 2 spatial filters 319, λ 2 optics deviation structures 320, λ 2 back group lens 321 and λ 1 spatial filter 325, λ 1 optics deviation structure 326, λ 1 back.
The frequency plane of λ 2 spatial filters 319 between preceding group of lens 311 and back group lens 321.The frequency plane of λ 1 spatial filter 325 between preceding group of lens 311 and back group lens 327.
Acquisition of signal module and processing module obtain the positional information of alignment mark by surveying and handling through the aligning light intensity signal after the reference marker imaging that is positioned at alignment mark lens combination image space.
The acquisition of signal module comprises CCD Transmission Fibers 316, CCD camera 317, λ 2 reference markers 322, λ 2 Transmission Fibers 323, λ 2 photodetectors 324, λ 1 reference marker 328, λ 1 Transmission Fibers 329 and λ 1 photodetector 330.
Signal processing module mainly comprises photosignal conversion and amplification, analog to digital conversion and digital signal processing circuit etc.
The alignment system principle is: dual wavelength illuminating bundle 301 enters light beam bundling device 302, be transferred to the polarizer 304 via monofilm polarization maintaining optical fibre 303, lens 305, illuminating aperture diaphragm 306 and lens 307, reflecting prism 308 on dull and stereotyped 309 impinges perpendicularly on and organizes lens 311 (4F lens preceding group) before achromatic λ/4 wave plates 310 enter then, light beam is assembled through preceding group of lens 311 and is shone on the wafer alignment marks 312 concurrent gaining interest and penetrate, 312 at different levels diffracted beams of alignment mark return along former road and enter beam splitter 314 through dull and stereotyped 309, beam splitter 314 reflexes to the CCD light path through CCD lens 315 with the sub-fraction diffracted beam through plated film reflecting surface 313, CCD Transmission Fibers 316, image in and be used for observing the picture situation that is marked as on the CCD 317, another part diffracted beam along the light path transmissive by 318 two kinds of wavelength light beams of Amici prism separately, enter different light paths respectively, through corresponding λ 2 spatial filters 319, λ 1 spatial filter 324, the diffraction lighting level that select to need time (the present invention need be respectively the positive and negative first-order diffraction light beam of each grating), and by λ 2 optics deviation structures 320, λ 1 optics deviation structure 326, λ 2 back group lens 321, λ 1 back group lens 327, (4F lens back group) become positive and negative first-order diffraction beam interference picture at λ 2 reference markers 321, on λ 1 reference marker 326, in the work stage scanning process, the positive and negative first-order diffraction beam interference of alignment mark picture scanning λ 2 reference markers 322, λ 1 reference marker 328, λ 2 photodetectors 324 and λ 1 photodetector 330 are surveyed through λ 2 Transmission Fibers 329, λ 1 Transmission Fibers 323 is surveyed the light signal that λ 2 reference markers 321 and λ 1 reference marker 326 see through, and is obtained the center of alignment mark by the phase information of light signal.Registration signal such as Figure 10 through gain process.
The principal character of this alignment system is, the positive and negative first-order diffraction light beam coherent imaging of first grating, second grating and the 3rd grating by surveying three cycle alignment marks in image planes is obtained the center of alignment mark after the light intensity of reference marker modulation changes by the phase information of optical signal transmissive.Wherein obtain the coarse position information of alignment mark, obtain the precise position information of alignment mark by the registration signal of the 3rd grating of alignment mark by the registration signal of first grating of alignment mark and second grating.
Fig. 3 A and Fig. 3 B are depicted as used alignment mark structure synoptic diagram among the present invention.
Alignment mark is three periods phase grating type marking groove marks, and dutycycle is 1: 1.Alignment mark comprises the grating of three groups of different cycles: first grating, second grating and the 3rd grating.The used alignment mark of the present invention comprises directions X alignment mark and Y direction alignment mark.
Fig. 3 A is used for the directions X alignment mark 200X that directions X is aimed at.
Directions X alignment mark 200X comprises the grating of three groups of different cycles successively along directions X: directions X first grating 201, directions X the 3rd grating 203 and directions X second grating 202.The grating cycle of directions X first grating 201 is P1, and the grating cycle of directions X second grating 202 is P2, and the grating cycle of directions X the 3rd grating 203 is P3.
To being used for two groups of large period gratings that same direction is aimed at, directions X first grating 201 and directions X second grating 202 select the different grating cycles can improve the capture range of alignment mark, and capture range is expressed as P1 * P2/[2 (P1-P2)].Grating cycle P1, P2 are more or less the same, and (1 ± r%) P1, wherein the r value is between 5 to 15 generally to get P2=.For example, directions X 201 cycles of first grating are 13um, and directions X 202 cycles of second grating are 12um, and then capture range is 78um.
Cycle P3＜the P1 of directions X the 3rd grating 203, and P3＜P2 are used for fine alignment.For example, the cycle of directions X the 3rd grating 203 can be 2 μ m.Cycle value between three groups of gratings will be mated mutually, and the positive and negative first-order diffraction light beam of grating sees through promptly to require filtering hole on filtering face be merely able to allow separately, and other level time diffracted beams are owing to being blocked outside the filtering hole.
Equally, shown in Fig. 3 B, Y direction alignment mark 200Y comprises successively that along the Y direction first grating 204, Y direction the 3rd grating 206 are identical with three groups of grating cycles of directions X alignment mark 200X respectively with 205, three groups of grating cycles of Y direction second grating.The shape that is used for the Y direction alignment mark 200Y that the Y direction aims at and directions X alignment mark turn clockwise identical after 90 °.
In addition, the position between three groups of gratings of alignment mark can be changed arbitrarily, and promptly the position of any one group of grating can exchange with other stop positions in three groups of gratings.
Alignment mark shown in Figure 3 is the used alignment mark of prior art, also is alignment mark used in the present invention.
Figure 4 shows that alignment system spatial filter structural representation among the present invention.
Please in conjunction with reference to figure 2 and Fig. 4, used λ 2 spatial filters 319, λ 1 spatial filter 325 in alignment system shown in Figure 2, be divided into six filtering holes that vertical and horizontal both direction is arranged, be respectively applied for alignment mark first grating, second grating of X, Y both direction, the positive and negative first-order diffraction light beam filtering of the 3rd grating, promptly allow alignment mark first grating, second grating of both direction, the positive and negative first-order diffraction light beam of the 3rd grating pass through from corresponding filtering hole, other orders of diffraction time are blocked.
Differ very little owing to be used for first grating that the aligning scope catches, the cycle of two large period gratings of second grating in the alignment mark, it is very near that its positive and negative first-order diffraction light beam is gone up distance at 4F system spectrum face (spatial filter position), so also can allow the positive and negative first-order diffraction light beam of first grating, two large period gratings of second grating pass through in same filtering hole.
The optics deviation structure that the first embodiment of the invention that is depicted as Fig. 5 A adopts is used for positive and negative first-order diffraction light beam deviation with Y direction the 3rd grating of Y direction alignment mark to directions X.
Please in conjunction with reference to figure 4 and Fig. 5 A.Optics deviation structure comprises catoptron and polarization components.Catoptron 702 is identical with 701 structures, effect is identical, correspondence is positioned at the corresponding filtering hole site that the positive and negative first-order diffraction light beam of Y direction the 3rd grating of Y direction alignment mark passes through, and is used to reflect the positive and negative first-order diffraction light beam of Y direction the 3rd grating of Y direction alignment mark to the polarization components 703 and 704 that is positioned at the frequency plane directions X.
Fig. 5 B is depicted as polarization components 703 structural representations of first embodiment of the invention at frequency plane.
The positive one-level incident beam of directions X (S polarization state) 708-1 impinges perpendicularly on half-wave plate 706, because the optical axis of half-wave plate 706 and polarizing prism 705 are 45 degree gummeds, like this through behind the half-wave plate 706, the polarization state of the positive one-level incident beam of directions X (S polarization state) 708-1 changes the P polarization state into by the S polarization state, the positive one-level incident beam of directions X 708-1 incides light splitting surface N and transmission crosses 705, and the positive one-level outgoing beam of directions X 708-2 is detected module and receives.The outgoing position of the positive one-level outgoing beam of directions X 708-2 is identical with direction with the outgoing position of the positive one-level outgoing beam of Y direction 707-2 with direction.Obtain registration signal through acquisition of signal and processing, can realize the alignment scanning on the both direction like this.
The use of polarization components 703 makes to compare in registration signal intensity and signal to noise ratio (S/N ratio) and the prior art and is improved, and capacity usage ratio is improved.Tangible flex point does not appear in the alignment scanning signal that obtains, and helps the signal Processing of parts such as later stage acquisition of signal and AGC gain.Effectively solve the problem that occurs in the prior art to a certain extent, improved alignment precision.The negative one-level incident beam incident of X, Y direction is identical therewith with process with the outgoing principle.
Fig. 6 is the optics deviation structural representation of second embodiment of the invention at frequency plane, is used for positive and negative first-order diffraction light beam deviation with directions X the 3rd grating of directions X alignment mark to the Y direction.
The catoptron of frequency plane that second embodiment of the invention is used in is identical with the catoptron of first embodiment, the position difference.
Catoptron 801 and 802 is positioned at the corresponding filtering hole site that the positive and negative first-order diffraction light beam of directions X the 3rd grating of directions X alignment mark passes through, and is used for the positive and negative first-order diffraction beam reflection of the 3rd grating of the directions X of directions X alignment mark to polarization components 803 and 804.Catoptron 801 is identical with 802 structures, can plate the utilization factor that highly reflecting films or total reflection film improve luminous energy.
The polarization components 803 of frequency plane that second embodiment of the invention is used in and 804 structures and first embodiment are identical in the polarization components structure of frequency plane, the position difference.
Polarization components 803 and 804 all is positioned at the Y of Y direction alignment mark to the corresponding filtering hole site that the positive and negative first-order diffraction light beam of the 3rd grating passes through, and is used to reflect directions X the 3rd grating of directions X alignment mark and the positive and negative first-order diffraction light beam of Y direction the 3rd grating of transmission Y direction alignment mark.
The principle of second embodiment of the invention is identical with first embodiment with process.Can realize the alignment scanning on the both direction like this, make to compare in registration signal intensity and signal to noise ratio (S/N ratio) and the prior art and be improved, capacity usage ratio is improved, tangible flex point does not appear in the alignment scanning signal that obtains, the signal Processing that helps parts such as later stage acquisition of signal and AGC gain, effectively solve the problem that occurs in the prior art to a certain extent, improved alignment precision.
Fig. 7 A and Fig. 7 B are reference marker synoptic diagram and registration signal scintigrams used in the prior art.
Please in conjunction with reference to figure 2A, Fig. 2 B, Fig. 7 A and Fig. 7 B.Reference marker 600 shown in Fig. 7 A comprise eight groups of amplitude grating: AX first with reference to grating G1, AX second with reference to grating G2, AX the 3rd with reference to grating aG3-a, AX the 3rd with reference to grating bG3-b, AY first with reference to grating G4, AY second with reference to grating G5, AY the 3rd with reference to grating aG6-a and AY the 3rd with reference to grating bG6-b.
AX first corresponds respectively to directions X first grating 201 of directions X alignment mark 200X, the positive and negative first-order diffraction light beam picture of directions X second grating 202 with reference to grating G1, AX second with reference to grating G2.
AX the 3rd with reference to grating aG3-a, AX the 3rd with reference to the positive and negative first-order diffraction light beam picture of grating bG3-b corresponding to directions X the 3rd grating 203 of directions X alignment mark 200X.
AY first corresponds respectively to Y direction first grating 204 of Y direction alignment mark 200Y, the positive and negative first-order diffraction light beam picture of Y direction second grating 205 with reference to grating G4, AY second with reference to grating G5.
AY the 3rd with reference to grating aG6-a and AY the 3rd with reference to the positive and negative first-order diffraction light beam picture of grating bG6-b corresponding to Y direction the 3rd grating 206 of Y direction alignment mark 200Y.
Eight groups of amplitude gratings can be slightly less than or also can be greater than the length of the positive and negative first-order optical grating picture of correspondence along the length of cycle direction.
Be respectively arranged with the Transmission Fibers bundle behind eight groups of amplitude gratings, comprise F1, F2, F3-a, F3-b, F4, F5, F6-a and F6-b, respectively corresponding G1 Transmission Fibers, G2 Transmission Fibers, G3-a Transmission Fibers, G3-b Transmission Fibers, G4 Transmission Fibers, G5 Transmission Fibers, G6-a Transmission Fibers, G6-b Transmission Fibers.
The transmitted light of respectively organizing grating of reference marker 200X and 200Y is transferred to the corresponding photo detector array, wherein the alignment scanning signal light intensity that obtains of G3-a Transmission Fibers and G3-b Transmission Fibers lumps together as one road signal, and the alignment scanning signal light intensity that G6-a Transmission Fibers and G6-b Transmission Fibers obtain lumps together as one road signal.In directions X alignment mark 200X and Y direction alignment mark 200Y alignment scanning process, obtain the registration signal of alignment mark X and Y direction.
(Fig. 7 B has only drawn reference marker directions X AX direction the 3rd among Fig. 7 A with reference to grating G3-a and AX direction the 3rd synthetic alignment scanning signal with reference to grating G3-b to Fig. 7 B for reference marker modulation phase among Fig. 7 A is answered the relevant registration signal that obtains as light intensity of alignment mark, those skilled in the art as can be known, because Y direction alignment mark 200Y is identical with directions X alignment mark 200X, therefore the alignment scanning signal on the Y direction is identical).
Horizontal ordinate is the scanning position value among the figure, and unit is um, and ordinate is the signal scanning signal strength values, and unit represents with a.u.For as can be seen from the figure in intermediate alignment position part, alignment scanning signal light intensity maximal value is 3.9x104 (a.u), alignment scanning signal light intensity minimum value is 0.9x104 (a.u), the effective range that is the alignment scanning signal is 0.9x104～3.9x104 (a.u), as can be seen from the figure tangible flex point appears in registration signal light intensity in scanning process in addition, the processing such as later stage signal AGC gain that this situation is unfavorable for the alignment scanning signal occur.
AGC is the automatic gain control of registration signal, promptly according to the rate of change of prescan alignment scanning signal intensity as the AGC gain factor, adjust the output signal strength of corresponding detection channels, be used in and aim at the signal intensity catch with fine alignment and be consistent, and be a constant.The purpose of doing like this is exactly in order to make the signal intensity unanimity of each detection channels output, to be convenient to utilize signal phase to carry out coarse alignment and fine alignment.
AGC gain requires sweep signal consistent as far as possible from beginning to scan the signal intensity maximum process change in signal strength rate, be that tangible flex point can not appear in sweep signal, guarantee that with this output signal strength of the gain factor that obtains according to prescan and corresponding each passage keeps coordinating.
Fig. 8 A and Fig. 8 B are depicted as the structural representation and the registration signal scintigram of first embodiment of the invention reference marker.
Please in conjunction with reference to figure 5, Fig. 6 and Fig. 8 A～8B.Fig. 8 A is depicted as reference marker 900 and comprises five groups of amplitude gratings: first examines grating 905 with reference to grating 903, the 4th with reference to grating 904 and Wucan with reference to grating 902, the 3rd with reference to grating 901, second, and Transmission Fibers 906, Transmission Fibers 907, Transmission Fibers 908, Transmission Fibers 909, Transmission Fibers 910 are formed.The cycle that Wucan is examined grating 905 less than first with reference to grating 901, second with reference to grating 902, the 3rd with reference to grating 903 and the 4th cycle with reference to grating 904.
Please in conjunction with reference to figure 1, Fig. 2 and Fig. 8.Aim at image-forming module and make first grating of forming alignment mark, the positive and negative first-order diffraction light beam of the 3rd grating and second grating respectively coherent imaging in the reference marker relevant position that is positioned at image planes, be the directions X first grating interference picture and reference marker first corresponding of directions X alignment mark with reference to grating, the directions X second grating interference picture of directions X alignment mark is corresponding with the 3rd grating of reference marker, the Y direction first grating interference picture of Y direction alignment mark is corresponding with the 4th grating of reference marker, the Y direction second grating interference picture of Y direction alignment mark and reference marker second corresponding with reference to grating, it is corresponding that Y direction the 3rd grating interference picture and the Wucan of reference marker of directions X the 3rd grating of directions X alignment mark or Y direction alignment mark examined grating.
Fig. 8 B is that reference marker 900 Wucans are examined the registration signal that grating 905 scanning obtains and (only drawn reference marker directions X alignment scanning signal among the figure, those skilled in the art as can be known, because Y direction alignment mark 200Y is identical with directions X alignment mark 200X, the Y direction is identical), horizontal ordinate is the scanning position value among the figure, unit is, ordinate is the signal scanning intensity level, unit represents that with au as can be seen from the figure in intermediate alignment position part, the effective range of registration signal is 1.8 * 10
4-7.5 * 10
4, signal intensity and scope are bigger than the sweep signal among Fig. 7 B, and the shape of signal also more helps signal later stage gain process.
Figure 9 shows that the structural representation of second embodiment of the invention reference marker.
Fig. 9 comprises five groups of amplitude gratings for reference marker 1000: first with reference to grating 1001, second with reference to grating 1002, the 3rd with reference to grating 1003, the 4th examines grating 1005 with reference to grating 1004 and Wucan, and Transmission Fibers 1006, Transmission Fibers 1007, Transmission Fibers 1008, Transmission Fibers 1009, Transmission Fibers 1010 are formed.Wucan is examined the positive and negative first-order diffraction beam interference picture of Y direction the 3rd grating 206 of directions X the 3rd grating 203 of grating 1005 corresponding directions X alignment mark 200X or Y direction alignment mark 200Y.In order to take into account the scanning of registration signal both direction, Wucan is examined grating 1005 and is designed to the cycle along the bar shaped amplitude grating of Y to arrangement in the reference marker 1000, can utilize luminous energy to greatest extent like this, realizes the registration signal scanning of both direction.
The Wucan of second embodiment of the invention reference marker 1000 is examined Wucan in registration signal that grating 1005 scanning obtains and the reference marker 900, and to examine the registration signal of grating 905 identical.
The structure of the reference marker 900 of Fig. 8, the reference marker 1000 of Fig. 9 improves the intensity and the scope of signal to greatest extent, and makes sweep signal flex point or little of not influencing the flex point that the AGC gain is adjusted not occur.
Figure 10 is through the registration signal intensity synoptic diagram after the gain process in the alignment procedures of the present invention.
Please in conjunction with reference to figure 2A, 2B and Figure 10.The first light signal SP1 is the light intensity signal after the positive and negative first-order diffraction beam interference of alignment mark first grating picture is modulated through reference marker.The second light signal SP2 is the light intensity signal after the positive and negative first-order diffraction beam interference of alignment mark second grating picture is modulated through reference marker.The 3rd light signal SP3 is the light intensity signal after the positive and negative first-order diffraction beam interference of alignment mark the 3rd grating picture is modulated through reference marker.Carry out the position by the phase information of the first light signal SP1 and the second light signal SP2 and catch, obtain the rough center of alignment mark, the phase information by the 3rd light signal SP3 carries out position alignment on this basis, obtains the accurate center of alignment mark.
Though the present invention discloses as above with preferred embodiment, so it is not in order to limit the present invention.The persond having ordinary knowledge in the technical field of the present invention, without departing from the spirit and scope of the present invention, when being used for a variety of modifications and variations.Therefore, protection scope of the present invention is as the criterion when looking claims person of defining.
Claims (27)
1. alignment system that is used for lithographic equipment comprises:
Light source module is used to provide the illuminating bundle of this alignment system;
Lighting module is used to transmit illuminating bundle, the alignment mark on the vertical illumination wafer;
Image-forming module, the positive and negative first-order diffraction light beam of collection alignment mark and coherent imaging are in reference marker position; And
Acquisition of signal module and processing module obtain the positional information of alignment mark by surveying and handling through the aligning light intensity signal after the reference marker imaging,
It is characterized in that: described alignment mark is three periods phase grating phenotypic markers, comprise directions X alignment mark and Y direction alignment mark, described alignment mark comprises the grating of three groups of different cycles: along directions X first grating, along directions X the 3rd grating with along directions X second grating and along Y direction first grating, along Y direction the 3rd grating with along Y direction second grating; And
The frequency plane of described image-forming module is provided with optics deviation structure, this optics deviation structure with the positive and negative first-order diffraction light beam deviation of Y direction the 3rd grating of Y direction alignment mark to directions X, perhaps with the positive and negative first-order diffraction light beam deviation of directions X the 3rd grating of directions X alignment mark to the Y direction.
2. a kind of alignment system that is used for lithographic equipment according to claim 1 is characterized in that: described light source module is the laser cell of laser instrument or the modulation of process photoelectricity.
3. a kind of alignment system that is used for lithographic equipment according to claim 2 is characterized in that: described laser instrument is gas laser or semiconductor laser or solid state laser or fiber laser.
4. according to right 2 described a kind of alignment systems that are used for lithographic equipment, it is characterized in that: described laser cell comprises radio-frequency (RF) phse modulator and light intensity amplitude modulation unit.
5. a kind of alignment system that is used for lithographic equipment according to claim 1 is characterized in that described light source module provides the illuminating bundle of at least two different wave lengths.
6. a kind of alignment system that is used for lithographic equipment according to claim 5 is characterized in that described light source module provides the illuminating bundle of four different wave lengths, and wherein the wavelength of two illuminating bundles is near infrared or infrared band.
7. a kind of alignment system that is used for lithographic equipment according to claim 1 is characterized in that: the illuminating bundle of the alignment mark of described vertical illumination to the wafer is the S polarized light.
8. a kind of alignment system that is used for lithographic equipment according to claim 1 is characterized in that described alignment mark comprises:
The directions X alignment mark comprises successively along directions X:
Directions X first grating had for the first grating cycle;
Directions X the 3rd grating had for the 3rd grating cycle, and
Directions X second grating had for the second grating cycle,
Wherein, the 3rd grating cycle of directions X is less than this first grating cycle of directions X and this second grating cycle of directions X, and
Y direction alignment mark comprises successively along the Y direction:
Y direction first grating had for the first grating cycle;
Y direction the 3rd grating had for the 3rd grating cycle, and
Y direction second grating has second round;
Wherein, the 3rd grating cycle of Y direction is less than this first grating cycle of Y direction and this second grating cycle of Y direction, and
The shape of Y direction alignment mark and directions X alignment mark turn clockwise identical after 90 °.
9. a kind of alignment system that is used for lithographic equipment according to claim 8 is characterized in that, the position of three groups of gratings of described directions X alignment mark or Y direction alignment mark can be changed arbitrarily.
10. a kind of alignment system that is used for lithographic equipment according to claim 1, it is characterized in that: described image-forming module at least also comprises: preceding group of lens, beam splitter, spatial filter, back group lens are with the corresponding reference marker of described alignment mark distribution form.
11. a kind of alignment system that is used for lithographic equipment according to claim 10, it is characterized in that: described spatial filter, have a plurality of filtering hole, only allow to allow Y direction first grating, Y direction second grating, the positive and negative first-order diffraction light beam of Y direction the 3rd grating of directions X first grating, directions X second grating, directions X the 3rd grating and Y direction alignment mark of directions X alignment mark pass through from corresponding filtering hole.
12. a kind of alignment system that is used for lithographic equipment according to claim 10 is characterized in that: described spatial filter is organized the frequency plane between lens and the described back group lens before described.
13. a kind of alignment system that is used for lithographic equipment according to claim 1 is characterized in that, described optics deviation structure comprises: two catoptrons and two polarization components.
14. a kind of alignment system that is used for lithographic equipment according to claim 13, it is characterized in that, described two catoptrons, be positioned at the corresponding filtering hole site that the positive and negative first-order diffraction light beam of Y direction the 3rd grating of Y direction alignment mark passes through, be used to reflect the positive and negative first-order diffraction light beam of Y direction the 3rd grating of Y direction alignment mark to polarization components.
15. a kind of alignment system that is used for lithographic equipment according to claim 13, it is characterized in that, described two polarization components, be positioned at the corresponding filtering hole site that the positive and negative first-order diffraction light beam of directions X the 3rd grating of directions X alignment mark passes through, be used to reflect Y direction the 3rd grating of Y direction alignment mark and the positive and negative first-order diffraction light beam of directions X the 3rd grating of Transmission X direction alignment mark.
16. a kind of alignment system that is used for lithographic equipment according to claim 13, it is characterized in that, described two catoptrons, be positioned at the corresponding filtering hole site that the positive and negative first-order diffraction light beam of directions X the 3rd grating of directions X alignment mark passes through, the positive and negative first-order diffraction of directions X the 3rd grating light beam to two polarization components that is used to reflect the directions X alignment mark.
17. a kind of alignment system that is used for lithographic equipment according to claim 13, it is characterized in that, described two polarization components, be positioned at the corresponding filtering hole site that the positive and negative first-order diffraction light beam of Y direction the 3rd grating of Y direction alignment mark passes through, be used to reflect directions X the 3rd grating of directions X alignment mark and the positive and negative first-order diffraction light beam of Y direction the 3rd grating of transmission Y direction alignment mark.
18. a kind of alignment system that is used for lithographic equipment according to claim 13 is characterized in that described polarization components comprises:
Half-wave plate; And
Polarizing prism, the angle between the optical axis of this polarizing prism and the optical axis of this half-wave plate is 45 °.
19. a kind of alignment system that is used for lithographic equipment according to claim 1, it is characterized in that described reference marker comprises five groups of amplitude gratings: first examines grating with reference to grating, the 4th with reference to grating, Wucan with reference to grating, the 3rd with reference to grating, second.
20. a kind of alignment system that is used for lithographic equipment according to claim 1 is characterized in that, described reference marker comprises successively that along directions X first examines grating and the 3rd with reference to grating with reference to grating, Wucan; Comprise successively that along the Y direction the 4th examines grating, second with reference to grating with reference to grating, Wucan,
Wherein the first grating cycle of examining grating with reference to grating and Wucan with reference to grating, the 3rd is along directions X, second with reference to grating and the 4th with reference to grating cycle of grating along the Y direction.
21. a kind of alignment system that is used for lithographic equipment according to claim 1 is characterized in that, described reference marker comprises successively that along directions X first examines grating and the 3rd with reference to grating with reference to grating, Wucan; Comprise successively that along the Y direction the 4th examines grating, second with reference to grating with reference to grating, Wucan,
Wherein first with reference to grating and the 3rd with reference to grating cycle of grating along directions X, second examines the grating cycle of grating along the Y direction with reference to grating, the 4th with reference to grating and Wucan.
22. according to the described a kind of alignment system that is used for lithographic equipment of claim 1, it is characterized in that: described reference marker is positioned at described image-forming module image planes position.
23., it is characterized in that according to claim 20 or 21 described a kind of alignment systems that are used for lithographic equipment: described Wucan examine the grating cycle less than first with reference to grating, the 3rd with reference to grating, second with reference to grating and the 4th cycle with reference to grating.
24. a kind of alignment system that is used for lithographic equipment according to claim 20, it is characterized in that, the directions X first grating interference picture of described directions X alignment mark and reference marker first corresponding with reference to grating, the directions X second grating interference picture of directions X alignment mark is corresponding with the 3rd grating of reference marker, the Y direction first grating interference picture of Y direction alignment mark is corresponding with the 4th grating of reference marker, the Y direction second grating interference picture of Y direction alignment mark and reference marker second corresponding with reference to grating, it is corresponding that directions X the 3rd grating interference picture and the Wucan of reference marker of directions X alignment mark examined grating.
25. a kind of alignment system that is used for lithographic equipment according to claim 21, it is characterized in that, the directions X first grating interference picture of described directions X alignment mark and reference marker first corresponding with reference to grating, the directions X second grating interference picture of directions X alignment mark is corresponding with the 3rd grating of reference marker, the Y direction first grating interference picture of Y direction alignment mark is corresponding with the 4th grating of reference marker, the Y direction second grating interference picture of Y direction alignment mark and reference marker second corresponding with reference to grating, it is corresponding that Y direction the 3rd grating interference picture and the Wucan of reference marker of Y direction alignment mark examined grating.
26. a kind of alignment system that is used for lithographic equipment according to claim 1, it is characterized in that: described image-forming module makes the positive and negative first-order diffraction light beam of forming alignment mark first grating, the 3rd grating and second grating, and coherent imaging is in the reference marker relevant position that is positioned at image planes respectively, and wafer station is moved to scan on X and Y through drive systems and obtained first light signal, the 3rd light signal, second light signal.
27. a kind of alignment system that is used for lithographic equipment according to claim 26, it is characterized in that: described acquisition of signal and processing module are handled first light signal and second light signal, obtain the rough center of alignment mark according to the phase information of first light signal and second light signal; Handle the 3rd light signal,, and obtain the accurate center of alignment mark in conjunction with the rough center of alignment mark according to the phase information of the 3rd light signal.
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| CN102841515B (en) * | 2011-06-22 | 2015-08-26 | 上海微电子装备有限公司 | Based on alignment methods and the device of multi-period mark |
| CN102231049B (en) * | 2011-06-29 | 2014-04-23 | 广东工业大学 | Large-area projection lithography system and alignment method thereof |
| CN104062859B (en) * | 2013-03-21 | 2016-08-10 | 上海微电子装备有限公司 | A kind of photolithography equipment aligning system |
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| SG11201900623PA (en) * | 2016-08-30 | 2019-02-27 | Asml Netherlands Bv | Position sensor, lithographic apparatus and method for manufacturing devices |
| NL2020769A (en) | 2017-05-15 | 2018-11-20 | Asml Netherlands Bv | Metrology sensor, lithographic apparatus and method for manufacturing devices |
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| CN111505914B (en) * | 2019-01-31 | 2021-06-25 | 上海微电子装备（集团）股份有限公司 | Optical alignment device and photoetching system |
| CN111725696B (en) * | 2020-06-16 | 2021-05-25 | 中国人民解放军国防科技大学 | Piston phase regulation and control system and method of laser coherent array |
| CN116819917B (en) * | 2023-08-31 | 2023-11-17 | 光科芯图(北京)科技有限公司 | Mask plate, exposure equipment and mask plate alignment method |
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