CN100587608C - Aligning system used for photolithography equipment - Google Patents
Aligning system used for photolithography equipment Download PDFInfo
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- CN100587608C CN100587608C CN200710044152A CN200710044152A CN100587608C CN 100587608 C CN100587608 C CN 100587608C CN 200710044152 A CN200710044152 A CN 200710044152A CN 200710044152 A CN200710044152 A CN 200710044152A CN 100587608 C CN100587608 C CN 100587608C
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Abstract
The invention discloses an alignment system applied in a lithography device, which uses three periods phase grating with crude precision combination in a substrate marker or a substrate station reference marker, uses a first order diffraction light of the three periods as an alignment signal, simultaneously realizes a big capture range and gets high alignment precision, gets labeled deformation information and other useful information, and through the optimum design of the match and/or the layout of the three periods, the influence on an alignment position by asymmetrical deformation of the marker is effectively reduced.
Description
Technical field
The present invention relates to photoetching machine technique, particularly the technique of alignment of scanning projection litho machine.
Background technology
Use advanced scanning projecting photoetching machine and finish the figure transfer task of microfabrication, basically can relate to workpiece loads, workpiece zone to be processed is aimed at mask, basic steps such as workpiece exposure and workpiece unloading, wherein referring more particularly to workpiece need carry out under the situation of multilayer processing technology, workpiece zone to be processed is to guarantee constantly to dwindle the prerequisite that workpiece is correctly processed under the situation in live width with accurate aligning of mask, when figure is projected to a workpiece zone to be processed or a new layer pattern accurately alignment is projected on the workpiece zone to be processed that has before formed figure accurately, to when the suitable exposure of anterior layer, can realize figure accurate transfer or requirement of interlayer alignment of (being workpiece to be processed) from the mask to the substrate.
Early stage lithographic projection apparatus adopts the coaxial alignment method more, patent US.4,251,160 have introduced a kind of coaxial alignment device, realize aiming at of mask sheet mark and substrate marker, its implementation structure comprises to be aimed at light source, mask sheet and mask mark, optical system for alignment (by means of the projection objective light path) and substrate and substrate marker.Yet, along with the processing minimum feature is constantly dwindled, be forced to adopt shorter exposure wavelength, because object lens must be not that alignment wavelengths is optimized design according to exposure wavelength, the intensity of registration signal certainly will be affected.And because introducing CMP technology makes substrate marker asymmetric, thereby make the coaxial alignment method no longer reliable.In addition, various processing steps change alignment mark, comprise the variation of the groove significant depth of introducing asymmetry and substrate grating marker.Other job operation or step are often introduced dissimilar errors.For example, copper-mosaic process can be introduced alignment error in the stochastic distribution of integrated circuit surface.Along with the size of the structure of photoetching technique structure reduces and complicacy improves, constantly require to improve alignment precision.Do not improve alignment precision, just can not realize the raising of resolution.In addition, the raising of micro element complicacy more need technology control and with in the manufacture process because alignment error and the substrate quantity that must abandon is reduced to minimum.
In addition, how to realize that bigger capture range guarantees that comprising centering adjustment also is the problem that pay close attention to, because the restriction of technical conditions and job order, the prealignment precision of substrate last slice also is not easy the degree that reaches very high, so to finishing the precondition that substrate that prealignment is placed on base station later on aims at is the zone that alignment device can guarantee to find place, alignment mark center, and obtain the signal that comprises central area information, finally obtain the centering adjustment position by processing, this just so-called capture range problem to this type signal.Document 1 (A new interferometric alignment technique, D.C.Flanders and HenryI.Smith, Appl.Phys.Lett., vol.31, no.7, p.426,1977) introduced a kind of be used for X ray projection mask aligner utilize had the substrate marker of period p with the mask mark with period p+Δ p between the positive level time light group that obtains of spatial modulation interfere between the phase signal of the phase signal that forms and time light group interference formation of negative level the phase zero intersection location as the position of fine alignment, simultaneously, can obtain P=[p (p+ Δ p) like this]/Δ p ≈ p
2The capture range of the mark center position of/Δ p, promptly can guarantee has an alignment point in the P scope.
Further, document 2 (Automatic Alignment System for Optical ProjectionPrinting, Gijs Bouwhuis and Stefan Wittekoek, IEEE Transactions on ElectronDevices, VOL.ED-26, NO.4, April 1979) proposed a kind of be used for stepping projection mask aligner a kind of utilize the cycle for the substrate phase grating of p and cycle carry out for the mask phase grating of p '=R * p/2 (wherein R is the optics multiplying power) is relative scanning motion obtain one with the corresponding to quadratic form phase signal of substrate location, can utilize the largest light intensity value to determine aligned position, prerequisite is that the prealignment precision reaches p/4, signal peak in prealignment precision allowed band is exactly the aligned position of being asked, can realize such prealignment precision with the method that increases observation optical path though mention in the literary composition, but better method be add the another one cycle be p+ Δ p (Δ p＜＜p) grating, guarantee that by design there is zero intersection location in the grating in these two cycles, the zero intersection location of the signal that forms of these two gratings will be with P=[p (p+ Δ p) like this]/Δ p ≈ p
2/ Δ p repeats in the cycle, so if can guarantee to have only a unique zero intersection location in less than the scope of P, this position just can be used as accurate aligned position.(Critical Dimension, CD) reducing of size is to the also feasible requirement that can't satisfy higher alignment precision merely in this way of the requirement of alignment precision raising but along with characteristic line breadth.Because if reduce p, then P also will reduce, to corresponding must the raising that require of prealignment; And if increase p, though then P can increase, if only utilize one-level light can't better realize more high-precision aligning.
The introducing of off-axis alignment system for some time.Such as, patent US.4,937,618 have introduced a kind of off-axis alignment technology, wherein used two-way off-axis alignment unit, finish the aligning of mask mark and substrate marker in conjunction with one road coaxial alignment unit, in two-way off-axis alignment unit, it is high that each road can provide, detection mode at the bottom of low two kinds of enlargement factors, be respectively applied for fine alignment and coarse alignment, its detectable signal is relatively introduced CCD (charge coupled device) and testing circuit and display in the back through a reference marker, by testing circuit picture signal is carried out integration line by line, compares by threshold level value V1 and a low level value V2 with the representative mark center of presetting after the entire image of acquisition plurality of continuous hardwood, can find value above V2, the image that serves as a mark, and the value that the surpasses V1 center that serves as a mark, x to y to surveying simultaneously.Obviously, detect centering adjustment by the predetermined threshold value level value, its precision is except being subjected to CCD pixel size and system's enlargement ratio (the excessive image quality that then be difficult for to guarantee of enlargement ratio) influence easily, also is subjected to the influence of the average noise that superposes on the signal, so actual alignment precision and repeatability are relatively poor.
Patent US.5,243,195 have introduced a kind of off-axis alignment technology, also are the alignings of realizing mask mark and substrate marker in conjunction with the coaxial alignment device.By with a differentiation plate with mark x to being imaged on respectively on separately the ccd sensor to part with y, obtain aligned position in conjunction with analysis then to picture signal, yet, the variation of deformed mark and different coverings material reflectance makes picture contrast and Strength Changes very big, thereby influence obtains result preferably.
Patent US.6,297,876 B1 have introduced a kind of off-axis alignment method, also are the alignings of realizing mask mark and substrate marker in conjunction with the coaxial alignment device.The diffraction light of 7 orders by gathering a mark, make the positive and negative component of these 7 orders in the image planes coherence stack through apart device with wedge regulating device, light signal to these 7 orders fits then, find 7 orders all maximum a bit, the center that serves as a mark.The advantage of this scheme is can realize catching automatically and higher alignment precision, but shortcoming is to need special wedge regulating device and complicated debuging, in addition, high order signal in the diffraction light a little less than, and but this method realizes higher alignment precision by high order signal, the highest alignment precision along with mark (particularly silicon chip mark) reflected signal (particularly high order signal) power is low excessively, then actually can't utilize high order signal in the reality, so can not be provided reliably.
Summary of the invention
The object of the present invention is to provide a kind of alignment system that is used for lithographic equipment, with realization bigger capture range and higher alignment precision, and corresponding lithographic equipment has higher alignment precision and productive rate.
To achieve the above object, the invention provides a kind of alignment system that is used for lithographic equipment, it comprises: aim at radiation source, alignment mark, alignment mark signal detector and signal processor; This aligning radiation source sends calibration beam; This calibration beam shines this alignment mark and obtains the alignment mark signal; This alignment mark signal is injected this alignment mark signal detector; This alignment mark signal detector is connected with signal processor, and wherein, this alignment mark comprises the phase grating of three different cycles, and the alignment mark signal that this calibration beam shines this alignment mark generation is a cyclical signal.This alignment mark comprises the phase grating that is positioned at nonoverlapping three different cycles in position, same plane.This alignment mark can be the phase grating of three different cycles arranging of being in line, also can be to be positioned at two phase gratings of forming three different cycles of line spread that same plane is orthogonal and arranges, can also be to be positioned at the phase grating that comprises three different cycles that other modes on same plane are arranged.The striped of the phase grating of three different cycles of this arrangement that is in line is in line perpendicular to three gratings, the cycle of grating that is positioned at the middle part can be the cycle less than the grating that is positioned at both sides, and the cycle that is positioned at the grating at middle part can be poor greater than the cycle of the grating that is positioned at both sides.
The first-order diffraction signal that this alignment mark signal sends behind this alignment mark for this calibration beam shines.
This alignment mark can be positioned in the substrate, also can be positioned on the base station.
The lens combination that this alignment mark signal detector uses can be the 4f lens combination of the two core structures far away of employing of design separately, also can be the projection objective of litho machine.
This alignment mark is positioned on the preceding group of lens focal plane of this lens combination.
This alignment system adopts unified work schedule controlling mechanism.
Can add spatial filter in this lens combination.This spatial filter only allows the first-order diffraction signal of the grating of three periodic phase to pass through.This spatial filter can be the aperture diaphragm that only allows the first-order diffraction signal of the grating of this alignment mark to pass through.
This aligning radiation source can be the radiation source that can only send the calibration beam of a wavelength, also can be the radiation source that can send the calibration beam of two or more wavelength.This radiation source that can send the calibration beam of two or more wavelength can be the radiation source that synchronization sends the calibration beam of two or more wavelength, also can be two or more radiation sources of the synchronization calibration beam that sends different single wavelengths.
Two or more radiation sources that this synchronization sends the calibration beam of different single wavelengths can project this alignment mark with the calibration beam of different wave length with identical incident angle by beam splitter.This beam splitter can be the polarization beam splitting device.
Two or more radiation sources that this synchronization sends the calibration beam of different single wavelengths can be two radiation sources of the synchronization calibration beam that sends different single wavelengths, at this moment, first radiation source sends the calibration beam of first wavelength perpendicular to this alignment mark plane irradiation alignment mark, the calibration beam of first wavelength that the calibration beam that second radiation source sends second wavelength sends perpendicular to first radiation source, this polarization beam splitting device is positioned at the calibration beam intersection of calibration beam and this second wavelength of this first wavelength.Can between this polarization division device and this alignment mark, add λ/4 wave plates.
When use can be sent the radiation source of calibration beam of two or more wavelength, can only use an alignment mark signal detector, also can use two or more alignment mark signal detectors.When using two or more these alignment mark signal detectors, can use beam splitter that the alignment mark signal of two or more wavelength is projected different registration signal detecting devices respectively.This beam splitter can be the polarization beam splitting device.
This alignment mark signal detector can comprise aim at radiation source optical fiber, light-dividing device, preceding group of lens, spatial filter, back group lens, total reflection device, photoelectric signal sensor and with this alignment mark distribution form accordingly with reference to grating.This aligning radiation source is connected to this aligning radiation source optical fiber, this aligning radiation source optical fiber is connected to an input end of this light-dividing device, an output terminal and another input end of this light-dividing device point to this alignment mark simultaneously, another output terminal of this light-dividing device points to should precedingly organize lens, this spatial filter is organized lens and should be organized between the lens back before this, group lens were organized on the center light path of lens with this back before this total reflection device was positioned at this, this forms the image position with reference to the grating scioptics that grating lays respectively at this alignment mark, this photoelectric signal sensor lay respectively at this with reference to grating after.This with reference to cycle of grating branch respectively with identical to cycle that should alignment mark branch imaging.This total reflection device can be a total reflection prism.
This alignment mark signal detector also can comprise aim at radiation source optical fiber, light-dividing device, preceding group of lens, spatial filter, back group lens, total reflection device, detection optical fiber, photoelectric signal sensor and with this alignment mark distribution form accordingly with reference to grating.This aligning radiation source is connected to this aligning radiation source optical fiber, this aligning radiation source optical fiber is connected to an input end of this light-dividing device, an output terminal and another input end of this light-dividing device point to this alignment mark simultaneously, another output terminal of this light-dividing device points to should precedingly organize lens, this spatial filter is organized lens and should be organized between the lens back before this, group lens were organized on the center light path of lens with this back before this total reflection device was positioned at this, this forms the image position with reference to the grating scioptics that grating lays respectively at this alignment mark, one end of this detection optical fiber lay respectively at this with reference to grating after, the other end of this detection optical fiber is connected to this photoelectric signal sensor.This with reference to cycle of grating branch respectively with identical to cycle that should alignment mark branch imaging.This total reflection device can be a total reflection prism.
This signal processor comprises: opto-electronic conversion and amplifier; Analog to digital converter; The signal processor that fits with two input ends; The position data processor; Position data conversion and sampling thief with two output terminals; The base station motion controller; With the work schedule controller; The output signal of this alignment mark signal detector is imported this opto-electronic conversion and amplifier input terminal; The output terminal of this opto-electronic conversion and amplifier links to each other with the input end of this analog to digital converter; The output terminal of this analog to digital converter links to each other with the input end that this fits signal processor; The base station displacement signal is imported the input end of this position data conversion and sampling thief; This position data conversion links to each other with the input end of this position data processor with an output terminal of sampling thief; The output terminal of this position data processor links to each other with another input end that this fits signal processor; This position data conversion links to each other with the base station motion controller with another output terminal of sampling thief; Work schedule controller and opto-electronic conversion and amplifier, analog to digital converter, fit signal processor, position data processor, position data conversion and link to each other with the sequential port of sampling thief, base station motion controller.
This base station displacement signal can be by being positioned at the orthogonal thereto distribution in base station plane and all aiming at two laser interferometer output of base station.This base station displacement signal can also comprise the output signal that is a vertical laser interferometer with this base station plane.
The alignment system that is used for lithographic equipment of the present invention uses three periods phase grating with thick smart cooperation in substrate marker or base station reference mark, the first-order diffraction light that only utilizes these three cycles is as registration signal, obtain high alignment precision when can realize big capture range, only use the first-order diffraction light in each cycle, can obtain stronger signal intensity, improve system signal noise ratio, need not come separately senior diffraction components of multichannel by regulating devices such as wedges, simplify light path design and debugging difficulty, adopt less fiber-optic signal and electric signal treatment channel quantity, can simplify the hardware realization and dwindle the signal processing time expense, aim at efficient thereby improve, by analysis to three periods phase grating aligned positions, can also obtain information and other useful information of deformed mark, by being cooperated, three cycles size carries out optimal design, and can be so that the mark asymmetrical deformation effectively reduces the influence of aligned position.
Description of drawings
Fig. 1 is for using litho machine alignment system synoptic diagram of the present invention;
Fig. 2 is that one dimension x is to three cycle mark synoptic diagram;
Fig. 3 is that one dimension y is to three cycle mark synoptic diagram;
Fig. 4 is the three cycle mark synoptic diagram of two groups of gratings arranging of being orthogonal;
Fig. 5 is three periodic optical grating space diffraction synoptic diagram;
Fig. 6 is a kind of implementation synoptic diagram of three cycle alignment systems of the present invention;
Fig. 7 is a 4f system architecture synoptic diagram;
Fig. 8 is three cycle alignment work principle and light channel structure synoptic diagram;
Fig. 9 is three cycle of a multi-wavelength alignment system structural representation;
Figure 10 is a spatial filter principle of work synoptic diagram;
Figure 11 is the spatial filter structural representation;
Figure 12 is for using the spatial filter structural representation of two wavelength alignment radiation sources;
Figure 13 is with reference to the grating structural representation;
Figure 14 arranges the cross section structure synoptic diagram for detection optical fiber;
Figure 15 is marked at suprabasil distribution schematic diagram for three cycles of one dimension;
Figure 16 is marked at suprabasil distribution schematic diagram for two-dimentional three cycles;
Figure 17 is desirable three cycle registration signal;
Figure 18 is actual three cycle registration signal.
In the accompanying drawing: 1, base station mark; 2, mask mark; 3, base station mark; 4, mask; 5, substrate marker; 6, mask stage; 7, substrate; 9, base station; 100, alignment device; 100 ', alignment device; 101, alignment mark signal; 102, Transmission Fibers; 103, Transmission Fibers; 104, total reflection prism; 104 ', total reflection prism; 105, spatial filter; 105 ', spatial filter; 106, with reference to grating; 106 ', with reference to grating; 107, detection optical fiber; 110, beam splitter; 111,1/4 λ wave plate; 200, signal processor; 201, opto-electronic conversion and amplifier; 201a, electrooptical device; 202, analog to digital converter; 203, fit signal processor; 204, position data processor; 205, position data conversion and sampling thief; 206, base station motion controller; 207, work schedule controller; 300, aim at radiation source; 300 ', aim at radiation source; 303, lens; 302, aperture diaphragm; 301, lens; Basad displacement measuring device laser interferometer of IFx, x; Basad displacement measuring device laser interferometer of IFy, y; PL, projection objective; L1, preceding group of lens; Lens are organized in L1 ', preceding group of lens L2, back; L2 ', back group lens; IB, calibration beam; P1, tag plane; P2, imaging plane; RG, with reference to grating; FB, detection optical fiber.
Embodiment
Below in conjunction with accompanying drawing the specific embodiment of the present invention is further described.
Accompanying drawing 1 (Fig. 1 is to use litho machine alignment system synoptic diagram of the present invention) shows the alignment system of prior art use and a kind of embodiment that alignment system of the present invention can adopt, and the primary structure of litho machine comprises: mask stage 6, mask 4, projection objective PL, base station 9.Base station mark 1 and substrate marker 5 can be the form of Fig. 2, Fig. 3 or Fig. 4.The distribution of substrate marker 5 in substrate 7 can be the form of Figure 15 or Figure 16, and wherein, Figure 15 is the combination of 4 groups of three cycle of one dimension marks.
In the system that prior art is used, utilize the mask mark 2 on the mask 4 of non-exposure wavelength radiation source irradiates mask stage 6 carryings of more low-energy exposure source or other, by projection objective PL the reduced image of mask mark 2 is projected on the base station mark 3 as the reference mark set on the base station 9, the sensor that utilizes base station mark 3 to be transmitted under it carries out the photosignal conversion, by a series of scanning collection signal, fit processing in conjunction with the locus signal that records by x basad displacement measuring device laser interferometer IFx and basad displacement measuring device laser interferometer of y IFy, set up the coordinate transformation relation of mask and base station.
Alignment system of the present invention provides one or more lighting source with suitable wavelength by Transmission Fibers 103 irradiation base station marks 1 by aiming at radiation source 300, collects the alignment mark signal 101 that reflects on the mark by alignment device 100.When base station mark 1 be arranged as the form of Fig. 4 the time, carry out x to measure have three cycle x to the first-order diffraction light signal have three the tunnel, carry out y to measure have y to the first-order diffraction light signal have three the tunnel, six road signals are collected through alignment device 100 altogether, guide to than finishing in the registration signal processing unit 200 at a distance by Transmission Fibers 102 and leave in the storage address of appointment after opto-electronic conversion and signal amplify conditioning and analog to digital conversion.Simultaneously, can obtain corresponding movement position information simultaneously by x basad displacement measuring device laser interferometer IFx and basad displacement measuring device laser interferometer of y IFy.To record numerical value and fit processing, can find base station mark 1 corresponding alignment point coordinate figure (x under the base station coordinate system
1, y
1).
In like manner, alignment device 100 can be measured substrate marker 5, obtains substrate marker 5 corresponding coordinate figure (x under the base station coordinate system
5, y
5).
By (x
1, y
1) and (x
5, y
5) can set up the transformational relation between base station coordinate origin and the substrate coordinate origin, and then set up the transformational relation between two coordinate systems.
Fig. 2 shows and is used for x to the three cycle mark structures of aiming at.Fig. 2 comprises the grating branch of three of p0x, p1x, p2x, and its cycle is respectively p0, p1, p2.Wherein p2x branch, p1x branch mark mid point become the center to be symmetrically distributed with respect to p0x branch mid point, and promptly the centre of form of whole mark overlaps with the p0x branch centre of form.
Accompanying drawing 3 (Fig. 3 is that one dimension y is to three cycle mark synoptic diagram) shows and is used for y to the three cycle mark structures of aiming at.Fig. 3 comprises the grating branch of three of p0y, p1y, p2y, and its cycle is respectively p0, p1, p2.Wherein p2y branch, p1y branch mark mid point become the center to be symmetrically distributed with respect to p0y branch mid point, and promptly the centre of form of whole mark overlaps with the p0y branch centre of form.
Fig. 4 show be used for simultaneously x to y to the three cycle mark structures of aiming at.X comprises the grating branch of three of p0x, p1x, p2x to mark, and its cycle is respectively p0, p1, p2, and p0x comprises p0x_a and p0x_b two grating branch.Wherein p2x branch, p1x branch mark mid point become the center to be symmetrically distributed with respect to p0x branch mid point, and p0x_a branch, p0x_b branch mark mid point become the center to be symmetrically distributed with respect to p0x branch mid point, and promptly whole x overlaps with the p0x branch centre of form to the centre of form of mark.Y comprises the grating branch of three of p0y, p1y, p2y to mark, and its cycle is respectively p0, p1, p2, and p0x comprises p0y_a and p0y_b two grating branch.Wherein p2y branch, p1y branch mark mid point become the center to be symmetrically distributed with respect to p0y branch mid point, and p0y_a branch, p0y_b branch mark mid point become the center to be symmetrically distributed with respect to p0y branch mid point, and promptly whole y overlaps with the p0y branch centre of form to the centre of form of mark.X is orthogonal to separately the centre of form and two mark intersection no-rasters to mark and y to mark.The effect of this mark is to support diagonal line scanning, if promptly along with x to or y become the directions of 45 degree to scan to coordinate axis, then can obtain simultaneously x to y to the mark center position.
The fundamental relation in three grating cycles is: p0＜p1＜p2 (formula 1)
Situation when Fig. 5 shows three cycle marks of the present invention are carried out one-dimensional scanning.When vertical or near normal projects three cycle of one dimension mark surperficial as calibration beam IB, at three different cycles grating places of mark diffraction take place, according to the angle of diffraction formula:
(wherein, p represents the pitch of grating, α represents the angle of diffraction beamlet and grating normal, λ represents lambda1-wavelength, n represents the order of diffraction time) incident beam takes place behind the diffraction becomes positive and negative level a plurality of beamlets that time are symmetrically distributed at each grating place, in free space, will propagate along corrugated separately.The present invention only needs to utilize the first-order diffraction light of each grating to aim at.In fact, when diffraction takes place, also can produce senior diffraction light except that first-order diffraction light, not need these diffraction components here, but in design, avoid of the interference of senior diffraction light of certain branch as far as possible other branch's first-order diffraction light at every place.On the other hand, the zero-order sub-beam of diffracted beam also is unwanted diffraction components, avoid it that three branch's first-order diffraction light are impacted in design.
Scanning in one direction can obtain the signal S of three different cycles
P0, S
P1, S
P2, p0＜p1＜p2, p0, p1, p2 are respectively S
P0, S
P1, S
P2Cycle.Utilize the signal of these three different cycles, we can realize the purpose that will reach required for the present invention, promptly obtain very high alignment precision when realizing big capture range, and its ultimate principle is as follows:
1) utilizes two than the big capture range of large period acquisition.
Two of alignment mark than existing fixing small periodic inequality between the large period, can be expressed as:
Δ p=p2-p1 (formula 3)
The maximum capture range that can be provided by the independent p1 of branch is
Or be expressed as
, this is because the cycle is cycle of the interference fringe of positive and negative one-level light after relevant on the image planes of the branch of p1 to be
, and capture range allow promptly that the desired locations error drops on signal certain determine in the cycle; And the corresponding cycle for the maximum capture range that the branch of p2 can provide is
The maximum capture range that two independent branches can provide is
, its capture range is not very big, the prealignment deviation greater than
Situation under can't determine the mark center position definite be positioned at which signal period.And if we use the grating in two cycles simultaneously, then can expand capture range to P ', wherein:
If promptly the error of mark center and desired locations less than P ' or
In, be center when scanning then according to the desired locations of appointment, can obtain the coarse alignment position of mark center.
2) utilize the period 3 to obtain high alignment precision.
Further, can release the alignment precision expression formula by phase grating diffraction interference principle:
Wherein, δ is an alignment precision, and p is the object mark grating cycle, and n is a diffraction progression, and ΔΦ is the signal deteching circuit phase resolution.
The present invention compares the purpose that less grating period p 0 realizes improving alignment precision by introducing one with p1, p2, and the precision of aligning has had further raising.
3) in conjunction with the fine alignment signal of two coarse alignment positions that obtain than large period with the period 3 acquisition.
Ideally, the coarse alignment position is S
P1And S
P2Phase coincidence point C
P1And C
P2(two signal phases are identical herein) in addition, by the appropriate design layout to three branches of mark, can guarantee fine alignment signal S
P0Also at C
P0A phase coincidence point appears in the place, and three's phase coincidence point can be thought alignment point ideally; Under the actual conditions, yet in the device manufacturing processes, mark and all can not accomplish accurate symmetry with reference to grating, and substrate marker is in technological process, various distortion situations can appear, so, in fact there is not the absolute accurate phase coincidence point of three periodic signals.And for three different cycles, technology causes that the situation of distortion is also different, under present technological conditions, be subject to the influence that technology causes distortion than large period, and processes is to also less than the minor cycle influence.Truth is three signal S
P0, S
P1, S
P2Whenever all can have some deviations each other, the best result that can reach is to find a position in this case, makes in capture range, at first with S
P1, S
P2One of them signal is that benchmark finds both phase deviation smallest point; With this point is reference point, looks for S
P0With S
P1The phase deviation smallest point of signal promptly can be as accurate aligned position.Only need period p 0 enough big, such as p0＞(p2-p1), be actually and guarantee at S
P0With S
P1Near the point of proximity (is same-phase with the peak value) of signal phase, only there is a peak point.
Fig. 7 is the structural representation of 4f system.Mark on tag plane P1 be positioned at the 4f system preceding group of lens L1 front focal plane and be positioned at the paraxial region of optical axis, the positive and negative two-beam of certain grade of arbitrary branch diffraction time becomes the two-way collimated light beam through behind preceding group of lens L1 from the mark; After back group of lens L2 of process 4f system converges, this two-way collimated light beam is focused on the back focal plane of back group lens L2, owing to have stable phase differential between positive and negative level is inferior, frequency identical and on reference grating face projection components be parallel to each other, satisfy coherent condition, the two-way beamlet is coherent imaging herein.In fact, have the entrance pupil that the inferior beamlet of a plurality of levels can enter this 4f system in the diffraction components on mark in each branch, the present invention only uses first-order diffraction light beam wherein, so an aperture diaphragm device need be set at the back focal plane place of preceding group of lens L1, make that can optionally see through us needs the inferior beamlet of level.
Figure 10 is the fundamental diagram as the aperture diaphragm device of spatial filter.Spatial filter 105 is positioned at the back focal plane of L1, the printing opacity place of aperture diaphragm, and the first-order diffraction light light path of corresponding three gratings of difference, and between the senior diffraction light of the first-order diffraction light of minimum period grating and other periodic optical gratings enough offsets are arranged.
Figure 11 is the structural representation of a kind of spatial filter of using of the present invention.Corresponding to three cycle marks of the two groups of gratings arranging of being orthogonal shown in Figure 4, it comprise x to the spatial filter structure and y to the spatial filter structure.Only can by x to three cycle marks and y to the first-order diffraction light of three cycle marks.
For vivider explanation principle of work, Fig. 8 has adopted the mode of exaggeration to draw three cycles and has gone up diffraction and imaging process.In fact, incident laser is a branch of light, and its color is a monochromatic light.Because f1 is much larger than label size, can think that primary optical axis that each cycle of mark all is positioned at optics 4f system goes forward to organize the front focus place of lens L1, so behind preceding group of lens L1, the first-order diffraction light in three cycles all is the approximate light that is parallel to primary optical axis, reason in order to distinguish among Fig. 8, the deliberately slightly deflection of drawing.As shown in Figure 8, incident beam IB is vertically projected on the mark of substrate surface after by total reflection prism 104 deflections, and this incoming laser beam enough covers three cycles of mark, so when mark generation diffraction, branch can produce diffraction lights at different levels.Because period p 0＜p1＜p2, in time diffracted ray at the same level, secondly branch's p0x virgin beam diffraction angle maximum is the p1x virgin of branch light beam, and branch's p2x virgin beam diffraction angle minimum.When we during only to the first-order diffraction light sensation interest in three cycles, can be only in the schematic ray tracing of each first-order diffraction beamlet shown in Fig. 5 b.Because the effect of blocking of total reflection prism 104 and aperture diaphragm 105 is arranged, and the Zero-order diffractive component can not cause interference to each first-order diffraction beamlet.The one-level light b0+1 of branch's p0x grating place diffraction and b0-1 become collimated light beam b0+1 ', the b0-1 ' of pair of parallel and primary optical axis behind preceding group of lens L1, and the light hole by diaphragm 105 after 2 the beamlet b0+1 in back focal plane place " and b0-1 " that converging in back group lens L2 of back group lens L2 interfere, image planes P2 near the primary optical axis place form p0x as p0x '.In like manner, p1x place diffraction beamlet can be imaged on p1x ' through this 4f system and locate, and p2x place diffraction beamlet can be imaged on p2x ' through this 4f system and locate.Simultaneously, on image planes P2, placing one with reference to grating, comprising the RG0x corresponding with the p0x cycle with primary optical axis is centrosymmetric, the RG1x corresponding with the p1x cycle, each sections such as RG2x of p2x cycle correspondence, its concrete structure pattern can be referring to Figure 13; All placing corresponding detection optical fiber at each with reference to each section back of grating, can collect by with reference to the light intensity signal behind the grating, its arrangement can be referring to Figure 14.And these detection optical fibers guide to electrooptical device with corresponding light intensity signal, and light intensity signal is changed and handled.Because the image of substrate marker is the continuous hot spot striped consistent with the optical grating construction form, when mark moves with respect to alignment optical system, these stripeds also can move with respect to the reference grating, being the imaging striped with the degree that overlaps with reference to grating continuous variation takes place, the result is that signal light intensity on photodetector is also along with this mobile generation changes continuously, because fringe spacing is cyclical variation, the variation of this light intensity signal also is periodic.According to Fourier optics, what form on detector is a kind of signal of sinusoidal form, if keep the mutually accurate uniform motion of mark and alignment system, then can obtain the sinusoidal signal of a constant cycle.Corresponding to each section (marker image-with reference to grating), the sinusoidal signal of a constant cycle that is directly proportional with the grating cycle can be arranged all.
Following example illustrates that several specific product of the present invention constitutes, and its objective is and explains utilization of the present invention better, and not should be understood to limitation of the present invention.
Fig. 6 is the synoptic diagram of a kind of implementation of three cycle alignment systems of the present invention.Aim at radiation source that radiation source 300 sends through lens 303, aperture diaphragm 302 and lens 301 and Transmission Fibers 103 (passing the light polarization maintaining optical fibre) through total reflection prism 104 deflections, through preceding group of lens L1 vertical irradiation to the base station mark 1 that is positioned at base station 9 or be positioned on the substrate marker 5 of substrate 7, be deflected and the approximately parallel collimated light beam of optical axis behind the group lens L1 before the 1 order diffraction beamlet in each cycle of generation diffraction is transmitted on three cycle marks, 0 order diffraction light of each periodic optical grating returns former incident light direction in addition.Comprising some in each collimated light beam in fact is regarded as disturbing with reference to the order of diffraction of grating surface imaging time and parasitic light component, so be provided with a spatial filter 105 that only can optionally see through the 1 order diffraction light component in three cycles at the back focal plane (also being simultaneously the front focal plane of back group lens L2) of preceding group of lens L1.These light beams are focused on the reference grating 106 that is placed on back group lens L2 back focal plane by back group lens L2 and form interference image, when carrying out the alignment scanning of base station mark 1 or substrate marker 5, imaging is at the uniform velocity mobile with respect to reference grating 106, and then on placing, form the sinusoidal light intensity signal of continually varying with reference to 107 receiving planes of the detection optical fiber behind the grating, become electric signal be sent to the electrooptical device 201a of the opto-electronic conversion of signal processing unit 200 and amplifier 201 by Transmission Fibers 102 after.Trigger via the unified of work schedule controller 207, can guarantee that collection to this alignings electric signal is with synchronous through the displacement numerical value that position data is changed and sampling thief 205 is gathered.Simultaneously, the signal after opto-electronic conversion and amplifier 201 are handled also will convert digital signal to through analog to digital converter 202, delivers to and fits signal processor 203; And 203 receive the position data from position data processor 204 simultaneously, it comes from position data conversion and sampling thief 205, these data offer base station motion controller 206 simultaneously, carry out mark scannng by base station motion controller 206 control base station according to desired speed and direction.In conjunction with the synchronously sampled data that comes from analog to digital converter 202 and position data processor 204, can determine the aligned position of this scanning by fitting signal processor 203 through fitting processing.
In the practical operation, can be taken into the long 633nm of being of ejected wave, select p0=1.8um, p1=16um, during p2=17.6um, α 0=20.58929 ° (α 0 is the first-order diffraction optical diffraction angle of p0); α 1=2.267356 ° (α 1 is the first-order diffraction optical diffraction angle of p1); α 2=2.061139 ° (α 2 is the first-order diffraction optical diffraction angle of p2); During corresponding p1=16um, 8 order diffraction diffraction of light angles are 18.45139 °, and 9 order diffraction diffraction of light angles are 20.85858 °; The pairing 8 order diffraction light of p2=17.6um, 9 order diffraction diffraction of light angles are respectively 16.72194 ° and 18.88642 °, hence one can see that, it is can satisfy three branches to be independent of each other each other that such cycle cooperates, and the NA that realizes the optical system of this matching relationship is about 0.35, can realize.In fact, basic quite the time when three branch's reflective powers, because the power of senior diffraction light is well below 1 order diffraction light, even can ignore its influence to 1 order diffraction component.0 order diffraction light of three branches is stopped by spatial filter 105, can not enter subsequent optical path, also can not participate in the imaging of back group lens L2 back focal plane then.
Another embodiment of the present invention is used the radiation source of the different wave length that is similar to module 300 as shown in Figure 9.Introduce multi-wavelength and be when considering actual Alignment Process, because the different medium material is handled the variation that mark linear grating groove effect of depth is brought diffraction efficiency and reflection coefficient to the receptivity difference and the substrate processing of different wave length radiation source, by the radiation source of different wave length, can select signal best or by the only signal of combination selection as registration signal.The identical structure of alignment device 100 ' have and alignment device 100 wherein, its concrete principle is identical as shown in Figure 8.Increased a splitter module 110 newly.This splitter module will be from the aligning radiation beam transmissive with wavelength X 1 and first polarization direction of module 100 mark 1 or the mark 5 in the substrate 7 to the base station 9; This beam splitter will be from 100 ' have the aiming on the mark 1 or the mark 5 in the substrate 7 that is vertically projected to behind the radiation beam deflection on the base station 9 of wavelength X 2 and second polarization direction vertical with above-mentioned first polarization direction.Mark 1 or mark 5 secondary reflections at different levels after with this two bundles incident radiation diffraction go back to the former incident of beam splitter interface, and the more former outgoing module 100 of reflected back or 100 ' back by 100 or 100 ' separately with reference to the imaging of grating place.Less when the alignment mark grating cycle, with the illumination wavelengths magnitude during quite or less than 5 λ, diffraction efficiency of grating is relevant with the polarization characteristic of lighting source, therefore utilize achromatic λ/4 wave plates 111, make from beam splitter 110 and shine linearly polarized light on the silicon chip behind achromatic λ/4 wave plates 111, the hot spot that incides on the wafer is a circularly polarized light, and circularly polarized light comprises the vertical linearly polarized light of both direction, guarantees always to have a polarization direction can produce high efficiency diffraction light.Among the figure 105 and 105 ' version will become pattern shown in Figure 12, this is because light path design is wanted the angle of diffraction skew of compatible two kinds of incident wavelengths, owing to can select two kinds of comparatively approaching incident radiation wavelength, can select the laser of 633nm and 532nm, also can select the laser of 633nm and 785nm, so the skew of two angle of diffraction can be not excessive, wave aberration in the time of can reducing on the reference grating, to form image and then the aligned position error that causes.
When we utilize certain mode mark is carried out coarse localization, such as a light-dividing device can be set behind spatial filter 105, tell a part of signal, utilize the another one lens combination that it is imaged on the video imaging apparatus, the operator is positioned at mark near the center, visual field of alignment system as assisting, beginning label scanning motion then, so just can easier acquisition respectively with corresponding signal Sp0 of 3 grating cycles, Sp1, the Sp2 of alignment mark.In fact, if substrate or base station prealignment precision are enough, can directly not obtain 3 intermittent scanning signals by other servicing unit yet.Can corresponding to the scanning of a direction, can obtain the signal of 3 different cycles referring to three cycle of ideal shown in Figure 17 registration signal.Actual signal as shown in figure 18, at first with S
P1, S
P2One of them signal is that benchmark finds both phase deviation smallest point, as S
P1C
P1Point and S
P2C
P2Point, its minimum deflection are Δ (C
P2-C
P1); With C
P1Point is looked for S for reference point
P0With S
P1The phase deviation smallest point of signal is such as C shown in Figure 180
P0Point, C
P0Promptly can be as accurate aligned position.
Claims (32)
1, a kind of alignment system that is used for lithographic equipment comprises:
Aim at radiation source;
Alignment mark;
The alignment mark signal detector; With
Signal processor;
Wherein, described aligning radiation source sends calibration beam; Described calibration beam shines described alignment mark and obtains the alignment mark signal; Described alignment mark signal is injected described alignment mark signal detector; Described alignment mark signal detector is connected with signal processor; It is characterized in that described alignment mark comprises the phase grating of three different cycles, the alignment mark signal that described calibration beam shines described alignment mark generation is a cyclical signal; The arrangement that is in line of the phase grating of described three different cycles, the striped of the phase grating of three different cycles of the described arrangement that is in line is in line perpendicular to described three gratings, the cycle of grating that is positioned at the middle part is less than cycle of the grating that is positioned at both sides, the cycle of grating that is positioned at the middle part poor greater than cycle of the grating that is positioned at both sides.
2, the alignment system that is used for lithographic equipment according to claim 1 is characterized in that: described alignment mark is to be positioned at two phase gratings of forming three different cycles of line spread that same plane is orthogonal and arranges.
3, the alignment system that is used for lithographic equipment according to claim 2, it is characterized in that: the striped of the phase grating of three different cycles of the described arrangement that is in line is in line perpendicular to described three gratings, and the cycle of the grating in the middle part of being positioned at is less than the cycle of the grating that is positioned at both sides.
4, the alignment system that is used for lithographic equipment according to claim 2 is characterized in that: the cycle of the described grating that is positioned at the middle part is poor greater than cycle of the described grating that is positioned at both sides.
5, the alignment system that is used for lithographic equipment according to claim 1 is characterized in that: described alignment mark signal is that described calibration beam shines the first-order diffraction signal that sends behind the described alignment mark.
6, the alignment system that is used for lithographic equipment according to claim 1 is characterized in that: described alignment mark is positioned in the substrate or on the base station.
7, the alignment system that is used for lithographic equipment according to claim 1 is characterized in that: the lens combination that described registration signal detecting device uses is the 4f lens combination of the two core structures far away of employing of design separately, or the projection objective of litho machine.
8, the alignment system that is used for lithographic equipment according to claim 7 is characterized in that: group lens before described lens combination comprises, described alignment mark is positioned on the focal plane of preceding group of lens of described lens combination.
9, the alignment system that is used for lithographic equipment according to claim 1 is characterized in that: described alignment system adopts unified work schedule controlling mechanism.
10, the alignment system that is used for lithographic equipment according to claim 7 is characterized in that: insert spatial filter between group lens and the back group lens before described.
11, the alignment system that is used for lithographic equipment according to claim 10 is characterized in that: described spatial filter only allows the first-order diffraction signal of the phase grating in three cycles to pass through.
12, the alignment system that is used for lithographic equipment according to claim 11 is characterized in that: described spatial filter only allows the first-order diffraction signal of the grating of described alignment mark to pass through aperture diaphragm.
13, the alignment system that is used for lithographic equipment according to claim 1, it is characterized in that: described aligning radiation source provides the calibration beam of a wavelength.
14, the alignment system that is used for lithographic equipment according to claim 1, it is characterized in that: described aligning radiation source provides the calibration beam of two or more wavelength.
15, the alignment system that is used for lithographic equipment according to claim 14 is characterized in that: the described radiation source synchronization that the calibration beam of two or more wavelength is provided only sends the calibration beam of a wavelength.
16, the alignment system that is used for lithographic equipment according to claim 14 is characterized in that: the described radiation source synchronization that the calibration beam of two or more wavelength is provided sends the calibration beam of two or more wavelength.
17, the alignment system that is used for lithographic equipment according to claim 14 is characterized in that: the described radiation source of the calibration beam of two or more wavelength that provides comprises that synchronization sends two or more radiation sources of the calibration beam of different single wavelengths.
18, the alignment system that is used for lithographic equipment according to claim 17 is characterized in that: two or more radiation sources that described synchronization sends the calibration beam of different single wavelengths project described alignment mark with the calibration beam of different wave length with identical incident angle by beam splitter.
19, the alignment system that is used for lithographic equipment according to claim 18 is characterized in that: described beam splitter is the polarization beam splitting device.
20, the alignment system that is used for lithographic equipment according to claim 19, it is characterized in that: adopt two radiation sources to send the calibration beam of different single wavelengths at synchronization, wherein, the calibration beam that first radiation source sends first wavelength shines described alignment mark perpendicular to described alignment mark plane, the calibration beam of first wavelength that the calibration beam that second radiation source sends second wavelength sends perpendicular to described first radiation source, described polarization beam splitting device is positioned at the calibration beam intersection of the calibration beam and described second wavelength of described first wavelength.
21, the alignment system that is used for lithographic equipment according to claim 20 is characterized in that: add λ/4 wave plates between described polarization division device and the described alignment mark.
22, the alignment system that is used for lithographic equipment according to claim 14 is characterized in that: when using the radiation source of the described calibration beam that two or more wavelength are provided, only use a described alignment mark signal detector.
23, the alignment system that is used for lithographic equipment according to claim 14 is characterized in that: when using the radiation source of the described calibration beam that two or more wavelength are provided, use two or more described alignment mark signal detectors.
24, the alignment system that is used for lithographic equipment according to claim 23, it is characterized in that: when using two or more described alignment mark signal detectors, utilize beam splitter that the alignment mark signal of two or more wavelength is projected different lens combination and registration signal detecting device respectively.
25, the alignment system that is used for lithographic equipment according to claim 24 is characterized in that: described beam splitter is the polarization beam splitting device.
26, the alignment system that is used for lithographic equipment according to claim 1 is characterized in that: described alignment mark signal detector comprises:
Aim at radiation source optical fiber;
Light-dividing device;
Preceding group lens;
Spatial filter;
Back group lens;
The total reflection device;
Photoelectric signal sensor; With
With described alignment mark distribution form accordingly with reference to grating;
Described aligning radiation source is connected to described aligning radiation source optical fiber; Described aligning radiation source optical fiber is connected to an input end of described light-dividing device; An output terminal and another input end of described light-dividing device point to described alignment mark simultaneously; Another output terminal of described light-dividing device points to described preceding group lens; Described spatial filter is organized before described between lens and the described back group lens; Described total reflection device is positioned on the center light path of described preceding group lens and described back group lens; The described grating scioptics composition image position that lays respectively at described alignment mark with reference to grating; Described photoelectric signal sensor lays respectively at described with reference to behind the grating.
27, the alignment system that is used for lithographic equipment according to claim 1 is characterized in that: described alignment mark signal detector comprises:
Aim at radiation source optical fiber;
Light-dividing device;
Preceding group lens;
Spatial filter;
Back group lens;
The total reflection device;
Detection optical fiber;
Photoelectric signal sensor; With
With described alignment mark distribution form accordingly with reference to grating;
Described aligning radiation source is connected to described aligning radiation source optical fiber; Described aligning radiation source optical fiber is connected to an input end of described light-dividing device; An output terminal and another input end of described light-dividing device point to described alignment mark simultaneously; Another output terminal of described light-dividing device points to described preceding group lens; Described spatial filter is organized before described between lens and the described back group lens; Described total reflection device is positioned on the center light path of described preceding group lens and described back group lens; The described grating scioptics composition image position that lays respectively at described alignment mark with reference to grating; One end of described detection optical fiber lays respectively at described with reference to behind the grating, and the other end of described detection optical fiber is connected to described photoelectric signal sensor.
28, according to claim 26 or the 27 described alignment systems that are used for lithographic equipment, it is characterized in that: the described cycle with reference to grating branch is identical with the cycle of corresponding described alignment mark branch imaging respectively.
29, according to claim 26 or the 27 described alignment systems that are used for lithographic equipment, it is characterized in that: described total reflection device is a total reflection prism.
30, the alignment system that is used for lithographic equipment according to claim 1, it is characterized in that: described signal processor comprises:
Opto-electronic conversion and amplifier;
Analog to digital converter;
The signal processor that fits with two input ends;
The position data processor;
Position data conversion and sampling thief with two output terminals;
The base station motion controller; With
The work schedule controller;
The output signal of described alignment mark signal detector is imported described opto-electronic conversion and amplifier input terminal; The output terminal of described opto-electronic conversion and amplifier links to each other with the input end of described analog to digital converter; The output terminal of described analog to digital converter links to each other with a described input end that fits signal processor; The base station displacement signal is imported the input end of described position data conversion and sampling thief; Described position data conversion links to each other with the input end of described position data processor with an output terminal of sampling thief; The output terminal of described position data processor links to each other with described another input end that fits signal processor; Described position data conversion links to each other with the base station motion controller with another output terminal of sampling thief; Work schedule controller and opto-electronic conversion and amplifier, analog to digital converter, fit signal processor, position data processor, position data conversion and link to each other with the sequential port of sampling thief, base station motion controller.
31, the alignment system that is used for lithographic equipment according to claim 30 is characterized in that: described base station displacement signal is to be provided by two laser interferometer that are positioned at the orthogonal thereto distribution in base station plane and all aim at base station.
32, the alignment system that is used for lithographic equipment according to claim 31 is characterized in that: described base station displacement signal further comprises the output signal that is a vertical laser interferometer with described base station plane.
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