CN101329514B - System and method for aligning photolithography apparatus - Google Patents
System and method for aligning photolithography apparatus Download PDFInfo
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- CN101329514B CN101329514B CN 200810041152 CN200810041152A CN101329514B CN 101329514 B CN101329514 B CN 101329514B CN 200810041152 CN200810041152 CN 200810041152 CN 200810041152 A CN200810041152 A CN 200810041152A CN 101329514 B CN101329514 B CN 101329514B
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Abstract
The invention discloses an aligning system used for photoetching equipment and an aligning method; the invention adopts reference marks, the middle branch thereof is combination of bar grating and array which has the same period with the bar grating and takes the shape of diamond or other shapes so as to form new reference marks, thus realizing the aligning signal scanning in two directions, leading the signal-to-noise ratio and intensity of the aligning signal to be improved compared with the prior art and leading the energy utilization to be improved; the obtained aligning scanning signal does not have obvious inflexion point, thus being beneficial to the detection of post-signals and the processing of parts such as AGC gain, etc., effectively solving the problems in the prior art to a certain extent and improving the alignment precision.
Description
Technical field
The present invention relates to the alignment system and the alignment methods of lithographic equipment, particularly relate to lithographic equipment optical grating diffraction phenotypic marker alignment methods.
Background technology
Lithographic equipment of the prior art is mainly used in the manufacturing of integrated circuit (IC) or other microdevice.By lithographic equipment, the multilayer mask with different mask patterns is imaged on the wafer that is coated with photoresist under accurately aiming at successively, for example semiconductor wafer or LCD plate.Lithographic equipment is divided into two classes substantially, one class is the stepping lithographic equipment, the mask pattern single exposure is imaged on an exposure area of wafer, wafer moves with respect to mask subsequently, next exposure area is moved to mask pattern and projection objective below, again mask pattern is exposed in another exposure area of wafer, repeat the picture that this process all exposure areas on wafer all have mask pattern.Another kind of is the step-scan lithographic equipment, and in said process, mask pattern is not the single exposure imaging, but the scanning mobile imaging by the projection light field.In the mask pattern imaging process, mask and wafer move with respect to optical projection system and projected light beam simultaneously.
Critical step is with mask and wafer aligned in the lithographic equipment.After exposing on wafer, the ground floor mask pattern from device, removes, after the PROCESS FOR TREATMENT that wafer is correlated with, carry out the exposure of second layer mask pattern, but for guarantee second layer mask pattern and subsequently the picture of mask pattern mask and wafer accurately need be aimed at respect to the accurate location of exposed mask pattern image on the wafer.IC device by the photoetching technique manufacturing needs multiexposure, multiple exposure to form multilayer circuit in wafer, for this reason, requires the configuration alignment system in the lithographic equipment, realizes the accurate aligning of mask and wafer.When characteristic dimension requires more hour, the requirement of alignment precision and consequent requirement to alignment precision are become strict more.
The alignment system of lithographic equipment, its major function is to realize mask-wafer aligned before the alignment exposure, promptly measure the coordinate (XW of wafer in coordinate system of machine, YW, Φ WZ), and the coordinate (XR of mask in coordinate system of machine, YR, Φ RZ), and calculates the position of mask, to satisfy the requirement of alignment precision with respect to wafer.Prior art has two kinds of alignment scheme: a kind of is the TTL technique of alignment that sees through camera lens, the alignment mark of the periodic phase optical grating construction that laser lighting is provided with on wafer, diffraction light or scattered light by the collected wafer alignment marks of the projection objective of lithographic equipment shine on mask alignment mark, and this alignment mark can be amplitude or phase grating.Behind the mask mark detector is set, when scanning wafer under projection objective, surveys the light intensity that sees through the mask mark, the maximal value of detector output is represented correct alignment position.This aligned position provides zero reference for the position measurement of the laser interferometer that is used for monitoring wafer platform position and moves.Another kind is an OA off-axis alignment technology, is positioned at the reference mark of datum plate on a plurality of alignment marks on the wafer and the wafer station by the off-axis alignment systematic survey, realizes that wafer aligned and wafer station aim at; The reference mark of datum plate is aimed at mask alignment mark on the wafer station, realizes mask registration; The position relation of mask and wafer be can obtain thus, mask and wafer aligned realized.
At present, the most alignment so that adopts of lithographic equipment is a grating alignment.Grating alignment is meant that even illumination beam on the grating alignment mark diffraction takes place, and the emergent light behind the diffraction carries the full detail about alignment mark structure.Senior diffraction light scatters from the phase alignment grating with wide-angle, after filtering zero order light by spatial filter, gather diffraction light ± 1 order diffraction light, the perhaps raising that requires along with CD, gather multi-level diffraction light (comprising senior) simultaneously in picture plane interference imaging, through photodetector and signal Processing, determine the centering adjustment position.
A kind of situation of prior art is (referring to Chinese invention patent, application number: CN03164859.2, denomination of invention: the alignment system and the method that are used for etching system), the off-axis alignment system of a kind of 4f system architecture that Holland ASML company is adopted, this alignment system adopts ruddiness, green glow two-source illumination at the Lights section; And adopt voussoir array or wedge group to realize the overlapping and relevant of multi-level diffraction light; The registration signal of ruddiness and green glow is separated by a polarization beam splitter prism; By surveying the transmitted light intensity that the alignment mark picture sees through reference marker, obtain the registration signal of sinusoidal output.Adopt voussoir array or wedge to make up and realize the overlapping, relevant of multi-level diffraction light.The face type and the angle of wedge coherence request of two voussoirs that the positive and negative same stages of birefringence is inferior are very high; And the requirement of the processing and manufacturing of wedge group, assembling and adjustment is also very high, and the specific implementation engineering difficulty of getting up is bigger, costs dearly.
The situation of another kind of prior art is (referring to (2) Chinese invention patent, publication number: 200710044152.1, denomination of invention: a kind of alignment system that is used for lithographic equipment), this alignment system adopts has three periods phase grating of thickness combination, only utilize these three cycles ± the relevant picture of 1 order diffraction light is as registration signal, obtain high alignment precision when can realize big capture range, only use each cycle ± 1 order diffraction light, can obtain stronger signal intensity, improve system signal noise ratio, need not come separately senior diffraction components of multichannel by regulating devices such as wedges, simplify light path design and debugging difficulty, but alignment mark distribution in one line on silicon chip and datum plate in the alignment system, it all is unidirectional alignment mark, the corresponding reference mark is divided into eight branches, referring to Fig. 6 a, can bring a lot of deficiencies like this: alignment mark and corresponding reference marker take up room bigger, this makes that the energy of light source utilization factor is low, and factors such as photoetching process and silicon chip distortion are bigger to the influence of alignment precision; When the relevant picture of alignment mark diffracted beam scanned with reference marker, tangible flex point (referring to Fig. 6 b) appearred in the alignment scanning signal intensity that obtains, and this alignment scanning signal is unfavorable for relevant signal Processing such as later stage AGC gain; Since the reference marker medial fascicle when a scanning direction reference marker (a) the relevant picture of a mark optical grating diffraction light beam is scanned jointly in G3-a and two branches of G3-b (or G6-a and G6-b) referring to Fig. 6, these two branch's intermediate blanks partly do not have detection optical fiber and the photodetector after luminous energy enters reference marker, make that the intensity and the signal to noise ratio (S/N ratio) of alignment scanning signal are very low, and can cause two G3-a of reference marker branch and G3-b (or G6-a and G6-b) the phase place mismatch problem to occur, be unfavorable for alignment mark position alignment and signal Processing with respect to the relevant picture of alignment mark diffracted beam; Two minor cycle reference markers of same direction require to do little under the enough situation of registration signal energy as far as possible, but bring reference marker back detection optical fiber diameter to diminish simultaneously and the space difficult with the reference marker coupling.
Summary of the invention
The object of the present invention is to provide a kind of alignment system and alignment methods that is used for lithographic equipment,, improve the purpose of alignment precision to realize improving registration signal signal to noise ratio (S/N ratio) and intensity.
To achieve the above object, the invention provides a kind of alignment system that is used for lithographic equipment, comprise and aim at radiation source module, lighting module, alignment optical module and acquisition of signal module.The illuminating bundle that this aligning radiation source module is provided for aiming at; This lighting module transmits this illuminating bundle, has the alignment mark of three different cycles on described collimated illumination silicon chip or the datum plate; This alignment optical module collection alignment mark corresponding order of diffraction time light beam and coherent imaging are in the amplitude type reference marker position; The aligning light intensity signal through the modulation of amplitude type reference marker is surveyed and handled to this acquisition of signal module, obtains alignment mark center information.
This acquisition of signal module comprises amplitude type reference marker, photodetector and signal processing.This acquisition of signal module is passed through the scanning to the coherent imaging and the respective amplitudes type reference marker of alignment mark diffracted beam, survey and handle aligning light intensity signal through the modulation of amplitude type reference marker, aim at light intensity signal and transmit, utilize the phase information of the light intensity signal of modulating through the amplitude type reference marker to obtain alignment mark center information by the Transmission Fibers of tight connection amplitude type reference marker and photodetector.
This amplitude type reference marker can be along directions X be arranged in order X to first grating, X to the 3rd grating, X to second grating; Along the Y direction vertical with this directions X be arranged in order Y to first grating, Y to the 3rd grating, Y to second grating, described X has lap to the 3rd grating and described Y to the 3rd grating, this lap scans in order to realize X and Y both direction position; The grating of this amplitude type reference marker is arranged along the direction perpendicular to aligning direction.
This X is corresponding with the grating of described alignment mark to second grating to the 3rd grating, Y to first grating, Y to second grating, Y to the 3rd grating, X to first grating, X.
Described X to first grating, X to the 3rd grating, X to second grating, Y to first grating, Y to the 3rd grating, Y to second grating respectively to the coherent imaging scanning of the grating of alignment mark, obtain directions X first light signal, directions X second light signal, directions X the 3rd light signal, Y direction first light signal, Y direction second light signal, Y direction the 3rd light signal.
This amplitude type reference marker grating can equal the length of corresponding ± 1 grade of grating picture along the length of cycle direction, this amplitude type reference marker grating along the length of cycle direction can greater than correspondence ± length of 1 grade of grating picture, this amplitude type reference marker grating along the length of cycle direction can also less than correspondence ± length of 1 grade of grating picture.
This X can be made up of the rhombus array grating identical with the adjacent amplitude grating cycle to the lap of the 3rd grating with described Y to the 3rd grating; Can form by the square array grating identical with the adjacent amplitude grating cycle; Can be by forming with other array of shapes gratings of adjacent amplitude grating same period.
This X can increase or reduce to the number of cycles of rhombus array grating, square array grating or other array of shapes gratings of the lap of the 3rd grating to the 3rd grating and described Y according to signal gain adjustment or registration signal intensity needs.
The size of rhombus can or reduce according to signal gain adjustment or the increase of registration signal intensity needs in this rhombus array grating.
The branched structure relative position of this amplitude type reference marker can exchange as required or move.
This aligning radiation source module can be by the laser instrument of photoelectricity modulation, can comprise laser cell.This laser cell comprises phase-modulator and intensity modulator unit.This laser instrument can be gas laser, solid state laser, semiconductor laser or fiber laser.
This illuminating bundle comprises the laser lighting light beam of two discrete wavelength at least.This laser lighting light beam that comprises two discrete wavelength at least can adopt four discrete wavelength, and wherein has two wavelength at least near infrared or infrared band.
This alignment optical module comprises alignment optical system and light-dividing device.This light-dividing device utilizes the separately alignment of two kinds of different wave lengths of polarisation of light character.
The present invention also provides a kind of alignment methods that is used for lithographic equipment of using this system, may further comprise the steps: aim at radiation source irradiates through the lighting module transmission and to alignment mark, diffraction takes place, utilize alignment mark diffracted beam (± 1 grade or senior time) through alignment optical module coherent imaging, and utilizing the corresponding amplitude type reference marker of acquisition of signal module to obtain aiming at light intensity signal as carrying out signal intensity scanning to alignment mark is relevant, the aligning light intensity signal that obtains is transferred to the photodetector that is connected with Transmission Fibers through the accurate Transmission Fibers that is connected amplitude type reference marker back with the alignment scanning signal and surveys; Utilize photodetector to survey the phase information that obtains the alignment scanning signal and carry out position sensing and aligning.
This amplitude type reference marker can be along directions X be arranged in order X to first grating, X to the 3rd grating, X to second grating; Along the Y direction vertical with this directions X be arranged in order Y to first grating, Y to the 3rd grating, Y to second grating, described X has lap to the 3rd grating and described Y to the 3rd grating, this lap scans in order to realize X and Y both direction position; The grating of this amplitude type reference marker is arranged along the direction perpendicular to aligning direction.
This X is corresponding with the grating of described alignment mark to second grating to the 3rd grating, Y to first grating, Y to second grating, Y to the 3rd grating, X to first grating, X.
Described X to first grating, X to the 3rd grating, X to second grating, Y to first grating, Y to the 3rd grating, Y to second grating respectively to the coherent imaging scanning of the grating of alignment mark, obtain directions X first light signal, directions X second light signal, directions X the 3rd light signal, Y direction first light signal, Y direction second light signal, Y direction the 3rd light signal.
This amplitude type reference marker grating can equal the length of corresponding ± 1 grade of grating picture along the length of cycle direction, this amplitude type reference marker grating along the length of cycle direction can greater than correspondence ± length of 1 grade of grating picture, this amplitude type reference marker grating along the length of cycle direction can also less than correspondence ± length of 1 grade of grating picture.
This X can be made up of the rhombus array grating identical with the adjacent amplitude grating cycle to the lap of the 3rd grating with described Y to the 3rd grating; Can form by the square array grating identical with the adjacent amplitude grating cycle; Can be by forming with other array of shapes gratings of adjacent amplitude grating same period.
This X can increase or reduce to the number of cycles of the rhombus array grating of the lap of the 3rd grating, square array grating, other array of shapes gratings to the 3rd grating and described Y according to signal gain adjustment or registration signal intensity needs.
The size of rhombus can or reduce according to signal gain adjustment or the increase of registration signal intensity needs in this rhombus array grating.
The branched structure relative position of this amplitude type reference marker can exchange as required or move.
It is the bar shaped grating and the rhombus identical with the strip light grid cycle or the array combination of other shapes that alignment system that is used for lithographic equipment of the present invention and alignment methods have adopted amplitude type reference marker medial fascicle, form the amplitude type reference marker of new model, can realize the registration signal scanning of both direction, make to compare in registration signal signal to noise ratio (S/N ratio) and intensity and the prior art and be improved, capacity usage ratio is improved, tangible flex point does not appear in the alignment scanning signal that obtains, help processing partly such as later stage acquisition of signal and AGC gain, effectively solve the problem that occurs in the prior art to a certain extent, improved alignment precision.
Description of drawings
Fig. 1 is the used alignment system of lithographic equipment of the present invention and the total arrangement between the lithographic equipment, principle of work structural representation;
Fig. 2 a and Fig. 2 b are used alignment mark structure synoptic diagram in the prior art;
Fig. 3 is an embodiment of the present invention alignment system theory structure synoptic diagram;
Fig. 4 is an embodiment of the present invention alignment system spatial filter structural representation;
Fig. 5 is in the embodiment of the present invention alignment procedures, through the registration signal synoptic diagram after the gain process;
Fig. 6 a and Fig. 6 b are used reference marker structural representation and registration signal intensity maps in the prior art;
Fig. 7 a and Fig. 7 b are first embodiment of the invention reference marker structural representation and registration signal intensity map;
Fig. 8 is a second embodiment of the invention reference marker structural representation;
Fig. 9 a and Fig. 9 b are bar shaped reference marker structure and registration signal intensity map.
In the accompanying drawing: 1, illuminator; 2, mask; 3, mask platform; 4, projection optical system; 5, off-axis alignment system; 6, silicon chip; 7, silicon chip platform; 8, datum plate; 9, drive system; 10, catoptron; 11, laser interferometer; 12, master control system; 13, servo-drive system; 14, drive system; 15, laser interferometer; 16, catoptron; 200X, directions X alignment mark; 201, directions X first grating; 202, directions X second grating; 203, directions X the 3rd grating; 200Y, Y direction alignment mark; 204, Y direction first grating; 205, Y direction second grating; 206, Y direction the 3rd grating; 301, alignment; 302, light beam bundling device; 303, polarization maintaining optical fibre; 304, the polarizer; 305, lens; 306, illuminating aperture diaphragm; 307, lens; 308, reflecting prism; 309, flat board; 310, λ/4 wave plates; 311, object lens; 312, alignment mark; 313, reflecting surface; 314, beam splitter; 315, CCD lens; 316, CCD Transmission Fibers; 317, CCD; 318, Amici prism; 319, λ 2 spatial filters; 320, λ 2 lens combinations; 321, λ 2 reference markers; 322, λ 2 Transmission Fibers; 323, λ 2 photodetectors; 324, λ 1 spatial filter; 325, λ 1 lens combination; 326, λ 1 reference marker; 327, λ 1 Transmission Fibers; 328, λ 1 photodetector; 600, A reference marker; G1, AX first grating; G3, AX second grating; G3-a, AX the 3rd grating a; G3-b, AX the 3rd grating b; G4, AY first grating; G5, AY second grating; G6-a, AY the 3rd grating a; G6-b, AY the 3rd grating b; F1, G1 Transmission Fibers; F2, G2 Transmission Fibers; F3-a, G3-a Transmission Fibers; F3-b, G3-b Transmission Fibers; F4, G4 Transmission Fibers; F5, G5 Transmission Fibers; F6-a, G6-a Transmission Fibers; F6-b, G6-b Transmission Fibers; 700, B reference marker; 701, BX first grating; 703, BX second grating; 702, B the 3rd grating; 704, BY first grating; 705BY second grating; 706, BX Transmission Fibers a; 707, BX Transmission Fibers b; 708, B Transmission Fibers; 709, BY Transmission Fibers a; 710, BY Transmission Fibers b; 800, C reference marker; 801, CX first grating; 803, CX second grating; 802, C the 3rd grating; 804, CY first grating; 805, CY second grating; 806, CX Transmission Fibers a; 807, CX Transmission Fibers b; 808, C Transmission Fibers; 809, CY Transmission Fibers a; 810, CY Transmission Fibers b.
Embodiment
Further specify the present invention below in conjunction with accompanying drawing and embodiment.
Fig. 1 shows the alignment system of the used lithographic equipment of the present invention and the total arrangement between the lithographic equipment, principle of work structural representation.The formation of lithographic equipment comprises: the illuminator 1 that is used to provide exposing light beam; Be used to support the mask holder and the mask platform 3 of mask 2, the alignment mark RM that mask pattern is arranged on the mask 2 and have periodic structure; Be used for the mask pattern on the mask 2 is projected to the projection optical system 4 of silicon chip 6; Be used to support the silicon chip support and the silicon chip platform 7 of silicon chip 6, the datum plate 8 that is carved with reference mark FM is arranged on the silicon chip platform 7, the alignment mark of periodicity optical structure is arranged on the silicon chip 6; Be used for the off-axis alignment system 5 that mask and silicon chip are aimed at; The catoptron 10,16 and the laser interferometer 11,15 that are used for mask platform 3 and 7 position measurements of silicon chip platform, and by the mask platform 3 of master control system 12 controls and the servo-drive system 13 and the drive system 9,14 of silicon chip platform 7 displacements.
Wherein, illuminator 1 comprises that a light source, one make the lens combination of illumination homogenising, catoptron, a condenser (all not shown among the figure).As a light source cell, adopt KrF excimer laser (wavelength 248nm), ArF excimer laser (wavelength 193nm), F2 laser instrument (wavelength 157nm), Kr2 laser instrument (wavelength 146nm), Ar2 laser instrument (wavelength 126nm) or use ultrahigh pressure mercury lamp (g-line, i-line) etc.The exposing light beam IL of illuminator 1 uniform irradiation is radiated on the mask 2, includes the mark RM of mask pattern and periodic structure on the mask 2, is used for mask registration.Mask platform 3 can move in perpendicular to the X-Y plane of illuminator optical axis (overlapping with the optical axis AX of projection objective) through drive system 14, and moves with specific sweep velocity in predetermined direction of scanning (being parallel to X-direction).The position of mask platform 3 in plane of motion recorded by Doppler's two-frequency laser interferometer 15 precisions by the catoptron 16 that is positioned on the mask platform 3.The positional information of mask platform 3 sends to master control system 12 by laser interferometer 15 through servo-drive system 13, and master control system 12 drives mask platform 3 according to the positional information of mask platform 3 by drive system 14.
Projection optical system 4 (projection objective) is positioned at mask platform shown in Figure 13 belows, and its optical axis AX is parallel to Z-direction.Since adopt two core structures far away and have predetermined scale down as 1/5 or 1/4 refraction type or refractive and reflective optical system as projection optical system, so when the mask pattern on the exposing light beam illuminating mask 2 of illuminator 1 emission, the image that the circuit mask pattern becomes to dwindle on the silicon chip 6 that is coated with photoresist through projection optical system.
Fig. 2 is the structural representation of used alignment mark in the prior art.Alignment mark is marking groove (ScribeLane) alignment mark, and dutycycle is 1: 1 a phase grating structure, and wherein Fig. 2 a is used for the alignment mark 200X that directions X is aimed at.Directions X alignment mark 200X comprises the grating of three groups of different cycles: directions X first grating 201, directions X second grating 202 and directions X the 3rd grating 203, wherein the grating cycle of directions X first grating 201 is P1, the grating cycle of directions X second grating 202 is P2, and the grating cycle of directions X the 3rd grating 203 is P3.Three groups of gratings of directions X alignment mark 200X are arranged along the direction perpendicular to aligning direction.In addition, the position between three groups of gratings can be changed arbitrarily, and promptly the position of any one group of grating can exchange with other stop positions in three groups of gratings.To being used for two groups of large period gratings that same direction is aimed at: directions X first grating 201 and directions X second grating 202, select the different grating cycles can improve the capture range of alignment mark, capture range is expressed as P1 * P2/[2 (P1-P2)].Grating cycle P1, P2 are more or less the same, and (1 ± r%) P1, wherein the r value is between 5 to 15 generally to get P2=.For example, directions X 201 cycles of first grating are 13um, and directions X 202 cycles of second grating are 12um, and then capture range is 78um.Cycle P3＜the P1 of directions X the 3rd grating 203, and P3＜P2 are used for fine alignment.For example, the cycle of directions X the 3rd grating 203 can be 2 μ m.Cycle value between three groups of gratings will be mated mutually, promptly require filtering hole on filtering face be merely able to allow grating separately ± 1 order diffraction light transmission, other level time diffraction lights are owing to being blocked outside the filtering hole.
Equally, shown in Fig. 2 b, be used for alignment mark 200Y that the Y direction aims at and comprise that Y direction first grating 204, Y direction second grating 205 are identical with three groups of grating cycles of directions X alignment mark 200X respectively with 206, three groups of grating cycles of Y direction the 3rd grating.
Fig. 3 is an embodiment of the present invention alignment system theory structure synoptic diagram, and this alignment system mainly is made up of light source module, lighting module, image-forming module, detecting module, signal Processing and locating module (not illustrating among the figure) etc.Light source module mainly comprises light source, shutter, optoisolator and the radio frequency modulator (not illustrating among the figure) that two wavelength are provided.Lighting module comprises Transmission Fibers and lamp optical system.Image-forming module mainly comprises: the object lens 311 of large-numerical aperture, beam splitter 314, bi-directional beam divider 318, λ 2 spatial filters 319, λ 2 lens combinations 320 and λ 1 spatial filter 324, λ 1 lens combination 325.Detecting module comprises CCD Transmission Fibers 316, CCD camera 317, λ 2 reference markers 321, λ 2 Transmission Fibers 322, λ 2 photodetectors 323, λ 1 reference marker 326, λ 2 Transmission Fibers 327 and λ 2 photodetectors 328.Signal Processing and locating module mainly comprise photosignal conversion and amplification, analog to digital conversion and digital signal processing circuit etc.
The alignment system principle is: the alignment 301 of light source module output (comprises two kinds of choosing wavelengths, also can use simultaneously) enter light beam bundling device 302, be transferred to the polarizer 304 via monofilm polarization maintaining optical fibre 303, lens 305, illuminating aperture diaphragm 306 and lens 307, reflecting prism 308 on dull and stereotyped 309 impinges perpendicularly on the object lens 311 that achromatic λ/4 wave plates 310 enter large-numerical aperture (4F lens preceding group) then, light beam is assembled through the object lens 311 of large-numerical aperture and is shone on the silicon chip alignment mark 312 concurrent gaining interest and penetrate, 312 at different levels diffraction lights of alignment mark return along former road and enter beam splitter 314 through dull and stereotyped 309, beam splitter 314 reflexes to the CCD light path through CCD lens 315 with the sub-fraction diffraction light through plated film reflecting surface 313, CCD Transmission Fibers 316, image in and be used for observing the picture situation that is marked as on the CCD 317, another part diffraction light along the light path transmissive by 318 two kinds of wavelength light beams of Amici prism separately, enter different light paths respectively, through corresponding λ 2 spatial filters 319, λ 1 spatial filter 324, (what the present invention needed is respectively each grating ± 1 order diffraction light for the diffraction lighting level that select to need time, and by λ 2 lens combinations 320, λ 1 lens combination 325, (4F lens back group) become the corresponding order of diffraction time interference of light picture at λ 2 reference markers 321, on λ 1 reference marker 326, in the work stage scanning process, the alignment mark order of diffraction time interference image scanning λ 2 reference markers 321, λ 1 reference marker 326, through λ 2 Transmission Fibers 322, λ 1 Transmission Fibers 327 is surveyed the light signal that reference marker sees through, obtain the center of alignment mark by the phase information of light signal, through registration signal such as Fig. 5 of gain process.
Fig. 4 is used λ 2 spatial filters 319 of the present invention, the structural representation of λ 1 spatial filter 324, be divided into six filtering holes that vertical and horizontal both direction is arranged, be respectively applied for alignment mark first grating of both direction, second grating, the 3rd grating ± 1 order diffraction light filtering, promptly allow alignment mark first grating of both direction, second grating, the 3rd grating ± 1 order diffraction light passes through from corresponding filtering hole, other orders of diffraction are inferior to be blocked, owing to be used for first grating that the aligning scope is caught in the alignment mark, the cycle of two large period gratings of second grating differs very little, its ± that 1 order diffraction light beam is gone up distance at 4F system spectrum face (spatial filter position) is very near, so also can allow first grating, two large period gratings of second grating ± 1 order diffraction light beam passes through in same filtering hole.
The principal feature of this alignment system is, first grating, second grating and the 3rd grating by surveying alignment mark in image planes ± 1 order diffraction light coherent imaging is after the light intensity of reference marker modulation changes, and obtained the center of alignment mark by the phase information of optical signal transmissive.Wherein obtain the coarse position information of alignment mark, obtain the precise position information of alignment mark by the registration signal of the 3rd grating of alignment mark by the registration signal of first grating of alignment mark and second grating.
Fig. 5 is in the embodiment of the present invention alignment procedures, and through the registration signal intensity synoptic diagram after the gain process, the first light signal SP1 is the light intensity signal after the relevant picture of alignment mark first grating is modulated through reference marker; The second light signal SP2 is the light intensity signal after the relevant picture of alignment mark second grating is modulated through reference marker; The 3rd light signal SP3 is the light intensity signal after the relevant picture of alignment mark the 3rd grating is modulated through reference marker; Carry out the position by the phase information of the first light signal SP1 and the second light signal SP2 and catch, the phase information by the 3rd light signal SP3 carries out position alignment on this basis.
Fig. 6 is used reference marker structural representation and a registration signal scintigram in the prior art, A reference marker 600 among Fig. 6 a comprises eight groups of amplitude grating: AX, the first grating G1, the AX second grating G2, AX the 3rd grating aG3-a, AX the 3rd grating bG3-b, the AY first grating G4, the AY second grating G5, AY the 3rd grating aG6-a and AY the 3rd grating bG6-b, the AX first grating G1, the AX second grating G2 corresponds respectively to directions X first grating 201 of directions X alignment mark 200X, diffraction ± 1 of directions X second grating 202 grade grating picture, AX the 3rd grating aG3-a, AX the 3rd grating bG3-b is corresponding to the diffraction ± 1 grade grating picture of directions X the 3rd grating 203 of directions X alignment mark 200X, the AY first grating G4, the AY second grating G5 corresponds respectively to Y direction first grating 204 of Y direction alignment mark 200Y, diffraction ± 1 of Y direction second grating 205 grade grating picture, AY the 3rd grating aG6-a and AY the 3rd grating bG6-b are corresponding to the diffraction ± 1 grade grating picture of Y direction the 3rd grating 206 of Y direction alignment mark 200Y.Eight groups of amplitude gratings along the length of cycle direction can be slightly less than or also can greater than correspondence ± length of 1 grade of grating picture.Be respectively arranged with the Transmission Fibers bundle behind eight groups of amplitude gratings, comprise F1, F2, F3-a, F3-b, F4, F5, F6-a and F6-b, respectively corresponding G1 Transmission Fibers, G2 Transmission Fibers, G3-a Transmission Fibers, G3-b Transmission Fibers, G4 Transmission Fibers, G5 Transmission Fibers, G6-a Transmission Fibers, G6-b Transmission Fibers; The transmitted light of respectively organizing grating of reference marker is transferred to the corresponding photo detector array, wherein the alignment scanning signal light intensity that obtains of G3-a Transmission Fibers and G3-b Transmission Fibers lumps together as one road signal, and the alignment scanning signal light intensity that G6-a Transmission Fibers and G6-b Transmission Fibers obtain lumps together as one road signal.In directions X alignment mark 200X and Y direction alignment mark 200Y alignment scanning process, obtain the registration signal of alignment mark x and y direction.
Fig. 6 b is registration signal (the synthetic alignment scanning signal of only drawn A reference marker directions X AX direction the 3rd grating G3-a and AX direction the 3rd grating G3-b that corresponding reference marker modulation phase answers alignment mark to be concerned with and to obtain as light intensity, the Y direction is identical), horizontal ordinate is the scanning position value among the figure, unit is μ m, ordinate is the signal scanning signal strength values, unit represents with random quantity, for as can be seen from the figure in intermediate alignment position part, alignment scanning signal light intensity maximal value is 3.9 * 104 (a.u), alignment scanning signal light intensity minimum value is 0.9 * 104 (a.u), the effective range that is the alignment scanning signal is 0.9 * 104-3.9 * 104 (a.u), as can be seen from the figure tangible flex point appears in registration signal light intensity in scanning process in addition, the processing such as later stage signal AGC gain that this situation is unfavorable for the alignment scanning signal occur.
AGC (Automatic Gain Control) is the automatic gain control of registration signal, promptly according to the rate of change of prescan alignment scanning signal intensity as the AGC gain factor, adjust the output signal strength of corresponding detection channels, be used in and aim at the signal intensity catch with fine alignment and be consistent, and be a constant, the purpose of doing like this is exactly in order to make the signal intensity unanimity of each detection channels output, to be convenient to utilize signal phase to carry out coarse alignment and fine alignment.
AGC gain requires sweep signal consistent as far as possible from beginning to scan the signal intensity maximum process change in signal strength rate, be that significantly strange point can not appear in sweep signal, guarantee that with this output signal strength of the gain factor that obtains according to prescan and corresponding each passage keeps coordinating.
Fig. 7 is the structural representation and the registration signal scintigram of first embodiment of the invention B reference marker 700; Fig. 7 a is a B reference marker 700, by BX first grating 701, BX second grating 703, B the 3rd grating 702, BY first grating 704 and BY second grating 705, BX Transmission Fibers a 706, BX Transmission Fibers b 707, B Transmission Fibers 708, BY Transmission Fibers a 709, BY Transmission Fibers b710 forms, among B reference marker 700 the 3rd grating 702 corresponding directions X alignment mark 200X among directions X the 3rd grating 203 or the Y direction alignment mark 200Y Y direction the 3rd grating 206 ± the relevant picture of 1 order diffraction light, in order to take into account the scanning of registration signal both direction, B the 3rd grating 702 both direction laps (being the part of prior art empty) are designed to the rhombus array format in the B reference marker 700, cycle is identical with the adjacent bar grating, the purpose of doing like this is in order to have utilized luminous energy to greatest extent, can to have realized the registration signal scanning of both direction.
Fig. 7 b is registration signal (the reference marker directions X alignment scanning of only the drawing signal that corresponding reference marker B the 3rd grating 702 registration signal scanning obtains, the Y direction is identical), horizontal ordinate is the scanning position value among the figure, unit is μ m, ordinate is the signal scanning signal strength values, unit represents with random quantity, as can be seen from the figure in intermediate alignment position part, alignment scanning signal light intensity maximal value is 7 * 104, alignment scanning signal light intensity minimum value is 2.1 * 104, the effective range that is the alignment scanning signal is 2.1 * 104-7 * 104, as can be seen from the figure tangible flex point does not appear in registration signal light intensity in scanning process in addition, with among Fig. 6 b more as can be seen the alignment scanning signal shape significantly better than Fig. 6 b, the later stage gain that helps the alignment scanning signal waits processing, big in obviously than Fig. 6 b in the signal intensity of scanning center and scope, the photodetector behind the mark that is convenient for reference carries out acquisition of signal.
Fig. 8 is the structural representation of second embodiment of the invention reference marker C 800; By CX first grating 801, CX second grating 803, C the 3rd grating 802, CY first grating 804 and CY second grating 805, CX Transmission Fibers a 806, CX Transmission Fibers b 807, C Transmission Fibers 808, CY Transmission Fibers a 809, CY Transmission Fibers b 810 form, compare with Fig. 7 first embodiment B reference marker 700, both direction lap (being the part of prior art empty) is designed to the square array form in the middle of C the 3rd grating 802, and the cycle is identical with the adjacent bar grating.
Fig. 9 a is the conventional strip reference marker, Fig. 9 b is the registration signal scanning result of Fig. 9 a, horizontal ordinate is the scanning position value among the figure, unit is μ m, ordinate is the signal scanning signal strength values, unit represents that with random quantity the effective range of intermediate alignment position alignment sweep signal is 1.8 * 104-7.5 * 104.Signal intensity and scope are bigger than the sweep signal among Fig. 7, and the shape of signal also more helps signal later stage gain process, but its significant disadvantages is to realize the scanning of both direction.
B reference marker 700 among Fig. 7, Fig. 8, the structure of C reference marker 800 are the characteristics that combine bar shaped grating and rhombus (square) array grating, improve the intensity and the scope of signal to greatest extent, and make sweep signal flex point or the little flex point that does not influence AGC gain adjustment not occur.
Though disclose the preferred embodiments of the present invention, those skilled in the art will appreciate that under the situation that does not deviate from disclosed scope of the present invention in claims any various modifications, interpolation and replacement all belong to protection scope of the present invention.
Claims (21)
1. an alignment system that is used for lithographic equipment is characterized in that, described alignment system comprises:
Aim at radiation source module;
Lighting module;
The alignment optical module; With
The acquisition of signal module;
Described acquisition of signal module comprises amplitude type reference marker, photodetector and signal processing;
The illuminating bundle that described aligning radiation source module is provided for aiming at; Described lighting module transmits described illuminating bundle, has the alignment mark of three different cycles on this illuminating bundle collimated illumination silicon chip or the datum plate; Described alignment optical module is gathered the corresponding order of diffraction of described alignment mark time light beam and coherent imaging in described amplitude type reference marker position; Described acquisition of signal module is passed through the scanning to the coherent imaging and the respective amplitudes type reference marker of described alignment mark diffracted beam, survey and handle aligning light intensity signal through described amplitude type reference marker modulation, this aligning light intensity signal is transmitted by the Transmission Fibers of described amplitude type reference marker of tight connection and described photodetector, utilizes the phase information of the aligning light intensity signal of modulating through described amplitude type reference marker to obtain described alignment mark center information;
Described amplitude type reference marker comprise along directions X be arranged in order X to first grating, X to the 3rd grating, X to second grating; Along the Y direction vertical with described directions X be arranged in order Y to first grating, Y to the 3rd grating, Y to second grating; Described X has lap to the 3rd grating and described Y to the 3rd grating, and this lap is in order to realize the scanning of X and Y both direction position.
2. the alignment system that is used for lithographic equipment according to claim 1 is characterized in that: the grating of described amplitude type reference marker is arranged along the direction perpendicular to aligning direction;
Described X is corresponding to second grating to the 3rd grating, Y to first grating, Y to second grating, Y to the 3rd grating, X to first grating, X with the X of described alignment mark respectively to second grating to the 3rd grating, Y to first grating, Y to second grating, Y to the 3rd grating, X to first grating, X;
Described X to first grating, X to the 3rd grating, X to second grating, Y to first grating, Y to the 3rd grating, Y to second grating respectively to the coherent imaging scanning of the grating of alignment mark, obtain directions X first light signal, directions X second light signal, directions X the 3rd light signal, Y direction first light signal, Y direction second light signal, Y direction the 3rd light signal.
3. the alignment system that is used for lithographic equipment according to claim 2, it is characterized in that: described amplitude type reference marker grating along the length of cycle direction more than or equal to correspondence ± length of 1 grade of grating picture, or described amplitude type reference marker grating along the length of cycle direction less than correspondence ± length of 1 grade of grating picture.
4. the alignment system that is used for lithographic equipment according to claim 1 is characterized in that: described X is made up of the rhombus array grating identical with the adjacent amplitude grating cycle to the lap of the 3rd grating with described Y to the 3rd grating; Perhaps form by the square array grating identical with the adjacent amplitude grating cycle; Perhaps by forming with other array of shapes gratings of adjacent amplitude grating same period.
5. the alignment system that is used for lithographic equipment according to claim 4 is characterized in that: described X increases or reduces according to signal gain adjustment or registration signal intensity needs to the number of cycles of rhombus array grating, square array grating or other array of shapes gratings of the lap of the 3rd grating to the 3rd grating and described Y.
6. the alignment system that is used for lithographic equipment according to claim 4 is characterized in that: the size of rhombus increases according to signal gain adjustment or registration signal intensity needs or reduces in the described rhombus array grating.
7. the alignment system that is used for lithographic equipment according to claim 1 is characterized in that: the branched structure relative position of described amplitude type reference marker exchanges as required or moves.
8. the alignment system that is used for lithographic equipment according to claim 1 is characterized in that: described aligning radiation source module is by the laser instrument of photoelectricity modulation, perhaps comprises laser cell.
9. the alignment system that is used for lithographic equipment according to claim 8 is characterized in that: described laser cell comprises phase-modulator and intensity modulator unit.
10. the alignment system that is used for lithographic equipment according to claim 8 is characterized in that: described laser instrument is gas laser, solid state laser, semiconductor laser or fiber laser.
11. the alignment system that is used for lithographic equipment according to claim 1 is characterized in that: described illuminating bundle comprises the laser lighting light beam of two discrete wavelength at least.
12. the alignment system that is used for lithographic equipment according to claim 11 is characterized in that: the described laser lighting light beam that comprises two discrete wavelength at least adopts four discrete wavelength, and wherein has two wavelength at least near infrared or infrared band.
13. the alignment system that is used for lithographic equipment according to claim 1 is characterized in that: described alignment optical module comprises alignment optical system and light-dividing device.
14. the alignment system that is used for lithographic equipment according to claim 13 is characterized in that: described light-dividing device utilizes the separately alignment of two kinds of different wave lengths of polarisation of light character.
15. alignment methods of using the described system of claim 1, it is characterized in that, may further comprise the steps: aim at radiation source irradiates through the lighting module transmission and to alignment mark, diffraction takes place, the alignment mark diffracted beam is through alignment optical module coherent imaging, described alignment mark diffracted beam is ± 1 grade or senior time, the acquisition of signal module is passed through the scanning to the coherent imaging and the respective amplitudes type reference marker of described alignment mark diffracted beam, survey and handle the aligning light intensity signal through described amplitude type reference marker modulation, described aligning light intensity signal is transferred to the photodetector that is connected with Transmission Fibers through the Transmission Fibers that is connected amplitude type reference marker back and surveys; The phase information of utilizing photodetector to survey the aligning light intensity signal that obtains is carried out position sensing and aligning;
Utilize the phase information of the aligning light intensity signal of two large period gratings surveying the alignment mark that obtains to obtain a capture range, utilize the phase information of the aligning light intensity signal of the minor cycle grating of surveying the alignment mark that obtains in described capture range, to aim at.
16. alignment methods according to claim 15 is characterized in that: the grating of described amplitude type reference marker is arranged along the direction perpendicular to aligning direction;
Described X is corresponding to second grating to the 3rd grating, Y to first grating, Y to second grating, Y to the 3rd grating, X to first grating, X with the X of described alignment mark respectively to second grating to the 3rd grating, Y to first grating, Y to second grating, Y to the 3rd grating, X to first grating, X;
Described X to first grating, X to the 3rd grating, X to second grating, Y to first grating, Y to the 3rd grating, Y to second grating respectively to the coherent imaging scanning of the grating of alignment mark, obtain directions X first light signal, directions X second light signal, directions X the 3rd light signal, Y direction first light signal, Y direction second light signal, Y direction the 3rd light signal.
17. alignment methods according to claim 16, it is characterized in that: described amplitude type reference marker grating along the length of cycle direction more than or equal to correspondence ± length of 1 grade of grating picture, or described amplitude type reference marker grating along the length of cycle direction less than correspondence ± length of 1 grade of grating picture.
18. alignment methods according to claim 15 is characterized in that: described X is made up of the rhombus array grating identical with the adjacent amplitude grating cycle to the lap of the 3rd grating with described Y to the 3rd grating; Perhaps form by the square array grating identical with the adjacent amplitude grating cycle; Perhaps by forming with other array of shapes gratings of adjacent amplitude grating same period.
19. alignment methods according to claim 18 is characterized in that: described X increases or reduces according to signal gain adjustment or registration signal intensity needs to the number of cycles of rhombus array grating, square array grating or other array of shapes gratings of the lap of the 3rd grating to the 3rd grating and described Y.
20. alignment methods according to claim 18 is characterized in that: the size of rhombus increases according to signal gain adjustment or registration signal intensity needs or reduces in the described rhombus array grating.
21. alignment methods according to claim 15 is characterized in that: the branched structure relative position of described amplitude type reference marker exchanges as required or moves.
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101581889B (en) * | 2009-01-15 | 2014-05-21 | 上海微电子装备有限公司 | Alignment mark, alignment system and alignment method for photomask processor |
| CN101510055B (en) * | 2009-03-13 | 2011-05-11 | 上海微电子装备有限公司 | Alignment system and alignment method for photolithography equipment |
| DE102009032210B4 (en) * | 2009-07-03 | 2011-06-09 | Kleo Ag | processing plant |
| KR20120058572A (en) * | 2009-08-24 | 2012-06-07 | 에이에스엠엘 네델란즈 비.브이. | Metrology method and apparatus, lithographic apparatus, lithographic processing cell and substrate comprising metrology targets |
| CN102096347B (en) * | 2009-12-10 | 2012-06-20 | 上海微电子装备有限公司 | Alignment scanning method for alignment mark |
| CN101916040B (en) * | 2010-07-14 | 2012-09-05 | 中国科学院光电技术研究所 | Focus detection system suitable for projection lithography system |
| CN101976021B (en) * | 2010-10-12 | 2012-11-14 | 上海微电子装备有限公司 | Installation and adjustment device and method for alignment system reference board and detection optical fiber |
| CN102096348B (en) * | 2010-12-09 | 2013-01-02 | 西安交通大学 | Digital Moire fringe method for improving quality of Moire fringe images in imprinting alignment process |
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| CN103197505B (en) * | 2012-01-10 | 2015-09-30 | 上海微电子装备有限公司 | Add up based on mark cycle level time light intensity value and judge to find method and the alignment system of alignment mark |
| SG11201503261TA (en) * | 2012-11-19 | 2015-05-28 | Asml Netherlands Bv | Position measurement system, grating for a position measurement system and method |
| CN104078446B (en) * | 2013-03-27 | 2016-12-07 | 中芯国际集成电路制造(上海)有限公司 | Bonding alignment mark and the method calculating side-play amount |
| CN103411859B (en) * | 2013-07-30 | 2016-05-11 | 北京航空航天大学 | A kind of centralising device and method for forward direction diffraction light luminous intensity distribution measurement |
| JP7182904B2 (en) * | 2018-05-31 | 2022-12-05 | キヤノン株式会社 | Detection device, imprinting device, flattening device, detection method, and article manufacturing method |
| CN111505914B (en) * | 2019-01-31 | 2021-06-25 | 上海微电子装备（集团）股份有限公司 | Optical alignment device and photoetching system |
| CN112213836B (en) * | 2020-09-21 | 2021-08-17 | 中国科学院西安光学精密机械研究所 | Long-distance alignment method for grating array of satellite-borne double-grating modulation type imaging instrument |
| CN112099121B (en) * | 2020-09-29 | 2022-07-22 | 北京华卓精科科技股份有限公司 | Scanning interference photoetching system based on 4f system |
| CN112445088A (en) * | 2020-12-04 | 2021-03-05 | 百及纳米科技(上海)有限公司 | Stepping photoetching machine, working method thereof and graph alignment device |
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