CN104205325A - 自带散热器的功率模块用基板、自带冷却器的功率模块用基板以及功率模块 - Google Patents
自带散热器的功率模块用基板、自带冷却器的功率模块用基板以及功率模块 Download PDFInfo
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- CN104205325A CN104205325A CN201380016914.0A CN201380016914A CN104205325A CN 104205325 A CN104205325 A CN 104205325A CN 201380016914 A CN201380016914 A CN 201380016914A CN 104205325 A CN104205325 A CN 104205325A
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- power module
- module substrate
- radiator
- metal level
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- 239000000758 substrate Substances 0.000 title claims abstract description 104
- 229910052751 metal Inorganic materials 0.000 claims abstract description 80
- 239000002184 metal Substances 0.000 claims abstract description 80
- 229910000679 solder Inorganic materials 0.000 claims abstract description 62
- 239000000919 ceramic Substances 0.000 claims abstract description 44
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 41
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 41
- 229910052802 copper Inorganic materials 0.000 claims abstract description 20
- 239000010949 copper Substances 0.000 claims abstract description 20
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000006104 solid solution Substances 0.000 claims abstract description 19
- 229910000881 Cu alloy Inorganic materials 0.000 claims abstract description 12
- 239000004411 aluminium Substances 0.000 claims description 38
- 239000000243 solution Substances 0.000 claims description 14
- 229910052718 tin Inorganic materials 0.000 abstract description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 2
- 238000010438 heat treatment Methods 0.000 description 33
- 230000001351 cycling effect Effects 0.000 description 14
- 239000012071 phase Substances 0.000 description 11
- 239000004065 semiconductor Substances 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 238000001816 cooling Methods 0.000 description 5
- 230000004087 circulation Effects 0.000 description 4
- 230000001419 dependent effect Effects 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 229910018125 Al-Si Inorganic materials 0.000 description 3
- 229910018520 Al—Si Inorganic materials 0.000 description 3
- 229910020836 Sn-Ag Inorganic materials 0.000 description 3
- 229910020988 Sn—Ag Inorganic materials 0.000 description 3
- 238000005219 brazing Methods 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000945 filler Substances 0.000 description 3
- 239000007791 liquid phase Substances 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 229910017944 Ag—Cu Inorganic materials 0.000 description 2
- 229910017083 AlN Inorganic materials 0.000 description 2
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 2
- 229910020935 Sn-Sb Inorganic materials 0.000 description 2
- 229910008757 Sn—Sb Inorganic materials 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 230000001052 transient effect Effects 0.000 description 2
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 229910018956 Sn—In Inorganic materials 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 1
- 238000004881 precipitation hardening Methods 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
Classifications
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- H01L23/3735—Laminates or multilayers, e.g. direct bond copper ceramic substrates
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- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K7/00—Constructional details common to different types of electric apparatus
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- H01L23/40—Mountings or securing means for detachable cooling or heating arrangements ; fixed by friction, plugs or springs
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- H01L23/46—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements involving the transfer of heat by flowing fluids
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/06—Thermal details
- H05K2201/066—Heatsink mounted on the surface of the printed circuit board [PCB]
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Dispersion Chemistry (AREA)
- Thermal Sciences (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Cooling Or The Like Of Electrical Apparatus (AREA)
Abstract
本发明的自带散热器的功率模块用基板,具备:功率模块用基板(10),具有陶瓷基板(11)、电路层(12)及金属层(13);及散热器(18),通过焊料层(17)而与金属层(13)接合,并且由铜或铜合金构成。金属层(13)通过Al含量为99.0质量%以上且99.85质量%以下的铝板接合于陶瓷基板(11)而形成,焊料层(17)由固溶硬化型焊材形成,该固溶硬化型焊材含有作为主成分的Sn及固溶于该Sn的母相中的固溶元素。
Description
技术领域
本发明涉及一种自带散热器的功率模块用基板、具备该自带散热器的功率模块用基板的自带冷却器的功率模块用基板以及功率模块,所述自带散热器的功率模块用基板具备:功率模块用基板,在陶瓷基板的一面配设有电路层,并且在所述陶瓷基板的另一面配设有由铝构成的金属层;及散热器,由铜或铜合金构成。
本申请主张基于2012年03月30日在日本申请的专利申请2012-082997号的优先权,其内容援用于本说明书中。
背景技术
在半导体元件中用于电力供给的功率元件,由于发热量比较高,因此作为搭载该功率元件的基板,例如专利文献1~4所示,广泛应用功率模块用基板,该功率模块用基板在陶瓷基板的一面接合有作为电路层的铝金属板,而在陶瓷基板的另一面接合有作为金属层的铝金属板。
这些功率模块用基板中,在金属层的另一面侧通过焊料层而接合有铜制散热板(散热器)。并且,该散热板通过螺钉等而固定于冷却器。
上述功率模块中,在进行使用时会有热循环负载。在此,当功率模块用基板上有热循环负载的情况下,介于金属层与散热板(散热器)之间的焊料层上会累积应变,在焊料层有可能产生龟裂。
于是,以往以铝含量为99.99质量%以上的4N铝等变形阻力比较小的铝来构成金属层,由此通过金属层的变形来吸收上述应变,实现防止焊料层中产生龟裂。
在此,针对介于由4N铝构成的金属层与由铜构成的散热板(散热器)之间的焊料层,计算其内部的应变分布的结果,确认到应变会分布于整个金属层,应变广泛分散,应变量的峰值变低。
专利文献1:日本专利公开2004-152969号公报
专利文献2:日本专利公开2004-153075号公报
专利文献3:日本专利公开2004-200369号公报
专利文献4:日本专利公开2004-207619号公报
然而,如上所述,通过4N铝等变形阻力较小的铝而形成金属层的情况下,焊料层在宽范围内产生龟裂,金属层与散热器的接合变得不充分,从而有可能导致热循环负载后热阻上升。推测这是因为在热循环负载时,金属层变形至必要以上的程度,导致对与散热器之间的焊料层进一步负载应变,虽然特意使应变广泛分散,应变量也无法充分减低。
尤其,近年来,伴随功率模块的小型化、薄型化的发展,其使用环境也逐渐变得苛刻,来自半导体元件等电子部件的发热量变大,因此热循环的温度差大,有焊料层在宽范围地产生龟裂的倾向。
并且,作为介于金属层与散热器之间的焊料层,近年来,使用例如Sn-Ag系或Sn-Ag-Cu系的无铅焊材。这些焊材为析出硬化型焊材,其通过由Sn-Ag金属间化合物构成的析出物分散于Sn的母相中而硬化。由这些焊材构成的焊料层,由于析出物的粒径或分散状态通过热循环而变化,因此有焊料层的强度对热不稳定的问题。
发明内容
本发明是鉴于所述情况而完成的,其目的在于提供一种能够抑制介于由铝构成的金属层与由铜构成的散热器之间的焊料层中龟裂的产生以及加剧,且接合可靠性优异的自带散热器的功率模块用基板、具备该自带散热器的功率模块用基板的自带冷却器的功率模块用基板以及功率模块。
为了解决该问题,本发明人等经深入研究结果,发现在金属层中通过使用铝的纯度为99.0质量%以上且99.85质量%以下(所谓的2N铝)的铝板,与使用4N铝的铝板时相比较,可抑制金属层的变形。并且,针对介于由2N铝构成的金属层与由铜构成的散热器之间的焊料层,计算出其内部的应变分布的结果,发现在金属层的周缘部应变量变高,在金属层内侧区域应变量变低。
本发明是根据这些见解而完成的,本发明所涉及的自带散热器的功率模块用基板具备:功率模块用基板,其具备陶瓷基板、配设于所述陶瓷基板的一面的电路层、及配设于所述陶瓷基板的另一面的由铝构成的金属层;及散热器,通过焊料层而接合于该金属层的另一面侧,且由铜或铜合金构成,其中,所述金属层通过Al含量为99.0质量%以上且99.85质量%以下的铝板接合于所述陶瓷基板而形成,所述焊料层通过固溶硬化型焊材而形成,该固溶硬化型焊材含有作为主成分的Sn和固溶于该Sn的母相中的固溶元素。
根据具有该结构的自带散热器的功率模块用基板,所述金属层通过Al含量为99.0质量%以上且99.85质量%以下的铝板接合于所述陶瓷基板而形成,因此冷热循环负载后金属层不易变形,能够抑制焊料层中产生龟裂。另一方面,若Al含量小于99.0质量%,则Al的塑性变形不充分,无法获得充分的应力缓冲效果。由此,因陶瓷或焊料层中产生龟裂的原因而导致冷热循环后的接合率降低。并且,若超过99.85质量%,则冷热循环负载后因金属层的变形而在焊料层中产生龟裂,导致接合率降低。基于这些理由,将Al含量设为99.0质量%以上且99.85质量%以下的范围。
此外,由于焊料层通过固溶硬化型焊材而形成,该固溶硬化型焊材含有作为主成分的Sn和固溶于该Sn的母相中的固溶元素,因此焊料层母相的强度变高。并且,即使在冷热循环负载的情况下,强度也得到确保。从而,在金属层的周缘部,即使焊料层中产生龟裂,也能够抑制该龟裂加剧至金属层的内侧区域。
另外,在构成金属层铝板中,Al含量为99.0质量%以上且99.85质量%以下,主要的杂质可例举为Fe、Cu、Si。
在此,所述焊料层优选通过含有作为所述固溶元素的Sb的焊材而形成。
该情况下,Sb固溶于Sn的母相中,由此焊料层的强度可靠地提高,并且对热也稳定。从而,能够可靠地抑制在金属层的周缘部产生的龟裂的加剧。另外,通过Sb固溶于Sn中而强度充分地提高,由此也可以含有其他生成析出物的元素。即,即使析出物的粒径或分散状态因冷热循环而改变,也能够通过Sb的固溶硬化而确保Sn母相的强度,并能够抑制龟裂的加剧。
另外,所述散热器优选由抗拉强度为250MPa以上的铜或铜合金构成。
该情况下,由于散热器不易塑性变形,因此散热器在弹性变形区域变形。由此,能够抑制散热器以翘曲的方式塑性变形,并能够将散热器紧密接合于冷却器而层叠配置。
另外,作为散热器,包括板状的散热板、内部有制冷剂流通的冷却器、形成有散热片的液冷或空冷散热器以及热管等以通过发散热量而降低温度为目的的金属部件。
本发明所涉及的自带冷却器的功率模块用基板,具备所述自带散热器的功率模块用基板、以及在所述散热器的另一面侧层叠配置的冷却器。
根据该结构的自带冷却器的功率模块用基板,由于具备热传导性优异的铜制散热器,因此能够使来自功率模块用基板的热量有效地扩散并发散。并且,抑制介于金属层与冷却器之间的焊料层中龟裂的产生及加剧,因此能够使功率模块用基板一侧的热量可靠地传导至冷却器。
本发明所涉及的功率模块,具备所述自带散热器的功率模块用基板、以及搭载于该自带散热器的功率模块用基板上的电子部件。
根据该结构的功率模块,能够抑制形成于金属层与冷却器之间的焊料层中龟裂的产生及加剧,因此能够使其可靠性显著提高。
根据本发明,能够提供一种能够抑制介于由铝构成的金属层与由铜构成的散热器之间的焊料层中龟裂的产生及加剧且接合可靠性优异的自带散热器的功率模块用基板、具备该自带散热器的功率模块用基板的自带冷却器的功率模块用基板以及功率模块。
附图说明
图1为本发明的实施方式的功率模块的概略说明图。
图2为表示本发明的实施方式的自带散热器的功率模块用基板的说明图。
图3为表示本发明的实施方式的自带散热器的功率模块用基板的制造方法的说明图。
具体实施方式
以下,参考附图,说明本发明的实施方式。
图1示出本发明的实施方式的自带散热器的功率模块用基板以及功率模块。
该功率模块1具备自带散热器的功率模块用基板20、半导体芯片3及冷却器40。自带散热器的功率模块用基板20具备:功率模块用基板10,配设有电路层12及金属层13;及散热板18,通过焊料层17接合于金属层13的另一面(图1中为下表面)。半导体芯片3通过芯片用焊料层2而接合于电路层12的一面(图1中为上表面)。冷却器40配设于散热板18的另一面侧。另外,在本实施方式中,作为散热器而使用了散热板18。
此处,芯片用焊料层2例如为Sn-Ag系、Sn-In系或Sn-Ag-Cu系焊材。另外,在本实施方式中,在电路层12与芯片用焊料层2之间设有镀Ni层(未图示)。
如图1及图2所示,功率模块用基板10具备:构成绝缘层的陶瓷基板11;电路层12,配设于该陶瓷基板11的一面(图2中为上表面);及金属层13,配设于陶瓷基板11的另一面(图2中为下表面)。即,陶瓷基板11具有第一面(一表面)及第二面(另一表面),在陶瓷基板11的第一面配设有电路层,在陶瓷基板11的第二面配设有金属层。
陶瓷基板11防止电路层12与金属层13之间的电连接,其由绝缘性高的AlN(氮化铝)构成。并且,陶瓷基板11的厚度设定在0.2~1.5mm的范围内,在本实施方式中设定为0.635mm。另外,在本实施方式中,如图1及图2所示,陶瓷基板11的宽度设定成比电路层12及金属层13的宽度宽。
如图3所示,电路层12通过在陶瓷基板11的第一面(图3中为上表面)接合具有导电性的金属板22而形成。在本实施方式中,电路层12通过由铝含量为99.99质量%以上的铝(所谓的4N铝)的轧制板构成的金属板22接合于陶瓷基板11上而形成。
另外,如后面所述,金属板22与陶瓷基板11通过Al-Si系钎料而接合。由此,在电路层12中与陶瓷基板11的界面附近,形成有Si扩散的界面邻近层12A。在该界面邻近层12A中,有时铝的含量小于99.99质量%。
如图3所示,金属层13通过金属板23接合于陶瓷基板11的第二面(图3中为下表面)而形成。
在本实施方式中,金属层13通过由铝含量为99.0质量%以上且99.85质量%以下的铝(所谓的2N铝)的轧制板构成的金属板23接合于陶瓷基板11而形成。
另外,如后面所述,金属板23与陶瓷基板11通过Al-Si系钎料接合。由此,在金属层13中与陶瓷基板11之间的界面附近形成有Si扩散的界面邻近层13A。在该界面邻近层13A中,有时铝的含量小于99.0质量%。
散热板18将来自所述功率模块用基板10的热量朝表面方向扩散,其由热传导性优异的铜或铜合金构成。
此处,在本实施方式中,散热板18由杨氏模量为130GPa以下,且抗拉强度为250MPa以上的铜或铜合金构成。具体而言,散热板18由Cu-0.04质量%Ni-0.17质量%Co-0.05质量%P-0.1质量%Sn(CDA No.C18620)构成,杨氏模量为125GPa、抗拉强度为250MPa以上。
如图1所示,冷却器40具备用于使冷却介质(例如冷却水)流通的流路41。冷却器40理想的是由热传导性良好的材质构成,在本实施方式中,以A6063(铝合金)构成。
另外,如图1所示,散热板18与冷却器40通过固定螺钉45而被紧固。
并且,介于金属层13与散热板18之间的焊料层17通过固溶硬化型焊材而形成,该固溶硬化型焊材含有作为主成分的Sn和固溶于该Sn的母相中的固溶元素。在本实施方式中,焊材由含有2质量%以上且10质量%以下范围的Sb作为固溶元素的Sn-Sb系合金构成,具体而言,将Sn-5质量%Sb作为焊材。
另外,在本实施方式中,在金属层13与焊料层17之间设有镀Ni层(未图示)。
以下,参考图3说明所述结构的自带散热器的功率模块用基板20的制造方法。
首先,如图3所示,在陶瓷基板11的第一面侧,成为电路层12的金属板22(4N铝的轧制板)通过厚度为5~50μm(本实施方式中为14μm)的钎料箔24而层叠。
并且,在陶瓷基板11的第二面侧,成为金属层13的金属板23(2N铝的轧制板)通过厚度为5~50μm(本实施方式中为14μm)的钎料箔25而层叠。
另外,在本实施方式中,钎料箔24、25为含有熔点下降元素Si的Al-Si系钎料。
接下来,将如同上述而层叠的金属板22、钎料箔24、陶瓷基板11、钎料箔25、金属板23朝其层叠方向加压(压力为1~5kgf/cm2)的状态下,放入加热炉内进行加热。则钎料箔24、25与金属板22、23的一部分熔融,在金属板22、23与陶瓷基板11的界面分别形成熔融金属区域。其中,加热温度为550℃以上且650℃以下,加热时间为30分钟以上且180分钟以下。接着,加热后通过冷却而使得在金属板22、23与陶瓷基板11的界面形成的熔融金属区域凝固,将陶瓷基板11与金属板22及金属板23之间进行接合。
此时,钎料箔24、25中所含有的熔点下降元素(Si)朝金属板22、23扩散。
由此,成为电路层12及金属层13的金属板22、23与陶瓷基板11被接合起来,制造出本实施方式的功率模块用基板10。
并且,在金属层13中,钎料箔25中所含有的Si扩散而形成界面邻近层13A。同样,在电路层12中,钎料箔24中所含有的Si扩散而形成界面邻近层12A。
接下来,在该功率模块用基板10的金属层13的另一面形成镀Ni膜之后,利用Sn-5质量%Sb焊材来焊锡接合散热板18。由此,在金属层13与散热板18之间形成焊料层17,制造出本实施方式的自带散热板功率模块用基板20。
并且,该自带散热器的功率模块用基板20的散热板18通过固定螺钉45而紧固于冷却器40上。由此,制造出本实施方式的自带冷却器的功率模块用基板。
并且,在电路层12的一面通过芯片用焊料层2而搭载半导体芯片3。由此,制造出本实施方式的功率模块1。
如以上结构的本实施方式的自带散热器的功率模块用基板20及功率模块1中,由于金属层13通过将由Al含量为99.0质量%以上且99.85质量%以下的2N铝构成的金属板23接合于陶瓷基板11而形成,因此在冷热循环负载之后,金属层13不易变形,能够抑制焊料层17中产生龟裂。
并且,焊料层17通过固溶硬化型焊材而构成,该固溶硬化型焊材含有作为主成分的Sn及固溶于该Sn的母相中的固溶元素,在本实施方式中,焊材由含有2质量%以上且10质量%以下范围的Sb作为固溶元素的Sn-Sb系合金构成,具体而言,通过Sn-5质量%Sb焊材而形成,因此焊料层17的母相强度变高,且即使在有冷热循环负载的情况下,也能够确保焊料层17的母相强度。因此,即使在金属层13的周缘部,在焊料层17中产生龟裂的情况下,也能够抑制该龟裂加剧至金属层13的内侧区域。
另外,若Sb的含量小于2质量%,则固溶硬化的效果有可能不充分,而若Sb的含量超过10质量%,则焊料层17有可能变得过硬。由此,在含有作为固溶元素的Sb的情况下,优选其含量为2质量%以上且10质量%以下的范围。
并且,散热板18由杨氏模量为130MPa以下以及抗拉强度为250MPa以上的铜或铜合金构成,因此散热板18容易弹性变形,且不易塑性变形。即散热板18的弹性变形区域变广。因此通过该散热板18的弹性变形,能够减低在焊料层17中产生的应变,并能够抑制在金属层13的周缘部产生的龟裂加剧至金属层13的内侧区域。
并且,能够抑制散热板18以翘曲的方式塑性变形,因此能够使冷却器40与散热板18紧密接合,并且能够使半导体芯片3的热量朝冷却器40有效地发散。
以上说明了本发明的实施方式,但本发明并不限定于此,在不脱离本发明的技术思想的范围内可适当地变更。
例如,作为本发明的实施方式,作为散热器使用散热板,对此已进行了说明,然而,当直接接合于图1所示结构的冷却器的情况下,或者也可以利用形成有散热片的液冷/空冷散热器、热管等来作为散热器。
并且,说明了利用钎料箔来接合成为电路层的金属板及成为金属层的金属板与陶瓷基板,但并不限定于此,也可以通过瞬间液相扩散连接法(Transient LiquidPhase Diffusion Bonding)来接合成为电路层的金属板及成为金属层的金属板与陶瓷基板。
另外,说明了以杨氏模量为130MPa以下且抗拉强度为250MPa以上的铜或铜合金来构成散热器,但并不限定于此,也可以为由其他铜或铜合金构成的散热器。
并且,说明了电路层通过铝而形成,然而,并不限定于此,电路层也可以由铜或铜合金形成。
实施例
接下来,说明为确认本发明的效果而实施的确认实验结果。
制造出表1所示的自带散热器的功率模块用基板,评估了初始接合率及冷热循环后的接合率。
此处,电路层及金属层的尺寸为37mm×37mm,陶瓷基板的尺寸为40mm×40mm。
利用散热板作为散热器,该散热板的尺寸为70mm×70mm×3mm。并且,散热板与金属层之间的焊料层的厚度为0.4mm。
金属层与散热板之间的接合率是利用超声波探伤装置并利用以下公式求出的。此处,初始接合面积为接合前应接合的面积,即金属层面积。在超声波探伤图像中,以接合部内的白色部分来表示剥离,因此将该白色部的面积作为剥离面积。
(接合率)={(初始接合面积)-(剥离面积)}/(初始接合面积)
另外,接合率是在冷热循环负载前及负载后进行测定。
并且,冷热循环是使用冷热冲击试验机ESPEC公司制TSB-51,对试验片(自带散热器的功率模块),重复进行在液相(Fluorinert)中以﹣40℃经5分钟以及以125℃经5分钟的循环,实施了2000次循环。
在表1中示出评估结果。
[表1]
使用固溶硬化型之外的焊材的比较例1、2中,确认到在冷热循环负载后接合率降低。可推测其原因是在冷热循环负载之后焊料层的母相强度降低,在金属层的周缘部产生的龟裂加剧至金属层的内侧区域所致。
并且,通过4N铝而形成金属层的比较例3、4中,确认到冷热循环负载之后接合率降低。可推测其原因是在焊料层宽范围地产生龟裂。
与此相对,在本发明例1~7中,即使在冷热循环负载之后接合率也没有降低。确认到通过Al含量为99.0质量%以上且99.85质量%以下的铝板而形成金属层,并通过使用固溶硬化型焊材来提高金属层与散热器之间的接合可靠性。
产业上的可利用性
根据本发明,能够提供一种能够抑制介于由铝构成的金属层与由铜构成的散热器之间的焊料层中龟裂的产生及加剧,且接合可靠性优异的自带散热器的功率模块用基板、具备该自带散热器的功率模块用基板的自带冷却器的功率模块用基板及功率模块。
符号说明
1-功率模块,3-半导体芯片(电子部件),10-功率模块用基板,11-陶瓷基板,13-金属层,17-焊料层,18-散热器(散热板)。
Claims (5)
1.一种自带散热器的功率模块用基板,具备:功率模块用基板,具备陶瓷基板、配设于所述陶瓷基板的一面的电路层及配设于所述陶瓷基板的另一面的由铝构成的金属层;及散热器,通过焊料层而接合于该金属层的另一面侧,且由铜或铜合金构成,其中,
所述金属层通过Al含量为99.0质量%以上且99.85质量%以下的铝板接合于所述陶瓷基板而形成,
所述焊料层通过固溶硬化型焊材而形成,所述固溶硬化型焊材含有作为主成分的Sn和固溶于该Sn的母相中的固溶元素。
2.根据权利要求1所述的自带散热器的功率模块用基板,其中,
所述焊料层通过含有作为所述固溶元素的Sb的焊材而形成。
3.根据权利要求1或2所述的自带散热器的功率模块用基板,其中,
所述散热器由抗拉强度为250MPa以上的铜或铜合金构成。
4.一种自带冷却器的功率模块用基板,具备:
根据权利要求1至3中任一项所述的自带散热器的功率模块用基板;及层叠配置于所述散热器的另一面侧的冷却器。
5.一种功率模块,具备:
根据权利要求1至3中任一项所述的自带散热器的功率模块用基板;及搭载于该自带散热器的功率模块用基板上的电子部件。
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