Brief AML Presentation
Brief AML Presentation
Brief AML Presentation
• AML focus on & Provide Wafer Bonding equipment & Wafer bonding
services (BONDCENTRE)
From MEMS
background not Mask
Aligner for IC
T <560
C
HV
•Heat + Pump + Align
<2500V
•Independent platen T
•Flexible
•2 to 8 inch wafers
AML – Wafer Bonding Machines & Services
•Fast cycles times
AML Wafer Bonders
Wafer bonding capabilities:-
ALIGN / BOND
• No wafer movement between alignment & bonding – guaranteed
alignment accuracy
• Simultaneous alignment, heating and vac pump-down (fastest cycle
time)
• In-bond chamber alignment at bond temperature (reduces expansion
misalignment effects you would see with competitors jigging)
• No flags touching bond surfaces so no possibility of contamination,
damage or flag removal issues
• Best system for vacuum encapsulation (Large gap between wafers
during pump-down)
• Independent control of upper & Lower wafer temperatures –
(useful for getter activation)
• Best system for reducing / forming gas environment - e.g. for
eutectic bonding. (reproducible wafer surface environment)
• Wide range of processes possible – Including Nano-Imprint
EASY
• Very high reliability – minimal servicing – fast & simple to maintain
SUPPORT
• Excellent process support via BONDCENTRE – fast response
lower chuck
IR transmission image of
void free Si – Si direct
bond. 100mm wafers.
Bond performed on
AML402 direct bonder -
using pin chuck system
Outline Specification
Force up to 5000N Stroke up to 750 microns
T up to 500 C (cooling) up to 6” wafers
2 micron alignment between
Operation in Vacuum
stamp & substrate
T <560
C
HV
•Heat + Pump + Align
<2500V
•Independent platen T
•Flexible
•2 to 8 inch wafers
AML – Wafer Bonding Machines & Services
•Fast cycles times
Radical Activation Tool
Source
DC source
Wafers
for in-situ
activation
R. pump
Untreated Centre
6000 6000
5000 5000
4000 4000
Counts per second
2000 2000
1000 1000
0 0
1000 800 600 400 200 0 1000 800 600 400 200 0
Binding energy /eV Binding energy /eV
2.00
1.50
1.00
0.50
0.00
0.000 5.000 10.000 15.000 20.000 25.000
Exposure Time /min
Glass Frit
Eutectic
Thermocompression
Adhesive
The above images were obtained using pressure sensitive film. The
black areas are full scale, white areas are zero load.
• Also access via long term collaboration with CMF @ Rutherford to:
• PHOTOLITHOGRAPHY DEPOSITION- PVD & CVD & FURNACES
• ETCHING – DRY & WET
• WAFER SAW WIRE & BUMP BONDING
• METROLOGY: THIN FILM, LINE WIDTH, SEM
AML – Wafer Bonding Machines & Services
4 Aligner –Bonders in class 10