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Lecture No 2 on MOSFET

We have already seen


the Physical structure of
MOSFET , lets see its
Operation
S D When Gate , Source and drain , all are at zero
potential then no channel formed between
source and drain - No current flow possible

S When positive voltage applied at Gate only ,


D The holes in the substrate are pushed down ,
leaving behind negative ions , balancing the
positive charges on the top plate

When Gate potential crosses certain


S D threshold voltage , the electrons from the
two heavily doped S & D regions are
attracted – the total negative charges i.e.
ions and electrons balances the positive
charges on the top plate
As we increase the potential at the
drain , the channel starts to taper

𝑸=𝑪
  ×𝑽

S
 𝑉 𝑒𝑓𝑓𝑒𝑐𝑡𝑖𝑣𝑒 =𝑉 𝐺 − 𝑉 𝑥
The channel gets
tapered

Channel is pinched
off

𝑉
  𝐷𝑆 ≥ 𝑉 𝐺𝑆 −𝑉 𝑇𝐻
Pinch off point shifts
to left

  Because of the electric field the


electrons are sucked in the drain:
BUT the current will be constant
and independent of
Derivation of current equation
Charge on the capacitor is = Capacitance x Voltage applied 𝑸=𝑪
  ×𝑽

𝑇𝑜𝑡𝑎𝑙
  𝑐h𝑎𝑟𝑔𝑒= 𝐴𝑟𝑒𝑎 × 𝐶𝑎𝑝𝑎𝑐𝑖𝑡𝑎𝑛𝑐𝑒 ×𝑉𝑜𝑙𝑎𝑡𝑔𝑒

𝑄
  𝑇 =W × 𝐿 ×𝐶 𝑜𝑥 ×𝑉

Charge per unit length is

𝑸
  𝑻𝑳=𝐖 × 𝑪 𝒐𝒙 × 𝑽 𝑮

𝑄
  𝑇𝐿=W ×𝐶 𝑜𝑥 ×(𝑉 ¿ ¿ 𝐺 −𝑉 𝑇𝐻 − 𝑉 𝑥 )¿
Derivation

Since

L
Plotting  Curve

It’s a parabola ,
what after this
point, and how
to find peak
value of this
curve
 
How do we find the maxima of curve /current,
We will take derivative wrt of the equation of current

Maximum value of
current

  The value of at which


we will get peak current

 The point where the peak current occurs is when


That  is for
MOSFET acts as a resistor

  𝐼 𝐷 =𝑔 =1/ 2 𝐶 𝜇 𝑊 ( 2× 𝑉 − 𝑉 )
𝐷𝑆 𝑜𝑥 𝑛 𝐺𝑆 𝑇𝐻
𝑉 𝐷𝑆 𝐿
 
What happens if
• We start from the basic equation

 Butthe integration limit all though starts from zero but it ends at
the point where the channel end or pinched off
 𝐿 (𝑉 𝐺 −𝑉 𝑇𝐻 )

∫ 𝐼 𝐷 𝑑𝑥=𝑢𝑛 𝐶 𝑜𝑥 ( 𝑊 ) ∫ ( 𝑉 𝐺𝑆 −𝑉 𝑇𝐻 − 𝑉 𝑥 ) 𝑑𝑉
0 0

 1 ' W  2
OR iD   k n   vGS  Vt  
2 L 
If we increase
 
The Curve
 
In saturation Region

1 ' W  2
iD  k n   vOV
2  L

1 ' W 
iD  k n   (vGS  Vt ) 2
2  L

A voltage controlled current cource

The iD – vOV curve can be obtained by


shifting the origin to Vth
The Curve
 

vDS  vOV
NMOS Transistor Regions of Operation: 1
vDS  VOV
vGD  Vtn
Triode Region
 W  1 2 
iD  k n'   (v OV vDS  vDS )
 L 2 

vGS  Vtn : no Channel;


the transisto r is cut - off
iD  0

vGS  Vtn  VOV :


Channel is induced;
the transisto r operating
NMOS Transistor Regions of Operation: 2
vDS  VOV
vGD  Vtn
Saturation Region
1 ' W  2
iD  k n   vOV
2  L

vGS  Vtn : no Channel;


the transisto r is cut - off
iD  0

vGS  Vtn  VOV :


Channel is induced;
the transisto r operating
Summary of Regions of operation
The Equivalent Circuit Model of the NMOS in
Saturation

1 ' W  2
iD  kn   vOV
2  L 

1 ' W 
iD  kn   (vGS  Vtn )
2

2  L 

• A voltage controlled current source


• The drain current is a function of vOV
Channel Length modulations
Channel-Length Modulation
Channel Length Modulation
Output Resistance in Sat Mode:1
Ideally
1 ' W  2
iD  k n   vOV
2 L

In practice the channel length


reduces with increase in vDS ,
thus iD may be expressed as :
1 ' W  2
iD  kn   vOV
2  L  L 
 
1 'W  1  2
or iD  k n   vOV
2 L  1  L 
 
 L 
Output Resistance in Sat Mode:2
 
1 'W  1  2
iD  k n   vOV
2 L  1  L 
 
 L 
L
since  1
L
using series expansion we get
1 W L  2
iD  k n'  1   vOV
2 L L 

since L  vDS
Finally we get
L   vDS
'

1 'W 2
and 
'
iD  kn vOV 1  vDS 
L 2 L
Output Resistance in Sat Mode:3

1 'W 2
We got iD  k n vOV 1  vDS 
2 L

1
iD  0 when vDS 

1
So VA 

VA is a device parameter, with dimensions of V
For a given process, VA is proportion al to the
channel length

defining VA  V A' L

here VA' is entirely process technolo gy parameter,


with dimensions of V/m
Output Resistance in Sat Mode:4
1 'W 2
Using iD  k n vOV 1  vDS 
2 L
1
 i 
and rO   D 
 vDS  vGS Cons
1
 k n' W 2 
We get rO   VOV 
 2 L 
1
 rO 
I D

VA
Therefore rO 
ID
where I D is current wi thout channel modulation
Output Resistance in Sat Mode:5

The MOSFET parameter VA depends on the


process technology, and for a given process,
is proportional to the channel length
Student Queries

1. What would happen if we had applied a different voltage at the source


and a different voltage at the drain.

2. When we increase VDS  further the length of the channel decreases. So


does it mean that we have created a voltage dependent Length??  

3. when we talk about MOS being symmetric. if the device is symmetric


then there is no way of identifying the drain or the source physically
until labeled. Correct? So how will we identify which is the source and the
drain if I connect batteries on both sides. Also if we know that the device
is labeled with the source and drain. And I connect a battery on the source
and keep the drain grounded. Current will flow from the source to the
drain or we will consider source as drain and drain as source?? 
NMOS Circuit Symbols
Output Resistance in Sat Mode:6

ro incorporated in the large signal model of


n-channel MOSFET
Summary

𝑉𝐺𝑆<𝑉𝑇𝐻;𝑤𝑖𝑡h𝑒𝑣𝑒𝑛𝑉𝐷𝑆>0,𝑠𝑡𝑖𝑙 𝑛𝑜𝑐𝑢𝑟 𝑒𝑛𝑡


•  
 𝑉 𝐺𝑆 ≥𝑉 𝑇𝐻 ; 𝑉 𝐷𝑆 =0 . 𝑇h𝑜𝑢𝑔h 𝑐h𝑎𝑛𝑛𝑒𝑙 𝑖𝑠 𝑓𝑜𝑟𝑚𝑒𝑑 𝑏𝑢𝑡 𝑛𝑜 𝑐𝑢𝑟𝑟𝑒𝑛𝑡

𝑉
  𝐺𝑆 ≥𝑉 𝑇𝐻 ; 𝑉 𝐷𝑆 𝑖𝑠 𝑣𝑒𝑟𝑦 𝑠𝑚𝑎𝑙𝑙 𝑡h𝑒𝑛 𝑉 𝑂𝑉 . MOSFET acts as resistor

𝑉
  𝐺𝑆 ≥𝑉 𝑇𝐻 ; 𝑉 𝐷𝑆 < 𝑉 𝑂𝑉 . MOSFET ∈triode region

𝑉
  𝐺𝑆 ≥𝑉 𝑇𝐻 ; 𝑉 𝐷𝑆 ≥ 𝑉 𝑂𝑉 . MOSFET ∈saturation region

 
Note in MOSFETs
Comparison with BJT
Effect of Channel Width
Circuit Symbol
PMOS Transistor

Polarity of the terminal


voltages !!!!!
PMOS Transistor
vGS  Vtp since Vtp is negative

To avoid dealing with negative signs

vGS  Vtp

 L
k p'   p Cox and k p  k p' W

where  p  0.25 n to 0.5 n


PMOS Circuit Symbols
CMOS Technology
EXAMPLES SOLVING
¿ 𝜇 𝐴
  𝑛 = 𝜇𝑛 𝐶 𝑜𝑥 =194
𝑘
𝑉2
Example 5.2
Consider an NMOS transistor fabricated in a 0.18-μm process with
L = 0.18 μm and W = 2 μm. The process technology is specified to have
Cox = 8.6 fF/μm2, μn = 450 cm2/ V.s and Vtn = 0.5 V.

(a) Find VGS and VDS that result in the MOSFET operating at the edge of saturation
with ID = 100 μA.

(b) If VGS is kept constant, find VDS that results in ID = 50 μA.

(c) To investigate the use of the MOSFET as a linear amplifier, let it be operating in
saturation with VDS = 0.3 V. Find the change in iD resulting from changing VGS
from 0.7 V by +0.01V and by - 0.01V.

Solution: The FET transconductance


The process transconductance parameter parameter
(a) Find VGS and VDS that result in the MOSFET operating at the edge of
saturation with ID = 100 μA.

kn  4.3 mA / V 2

Since operating at the edge of saturation


(b) If VGS is kept constant, find VDS that results in ID = 50 μA.

As ID is reduced from the value obtained at the edge of saturation, the MOSFET
will now be operating in the triode region

kn  4.3 mA / V 2

In triode region VDS can’t be greater than Vov


(c) To investigate the use of the MOSFET as a linear amplifier, let it be operating in
saturation with VDS = 0.3 V. Find the change in iD resulting from changing VGS
from 0.7 V by +0.01V and by - 0.01V.
𝑊 2
𝐼  𝐷 =1/ 2 𝜇 𝑛 𝐶 𝑜𝑥 𝑉
𝐿 𝑂𝑉

  60 120 2
0.3=0.5 × × × 𝑉 𝑂𝑉
1000 3

𝑇h𝑒𝑟𝑒𝑓𝑜𝑟𝑒
  𝑉 𝑂𝑉 =0.5 𝑉

𝑉
  𝐺𝑆 −𝑉 𝑇𝐻 =𝑉 𝑂𝑉 → 𝑉 𝐺𝑆 =1.5

𝑇h𝑒𝑟𝑒𝑓𝑜𝑟𝑒
  𝑉 𝑆 =−1.5

  𝑉 𝑆 − 𝑉 𝑆𝑆 −1.5 − (− 2.5 )
𝑅 𝑆= = =3.33 𝐾 Ω
𝐼𝐷 0.3

 
  𝑊 2
𝐼 𝐷 =1/ 2 𝜇 𝑛 𝐶 𝑜𝑥 𝑉 𝑂𝑉
𝐿
𝑉
  𝐷=𝑉 𝐺 =0.8 𝑉

𝑉
  𝑂𝑉 =𝑉 𝐺𝑆 −𝑉 𝑇𝐻 =0.8− 0.5=0.3

−3 2
 𝐼 𝐷 =0.5 × 0.4 × 10 × 4 × ( 0.3 ) =72 𝜇 𝐴

 𝑅= 1.8 − 0.8 =13.9 𝐾


−6
72 × 10

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