Henni 2015
Henni 2015
Henni 2015
a r t i c l e in f o abstract
The zinc oxide nanostructured were synthesized on Indium doped tin oxide substrate
Keywords: using cathodic reduction of H2O2 and ZnCl2 from chloride aqueous electrolyte under
Zinc oxide differents applied potentials. The effects of this potential on the nucleation of ZnO seeds
Chronoamperometry were investigated by performing transient current measurements and using model based
Photocurrent on Scharifker–Hills equations. The results suggest that the nucleation mechanism of ZnO
Nucleation is progressive with a three-dimensional growth of the hemispherical nuclei. The XRD
Nanorods patterns show that the ZnO crystallizes in a hexagonal Würtzite-type structure with a
phase preferentially orientated along c-axis. The structural analysis evidences a strong
relationship between the directional growth along (0 0 2) crystallographic plane and the
applied potentials. ZnO crystalizes in hexagonal nanorods (NRs) with diameters in the
ranges of 160–250 nm. Photoelectrochemical study indicates that the obtained films have
n-type semiconducting behaviour, and generate high photocurrents up to 40 μA/cm2 at
1.0 and 1.1 V. The transmittance spectra indicate that the films exhibit a good optical
quality with low defects density with an averaged band gap of 3.31 eV.
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http://dx.doi.org/10.1016/j.mssp.2014.12.011
1369-8001/& 2014 Elsevier Ltd. All rights reserved.
A. Henni et al. / Materials Science in Semiconductor Processing 31 (2015) 380–385 381
In the present work, we report the electrochemical The zinc hydroxide formed in this reaction is trans-
synthesis of ZnO nanorods on Indium tin oxide (ITO) con- formed at 65 1C into zinc oxide as following:
ducting glass in chloride medium and using a hydrogen
peroxide as a precursor. More efforts have been focused to Zn(OH)2-ZnOþH2O (2)
investigate the effect of applied potential on microstructural
and functional properties of ZnO. The chronoamperometry
techniques were employed to study the initial growth stages Scharifker and Hills [32] have developed theoretical
of ZnO during the electrodeposition. Models based on models to describe the nucleation process during the
Scharifker-Hills calculations were established to determine initial few seconds using chronoamperometric curves.
the nucleation and growth mechanism. The nucleation rate According to the three-dimensional (3D) nucleation
and the diffusion coefficient of ZnO were also investigated. model, two limiting cases referring to instantaneous and
The effects of the applied potential on electrochemical, progressive nucleation modes have been considered.
structures, morphologies, photoelectrochemical and optical Instantaneous nucleation corresponds to fast growth of
properties of ZnO nanostructures were studied in detail to nuclei on many active sites, all activated during the
evaluate the potential of use of such fabrication method to electro-reduction step [33] according to the following
achieve ZnO nanorods with a crystal quality comparable to relationship (Eq. (3)):
transparent conducting oxide films prepared by other tech-
2 2
niques [29–31]. i t max t
¼ 1:9542 1 exp 1:2564 ð3Þ
imax t t max
Fig. 3. SEM micrographs showing the surface morphology of the ZnO nanowires deposited at different potential: (a) 0.8 V, (b) 0.9 V, (c) 1.0 V,
(d) 1.1 V and (e) 1.2 V vs. SCE.
4. Conclusion
Fig. 4. Photocurrent response curves of ZnO nanostructures at a constant
potential ( þ 0.2 V).
In summary, highly transparent nanostructured ZnO
films were electrochemically deposited on ITO-glass sub-
strates. The effects of the applied potential on the films
structural, morphology, photocurrent, optical, and electri-
cal properties are investigated. Detailled analysis suggest
that the ZnO electrodeposition is achieved through a 3D
progressive nucleation process. ZnO exhibits aligned
nanorods arrays synthesized directly on ITO substrates
with diameters between 160 and 250 nm. ZnO crystallize
in single phase with Würtzite structure. The microstruc-
tural and functional properties of the obtained ZnO are
strongly affected by the potentials applied during the
electrodeposition. The photoelectrochemical tests demon-
strate clearly the ability of ZnO nanowires to generate
significant photocurrents under UV light. The optical
measurements of all the samples with were found to be
greater 80% in visible region, thus demonstrating that all
films are highly transparent. Band gap measurements
using Tauc plots from UV spectroscopy showed that the
energy gap varies slightly with the potential imposed.
[8] Z.L. Wang, J. Song, Science 312 (2006) 242–246. [23] L. Zhang, C. Zhigang, Y. Tang, Z. Jia, Thin Solid Films 492 (2005)
[9] I.Y. Bu, C.-C. Yang, Superlattices Microstruct. 51 (2012) 745–753. 24–29.
[10] J. Xue, S. Qianqian, J. Zheng, W. Liang, X. Liu, Mater. Lett. 125 (2014) [24] F. Wang, R. Liu, A. Pan, L. Cao, K. Cheng, B. Xue, G. Wang, Q. Meng,
99–102. L. Jinghong, Q. Li, Y. Wang, T. Wang, B. Zou, Mater. Lett. 61 (2007)
[11] H. Lu, F. Zheng, M. Guo, M. Zhang, J. Alloys Compd. 588 (2014) 2000–2003.
217–221. [25] S. Peulon, D. Lincot, J. Electrochem. Soc. 145 (1998) 864–874.
[12] H.B. Kim, H. Kim, H.S. Sohn, I. Son, H.S. Lee, Mater. Lett. 101 (2013) [26] T. Singh, D.K. Pandya, R. Singh, Opt. Mater. 35 (2013) 1493–1497.
65–68. [27] T. Singh, D.K. Pandya, R. Singh, Appl. Surf. Sci. 270 (2013) 578–583.
[13] L. d’Abbadie, T.T. Tan, C.C. Yang, S. Li, Mater. Sci. Eng. B 167 (2010) [28] M. Izaki, T. Omi, J. Electrochem. Soc. 143 (1996) L53–L55.
31–35. [29] T. Minami, T. Yamamoto, T. Miyata, Thin Solid Films 366 (2000)
[14] G.S. Wu, T. Xie, X.Y. Yuan, Y. Li, L. Yang, Y.H. Xiao, L.D. Zhang, Solid 63–68.
State Commun. 134 (2005) 485–489. [30] A. El Hichou, M. Addou, J. Ebothé, M. Troyon, J. Lumin. 113 (2005)
[15] Y. Sun, N.G. Ndifor-Angwafor, D.J. Riley, M.N.R. Ashfold, Chem. Phys. 183–190.
Lett. 431 (2006) 352–357. [31] X. Sun, Z. Deng, Y. Li, Mater. Chem. Phys. 80 (2003) 366–370.
[16] A. El Hichou, M. Addou, J. Ebothé, M. Troyon, J. Lumin. 113 (2005) [32] B. Scharifker, G. Hills, Electrochim. Acta 28 (1983) 879–889.
183–190. [33] M.P. Pardave, M.T. Ramirez, I. Gonzalez, A. Serruya, B. Scharifker,
[17] L. Li, S.S. Pan, X.C. Dou, Y.G. Zhu, X.H. Huang, Y.W. Yang, G.H. Li, J. Electrochem. Soc. 143 (1996) 1551–1558.
L.D. Zhang, J. Phys. Chem. C 111 (2007) 7288–7291. [34] S. Jiang, M. Wu, Y. Zhou, Y. Wen, C. Yang, S. Zhang, Integr. Ferroelectr.
[18] B.M. Ateav, A.M. Bagamadova, V.V. Mamedov, A.K. Omaev, Mater.
88 (2007) 33–43.
Sci. Eng. B 65 (1999) 159–163.
[35] H. Zhang, S. Jin, G. Duan, J. Wang, W. Cai, J. Mater. Sci. Technol.
[19] A. Berchi, D. Abdi, A. Medjahed, Mater. Sci. Semicond. Process. 27
(2014).
(2014) 877–882.
[36] H. Chettah, D. Abdi, Thin Solid Films 537 (2013) 119–123.
[20] C.L. Cheng, J.S. Lin, Y.F. Chen, J. Alloys Compd. 476 (2009) 903–907.
[37] J. Tauc, R. Grigorovichi, A. Vancu, Phys. Status Solidi 15 (1966)
[21] G.W. She, X.H. Zhang, W.S. Shi, X. Fan, J.C. Chang, C.S. Lee, S.T. Lee,
627–637.
C.H. Liu, Appl. Phys. Lett. 92 (2008). (0531111-0531111).
[38] R. Chander, A.K. Raychaudhuri, Solid State Commun. 145 (2008)
[22] J. Cembrero, A. Elmanouni, B. Hartiti, M. Mollar, B. Mari, Thin Solid
Films 451 (2004) 198–202. 81–85.