WO2022260051A1 - 含フッ素エーテル化合物、含フッ素エーテル混合物、コーティング剤、物品及び物品の製造方法 - Google Patents
含フッ素エーテル化合物、含フッ素エーテル混合物、コーティング剤、物品及び物品の製造方法 Download PDFInfo
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- WO2022260051A1 WO2022260051A1 PCT/JP2022/022998 JP2022022998W WO2022260051A1 WO 2022260051 A1 WO2022260051 A1 WO 2022260051A1 JP 2022022998 W JP2022022998 W JP 2022022998W WO 2022260051 A1 WO2022260051 A1 WO 2022260051A1
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- WIPO (PCT)
- Prior art keywords
- group
- fluorine
- containing ether
- formula
- compound
- Prior art date
Links
- 229910052731 fluorine Inorganic materials 0.000 title claims abstract description 135
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 title claims abstract description 133
- 239000011737 fluorine Substances 0.000 title claims abstract description 132
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 title claims abstract description 129
- -1 ether compound Chemical class 0.000 title claims abstract description 97
- 239000011248 coating agent Substances 0.000 title claims abstract description 53
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 34
- 239000000203 mixture Substances 0.000 title claims abstract description 27
- 125000003808 silyl group Chemical group [H][Si]([H])([H])[*] 0.000 claims abstract description 28
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 17
- 125000000962 organic group Chemical group 0.000 claims abstract description 8
- 239000002344 surface layer Substances 0.000 claims description 50
- 239000000758 substrate Substances 0.000 claims description 48
- 125000004432 carbon atom Chemical group C* 0.000 claims description 41
- 238000000576 coating method Methods 0.000 claims description 25
- 239000000463 material Substances 0.000 claims description 22
- 150000002170 ethers Chemical class 0.000 claims description 20
- 239000007788 liquid Substances 0.000 claims description 18
- 125000002947 alkylene group Chemical group 0.000 claims description 16
- 125000006551 perfluoro alkylene group Chemical group 0.000 claims description 11
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 7
- 238000001035 drying Methods 0.000 claims description 5
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 abstract description 64
- 238000005299 abrasion Methods 0.000 description 29
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 27
- 239000003960 organic solvent Substances 0.000 description 20
- 125000001153 fluoro group Chemical group F* 0.000 description 19
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 18
- 238000000034 method Methods 0.000 description 18
- 239000002585 base Substances 0.000 description 16
- 239000002904 solvent Substances 0.000 description 15
- 239000000047 product Substances 0.000 description 14
- ABRVLXLNVJHDRQ-UHFFFAOYSA-N [2-pyridin-3-yl-6-(trifluoromethyl)pyridin-4-yl]methanamine Chemical compound FC(C1=CC(=CC(=N1)C=1C=NC=CC=1)CN)(F)F ABRVLXLNVJHDRQ-UHFFFAOYSA-N 0.000 description 11
- 238000011156 evaluation Methods 0.000 description 10
- 229940125904 compound 1 Drugs 0.000 description 9
- 239000007858 starting material Substances 0.000 description 8
- 238000005160 1H NMR spectroscopy Methods 0.000 description 7
- 238000005481 NMR spectroscopy Methods 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 150000002430 hydrocarbons Chemical group 0.000 description 7
- IOXXVNYDGIXMIP-UHFFFAOYSA-N n-methylprop-2-en-1-amine Chemical compound CNCC=C IOXXVNYDGIXMIP-UHFFFAOYSA-N 0.000 description 7
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 7
- 239000010408 film Substances 0.000 description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 6
- 239000003921 oil Substances 0.000 description 6
- 238000001771 vacuum deposition Methods 0.000 description 6
- 125000003545 alkoxy group Chemical group 0.000 description 5
- 229940125898 compound 5 Drugs 0.000 description 5
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 5
- 125000005372 silanol group Chemical group 0.000 description 5
- 125000004104 aryloxy group Chemical group 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 229940125782 compound 2 Drugs 0.000 description 4
- 238000006482 condensation reaction Methods 0.000 description 4
- 238000006460 hydrolysis reaction Methods 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 150000004756 silanes Chemical class 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 239000003377 acid catalyst Substances 0.000 description 3
- 125000002252 acyl group Chemical group 0.000 description 3
- 125000004423 acyloxy group Chemical group 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000009835 boiling Methods 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- 229940126214 compound 3 Drugs 0.000 description 3
- 125000001033 ether group Chemical group 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 3
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 3
- SJBBXFLOLUTGCW-UHFFFAOYSA-N 1,3-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC(C(F)(F)F)=C1 SJBBXFLOLUTGCW-UHFFFAOYSA-N 0.000 description 2
- RGUKYNXWOWSRET-UHFFFAOYSA-N 4-pyrrolidin-1-ylpyridine Chemical compound C1CCCN1C1=CC=NC=C1 RGUKYNXWOWSRET-UHFFFAOYSA-N 0.000 description 2
- VVJKKWFAADXIJK-UHFFFAOYSA-N Allylamine Chemical compound NCC=C VVJKKWFAADXIJK-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 229910008051 Si-OH Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910006358 Si—OH Inorganic materials 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 description 2
- 150000003973 alkyl amines Chemical class 0.000 description 2
- 150000001491 aromatic compounds Chemical class 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- ZQBFAOFFOQMSGJ-UHFFFAOYSA-N hexafluorobenzene Chemical compound FC1=C(F)C(F)=C(F)C(F)=C1F ZQBFAOFFOQMSGJ-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 125000005647 linker group Chemical group 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- SNAUETXKUXDMFB-UHFFFAOYSA-N n-prop-2-enylbutan-1-amine Chemical compound CCCCNCC=C SNAUETXKUXDMFB-UHFFFAOYSA-N 0.000 description 2
- DYUWTXWIYMHBQS-UHFFFAOYSA-N n-prop-2-enylprop-2-en-1-amine Chemical compound C=CCNCC=C DYUWTXWIYMHBQS-UHFFFAOYSA-N 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- 150000003961 organosilicon compounds Chemical class 0.000 description 2
- DPBLXKKOBLCELK-UHFFFAOYSA-N pentan-1-amine Chemical compound CCCCCN DPBLXKKOBLCELK-UHFFFAOYSA-N 0.000 description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 239000000741 silica gel Substances 0.000 description 2
- 229910002027 silica gel Inorganic materials 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000012756 surface treatment agent Substances 0.000 description 2
- ZUHZGEOKBKGPSW-UHFFFAOYSA-N tetraglyme Chemical compound COCCOCCOCCOCCOC ZUHZGEOKBKGPSW-UHFFFAOYSA-N 0.000 description 2
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 2
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 1
- BYEAHWXPCBROCE-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropan-2-ol Chemical compound FC(F)(F)C(O)C(F)(F)F BYEAHWXPCBROCE-UHFFFAOYSA-N 0.000 description 1
- CWIFAKBLLXGZIC-UHFFFAOYSA-N 1,1,2,2-tetrafluoro-1-(2,2,2-trifluoroethoxy)ethane Chemical compound FC(F)C(F)(F)OCC(F)(F)F CWIFAKBLLXGZIC-UHFFFAOYSA-N 0.000 description 1
- USPWUOFNOTUBAD-UHFFFAOYSA-N 1,2,3,4,5-pentafluoro-6-(trifluoromethyl)benzene Chemical compound FC1=C(F)C(F)=C(C(F)(F)F)C(F)=C1F USPWUOFNOTUBAD-UHFFFAOYSA-N 0.000 description 1
- PDCBZHHORLHNCZ-UHFFFAOYSA-N 1,4-bis(trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=C(C(F)(F)F)C=C1 PDCBZHHORLHNCZ-UHFFFAOYSA-N 0.000 description 1
- NBUKAOOFKZFCGD-UHFFFAOYSA-N 2,2,3,3-tetrafluoropropan-1-ol Chemical compound OCC(F)(F)C(F)F NBUKAOOFKZFCGD-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 235000002597 Solanum melongena Nutrition 0.000 description 1
- RHQDFWAXVIIEBN-UHFFFAOYSA-N Trifluoroethanol Chemical compound OCC(F)(F)F RHQDFWAXVIIEBN-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000007607 die coating method Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000035622 drinking Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- BITPLIXHRASDQB-UHFFFAOYSA-N ethenyl-[ethenyl(dimethyl)silyl]oxy-dimethylsilane Chemical compound C=C[Si](C)(C)O[Si](C)(C)C=C BITPLIXHRASDQB-UHFFFAOYSA-N 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000001072 heteroaryl group Chemical group 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 239000002649 leather substitute Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 235000014593 oils and fats Nutrition 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 125000004817 pentamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- 229950008618 perfluamine Drugs 0.000 description 1
- 239000010702 perfluoropolyether Substances 0.000 description 1
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 1
- JAJLKEVKNDUJBG-UHFFFAOYSA-N perfluorotripropylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)F JAJLKEVKNDUJBG-UHFFFAOYSA-N 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 229930195734 saturated hydrocarbon Natural products 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 238000010896 thin film analysis Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/336—Polymers modified by chemical after-treatment with organic compounds containing silicon
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D171/00—Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/18—Materials not provided for elsewhere for application to surfaces to minimize adherence of ice, mist or water thereto; Thawing or antifreeze materials for application to surfaces
Definitions
- the present disclosure relates to a fluorine-containing ether compound, a fluorine-containing ether mixture, a coating agent, an article, and a method for producing the article.
- Fluorine-containing compounds exhibit high lubricity, water and oil repellency, and are therefore suitable for use as surface treatment agents. By imparting water and oil repellency to the surface of the base material with the surface treatment agent, dirt on the surface of the base material can be easily wiped off and the removability of the dirt can be improved.
- a fluorine-containing ether compound having a poly(oxyfluoroalkylene) chain in which an ether bond is present in the fluoroalkylene chain is a compound with excellent flexibility, and is particularly excellent in removing stains such as oils and fats.
- fluorine-containing ether compound compounds having a poly(oxyperfluoroalkylene) chain and having a hydrolyzable silyl group at the end are widely used (see Patent Documents 1 to 3, for example).
- the fluorine-containing ether compounds of Patent Documents 1 to 3 are said to be capable of forming a surface-treated layer having high initial water and oil repellency and excellent abrasion resistance and fingerprint stain removability.
- the level of demand for abrasion resistance of the surface layer by coating has increased.
- the abrasion resistance of the surface layer of the part that people touch with their fingers, such as the cover glass of smartphones can be replaced with or in addition to the conventional evaluation method using cellulose non-woven fabric, etc., using an eraser with stricter conditions. It is designed to be evaluated using
- conventional fluorine-containing ether compounds are not evaluated sufficiently according to the abrasion resistance using an eraser. Therefore, there is a demand for a technique that can provide a surface layer with excellent abrasion resistance even under severer conditions than conventional evaluation methods.
- the present disclosure relates to the provision of a fluorine-containing ether compound, a fluorine-containing ether mixture, a coating agent capable of forming a surface layer with excellent abrasion resistance, an article using these, and a method for producing the same.
- Means for solving the above problems include the following aspects. ⁇ 1> a monovalent group having a poly(oxyfluoroalkylene) chain; Formula (L1): a divalent group represented by —X 1 —NR 1 —(CH 2 ) n1 —; a monovalent group having a reactive silyl group; has The monovalent group having a poly(oxyfluoroalkylene) chain is linked to -X 1 - of the divalent group represented by the formula (L1), and the monovalent group having a reactive silyl group is the above
- X 1 represents a single bond or a divalent organic group
- R 1 represents an alkyl group
- n1 represents an integer of 1-10.
- the fluorine-containing ether compound according to ⁇ 1> which is CH 2 —, —CH 2 —O—CH 2 —, an alkylene group having 1 to 6 carbon atoms, or a perfluoroalkylene group having 1 to 6 carbon atoms.
- R 1 is an alkyl group having 1 to 4 carbon atoms.
- ⁇ 7> Contains two or more fluorine-containing ether compounds according to any one of ⁇ 1> to ⁇ 6>, or containing the fluorine-containing ether compound according to any one of ⁇ 1> to ⁇ 6> A fluorine-containing ether mixture containing one or more fluorine-containing ether compounds other than the fluorine-containing ether compound according to any one of ⁇ 1> to ⁇ 6>.
- a coating agent comprising the fluorine-containing ether compound according to any one of ⁇ 1> to ⁇ 6> or the fluorine-containing ether mixture according to ⁇ 7>.
- ⁇ 10> An article comprising a base material and a surface layer formed on the base material by the coating agent according to ⁇ 8> or ⁇ 9>.
- a method for producing an article comprising applying the coating agent according to ⁇ 8> to a surface of a substrate by a dry coating method to form a surface layer on the substrate.
- a method of manufacturing an article comprising:
- a fluorine-containing ether compound a fluorine-containing ether mixture, a coating agent capable of forming a surface layer with excellent abrasion resistance, an article using these, and a method for producing the same are provided.
- the term "process” includes a process that is independent of other processes, and even if the purpose of the process is achieved even if it cannot be clearly distinguished from other processes. .
- the numerical range indicated using “-” includes the numerical values before and after "-" as the minimum and maximum values, respectively.
- each component may contain multiple types of applicable substances. When there are multiple types of substances corresponding to each component in the composition, the content rate or content of each component is the total content rate or content of the multiple types of substances present in the composition unless otherwise specified. means quantity.
- the terms "alkyl group” and “alkylene group” mean unsubstituted alkyl groups and unsubstituted alkylene groups, respectively, unless otherwise specified that they have substituents.
- the fluorine-containing ether compound of the present disclosure is A monovalent group having a poly(oxyfluoroalkylene) chain, Formula (L1): a divalent group represented by —X 1 —NR 1 —(CH 2 ) n1 —; a monovalent group having a reactive silyl group; has The monovalent group having a poly(oxyfluoroalkylene) chain is linked to -X 1 - of the divalent group represented by the formula (L1), and the monovalent group having a reactive silyl group is the above It is linked to —(CH 2 ) n1 — of the divalent group represented by formula (L1).
- X 1 represents a single bond or a divalent organic group
- R 1 represents an alkyl group
- n1 represents an integer of 1-10.
- the fluorine-containing ether compound is also referred to as a "specific fluorine-containing ether compound".
- each group of the specific fluorine-containing ether compound may be indicated as follows.
- S Monovalent Group Having the Reactive Silyl Group
- the specific fluorine ether compound has a structure represented by (P)-(L)-(S).
- the left side is the (P) group side and the right side is the (S) group side.
- the specific fluorine ether compound may be used alone or in combination of two or more.
- a surface layer having excellent abrasion resistance can be formed by using a specific fluorine-containing ether compound.
- the reason for this is not necessarily clear, but is presumed as follows.
- a group having a poly(oxyfluoroalkylene) chain and a group having a reactive silyl group have an —NH— group at the connecting portion.
- the -NH- group forms a hydrogen bond with the substrate surface when the compound is applied to the substrate, and the site intended as the "bonding site with the substrate" derived from the reactive silyl group binds to the substrate.
- a monovalent group ((P) group) having a poly(oxyfluoroalkylene) chain includes a plurality of units represented by the following formula.
- the number of carbon atoms in the fluoroalkylene group in the poly(oxyfluoroalkylene) chain is preferably 1 to 20, more preferably 1 to 10, and 1 to 6 independently from the viewpoint of improving the abrasion resistance of the surface layer. is more preferred.
- a fluoroalkylene group may be linear, branched or cyclic.
- the number of fluorine atoms in the fluoroalkylene group is preferably 1 to 2 times the number of carbon atoms, more preferably 1.7 to 2 times, from the viewpoint of improving the abrasion resistance of the surface layer.
- the fluoroalkylene group may be a group in which all hydrogen atoms in the fluoroalkylene group are substituted with fluorine atoms (perfluoroalkylene group). From the viewpoint of improving the abrasion resistance of the surface layer, the perfluoroalkylene group is preferable.
- (OX) includes -OCHF-, -OCF 2 CHF-, -OCHFCF 2 - , -OCF 2 CH 2 -, -OCH 2 CF 2 -, -OCF 2 CF 2 CHF-, -OCHFCF 2 CF 2 - , -OCF2CF2CH2- , -OCH2CF2CF2- , -OCF2CF2CF2CH2- , -OCH2CF2CF2CF2- , -OCF2CF2CF2CF2CH _ _ _ _ _ _ _ _ _ 2- , -OCH2CF2CF2CF2- , -OCF2CF2CF2CF2CF2CH2- , -OCH2CF2CF2CF2CF2CF2- , -OCF2- _ _ _ _ _ _ _ _ _ _ _ _ 2- , -OCH2CF2CF2CF2- , -OCF2
- the repeating number m of (OX) is an integer of 2 or more, preferably an integer of 2 to 500, more preferably an integer of 2 to 200, more preferably an integer of 5 to 150, and particularly preferably an integer of 5 to 100. , 10-75 is most preferred.
- (OX) m may be a repetition of one type of (OX), or may contain two or more types of (OX).
- the binding order of two or more (OX) is not limited, and may be arranged randomly, alternately, or in blocks.
- Containing two or more types of (OX) means that, in the specific fluorine-containing ether compound, for example, two or more types of (OX) having different numbers of carbon atoms are present, two or more types of (OX) having different numbers of hydrogen atoms exists, two or more types of (OX) with different positions of hydrogen atoms exist, or the presence or absence of side chains even if the number of carbon atoms is the same, the type of side chain (the number of side chains, the number of side chains It means that there are two or more types of (OX) having different numbers of carbon atoms, etc.).
- the poly(oxyfluoroalkylene) chain is preferably a poly(oxyfluoroalkylene) chain mainly composed of (OX), which is an oxyperfluoroalkylene group, from the viewpoint of forming a film having excellent fingerprint stain removability.
- OX In the poly(oxyfluoroalkylene) chain represented by m , the ratio of the number of (OX) which is an oxyperfluoroalkylene group to the total number m of (OX) is preferably 50 to 100%, and 80 to 100 % is more preferred, and 90 to 100% is even more preferred.
- the poly(oxyfluoroalkylene) chain includes a poly(oxyperfluoroalkylene) chain and a poly(oxyperfluoroalkylene) chain having one or two oxyfluoroalkylene units having hydrogen atoms at one end or both ends. more preferred.
- two or more (OX) arrangements are represented as follows.
- the structure represented by ⁇ (OCF 2 ) m21 (OCF 2 CF 2 ) m22 ⁇ indicates that m21 (OCF 2 ) and m22 (OCF 2 CF 2 ) are randomly arranged.
- the structure represented by ( OCF 2 CF 2 -OCF 2 CF 2 CF 2 CF 2 ) m25 is composed of m25 ( OCF2CF2 ) and m25 ( OCF2CF2CF2CF2 ) Indicates that they are arranged alternately.
- (OX) m is represented by (OCH ma F (2-ma) ) m11 ⁇ (OC 2 H mb F (4-mb) ) m12 ⁇ (OC 3 H mc F (6-mc) ) m13 ⁇ (OC 4 H md F (8-md) ) m14 .(OC 5 H me F (10-me) ) m15 .(OC 6 H mf F (12-mf) ) m16 .(O-cycloC 4 H mg F (6- mg) ) m17 is preferred.
- -cycloC 4 H mg F (6-mg) represents a fluorocyclobutane-diyl group, preferably a fluorocyclobutane-1,2-diyl group.
- ma is 0 or 1
- mb is an integer of 0 to 3
- mc is an integer of 0 to 5
- md is an integer of 0 to 7
- me is an integer of 0 to 9.
- mf is an integer from 0 to 11
- mg is an integer from 0 to 5.
- m11, m12, m13, m14, m15, m16 and m17 are each independently an integer of 0 or more, preferably 100 or less.
- m11 + m12 + m13 + m14 + m15 + m16 + m17 is an integer of 2 or more, preferably an integer of 2 to 500, more preferably an integer of 2 to 200, more preferably an integer of 5 to 150, particularly preferably an integer of 5 to 100, and an integer of 10 to 50 Most preferred.
- m12 is preferably an integer of 2 or more, more preferably an integer of 2 to 200.
- C 3 H mc F (6-mc) , C 4 H md F (8-md) , C 5 H me F (10-me) and C 6 H mf F (12-mf) are also linear or a branched chain, and a straight chain is preferred from the standpoint of more excellent abrasion resistance of the surface layer.
- the above formula represents the type and number of units, and does not represent the arrangement of the units. That is, m11 to m16 represent the number of units.
- m11 represents a block in which m11 (OCH ma F (2-ma) ) units are consecutive. is not.
- the order of (OCH ma F (2-ma) ) to (O-cycloC 4 H mg F (6-mg) ) does not indicate that they are arranged in that order.
- the arrangement of different units is a random arrangement or an alternate arrangement.
- each oxyfluoroalkylene unit may be the same or different.
- m11 is 2 or more
- multiple (OCH ma F (2-ma) ) may be the same or different.
- (OX) m preferably has the following structure. ⁇ ( OCF2 ) m21 ( OCF2 CF2) m22 ⁇ , ( OCF2CF2 ) m23 , ( OCF2CF2CF2 ) m24 , ( OCF2CF2 - OCF2CF2CF2 ) m25 , ( OCF2CF2CF2CF2 ) m26 ( OCF2 ) m27 , ( OCF2CF2CF2CF2CF2 ) m26 ( OCF2CF2 ) m27 , ( OCF2CF2CF2CF2CF2CF2 ) m26 ( OCF2 ) m27 , ( OCF2CF2CF2CF2CF2CF2 ) m26 ( OCF2 ) m27 , ( OCF2CF2CF2CF2CF2CF2 ) m26 ( OCF2 ) m27 , ( OCF2CF2CF2CF2CF2 ) m26 ( OCF
- m21 is an integer of 1 or more
- m22 is an integer of 1 or more
- m21+m22 is an integer of 2 to 500
- m23 and m24 are each independently an integer of 2 to 500
- m25 is It is an integer of 1-250
- m26 and m27 are each independently an integer of 1 or more
- m26+m27 is an integer of 2-500
- m28 is an integer of 1-250.
- (OX) m is preferably the following structure from the viewpoint of easy production of the specific fluorine-containing ether compound. ⁇ ( OCF2 ) m21 ( OCF2 CF2) m22 ⁇ , ( OCF2CF2 ) m24 , (OCF 2 CF 2 ) 2 ⁇ (OCF 2 ) m21 (OCF 2 CF 2 ) m22-2 ⁇ , ( OCF2CF2 - OCF2CF2CF2 ) m25-1 OCF2CF2 , _ ( OCF2CF2CF2CF2CF2 - OCF2 ) m28 , ( OCF2CF2CF2CF2CF2CF2 - OCF2 ) m28 , _ ( OCF2CF2 - OCF2CF2CF2 ) m28-1 OCF2CF2 , _ _ ( OCF2CF2 - OCF2CF2CF2CF2CF2 ) m28-1 OCF2CF2 , _
- (OX) m includes ⁇ (OCF 2 ) m21 (OCF 2 CF 2 ) m22 ⁇ and (OCF 2 CF 2 - OCF 2 CF 2 CF 2 CF 2 ) m25 is preferred.
- the (P) group has the above structure
- the (L) group has a divalent group represented by the formula (L1), so that particularly friction resistance and lubricity Excellent compatibility with
- ⁇ (OCF 2 ) m21 (OCF 2 CF 2 ) m22 ⁇ the ratio of m22 to m21 (m22/m21) is from 0.05 to 10.00 is preferred, 0.10 to 5.00 is more preferred, 0.12 to 2.00 is even more preferred, 0.14 to 1.50 is particularly preferred, and 0.16 to 0.85 is most preferred.
- m21 is preferably 2 to 200 and m22 is 2 to 100, m21 is 10 to 100 and m22 is 5 to 50. More preferably, m21 is 15-60 and m22 is 5-30.
- m25 is preferably 2 to 100, more preferably 3 to 50, still more preferably 5 to 14, and particularly preferably 7 to 13.
- the (P) group preferably has a structure represented by the following formula (P1).
- R f1 represents a fluoroalkyl group
- each X independently represents a fluoroalkylene group
- R f2 represents a fluoroalkylene group
- m represents an integer of 2 or more.
- R f1 is a fluoroalkyl group.
- the number of carbon atoms in the fluoroalkyl group is preferably from 1 to 20, more preferably from 1 to 10, even more preferably from 1 to 6, from the viewpoint of improving the abrasion resistance of the surface layer.
- a fluoroalkyl group may be linear, branched or cyclic.
- the fluoroalkyl group may be one in which at least one of the hydrogen atoms in the alkyl group is replaced with a fluorine atom, and the ratio of the number of fluorine atoms to the total number of hydrogen atoms and fluorine atoms in the fluoroalkyl group is 40% or more. It is preferably 60% or more, more preferably 80% or more.
- Perfluoroalkyl groups include CF 3 —, CF 3 CF 2 —, CF 3 CF 2 CF 2 —, CF 3 CF 2 CF 2 —, CF 3 CF 2 CF 2 CF 2 —, CF 3 CF 2 CF 2 CF 2 —, CF 3 CF(CF 3 )-, etc., and from the viewpoint of more excellent water and oil repellency of the surface layer, CF 3 -, CF 3 CF 2 -, and CF 3 CF 2 CF 2 — is preferred.
- R f2 is a fluoroalkylene group.
- the number of carbon atoms in the fluoroalkylene group is preferably 1-6, more preferably 1-3.
- the fluoroalkylene group may be linear or branched, and is preferably linear from the viewpoint of providing a surface layer with more excellent abrasion resistance.
- the fluoroalkylene group has one or more fluorine atoms, preferably 1 to 10 fluorine atoms, particularly preferably 1 to 6 fluorine atoms.
- the fluoroalkylene group may be one in which at least one of the hydrogen atoms in the alkylene group is replaced with a fluorine atom, and the ratio of the number of fluorine atoms to the total number of hydrogen atoms and fluorine atoms in the fluoroalkylene group is 40% or more. It is preferably 60% or more, more preferably 80% or more.
- the fluoroalkylene group may be a group in which all hydrogen atoms in the fluoroalkylene group are substituted with fluorine atoms (perfluoroalkylene group).
- R f2 includes -CF 2 CHF-, -CHFCF 2 -, -CH 2 CF 2 -, -CF 2 CF 2 CHF-, -CHFCF 2 CF 2 -, -CH 2 CF 2 CF 2 -, -CH 2 CF2CF2CF2- , -CH2CF2CF2CF2CF2- , -CH2CF2CF2CF2CF2- , -CH2CF2CF2CF2CF2- , -CF2- , -CF2CF2- , -CF _ _ _ _ _ _ 2CF2- , -CF ( CF3 ) CF2- , -CF2CF2CF2CF2- , -CF ( CF3 ) CF2CF2- , -CF2CF2CF2CF 2- , -CF 2 CF 2 CF 2 CF 2 CF 2 - and the like.
- the (L) group is a divalent group represented by the formula (L1): -X 1 -NR 1 -(CH 2 ) n1 -.
- X 1 represents a single bond or a divalent organic group
- R 1 represents an alkyl group
- n1 represents an integer of 1-10.
- X1 represents a single bond or a divalent organic group.
- the number of carbon atoms in the divalent organic group is preferably 1-20, more preferably 1-10, even more preferably 1-6.
- divalent organic groups include ether group-containing groups, ester group-containing groups, carbonyl group-containing groups, alkylene groups, and fluoroalkylene groups having the number of carbon atoms described above.
- alkylene group a linear or branched alkylene group is preferred.
- the number of carbon atoms in the alkylene group is preferably 1-20, more preferably 1-10, even more preferably 1-6.
- the fluoroalkylene group may be one in which at least one of the hydrogen atoms in the alkylene group is replaced with a fluorine atom, and the ratio of the number of fluorine atoms to the total number of hydrogen atoms and fluorine atoms in the fluoroalkylene group is 40% or more. It is preferably 60% or more, more preferably 80% or more, and particularly preferably a perfluoroalkylene group.
- the perfluoroalkylene group includes a fluoroalkylene group in which all or part of the hydrogen atoms of the alkylene group are replaced with fluorine atoms, and a perfluoroalkylene group in which all of the hydrogen atoms of the alkylene group are replaced with fluorine atoms. preferable.
- the alkylene group having 1 to 6 carbon atoms is preferably a linear or branched alkylene group having 1 to 6 carbon atoms, such as methylene group, ethylene group, n-propylene group, isopropylene group, butylene group, each Pentylene groups and respective hexylene groups are included.
- perfluoroalkylene groups having 1 to 6 carbon atoms include perfluoroalkylene groups in which all hydrogen atoms of the alkylene groups having 1 to 6 carbon atoms are replaced with fluorine atoms.
- R 1 represents an alkyl group, preferably an alkyl group having 1 to 20 carbon atoms, more preferably an alkyl group having 1 to 10 carbon atoms, and from the viewpoint of better abrasion resistance, an alkyl group having 1 to 10 carbon atoms. 4 alkyl groups are more preferred. When the number of carbon atoms is 1 to 4, steric hindrance is small, so the "adhesion site with the base material" derived from the reactive silyl group is considered to be well adhered to the base material, and the abrasion resistance is particularly improved.
- R 1 may be a methyl group, an ethyl group, an n-butyl group, or an n-pentyl group, and may be a methyl group, an ethyl group, or an n-butyl group, a methyl group, or an n-butyl group. or a methyl group.
- n1 represents an integer of 1 to 10, preferably 1 to 6, more preferably 1 to 3, from the viewpoint of better abrasion resistance.
- R 1 is the same as the definition of R 1 in formula (L1), and n11 represents an integer of 1-3.
- a reactive silyl group means a hydrolyzable silyl group and a silanol group (Si—OH).
- a hydrolyzable silyl group becomes a silanol group represented by Si—OH through a hydrolysis reaction.
- the silanol groups further undergo a dehydration condensation reaction between silanol groups to form Si--O--Si bonds.
- the silanol group can undergo a dehydration condensation reaction with a hydroxyl group present on the surface of the substrate to form a bond of the Si—O—substrate.
- the number of reactive silyl groups in one molecule of the specific fluorine-containing ether compound is 1 or more, preferably 1 to 3, more preferably 1 or 2.
- the multiple reactive silyl groups may be the same or different. From the viewpoint of availability of raw materials and ease of production of the fluorine-containing ether compound, it is preferable that the plurality of reactive silyl groups are the same.
- each R 2 independently represents a monovalent hydrocarbon group
- each L independently represents a hydrolyzable group or a hydroxyl group
- n represents an integer of 0-2.
- Each R 2 is independently a monovalent hydrocarbon group, preferably a monovalent saturated hydrocarbon group.
- the number of carbon atoms in R 2 is preferably 1-6, more preferably 1-3, even more preferably 1-2.
- Each L is independently a hydrolyzable group or a hydroxyl group.
- the hydrolyzable group represented by L is a group that becomes a hydroxyl group through a hydrolysis reaction.
- Examples of the hydrolyzable group L include an alkoxy group, an aryloxy group, a halogen atom, an acyl group, an acyloxy group, and an isocyanate group (--NCO).
- the alkoxy group an alkoxy group having 1 to 4 carbon atoms is preferable.
- the aryloxy group an aryloxy group having 3 to 10 carbon atoms is preferred.
- the aryl group of the aryloxy group may be an aryl group containing no heteroatom or a heteroaryl group.
- a chlorine atom is preferable as the halogen atom.
- As the acyl group an acyl group having 1 to 6 carbon atoms is preferred.
- an acyloxy group having 1 to 6 carbon atoms is preferred.
- L is preferably an alkoxy group having 1 to 4 carbon atoms and a halogen atom.
- L is preferably an alkoxy group having 1 to 4 carbon atoms from the viewpoint of less outgassing during application and excellent storage stability of the fluorine-containing ether compound, and when long-term storage stability of the fluorine-containing ether compound is required.
- n is an integer of 0-2. n is preferably 0 or 1, more preferably 0.
- the adhesion of the surface layer to the base material becomes stronger.
- n is 1 or less, multiple Ls present in one molecule may be the same or different. From the viewpoint of availability of raw materials and ease of production of the fluorine-containing ether compound, it is preferable that the plurality of L's are the same.
- n is 2, multiple R 2 present in one molecule may be the same or different. From the viewpoint of the availability of raw materials and the ease of production of the fluorine-containing ether compound, they are preferably the same.
- the (S) group is preferably a group represented by the following formula (S1) or (S2).
- Formula (S2): —CH (3-p) [(CH 2 ) n2 —Si(R 2 ) n L 3-n ] p In formulas (S1) and (S2), each R 2 independently represents a monovalent hydrocarbon group, L each independently represents a hydrolyzable group or a hydroxyl group, p represents 2 or 3, n represents an integer of 0 to 2, n2 represents an integer of 1-10.
- p 2 or 3
- 3 is preferable from the viewpoint of better abrasion resistance.
- n2 represents an integer of 1 to 10, more preferably 1 to 6, and even more preferably 1 to 3, from the viewpoint of better abrasion resistance.
- the specific fluorine-containing ether compound includes compounds having the following structures in which Formula (P1), Formula (L1), and Formula (S1) or (S2) are combined.
- R f1 —(OX) m OR f2 —X 1 —NR 1 —(CH 2 ) n1 —Si(R 2 ) n L 3-n
- R f1 —(OX) m OR f2 —X 1 —NR 1 —(CH 2 ) n1 —CH (3-p) [(CH 2 ) n2 —Si(R 2 ) n L 3-n ] p
- the details of each code are as described above.
- the fluorine-containing ether mixture of the present disclosure contains two or more specific fluorine-containing ether compounds, or one or more specific fluorine-containing ether compounds and a fluorine-containing ether compound other than the specific fluorine-containing ether compounds.
- the fluorine-containing ether mixture is also referred to as "specific fluorine-containing ether mixture”.
- a specific fluorine-containing ether mixture is a mixture of two or more fluorine-containing ether compounds containing a specific fluorine-containing ether compound.
- fluorine-containing ether compound other than the specific fluorine-containing ether compound examples include a linking group having a poly(oxyfluoroalkylene) chain and a reactive silyl group, both of which have a structure different from that of formula (L1). compounds that are linked via As the fluorine-containing ether compound other than the specific fluorine-containing ether compound, a compound that is unlikely to deteriorate the properties of the specific fluorine-containing ether compound is preferable.
- the fluorine-containing ether compounds other than the specific fluorine-containing ether compound may be used singly or in combination of two or more.
- fluorine-containing ether compounds other than the specific fluorine-containing ether compounds include those described in the following documents. perfluoropolyether-modified aminosilanes described in JP-A-11-029585 and JP-A-2000-327772; a silicon-containing organic fluorine-containing polymer described in Japanese Patent No. 2874715; Organosilicon compounds described in JP-A-2000-144097, Fluorinated siloxane described in JP-T-2002-506887, Organosilicone compounds described in JP-T-2008-534696, a fluorinated modified hydrogen-containing polymer described in Japanese Patent No. 4138936; The compounds described in US Patent Application Publication No.
- fluorine-containing ether compounds other than specific fluorine-containing ether compounds include KY-100 series (KY-178, KY-185, KY-195, etc.) manufactured by Shin-Etsu Chemical Co., Ltd.; Afluid (registered trademark) manufactured by AGC; ) S550; Optool (registered trademark) DSX, Optool (registered trademark) AES, Optool (registered trademark) UF503, Optool (registered trademark) UD509 manufactured by Daikin Industries; Fomblin (registered trademark), Galden (registered trademark) manufactured by Solvay ), Fluorolink (registered trademark); Krytox (registered trademark) manufactured by Chemours, and the like.
- Fluorine-containing ether compounds other than the specific fluorine-containing ether compound also include fluorine-containing ether compounds that are by-produced in the production process of the specific fluorine-containing ether compound.
- Examples of the by-product fluorine-containing ether compound include CF 3 CF 2 CF 2 O[CF 2 obtained as a by-product of the fluorine-containing ether compound produced by the method described in Example 13-7 of WO 2018/216630.
- the content of the fluorine-containing ether compound other than the specific fluorine-containing ether compound is preferably 0% by mass or more and less than 90% by mass, more preferably 0% by mass or more and less than 70% by mass, based on the total mass of the specific fluorine-containing ether compound. , more preferably 0% by mass or more and less than 50% by mass, and particularly preferably 0% by mass or more and less than 30% by mass.
- the coating agent of the present disclosure contains a specific fluorine-containing ether compound or a specific fluorine-containing ether mixture.
- a specific fluorine-containing ether compound or a specific fluorine-containing ether mixture can be used alone to form a surface layer on a substrate (dry coating method described later).
- a composition containing other components than the specific fluorine-containing ether compound or the specific fluorine-containing ether mixture may be used (dry coating method and wet coating method described later). .
- a specific fluorine-containing ether compound, a specific fluorine-containing ether mixture, and a composition containing a specific fluorine-containing ether compound or a specific fluorine-containing ether mixture and other components, which are used for coating a substrate are all ""coatingagent".
- the coating agent may contain a liquid medium.
- liquid media include water and organic solvents.
- a liquid medium refers to a medium that is liquid at 25°C.
- the liquid medium preferably contains an organic solvent, and more preferably contains an organic solvent having a boiling point of 35 to 250° C. from the viewpoint of excellent coatability.
- boiling point means normal boiling point.
- the organic solvent include fluorine-based organic solvents and non-fluorine-based organic solvents, and from the viewpoint of excellent solubility, fluorine-based organic solvents are preferred.
- An organic solvent may be used individually by 1 type, and may use 2 or more types together.
- Fluorinated organic solvents include fluorinated alkanes, fluorinated aromatic compounds, fluoroalkyl ethers, fluorinated alkylamines, fluoroalcohols and the like.
- the fluorinated alkane is preferably a compound having 4 to 8 carbon atoms.
- Examples of compounds having 4 to 8 carbon atoms include C 6 F 13 H (AC-2000: product name, manufactured by AGC), C 6 F 13 C 2 H 5 (AC-6000: product name, manufactured by AGC), C 2 F 5 CHFCHFCF 3 (Vertrell: product name, manufactured by Chemours) and the like.
- Fluorinated aromatic compounds include hexafluorobenzene, trifluoromethylbenzene, perfluorotoluene, 1,3-bis(trifluoromethyl)benzene, and 1,4-bis(trifluoromethyl)benzene.
- Fluoroalkyl ethers are preferably compounds having 4 to 12 carbon atoms. Examples of fluoroalkyl ethers include CF 3 CH 2 OCF 2 CF 2 H (AE-3000: product name, manufactured by AGC), C 4 F 9 OCH 3 (Novec-7100: product name, manufactured by 3M), and C 4 F.
- Fluorinated alkylamines include perfluorotripropylamine, perfluorotributylamine, and the like.
- Fluoroalcohols include 2,2,3,3-tetrafluoropropanol, 2,2,2-trifluoroethanol, hexafluoroisopropanol and the like.
- non-fluorine organic solvent a compound consisting only of hydrogen atoms and carbon atoms, and a compound consisting only of hydrogen atoms, carbon atoms and oxygen atoms are preferable.
- examples of such compounds include hydrocarbon-based organic solvents, ketone-based organic solvents, ether-based organic solvents, ester-based organic solvents, and alcohol-based organic solvents.
- hydrocarbon-based organic solvents include hexane, heptane, cyclohexane, and the like.
- Ketone organic solvents include acetone, methyl ethyl ketone, methyl isobutyl ketone, and the like.
- ether-based organic solvents examples include diethyl ether, tetrahydrofuran, tetraethylene glycol dimethyl ether, and the like. Ethyl acetate, butyl acetate, etc. are mentioned as an ester type organic solvent.
- alcoholic organic solvents include isopropyl alcohol, ethanol, n-butanol and the like.
- the content of the liquid medium is preferably 70.00 to 99.99% by mass, more preferably 75.00 to 99.50% by mass, relative to the total mass of the coating agent.
- the coating agent may contain components other than the specific fluorine-containing ether compound, the fluorine-containing ether compound other than the specific fluorine-containing ether compound, and the liquid medium.
- the coating agent may contain by-products produced in the manufacturing process of the specific fluorine-containing ether compound and optionally other fluorine-containing ether compounds, residual unreacted raw materials, and the like.
- the coating agent may also contain additives such as acid catalysts and basic catalysts that promote hydrolysis and condensation reaction of the hydrolyzable silyl groups.
- Acid catalysts include hydrochloric acid, nitric acid, acetic acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, p-toluenesulfonic acid and the like.
- Basic catalysts include sodium hydroxide, potassium hydroxide, ammonia and the like.
- the content of such components is the total mass of the components of the coating agent excluding the liquid medium. 0 to 10% by mass is preferable, 0 to 5% by mass is more preferable, and 0 to 1% by mass is even more preferable.
- An article of the present disclosure has a substrate and a surface layer formed on the substrate with the coating agent.
- the surface layer contains a compound obtained by hydrolysis reaction and condensation reaction of a specific fluorine-containing ether compound.
- the thickness of the surface layer is preferably 1 to 100 nm, particularly preferably 1 to 50 nm. When the thickness of the surface layer is equal to or greater than the lower limit, the effect of the surface layer can be obtained satisfactorily. When the thickness of the surface layer is equal to or less than the upper limit, the utilization efficiency of the coating agent is high.
- the thickness of the surface layer is obtained by obtaining an interference pattern of reflected X-rays by X-ray reflectance method (XRR) using an X-ray diffractometer for thin film analysis (for example, product name “ATX-G”, manufactured by RIGAKU). , can be calculated from the oscillation period of this interference pattern.
- XRR X-ray reflectance method
- Substrates include other items (stylus, etc.), substrates that may be used in contact with human fingers, substrates that may be held with human fingers during operation, and other items (placing table, etc.).
- a substrate or the like on which it may be placed is preferred. Since the coating agent of the present disclosure can impart water and oil repellency and abrasion resistance to a substrate, it is particularly useful when using a substrate that requires imparting water and oil repellency and abrasion resistance.
- Materials for the substrate include metal, resin, glass, sapphire, ceramic, stone, fiber, non-woven fabric, paper, wood, natural leather, artificial leather, and composite materials thereof.
- the glass may be chemically strengthened.
- the base material is preferably a touch panel base material or a display base material, and more preferably a touch panel base material.
- the touch panel substrate preferably has translucency.
- the term "having translucency" means that the vertical incidence type visible light transmittance according to JIS R3106:2019 (ISO 9050:2003) is 25% or more.
- Glass or transparent resin is preferable as the material of the touch panel substrate. Interior goods; transportation equipment (automobiles, etc.); signboards or bulletin boards; drinking vessels or tableware; water tanks; packaging containers; glass or resin used for art, sports or games;
- As the base material glass or resin used for exterior parts (excluding display parts) of devices such as mobile phones (smartphones, etc.), personal digital assistants, game machines, remote controllers, etc. is also preferable.
- the shape of the substrate may be plate-like, film-like, or the like.
- the article is a touch panel, and the surface layer is formed on the surface of a member that constitutes the surface of the touch panel that is touched by a finger.
- the surface layer may be formed directly on the surface of the substrate, or may be formed on the substrate via another film formed on the surface of the substrate.
- the other films include compounds described in paragraphs 0089 to 0095 of International Publication No. WO 2011/016458, base films formed on the surface of the base material by treating the base material with SiO 2 or the like. be done.
- Articles of the present disclosure can be manufactured, for example, in the following manner.
- a method of manufacturing an article comprising applying the coating agent of the present disclosure to the surface of a substrate by a dry coating method to form a surface layer on the substrate.
- a method of manufacturing an article comprising applying the coating agent of the present disclosure to the surface of a substrate by a dry coating method to form a surface layer on the substrate.
- Dry coating methods include vacuum deposition, CVD, and sputtering.
- the vacuum deposition method is preferable from the viewpoint of suppressing the decomposition of the specific fluorine-containing ether compound and from the viewpoint of the simplicity of the apparatus.
- a pellet-like material obtained by impregnating a metal porous material such as iron or steel with a coating agent containing a liquid medium and drying may be used.
- wet coating methods include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet, flow coating, roll coating, casting, Langmuir-Blodgett, and gravure. A coat method and the like can be mentioned.
- the drying temperature of the coating film is preferably 20 to 200°C, more preferably 80 to 160°C.
- a specific fluorine-containing ether compound is hydrolyzed in advance using a catalyst such as an acid catalyst or a basic catalyst, and a composition containing the hydrolyzed compound and a liquid medium is used as a coating agent. good too.
- compounds 1-8 compounds 1, 2, and 4-6 are compounds according to embodiments of the present disclosure, and the others are comparative compounds. Further, among Examples 1 to 10, Examples 1, 2, 4 to 6, and 9 are examples, and the others are comparative examples.
- Step 2 In a 100 mL tetrafluoroethylene-perfluoro(alkoxyvinyl ether) copolymer eggplant flask, 5.0 g of compound 1-1 and platinum/1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex were added. 0.03 g of xylene solution (platinum content: 2% by mass), 0.36 g of trimethoxysilane, 0.01 g of aniline and 2.0 g of 1,3-bis(trifluoromethyl)benzene were added, and the mixture was heated to room temperature ( 25° C.) for 8 hours.
- Step 2 Compound 2-1 was obtained in the same manner as in the synthesis of compound 1-1, except that N-butylallylamine was used instead of N-methylallylamine as a starting material.
- Step 3 Compound 2 was obtained in the same manner as in step 2 of the production example of compound 1, except that compound 2-1 was used instead of compound 1-1 as a starting material.
- CF3- OCF2CF2OCF2CF2CF2CF2 ) mOCF2CF2OCF2CF2CF2 - C ( O ) N ( CH2CH2CH2CH3 ) CH2CH2CH2 _ _ _ _ _ —Si(OCH 3 ) 3 (compound 2) Average value of unit number m: 13, Mn: 4,929.
- Step 1 10.0 g of N-pentylallylamine was obtained in the same manner as described in Example 3 of Japanese Patent No. 6384430, except that n-pentylamine was used instead of n-butylamine.
- Step 2 Compound 4-1 was obtained in the same manner as in the synthesis of compound 1-1, except that N-pentylallylamine was used instead of N-methylallylamine as a starting material.
- CF3- OCF2CF2OCF2CF2CF2CF2 ) x5OCF2CF2OCF2CF2CF2 - C ( O ) N ( CH2CH2CH2CH3 ) CH2 - CH _ _ ⁇ CH 2
- Compound 4-1 Average value of unit number m: 13, Mn: 4,821.
- Step 3 Compound 4 was obtained in the same manner as in step 2 of the production example of compound 1, except that compound 4-1 was used instead of compound 1-1 as a starting material.
- CF3- OCF2CF2OCF2CF2CF2CF2 ) mOCF2CF2OCF2CF2CF2 - C ( O ) N ( CH2CH2CH2CH2CH3 ) CH2CH2 _ _ _ _ _ CH 2 —Si(OCH 3 ) 3 (compound 4) Average value of unit number m: 13, Mn: 4,943.
- Step 1 In the method described in Example 3-3 of Examples of International Publication No. 2017/038832, compound 5-1 was obtained by performing the same operation except using N-methylallylamine instead of diallylamine.
- CF 3 (OCF 2 CF 2 OCF 2 CF 2 CF 2 CF 2 ) m OCF 2 CF 2 OCF 2 CF 2 CF 2 —CH 2 —N(CH 3 )CH 2 —CH ⁇ CH 2 (compound 5 -1) Average value of unit number m: 13, Mn: 4,751.
- Step 2 Compound 5 was obtained in the same manner as in step 2 of the production example of compound 1, except that compound 5-1 was used instead of compound 1-1 as a starting material.
- CF3- OCF2CF2OCF2CF2CF2CF2 ) mOCF2CF2OCF2CF2CF2 - CH2 - N ( CH3 ) CH2CH2CH2 - Si ( OCH3 ) 3 _ ...
- compound 5 Average value of unit number m: 13, Mn: 4,837.
- Step 1 CF 3 CF 2 CF 2 -O-CF 2 -CF 2 OCF 2 CF 2 CF 2 CF 2 CF 2 O-CF in analogy to the method described in Examples 13-6 of WO 2018/216630 10.0 g of 2-(CF 2 O ) ⁇ (CF 2 O) x1 (CF 2 CF 2 O) x2 ⁇ -CF 2 -C(O)OCH 3 was obtained. Subsequently, 1.54 g of N-methylallylamine, 1.12 g of 4-pyrrolidinopyridine and 3 g of AC-2000 were added and stirred at 0° C. for 200 hours.
- Step 2 Compound 6 was obtained in the same manner as in step 2 of the production example of compound 1, except that compound 6-1 was used instead of compound 1-1 as a starting material.
- CF 3 CF 2 CF 2 --O--CF 2 --CF 2 OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2 O--CF 2 --(CF 2 O) ⁇ (CF 2 O) x1 (CF 2 CF 2 O) x2 ⁇ —CF 2 —C(O)N(CH 3 )CH 2 CH 2 CH 2 —Si(OCH 3 ) 3
- Step 1 Compound 7-1 was obtained in the same manner as in the preparation of compound 6-1, except that allylamine was used instead of N-methylallylamine.
- CF 3 CF 2 CF 2 --O--CF 2 --CF 2 OCF 2 CF 2 CF 2 CF 2 CF 2 O--CF 2 --(CF 2 O) ⁇ (CF 2 O) x1 (CF 2 CF 2 O) x2 ⁇ —CF 2 —C(O)NHCH 2 —CH ⁇ CH 2
- Compound 7-1 Average value of unit number x1: 21, average value of unit number x2: 20, Mn: 4,592
- Step 2 Compound 7 was obtained in the same manner as in step 2 of the production example of compound 1, except that compound 7-1 was used instead of compound 1-1 as a starting material.
- CF 3 CF 2 CF 2 --O--CF 2 --CF 2 OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2 O--CF 2 --(CF 2 O) ⁇ (CF 2 O) x1 (CF 2 CF 2 O) x2 ⁇ —CF 2 —C(O)NHCH 2 CH 2 CH 2 —Si(OCH 3 ) 3
- Step 1 Compound 8-1 was obtained by performing the same operation except that diallylamine was used instead of N-methylallylamine in the production of compound 6-1.
- CF 3 CF 2 CF 2 --O--CF 2 --CF 2 OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2 O--CF 2 --(CF 2 O) ⁇ (CF 2 O) x1 (CF 2 CF 2 O) x2 ⁇ —CF 2 —C(O)N[CH 2 —CH ⁇ CH 2 ] 2
- Compound 8-1 Average value of unit number x1: 21, average value of unit number x2: 20, Mn: 4,634.
- Step 2 Compound 8 was obtained in the same manner as in step 2 of the production example of compound 1, except that compound 8-1 was used instead of compound 1-1 as a starting material.
- CF 3 CF 2 CF 2 --O--CF 2 --CF 2 OCF 2 CF 2 CF 2 CF 2 CF 2 CF 2 O--CF 2 --(CF 2 O) ⁇ (CF 2 O) x1 (CF 2 CF 2 O) x2 ⁇ —CF 2 —C(O)N[CH 2 CH 2 CH 2 —Si(OCH 3 ) 3 ] 2
- Compound 8 Average value of unit number x1: 21, average value of unit number x2: 20, Mn: 4,876.
- a base material non-alkali glass (Eagle XG: product name, manufactured by Corning, 50 mm ⁇ 50 mm, thickness 0.5 mm)
- the vacuum deposition apparatus is 5 ⁇ 10 -3 Pa or less.
- a vapor deposition vessel containing the fluorine-containing ether compound synthesized above was placed at a position at a distance of 1000 mm so as to face one of the main surfaces of the substrate and heated to 300° C. by resistance heating to vacuum-deposit the fluorine-containing ether compound.
- a surface layer with a thickness of 10 nm was formed.
- the temperature of the fluorine-containing ether compound in each example was 300°C. After that, the obtained substrate with a surface layer was heated at a temperature of 200° C. for 30 minutes (post-treatment).
- the coating agent formed on the substrate is heated at 120 ° C. for 10 It was dried for a minute to obtain a base material with a surface layer.
- the thickness of the surface layer was 10 nm.
- ⁇ Evaluation method> [Method for measuring water contact angle]
- the contact angle of approximately 2 ⁇ L of distilled water placed on the surface of the surface layer was measured using a contact angle measurement device (manufactured by Kyowa Interface Science Co., Ltd., DM-500). Measurements were performed at five different points on the surface of the surface layer, and the average value was calculated. The 2 ⁇ method was used to calculate the contact angle.
- Initial water contact angle The initial water contact angle of the surface layer was measured by the method described above. Evaluation criteria are as follows. Initial water contact angle: A: 115 degrees or more. B: 110 degrees or more and less than 115 degrees. C: 100 degrees or more and less than 110 degrees. D: Less than 100 degrees.
- the dynamic friction coefficient of the surface layer against artificial skin was measured using a variable load type friction and wear test system (manufactured by Shinto Kagaku Co., Ltd., HHS2000), contact area: 3 cm ⁇ 3 cm, load: 0.98 N was measured under the conditions of The smaller the coefficient of dynamic friction, the better the lubricity. Evaluation criteria are as follows. A: The dynamic friction coefficient is 0.3 or less. B: The dynamic friction coefficient is more than 0.3 and 0.4 or less. C: The dynamic friction coefficient is more than 0.4 and 0.5 or less. D: The dynamic friction coefficient is over 0.5.
- a surface layer was formed on the base material using compounds 1 to 8, and each evaluation was performed.
- the evaluation results of each example are shown in the table below.
- Examples 1, 2, 4 to 6, and 9 the eraser abrasion resistance evaluation was A or B, and it was confirmed that excellent abrasion resistance was obtained. Comparing Examples 1 to 4, even with the same poly(oxyfluoroalkylene) chain and reactive silyl group, especially when an alkyl group having 1 to 4 carbon atoms is attached to the nitrogen atom of the linking group, It was found that excellent abrasion resistance was obtained. Moreover, excellent lubricity was confirmed in any of the examples.
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Abstract
Description
<1> ポリ(オキシフルオロアルキレン)鎖を有する1価の基と、
式(L1):-X1-NR1-(CH2)n1-で表される2価の基と、
反応性シリル基を有する1価の基と、
を有し、
前記ポリ(オキシフルオロアルキレン)鎖を有する1価の基は前記式(L1)で表される2価の基の-X1-と連結し、前記反応性シリル基を有する1価の基は前記式(L1)で表される2価の基の-(CH2)n1-と連結している、含フッ素エーテル化合物:
式(L1)中、
X1は単結合又は2価の有機基を表し、
R1はアルキル基を表し、
n1は1~10の整数を表す。
<2> 式(L1)中、X1が-C(=O)-O-、-O-C(=O)-、-C(=O)-、-CH2-O-、-O-CH2-、-CH2-O-CH2-、炭素数1~6のアルキレン基、又は炭素数1~6のペルフルオロアルキレン基である、<1>に記載の含フッ素エーテル化合物。
<3> 式(L1)中、R1が炭素数1~4のアルキル基である、<1>又は<2>に記載の含フッ素エーテル化合物。
<4> 前記ポリ(オキシフルオロアルキレン)鎖中のフルオロアルキレン基の炭素数がそれぞれ独立に1~6である、<1>~<3>のいずれか1項に記載の含フッ素エーテル化合物。
<5> 前記ポリ(オキシフルオロアルキレン)鎖を有する1価の基が、式(P1):Rf1-(OX)m-O-Rf2-で表される構造を有する、<1>~<4>のいずれか1項に記載の含フッ素エーテル化合物;
式(P1)中、
Rf1はフルオロアルキル基を表し、
Xはそれぞれ独立にフルオロアルキレン基を表し、
Rf2はフルオロアルキレン基を表し、
mは2以上の整数を表す。
<6> 前記反応性シリル基を有する1価の基が、下記式(S1)又は(S2)で表される、<1>~<5>のいずれか1項に記載の含フッ素エーテル化合物;
式(S1):-Si(R2)nL3-n
式(S2):-CH(3-p)[(CH2)n2-Si(R2)nL3-n]p:
式(S1)及び(S2)中、
R2はそれぞれ独立に1価の炭化水素基を表し、
Lはそれぞれ独立に加水分解性基又は水酸基を表し、
pは2又は3を表し、
nは0~2の整数を表し、
n2は1~10の整数を表す。
<7> <1>~<6>のいずれか1項に記載の含フッ素エーテル化合物を2種以上含むか、又は<1>~<6>のいずれか1項に記載の含フッ素エーテル化合物の1種以上と<1>~<6>のいずれか1項に記載の含フッ素エーテル化合物以外の含フッ素エーテル化合物とを含む、含フッ素エーテル混合物。
<8> <1>~<6>のいずれか1項に記載の含フッ素エーテル化合物又は<7>に記載の含フッ素エーテル混合物を含むコーティング剤。
<9> さらに液状媒体を含む、<8>に記載のコーティング剤。
<10> 基材と、<8>又は<9>に記載のコーティング剤により前記基材上に形成される表面層と、を有する物品。
<11> 前記物品がタッチパネルであり、前記表面層は前記タッチパネルの指で触れる面を構成する部材の表面に形成されている、<10>に記載の物品。
<12> <8>に記載のコーティング剤をドライコーティング法によって基材の表面に付与して、前記基材上に表面層を形成することを含む、物品の製造方法。
<13> <9>に記載のコーティング剤をウェットコーティング法によって基材の表面に付与することと、
前記コーティング剤を付与した基材を乾燥させて、前記基材上に表面層を形成することと、
を含む、物品の製造方法。
本開示において「~」を用いて示された数値範囲には、「~」の前後に記載される数値がそれぞれ最小値及び最大値として含まれる。
本開示において各成分は該当する物質を複数種含んでいてもよい。組成物中に各成分に該当する物質が複数種存在する場合、各成分の含有率又は含有量は、特に断らない限り、組成物中に存在する当該複数種の物質の合計の含有率又は含有量を意味する。
本開示において、「アルキル基」及び「アルキレン基」との語は、置換基を有する旨の特段の指定がない限り、それぞれ非置換のアルキル基及び非置換のアルキレン基を意味する。
本開示の含フッ素エーテル化合物は、
ポリ(オキシフルオロアルキレン)鎖を有する1価の基と、
式(L1):-X1-NR1-(CH2)n1-で表される2価の基と、
反応性シリル基を有する1価の基と、
を有し、
前記ポリ(オキシフルオロアルキレン)鎖を有する1価の基は前記式(L1)で表される2価の基の-X1-と連結し、前記反応性シリル基を有する1価の基は前記式(L1)で表される2価の基の-(CH2)n1-と連結している。
式(L1)中、
X1は単結合又は2価の有機基を表し、
R1はアルキル基を表し、
n1は1~10の整数を表す。
本開示において、特定含フッ素エーテル化合物の各基を以下のように示すことがある。
(P)基:前記ポリ(オキシフルオロアルキレン)鎖を有する1価の基
(L)基:前記式(L1):-X1-NR1-(CH2)n1-で表される2価の基
(S)基:前記反応性シリル基を有する1価の基
特定フッ素エーテル化合物は(P)基-(L)基-(S)基で示される構造を有する。
本開示において、特定含フッ素エーテル化合物の全体構造又は部分構造を示す場合、左側が(P)基側、右側が(S)基側となるように記載する。
特定フッ素エーテル化合物は、1種を単独で用いてもよく、2種以上を併用してもよい。
従来、ポリ(オキシフルオロアルキレン)鎖を有する基と、反応性シリル基を有する基と、の連結部に-NH-基を有するものが知られている。-NH-基は、化合物の基材への塗布時に基材表面と水素結合を形成し、反応性シリル基に由来する「基材との接着部位」として意図される部位が基材と結合することを妨げてしまうと考えられる。一方、特定含フッ素エーテル化合物は、-NH-基の水素原子がアルキル基に置き換えられているため、基材との水素結合を形成しにくく、反応性シリル基に由来する「基材との接着部位」として意図される部位が効率的に基材と結合すると考えられる。そのため、基材に結合する特定含フッ素エーテル化合物又はこれを含む組成物の量が増え、耐摩擦性が向上すると考えられる。
以下、特定含フッ素エーテル化合物の各基の構造を詳述する。
ポリ(オキシフルオロアルキレン)鎖は、下式で表される単位を複数含む。
式:(OX)
式中、Xはそれぞれ独立にフルオロアルキレン基を表す。
フルオロアルキレン基は、直鎖状、分岐鎖状及び環状のいずれであってもよい。
フルオロアルキレン基におけるフッ素原子の数は、表面層の耐摩擦性がより優れる観点からは、炭素原子の数の1~2倍が好ましく、1.7~2倍がより好ましい。
フルオロアルキレン基は、フルオロアルキレン基中のすべての水素原子がフッ素原子に置換された基(ペルフルオロアルキレン基)であってもよく、表面層の耐摩擦性がより優れる観点からは、ペルフルオロアルキレン基が好ましい。
ここで、-cycloC4F6-は、ペルフルオロシクロブタンジイル基を意味し、その具体例としては、ペルフルオロシクロブタン-1,2-ジイル基が挙げられる。
(OX)mは、1種の(OX)の繰り返しでもよく、2種以上の(OX)を含んでいてもよい。2種以上の(OX)の結合順序は限定されず、ランダム、交互、又はブロックに配置されてもよい。
2種以上の(OX)を含むとは、特定含フッ素エーテル化合物中において、例えば、炭素数の異なる2種以上の(OX)が存在すること、水素原子数が異なる2種以上の(OX)が存在すること、水素原子の位置が異なる2種以上の(OX)が存在すること、又は炭素数が同一であっても側鎖の有無、側鎖の種類(側鎖の数、側鎖の炭素数等)等が異なる2種以上の(OX)が存在することをいう。
m11、m12、m13、m14、m15、m16及びm17は、それぞれ独立に、0以上の整数であり、100以下が好ましい。
m11+m12+m13+m14+m15+m16+m17は2以上の整数であり、2~500の整数が好ましく、2~200の整数がより好ましく、5~150の整数が更に好ましく、5~100の整数が特に好ましく、10~50の整数が最も好ましい。
なかでも、m12は2以上の整数が好ましく、2~200の整数がより好ましい。
また、C3HmcF(6-mc)、C4HmdF(8-md)、C5HmeF(10-me)及びC6HmfF(12-mf)は、直鎖状であっても分岐鎖状であってもよく、表面層の耐摩擦性がより優れる観点からは直鎖状が好ましい。
上記式において、m11~m17のうちの2つ以上が0以外の場合(すなわち、(OX)mが2種以上の単位から構成されている場合)、異なる単位の配列は、ランダム配列、交互配列、ブロック配列及びそれら配列の組合せのいずれであってもよい。
上記式において、同じ式で表されるオキシフルオロアルキレン単位が2個以上存在する場合、各オキシフルオロアルキレン単位は同一であっても異なっていてもよい。例えば、m11が2以上の場合、複数の(OCHmaF(2-ma))は同一であっても異なっていてもよい。
{(OCF2)m21(OCF2CF2)m22}、
(OCF2CF2)m23、
(OCF2CF2CF2)m24、
(OCF2CF2-OCF2CF2CF2CF2)m25、
(OCF2CF2CF2CF2CF2)m26(OCF2)m27、
(OCF2CF2CF2CF2CF2)m26(OCF2CF2)m27、
(OCF2CF2CF2CF2CF2CF2)m26(OCF2)m27、
(OCF2CF2CF2CF2CF2CF2)m26(OCF2CF2)m27、
(OCF2CF2CF2CF2CF2-OCF2)m28、
(OCF2CF2CF2CF2CF2-OCF2CF2)m28、
(OCF2CF2CF2CF2CF2CF2-OCF2)m28、
(OCF2CF2CF2CF2CF2CF2-OCF2CF2)m28、
(OCF2-OCF2CF2CF2CF2CF2)m28、
(OCF2-OCF2CF2CF2CF2CF2CF2)m28、
(OCF2CF2-OCF2CF2CF2CF2CF2)m28、
(OCF2CF2-OCF2CF2CF2CF2CF2CF2)m28。
{(OCF2)m21(OCF2CF2)m22}、
(OCF2CF2CF2)m24、
(OCF2CF2)2{(OCF2)m21(OCF2CF2)m22-2}、
(OCF2CF2-OCF2CF2CF2CF2)m25-1OCF2CF2、
(OCF2CF2CF2CF2CF2-OCF2)m28、
(OCF2CF2CF2CF2CF2CF2-OCF2)m28、
(OCF2CF2-OCF2CF2CF2CF2CF2)m28-1OCF2CF2、
(OCF2CF2-OCF2CF2CF2CF2CF2CF2)m28-1OCF2CF2。
ただし、m22-2、m25-1及びm28-1はそれぞれ1以上の整数となる。
{(OCF2)m21(OCF2CF2)m22}において、m21が2~200であり、かつm22が2~100であることが好ましく、m21が10~100であり、かつm22が5~50であることがより好ましく、m21が15~60であり、かつm22が5~30であることが更に好ましい。
式(P1):Rf1-(OX)m-O-Rf2-
式(P1)中、
Rf1はフルオロアルキル基を表し、
Xはそれぞれ独立にフルオロアルキレン基を表し、
Rf2はフルオロアルキレン基を表し、
mは2以上の整数を表す。
フルオロアルキル基中の炭素数は、表面層の耐摩擦性がより優れる観点からは、1~20が好ましく、1~10がより好ましく、1~6が更に好ましい。
フルオロアルキル基は、直鎖状、分岐鎖状及び環状のいずれであってもよい。
フルオロアルキル基は、アルキル基の水素原子の少なくとも1つがフッ素原子に置き換えられたものであればよく、フルオロアルキル基における水素原子とフッ素原子の合計数に対するフッ素原子の数の割合が40%以上が好ましく、60%以上がより好ましく、80%以上が更に好ましい。
フルオロアルキレン基の炭素数は、1~6が好ましく、1~3がより好ましい。
フルオロアルキレン基は、直鎖状であっても分岐鎖状であってもよく、表面層の耐摩擦性がより優れる観点からは、直鎖状が好ましい。
フルオロアルキレン基は、フッ素原子を1個以上有し、フッ素原子の数は1~10個が好ましく、1~6個が特に好ましい。
フルオロアルキレン基は、アルキレン基の水素原子の少なくとも1つがフッ素原子に置き換えられたものであればよく、フルオロアルキレン基における水素原子とフッ素原子の合計数に対するフッ素原子の数の割合が40%以上が好ましく、60%以上がより好ましく、80%以上が更に好ましい。
フルオロアルキレン基は、フルオロアルキレン基中のすべての水素原子がフッ素原子に置換された基(ペルフルオロアルキレン基)であってもよい。
(L)基は、式(L1):-X1-NR1-(CH2)n1-で表される2価の基である。
式(L1)中、
X1は単結合又は2価の有機基を表し、
R1はアルキル基を表し、
n1は1~10の整数を表す。
2価の有機基の炭素数は1~20が好ましく、1~10がより好ましく、1~6が更に好ましい。2価の有機基としては、上記炭素数を有するエーテル基含有基、エステル基含有基、及びカルボニル基含有基、アルキレン基、及びフルオロアルキレン基が挙げられる。
アルキレン基としては、直鎖状又は分岐鎖状のアルキレン基が好ましい。アルキレン基の炭素数は、1~20が好ましく、1~10がより好ましく、1~6が更に好ましい。
フルオロアルキレン基は、アルキレン基の水素原子の少なくとも1つがフッ素原子に置き換えられたものであればよく、フルオロアルキレン基における水素原子とフッ素原子の合計数に対するフッ素原子の数の割合が40%以上が好ましく、60%以上がより好ましく、80%以上が更に好ましく、ペルフルオロアルキレン基が特に好ましい。
ペルフルオロアルキレン基としては、前記アルキレン基の水素原子の全部又は一部がフッ素原子で置き換えられたフルオロアルキレン基が挙げられ、前記アルキレン基の水素原子の全部がフッ素原子で置き換えられたペルフルオロアルキレン基が好ましい。
炭素数1~6のアルキレン基としては、直鎖状又は分岐鎖状の炭素数1~6のアルキレン基が好ましく、メチレン基、エチレン基、n-プロピレン基、イソプロピレン基、各ブチレン基、各ペンチレン基、及び各ヘキシレン基が挙げられる。
炭素数1~6のペルフルオロアルキレン基としては、前記炭素数1~6のアルキレン基の水素原子のすべてがフッ素原子で置き換えられたペルフルオロアルキレン基が挙げられる。
反応性シリル基とは、加水分解性シリル基及びシラノール基(Si-OH)を意味する。加水分解性シリル基は、加水分解反応によりSi-OHで表されるシラノール基となる。シラノール基は、更にシラノール基間で脱水縮合反応してSi-O-Si結合を形成する。また、シラノール基は、基材の表面に存在する水酸基と脱水縮合反応してSi-O-基材の結合を形成できる。
式:-Si(R2)nL3-n
式中、R2はそれぞれ独立に1価の炭化水素基を表し、Lはそれぞれ独立に加水分解性基又は水酸基を表し、nは0~2の整数を表す。
アルコキシ基としては、炭素数1~4のアルコキシ基が好ましい。
アリールオキシ基としては、炭素数3~10のアリールオキシ基が好ましい。ただしアリールオキシ基のアリール基は、ヘテロ原子を含まないアリール基であってもよく、ヘテロアリール基であってもよい。
ハロゲン原子としては、塩素原子が好ましい。
アシル基としては、炭素数1~6のアシル基が好ましい。
アシルオキシ基としては、炭素数1~6のアシルオキシ基が好ましい。
nは、0又は1が好ましく、0がより好ましい。Lが複数存在することによって、表面層の基材への密着性がより強固になる。
nが1以下である場合、1分子中に存在する複数のLは同じであっても異なっていてもよい。原料の入手容易性及び含フッ素エーテル化合物の製造容易性の観点からは、複数のLは互いに同じであることが好ましい。
nが2である場合、1分子中に存在する複数のR2は同じであっても異なっていてもよい。原料の入手容易性及び含フッ素エーテル化合物の製造容易性の観点からは、互いに同じであることが好ましい。
式(S1):-Si(R2)nL3-n
式(S2):-CH(3-p)[(CH2)n2-Si(R2)nL3-n]p:
式(S1)及び(S2)中、
R2はそれぞれ独立に1価の炭化水素基を表し、
Lはそれぞれ独立に加水分解性基又は水酸基を表し、
pは2又は3を表し、
nは0~2の整数を表し、
n2は1~10の整数を表す。
一態様において、特定含フッ素エーテル化合物としては、式(P1)、式(L1)、及び式(S1)又は(S2)を組み合わせた下記構造の化合物が挙げられる。
Rf1-(OX)m-O-Rf2-X1-NR1-(CH2)n1-Si(R2)nL3-n
Rf1-(OX)m-O-Rf2-X1-NR1-(CH2)n1-CH(3-p)[(CH2)n2-Si(R2)nL3-n]p
各符号の詳細は上述の通りである。
本開示の含フッ素エーテル混合物は、特定含フッ素エーテル化合物を2種以上含むか、又は特定含フッ素エーテル化合物の1種以上と特定含フッ素エーテル化合物以外の含フッ素エーテル化合物とを含む。以下、前記含フッ素エーテル混合物を「特定含フッ素エーテル混合物」とも称する。特定含フッ素エーテル混合物は、特定含フッ素エーテル化合物を含む、2種以上の含フッ素エーテル化合物の混合物である。
特定含フッ素エーテル化合物以外の含フッ素エーテル化合物は、1種を単独で用いてもよく、2種以上を併用してもよい。
特開平11-029585号公報及び特開2000-327772号公報に記載のパーフルオロポリエーテル変性アミノシラン、
特許第2874715号公報に記載のケイ素含有有機含フッ素ポリマー、
特開2000-144097号公報に記載の有機ケイ素化合物、
特表2002-506887号公報に記載のフッ素化シロキサン、
特表2008-534696号公報に記載の有機シリコーン化合物、
特許第4138936号公報に記載のフッ素化変性水素含有重合体、
米国特許出願公開第2010/0129672号明細書、国際公開第2014/126064号及び特開2014-070163号公報に記載の化合物、
国際公開第2011/060047号及び国際公開第2011/059430号に記載のオルガノシリコン化合物、
国際公開第2012/064649号に記載の含フッ素オルガノシラン化合物、
特開2012-72272号公報に記載のフルオロオキシアルキレン基含有ポリマー、
国際公開第2013/042732号、国際公開第2013/121984号、国際公開第2013/121985号、国際公開第2013/121986号、国際公開第2014/163004号、特開2014-080473号公報、国際公開第2015/087902号、国際公開第2017/038830号、国際公開第2017/038832号、国際公開第2017/187775号、国際公開第2018/216630号、国際公開第2019/039186号、国際公開第2019/039226号、国際公開第2019/039341号、国際公開第2019/044479号、国際公開第2019/049753号、国際公開第2019/163282号及び特開2019-044158号公報に記載の含フッ素エーテル化合物、
特開2014-218639号公報、国際公開第2017/022437号、国際公開第2018/079743号、国際公開第2018/143433号に記載のパーフルオロ(ポリ)エーテル含有シラン化合物、
国際公開第2018/169002号に記載のパーフルオロ(ポリ)エーテル基含有シラン化合物、
国際公開第2019/151442号に記載のフルオロ(ポリ)エーテル基含有シラン化合物、
国際公開第2019/151445号に記載の(ポリ)エーテル基含有シラン化合物、
国際公開第2019/098230号に記載のパーフルオロポリエーテル基含有化合物、
特開2015-199906号公報、特開2016-204656号公報、特開2016-210854号公報及び特開2016-222859号公報に記載のフルオロポリエーテル基含有ポリマー変性シラン、
国際公開第2019/039083号及び国際公開第2019/049754号に記載の含フッ素化合物。
副生含フッ素エーテル化合物としては、国際公開第2018/216630号の例13-7に記載の方法で製造される含フッ素エーテル化合物の副生成物として得られるCF3CF2CF2O[CF2CF2OCF2CF2CF2CF2CF2CF2O]CF2CF2O{(CF2O)x1(CF2CF2O)x2}CF2CF2OCF2CF2[OCF2CF2CF2CF2CF2CF2OCF2CF2]OCF2CF2CF3、国際公開第2013/121984号の例6に記載の方法で製造される含フッ素エーテル化合物CF3-(OCF2CF2OCF2CF2CF2CF2)mOCF2CF2OCF2CF2CF2-C(=O)OCH3等が挙げられる。
本開示のコーティング剤は、特定含フッ素エーテル化合物又は特定含フッ素エーテル混合物を含む。
特定含フッ素エーテル化合物又は特定含フッ素エーテル混合物は、基材上に表面層を形成するために、単独で使用できる(後述のドライコーティング法)。また、基材上に表面層を形成するために、特定含フッ素エーテル化合物又は特定含フッ素エーテル混合物以外の他の成分を含む組成物を用いてもよい(後述のドライコーティング法及びウェットコーティング法)。
本開示では、基材のコーティングに用いられる、特定含フッ素エーテル化合物、特定含フッ素エーテル混合物、及び特定含フッ素エーテル化合物又は特定含フッ素エーテル混合物と他の成分とを含む組成物を、いずれも「コーティング剤」と称する。
液状媒体は有機溶媒を含むことが好ましく、塗工性に優れる観点からは、沸点が35~250℃の有機溶媒を含むことがより好ましい。ここで、沸点は、標準沸点を意味する。
有機溶媒としては、フッ素系有機溶媒及び非フッ素系有機溶媒が挙げられ、溶解性に優れる観点からは、フッ素系有機溶媒が好ましい。有機溶媒は、1種を単独で用いてもよく、2種以上を併用してもよい。
フッ素化アルカンは、炭素数4~8の化合物が好ましい。炭素数4~8の化合物としては、C6F13H(AC-2000:製品名、AGC社製)、C6F13C2H5(AC-6000:製品名、AGC社製)、C2F5CHFCHFCF3(バートレル:製品名、ケマーズ社製)等が挙げられる。
フッ素化芳香族化合物としては、ヘキサフルオロベンゼン、トリフルオロメチルベンゼン、ペルフルオロトルエン、1,3-ビス(トリフルオロメチル)ベンゼン、1,4-ビス(トリフルオロメチル)ベンゼンが挙げられる。
フルオロアルキルエーテルは、炭素数4~12の化合物が好ましい。フルオロアルキルエーテルとしては、CF3CH2OCF2CF2H(AE-3000:製品名、AGC社製)、C4F9OCH3(ノベック-7100:製品名、3M社製)、C4F9OC2H5(ノベック-7200:製品名、3M社製)、C2F5CF(OCH3)C3F7(ノベック-7300:製品名、3M社製)等が挙げられる。
フッ素化アルキルアミンとしては、ペルフルオロトリプロピルアミン、ペルフルオロトリブチルアミン等が挙げられる。
フルオロアルコールとしては、2,2,3,3-テトラフルオロプロパノール、2,2,2-トリフルオロエタノール、ヘキサフルオロイソプロパノール等が挙げられる。
炭化水素系有機溶媒としては、ヘキサン、へプタン、シクロヘキサン等が挙げられる。
ケトン系有機溶媒としては、アセトン、メチルエチルケトン、メチルイソブチルケトン等が挙げられる。
エーテル系有機溶媒としては、ジエチルエーテル、テトラヒドロフラン、テトラエチレングリコールジメチルエーテル等が挙げられる。
エステル系有機溶媒としては、酢酸エチル、酢酸ブチル等が挙げられる。
アルコール系有機溶媒としては、イソプロピルアルコール、エタノール、n-ブタノール等が挙げられる。
例えば、コーティング剤は、特定含フッ素エーテル化合物及び必要に応じて用いられる他の含フッ素エーテル化合物の製造工程で生成した副生物、残留する未反応の原料等を含んでもよい。
また、コーティング剤は、加水分解性シリル基の加水分解と縮合反応を促進する酸触媒、塩基性触媒等の添加剤を含んでもよい。酸触媒としては、塩酸、硝酸、酢酸、硫酸、燐酸、スルホン酸、メタンスルホン酸、p-トルエンスルホン酸等が挙げられる。塩基性触媒としては、水酸化ナトリウム、水酸化カリウム、アンモニア等が挙げられる。
本開示の物品は、基材と、前記コーティング剤により前記基材上に形成される表面層と、を有する。表面層には、特定含フッ素エーテル化合物の加水分解反応及び縮合反応によって得られる化合物が含まれる。
表面層の厚みは、薄膜解析用X線回折計(例えば、製品名「ATX-G」、RIGAKU社製)を用いて、X線反射率法(XRR)によって反射X線の干渉パターンを得て、この干渉パターンの振動周期から算出できる。
基材の材質としては、金属、樹脂、ガラス、サファイア、セラミック、石、繊維、不織布、紙、木、天然皮革、人工皮革、及びこれらの複合材料等が挙げられる。ガラスは化学強化されていてもよい。
基材としては、タッチパネル用基材及びディスプレイ基材が好ましく、タッチパネル用基材がより好ましい。タッチパネル用基材は、透光性を有することが好ましい。「透光性を有する」とは、JIS R3106:2019(ISO 9050:2003)に準じた垂直入射型可視光透過率が25%以上であることを意味する。タッチパネル用基材の材質としては、ガラス又は透明樹脂が好ましい。
また基材としては、建材;装飾建材;インテリア用品;輸送機器(自動車等);看板又は掲示板;飲用器又は食器;水槽;観賞用器具(額、箱等);実験器具;家具、繊維製品、包装容器;アート、スポーツ又はゲームに使用する、ガラス又は樹脂なども挙げられる。基材としては、携帯電話(スマートフォン等)、携帯情報端末、ゲーム機、リモコン等の機器における外装部分(表示部を除く)に使用する、ガラス又は樹脂も好ましい。
基材の形状は、板状、フィルム状等でもよい。
本開示の物品は、例えば以下の方法で製造できる。
・本開示のコーティング剤をドライコーティング法によって基材の表面に付与して、前記基材上に表面層を形成することを含む、物品の製造方法。
・液状媒体を含む本開示のコーティング剤をウェットコーティング法によって基材の表面に付与することと、前記コーティング剤を付与した基材を乾燥させて、前記基材上に表面層を形成することと、を含む、物品の製造方法。
ウェットコーティング法では、特定含フッ素エーテル化合物を、酸触媒、塩基性触媒等の触媒を用いて予め加水分解しておき、加水分解した化合物と液状媒体とを含む組成物をコーティング剤として使用してもよい。
〔化合物1の製造〕
(工程1)
国際公開第2013/121984号の例6に記載の方法と同様にして、CF3-(OCF2CF2OCF2CF2CF2CF2)mOCF2CF2OCF2CF2CF2-C(=O)OCH3の10.0gを得た。続いて、N-メチルアリルアミンの1.54g、4-ピロリジノピリジンの1.12g、AC-2000(製品名、AGC社製、C6F13H)の3gを加えて0℃で200時間撹拌した。その後、シリカゲルカラムで精製して、AC-2000をエバポレータで除去することで、化合物1-1を得た。
CF3-(OCF2CF2OCF2CF2CF2CF2)mOCF2CF2OCF2CF2CF2-C(O)N(CH3)CH2-CH=CH2・・・(化合物1-1)
単位数mの平均値:13、Mn:4,765。
100mLのテトラフルオロエチレン-ペルフルオロ(アルコキシビニルエーテル)共重合体製ナスフラスコに、化合物1-1の5.0g、白金/1,3-ジビニル-1,1,3,3-テトラメチルジシロキサン錯体のキシレン溶液(白金含有量:2質量%)の0.03g、トリメトキシシランの0.36g、アニリンの0.01g及び1,3-ビス(トリフルオロメチル)ベンゼンの2.0gを入れ、室温(約25℃)で8時間撹拌した。溶媒等を減圧留去し、孔径0.5μmのメンブランフィルタでろ過し、化合物1の5.2gを得た。
CF3-(OCF2CF2OCF2CF2CF2CF2)mOCF2CF2OCF2CF2CF2-C(O)N(CH3)CH2CH2CH2-Si(OCH3)3・・・(化合物1)
単位数mの平均値:13、Mn:4,887。
1H-NMR(300.4MHz、溶媒:CDCl3、基準:TMS) δ(ppm):0.5(2H)、1.6(2H)、2.9(3H)、3.4(2H)、3.6(9H)。
19F-NMR(282.7MHz、溶媒:CDCl3、基準:CFCl3) δ(ppm):-55.2(3F)、-82.8(54F)、-88.1(54F)、-90.2(2F)、-111.4(2F)、-124.2(2F)、-125.2(52F)。
(工程1)
特許第6384430号の実施例3に記載の方法と同様にして、N-ブチルアリルアミンの10.0gを得た。
化合物1-1の合成において、原料としてN-メチルアリルアミンを用いる代わりにN-ブチルアリルアミンを用いる以外は同様の操作を行い、化合物2-1を得た。
CF3-(OCF2CF2OCF2CF2CF2CF2)mOCF2CF2OCF2CF2CF2-C(O)N(CH2CH2CH2CH3)CH2-CH=CH2・・・(化合物2-1)
単位数mの平均値:13、Mn:4,807。
化合物1の製造例の工程2において、原料として化合物1-1を用いる代わりに化合物2-1を用いる以外は同様の操作を行い、化合物2を得た。
CF3-(OCF2CF2OCF2CF2CF2CF2)mOCF2CF2OCF2CF2CF2-C(O)N(CH2CH2CH2CH3)CH2CH2CH2-Si(OCH3)3・・・(化合物2)
単位数mの平均値:13、Mn:4,929。
1H-NMR(300.4MHz、溶媒:CDCl3、基準:TMS) δ(ppm):0.5(2H)、0.9(3H)、1.6(4H)、3.4(4H)、3.6(9H)。
19F-NMR(282.7MHz、溶媒:CDCl3、基準:CFCl3) δ(ppm):-55.2(3F)、-82.8(54F)、-88.1(54F)、-90.2(2F)、-111.4(2F)、-124.2(2F)、-125.2(52F)。
国際公開第2013/121984号の例6に記載の方法にしたがい、化合物3を得た。
CF3-(OCF2CF2OCF2CF2CF2CF2)mOCF2CF2OCF2CF2CF2-C(O)NHCH2CH2CH2-Si(OCH3)3・・・(化合物3)
単位数mの平均値:13、Mn:4,873。
(工程1)
特許第6384430号の実施例3に記載の方法において、n-ブチルアミンの代わりにn-ペンチルアミンを用いる以外は同様の操作を行い、N-ペンチルアリルアミンの10.0gを得た。
化合物1-1の合成において、原料としてN-メチルアリルアミンを用いる代わりにN-ペンチルアリルアミンを用いる以外は同様の操作を行い、化合物4-1を得た。
CF3-(OCF2CF2OCF2CF2CF2CF2)x5OCF2CF2OCF2CF2CF2-C(O)N(CH2CH2CH2CH2CH3)CH2-CH=CH2・・・(化合物4-1)
単位数mの平均値:13、Mn:4,821。
化合物1の製造例の工程2において、原料として化合物1-1を用いる代わりに化合物4-1を用いる以外は同様の操作を行い、化合物4を得た。
CF3-(OCF2CF2OCF2CF2CF2CF2)mOCF2CF2OCF2CF2CF2-C(O)N(CH2CH2CH2CH2CH3)CH2CH2CH2-Si(OCH3)3・・・(化合物4)
単位数mの平均値:13、Mn:4,943。
1H-NMR(300.4MHz、溶媒:CDCl3、基準:TMS) δ(ppm):0.5(2H)、0.9(3H)、1.6(6H)、3.4(4H)、3.6(9H)。
19F-NMR(282.7MHz、溶媒:CDCl3、基準:CFCl3) δ(ppm):-55.2(3F)、-82.8(54F)、-88.1(54F)、-90.2(2F)、-111.4(2F)、-124.2(2F)、-125.2(52F)。
(工程1)
国際公開第2017/038832号の実施例の例3-3に記載の方法において、ジアリルアミンの代わりにN-メチルアリルアミンを用いる以外は同様の操作を行い、化合物5-1を得た。
CF3-(OCF2CF2OCF2CF2CF2CF2)mOCF2CF2OCF2CF2CF2-CH2-N(CH3)CH2-CH=CH2・・・(化合物5-1)
単位数mの平均値:13、Mn:4,751。
化合物1の製造例の工程2において、原料として化合物1-1を用いる代わりに化合物5-1を用いる以外は同様の操作を行い、化合物5を得た。
CF3-(OCF2CF2OCF2CF2CF2CF2)mOCF2CF2OCF2CF2CF2-CH2-N(CH3)CH2CH2CH2-Si(OCH3)3・・・(化合物5)
単位数mの平均値:13、Mn:4,837。
1H-NMR(300.4MHz、溶媒:CDCl3、基準:TMS) δ(ppm):0.5(2H)、1.4(2H)、2.3(3H)、2.5(2H)、2.7(2H)、3.6(9H)。
19F-NMR(282.7MHz、溶媒:CDCl3、基準:CFCl3) δ(ppm):-55.2(3F)、-82.8(54F)、-88.1(54F)、-90.2(2F)、-111.4(2F)、-121.3(2F)、-125.2(52F)。
(工程1)
国際公開第2018/216630号の例13-6に記載の方法と同様にして、CF3CF2CF2-O-CF2-CF2OCF2CF2CF2CF2CF2CF2O-CF2-(CF2O){(CF2O)x1(CF2CF2O)x2}-CF2-C(O)OCH3の10.0gを得た。続いて、N-メチルアリルアミンの1.54g、4-ピロリジノピリジンの1.12g、AC-2000の3gを加えて0℃で200時間撹拌した。その後、シリカゲルカラムで精製して、AC-2000をエバポレータで除去することで、化合物6-1を得た。
CF3CF2CF2-O-CF2-CF2OCF2CF2CF2CF2CF2CF2O-CF2-(CF2O){(CF2O)x1(CF2CF2O)x2}-CF2-C(O)N(CH3)CH2-CH=CH2・・・(化合物6-1)
単位数x1の平均値:21、単位数x2の平均値:20、Mn:4,606。
化合物1の製造例の工程2において、原料として化合物1-1を用いる代わりに化合物6-1を用いる以外は同様の操作を行い、化合物6を得た。
CF3CF2CF2-O-CF2-CF2OCF2CF2CF2CF2CF2CF2O-CF2-(CF2O){(CF2O)x1(CF2CF2O)x2}-CF2-C(O)N(CH3)CH2CH2CH2-Si(OCH3)3 ・・・(化合物6)
単位数x1の平均値:21、単位数x2の平均値:20、Mn:4,728。
1H-NMR(300.4MHz、溶媒:CDCl3、基準:TMS) δ(ppm):0.5(2H)、1.6(2H)、2.9(3H)、3.4(2H)、3.6(9H)。
19F-NMR(282.7MHz、溶媒:CDCl3、基準:CFCl3) δ(ppm):-52~-56(42F)、-79~-88(10F)、-89~-91(90F)、-121.1(4F)、-124.2(4F)、-130.1(2F)。
(工程1)
化合物6-1の製造において、N-メチルアリルアミンの代わりにアリルアミンを使用する以外は同様の操作を行って、化合物7-1を得た。
CF3CF2CF2-O-CF2-CF2OCF2CF2CF2CF2CF2CF2O-CF2-(CF2O){(CF2O)x1(CF2CF2O)x2}-CF2-C(O)NHCH2-CH=CH2・・・(化合物7-1)
単位数x1の平均値:21、単位数x2の平均値:20、Mn:4,592
化合物1の製造例の工程2において、原料として化合物1-1を用いる代わりに化合物7-1を用いる以外は同様の操作を行い、化合物7を得た。
CF3CF2CF2-O-CF2-CF2OCF2CF2CF2CF2CF2CF2O-CF2-(CF2O){(CF2O)x1(CF2CF2O)x2}-CF2-C(O)NHCH2CH2CH2-Si(OCH3)3・・・(化合物7)
単位数x1の平均値:21、単位数x2の平均値:20、Mn:4,714。
1H-NMR(300.4MHz、溶媒:CDCl3、基準:TMS) δ(ppm):0.5(2H)、1.6(2H)、3.4(2H)、3.6(9H)、6.3(1H)。
19F-NMR(282.7MHz、溶媒:CDCl3、基準:CFCl3) δ(ppm):-52~-56(42F)、-79~-88(10F)、-89~-91(90F)、-121.1(4F)、-124.2(4F)、-130.1(2F)。
(工程1)
化合物6-1の製造において、N-メチルアリルアミンの代わりにジアリルアミンを使用する以外は同様の操作を行って、化合物8-1を得た。
CF3CF2CF2-O-CF2-CF2OCF2CF2CF2CF2CF2CF2O-CF2-(CF2O){(CF2O)x1(CF2CF2O)x2}-CF2-C(O)N[CH2-CH=CH2]2・・・(化合物8-1)
単位数x1の平均値:21、単位数x2の平均値:20、Mn:4,634。
化合物1の製造例の工程2において、原料として化合物1-1を用いる代わりに化合物8-1を用いる以外は同様の操作を行い、化合物8を得た。
CF3CF2CF2-O-CF2-CF2OCF2CF2CF2CF2CF2CF2O-CF2-(CF2O){(CF2O)x1(CF2CF2O)x2}-CF2-C(O)N[CH2CH2CH2-Si(OCH3)3]2・・・(化合物8)
単位数x1の平均値:21、単位数x2の平均値:20、Mn:4,876。
1H-NMR(300.4MHz、溶媒:CDCl3、基準:TMS) δ(ppm):0.5(4H)、1.6(4H)、3.4(4H)、3.6(18H)。
19F-NMR(282.7MHz、溶媒:CDCl3、基準:CFCl3) δ(ppm):-52~-56(42F)、-79~-88(10F)、-89~-91(90F)、-121.1(4F)、-124.2(4F)、-130.1(2F)。
〔真空蒸着〕
真空蒸着装置内に、基材(無アルカリガラス(イーグルXG:製品名、コーニング社製、50mm×50mm、厚さ0.5mm))を配置し、真空蒸着装置内を5×10-3Pa以下の圧力になるまで排気した。基材の一方の主面に対向するように距離1000mmの位置に上記で合成した含フッ素エーテル化合物を収容した蒸着用容器を抵抗加熱によって300℃に加熱し、含フッ素エーテル化合物を真空蒸着させて厚さ10nmの表面層を形成した。なお、各例における含フッ素エーテル化合物の温度は、300℃であった。その後、得られた表面層付き基材を、温度200℃で30分間加熱(後処理)した。
上記で合成した含フッ素エーテル化合物と液状媒体としてのC4F9OC2H5(ノベック-7200:製品名、3M社製)とを混合して、コーティング剤のうちの含フッ素エーテル化合物の含有率が0.1質量%であるコーティング液を調製した。基材としては無アルカリガラス(イーグルXG:製品名、コーニング社製、50mm×50mm、厚さ0.5mm)を準備した。
〔水接触角の測定方法〕
表面層の表面に置いた約2μLの蒸留水の接触角を、接触角測定装置(協和界面科学社製、DM-500)を用いて測定した。表面層の表面における異なる5箇所で測定を行い、その平均値を算出した。接触角の算出には2θ法を用いた。
表面層について、初期水接触角を前記測定方法で測定した。評価基準は下記の通りである。
初期水接触角:
A:115度以上。
B:110度以上115度未満。
C:100度以上110度未満。
D:100度未満。
表面層について、JIS L0849:2013(ISO 105-X12:2001)に準拠して往復式トラバース試験機(ケイエヌテー社製)を用い、スチールウールボンスター(♯0000)を圧力:98.07kPa、速度:320cm/分で1万回往復させた後、水接触角を測定した。摩擦後の撥水性(水接触角)の低下が小さいほど摩擦による性能の低下が小さく、耐摩擦性に優れる。評価基準は下記の通りである。
A:1万回往復後の水接触角の変化が2度以下。
B:1万回往復後の水接触角の変化が2度超5度以下。
C:1万回往復後の水接触角の変化が5度超10度以下。
D:1万回往復後の水接触角の変化が10度超。
表面層について、JIS L0849:2013(ISO 105-X12:2001)に準拠して往復式トラバース試験機(ケイエヌテー社製)を用い、Rubber Eraser(Minoan社製)を荷重:4.9N、速度:60回毎分(rpm)で3万回往復させた後、水接触角を測定した。摩擦後の撥水性(水接触角)の低下が小さいほど摩擦による性能の低下が小さく、耐摩擦性に優れる。評価基準は下記の通りである。
A:1万回往復後の水接触角の変化が2度以下。
B:1万回往復後の水接触角の変化が2度超5度以下。
C:1万回往復後の水接触角の変化が5度超10度以下。
D:1万回往復後の水接触角の変化が10度超。
人工皮膚(出光テクノファイン社製、PBZ13001)に対する表面層の動摩擦係数を、荷重変動型摩擦摩耗試験システム(新東科学社製、HHS2000)を用い、接触面積:3cm×3cm、荷重:0.98Nの条件で測定した。動摩擦係数が小さいほど潤滑性に優れる。評価基準は下記の通りである。
A:動摩擦係数が0.3以下。
B:動摩擦係数が0.3超0.4以下。
C:動摩擦係数が0.4超0.5以下。
D:動摩擦係数が0.5超。
例1~4を比較すると、同じポリ(オキシフルオロアルキレン)鎖及び反応性シリル基を有していても、連結基の窒素原子に炭素数1~4のアルキル基が結合している場合に特に優れた耐摩擦性が得られることが分かった。
また、いずれの例においても優れた潤滑性が確認された。
Claims (13)
- ポリ(オキシフルオロアルキレン)鎖を有する1価の基と、
式(L1):-X1-NR1-(CH2)n1-で表される2価の基と、
反応性シリル基を有する1価の基と、
を有し、
前記ポリ(オキシフルオロアルキレン)鎖を有する1価の基は前記式(L1)で表される2価の基の-X1-と連結し、前記反応性シリル基を有する1価の基は前記式(L1)で表される2価の基の-(CH2)n1-と連結している、含フッ素エーテル化合物:
式(L1)中、
X1は単結合又は2価の有機基を表し、
R1はアルキル基を表し、
n1は1~10の整数を表す。 - 式(L1)中、X1が-C(=O)-O-、-O-C(=O)-、-C(=O)-、-CH2-O-、-O-CH2-、-CH2-O-CH2-、炭素数1~6のアルキレン基、又は炭素数1~6のペルフルオロアルキレン基である、請求項1に記載の含フッ素エーテル化合物。
- 式(L1)中、R1が炭素数1~4のアルキル基である、請求項1又は2に記載の含フッ素エーテル化合物。
- 前記ポリ(オキシフルオロアルキレン)鎖中のフルオロアルキレン基の炭素数がそれぞれ独立に1~6である、請求項1~3のいずれか1項に記載の含フッ素エーテル化合物。
- 前記ポリ(オキシフルオロアルキレン)鎖を有する1価の基が、式(P1):Rf1-(OX)m-O-Rf2-で表される構造を有する、請求項1~4のいずれか1項に記載の含フッ素エーテル化合物;
式(P1)中、
Rf1はフルオロアルキル基を表し、
Xはそれぞれ独立にフルオロアルキレン基を表し、
Rf2はフルオロアルキレン基を表し、
mは2以上の整数を表す。 - 前記反応性シリル基を有する1価の基が、下記式(S1)又は(S2)で表される、請求項1~5のいずれか1項に記載の含フッ素エーテル化合物;
式(S1):-Si(R2)nL3-n
式(S2):-CH(3-p)[(CH2)n2-Si(R2)nL3-n]p:
式(S1)及び(S2)中、
R2はそれぞれ独立に1価の炭化水素基を表し、
Lはそれぞれ独立に加水分解性基又は水酸基を表し、
pは2又は3を表し、
nは0~2の整数を表し、
n2は1~10の整数を表す。 - 請求項1~6のいずれか1項に記載の含フッ素エーテル化合物を2種以上含むか、又は請求項1~6のいずれか1項に記載の含フッ素エーテル化合物の1種以上と請求項1~6のいずれか1項に記載の含フッ素エーテル化合物以外の含フッ素エーテル化合物とを含む、含フッ素エーテル混合物。
- 請求項1~6のいずれか1項に記載の含フッ素エーテル化合物又は請求項7に記載の含フッ素エーテル混合物を含むコーティング剤。
- さらに液状媒体を含む、請求項8に記載のコーティング剤。
- 基材と、請求項8又は9に記載のコーティング剤により前記基材上に形成される表面層と、を有する物品。
- 前記物品がタッチパネルであり、前記表面層は前記タッチパネルの指で触れる面を構成する部材の表面に形成されている、請求項10に記載の物品。
- 請求項8に記載のコーティング剤をドライコーティング法によって基材の表面に付与して、前記基材上に表面層を形成することを含む、物品の製造方法。
- 請求項9に記載のコーティング剤をウェットコーティング法によって基材の表面に付与することと、
前記コーティング剤を付与した基材を乾燥させて、前記基材上に表面層を形成することと、
を含む、物品の製造方法。
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Citations (3)
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JP2013144726A (ja) * | 2012-01-13 | 2013-07-25 | Shin-Etsu Chemical Co Ltd | フルオロオキシアルキレン基含有ポリマー変性シラン及び該シランを含む表面処理剤並びに該表面処理剤で表面処理された物品 |
JP2014005353A (ja) * | 2012-06-22 | 2014-01-16 | Nicca Chemical Co Ltd | パーフルオロポリエーテル変性シラン化合物、防汚性被膜形成用組成物、防汚性被膜、およびこの被膜を有する物品 |
JP2017048370A (ja) * | 2015-08-31 | 2017-03-09 | ダイキン工業株式会社 | パーフルオロ(ポリ)エーテル基含有シラン化合物 |
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JP6127985B2 (ja) | 2012-02-17 | 2017-05-17 | 旭硝子株式会社 | 含フッ素エーテル化合物、含フッ素エーテル組成物およびコーティング液、ならびに表面処理層を有する基材およびその製造方法 |
WO2013121986A1 (ja) | 2012-02-17 | 2013-08-22 | 旭硝子株式会社 | 含フッ素エーテル化合物、含フッ素エーテル組成物およびコーティング液、ならびに表面処理層を有する基材およびその製造方法 |
CN104114566B (zh) | 2012-02-17 | 2017-05-31 | 旭硝子株式会社 | 含氟醚化合物、含氟醚组合物及涂覆液以及具有表面处理层的基材及其制造方法 |
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JP2013144726A (ja) * | 2012-01-13 | 2013-07-25 | Shin-Etsu Chemical Co Ltd | フルオロオキシアルキレン基含有ポリマー変性シラン及び該シランを含む表面処理剤並びに該表面処理剤で表面処理された物品 |
JP2014005353A (ja) * | 2012-06-22 | 2014-01-16 | Nicca Chemical Co Ltd | パーフルオロポリエーテル変性シラン化合物、防汚性被膜形成用組成物、防汚性被膜、およびこの被膜を有する物品 |
JP2017048370A (ja) * | 2015-08-31 | 2017-03-09 | ダイキン工業株式会社 | パーフルオロ(ポリ)エーテル基含有シラン化合物 |
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CN117500863A (zh) | 2024-02-02 |
JPWO2022260051A1 (ja) | 2022-12-15 |
KR20240017822A (ko) | 2024-02-08 |
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