WO2017188331A1 - Composition - Google Patents
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- WO2017188331A1 WO2017188331A1 PCT/JP2017/016588 JP2017016588W WO2017188331A1 WO 2017188331 A1 WO2017188331 A1 WO 2017188331A1 JP 2017016588 W JP2017016588 W JP 2017016588W WO 2017188331 A1 WO2017188331 A1 WO 2017188331A1
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- fluorine
- organosilicon compound
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- 0 CC*N(*)C(C)(C)N=C Chemical compound CC*N(*)C(C)(C)N=C 0.000 description 7
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D185/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon; Coating compositions based on derivatives of such polymers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
Definitions
- the present invention relates to a composition for forming a film capable of imparting water repellency and oil repellency to various substrates.
- Patent Document 1 as a treating agent that can be applied to a glass substrate having a bent shape to produce a water-slidable glass article, it contains linear polydimethylsiloxane and fluoroalkylsilane, and further includes a solvent and a catalyst.
- a composition comprising
- the inventors of the present invention have found that the film described in Patent Document 1 may not have sufficient oil repellency, adhesion and film-forming properties.
- the present invention has been made in view of the above circumstances, and an object of the present invention is to provide a composition capable of improving the film forming property while achieving both the water repellency and the oil repellency of the film.
- the present inventors have achieved both the water repellency and oil repellency of the resulting film when using a composition containing a predetermined organosilicon compound, metal alkoxide, and fluorine-containing organosilicon compound.
- the present invention has been completed by finding that the film-forming property can be improved.
- the present invention includes the following inventions.
- a coating composition comprising a fluorine-containing organosilicon compound (f) having a functional group bonded to a silicon atom.
- the compound (a) is a compound represented by the formula (I).
- R a represents a trialkylsilyl group-containing molecular chain
- a a1 independently represents a hydrolyzable group.
- Z a1 represents a trialkylsilyl group-containing molecular chain, a hydrocarbon chain-containing group, a siloxane skeleton-containing group, or a hydrolyzable group.
- M represents a trivalent or tetravalent metal atom capable of forming a metal alkoxide.
- a b1 independently represents an alkoxy group having 1 to 4 carbon atoms.
- k represents an integer of 3 or 4 depending on M.
- a f2 independently represents a hydrolyzable group, a fluorine-containing alkyl group having 1 to 12 carbon atoms, or an alkyl group having 1 to 4 carbon atoms.
- the content ratio of the fluorine-containing organosilicon compound (f) and the organosilicon compound (a) (fluorine-containing organosilicon compound (f) / organosilicon compound (a)) is 7 /
- the coating composition according to any one of [1] to [4], which is 1 or more and 20/1 or less.
- the content ratio of the metal alkoxide (b) to the fluorine-containing organosilicon compound (f) is 0.01 or more in molar ratio.
- composition of the present invention contains a predetermined organosilicon compound, metal alkoxide, and fluorine-containing organosilicon compound, it is possible to achieve both the water repellency, oil repellency and adhesion of the resulting film, and also film forming properties. It becomes good.
- composition is an organic compound in which at least one trialkylsilyl group-containing molecular chain and at least one hydrolyzable group are bonded to a silicon atom.
- the metal alkoxide (b) itself contributes less to water repellency and oil repellency than the organosilicon compound or the fluorine-containing organosilicon compound (f), the metal alkoxide (b) It is considered that the water- and oil-repellent properties of the trialkylsilyl group-containing molecular chain and the fluorine-containing group are emphasized, and the homogeneity of the resulting film is also improved.
- the organosilicon compound (a) includes, in one molecule, at least one trialkylsilyl group-containing molecular chain bonded to the central silicon atom, and at least one hydrolyzable group bonded to the central silicon atom.
- the organosilicon compound (a) is preferably a compound represented by the following formula (I).
- R a represents a trialkylsilyl group-containing molecular chain
- a a1 independently represents a hydrolyzable group
- Z a1 represents a trialkylsilyl group-containing molecular chain, a hydrocarbon chain-containing group, a siloxane skeleton-containing group, or a hydrolyzable group.
- the trialkylsilyl group-containing molecular chain is a monovalent group having a structure in which the trialkylsilyl-containing group is bonded to the end of the molecular chain, and the trialkylsilyl-containing group is bonded to the molecular chain.
- the water repellency and oil repellency of the film formed from the composition of the invention are improved.
- the presence of the trialkylsilyl group-containing molecular chain reduces the friction between the droplet (water droplet, oil droplet, etc.) and the coating, and facilitates the movement of the droplet.
- chemical durability and / or physical durability are improved, and heat resistance and light resistance are improved. Even in the case where the alkyl group of the trialkylsilyl-containing group is replaced with a fluoroalkyl group, the water repellency and oil repellency at the film interface (surface) can be similarly improved.
- the trialkylsilyl-containing group is a group containing at least one trialkylsilyl group, preferably two or more, more preferably three trialkylsilyl groups.
- the trialkylsilyl-containing group is preferably a group represented by the formula (s1).
- R s1 represents a hydrocarbon group or a trialkylsilyloxy group, and the hydrogen atom contained in the hydrocarbon group or the trialkylsilyloxy group may be substituted with a fluorine atom. However, when all R s1 is a hydrocarbon group, R s1 is an alkyl group. * Represents a bond. ]
- the hydrocarbon group represented by R s1 preferably has 1 to 4 carbon atoms, more preferably 1 to 3, and still more preferably 1 to 2.
- the total carbon number of the three R s1 is preferably 9 or less, more preferably 6 or less, and even more preferably 4 or less.
- the hydrocarbon group represented by R s1 is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. Examples of the alkyl group include a methyl group, an ethyl group, a propyl group, and a butyl group.
- a plurality of R s1 may be the same or different and are preferably the same. Is preferably at least one of methyl group of the three R s1, more preferably at least two of a methyl group, and particularly preferably all three R s1 is a methyl group.
- the hydrogen atom contained in the trialkylsilyl group and trialkylsilyloxy group represented by R s1 may be substituted with a fluorine atom.
- the number of fluorine atoms substituted is preferably 1 or more, more preferably 3 or more, and preferably 2 ⁇ A + 1 or less, where A is the number of carbon atoms.
- the hydrogen atom contained in the alkyl group is substituted with a fluorine atom
- the number of substituted alkyl groups can be appropriately selected within a range of 1 to 3 per silicon atom.
- At least one of R s1 may be a trialkylsilyloxy group.
- the trialkylsilyloxy group include a group in which an oxygen atom is bonded to a silicon atom of a group (trialkylsilyl group) in which R s1 is a hydrocarbon group (alkyl group).
- R s1 is a trialkylsilyloxy group
- examples of the group in which at least one of R s1 is a trialkylsilyloxy group include groups represented by the following formulae.
- the trialkylsilyl group may be bonded to the end (free end side) of the molecular chain, particularly to the end (free end side) of the main chain (longest straight chain) of the molecular chain. preferable.
- the molecular chain to which the trialkylsilyl group is bonded is preferably linear or branched, and is preferably linear.
- the molecular chain preferably includes a dialkylsiloxane chain, and preferably includes a linear dialkylsiloxane chain.
- the molecular chain may contain a divalent hydrocarbon group. Even if a part of the molecular chain is a divalent hydrocarbon group, since the remainder is a dialkylsiloxane chain, the chemical durability and / or physical durability of the resulting film is good.
- the molecular chain is preferably a group represented by the formula (s2).
- R s2 represents an alkyl group having 1 to 4 carbon atoms.
- Z s1 represents —O— or a divalent hydrocarbon group, and —CH 2 — contained in the divalent hydrocarbon group may be replaced by —O—.
- Y s1 represents a single bond or —Si (R s2 ) 2 —L s1 —.
- L s1 represents a divalent hydrocarbon group, and —CH 2 — contained in the divalent hydrocarbon group may be replaced by —O—.
- * On the left side represents a bond with a central silicon atom, and * on the right side represents a bond with a trialkylsilyl-containing group.
- the number of carbon atoms of the alkyl group represented by R s2 is preferably 1 to 4, more preferably 1 to 3, and still more preferably 1 to 2.
- Examples of the alkyl group represented by R s2 include a methyl group, an ethyl group, a propyl group, and a butyl group. A methyl group or an ethyl group is preferable, and a methyl group is particularly preferable.
- N1 is preferably 1 to 100, more preferably 1 to 80, still more preferably 1 to 50, and particularly preferably 1 to 30.
- the number of carbon atoms of the divalent hydrocarbon group represented by Z s1 or L s1 is preferably 1 to 10, more preferably 1 to 6, and further preferably 1 to 4.
- the divalent hydrocarbon group is preferably chain-like, and when it is chain-like, it may be either linear or branched.
- the divalent hydrocarbon group is preferably a divalent aliphatic hydrocarbon group, and preferably an alkanediyl group. Examples of the divalent hydrocarbon group include a methylene group, an ethylene group, a propylene group, and a butylene group.
- a part of —CH 2 — contained in the divalent hydrocarbon group may be replaced by —O—.
- two consecutive —CH 2 — are not simultaneously replaced with —O—, and —CH 2 — adjacent to the Si atom is not replaced with —O—.
- the number of carbon atoms between —O— and —O— is preferably 2 to 4, and more preferably 2 to 3 preferable.
- Specific examples of the group in which a part of the divalent hydrocarbon group is replaced by —O— include a group having a (poly) ethylene glycol unit, a group having a (poly) propylene glycol unit, and the like. it can.
- Z s1 is —O— and Y s1 is a single bond, that is, the molecular chain is composed only of repeating dialkylsilyloxy groups.
- the dialkylsiloxane chain consists only of repeating dialkylsilyloxy groups, the resulting film has good chemical durability and / or physical durability.
- Examples of the molecular chain contained in the trialkylsilyl group-containing molecular chain include a molecular chain represented by the following formula.
- p1 represents an integer of 1 to 30, and * represents a bond bonded to a silicon atom or a trialkylsilyl group forming a polysiloxane skeleton.
- the total number of atoms constituting the trialkylsilyl group-containing molecular chain is preferably 24 or more, more preferably 40 or more, still more preferably 50 or more, and preferably 1200 or less. Is 700 or less, more preferably 250 or less.
- the trialkylsilyl group-containing molecular chain is preferably a group represented by the following formula (s1).
- the trialkylsilyl group-containing molecular chain is more preferably a group represented by the following formula (s1-1), and even more preferably a group represented by the following formula (s1-1-1).
- R s2 , Y s1 , Z s1 , and n1 are as defined above.
- R s3 represents an alkyl group having 1 to 4 carbon atoms. * Represents a bond with a silicon atom.
- trialkylsilyl group-containing molecular chain is preferably a group represented by the following formula (s1-2), more preferably a group represented by the following formula (s1-2-1).
- R s2 , R s3 , Y s1 , Z s1 , and n1 are as defined above. * Represents a bond with a silicon atom.
- Examples of the alkyl group represented by R s3 include the same groups as the alkyl groups exemplified as the hydrocarbon group represented by R s1 , and the alkyl group preferably has 1 to 3 carbon atoms. Preferably it is 1-2. Further, the total carbon number of R s3 contained in * -Si (R s3 ) 3 is preferably 9 or less, more preferably 6 or less, and still more preferably 4 or less. Further, among R s3 contained in * -Si (R s3 ) 3 , at least one is preferably a methyl group, two or more R s3 are preferably methyl groups, and all three R s3 are all A methyl group is particularly preferred.
- Examples of the trialkylsilyl group-containing molecular chain include a group represented by the formula (s1-I).
- the following formulas (s1-I-1) to (s1-I-50) are specific examples of the group represented by the formula (s1-I), but are not limited thereto.
- a plurality of R s20 and a plurality of R s10 contained therein may be the same or different.
- the number of trialkylsilyl group-containing molecular chains bonded to the central silicon atom is preferably 1 to 3, more preferably 1 to 2, and particularly preferably 1.
- the hydrolyzable group When the hydrolyzable group is bonded to a silicon atom, the hydrolyzable group may be a group that gives a hydroxy group (silanol group) by hydrolysis.
- the number of carbon atoms such as methoxy group, ethoxy group, propoxy group, butoxy group Preferred examples include 1-4 alkoxy groups; acetoxy groups; chlorine atoms; isocyanate groups; Among these, an alkoxy group having 1 to 4 carbon atoms is preferable, and an alkoxy group having 1 to 2 carbon atoms is more preferable.
- the number of hydrolyzable groups bonded to the central silicon atom is 1 to 3, and preferably 2 to 3.
- a group in which a hydrolyzable group is bonded to a silicon atom may be referred to as a hydrolyzable silicon group.
- the siloxane skeleton-containing group is a monovalent group containing a siloxane unit (Si—O—), and may be composed of a smaller number of atoms than the number of atoms constituting the trialkylsilyl group-containing molecular chain. That's fine.
- the siloxane skeleton-containing group is a group having a shorter length than the trialkylsilyl group-containing molecular chain or a small steric spread (bulk height).
- the siloxane skeleton-containing group may contain a divalent hydrocarbon group.
- the siloxane skeleton-containing group is preferably a group represented by the following formula (s2).
- R s2 has the same meaning as described above.
- R s5 represents a hydrocarbon group or a hydroxy group, —CH 2 — contained in the hydrocarbon group may be replaced by —O—, and the hydrogen atom contained in the hydrocarbon group is a fluorine atom. May be substituted.
- Z s2 represents —O— or a divalent hydrocarbon group, and —CH 2 — contained in the divalent hydrocarbon group may be replaced with —O—.
- Y s2 represents a single bond or —Si (R s2 ) 2 —L s2 —.
- L s2 represents a divalent hydrocarbon group, and —CH 2 — contained in the divalent hydrocarbon group may be replaced by —O—.
- n2 represents an integer of 0 to 5. * Represents a bond with a silicon atom.
- Examples of the hydrocarbon group represented by R s5 include the same groups as the hydrocarbon group represented by R s1 , an aliphatic hydrocarbon group is preferable, and an alkyl group is more preferable.
- the number of carbon atoms is preferably 1 to 4, more preferably 1 to 3, and still more preferably 1 to 2.
- Examples of the divalent hydrocarbon group represented by Z s2 or L s2 include the same groups as the divalent hydrocarbon group represented by Z s1 , and the number of carbon atoms is preferably 1 to 10. More preferably, it is 1-6, and more preferably 1-4.
- the divalent hydrocarbon group represented by Z s2 or L s2 is preferably a divalent aliphatic hydrocarbon group, and more preferably a linear or branched alkanediyl group. .
- N2 is preferably 1 to 5, and more preferably 1 to 3.
- siloxane skeleton-containing group examples include groups represented by the following formulas.
- the hydrocarbon chain-containing group is a monovalent group including a hydrocarbon chain and has a hydrocarbon chain portion having a smaller number of carbon atoms than the number of atoms constituting the molecular chain of the trialkylsilyl group-containing molecular chain. Good. Moreover, it is preferable that the number of carbon atoms of the longest straight chain of the hydrocarbon chain is smaller than the number of atoms constituting the longest straight chain of the trialkylsilyl group-containing molecular chain.
- the hydrocarbon chain-containing group may be composed only of a hydrocarbon group (hydrocarbon chain), and —CH 2 — contained in the hydrocarbon chain may be replaced by —O—, and the hydrocarbon group ( It is preferably composed of only hydrocarbon chains.
- the carbon number of the hydrocarbon chain portion means the number of carbon atoms constituting the hydrocarbon group (hydrocarbon chain) in the oxygen non-substituted hydrocarbon chain-containing group, and includes the oxygen-substituted hydrocarbon chain. In the group, it means the number of carbon atoms counted by replacing —O— with —CH 2 —.
- a hydrocarbon chain-containing group will be described by taking an oxygen-nonsubstituted hydrocarbon chain-containing group (that is, a monovalent hydrocarbon group) as an example. In any description, —CH 2 — It is possible to replace some of them with —O—.
- the number of carbon atoms of the hydrocarbon chain-containing group is preferably 1 to 3, more preferably 1.
- the hydrocarbon chain-containing group (in the case of a hydrocarbon group) may be branched or linear.
- the hydrocarbon chain-containing group in the case of a hydrocarbon group) is preferably a saturated or unsaturated aliphatic hydrocarbon chain-containing group, and more preferably a saturated aliphatic hydrocarbon chain-containing group.
- the saturated aliphatic hydrocarbon chain-containing group is preferably an alkyl group such as a methyl group, an ethyl group, or a propyl group.
- the organosilicon compound (a) is preferably a compound represented by the following formula (I-1), and more preferably a compound represented by the formula (I-1-1).
- a a1 , Z a1 , Z s1 , Y s1 , R s2 , R s3 , n1 are as defined above.
- the organosilicon compound (a) may be a compound represented by the formula (I-2), preferably a compound represented by the formula (I-2-1).
- a a1 , Z a1 , Z s1 , Y s1 , R s2 , R s3 , and n2 are as defined above.
- organosilicon compound (a) examples include groups represented by the formula (II).
- the following formulas (II-1) to (II-100) are specific examples of the group represented by the formula (II), but are not limited thereto.
- a plurality of A a10 , a plurality of R s20, and a plurality of R s10 contained therein may be the same or different.
- Examples of the method for synthesizing the organosilicon compound (a) include the following methods.
- a compound in which a trialkylsilyl group-containing molecular chain and a halogen atom (preferably a chlorine atom) are bonded, and a compound in which three or more (especially four) hydrolyzable groups are bonded to a silicon atom It can manufacture by making this react.
- a compound in which halogen atoms are bonded to both ends of a dialkylsiloxane chain (hereinafter, “dihalogenated dialkylsiloxane”), a tris (trialkylsilyloxy) silyl group, an M 1 O— group ( M 1 represents an alkali metal) and can be produced by reacting a compound (hereinafter referred to as “alkali metal silyl oxide”) and a compound having four hydrolyzable groups bonded to a silicon atom.
- reaction order of these compounds is not limited, it is preferable to first react a dihalogenated dialkylsiloxane and an alkali metal silyl oxide, and then react a compound having four hydrolyzable groups bonded to a silicon atom.
- a halogen atom a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc. are mentioned, A chlorine atom is preferable.
- the alkali metal is preferably lithium.
- the alkali metal silyl oxide can be produced, for example, by reacting an alkyl alkali metal with a compound in which a tris (trialkylsilyloxy) silyl group and a hydroxy group are bonded.
- the organic alkali metal compound include alkyllithiums such as n-butyllithium, sec-butyllithium and tert-butyllithium, with n-butyllithium being particularly preferred.
- the organosilicon compound (a) is prepared by reacting, for example, alkali metal silyloxide and cyclic dimethylsiloxane, and then the silicon atom has three hydrolyzable groups and a halogen atom (particularly a chlorine atom). It can also be produced by reacting a compound in which one) is bonded.
- the organosilicon compound (a) is reacted with alkali metal silyl oxide and cyclic dimethylsiloxane to obtain dimethylsiloxane having a hydroxyl group at the terminal, and then reacted with tetraalkoxysilane. It can also be manufactured.
- the content of the organosilicon compound (a) is preferably 0.01% by mass or more, more preferably 0.05% by mass or more, and further preferably 0.1% by mass or more in 100% by mass of the composition. Yes, it is preferably 10% by mass or less, more preferably 5% by mass or less, and further preferably 3% by mass or less.
- the metal alkoxide (b) is a compound in which an alkoxy group is bonded to a metal atom, and a site having a spacer function can be formed in a film formed from the composition of the present invention.
- the water repellency and oil repellency improving action by the trialkylsilyl group-containing molecular chain and fluorine-containing group can be enhanced, and the film-forming property is also improved.
- the metal alkoxide (b) is preferably a compound represented by the formula (II).
- the compound represented by the formula (II) may be a hydrolysis condensate thereof.
- the hydrolysis-condensation product means a compound in which all or a part of alkoxy groups contained in each compound (II) are condensed by hydrolysis.
- M represents a trivalent or tetravalent metal atom capable of forming a metal alkoxide.
- a b1 independently represents an alkoxy group having 1 to 4 carbon atoms.
- k represents an integer of 3 or 4 depending on the valence of M.
- M is a metal atom that can be bonded to an alkoxy group to form a metal alkoxide, and the metal atom includes a semimetal such as Si or Ge.
- M include trivalent metals such as Al, Fe and In; tetravalent metals such as Hf, Si, Ti, Sn and Zr; and preferably trivalent metals such as Al; Si, Ti, Sn, Tetravalent metals such as Zr; more preferably Al, Si, Ti, Zr, and particularly preferably Si.
- These metal alkoxides can be easily liquefied. Further, when M is a trivalent metal, k represents 3, and when M is a tetravalent metal, k represents 4.
- the alkoxy group represented by A b1 is more preferably an alkoxy group having 1 to 2 carbon atoms.
- the hydrolyzable group of the organosilicon compound (a) and the alkoxy group of the metal alkoxide (b) may be the same or different, but are preferably the same, both of which are alkoxy groups having 1 to 4 carbon atoms. It is preferable that
- Examples of the metal alkoxide (b) include tetraalkoxysilanes such as tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, and tetrabutoxysilane; trialkoxyaluminums such as triethoxyaluminum, tripropoxyaluminum, and tributoxyaluminum; Trialkoxy iron; trialkoxy indium such as trimethoxy indium, triethoxy indium, tripropoxy indium, tributoxy indium; tetraalkoxy hafnium such as tetramethoxy hafnium, tetraethoxy hafnium, tetrapropoxy hafnium, tetrabutoxy hafnium; tetramethoxy titanium, Tetraalkoxy such as tetraethoxytitanium, tetrapropoxytitanium, tetrabutoxytitanium, etc
- Tan tetramethoxy tin, tetraethoxy tin, tetra propoxy tin, tetraalkoxy tin, such as tetrabutoxy tin; tetramethoxy zirconium, tetraethoxy zirconium, tetra propoxy zirconium, tetra-alkoxy zirconium, such as tetrabutoxyzirconium; and the like.
- the content of the metal alkoxide (b) is preferably 0.01% by mass or more, more preferably 0.5% by mass or more, and further preferably 1.0% by mass or more in 100% by mass of the composition.
- the content is preferably 20% by mass or less, more preferably 10% by mass or less, and still more preferably 5% by mass or less.
- the ratio of metal alkoxide (b) to organosilicon compound (a) is preferably 1/10 or more on a molar basis, More preferably 1/1 or more, still more preferably 2/1 or more, and preferably 100/1 or less, more preferably 50/1 or less, still more preferably 30/1 or less, and even more preferably 25 / 1 or less.
- the fluorine-containing organosilicon compound (f) has at least one fluorine-containing group bonded to the central silicon atom and at least one hydrolyzable group bonded to the central silicon atom in one molecule. .
- the fluorine-containing group is a group including a structure in which a carbon atom and a fluorine atom are bonded, and may be a fluorinated hydrocarbon group which may have a substituent. It may be a group in which bonded silicon atoms and —O— are alternately arranged (sometimes referred to as a hydrolyzable silane oligomer residue).
- the fluorine-containing organosilicon compound (f) is preferably a compound represented by either the following formula (III-1) or (III-2).
- each of the compounds represented by the formula (III-1) or (III-2) may be a hydrolysis condensate (a group in which a hydrolyzable group contained in the compound is condensed by hydrolysis). Good.
- R f1 represents a fluorocarbon-containing group having 1 to 8 carbon atoms.
- a f1 independently represents a hydrolyzable group.
- Z f1 represents a siloxane skeleton-containing group, a hydrocarbon chain-containing group, or a hydrolyzable group.
- R f2 represents a hydrolyzable silane oligomer residue.
- a f2 independently represents a hydrolyzable group, a fluorine-containing alkyl group having 1 to 12 carbon atoms, or an alkyl group having 1 to 4 carbon atoms.
- Examples of the hydrolyzable group represented by A f1 , A f2 and Z f1 include the same groups as the hydrolyzable groups of the organosilicon compound (a), preferably an alkoxy group or an isocyanate group, An alkoxy group having 4 carbon atoms is more preferable, and an alkoxy group having 1 to 2 carbon atoms is more preferable.
- the hydrolyzable groups of the fluorine-containing organosilicon compound (f) and the organosilicon compound (a) may be the same or different and are preferably the same, both of which are alkoxy groups having 1 to 4 carbon atoms. Preferably there is.
- the number of atoms of the siloxane skeleton-containing group represented by Z f1 , the hydrocarbon chain-containing group, and the fluorocarbon-containing group represented by R f1 is the molecular chain (preferably trialkylsilyl group and hydrolysate in the organic compound (a)).
- the number of atoms is preferably smaller than the number of atoms of the chain or cyclic hydrocarbon and / or the chain or cyclic dialkylsiloxane connecting the decomposable silicon group.
- the longest straight chain carbon number contained in the siloxane skeleton-containing group, hydrocarbon chain-containing group or R f1 represented by R f1 in Z f1 is greater than the number of atoms in the trialkylsilyl group-containing molecular chain. It is preferable that the amount is small.
- the structure derived from the metal alkoxide (b) can act as a spacer.
- Siloxane skeleton-containing group represented by Z f1 the hydrocarbon chain-containing group, a siloxane skeleton-containing group represented by Z a2, include hydrocarbon chains containing groups and each similar group.
- the fluorocarbon-containing group represented by R f1 is a monovalent group including a structure in which a fluorine atom is bonded to a carbon atom, and is preferably a group having a fluoroalkyl group at the end, and a fluoroalkyl group (preferably trifluoro). A group having a methyl group) at the terminal is preferable.
- a group represented by the formula (f1) is preferable.
- R f3 represents a fluorine-containing alkyl group having 1 to 20 carbon atoms.
- R f4 represents a fluorine atom or a fluoroalkyl group having 1 to 20 carbon atoms.
- R b4 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
- L represents any of —O—, —COO—, —OCO—, —NR f5 —, —NR f5 CO—, and —CONR f5 —.
- R f5 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or a fluorine-containing alkyl group having 1 to 4 carbon atoms.
- h1 to h5 are integers of 0 to 100, and the total value of h1 to h5 is 100 or less. Further, the order of each repeating unit attached with h1 to h5 and enclosed in parentheses is arbitrary in the formula. * Represents a bond. ]
- the fluorine-containing alkyl group represented by R f3 or R f4 has 1 to 20, preferably 1 to 12, more preferably 1 to 10, and more preferably 1 to 5. Further preferred.
- the number of fluorine atoms substituted in the fluorine-containing alkyl group represented by R f3 or R f4 is 1 or more and 2A + 1 or less, where A is the number of carbon atoms contained in the fluorine-containing alkyl group, and 2A + 1 That is, the fluorine-containing alkyl group is preferably a perfluoroalkyl group.
- Examples of the alkyl group represented by R b4 include the same groups as the alkyl groups exemplified as the hydrocarbon group represented by R s1 .
- L f1 is preferably any one of —O—, —COO—, and —OCO—.
- h1 is preferably 1 to 30, more preferably 1 to 25, still more preferably 1 to 10, particularly preferably 1 to 5, and most preferably 1 to 2.
- h2 is preferably from 0 to 15, and more preferably from 0 to 10.
- h3 is preferably 0 to 5, and more preferably 0 to 2.
- h4 is preferably from 0 to 4, more preferably from 0 to 2.
- h5 is preferably from 0 to 4, more preferably from 0 to 2.
- the total value of h1 to h5 is preferably 3 or more, more preferably 5 or more, and preferably 80 or less, more preferably 50 or less, and still more preferably 20 or less.
- R f3 is a perfluoroalkyl having 1 to 5 carbon atoms
- R f4 is a fluorine atom or a perfluoroalkyl having 1 to 5 carbon atoms
- R b4 is a hydrogen atom
- h3, h4, and h5 are all 0. It is preferable that h1 is 1 to 5 and h2 is 0 to 5.
- fluorocarbon-containing group examples include groups represented by the following formulas.
- R f3 and R b4 are as defined above, R f3 is preferably a C 1-12 perfluoroalkyl group, and R b4 is preferably a hydrogen atom.
- R2 is 5 to 20, preferably 8 to 15.
- r3 is 1 to 7, preferably 2 to 6.
- r4 is 1 to 10, preferably 3 to 7.
- r5 is 1 to 6, preferably 2 to 4.
- Examples of the group represented by the formula (f1-1) include a group represented by the following formula.
- Examples of the group represented by the formula (f1-2) include a group represented by the following formula.
- L f2 represents an alkanediyl group having 5 to 20 carbon atoms.
- Examples of the group represented by the formula (f1-3) include a group represented by the following formula.
- L f2 represents an alkanediyl group having 5 to 20 carbon atoms.
- Examples of the group represented by the formula (f1-4) include a group represented by the following formula.
- L f2 represents an alkanediyl group having 5 to 20 carbon atoms.
- Examples of the group represented by the formula (f1-5) include a group represented by the following formula.
- L f3 represents an alkanediyl group having 1 to 6 carbon atoms.
- the fluorocarbon-containing group may be a fluoroalkylaryl group, a fluoroalkylalkenyl group, a fluoroalkylalkynyl group, or the like.
- the fluoroalkylaryl group include (fluoro C 1-8 alkyl) phenyl group and (fluoro C 1-8 alkyl) naphthyl group.
- the fluoroalkylalkenyl group include (fluoro C 1-17 alkyl) vinyl group.
- Examples of the fluoroalkylalkynyl group include a ( fluoroC 1-17 alkyl) ethynyl group.
- Z f1 is preferably a siloxane skeleton-containing group or a hydrolyzable group, and more preferably a hydrolyzable group.
- the hydrolyzable silane oligomer residue represented by R f2 is a compound containing a silicon atom and a hydrolyzable group bonded to the silicon atom (hereinafter referred to as “hydrolyzable silane monomer”).
- the number of silicon atoms contained in the hydrolyzable silane oligomer residue is, for example, 3 or more, preferably 5 or more, more preferably 7 or more.
- the number of silicon atoms contained in the hydrolyzable silane oligomer residue is preferably 15 or less, more preferably 13 or less, and even more preferably 10 or less.
- hydrolyzable silane oligomer residue has an alkoxy group
- examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, and a butoxy group, and a methoxy group and an ethoxy group are preferable.
- the hydrolyzable silane oligomer residue may have one or more of these alkoxy groups, and preferably has one.
- the hydrolyzable silane oligomer residue is preferably a group represented by the formula (f2).
- a f3 independently represents a hydrolyzable group, an alkyl group having 1 to 4 carbon atoms, or a fluorine-containing alkyl group having 1 to 4 carbon atoms.
- h6 is an integer of 0 or more and 100 or less. * Represents a bond with Si.
- Examples of the hydrolyzable group represented by A f3 include an alkoxy group having 1 to 4 carbon atoms (preferably 1 to 2) such as a methoxy group, an ethoxy group, a propoxy group, and a butoxy group; a hydrogen atom; a cyano group; an allyl group An alkoxy group is preferable, and an ethoxy group, a methoxy group, and an isocyanate group are more preferable.
- h6 is preferably 0 or more and 10 or less, and more preferably 0 or more and 7 or less.
- a f3 is preferably a hydrolyzable group or a fluorinated alkyl group having 1 to 4 carbon atoms, and at least one of A f3 is preferably a fluorinated alkyl group having 1 to 4 carbon atoms. Further, at least one of A f3 is preferably a hydrolyzable group (particularly a methoxy group or an ethoxy group).
- hydrolyzable silane oligomer residue examples include groups represented by the following formulas.
- Examples of the compound represented by the formula (III-1) include a compound represented by the following formula.
- r1 is 1 to 15, preferably 1 to 12, and more preferably 1 to 6.
- Examples of the compound represented by the formula (III-1) also include a compound represented by the following formula.
- r2 is 5 to 20, preferably 8 to 15.
- r3 is 1 to 7, preferably 2 to 6.
- r4 is 1 to 10, preferably 2 to 8, and more preferably 2 to 5.
- r5 is 1 to 5, preferably 2 to 4.
- r6 is 2 to 10, preferably 2 to 8.
- r7 is 2 to 10, preferably 3 to 7.
- Examples of the compound represented by the formula (III-2) include compounds represented by the following formula.
- the content of the fluorine-containing organosilicon compound (f) is preferably 0.01% by mass or more, more preferably 0.05% by mass or more, and further preferably 1% by mass or more in 100% by mass of the composition. It is preferably 20% by mass or less, more preferably 10% by mass or less, and still more preferably 7% by mass or less.
- the ratio of the fluorine-containing organosilicon compound (f) to the organosilicon compound (a) is 1 in molar ratio.
- the content ratio of the metal alkoxide (b) and the fluorine-containing organosilicon compound (f) is 0.01 by molar ratio.
- it is 0.1 or more, more preferably 0.2 or more, and preferably 50 or less, more preferably 10 or less, and even more preferably 5 or less.
- the composition of the present invention preferably further contains a solvent (c).
- Solvent (c) includes water; hydrophilic organic solvents such as alcohol solvents, ether solvents, ketone solvents, ester solvents and amide solvents; hydrophobic solvents such as aromatic hydrocarbon solvents and saturated hydrocarbon solvents These may be used alone or in combination of two or more.
- the alcohol solvent include methanol, ethanol, propanol, isopropyl alcohol, butanol, ethylene glycol, propylene glycol, and diethylene glycol.
- the ether solvent include dimethoxyethane, tetrahydrofuran, and dioxane.
- Examples of the solvent include acetone and methyl ethyl ketone, examples of the ester solvent include ethyl acetate and butyl acetate, examples of the amide solvent include dimethylformamide, and examples of the aromatic hydrocarbon solvent include Examples of the saturated hydrocarbon solvent include benzene, toluene, and xylene. Examples of the saturated hydrocarbon solvent include hexane and cyclohexane.
- alcohol solvents and ketone solvents are preferable and may contain water. When water is contained, the content of water in the solvent (c) is preferably 0.1% by mass or more, more preferably 5% by mass or more, still more preferably 10% by mass or more, and preferably 90% by mass or less. More preferably, it is 70 mass% or less, More preferably, it is 50 mass% or less.
- the solvent (c) is preferably 0.1 parts by mass or more, more preferably with respect to 1 part by mass in total of the organosilicon compound (a), the metal alkoxide (b) and the fluorinated organosilicon compound (f). Is 5 parts by mass or more, more preferably 10 parts by mass or more, particularly preferably 12 parts by mass or more, preferably 100 parts by mass or less, more preferably 80 parts by mass or less, still more preferably 50 parts by mass or less. is there. When the amount of the solvent (c) is within this range, the thickness of the film can be easily controlled.
- the composition of the present invention may further contain a catalyst (d).
- the catalyst (d) is not particularly limited as long as it can act as a hydrolysis catalyst for a hydrolyzable group bonded to a silicon atom, and examples thereof include acidic compounds; basic compounds; organometallic compounds; Examples of the acidic compound include inorganic acids such as hydrochloric acid and nitric acid; organic acids such as acetic acid; Examples of the basic compound include ammonia, amines, and the like.
- organometallic compound examples include organometallic compounds having a metal element such as Al, Fe, Zn, and Sn as a central metal, and organoaluminum compounds such as aluminum acetylacetone complex and aluminum ethylacetoacetate complex; Organic iron compounds; organic zinc compounds such as zinc acetylacetonate monohydrate, zinc naphthenate, and zinc octylate; organic tin compounds such as dibutyltin diacetate complex; Especially, as a catalyst (d), an organometallic compound and an acidic compound are preferable, and an organoaluminum compound and hydrochloric acid are more preferable.
- organometallic compounds having a metal element such as Al, Fe, Zn, and Sn as a central metal
- organoaluminum compounds such as aluminum acetylacetone complex and aluminum ethylacetoacetate complex
- Organic iron compounds organic zinc compounds such as zinc acetylacetonate monohydrate, zinc naphthenate, and
- the catalyst (d) is preferably 0.0001 parts by mass or more, more preferably 100 parts by mass or more with respect to 100 parts by mass in total of the organosilicon compound (a), the metal alkoxide (b) and the fluorine-containing organosilicon compound (f). Is 0.0002 parts by mass or more, more preferably 0.001 parts by mass or more, preferably 20 parts by mass or less, more preferably 10 parts by mass or less, and further preferably 5 parts by mass or less. Further, when an acidic compound is used as the catalyst, the catalyst (d) is 0.001 mass relative to 100 mass parts in total of the organosilicon compound (a), the metal alkoxide (b) and the fluorinated organosilicon compound (f).
- the catalyst (d) is 0.0001 with respect to 100 parts by mass in total of the organosilicon compound (a), the metal alkoxide (b) and the fluorinated organosilicon compound (f). It is preferably at least part by mass, more preferably at least 0.0002 part by mass, even more preferably at least 0.001 part by mass, preferably at most 0.1 part by mass, more preferably at least 0.05 part by mass. Or less.
- composition of the present invention is an antioxidant, a rust inhibitor, a UV absorber, a light stabilizer, a fungicide, an antibacterial agent, an anti-bioadhesive agent, a deodorant, as long as the effects of the present invention are not impaired.
- Various additives such as pigments, flame retardants and antistatic agents may be included.
- antioxidants examples include phenol-based antioxidants, sulfur-based antioxidants, phosphorus-based antioxidants, hindered amine-based antioxidants, and the like.
- phenolic antioxidant examples include n-octadecyl-3- (4-hydroxy-3,5-di-t-butylphenyl) propionate, 2,6-di-t-butyl-4-methylphenol, 2, 2-thio-diethylene-bis- [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], tri-ethylene glycol-bis- [3- (3-t-butyl-5-methyl -4-hydroxyphenyl) propionate], 3,9-bis [2- ⁇ 3- (3-tert-butyl-4-hydroxy-5-methylphenyl) propionyloxy ⁇ -1,1-dimethylethyl] -2, 4,8,10-tetraoxaspiro [5.5] undecane, tetrakis ⁇ 3- (3,5-di-tert-butyl-4-hydroxyphenyl) -propionic acid ⁇ pentaeryth Cyl ester, 2-t-butyl-6-
- sulfur-based antioxidant examples include 3,3′-thiodipropionic acid di-n-dodecyl ester, 3,3′-thiodipropionic acid di-n-tetradecyl ester, and 3,3′-thiodipropion ester.
- examples include acid di-n-octadecyl ester, tetrakis (3-dodecylthiopropionic acid) pentaerythritol ester, and the like.
- Examples of the phosphorus antioxidant include tris (2,4-di-t-butylphenyl) phosphite, bis (2,4-di-t-butylphenyl) pentaerythritol diphosphite, bis (2,6- Di-t-butyl-4-methylphenyl) pentaerythritol diphosphite, bis (2,4-di-cumylphenyl) pentaerythritol diphosphite, tetrakis (2,4-di-t-butylphenyl) -4,4 Examples include '-biphenylene diphosphonite, bis- [2,4-di-t-butyl, (6-methyl) phenyl] ethyl phosphite, and the like.
- hindered amine antioxidant examples include sebacic acid bis (2,2,6,6-tetramethyl-4-piperidyl) ester (melting point: 81 to 86 ° C.), 2,2,6,6-tetramethyl-4- Piperidyl methacrylate (melting point: 58 ° C.), poly [ ⁇ 6- (1,1,3,3-tetramethylbutyl) amino-1,3,5-triazine-2,4-diyl ⁇ ⁇ (2,2,6, 6-tetramethyl-4-piperidyl) imino ⁇ -1,6-hexamethylene ⁇ (2,2,6,6-tetramethyl-4-piperidyl) imino ⁇ ] and the like.
- the rust inhibitor examples include alkanolamines such as triethanolamine; quaternary ammonium salts; alkanethiols; imidazoles such as imidazoline, imidazole, alkylimidazoline derivatives, benzimidazole, 2-mercaptobenzimidazole, and benzotriazole; metavanadic acid Sodium; bismuth citrate; phenol derivatives; aliphatic amines such as alkylamines and polyalkenylamines, aromatic amines, ethoxylated amines, cyanoalkylamines, cyclohexylamine benzoate, aliphatic diamines such as alkylenediamine, aromatic diamines, etc.
- alkanolamines such as triethanolamine
- quaternary ammonium salts such as imidazoline, imidazole, alkylimidazoline derivatives, benzimidazole, 2-mercaptobenzimidazole, and benzotri
- Examples of the ultraviolet absorber / light stabilizer include 2- (5-methyl-2-hydroxyphenyl) benzotriazole, 2- [2-hydroxy-3,5-bis ( ⁇ , ⁇ -dimethylbenzyl) phenyl].
- Examples of the fungicide / antibacterial agent include 2- (4-thiazolyl) benzimidazole, sorbic acid, 1,2-benzisothiazolin-3-one, (2-pyridylthio-1-oxide) sodium, dehydroacetic acid, 2-methyl -5-chloro-4-isothiazolone complex, 2,4,5,6-tetrachlorophthalonitrile, methyl 2-benzimidazole carbamate, methyl 1- (butylcarbamoyl) -2-benzimidazole carbamate, mono or dibromocyano
- Examples include acetamides, 1,2-dibromo-2,4-dicyanobutane, 1,1-dibromo-1-nitropropanol and 1,1-dibromo-1-nitro-2-acetoxypropane.
- biological adhesion inhibitor examples include tetramethylthiuram disulfide, bis (N, N-dimethyldithiocarbamate) zinc, 3- (3,4-dichlorophenyl) -1,1-dimethylurea, dichloro-N-((dimethylamino ) Sulfonyl) fluoro-N- (P-tolyl) methanesulfenamide, pyridine-triphenylborane, N, N-dimethyl-N′-phenyl-N ′-(fluorodichloromethylthio) sulfamide, cuprous thiocyanate ( 1), cuprous oxide, tetrabutylthiuram disulfide, 2,4,5,6-tetrachloroisophthalonitrile, zinc ethylenebisdithiocarbamate, 2,3,5,6-tetrachloro-4- (methyl) Sulfonyl) pyridine, N- (2,4,6-trichloroph
- deodorizer examples include lactic acid, succinic acid, malic acid, citric acid, maleic acid, malonic acid, ethylenediaminepolyacetic acid, alkane-1,2-dicarboxylic acid, alkene-1,2-dicarboxylic acid, cycloalkane-1 , 2-dicarboxylic acid, cycloalkene-1,2-dicarboxylic acid, organic acids such as naphthalenesulfonic acid; fatty acid metals such as zinc undecylenate, zinc 2-ethylhexanoate, zinc ricinoleate; iron oxide, iron sulfate, Zinc oxide, zinc sulfate, zinc chloride, silver oxide, copper oxide, metal (iron, copper, etc.) chlorophyllin sodium, metal (iron, copper, cobalt etc.) phthalocyanine, metal (iron, copper, cobalt etc.) tetrasulfonic acid phthalocyanine, Metal compounds such as titanium dioxide, visible light responsive
- the pigment examples include carbon black, titanium oxide, phthalocyanine pigment, quinacridone pigment, isoindolinone pigment, perylene or perine pigment, quinophthalone pigment, diketopyrrolo-pyrrole pigment, dioxazine pigment, disazo condensation pigment, Examples include benzimidazolone pigments.
- flame retardant examples include decabromobiphenyl, antimony trioxide, phosphorus flame retardant, aluminum hydroxide and the like.
- antistatic agent examples include quaternary ammonium salt type cationic surfactants, betaine type amphoteric surfactants, alkyl phosphate type anionic surfactants, primary amine salts, secondary amine salts, thirds.
- Cationic surfactants such as quaternary amine salts, quaternary amine salts and pyridine derivatives, sulfated oils, soaps, sulfated ester oils, sulfated amide oils, sulfated ester salts of olefins, fatty alcohol sulfate esters, alkyl sulfates
- Anionic surfactants such as ester salts, fatty acid ethyl sulfonates, alkyl naphthalene sulfonates, alkyl benzene sulfonates, oxalate sulfonates and phosphate ester salts, partial fatty acid esters of polyhydric alcohols, fatty alcohol
- additives lubricants, fillers, plasticizers, nucleating agents, antiblocking agents, foaming agents, emulsifiers, brighteners, binders, and the like may coexist.
- the content of the additive is usually 0.1 to 70% by mass, preferably 0.1 to 50% by mass, more preferably 0.5 to 30% in the composition. % By mass, more preferably 2 to 15% by mass.
- the content of the silicon compound (f) and the solvent (c)) is usually 60% by mass or more, preferably 75% by mass or more, more preferably 85% by mass or more, and still more preferably 95% in the composition. % Or more.
- Examples of the method of bringing the organosilicon compound (a), the metal alkoxide (b), and the fluorine-containing organosilicon compound (f) into contact with the substrate include, for example, a spin coating method, a dip coating method, a spray coating method, a roll coating method, Examples thereof include a bar coating method and a die coating method, and a spin coating method and a spray coating method are preferable. According to the spin coating method and the spray coating method, the thickness of the film can be easily adjusted.
- the composition may be further diluted as necessary.
- the dilution factor is, for example, 2 to 100 times, preferably 5 to 50 times that of the composition before dilution.
- the solvent illustrated as a solvent (c) can be used suitably.
- composition of the present invention By leaving the composition of the present invention and the substrate in contact with each other in the air, moisture in the air is taken in and hydrolyzable groups are hydrolyzed to form a siloxane skeleton, thereby forming a film. Is done. When allowed to stand, it may be kept at 40 to 250 ° C.
- a film formed from the above composition is also included in the scope of the present invention.
- the coating includes a structure derived from the organosilicon compound (a), the metal alkoxide (b), and the fluorine-containing organosilicon compound (f).
- the initial contact angle of water ⁇ 01 for the film of the present invention is preferably 80 ° or more, more preferably 90 ° or more, still more preferably 100 ° or more, and may be 140 ° or less. It may be 130 ° or less.
- the contact angle means a value measured by the ⁇ / 2 method using 3.0 ⁇ L of water.
- the initial contact angle ⁇ 02 of the oil with respect to the film of the present invention is preferably 55 ° or more, more preferably 60 ° or more, still more preferably 65 ° or more, and may be 120 ° or less. It may be 110 ° or less.
- the contact angle means a value measured by the ⁇ / 2 method using hexadecane having a liquid volume of 3.0 ⁇ L.
- the film of the present invention has a contact angle change rate d w2 represented by the following formula of ⁇ 25% or more when the contact angle after immersion in ion exchange water at 70 ° C. for 12 hours is ⁇ w2.
- a contact angle change rate d w2 represented by the following formula of ⁇ 25% or more when the contact angle after immersion in ion exchange water at 70 ° C. for 12 hours is ⁇ w2.
- it is -15% or more, more preferably -12% or more, and preferably 0%, but it is also acceptable that it is -1% or less, and further -5% or less.
- Contact angle change rate d w2 (%) ( ⁇ w2 ⁇ 01 ) / ⁇ 01 ⁇ 100
- the structure (A) derived from the organosilicon compound (a) is represented by the formula (IA).
- R a represents a trialkylsilyl group-containing molecular chain
- Z a1 represents a trialkylsilyl group-containing molecular chain, a siloxane skeleton-containing group, a hydrocarbon chain-containing group, or an —O— group.
- a trialkylsilyl group-containing molecular chain of R a , Z a1 , a siloxane skeleton-containing group of Z a1 , and a hydrocarbon chain-containing group are respectively a trialkylsilyl group-containing molecular chain, a siloxane skeleton-containing group, and a hydrocarbon chain-containing group.
- the hydrocarbon chain-containing group can be appropriately selected from the range described above.
- Z a1 is preferably a siloxane skeleton-containing group or an —O— group, and more preferably an —O— group.
- a structure represented by the formula (IA-I) can be given.
- the following formulas (IA-I-1) to (IA-I-50) are specific examples of the structure represented by the formula (IA-I), but are not limited thereto.
- the plurality of R s20 and the plurality of R s10 included therein may be the same or different.
- the structure (B) derived from the metal alkoxide (b) is represented by the formula (IIB).
- R b2 represents a hydroxy group or a —O— group.
- Structure (B) includes a structure represented by the following formula when M is Si.
- the structure (F) derived from the fluorine-containing organosilicon compound (f) is represented by the formula (IIIF-1) or (IIIF-2).
- R f1 and R f2 are as defined above.
- Z f2 represents a siloxane skeleton-containing group, a hydrocarbon chain-containing group, a hydroxy group, or an —O— group.
- a f3 represents a fluorine-containing alkyl group having 1 to 12 carbon atoms, an alkyl group having 1 to 4 carbon atoms, a hydroxy group, or an —O— group.
- the siloxane skeleton-containing group or a hydrocarbon chain-containing group represented by Z f2, a siloxane skeleton-containing group represented by Z a2, include hydrocarbon chains containing groups and each similar group.
- Structure (F) includes a structure represented by the following formula.
- r8 is an integer of 1 to 20, preferably an integer of 1 to 10.
- r9 is an integer of 1 to 10, preferably an integer of 1 to 5.
- r10 is an integer of 1 to 10, preferably an integer of 1 to 5.
- the film formed from the composition of the present invention has a trialkylsilyl group-containing molecular chain and a fluorine-containing group, and has a part that can function as a spacer derived from the metal alkoxide (b). Therefore, both water repellency and oil repellency can be achieved, and the smoothness of the coating surface is also good.
- a film-treated substrate in which the film of the present invention is formed on the substrate is also included in the scope of the present invention.
- the shape of the substrate may be either a flat surface or a curved surface, or may be a three-dimensional structure in which a large number of surfaces are combined.
- the substrate may be composed of any organic material or inorganic material.
- the organic material examples include acrylic resin, polycarbonate resin, polyester resin, styrene resin, acrylic-styrene copolymer resin, cellulose Thermoplastic resins such as resins, polyolefin resins, polyvinyl alcohol, etc .; thermosetting resins such as phenol resins, urea resins, melamine resins, epoxy resins, unsaturated polyesters, silicone resins, urethane resins; Are ceramics; glass; metals such as iron, silicon, copper, zinc, and aluminum; alloys containing the metals;
- the substrate may be subjected to an easy adhesion treatment in advance.
- the easy adhesion treatment include hydrophilic treatment such as corona treatment, plasma treatment, and ultraviolet treatment.
- primer treatment with a resin, a silane coupling agent, tetraalkoxysilane, or the like may be used.
- the primer layer is preferably a layer formed from a primer layer forming composition containing a component (P) capable of forming a siloxane skeleton (hereinafter sometimes referred to as component (P)).
- the composition for forming a primer layer comprises a compound represented by the following formula (Pa) as the component (P) (hereinafter sometimes referred to as a compound (Pa)) and / or a partial hydrolysis condensate thereof (P1). It is preferable to include a component.
- Si (X P2 ) 4 (Pa) [In the formula (Pa), X P2 represents a halogen atom, an alkoxy group or an isocyanate group. ]
- X P2 is preferably a chlorine atom, an alkoxy group having 1 to 4 carbon atoms or an isocyanate group, and preferably four X P2 are the same.
- Si (NCO) 4, Si (OCH 3) 4, Si (OC 2 H 5) 4 and the like are preferable.
- the (P1) component contained in the primer layer forming composition may be a partial hydrolysis-condensation product of the compound (Pa).
- the partial hydrolysis-condensation product of compound (Pa) can be produced by a general hydrolysis-condensation method using an acid catalyst or a base catalyst.
- the degree of condensation (degree of multimerization) of the partially hydrolyzed condensate is preferably such that the product is dissolved in the solvent.
- the component (Pa) may be a compound (Pa) or a partial hydrolysis condensate of the compound (Pa), and a mixture of the compound (Pa) and its partial hydrolysis condensate, for example, It may be a partially hydrolyzed condensate of the compound (Pa) containing the reaction compound (Pa).
- a commercial item can also be used as a compound (Pa) and its partial hydrolysis-condensation product.
- the primer layer forming composition further comprises, as component (P), a compound represented by formula (Pb) (hereinafter sometimes referred to as compound (Pb)) and / or a partially hydrolyzed condensate thereof ( P2) component may be included.
- component (P) a compound represented by formula (Pb) (hereinafter sometimes referred to as compound (Pb)) and / or a partially hydrolyzed condensate thereof ( P2) component may be included.
- Pb a compound represented by formula (Pb)
- P2 a compound represented by formula (Pb)
- P2 a compound represented by formula (Pb)
- P2 a partially hydrolyzed condensate thereof
- examples of the hydrolyzable group represented by X P3 include the same groups or atoms as those of X P2 .
- X P3 is preferably an alkoxy group or an isocyanate group, and particularly preferably an alkoxy group.
- the alkoxy group an alkoxy group having 1 to 4 carbon atoms is preferable, and a methoxy group or an ethoxy group is more preferable.
- a plurality of X P3 present in the compound (Pb) may be the same group or different groups, and the same group is preferable from the viewpoint of availability.
- the compound (Pb) one or more kinds can be used, and (CH 3 O) 3 SiCH 2 CH 2 Si (OCH 3 ) 3 , (OCN) 3 SiCH 2 CH 2 Si (NCO) 3 , Cl 3 SiCH 2 CH 2 SiCl 3 , (C 2 H 5 O) 3 SiCH 2 CH 2 Si (OC 2 H 5) 3, (CH 3 O) 3 SiCH 2 CH 2 CH 2 CH 2 CH 2 Si ( OCH 3 ) 3 and the like.
- Component (P2) may be a partially hydrolyzed condensate of compound (Pb).
- the partially hydrolyzed condensate of compound (Pb) can be obtained by the same method as described in the production of the partially hydrolyzed condensate of compound (Pa).
- the degree of condensation (degree of multimerization) of the partially hydrolyzed condensate is preferably such that the product is dissolved in the solvent.
- Component (P2) may be compound (Pb) or a partial hydrolysis condensate of compound (Pb), and a mixture of compound (Pb) and its partial hydrolysis condensate, for example, It may be a partial hydrolysis-condensation product of the compound (Pb) containing the reaction compound (Pb).
- the primer layer forming composition may contain a cohydrolysis condensate by cohydrolysis of the compound (Pb) and the compound (Pa) as the component (P), and various polysilazanes are contained. Also good.
- the composition for forming a primer layer usually contains an organic solvent in consideration of economic efficiency, workability, ease of control of the thickness of the resulting primer layer, etc., in addition to the solid content as a layer constituent component.
- the organic solvent is preferably one that dissolves the solid content contained in the primer layer forming composition, and examples thereof include the same solvents as the solvent (c) used in the composition.
- the organic solvent is not limited to one kind, and two or more kinds of solvents having different polarities and evaporation rates may be mixed and used.
- the composition for primer layer formation contains a partial hydrolysis-condensation product and a partial hydrolysis-condensation product, it may contain the solvent used in order to manufacture these.
- composition for forming a primer layer even if it does not contain a partial hydrolysis condensate or partial hydrolysis cocondensate, in order to promote the hydrolysis cocondensation reaction, It is also preferable to blend a catalyst such as an acid catalyst that is generally used. Even when a partially hydrolyzed condensate or a partially hydrolyzed cocondensate is included, when the catalyst used for the production thereof does not remain in the composition, it is preferable to add a catalyst.
- the composition for forming a primer layer may contain water for the above-described components to undergo a hydrolysis condensation reaction or a hydrolysis cocondensation reaction.
- the base layer forming composition is applied to the surface of the substrate by brush coating, flow coating, spin coating, dip coating, squeegee coating, spray coating, hand coating, or the like, and is necessary in the air or in a nitrogen atmosphere.
- the base layer can be formed by curing after drying according to the above. Curing conditions are appropriately controlled depending on the type and concentration of the composition used. In addition, you may perform hardening of the composition for primer layer formation simultaneously with hardening of a composition.
- the thickness of the primer layer is not particularly limited as long as it can provide moisture resistance, adhesion, and barrier properties such as alkali from the substrate to the film formed thereon.
- the film formed from the composition of the present invention can achieve both water repellency and oil repellency, adhesion and film-forming properties, display devices such as touch panel displays, optical elements, semiconductor elements, building materials, automobile parts, nanoimprint technology, etc. It is useful as a base material.
- the film formed from the composition of the present invention is suitably used as an article such as a body, window glass (front glass, side glass, rear glass), mirror, bumper and the like in transportation equipment such as trains, automobiles, ships, and airplanes. Moreover, it can also be used for outdoor uses, such as a building outer wall, a tent, a solar power generation module, a sound insulation board, and concrete. It can also be used for fishing nets, insect nets, water tanks, and the like.
- it can be used for various indoor facilities such as kitchens, bathrooms, washstands, mirrors, toilet articles, ceramics such as chandeliers and tiles, artificial marble, and air conditioners. It can also be used as an antifouling treatment for jigs, inner walls, pipes and the like in factories. It is also suitable for goggles, glasses, helmets, slingshots, textiles, umbrellas, play equipment, soccer balls and the like. Furthermore, it can also be used as an anti-adhesive agent for various packaging materials such as food packaging materials, cosmetic packaging materials, and the inside of pots.
- Hot water test The film was immersed in ion exchange water at 70 ° C. for 12 hours, and the contact angle of water before and after immersion was measured. Comprehensive evaluation of the hot water test resistance was performed from the contact angle and change rate after the test.
- ⁇ Contact angle is 99 ° or more and the change rate of contact angle is ⁇ 10% or more
- ⁇ Contact angle is less than 99 ° to 90 ° or more, and the contact angle change rate is ⁇ 10% or more
- ⁇ Contact angle is less than 90 ° Or contact angle change rate is less than -10%
- Example 1-1 A three-necked flask was charged with 4.69 g of tris (trimethylsiloxy) silanol and 21.0 g of tetrahydrofuran (THF) and stirred. After cooling to ⁇ 40 ° C., 9.38 mL of n-BuLi hexane solution (1.6 mol / L) was added dropwise. The temperature was raised to 0 ° C., 10.01 g of hexamethylcyclotrisiloxane dissolved in 21 g of THF was added dropwise, and the mixture was stirred for 17 hours.
- THF tetrahydrofuran
- Example 1-2 A four-necked flask was charged with 0.72 g of trimethylsilanol and 6.72 mL of THF and stirred. After cooling to ⁇ 40 ° C., 5.00 mL of n-BuLi hexane solution (1.6 mol / L) was added dropwise. The temperature was raised to 0 ° C., 14.24 g of hexamethylcyclotrisiloxane dissolved in 16.43 mL of THF was added dropwise, the temperature was raised to room temperature, and the mixture was stirred for 17 hours. The mixture was cooled to ⁇ 40 ° C., and 1.59 g of chlorotriethoxysilane was added dropwise. Hexane was added and filtered. The filtrate was concentrated at 13 hPa and 25 ° C. to obtain compound 2. In the formula, the average number of repeating units in parentheses was calculated from the NMR spectrum and found to be 8.
- Example 2-1 Compound 1 as organosilicon compound (a), tetraethoxysilane (TEOS) as metal alkoxide (b), triethoxy (1H, 1H, 2H, 2H-nonafluorohexyl) silane as fluorine-containing organosilicon compound (f) (C 4 F 9 —C 2 H 4 —Si— (OC 2 H 5 ) 3 ), 0.01 M hydrochloric acid as the catalyst (d), and methyl ethyl ketone (MEK) as the solvent (c) are shown in Table 7. The mixture was mixed at a ratio and stirred for 24 hours to obtain a coating solution.
- TEOS tetraethoxysilane
- MEK methyl ethyl ketone
- a coating solution obtained using a spin coater (manufactured by MIKASA) obtained on an alkali-cleaned glass substrate (EAGLE XG, Corning) was coated at 3000 rpm for 20 s and allowed to stand at room temperature for 1 day. The film was cured at a temperature of
- Examples 2-2 to 2-8, Comparative Examples 1 to 4 After mixing at a composition ratio shown in Table 9 to obtain a coating solution, a film was obtained in the same manner as in Example 2-1. About the produced membrane
- Comparative Compound 1 represents a compound represented by the following formula.
- the average number of repeating units in parentheses was 24 calculated from the NMR spectrum.
- compositions obtained in the examples were excellent in film forming properties during film formation, and the resulting films were excellent in water and oil repellency, adhesion and film forming properties.
- all of the compositions obtained in the comparative examples were inferior in film forming properties during film formation.
- the film obtained from the composition of Comparative Example 4 is inferior in water repellency and oil repellency, and the film obtained from the compositions of Comparative Example 2 and Comparative Example 4 has adhesiveness as a result of the hot water test. I found it inferior.
- the film formed from the composition of the present invention can achieve both water repellency and oil repellency and film forming properties, and is a base material for display devices such as touch panel displays, optical elements, semiconductor elements, building materials, automobile parts, nanoimprint technology, etc. Useful as.
- the film formed from the composition of the present invention is suitably used as an article such as a body, window glass (front glass, side glass, rear glass), mirror, bumper and the like in transportation equipment such as trains, automobiles, ships, and airplanes. Moreover, it can also be used for outdoor uses, such as a building outer wall, a tent, a solar power generation module, a sound insulation board, and concrete. It can also be used for fishing nets, insect nets, water tanks, and the like.
- it can be used for various indoor facilities such as kitchens, bathrooms, washstands, mirrors, toilet articles, ceramics such as chandeliers and tiles, artificial marble, and air conditioners. It can also be used as an antifouling treatment for jigs, inner walls, pipes and the like in factories. It is also suitable for goggles, glasses, helmets, slingshots, textiles, umbrellas, play equipment, soccer balls and the like. Furthermore, it can also be used as an anti-adhesive agent for various packaging materials such as food packaging materials, cosmetic packaging materials, and the inside of pots.
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Abstract
The purpose of the present invention is to provide a composition that achieves both water and oil repellency for a coating and can also improve film formation properties. This coating composition includes: an organic silicon compound (a) having bonded, to a silicon atom, at least one trialkylsilyl group-containing molecular chain and at least one hydrolysable group; a metal alkoxide (b); and a flourine-containing organic silicon compound (f) having bonded, to a silicon atom, a fluorine-containing group and a hydrolysable group. The compound (a) can be a compound indicated by formula (I).
Description
本発明は、各種基材に撥水性及び撥油性を付与できる皮膜を形成するための組成物に関する。
The present invention relates to a composition for forming a film capable of imparting water repellency and oil repellency to various substrates.
各種の表示装置、光学素子、半導体素子、建築材料、自動車部品、ナノインプリント技術等において、基材の表面に液滴が付着することにより、基材の汚れや腐食、さらにこの汚れや腐食に由来する性能低下等の問題が生じる場合がある。そのため、これらの分野において、基材表面の撥水性及び撥油性が良好であることが求められている。
In various display devices, optical elements, semiconductor elements, building materials, automobile parts, nanoimprint technology, etc., droplets adhere to the surface of the substrate, resulting in contamination and corrosion of the substrate, and further from this contamination and corrosion. Problems such as performance degradation may occur. Therefore, in these fields, it is required that the water repellency and oil repellency of the substrate surface are good.
特許文献1では、曲げ形状を有するガラス基材に塗布し、滑水性ガラス物品を生産することを可能とする処理剤として、直鎖状ポリジメチルシロキサンとフルオロアルキルシランとを含み、さらに溶剤と触媒とを含む組成物が提案されている。
In Patent Document 1, as a treating agent that can be applied to a glass substrate having a bent shape to produce a water-slidable glass article, it contains linear polydimethylsiloxane and fluoroalkylsilane, and further includes a solvent and a catalyst. A composition comprising
本発明者らは、上記特許文献1に記載の皮膜では、撥油性、密着性や製膜性が十分でない場合があるとの知見を得た。本発明は、前記事情に鑑みてなされたものであり、皮膜の撥水性と撥油性とを両立しつつ、さらには製膜性をも向上できる組成物の提供を目的とする。
The inventors of the present invention have found that the film described in Patent Document 1 may not have sufficient oil repellency, adhesion and film-forming properties. The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a composition capable of improving the film forming property while achieving both the water repellency and the oil repellency of the film.
本発明者らは、上記事情に鑑みて鋭意検討した結果、所定の有機ケイ素化合物、金属アルコキシド及び含フッ素有機ケイ素化合物を含む組成物を用いると、得られる皮膜の撥水性と撥油性とを両立することができ、さらには製膜性も良好なものとなることを見出して、本発明を完成した。本発明は、以下の発明を含む。
[1]少なくとも1つのトリアルキルシリル基含有分子鎖と、少なくとも1つの加水分解性基とがケイ素原子に結合している有機ケイ素化合物(a)、金属アルコキシド(b)及び含フッ素基と加水分解性基とがケイ素原子に結合している含フッ素有機ケイ素化合物(f)を含むコーティング組成物。
[2]前記化合物(a)が、式(I)で表される化合物である[1]に記載のコーティング組成物。
[式(I)中、Raはトリアルキルシリル基含有分子鎖を表し、Aa1は、それぞれ独立に、加水分解性基を表す。Za1は、トリアルキルシリル基含有分子鎖、炭化水素鎖含有基、シロキサン骨格含有基又は加水分解性基を表す。]
[3]前記金属アルコキシド(b)が、式(II)で表される化合物である[1]又は[2]に記載のコーティング組成物。
[式(II)中、Mは金属アルコキシドを形成しうる3価又は4価の金属原子を表す。Ab1は、それぞれ独立に、炭素数1~4のアルコキシ基を表す。kは、Mに応じて、3又は4の整数を表す。
]
[4]前記化合物(f)が、式(III-1)及び(III-2)のいずれかで表される化合物である[1]~[3]のいずれかに記載のコーティング組成物。
[式(III-1)中、Rf1は、炭素数1~8のフッ化炭素含有基を表す。Af1は、それぞれ独立に、加水分解性基を表す。Zf1は、シロキサン骨格含有基、炭化水素鎖含有基又は加水分解性基を表す。]
[上記式(III-2)中、Rf2は、加水分解性シランオリゴマー残基を表す。Af2は、それぞれ独立に、加水分解性基、炭素数1~12の含フッ素アルキル基又は炭素数1~4のアルキル基を表す。]
[5]前記含フッ素有機ケイ素化合物(f)と前記有機ケイ素化合物(a)の含有率の比(含フッ素有機ケイ素化合物(f)/有機ケイ素化合物(a))が、モル比で、7/1以上、20/1以下である[1]~[4]のいずれかに記載のコーティング組成物。
[6]前記金属アルコキシド(b)と前記含フッ素有機ケイ素化合物(f)の含有率の比(金属アルコキシド(b)/含フッ素有機ケイ素化合物(f))が、モル比で、0.01以上、50以下である[1]~[5]のいずれかに記載のコーティング組成物。
[7][1]~[6]に記載のコーティング組成物から形成される皮膜。 As a result of intensive studies in view of the above circumstances, the present inventors have achieved both the water repellency and oil repellency of the resulting film when using a composition containing a predetermined organosilicon compound, metal alkoxide, and fluorine-containing organosilicon compound. In addition, the present invention has been completed by finding that the film-forming property can be improved. The present invention includes the following inventions.
[1] Hydrolysis of organosilicon compound (a), metal alkoxide (b) and fluorine-containing group in which at least one trialkylsilyl group-containing molecular chain and at least one hydrolyzable group are bonded to a silicon atom A coating composition comprising a fluorine-containing organosilicon compound (f) having a functional group bonded to a silicon atom.
[2] The coating composition according to [1], wherein the compound (a) is a compound represented by the formula (I).
[In formula (I), R a represents a trialkylsilyl group-containing molecular chain, and A a1 independently represents a hydrolyzable group. Z a1 represents a trialkylsilyl group-containing molecular chain, a hydrocarbon chain-containing group, a siloxane skeleton-containing group, or a hydrolyzable group. ]
[3] The coating composition according to [1] or [2], wherein the metal alkoxide (b) is a compound represented by the formula (II).
[In formula (II), M represents a trivalent or tetravalent metal atom capable of forming a metal alkoxide. A b1 independently represents an alkoxy group having 1 to 4 carbon atoms. k represents an integer of 3 or 4 depending on M.
]
[4] The coating composition according to any one of [1] to [3], wherein the compound (f) is a compound represented by any one of formulas (III-1) and (III-2).
[In the formula (III-1), R f1 represents a fluorocarbon-containing group having 1 to 8 carbon atoms. A f1 independently represents a hydrolyzable group. Z f1 represents a siloxane skeleton-containing group, a hydrocarbon chain-containing group, or a hydrolyzable group. ]
[In the above formula (III-2), R f2 represents a hydrolyzable silane oligomer residue. A f2 independently represents a hydrolyzable group, a fluorine-containing alkyl group having 1 to 12 carbon atoms, or an alkyl group having 1 to 4 carbon atoms. ]
[5] The content ratio of the fluorine-containing organosilicon compound (f) and the organosilicon compound (a) (fluorine-containing organosilicon compound (f) / organosilicon compound (a)) is 7 / The coating composition according to any one of [1] to [4], which is 1 or more and 20/1 or less.
[6] The content ratio of the metal alkoxide (b) to the fluorine-containing organosilicon compound (f) (metal alkoxide (b) / fluorine-containing organosilicon compound (f)) is 0.01 or more in molar ratio. The coating composition according to any one of [1] to [5], which is 50 or less.
[7] A film formed from the coating composition according to [1] to [6].
[1]少なくとも1つのトリアルキルシリル基含有分子鎖と、少なくとも1つの加水分解性基とがケイ素原子に結合している有機ケイ素化合物(a)、金属アルコキシド(b)及び含フッ素基と加水分解性基とがケイ素原子に結合している含フッ素有機ケイ素化合物(f)を含むコーティング組成物。
[2]前記化合物(a)が、式(I)で表される化合物である[1]に記載のコーティング組成物。
[3]前記金属アルコキシド(b)が、式(II)で表される化合物である[1]又は[2]に記載のコーティング組成物。
]
[4]前記化合物(f)が、式(III-1)及び(III-2)のいずれかで表される化合物である[1]~[3]のいずれかに記載のコーティング組成物。
[5]前記含フッ素有機ケイ素化合物(f)と前記有機ケイ素化合物(a)の含有率の比(含フッ素有機ケイ素化合物(f)/有機ケイ素化合物(a))が、モル比で、7/1以上、20/1以下である[1]~[4]のいずれかに記載のコーティング組成物。
[6]前記金属アルコキシド(b)と前記含フッ素有機ケイ素化合物(f)の含有率の比(金属アルコキシド(b)/含フッ素有機ケイ素化合物(f))が、モル比で、0.01以上、50以下である[1]~[5]のいずれかに記載のコーティング組成物。
[7][1]~[6]に記載のコーティング組成物から形成される皮膜。 As a result of intensive studies in view of the above circumstances, the present inventors have achieved both the water repellency and oil repellency of the resulting film when using a composition containing a predetermined organosilicon compound, metal alkoxide, and fluorine-containing organosilicon compound. In addition, the present invention has been completed by finding that the film-forming property can be improved. The present invention includes the following inventions.
[1] Hydrolysis of organosilicon compound (a), metal alkoxide (b) and fluorine-containing group in which at least one trialkylsilyl group-containing molecular chain and at least one hydrolyzable group are bonded to a silicon atom A coating composition comprising a fluorine-containing organosilicon compound (f) having a functional group bonded to a silicon atom.
[2] The coating composition according to [1], wherein the compound (a) is a compound represented by the formula (I).
[3] The coating composition according to [1] or [2], wherein the metal alkoxide (b) is a compound represented by the formula (II).
]
[4] The coating composition according to any one of [1] to [3], wherein the compound (f) is a compound represented by any one of formulas (III-1) and (III-2).
[5] The content ratio of the fluorine-containing organosilicon compound (f) and the organosilicon compound (a) (fluorine-containing organosilicon compound (f) / organosilicon compound (a)) is 7 / The coating composition according to any one of [1] to [4], which is 1 or more and 20/1 or less.
[6] The content ratio of the metal alkoxide (b) to the fluorine-containing organosilicon compound (f) (metal alkoxide (b) / fluorine-containing organosilicon compound (f)) is 0.01 or more in molar ratio. The coating composition according to any one of [1] to [5], which is 50 or less.
[7] A film formed from the coating composition according to [1] to [6].
本発明の組成物は、所定の有機ケイ素化合物、金属アルコキシド及び含フッ素有機ケイ素化合物を含むため、得られる皮膜の撥水性、撥油性及び密着性を両立することができ、さらには製膜性も良好となる。
Since the composition of the present invention contains a predetermined organosilicon compound, metal alkoxide, and fluorine-containing organosilicon compound, it is possible to achieve both the water repellency, oil repellency and adhesion of the resulting film, and also film forming properties. It becomes good.
本発明の組成物(以下、単に「組成物」という場合がある。)は、少なくとも1つのトリアルキルシリル基含有分子鎖と、少なくとも1つの加水分解性基とがケイ素原子に結合している有機ケイ素化合物(a);金属アルコキシド(b);及び含フッ素基と加水分解性基とがケイ素原子に結合している含フッ素有機ケイ素化合物(f)を含む。金属アルコキシド(b)自体は有機ケイ素化合物や含フッ素有機ケイ素化合物(f)に比べて撥水性及び撥油性への寄与は少ないものの、本発明の組成物から形成される皮膜では、金属アルコキシド(b)に由来する構造がスペーサーとして機能するためか、トリアルキルシリル基含有分子鎖や含フッ素基の撥水性及び撥油性が強調され、さらには得られる皮膜の均質性も向上すると考えられる。
The composition of the present invention (hereinafter sometimes simply referred to as “composition”) is an organic compound in which at least one trialkylsilyl group-containing molecular chain and at least one hydrolyzable group are bonded to a silicon atom. A silicon compound (a); a metal alkoxide (b); and a fluorine-containing organosilicon compound (f) in which a fluorine-containing group and a hydrolyzable group are bonded to a silicon atom. Although the metal alkoxide (b) itself contributes less to water repellency and oil repellency than the organosilicon compound or the fluorine-containing organosilicon compound (f), the metal alkoxide (b) It is considered that the water- and oil-repellent properties of the trialkylsilyl group-containing molecular chain and the fluorine-containing group are emphasized, and the homogeneity of the resulting film is also improved.
前記有機ケイ素化合物(a)は、1分子中に、中心ケイ素原子に結合している少なくとも1つのトリアルキルシリル基含有分子鎖と、中心ケイ素原子に結合している少なくとも1つの加水分解性基とを有する。有機ケイ素化合物(a)としては、1つのトリアルキルシリル基含有分子鎖と、3つの加水分解性基とが中心ケイ素原子に結合している化合物;1つのトリアルキルシリル基含有分子鎖と、1つのシロキサン骨格含有基と、2つの加水分解性基とが中心ケイ素原子に結合している化合物;1つのトリアルキルシリル基含有分子鎖と、1つの炭化水素鎖含有基と、2つの加水分解性基とが中心ケイ素原子に結合している化合物;等を挙げることができる。
The organosilicon compound (a) includes, in one molecule, at least one trialkylsilyl group-containing molecular chain bonded to the central silicon atom, and at least one hydrolyzable group bonded to the central silicon atom. Have As the organosilicon compound (a), a compound in which one trialkylsilyl group-containing molecular chain and three hydrolyzable groups are bonded to the central silicon atom; one trialkylsilyl group-containing molecular chain, and 1 Compound in which one siloxane skeleton-containing group and two hydrolyzable groups are bonded to the central silicon atom; one trialkylsilyl group-containing molecular chain, one hydrocarbon chain-containing group, and two hydrolyzable groups A compound in which the group is bonded to the central silicon atom;
具体的には、有機ケイ素化合物(a)は、下記式(I)で表される化合物であることが好ましい。
Specifically, the organosilicon compound (a) is preferably a compound represented by the following formula (I).
[式(I)中、Raはトリアルキルシリル基含有分子鎖を表し、Aa1は、それぞれ独立に、加水分解性基を表す。Za1は、トリアルキルシリル基含有分子鎖、炭化水素鎖含有基、シロキサン骨格含有基又は加水分解性基を表す。]
[In formula (I), R a represents a trialkylsilyl group-containing molecular chain, and A a1 independently represents a hydrolyzable group. Z a1 represents a trialkylsilyl group-containing molecular chain, a hydrocarbon chain-containing group, a siloxane skeleton-containing group, or a hydrolyzable group. ]
前記トリアルキルシリル基含有分子鎖は、トリアルキルシリル含有基が分子鎖の末端に結合した構造を有する1価の基であり、分子鎖にトリアルキルシリル含有基が結合していることで、本発明の組成物から形成される皮膜の撥水性及び撥油性が向上する。またトリアルキルシリル基含有分子鎖が存在することで、液滴(水滴、油滴等)と該皮膜の間の摩擦が低減され、液滴が移動しやすくなる。さらに、トリアルキルシリル基を有することで、化学的耐久性及び/又は物理的耐久性が高められ、耐熱性、耐光性が向上する。トリアルキルシリル含有基のアルキル基がフルオロアルキル基に置き換わっている場合においても、同様に該皮膜界面(表面)の撥水性及び撥油性を向上することができる。
The trialkylsilyl group-containing molecular chain is a monovalent group having a structure in which the trialkylsilyl-containing group is bonded to the end of the molecular chain, and the trialkylsilyl-containing group is bonded to the molecular chain. The water repellency and oil repellency of the film formed from the composition of the invention are improved. Further, the presence of the trialkylsilyl group-containing molecular chain reduces the friction between the droplet (water droplet, oil droplet, etc.) and the coating, and facilitates the movement of the droplet. Furthermore, by having a trialkylsilyl group, chemical durability and / or physical durability are improved, and heat resistance and light resistance are improved. Even in the case where the alkyl group of the trialkylsilyl-containing group is replaced with a fluoroalkyl group, the water repellency and oil repellency at the film interface (surface) can be similarly improved.
前記トリアルキルシリル含有基は、少なくとも1つのトリアルキルシリル基を含む基であり、好ましくは2つ以上、さらに好ましくは3つのトリアルキルシリル基を含む。トリアルキルシリル含有基は、式(s1)で表される基であることが好ましい。
The trialkylsilyl-containing group is a group containing at least one trialkylsilyl group, preferably two or more, more preferably three trialkylsilyl groups. The trialkylsilyl-containing group is preferably a group represented by the formula (s1).
[式(s1)中、Rs1は炭化水素基又はトリアルキルシリルオキシ基を表し、該炭化水素基又はトリアルキルシリルオキシ基に含まれる水素原子は、フッ素原子に置換されていてもよい。ただし、Rs1が全て炭化水素基である場合、Rs1はアルキル基である。*は結合手を表す。]
[In formula (s1), R s1 represents a hydrocarbon group or a trialkylsilyloxy group, and the hydrogen atom contained in the hydrocarbon group or the trialkylsilyloxy group may be substituted with a fluorine atom. However, when all R s1 is a hydrocarbon group, R s1 is an alkyl group. * Represents a bond. ]
Rs1で表される炭化水素基の炭素数は、1~4であることが好ましく、より好ましくは1~3、さらに好ましくは1~2である。Rs1が全て炭化水素基である場合、3つのRs1の合計の炭素数は、9以下であることが好ましく、より好ましくは6以下、さらに好ましくは4以下である。
Rs1で表される炭化水素基としては、脂肪族炭化水素基が好ましく、アルキル基がより好ましい。該アルキル基としては、メチル基、エチル基、プロピル基、ブチル基等が挙げられる。複数のRs1は、同一でも異なっていてもよく、同一であることが好ましい。3つのRs1のうち少なくとも1つがメチル基であることが好ましく、少なくとも2つがメチル基であることがより好ましく、3つのRs1全てがメチル基であることが特に好ましい。 The hydrocarbon group represented by R s1 preferably has 1 to 4 carbon atoms, more preferably 1 to 3, and still more preferably 1 to 2. When all R s1 are hydrocarbon groups, the total carbon number of the three R s1 is preferably 9 or less, more preferably 6 or less, and even more preferably 4 or less.
The hydrocarbon group represented by R s1 is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. Examples of the alkyl group include a methyl group, an ethyl group, a propyl group, and a butyl group. A plurality of R s1 may be the same or different and are preferably the same. Is preferably at least one of methyl group of the three R s1, more preferably at least two of a methyl group, and particularly preferably all three R s1 is a methyl group.
Rs1で表される炭化水素基としては、脂肪族炭化水素基が好ましく、アルキル基がより好ましい。該アルキル基としては、メチル基、エチル基、プロピル基、ブチル基等が挙げられる。複数のRs1は、同一でも異なっていてもよく、同一であることが好ましい。3つのRs1のうち少なくとも1つがメチル基であることが好ましく、少なくとも2つがメチル基であることがより好ましく、3つのRs1全てがメチル基であることが特に好ましい。 The hydrocarbon group represented by R s1 preferably has 1 to 4 carbon atoms, more preferably 1 to 3, and still more preferably 1 to 2. When all R s1 are hydrocarbon groups, the total carbon number of the three R s1 is preferably 9 or less, more preferably 6 or less, and even more preferably 4 or less.
The hydrocarbon group represented by R s1 is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. Examples of the alkyl group include a methyl group, an ethyl group, a propyl group, and a butyl group. A plurality of R s1 may be the same or different and are preferably the same. Is preferably at least one of methyl group of the three R s1, more preferably at least two of a methyl group, and particularly preferably all three R s1 is a methyl group.
また、Rs1で表されるトリアルキルシリル基及びトリアルキルシリルオキシ基に含まれる水素原子は、フッ素原子に置換されていてもよい。フッ素原子の置換数としては、炭素原子の数をAとしたとき、1以上が好ましく、より好ましくは3以上であり、2×A+1以下が好ましい。また、アルキル基に含まれる水素原子がフッ素原子に置換される場合、置換されるアルキル基の数は、ケイ素原子1つあたり1~3となる範囲で適宜選択できる。
Moreover, the hydrogen atom contained in the trialkylsilyl group and trialkylsilyloxy group represented by R s1 may be substituted with a fluorine atom. The number of fluorine atoms substituted is preferably 1 or more, more preferably 3 or more, and preferably 2 × A + 1 or less, where A is the number of carbon atoms. When the hydrogen atom contained in the alkyl group is substituted with a fluorine atom, the number of substituted alkyl groups can be appropriately selected within a range of 1 to 3 per silicon atom.
Rs1が全て炭化水素基(アルキル基)である基(トリアルキルシリル基)としては、具体的には、下記式で表される基等が挙げられる。式中、*は結合手を表す。
Specific examples of the group (trialkylsilyl group) in which R s1 is a hydrocarbon group (alkyl group) include groups represented by the following formulas. In the formula, * represents a bond.
Rs1の少なくとも1つが、トリアルキルシリルオキシ基であってもよい。前記トリアルキルシリルオキシ基としては、Rs1が全て炭化水素基(アルキル基)である基(トリアルキルシリル基)のケイ素原子に酸素原子が結合している基が挙げられる。
At least one of R s1 may be a trialkylsilyloxy group. Examples of the trialkylsilyloxy group include a group in which an oxygen atom is bonded to a silicon atom of a group (trialkylsilyl group) in which R s1 is a hydrocarbon group (alkyl group).
Rs1の少なくとも1つがトリアルキルシリルオキシ基である基としては、下記式で表される基が挙げられる。
Examples of the group in which at least one of R s1 is a trialkylsilyloxy group include groups represented by the following formulae.
トリアルキルシリル基含有分子鎖において、トリアルキルシリル基は、分子鎖の末端(自由端側)、特に分子鎖の主鎖(最長直鎖)の末端(自由端側)に結合していることが好ましい。
In a trialkylsilyl group-containing molecular chain, the trialkylsilyl group may be bonded to the end (free end side) of the molecular chain, particularly to the end (free end side) of the main chain (longest straight chain) of the molecular chain. preferable.
トリアルキルシリル基が結合している分子鎖は、直鎖状又は分岐鎖状であることが好ましく、直鎖状であることが好ましい。前記分子鎖は、ジアルキルシロキサン鎖を含むことが好ましく、直鎖状ジアルキルシロキサン鎖を含むことが好ましい。また前記分子鎖は、2価の炭化水素基を含んでいてもよい。分子鎖の一部が2価の炭化水素基であっても、残部がジアルキルシロキサン鎖であるため、得られる皮膜の化学的耐久性及び/又は物理的耐久性が良好である。
前記分子鎖は、式(s2)で表される基であることが好ましい。 The molecular chain to which the trialkylsilyl group is bonded is preferably linear or branched, and is preferably linear. The molecular chain preferably includes a dialkylsiloxane chain, and preferably includes a linear dialkylsiloxane chain. The molecular chain may contain a divalent hydrocarbon group. Even if a part of the molecular chain is a divalent hydrocarbon group, since the remainder is a dialkylsiloxane chain, the chemical durability and / or physical durability of the resulting film is good.
The molecular chain is preferably a group represented by the formula (s2).
前記分子鎖は、式(s2)で表される基であることが好ましい。 The molecular chain to which the trialkylsilyl group is bonded is preferably linear or branched, and is preferably linear. The molecular chain preferably includes a dialkylsiloxane chain, and preferably includes a linear dialkylsiloxane chain. The molecular chain may contain a divalent hydrocarbon group. Even if a part of the molecular chain is a divalent hydrocarbon group, since the remainder is a dialkylsiloxane chain, the chemical durability and / or physical durability of the resulting film is good.
The molecular chain is preferably a group represented by the formula (s2).
[式(s2)中、Rs2は炭素数1~4のアルキル基を表す。Zs1は、-O-又は2価の炭化水素基を表し、該2価の炭化水素基に含まれる-CH2-は、-O-に置き換わっていてもよい。Ys1は、単結合又は-Si(Rs2)2-Ls1-を表す。Ls1は、2価の炭化水素基を表し、該2価の炭化水素基に含まれる-CH2-は、-O-に置き換わっていてもよい。左側の*は、中心ケイ素原子との結合手を表し、右側の*はトリアルキルシリル含有基との結合手を表す。]
[In the formula (s2), R s2 represents an alkyl group having 1 to 4 carbon atoms. Z s1 represents —O— or a divalent hydrocarbon group, and —CH 2 — contained in the divalent hydrocarbon group may be replaced by —O—. Y s1 represents a single bond or —Si (R s2 ) 2 —L s1 —. L s1 represents a divalent hydrocarbon group, and —CH 2 — contained in the divalent hydrocarbon group may be replaced by —O—. * On the left side represents a bond with a central silicon atom, and * on the right side represents a bond with a trialkylsilyl-containing group. ]
前記Rs2で表されるアルキル基の炭素数は、1~4であることが好ましく、より好ましくは1~3、さらに好ましくは1~2である。Rs2で表されるアルキル基としては、メチル基、エチル基、プロピル基、ブチル基等が挙げられ、メチル基又はエチル基が好ましく、メチル基が特に好ましい。
The number of carbon atoms of the alkyl group represented by R s2 is preferably 1 to 4, more preferably 1 to 3, and still more preferably 1 to 2. Examples of the alkyl group represented by R s2 include a methyl group, an ethyl group, a propyl group, and a butyl group. A methyl group or an ethyl group is preferable, and a methyl group is particularly preferable.
n1は、1~100であることが好ましく、より好ましくは1~80、さらに好ましくは1~50、特に好ましくは1~30である。
N1 is preferably 1 to 100, more preferably 1 to 80, still more preferably 1 to 50, and particularly preferably 1 to 30.
Zs1又はLs1で表される2価の炭化水素基の炭素数は、1~10であることが好ましく、より好ましくは1~6、さらに好ましくは1~4である。前記2価の炭化水素基は、鎖状であることが好ましく、鎖状である場合、直鎖状、分岐鎖状のいずれであってもよい。
また、前記2価の炭化水素基は、2価の脂肪族炭化水素基であることが好ましく、アルカンジイル基であることが好ましい。2価の炭化水素基としては、メチレン基、エチレン基、プロピレン基、ブチレン基等が挙げられる。 The number of carbon atoms of the divalent hydrocarbon group represented by Z s1 or L s1 is preferably 1 to 10, more preferably 1 to 6, and further preferably 1 to 4. The divalent hydrocarbon group is preferably chain-like, and when it is chain-like, it may be either linear or branched.
The divalent hydrocarbon group is preferably a divalent aliphatic hydrocarbon group, and preferably an alkanediyl group. Examples of the divalent hydrocarbon group include a methylene group, an ethylene group, a propylene group, and a butylene group.
また、前記2価の炭化水素基は、2価の脂肪族炭化水素基であることが好ましく、アルカンジイル基であることが好ましい。2価の炭化水素基としては、メチレン基、エチレン基、プロピレン基、ブチレン基等が挙げられる。 The number of carbon atoms of the divalent hydrocarbon group represented by Z s1 or L s1 is preferably 1 to 10, more preferably 1 to 6, and further preferably 1 to 4. The divalent hydrocarbon group is preferably chain-like, and when it is chain-like, it may be either linear or branched.
The divalent hydrocarbon group is preferably a divalent aliphatic hydrocarbon group, and preferably an alkanediyl group. Examples of the divalent hydrocarbon group include a methylene group, an ethylene group, a propylene group, and a butylene group.
さらに、前記2価の炭化水素基に含まれる一部の-CH2-は-O-に置き換わっていてもよい。この場合連続する2つの-CH2-が同時に-O-に置き換わることはなく、Si原子に隣接する-CH2-が-O-に置き換わることはない。2つ以上の-CH2-が-O-に置き換わっている場合、-O-と-O-の間の炭素原子数は、2~4であることが好ましく、2~3であることがさらに好ましい。2価の炭化水素基の一部が-O-に置き換わった基としては、具体的には、(ポリ)エチレングリコール単位を有する基、(ポリ)プロピレングリコール単位を有する基等を例示することができる。
Furthermore, a part of —CH 2 — contained in the divalent hydrocarbon group may be replaced by —O—. In this case, two consecutive —CH 2 — are not simultaneously replaced with —O—, and —CH 2 — adjacent to the Si atom is not replaced with —O—. When two or more —CH 2 — are replaced by —O—, the number of carbon atoms between —O— and —O— is preferably 2 to 4, and more preferably 2 to 3 preferable. Specific examples of the group in which a part of the divalent hydrocarbon group is replaced by —O— include a group having a (poly) ethylene glycol unit, a group having a (poly) propylene glycol unit, and the like. it can.
前記式(s2)において、Zs1が-O-であり、Ys1が単結合であること、すなわち前記分子鎖は、ジアルキルシリルオキシ基の繰り返しのみからなることが好ましい。ジアルキルシロキサン鎖がジアルキルシリルオキシ基の繰り返しのみからなる場合、得られる皮膜の化学的耐久性及び/又は物理的耐久性が良好である。
In the formula (s2), it is preferable that Z s1 is —O— and Y s1 is a single bond, that is, the molecular chain is composed only of repeating dialkylsilyloxy groups. When the dialkylsiloxane chain consists only of repeating dialkylsilyloxy groups, the resulting film has good chemical durability and / or physical durability.
トリアルキルシリル基含有分子鎖に含まれる分子鎖としては、下記式で表される分子鎖を挙げることができる。式中、p1は1~30の整数を表し、*は、ポリシロキサン骨格を形成するケイ素原子又はトリアルキルシリル基に結合する結合手を表すものとする。
Examples of the molecular chain contained in the trialkylsilyl group-containing molecular chain include a molecular chain represented by the following formula. In the formula, p1 represents an integer of 1 to 30, and * represents a bond bonded to a silicon atom or a trialkylsilyl group forming a polysiloxane skeleton.
また、トリアルキルシリル基含有分子鎖を構成する原子の合計数は、24以上であることが好ましく、より好ましくは40以上、さらに好ましくは50以上であり、1200以下であることが好ましく、より好ましくは700以下、さらに好ましく250以下である。
The total number of atoms constituting the trialkylsilyl group-containing molecular chain is preferably 24 or more, more preferably 40 or more, still more preferably 50 or more, and preferably 1200 or less. Is 700 or less, more preferably 250 or less.
トリアルキルシリル基含有分子鎖は、下記式(s1)で表される基であることが好ましい。
The trialkylsilyl group-containing molecular chain is preferably a group represented by the following formula (s1).
[式(s1)中、Rs1、Rs2、Zs1、Ys1、n1は、上記と同義である。*は、ケイ素原子との結合手を表す。]
[In the formula (s1), R s1 , R s2 , Z s1 , Y s1 , and n1 are as defined above. * Represents a bond with a silicon atom. ]
トリアルキルシリル基含有分子鎖は、下記式(s1-1)で表される基であることがより好ましく、下記式(s1-1-1)で表される基であることがさらに好ましい。
The trialkylsilyl group-containing molecular chain is more preferably a group represented by the following formula (s1-1), and even more preferably a group represented by the following formula (s1-1-1).
また、トリアルキルシリル基含有分子鎖は、下記式(s1-2)で表される基であることも好ましく、下記式(s1-2-1)で表される基であることがさらに好ましい。
In addition, the trialkylsilyl group-containing molecular chain is preferably a group represented by the following formula (s1-2), more preferably a group represented by the following formula (s1-2-1).
[式(s1-2)及び式(s1-2-1)中、Rs2、Rs3、Ys1、Zs1、n1は上記と同義である。*は、ケイ素原子との結合手を表す。]
[In the formulas (s1-2) and (s1-2-1), R s2 , R s3 , Y s1 , Z s1 , and n1 are as defined above. * Represents a bond with a silicon atom. ]
Rs3で表されるアルキル基としては、Rs1で表される炭化水素基として例示したアルキル基と同様の基が挙げられ、該アルキル基の炭素数は1~3であることが好ましく、より好ましくは1~2である。また、*-Si(Rs3)3に含まれるRs3の合計の炭素数は、9以下であることが好ましく、より好ましくは6以下、さらに好ましくは4以下である。
さらに、*-Si(Rs3)3に含まれるRs3のうち、少なくとも1つがメチル基であることが好ましく、2つ以上のRs3がメチル基であることが好ましく、3つのRs3全てがメチル基であることが特に好ましい。 Examples of the alkyl group represented by R s3 include the same groups as the alkyl groups exemplified as the hydrocarbon group represented by R s1 , and the alkyl group preferably has 1 to 3 carbon atoms. Preferably it is 1-2. Further, the total carbon number of R s3 contained in * -Si (R s3 ) 3 is preferably 9 or less, more preferably 6 or less, and still more preferably 4 or less.
Further, among R s3 contained in * -Si (R s3 ) 3 , at least one is preferably a methyl group, two or more R s3 are preferably methyl groups, and all three R s3 are all A methyl group is particularly preferred.
さらに、*-Si(Rs3)3に含まれるRs3のうち、少なくとも1つがメチル基であることが好ましく、2つ以上のRs3がメチル基であることが好ましく、3つのRs3全てがメチル基であることが特に好ましい。 Examples of the alkyl group represented by R s3 include the same groups as the alkyl groups exemplified as the hydrocarbon group represented by R s1 , and the alkyl group preferably has 1 to 3 carbon atoms. Preferably it is 1-2. Further, the total carbon number of R s3 contained in * -Si (R s3 ) 3 is preferably 9 or less, more preferably 6 or less, and still more preferably 4 or less.
Further, among R s3 contained in * -Si (R s3 ) 3 , at least one is preferably a methyl group, two or more R s3 are preferably methyl groups, and all three R s3 are all A methyl group is particularly preferred.
トリアルキルシリル基含有分子鎖としては式(s1-I)で表される基が挙げられる。下記式(s1-I-1)~(s1-I-50)は、式(s1-I)で表される基の具体例であるが、これらに限られるものではない。式(s1-I)で表される基において、これに含まれる複数のRs20及び複数のRs10は、それぞれ同一であってもよいし、異なっていてもよい。
Examples of the trialkylsilyl group-containing molecular chain include a group represented by the formula (s1-I). The following formulas (s1-I-1) to (s1-I-50) are specific examples of the group represented by the formula (s1-I), but are not limited thereto. In the group represented by the formula (s1-I), a plurality of R s20 and a plurality of R s10 contained therein may be the same or different.
有機ケイ素化合物(a)において、中心ケイ素原子に結合するトリアルキルシリル基含有分子鎖の個数は、1~3であることが好ましく、より好ましくは1~2であり、特に好ましくは1である。
In the organosilicon compound (a), the number of trialkylsilyl group-containing molecular chains bonded to the central silicon atom is preferably 1 to 3, more preferably 1 to 2, and particularly preferably 1.
前記加水分解性基は、ケイ素原子に結合している場合、加水分解によりヒドロキシ基(シラノール基)を与える基であればよく、例えば、メトキシ基、エトキシ基、プロポキシ基、ブトキシ基等の炭素数1~4のアルコキシ基;アセトキシ基;塩素原子;イソシアネート基;等を好ましく挙げることができる。中でも、炭素数1~4のアルコキシ基が好ましく、炭素数1~2のアルコキシ基がより好ましい。
有機ケイ素化合物(a)において、中心ケイ素原子に結合する加水分解性基の個数は、1~3であり、2~3であることが好ましい。
以下、加水分解性基がケイ素原子に結合している基を加水分解性ケイ素基という場合がある。 When the hydrolyzable group is bonded to a silicon atom, the hydrolyzable group may be a group that gives a hydroxy group (silanol group) by hydrolysis. For example, the number of carbon atoms such as methoxy group, ethoxy group, propoxy group, butoxy group Preferred examples include 1-4 alkoxy groups; acetoxy groups; chlorine atoms; isocyanate groups; Among these, an alkoxy group having 1 to 4 carbon atoms is preferable, and an alkoxy group having 1 to 2 carbon atoms is more preferable.
In the organosilicon compound (a), the number of hydrolyzable groups bonded to the central silicon atom is 1 to 3, and preferably 2 to 3.
Hereinafter, a group in which a hydrolyzable group is bonded to a silicon atom may be referred to as a hydrolyzable silicon group.
有機ケイ素化合物(a)において、中心ケイ素原子に結合する加水分解性基の個数は、1~3であり、2~3であることが好ましい。
以下、加水分解性基がケイ素原子に結合している基を加水分解性ケイ素基という場合がある。 When the hydrolyzable group is bonded to a silicon atom, the hydrolyzable group may be a group that gives a hydroxy group (silanol group) by hydrolysis. For example, the number of carbon atoms such as methoxy group, ethoxy group, propoxy group, butoxy group Preferred examples include 1-4 alkoxy groups; acetoxy groups; chlorine atoms; isocyanate groups; Among these, an alkoxy group having 1 to 4 carbon atoms is preferable, and an alkoxy group having 1 to 2 carbon atoms is more preferable.
In the organosilicon compound (a), the number of hydrolyzable groups bonded to the central silicon atom is 1 to 3, and preferably 2 to 3.
Hereinafter, a group in which a hydrolyzable group is bonded to a silicon atom may be referred to as a hydrolyzable silicon group.
前記シロキサン骨格含有基は、シロキサン単位(Si-O-)を含有する1価の基であり、トリアルキルシリル基含有分子鎖を構成する原子数よりも少ない数の原子で構成されるものであればよい。これにより、シロキサン骨格含有基は、トリアルキルシリル基含有分子鎖よりも長さが短いか、立体的な広がり(かさ高さ)が小さな基となる。シロキサン骨格含有基には、2価の炭化水素基が含まれていてもよい。
The siloxane skeleton-containing group is a monovalent group containing a siloxane unit (Si—O—), and may be composed of a smaller number of atoms than the number of atoms constituting the trialkylsilyl group-containing molecular chain. That's fine. As a result, the siloxane skeleton-containing group is a group having a shorter length than the trialkylsilyl group-containing molecular chain or a small steric spread (bulk height). The siloxane skeleton-containing group may contain a divalent hydrocarbon group.
シロキサン骨格含有基は、下記式(s2)で表される基であることが好ましい。
The siloxane skeleton-containing group is preferably a group represented by the following formula (s2).
[式(s2)中、Rs2は上記と同義である。Rs5は、炭化水素基又はヒドロキシ基を表し、該炭化水素基に含まれる-CH2-は、-O-に置き換わっていてもよく、該炭化水素基に含まれる水素原子は、フッ素原子に置換されていてもよい。Zs2は、-O-又は2価の炭化水素基を表し、該2価の炭化水素基に含まれる-CH2-は、-O-に置き換わっていてもよい。Ys2は、単結合又は-Si(Rs2)2-Ls2-を表す。Ls2は、2価の炭化水素基を表し、該2価の炭化水素基に含まれる-CH2-は、-O-に置き換わっていてもよい。n2は、0~5の整数を表す。*は、ケイ素原子との結合手を表す。]
[In formula (s2), R s2 has the same meaning as described above. R s5 represents a hydrocarbon group or a hydroxy group, —CH 2 — contained in the hydrocarbon group may be replaced by —O—, and the hydrogen atom contained in the hydrocarbon group is a fluorine atom. May be substituted. Z s2 represents —O— or a divalent hydrocarbon group, and —CH 2 — contained in the divalent hydrocarbon group may be replaced with —O—. Y s2 represents a single bond or —Si (R s2 ) 2 —L s2 —. L s2 represents a divalent hydrocarbon group, and —CH 2 — contained in the divalent hydrocarbon group may be replaced by —O—. n2 represents an integer of 0 to 5. * Represents a bond with a silicon atom. ]
Rs5で表される炭化水素基としては、Rs1で表される炭化水素基と同様の基が挙げられ、脂肪族炭化水素基が好ましく、アルキル基がより好ましい。炭素数は1~4であることが好ましく、より好ましくは1~3、さらに好ましくは1~2である。
Zs2又はLs2で表される2価の炭化水素基としては、Zs1で表される2価の炭化水素基と同様の基が挙げられ、炭素数は、1~10であることが好ましく、より好ましくは1~6、さらに好ましくは1~4である。また、Zs2又はLs2で表される2価の炭化水素基は、2価の脂肪族炭化水素基であることが好ましく、直鎖状又は分岐鎖状のアルカンジイル基であることがさらに好ましい。 Examples of the hydrocarbon group represented by R s5 include the same groups as the hydrocarbon group represented by R s1 , an aliphatic hydrocarbon group is preferable, and an alkyl group is more preferable. The number of carbon atoms is preferably 1 to 4, more preferably 1 to 3, and still more preferably 1 to 2.
Examples of the divalent hydrocarbon group represented by Z s2 or L s2 include the same groups as the divalent hydrocarbon group represented by Z s1 , and the number of carbon atoms is preferably 1 to 10. More preferably, it is 1-6, and more preferably 1-4. The divalent hydrocarbon group represented by Z s2 or L s2 is preferably a divalent aliphatic hydrocarbon group, and more preferably a linear or branched alkanediyl group. .
Zs2又はLs2で表される2価の炭化水素基としては、Zs1で表される2価の炭化水素基と同様の基が挙げられ、炭素数は、1~10であることが好ましく、より好ましくは1~6、さらに好ましくは1~4である。また、Zs2又はLs2で表される2価の炭化水素基は、2価の脂肪族炭化水素基であることが好ましく、直鎖状又は分岐鎖状のアルカンジイル基であることがさらに好ましい。 Examples of the hydrocarbon group represented by R s5 include the same groups as the hydrocarbon group represented by R s1 , an aliphatic hydrocarbon group is preferable, and an alkyl group is more preferable. The number of carbon atoms is preferably 1 to 4, more preferably 1 to 3, and still more preferably 1 to 2.
Examples of the divalent hydrocarbon group represented by Z s2 or L s2 include the same groups as the divalent hydrocarbon group represented by Z s1 , and the number of carbon atoms is preferably 1 to 10. More preferably, it is 1-6, and more preferably 1-4. The divalent hydrocarbon group represented by Z s2 or L s2 is preferably a divalent aliphatic hydrocarbon group, and more preferably a linear or branched alkanediyl group. .
n2は、1~5であることが好ましく、より好ましくは1~3である。
N2 is preferably 1 to 5, and more preferably 1 to 3.
シロキサン骨格含有基としては、具体的には、下記式で表される基が挙げられる。
Specific examples of the siloxane skeleton-containing group include groups represented by the following formulas.
前記炭化水素鎖含有基は、炭化水素鎖を含む1価の基であり、トリアルキルシリル基含有分子鎖の分子鎖を構成する原子数よりも炭化水素鎖部分の炭素数が少ないものであればよい。また、トリアルキルシリル基含有分子鎖の最長直鎖を構成する原子数よりも、炭化水素鎖の最長直鎖の炭素数が少ないものであることが好ましい。
炭化水素鎖含有基は、炭化水素基(炭化水素鎖)のみから構成されていてもよく、この炭化水素鎖に含まれる-CH2-は-O-に置き換わっていてもよく、炭化水素基(炭化水素鎖)のみから構成されていることが好ましい。ただしSi原子に隣接する-CH2-は-O-に置き換わることはなく、また連続する2つの-CH2-が同時に-O-に置き換わることもない。
なお、炭化水素鎖部分の炭素数とは、酸素非置換型の炭化水素鎖含有基では炭化水素基(炭化水素鎖)を構成する炭素原子の数を意味し、酸素置換型の炭化水素鎖含有基では、-O-を-CH2-と読み替えて数えた炭素原子の数を意味するものとする。以下、特に断りがない限り、酸素非置換型の炭化水素鎖含有基(すなわち1価の炭化水素基)を例にとって炭化水素鎖含有基について説明するが、いずれの説明でも、その-CH2-のうち一部を-O-に置き換えることが可能である。 The hydrocarbon chain-containing group is a monovalent group including a hydrocarbon chain and has a hydrocarbon chain portion having a smaller number of carbon atoms than the number of atoms constituting the molecular chain of the trialkylsilyl group-containing molecular chain. Good. Moreover, it is preferable that the number of carbon atoms of the longest straight chain of the hydrocarbon chain is smaller than the number of atoms constituting the longest straight chain of the trialkylsilyl group-containing molecular chain.
The hydrocarbon chain-containing group may be composed only of a hydrocarbon group (hydrocarbon chain), and —CH 2 — contained in the hydrocarbon chain may be replaced by —O—, and the hydrocarbon group ( It is preferably composed of only hydrocarbon chains. However, —CH 2 — adjacent to the Si atom is not replaced with —O—, and two consecutive —CH 2 — are not replaced with —O— at the same time.
In addition, the carbon number of the hydrocarbon chain portion means the number of carbon atoms constituting the hydrocarbon group (hydrocarbon chain) in the oxygen non-substituted hydrocarbon chain-containing group, and includes the oxygen-substituted hydrocarbon chain. In the group, it means the number of carbon atoms counted by replacing —O— with —CH 2 —. Hereinafter, unless otherwise specified, a hydrocarbon chain-containing group will be described by taking an oxygen-nonsubstituted hydrocarbon chain-containing group (that is, a monovalent hydrocarbon group) as an example. In any description, —CH 2 — It is possible to replace some of them with —O—.
炭化水素鎖含有基は、炭化水素基(炭化水素鎖)のみから構成されていてもよく、この炭化水素鎖に含まれる-CH2-は-O-に置き換わっていてもよく、炭化水素基(炭化水素鎖)のみから構成されていることが好ましい。ただしSi原子に隣接する-CH2-は-O-に置き換わることはなく、また連続する2つの-CH2-が同時に-O-に置き換わることもない。
なお、炭化水素鎖部分の炭素数とは、酸素非置換型の炭化水素鎖含有基では炭化水素基(炭化水素鎖)を構成する炭素原子の数を意味し、酸素置換型の炭化水素鎖含有基では、-O-を-CH2-と読み替えて数えた炭素原子の数を意味するものとする。以下、特に断りがない限り、酸素非置換型の炭化水素鎖含有基(すなわち1価の炭化水素基)を例にとって炭化水素鎖含有基について説明するが、いずれの説明でも、その-CH2-のうち一部を-O-に置き換えることが可能である。 The hydrocarbon chain-containing group is a monovalent group including a hydrocarbon chain and has a hydrocarbon chain portion having a smaller number of carbon atoms than the number of atoms constituting the molecular chain of the trialkylsilyl group-containing molecular chain. Good. Moreover, it is preferable that the number of carbon atoms of the longest straight chain of the hydrocarbon chain is smaller than the number of atoms constituting the longest straight chain of the trialkylsilyl group-containing molecular chain.
The hydrocarbon chain-containing group may be composed only of a hydrocarbon group (hydrocarbon chain), and —CH 2 — contained in the hydrocarbon chain may be replaced by —O—, and the hydrocarbon group ( It is preferably composed of only hydrocarbon chains. However, —CH 2 — adjacent to the Si atom is not replaced with —O—, and two consecutive —CH 2 — are not replaced with —O— at the same time.
In addition, the carbon number of the hydrocarbon chain portion means the number of carbon atoms constituting the hydrocarbon group (hydrocarbon chain) in the oxygen non-substituted hydrocarbon chain-containing group, and includes the oxygen-substituted hydrocarbon chain. In the group, it means the number of carbon atoms counted by replacing —O— with —CH 2 —. Hereinafter, unless otherwise specified, a hydrocarbon chain-containing group will be described by taking an oxygen-nonsubstituted hydrocarbon chain-containing group (that is, a monovalent hydrocarbon group) as an example. In any description, —CH 2 — It is possible to replace some of them with —O—.
前記炭化水素鎖含有基の炭素数は1~3であることが好ましく、より好ましくは1である。また、前記炭化水素鎖含有基(炭化水素基の場合)は、分岐鎖状であっても直鎖状であってもよい。前記炭化水素鎖含有基(炭化水素基の場合)は、飽和又は不飽和の脂肪族炭化水素鎖含有基であることが好ましく、飽和脂肪族炭化水素鎖含有基であることがより好ましい。前記飽和脂肪族炭化水素鎖含有基としては、メチル基、エチル基、プロピル基等のアルキル基が好ましい。
The number of carbon atoms of the hydrocarbon chain-containing group is preferably 1 to 3, more preferably 1. The hydrocarbon chain-containing group (in the case of a hydrocarbon group) may be branched or linear. The hydrocarbon chain-containing group (in the case of a hydrocarbon group) is preferably a saturated or unsaturated aliphatic hydrocarbon chain-containing group, and more preferably a saturated aliphatic hydrocarbon chain-containing group. The saturated aliphatic hydrocarbon chain-containing group is preferably an alkyl group such as a methyl group, an ethyl group, or a propyl group.
炭化水素鎖に含まれる-CH2-が-O-に置き換わる場合、(ポリ)エチレングリコール単位を有する基等を例示することができる。
When —CH 2 — contained in the hydrocarbon chain is replaced by —O—, a group having a (poly) ethylene glycol unit can be exemplified.
中でも、有機ケイ素化合物(a)は、下記式(I-1)で表される化合物であることが好ましく、式(I-1-1)で表される化合物であることがより好ましい。
Among these, the organosilicon compound (a) is preferably a compound represented by the following formula (I-1), and more preferably a compound represented by the formula (I-1-1).
[式(I-1)及び(I-1-1)中、Aa1、Za1、Zs1、Ys1、Rs2、Rs3、n1は、それぞれ上記と同義である。]
[In the formulas (I-1) and (I-1-1), A a1 , Z a1 , Z s1 , Y s1 , R s2 , R s3 , n1 are as defined above. ]
また有機ケイ素化合物(a)は、式(I-2)で表される化合物であってもよく、好ましくは式(I-2-1)で表される化合物であってもよい。
The organosilicon compound (a) may be a compound represented by the formula (I-2), preferably a compound represented by the formula (I-2-1).
[式(I-2)及び式(I-2-1)中、Aa1、Za1、Zs1、Ys1、Rs2、Rs3、n2は、それぞれ上記と同義である。]
[In the formulas (I-2) and (I-2-1), A a1 , Z a1 , Z s1 , Y s1 , R s2 , R s3 , and n2 are as defined above. ]
有機ケイ素化合物(a)としては、具体的には、式(I-I)で表される基が挙げられる。下記式(I-I-1)~(I-I-100)は、式(I-I)で表される基の具体例であるが、これらに限られるものではない。式(s1-I)で表される基において、これに含まれる複数のAa10、複数のRs20及び複数のRs10は、それぞれ同一であってもよいし、異なっていてもよい。
Specific examples of the organosilicon compound (a) include groups represented by the formula (II). The following formulas (II-1) to (II-100) are specific examples of the group represented by the formula (II), but are not limited thereto. In the group represented by the formula (s1-I), a plurality of A a10 , a plurality of R s20, and a plurality of R s10 contained therein may be the same or different.
有機ケイ素化合物(a)の合成方法の例としては、次のような方法があげられる。第一の方法としては、トリアルキルシリル基含有分子鎖とハロゲン原子(好ましくは塩素原子)とが結合した化合物と、ケイ素原子に加水分解性基が3つ以上(特に4つ)結合した化合物とを反応させることにより、製造することができる。
第二の合成方法としては、ジアルキルシロキサン鎖の両末端にハロゲン原子が結合した化合物(以下、「ジハロゲン化ジアルキルシロキサン」)と、トリス(トリアルキルシリルオキシ)シリル基と、M1O-基(M1は、アルカリ金属を表す。)が結合した化合物(以下、「アルカリ金属シリルオキシド」)及びケイ素原子に加水分解性基が4つ結合した化合物を反応させることにより製造することができる。これらの化合物の反応順序は限定されないが、まずジハロゲン化ジアルキルシロキサンとアルカリ金属シリルオキシドを反応させ、次いで、ケイ素原子に加水分解性基が4つ結合した化合物を反応させることが好ましい。
前記ハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子等が挙げられ、塩素原子が好ましい。また、前記アルカリ金属としては、リチウムが好ましい。
アルカリ金属シリルオキシドは、例えば、トリス(トリアルキルシリルオキシ)シリル基とヒドロキシ基が結合した化合物に、アルキルアルカリ金属を反応させることにより製造することができる。有機アルカリ金属化合物としては、n-ブチルリチウム、sec-ブチルリチウム、tert-ブチルリチウム等のアルキルリチウムが挙げられ、特に好ましくはn-ブチルリチウムである。 Examples of the method for synthesizing the organosilicon compound (a) include the following methods. As a first method, a compound in which a trialkylsilyl group-containing molecular chain and a halogen atom (preferably a chlorine atom) are bonded, and a compound in which three or more (especially four) hydrolyzable groups are bonded to a silicon atom, It can manufacture by making this react.
As a second synthesis method, a compound in which halogen atoms are bonded to both ends of a dialkylsiloxane chain (hereinafter, “dihalogenated dialkylsiloxane”), a tris (trialkylsilyloxy) silyl group, an M 1 O— group ( M 1 represents an alkali metal) and can be produced by reacting a compound (hereinafter referred to as “alkali metal silyl oxide”) and a compound having four hydrolyzable groups bonded to a silicon atom. Although the reaction order of these compounds is not limited, it is preferable to first react a dihalogenated dialkylsiloxane and an alkali metal silyl oxide, and then react a compound having four hydrolyzable groups bonded to a silicon atom.
As said halogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc. are mentioned, A chlorine atom is preferable. The alkali metal is preferably lithium.
The alkali metal silyl oxide can be produced, for example, by reacting an alkyl alkali metal with a compound in which a tris (trialkylsilyloxy) silyl group and a hydroxy group are bonded. Examples of the organic alkali metal compound include alkyllithiums such as n-butyllithium, sec-butyllithium and tert-butyllithium, with n-butyllithium being particularly preferred.
第二の合成方法としては、ジアルキルシロキサン鎖の両末端にハロゲン原子が結合した化合物(以下、「ジハロゲン化ジアルキルシロキサン」)と、トリス(トリアルキルシリルオキシ)シリル基と、M1O-基(M1は、アルカリ金属を表す。)が結合した化合物(以下、「アルカリ金属シリルオキシド」)及びケイ素原子に加水分解性基が4つ結合した化合物を反応させることにより製造することができる。これらの化合物の反応順序は限定されないが、まずジハロゲン化ジアルキルシロキサンとアルカリ金属シリルオキシドを反応させ、次いで、ケイ素原子に加水分解性基が4つ結合した化合物を反応させることが好ましい。
前記ハロゲン原子としては、フッ素原子、塩素原子、臭素原子、ヨウ素原子等が挙げられ、塩素原子が好ましい。また、前記アルカリ金属としては、リチウムが好ましい。
アルカリ金属シリルオキシドは、例えば、トリス(トリアルキルシリルオキシ)シリル基とヒドロキシ基が結合した化合物に、アルキルアルカリ金属を反応させることにより製造することができる。有機アルカリ金属化合物としては、n-ブチルリチウム、sec-ブチルリチウム、tert-ブチルリチウム等のアルキルリチウムが挙げられ、特に好ましくはn-ブチルリチウムである。 Examples of the method for synthesizing the organosilicon compound (a) include the following methods. As a first method, a compound in which a trialkylsilyl group-containing molecular chain and a halogen atom (preferably a chlorine atom) are bonded, and a compound in which three or more (especially four) hydrolyzable groups are bonded to a silicon atom, It can manufacture by making this react.
As a second synthesis method, a compound in which halogen atoms are bonded to both ends of a dialkylsiloxane chain (hereinafter, “dihalogenated dialkylsiloxane”), a tris (trialkylsilyloxy) silyl group, an M 1 O— group ( M 1 represents an alkali metal) and can be produced by reacting a compound (hereinafter referred to as “alkali metal silyl oxide”) and a compound having four hydrolyzable groups bonded to a silicon atom. Although the reaction order of these compounds is not limited, it is preferable to first react a dihalogenated dialkylsiloxane and an alkali metal silyl oxide, and then react a compound having four hydrolyzable groups bonded to a silicon atom.
As said halogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, etc. are mentioned, A chlorine atom is preferable. The alkali metal is preferably lithium.
The alkali metal silyl oxide can be produced, for example, by reacting an alkyl alkali metal with a compound in which a tris (trialkylsilyloxy) silyl group and a hydroxy group are bonded. Examples of the organic alkali metal compound include alkyllithiums such as n-butyllithium, sec-butyllithium and tert-butyllithium, with n-butyllithium being particularly preferred.
また第三の合成方法としては、有機ケイ素化合物(a)は、例えば、アルカリ金属シリルオキシド及び環状ジメチルシロキサンを反応させ、次いで、ケイ素原子に加水分解性基が3つとハロゲン原子(特に、塩素原子)が1つ結合している化合物を反応させることにより製造することもできる。
As a third synthesis method, for example, the organosilicon compound (a) is prepared by reacting, for example, alkali metal silyloxide and cyclic dimethylsiloxane, and then the silicon atom has three hydrolyzable groups and a halogen atom (particularly a chlorine atom). It can also be produced by reacting a compound in which one) is bonded.
また、第四の合成法としては、有機ケイ素化合物(a)は、例えば、アルカリ金属シリルオキシド及び環状ジメチルシロキサンを反応させ、末端に水酸基を有するジメチルシロキサンを得、次いで、テトラアルコキシシランを反応させることにより、製造することもできる。
As a fourth synthesis method, for example, the organosilicon compound (a) is reacted with alkali metal silyl oxide and cyclic dimethylsiloxane to obtain dimethylsiloxane having a hydroxyl group at the terminal, and then reacted with tetraalkoxysilane. It can also be manufactured.
有機ケイ素化合物(a)の含有率は、組成物100質量%中、0.01質量%以上であることが好ましく、より好ましくは0.05質量%以上、さらに好ましくは0.1質量%以上であり、10質量%以下であることが好ましく、より好ましくは5質量%以下、さらに好ましくは3質量%以下である。
The content of the organosilicon compound (a) is preferably 0.01% by mass or more, more preferably 0.05% by mass or more, and further preferably 0.1% by mass or more in 100% by mass of the composition. Yes, it is preferably 10% by mass or less, more preferably 5% by mass or less, and further preferably 3% by mass or less.
前記金属アルコキシド(b)は、アルコキシ基が金属原子に結合している化合物であり、本発明の組成物から形成される皮膜において、スペーサー機能を有する部位が形成されうる。その結果、トリアルキルシリル基含有分子鎖や含フッ素基による撥水性及び撥油性向上作用を高めることができ、さらには製膜性も良好となる。
The metal alkoxide (b) is a compound in which an alkoxy group is bonded to a metal atom, and a site having a spacer function can be formed in a film formed from the composition of the present invention. As a result, the water repellency and oil repellency improving action by the trialkylsilyl group-containing molecular chain and fluorine-containing group can be enhanced, and the film-forming property is also improved.
前記金属アルコキシド(b)は、具体的には、式(II)で表される化合物であることが好ましい。また、式(II)で表される化合物は、その加水分解縮合物であってもよい。ここで、加水分解縮合物は、各化合物(II)に含まれる全部又は一部のアルコキシ基が、加水分解により縮合した化合物を意味する。
Specifically, the metal alkoxide (b) is preferably a compound represented by the formula (II). The compound represented by the formula (II) may be a hydrolysis condensate thereof. Here, the hydrolysis-condensation product means a compound in which all or a part of alkoxy groups contained in each compound (II) are condensed by hydrolysis.
[式(II)中、Mは金属アルコキシドを形成しうる3価又は4価の金属原子を表す。Ab1は、それぞれ独立に、炭素数1~4のアルコキシ基を表す。kは、Mの価数に応じて、3又は4の整数を表す。]
[In formula (II), M represents a trivalent or tetravalent metal atom capable of forming a metal alkoxide. A b1 independently represents an alkoxy group having 1 to 4 carbon atoms. k represents an integer of 3 or 4 depending on the valence of M. ]
Mは、アルコキシ基と結合して金属アルコキシドを形成しうる金属原子であり、該金属原子には、Si、Ge等の半金属も含まれる。Mとしては、Al、Fe、In等の3価金属;Hf、Si、Ti、Sn、Zr等の4価金属;等が挙げられ、好ましくはAl等の3価金属;Si、Ti、Sn、Zr等の4価金属;であり、さらに好ましくはAl、Si、Ti、Zrであり、特に好ましくはSiである。これら金属のアルコキシドは、液状化が容易である。また、Mが3価金属の場合、kは3を表し、Mが4価金属の場合、kは4を表す。
M is a metal atom that can be bonded to an alkoxy group to form a metal alkoxide, and the metal atom includes a semimetal such as Si or Ge. Examples of M include trivalent metals such as Al, Fe and In; tetravalent metals such as Hf, Si, Ti, Sn and Zr; and preferably trivalent metals such as Al; Si, Ti, Sn, Tetravalent metals such as Zr; more preferably Al, Si, Ti, Zr, and particularly preferably Si. These metal alkoxides can be easily liquefied. Further, when M is a trivalent metal, k represents 3, and when M is a tetravalent metal, k represents 4.
Ab1で表されるアルコキシ基としては、炭素数1~2のアルコキシ基がより好ましい。
また、有機ケイ素化合物(a)の加水分解性基と金属アルコキシド(b)のアルコキシ基は、同一でも異なっていてもよいが、同一であることが好ましく、いずれも炭素数1~4のアルコキシ基であることが好ましい。 The alkoxy group represented by A b1 is more preferably an alkoxy group having 1 to 2 carbon atoms.
Further, the hydrolyzable group of the organosilicon compound (a) and the alkoxy group of the metal alkoxide (b) may be the same or different, but are preferably the same, both of which are alkoxy groups having 1 to 4 carbon atoms. It is preferable that
また、有機ケイ素化合物(a)の加水分解性基と金属アルコキシド(b)のアルコキシ基は、同一でも異なっていてもよいが、同一であることが好ましく、いずれも炭素数1~4のアルコキシ基であることが好ましい。 The alkoxy group represented by A b1 is more preferably an alkoxy group having 1 to 2 carbon atoms.
Further, the hydrolyzable group of the organosilicon compound (a) and the alkoxy group of the metal alkoxide (b) may be the same or different, but are preferably the same, both of which are alkoxy groups having 1 to 4 carbon atoms. It is preferable that
金属アルコキシド(b)としては、テトラメトキシシラン、テトラエトキシシラン、テトラプロポキシシラン、テトラブトキシシラン等のテトラアルコキシシラン;トリエトキシアルミニウム、トリプロポキシアルミニウム、トリブトキシアルミニウム等のトリアルコキシアルミニウム;トリエトキシ鉄等のトリアルコキシ鉄;トリメトキシインジウム、トリエトキシインジウム、トリプロポキシインジウム、トリブトキシインジウム等のトリアルコキシインジウム;テトラメトキシハフニウム、テトラエトキシハフニウム、テトラプロポキシハフニウム、テトラブトキシハフニウム等のテトラアルコキシハフニウム;テトラメトキシチタン、テトラエトキシチタン、テトラプロポキシチタン、テトラブトキシチタン等のテトラアルコキシチタン;テトラメトキシスズ、テトラエトキシスズ、テトラプロポキシスズ、テトラブトキシスズ等のテトラアルコキシスズ;テトラメトキシジルコニウム、テトラエトキシジルコニウム、テトラプロポキシジルコニウム、テトラブトキシジルコニウム等のテトラアルコキシジルコニウム;等が挙げられる。
Examples of the metal alkoxide (b) include tetraalkoxysilanes such as tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, and tetrabutoxysilane; trialkoxyaluminums such as triethoxyaluminum, tripropoxyaluminum, and tributoxyaluminum; Trialkoxy iron; trialkoxy indium such as trimethoxy indium, triethoxy indium, tripropoxy indium, tributoxy indium; tetraalkoxy hafnium such as tetramethoxy hafnium, tetraethoxy hafnium, tetrapropoxy hafnium, tetrabutoxy hafnium; tetramethoxy titanium, Tetraalkoxy such as tetraethoxytitanium, tetrapropoxytitanium, tetrabutoxytitanium, etc. Tan; tetramethoxy tin, tetraethoxy tin, tetra propoxy tin, tetraalkoxy tin, such as tetrabutoxy tin; tetramethoxy zirconium, tetraethoxy zirconium, tetra propoxy zirconium, tetra-alkoxy zirconium, such as tetrabutoxyzirconium; and the like.
金属アルコキシド(b)の含有率は、組成物100質量%中、0.01質量%以上であることが好ましく、より好ましくは0.5質量%以上、さらに好ましくは1.0質量%以上であり、20質量%以下であることが好ましく、より好ましくは10質量%以下、さらに好ましくは5質量%以下である。
本発明の組成物において、金属アルコキシド(b)と有機ケイ素化合物(a)の比(金属アルコキシド(b)/有機ケイ素化合物(a))は、モル基準で1/10以上であることが好ましく、より好ましくは1/1以上、さらに好ましくは2/1以上であり、100/1以下であることが好ましく、より好ましくは50/1以下、さらに好ましくは30/1以下、よりいっそう好ましくは25/1以下である。 The content of the metal alkoxide (b) is preferably 0.01% by mass or more, more preferably 0.5% by mass or more, and further preferably 1.0% by mass or more in 100% by mass of the composition. The content is preferably 20% by mass or less, more preferably 10% by mass or less, and still more preferably 5% by mass or less.
In the composition of the present invention, the ratio of metal alkoxide (b) to organosilicon compound (a) (metal alkoxide (b) / organosilicon compound (a)) is preferably 1/10 or more on a molar basis, More preferably 1/1 or more, still more preferably 2/1 or more, and preferably 100/1 or less, more preferably 50/1 or less, still more preferably 30/1 or less, and even more preferably 25 / 1 or less.
本発明の組成物において、金属アルコキシド(b)と有機ケイ素化合物(a)の比(金属アルコキシド(b)/有機ケイ素化合物(a))は、モル基準で1/10以上であることが好ましく、より好ましくは1/1以上、さらに好ましくは2/1以上であり、100/1以下であることが好ましく、より好ましくは50/1以下、さらに好ましくは30/1以下、よりいっそう好ましくは25/1以下である。 The content of the metal alkoxide (b) is preferably 0.01% by mass or more, more preferably 0.5% by mass or more, and further preferably 1.0% by mass or more in 100% by mass of the composition. The content is preferably 20% by mass or less, more preferably 10% by mass or less, and still more preferably 5% by mass or less.
In the composition of the present invention, the ratio of metal alkoxide (b) to organosilicon compound (a) (metal alkoxide (b) / organosilicon compound (a)) is preferably 1/10 or more on a molar basis, More preferably 1/1 or more, still more preferably 2/1 or more, and preferably 100/1 or less, more preferably 50/1 or less, still more preferably 30/1 or less, and even more preferably 25 / 1 or less.
前記含フッ素有機ケイ素化合物(f)は、1分子中に、中心ケイ素原子に結合している少なくとも1つの含フッ素基と、中心ケイ素原子に結合している少なくとも1つの加水分解性基とを有する。組成物に含フッ素有機ケイ素化合物が含まれることで、得られる皮膜の撥水性及び撥油性が高められやすくなる。
前記含フッ素基は、炭素原子とフッ素原子とが結合している構造を含む基であり、置換基を有していてもよいフッ化炭化水素基であってもよく、フッ化炭化水素基が結合しているケイ素原子と-O-とが交互に配置された基(加水分解性シランオリゴマー残基という場合がある。)であってもよい。 The fluorine-containing organosilicon compound (f) has at least one fluorine-containing group bonded to the central silicon atom and at least one hydrolyzable group bonded to the central silicon atom in one molecule. . By including the fluorine-containing organosilicon compound in the composition, the water repellency and oil repellency of the resulting film are easily improved.
The fluorine-containing group is a group including a structure in which a carbon atom and a fluorine atom are bonded, and may be a fluorinated hydrocarbon group which may have a substituent. It may be a group in which bonded silicon atoms and —O— are alternately arranged (sometimes referred to as a hydrolyzable silane oligomer residue).
前記含フッ素基は、炭素原子とフッ素原子とが結合している構造を含む基であり、置換基を有していてもよいフッ化炭化水素基であってもよく、フッ化炭化水素基が結合しているケイ素原子と-O-とが交互に配置された基(加水分解性シランオリゴマー残基という場合がある。)であってもよい。 The fluorine-containing organosilicon compound (f) has at least one fluorine-containing group bonded to the central silicon atom and at least one hydrolyzable group bonded to the central silicon atom in one molecule. . By including the fluorine-containing organosilicon compound in the composition, the water repellency and oil repellency of the resulting film are easily improved.
The fluorine-containing group is a group including a structure in which a carbon atom and a fluorine atom are bonded, and may be a fluorinated hydrocarbon group which may have a substituent. It may be a group in which bonded silicon atoms and —O— are alternately arranged (sometimes referred to as a hydrolyzable silane oligomer residue).
前記含フッ素有機ケイ素化合物(f)は、具体的には、下記式(III-1)又は(III-2)のいずれかで表される化合物であることが好ましい。また、式(III-1)又は(III-2)で表される化合物は、それぞれ、その加水分解縮合物(化合物に含まれる加水分解性基が、加水分解により縮合した基)であってもよい。
Specifically, the fluorine-containing organosilicon compound (f) is preferably a compound represented by either the following formula (III-1) or (III-2). In addition, each of the compounds represented by the formula (III-1) or (III-2) may be a hydrolysis condensate (a group in which a hydrolyzable group contained in the compound is condensed by hydrolysis). Good.
[式(III-1)中、Rf1は、炭素数1~8のフッ化炭素含有基を表す。Af1は、それぞれ独立に、加水分解性基を表す。Zf1は、シロキサン骨格含有基、炭化水素鎖含有基又は加水分解性基を表す。]
[In the formula (III-1), R f1 represents a fluorocarbon-containing group having 1 to 8 carbon atoms. A f1 independently represents a hydrolyzable group. Z f1 represents a siloxane skeleton-containing group, a hydrocarbon chain-containing group, or a hydrolyzable group. ]
[上記式(III-2)中、Rf2は、加水分解性シランオリゴマー残基を表す。Af2は、それぞれ独立に、加水分解性基、炭素数1~12の含フッ素アルキル基又は炭素数1~4のアルキル基を表す。]
[In the above formula (III-2), R f2 represents a hydrolyzable silane oligomer residue. A f2 independently represents a hydrolyzable group, a fluorine-containing alkyl group having 1 to 12 carbon atoms, or an alkyl group having 1 to 4 carbon atoms. ]
Af1、Af2及びZf1で表される加水分解性基としては、有機ケイ素化合物(a)の加水分解性基と同様の基が挙げられ、アルコキシ基又はイソシアネート基が好ましく、炭素数1~4のアルコキシ基がより好ましく、炭素数1~2のアルコキシ基がさらに好ましい。
また、含フッ素有機ケイ素化合物(f)と有機ケイ素化合物(a)の加水分解性基は、同一でも異なっていてもよく、同一であることが好ましく、いずれも炭素数1~4のアルコキシ基であることが好ましい。 Examples of the hydrolyzable group represented by A f1 , A f2 and Z f1 include the same groups as the hydrolyzable groups of the organosilicon compound (a), preferably an alkoxy group or an isocyanate group, An alkoxy group having 4 carbon atoms is more preferable, and an alkoxy group having 1 to 2 carbon atoms is more preferable.
Further, the hydrolyzable groups of the fluorine-containing organosilicon compound (f) and the organosilicon compound (a) may be the same or different and are preferably the same, both of which are alkoxy groups having 1 to 4 carbon atoms. Preferably there is.
また、含フッ素有機ケイ素化合物(f)と有機ケイ素化合物(a)の加水分解性基は、同一でも異なっていてもよく、同一であることが好ましく、いずれも炭素数1~4のアルコキシ基であることが好ましい。 Examples of the hydrolyzable group represented by A f1 , A f2 and Z f1 include the same groups as the hydrolyzable groups of the organosilicon compound (a), preferably an alkoxy group or an isocyanate group, An alkoxy group having 4 carbon atoms is more preferable, and an alkoxy group having 1 to 2 carbon atoms is more preferable.
Further, the hydrolyzable groups of the fluorine-containing organosilicon compound (f) and the organosilicon compound (a) may be the same or different and are preferably the same, both of which are alkoxy groups having 1 to 4 carbon atoms. Preferably there is.
Zf1で表されるシロキサン骨格含有基、炭化水素鎖含有基及びRf1で表されるフッ化炭素含有基の原子数は、有機化合物(a)における分子鎖(好ましくはトリアルキルシリル基と加水分解性ケイ素基をつなぐ鎖状或いは環状の炭化水素及び/又は鎖状或いは環状のジアルキルシロキサン)の原子数よりも少ないことが好ましい。また、Zf1におけるシロキサン骨格含有基、炭化水素鎖含有基又はRf1で表されるフッ化炭素含有基に含まれる最長直鎖の炭素数は、トリアルキルシリル基含有分子鎖の原子数よりも少ないものであることが好ましい。これにより、本発明の組成物から形成される皮膜において、金属アルコキシド(b)に由来する構造がスペーサーとして作用することが可能となる。
Zf1で表されるシロキサン骨格含有基、炭化水素鎖含有基としては、Za2で表されるシロキサン骨格含有基、炭化水素鎖含有基とそれぞれ同様の基が挙げられる。 The number of atoms of the siloxane skeleton-containing group represented by Z f1 , the hydrocarbon chain-containing group, and the fluorocarbon-containing group represented by R f1 is the molecular chain (preferably trialkylsilyl group and hydrolysate in the organic compound (a)). The number of atoms is preferably smaller than the number of atoms of the chain or cyclic hydrocarbon and / or the chain or cyclic dialkylsiloxane connecting the decomposable silicon group. In addition, the longest straight chain carbon number contained in the siloxane skeleton-containing group, hydrocarbon chain-containing group or R f1 represented by R f1 in Z f1 is greater than the number of atoms in the trialkylsilyl group-containing molecular chain. It is preferable that the amount is small. Thereby, in the film formed from the composition of the present invention, the structure derived from the metal alkoxide (b) can act as a spacer.
Siloxane skeleton-containing group represented by Z f1, the hydrocarbon chain-containing group, a siloxane skeleton-containing group represented by Z a2, include hydrocarbon chains containing groups and each similar group.
Zf1で表されるシロキサン骨格含有基、炭化水素鎖含有基としては、Za2で表されるシロキサン骨格含有基、炭化水素鎖含有基とそれぞれ同様の基が挙げられる。 The number of atoms of the siloxane skeleton-containing group represented by Z f1 , the hydrocarbon chain-containing group, and the fluorocarbon-containing group represented by R f1 is the molecular chain (preferably trialkylsilyl group and hydrolysate in the organic compound (a)). The number of atoms is preferably smaller than the number of atoms of the chain or cyclic hydrocarbon and / or the chain or cyclic dialkylsiloxane connecting the decomposable silicon group. In addition, the longest straight chain carbon number contained in the siloxane skeleton-containing group, hydrocarbon chain-containing group or R f1 represented by R f1 in Z f1 is greater than the number of atoms in the trialkylsilyl group-containing molecular chain. It is preferable that the amount is small. Thereby, in the film formed from the composition of the present invention, the structure derived from the metal alkoxide (b) can act as a spacer.
Siloxane skeleton-containing group represented by Z f1, the hydrocarbon chain-containing group, a siloxane skeleton-containing group represented by Z a2, include hydrocarbon chains containing groups and each similar group.
Rf1で表されるフッ化炭素含有基は、フッ素原子が炭素原子に結合した構造を含む1価の基であり、フルオロアルキル基を末端に有する基が好ましく、フルオロアルキル基(好ましくはトリフルオロメチル基)を末端に有する基が好ましい。フッ化炭素含有基としては、式(f1)で表される基が好ましい。
The fluorocarbon-containing group represented by R f1 is a monovalent group including a structure in which a fluorine atom is bonded to a carbon atom, and is preferably a group having a fluoroalkyl group at the end, and a fluoroalkyl group (preferably trifluoro). A group having a methyl group) at the terminal is preferable. As the fluorocarbon-containing group, a group represented by the formula (f1) is preferable.
[上記式(f1)中、
Rf3は、炭素数1~20の含フッ素アルキル基を表す。Rf4は、フッ素原子又は炭素数1~20のフルオロアルキル基を表す。Rb4は、水素原子又は炭素数1~4のアルキル基を表す。Lは、-O-、-COO-、-OCO-、-NRf5-、-NRf5CO-、及び-CONRf5-のいずれかを表す。Rf5は、水素原子又は炭素数1~4のアルキル基又は炭素数1~4の含フッ素アルキル基を表す。h1~h5は0以上100以下の整数であり、h1~h5の合計値は100以下である。また、h1~h5を付して括弧でくくられた各繰り返し単位の順序は式中において任意である。*は結合手を表す。] [In the above formula (f1),
R f3 represents a fluorine-containing alkyl group having 1 to 20 carbon atoms. R f4 represents a fluorine atom or a fluoroalkyl group having 1 to 20 carbon atoms. R b4 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. L represents any of —O—, —COO—, —OCO—, —NR f5 —, —NR f5 CO—, and —CONR f5 —. R f5 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or a fluorine-containing alkyl group having 1 to 4 carbon atoms. h1 to h5 are integers of 0 to 100, and the total value of h1 to h5 is 100 or less. Further, the order of each repeating unit attached with h1 to h5 and enclosed in parentheses is arbitrary in the formula. * Represents a bond. ]
Rf3は、炭素数1~20の含フッ素アルキル基を表す。Rf4は、フッ素原子又は炭素数1~20のフルオロアルキル基を表す。Rb4は、水素原子又は炭素数1~4のアルキル基を表す。Lは、-O-、-COO-、-OCO-、-NRf5-、-NRf5CO-、及び-CONRf5-のいずれかを表す。Rf5は、水素原子又は炭素数1~4のアルキル基又は炭素数1~4の含フッ素アルキル基を表す。h1~h5は0以上100以下の整数であり、h1~h5の合計値は100以下である。また、h1~h5を付して括弧でくくられた各繰り返し単位の順序は式中において任意である。*は結合手を表す。] [In the above formula (f1),
R f3 represents a fluorine-containing alkyl group having 1 to 20 carbon atoms. R f4 represents a fluorine atom or a fluoroalkyl group having 1 to 20 carbon atoms. R b4 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms. L represents any of —O—, —COO—, —OCO—, —NR f5 —, —NR f5 CO—, and —CONR f5 —. R f5 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, or a fluorine-containing alkyl group having 1 to 4 carbon atoms. h1 to h5 are integers of 0 to 100, and the total value of h1 to h5 is 100 or less. Further, the order of each repeating unit attached with h1 to h5 and enclosed in parentheses is arbitrary in the formula. * Represents a bond. ]
Rf3又はRf4で表される含フッ素アルキル基の炭素数は、1~20であり、1~12であることが好ましく、1~10であることがより好ましく、1~5であることがさらに好ましい。また、Rf3又はRf4で表される含フッ素アルキル基におけるフッ素原子の置換数は、該含フッ素アルキル基に含まれる炭素原子の数をAとしたとき、1以上、2A+1以下であり、2A+1であること、すなわち該含フッ素アルキル基はペルフルオロアルキル基であることが好ましい。
Rb4で表されるアルキル基としては、Rs1で表される炭化水素基として例示したアルキル基と同様の基が挙げられる。
Lf1としては、-O-、-COO-、及び-OCO-のいずれかが好ましい。
h1は1~30であることが好ましく、1~25であることがより好ましく、1~10であることが更に好ましく、1~5であることが特に好ましく、最も好ましくは1~2である。h2は0~15であることが好ましく、より好ましくは0~10である。h3は0~5であることが好ましく、より好ましくは0~2である。h4は0~4であることが好ましく、より好ましくは0~2である。h5は0~4であることが好ましく、より好ましくは0~2である。h1~h5の合計値は3以上が好ましく、5以上がより好ましく、また80以下が好ましく、より好ましくは50以下、更に好ましくは20以下である。 The fluorine-containing alkyl group represented by R f3 or R f4 has 1 to 20, preferably 1 to 12, more preferably 1 to 10, and more preferably 1 to 5. Further preferred. The number of fluorine atoms substituted in the fluorine-containing alkyl group represented by R f3 or R f4 is 1 or more and 2A + 1 or less, where A is the number of carbon atoms contained in the fluorine-containing alkyl group, and 2A + 1 That is, the fluorine-containing alkyl group is preferably a perfluoroalkyl group.
Examples of the alkyl group represented by R b4 include the same groups as the alkyl groups exemplified as the hydrocarbon group represented by R s1 .
L f1 is preferably any one of —O—, —COO—, and —OCO—.
h1 is preferably 1 to 30, more preferably 1 to 25, still more preferably 1 to 10, particularly preferably 1 to 5, and most preferably 1 to 2. h2 is preferably from 0 to 15, and more preferably from 0 to 10. h3 is preferably 0 to 5, and more preferably 0 to 2. h4 is preferably from 0 to 4, more preferably from 0 to 2. h5 is preferably from 0 to 4, more preferably from 0 to 2. The total value of h1 to h5 is preferably 3 or more, more preferably 5 or more, and preferably 80 or less, more preferably 50 or less, and still more preferably 20 or less.
Rb4で表されるアルキル基としては、Rs1で表される炭化水素基として例示したアルキル基と同様の基が挙げられる。
Lf1としては、-O-、-COO-、及び-OCO-のいずれかが好ましい。
h1は1~30であることが好ましく、1~25であることがより好ましく、1~10であることが更に好ましく、1~5であることが特に好ましく、最も好ましくは1~2である。h2は0~15であることが好ましく、より好ましくは0~10である。h3は0~5であることが好ましく、より好ましくは0~2である。h4は0~4であることが好ましく、より好ましくは0~2である。h5は0~4であることが好ましく、より好ましくは0~2である。h1~h5の合計値は3以上が好ましく、5以上がより好ましく、また80以下が好ましく、より好ましくは50以下、更に好ましくは20以下である。 The fluorine-containing alkyl group represented by R f3 or R f4 has 1 to 20, preferably 1 to 12, more preferably 1 to 10, and more preferably 1 to 5. Further preferred. The number of fluorine atoms substituted in the fluorine-containing alkyl group represented by R f3 or R f4 is 1 or more and 2A + 1 or less, where A is the number of carbon atoms contained in the fluorine-containing alkyl group, and 2A + 1 That is, the fluorine-containing alkyl group is preferably a perfluoroalkyl group.
Examples of the alkyl group represented by R b4 include the same groups as the alkyl groups exemplified as the hydrocarbon group represented by R s1 .
L f1 is preferably any one of —O—, —COO—, and —OCO—.
h1 is preferably 1 to 30, more preferably 1 to 25, still more preferably 1 to 10, particularly preferably 1 to 5, and most preferably 1 to 2. h2 is preferably from 0 to 15, and more preferably from 0 to 10. h3 is preferably 0 to 5, and more preferably 0 to 2. h4 is preferably from 0 to 4, more preferably from 0 to 2. h5 is preferably from 0 to 4, more preferably from 0 to 2. The total value of h1 to h5 is preferably 3 or more, more preferably 5 or more, and preferably 80 or less, more preferably 50 or less, and still more preferably 20 or less.
特に、Rf3が炭素数1~5のペルフルオロアルキルであり、Rf4がフッ素原子又は炭素数1~5のペルフルオロアルキルであり、Rb4が水素原子であり、h3、h4及びh5がいずれも0であり、h1が1~5であり、h2が0~5であることが好ましい。
In particular, R f3 is a perfluoroalkyl having 1 to 5 carbon atoms, R f4 is a fluorine atom or a perfluoroalkyl having 1 to 5 carbon atoms, R b4 is a hydrogen atom, and h3, h4, and h5 are all 0. It is preferable that h1 is 1 to 5 and h2 is 0 to 5.
前記フッ化炭素含有基としては、例えば下記式で表される基が挙げられる。式中、Rf3、Rb4は上記と同義であり、Rf3は好ましくは炭素数1~12のペルフルオロアルキル基であり、Rb4は好ましくは水素原子である。また、r2は5~20であり、好ましくは8~15である。r3は1~7であり、好ましくは2~6である。r4は1~10であり、好ましくは3~7である。r5は1~6であり、好ましくは2~4である。
Examples of the fluorocarbon-containing group include groups represented by the following formulas. In the formula, R f3 and R b4 are as defined above, R f3 is preferably a C 1-12 perfluoroalkyl group, and R b4 is preferably a hydrogen atom. R2 is 5 to 20, preferably 8 to 15. r3 is 1 to 7, preferably 2 to 6. r4 is 1 to 10, preferably 3 to 7. r5 is 1 to 6, preferably 2 to 4.
式(f1-1)で表される基としては、下記式で表される基が挙げられる。
Examples of the group represented by the formula (f1-1) include a group represented by the following formula.
式(f1-2)で表される基としては、下記式で表される基が挙げられる。ただしLf2は炭素数5~20のアルカンジイル基を表す。
Examples of the group represented by the formula (f1-2) include a group represented by the following formula. L f2 represents an alkanediyl group having 5 to 20 carbon atoms.
式(f1-3)で表される基としては、下記式で表される基が挙げられる。ただしLf2は炭素数5~20のアルカンジイル基を表す。
Examples of the group represented by the formula (f1-3) include a group represented by the following formula. L f2 represents an alkanediyl group having 5 to 20 carbon atoms.
式(f1-4)で表される基としては、下記式で表される基が挙げられる。ただしLf2は炭素数5~20のアルカンジイル基を表す。
Examples of the group represented by the formula (f1-4) include a group represented by the following formula. L f2 represents an alkanediyl group having 5 to 20 carbon atoms.
式(f1-5)で表される基としては、下記式で表される基が挙げられる。ただしLf3は炭素数1~6のアルカンジイル基を表す。
Examples of the group represented by the formula (f1-5) include a group represented by the following formula. L f3 represents an alkanediyl group having 1 to 6 carbon atoms.
フッ化炭素含有基は、フルオロアルキルアリール基、フルオロアルキルアルケニル基、フルオロアルキルアルキニル基等であってもよい。フルオロアルキルアリール基としては、(フルオロC1-8アルキル)フェニル基、(フルオロC1-8アルキル)ナフチル基が挙げられ、フルオロアルキルアルケニル基としては、(フルオロC1-17アルキル)ビニル基が挙げられ、フルオロアルキルアルキニル基としては、(フルオロC1-17アルキル)エチニル基が挙げられる。
The fluorocarbon-containing group may be a fluoroalkylaryl group, a fluoroalkylalkenyl group, a fluoroalkylalkynyl group, or the like. Examples of the fluoroalkylaryl group include (fluoro C 1-8 alkyl) phenyl group and (fluoro C 1-8 alkyl) naphthyl group. Examples of the fluoroalkylalkenyl group include (fluoro C 1-17 alkyl) vinyl group. Examples of the fluoroalkylalkynyl group include a ( fluoroC 1-17 alkyl) ethynyl group.
Zf1は、シロキサン骨格含有基又は加水分解性基であることが好ましく、加水分解性基であることがより好ましい。
Z f1 is preferably a siloxane skeleton-containing group or a hydrolyzable group, and more preferably a hydrolyzable group.
式(III-2)中、Rf2で表される加水分解性シランオリゴマー残基は、ケイ素原子と、ケイ素原子に結合する加水分解性基とを含む化合物(以下、「加水分解性シランモノマー」という場合がある)の加水分解縮合物に由来する1価の基を意味する。加水分解性シランオリゴマー残基に含まれるケイ素原子の数は、例えば3以上であり、好ましくは5以上であり、より好ましくは7以上である。加水分解性シランオリゴマー残基に含まれるケイ素原子の数は好ましくは15以下であり、より好ましくは13以下であり、更に好ましくは10以下である。
また、前記加水分解性シランオリゴマー残基がアルコキシ基を有する場合、該アルコキシ基としてはメトキシ基、エトキシ基、プロポキシ基、ブトキシ基などが挙げられ、好ましくはメトキシ基、エトキシ基等である。前記加水分解性シランオリゴマー残基は、これらアルコキシ基の1種又は2種以上を有することができ、好ましくは1種を有する。 In formula (III-2), the hydrolyzable silane oligomer residue represented by R f2 is a compound containing a silicon atom and a hydrolyzable group bonded to the silicon atom (hereinafter referred to as “hydrolyzable silane monomer”). A monovalent group derived from the hydrolytic condensate. The number of silicon atoms contained in the hydrolyzable silane oligomer residue is, for example, 3 or more, preferably 5 or more, more preferably 7 or more. The number of silicon atoms contained in the hydrolyzable silane oligomer residue is preferably 15 or less, more preferably 13 or less, and even more preferably 10 or less.
When the hydrolyzable silane oligomer residue has an alkoxy group, examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, and a butoxy group, and a methoxy group and an ethoxy group are preferable. The hydrolyzable silane oligomer residue may have one or more of these alkoxy groups, and preferably has one.
また、前記加水分解性シランオリゴマー残基がアルコキシ基を有する場合、該アルコキシ基としてはメトキシ基、エトキシ基、プロポキシ基、ブトキシ基などが挙げられ、好ましくはメトキシ基、エトキシ基等である。前記加水分解性シランオリゴマー残基は、これらアルコキシ基の1種又は2種以上を有することができ、好ましくは1種を有する。 In formula (III-2), the hydrolyzable silane oligomer residue represented by R f2 is a compound containing a silicon atom and a hydrolyzable group bonded to the silicon atom (hereinafter referred to as “hydrolyzable silane monomer”). A monovalent group derived from the hydrolytic condensate. The number of silicon atoms contained in the hydrolyzable silane oligomer residue is, for example, 3 or more, preferably 5 or more, more preferably 7 or more. The number of silicon atoms contained in the hydrolyzable silane oligomer residue is preferably 15 or less, more preferably 13 or less, and even more preferably 10 or less.
When the hydrolyzable silane oligomer residue has an alkoxy group, examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, and a butoxy group, and a methoxy group and an ethoxy group are preferable. The hydrolyzable silane oligomer residue may have one or more of these alkoxy groups, and preferably has one.
加水分解性シランオリゴマー残基は、式(f2)で表される基であることが好ましい。
The hydrolyzable silane oligomer residue is preferably a group represented by the formula (f2).
[上記式(f2)中、Af3は、それぞれ独立に、加水分解性基、炭素数1~4のアルキル基又は炭素数1~4の含フッ素アルキル基を表す。h6は0以上100以下の整数である。*はSiとの結合手を表す。]
[In Formula (f2), A f3 independently represents a hydrolyzable group, an alkyl group having 1 to 4 carbon atoms, or a fluorine-containing alkyl group having 1 to 4 carbon atoms. h6 is an integer of 0 or more and 100 or less. * Represents a bond with Si. ]
Af3で表される加水分解性基としては、メトキシ基、エトキシ基、プロポキシ基、ブトキシ基等の炭素数1~4(好ましくは1~2)のアルコキシ基;水素原子;シアノ基;アリル基、イソシアネート基;が挙げられ、アルコキシ基が好ましく、エトキシ基、メトキシ基、イソシアネート基がより好ましい。h6は0以上10以下であることが好ましく、より好ましくは0以上7以下である。
Af3としては加水分解性基又は炭素数1~4の含フッ素アルキル基が好ましく、Af3のうち少なくとも一つが炭素数1~4の含フッ素アルキル基であることが好ましい。またAf3のうち少なくとも一つは加水分解性基(特にメトキシ基、エトキシ基)であることが好ましい。 Examples of the hydrolyzable group represented by A f3 include an alkoxy group having 1 to 4 carbon atoms (preferably 1 to 2) such as a methoxy group, an ethoxy group, a propoxy group, and a butoxy group; a hydrogen atom; a cyano group; an allyl group An alkoxy group is preferable, and an ethoxy group, a methoxy group, and an isocyanate group are more preferable. h6 is preferably 0 or more and 10 or less, and more preferably 0 or more and 7 or less.
A f3 is preferably a hydrolyzable group or a fluorinated alkyl group having 1 to 4 carbon atoms, and at least one of A f3 is preferably a fluorinated alkyl group having 1 to 4 carbon atoms. Further, at least one of A f3 is preferably a hydrolyzable group (particularly a methoxy group or an ethoxy group).
Af3としては加水分解性基又は炭素数1~4の含フッ素アルキル基が好ましく、Af3のうち少なくとも一つが炭素数1~4の含フッ素アルキル基であることが好ましい。またAf3のうち少なくとも一つは加水分解性基(特にメトキシ基、エトキシ基)であることが好ましい。 Examples of the hydrolyzable group represented by A f3 include an alkoxy group having 1 to 4 carbon atoms (preferably 1 to 2) such as a methoxy group, an ethoxy group, a propoxy group, and a butoxy group; a hydrogen atom; a cyano group; an allyl group An alkoxy group is preferable, and an ethoxy group, a methoxy group, and an isocyanate group are more preferable. h6 is preferably 0 or more and 10 or less, and more preferably 0 or more and 7 or less.
A f3 is preferably a hydrolyzable group or a fluorinated alkyl group having 1 to 4 carbon atoms, and at least one of A f3 is preferably a fluorinated alkyl group having 1 to 4 carbon atoms. Further, at least one of A f3 is preferably a hydrolyzable group (particularly a methoxy group or an ethoxy group).
加水分解性シランオリゴマー残基としては、例えば下記式で表される基が挙げられる。
Examples of the hydrolyzable silane oligomer residue include groups represented by the following formulas.
式(III-1)で表される化合物としては、例えば下記式で表される化合物が挙げられる。式中、r1は1~15であり、好ましくは1~12、さらに好ましくは1~6である。
Examples of the compound represented by the formula (III-1) include a compound represented by the following formula. In the formula, r1 is 1 to 15, preferably 1 to 12, and more preferably 1 to 6.
式(III-1)で表される化合物としては、下記式で表される化合物も挙げられる。
式中、r2は5~20であり、好ましくは8~15である。r3は1~7であり、好ましくは2~6である。r4は1~10であり、好ましくは2~8、より好ましくは2~5である。r5は1~5であり、好ましくは2~4である。r6は2~10であり、好ましくは2~8である。r7は2~10であり、好ましくは3~7である。 Examples of the compound represented by the formula (III-1) also include a compound represented by the following formula.
In the formula, r2 is 5 to 20, preferably 8 to 15. r3 is 1 to 7, preferably 2 to 6. r4 is 1 to 10, preferably 2 to 8, and more preferably 2 to 5. r5 is 1 to 5, preferably 2 to 4. r6 is 2 to 10, preferably 2 to 8. r7 is 2 to 10, preferably 3 to 7.
式中、r2は5~20であり、好ましくは8~15である。r3は1~7であり、好ましくは2~6である。r4は1~10であり、好ましくは2~8、より好ましくは2~5である。r5は1~5であり、好ましくは2~4である。r6は2~10であり、好ましくは2~8である。r7は2~10であり、好ましくは3~7である。 Examples of the compound represented by the formula (III-1) also include a compound represented by the following formula.
In the formula, r2 is 5 to 20, preferably 8 to 15. r3 is 1 to 7, preferably 2 to 6. r4 is 1 to 10, preferably 2 to 8, and more preferably 2 to 5. r5 is 1 to 5, preferably 2 to 4. r6 is 2 to 10, preferably 2 to 8. r7 is 2 to 10, preferably 3 to 7.
式(III-2)で表される化合物としては、下記式で表される化合物が挙げられる。
Examples of the compound represented by the formula (III-2) include compounds represented by the following formula.
含フッ素有機ケイ素化合物(f)の含有率は、組成物100質量%中、0.01質量%以上であることが好ましく、より好ましくは0.05質量%以上、さらに好ましくは1質量%以上であり、20質量%以下であることが好ましく、より好ましくは10質量%以下、さらに好ましくは7質量%以下である。
本発明の組成物において、含フッ素有機ケイ素化合物(f)と有機ケイ素化合物(a)の含有率の比(含フッ素有機ケイ素化合物(f)/有機ケイ素化合物(a))は、モル比で1/1以上であることが好ましく、より好ましくは7/1以上、さらに好ましくは10/1以上であり、100/1以下であることが好ましく、より好ましくは50/1以下、さらに好ましくは25/1以下、よりいっそう好ましくは20/1以下、特に好ましくは15/1以下である。
本発明の組成物において、金属アルコキシド(b)と含フッ素有機ケイ素化合物(f)の含有率の比(金属アルコキシド(b)/含フッ素有機ケイ素化合物(f))は、モル比で0.01以上であることが好ましく、より好ましくは0.1以上、さらに好ましくは0.2以上であり、50以下であることが好ましく、より好ましくは10以下、よりいっそう好ましくは5以下であるである。 The content of the fluorine-containing organosilicon compound (f) is preferably 0.01% by mass or more, more preferably 0.05% by mass or more, and further preferably 1% by mass or more in 100% by mass of the composition. It is preferably 20% by mass or less, more preferably 10% by mass or less, and still more preferably 7% by mass or less.
In the composition of the present invention, the ratio of the fluorine-containing organosilicon compound (f) to the organosilicon compound (a) (fluorine-containing organosilicon compound (f) / organosilicon compound (a)) is 1 in molar ratio. / 1 or more, more preferably 7/1 or more, still more preferably 10/1 or more, and preferably 100/1 or less, more preferably 50/1 or less, and even more preferably 25 / 1 or less, more preferably 20/1 or less, particularly preferably 15/1 or less.
In the composition of the present invention, the content ratio of the metal alkoxide (b) and the fluorine-containing organosilicon compound (f) (metal alkoxide (b) / fluorine-containing organosilicon compound (f)) is 0.01 by molar ratio. Preferably, it is 0.1 or more, more preferably 0.2 or more, and preferably 50 or less, more preferably 10 or less, and even more preferably 5 or less.
本発明の組成物において、含フッ素有機ケイ素化合物(f)と有機ケイ素化合物(a)の含有率の比(含フッ素有機ケイ素化合物(f)/有機ケイ素化合物(a))は、モル比で1/1以上であることが好ましく、より好ましくは7/1以上、さらに好ましくは10/1以上であり、100/1以下であることが好ましく、より好ましくは50/1以下、さらに好ましくは25/1以下、よりいっそう好ましくは20/1以下、特に好ましくは15/1以下である。
本発明の組成物において、金属アルコキシド(b)と含フッ素有機ケイ素化合物(f)の含有率の比(金属アルコキシド(b)/含フッ素有機ケイ素化合物(f))は、モル比で0.01以上であることが好ましく、より好ましくは0.1以上、さらに好ましくは0.2以上であり、50以下であることが好ましく、より好ましくは10以下、よりいっそう好ましくは5以下であるである。 The content of the fluorine-containing organosilicon compound (f) is preferably 0.01% by mass or more, more preferably 0.05% by mass or more, and further preferably 1% by mass or more in 100% by mass of the composition. It is preferably 20% by mass or less, more preferably 10% by mass or less, and still more preferably 7% by mass or less.
In the composition of the present invention, the ratio of the fluorine-containing organosilicon compound (f) to the organosilicon compound (a) (fluorine-containing organosilicon compound (f) / organosilicon compound (a)) is 1 in molar ratio. / 1 or more, more preferably 7/1 or more, still more preferably 10/1 or more, and preferably 100/1 or less, more preferably 50/1 or less, and even more preferably 25 / 1 or less, more preferably 20/1 or less, particularly preferably 15/1 or less.
In the composition of the present invention, the content ratio of the metal alkoxide (b) and the fluorine-containing organosilicon compound (f) (metal alkoxide (b) / fluorine-containing organosilicon compound (f)) is 0.01 by molar ratio. Preferably, it is 0.1 or more, more preferably 0.2 or more, and preferably 50 or less, more preferably 10 or less, and even more preferably 5 or less.
本発明の組成物は、さらに溶剤(c)を含んでいることが好ましい。溶剤(c)としては、水;アルコール系溶剤、エーテル系溶剤、ケトン系溶剤、エステル系溶剤、アミド系溶剤等の親水性有機溶剤;芳香族炭化水素系溶剤、飽和炭化水素系溶剤等の疎水性有機溶剤が挙げられる、これらを単独で使用してもよく、2種以上を併用してもよい。
前記アルコール系溶剤としては、メタノール、エタノール、プロパノール、イソプロピルアルコール、ブタノール、エチレングリコール、プロピレングリコール、ジエチレングリコール等が挙げられ、前記エーテル系溶剤としては、ジメトキシエタン、テトラヒドロフラン、ジオキサン等が挙げられ、ケトン系溶剤としては、アセトン、メチルエチルケトン等が挙げられ、エステル系溶剤としては、酢酸エチル、酢酸ブチル等が挙げられ、アミド系溶剤としては、ジメチルホルムアミド等が挙げられ、芳香族炭化水素系溶剤としては、ベンゼン、トルエン、キシレン等が挙げられ、飽和炭化水素系溶剤としては、ヘキサン、シクロヘキサン等が挙げられる。
中でも、アルコール系溶剤、ケトン系溶剤が好ましく、水を含んでいてもよい。
水を含む場合、溶剤(c)中、水の含有率は、0.1質量%以上が好ましく、より好ましくは5質量%以上、さらに好ましくは10質量%以上であり、90質量%以下が好ましく、より好ましくは70質量%以下、さらに好ましくは50質量%以下である。 The composition of the present invention preferably further contains a solvent (c). Solvent (c) includes water; hydrophilic organic solvents such as alcohol solvents, ether solvents, ketone solvents, ester solvents and amide solvents; hydrophobic solvents such as aromatic hydrocarbon solvents and saturated hydrocarbon solvents These may be used alone or in combination of two or more.
Examples of the alcohol solvent include methanol, ethanol, propanol, isopropyl alcohol, butanol, ethylene glycol, propylene glycol, and diethylene glycol. Examples of the ether solvent include dimethoxyethane, tetrahydrofuran, and dioxane. Examples of the solvent include acetone and methyl ethyl ketone, examples of the ester solvent include ethyl acetate and butyl acetate, examples of the amide solvent include dimethylformamide, and examples of the aromatic hydrocarbon solvent include Examples of the saturated hydrocarbon solvent include benzene, toluene, and xylene. Examples of the saturated hydrocarbon solvent include hexane and cyclohexane.
Among these, alcohol solvents and ketone solvents are preferable and may contain water.
When water is contained, the content of water in the solvent (c) is preferably 0.1% by mass or more, more preferably 5% by mass or more, still more preferably 10% by mass or more, and preferably 90% by mass or less. More preferably, it is 70 mass% or less, More preferably, it is 50 mass% or less.
前記アルコール系溶剤としては、メタノール、エタノール、プロパノール、イソプロピルアルコール、ブタノール、エチレングリコール、プロピレングリコール、ジエチレングリコール等が挙げられ、前記エーテル系溶剤としては、ジメトキシエタン、テトラヒドロフラン、ジオキサン等が挙げられ、ケトン系溶剤としては、アセトン、メチルエチルケトン等が挙げられ、エステル系溶剤としては、酢酸エチル、酢酸ブチル等が挙げられ、アミド系溶剤としては、ジメチルホルムアミド等が挙げられ、芳香族炭化水素系溶剤としては、ベンゼン、トルエン、キシレン等が挙げられ、飽和炭化水素系溶剤としては、ヘキサン、シクロヘキサン等が挙げられる。
中でも、アルコール系溶剤、ケトン系溶剤が好ましく、水を含んでいてもよい。
水を含む場合、溶剤(c)中、水の含有率は、0.1質量%以上が好ましく、より好ましくは5質量%以上、さらに好ましくは10質量%以上であり、90質量%以下が好ましく、より好ましくは70質量%以下、さらに好ましくは50質量%以下である。 The composition of the present invention preferably further contains a solvent (c). Solvent (c) includes water; hydrophilic organic solvents such as alcohol solvents, ether solvents, ketone solvents, ester solvents and amide solvents; hydrophobic solvents such as aromatic hydrocarbon solvents and saturated hydrocarbon solvents These may be used alone or in combination of two or more.
Examples of the alcohol solvent include methanol, ethanol, propanol, isopropyl alcohol, butanol, ethylene glycol, propylene glycol, and diethylene glycol. Examples of the ether solvent include dimethoxyethane, tetrahydrofuran, and dioxane. Examples of the solvent include acetone and methyl ethyl ketone, examples of the ester solvent include ethyl acetate and butyl acetate, examples of the amide solvent include dimethylformamide, and examples of the aromatic hydrocarbon solvent include Examples of the saturated hydrocarbon solvent include benzene, toluene, and xylene. Examples of the saturated hydrocarbon solvent include hexane and cyclohexane.
Among these, alcohol solvents and ketone solvents are preferable and may contain water.
When water is contained, the content of water in the solvent (c) is preferably 0.1% by mass or more, more preferably 5% by mass or more, still more preferably 10% by mass or more, and preferably 90% by mass or less. More preferably, it is 70 mass% or less, More preferably, it is 50 mass% or less.
溶剤(c)は、有機ケイ素化合物(a)、金属アルコキシド(b)及び含フッ素有機ケイ素化合物(f)の合計1質量部に対して、0.1質量部以上であることが好ましく、より好ましくは5質量部以上、さらに好ましくは10質量部以上、特に好ましくは12質量部以上であり、100質量部以下であることが好ましく、より好ましくは80質量部以下、さらに好ましくは50質量部以下である。溶剤(c)の量がこの範囲にあると、皮膜の厚みの制御が容易である。
The solvent (c) is preferably 0.1 parts by mass or more, more preferably with respect to 1 part by mass in total of the organosilicon compound (a), the metal alkoxide (b) and the fluorinated organosilicon compound (f). Is 5 parts by mass or more, more preferably 10 parts by mass or more, particularly preferably 12 parts by mass or more, preferably 100 parts by mass or less, more preferably 80 parts by mass or less, still more preferably 50 parts by mass or less. is there. When the amount of the solvent (c) is within this range, the thickness of the film can be easily controlled.
本発明の組成物は、さらに、触媒(d)を含んでいてもよい。触媒(d)は、ケイ素原子に結合する加水分解性基の加水分解触媒として作用しうるものであればよく、例えば、酸性化合物;塩基性化合物;有機金属化合物;等が挙げられる。前記酸性化合物としては、塩酸、硝酸等の無機酸;酢酸等の有機酸;等が挙げられる。前記塩基性化合物としては、アンモニア;アミン;等が挙げられる。前記有機金属化合物としては、Al、Fe、Zn、Sn等の金属元素を中心金属とする有機金属化合物が挙げられ、アルミニウムアセチルアセトン錯体、アルミニウムエチルアセトアセテート錯体等の有機アルミニウム化合物;オクチル酸鉄等の有機鉄化合物;亜鉛アセチルアセトナートモノハイドレート、ナフテン酸亜鉛、オクチル酸亜鉛等の有機亜鉛化合物;ジブチル錫ジアセテート錯体等の有機錫化合物;等が挙げられる。
中でも、触媒(d)としては、有機金属化合物、酸性化合物が好ましく、有機アルミニウム化合物、塩酸がより好ましい。 The composition of the present invention may further contain a catalyst (d). The catalyst (d) is not particularly limited as long as it can act as a hydrolysis catalyst for a hydrolyzable group bonded to a silicon atom, and examples thereof include acidic compounds; basic compounds; organometallic compounds; Examples of the acidic compound include inorganic acids such as hydrochloric acid and nitric acid; organic acids such as acetic acid; Examples of the basic compound include ammonia, amines, and the like. Examples of the organometallic compound include organometallic compounds having a metal element such as Al, Fe, Zn, and Sn as a central metal, and organoaluminum compounds such as aluminum acetylacetone complex and aluminum ethylacetoacetate complex; Organic iron compounds; organic zinc compounds such as zinc acetylacetonate monohydrate, zinc naphthenate, and zinc octylate; organic tin compounds such as dibutyltin diacetate complex;
Especially, as a catalyst (d), an organometallic compound and an acidic compound are preferable, and an organoaluminum compound and hydrochloric acid are more preferable.
中でも、触媒(d)としては、有機金属化合物、酸性化合物が好ましく、有機アルミニウム化合物、塩酸がより好ましい。 The composition of the present invention may further contain a catalyst (d). The catalyst (d) is not particularly limited as long as it can act as a hydrolysis catalyst for a hydrolyzable group bonded to a silicon atom, and examples thereof include acidic compounds; basic compounds; organometallic compounds; Examples of the acidic compound include inorganic acids such as hydrochloric acid and nitric acid; organic acids such as acetic acid; Examples of the basic compound include ammonia, amines, and the like. Examples of the organometallic compound include organometallic compounds having a metal element such as Al, Fe, Zn, and Sn as a central metal, and organoaluminum compounds such as aluminum acetylacetone complex and aluminum ethylacetoacetate complex; Organic iron compounds; organic zinc compounds such as zinc acetylacetonate monohydrate, zinc naphthenate, and zinc octylate; organic tin compounds such as dibutyltin diacetate complex;
Especially, as a catalyst (d), an organometallic compound and an acidic compound are preferable, and an organoaluminum compound and hydrochloric acid are more preferable.
触媒(d)は、有機ケイ素化合物(a)、金属アルコキシド(b)及び含フッ素有機ケイ素化合物(f)の合計100質量部に対して、0.0001質量部以上であることが好ましく、より好ましくは0.0002質量部以上、さらに好ましくは0.001質量部以上であり、20質量部以下であることが好ましく、より好ましくは10質量部以下、さらに好ましくは5質量部以下である。
また、触媒として酸性化合物を用いる場合、触媒(d)は、有機ケイ素化合物(a)、金属アルコキシド(b)及び含フッ素有機ケイ素化合物(f)の合計100質量部に対して、0.001質量部以上であることが好ましく、より好ましくは0.005質量部以上、さらに好ましくは0.01質量部以上であり、1質量部以下であることが好ましく、より好ましくは0.5質量部以下である。
さらに、触媒として有機金属化合物を用いる場合、触媒(d)は、有機ケイ素化合物(a)、金属アルコキシド(b)及び含フッ素有機ケイ素化合物(f)の合計100質量部に対して、0.0001質量部以上であることが好ましく、より好ましくは0.0002質量部以上、さらに好ましくは0.001質量部以上であり、0.1質量部以下であることが好ましく、より好ましくは0.05質量部以下である。 The catalyst (d) is preferably 0.0001 parts by mass or more, more preferably 100 parts by mass or more with respect to 100 parts by mass in total of the organosilicon compound (a), the metal alkoxide (b) and the fluorine-containing organosilicon compound (f). Is 0.0002 parts by mass or more, more preferably 0.001 parts by mass or more, preferably 20 parts by mass or less, more preferably 10 parts by mass or less, and further preferably 5 parts by mass or less.
Further, when an acidic compound is used as the catalyst, the catalyst (d) is 0.001 mass relative to 100 mass parts in total of the organosilicon compound (a), the metal alkoxide (b) and the fluorinated organosilicon compound (f). Preferably, it is 0.005 parts by mass or more, more preferably 0.01 parts by mass or more, and preferably 1 part by mass or less, more preferably 0.5 parts by mass or less. is there.
Further, when an organometallic compound is used as the catalyst, the catalyst (d) is 0.0001 with respect to 100 parts by mass in total of the organosilicon compound (a), the metal alkoxide (b) and the fluorinated organosilicon compound (f). It is preferably at least part by mass, more preferably at least 0.0002 part by mass, even more preferably at least 0.001 part by mass, preferably at most 0.1 part by mass, more preferably at least 0.05 part by mass. Or less.
また、触媒として酸性化合物を用いる場合、触媒(d)は、有機ケイ素化合物(a)、金属アルコキシド(b)及び含フッ素有機ケイ素化合物(f)の合計100質量部に対して、0.001質量部以上であることが好ましく、より好ましくは0.005質量部以上、さらに好ましくは0.01質量部以上であり、1質量部以下であることが好ましく、より好ましくは0.5質量部以下である。
さらに、触媒として有機金属化合物を用いる場合、触媒(d)は、有機ケイ素化合物(a)、金属アルコキシド(b)及び含フッ素有機ケイ素化合物(f)の合計100質量部に対して、0.0001質量部以上であることが好ましく、より好ましくは0.0002質量部以上、さらに好ましくは0.001質量部以上であり、0.1質量部以下であることが好ましく、より好ましくは0.05質量部以下である。 The catalyst (d) is preferably 0.0001 parts by mass or more, more preferably 100 parts by mass or more with respect to 100 parts by mass in total of the organosilicon compound (a), the metal alkoxide (b) and the fluorine-containing organosilicon compound (f). Is 0.0002 parts by mass or more, more preferably 0.001 parts by mass or more, preferably 20 parts by mass or less, more preferably 10 parts by mass or less, and further preferably 5 parts by mass or less.
Further, when an acidic compound is used as the catalyst, the catalyst (d) is 0.001 mass relative to 100 mass parts in total of the organosilicon compound (a), the metal alkoxide (b) and the fluorinated organosilicon compound (f). Preferably, it is 0.005 parts by mass or more, more preferably 0.01 parts by mass or more, and preferably 1 part by mass or less, more preferably 0.5 parts by mass or less. is there.
Further, when an organometallic compound is used as the catalyst, the catalyst (d) is 0.0001 with respect to 100 parts by mass in total of the organosilicon compound (a), the metal alkoxide (b) and the fluorinated organosilicon compound (f). It is preferably at least part by mass, more preferably at least 0.0002 part by mass, even more preferably at least 0.001 part by mass, preferably at most 0.1 part by mass, more preferably at least 0.05 part by mass. Or less.
さらに本発明の組成物は、本発明の効果を阻害しない範囲で、酸化防止剤、防錆剤、紫外線吸収剤、光安定剤、防カビ剤、抗菌剤、生物付着防止剤、消臭剤、顔料、難燃剤、帯電防止剤等の各種の添加剤を含んでいてもよい。
Furthermore, the composition of the present invention is an antioxidant, a rust inhibitor, a UV absorber, a light stabilizer, a fungicide, an antibacterial agent, an anti-bioadhesive agent, a deodorant, as long as the effects of the present invention are not impaired. Various additives such as pigments, flame retardants and antistatic agents may be included.
前記酸化防止剤としては、フェノール系酸化防止剤、硫黄系酸化防止剤、リン系酸化防止剤、ヒンダ-ドアミン系酸化防止剤等が挙げられる。
Examples of the antioxidant include phenol-based antioxidants, sulfur-based antioxidants, phosphorus-based antioxidants, hindered amine-based antioxidants, and the like.
前記フェノール系酸化防止剤としては、n-オクタデシル-3-(4-ヒドロキシ-3,5-ジ-t-ブチルフェニル)プロピオネート、2,6-ジ-t-ブチル-4-メチルフェノール、2,2-チオ-ジエチレン-ビス-[3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)プロピオネート]、トリ-エチレングリコール-ビス-[3-(3-t-ブチル-5-メチル-4-ヒドロキシフェニル)プロピオネート]、3,9-ビス[2-{3-(3-t-ブチル-4-ヒドロキシ-5-メチルフェニル)プロピオニルオキシ}-1,1-ジメチルエチル]-2,4,8,10-テトラオキサスピロ[5・5]ウンデカン、テトラキス{3-(3,5-ジ-t-ブチル-4-ヒドロキシフェニル)-プロピオン酸}ペンタエリスリチルエステル、2-t-ブチル-6-(3-t-ブチル-2-ヒドロキシ-5-メチルベンジル)-4-メチルフェニルアクリレート、2-[1-(2-ヒドロキシ-3,5-ジ-t-ペンチルフェニル)エチル]-4,6-ジ-t-ペンチルフェニルアクリレート、1,3,5-トリメチル-2,4,6-トリス(3,5-ジ-t-ブチル-4-ヒドロキシベンジル)ベンゼン、トリス(3,5-ジ-t-ブチル-4-ヒドロキシベンジル)イソシアヌレート、1,3,5-トリス(4-t-ブチル-3-ヒドロキシ-2,6-ジメチルベンジル)-1,3,5-トリアジン-2,4,6-(1H,3H,5H)-トリオン、2,2’-メチレンビス(6-t-ブチル-4-メチルフェノール)、4,4’-ブチリデンビス(6-t-ブチル-3-メチルフェノール)、4,4’-チオビス(6-t-ブチル-3-メチルフェノール)等が挙げられる。
Examples of the phenolic antioxidant include n-octadecyl-3- (4-hydroxy-3,5-di-t-butylphenyl) propionate, 2,6-di-t-butyl-4-methylphenol, 2, 2-thio-diethylene-bis- [3- (3,5-di-t-butyl-4-hydroxyphenyl) propionate], tri-ethylene glycol-bis- [3- (3-t-butyl-5-methyl -4-hydroxyphenyl) propionate], 3,9-bis [2- {3- (3-tert-butyl-4-hydroxy-5-methylphenyl) propionyloxy} -1,1-dimethylethyl] -2, 4,8,10-tetraoxaspiro [5.5] undecane, tetrakis {3- (3,5-di-tert-butyl-4-hydroxyphenyl) -propionic acid} pentaeryth Cyl ester, 2-t-butyl-6- (3-t-butyl-2-hydroxy-5-methylbenzyl) -4-methylphenyl acrylate, 2- [1- (2-hydroxy-3,5-di-t -Pentylphenyl) ethyl] -4,6-di-t-pentylphenyl acrylate, 1,3,5-trimethyl-2,4,6-tris (3,5-di-t-butyl-4-hydroxybenzyl) Benzene, tris (3,5-di-t-butyl-4-hydroxybenzyl) isocyanurate, 1,3,5-tris (4-t-butyl-3-hydroxy-2,6-dimethylbenzyl) -1, 3,5-triazine-2,4,6- (1H, 3H, 5H) -trione, 2,2′-methylenebis (6-tert-butyl-4-methylphenol), 4,4′-butylidenebis (6- t-bu -3-methylphenol), 4,4'-thiobis (6-t-butyl-3-methylphenol) and the like.
前記硫黄系酸化防止剤としては、3,3’-チオジプロピオン酸ジ-n-ドデシルエステル、3,3’-チオジプロピオン酸ジ-n-テトラデシルエステル、3,3’-チオジプロピオン酸ジ-n-オクタデシルエステル、テトラキス(3-ドデシルチオプロピオン酸)ペンタエリスリトールエステル等が挙げられる。
Examples of the sulfur-based antioxidant include 3,3′-thiodipropionic acid di-n-dodecyl ester, 3,3′-thiodipropionic acid di-n-tetradecyl ester, and 3,3′-thiodipropion ester. Examples include acid di-n-octadecyl ester, tetrakis (3-dodecylthiopropionic acid) pentaerythritol ester, and the like.
前記リン系酸化防止剤としては、トリス(2,4-ジ-t-ブチルフェニル)ホスファイト、ビス(2,4-ジ-t-ブチルフェニル)ペンタエリスリトールジホスファイト、ビス(2,6-ジ-t-ブチル-4-メチルフェニル)ペンタエリスリトールジホスファイト、ビス(2,4-ジ-クミルフェニル)ペンタエリスリトールジホスファイト、テトラキス(2,4-ジ-t-ブチルフェニル)-4,4’-ビフェニレンジホスフォナイト、ビス-[2,4-ジ-t-ブチル,(6-メチル)フェニル]エチルホスファイト等が挙げられる。
Examples of the phosphorus antioxidant include tris (2,4-di-t-butylphenyl) phosphite, bis (2,4-di-t-butylphenyl) pentaerythritol diphosphite, bis (2,6- Di-t-butyl-4-methylphenyl) pentaerythritol diphosphite, bis (2,4-di-cumylphenyl) pentaerythritol diphosphite, tetrakis (2,4-di-t-butylphenyl) -4,4 Examples include '-biphenylene diphosphonite, bis- [2,4-di-t-butyl, (6-methyl) phenyl] ethyl phosphite, and the like.
前記ヒンダードアミン系酸化防止剤としては、セバシン酸ビス(2,2,6,6-テトラメチル-4-ピペリジル)エステル(融点81~86℃)、2,2,6,6-テトラメチル-4-ピペリジルメタクリレート(融点58℃)、ポリ[{6-(1,1,3,3-テトラメチルブチル)アミノ-1,3,5-トリアジン-2,4-ジイル}{(2,2,6,6-テトラメチル-4-ピペリジル)イミノ}-1,6-ヘキサメチレン{(2,2,6,6-テトラメチル-4-ピペリジル)イミノ}]等が挙げられる。
Examples of the hindered amine antioxidant include sebacic acid bis (2,2,6,6-tetramethyl-4-piperidyl) ester (melting point: 81 to 86 ° C.), 2,2,6,6-tetramethyl-4- Piperidyl methacrylate (melting point: 58 ° C.), poly [{6- (1,1,3,3-tetramethylbutyl) amino-1,3,5-triazine-2,4-diyl} {(2,2,6, 6-tetramethyl-4-piperidyl) imino} -1,6-hexamethylene {(2,2,6,6-tetramethyl-4-piperidyl) imino}] and the like.
前記防錆剤としては、トリエタノールアミン等のアルカノールアミン;第四級アンモニウム塩;アルカンチオール;イミダゾリン、イミダゾール、アルキルイミダゾリン誘導体、ベンズイミダゾール、2-メルカプトベンズイミダゾール、ベンゾトリアゾール等のアゾール類;メタバナジン酸ナトリウム;クエン酸ビスマス;フェノール誘導体;アルキルアミンやポリアルケニルアミン等の脂肪族アミン、芳香族アミン、エトキシ化アミン、シアノアルキルアミン、安息香酸シクロヘキシルアミン、アルキレンジアミン等の脂肪族ジアミン、芳香族ジアミン等のアミン化合物;前記アミン化合物とカルボン酸とのアミド;アルキルエステル;ピリミジン;ナフテン酸;スルホン酸複合体;亜硝酸カルシウム、亜硝酸ナトリウム、亜硝酸ジシクロヘキシルアミン等の亜硝酸塩;ポリアルコール、ポリフェノール等のポリオール化合物;モリブデン酸ナトリウム、タングステン酸ナトリウム、ホスホン酸ナトリウム、クロム酸ナトリウム、ケイ酸ナトリウム等のヘテロポリ酸塩;ゼラチン;カルボン酸のポリマー;ニトロ化合物;ホルムアルデヒド;アセチレンアルコール;脂肪族チオール、芳香族チオール、アセチレンチオール等のチオール化合物;脂肪族スルフィド、芳香族スルフィド、アセチレンスルフィド等のスルフィド化合物;スルホキシド、ジベンジルスルホキシド等のスルホキシド化合物;チオ尿素;アミン又は第四級アンモニウム塩とハロゲンイオンの組合せ;アルキルアミンとヨウ化カリウムの組合せ;タンニンとリン酸ナトリウムの組合せ;トリエタノールアミンとラウリルサルコシンの組合せ;トリエタノールアミンとラウリルサルコシンとベンゾトリアゾールの組合せ;アルキルアミンとベンゾトリアゾールと亜硝酸ナトリウムとリン酸ナトリウムの組合せ;等が挙げられる。
Examples of the rust inhibitor include alkanolamines such as triethanolamine; quaternary ammonium salts; alkanethiols; imidazoles such as imidazoline, imidazole, alkylimidazoline derivatives, benzimidazole, 2-mercaptobenzimidazole, and benzotriazole; metavanadic acid Sodium; bismuth citrate; phenol derivatives; aliphatic amines such as alkylamines and polyalkenylamines, aromatic amines, ethoxylated amines, cyanoalkylamines, cyclohexylamine benzoate, aliphatic diamines such as alkylenediamine, aromatic diamines, etc. Amides of the above amine compounds and carboxylic acids; alkyl esters; pyrimidines; naphthenic acids; sulfonic acid complexes; calcium nitrite, sodium nitrite, disulphite nitrite Nitrites such as rohexylamine; polyol compounds such as polyalcohols and polyphenols; heteropolyacid salts such as sodium molybdate, sodium tungstate, sodium phosphonate, sodium chromate, sodium silicate; gelatin; polymer of carboxylic acid; nitro Compound: formaldehyde; acetylene alcohol; thiol compound such as aliphatic thiol, aromatic thiol, acetylene thiol; sulfide compound such as aliphatic sulfide, aromatic sulfide, acetylene sulfide; sulfoxide compound such as sulfoxide, dibenzyl sulfoxide; thiourea; Combination of amine or quaternary ammonium salt and halogen ion; Combination of alkylamine and potassium iodide; Combination of tannin and sodium phosphate; Triethanolamine Triethanolamine lauryl sarcosinate and combinations benzotriazole; alkylamine benzotriazole and combinations of sodium nitrite and sodium phosphate; and the like lauryl sarcosine combination with.
前記紫外線吸収剤/光安定剤としては、例えば、2-(5-メチル-2-ヒドロキシフェニル)ベンゾトリアゾール、2-[2-ヒドロキシ-3,5-ビス(α,α-ジメチルベンジル)フェニル]-2H-ベンゾトリアゾール、2-(3-t-ブチル-5-メチル-2-ヒドロキシフェニル)-5-クロロベンゾトリアゾール、2-(2’-ヒドロキシ-5’-t-オクチルフェニル)ベンゾトリアゾール、メチル-3-[3-t-ブチル-5-(2H-ベンゾトリアゾール-2-イル)-4-ヒドロキシフェニル]プロピオネート-ポリエチレングリコール(分子量約300)との縮合物、ヒドロキシフェニルベンゾトリアゾール誘導体、2-(4,6-ジフェニル-1,3,5-トリアジン-2-イル)-5[(ヘキシル)オキシ]-フェノール、2-エトキシ-2’-エチル-オキサリック酸ビスアニリド等が挙げられる。
Examples of the ultraviolet absorber / light stabilizer include 2- (5-methyl-2-hydroxyphenyl) benzotriazole, 2- [2-hydroxy-3,5-bis (α, α-dimethylbenzyl) phenyl]. -2H-benzotriazole, 2- (3-t-butyl-5-methyl-2-hydroxyphenyl) -5-chlorobenzotriazole, 2- (2'-hydroxy-5'-t-octylphenyl) benzotriazole, Condensates with methyl-3- [3-tert-butyl-5- (2H-benzotriazol-2-yl) -4-hydroxyphenyl] propionate-polyethylene glycol (molecular weight about 300), hydroxyphenylbenzotriazole derivatives, 2 -(4,6-diphenyl-1,3,5-triazin-2-yl) -5 [(hexyl) oxy]- Phenol, 2-ethoxy-2'-ethyl-oxalic acid bisanilide and the like.
前記防カビ剤/抗菌剤としては、2-(4-チアゾリル)ベンツイミダゾール、ソルビン酸、1,2-ベンズイソチアゾリン-3オン、(2-ピリジルチオ-1-オキシド)ナトリウム、デヒドロ酢酸、2-メチル-5-クロロ-4-イソチアゾロン錯体、2,4,5,6-テトラクロロフタロニトリル、2-ベンズイミダゾールカルバミン酸メチル、1-(ブチルカルバモイル)-2-ベンズイミダゾールカルバミン酸メチル、モノあるいはジブロモシアノアセトアミド類、1,2-ジブロモ-2,4-ジシアノブタン、1,1-ジブロモ-1-ニトロプロパノール及び1,1-ジブロモ-1-ニトロ-2-アセトキシプロパン等が挙げられる。
Examples of the fungicide / antibacterial agent include 2- (4-thiazolyl) benzimidazole, sorbic acid, 1,2-benzisothiazolin-3-one, (2-pyridylthio-1-oxide) sodium, dehydroacetic acid, 2-methyl -5-chloro-4-isothiazolone complex, 2,4,5,6-tetrachlorophthalonitrile, methyl 2-benzimidazole carbamate, methyl 1- (butylcarbamoyl) -2-benzimidazole carbamate, mono or dibromocyano Examples include acetamides, 1,2-dibromo-2,4-dicyanobutane, 1,1-dibromo-1-nitropropanol and 1,1-dibromo-1-nitro-2-acetoxypropane.
前記生物付着防止剤としては、テトラメチルチウラムジスルフィド、ビス(N,N-ジメチルジチオカルバミン酸)亜鉛、3-(3,4-ジクロロフェニル)-1,1-ジメチルウレア、ジクロロ-N-((ジメチルアミノ)スルフォニル)フルオロ-N-(P-トリル)メタンスルフェンアミド、ピリジン-トリフェニルボラン、N,N-ジメチル-N’-フェニル-N’-(フルオロジクロロメチルチオ)スルファミド、チオシアン酸第一銅(1)、酸化第一銅、テトラブチルチウラムジサルファイド、2,4,5,6-テトラクロロイソフタロニトリル、ジンクエチレンビスジチオカーバーメート、2,3,5,6-テトラクロロ-4-(メチルスルホニル)ピリジン、N-(2,4,6-トリクロロフェニル)マレイミド、ビス(2-ピリジンチオール-1-オキシド)亜鉛塩、ビス(2-ピリジンチオール-1-オキシド)銅塩、2-メチルチオ-4-t-ブチルアミノ-6-シクロプロピルアミノ-s-トリアジン、4,5-ジクロロ-2-n-オクチル-4-イソチアゾリン-3-オン、フラノン類、アルキルピリジン化合物、グラミン系化合物、イソニトリル化合物等が挙げられる。
Examples of the biological adhesion inhibitor include tetramethylthiuram disulfide, bis (N, N-dimethyldithiocarbamate) zinc, 3- (3,4-dichlorophenyl) -1,1-dimethylurea, dichloro-N-((dimethylamino ) Sulfonyl) fluoro-N- (P-tolyl) methanesulfenamide, pyridine-triphenylborane, N, N-dimethyl-N′-phenyl-N ′-(fluorodichloromethylthio) sulfamide, cuprous thiocyanate ( 1), cuprous oxide, tetrabutylthiuram disulfide, 2,4,5,6-tetrachloroisophthalonitrile, zinc ethylenebisdithiocarbamate, 2,3,5,6-tetrachloro-4- (methyl) Sulfonyl) pyridine, N- (2,4,6-trichlorophenyl) maleimide, bis ( -Pyridinethiol-1-oxide) zinc salt, bis (2-pyridinethiol-1-oxide) copper salt, 2-methylthio-4-t-butylamino-6-cyclopropylamino-s-triazine, 4,5- Examples include dichloro-2-n-octyl-4-isothiazolin-3-one, furanones, alkylpyridine compounds, gramine compounds, isonitrile compounds, and the like.
前記消臭剤としては、乳酸、コハク酸、リンゴ酸、クエン酸、マレイン酸、マロン酸、エチレンジアミンポリ酢酸、アルカン-1,2-ジカルボン酸、アルケン-1,2-ジカルボン酸、シクロアルカン-1,2-ジカルボン酸、シクロアルケン-1,2-ジカルボン酸、ナフタレンスルホン酸等の有機酸類;ウンデシレン酸亜鉛、2-エチルヘキサン酸亜鉛、リシノール酸亜鉛等の脂肪酸金属類;酸化鉄、硫酸鉄、酸化亜鉛、硫酸亜鉛、塩化亜鉛、酸化銀、酸化銅、金属(鉄、銅等)クロロフィリンナトリウム、金属(鉄、銅、コバルト等)フタロシアニン、金属(鉄、銅、コバルト等)テトラスルホン酸フタロシアニン、二酸化チタン、可視光応答型二酸化チタン(窒素ドープ型など)等の金属化合物;α-、β-又はγ-シクロデキストリン、そのメチル誘導体、ヒドロキシプロピル誘導体、グルコシル誘導体、マルトシル誘導体等のシクロデキストリン類;多孔メタクリル酸ポリマー、多孔アクリル酸ポリマー等のアクリル酸系ポリマー、多孔ジビニルベンゼンポリマー、多孔スチレン-ジビニルベンゼン-ビニルピリジンポリマー、多孔ジビニルベンゼン-ビニルピリジンポリマー等の芳香族系ポリマー、それらの共重合体及びキチン、キトサン、活性炭、シリカゲル、活性アルミナ、ゼオライト、セラミック等の多孔質体等が挙げられる。
Examples of the deodorizer include lactic acid, succinic acid, malic acid, citric acid, maleic acid, malonic acid, ethylenediaminepolyacetic acid, alkane-1,2-dicarboxylic acid, alkene-1,2-dicarboxylic acid, cycloalkane-1 , 2-dicarboxylic acid, cycloalkene-1,2-dicarboxylic acid, organic acids such as naphthalenesulfonic acid; fatty acid metals such as zinc undecylenate, zinc 2-ethylhexanoate, zinc ricinoleate; iron oxide, iron sulfate, Zinc oxide, zinc sulfate, zinc chloride, silver oxide, copper oxide, metal (iron, copper, etc.) chlorophyllin sodium, metal (iron, copper, cobalt etc.) phthalocyanine, metal (iron, copper, cobalt etc.) tetrasulfonic acid phthalocyanine, Metal compounds such as titanium dioxide, visible light responsive titanium dioxide (nitrogen doped type, etc.); α-, β- or γ-cyclodex Cyclodextrins such as phosphorus, its methyl derivatives, hydroxypropyl derivatives, glucosyl derivatives, maltosyl derivatives; acrylic polymers such as porous methacrylic acid polymers and porous acrylic acid polymers, porous divinylbenzene polymers, porous styrene-divinylbenzene-vinylpyridine Examples thereof include polymers, aromatic polymers such as porous divinylbenzene-vinylpyridine polymer, copolymers thereof, and porous materials such as chitin, chitosan, activated carbon, silica gel, activated alumina, zeolite, and ceramic.
前記顔料としては、カーボンブラック、酸化チタン、フタロシアニン系顔料、キナクリドン系顔料、イソインドリノン系顔料、ペリレン又はペリニン系顔料、キノフタロン系顔料、ジケトピロロ-ピロール系顔料、ジオキサジン系顔料、ジスアゾ縮合系顔料やベンズイミダゾロン系顔料等が挙げられる。
Examples of the pigment include carbon black, titanium oxide, phthalocyanine pigment, quinacridone pigment, isoindolinone pigment, perylene or perine pigment, quinophthalone pigment, diketopyrrolo-pyrrole pigment, dioxazine pigment, disazo condensation pigment, Examples include benzimidazolone pigments.
前記難燃剤としてはデカブロモビフェニル、三酸化アンチモン、リン系難燃剤、水酸化アルミニウム等が挙げられる。
Examples of the flame retardant include decabromobiphenyl, antimony trioxide, phosphorus flame retardant, aluminum hydroxide and the like.
前記帯電防止剤としては、4級アンモニウム塩型のカチオン界面活性剤、ベタイン型の両性界面活性剤、リン酸アルキル型のアニオン界面活性剤、第1級アミン塩、第2級アミン塩、第3級アミン塩、第4級アミン塩やピリジン誘導体等のカチオン界面活性剤、硫酸化油、石鹸、硫酸化エステル油、硫酸化アミド油、オレフィンの硫酸化エステル塩類、脂肪アルコール硫酸エステル塩類、アルキル硫酸エステル塩、脂肪酸エチルスルホン酸塩、アルキルナフタレンスルホン酸塩、アルキルベンゼンスルホン酸塩、琥珀酸エステルスルホン酸塩や燐酸エステル塩等のアニオン界面活性剤、多価アルコールの部分的脂肪酸エステル、脂肪アルコールのエチレンオキサイド付加物、脂肪酸のエチレンオキサイド付加物、脂肪アミノ又は脂肪酸アミドのエチレンオキサイド付加物、アルキルフェノールのエチレンオキサイド付加物、多価アルコールの部分的脂肪酸エステルのエチレンオキサイド付加物やポリエチレングリコール等のノニオン界面活性剤、カルボン酸誘導体やイミダゾリン誘導体等の両性界面活性剤等が挙げられる。
Examples of the antistatic agent include quaternary ammonium salt type cationic surfactants, betaine type amphoteric surfactants, alkyl phosphate type anionic surfactants, primary amine salts, secondary amine salts, thirds. Cationic surfactants such as quaternary amine salts, quaternary amine salts and pyridine derivatives, sulfated oils, soaps, sulfated ester oils, sulfated amide oils, sulfated ester salts of olefins, fatty alcohol sulfate esters, alkyl sulfates Anionic surfactants such as ester salts, fatty acid ethyl sulfonates, alkyl naphthalene sulfonates, alkyl benzene sulfonates, oxalate sulfonates and phosphate ester salts, partial fatty acid esters of polyhydric alcohols, fatty alcohol ethylenes Oxide adduct, fatty acid ethylene oxide adduct, fatty amino acid or fatty acid amino acid Ethylene oxide adducts of alkylphenols, ethylene oxide adducts of alkylphenols, ethylene oxide adducts of partial fatty acid esters of polyhydric alcohols, nonionic surfactants such as polyethylene glycol, amphoteric surfactants such as carboxylic acid derivatives and imidazoline derivatives, etc. Can be mentioned.
また、添加剤としてさらに、滑剤、充填剤、可塑剤、核剤、アンチブロッキング剤、発泡剤、乳化剤、光沢剤、結着剤等を共存させてもよい。
Further, as additives, lubricants, fillers, plasticizers, nucleating agents, antiblocking agents, foaming agents, emulsifiers, brighteners, binders, and the like may coexist.
これら添加剤を含む場合、添加剤の含有量は、組成物中、通常、0.1~70質量%であり、好ましくは0.1~50質量%であり、より好ましくは0.5~30質量%であり、さらに好ましくは2~15質量%である。
When these additives are included, the content of the additive is usually 0.1 to 70% by mass, preferably 0.1 to 50% by mass, more preferably 0.5 to 30% in the composition. % By mass, more preferably 2 to 15% by mass.
また、有機ケイ素化合物(a)、金属アルコキシド(b)及び含フッ素有機ケイ素化合物(f)の合計(溶剤(c)を含む場合、有機ケイ素化合物(a)と金属アルコキシド(b)と含フッ素有機ケイ素化合物(f)と溶剤(c)の合計)の含有量は、組成物中、通常60質量%以上であり、好ましくは75質量%以上、より好ましくは85質量%以上、さらに好ましくは95量%以上である。
Further, the sum of the organosilicon compound (a), the metal alkoxide (b) and the fluorinated organosilicon compound (f) (when the solvent (c) is included, the organosilicon compound (a), the metal alkoxide (b) and the fluorinated organic The content of the silicon compound (f) and the solvent (c)) is usually 60% by mass or more, preferably 75% by mass or more, more preferably 85% by mass or more, and still more preferably 95% in the composition. % Or more.
有機ケイ素化合物(a)、金属アルコキシド(b)及び含フッ素有機ケイ素化合物(f)とを基材と接触させる方法としては、例えば、スピンコーティング法、ディップコーティング法、スプレーコーティング法、ロールコート法、バーコート法、ダイコート法などが挙げられ、スピンコーティング法、スプレーコーティング法が好ましい。スピンコーティング法、スプレーコーティング法によれば、皮膜の厚さの調整が容易になる。
Examples of the method of bringing the organosilicon compound (a), the metal alkoxide (b), and the fluorine-containing organosilicon compound (f) into contact with the substrate include, for example, a spin coating method, a dip coating method, a spray coating method, a roll coating method, Examples thereof include a bar coating method and a die coating method, and a spin coating method and a spray coating method are preferable. According to the spin coating method and the spray coating method, the thickness of the film can be easily adjusted.
この際、組成物は、必要に応じて、さらに希釈しておいてもよい。希釈倍率は、希釈前の組成物に対して、例えば2~100倍であり、好ましくは5~50倍である。希釈溶剤としては、溶剤(c)として例示した溶媒を適宜使用することができる。
At this time, the composition may be further diluted as necessary. The dilution factor is, for example, 2 to 100 times, preferably 5 to 50 times that of the composition before dilution. As a dilution solvent, the solvent illustrated as a solvent (c) can be used suitably.
本発明の組成物と基材とを接触させた状態で、空気中で静置することで、空気中の水分を取り込んで加水分解性基が加水分解されてシロキサン骨格を形成し、皮膜が形成される。静置する際、40~250℃で保持してもよい。
By leaving the composition of the present invention and the substrate in contact with each other in the air, moisture in the air is taken in and hydrolyzable groups are hydrolyzed to form a siloxane skeleton, thereby forming a film. Is done. When allowed to stand, it may be kept at 40 to 250 ° C.
上記組成物から形成される皮膜も本発明の範囲に包含される。該皮膜には、有機ケイ素化合物(a)、金属アルコキシド(b)及び含フッ素有機ケイ素化合物(f)に由来する構造が含まれる。
A film formed from the above composition is also included in the scope of the present invention. The coating includes a structure derived from the organosilicon compound (a), the metal alkoxide (b), and the fluorine-containing organosilicon compound (f).
本発明の皮膜に対する水の初期接触角θ01は、80°以上であることが好ましく、より好ましくは90°以上、さらに好ましくは100°以上であり、140°以下であってもよく、さらには130°以下であってもよい。
前記接触角は、液量3.0μLの水を用い、θ/2法により測定した値を意味する。 The initial contact angle of water θ 01 for the film of the present invention is preferably 80 ° or more, more preferably 90 ° or more, still more preferably 100 ° or more, and may be 140 ° or less. It may be 130 ° or less.
The contact angle means a value measured by the θ / 2 method using 3.0 μL of water.
前記接触角は、液量3.0μLの水を用い、θ/2法により測定した値を意味する。 The initial contact angle of water θ 01 for the film of the present invention is preferably 80 ° or more, more preferably 90 ° or more, still more preferably 100 ° or more, and may be 140 ° or less. It may be 130 ° or less.
The contact angle means a value measured by the θ / 2 method using 3.0 μL of water.
本発明の皮膜に対する油の初期接触角θ02は、55°以上であることが好ましく、より好ましくは60°以上、さらに好ましくは65°以上であり、120°以下であってもよく、さらには110°以下であってもよい。
前記接触角は、液量3.0μLのヘキサデカンを用い、θ/2法により測定した値を意味する。 The initial contact angle θ 02 of the oil with respect to the film of the present invention is preferably 55 ° or more, more preferably 60 ° or more, still more preferably 65 ° or more, and may be 120 ° or less. It may be 110 ° or less.
The contact angle means a value measured by the θ / 2 method using hexadecane having a liquid volume of 3.0 μL.
前記接触角は、液量3.0μLのヘキサデカンを用い、θ/2法により測定した値を意味する。 The initial contact angle θ 02 of the oil with respect to the film of the present invention is preferably 55 ° or more, more preferably 60 ° or more, still more preferably 65 ° or more, and may be 120 ° or less. It may be 110 ° or less.
The contact angle means a value measured by the θ / 2 method using hexadecane having a liquid volume of 3.0 μL.
本発明の皮膜は、70℃のイオン交換水に12時間浸漬した後の接触角をθw2としたとき、下記式で表される接触角変化率dw2は、-25%以上であることが好ましく、より好ましくは-15%以上、さらに好ましくは-12%以上であり、0%であることが好ましいものの、-1%以下、さらには-5%以下であることも許容される。
接触角変化率dw2(%)=(θw2-θ01)/θ01×100 The film of the present invention has a contact angle change rate d w2 represented by the following formula of −25% or more when the contact angle after immersion in ion exchange water at 70 ° C. for 12 hours is θ w2. Preferably, it is -15% or more, more preferably -12% or more, and preferably 0%, but it is also acceptable that it is -1% or less, and further -5% or less.
Contact angle change rate d w2 (%) = (θ w2 −θ 01 ) / θ 01 × 100
接触角変化率dw2(%)=(θw2-θ01)/θ01×100 The film of the present invention has a contact angle change rate d w2 represented by the following formula of −25% or more when the contact angle after immersion in ion exchange water at 70 ° C. for 12 hours is θ w2. Preferably, it is -15% or more, more preferably -12% or more, and preferably 0%, but it is also acceptable that it is -1% or less, and further -5% or less.
Contact angle change rate d w2 (%) = (θ w2 −θ 01 ) / θ 01 × 100
有機ケイ素化合物(a)に由来する構造(A)は、式(IA)で表される。
The structure (A) derived from the organosilicon compound (a) is represented by the formula (IA).
[式(IA)中、Raはトリアルキルシリル基含有分子鎖を表し、Za1は、トリアルキルシリル基含有分子鎖、シロキサン骨格含有基、炭化水素鎖含有基又は-O-基を表す。]
[In the formula (IA), R a represents a trialkylsilyl group-containing molecular chain, and Z a1 represents a trialkylsilyl group-containing molecular chain, a siloxane skeleton-containing group, a hydrocarbon chain-containing group, or an —O— group. ]
式(IA)中、Ra、Za1のトリアルキルシリル基含有分子鎖、Za1のシロキサン骨格含有基、炭化水素鎖含有基は、それぞれ、トリアルキルシリル基含有分子鎖、シロキサン骨格含有基、炭化水素鎖含有基として上記説明した範囲から適宜選択できる。
中でも、式(IA)中、Za1は、シロキサン骨格含有基又は-O-基であることが好ましく、-O-基であることがより好ましい。 In the formula (IA), a trialkylsilyl group-containing molecular chain of R a , Z a1 , a siloxane skeleton-containing group of Z a1 , and a hydrocarbon chain-containing group are respectively a trialkylsilyl group-containing molecular chain, a siloxane skeleton-containing group, The hydrocarbon chain-containing group can be appropriately selected from the range described above.
In particular, in the formula (IA), Z a1 is preferably a siloxane skeleton-containing group or an —O— group, and more preferably an —O— group.
中でも、式(IA)中、Za1は、シロキサン骨格含有基又は-O-基であることが好ましく、-O-基であることがより好ましい。 In the formula (IA), a trialkylsilyl group-containing molecular chain of R a , Z a1 , a siloxane skeleton-containing group of Z a1 , and a hydrocarbon chain-containing group are respectively a trialkylsilyl group-containing molecular chain, a siloxane skeleton-containing group, The hydrocarbon chain-containing group can be appropriately selected from the range described above.
In particular, in the formula (IA), Z a1 is preferably a siloxane skeleton-containing group or an —O— group, and more preferably an —O— group.
構造(A)としては、式(IA-I)で表される構造が挙げられる。下記式(IA-I-1)~(IA-I-50)は、式(IA-I)で表される構造の具体例であるが、これらに限られるものではない。式(IA-I)で表される構造において、これに含まれる複数のRs20及び複数のRs10は、それぞれ同一であってもよいし、異なっていてもよい。
As the structure (A), a structure represented by the formula (IA-I) can be given. The following formulas (IA-I-1) to (IA-I-50) are specific examples of the structure represented by the formula (IA-I), but are not limited thereto. In the structure represented by the formula (IA-I), the plurality of R s20 and the plurality of R s10 included therein may be the same or different.
また、金属アルコキシド(b)に由来する構造(B)では、金属原子(ただし金属原子がケイ素原子である場合、トリアルキルシリル基含有分子鎖が結合しているケイ素原子とは異なる)に結合する基(炭化水素鎖含有基、シロキサン骨格含有基、ヒドロキシ基等)は、トリアルキルシリル基含有分子鎖よりも構成原子数が少ないため、該構造(B)がスペーサーとして作用する結果、トリアルキルシリル基含有分子鎖による撥水特性向上作用が高められやすくなる。また、金属アルコキシド(b)を含むことによって、耐温水性が高く、実用耐久性に優れた膜を得ることが出来る。
Further, in the structure (B) derived from the metal alkoxide (b), it is bonded to a metal atom (however, when the metal atom is a silicon atom, it is different from the silicon atom to which the trialkylsilyl group-containing molecular chain is bonded). Since the group (hydrocarbon chain-containing group, siloxane skeleton-containing group, hydroxy group, etc.) has fewer constituent atoms than the trialkylsilyl group-containing molecular chain, the structure (B) acts as a spacer. The effect of improving water repellency by the group-containing molecular chain is likely to be enhanced. In addition, by including the metal alkoxide (b), it is possible to obtain a film having high warm water resistance and excellent practical durability.
金属アルコキシド(b)に由来する構造(B)は、式(IIB)で表される。
The structure (B) derived from the metal alkoxide (b) is represented by the formula (IIB).
[式(IIB)中、M、kは上記と同義である。Rb2は、ヒドロキシ基又は-O-基を表す。]
[In formula (IIB), M and k are as defined above. R b2 represents a hydroxy group or a —O— group. ]
構造(B)としては、MがSiの場合、下記式で表される構造が挙げられる。
Structure (B) includes a structure represented by the following formula when M is Si.
含フッ素有機ケイ素化合物(f)に由来する構造(F)は、式(IIIF-1)又は(IIIF-2)で表される。
The structure (F) derived from the fluorine-containing organosilicon compound (f) is represented by the formula (IIIF-1) or (IIIF-2).
[式(IIIF-1)及び式(IIIF-2)中、Rf1、Rf2は上記と同義である。Zf2は、シロキサン骨格含有基、炭化水素鎖含有基、ヒドロキシ基又は-O-基を表す。Af3は、炭素数1~12の含フッ素アルキル基、炭素数1~4のアルキル基、ヒドロキシ基又は-O-基を表す。]
[In Formula (IIIF-1) and Formula (IIIF-2), R f1 and R f2 are as defined above. Z f2 represents a siloxane skeleton-containing group, a hydrocarbon chain-containing group, a hydroxy group, or an —O— group. A f3 represents a fluorine-containing alkyl group having 1 to 12 carbon atoms, an alkyl group having 1 to 4 carbon atoms, a hydroxy group, or an —O— group. ]
Zf2で表されるシロキサン骨格含有基又は炭化水素鎖含有基としては、Za2で表されるシロキサン骨格含有基、炭化水素鎖含有基とそれぞれ同様の基が挙げられる。
The siloxane skeleton-containing group or a hydrocarbon chain-containing group represented by Z f2, a siloxane skeleton-containing group represented by Z a2, include hydrocarbon chains containing groups and each similar group.
構造(F)としては、下記式で表される構造が挙げられる。式中、r8は1~20の整数であり、好ましくは1~10の整数である。r9は1~10の整数であり、好ましくは1~5の整数である。r10は1~10の整数であり、好ましくは1~5の整数である。
Structure (F) includes a structure represented by the following formula. In the formula, r8 is an integer of 1 to 20, preferably an integer of 1 to 10. r9 is an integer of 1 to 10, preferably an integer of 1 to 5. r10 is an integer of 1 to 10, preferably an integer of 1 to 5.
本発明の組成物から形成される皮膜は、トリアルキルシリル基含有分子鎖及び含フッ素基を有するものであり、且つ金属アルコキシド(b)に由来してスペーサーとしての機能を発揮できる部位を有するものであるため、撥水性及び撥油性を両立することができるとともに、皮膜表面の平滑性も良好である。
The film formed from the composition of the present invention has a trialkylsilyl group-containing molecular chain and a fluorine-containing group, and has a part that can function as a spacer derived from the metal alkoxide (b). Therefore, both water repellency and oil repellency can be achieved, and the smoothness of the coating surface is also good.
基材上に本発明の皮膜を形成した皮膜処理基材も本発明の範囲に包含される。基材の形状は、平面、曲面のいずれでもよいし、多数の面が組み合わさった三次元的構造でもよい。また、基材は、有機系材料、無機系材料のいずれで構成されていてもよく、前記有機系材料としては、アクリル樹脂、ポリカーボネート樹脂、ポリエステル樹脂、スチレン樹脂、アクリル-スチレン共重合樹脂、セルロース樹脂、ポリオレフィン樹脂、ポリビニルアルコール等の熱可塑性樹脂;フェノール樹脂、ユリア樹脂、メラミン樹脂、エポキシ樹脂、不飽和ポリエステル、シリコーン樹脂、ウレタン樹脂等の熱硬化性樹脂;等が挙げられ、無機系材料としては、セラミックス;ガラス;鉄、シリコン、銅、亜鉛、アルミニウム、等の金属;前記金属を含む合金;等が挙げられる。
前記基材には、予め易接着処理を施しておいてもよい。易接着処理としては、コロナ処理、プラズマ処理、紫外線処理等の親水化処理が挙げられる。また、樹脂、シランカップリング剤、テトラアルコキシシラン等によるプライマー処理を用いてもよい。 A film-treated substrate in which the film of the present invention is formed on the substrate is also included in the scope of the present invention. The shape of the substrate may be either a flat surface or a curved surface, or may be a three-dimensional structure in which a large number of surfaces are combined. The substrate may be composed of any organic material or inorganic material. Examples of the organic material include acrylic resin, polycarbonate resin, polyester resin, styrene resin, acrylic-styrene copolymer resin, cellulose Thermoplastic resins such as resins, polyolefin resins, polyvinyl alcohol, etc .; thermosetting resins such as phenol resins, urea resins, melamine resins, epoxy resins, unsaturated polyesters, silicone resins, urethane resins; Are ceramics; glass; metals such as iron, silicon, copper, zinc, and aluminum; alloys containing the metals;
The substrate may be subjected to an easy adhesion treatment in advance. Examples of the easy adhesion treatment include hydrophilic treatment such as corona treatment, plasma treatment, and ultraviolet treatment. Further, primer treatment with a resin, a silane coupling agent, tetraalkoxysilane, or the like may be used.
前記基材には、予め易接着処理を施しておいてもよい。易接着処理としては、コロナ処理、プラズマ処理、紫外線処理等の親水化処理が挙げられる。また、樹脂、シランカップリング剤、テトラアルコキシシラン等によるプライマー処理を用いてもよい。 A film-treated substrate in which the film of the present invention is formed on the substrate is also included in the scope of the present invention. The shape of the substrate may be either a flat surface or a curved surface, or may be a three-dimensional structure in which a large number of surfaces are combined. The substrate may be composed of any organic material or inorganic material. Examples of the organic material include acrylic resin, polycarbonate resin, polyester resin, styrene resin, acrylic-styrene copolymer resin, cellulose Thermoplastic resins such as resins, polyolefin resins, polyvinyl alcohol, etc .; thermosetting resins such as phenol resins, urea resins, melamine resins, epoxy resins, unsaturated polyesters, silicone resins, urethane resins; Are ceramics; glass; metals such as iron, silicon, copper, zinc, and aluminum; alloys containing the metals;
The substrate may be subjected to an easy adhesion treatment in advance. Examples of the easy adhesion treatment include hydrophilic treatment such as corona treatment, plasma treatment, and ultraviolet treatment. Further, primer treatment with a resin, a silane coupling agent, tetraalkoxysilane, or the like may be used.
プライマー層としては、シロキサン骨格を形成しうる成分(P)(以下、成分(P)という場合がある。)を含むプライマー層形成用組成物から形成された層が好ましい。プライマー層形成用組成物は、成分(P)として下記式(Pa)で表される化合物(以下、化合物(Pa)という場合がある。)及び/又はその部分加水分解縮合物からなる(P1)成分を含むことが好ましい。
Si(XP2)4 …(Pa)
[式(Pa)中、XP2は、ハロゲン原子、アルコキシ基又はイソシアネート基を示す。] The primer layer is preferably a layer formed from a primer layer forming composition containing a component (P) capable of forming a siloxane skeleton (hereinafter sometimes referred to as component (P)). The composition for forming a primer layer comprises a compound represented by the following formula (Pa) as the component (P) (hereinafter sometimes referred to as a compound (Pa)) and / or a partial hydrolysis condensate thereof (P1). It is preferable to include a component.
Si (X P2 ) 4 (Pa)
[In the formula (Pa), X P2 represents a halogen atom, an alkoxy group or an isocyanate group. ]
Si(XP2)4 …(Pa)
[式(Pa)中、XP2は、ハロゲン原子、アルコキシ基又はイソシアネート基を示す。] The primer layer is preferably a layer formed from a primer layer forming composition containing a component (P) capable of forming a siloxane skeleton (hereinafter sometimes referred to as component (P)). The composition for forming a primer layer comprises a compound represented by the following formula (Pa) as the component (P) (hereinafter sometimes referred to as a compound (Pa)) and / or a partial hydrolysis condensate thereof (P1). It is preferable to include a component.
Si (X P2 ) 4 (Pa)
[In the formula (Pa), X P2 represents a halogen atom, an alkoxy group or an isocyanate group. ]
上記式(Pa)中、XP2は、塩素原子、炭素原子数1~4のアルコキシ基又はイソシアネート基であることが好ましく、4個のXP2が同一であることが好ましい。
In the above formula (Pa), X P2 is preferably a chlorine atom, an alkoxy group having 1 to 4 carbon atoms or an isocyanate group, and preferably four X P2 are the same.
化合物(Pa)としては、1種又は2種以上を用いることができ、Si(NCO)4、Si(OCH3)4、Si(OC2H5)4等が好ましい。
As the compound (Pa), can be used alone or in combination, Si (NCO) 4, Si (OCH 3) 4, Si (OC 2 H 5) 4 and the like are preferable.
プライマー層形成用組成物に含まれる(P1)成分は、化合物(Pa)の部分加水分解縮合物であってもよい。化合物(Pa)の部分加水分解縮合物は、酸触媒や塩基触媒を用い、一般的な加水分解縮合方法により製造することができる。部分加水分解縮合物の縮合度(多量化度)は、生成物が溶媒に溶解する程度であることが好ましい。(Pa)成分としては、化合物(Pa)であっても、化合物(Pa)の部分加水分解縮合物であってもよく、化合物(Pa)とその部分加水分解縮合物との混合物、例えば、未反応の化合物(Pa)が含まれる化合物(Pa)の部分加水分解縮合物であってもよい。化合物(Pa)やその部分加水分解縮合物としては市販品を用いることもできる。
(P1) component contained in the primer layer forming composition may be a partial hydrolysis-condensation product of the compound (Pa). The partial hydrolysis-condensation product of compound (Pa) can be produced by a general hydrolysis-condensation method using an acid catalyst or a base catalyst. The degree of condensation (degree of multimerization) of the partially hydrolyzed condensate is preferably such that the product is dissolved in the solvent. The component (Pa) may be a compound (Pa) or a partial hydrolysis condensate of the compound (Pa), and a mixture of the compound (Pa) and its partial hydrolysis condensate, for example, It may be a partially hydrolyzed condensate of the compound (Pa) containing the reaction compound (Pa). A commercial item can also be used as a compound (Pa) and its partial hydrolysis-condensation product.
また、プライマー層形成用組成物は、成分(P)として、さらに式(Pb)で表される化合物(以下、化合物(Pb)という場合がある)及び/又はその部分加水分解縮合物からなる(P2)成分を含んでいてもよい。
(XP3)3Si-(CH2)p-Si(XP3)3 …(Pb)
[ただし、式(Pb)中、XP3はそれぞれ独立して加水分解性基又は水酸基を示し、pは1~8の整数である。] The primer layer forming composition further comprises, as component (P), a compound represented by formula (Pb) (hereinafter sometimes referred to as compound (Pb)) and / or a partially hydrolyzed condensate thereof ( P2) component may be included.
(X P3 ) 3 Si— (CH 2 ) p —Si (X P3 ) 3 (Pb)
[In the formula (Pb), X P3 independently represents a hydrolyzable group or a hydroxyl group, and p is an integer of 1 to 8. ]
(XP3)3Si-(CH2)p-Si(XP3)3 …(Pb)
[ただし、式(Pb)中、XP3はそれぞれ独立して加水分解性基又は水酸基を示し、pは1~8の整数である。] The primer layer forming composition further comprises, as component (P), a compound represented by formula (Pb) (hereinafter sometimes referred to as compound (Pb)) and / or a partially hydrolyzed condensate thereof ( P2) component may be included.
(X P3 ) 3 Si— (CH 2 ) p —Si (X P3 ) 3 (Pb)
[In the formula (Pb), X P3 independently represents a hydrolyzable group or a hydroxyl group, and p is an integer of 1 to 8. ]
式(Pb)中、XP3で示される加水分解性基としては、上記XP2と同様の基又は原子が挙げられる。化合物(Pb)の安定性と加水分解のし易さとのバランスの点から、XP3としては、アルコキシ基及びイソシアネート基が好ましく、アルコキシ基が特に好ましい。
アルコキシ基としては、炭素原子数1~4のアルコキシ基が好ましく、メトキシ基又はエトキシ基がより好ましい。化合物(Pb)中に複数個存在するXP3は同じ基でも異なる基でもよく、同じ基であることが入手しやすさの点で好ましい。 In the formula (Pb), examples of the hydrolyzable group represented by X P3 include the same groups or atoms as those of X P2 . In view of the balance between the stability of the compound (Pb) and the ease of hydrolysis, X P3 is preferably an alkoxy group or an isocyanate group, and particularly preferably an alkoxy group.
As the alkoxy group, an alkoxy group having 1 to 4 carbon atoms is preferable, and a methoxy group or an ethoxy group is more preferable. A plurality of X P3 present in the compound (Pb) may be the same group or different groups, and the same group is preferable from the viewpoint of availability.
アルコキシ基としては、炭素原子数1~4のアルコキシ基が好ましく、メトキシ基又はエトキシ基がより好ましい。化合物(Pb)中に複数個存在するXP3は同じ基でも異なる基でもよく、同じ基であることが入手しやすさの点で好ましい。 In the formula (Pb), examples of the hydrolyzable group represented by X P3 include the same groups or atoms as those of X P2 . In view of the balance between the stability of the compound (Pb) and the ease of hydrolysis, X P3 is preferably an alkoxy group or an isocyanate group, and particularly preferably an alkoxy group.
As the alkoxy group, an alkoxy group having 1 to 4 carbon atoms is preferable, and a methoxy group or an ethoxy group is more preferable. A plurality of X P3 present in the compound (Pb) may be the same group or different groups, and the same group is preferable from the viewpoint of availability.
化合物(Pb)としては、1種又は2種以上を用いることができ、(CH3O)3SiCH2CH2Si(OCH3)3、(OCN)3SiCH2CH2Si(NCO)3、Cl3SiCH2CH2SiCl3、(C2H5O)3SiCH2CH2Si(OC2H5)3、(CH3O)3SiCH2CH2CH2CH2CH2CH2Si(OCH3)3等が挙げられる。
As the compound (Pb), one or more kinds can be used, and (CH 3 O) 3 SiCH 2 CH 2 Si (OCH 3 ) 3 , (OCN) 3 SiCH 2 CH 2 Si (NCO) 3 , Cl 3 SiCH 2 CH 2 SiCl 3 , (C 2 H 5 O) 3 SiCH 2 CH 2 Si (OC 2 H 5) 3, (CH 3 O) 3 SiCH 2 CH 2 CH 2 CH 2 CH 2 CH 2 Si ( OCH 3 ) 3 and the like.
成分(P2)は、化合物(Pb)の部分加水分解縮合物であってもよい。化合物(Pb)の部分加水分解縮合物は、化合物(Pa)の部分加水分解縮合物の製造において説明したのと同様の方法で得ることができる。部分加水分解縮合物の縮合度(多量化度)は、生成物が溶媒に溶解する程度であることが好ましい。成分(P2)としては、化合物(Pb)であっても、化合物(Pb)の部分加水分解縮合物であってもよく、化合物(Pb)とその部分加水分解縮合物との混合物、例えば、未反応の化合物(Pb)が含まれる化合物(Pb)の部分加水分解縮合物であってもよい。化合物(Pb)やその部分加水分解縮合物としては市販品を用いることも可能である。
またプライマー層形成用組成物には、成分(P)として化合物(Pb)と化合物(Pa)との共加水分解による共加水分解縮合物が含まれていてもよく、各種ポリシラザンが含まれていてもよい。 Component (P2) may be a partially hydrolyzed condensate of compound (Pb). The partially hydrolyzed condensate of compound (Pb) can be obtained by the same method as described in the production of the partially hydrolyzed condensate of compound (Pa). The degree of condensation (degree of multimerization) of the partially hydrolyzed condensate is preferably such that the product is dissolved in the solvent. Component (P2) may be compound (Pb) or a partial hydrolysis condensate of compound (Pb), and a mixture of compound (Pb) and its partial hydrolysis condensate, for example, It may be a partial hydrolysis-condensation product of the compound (Pb) containing the reaction compound (Pb). Commercially available products can also be used as the compound (Pb) and its partial hydrolysis condensate.
The primer layer forming composition may contain a cohydrolysis condensate by cohydrolysis of the compound (Pb) and the compound (Pa) as the component (P), and various polysilazanes are contained. Also good.
またプライマー層形成用組成物には、成分(P)として化合物(Pb)と化合物(Pa)との共加水分解による共加水分解縮合物が含まれていてもよく、各種ポリシラザンが含まれていてもよい。 Component (P2) may be a partially hydrolyzed condensate of compound (Pb). The partially hydrolyzed condensate of compound (Pb) can be obtained by the same method as described in the production of the partially hydrolyzed condensate of compound (Pa). The degree of condensation (degree of multimerization) of the partially hydrolyzed condensate is preferably such that the product is dissolved in the solvent. Component (P2) may be compound (Pb) or a partial hydrolysis condensate of compound (Pb), and a mixture of compound (Pb) and its partial hydrolysis condensate, for example, It may be a partial hydrolysis-condensation product of the compound (Pb) containing the reaction compound (Pb). Commercially available products can also be used as the compound (Pb) and its partial hydrolysis condensate.
The primer layer forming composition may contain a cohydrolysis condensate by cohydrolysis of the compound (Pb) and the compound (Pa) as the component (P), and various polysilazanes are contained. Also good.
プライマー層形成用組成物は、通常、層構成成分となる固形分の他に、経済性、作業性、得られるプライマー層の厚さ制御のしやすさ等を考慮して、有機溶剤を含む。有機溶剤は、プライマー層形成用組成物が含有する固形分を溶解するものであることが好ましく、組成物に用いられる溶剤(c)と同様の溶剤が挙げられる。有機溶剤は1種に限定されず、極性、蒸発速度等の異なる2種以上の溶剤を混合して使用してもよい。
プライマー層形成用組成物は、部分加水分解縮合物や部分加水分解共縮合物を含有する場合、これらを製造するために使用した溶媒を含んでもよい。 The composition for forming a primer layer usually contains an organic solvent in consideration of economic efficiency, workability, ease of control of the thickness of the resulting primer layer, etc., in addition to the solid content as a layer constituent component. The organic solvent is preferably one that dissolves the solid content contained in the primer layer forming composition, and examples thereof include the same solvents as the solvent (c) used in the composition. The organic solvent is not limited to one kind, and two or more kinds of solvents having different polarities and evaporation rates may be mixed and used.
When the composition for primer layer formation contains a partial hydrolysis-condensation product and a partial hydrolysis-condensation product, it may contain the solvent used in order to manufacture these.
プライマー層形成用組成物は、部分加水分解縮合物や部分加水分解共縮合物を含有する場合、これらを製造するために使用した溶媒を含んでもよい。 The composition for forming a primer layer usually contains an organic solvent in consideration of economic efficiency, workability, ease of control of the thickness of the resulting primer layer, etc., in addition to the solid content as a layer constituent component. The organic solvent is preferably one that dissolves the solid content contained in the primer layer forming composition, and examples thereof include the same solvents as the solvent (c) used in the composition. The organic solvent is not limited to one kind, and two or more kinds of solvents having different polarities and evaporation rates may be mixed and used.
When the composition for primer layer formation contains a partial hydrolysis-condensation product and a partial hydrolysis-condensation product, it may contain the solvent used in order to manufacture these.
さらに、プライマー層形成用組成物においては、部分加水分解縮合物や部分加水分解共縮合物を含まないものであっても、加水分解共縮合反応を促進させるために、部分加水分解縮合の反応において一般的に使用されるのと同様の酸触媒等の触媒を配合しておくことも好ましい。部分加水分解縮合物や部分加水分解共縮合物を含む場合であっても、それらの製造に使用した触媒が組成物中に残存していない場合は、触媒を配合することが好ましい。プライマー層形成用組成物は、上記含有成分が加水分解縮合反応や加水分解共縮合反応するための水を含んでいてもよい。
Furthermore, in the composition for forming a primer layer, even if it does not contain a partial hydrolysis condensate or partial hydrolysis cocondensate, in order to promote the hydrolysis cocondensation reaction, It is also preferable to blend a catalyst such as an acid catalyst that is generally used. Even when a partially hydrolyzed condensate or a partially hydrolyzed cocondensate is included, when the catalyst used for the production thereof does not remain in the composition, it is preferable to add a catalyst. The composition for forming a primer layer may contain water for the above-described components to undergo a hydrolysis condensation reaction or a hydrolysis cocondensation reaction.
プライマー層形成用組成物を用いて下地層を形成する方法としては、オルガノシラン化合物系の表面処理剤における公知の方法を用いることが可能である。例えば、はけ塗り、流し塗り、回転塗布、浸漬塗布、スキージ塗布、スプレー塗布、手塗り等の方法で下地層形成用組成物を基体の表面に塗布し、大気中又は窒素雰囲気中において、必要に応じて乾燥した後、硬化させることで、下地層を形成できる。硬化の条件は、用いる組成物の種類、濃度等により適宜制御される。なお、プライマー層形成用組成物の硬化は、組成物の硬化と同時に行ってもよい。
As a method for forming the underlayer using the primer layer forming composition, a known method for an organosilane compound-based surface treatment agent can be used. For example, the base layer forming composition is applied to the surface of the substrate by brush coating, flow coating, spin coating, dip coating, squeegee coating, spray coating, hand coating, or the like, and is necessary in the air or in a nitrogen atmosphere. The base layer can be formed by curing after drying according to the above. Curing conditions are appropriately controlled depending on the type and concentration of the composition used. In addition, you may perform hardening of the composition for primer layer formation simultaneously with hardening of a composition.
プライマー層の厚さは、その上に形成される皮膜に耐湿性、密着性、基体からのアルカリ等のバリア性を付与できる厚さであれば特に限定されない。
The thickness of the primer layer is not particularly limited as long as it can provide moisture resistance, adhesion, and barrier properties such as alkali from the substrate to the film formed thereon.
本発明の組成物から形成される皮膜は、撥水性及び撥油性、密着性及び製膜性を両立でき、タッチパネルディスプレイ等の表示装置、光学素子、半導体素子、建築材料、自動車部品、ナノインプリント技術等における基材として有用である。本発明の組成物から形成される皮膜は、電車、自動車、船舶、航空機等の輸送機器におけるボディー、窓ガラス(フロントガラス、サイドガラス、リアガラス)、ミラー、バンパー等の物品として好適に用いられる。また、建築物外壁、テント、太陽光発電モジュール、遮音板、コンクリート、などの屋外用途にも用いることができる。漁網、虫取り網、水槽などにも用いることができる。更に、台所、風呂場、洗面台、鏡、トイレ周りの各部材の物品、シャンデリア、タイルなどの陶磁器、人工大理石、エアコン等の各種屋内設備にも利用可能である。また、工場内の治具や内壁、配管等の防汚処理としても用いることができる。ゴーグル、眼鏡、ヘルメット、パチンコ、繊維、傘、遊具、サッカーボールなどにも好適である。更に、食品用包材、化粧品用包材、ポットの内部、など、各種包材の付着防止剤としても用いることができる。
The film formed from the composition of the present invention can achieve both water repellency and oil repellency, adhesion and film-forming properties, display devices such as touch panel displays, optical elements, semiconductor elements, building materials, automobile parts, nanoimprint technology, etc. It is useful as a base material. The film formed from the composition of the present invention is suitably used as an article such as a body, window glass (front glass, side glass, rear glass), mirror, bumper and the like in transportation equipment such as trains, automobiles, ships, and airplanes. Moreover, it can also be used for outdoor uses, such as a building outer wall, a tent, a solar power generation module, a sound insulation board, and concrete. It can also be used for fishing nets, insect nets, water tanks, and the like. Furthermore, it can be used for various indoor facilities such as kitchens, bathrooms, washstands, mirrors, toilet articles, ceramics such as chandeliers and tiles, artificial marble, and air conditioners. It can also be used as an antifouling treatment for jigs, inner walls, pipes and the like in factories. It is also suitable for goggles, glasses, helmets, slingshots, textiles, umbrellas, play equipment, soccer balls and the like. Furthermore, it can also be used as an anti-adhesive agent for various packaging materials such as food packaging materials, cosmetic packaging materials, and the inside of pots.
以下、実施例を挙げて本発明をより具体的に説明するが、本発明はもとより下記実施例によって制限を受けるものではなく、前記及び後記の趣旨に適合し得る範囲で適当に変更を加えて実施することも勿論可能であり、それらはいずれも本発明の技術的範囲に包含される。なお、以下においては、特に断りのない限り、「部」は「質量部」を、「%」は「質量%」を意味する。
EXAMPLES Hereinafter, the present invention will be described more specifically with reference to examples. However, the present invention is not limited by the following examples, but may be appropriately modified within a range that can be adapted to the above and the following. Of course, it is possible to implement them, and they are all included in the technical scope of the present invention. In the following, “part” means “part by mass” and “%” means “mass%” unless otherwise specified.
接触角評価
協和界面科学社製DM700を使用し、液滴法(解析方法:θ/2法)で、皮膜表面の水及びヘキサデカンの接触角を測定した。水滴量は3.0μLであり、油滴量は3.0μLである。 Contact angle evaluation Using DM700 manufactured by Kyowa Interface Science Co., Ltd., the contact angle of water and hexadecane on the film surface was measured by the droplet method (analysis method: θ / 2 method). The amount of water droplets is 3.0 μL, and the amount of oil droplets is 3.0 μL.
協和界面科学社製DM700を使用し、液滴法(解析方法:θ/2法)で、皮膜表面の水及びヘキサデカンの接触角を測定した。水滴量は3.0μLであり、油滴量は3.0μLである。 Contact angle evaluation Using DM700 manufactured by Kyowa Interface Science Co., Ltd., the contact angle of water and hexadecane on the film surface was measured by the droplet method (analysis method: θ / 2 method). The amount of water droplets is 3.0 μL, and the amount of oil droplets is 3.0 μL.
照度1000ルクスの環境において、皮膜を目視にて観察し、着色や異物の有無(以下、まとめて「汚れ」と記載する)を官能評価にて、以下の通り製膜性を評価した。
◎:全く汚れがない
○:よく見ると汚れが確認できる
△:膜の部分的な汚れが確認できる
×:膜の全体的な汚れが確認できる In an environment with an illuminance of 1000 lux, the film was visually observed, and the presence or absence of coloring or foreign matter (hereinafter collectively referred to as “dirt”) was evaluated by sensory evaluation, and the film forming property was evaluated as follows.
◎: No dirt at all ○: Dirt can be confirmed by looking closely △: Partial dirt on the film can be confirmed ×: Overall dirt on the film can be confirmed
◎:全く汚れがない
○:よく見ると汚れが確認できる
△:膜の部分的な汚れが確認できる
×:膜の全体的な汚れが確認できる In an environment with an illuminance of 1000 lux, the film was visually observed, and the presence or absence of coloring or foreign matter (hereinafter collectively referred to as “dirt”) was evaluated by sensory evaluation, and the film forming property was evaluated as follows.
◎: No dirt at all ○: Dirt can be confirmed by looking closely △: Partial dirt on the film can be confirmed ×: Overall dirt on the film can be confirmed
温水試験
70℃のイオン交換水に皮膜を12時間浸漬し、浸漬前後の水の接触角を測定した。
試験後の接触角と変化率から温水試験耐性の総合評価を行った。
◎:接触角が99°以上かつ接触角の変化率が-10%以上
○:接触角が99°未満~90°以上、かつ接触角変化率が-10%以上
×:接触角が90°未満、または接触角変化率が-10%未満 Hot water test The film was immersed in ion exchange water at 70 ° C. for 12 hours, and the contact angle of water before and after immersion was measured.
Comprehensive evaluation of the hot water test resistance was performed from the contact angle and change rate after the test.
◎: Contact angle is 99 ° or more and the change rate of contact angle is −10% or more ○: Contact angle is less than 99 ° to 90 ° or more, and the contact angle change rate is −10% or more ×: Contact angle is less than 90 ° Or contact angle change rate is less than -10%
70℃のイオン交換水に皮膜を12時間浸漬し、浸漬前後の水の接触角を測定した。
試験後の接触角と変化率から温水試験耐性の総合評価を行った。
◎:接触角が99°以上かつ接触角の変化率が-10%以上
○:接触角が99°未満~90°以上、かつ接触角変化率が-10%以上
×:接触角が90°未満、または接触角変化率が-10%未満 Hot water test The film was immersed in ion exchange water at 70 ° C. for 12 hours, and the contact angle of water before and after immersion was measured.
Comprehensive evaluation of the hot water test resistance was performed from the contact angle and change rate after the test.
◎: Contact angle is 99 ° or more and the change rate of contact angle is −10% or more ○: Contact angle is less than 99 ° to 90 ° or more, and the contact angle change rate is −10% or more ×: Contact angle is less than 90 ° Or contact angle change rate is less than -10%
実施例1-1
三ツ口フラスコに、トリス(トリメチルシロキシ)シラノールを4.69g、テトラヒドロフラン(THF)を21.0g仕込み、撹拌した。-40℃に冷却し、n-BuLiヘキサン溶液(1.6mol/L)を9.38mL滴下した。0℃まで昇温し、21gのTHFに溶解したヘキサメチルシクロトリシロキサン10.01gを滴下し、17時間撹拌した。-40℃に冷却し、反応液にTHF、イオン交換水、ヘキサンを順次加え、分液して、有機層を取り分けた。イオン交換水で洗浄し、無水硫酸マグネシウムで乾燥後減圧濃縮し、無色透明の中間体1を得た。
中間体1を9.47g、テトラメトキシシラン(TMOS)を8.97g、t-ブチルアミンを151.2μL仕込み、撹拌しながら30℃で5時間反応を行った。12hPa、140℃で減圧濃縮し、下記式で表される化合物1を得た。式中、括弧でくくられた単位の平均繰り返し数をNMRスペクトルから算出したところ、8であった。 Example 1-1
A three-necked flask was charged with 4.69 g of tris (trimethylsiloxy) silanol and 21.0 g of tetrahydrofuran (THF) and stirred. After cooling to −40 ° C., 9.38 mL of n-BuLi hexane solution (1.6 mol / L) was added dropwise. The temperature was raised to 0 ° C., 10.01 g of hexamethylcyclotrisiloxane dissolved in 21 g of THF was added dropwise, and the mixture was stirred for 17 hours. After cooling to −40 ° C., THF, ion-exchanged water, and hexane were sequentially added to the reaction solution, followed by liquid separation to separate the organic layer. The extract was washed with ion-exchanged water, dried over anhydrous magnesium sulfate and concentrated under reduced pressure to obtain colorless and transparent intermediate 1.
9.47 g of Intermediate 1, 8.97 g of tetramethoxysilane (TMOS) and 151.2 μL of t-butylamine were charged and reacted at 30 ° C. for 5 hours with stirring. Concentration under reduced pressure at 12 hPa and 140 ° C. gave Compound 1 represented by the following formula. In the formula, the average number of repeating units in parentheses was calculated from the NMR spectrum and found to be 8.
三ツ口フラスコに、トリス(トリメチルシロキシ)シラノールを4.69g、テトラヒドロフラン(THF)を21.0g仕込み、撹拌した。-40℃に冷却し、n-BuLiヘキサン溶液(1.6mol/L)を9.38mL滴下した。0℃まで昇温し、21gのTHFに溶解したヘキサメチルシクロトリシロキサン10.01gを滴下し、17時間撹拌した。-40℃に冷却し、反応液にTHF、イオン交換水、ヘキサンを順次加え、分液して、有機層を取り分けた。イオン交換水で洗浄し、無水硫酸マグネシウムで乾燥後減圧濃縮し、無色透明の中間体1を得た。
中間体1を9.47g、テトラメトキシシラン(TMOS)を8.97g、t-ブチルアミンを151.2μL仕込み、撹拌しながら30℃で5時間反応を行った。12hPa、140℃で減圧濃縮し、下記式で表される化合物1を得た。式中、括弧でくくられた単位の平均繰り返し数をNMRスペクトルから算出したところ、8であった。 Example 1-1
A three-necked flask was charged with 4.69 g of tris (trimethylsiloxy) silanol and 21.0 g of tetrahydrofuran (THF) and stirred. After cooling to −40 ° C., 9.38 mL of n-BuLi hexane solution (1.6 mol / L) was added dropwise. The temperature was raised to 0 ° C., 10.01 g of hexamethylcyclotrisiloxane dissolved in 21 g of THF was added dropwise, and the mixture was stirred for 17 hours. After cooling to −40 ° C., THF, ion-exchanged water, and hexane were sequentially added to the reaction solution, followed by liquid separation to separate the organic layer. The extract was washed with ion-exchanged water, dried over anhydrous magnesium sulfate and concentrated under reduced pressure to obtain colorless and transparent intermediate 1.
9.47 g of Intermediate 1, 8.97 g of tetramethoxysilane (TMOS) and 151.2 μL of t-butylamine were charged and reacted at 30 ° C. for 5 hours with stirring. Concentration under reduced pressure at 12 hPa and 140 ° C. gave Compound 1 represented by the following formula. In the formula, the average number of repeating units in parentheses was calculated from the NMR spectrum and found to be 8.
実施例1-2
トリメチルシラノール0.72g、THF6.72mLを四つ口フラスコに仕込み、撹拌した。-40℃に冷却し、n-BuLiヘキサン溶液(1.6mol/L)を5.00mL滴下した。0℃まで昇温し、16.43mLのTHFに溶解したヘキサメチルシクロトリシロキサン14.24gを滴下し、室温に昇温して17時間撹拌した。-40℃に冷却し、クロロトリエトキシシラン1.59gを滴下した。ヘキサンを加えて濾過した。濾液を13hPa、25℃で濃縮し、化合物2を得た。式中、括弧でくくられた単位の平均繰り返し数をNMRスペクトルから算出したところ、8であった。 Example 1-2
A four-necked flask was charged with 0.72 g of trimethylsilanol and 6.72 mL of THF and stirred. After cooling to −40 ° C., 5.00 mL of n-BuLi hexane solution (1.6 mol / L) was added dropwise. The temperature was raised to 0 ° C., 14.24 g of hexamethylcyclotrisiloxane dissolved in 16.43 mL of THF was added dropwise, the temperature was raised to room temperature, and the mixture was stirred for 17 hours. The mixture was cooled to −40 ° C., and 1.59 g of chlorotriethoxysilane was added dropwise. Hexane was added and filtered. The filtrate was concentrated at 13 hPa and 25 ° C. to obtain compound 2. In the formula, the average number of repeating units in parentheses was calculated from the NMR spectrum and found to be 8.
トリメチルシラノール0.72g、THF6.72mLを四つ口フラスコに仕込み、撹拌した。-40℃に冷却し、n-BuLiヘキサン溶液(1.6mol/L)を5.00mL滴下した。0℃まで昇温し、16.43mLのTHFに溶解したヘキサメチルシクロトリシロキサン14.24gを滴下し、室温に昇温して17時間撹拌した。-40℃に冷却し、クロロトリエトキシシラン1.59gを滴下した。ヘキサンを加えて濾過した。濾液を13hPa、25℃で濃縮し、化合物2を得た。式中、括弧でくくられた単位の平均繰り返し数をNMRスペクトルから算出したところ、8であった。 Example 1-2
A four-necked flask was charged with 0.72 g of trimethylsilanol and 6.72 mL of THF and stirred. After cooling to −40 ° C., 5.00 mL of n-BuLi hexane solution (1.6 mol / L) was added dropwise. The temperature was raised to 0 ° C., 14.24 g of hexamethylcyclotrisiloxane dissolved in 16.43 mL of THF was added dropwise, the temperature was raised to room temperature, and the mixture was stirred for 17 hours. The mixture was cooled to −40 ° C., and 1.59 g of chlorotriethoxysilane was added dropwise. Hexane was added and filtered. The filtrate was concentrated at 13 hPa and 25 ° C. to obtain compound 2. In the formula, the average number of repeating units in parentheses was calculated from the NMR spectrum and found to be 8.
実施例2-1
有機ケイ素化合物(a)としての化合物1、金属アルコキシド(b)としてのテトラエトキシシラン(TEOS)、含フッ素有機ケイ素化合物(f)としてのトリエトキシ(1H,1H,2H,2H-ノナフルオロヘキシル)シラン(C4F9-C2H4-Si-(OC2H5)3)、触媒(d)としての0.01M塩酸、及び溶剤(c)としてのメチルエチルケトン(MEK)を表7に示す組成比で混合し、24h撹拌して塗布液を得た。アルカリ洗浄したガラス基板(EAGLE XG、Corning社)に得られたスピンコーター(MIKASA社製)を用いて得られた塗布液を3000rpm、20sでコーティングし、1日室温で静置した後、さらに所定の温度で硬化させて、皮膜を得た。 Example 2-1
Compound 1 as organosilicon compound (a), tetraethoxysilane (TEOS) as metal alkoxide (b), triethoxy (1H, 1H, 2H, 2H-nonafluorohexyl) silane as fluorine-containing organosilicon compound (f) (C 4 F 9 —C 2 H 4 —Si— (OC 2 H 5 ) 3 ), 0.01 M hydrochloric acid as the catalyst (d), and methyl ethyl ketone (MEK) as the solvent (c) are shown in Table 7. The mixture was mixed at a ratio and stirred for 24 hours to obtain a coating solution. A coating solution obtained using a spin coater (manufactured by MIKASA) obtained on an alkali-cleaned glass substrate (EAGLE XG, Corning) was coated at 3000 rpm for 20 s and allowed to stand at room temperature for 1 day. The film was cured at a temperature of
有機ケイ素化合物(a)としての化合物1、金属アルコキシド(b)としてのテトラエトキシシラン(TEOS)、含フッ素有機ケイ素化合物(f)としてのトリエトキシ(1H,1H,2H,2H-ノナフルオロヘキシル)シラン(C4F9-C2H4-Si-(OC2H5)3)、触媒(d)としての0.01M塩酸、及び溶剤(c)としてのメチルエチルケトン(MEK)を表7に示す組成比で混合し、24h撹拌して塗布液を得た。アルカリ洗浄したガラス基板(EAGLE XG、Corning社)に得られたスピンコーター(MIKASA社製)を用いて得られた塗布液を3000rpm、20sでコーティングし、1日室温で静置した後、さらに所定の温度で硬化させて、皮膜を得た。 Example 2-1
Compound 1 as organosilicon compound (a), tetraethoxysilane (TEOS) as metal alkoxide (b), triethoxy (1H, 1H, 2H, 2H-nonafluorohexyl) silane as fluorine-containing organosilicon compound (f) (C 4 F 9 —C 2 H 4 —Si— (OC 2 H 5 ) 3 ), 0.01 M hydrochloric acid as the catalyst (d), and methyl ethyl ketone (MEK) as the solvent (c) are shown in Table 7. The mixture was mixed at a ratio and stirred for 24 hours to obtain a coating solution. A coating solution obtained using a spin coater (manufactured by MIKASA) obtained on an alkali-cleaned glass substrate (EAGLE XG, Corning) was coated at 3000 rpm for 20 s and allowed to stand at room temperature for 1 day. The film was cured at a temperature of
実施例2-2~2-8、比較例1~4
表9に示す組成比で混合し塗布液を得た後、実施例2-1と同様の操作をして皮膜を得た。作製した皮膜について、接触角(水又はヘキサデカン)及び温水試験後の接触角を評価した。 Examples 2-2 to 2-8, Comparative Examples 1 to 4
After mixing at a composition ratio shown in Table 9 to obtain a coating solution, a film was obtained in the same manner as in Example 2-1. About the produced membrane | film | coat, the contact angle (water or hexadecane) and the contact angle after a warm water test were evaluated.
表9に示す組成比で混合し塗布液を得た後、実施例2-1と同様の操作をして皮膜を得た。作製した皮膜について、接触角(水又はヘキサデカン)及び温水試験後の接触角を評価した。 Examples 2-2 to 2-8, Comparative Examples 1 to 4
After mixing at a composition ratio shown in Table 9 to obtain a coating solution, a film was obtained in the same manner as in Example 2-1. About the produced membrane | film | coat, the contact angle (water or hexadecane) and the contact angle after a warm water test were evaluated.
表中、比較化合物1は、下記式で表される化合物を表す。式中、括弧でくくられた単位の平均繰り返し数をNMRスペクトルから算出したところ、24であった。
In the table, Comparative Compound 1 represents a compound represented by the following formula. In the formula, the average number of repeating units in parentheses was 24 calculated from the NMR spectrum.
実施例で得られた組成物は、皮膜形成時の製膜性に優れ、得られる皮膜は、撥水性及び撥油性、密着性および製膜性に優れていた。一方、比較例で得られた組成物は、いずれも皮膜形成時の製膜性に劣っていた。さらに、比較例4の組成物から得られた皮膜は、撥水性及び撥油性に劣っており、比較例2及び比較例4の組成物から得られた皮膜は、温水試験の結果、密着性が劣っていることがわかった。
The compositions obtained in the examples were excellent in film forming properties during film formation, and the resulting films were excellent in water and oil repellency, adhesion and film forming properties. On the other hand, all of the compositions obtained in the comparative examples were inferior in film forming properties during film formation. Furthermore, the film obtained from the composition of Comparative Example 4 is inferior in water repellency and oil repellency, and the film obtained from the compositions of Comparative Example 2 and Comparative Example 4 has adhesiveness as a result of the hot water test. I found it inferior.
本発明の組成物から形成される皮膜は、撥水性及び撥油性と製膜性を両立でき、タッチパネルディスプレイ等の表示装置、光学素子、半導体素子、建築材料、自動車部品、ナノインプリント技術等における基材として有用である。また本発明の組成物から形成される皮膜は、電車、自動車、船舶、航空機等の輸送機器におけるボディー、窓ガラス(フロントガラス、サイドガラス、リアガラス)、ミラー、バンパー等の物品として好適に用いられる。また、建築物外壁、テント、太陽光発電モジュール、遮音板、コンクリート、などの屋外用途にも用いることができる。漁網、虫取り網、水槽などにも用いることができる。更に、台所、風呂場、洗面台、鏡、トイレ周りの各部材の物品、シャンデリア、タイルなどの陶磁器、人工大理石、エアコン等の各種屋内設備にも利用可能である。また、工場内の治具や内壁、配管等の防汚処理としても用いることができる。ゴーグル、眼鏡、ヘルメット、パチンコ、繊維、傘、遊具、サッカーボールなどにも好適である。更に、食品用包材、化粧品用包材、ポットの内部、など、各種包材の付着防止剤としても用いることができる。
The film formed from the composition of the present invention can achieve both water repellency and oil repellency and film forming properties, and is a base material for display devices such as touch panel displays, optical elements, semiconductor elements, building materials, automobile parts, nanoimprint technology, etc. Useful as. The film formed from the composition of the present invention is suitably used as an article such as a body, window glass (front glass, side glass, rear glass), mirror, bumper and the like in transportation equipment such as trains, automobiles, ships, and airplanes. Moreover, it can also be used for outdoor uses, such as a building outer wall, a tent, a solar power generation module, a sound insulation board, and concrete. It can also be used for fishing nets, insect nets, water tanks, and the like. Furthermore, it can be used for various indoor facilities such as kitchens, bathrooms, washstands, mirrors, toilet articles, ceramics such as chandeliers and tiles, artificial marble, and air conditioners. It can also be used as an antifouling treatment for jigs, inner walls, pipes and the like in factories. It is also suitable for goggles, glasses, helmets, slingshots, textiles, umbrellas, play equipment, soccer balls and the like. Furthermore, it can also be used as an anti-adhesive agent for various packaging materials such as food packaging materials, cosmetic packaging materials, and the inside of pots.
Claims (7)
- 少なくとも1つのトリアルキルシリル基含有分子鎖と、少なくとも1つの加水分解性基とがケイ素原子に結合している有機ケイ素化合物(a)、金属アルコキシド(b)及び含フッ素基と加水分解性基とがケイ素原子に結合している含フッ素有機ケイ素化合物(f)を含む組成物。 Organosilicon compound (a), metal alkoxide (b), fluorine-containing group and hydrolyzable group in which at least one trialkylsilyl group-containing molecular chain and at least one hydrolyzable group are bonded to a silicon atom A composition comprising a fluorine-containing organosilicon compound (f) in which is bonded to a silicon atom.
- 前記有機ケイ素化合物(a)が、式(I)で表される化合物である請求項1に記載の組成物。
- 前記金属アルコキシド(b)が、式(II)で表される化合物である請求項1又は2に記載の組成物。
- 前記含フッ素有機ケイ素化合物(f)が、式(III-1)及び(III-2)のいずれかで表される化合物である請求項1~3のいずれかに記載の組成物。
- 前記含フッ素有機ケイ素化合物(f)と前記有機ケイ素化合物(a)の含有率の比(含フッ素有機ケイ素化合物(f)/有機ケイ素化合物(a))が、モル比で、7/1以上、20/1以下である請求項1~4のいずれかに記載の組成物。 The ratio of the content of the fluorine-containing organosilicon compound (f) and the organosilicon compound (a) (fluorine-containing organosilicon compound (f) / organosilicon compound (a)) is 7/1 or more in molar ratio, The composition according to any one of claims 1 to 4, which is 20/1 or less.
- 前記金属アルコキシド(b)と前記含フッ素有機ケイ素化合物(f)の含有率の比(金属アルコキシド(b)/含フッ素有機ケイ素化合物(f))が、モル比で、0.01以上であり、50以下である請求項1~5のいずれかに記載の組成物。 The ratio of the content of the metal alkoxide (b) and the fluorine-containing organosilicon compound (f) (metal alkoxide (b) / fluorine-containing organosilicon compound (f)) is 0.01 or more in terms of molar ratio. The composition according to any one of claims 1 to 5, which is 50 or less.
- 請求項1~6に記載の組成物から形成される皮膜。 A film formed from the composition according to claims 1 to 6.
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JP7135851B2 (en) * | 2018-04-11 | 2022-09-13 | 信越化学工業株式会社 | Water-repellent film-forming composition and water-repellent film |
JP7446840B2 (en) * | 2019-04-23 | 2024-03-11 | 住友化学株式会社 | mixed composition |
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- 2017-04-26 TW TW106113959A patent/TWI721160B/en not_active IP Right Cessation
- 2017-04-26 WO PCT/JP2017/016588 patent/WO2017188331A1/en active Application Filing
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WO2023145301A1 (en) * | 2022-01-31 | 2023-08-03 | 住友化学株式会社 | Mixed composition, cured film of said mixed composition, and glass having said film |
Also Published As
Publication number | Publication date |
---|---|
JP6914714B2 (en) | 2021-08-04 |
KR20190004732A (en) | 2019-01-14 |
JP2017201009A (en) | 2017-11-09 |
CN109071819B (en) | 2021-09-21 |
CN109071819A (en) | 2018-12-21 |
TWI721160B (en) | 2021-03-11 |
KR102370256B1 (en) | 2022-03-04 |
TW201809100A (en) | 2018-03-16 |
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