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WO2011137606A1 - Capacitive touch sensing structure, process of producing the same and touch sensing device using the same - Google Patents

Capacitive touch sensing structure, process of producing the same and touch sensing device using the same Download PDF

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Publication number
WO2011137606A1
WO2011137606A1 PCT/CN2010/075268 CN2010075268W WO2011137606A1 WO 2011137606 A1 WO2011137606 A1 WO 2011137606A1 CN 2010075268 W CN2010075268 W CN 2010075268W WO 2011137606 A1 WO2011137606 A1 WO 2011137606A1
Authority
WO
WIPO (PCT)
Prior art keywords
touch sensing
direction electrode
capacitive touch
insulator
sensing structure
Prior art date
Application number
PCT/CN2010/075268
Other languages
English (en)
French (fr)
Inventor
Chenyu Liu
Luhsing Lee
Original Assignee
Tpk Touch Solutions Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tpk Touch Solutions Inc. filed Critical Tpk Touch Solutions Inc.
Priority to KR1020127029258A priority Critical patent/KR101548014B1/ko
Priority to JP2013508351A priority patent/JP5599940B2/ja
Priority to EP10850975.3A priority patent/EP2567307A4/en
Publication of WO2011137606A1 publication Critical patent/WO2011137606A1/en

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Classifications

    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0443—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a single layer of sensing electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/044—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means
    • G06F3/0446—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means by capacitive means using a grid-like structure of electrodes in at least two directions, e.g. using row and column electrodes
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
    • G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
    • G06F2203/04111—Cross over in capacitive digitiser, i.e. details of structures for connecting electrodes of the sensing pattern where the connections cross each other, e.g. bridge structures comprising an insulating layer, or vias through substrate

Definitions

  • the present invention generally relates to touch sensing devices for information inputting systems, and more particularly, to a touch sensing structure thereof and a process of producing the touch sensing structure.
  • touch sensing devices for example, touchpad, touch panel, touch screen
  • the capacitive touch sensing device includes a touch sensing structure, some wires, and a microprocessor.
  • the touch sensing structure connects to the microprocessor by the wires.
  • a projective capacitive touch sensing structure 1 is grid-like, and includes a substrate 6, a first direction electrode 2, a second direction electrode 3, an insulator 4, and a protective layer 5.
  • the first direction electrode 2 and the second direction electrode 3 are orthogonally placed on the substrate 6, and are insulated by the insulator 4.
  • the protective layer 5 is disposed on the second direction electrode 3 to protect the first direction electrode 2 and the second direction electrode 3.
  • a microprocessor (not shown in FIG.1 and FIG.2) is connected to the first direction electrode 2 and the second direction electrode 3 correspondingly.
  • the protective layer in the conventional projective capacitive touch sensing structure is a continuous flat structure, but the parts which need to be protected are only the crossing location of the first direction electrode 2 and the second direction electrode 3. Therefore, the utilization rate of the protective layer 5 is too low.
  • the projective capacitive touch sensing structure is assembled in a monitor (such as touch screen), all parts of the projective capacitive touch sensing structure are transparent in order to ensure the visibility and operability. Because the conventional projective capacitive touch sensing structure is a multilayer structure and the electrodes spread over visual area, with the effect of the different refraction of the material of each layer, the light transmittance of the projective capacitive touch sensing structure was limited. Therefore, the visibility of the monitor which combines the projective capacitive touch sensing structure is dropped.
  • a capacitive touch sensing structure which can reduce the material of the protective layer, a process of producing the same, and touch sensing devices using the same are provided.
  • a capacitive touch sensing structure includes a substrate, at least one first direction electrode, at least one insulator, at least one second direction electrode, and at least one protective block.
  • the first direction electrode is superposed on the substrate.
  • the insulator is superposed on the first direction electrode.
  • the second direction electrode is superposed on the insulator opposite to the first direction electrode and crosses the first direction electrode to form at least one location of crossing.
  • the protective block is disposed on the second direction electrode and covers the location of crossing.
  • a process of producing a capacitive touch sensing structure includes the steps of: (a) affixing at least one first direction electrode onto a substrate; (b) affixing at least one insulator onto the first direction electrode; (c) affixing at least one second direction electrode onto the insulator and crossing with the first direction electrode to form a location of crossing, and to make the first direction electrode and the second direction electrode located on opposite surfaces of the insulator; (d) affixing at least one protective block onto the second direction electrode, and the protective block covering the location of crossing.
  • a capacitive touch sensing device in another more aspect, includes at least one wire; a processor; a shell; and a capacitive touch sensing structure disposed in the shell.
  • the capacitive touch sensing structure includes a substrate; at least one first direction electrode, at least one insulator, at least one second direction electrode, and at least one protective block.
  • the first direction electrode is located on the substrate.
  • the insulator is located on the first direction electrode.
  • the second direction electrode is located on the insulator opposite to the first direction electrode and crossing the first direction electrode to form at least one location of crossing.
  • the protective block sets on the second direction electrode and covers the location of crossing.
  • the first direction electrode and second direction electrode of the capacitive touch sensing structure connect to processor by the wire.
  • FIG.1 shows a top view of a conventional projective capacitive touch sensing structure.
  • FIG.2 shows a cross sectional view of the conventional projective capacitive touch sensing structure shown in FIG.1 taken along the line A-A.
  • FIG.3 shows a top view of a capacitive touch sensing structure according to the first embodiment of the present invention.
  • FIG.4 shows a cross sectional view of the capacitive touch sensing structure shown in FIG.3 taken along the line B-B.
  • FIG.5 shows a cross sectional view of a capacitive touch sensing structure according to a second embodiment of the present invention.
  • FIG.6 shows a top view of a capacitive touch sensing structure according to a third embodiment of the present invention.
  • FIG.7 shows a cross sectional view of the capacitive touch sensing structure shown in FIG.6 taken along the line C-C.
  • FIG.8 shows a top view of a capacitive touch sensing structure according to a fourth embodiment of the present invention.
  • FIG.9 shows a cross sectional view of the capacitive touch sensing structure shown in FIG.8 taken along the line D-D.
  • FIG.10 shows a top view of a capacitive touch sensing structure according to a fifth embodiment of the present invention.
  • FIG.11 shows a cross sectional view of the capacitive touch sensing structure shown in FIG.10 taken along the line E-E.
  • FIG.12a-12d is a flow chart of a process of producing the first embodiment of the present invention.
  • FIG.13a-13d is a flow chart of a process of producing the fourth embodiment of the present invention.
  • FIG.14a-14d is a flow chart of another process of producing the fourth embodiment of the present invention.
  • FIG.15 is a schematic diagram of a touch sensing device using the capacitive touch sensing structure of the present invention.
  • FIG.16 is another schematic diagram of a touch sensing device using the capacitive touch sensing structure of the present invention.
  • FIG.17 is another more schematic diagram of a touch sensing device using the capacitive touch sensing structure of the present invention.
  • the capacitive touch sensing structure of the present invention comprises a substrate, at least one first direction electrode disposed on the substrate, at least one insulator disposed on the first direction electrode, at least one second direction electrode superposed on the insulator.
  • the first direction electrode and the second direction electrode are crossed to form a crossing and disposed on the opposite sides of the insulator respectively. Therefore, the first direction electrode and the second direction electrode are insulated by the insulator.
  • the capacitive touch sensing structure also comprises a protective block which is disposed on the second direction electrode for covering the crossing to reduce the material.
  • a capacitive touch sensing structure 100 includes a substrate 110, at least one first direction electrode 120, at least one second direction electrode 130, at least one insulator 140 and at least one protective block 150.
  • first direction electrodes 120 are superposed on the surface of the substrate 110.
  • the insulators 140 are disposed on the surface of the first direction electrodes 120.
  • the second direction electrodes 130 are superposed on the insulators 140 opposite to the first direction electrodes 120.
  • the first direction electrodes 120 and the second direction electrodes 130 are crossed to form a plurality of locations of crossings and insulated by the insulators 140.
  • the protective blocks 150 are disposed on the surface of the second direction electrodes 130, and cover the locations of crossings.
  • the insulators 140 are located between the first direction electrodes 120 and the second direction electrodes 130, and disposed at the locations of crossings to insulate the first direction electrodes 120 from the second direction electrodes 130.
  • Each of the insulators 140 is in the form of a sheet.
  • each of the protective blocks 150 covers the corresponding insulator 140 and the part of second direction electrode 130 which located on the surface of the insulator 140.
  • each of the protective blocks 250 only covers the part of second direction electrode 230 which located on the surface of the insulator 240.
  • a capacitive touch sensing structure 300 includes a substrate 310, first direction electrodes 320, second direction electrodes 330, a insulator 340 and protective blocks 350.
  • the insulator 340 is a continuous flat structure defining at least one pair of through holes 341.
  • the pair of through holes 341 is defined at both two sides of a first direction electrode 320 and just located at the location of crossing of the first direction electrode 320 and the second direction electrode 330.
  • a second direction electrode 330 passes through the pair of through holes 341, thus the insulator 340 is placed between the first direction electrode 320 and the second direction electrode 330 at the location of crossing.
  • the part of the second direction electrode 330 outside the pair of through holes 341 is placed between the substrate 310 and the insulator 340, while the part between the pair of through holes 341 is superposed on the insulator 340 opposite to the first direction electrode 320.
  • the first direction electrode 320 can be insulated from the second direction electrode 330 by the insulator 340.
  • Each protective block 350 is superposed on the surface of the second direction electrode 330 which located on insulator 340, and covers the part of second direction electrode 330 protruding from the pair of through holes 341.
  • a capacitive touch sensing structure 400 includes a substrate 410, first direction electrodes 420, second direction electrodes 430, a plurality of insulators 440 and a plurality of protective blocks 450.
  • each first direction electrode 420 includes at least two first direction conductive units 422 and at least one first direction wire 421; and each second direction electrode 430 includes at least two second direction conductive units 432 and at least one second direction wire 431.
  • the first direction conductive units 422 are separated from each other and connected by the first direction wire 421; similarly, the second direction conductive units 432 are separated from each other and connected by the second direction wire 431.
  • Each insulator 440 is superposed on the surface of the first direction wire 421, and the second direction wire 431 crosses on the surface of the insulator 440, so that the first direction electrode 420 can be insulated from the second direction electrode 430.
  • Each of the insulators 440 is in the form of a sheet.
  • each protective block 450 can cover the part of second direction wire 431 which located on the insulator 440, or the corresponding insulator 440 and the second direction wire 431 which located on the insulator 440.
  • a capacitive touch sensing structure 500 includes a substrate 510, first direction electrodes 520, second direction electrodes 530, a insulator 540 and a plurality of protective blocks 550.
  • a first direction electrode 520 includes at least two first direction conductive units 522 and at least one first direction wire 521; and a second direction electrode 530 includes at least two second direction conductive units 532 and at least one second direction wire 531.
  • the first direction conductive units 522 are separated from each other, and connected by the first direction wire 521; similarly, the second direction conductive units 532 are separated from each other, and connected by the second direction wire 531.
  • the first direction conductive units 522, the first direction wire 521, and the second direction conductive units 532 are located on the same side of the surface of substrate 510.
  • the second direction wire 531 passes through the through holes 541 in succession to connect the second direction conductive units 532, thus the insulator 540 is placed between the first direction wire 521 and the second direction wire 531 at the location of crossing for isolating the first direction electrode 520 and the second direction electrode 530.
  • the protective blocks 550 are superposed on the surface of corresponding insulator 540, and cover the second direction wire 531.
  • All parts of the capacitive touch sensing structure of the present invention can be made of transparent material or opaque material depending on appliance requirements.
  • the opaque conductive material can be metal such like copper, aluminum, gold and so on;
  • the transparent conductive material for making electrodes can be ITO(Indium Tin Oxides) or others.
  • the insulator can use resin or glass, which is transparent or opaque.
  • the capacitive touch sensing structure can be used in computer to make touchpad when it is opaque, and can also be used in monitor or other display devices to make touch screen when it is transparent.
  • the light transmittance of the transparent capacitive touch sensing structure can be improved.
  • it can reduce the amount of material for making the protective block whether the material is transparent or opaque, and the cost of production is reduced accordingly.
  • a process of producing a capacitive touch sensing structure above-mentioned including the following steps: (a) affixing at least one first direction electrode onto the surface of a substrate; (b) affixing at least one insulator onto the surface of first direction electrode;(c) affixing at least one second direction electrode onto the insulator and crossing with the first direction electrode to form a crossing, the first direction electrode and the second direction electrode located on opposite surfaces of the insulator; (d) affixing at least one protective block onto the second direction electrode, the protective block cover the location of crossing.
  • a process of producing the capacitive touch sensing structure 100 according to the first embodiment of the present invention including the following steps: in step S110, as shown in FIG.12a, affixing at least one first direction electrode 120 onto the surface of a substrate 110; in step S120, as shown in FIG.12b, affixing at least one insulator 140 onto the surface of first direction electrode 120; in step S130, as shown in FIG.12c, affixing at least one second direction electrode 130 on the insulators 140, wherein the second direction electrode 130 crosses with the first direction electrode 120 to form a plurality of crossings corresponding with the insulators 140 to make the first direction electrode 120 insulated from the second direction electrode 130; in step S140, as shown in FIG.12d, affixing each of the protective blocks 150 at the corresponding crossing of the second direction electrode 130 and the first electrode 120 for covering the corresponding insulators 140 and the second direction electrode 130 .
  • first direction electrode includes at least two first conductive direction units and one first direction wire which connects the first conductive direction units and the second direction electrode includes at least two second conductive direction units and one second direction wire which connects the second conductive direction units.
  • the process includes the following steps: (a) affixing a plurality of first direction wires onto the surface of a substrate; (b) affixing a plurality of insulators onto the surface of each first direction wire; (c) affixing a plurality of second direction wires onto each insulator and crossing with the first direction wires to form a plurality of locations of crossings, wherein the first direction wires and the second direction wires located on opposite surfaces of the insulators respectively; (d) affixing a plurality of protective blocks onto each second direction wires, each of the protective block covers the location of crossing.
  • the process may further include the step of affixing the first conductive direction units and the second conductive direction units.
  • FIGs.13a-13d and FIGs.14a-14d show more detailed steps of the exemplary embodiment and illustrate the main difference of affixing of first conductive direction units and second conductive direction units in different steps in the process of producing the capacitive touch sensing structure.
  • a process of producing the fourth embodiment of the capacitive touch sensing structure includes four steps: in step S210, as shown in FIG.13a, affixing at least two first conductive direction units 422, at least one first direction wire 421 connecting the first conductive direction units 422, and at least two second conductive direction units 432 onto the surface of substrate 410; in step S220, as shown in FIG.13b, affixing a plurality of insulators 440 onto the surface of first direction wire 421; in step S230, as shown in FIG13c, affixing at least one second direction wire 431 on the insulators 440 to connect the second conductive direction units 432; in step S240, as shown in FIG13d, affixing a plurality of protective blocks 450 onto the surface of the second direction wire 431 for covering the corresponding insulators 440 and the second direction wire 431.
  • step S310 as shown in FIG.14a, affixing at least one first direction wire 421 onto the surface of a substrate 410; in step S320, as shown in FIG.14b, affixing a plurality of insulators 440 onto the surface of the first direction wire 421; in step S330, as shown in FIG.14c, affixing at least two first conductive direction units 422 disposed on the surface of substrate 410 and connected to the first direction wire 421, at least two second conductive direction units 432 onto the surface of substrate 410, and at least one second direction wire 431 onto the insulators 440 for connecting the second conductive direction units 432; in step S340, as shown in FIG.14d, affixing a plurality of protective blocks 450 onto the surface of the second direction wire 431 for covering the corresponding insulators 440 and the second direction wire 431.
  • the process of producing the fifth embodiment of the capacitive touch sensing structure is similar to that of the fourth embodiment, the difference between the fifth embodiment and the fourth embodiment is that during the second step, the insulator 540 includes at least one pair of through holes 541 defining on both sides of the first direction wire 521.
  • the method of photolithography or printing can be introduced into above-mentioned process of producing the capacitive touch sensing structure of the present invention.
  • the touch sensing device 10 includes a capacitive touch sensing structure 11, wires 12, a processor 13 and a shell 14.
  • the shell 14 is used for storing the touch sensing structure 11, the wires 12 and the processor 13.
  • the capacitive touch sensing structure 11 is near the inner surface 14a of the shell 14, and the first direction electrode and second direction electrode of the capacitive touch sensing structure 11 are connected to the processor 13 by the wires 12. While a conductive object touches the inner surface 14a of the shell 14, the capacitive touch sensing structure 11 generates an electric signal transmitted to the processor 13 by the wires 12, and the processor 13 determines the coordinate of touching location according to the electric signal.
  • the touch sensing device 20 includes a capacitive touch sensing structure 21, wires 22, a processor 23 and a display unit 25 having a polarizer 24.
  • the capacitive touch sensing structure 21 is set in the display unit 25, and it is on the inner surface 24a of the polarizer 24.
  • the capacitive touch sensing structure 21 is made of transparent material.
  • the first direction electrode and second direction electrode of the capacitive touch sensing structure 21 are connected to the processor 23 by the wires 22.
  • a conductive object can touch the polarizer 24 straightly to do the operation of touch.
  • the display unit 25 is a LCD unit.
  • the touch sensing device 30 includes a capacitive touch sensing structure 31, wires 32, a processor 33 and a display unit 35.
  • the capacitive touch sensing structure 31 is transparent, and is set on the outer surface of the display unit 35.
  • the first direction electrode and second direction electrode of the capacitive touch sensing structure 31 are connected to the processor 33 by the wires 32.
  • the display unit 35 is a LCD unit.
  • the capacitive touch sensing structure used in the above-mentioned touch sensing device can be any one of the embodiments of the capacitive touch sensing structure.
  • the material for making the protective layer is reduced, so the cost of production is reduced accordingly.
  • the capacitive touch sensing structure is transparent, the light transmittance of the capacitive touch sensing structure is improved.
  • the display effect of display devices using the touch sensing structure is improved as well.
  • the first direction electrode or the second direction electrode of the capacitive touch sensing structure of the present invention includes at least one electrode. Furthermore, the amount of the insulators, through holes, and protective blocks depend on the amount of the first direction electrodes and second direction electrodes. Besides, the amount of the first direction electrodes and second direction electrodes depend on the resolution and size of the touch sensing structure. The higher the resolution or the larger the size is, the larger the amount is.

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  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Human Computer Interaction (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Position Input By Displaying (AREA)
  • Switches That Are Operated By Magnetic Or Electric Fields (AREA)
PCT/CN2010/075268 2010-05-04 2010-07-19 Capacitive touch sensing structure, process of producing the same and touch sensing device using the same WO2011137606A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1020127029258A KR101548014B1 (ko) 2010-05-04 2010-07-19 정전용량 방식의 터치 감지 구조, 정전용량 방식의 터치 감지 구조를 제조하는 방법 및 정전용량 방식의 터치 감지 구조를 이용한 터치 감지 장치
JP2013508351A JP5599940B2 (ja) 2010-05-04 2010-07-19 容量性タッチセンサシステム、その生産工程及びそれを使用するタッチセンサ装置
EP10850975.3A EP2567307A4 (en) 2010-05-04 2010-07-19 CAPACITIVE TOUCH SENSING STRUCTURE, METHOD OF MANUFACTURING THEREFOR AND TOUCH SENSING DEVICE THEREWITH

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CN2010101678610A CN102236482B (zh) 2010-05-04 2010-05-04 电容式触控结构及其制造方法以及触控设备
CN201010167861.0 2010-05-04

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WO2011137606A1 true WO2011137606A1 (en) 2011-11-10

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PCT/CN2010/075268 WO2011137606A1 (en) 2010-05-04 2010-07-19 Capacitive touch sensing structure, process of producing the same and touch sensing device using the same

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EP (1) EP2567307A4 (ko)
JP (1) JP5599940B2 (ko)
KR (1) KR101548014B1 (ko)
CN (1) CN102236482B (ko)
DE (1) DE202010018618U1 (ko)
WO (1) WO2011137606A1 (ko)

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KR20130029388A (ko) 2013-03-22
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CN102236482A (zh) 2011-11-09
EP2567307A1 (en) 2013-03-13
DE202010018618U1 (de) 2018-11-27
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