Nothing Special   »   [go: up one dir, main page]

WO2011068134A1 - Copper alloy sheet material having low young's modulus and method for producing same - Google Patents

Copper alloy sheet material having low young's modulus and method for producing same Download PDF

Info

Publication number
WO2011068134A1
WO2011068134A1 PCT/JP2010/071517 JP2010071517W WO2011068134A1 WO 2011068134 A1 WO2011068134 A1 WO 2011068134A1 JP 2010071517 W JP2010071517 W JP 2010071517W WO 2011068134 A1 WO2011068134 A1 WO 2011068134A1
Authority
WO
WIPO (PCT)
Prior art keywords
copper alloy
alloy sheet
rolling
modulus
electronic parts
Prior art date
Application number
PCT/JP2010/071517
Other languages
French (fr)
Japanese (ja)
Inventor
佐藤 浩二
洋 金子
立彦 江口
Original Assignee
古河電気工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 古河電気工業株式会社 filed Critical 古河電気工業株式会社
Priority to JP2011513179A priority Critical patent/JP4809935B2/en
Priority to EP10834584.4A priority patent/EP2508634B1/en
Priority to CN201080053121.2A priority patent/CN102630251B/en
Publication of WO2011068134A1 publication Critical patent/WO2011068134A1/en
Priority to US13/486,861 priority patent/US20120241056A1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/06Alloys based on copper with nickel or cobalt as the next major constituent
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21BROLLING OF METAL
    • B21B3/00Rolling materials of special alloys so far as the composition of the alloy requires or permits special rolling methods or sequences ; Rolling of aluminium, copper, zinc or other non-ferrous metals
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C9/00Alloys based on copper
    • C22C9/10Alloys based on copper with silicon as the next major constituent
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22FCHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
    • C22F1/00Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
    • C22F1/08Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of copper or alloys based thereon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/02Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of metals or alloys
    • H01B1/026Alloys based on copper
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B21MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
    • B21BROLLING OF METAL
    • B21B3/00Rolling materials of special alloys so far as the composition of the alloy requires or permits special rolling methods or sequences ; Rolling of aluminium, copper, zinc or other non-ferrous metals
    • B21B2003/005Copper or its alloys

Definitions

  • the present invention relates to a copper alloy sheet having high strength and high conductivity suitable as materials for electric and electronic parts such as connectors, and further having a low Young's modulus, and a method for producing the same.
  • the tensile strength in the rolling direction (RD) is 500MPa or more as the strength not to be deformed during insertion and removal or bending, and furthermore, the electrical conductivity is 30% IACS to suppress the generation of Joule heat due to energization. The above is preferable.
  • the connector be miniaturized and that a large Young's modulus of the connector material be obtained so that a large stress can be obtained with a small displacement.
  • the dimensional accuracy of the terminal itself becomes severe, and management standards such as die technology and press operation management, or variations in plate thickness and residual stress of connector materials become strict, which in turn causes an increase in cost. Therefore, recently, a connector material having a small Young's modulus is used, a structure in which the displacement of the spring is large, and a design that can tolerate variations in dimensions are being sought. Therefore, it is required that the Young's modulus in the rolling direction is 110 GPa or less, preferably 100 GPa or less.
  • brass, phosphor bronze and the like have been generally used as connector materials.
  • the Young's modulus in the rolling direction of both brass and phosphor bronze is about 110 to 120 GPa, which is smaller than the Young's modulus 128 GPa of pure copper, and is widely used as a low Young's modulus material.
  • these copper alloys have a conductivity of 30% IACS or less, a low conductivity, and can not be used as a connector in applications where a large current flows. Therefore, Corson alloys having moderate conductivity have been attracting attention, and the amount used has been increasing. However, this Corson alloy has a Young's modulus of about 130 GPa, and in this point, the Young's modulus of the connector material is reduced. It has been demanded.
  • the connector may be designed not with Young's modulus but with a bending deflection coefficient (longitudinal elastic modulus at the time of bending test), and therefore, a low bending deflection coefficient is required.
  • Young's modulus represents the longitudinal elastic modulus under tensile stress
  • flexural deflection coefficient represents the longitudinal elastic modulus under complex stress of compression and tension at bending
  • the values of Young's modulus and flexural deflection coefficient are Although different, when the Young's modulus is low, the bending deflection coefficient tends to be a low value.
  • the low Young's modulus and the low flexural deflection are achieved not only by adding zinc (Zn) and phosphorus (P) to copper but also by controlling the crystal orientation.
  • Zn zinc
  • P phosphorus
  • the Young's modulus decreases and the flexibility becomes good.
  • the Corson alloy it is difficult to control the Young's modulus by simply increasing the cold rolling ratio before recrystallization without increasing the Cube orientation.
  • the present invention is a copper alloy sheet material for electrical and electronic components such as a connector which can simultaneously satisfy high strength, high conductivity and low Young's modulus required for materials for electrical and electronic components such as connectors with the development of electronics industry. And its purpose is to provide its manufacturing method.
  • the area ratio of the (111) plane facing in the rolling direction obtained by analyzing using EBSD of the copper alloy sheet is 15% or less, as described in (1) or (2).
  • Copper alloy sheet for electrical and electronic parts is (4)
  • a connector comprising the copper alloy sheet material for electric and electronic parts according to any one of (1) to (6).
  • the copper-based alloy material according to the present invention or the copper alloy material obtained by the production method of the present invention has high strength and high required for materials for electrical and electronic parts such as connectors, as compared with conventional Corson-based alloys. It has a low Young's modulus without impairing the conductivity, and is suitable as a copper alloy material for electrical and electronic parts such as connectors.
  • copper alloy material means one obtained by processing a copper alloy material into a predetermined shape (e.g., plate, strip, foil, bar, wire, etc.).
  • a plate material refers to a plate having a specific thickness, being stable in shape and having a spread in the surface direction, and in a broad sense, it includes a bar material.
  • material surface layer means “plate surface layer”
  • depth position of material means “position in the plate thickness direction”.
  • the thickness of the plate is not particularly limited, but is preferably 8 to 800 ⁇ m, more preferably 50 to 70 ⁇ m, in consideration of the fact that the effects of the present invention are more apparent and suitable for practical applications.
  • the copper alloy sheet material of the present invention defines its characteristics by the accumulation ratio of atomic planes in a predetermined direction of the rolled sheet, it has the characteristics as the present invention as a copper alloy sheet material.
  • the shape of the copper alloy plate is not limited to the plate and the strip, and in the present invention, the tube can be interpreted as a plate and handled.
  • the alloy composition of the copper alloy material of the present invention (a typical shape is a plate material), which is a precipitation type copper alloy material such as Corson type having a low Young's modulus and a low flexural deflection coefficient, Describe the organization.
  • Ni is an element which is contained together with Si to be described later, forms an Ni 2 Si phase precipitated by aging treatment, and contributes to the improvement of the strength of the copper alloy material.
  • the Ni 2 Si phase is insufficient, and the tensile strength of the copper alloy material can not be increased.
  • the Ni content is in the range of 0.5 to 5.0%, preferably 1.5 to 4.0%.
  • Co 0.5 to 5.0%
  • Co is an element which is contained together with Si to form a Co 2 Si phase precipitated by aging treatment and contributes to the improvement of the strength of the copper alloy material.
  • the content of Co is too low, the Co 2 Si phase runs short, and the tensile strength of the copper alloy material can not be increased.
  • the content of Co is too large, the conductivity decreases. In addition, the hot rolling processability is deteriorated. Therefore, the Co content is in the range of 0.5 to 5.0%, preferably 0.8 to 3.0%, and more preferably 1.1 to 1.7%.
  • Ni and Co may contain both, but the total content thereof is 0.5 to 5.0%.
  • both Ni 2 Si and Co 2 Si can be precipitated during the aging treatment to enhance the aging strength. If the total content is too small, the tensile strength can not be increased, and if too large, the electrical conductivity and the hot-rolling processability decrease. Therefore, the total content of Ni and Co is in the range of 0.5 to 5.0%, preferably 0.8 to 4.0%.
  • (Si) Si is contained together with the Ni and Co to form a Ni 2 Si or Co 2 Si phase precipitated by the aging treatment, and contributes to the improvement of the strength of the copper alloy material.
  • the content of Si is 0.2 to 1.5%, preferably 0.2 to 1.0%.
  • the tensile strength of the copper alloy material can be increased, but the excess of Si forms a solid solution in the copper matrix and the conductivity of the copper alloy material Decreases.
  • Si is excessively contained, castability in casting and rolling workability in hot and cold also decrease, and casting cracking and rolling cracking easily occur.
  • precipitation phases of Ni 2 Si or Co 2 Si will be insufficient, and the tensile strength of the material can not be increased.
  • Cr In addition to the above composition, 0.05 to 0.5 mass% of Cr may be contained. Cr has the effect of refining the crystal grains in the alloy and contributes to the improvement of the strength and bending workability of the copper alloy material. When the amount is too small, the effect is small, and when the amount is too large, a crystallized product is formed during casting and the aging strength is reduced.
  • (Other alloying elements) In the copper alloy material of the present invention, Sn: 0.01 to 1.0%, Zn: 0.01 to 1.0%, Ag: 0.01 to 10% by mass as an additive element in addition to the above basic composition. One or two or more of 1.0%, Mn: 0.01 to 1.0%, Zr: 0.1 to 1.0%, Mg: 0.01 to 1.0% in total It can be contained as needed in an amount of 1.0%.
  • Each of these elements has a common effect of improving either the high strength, conductivity or low Young's modulus that the copper alloy material of the present invention is intended to play, in addition to or instead of this. It is an element that further improves other properties (such as stress relaxation resistance). Below, the characteristic effect of each element and the significance of the content range are described.
  • (Sn) Sn is an element that mainly improves the strength of the copper alloy material, and is selectively contained when used in applications that place importance on these properties.
  • the content of Sn is too small, the strength improvement effect is small.
  • the conductivity of the copper alloy material is lowered.
  • the amount of Sn is too large, it becomes difficult to make the conductivity of the copper alloy material 30% IACS or more. Therefore, when it is contained, the content of Sn is in the range of 0.01 to 1.0%.
  • Zn The addition of Zn can improve the thermal peelability and migration resistance of the solder. If the content of Zn is too low, the effect is small. On the other hand, when Zn is contained, the conductivity of the copper alloy material is lowered, and when Zn is too much, it is difficult to set the conductivity of the copper alloy material to 30% IACS or more. Therefore, the content of Zn is in the range of 0.01 to 1.0%.
  • (Ag) Ag contributes to the increase in strength. If the content of Ag is too small, the effect is small. On the other hand, even if a large amount of Ag is contained, the strength increase effect is only saturated. Therefore, when it is contained, the content of Ag is in the range of 0.01 to 1.0%.
  • (Mn) Mn mainly improves the workability in hot rolling.
  • the content of Mn is too small, the effect is small.
  • the amount of Mn is too large, the fluidity of the copper alloy during ingot formation deteriorates, and the ingot retention decreases. Therefore, when it is contained, the content of Mn is in the range of 0.01 to 1.0%.
  • (Zr) Zr mainly refines crystal grains to improve the strength and bending workability of the copper alloy material. If the content of Zr is too small, the effect is small. On the other hand, when the amount of Zr is too large, a compound is formed, and the workability such as rolling of a copper alloy material is reduced. Therefore, when it is contained, the content of Zr is in the range of 0.01 to 1.0%.
  • Mg improves the stress relaxation resistance. Therefore, when stress relaxation resistance is required, it is selectively contained in the range of 0.01 to 1.0%. When the amount is too small, the effect of addition is small, and when the amount is too large, the conductivity decreases. Therefore, when it is contained, the content of Mg is in the range of 0.01 to 1.0%.
  • Mg, Sn, and Zn improve the stress relaxation resistance by adding them to Cu-Ni-Si, Cu-Ni-Co-Si, and Cu-Co-Si copper alloys. The stress relaxation resistance is further improved by the synergetic effect when they are added together as compared to when each of them is added alone. In addition, it has the effect of significantly improving solder embrittlement.
  • the conductivity realized by the copper alloy sheet material of the present invention is 30% IACS or more, preferably 35% IACS or more, and more preferably 45% IACS or more. There is no particular upper limit, but it is practical that it is 60% IACS or less. Further, a preferable range as a 0.2% proof stress in the rolling direction realized by the copper alloy material of the present invention is 500 MPa or more, preferably 650 MPa or more, and more preferably 800 MPa or more. There is no particular upper limit, but it is practical that it is 1100 MPa or less.
  • the bending deflection coefficient is preferably 105 GPa or less, more preferably 100 GPa or less. There is no particular lower limit, but it is practical that it is 60 GPa or more.
  • the Young's modulus is 110 GPa or less, more preferably 100 GPa or less. There is no particular lower limit, but it is practical that it is 70 GPa or more.
  • the texture of the copper alloy material of the present invention is, in particular, a surface (100) facing RD in the analysis result from the rolling direction (RD) by the SEM-EBSD method in order to realize a low Young's modulus and a low flexural deflection coefficient. It is preferable to have a texture having an area ratio of 30% or more. Note that all crystal grains having an orientation in which the angle between the sheet rolling direction (RD) and the normal to the surface is 10 ° or less has a (100) plane facing the RD.
  • a texture called Cube orientation, Goss orientation, Brass orientation, Copper orientation, S orientation, etc. is formed, and a crystal plane corresponding to them is present.
  • the material rolling direction (RD) is taken along the X axis, the plate width direction (TD) as the Y axis, and the rolling normal direction (ND) as the Z axis orthogonal coordinate system.
  • the angle between two vectors of the plane orientation ⁇ eg the normal to the (100) plane ⁇ and RD is 10 ° or less
  • the area ratio of the crystal plane is preferably 30% or more, and thereby, it is possible to have a texture with a low Young's modulus and a low flexural deflection coefficient.
  • the area ratio of the (100) plane facing the RD is more preferably 40% or more, more preferably 50% or more.
  • the Young's modulus can be 110 GPa or less
  • the bending deflection coefficient can be 105 GPa or less.
  • the area ratio of the crystal face toward RD having a low Young's modulus and a low flexural modulus (100) increases.
  • the Young's modulus can be reduced by decreasing the area ratio of the crystal face to the RD of (111) having a high Young's modulus and a high bending deflection coefficient.
  • the area ratio of the (111) plane facing RD is preferably 15% or less, more preferably 10% or less.
  • the measurement of the area ratio of the (100) plane facing RD in the texture of the copper alloy sheet can be obtained by analyzing the electron microscopic structure by SEM using EBSD.
  • a range including 400 or more crystal grains was scanned at 1 ⁇ m steps to analyze the orientation.
  • direction distribution is changing to the plate
  • the SEM-EBSD method is an abbreviation of Scanning Electron Microscopy-Electron Back Scattered Diffraction Pattern method. That is, the individual crystal grains appearing on the SEM screen are irradiated with an electron beam, and the individual crystal orientations are identified from the diffracted electrons.
  • the crystal orientation display method in this specification takes the rectangular coordinate system of the rolling direction (RD) of the material as the X axis, the sheet width direction (TD) as the Y axis, and the rolling normal direction (ND) as the Z axis.
  • the ratio of the area where the (100) plane faces is defined by the area ratio.
  • a region having an atomic plane in which the angle between the normal to the (100) plane and the RD is 10 ° or less Regarding accumulation of atomic planes facing the rolling direction (RD) of the rolled sheet, that is, facing the RD, the (100) plane itself with the rolling direction (RD) of the rolled sheet being the ideal direction as a normal
  • the region (the sum of these areas) is a combination of each of the atomic planes in which the angle between the normal of R and the angle formed by RD is 10 ° or less.
  • the features of the EBSD measurement will be described as a comparison with the X-ray diffraction measurement.
  • the first point mentioned is the crystal orientation which can not be measured by X-ray diffraction measurement, which is the S orientation and the BR orientation. In other words, by adopting EBSD, for the first time, information on S orientation and BR orientation can be obtained, and the relationship between the specified alloy structure and action can be clarified.
  • the second point is that X-ray diffraction measures the amount of crystal orientation included in ⁇ 0.5 ° of ND // ⁇ hkl ⁇ .
  • EBSD measures the amount of crystal orientation included in ⁇ 10 ° from the orientation. Therefore, EBSD measurement provides an order of magnitude comprehensive information on the alloy structure comprehensively, and it becomes clear that it is difficult to identify the entire alloy material by X-ray diffraction. As described above, the information obtained by EBSD measurement and X-ray diffraction measurement differs in the content and nature thereof. In addition, unless otherwise indicated in this specification, the result of EBSD is performed to the ND direction of a copper alloy plate material.
  • the copper alloy material of the present invention is, for example, each step of casting, hot rolling, slow cooling, cold rolling 1, intermediate annealing, cold rolling 2, solution heat treatment, aging heat treatment, finish cold rolling, low temperature annealing, Manufactured through.
  • the copper alloy material of the present invention can be manufactured with almost the same equipment as a conventional Corson alloy. In order to obtain predetermined physical properties and further a texture, it is necessary to appropriately adjust the manufacturing conditions of each process. In this respect, the copper alloy material of the present invention is manufactured by performing processing after hot rolling or at least one of cold rolling and intermediate annealing before solution treatment under predetermined conditions. Can.
  • the casting is performed by casting a molten copper alloy having its components adjusted to the above composition range. Then, the ingot is chamfered, heated or homogenized at 800 to 1000 ° C., and hot rolled.
  • the steel is rapidly quenched by a method such as water cooling immediately after hot rolling.
  • the quenching is not carried out in order to increase the (100) surface facing RD after the hot rolling, and it is characterized by slow cooling. I assume.
  • the cooling rate at the time of slow cooling is preferably 5 K / s or less.
  • the direction in which the (100) plane faces RD has a recovery phenomenon at low temperature as compared with other directions, and the area ratio of the direction in which the (100) face faces RD can be increased in the hot-rolled structure.
  • the area ratio of the orientation in which the face of (100) faces in RD in the subsequent solutionizing step It can be enhanced. Since a change in structure does not occur if the temperature upon cooling is less than 350 ° C., after the temperature is cooled to less than 350 ° C., quenching may be performed by a method such as water cooling to reduce production time.
  • the surface is cut and cold rolling 1 is performed. If the rolling reduction ratio of the cold rolling 1 is too low, even if the final product is manufactured, the brass orientation and the S orientation develop, and it becomes difficult to increase the (100) area ratio. Therefore, it is preferable that the rolling reduction rate of the cold rolling 1 be 70% or more.
  • intermediate annealing is applied at 300 to 800 ° C. for 5 seconds to 2 hours.
  • cold rolling 2 with a rolling reduction of 3 to 60% is performed. Repeating the intermediate annealing and the cold rolling 2 can further increase the area ratio of the (100) plane facing RD. Therefore, in the second preferred embodiment of the method for producing a copper alloy material of the present invention, the intermediate annealing and the cold rolling 2 are repeated twice or more.
  • the solution treatment is performed at 600 to 1000 ° C. for 5 seconds to 300 seconds. Since the necessary temperature conditions change depending on the concentrations of Ni and Co, it is necessary to select an appropriate temperature condition according to the Ni and Co concentrations. If the solution treatment temperature is too low, the strength is insufficient in the aging treatment step, and if the solution treatment temperature is too high, the material softens more than necessary and the shape control becomes difficult, which is not preferable.
  • the aging treatment is performed at 400 to 600 ° C. for 0.5 to 8 hours. Since the necessary temperature conditions change depending on the concentrations of Ni and Co, it is necessary to select an appropriate temperature condition according to the Ni and Co concentrations. When the temperature of the aging treatment is too low, the amount of aging precipitation decreases and the strength is insufficient. In addition, when the temperature of the aging treatment is too high, the precipitates become coarse and the strength decreases.
  • the working ratio of finish cold rolling after solution treatment it is preferable to set the working ratio of finish cold rolling after solution treatment to 50% or less.
  • the crystal grains having (100) orientation such as Cube orientation can be prevented from rotating in orientation to Brass, S, Copper orientation, etc., and the physical properties of the obtained copper alloy material In addition, it is possible to achieve the desirable state of the texture.
  • Low temperature annealing is performed at 300 to 700 ° C. for 10 seconds to 2 hours. This annealing can improve the stress relaxation resistance and the spring limit value required for the connector material.
  • the steps of both the first embodiment and the second embodiment are performed, that is, until the temperature range of at least less than 350 ° C. after hot rolling. Is not rapid cooling but gradual cooling (preferably with a cooling rate of 5 K / sec or less), and intermediate annealing and cold rolling 2 are repeated twice or more.
  • the copper alloy material of the present invention manufactured by the above method has predetermined properties, it is verified by EBSD analysis whether the physical properties of the copper alloy material and the texture are within the predetermined range. do it.
  • the copper alloy of each composition shown in the following Tables 1 and 2 was cast to manufacture a copper alloy plate, and each characteristic such as strength (0.2% proof stress), conductivity, Young's modulus was evaluated.
  • casting was performed by a DC (Direct Chill) method to obtain an ingot having a thickness of 30 mm, a width of 100 mm, and a length of 150 mm.
  • these ingots were heated to 950 ° C., held at this temperature for 1 hour, hot-rolled to a thickness of 14 mm, gradually cooled at a cooling rate of 1 K / s, and cooled to 300 ° C. or less.
  • the both surfaces were subjected to 2 mm face milling to remove the oxide film, and then cold rolling 1 with a rolling ratio of 90 to 95% was applied. Thereafter, cold rolling 2 was performed at an intermediate annealing temperature of 350 to 700 ° C. for 30 minutes and a cold rolling ratio of 10 to 30%.
  • solution treatment was performed at 700 to 950 ° C. under various conditions for 5 seconds to 10 minutes, and immediately cooled at a cooling rate of 15 ° C./second or more.
  • aging was performed at 400 to 600 ° C. for 2 hours, and then finish rolling was performed at a rolling reduction of 50% or less, and the final plate thickness was made 0.15 mm.
  • finish rolling a low temperature annealing treatment was performed at 400 ° C. for 30 seconds to obtain a copper alloy sheet of each alloy composition.
  • the sum of the areas of the (100) planes of the crystal grains having the normal to the (100) plane such that the angle between the plate material sample and the rolling direction (RD) makes 10 ° or less is determined
  • the area ratio (%) of the (100) plane facing RD was obtained by dividing the sum of the areas by the total measurement area.
  • the crystal grains having the above-mentioned angle of 10 ° or less were the same orientation grains.
  • the area ratio (%) of the (111) plane facing RD was similarly determined.
  • (2) 0.2% proof stress The 0.2% proof stress was determined in accordance with JIS Z 2241 by cutting a No. 5 test piece described in JIS Z 2201 from each test material. The 0.2% proof stress is shown by rounding to an integral multiple of 5 MPa.
  • Table 1 shows an example of the present invention.
  • the texture was within the preferable range of the present invention, and all of 0.2% proof stress, conductivity, Young's modulus and bending deflection coefficient were excellent.
  • Table 2 shows a comparative example to the present invention. Comparative Examples 1, 2 and 5 were inferior in 0.2% proof stress because the content of Ni and / or Co and the content of Si were too smaller than the range of the present invention. In Comparative Examples 3, 4, 6, and 7, since the content of Ni and / or Co was too high, cracking occurred during hot rolling, and the production was stopped. In Comparative Example 8, the conductivity was inferior because the concentration of Si was too high.
  • the following comparative example is an example using the same ingot as Example 2.
  • Comparative Example 2-2 is an example in which water cooling was immediately performed after hot rolling, intermediate annealing and cold rolling 2 were omitted, and the others were prepared in the same manner as in Example 2, but the (100) plane is suitable for RD The area ratio of (111) was low, and the area ratio of (111) plane was high, and the Young's modulus and bending deflection coefficient were higher than those of the inventive example.
  • Comparative Example 2-3 is an example produced similarly to Example 2 except that water cooling is immediately performed after hot rolling, but the area ratio of the (100) plane facing RD is low, and the Young's modulus is an example of the present invention It was higher than that.
  • Table 3 shows another embodiment.
  • Examples 10-2, 18-2 and 25-2 of Table 3 the same ingot as that of Examples 10, 18 and 25 of Table 1 was used, and water cooling was immediately performed after hot rolling, and intermediate annealing and cooling were performed. This is an example in which the inter-rolling 2 was repeated twice, and the others were produced in the same manner as in each example of Table 1 and the respective characteristics were similarly evaluated.
  • the area ratio of the (100) plane facing RD is within the preferable range of the present invention, and the strength, the conductivity, the Young's modulus, and the bending deflection coefficient are excellent.
  • Examples 10-3, 18-3, and 25-3 using the same ingots as those of Examples 10, 18, and 25 in Table 1, intermediate annealing and cold rolling 2 are repeated twice, and the others are It is the example which produced similarly to each Example of Table 1, and evaluated each characteristic similarly. These had a particularly high area ratio of (100) face toward RD, a Young's modulus was particularly low at 100 GPa or less, a bending deflection coefficient was particularly low at 90 GPa, and 0.2% proof stress and conductivity were excellent. .
  • Comparative Example 101 Condition of JP 2009-007666 A metal element similar to that of the invention example 1-1 was blended, and an alloy composed of Cu and incidental impurities with the balance was melted in a high frequency melting furnace, This was cast at a cooling rate of 0.1 to 100 ° C./sec to obtain an ingot. After holding this at 900 ° C. to 1020 ° C. for 3 minutes to 10 hours, it was hot-worked and then water-quenched to carry out facing for oxide scale removal. In the subsequent steps, a copper alloy c01 was produced by the treatment of steps A-3 and B-3 described below.
  • the manufacturing process includes one or more solution heat treatment, in which the steps are classified before and after the last solution heat treatment, and the steps up to intermediate solution treatment are designated as A-3, It was designated as B-3 step in the step after intermediate solution treatment.
  • Step A-3 Cold work with a reduction in area of 20% or more, heat treatment for 5 minutes to 10 hours at 350 to 750 ° C., cold work with a reduction in area of 5 to 50%, 800 A solution heat treatment is performed at about 1000 ° C. for 5 seconds to 30 minutes.
  • Step B-3 Cold work with a reduction in area of 50% or less, heat treatment at 400 to 700 ° C. for 5 minutes to 10 hours, cold work with a reduction in area of 30% or less, Apply temper annealing at 550 ° C. for 5 seconds to 10 hours.
  • the obtained test body c01 differs from the above example in terms of the presence or absence of slow cooling to 350 ° C. after hot rolling with respect to manufacturing conditions, and the area ratio of the (111) plane facing RD is high, Young's modulus and bending The deflection coefficient did not meet the required characteristics.
  • Comparative Example 102 Condition of Japanese Patent Application Laid-Open No. 2006-283059
  • the copper alloy having the composition of the above-mentioned inventive example 1-1 was dissolved in the atmosphere with an electric furnace under charcoal coating, and the possibility of casting was judged. .
  • the molten ingot was hot-rolled and finished to a thickness of 15 mm.
  • cold rolling and heat treatment (cold rolling 1 ⁇ solution annealing continuous annealing ⁇ cold rolling 2 ⁇ aging treatment ⁇ cold rolling 3 ⁇ short time annealing) are applied to the hot-rolled material, and a predetermined thickness is obtained.
  • Copper alloy sheet (c02) was produced.
  • the obtained test body c02 is different from the above-mentioned Example 1 in the presence or absence of slow cooling to 350 ° C. after hot rolling and the presence or absence of intermediate annealing before solution treatment and cold rolling with respect to production conditions.
  • the area ratio of the (111) plane facing to was high, and the result was not satisfied with the Young's modulus and bending deflection coefficient.
  • Comparative Example 103 Condition of JP-A-2006-152392 The alloy having the composition of the above-mentioned invention example 1-1 is melted under charcoal covering in the atmosphere in a krypton furnace and cast in a cast iron book mold. Thus, an ingot having a thickness of 50 mm, a width of 75 mm and a length of 180 mm was obtained. Then, after the surface of the ingot was chamfered, it was hot rolled at a temperature of 950 ° C. to a thickness of 15 mm, and quenched into water from a temperature of 750 ° C. or more. Next, after removing the oxide scale, cold rolling was performed to obtain a plate having a predetermined thickness.
  • the obtained test body c03 is different from the above-mentioned Example 1 in the presence or absence of slow cooling to 350 ° C. after hot rolling and the presence or absence of intermediate annealing before solution treatment and cold rolling with respect to production conditions.
  • the area ratio of the (111) plane facing to was high, and the result was not satisfied with the Young's modulus and bending deflection coefficient.
  • Comparative Example 104 Condition of JP-A-2008-223136 The copper alloy shown in Example 1 was melted and cast using a vertical continuous casting machine. A sample of 50 mm in thickness was cut out from the obtained slab (180 mm in thickness), heated to 950 ° C., extracted, and hot rolling was started. At this time, a pass schedule was set so that the rolling reduction in a temperature range of 950 to 700 ° C. would be 60% or more and rolling could be performed in a temperature range of less than 700 ° C. The final pass temperature for hot rolling is between 600 and 400 ° C. The total hot-rolling rate from the slab is about 90%. After hot rolling, the surface oxide layer was removed by mechanical polishing (face grinding).
  • the aging treatment temperature was set to 450 ° C., and the aging time was adjusted to a time at which the hardness peaked at 450 ° C. aging depending on the alloy composition.
  • the optimum solution treatment conditions and aging treatment time are grasped by preliminary experiments according to such alloy composition.
  • finish cold rolling was performed at a rolling ratio.
  • the final cold-rolled product was further subjected to low-temperature annealing for 5 minutes in a 400 ° C. furnace.
  • the test material c04 was obtained.
  • the main production conditions are described below.
  • the obtained test body c04 is different from the above-mentioned Example 1 in the presence or absence of slow cooling up to 350 ° C. after hot rolling and the presence or absence of intermediate annealing before solution treatment and cold rolling with respect to production conditions.
  • the area ratio of the (111) plane facing to was high, and the result was not satisfied with the Young's modulus and bending deflection coefficient.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Conductive Materials (AREA)

Abstract

Disclosed is a copper alloy sheet material for an electrical/electronic component, which has low Young's modulus that is required for an electrical/electronic component such as a connector. The copper alloy sheet material for an electrical/electronic component has an alloy composition containing 0.5-5.0% by mass of Ni and/or Co in total and 0.2-1.5% by mass of Si, with the balance made up of Cu and unavoidable impurities. The copper alloy sheet material for an electrical/electronic component has a 0.2% proof stress in the rolling direction of not less than 500 MPa, a conductivity of not less than 30% IACS, a Young's modulus of not more than 110 GPa and a bending/flexure coefficient of not more than 105 GPa.

Description

低ヤング率を有する銅合金板材およびその製造法Copper alloy sheet having low Young's modulus and method for producing the same
 本発明は、コネクタ等の電気・電子部品用材料として好適な高強度と高導電性を有し、さらに低ヤング率を有する銅合金板材、およびその製造法に関するものである。 The present invention relates to a copper alloy sheet having high strength and high conductivity suitable as materials for electric and electronic parts such as connectors, and further having a low Young's modulus, and a method for producing the same.
 近年、エレクトロニクス産業の発達により、種々の電気・電子機器の配線は複雑化、高集積化が進み、それに伴い電気・電子部品用として銅合金が使用される機会が増加している。特に、コネクタ等の電気・電子部品には、狭ピッチ、低背化、高信頼性、低コスト化が要求されている。よって、これらの要求を満たすために、コネクタ等の電気・電子部品に用いられる銅合金板材は、薄肉化され、また複雑な形状にプレスされるために、高い強度と導電率を有し、同時にプレス成形性に優れることが必要とされる。 In recent years, with the development of the electronics industry, the wiring of various electric and electronic devices has become more complicated and highly integrated, and the opportunities for using copper alloys for electric and electronic parts have been increased accordingly. In particular, narrow pitches, low height, high reliability, and low cost are required for electrical and electronic parts such as connectors. Therefore, in order to satisfy these requirements, copper alloy sheet materials used for electrical and electronic parts such as connectors have high strength and conductivity, and at the same time, because they are thinned and pressed into complicated shapes. It is required that the press formability is excellent.
 端子として使用するためには、挿抜時や曲げに対して変形しない強度として、圧延方向(RD)の引張強さは500MPa以上、さらに、通電によるジュール熱発生を抑えるため、導電率は30%IACS以上が好ましい。 To be used as a terminal, the tensile strength in the rolling direction (RD) is 500MPa or more as the strength not to be deformed during insertion and removal or bending, and furthermore, the electrical conductivity is 30% IACS to suppress the generation of Joule heat due to energization. The above is preferable.
 また従来は、コネクタが小型化され、小さな変位で大きな応力が得られるようコネクタ用材料のヤング率が大きいことが求められていた。しかしながら、端子自身の寸法精度が厳しくなり、金型技術やプレスの操業管理、またはコネクタ用材料の板厚や残留応力のバラツキ等、管理基準が厳しくなり、逆にコストアップを招いていた。そこで、最近はヤング率の小さいコネクタ用材料を用い、ばねの変位を大きくとる構造とし、寸法のばらつきを許容できる設計が求められてきている。したがって、圧延方向のヤング率が110GPa以下、好ましくは100GPa以下であることが求められてきている。 Also, conventionally, it has been required that the connector be miniaturized and that a large Young's modulus of the connector material be obtained so that a large stress can be obtained with a small displacement. However, the dimensional accuracy of the terminal itself becomes severe, and management standards such as die technology and press operation management, or variations in plate thickness and residual stress of connector materials become strict, which in turn causes an increase in cost. Therefore, recently, a connector material having a small Young's modulus is used, a structure in which the displacement of the spring is large, and a design that can tolerate variations in dimensions are being sought. Therefore, it is required that the Young's modulus in the rolling direction is 110 GPa or less, preferably 100 GPa or less.
 これまでに、黄銅やりん青銅等が、コネクタ用材料として一般的に使用されてきている。黄銅、りん青銅共に圧延方向のヤング率は約110~120GPaであり、純銅のヤング率128GPaと比べて小さく、低ヤング率材として広く使用されている。しかしながらこれらの銅合金は導電率が30%IACS以下であり、導電率が低く、大電流を流す用途としてはコネクタとして使用できない。そこで、中程度の導電率をもつコルソン系合金が注目され、使用量が増加してきているが、このコルソン系合金は、ヤング率が約130GPaであり、この点でコネクタ材料の低ヤング率化が求められている。また、コネクタの設計者によっては、ヤング率ではなく、曲げたわみ係数(曲げ試験時の縦弾性係数)でコネクタを設計する場合もあり、低曲げたわみ係数化が求められている。一般的に、ヤング率は引張応力下での縦弾性係数を表し、曲げたわみ係数は曲げ時の圧縮と引張の複雑な応力下での縦弾性係数を表し、ヤング率と曲げたわみ係数の値は異なるが、ヤング率が低ければ、曲げたわみ係数も低い値となる傾向がある。 So far, brass, phosphor bronze and the like have been generally used as connector materials. The Young's modulus in the rolling direction of both brass and phosphor bronze is about 110 to 120 GPa, which is smaller than the Young's modulus 128 GPa of pure copper, and is widely used as a low Young's modulus material. However, these copper alloys have a conductivity of 30% IACS or less, a low conductivity, and can not be used as a connector in applications where a large current flows. Therefore, Corson alloys having moderate conductivity have been attracting attention, and the amount used has been increasing. However, this Corson alloy has a Young's modulus of about 130 GPa, and in this point, the Young's modulus of the connector material is reduced. It has been demanded. In addition, depending on the connector designer, the connector may be designed not with Young's modulus but with a bending deflection coefficient (longitudinal elastic modulus at the time of bending test), and therefore, a low bending deflection coefficient is required. In general, Young's modulus represents the longitudinal elastic modulus under tensile stress, flexural deflection coefficient represents the longitudinal elastic modulus under complex stress of compression and tension at bending, and the values of Young's modulus and flexural deflection coefficient are Although different, when the Young's modulus is low, the bending deflection coefficient tends to be a low value.
 低ヤング率化および低曲げたわみ係数化は、亜鉛(Zn)やリン(P)を銅に添加するだけでなく、結晶方位を制御することでも達成される。例えば特許文献1や特許文献2で述べられているように、純銅では高い加工率で圧延後に熱処理して再結晶させると板材の圧延法線方向(ND)に対してCube方位(100)<100>が増加することで、ヤング率が低下し、屈曲性が良好となる。しかしながら、コルソン系合金では単純に再結晶前の冷間圧延率を高めるのみでは、Cube方位は増加せず、ヤング率を制御することは困難であった。 The low Young's modulus and the low flexural deflection are achieved not only by adding zinc (Zn) and phosphorus (P) to copper but also by controlling the crystal orientation. For example, as described in Patent Document 1 and Patent Document 2, in pure copper, when rolled after heat treatment and recrystallization after rolling at a high working ratio, Cube orientation (100) <100 relative to the normal direction of rolling (ND) of the plate material By increasing>, the Young's modulus decreases and the flexibility becomes good. However, with the Corson alloy, it is difficult to control the Young's modulus by simply increasing the cold rolling ratio before recrystallization without increasing the Cube orientation.
特開昭55-54554号公報Japanese Patent Application Laid-Open No. 55-54554 特許3009383号公報Patent No. 3009383
 本発明は、エレクトロニクス産業の発達によりコネクタ等の電気・電子部品用材料に要求される高い強度、高い導電率、低いヤング率を同時に満足することができるコネクタ等の電気・電子部品用銅合金板材とその製造法を提供することを目的とする。 The present invention is a copper alloy sheet material for electrical and electronic components such as a connector which can simultaneously satisfy high strength, high conductivity and low Young's modulus required for materials for electrical and electronic components such as connectors with the development of electronics industry. And its purpose is to provide its manufacturing method.
 本発明によれば、以下の手段が提供される。
(1)NiとCoのどちらか一方または両方の合計で0.5~5.0質量%、Siを0.2~1.5質量%含有し、残部がCuおよび不可避不純物からなる合金組成を有してなり、圧延方向の0.2%耐力が500MPa以上、導電率が30%IACS以上、ヤング率が110GPa以下、曲げたわみ係数が105GPa以下であることを特徴とする電気・電子部品用銅合金板材。
(2)前記銅合金板材のEBSDを用いて解析することによって得られる圧延方向に向く(100)面の面積率が30%以上であることを特徴とする(1)に記載の電気・電子部品用銅合金板材。
(3)前記銅合金板材のEBSDを用いて解析することによって得られる圧延方向に向く(111)面の面積率が15%以下であることを特徴とする(1)又は(2)に記載の電気・電子部品用銅合金板材。
(4)さらに、Crを0.05~0.5質量%含有することを特徴とする(1)~(3)のいずれかに記載の電気・電子部品用銅合金板材。
(5)さらに、Zn、Sn、Mg、Ag、MnおよびZrからなる群から選ばれる1種または2種以上を合計で0.01~1.0質量%含有することを特徴とする(1)~(4)のいずれかに記載の電気・電子部品用銅合金板材。
(6)コネクタ用材料であることを特徴とする(1)~(5)のいずれか1項に記載の電気・電子部品用銅合金板材。
(7)(1)~(6)のいずれか1項に記載の電気・電子部品用銅合金板材からなるコネクタ。
(8)(1)~(7)のいずれか1項に記載の電気・電子部品用銅合金板材を製造する方法であって、前記合金組成を与える銅合金に、鋳造、熱間圧延、冷間圧延1、中間焼鈍、冷間圧延2、溶体化熱処理、時効熱処理、仕上げ冷間圧延、低温焼鈍の各工程をこの順に施し、さらに、下記[1]と[2]の少なくともいずれか一方または両方の処理を行うことを特徴とする電気・電子部品用銅合金板材の製造方法。
 [1]上記熱間圧延後に350℃までは徐冷する工程
 [2]前記中間焼鈍と冷間圧延2とを2回以上繰り返して行う工程
According to the present invention, the following means are provided.
(1) An alloy composition containing 0.5 to 5.0% by mass and 0.2 to 1.5% by mass of Si in total of one or both of Ni and Co, and the balance being Cu and unavoidable impurities Copper having a 0.2% proof stress in the rolling direction of 500 MPa or more, a conductivity of 30% IACS or more, a Young's modulus of 110 GPa or less, and a bending deflection coefficient of 105 GPa or less Alloy plate material.
(2) The electrical / electronic component according to (1), wherein the area ratio of the (100) plane directed to the rolling direction obtained by analyzing using EBSD of the copper alloy sheet is 30% or more. Copper alloy sheet material.
(3) The area ratio of the (111) plane facing in the rolling direction obtained by analyzing using EBSD of the copper alloy sheet is 15% or less, as described in (1) or (2). Copper alloy sheet for electrical and electronic parts.
(4) The copper alloy sheet material for electric and electronic parts according to any one of (1) to (3), which further contains 0.05 to 0.5% by mass of Cr.
(5) Furthermore, it is characterized in that it contains 0.01 to 1.0% by mass in total of one or more selected from the group consisting of Zn, Sn, Mg, Ag, Mn and Zr. A copper alloy sheet material for electric and electronic parts according to any one of (4) to (4).
(6) A copper alloy sheet material for electric and electronic parts according to any one of (1) to (5), which is a material for a connector.
(7) A connector comprising the copper alloy sheet material for electric and electronic parts according to any one of (1) to (6).
(8) A method of producing a copper alloy sheet material for electric and electronic parts according to any one of (1) to (7), wherein casting, hot rolling or cold rolling is performed on a copper alloy giving said alloy composition. The following steps are carried out in this order: intermediate rolling 1, intermediate annealing, cold rolling 2, solution heat treatment, aging heat treatment, finish cold rolling, low temperature annealing, and further at least one of the following [1] and [2] or The manufacturing method of the copper alloy board material for electric and electronic parts characterized by performing both processings.
[1] Step of gradually cooling to 350 ° C. after the above hot rolling [2] Step of repeating the intermediate annealing and the cold rolling 2 twice or more
 本発明に係る銅基合金材料または本発明の製造法によって得られた銅合金材料は、従来のコルソン系合金と比較して、コネクタ等の電気・電子部品用材料に要求される高強度や高導電率を損ねることなく、低ヤング率を有し、コネクタ等の電気・電子部品用銅合金材料として好適なものである。 The copper-based alloy material according to the present invention or the copper alloy material obtained by the production method of the present invention has high strength and high required for materials for electrical and electronic parts such as connectors, as compared with conventional Corson-based alloys. It has a low Young's modulus without impairing the conductivity, and is suitable as a copper alloy material for electrical and electronic parts such as connectors.
 本発明の銅合金板材の好ましい実施の態様について、詳細に説明する。ここで、「銅合金材料」とは、銅合金素材が所定の形状(例えば、板、条、箔、棒、線など)に加工されたものを意味する。そのなかで板材とは、特定の厚みを有し形状的に安定しており面方向に広がりをもつものを指し、広義には条材を含む意味である。ここで、板材において、「材料表層」とは、「板表層」を意味し、「材料の深さ位置」とは、「板厚方向の位置」を意味する。板材の厚さは特に限定されないが、本発明の効果が一層よく顕れ実際的なアプリケーションに適合することを考慮すると、8~800μmが好ましく、50~70μmがより好ましい。
 なお、本発明の銅合金板材は、その特性を圧延板の所定の方向における原子面の集積率で規定するものであるが、これは銅合金板材として本発明のような特性を有していれば良いのであって、銅合金板材の形状は板材や条材に限定されるものではなく、本発明では、管材も板材として解釈して取り扱うことができるものとする。
 上記の、低ヤング率および低曲げたわみ係数を有するコルソン系などの析出型銅合金材料である本発明の銅合金材料(代表的な形状としては、板材)について、まずその合金組成を、次いでその組織を説明する。
A preferred embodiment of the copper alloy sheet of the present invention will be described in detail. Here, "copper alloy material" means one obtained by processing a copper alloy material into a predetermined shape (e.g., plate, strip, foil, bar, wire, etc.). Among them, a plate material refers to a plate having a specific thickness, being stable in shape and having a spread in the surface direction, and in a broad sense, it includes a bar material. Here, in the plate material, “material surface layer” means “plate surface layer”, and “depth position of material” means “position in the plate thickness direction”. The thickness of the plate is not particularly limited, but is preferably 8 to 800 μm, more preferably 50 to 70 μm, in consideration of the fact that the effects of the present invention are more apparent and suitable for practical applications.
Although the copper alloy sheet material of the present invention defines its characteristics by the accumulation ratio of atomic planes in a predetermined direction of the rolled sheet, it has the characteristics as the present invention as a copper alloy sheet material. The shape of the copper alloy plate is not limited to the plate and the strip, and in the present invention, the tube can be interpreted as a plate and handled.
First, the alloy composition of the copper alloy material of the present invention (a typical shape is a plate material), which is a precipitation type copper alloy material such as Corson type having a low Young's modulus and a low flexural deflection coefficient, Describe the organization.
(銅合金材料の成分組成)
 高強度を有するための前提となる、本発明の銅合金材料における化学成分組成の限定理由を説明する(ここで記載する含有量「%」は全て「質量%」である)。
(Component composition of copper alloy material)
The reasons for limitation of the chemical composition in the copper alloy material of the present invention, which is a premise for having high strength, will be described (all the contents "%" described herein are "% by mass").
(Ni:0.5~5.0%)
 Niは後述するSiと共に含有されて、時効処理で析出したNiSi相を形成して、銅合金材料の強度の向上に寄与する元素である。Niの含有量が少なすぎる場合は、前記NiSi相が不足し、銅合金材料の引張強さを高めることができない。一方、Niの含有量が多すぎると、導電率が低下する。また、熱間圧延加工性が悪化する。したがって、Ni含有量は0.5~5.0%の範囲とし、好ましくは1.5~4.0%である。
(Ni: 0.5 to 5.0%)
Ni is an element which is contained together with Si to be described later, forms an Ni 2 Si phase precipitated by aging treatment, and contributes to the improvement of the strength of the copper alloy material. When the content of Ni is too low, the Ni 2 Si phase is insufficient, and the tensile strength of the copper alloy material can not be increased. On the other hand, when the content of Ni is too large, the conductivity decreases. In addition, the hot rolling processability is deteriorated. Therefore, the Ni content is in the range of 0.5 to 5.0%, preferably 1.5 to 4.0%.
(Co:0.5~5.0%)
 CoはSiと共に含有されて、時効処理で析出したCoSi相を形成して、銅合金材料の強度の向上に寄与する元素である。導電性を高めたい場合は、Niを含まずCoを単独で含有させることが好ましい。Coの含有量が少なすぎる場合は、前記CoSi相が不足し、銅合金材料の引張強さを高めることができない。一方、Coの含有量が多すぎると、導電率が低下する。また、熱間圧延加工性が悪化する。したがって、Co含有量は0.5~5.0%の範囲とし、好ましくは0.8~3.0%、さらに好ましくは1.1~1.7%である。
(Co: 0.5 to 5.0%)
Co is an element which is contained together with Si to form a Co 2 Si phase precipitated by aging treatment and contributes to the improvement of the strength of the copper alloy material. When it is desired to enhance the conductivity, it is preferable not to contain Ni but to contain Co alone. When the content of Co is too low, the Co 2 Si phase runs short, and the tensile strength of the copper alloy material can not be increased. On the other hand, when the content of Co is too large, the conductivity decreases. In addition, the hot rolling processability is deteriorated. Therefore, the Co content is in the range of 0.5 to 5.0%, preferably 0.8 to 3.0%, and more preferably 1.1 to 1.7%.
 これらNiとCoは両方を含有してもよいが、これらの含有量を合計で0.5~5.0%とする。NiとCoの両方を含有すると、時効処理の際にNiSiとCoSiの両方が析出し、時効強度を高めることができる。この合計の含有量が少なすぎる場合は、引張強さを高めることができず、多すぎると導電率や熱間圧延加工性が低下する。したがって、NiとCoの含有量の合計は0.5~5.0%の範囲とし、好ましくは0.8~4.0%である。 These Ni and Co may contain both, but the total content thereof is 0.5 to 5.0%. When both Ni and Co are contained, both Ni 2 Si and Co 2 Si can be precipitated during the aging treatment to enhance the aging strength. If the total content is too small, the tensile strength can not be increased, and if too large, the electrical conductivity and the hot-rolling processability decrease. Therefore, the total content of Ni and Co is in the range of 0.5 to 5.0%, preferably 0.8 to 4.0%.
(Si)
 Siは前記Ni、Coと共に含有されて、時効処理で析出したNiSiまたはCoSi相を形成して、銅合金材料の強度の向上に寄与する。Siの含有量は、0.2~1.5%とし、好ましくは0.2~1.0%である。Siの含有量は化学量論比でNi/Si=4.2、Co/Si=4.2とするのが最も導電率と強度のバランスがよい。そのためSiの含有量は、Ni/Si、Co/Si、(Ni+Co)/Siが3.2~5.2の範囲となるようにするのが好ましく、より好ましくは3.5~4.8である。
(Si)
Si is contained together with the Ni and Co to form a Ni 2 Si or Co 2 Si phase precipitated by the aging treatment, and contributes to the improvement of the strength of the copper alloy material. The content of Si is 0.2 to 1.5%, preferably 0.2 to 1.0%. The Si content is most preferably Ni / Si = 4.2 and Co / Si = 4.2 in terms of stoichiometry, for the best balance between conductivity and strength. Therefore, the content of Si is preferably such that Ni / Si, Co / Si, and (Ni + Co) / Si are in the range of 3.2 to 5.2, and more preferably 3.5 to 4.8. is there.
 この範囲から外れ、Siが過剰に含まれた場合、銅合金材料の引張強さを高くすることができるが、過剰な分のSiが銅のマトリックス中に固溶し、銅合金材料の導電率が低下する。また、Siが過剰に含まれた場合、鋳造での鋳造性や、熱間および冷間での圧延加工性も低下し、鋳造割れや圧延割れが生じやすくなる。一方、この範囲から外れ、Siの含有量が少な過ぎる場合は、NiSiやCoSiの析出相が不足し材料の引張強さを高くすることができない。 If it is out of this range and Si is contained in excess, the tensile strength of the copper alloy material can be increased, but the excess of Si forms a solid solution in the copper matrix and the conductivity of the copper alloy material Decreases. In addition, when Si is excessively contained, castability in casting and rolling workability in hot and cold also decrease, and casting cracking and rolling cracking easily occur. On the other hand, if it is out of this range and the content of Si is too small, precipitation phases of Ni 2 Si or Co 2 Si will be insufficient, and the tensile strength of the material can not be increased.
(Cr)
 上記組成に加えて、Crを0.05~0.5質量%含有してもよい。Crは合金中の結晶粒を微細化する効果があり、銅合金材料の強度や曲げ加工性の向上に寄与する。少なすぎるとその効果が小さく、多すぎると鋳造時に晶出物を形成し時効強度が低下する。
(Cr)
In addition to the above composition, 0.05 to 0.5 mass% of Cr may be contained. Cr has the effect of refining the crystal grains in the alloy and contributes to the improvement of the strength and bending workability of the copper alloy material. When the amount is too small, the effect is small, and when the amount is too large, a crystallized product is formed during casting and the aging strength is reduced.
(その他の合金元素)
 本発明の銅合金材料は、上記基本組成の他に添加元素として、質量%で、Sn:0.01~1.0%、Zn:0.01~1.0%、Ag:0.01~1.0%、Mn:0.01~1.0%、Zr:0.1~1.0%、Mg:0.01~1.0%の一種または二種以上を合計で0.01~1.0%の量で、必要に応じて含有することができる。これらの元素は、いずれも本発明の銅合金材料が奏しようとする高い強度や導電率あるいは低いヤング率のいずれかを向上させる共通の効果があるか、これに加えてあるいはこれに代えて、さらに他の性質(耐応力緩和特性など)を向上させる元素である。以下に、各元素の特徴的な作用効果と含有範囲の意義を記載する。
(Other alloying elements)
In the copper alloy material of the present invention, Sn: 0.01 to 1.0%, Zn: 0.01 to 1.0%, Ag: 0.01 to 10% by mass as an additive element in addition to the above basic composition. One or two or more of 1.0%, Mn: 0.01 to 1.0%, Zr: 0.1 to 1.0%, Mg: 0.01 to 1.0% in total It can be contained as needed in an amount of 1.0%. Each of these elements has a common effect of improving either the high strength, conductivity or low Young's modulus that the copper alloy material of the present invention is intended to play, in addition to or instead of this. It is an element that further improves other properties (such as stress relaxation resistance). Below, the characteristic effect of each element and the significance of the content range are described.
(Sn)
 Snは主に銅合金材料の強度を向上させる元素であり、これらの特性を重視する用途に使用する場合には、選択的に含有させる。Snの含有量が少なすぎるとその強度向上効果が小さい。一方、Snを含有させると銅合金材料の導電率が低下する。特に、Snが多すぎると、銅合金材料の導電率を30%IACS以上とすることが難しくなる。したがって、含有させる場合には、Snの含有量を0.01~1.0%の範囲とする。
(Sn)
Sn is an element that mainly improves the strength of the copper alloy material, and is selectively contained when used in applications that place importance on these properties. When the content of Sn is too small, the strength improvement effect is small. On the other hand, when Sn is contained, the conductivity of the copper alloy material is lowered. In particular, when the amount of Sn is too large, it becomes difficult to make the conductivity of the copper alloy material 30% IACS or more. Therefore, when it is contained, the content of Sn is in the range of 0.01 to 1.0%.
(Zn)
 Zn添加により、半田の耐熱剥離性や耐マイグレーション性を向上させることができる。Znの含有量が少なすぎるとその効果が小さい。一方、Znを含有させると銅合金材料の導電率が低下し、Znが多すぎると、銅合金材料の導電率を30%IACS以上とすることが難しくなる。したがって、Znの含有量を0.01~1.0%の範囲とする。
(Zn)
The addition of Zn can improve the thermal peelability and migration resistance of the solder. If the content of Zn is too low, the effect is small. On the other hand, when Zn is contained, the conductivity of the copper alloy material is lowered, and when Zn is too much, it is difficult to set the conductivity of the copper alloy material to 30% IACS or more. Therefore, the content of Zn is in the range of 0.01 to 1.0%.
(Ag)
 Agは強度の上昇に寄与する。Agの含有量が少なすぎるとその効果が小さい。一方、Agを多く含有させても、強度上昇効果が飽和するだけである。したがって、含有させる場合には、Agの含有量を0.01~1.0%の範囲とする。
(Ag)
Ag contributes to the increase in strength. If the content of Ag is too small, the effect is small. On the other hand, even if a large amount of Ag is contained, the strength increase effect is only saturated. Therefore, when it is contained, the content of Ag is in the range of 0.01 to 1.0%.
(Mn)
 Mnは主に熱間圧延での加工性を向上させる。Mnの含有量が少なすぎるとその効果が小さい。一方、Mnが多すぎると、銅合金の造塊時の湯流れ性が悪化して造塊歩留まりが低下する。したがって、含有させる場合には、Mnの含有量を0.01~1.0%の範囲とする。
(Mn)
Mn mainly improves the workability in hot rolling. When the content of Mn is too small, the effect is small. On the other hand, when the amount of Mn is too large, the fluidity of the copper alloy during ingot formation deteriorates, and the ingot retention decreases. Therefore, when it is contained, the content of Mn is in the range of 0.01 to 1.0%.
(Zr)
 Zrは主に結晶粒を微細化させて、銅合金材料の強度や曲げ加工性を向上させる。Zrの含有量が少なすぎるとその効果が小さい。一方、Zrが多すぎると、化合物を形成し、銅合金材料の圧延などの加工性が低下する。したがって、含有させる場合には、Zrの含有量を0.01~1.0%の範囲とする。
(Zr)
Zr mainly refines crystal grains to improve the strength and bending workability of the copper alloy material. If the content of Zr is too small, the effect is small. On the other hand, when the amount of Zr is too large, a compound is formed, and the workability such as rolling of a copper alloy material is reduced. Therefore, when it is contained, the content of Zr is in the range of 0.01 to 1.0%.
(Mg)
 Mgは耐応力緩和特性を向上させる。したがって、耐応力緩和特性が必要な場合には、0.01~1.0%の範囲で選択的に含有させる。少なすぎると、添加した効果が小さく、多すぎると導電率が低下する。したがって、含有させる場合には、Mgの含有量を0.01~1.0%の範囲とする。
 なお、Mg、Sn、Znは、Cu-Ni-Si系、Cu-Ni-Co-Si系、Cu-Co-Si系銅合金に添加することで、いずれも耐応力緩和特性が向上する。それぞれを単独で添加した場合よりも併せて添加した場合に相乗効果によってさらに耐応力緩和特性が向上する。また、半田脆化を著しく改善する効果がある。
(Mg)
Mg improves the stress relaxation resistance. Therefore, when stress relaxation resistance is required, it is selectively contained in the range of 0.01 to 1.0%. When the amount is too small, the effect of addition is small, and when the amount is too large, the conductivity decreases. Therefore, when it is contained, the content of Mg is in the range of 0.01 to 1.0%.
Note that Mg, Sn, and Zn improve the stress relaxation resistance by adding them to Cu-Ni-Si, Cu-Ni-Co-Si, and Cu-Co-Si copper alloys. The stress relaxation resistance is further improved by the synergetic effect when they are added together as compared to when each of them is added alone. In addition, it has the effect of significantly improving solder embrittlement.
 本発明の銅合金板材で実現される導電性としては30%IACS以上であり、好ましい範囲は35%IACS以上、更に好ましい範囲45%IACS以上である。上限は特にないが60%IACS以下であることが実際的である。
 また、本発明の銅合金材料で実現される圧延方向の0.2%耐力として好ましい範囲は500MPa以上であり、650MPa以上であることが好ましく、更に好ましい範囲は800MPa以上である。上限は特にないが1100MPa以下であることが実際的である。
 曲げたわみ係数は、105GPa以下であることが好ましく、100GPa以下であることがより好ましい。下限は特にないが60GPa以上であることが実際的である。
 ヤング率は110GPa以下であり、100GPa以下であることがより好ましい。下限は特にないが70GPa以上であることが実際的である。
The conductivity realized by the copper alloy sheet material of the present invention is 30% IACS or more, preferably 35% IACS or more, and more preferably 45% IACS or more. There is no particular upper limit, but it is practical that it is 60% IACS or less.
Further, a preferable range as a 0.2% proof stress in the rolling direction realized by the copper alloy material of the present invention is 500 MPa or more, preferably 650 MPa or more, and more preferably 800 MPa or more. There is no particular upper limit, but it is practical that it is 1100 MPa or less.
The bending deflection coefficient is preferably 105 GPa or less, more preferably 100 GPa or less. There is no particular lower limit, but it is practical that it is 60 GPa or more.
The Young's modulus is 110 GPa or less, more preferably 100 GPa or less. There is no particular lower limit, but it is practical that it is 70 GPa or more.
(集合組織)
 本発明の銅合金材料の集合組織は、特に、低ヤング率および低曲げたわみ係数を実現するために、SEM-EBSD法による圧延方向(RD)からの解析結果で、RDに向く(100)面の面積率が30%以上である集合組織を有するものとすることが好ましい。なお、板材圧延方向(RD)と当該面の法線とのなす角の角度が10°以下の方位を有する結晶粒はすべて当該RDに向く(100)面を有するものとする。
(Group organization)
The texture of the copper alloy material of the present invention is, in particular, a surface (100) facing RD in the analysis result from the rolling direction (RD) by the SEM-EBSD method in order to realize a low Young's modulus and a low flexural deflection coefficient. It is preferable to have a texture having an area ratio of 30% or more. Note that all crystal grains having an orientation in which the angle between the sheet rolling direction (RD) and the normal to the surface is 10 ° or less has a (100) plane facing the RD.
 銅合金板の場合、主に、以下に示す如き、Cube方位、Goss方位、Brass方位、Copper方位、S方位等と呼ばれる集合組織を形成し、それらに応じた結晶面が存在する。 In the case of a copper alloy sheet, mainly, as shown below, a texture called Cube orientation, Goss orientation, Brass orientation, Copper orientation, S orientation, etc. is formed, and a crystal plane corresponding to them is present.
 これらの集合組織の形成は同じ結晶系の場合でも加工、熱処理方法によって異なる。本明細書における結晶方位の表示方法は、材料の圧延方向(RD)をX軸、板幅方向(TD)をY軸、圧延法線方向を(ND)をZ軸の直角座標系をとり、材料中の各領域がZ軸に垂直な(圧延面に平行な)結晶面の指数(hkl)とX軸に平行な(圧延面に垂直な)結晶方向の指数[uvw]とを用いて(hkl)[uvw]の形で示す。また、(1 3 2)[6 -4 3]と(2 3 1)[3 -4 6]などのように、銅合金の立方晶の対称性のもとで等価な方位については、ファミリーを表すカッコ記号を使用し、{hkl}<uvw>と示す。上述の表記に伴い、各方位は下記の如く表現される。 The formation of these textures differs depending on the processing and heat treatment method even in the case of the same crystal system. In the crystal orientation display method in this specification, the material rolling direction (RD) is taken along the X axis, the plate width direction (TD) as the Y axis, and the rolling normal direction (ND) as the Z axis orthogonal coordinate system. Using the index (hkl) of the crystal plane where each region in the material is perpendicular to the Z axis (parallel to the rolling plane) and the index [uvw] of the crystal orientation parallel to the X axis (perpendicular to the rolling plane) hkl) Shown in the form of [uvw]. Also, for equivalent orientations under the cubic symmetry of copper alloys, such as (1 32) [6-4 3] and (2 3 1) [3-4 6] etc. Use the parenthesis symbol to indicate, {hkl} <uvw>. With the above notation, each orientation is expressed as follows.
 FCC金属に見られる、代表的な結晶方位としては、下記のような指数で表現される成分が一般的である。
  Cube方位          {001}<100>
  Rotated-Cube方位  {012}<100>
  Goss方位          {011}<100>
  Rotated-Goss方位  {011}<011>
  Brass方位         {011}<211>
  Copper方位        {112}<111>
  S方位             {123}<634>
  P方位             {011}<111>
As typical crystal orientations found in FCC metals, components represented by the following indices are common.
Cube orientation {001} <100>
Rotated-Cube Orientation {012} <100>
Goss azimuth {011} <100>
Rotated-Goss azimuth {011} <011>
Brass orientation {011} <211>
Copper azimuth {112} <111>
S direction {123} <634>
P direction {011} <111>
 通常の銅合金板の集合組織は、これらの結晶面の構成割合が変化すると板材の弾性挙動が変化する。 In the texture of a normal copper alloy sheet, the elastic behavior of the sheet changes as the composition ratio of these crystal planes changes.
 銅合金では、上述のような方位が現れることが知られているが、我々は鋭意検討した結果、RDに向く(100)面の面積率を増加させることがヤング率および曲げたわみ係数を低下させることに有効であることを見出した。(100)面がRDに向く方位成分には、上述のCube方位、Rotated-Cube方位、Goss方位などが含まれる。従来のコルソン系高強度銅合金板の集合組織は、公知の方法によって製造した場合、Cube方位{001}<100>以外の、S方位{123}<634>や、Brass方位{011}<211>が主体となり、Cube方位の割合は減少し、ヤング率および曲げたわみ係数は高くなることを本発明者らは確認した。特にRD方向に(111)面が多い場合、ヤング率および曲げたわみ係数が高くなることを確認した。 In copper alloys, it is known that the orientation as described above appears, but as a result of intensive studies, increasing the area ratio of the (100) plane facing RD decreases the Young's modulus and bending deflection coefficient. I found it to be particularly effective. The above-mentioned Cube orientation, Rotated-Cube orientation, Goss orientation, etc. are included in the orientation component in which the (100) plane faces RD. The texture of the conventional Corson-based high strength copper alloy sheet, when manufactured by a known method, S orientation {123} <634> other than Cube orientation {001} <100>, Brass orientation {011} <211 The inventors of the present invention have confirmed that the &gt; main component, the proportion of Cube orientation decreases, and the Young's modulus and bending deflection coefficient increase. In particular, when there were many (111) planes in the RD direction, it was confirmed that Young's modulus and bending deflection coefficient became high.
 したがって、本発明の銅合金板の集合組織は、RDに向く結晶面のうち、その面方位{例えば(100)面の法線}とRDとの2つのベクトルのなす角が10°以下である結晶面の面積率が30%以上であることが好ましく、これにより、低ヤング率および低曲げたわみ係数の集合組織を有するものとすることができる。RDに向く(100)面の面積率は、さらに好ましくは40%以上、より好ましくは50%以上である。このようにRDに向く(100)面の面積率を高めれば、ヤング率は110GPa以下に、曲げたわみ係数は105GPa以下にすることができる。これは、ヤング率および曲げたわみ係数の低い(100)のRDに向く結晶面の面積率が増えるためである。また、ヤング率および曲げたわみ係数の高い(111)のRDに向く結晶面の面積率が減少することによりヤング率を低下させることができる。RDに向く(111)面の面積率は、15%以下であることが好ましく、さらに好ましくは10%以下である。 Therefore, in the texture of the copper alloy sheet of the present invention, among the crystal faces directed to RD, the angle between two vectors of the plane orientation {eg the normal to the (100) plane} and RD is 10 ° or less The area ratio of the crystal plane is preferably 30% or more, and thereby, it is possible to have a texture with a low Young's modulus and a low flexural deflection coefficient. The area ratio of the (100) plane facing the RD is more preferably 40% or more, more preferably 50% or more. Thus, by increasing the area ratio of the (100) plane facing RD, the Young's modulus can be 110 GPa or less, and the bending deflection coefficient can be 105 GPa or less. This is because the area ratio of the crystal face toward RD having a low Young's modulus and a low flexural modulus (100) increases. In addition, the Young's modulus can be reduced by decreasing the area ratio of the crystal face to the RD of (111) having a high Young's modulus and a high bending deflection coefficient. The area ratio of the (111) plane facing RD is preferably 15% or less, more preferably 10% or less.
 銅合金板の集合組織における、RDに向く(100)面の面積率の測定は、SEMによる電子顕微鏡組織をEBSDを用いて解析することによって得られる。ここでは、結晶粒を400個以上含む範囲を(例えば、800μm四方の試料面積に対して)、1μmのステップでスキャンし、方位を解析した。なお、これらの方位分布は板厚方向に変化しているため、板厚方向に何点か任意にとって平均をとることによって求める方が好ましい。 The measurement of the area ratio of the (100) plane facing RD in the texture of the copper alloy sheet can be obtained by analyzing the electron microscopic structure by SEM using EBSD. Here, a range including 400 or more crystal grains (for example, with respect to a sample area of 800 μm square) was scanned at 1 μm steps to analyze the orientation. In addition, since these azimuth | direction distribution is changing to the plate | board thickness direction, it is more preferable to obtain | require by taking the average for several points arbitrarily in the plate | board thickness direction.
 このSEM-EBSD法は、Scanning Electron Microscopy-Electron Back Scattered Diffraction Pattern法の略称である。即ち、SEM画面上にあらわれる個々の結晶粒に電子ビームを照射し、その回折電子から個々の結晶方位を同定するものである。 The SEM-EBSD method is an abbreviation of Scanning Electron Microscopy-Electron Back Scattered Diffraction Pattern method. That is, the individual crystal grains appearing on the SEM screen are irradiated with an electron beam, and the individual crystal orientations are identified from the diffracted electrons.
 本明細書における結晶方位の表示方法は、材料の圧延方向(RD)をX軸、板幅方向(TD)をY軸、圧延法線方向(ND)をZ軸の直角座標系を取り、RDに(100)面が向いている領域の割合を、その面積率で規定したものである。測定領域内の各結晶粒の(100)面の法線とRDの二つのベクトルのなす角の角度を計算し、この角度が10°以下の原子面を有するものについて面積を合計し、これを全測定面積で除して得た値を、(100)面の法線とRDのなす角の角度が10°以下である原子面を有する領域の面積率(%)とした。
 すなわち、本発明において、圧延板の圧延方向(RD)に向く原子面の集積に関し、(100)面の法線とRDのなす角の角度が10°以下である原子面を有する領域とは、圧延板の圧延方向(RD)に向く、つまりRDに対向する原子面の集積に関して、理想方位である圧延板の圧延方向(RD)を法線とする(100)面自体と、(100)面の法線とRDのなす角の角度が10°以下である原子面の各々とを合わせた領域(これらの面積の和)をいう。以下、これらの面を合わせて、RDに向く(100)面ともいい、また、これらの領域を、単に、RDに(100)面が向く原子面の領域ともいう。また、RDに向く(111)面についても同様である。
The crystal orientation display method in this specification takes the rectangular coordinate system of the rolling direction (RD) of the material as the X axis, the sheet width direction (TD) as the Y axis, and the rolling normal direction (ND) as the Z axis. The ratio of the area where the (100) plane faces is defined by the area ratio. Calculate the angle between the normal to (100) plane of each crystal grain in the measurement area and the angle formed by the two vectors of RD, sum the areas for those with an atomic face whose angle is 10 ° or less, and calculate the sum The value obtained by dividing by the total measurement area was taken as the area ratio (%) of the region having an atomic plane in which the angle formed by the normal to the (100) plane and the RD is 10 ° or less.
That is, in the present invention, with regard to the accumulation of atomic planes directed to the rolling direction (RD) of a rolled sheet, a region having an atomic plane in which the angle between the normal to the (100) plane and the RD is 10 ° or less Regarding accumulation of atomic planes facing the rolling direction (RD) of the rolled sheet, that is, facing the RD, the (100) plane itself with the rolling direction (RD) of the rolled sheet being the ideal direction as a normal The region (the sum of these areas) is a combination of each of the atomic planes in which the angle between the normal of R and the angle formed by RD is 10 ° or less. Hereinafter, these surfaces are combined to be referred to as a (100) surface facing the RD, and these regions are simply referred to as a region of an atomic surface where the (100) surface faces the RD. The same applies to the (111) plane facing RD.
 EBSD測定にあたっては、鮮明な菊池線回折像を得るために、機械研磨の後に、コロイダルシリカの砥粒を使用して、基体表面を鏡面研磨した後に、測定を行うことが好ましい。また、測定は特に断らない限り板表面のND方向から行なうものとする。
 ここで、EBSD測定の特徴について、X線回折測定との対比として説明する。まず1点目に挙げられるのは、X線回折測定によったのでは測定することができない結晶方位があり、それがS方位及びBR方位である。換言すれば、EBSDを採用することにより、初めて、S方位及びBR方位に関する情報が得られ、それにより特定される合金組織と作用との関係が明らかになる。2点目は、X線回折はND//{hkl}の±0.5°程度に含まれる結晶方位の分量を測定している。一方、EBSDは当該方位から±10°に含まれる結晶方位の分量を測定している。したがって、EBSD測定によれば桁違いに広範な合金組織に関する情報が網羅的に得られ、合金材料全体としてX線回折では特定することが難しい状態が明らかになる。以上のとおり、EBSD測定とX線回折測定とで得られる情報はその内容及び性質が異なる。なお、本明細書において特に断らない限り、EBSDの結果は、銅合金板材のND方向に対して行ったものである。
In the EBSD measurement, in order to obtain a clear Kikuchi line diffraction image, it is preferable to perform the measurement after mirror polishing of the substrate surface using abrasive grains of colloidal silica after mechanical polishing. Moreover, measurement shall be performed from the ND direction of the plate surface unless otherwise specified.
Here, the features of the EBSD measurement will be described as a comparison with the X-ray diffraction measurement. The first point mentioned is the crystal orientation which can not be measured by X-ray diffraction measurement, which is the S orientation and the BR orientation. In other words, by adopting EBSD, for the first time, information on S orientation and BR orientation can be obtained, and the relationship between the specified alloy structure and action can be clarified. The second point is that X-ray diffraction measures the amount of crystal orientation included in ± 0.5 ° of ND // {hkl}. On the other hand, EBSD measures the amount of crystal orientation included in ± 10 ° from the orientation. Therefore, EBSD measurement provides an order of magnitude comprehensive information on the alloy structure comprehensively, and it becomes clear that it is difficult to identify the entire alloy material by X-ray diffraction. As described above, the information obtained by EBSD measurement and X-ray diffraction measurement differs in the content and nature thereof. In addition, unless otherwise indicated in this specification, the result of EBSD is performed to the ND direction of a copper alloy plate material.
(製造条件)
 次に、本発明の銅合金材料の好ましい製造条件について以下に説明する。本発明の銅合金材料は、例えば、鋳造、熱間圧延、徐冷、冷間圧延1、中間焼鈍、冷間圧延2、溶体化熱処理、時効熱処理、仕上げ冷間圧延、低温焼鈍、の各工程を経て製造される。本発明の銅合金材料は、従来のコルソン系合金とほぼ同様の設備で製造できる。所定の物性とさらには集合組織を得るには、各工程の製造条件を適宜調整する必要がある。この点、本発明の銅合金材料は、熱間圧延後の処理か、溶体化処理前の冷間圧延と中間焼鈍の、少なくともいずれかの処理もしくは加工を所定の条件で行なうことで製造することができる。
(Manufacturing conditions)
Next, preferable manufacturing conditions of the copper alloy material of the present invention will be described below. The copper alloy material of the present invention is, for example, each step of casting, hot rolling, slow cooling, cold rolling 1, intermediate annealing, cold rolling 2, solution heat treatment, aging heat treatment, finish cold rolling, low temperature annealing, Manufactured through. The copper alloy material of the present invention can be manufactured with almost the same equipment as a conventional Corson alloy. In order to obtain predetermined physical properties and further a texture, it is necessary to appropriately adjust the manufacturing conditions of each process. In this respect, the copper alloy material of the present invention is manufactured by performing processing after hot rolling or at least one of cold rolling and intermediate annealing before solution treatment under predetermined conditions. Can.
 鋳造は、上記組成範囲に成分調整した銅合金溶湯を鋳造する。そして、鋳塊を面削後、800~1000℃で加熱または均質化熱処理した後に熱間圧延する。ここで、通常のコルソン系合金の製造方法では熱間圧延後ただちに水冷などの方法で急冷する。一方、本発明の銅合金材料を製造する方法の好ましい第1の実施態様では、熱間圧延後のRDに向く(100)面を増加させるために急冷を実施せず、徐冷することを特徴とする。徐冷する際の冷却速度は5K/秒以下が好ましい。RDに(100)面が向く方位は他の方位に比べて、低温で回復現象を生じ、熱間圧延組織中にRDに(100)面が向く方位の面積率を高めることができる。この熱間圧延組織中のRDに(100)の面が向く方位を有する粒の割合を高めると、後の工程である溶体化工程において、RDに(100)の面が向く方位の面積率を高めることができる。冷却の際の温度が350℃未満では組織の変化は生じないため、温度が350℃未満まで冷却された後には、製造時間を短縮するために水冷などの方法で急冷してもよい。 The casting is performed by casting a molten copper alloy having its components adjusted to the above composition range. Then, the ingot is chamfered, heated or homogenized at 800 to 1000 ° C., and hot rolled. Here, in the case of a conventional method for producing a Corson-based alloy, the steel is rapidly quenched by a method such as water cooling immediately after hot rolling. On the other hand, in the first preferred embodiment of the method for producing the copper alloy material of the present invention, the quenching is not carried out in order to increase the (100) surface facing RD after the hot rolling, and it is characterized by slow cooling. I assume. The cooling rate at the time of slow cooling is preferably 5 K / s or less. The direction in which the (100) plane faces RD has a recovery phenomenon at low temperature as compared with other directions, and the area ratio of the direction in which the (100) face faces RD can be increased in the hot-rolled structure. When the proportion of grains having an orientation in which the face of (100) faces in RD in this hot rolled structure is increased, the area ratio of the orientation in which the face of (100) faces in RD in the subsequent solutionizing step It can be enhanced. Since a change in structure does not occur if the temperature upon cooling is less than 350 ° C., after the temperature is cooled to less than 350 ° C., quenching may be performed by a method such as water cooling to reduce production time.
 次に、前記熱間圧延と冷却とが完了後、表面を面削し、冷間圧延1を行う。この冷間圧延1の圧延率が低すぎると、その後最終製品まで製造してもBrass方位やS方位などが発達し、(100)面積率を高めることが難しくなる。そのため、冷間圧延1の圧延率は70%以上とすることが好ましい。 Next, after the hot rolling and cooling are completed, the surface is cut and cold rolling 1 is performed. If the rolling reduction ratio of the cold rolling 1 is too low, even if the final product is manufactured, the brass orientation and the S orientation develop, and it becomes difficult to increase the (100) area ratio. Therefore, it is preferable that the rolling reduction rate of the cold rolling 1 be 70% or more.
 冷間圧延1の後、300~800℃で5秒~2時間、中間焼鈍を施す。中間焼鈍の後、圧延率3~60%の冷間圧延2を行う。この中間焼鈍と冷間圧延2を繰り返し行うと、さらにRDに向く(100)面の面積率を高めることができる。そこで、本発明の銅合金材料を製造する方法の好ましい第2の実施態様では、前記中間焼鈍と冷間圧延2とを2回以上繰り返して行なう。 After cold rolling 1, intermediate annealing is applied at 300 to 800 ° C. for 5 seconds to 2 hours. After the intermediate annealing, cold rolling 2 with a rolling reduction of 3 to 60% is performed. Repeating the intermediate annealing and the cold rolling 2 can further increase the area ratio of the (100) plane facing RD. Therefore, in the second preferred embodiment of the method for producing a copper alloy material of the present invention, the intermediate annealing and the cold rolling 2 are repeated twice or more.
 溶体化処理は、600~1000℃で5秒~300秒の条件で行う。NiやCoの濃度によって必要な温度条件が変わるため、Ni、Co濃度に応じて適切な温度条件を選択する必要がある。溶体化温度が低すぎると、時効処理工程において強度が不足し、溶体化温度が高すぎると材料が必要以上に軟化して形状制御が難しくなるため好ましくない。 The solution treatment is performed at 600 to 1000 ° C. for 5 seconds to 300 seconds. Since the necessary temperature conditions change depending on the concentrations of Ni and Co, it is necessary to select an appropriate temperature condition according to the Ni and Co concentrations. If the solution treatment temperature is too low, the strength is insufficient in the aging treatment step, and if the solution treatment temperature is too high, the material softens more than necessary and the shape control becomes difficult, which is not preferable.
 時効処理は、400~600℃で0.5時間~8時間の範囲で行う。NiやCoの濃度によって必要な温度条件が変わるため、Ni、Co濃度に応じて適切な温度条件を選択する必要がある。時効処理の温度が低すぎると、時効析出量が低下し強度が不足する。また、時効処理の温度が高すぎると析出物が粗大化し、強度が低下する。 The aging treatment is performed at 400 to 600 ° C. for 0.5 to 8 hours. Since the necessary temperature conditions change depending on the concentrations of Ni and Co, it is necessary to select an appropriate temperature condition according to the Ni and Co concentrations. When the temperature of the aging treatment is too low, the amount of aging precipitation decreases and the strength is insufficient. In addition, when the temperature of the aging treatment is too high, the precipitates become coarse and the strength decreases.
 溶体化処理後の仕上げ冷間圧延の加工率を50%以下とするのが好ましい。このように加工率を適正に規制することにより、Cube方位などの(100)方位を有する結晶粒がBrass、S、Copper方位などへと方位回転することを抑制し、得られる銅合金材料の物性に優れ、さらには集合組織の好ましい状態を達成することができる。 It is preferable to set the working ratio of finish cold rolling after solution treatment to 50% or less. Thus, by appropriately controlling the processing rate, the crystal grains having (100) orientation such as Cube orientation can be prevented from rotating in orientation to Brass, S, Copper orientation, etc., and the physical properties of the obtained copper alloy material In addition, it is possible to achieve the desirable state of the texture.
 低温焼鈍は、300~700℃で10秒~2時間の条件で行う。この焼鈍によって、コネクタ材に要求される、耐応力緩和特性やバネ限界値を向上させることができる。 Low temperature annealing is performed at 300 to 700 ° C. for 10 seconds to 2 hours. This annealing can improve the stress relaxation resistance and the spring limit value required for the connector material.
 本発明の銅合金材料を得るより好ましい製造方法においては、前記第1の実施態様と第2の実施態様の両方の工程を行い、つまり、熱間圧延後に少なくとも350℃未満の温度域となるまでは急冷ではなく徐冷(好ましくは冷却速度5K/秒以下)し、中間焼鈍と冷間圧延2とを2回以上繰り返して行なう。 In a more preferable production method for obtaining the copper alloy material of the present invention, the steps of both the first embodiment and the second embodiment are performed, that is, until the temperature range of at least less than 350 ° C. after hot rolling. Is not rapid cooling but gradual cooling (preferably with a cooling rate of 5 K / sec or less), and intermediate annealing and cold rolling 2 are repeated twice or more.
Figure JPOXMLDOC01-appb-T000001
Figure JPOXMLDOC01-appb-T000001
 上記方法により製造された本発明の銅合金材料が所定の特性を有することを保証するためには、銅合金材料の物性とさらには集合組織が所定の範囲内であるかどうか、EBSD解析によって検証すればよい。 In order to ensure that the copper alloy material of the present invention manufactured by the above method has predetermined properties, it is verified by EBSD analysis whether the physical properties of the copper alloy material and the texture are within the predetermined range. do it.
 以下に、実施例に基づき本発明をさらに詳細に説明するが、本発明はこれに限定されるものではない。 Hereinafter, the present invention will be described in more detail based on examples, but the present invention is not limited thereto.
 下記表1、2に示す各組成の銅合金を鋳造して銅合金板を製造し、強度(0.2%耐力)、導電率、ヤング率などの各特性を評価した。 The copper alloy of each composition shown in the following Tables 1 and 2 was cast to manufacture a copper alloy plate, and each characteristic such as strength (0.2% proof stress), conductivity, Young's modulus was evaluated.
 まず、DC(Direct Chill)法により鋳造して、厚さ30mm、幅100mm、長さ150mmの鋳塊を得た。次にこれら鋳塊を950℃に加熱し、この温度に1時間保持後、厚さ14mmに熱間圧延し、1K/sの冷却速度で徐冷し、300℃以下になったら水冷した。次いで両面を各2mmずつ面削して酸化被膜を除去した後、圧延率90~95%の冷間圧延1を施した。この後、350~700℃で30分の中間焼鈍と、10~30%の冷間圧延率で冷間圧延2を行った。その後、700~950℃で5秒~10分の種々の条件で溶体化処理を行い、直ちに15℃/秒以上の冷却速度で冷却した。次に不活性ガス雰囲気中で、400~600℃で2時間の時効処理を施し、その後圧延率50%以下の仕上げ圧延を行い、最終的な板厚を0.15mmに揃えた。仕上げ圧延後、400℃で30秒の低温焼鈍処理を施して、各合金組成の銅合金板材を得た。 First, casting was performed by a DC (Direct Chill) method to obtain an ingot having a thickness of 30 mm, a width of 100 mm, and a length of 150 mm. Next, these ingots were heated to 950 ° C., held at this temperature for 1 hour, hot-rolled to a thickness of 14 mm, gradually cooled at a cooling rate of 1 K / s, and cooled to 300 ° C. or less. Subsequently, the both surfaces were subjected to 2 mm face milling to remove the oxide film, and then cold rolling 1 with a rolling ratio of 90 to 95% was applied. Thereafter, cold rolling 2 was performed at an intermediate annealing temperature of 350 to 700 ° C. for 30 minutes and a cold rolling ratio of 10 to 30%. Thereafter, solution treatment was performed at 700 to 950 ° C. under various conditions for 5 seconds to 10 minutes, and immediately cooled at a cooling rate of 15 ° C./second or more. Next, in an inert gas atmosphere, aging was performed at 400 to 600 ° C. for 2 hours, and then finish rolling was performed at a rolling reduction of 50% or less, and the final plate thickness was made 0.15 mm. After finish rolling, a low temperature annealing treatment was performed at 400 ° C. for 30 seconds to obtain a copper alloy sheet of each alloy composition.
 このようにして製造した銅合金板に対して、各例とも、低温焼鈍処理を施した銅合金板から切り出した試料を使用し、以下に示す試験及び評価を実施した。 With respect to the copper alloy sheet thus produced, in each of the examples, the samples cut out from the copper alloy sheet subjected to the low temperature annealing treatment were used, and the following tests and evaluations were carried out.
(1)結晶方位粒の面積率
 銅合金板試料の組織について、RDに向く(100)面の面積率を次のように求めた。
 すなわち、RD方向からEBSD解析したときの(100)面の法線がRDとなす角についてその角度が10°以下の結晶方位を有する結晶粒を、RDに向く(100)面を有する粒とした。前記RDに向く(100)面の面積率は、具体的には次のように求めた。EBSD法により、約800μm四方の試料測定領域で、スキャンステップが1μmの条件で測定を行った。測定面積は結晶粒を400個以上含むことを基準として調整した。上記の通り、板材試料の圧延方向(RD)とのなす角が10°以下となるような(100)面の法線を有する結晶粒の(100)面についてその面積の和を求めて、該面積の和を全測定面積で割ることでRDに向く(100)面の面積率(%)を得た。ここで、前記なす角が10°以下の結晶粒については同一方位粒とした。
 また、RDに向く(111)面の面積率(%)についても同様に求めた。
(2)0.2%耐力
 0.2%耐力は、各供試材からJIS Z 2201記載の5号試験片を切り出して、JIS Z 2241に準拠して求めた。0.2%耐力は5MPaの整数倍に丸めて示した。
(3)導電率
 導電率はJIS H 0505に準拠して求めた。
(4)ヤング率
 ヤング率は、幅20~30mmの短冊状試験片を用い、引張試験機にて0.2%耐力以下の強度領域のヤング率を、ひずみゲージを用いて測定した。なお、試験片は圧延方向に対して平行に採取した。
(5)曲げたわみ係数
 曲げたわみ係数は、日本伸銅協会(JCBA)技術標準に準拠して測定した。試験片の幅は10mm、長さ15mmとし、片持ち梁の曲げ試験を行い、荷重とたわみ変位から、たわみ係数を測定した。
これらの結果を表1、2に示す。
(1) Area ratio of crystal orientation grain About the structure | tissue of a copper alloy plate sample, the area ratio of the (100) plane which faces RD was calculated | required as follows.
That is, when an EBSD analysis is performed from the RD direction, a crystal grain having a crystal orientation whose angle is 10 ° or less with respect to an angle that the normal to the (100) plane makes with RD is a grain having the (100) plane facing the RD. . Specifically, the area ratio of the (100) plane facing the RD was determined as follows. According to the EBSD method, measurement was performed under the condition of a scan step of 1 μm in a sample measurement area of about 800 μm. The measurement area was adjusted on the basis of including 400 or more crystal grains. As described above, the sum of the areas of the (100) planes of the crystal grains having the normal to the (100) plane such that the angle between the plate material sample and the rolling direction (RD) makes 10 ° or less is determined The area ratio (%) of the (100) plane facing RD was obtained by dividing the sum of the areas by the total measurement area. Here, the crystal grains having the above-mentioned angle of 10 ° or less were the same orientation grains.
In addition, the area ratio (%) of the (111) plane facing RD was similarly determined.
(2) 0.2% proof stress The 0.2% proof stress was determined in accordance with JIS Z 2241 by cutting a No. 5 test piece described in JIS Z 2201 from each test material. The 0.2% proof stress is shown by rounding to an integral multiple of 5 MPa.
(3) Conductivity The conductivity was determined in accordance with JIS H 0505.
(4) Young's Modulus The Young's modulus was measured using a strain gauge with a tensile tester using a strip-shaped test piece having a width of 20 to 30 mm, and a Young's modulus in a strength region of 0.2% or less of the proof stress. The test pieces were collected parallel to the rolling direction.
(5) Bending deflection coefficient The bending deflection coefficient was measured in accordance with the Japan Copper and Brass Association (JCBA) technical standard. The width of the test piece was 10 mm and the length was 15 mm, and a bending test of the cantilever was conducted, and the deflection coefficient was measured from the load and the deflection displacement.
These results are shown in Tables 1 and 2.
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000002
Figure JPOXMLDOC01-appb-T000003
Figure JPOXMLDOC01-appb-T000003
 表1に、本発明の実施例を示す。実施例1~29は集合組織が本発明の好ましい範囲内にあり、0.2%耐力、導電率、ヤング率および曲げたわみ係数がいずれも優れるものであった。 Table 1 shows an example of the present invention. In Examples 1 to 29, the texture was within the preferable range of the present invention, and all of 0.2% proof stress, conductivity, Young's modulus and bending deflection coefficient were excellent.
 表2に本発明に対する比較例を示す。比較例1、2、5は、Niおよび/またはCoの含有量とSiの含有量とが本発明の範囲より少なすぎたため、0.2%耐力が劣った。比較例3、4、6、7は、Niおよび/またはCoの含有量が多すぎたため、熱間圧延時に割れが生じたため製造を中止した。比較例8は、Siの濃度が高すぎたため、導電率が劣った。
以下の比較例は実施例2と同一の鋳塊を用いた例である。
・比較例2-2は、熱間圧延後ただちに水冷し、中間焼鈍と冷間圧延2を省略し、その他については実施例2と同様に作製した例であるが、RDに向く(100)面の面積率が低く、また(111)面の面積率が高く、ヤング率および曲げたわみ係数が本発明例よりも高くなった。
・比較例2-3は、熱間圧延後ただちに水冷すること以外は実施例2と同様に作製した例であるが、RDに向く(100)面の面積率が低く、ヤング率が本発明例よりも高くなった。
Table 2 shows a comparative example to the present invention. Comparative Examples 1, 2 and 5 were inferior in 0.2% proof stress because the content of Ni and / or Co and the content of Si were too smaller than the range of the present invention. In Comparative Examples 3, 4, 6, and 7, since the content of Ni and / or Co was too high, cracking occurred during hot rolling, and the production was stopped. In Comparative Example 8, the conductivity was inferior because the concentration of Si was too high.
The following comparative example is an example using the same ingot as Example 2.
Comparative Example 2-2 is an example in which water cooling was immediately performed after hot rolling, intermediate annealing and cold rolling 2 were omitted, and the others were prepared in the same manner as in Example 2, but the (100) plane is suitable for RD The area ratio of (111) was low, and the area ratio of (111) plane was high, and the Young's modulus and bending deflection coefficient were higher than those of the inventive example.
Comparative Example 2-3 is an example produced similarly to Example 2 except that water cooling is immediately performed after hot rolling, but the area ratio of the (100) plane facing RD is low, and the Young's modulus is an example of the present invention It was higher than that.
Figure JPOXMLDOC01-appb-T000004
Figure JPOXMLDOC01-appb-T000004
 表3に他の実施例を示す。 Table 3 shows another embodiment.
Figure JPOXMLDOC01-appb-T000005
Figure JPOXMLDOC01-appb-T000005
 表3の実施例10-2、18-2、25-2は、表1の実施例10、18、25とそれぞれ同一の鋳塊を用いて、熱間圧延後ただちに水冷し、中間焼鈍と冷間圧延2を2度繰り返し、その他については表1の各実施例と同様に作製し、同様に各特性を評価した例である。これらはRDに向く(100)面の面積率が本発明の好ましい範囲内にあり、強度、導電率、ヤング率、曲げたわみ係数が優れる。
 実施例10-3、18-3、25-3は、表1の実施例10、18、25とそれぞれ同一の鋳塊を用いて、中間焼鈍と冷間圧延2を2度繰り返し、その他については表1の各実施例と同様に作製し、同様に各特性を評価した例である。これらはRDに向く(100)面の面積率が特に高く、ヤング率が100GPa以下と特に低く、曲げたわみ係数が90GPaと特に低く、かつ、0.2%耐力と導電率が優れるものであった。
In Examples 10-2, 18-2 and 25-2 of Table 3, the same ingot as that of Examples 10, 18 and 25 of Table 1 was used, and water cooling was immediately performed after hot rolling, and intermediate annealing and cooling were performed. This is an example in which the inter-rolling 2 was repeated twice, and the others were produced in the same manner as in each example of Table 1 and the respective characteristics were similarly evaluated. The area ratio of the (100) plane facing RD is within the preferable range of the present invention, and the strength, the conductivity, the Young's modulus, and the bending deflection coefficient are excellent.
In Examples 10-3, 18-3, and 25-3, using the same ingots as those of Examples 10, 18, and 25 in Table 1, intermediate annealing and cold rolling 2 are repeated twice, and the others are It is the example which produced similarly to each Example of Table 1, and evaluated each characteristic similarly. These had a particularly high area ratio of (100) face toward RD, a Young's modulus was particularly low at 100 GPa or less, a bending deflection coefficient was particularly low at 90 GPa, and 0.2% proof stress and conductivity were excellent. .
 つづいて、従来の製造条件により製造した銅合金板材について、本願発明に係る銅合金板材との相違を明確化するために、その条件で銅合金板材を作製し、上記と同様の特性項目の評価を行った。なお、各板材の厚さは特に断らない限り上記実施例と同じ厚さになるように加工率を調整した。 Then, in order to clarify the difference with the copper alloy plate material concerning the present invention about the copper alloy plate material manufactured according to the conventional manufacturing conditions, a copper alloy plate material is produced under the conditions, and evaluation of the same characteristic items as above Did. The working ratio was adjusted so that the thickness of each plate was the same as that in the above-mentioned embodiment unless otherwise specified.
(比較例101)・・・特開2009-007666号公報の条件
 上記本発明例1-1と同様の金属元素を配合し、残部がCuと不可避不純物から成る合金を高周波溶解炉により溶解し、これを0.1~100℃/秒の冷却速度で鋳造して鋳塊を得た。これを900~1020℃で3分から10時間の保持後、熱間加工を行った後に水焼き入れを行い、酸化スケール除去のために面削を行った。この後の工程は、次に記載する工程A-3,B-3の処理を施すことによって銅合金c01を製造した。
 製造工程には、1回または2回以上の溶体化熱処理を含み、ここでは、その中の最後の溶体化熱処理の前後で工程を分類し、中間溶体化までの工程でA-3工程とし、中間溶体化より後の工程でB-3工程とした。
Comparative Example 101 Condition of JP 2009-007666 A metal element similar to that of the invention example 1-1 was blended, and an alloy composed of Cu and incidental impurities with the balance was melted in a high frequency melting furnace, This was cast at a cooling rate of 0.1 to 100 ° C./sec to obtain an ingot. After holding this at 900 ° C. to 1020 ° C. for 3 minutes to 10 hours, it was hot-worked and then water-quenched to carry out facing for oxide scale removal. In the subsequent steps, a copper alloy c01 was produced by the treatment of steps A-3 and B-3 described below.
The manufacturing process includes one or more solution heat treatment, in which the steps are classified before and after the last solution heat treatment, and the steps up to intermediate solution treatment are designated as A-3, It was designated as B-3 step in the step after intermediate solution treatment.
工程A-3:断面減少率が20%以上の冷間加工を施し、350~750℃で5分~10時間の熱処理を施し、断面減少率が5~50%の冷間加工を施し、800~1000℃で5秒~30分の溶体化熱処理を施す。
工程B-3:断面減少率が50%以下の冷間加工を施し、400~700℃で5分~10時間の熱処理を施し、断面減少率が30%以下の冷間加工を施し、200~550℃で5秒~10時間の調質焼鈍を施す。
Step A-3: Cold work with a reduction in area of 20% or more, heat treatment for 5 minutes to 10 hours at 350 to 750 ° C., cold work with a reduction in area of 5 to 50%, 800 A solution heat treatment is performed at about 1000 ° C. for 5 seconds to 30 minutes.
Step B-3: Cold work with a reduction in area of 50% or less, heat treatment at 400 to 700 ° C. for 5 minutes to 10 hours, cold work with a reduction in area of 30% or less, Apply temper annealing at 550 ° C. for 5 seconds to 10 hours.
 得られた試験体c01は、上記実施例とは製造条件について熱延後の350℃までの徐冷の有無の点で異なり、RDに向く(111)面の面積率が高く、ヤング率および曲げたわみ係数について要求特性を満たさない結果となった。 The obtained test body c01 differs from the above example in terms of the presence or absence of slow cooling to 350 ° C. after hot rolling with respect to manufacturing conditions, and the area ratio of the (111) plane facing RD is high, Young's modulus and bending The deflection coefficient did not meet the required characteristics.
(比較例102)・・・特開2006-283059号公報の条件
 上記本発明例1-1の組成の銅合金を、電気炉により大気中にて木炭被覆下で溶解し、鋳造可否を判断した。溶製した鋳塊を熱間圧延し、厚さ15mmに仕上げた。つづいてこの熱間圧延材に対し、冷間圧延及び熱処理(冷間圧延1→溶体化連続焼鈍→冷間圧延2→時効処理→冷間圧延3→短時間焼鈍)を施し、所定の厚さの銅合金薄板(c02)を製造した。
Comparative Example 102 Condition of Japanese Patent Application Laid-Open No. 2006-283059 The copper alloy having the composition of the above-mentioned inventive example 1-1 was dissolved in the atmosphere with an electric furnace under charcoal coating, and the possibility of casting was judged. . The molten ingot was hot-rolled and finished to a thickness of 15 mm. Subsequently, cold rolling and heat treatment (cold rolling 1 → solution annealing continuous annealing → cold rolling 2 → aging treatment → cold rolling 3 → short time annealing) are applied to the hot-rolled material, and a predetermined thickness is obtained. Copper alloy sheet (c02) was produced.
 得られた試験体c02は、上記実施例1とは製造条件について熱延後の350℃までの徐冷の有無、および、溶体化前の中間焼鈍と冷間圧延の有無の点で異なり、RDに向く(111)面の面積率が高く、ヤング率および曲げたわみ係数について要求を満たさない結果となった。 The obtained test body c02 is different from the above-mentioned Example 1 in the presence or absence of slow cooling to 350 ° C. after hot rolling and the presence or absence of intermediate annealing before solution treatment and cold rolling with respect to production conditions. The area ratio of the (111) plane facing to was high, and the result was not satisfied with the Young's modulus and bending deflection coefficient.
(比較例103)・・・特開2006-152392号公報の条件
 上記本発明例1-1の組成をもつ合金について、クリプトル炉において大気中で木炭被覆下で溶解し、鋳鉄製ブックモールドに鋳造し、厚さが50mm、幅が75mm、長さが180mmの鋳塊を得た。そして、鋳塊の表面を面削した後、950℃の温度で厚さが15mmになるまで熱間圧延し、750℃以上の温度から水中に急冷した。次に、酸化スケールを除去した後、冷間圧延を行い、所定の厚さの板を得た。
Comparative Example 103 Condition of JP-A-2006-152392 The alloy having the composition of the above-mentioned invention example 1-1 is melted under charcoal covering in the atmosphere in a krypton furnace and cast in a cast iron book mold. Thus, an ingot having a thickness of 50 mm, a width of 75 mm and a length of 180 mm was obtained. Then, after the surface of the ingot was chamfered, it was hot rolled at a temperature of 950 ° C. to a thickness of 15 mm, and quenched into water from a temperature of 750 ° C. or more. Next, after removing the oxide scale, cold rolling was performed to obtain a plate having a predetermined thickness.
 続いて、塩浴炉を使用し、温度で20秒間加熱する溶体化処理を行なった後に、水中に急冷した後、後半の仕上げ冷間圧延により、各厚みの冷延板にした。この際、下記に示すように、これら冷間圧延の加工率(%)を種々変えて冷延板(c03)にした。これらの冷延板を、下記に示すように、温度(℃)と時間(hr)とを種々変えて時効処理した。 Then, after performing the solution treatment which heats at temperature for 20 seconds using a salt bath furnace, after rapidly_cooling | quenching in water, it was made into the cold-rolled sheet of each thickness by finish cold rolling of the latter half. Under the present circumstances, as shown below, the working ratio (%) of these cold rollings was changed variously, and it was set as the cold rolled sheet (c03). These cold rolled sheets were subjected to an aging treatment while changing the temperature (° C.) and the time (hr) variously as shown below.
 冷間加工率:         95%
 溶体化処理温度:       900℃
 人工時効硬化処理温度×時間: 450℃×4時間
 板厚:            0.6mm
Cold working rate: 95%
Solution treatment temperature: 900 ° C
Artificial age hardening processing temperature × time: 450 ° C × 4 hours Thickness: 0.6 mm
 得られた試験体c03は、上記実施例1とは製造条件について熱延後の350℃までの徐冷の有無、および、溶体化前の中間焼鈍と冷間圧延の有無の点で異なり、RDに向く(111)面の面積率が高く、ヤング率および曲げたわみ係数について要求を満たさない結果となった。 The obtained test body c03 is different from the above-mentioned Example 1 in the presence or absence of slow cooling to 350 ° C. after hot rolling and the presence or absence of intermediate annealing before solution treatment and cold rolling with respect to production conditions. The area ratio of the (111) plane facing to was high, and the result was not satisfied with the Young's modulus and bending deflection coefficient.
(比較例104)・・・特開2008-223136号公報の条件
 実施例1に示す銅合金を溶製し、縦型連続鋳造機を用いて鋳造した。得られた鋳片(厚さ180mm)から厚さ50mmの試料を切り出し、これを950℃に加熱したのち抽出して、熱間圧延を開始した。その際、950~700℃の温度域での圧延率が60%以上となり、かつ700℃未満の温度域でも圧延が行われるようにパススケジュールを設定した。熱間圧延の最終パス温度は600~400℃の間にある。鋳片からのトータルの熱間圧延率は約90%である。熱間圧延後、表層の酸化層を機械研磨により除去(面削)した。
Comparative Example 104 Condition of JP-A-2008-223136 The copper alloy shown in Example 1 was melted and cast using a vertical continuous casting machine. A sample of 50 mm in thickness was cut out from the obtained slab (180 mm in thickness), heated to 950 ° C., extracted, and hot rolling was started. At this time, a pass schedule was set so that the rolling reduction in a temperature range of 950 to 700 ° C. would be 60% or more and rolling could be performed in a temperature range of less than 700 ° C. The final pass temperature for hot rolling is between 600 and 400 ° C. The total hot-rolling rate from the slab is about 90%. After hot rolling, the surface oxide layer was removed by mechanical polishing (face grinding).
 次いで、冷間圧延を行った後、溶体化処理に供した。試料表面に取り付けた熱電対により溶体化処理時の温度変化をモニターし、昇温過程における100℃から700℃までの昇温時間を求めた。溶体化処理後の平均結晶粒径(双晶境界を結晶粒界とみなさない)が10~60μmとなるように到達温度を合金組成に応じて700~850℃の範囲内で調整し、700~850℃の温度域での保持時間を10sec~10mimの範囲で調整した。続いて、上記溶体化処理後の板材に対して、圧延率で中間冷間圧延を施し、次いで時効処理を施した。時効処理温度は材温450℃とし、時効時間は合金組成に応じて450℃の時効で硬さがピークになる時間に調整した。このような合金組成に応じて最適な溶体化処理条件や時効処理時間は予備実験により把握してある。次いで、圧延率で仕上げ冷間圧延を行った。仕上げ冷間圧延を行ったものについては、その後さらに、400℃の炉中に5min装入する低温焼鈍を施した。このようにして供試材c04を得た。なお、必要に応じて途中で面削を行い、供試材の板厚は0.2mmに揃えた。主な製造条件は下記に記載してある。 Next, after cold rolling, it was subjected to solution treatment. The temperature change at the time of solution treatment was monitored by a thermocouple attached to the sample surface, and the temperature rising time from 100 ° C. to 700 ° C. in the temperature rising process was determined. The final temperature is adjusted within the range of 700 to 850 ° C according to the alloy composition so that the average grain size after solution treatment (twin boundaries are not regarded as grain boundaries) is 10 to 60 μm, The holding time in the temperature range of 850 ° C. was adjusted in the range of 10 sec to 10 mim. Subsequently, the plate material after the solution treatment was subjected to intermediate cold rolling at a rolling ratio and then subjected to an aging treatment. The aging treatment temperature was set to 450 ° C., and the aging time was adjusted to a time at which the hardness peaked at 450 ° C. aging depending on the alloy composition. The optimum solution treatment conditions and aging treatment time are grasped by preliminary experiments according to such alloy composition. Then, finish cold rolling was performed at a rolling ratio. The final cold-rolled product was further subjected to low-temperature annealing for 5 minutes in a 400 ° C. furnace. Thus, the test material c04 was obtained. In addition, it was chamfered on the way as needed, and the plate thickness of the test material was equalized to 0.2 mm. The main production conditions are described below.
 [特開2008-223136 実施例1の条件]
  700℃未満~400℃での熱間圧延率:  56%(1パス)
  溶体化処理前 冷間圧延率: 92%
  中間冷間圧延 冷間圧延率: 20%
  仕上げ冷間圧延 冷間圧延率: 30%
  100℃から700℃までの昇温時間: 10秒
[Conditions of JP-A-2008-223136 Example 1]
Hot rolling reduction at less than 700 ° C to 400 ° C: 56% (1 pass)
Before solution treatment Cold rolling ratio: 92%
Intermediate cold rolling Cold rolling ratio: 20%
Finish cold rolling Cold rolling ratio: 30%
Temperature rising time from 100 ° C to 700 ° C: 10 seconds
 得られた試験体c04は、上記実施例1とは製造条件について熱延後の350℃までの徐冷の有無、および、溶体化前の中間焼鈍と冷間圧延の有無 の点で異なり、RDに向く(111)面の面積率が高く、ヤング率および曲げたわみ係数について要求を満たさない結果となった。 The obtained test body c04 is different from the above-mentioned Example 1 in the presence or absence of slow cooling up to 350 ° C. after hot rolling and the presence or absence of intermediate annealing before solution treatment and cold rolling with respect to production conditions. The area ratio of the (111) plane facing to was high, and the result was not satisfied with the Young's modulus and bending deflection coefficient.

Claims (9)

  1.  NiとCoのどちらか一方または両方の合計で0.5~5.0質量%、Siを0.2~1.5質量%含有し、残部がCuおよび不可避不純物からなる合金組成を有してなり、圧延方向の0.2%耐力が500MPa以上、導電率が30%IACS以上、ヤング率が110GPa以下、曲げたわみ係数が105GPa以下であることを特徴とする電気・電子部品用銅合金板材。 Containing an alloy composition containing 0.5 to 5.0% by mass in total of one or both of Ni and Co, 0.2 to 1.5% by mass of Si, and the balance being Cu and unavoidable impurities A copper alloy sheet material for electric and electronic parts characterized in that the 0.2% proof stress in the rolling direction is 500 MPa or more, the conductivity is 30% IACS or more, the Young's modulus is 110 GPa or less, and the bending deflection coefficient is 105 GPa or less.
  2.  前記銅合金板材のEBSDを用いて解析することによって得られる圧延方向に向く(100)面の面積率が30%以上であることを特徴とする請求項1に記載の電気・電子部品用銅合金板材。 The copper alloy for electric and electronic parts according to claim 1, wherein the area ratio of the (100) plane facing in the rolling direction obtained by analyzing using EBSD of the copper alloy sheet is 30% or more. Plate material.
  3.  前記銅合金板材のEBSDを用いて解析することによって得られる圧延方向に向く(111)面の面積率が15%以下であることを特徴とする請求項1又は2に記載の電気・電子部品用銅合金板材。 3. The electric / electronic component according to claim 1, wherein the area ratio of the (111) plane directed in the rolling direction obtained by analyzing the copper alloy sheet using EBSD is 15% or less. Copper alloy sheet material.
  4.  さらに、Crを0.05~0.5質量%含有することを特徴とする請求項1~3のいずれかに記載の電気・電子部品用銅合金板材。 The copper alloy sheet according to any one of claims 1 to 3, further comprising 0.05 to 0.5 mass% of Cr.
  5.  さらに、Zn、Sn、Mg、Ag、MnおよびZrからなる群から選ばれる1種または2種以上を合計で0.01~1.0質量%含有することを特徴とする請求項1~4のいずれか1項に記載の電気・電子部品用銅合金板材。 5. The method according to claim 1, further comprising 0.01 to 1.0% by mass in total of one or more selected from the group consisting of Zn, Sn, Mg, Ag, Mn and Zr. The copper alloy sheet material for electric and electronic parts according to any one of the items.
  6.  前記銅合金板材のEBSDを用いて解析することによって得られる圧延方向に向く(111)面の面積率が15%以下であることを特徴とする請求項1~5のいずれか1項に記載の電気・電子部品用銅合金板材。 The area ratio of the (111) plane facing in the rolling direction obtained by analyzing the EBSD of the copper alloy sheet material is 15% or less, The area ratio according to any one of claims 1 to 5, Copper alloy sheet for electrical and electronic parts.
  7.  コネクタ用材料であることを特徴とする請求項1~6のいずれか1項に記載の電気・電
    子部品用銅合金板材。
    The copper alloy sheet material for electric and electronic parts according to any one of claims 1 to 6, which is a material for a connector.
  8.  請求項1~6のいずれか1項に記載の電気・電子部品用銅合金板材からなるコネクタ。 A connector comprising the copper alloy sheet material for electric and electronic parts according to any one of claims 1 to 6.
  9.  請求項1~6のいずれか1項に記載の電気・電子部品用銅合金板材を製造する方法であって、前記合金組成を与える銅合金に、鋳造、熱間圧延、冷間圧延1、中間焼鈍、冷間圧延2、溶体化熱処理、時効熱処理、仕上げ冷間圧延、低温焼鈍の各工程をこの順に施し、さらに、下記[1]と[2]の少なくともいずれか一方または両方の処理を行うことを特
    徴とする電気・電子部品用銅合金板材の製造方法。
     [1]上記熱間圧延後に350℃までは徐冷する工程
     [2]前記中間焼鈍と冷間圧延2とを2回以上繰り返して行う工程
    A method of producing a copper alloy sheet for electric and electronic parts according to any one of claims 1 to 6, wherein the copper alloy giving the alloy composition is cast, hot rolled, cold rolled 1, an intermediate Annealing, cold rolling 2, solution heat treatment, aging heat treatment, finish cold rolling, low temperature annealing are applied in this order, and at least one or both of the following [1] and [2] are further performed The manufacturing method of the copper alloy board material for electric and electronic parts characterized by the above.
    [1] Step of gradually cooling to 350 ° C. after the above hot rolling [2] Step of repeating the intermediate annealing and the cold rolling 2 twice or more
PCT/JP2010/071517 2009-12-02 2010-12-01 Copper alloy sheet material having low young's modulus and method for producing same WO2011068134A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2011513179A JP4809935B2 (en) 2009-12-02 2010-12-01 Copper alloy sheet having low Young's modulus and method for producing the same
EP10834584.4A EP2508634B1 (en) 2009-12-02 2010-12-01 Method for producing a copper alloy sheet material having low young's modulus
CN201080053121.2A CN102630251B (en) 2009-12-02 2010-12-01 There is copper alloy plate and its manufacture method of low Young's modulus
US13/486,861 US20120241056A1 (en) 2009-12-02 2012-06-01 Copper alloy sheet material having a low young's modulus and method of producing the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009274996 2009-12-02
JP2009-274996 2009-12-02

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US13/486,861 Continuation US20120241056A1 (en) 2009-12-02 2012-06-01 Copper alloy sheet material having a low young's modulus and method of producing the same

Publications (1)

Publication Number Publication Date
WO2011068134A1 true WO2011068134A1 (en) 2011-06-09

Family

ID=44114980

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2010/071517 WO2011068134A1 (en) 2009-12-02 2010-12-01 Copper alloy sheet material having low young's modulus and method for producing same

Country Status (6)

Country Link
US (1) US20120241056A1 (en)
EP (1) EP2508634B1 (en)
JP (1) JP4809935B2 (en)
KR (1) KR20120104553A (en)
CN (1) CN102630251B (en)
WO (1) WO2011068134A1 (en)

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2013018399A1 (en) * 2011-08-01 2013-02-07 Jx日鉱日石金属株式会社 Highly bendable cu-co-si alloy wire
WO2013021969A1 (en) * 2011-08-05 2013-02-14 古河電気工業株式会社 Rolled copper foil for secondary battery collector and production method therefor
JP2013040389A (en) * 2011-08-18 2013-02-28 Furukawa Electric Co Ltd:The Copper alloy sheet material low in deflection coefficient and excellent in bendability
JP2013040399A (en) * 2011-07-15 2013-02-28 Jx Nippon Mining & Metals Corp Corson alloy and method for manufacturing the same
WO2013121620A1 (en) * 2012-02-14 2013-08-22 Jx日鉱日石金属株式会社 Corson alloy and method for manufacturing same
WO2013145824A1 (en) * 2012-03-26 2013-10-03 Jx日鉱日石金属株式会社 Corson alloy and method for producing same
JP2013227600A (en) * 2012-04-24 2013-11-07 Jx Nippon Mining & Metals Corp Cu-Ni-Si BASED COPPER ALLOY
JP2014029031A (en) * 2009-12-02 2014-02-13 Furukawa Electric Co Ltd:The Copper alloy sheet material and production method of the same
JP2014074193A (en) * 2012-10-02 2014-04-24 Jx Nippon Mining & Metals Corp Titanium copper and its manufacturing method
EP2728025A2 (en) 2012-10-31 2014-05-07 Dowa Metaltech Co., Ltd. Cu-Ni-Co-Si based copper alloy sheet material and method for producing the same
WO2014126047A1 (en) 2013-02-14 2014-08-21 Dowaメタルテック株式会社 HIGH-STRENGTH Cu-Ni-Co-Si BASE COPPER ALLOY SHEET, PROCESS FOR PRODUCING SAME, AND CURRENT-CARRYING COMPONENT
JP2014173167A (en) * 2013-03-12 2014-09-22 Jx Nippon Mining & Metals Corp Cu-Ni-Si BASED COPPER ALLOY
WO2015099098A1 (en) 2013-12-27 2015-07-02 古河電気工業株式会社 Copper alloy sheet material, connector, and production method for copper alloy sheet material
WO2015099097A1 (en) 2013-12-27 2015-07-02 古河電気工業株式会社 Copper alloy sheet material, connector, and production method for copper alloy sheet material
JP2016509132A (en) * 2013-01-22 2016-03-24 韓国機械材料技術院Korea Institute Of Machinery & Materials Metal composite material having oriented precipitate and method for producing the same
KR20160090871A (en) 2013-11-25 2016-08-01 제이엑스금속주식회사 Copper alloy plate having excellent electroconductivity, moldability, and stress relaxation properties
KR20160117210A (en) 2015-03-30 2016-10-10 제이엑스금속주식회사 Cu-Ni-Si BASED ROLLED COPPER ALLOY AND METHOD FOR MANUFACTURING THE SAME
JP2016204757A (en) * 2016-07-20 2016-12-08 Jx金属株式会社 Cu-Ni-Si-BASED COPPER ALLOY
JP2017020115A (en) * 2016-08-29 2017-01-26 Jx金属株式会社 Titanium copper and manufacturing method therefor
CN108496228A (en) * 2016-09-20 2018-09-04 古河电气工业株式会社 Flat cable, the manufacturing method of flat cable and the rotary connector including flat cable
WO2018174081A1 (en) 2017-03-22 2018-09-27 Jx金属株式会社 Copper alloy strip exhibiting improved dimensional accuracy after press-working
JP2018162489A (en) * 2017-03-24 2018-10-18 Jx金属株式会社 Copper alloy for electronic material
KR20190030603A (en) 2017-09-14 2019-03-22 제이엑스금속주식회사 Cu-Ni-Si BASED COPPER ALLOY HAVING EXCELLENT WEAR-RESISTANCE OF MOLDING
US11021774B2 (en) 2013-08-13 2021-06-01 Jx Nippon Mining & Metals Corporation Copper alloy plate having excellent electrical conductivity and bending deflection coefficient
WO2023140314A1 (en) * 2022-01-20 2023-07-27 古河電気工業株式会社 Copper alloy sheet material and method for manufacturing same

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2508635B1 (en) * 2009-12-02 2017-08-23 Furukawa Electric Co., Ltd. Copper alloy sheet and process for producing same
CN103069025B (en) * 2010-08-27 2015-04-22 古河电气工业株式会社 Copper alloy sheet and manufacturing method for same
CN105088010B (en) * 2015-08-31 2017-08-25 河南科技大学 A kind of high-strength highly-conductive rare earth copper zirconium alloy and preparation method thereof
CN109055810A (en) * 2018-07-10 2018-12-21 浙江力博实业股份有限公司 A kind of preparation method of electrode material copper cobalt chrome-silicon alloy
KR102499087B1 (en) 2020-11-30 2023-02-15 한국생산기술연구원 Manufacturing method of beryllium(Be) free copper alloy using Metaheuristic
KR20220077196A (en) 2020-11-30 2022-06-09 한국생산기술연구원 beryllium(Be) free copper alloy
KR102499059B1 (en) 2020-11-30 2023-02-15 한국생산기술연구원 Manufacturing method of beryllium(Be) free copper alloy

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5554554A (en) 1978-10-11 1980-04-21 Yaskawa Electric Mfg Co Ltd Conductor for flexible cable
JPS6362834A (en) * 1986-09-04 1988-03-19 Nippon Mining Co Ltd Copper alloy for dc wiring material
JPH039383B2 (en) 1987-12-08 1991-02-08 Rinnai Kk
JP2005048262A (en) * 2003-07-31 2005-02-24 Nikko Metal Manufacturing Co Ltd Cu-Ni-Si BASED ALLOY HAVING EXCELLENT FATIGUE PROPERTY
JP2006152392A (en) 2004-11-30 2006-06-15 Kobe Steel Ltd High-strength copper alloy sheet superior in bendability and manufacturing method therefor
JP2006283059A (en) 2005-03-31 2006-10-19 Kobe Steel Ltd High strength copper alloy sheet with excellent bendability, and its manufacturing method
JP2008127668A (en) * 2006-11-24 2008-06-05 Mitsubishi Shindoh Co Ltd Copper alloy for electronic equipment and lead frame material
JP2008223136A (en) 2007-02-13 2008-09-25 Dowa Metaltech Kk SHEET MATERIAL OF Cu-Ni-Si-BASED COPPER ALLOY AND MANUFACTURING METHOD THEREFOR
JP2009007666A (en) 2007-05-31 2009-01-15 Furukawa Electric Co Ltd:The Copper alloy for electrical and electronic equipment

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2154257B1 (en) * 2007-03-30 2016-10-05 JX Nippon Mining & Metals Corporation Cu-ni-si-based alloy for electronic material
JP4875768B2 (en) * 2008-06-03 2012-02-15 古河電気工業株式会社 Copper alloy sheet and manufacturing method thereof
EP2508635B1 (en) * 2009-12-02 2017-08-23 Furukawa Electric Co., Ltd. Copper alloy sheet and process for producing same

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5554554A (en) 1978-10-11 1980-04-21 Yaskawa Electric Mfg Co Ltd Conductor for flexible cable
JPS6362834A (en) * 1986-09-04 1988-03-19 Nippon Mining Co Ltd Copper alloy for dc wiring material
JPH039383B2 (en) 1987-12-08 1991-02-08 Rinnai Kk
JP2005048262A (en) * 2003-07-31 2005-02-24 Nikko Metal Manufacturing Co Ltd Cu-Ni-Si BASED ALLOY HAVING EXCELLENT FATIGUE PROPERTY
JP2006152392A (en) 2004-11-30 2006-06-15 Kobe Steel Ltd High-strength copper alloy sheet superior in bendability and manufacturing method therefor
JP2006283059A (en) 2005-03-31 2006-10-19 Kobe Steel Ltd High strength copper alloy sheet with excellent bendability, and its manufacturing method
JP2008127668A (en) * 2006-11-24 2008-06-05 Mitsubishi Shindoh Co Ltd Copper alloy for electronic equipment and lead frame material
JP2008223136A (en) 2007-02-13 2008-09-25 Dowa Metaltech Kk SHEET MATERIAL OF Cu-Ni-Si-BASED COPPER ALLOY AND MANUFACTURING METHOD THEREFOR
JP2009007666A (en) 2007-05-31 2009-01-15 Furukawa Electric Co Ltd:The Copper alloy for electrical and electronic equipment

Cited By (54)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014029031A (en) * 2009-12-02 2014-02-13 Furukawa Electric Co Ltd:The Copper alloy sheet material and production method of the same
JP2013040399A (en) * 2011-07-15 2013-02-28 Jx Nippon Mining & Metals Corp Corson alloy and method for manufacturing the same
WO2013018399A1 (en) * 2011-08-01 2013-02-07 Jx日鉱日石金属株式会社 Highly bendable cu-co-si alloy wire
JP2013032564A (en) * 2011-08-01 2013-02-14 Jx Nippon Mining & Metals Corp Cu-Co-Si-BASED ALLOY EXCELLENT IN BENDABILITY
TWI560285B (en) * 2011-08-05 2016-12-01 Furukawa Electric Co Ltd
JPWO2013021969A1 (en) * 2011-08-05 2015-03-05 古河電気工業株式会社 Rolled copper foil for secondary battery negative electrode current collector and method for producing the same
JP5567210B2 (en) * 2011-08-05 2014-08-06 古河電気工業株式会社 Rolled copper foil for secondary battery negative electrode current collector and method for producing the same
WO2013021969A1 (en) * 2011-08-05 2013-02-14 古河電気工業株式会社 Rolled copper foil for secondary battery collector and production method therefor
JP2014065976A (en) * 2011-08-05 2014-04-17 Furukawa Electric Co Ltd:The Rolled copper foil for secondary battery negative electrode collector and method for manufacturing the same
CN103732768A (en) * 2011-08-05 2014-04-16 古河电气工业株式会社 Rolled copper foil for secondary battery collector and production method therefor
JP2013040389A (en) * 2011-08-18 2013-02-28 Furukawa Electric Co Ltd:The Copper alloy sheet material low in deflection coefficient and excellent in bendability
TWI461549B (en) * 2012-02-14 2014-11-21 Jx Nippon Mining & Metals Corp Carbene alloy and its manufacturing method
KR101622498B1 (en) * 2012-02-14 2016-05-18 제이엑스 킨조쿠 가부시키가이샤 Corson alloy and method for manufacturing same
WO2013121620A1 (en) * 2012-02-14 2013-08-22 Jx日鉱日石金属株式会社 Corson alloy and method for manufacturing same
CN104204248A (en) * 2012-02-14 2014-12-10 Jx日矿日石金属株式会社 Corson alloy and method for manufacturing same
JP2013227642A (en) * 2012-03-26 2013-11-07 Jx Nippon Mining & Metals Corp Corson alloy and method for producing the same
KR20140148437A (en) 2012-03-26 2014-12-31 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 Corson alloy and method for producing same
WO2013145824A1 (en) * 2012-03-26 2013-10-03 Jx日鉱日石金属株式会社 Corson alloy and method for producing same
JP2013227600A (en) * 2012-04-24 2013-11-07 Jx Nippon Mining & Metals Corp Cu-Ni-Si BASED COPPER ALLOY
KR20140146123A (en) 2012-04-24 2014-12-24 제이엑스 닛코 닛세키 킨조쿠 가부시키가이샤 Cu-Ni-Si TYPE COPPER ALLOY
US9859031B2 (en) 2012-04-24 2018-01-02 Jx Nippon Mining & Metals Corporation Cu—Ni—Si based copper alloy
JP2014074193A (en) * 2012-10-02 2014-04-24 Jx Nippon Mining & Metals Corp Titanium copper and its manufacturing method
EP2728025A2 (en) 2012-10-31 2014-05-07 Dowa Metaltech Co., Ltd. Cu-Ni-Co-Si based copper alloy sheet material and method for producing the same
CN103789571A (en) * 2012-10-31 2014-05-14 同和金属技术有限公司 Cu-Ni-Co-Si based copper alloy sheet material and method for producing the same
KR20140056003A (en) 2012-10-31 2014-05-09 도와 메탈테크 가부시키가이샤 Cu-ni-co-si based copper alloy sheet materal and method for producing the same
JP2014088604A (en) * 2012-10-31 2014-05-15 Dowa Metaltech Kk Cu-Ni-Co-Si-BASED COPPER ALLOY SHEET MATERIAL AND MANUFACTURING METHOD THEREOF
US9412482B2 (en) 2012-10-31 2016-08-09 Dowa Metaltech Co., Ltd. Cu-Ni-Co-Si based copper alloy sheet material and method for producing the same
JP2016509132A (en) * 2013-01-22 2016-03-24 韓国機械材料技術院Korea Institute Of Machinery & Materials Metal composite material having oriented precipitate and method for producing the same
KR20150116825A (en) 2013-02-14 2015-10-16 도와 메탈테크 가부시키가이샤 HIGH-STRENGTH Cu-Ni-Co-Si BASE COPPER ALLOY SHEET, PROCESS FOR PRODUCING SAME, AND CURRENT-CARRYING COMPONENT
US10199132B2 (en) 2013-02-14 2019-02-05 Dowa Metaltech Co., Ltd. High strength Cu—Ni—Co—Si based copper alloy sheet material and method for producing the same, and current carrying component
WO2014126047A1 (en) 2013-02-14 2014-08-21 Dowaメタルテック株式会社 HIGH-STRENGTH Cu-Ni-Co-Si BASE COPPER ALLOY SHEET, PROCESS FOR PRODUCING SAME, AND CURRENT-CARRYING COMPONENT
JP2014173167A (en) * 2013-03-12 2014-09-22 Jx Nippon Mining & Metals Corp Cu-Ni-Si BASED COPPER ALLOY
US11021774B2 (en) 2013-08-13 2021-06-01 Jx Nippon Mining & Metals Corporation Copper alloy plate having excellent electrical conductivity and bending deflection coefficient
KR20160090871A (en) 2013-11-25 2016-08-01 제이엑스금속주식회사 Copper alloy plate having excellent electroconductivity, moldability, and stress relaxation properties
WO2015099098A1 (en) 2013-12-27 2015-07-02 古河電気工業株式会社 Copper alloy sheet material, connector, and production method for copper alloy sheet material
US10294554B2 (en) 2013-12-27 2019-05-21 Furukawa Electric Co., Ltd. Copper alloy sheet material, connector, and method of producing a copper alloy sheet material
WO2015099097A1 (en) 2013-12-27 2015-07-02 古河電気工業株式会社 Copper alloy sheet material, connector, and production method for copper alloy sheet material
US10294555B2 (en) 2013-12-27 2019-05-21 Furukawa Electric Co., Ltd. Copper alloy sheet material, connector, and method of producing a copper alloy sheet material
JPWO2015099098A1 (en) * 2013-12-27 2017-03-23 古河電気工業株式会社 Copper alloy sheet, connector, and method for producing copper alloy sheet
JPWO2015099097A1 (en) * 2013-12-27 2017-03-23 古河電気工業株式会社 Copper alloy sheet, connector, and method for producing copper alloy sheet
KR20160103003A (en) 2013-12-27 2016-08-31 후루카와 덴키 고교 가부시키가이샤 Copper alloy sheet material, connector, and production method for copper alloy sheet material
KR20160102989A (en) 2013-12-27 2016-08-31 후루카와 덴키 고교 가부시키가이샤 Copper alloy sheet material, connector, and production method for copper alloy sheet material
KR20160117210A (en) 2015-03-30 2016-10-10 제이엑스금속주식회사 Cu-Ni-Si BASED ROLLED COPPER ALLOY AND METHOD FOR MANUFACTURING THE SAME
US10704129B2 (en) 2015-03-30 2020-07-07 Jx Nippon Mining & Metals Corporation Cu—Ni—Si based rolled copper alloy and production method thereof
JP2016204757A (en) * 2016-07-20 2016-12-08 Jx金属株式会社 Cu-Ni-Si-BASED COPPER ALLOY
JP2017020115A (en) * 2016-08-29 2017-01-26 Jx金属株式会社 Titanium copper and manufacturing method therefor
CN108496228A (en) * 2016-09-20 2018-09-04 古河电气工业株式会社 Flat cable, the manufacturing method of flat cable and the rotary connector including flat cable
CN108496228B (en) * 2016-09-20 2020-11-03 古河电气工业株式会社 Flat cable, method of manufacturing flat cable, and rotary connector device including flat cable
WO2018174081A1 (en) 2017-03-22 2018-09-27 Jx金属株式会社 Copper alloy strip exhibiting improved dimensional accuracy after press-working
KR20190119621A (en) 2017-03-22 2019-10-22 제이엑스금속주식회사 Copper alloy bath with improved dimensional accuracy after press working
US11499207B2 (en) 2017-03-22 2022-11-15 Jx Nippon Mining & Metals Corporation Copper alloy strip exhibiting improved dimensional accuracy after press-working
JP2018162489A (en) * 2017-03-24 2018-10-18 Jx金属株式会社 Copper alloy for electronic material
KR20190030603A (en) 2017-09-14 2019-03-22 제이엑스금속주식회사 Cu-Ni-Si BASED COPPER ALLOY HAVING EXCELLENT WEAR-RESISTANCE OF MOLDING
WO2023140314A1 (en) * 2022-01-20 2023-07-27 古河電気工業株式会社 Copper alloy sheet material and method for manufacturing same

Also Published As

Publication number Publication date
EP2508634B1 (en) 2017-08-23
CN102630251B (en) 2017-03-15
KR20120104553A (en) 2012-09-21
JP4809935B2 (en) 2011-11-09
EP2508634A4 (en) 2016-01-06
CN102630251A (en) 2012-08-08
US20120241056A1 (en) 2012-09-27
EP2508634A1 (en) 2012-10-10
JPWO2011068134A1 (en) 2013-04-18

Similar Documents

Publication Publication Date Title
JP4809935B2 (en) Copper alloy sheet having low Young&#39;s modulus and method for producing the same
JP4934759B2 (en) Copper alloy sheet, connector using the same, and method for producing copper alloy sheet
JP5448763B2 (en) Copper alloy material
JP5158909B2 (en) Copper alloy sheet and manufacturing method thereof
JP4885332B2 (en) Copper alloy sheet and manufacturing method thereof
JP4584692B2 (en) High-strength copper alloy sheet excellent in bending workability and manufacturing method thereof
KR101935987B1 (en) Copper alloy sheet, connector comprising copper alloy sheet, and method for producing copper alloy sheet
JP5156316B2 (en) Cu-Sn-P copper alloy sheet, method for producing the same, and connector
JP5503791B2 (en) Copper alloy sheet and manufacturing method thereof
JP3962751B2 (en) Copper alloy sheet for electric and electronic parts with bending workability
WO2011068121A1 (en) Copper alloy sheet material, connector using same, and copper alloy sheet material production method for producing same
KR20140001821A (en) Copper alloy sheet and manufacturing method for same
JP5261619B2 (en) Copper alloy sheet and manufacturing method thereof
WO2013018228A1 (en) Copper alloy
KR20160029033A (en) Copper alloy for electronic and electrical equipment, copper alloy thin sheet for electronic and electrical equipment, and conductive component for electronic and electrical equipment, terminal
JP2009007625A (en) Method for producing high strength copper alloy for electric/electronic component
JP5117602B1 (en) Copper alloy sheet with low deflection coefficient and excellent bending workability

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 201080053121.2

Country of ref document: CN

ENP Entry into the national phase

Ref document number: 2011513179

Country of ref document: JP

Kind code of ref document: A

121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 10834584

Country of ref document: EP

Kind code of ref document: A1

ENP Entry into the national phase

Ref document number: 20127013066

Country of ref document: KR

Kind code of ref document: A

NENP Non-entry into the national phase

Ref country code: DE

REEP Request for entry into the european phase

Ref document number: 2010834584

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 2010834584

Country of ref document: EP