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US3637468A - Electrodes for electrolytic processes - Google Patents

Electrodes for electrolytic processes Download PDF

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Publication number
US3637468A
US3637468A US819142A US3637468DA US3637468A US 3637468 A US3637468 A US 3637468A US 819142 A US819142 A US 819142A US 3637468D A US3637468D A US 3637468DA US 3637468 A US3637468 A US 3637468A
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United States
Prior art keywords
electrode
carbon
layer
electrode assembly
electrolyte
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Expired - Lifetime
Application number
US819142A
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English (en)
Inventor
Jean J G Icxi
Philippe J Tilche
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DALIC SA
LF CARBONE LORRAINE SA
LF CARBONE-LORRAINE SA
Original Assignee
DALIC SA
LF CARBONE LORRAINE SA
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Publication of US3637468A publication Critical patent/US3637468A/en
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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/14—Electrodes, e.g. composition, counter electrode for pad-plating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S204/00—Chemistry: electrical and wave energy
    • Y10S204/07—Current distribution within the bath

Definitions

  • the absorbent material that is conventionally used, for example, in the brush or tampon process, consists of an absorbent porous carbon material.
  • a device for use in this context can comprise an electrode in contact with at least one carbon material member.
  • Electrolytic processes using brush and tampon, etc. are well known and have important industrial applications, not only in the fields of metal and metal-alloy depositions but also in the field of electrochemical treatments and applications, such as for example: anodic oxidation, electrochemical machining and/or polishing, etc.
  • the characteristics are much the same whether the workpiece to be treated be the cathode or the anode.
  • the process consists essentially in moving an absorbent device, impregnated with an appropriate electrolyte, on the conductive workpiece to be treated.
  • the invention consists in an electrolytic process utilizing highly absorbent porous carbon materials, particularly in those processes known as brush or tampon processes, and is applicable both to anodic systems, e.g., for the deposition of metals, and to cathodic systems, e.g., for anodic oxidation, electrochemical machining and electrolytic polishing.
  • the invention also consists in a device useful to carry out this process, and comprising an electrode in contact with at least one carbon material member.
  • the member is preferably nonrigid and may be cemented to the electrode with organic substances followed or not by pyrolysis. Alternatively, the parts may be attached to one another by threads which may or may not be, carbon.
  • Electrodes may be used in contact with electrodes, to receive electrolytic feeding; to serve as devices for the circulation of a fluid; to enable them to be heated by the same means or by an electric current, or to be polarized in relation to the electrode. They may also be used in electrolysis by means of fused salts. In tank plating processes they may be used to change the behavior of soluble anodes or to establish an homogeneous electric field or to improve electrodes used in electrochemical machining.
  • FIG. 1 shows a diagrammatic representation of the known electrodeposition of metals
  • FIG. 2 schematically shows a known system of electrolytic plating with cooling
  • FIG. 3 shows a first embodiment of a device according to the invention
  • FIG. 4 shows how the distance between a pseudoanode and a cathode can remain constant
  • FIG. 5 shows an anode with certain fittings
  • FIG. 6 shows an insulating component
  • FIG. 7 shows a means for the distribution of electrolytes
  • FIG. 8 shows a device capable of receiving electrolysis of fused salts
  • FIG. 9 shows a device comprising a protecting ring
  • FIG. 10 shows a cross section along the line X-X of FIG. 9, and
  • FIG. 11 schematically shows how a substantially uniform electric field is obtained.
  • FIG. 1 shows an anode 1 in contact with an absorbent material 2 that is rendered electrically conductive by impregnating it with an appropriate electrolyte, the constituent materials of the tampon being preferably hydrophilous cotton-wool, cellulose, etc., or hydrophobic synthetic fabrics, brushes with nonconductive bristles, etc., or a combination of these.
  • the whole of the anode l and the absorbent material 2 is contained in an electrically nonconductive head T.
  • the anode 1 and a workpiece 3 to be plated forming the cathode are, of course, connected to an electric power source schematically illustrated at G.
  • This device may use either soluble anodes (e.g., copper in the case of electrodeposition of copper), or alternatively nonsoluble anodes.
  • FIG. 2 represents schematically the plating of a rotating, cylindricalshaped workpiece component 3, a water jacket in which the cooling fluid 5 circulates being incorporated in the anode 1.
  • the thickness of the latter is to be as thin as possible (see example in FIG. 2).
  • the absorbent power of this material is therefore reduced and the circulation of the electrolyte which occasionally is injected, consequently becomes more difficult.
  • FIG. 3 shows a device which illustrates in principle the object of the present invention.
  • the anode 1 is put into contact with a porous carbon material member C2 placed in between the anode l and the nonconductive absorbent material 2.
  • These carbon materials may absorb for example an amount of electrolyte equal to percent of their proper volume. Considering that their own electric conductivity is far superior to that of the impregnating electrolyte, for example about 90 percent of the current passing through the device may thus be conducted by this porous material. Consequently, one may use a voluminous absorbent material C2 and 2.
  • the thickness of the nonconductive absorbent material 2 may be reduced since the carbonaceous material C2 serves as an anode and is therefore in close contact with the surface of the workpiece 3 to be treated. For this reason the electric field is much more homogeneous, the coating more even, the Joule effect reduced, all of which represents an important advantage.
  • this absorbent material is nonrigid and adaptable to any complex shaped profiles without requiring any specific machining of the anode 1; since the easily adaptable, conductive carbonaceous absorbent part operates as an anode, the distance between this pseudoanode and the cathode remains constant (FIG. 4).
  • the intrinsic electrical conductivity of the material of the member C2 makes it easy to provide the anode l with different fittings e.g., perforated electrolyte tubes 6 made of insulating materials 7 as shown in FIG. 5; mechanically or otherwise deformable anodes, even by an insulating component 8 as shown in FIG. 6, since the electric current is distributed by the carbonaceous material C2 underneath this insulator and therefore maintains a uniform electric field without any blanketing effect.
  • porous carbon materials are very suitable for the manufacture of complicated assemblies.
  • organic cements they may be attached together or to carbon or graphite supports or other materials with a basic carbon content.
  • the assemblies thus obtained may subsequently be heat treated, i.e., pyrogenized or pyrolyzed as a result of which an entirely carbonaceous matter is obtained.
  • the chemical inertia of the absorbent carbon materials allows for the use of electrolytes such as those containing concentrated sulphuric or phosphoric base acid which normally cannot be used with nonpyrolyzed absorbent organic materials.
  • the device of FIG. 7 can be adapted for electrolytic polishing, the workpiece 3 becoming the anode and the electrode 1 becoming the cathode.
  • FIG. 9 shows a device comprising a protecting ring C23.
  • This ring is made of a graphite tube 14 fixed and pyrogenated onto a ring C23 of porous carbon material and is subsequently polarized in relation to the anode l by an auxiliary power source GA for example.
  • the protecting ring is insulated by an insulating liner 15 from the porous absorbent material C2 in contact with the anode 1 and is placed inside the noncarbonaceous absorbent mass 2.
  • FIG. 10 shows a cross section along the line X-X of FIG. 9 of the different components of this protecting ring C23.
  • Insoluble anodes are often sensitive to electrolytic reaction and are subject to wear in the long run.
  • the use of conductive absorbent material acting more or less as an anode as shown in FIG. 3 protects the insoluble anodes from this type of wear.
  • An accidental short circuit between the carbonaceous material and the workpiece is temporary and without danger since the contact, being perfectly wet, prevents sudden current rises.
  • the material reduces the dissolution of the anode, for example: with an appropriate thickness of the carbonaceous material the rate of dissolution of the anode may be kept equal to the rate of deposition on the cathode in case the latter is inferior to the former.
  • anodes clad with one of these materials that may also serve as a filter for the residues from the anode dissolution, maintain the stability of the bath plating solutions.
  • the porous carbon material 17 close to the cathode 16 a uniform electric field is achieved and provided that its thickness is small the material does not act as an intermediate electrode since due to its porous texture any metallic deposit is avoided as shown in FIG. 11.
  • cathodes modified according to the present invention represent a considerable advantage.
  • electrochemical machining consists essentially in an electrolytic attack of the anodic part with a suitable electrolyte by means of an insoluble cathode having a shape similar to that of the part to be machined.
  • a very small gap between anode and cathode (approx. 20/100 mm. in most cases) is absolutely necessary to ensure an electric field as uniform as possible and to allow the highest current densities, a rapidly flowing electrolyte being passed into the gap. Since the cross section of the electrolyte flow is very small, the electrolyte must be injected under high pressure requiring strong supports able to resist heavy mechanical stresses and to ensure a precise positioning of the anode and cathode.
  • a cathode clad with a porous amorphous or graphitized carbon material due to its permeability during the electrolyte flow (e.g., 90 percent of its proper volume) makes it possible to increase considerably the speed of the electrolyte flow (e.g., 200 times) and to reduce in an even greater proportion the pressure required for the electrolyte circulation while still maintaining a very small gap owing to the fact that the porous carbon material acts partially or totally as an electrode due to its very high electric conduc tivity. Consequently, it is easier to provide the supports and it is even possible to operate in open tanks as used for conventional electrolytic treatments, thus reducing the danger of explosive gas mixtures, the detrimental rise or variation of temperature, the danger of accidental short circuits, etc.
  • FIGS. 5, 6, 7 and 9 are also applicable for electrodes used for electrochemical machining without tampons as well as for other electrochemical treatments in tanks where such type of electrodes provide a solution to the high current density conditions and forced electrolyte circulation.
  • a process for the electrolytic treatment of a conductive workpiece wherein said workpiece is held in contact with one face of a constant thickness layer of a nonconductive absorbent material, the opposite face of said layer is held in contact with one face of a layer of highly absorbent flexible electrically conductive material of fibrous porous carbon permanently filled with electrolyte, the opposite face of said carbon layer is held in contact with a conductive electrode element, the workpiece is connected to one pole of an electrical power source, and the electrode element is connected to the other pole of said power source.
  • An electrode assembly for the electrolytic treatment of a conductive workpiece comprising an electrode layer element connectable to one terminal of an electrical power source, an electrically conductive layer of a highly absorbent flexible fibrous carbon in contact with said electrode layer, and a layer of porous nonconductive material in contact over one face thereof with said carbon layer and adapted, while remaining of constant thickness, to be held with its opposite face in contact with the workpiece which is to be treated and which is connectable to the other terminal of said power source.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
US819142A 1968-04-29 1969-04-25 Electrodes for electrolytic processes Expired - Lifetime US3637468A (en)

Applications Claiming Priority (1)

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FR149897 1968-04-29

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US3637468A true US3637468A (en) 1972-01-25

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US (1) US3637468A (xx)
BE (1) BE731512A (xx)
CH (1) CH514352A (xx)
DE (1) DE1921274B2 (xx)
ES (1) ES366577A1 (xx)
FR (1) FR1585605A (xx)
GB (1) GB1264871A (xx)
LU (1) LU58475A1 (xx)
NL (1) NL143619B (xx)
NO (1) NO128432B (xx)
SE (1) SE356536B (xx)

Cited By (45)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3974050A (en) * 1971-10-12 1976-08-10 Kernforschungsanlage Julich Gesellschaft Mit Beschrankter Haftung Method of and apparatus for processing the surface of bodies
JPS524440A (en) * 1975-06-18 1977-01-13 Toshio Moriyama Electrolytic pigmentation process for stainless steel
US4043891A (en) * 1976-01-14 1977-08-23 Bell Telephone Laboratories, Incorporated Electrolytic cell with bipolar electrodes
US4073714A (en) * 1975-04-10 1978-02-14 Norsk Hydro A.S Means for cooling of self-baking anodes in aluminum electrolysis cells
US4202739A (en) * 1977-04-25 1980-05-13 The United States of America as represented by the United Stated Department of Energy Electrochemical removal of material from metallic work
US4287045A (en) * 1978-11-10 1981-09-01 Institut De Recherches De La Siderurgie Francaise Cooled electrode adapted to contact molten metal
US4360417A (en) * 1980-07-03 1982-11-23 Celanese Corporation Dimensionally stable high surface area anode comprising graphitic carbon fibers
US4431501A (en) * 1980-08-05 1984-02-14 Outokumpu Oy Apparatus for electrolytic polishing
US4650549A (en) * 1985-11-06 1987-03-17 Hughes Tool Company Method for electroplating helical rotors
US4668364A (en) * 1986-05-21 1987-05-26 Farmer Fred W Portable electroplating apparatus
DE3630919A1 (de) * 1986-09-11 1988-04-07 Harald Haffke Handgeraet zur verzinkung metallischer oberflaechen, insbesonders von karosserien mit hilfe der galvanotechnik ueber eine fahrzeug-stromquelle
US4776933A (en) * 1986-04-25 1988-10-11 Poligrat Gmbh Electrochemical polishing and pickling method and apparatus
US4786389A (en) * 1987-09-25 1988-11-22 Amp Incorporated Electroplating apparatus
US4806216A (en) * 1988-01-21 1989-02-21 The United States Of America As Represented By The United States Department Of Energy Electrochemical polishing of notches
US4874496A (en) * 1989-01-06 1989-10-17 Maryan Chak Device for silverizing drinking water
US4944856A (en) * 1989-04-19 1990-07-31 Westinghouse Electric Corp. Electrolytic etching apparatus and method for marking metal tubes with sequential identification numbers
US4992154A (en) * 1988-08-19 1991-02-12 Marui Mekki Kogyo Yugen Kaisha Brush for electrolytic treatment
US5207882A (en) * 1990-12-05 1993-05-04 Saulius Baublys Apparatus for electrochemical marking of workpieces
US5225059A (en) * 1992-08-03 1993-07-06 W. R. Associates Apparatus for single anode brush electroplating
US5322613A (en) * 1992-11-23 1994-06-21 Tomy K.K. Method and apparatus for marking orthodontic products
US5401369A (en) * 1994-01-21 1995-03-28 Gershin; Mircea-Mike Electroplating pen
US5409593A (en) * 1993-12-03 1995-04-25 Sifco Industries, Inc. Method and apparatus for selective electroplating using soluble anodes
FR2767340A1 (fr) * 1997-08-13 1999-02-19 Dalic Selective Plating Gmbh Procede pour combler des pores et/ou des microfissures presents a la surface d'un substrat en metal oxydable
FR2821627A1 (fr) * 2001-03-05 2002-09-06 Lorilleux Procede et dispositif d'elaboration par voie electrolytique d'un depot selectif epais de nickel sur une piece
US20030094364A1 (en) * 1998-12-01 2003-05-22 Homayoun Talieh Method and apparatus for electro-chemical mechanical deposition
US20040244910A1 (en) * 2001-06-14 2004-12-09 Anton Albrecht Method and device for locally removing coating from parts
US6843904B1 (en) * 1999-10-21 2005-01-18 Matsushita Electric Industrial Co., Ltd. Inspection and repair of active type substrate
US20050016868A1 (en) * 1998-12-01 2005-01-27 Asm Nutool, Inc. Electrochemical mechanical planarization process and apparatus
US20060006073A1 (en) * 2004-02-27 2006-01-12 Basol Bulent M System and method for electrochemical mechanical polishing
US20060070885A1 (en) * 1999-09-17 2006-04-06 Uzoh Cyprian E Chip interconnect and packaging deposition methods and structures
US20070042129A1 (en) * 2005-08-22 2007-02-22 Kang Gary Y Embossing assembly and methods of preparation
US20070051635A1 (en) * 2000-08-10 2007-03-08 Basol Bulent M Plating apparatus and method for controlling conductor deposition on predetermined portions of a wafer
US20070128851A1 (en) * 2001-01-05 2007-06-07 Novellus Systems, Inc. Fabrication of semiconductor interconnect structures
US20080169204A1 (en) * 2006-10-25 2008-07-17 Rolls-Royce Plc Method and apparatus for treating a component of a gas turbine engine
US20080237048A1 (en) * 2007-03-30 2008-10-02 Ismail Emesh Method and apparatus for selective electrofilling of through-wafer vias
US20080304975A1 (en) * 2007-06-05 2008-12-11 Rolls-Royce Plc Method for producing abrasive tips for gas turbine blades
US20090280243A1 (en) * 2006-07-21 2009-11-12 Novellus Systems, Inc. Photoresist-free metal deposition
US20100150730A1 (en) * 2008-12-15 2010-06-17 Rolls-Royce Plc Component having an abrasive layer and a method of applying an abrasive layer on a component
US20100193362A1 (en) * 2007-05-09 2010-08-05 Terunori Warabisako Method for processing silicon base material, article processed by the method, and processing apparatus
US20100224501A1 (en) * 2000-08-10 2010-09-09 Novellus Systems, Inc. Plating methods for low aspect ratio cavities
US20110054397A1 (en) * 2006-03-31 2011-03-03 Menot Sebastien Medical liquid injection device
WO2013064616A3 (en) * 2011-11-04 2014-07-31 Integran Technologies Flow-through consumable anodes
US20170253988A1 (en) * 2016-03-01 2017-09-07 The Boeing Company Electromodification of Conductive Surfaces
US10526717B2 (en) 2015-02-27 2020-01-07 Biomet Uk Healthcare Limited Apparatus and method for selectively treating a surface of a component
US20220186396A1 (en) * 2020-12-11 2022-06-16 Metaly S.R.L. Equipment for oxidation of planar metallic surfaces, such as sheet, fabric or metal net and method of application of the treatment

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FI834686A0 (fi) * 1983-12-20 1983-12-20 Niinivaara Ensi Kyoesti Juhani Foerfarande foer undervattensrening och -belaeggning

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GB190018643A (en) * 1900-10-18 1901-08-17 Thomas Grant Improvements in Single Cylinder Compound Compressors
GB493108A (en) * 1937-03-31 1938-09-30 Alfred Reginald Thomas Improvements in or relating to the electro-deposition of metals
US3346477A (en) * 1964-06-08 1967-10-10 W & W Products Hand instrument for electrolytic and acid etching
US3471383A (en) * 1965-02-05 1969-10-07 Gaf Corp Continuous anode for electrolytic cells
US3474013A (en) * 1965-07-17 1969-10-21 Inoue K Method of and apparatus for the electrochemical machining of a conductive workpiece

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB190018643A (en) * 1900-10-18 1901-08-17 Thomas Grant Improvements in Single Cylinder Compound Compressors
GB493108A (en) * 1937-03-31 1938-09-30 Alfred Reginald Thomas Improvements in or relating to the electro-deposition of metals
US3346477A (en) * 1964-06-08 1967-10-10 W & W Products Hand instrument for electrolytic and acid etching
US3471383A (en) * 1965-02-05 1969-10-07 Gaf Corp Continuous anode for electrolytic cells
US3474013A (en) * 1965-07-17 1969-10-21 Inoue K Method of and apparatus for the electrochemical machining of a conductive workpiece

Cited By (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3974050A (en) * 1971-10-12 1976-08-10 Kernforschungsanlage Julich Gesellschaft Mit Beschrankter Haftung Method of and apparatus for processing the surface of bodies
US4073714A (en) * 1975-04-10 1978-02-14 Norsk Hydro A.S Means for cooling of self-baking anodes in aluminum electrolysis cells
JPS524440A (en) * 1975-06-18 1977-01-13 Toshio Moriyama Electrolytic pigmentation process for stainless steel
US4043891A (en) * 1976-01-14 1977-08-23 Bell Telephone Laboratories, Incorporated Electrolytic cell with bipolar electrodes
US4202739A (en) * 1977-04-25 1980-05-13 The United States of America as represented by the United Stated Department of Energy Electrochemical removal of material from metallic work
US4287045A (en) * 1978-11-10 1981-09-01 Institut De Recherches De La Siderurgie Francaise Cooled electrode adapted to contact molten metal
US4360417A (en) * 1980-07-03 1982-11-23 Celanese Corporation Dimensionally stable high surface area anode comprising graphitic carbon fibers
US4431501A (en) * 1980-08-05 1984-02-14 Outokumpu Oy Apparatus for electrolytic polishing
US4650549A (en) * 1985-11-06 1987-03-17 Hughes Tool Company Method for electroplating helical rotors
US4776933A (en) * 1986-04-25 1988-10-11 Poligrat Gmbh Electrochemical polishing and pickling method and apparatus
US4668364A (en) * 1986-05-21 1987-05-26 Farmer Fred W Portable electroplating apparatus
DE3630919A1 (de) * 1986-09-11 1988-04-07 Harald Haffke Handgeraet zur verzinkung metallischer oberflaechen, insbesonders von karosserien mit hilfe der galvanotechnik ueber eine fahrzeug-stromquelle
US4786389A (en) * 1987-09-25 1988-11-22 Amp Incorporated Electroplating apparatus
US4806216A (en) * 1988-01-21 1989-02-21 The United States Of America As Represented By The United States Department Of Energy Electrochemical polishing of notches
US4992154A (en) * 1988-08-19 1991-02-12 Marui Mekki Kogyo Yugen Kaisha Brush for electrolytic treatment
US4874496A (en) * 1989-01-06 1989-10-17 Maryan Chak Device for silverizing drinking water
US4944856A (en) * 1989-04-19 1990-07-31 Westinghouse Electric Corp. Electrolytic etching apparatus and method for marking metal tubes with sequential identification numbers
US5207882A (en) * 1990-12-05 1993-05-04 Saulius Baublys Apparatus for electrochemical marking of workpieces
US5225059A (en) * 1992-08-03 1993-07-06 W. R. Associates Apparatus for single anode brush electroplating
US5322613A (en) * 1992-11-23 1994-06-21 Tomy K.K. Method and apparatus for marking orthodontic products
US5409593A (en) * 1993-12-03 1995-04-25 Sifco Industries, Inc. Method and apparatus for selective electroplating using soluble anodes
US5401369A (en) * 1994-01-21 1995-03-28 Gershin; Mircea-Mike Electroplating pen
FR2767340A1 (fr) * 1997-08-13 1999-02-19 Dalic Selective Plating Gmbh Procede pour combler des pores et/ou des microfissures presents a la surface d'un substrat en metal oxydable
EP0900861A1 (fr) * 1997-08-13 1999-03-10 Dalic Selective Plating GmbH Procédé pour combler des pores et/ou des microfissures présents à la surface d'un substrat en métal oxydable
US7425250B2 (en) 1998-12-01 2008-09-16 Novellus Systems, Inc. Electrochemical mechanical processing apparatus
US20030094364A1 (en) * 1998-12-01 2003-05-22 Homayoun Talieh Method and apparatus for electro-chemical mechanical deposition
US7341649B2 (en) * 1998-12-01 2008-03-11 Novellus Systems, Inc. Apparatus for electroprocessing a workpiece surface
US20050016868A1 (en) * 1998-12-01 2005-01-27 Asm Nutool, Inc. Electrochemical mechanical planarization process and apparatus
US20060070885A1 (en) * 1999-09-17 2006-04-06 Uzoh Cyprian E Chip interconnect and packaging deposition methods and structures
US6843904B1 (en) * 1999-10-21 2005-01-18 Matsushita Electric Industrial Co., Ltd. Inspection and repair of active type substrate
US8236160B2 (en) 2000-08-10 2012-08-07 Novellus Systems, Inc. Plating methods for low aspect ratio cavities
US20070051635A1 (en) * 2000-08-10 2007-03-08 Basol Bulent M Plating apparatus and method for controlling conductor deposition on predetermined portions of a wafer
US20100224501A1 (en) * 2000-08-10 2010-09-09 Novellus Systems, Inc. Plating methods for low aspect ratio cavities
US7754061B2 (en) 2000-08-10 2010-07-13 Novellus Systems, Inc. Method for controlling conductor deposition on predetermined portions of a wafer
US20070128851A1 (en) * 2001-01-05 2007-06-07 Novellus Systems, Inc. Fabrication of semiconductor interconnect structures
FR2821627A1 (fr) * 2001-03-05 2002-09-06 Lorilleux Procede et dispositif d'elaboration par voie electrolytique d'un depot selectif epais de nickel sur une piece
US7513986B2 (en) * 2001-06-14 2009-04-07 Mtu Aero Engines Gmbh Method and device for locally removing coating from parts
US20040244910A1 (en) * 2001-06-14 2004-12-09 Anton Albrecht Method and device for locally removing coating from parts
US20060006073A1 (en) * 2004-02-27 2006-01-12 Basol Bulent M System and method for electrochemical mechanical polishing
US7648622B2 (en) 2004-02-27 2010-01-19 Novellus Systems, Inc. System and method for electrochemical mechanical polishing
US20070042129A1 (en) * 2005-08-22 2007-02-22 Kang Gary Y Embossing assembly and methods of preparation
US7767126B2 (en) * 2005-08-22 2010-08-03 Sipix Imaging, Inc. Embossing assembly and methods of preparation
US20110054397A1 (en) * 2006-03-31 2011-03-03 Menot Sebastien Medical liquid injection device
US7947163B2 (en) 2006-07-21 2011-05-24 Novellus Systems, Inc. Photoresist-free metal deposition
US20090280243A1 (en) * 2006-07-21 2009-11-12 Novellus Systems, Inc. Photoresist-free metal deposition
US20090277801A1 (en) * 2006-07-21 2009-11-12 Novellus Systems, Inc. Photoresist-free metal deposition
US8500985B2 (en) 2006-07-21 2013-08-06 Novellus Systems, Inc. Photoresist-free metal deposition
US8168046B2 (en) * 2006-10-25 2012-05-01 Rolls-Royce Plc Method and apparatus for treating a component of a gas turbine engine
US20080169204A1 (en) * 2006-10-25 2008-07-17 Rolls-Royce Plc Method and apparatus for treating a component of a gas turbine engine
US20080237048A1 (en) * 2007-03-30 2008-10-02 Ismail Emesh Method and apparatus for selective electrofilling of through-wafer vias
US20100193362A1 (en) * 2007-05-09 2010-08-05 Terunori Warabisako Method for processing silicon base material, article processed by the method, and processing apparatus
US20080304975A1 (en) * 2007-06-05 2008-12-11 Rolls-Royce Plc Method for producing abrasive tips for gas turbine blades
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NO128432B (xx) 1973-11-19
FR1585605A (xx) 1970-01-30
NL143619B (nl) 1974-10-15
LU58475A1 (xx) 1969-07-22
NL6906587A (xx) 1969-10-31
CH514352A (fr) 1971-10-31
GB1264871A (xx) 1972-02-23
BE731512A (xx) 1969-09-15
DE1921274B2 (de) 1971-11-11
DE1921274A1 (de) 1969-11-06
SE356536B (xx) 1973-05-28
ES366577A1 (es) 1971-03-16

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