US20010001538A1 - Wafer probe station having environment control enclosure - Google Patents
Wafer probe station having environment control enclosure Download PDFInfo
- Publication number
- US20010001538A1 US20010001538A1 US08/790,969 US79096997A US2001001538A1 US 20010001538 A1 US20010001538 A1 US 20010001538A1 US 79096997 A US79096997 A US 79096997A US 2001001538 A1 US2001001538 A1 US 2001001538A1
- Authority
- US
- United States
- Prior art keywords
- enclosure
- holders
- positioning mechanisms
- lateral direction
- holder
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06705—Apparatus for holding or moving single probes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R35/00—Testing or calibrating of apparatus covered by the other groups of this subclass
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/06772—High frequency probes
Definitions
- the present invention is directed to probe stations for making highly accurate measurements of high-speed, large scale integrated circuits at the wafer level, and of other electronic devices. More particularly, the invention relates to such a probe station having an environment control enclosure for limiting the communication of the wafer-supporting chuck and probes with outside influences such as electromagnetic interference (EMI), air, and/or light.
- EMI electromagnetic interference
- the probe station is equipped with an integrated environment control enclosure substantially surrounding a supporting surface for holding a test device, such enclosure limiting fluid communication between the interior and exterior of the enclosure and preferably also providing EMI shielding and a dark environment.
- the limited communication between the interior and exterior of the enclosure is kept substantially constant despite positioning movement of either the supporting surface or probe holders.
- the positioning mechanisms for the supporting surface and probe holders each have portions located at least partially outside of the enclosure for transferring movement mechanically to the surface or holder.
- the environment control enclosure has an upper portion extending above the supporting surface and a side portion substantially surrounding the supporting surface, the supporting surface being movable laterally with respect to the top of the side portion.
- the environment control enclosure has an opening with a closable door for substituting different test devices on the supporting surface in a manner compatible with the positioning and environment control functions.
- FIG. 1 is a partial front view of an exemplary embodiment of a wafer probe station constructed in accordance with the present invention.
- FIG. 2 is a top view of the wafer probe station of FIG. 1.
- FIG. 2A is a partial top view of the wafer probe station of FIG. 1 with the enclosure door shown partially open.
- FIG. 3 is a partially sectional and partially schematic front view of the probe station of FIG. 1.
- FIG. 3A is an enlarged sectional view taken along line 3 A- 3 A of FIG. 3.
- FIG. 4 is a top view of the sealing assembly where the motorized positioning mechanism extends through the bottom of the enclosure.
- FIG. 5A is an enlarged top detail view taken along line 5 A- 5 A of FIG. 1.
- FIG. 5B is an enlarged top sectional view taken along line 5 B- 5 B of FIG. 1.
- FIG. 6 is a partially schematic top detail view of the chuck assembly, taken along line 6 - 6 of FIG. 3.
- FIG. 7 is a partially sectional front view of the chuck assembly of FIG. 6.
- FIG. 8 is a partially sectional side view of a probe holder and probe.
- FIG. 9 is a partially sectional bottom view taken along line 9 - 9 of FIG. 8.
- an exemplary embodiment of the probe station of the present invention comprises a base 10 (shown partially) which supports a platen 12 through a number of jacks 14 a, 14 b, 14 c, 14 d which selectively raise and lower the platen vertically relative to the base by a small increment (approximately one-tenth of an inch) for purposes to be described hereafter. Also supported by the base 10 of the probe station is a motorized positioner 16 having a rectangular plunger 18 which supports a movable chuck assembly 20 for supporting a wafer or other test device.
- the chuck assembly 20 passes freely through a large aperture 22 in the platen 12 which permits the chuck assembly to be moved independently of the platen by the positioner 16 along X, Y and Z axes, i.e. horizontally along two mutually-perpendicular axes X and Y, and vertically along the Z axis.
- the platen 12 when moved vertically by the jacks 14 , moves independently of the chuck assembly 20 and the positioner 16 .
- probe positioners such as 24 (only one of which is shown), each having an extending member 26 to which is mounted a probe holder 28 which in turn supports a respective probe 30 for contacting wafers and other test devices mounted atop the chuck assembly 20 .
- the probe positioner 24 has micrometer adjustments 34 , 36 and 38 for adjusting the position of the probe holder 28 , and thus the probe 30 , along the X, Y and Z axes respectively, relative to the chuck assembly 20 .
- the Z axis is exemplary of what is referred to herein loosely as the “axis of approach” between the probe holder 28 and the chuck assembly 20 , although directions of approach which are neither vertical nor linear, along which the probe tip and wafer or other test device are brought into contact with each other, are also intended to be included within the meaning of the term “axis of approach.”
- a further micrometer adjustment 40 adjustably tilts the probe holder 28 to adjust planarity of the probe with respect to the wafer or other test device supported by the chuck assembly 20 .
- As many as twelve individual probe positioners 24 each supporting a respective probe, may be arranged on the platen 12 around the chuck assembly 20 so as to converge radially toward the chuck assembly similarly to the spokes of a wheel.
- each individual positioner 24 can independently adjust its respective probe in the X, Y and Z directions, while the jacks 14 can be actuated to raise or lower the platen 12 and thus all of the positioners 24 and their respective probes in unison.
- An environment control enclosure is composed of an upper box portion 42 rigidly attached to the platen 12 , and a lower box portion 44 rigidly attached to the base 10 . Both portions are made of steel or other suitable electrically conductive material to provide EMI shielding.
- an electrically conductive resilient foam gasket 46 preferably composed of silver or carbon-impregnated silicone, is interposed peripherally at their mating juncture at the front of the enclosure and between the lower portion 44 and the platen 12 so that an EMI, substantially hermetic, and light seal are all maintained despite relative vertical movement between the two box portions 42 and 44 .
- a similar gasket 47 is preferably interposed between the portion 42 and the top of the platen to maximize sealing.
- the top of the upper box portion 42 comprises an octagonal steel box 48 having eight side panels such as 49 a and 49 b through which the extending members 26 of the respective probe positioners 24 can penetrate movably.
- Each panel comprises a hollow housing in which a respective sheet 50 of resilient foam, which may be similar to the above-identified gasket material, is placed. Slits such as 52 are partially cut vertically in the foam in alignment with slots 54 formed in the inner and outer surfaces of each panel housing, through which a respective extending member 26 of a respective probe positioner 24 can pass movably.
- the slitted foam permits X, Y and Z movement of the extending members 26 of each probe positioner, while maintaining the EMI, substantially hermetic, and light seal provided by the enclosure.
- the foam sheet 50 is sandwiched between a pair of steel plates 55 having slots 54 therein, such plates being slidable transversely within the panel housing through a range of movement encompassed by larger slots 56 in the inner and outer surfaces of the panel housing.
- a circular viewing aperture 58 is provided, having a recessed circular transparent sealing window 60 therein.
- a bracket 62 holds an apertured sliding shutter 64 to selectively permit or prevent the passage of light through the window.
- a stereoscope (not shown) connected to a CRT monitor can be placed above the window to provide a magnified display of the wafer or other test device and the probe tip for proper probe placement during set-up or operation.
- the window 60 can be removed and a microscope lens (not shown) surrounded by a foam gasket can be inserted through the viewing aperture 58 with the foam providing EMI, hermetic and light sealing.
- the upper box portion 42 of the environment control enclosure also includes a hinged steel door 68 which pivots outwardly about the pivot axis of a hinge 70 as shown in FIG. 2A.
- the hinge biases the door downwardly toward the top of the upper box portion 42 so that it forms a tight, overlapping, sliding peripheral seal 68 a with the top of the upper box portion.
- the sealing integrity of the enclosure is likewise maintained throughout positioning movements by the motorized positioner 16 due to the provision of a series of four sealing plates 72 , 74 , 76 and 78 stacked slidably atop one another.
- the sizes of the plates progress increasingly from the top to the bottom one, as do the respective sizes of the central apertures 72 a, 74 a, 76 a and 78 a formed in the respective plates 72 , 74 , 76 and 78 , and the aperture 79 a formed in the bottom 44 a of the lower box portion 44 .
- the central aperture 72 a in the top plate 72 mates closely around the bearing housing 18 a of the vertically-movable plunger 18 .
- the next plate in the downward progression, plate 74 has an upwardly-projecting peripheral margin 74 b which limits the extent to which the plate 72 can slide across the top of the plate 74 .
- the central aperture 74 a in the plate 74 is of a size to permit the positioner 16 to move the plunger 18 and its bearing housing 18 a transversely along the X and Y axes until the edge of the top plate 72 abuts against the margin 74 b of the plate 74 .
- the size of the aperture 74 a is, however, too small to be uncovered by the top plate 72 when such abutment occurs, and therefore a seal is maintained between the plates 72 and 74 regardless of the movement of the plunger 18 and its bearing housing along the X and Y axes.
- the chuck assembly 20 is of a unique modular construction usable either with or without an environment control enclosure.
- the plunger 18 supports an adjustment plate 79 which in turn supports first, second and third chuck assembly elements 80 , 81 and 83 , respectively, positioned at progressively greater distances from the probe(s) along the axis of approach.
- Element 83 is a conductive rectangular stage or shield 83 which detachably mounts conductive elements 80 and 81 of circular shape.
- the element 80 has a planar upwardly-facing wafer-supporting surface 82 having an array of vertical apertures 84 therein.
- apertures communicate with respective chambers separated by O-rings 88 , the chambers in turn being connected separately to different vacuum lines 90 a, 90 b, 90 c (FIG. 6) communicating through separately-controlled vacuum valves (not shown) with a source of vacuum.
- the respective vacuum lines selectively connect the respective chambers and their apertures to the source of vacuum to hold the wafer, or alternatively isolate the apertures from the source of vacuum to release the wafer, in a conventional manner.
- the separate operability of the respective chambers and their corresponding apertures enables the chuck to hold wafers of different diameters.
- auxiliary chucks such as 92 and 94 are detachably mounted on the corners of the element 83 by screws (not shown) independently of the elements 80 and 81 for the purpose of supporting contact substrates and calibration substrates while a wafer or other test device is simultaneously supported by the element 80 .
- Each auxiliary chuck 92 , 94 has its own separate upwardly-facing planar surface 100 , 102 respectively, in parallel relationship to the surface 82 of the element 80 .
- Vacuum apertures 104 protrude through the surfaces 100 and 102 from communication with respective chambers within the body of each auxiliary chuck.
- Each of these chambers in turn communicates through a separate vacuum line and a separate independently-actuated vacuum valve (not shown) with a source of vacuum, each such valve selectively connecting or isolating the respective sets of apertures 104 with respect to the source of vacuum independently of the operation of the apertures 84 of the element 80 , so as to selectively hold or release a contact substrate or calibration substrate located on the respective surfaces 100 and 102 independently of the wafer or other test device.
- An optional metal shield 106 may protrude upwardly from the edges of the element 83 to surround the other elements 80 , 81 and the auxiliary chucks 92 , 94 .
- the electrical insulation results from the fact that, in addition to the resilient dielectric O-rings 88 , dielectric spacers 85 and dielectric washers 86 are provided. These, coupled with the fact that the screws 96 pass through oversized apertures in the lower one of the two elements which each screw joins together thereby preventing electrical contact between the shank of the screw and the lower element, provide the desired insulation. As is apparent in FIG.
- the dielectric spacers 85 extend over only minor portions of the opposing surface areas of the interconnected chuck assembly elements, thereby leaving air gaps between the opposing surfaces over major portions of their respective areas. Such air gaps minimize the dielectric constant in the spaces between the respective chuck assembly elements, thereby correspondingly minimizing the capacitance between them and the ability for electrical current to leak from one element to another.
- the spacers and washers 85 and 86 are constructed of a material having the lowest possible dielectric constant consistent with high dimensional stability and high volume resistivity.
- a suitable material for the spacers and washers is glass epoxy, or acetal homopolymer marketed under the trademark Delrin by E. I. DuPont.
- the chuck assembly 20 also includes a pair of detachable electrical connector assemblies designated generally as 108 and 110 , each having at least two conductive connector elements 108 a, 108 b and 110 a, 110 b, respectively, electrically insulated from each other, with the connector elements 108 b and 110 b preferably coaxially surrounding the connector elements 108 a and 110 a as guards therefor.
- the connector assemblies 108 and 110 can be triaxial in configuration so as to include respective outer shields 108 c, 110 c surrounding the respective connector elements 108 b and 110 b, as shown in FIG. 7.
- the outer shields 108 c and 110 c may, if desired, be connected electrically through a shielding box 112 and a connector supporting bracket 113 to the chuck assembly element 83 , although such electrical connection is optional particularly in view of the surrounding EMI shielding enclosure 42 , 44 .
- the respective connector elements 108 a and 110 a are electrically connected in parallel to a connector plate 114 matingly and detachably connected along a curved contact surface 114 a by screws 114 b and 114 c to the curved edge of the chuck assembly element 80 .
- the connector elements 108 b and 110 b are connected in parallel to a connector plate 116 similarly matingly connected detachably to element 81 .
- the connector elements pass freely through a rectangular opening 112 a in the box 112 , being electrically insulated from the box 112 and therefore from the element 83 , as well as being electrically insulated from each other.
- Set screws such as 118 detachably fasten the connector elements to the respective connector plates 114 and 116 .
- triaxial cables 118 and 120 form portions of the respective detachable electrical connector assemblies 108 and 110 , as do their respective triaxial detachable connectors 122 and 124 which penetrate a wall of the lower portion 44 of the environment control enclosure so that the outer shields of the triaxial connectors 122 , 124 are electrically connected to the enclosure.
- Further triaxial cables 122 a, 124 a are detachably connectable to the connectors 122 and 124 from suitable test equipment such as a Hewlett-Packard 4142B modular DC source/monitor or a Hewlett-Packard 4284A precision LCR meter, depending upon the test application.
- the cables 118 and 120 are merely coaxial cables or other types of cables having only two conductors, one conductor interconnects the inner (signal) connector element of a respective connector 122 or 124 with a respective connector element 108 a or 110 a, while the other conductor connects the intermediate (guard) connector element of a respective connector 122 or 124 with a respective connector element 108 b, 110 b.
- the detachable connector assemblies 108 , 110 due to their interconnections with the two connector plates 114 , 116 , provide immediately ready-to-use signal and guard connections to the chuck assembly elements 80 and 81 , respectively, as well as ready-to-use guarded Kelvin connections thereto.
- the operator need merely attach a pair of cables 122 a and 124 a to the respective connectors 122 , 124 from a suitable test instrument such as a Hewlett-Packard 4284A precision LCR meter, thereby providing both source and measurement lines to the element 80 through the connector elements 108 a and 110 a and connector plate 114 , and guarding lines to the element 81 through the connector elements 108 b and 110 b and connector plate 116 .
- a suitable test instrument such as a Hewlett-Packard 4284A precision LCR meter
- respective individually movable probes 30 comprising pairs of probe elements 30 a are supported by respective probe holders 28 which in turn are supported by respective extending portions 26 of different probe positioners such as 24 .
- Atop each probe positioner 24 is a shield box 126 having a pair of triaxial connectors 128 , 130 mounted thereon with respective triaxial cables 132 entering each triaxial connector from a suitable test instrument as mentioned previously.
- Each triaxial connector includes a respective inner connector element 128 a, 130 a, an intermediate connector element 128 b, 130 b, and an outer connector element 128 c, 130 c in concentric arrangement.
- Each outer connector element 128 c, 130 c terminates by connection with the shield box 126 .
- the inner connector elements 128 a, 130 a, and the intermediate connector elements 128 b, 130 b are connected respectively to the inner and outer conductors of a pair of coaxial cables 134 , 136 which therefore are guarded cables.
- Each cable 134 , 136 terminates through a respective coaxial connector 138 , 140 with a respective probe element 30 a having a center conductor 142 surrounded by a guard 144 .
- an electrically-conductive shield tube 146 is provided around the cables 134 , 136 and electrically connected through the shield box 126 with the outer connector element 128 c, 130 c of the respective triaxial connectors 128 , 130 .
- the shield tube 146 passes through the same slit in the foam 50 as does the underlying extending member 26 of the probe positioner 24 .
- each individually movable probe 30 has not only its own separate individually movable probe holder 28 but also its own individually movable shield 146 for its guarded coaxial cables, which shield is movable in unison with the probe holder independently of the movement of any other probe holder by any other positioning mechanism 24 .
- This feature is particularly advantageous because such individually movable probes are normally not equipped for both shielded and guarded connections, which deficiency is solved by the described structure. Accordingly, the probes 30 are capable of being used with the same guarding and Kelvin connection techniques in a ready-to-use manner as is the chuck assembly 20 , consistently with full shielding despite the individual positioning capability of each probe 30 .
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
Abstract
A wafer probe station is equipped with an integrated environment control enclosure substantially surrounding a supporting surface for holding a test device, such enclosure limiting fluid communication between the interior and exterior of the enclosure and preferably also providing EMI shielding and a dark environment. The limited communication between the interior and exterior of the enclosure is kept substantially constant despite positioning movement of either the supporting surface or probe holders. The positioning mechanisms for the supporting surface and probe holders each have portions located at least partially outside of the enclosure for transferring movement mechanically to the surface or holders, respectively.
Description
- This application is a continuation of U.S. patent application Ser. No. 08/669,097, filed Jun. 26, 1996, which in turn is a continuation of U.S. patent application Ser. No. 08/417,982, filed Apr. 6 1995, now U.S. Pat. No. 5,532,609, which in turn is a divisional of U.S. patent application Ser. No. 08/245,581, filed May 18, 1994, now U.S. Pat. No. 5,434,512, which in turn is a divisional of U.S. patent application Ser. No. 07/896,853 filed Jun. 11, 1992, now U.S. Pat. No. 5,345,170.
- The present invention is directed to probe stations for making highly accurate measurements of high-speed, large scale integrated circuits at the wafer level, and of other electronic devices. More particularly, the invention relates to such a probe station having an environment control enclosure for limiting the communication of the wafer-supporting chuck and probes with outside influences such as electromagnetic interference (EMI), air, and/or light.
- The probe station is equipped with an integrated environment control enclosure substantially surrounding a supporting surface for holding a test device, such enclosure limiting fluid communication between the interior and exterior of the enclosure and preferably also providing EMI shielding and a dark environment. The limited communication between the interior and exterior of the enclosure is kept substantially constant despite positioning movement of either the supporting surface or probe holders. The positioning mechanisms for the supporting surface and probe holders each have portions located at least partially outside of the enclosure for transferring movement mechanically to the surface or holder.
- According to another aspect of the invention, the environment control enclosure has an upper portion extending above the supporting surface and a side portion substantially surrounding the supporting surface, the supporting surface being movable laterally with respect to the top of the side portion.
- According to another aspect of the invention, the environment control enclosure has an opening with a closable door for substituting different test devices on the supporting surface in a manner compatible with the positioning and environment control functions.
- The foregoing and other objectives, features, and advantages of the invention will be more readily understood upon consideration of the following detailed description of the invention, taken in conjunction with the accompanying drawings.
- FIG. 1 is a partial front view of an exemplary embodiment of a wafer probe station constructed in accordance with the present invention.
- FIG. 2 is a top view of the wafer probe station of FIG. 1.
- FIG. 2A is a partial top view of the wafer probe station of FIG. 1 with the enclosure door shown partially open.
- FIG. 3 is a partially sectional and partially schematic front view of the probe station of FIG. 1.
- FIG. 3A is an enlarged sectional view taken along
line 3A-3A of FIG. 3. - FIG. 4 is a top view of the sealing assembly where the motorized positioning mechanism extends through the bottom of the enclosure.
- FIG. 5A is an enlarged top detail view taken along
line 5A-5A of FIG. 1. - FIG. 5B is an enlarged top sectional view taken along
line 5B-5B of FIG. 1. - FIG. 6 is a partially schematic top detail view of the chuck assembly, taken along line6-6 of FIG. 3.
- FIG. 7 is a partially sectional front view of the chuck assembly of FIG. 6.
- FIG. 8 is a partially sectional side view of a probe holder and probe.
- FIG. 9 is a partially sectional bottom view taken along line9-9 of FIG. 8.
- General Arrangement of Probe Station
- With reference to FIGS. 1, 2 and3, an exemplary embodiment of the probe station of the present invention comprises a base 10 (shown partially) which supports a
platen 12 through a number ofjacks base 10 of the probe station is amotorized positioner 16 having arectangular plunger 18 which supports amovable chuck assembly 20 for supporting a wafer or other test device. Thechuck assembly 20 passes freely through alarge aperture 22 in theplaten 12 which permits the chuck assembly to be moved independently of the platen by thepositioner 16 along X, Y and Z axes, i.e. horizontally along two mutually-perpendicular axes X and Y, and vertically along the Z axis. Likewise, theplaten 12, when moved vertically by the jacks 14, moves independently of thechuck assembly 20 and thepositioner 16. - Mounted atop the
platen 12 are multiple individual probe positioners such as 24 (only one of which is shown), each having an extendingmember 26 to which is mounted aprobe holder 28 which in turn supports arespective probe 30 for contacting wafers and other test devices mounted atop thechuck assembly 20. Theprobe positioner 24 hasmicrometer adjustments probe holder 28, and thus theprobe 30, along the X, Y and Z axes respectively, relative to thechuck assembly 20. The Z axis is exemplary of what is referred to herein loosely as the “axis of approach” between theprobe holder 28 and thechuck assembly 20, although directions of approach which are neither vertical nor linear, along which the probe tip and wafer or other test device are brought into contact with each other, are also intended to be included within the meaning of the term “axis of approach.” Afurther micrometer adjustment 40 adjustably tilts theprobe holder 28 to adjust planarity of the probe with respect to the wafer or other test device supported by thechuck assembly 20. As many as twelveindividual probe positioners 24, each supporting a respective probe, may be arranged on theplaten 12 around thechuck assembly 20 so as to converge radially toward the chuck assembly similarly to the spokes of a wheel. With such an arrangement, eachindividual positioner 24 can independently adjust its respective probe in the X, Y and Z directions, while the jacks 14 can be actuated to raise or lower theplaten 12 and thus all of thepositioners 24 and their respective probes in unison. - An environment control enclosure is composed of an
upper box portion 42 rigidly attached to theplaten 12, and alower box portion 44 rigidly attached to thebase 10. Both portions are made of steel or other suitable electrically conductive material to provide EMI shielding. To accommodate the small vertical movement between the twobox portions platen 12, an electrically conductiveresilient foam gasket 46, preferably composed of silver or carbon-impregnated silicone, is interposed peripherally at their mating juncture at the front of the enclosure and between thelower portion 44 and theplaten 12 so that an EMI, substantially hermetic, and light seal are all maintained despite relative vertical movement between the twobox portions upper box portion 42 is rigidly attached to theplaten 12, asimilar gasket 47 is preferably interposed between theportion 42 and the top of the platen to maximize sealing. - With reference to FIGS. 5A and 5B, the top of the
upper box portion 42 comprises anoctagonal steel box 48 having eight side panels such as 49 a and 49 b through which the extendingmembers 26 of therespective probe positioners 24 can penetrate movably. Each panel comprises a hollow housing in which arespective sheet 50 of resilient foam, which may be similar to the above-identified gasket material, is placed. Slits such as 52 are partially cut vertically in the foam in alignment withslots 54 formed in the inner and outer surfaces of each panel housing, through which a respective extendingmember 26 of arespective probe positioner 24 can pass movably. The slitted foam permits X, Y and Z movement of the extendingmembers 26 of each probe positioner, while maintaining the EMI, substantially hermetic, and light seal provided by the enclosure. In four of the panels, to enable a greater range of X and Y movement, thefoam sheet 50 is sandwiched between a pair ofsteel plates 55 havingslots 54 therein, such plates being slidable transversely within the panel housing through a range of movement encompassed bylarger slots 56 in the inner and outer surfaces of the panel housing. - Atop the
octagonal box 48, acircular viewing aperture 58 is provided, having a recessed circulartransparent sealing window 60 therein. Abracket 62 holds an apertured slidingshutter 64 to selectively permit or prevent the passage of light through the window. A stereoscope (not shown) connected to a CRT monitor can be placed above the window to provide a magnified display of the wafer or other test device and the probe tip for proper probe placement during set-up or operation. Alternatively, thewindow 60 can be removed and a microscope lens (not shown) surrounded by a foam gasket can be inserted through theviewing aperture 58 with the foam providing EMI, hermetic and light sealing. - The
upper box portion 42 of the environment control enclosure also includes a hingedsteel door 68 which pivots outwardly about the pivot axis of ahinge 70 as shown in FIG. 2A. The hinge biases the door downwardly toward the top of theupper box portion 42 so that it forms a tight, overlapping, slidingperipheral seal 68 a with the top of the upper box portion. When the door is open, and thechuck assembly 20 is moved by thepositioner 16 beneath the door opening as shown in FIG. 2A, the chuck assembly is accessible for loading and unloading. - With reference to FIGS. 3 and 4, the sealing integrity of the enclosure is likewise maintained throughout positioning movements by the
motorized positioner 16 due to the provision of a series of four sealingplates central apertures respective plates aperture 79 a formed in the bottom 44 a of thelower box portion 44. Thecentral aperture 72 a in thetop plate 72 mates closely around the bearinghousing 18 a of the vertically-movable plunger 18. The next plate in the downward progression,plate 74, has an upwardly-projectingperipheral margin 74 b which limits the extent to which theplate 72 can slide across the top of theplate 74. Thecentral aperture 74 a in theplate 74 is of a size to permit thepositioner 16 to move theplunger 18 and its bearinghousing 18 a transversely along the X and Y axes until the edge of thetop plate 72 abuts against themargin 74 b of theplate 74. The size of theaperture 74 a is, however, too small to be uncovered by thetop plate 72 when such abutment occurs, and therefore a seal is maintained between theplates plunger 18 and its bearing housing along the X and Y axes. Further movement of theplunger 18 and bearing housing in the direction of abutment of theplate 72 with themargin 74 b results in the sliding of theplate 74 toward theperipheral margin 76 b of the nextunderlying plate 76. Again, thecentral aperture 76 a in theplate 76 is large enough to permit abutment of theplate 74 with themargin 76 b, but small enough to prevent theplate 74 from uncovering theaperture 76 a, thereby likewise maintaining the seal between theplates plunger 18 and bearing housing in the same direction causes similar sliding of theplates margin 78 b and the side of thebox portion 44, respectively, without theapertures plunger 18 along the X and Y axes by thepositioner 16, while maintaining the enclosure in a sealed condition despite such positioning movement. The EMI sealing provided by this structure is effective even with respect to the electric motors of thepositioner 16, since they are located below the sliding plates. - With particular reference to FIGS. 3, 6 and7, the
chuck assembly 20 is of a unique modular construction usable either with or without an environment control enclosure. Theplunger 18 supports anadjustment plate 79 which in turn supports first, second and thirdchuck assembly elements Element 83 is a conductive rectangular stage or shield 83 which detachably mountsconductive elements element 80 has a planar upwardly-facing wafer-supportingsurface 82 having an array ofvertical apertures 84 therein. These apertures communicate with respective chambers separated by O-rings 88, the chambers in turn being connected separately todifferent vacuum lines - In addition to the
circular elements element 83 by screws (not shown) independently of theelements element 80. Eachauxiliary chuck planar surface surface 82 of theelement 80.Vacuum apertures 104 protrude through thesurfaces apertures 104 with respect to the source of vacuum independently of the operation of theapertures 84 of theelement 80, so as to selectively hold or release a contact substrate or calibration substrate located on therespective surfaces optional metal shield 106 may protrude upwardly from the edges of theelement 83 to surround theother elements - All of the
chuck assembly elements chuck assembly element 79, are electrically insulated from one another even though they are constructed of electrically conductive metal and interconnected detachably by metallic screws such as 96. With reference to FIGS. 3 and 3A, the electrical insulation results from the fact that, in addition to the resilient dielectric O-rings 88,dielectric spacers 85 anddielectric washers 86 are provided. These, coupled with the fact that thescrews 96 pass through oversized apertures in the lower one of the two elements which each screw joins together thereby preventing electrical contact between the shank of the screw and the lower element, provide the desired insulation. As is apparent in FIG. 3, thedielectric spacers 85 extend over only minor portions of the opposing surface areas of the interconnected chuck assembly elements, thereby leaving air gaps between the opposing surfaces over major portions of their respective areas. Such air gaps minimize the dielectric constant in the spaces between the respective chuck assembly elements, thereby correspondingly minimizing the capacitance between them and the ability for electrical current to leak from one element to another. Preferably the spacers andwashers - With reference to FIGS. 6 and 7, the
chuck assembly 20 also includes a pair of detachable electrical connector assemblies designated generally as 108 and 110, each having at least twoconductive connector elements connector elements connector elements connector assemblies outer shields respective connector elements outer shields shielding box 112 and aconnector supporting bracket 113 to thechuck assembly element 83, although such electrical connection is optional particularly in view of the surroundingEMI shielding enclosure respective connector elements connector plate 114 matingly and detachably connected along acurved contact surface 114 a byscrews chuck assembly element 80. Conversely, theconnector elements connector plate 116 similarly matingly connected detachably toelement 81. The connector elements pass freely through arectangular opening 112 a in thebox 112, being electrically insulated from thebox 112 and therefore from theelement 83, as well as being electrically insulated from each other. Set screws such as 118 detachably fasten the connector elements to therespective connector plates - Either coaxial or, as shown,
triaxial cables electrical connector assemblies detachable connectors lower portion 44 of the environment control enclosure so that the outer shields of thetriaxial connectors triaxial cables connectors cables respective connector respective connector element respective connector respective connector element - In any case, the
detachable connector assemblies connector plates chuck assembly elements element 80, it is necessary only that the operator connect a single guardedcable 122 a from a test instrument such as a Hewlett-Packard 4142B modular DC source/monitor to thedetachable connector 122 so that a signal line is provided to thechuck assembly element 80 through theconnector element 108 a andconnector plate 114, and a guard line is provided to theelement 81 through theconnector element 108 b andconnector plate 116. Alternatively, if a Kelvin connection to the chuck assembly is desired for low-voltage measurements, such as those needed for measurements of low capacitance, the operator need merely attach a pair ofcables respective connectors element 80 through theconnector elements connector plate 114, and guarding lines to theelement 81 through theconnector elements connector plate 116. - With reference to FIGS. 5B, 8 and9, respective individually
movable probes 30 comprising pairs ofprobe elements 30 a are supported byrespective probe holders 28 which in turn are supported by respective extendingportions 26 of different probe positioners such as 24. Atop eachprobe positioner 24 is ashield box 126 having a pair oftriaxial connectors triaxial cables 132 entering each triaxial connector from a suitable test instrument as mentioned previously. Each triaxial connector includes a respectiveinner connector element 128 a, 130 a, anintermediate connector element outer connector element outer connector element shield box 126. Conversely, theinner connector elements 128 a, 130 a, and theintermediate connector elements coaxial cables cable coaxial connector respective probe element 30 a having acenter conductor 142 surrounded by aguard 144. In order to provide adequate shielding for thecoaxial cables octagonal box 48, an electrically-conductive shield tube 146 is provided around thecables shield box 126 with theouter connector element triaxial connectors shield tube 146 passes through the same slit in thefoam 50 as does the underlying extendingmember 26 of theprobe positioner 24. Thus, each individuallymovable probe 30 has not only its own separate individuallymovable probe holder 28 but also its own individuallymovable shield 146 for its guarded coaxial cables, which shield is movable in unison with the probe holder independently of the movement of any other probe holder by anyother positioning mechanism 24. This feature is particularly advantageous because such individually movable probes are normally not equipped for both shielded and guarded connections, which deficiency is solved by the described structure. Accordingly, theprobes 30 are capable of being used with the same guarding and Kelvin connection techniques in a ready-to-use manner as is thechuck assembly 20, consistently with full shielding despite the individual positioning capability of eachprobe 30. - The terms and expressions which have been employed in the foregoing specification are used therein as terms of description and not of limitation, and there is no intention, in the use of such terms and expressions, of excluding equivalents of the features shown and described or portions thereof, it being recognized that the scope of the invention is defined and limited only by the claims which follow.
Claims (9)
1. A probe station comprising:
(a) a surface extending in a lateral direction for holding a test device on said surface;
(b) a holder for an electrical probe for contacting said test device;
(c) a pair of positioning mechanisms each for selectively moving a corresponding one of said surface and said holder, independently of each other, toward or away from the other along an axis of approach;
(d) an environment control enclosure substantially surrounding said surface for limiting fluid communication between the interior and exterior of said enclosure to a substantially constant degree despite movement by said positioning mechanisms of either one of said surface and holder, respectively, toward or away from the other along said axis of approach, said enclosure having an upper portion extending over said surface substantially in said lateral direction and a side portion, substantially surrounding said surface laterally, having a top adjacent to said upper portion and extending generally toward said upper portion, said surface being movable by one of said positioning mechanisms in said lateral direction with respect to said top of said side portion, said pair of positioning mechanisms each having a portion located at least partially outside of said enclosure for transferring movement mechanically to the corresponding one of said surface and said holder; and
(e) said one of said positioning mechanisms being at least partially motorized.
2. A probe station comprising:
(a) a surface extending in a lateral direction for holding a test device on said surface;
(b) at least two holders for respective electrical probes for contacting said test device;
(c) respective positioning mechanisms each for selectively moving a corresponding one of said surface and said holders, independently of each other, in relation to each other in said lateral direction;
(d) an environment control enclosure substantially surrounding said surface for limiting fluid communication between the interior and exterior of said enclosure to a substantially constant degree despite movement by said positioning mechanisms of said surface and holders in said lateral direction, each of said positioning mechanisms having a portion located at least partially outside of said enclosure for transferring movement mechanically to the corresponding one of said surface and said holders;
(e) said enclosure having an opening for providing access to said surface, for substituting different test devices on said surface, and a door for selectively closing said opening, said portion of each positioning mechanism being capable of mechanically transferring movement to the corresponding one of said surface and said holders while said door is closed; and
(f) the respective positioning mechanism for moving said surface being at least partially motorized.
3. A probe station comprising:
(a) a surface extending in a lateral direction for holding a test device on said surface;
(b) a holder for an electrical probe for contacting said test device;
(c) a pair of positioning mechanisms each for selectively moving a corresponding one of said surface and said holder independently of each other, in relation to each other;
(d) an environment control enclosure, said enclosure having an upper portion extending over said surface substantially in said lateral direction and a side portion, substantially surrounding said surface laterally, having a top adjacent to said upper portion and extending generally toward said upper portion, said surface being movable by one of said positioning mechanisms in said lateral direction with respect to said top of said side portion, said pair of positioning mechanisms each having a portion located at least partially outside of said enclosure for transferring movement mechanically to the corresponding one of said surface and said holder;
(e) said one of said positioning mechanisms being at least partially motorized.
4. A probe station comprising:
(a) a surface extending in a lateral direction for holding a test device on said surface;
(b) at least two holders for respective electrical probes for contacting said test device;
(c) respective positioning mechanisms each for selectively moving a corresponding one of said surface and said holders, independently of each other, in relation to each other in said lateral direction;
(d) an environment control enclosure substantially surrounding said surface, each of said positioning mechanisms having a portion located at least partially outside of said enclosure for transferring movement mechanically to the corresponding one of said surface and said holders;
(e) said enclosure having an opening for providing access to said surface, for substituting different test devices on said surface, and a door for selectively closing said opening, said portion of each positioning mechanism being capable of mechanically transferring movement to the corresponding one of said surface and said holders while said door is closed; and
(f) the respective positioning mechanism for moving said surface being at least partially motorized.
5. The probe station of any one of claims 1-4, said enclosure substantially shielding said surface against electromagnetic interference.
6. The probe station of any one of claims 1-4, said enclosure substantially shielding said surface against light.
7. The probe station of any one of claims 1 and 3, said enclosure having an opening for providing access to said surface, for substituting different test devices on said surface, and a door for selectively closing said opening, said portion of each positioning mechanism being capable of mechanically transferring movement to the corresponding one of said surface and said holder while said door is closed.
8. The probe station of any one of claims 2 and 4, including a further positioning mechanism, each holder being supported by said upper portion of said enclosure and said upper portion being movable by said further positioning mechanism so as to move said holders in unison.
9. The probe station of any one of claims 2 and 4, said upper portion of said enclosure defining at least a pair of openings each for separately receiving the insertion of a respective mechanical member into said enclosure from a respective positioning mechanism of a respective holder.
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/790,969 US6313649B2 (en) | 1992-06-11 | 1997-01-29 | Wafer probe station having environment control enclosure |
US09/886,353 US6380751B2 (en) | 1992-06-11 | 2001-06-20 | Wafer probe station having environment control enclosure |
US10/068,728 US6486687B2 (en) | 1992-06-11 | 2002-02-06 | Wafer probe station having environment control enclosure |
US10/268,244 US6636059B2 (en) | 1992-06-11 | 2002-10-09 | Wafer probe station having environment control enclosure |
US10/441,646 US6801047B2 (en) | 1992-06-11 | 2003-05-19 | Wafer probe station having environment control enclosure |
US10/925,526 US7009383B2 (en) | 1992-06-11 | 2004-08-25 | Wafer probe station having environment control enclosure |
US11/317,400 US7348787B2 (en) | 1992-06-11 | 2005-12-22 | Wafer probe station having environment control enclosure |
US12/006,438 US7595632B2 (en) | 1992-06-11 | 2008-01-02 | Wafer probe station having environment control enclosure |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/896,853 US5345170A (en) | 1992-06-11 | 1992-06-11 | Wafer probe station having integrated guarding, Kelvin connection and shielding systems |
US08/245,581 US5434512A (en) | 1992-06-11 | 1994-05-18 | Wafer probe station having integrated guarding, Kelvin connection and shielding systems |
US08/417,982 US5532609A (en) | 1992-06-11 | 1995-04-06 | Wafer probe station having environment control enclosure |
US08/641,029 US5604444A (en) | 1992-06-11 | 1996-04-29 | Wafer probe station having environment control enclosure |
US08/669,097 US5659255A (en) | 1995-04-14 | 1996-06-26 | Method of evaluating signal conditions in a probe measurement network having a plurality of separate measurement channels |
US08/790,969 US6313649B2 (en) | 1992-06-11 | 1997-01-29 | Wafer probe station having environment control enclosure |
Related Parent Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US08/641,029 Continuation US5604444A (en) | 1992-06-11 | 1996-04-29 | Wafer probe station having environment control enclosure |
US08/669,097 Continuation US5659255A (en) | 1992-06-11 | 1996-06-26 | Method of evaluating signal conditions in a probe measurement network having a plurality of separate measurement channels |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US09/886,353 Continuation US6380751B2 (en) | 1992-06-11 | 2001-06-20 | Wafer probe station having environment control enclosure |
Publications (2)
Publication Number | Publication Date |
---|---|
US20010001538A1 true US20010001538A1 (en) | 2001-05-24 |
US6313649B2 US6313649B2 (en) | 2001-11-06 |
Family
ID=27540223
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US08/790,969 Expired - Fee Related US6313649B2 (en) | 1992-06-11 | 1997-01-29 | Wafer probe station having environment control enclosure |
Country Status (1)
Country | Link |
---|---|
US (1) | US6313649B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9784763B1 (en) * | 2016-04-08 | 2017-10-10 | Cascade Microtech, Inc. | Shielded probe systems with controlled testing environments |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6380751B2 (en) * | 1992-06-11 | 2002-04-30 | Cascade Microtech, Inc. | Wafer probe station having environment control enclosure |
US6445202B1 (en) | 1999-06-30 | 2002-09-03 | Cascade Microtech, Inc. | Probe station thermal chuck with shielding for capacitive current |
US6965226B2 (en) | 2000-09-05 | 2005-11-15 | Cascade Microtech, Inc. | Chuck for holding a device under test |
US6914423B2 (en) | 2000-09-05 | 2005-07-05 | Cascade Microtech, Inc. | Probe station |
US6771086B2 (en) * | 2002-02-19 | 2004-08-03 | Lucas/Signatone Corporation | Semiconductor wafer electrical testing with a mobile chiller plate for rapid and precise test temperature control |
US7492172B2 (en) | 2003-05-23 | 2009-02-17 | Cascade Microtech, Inc. | Chuck for holding a device under test |
US7013956B2 (en) * | 2003-09-02 | 2006-03-21 | Thermal Corp. | Heat pipe evaporator with porous valve |
US20050067146A1 (en) * | 2003-09-02 | 2005-03-31 | Thayer John Gilbert | Two phase cooling system method for burn-in testing |
US7129731B2 (en) * | 2003-09-02 | 2006-10-31 | Thermal Corp. | Heat pipe with chilled liquid condenser system for burn-in testing |
US20050067147A1 (en) * | 2003-09-02 | 2005-03-31 | Thayer John Gilbert | Loop thermosyphon for cooling semiconductors during burn-in testing |
US7250626B2 (en) | 2003-10-22 | 2007-07-31 | Cascade Microtech, Inc. | Probe testing structure |
US7187188B2 (en) | 2003-12-24 | 2007-03-06 | Cascade Microtech, Inc. | Chuck with integrated wafer support |
US7656172B2 (en) | 2005-01-31 | 2010-02-02 | Cascade Microtech, Inc. | System for testing semiconductors |
US7535247B2 (en) | 2005-01-31 | 2009-05-19 | Cascade Microtech, Inc. | Interface for testing semiconductors |
US8319503B2 (en) | 2008-11-24 | 2012-11-27 | Cascade Microtech, Inc. | Test apparatus for measuring a characteristic of a device under test |
US9000798B2 (en) * | 2012-06-13 | 2015-04-07 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of test probe alignment control |
KR101936348B1 (en) * | 2012-09-17 | 2019-01-08 | 삼성전자주식회사 | test handler for realizing rapid temperature transition and semiconductor device test method using the same |
US9188605B2 (en) * | 2013-11-12 | 2015-11-17 | Xcerra Corporation | Integrated circuit (IC) test socket with Faraday cage |
US10698002B2 (en) | 2017-10-02 | 2020-06-30 | Formfactor Beaverton, Inc. | Probe systems for testing a device under test |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3185927A (en) | 1961-01-31 | 1965-05-25 | Kulicke & Soffa Mfg Co | Probe instrument for inspecting semiconductor wafers including means for marking defective zones |
US3405361A (en) | 1964-01-08 | 1968-10-08 | Signetics Corp | Fluid actuable multi-point microprobe for semiconductors |
US3333274A (en) | 1965-04-21 | 1967-07-25 | Micro Tech Mfg Inc | Testing device |
US3710251A (en) | 1971-04-07 | 1973-01-09 | Collins Radio Co | Microelectric heat exchanger pedestal |
US4042119A (en) | 1975-06-30 | 1977-08-16 | International Business Machines Corporation | Workpiece positioning apparatus |
US4115736A (en) | 1977-03-09 | 1978-09-19 | The United States Of America As Represented By The Secretary Of The Air Force | Probe station |
JPS5953659B2 (en) | 1980-04-11 | 1984-12-26 | 株式会社日立製作所 | Reciprocating mechanism of rotating body in vacuum chamber |
US4694245A (en) | 1984-09-07 | 1987-09-15 | Precision Drilling, Inc. | Vacuum-actuated top access test probe fixture |
US4856904A (en) | 1985-01-21 | 1989-08-15 | Nikon Corporation | Wafer inspecting apparatus |
US4755746A (en) | 1985-04-24 | 1988-07-05 | Prometrix Corporation | Apparatus and methods for semiconductor wafer testing |
US4757255A (en) | 1986-03-03 | 1988-07-12 | National Semiconductor Corporation | Environmental box for automated wafer probing |
US4758785A (en) | 1986-09-03 | 1988-07-19 | Tektronix, Inc. | Pressure control apparatus for use in an integrated circuit testing station |
US4771234A (en) | 1986-11-20 | 1988-09-13 | Hewlett-Packard Company | Vacuum actuated test fixture |
US4845426A (en) | 1987-05-20 | 1989-07-04 | Signatone Corporation | Temperature conditioner for tests of unpackaged semiconductors |
US5084671A (en) | 1987-09-02 | 1992-01-28 | Tokyo Electron Limited | Electric probing-test machine having a cooling system |
US4926118A (en) | 1988-02-22 | 1990-05-15 | Sym-Tek Systems, Inc. | Test station |
JPH0222837A (en) | 1988-07-11 | 1990-01-25 | Mitsubishi Electric Corp | Wafer probing apparatus |
JPH02220453A (en) | 1989-02-21 | 1990-09-03 | Nippon Telegr & Teleph Corp <Ntt> | Apparatus for inspecting electronic circuit on wafer |
US5097207A (en) | 1989-11-03 | 1992-03-17 | John H. Blanz Company, Inc. | Temperature stable cryogenic probe station |
US5077523A (en) | 1989-11-03 | 1991-12-31 | John H. Blanz Company, Inc. | Cryogenic probe station having movable chuck accomodating variable thickness probe cards |
JPH04732A (en) | 1990-04-17 | 1992-01-06 | Mitsubishi Electric Corp | Wafer prober |
US5309088A (en) | 1990-08-10 | 1994-05-03 | Texas Instruments Incorporated | Measurement of semiconductor parameters at cryogenic temperatures using a spring contact probe |
DE4109908C2 (en) | 1991-03-26 | 1994-05-05 | Erich Reitinger | Arrangement for testing semiconductor wafers |
US5266889A (en) * | 1992-05-29 | 1993-11-30 | Cascade Microtech, Inc. | Wafer probe station with integrated environment control enclosure |
US5345170A (en) | 1992-06-11 | 1994-09-06 | Cascade Microtech, Inc. | Wafer probe station having integrated guarding, Kelvin connection and shielding systems |
-
1997
- 1997-01-29 US US08/790,969 patent/US6313649B2/en not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9784763B1 (en) * | 2016-04-08 | 2017-10-10 | Cascade Microtech, Inc. | Shielded probe systems with controlled testing environments |
US20180031608A1 (en) * | 2016-04-08 | 2018-02-01 | Cascade Microtech, Inc. | Shielded probe systems with controlled testing environments |
US10281492B2 (en) * | 2016-04-08 | 2019-05-07 | Formfactor Beaverton, Inc. | Shielded probe systems with controlled testing environments |
Also Published As
Publication number | Publication date |
---|---|
US6313649B2 (en) | 2001-11-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6380751B2 (en) | Wafer probe station having environment control enclosure | |
US5604444A (en) | Wafer probe station having environment control enclosure | |
US6313649B2 (en) | Wafer probe station having environment control enclosure | |
EP0573183B1 (en) | Probe station with integrated environment control enclosure | |
US7352168B2 (en) | Chuck for holding a device under test | |
EP0572180B1 (en) | Wafer probe station having auxiliary chucks |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: CASCADE MICROTECH, INC., OREGON Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:HARWOOD, WARREN K.;TERVO, PAUL A.;KOXXY, MARTIN J.;REEL/FRAME:008426/0266 Effective date: 19970124 |
|
FPAY | Fee payment |
Year of fee payment: 4 |
|
REMI | Maintenance fee reminder mailed | ||
FPAY | Fee payment |
Year of fee payment: 8 |
|
SULP | Surcharge for late payment |
Year of fee payment: 7 |
|
REMI | Maintenance fee reminder mailed | ||
LAPS | Lapse for failure to pay maintenance fees | ||
STCH | Information on status: patent discontinuation |
Free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362 |
|
FP | Lapsed due to failure to pay maintenance fee |
Effective date: 20131106 |