TWI483653B - Insert-chip and plasma torch - Google Patents

Description

Plug-in wafer and plasma torch

[Technical division]

The present invention relates to a plug-in wafer for a plasma welding torch and a plasma torch using the same.

〔Background technique〕

Patent Document 1 describes a nozzle shape in which a cross-sectional shape of a keyhole is obtained by welding a plasma keyhole. Patent Document 2 describes that in order to form one crater pool, the arrangement of the front ends of the electrodes is arranged in the direction of the weld line, and the two arc welding torches are simultaneously coupled by the torches. . Patent Document 3 describes a composite welding method in which a molten pit pool of 0 to 2 mm is irradiated with laser light before the target aiming position of arc welding, and keyhole welding is performed (FIG. 4, 0024, 0025). Patent Document 4 discloses that a non-penetrating fusion is performed by the first laser beam in the front, and a hole opening formed thereby is aligned, and a through-hole (keyhole) fusion is performed by the second laser beam. Laser welding method.

[Previous Technical Literature]

[Patent Document]

[Patent Document 1] Japanese Patent Laid-Open No. Hei 8-10957

[Patent Document 2] Japanese Patent Laid-Open No. Hei 6-150518

[Patent Document 3] Japanese Patent Laid-Open Publication No. 2004-298896

[Patent Document 4] Japanese Patent Laid-Open Publication No. 2008-126315

[Patent Document 5] Japanese Patent Application No. 2009-201304

[Patent Document 6] Japanese Patent Application No. 2010-264955

[Summary of the Invention]

The cross section of the plasma arc, which has been composed of a torch and is composed of a plasma arc welding, is generally circular. When the thickness of the plate is less than 3 mm, it is impossible to weld the keyhole by the plasma arc. Therefore, the contact welding (thermal conduction type fusion) is used, but even when the kiss is welded, it is easy to increase the speed. The occurrence of (a) concave cut and (b) high temperature cracking due to wide particles. In the high-speed welding, the current is a high current and becomes a wide arc. Therefore, it becomes a particle shape of a wide shallow melt, and high temperature cracking easily occurs during solidification.

In the case of a plasma arc welding which is composed of a torch, the keyhole is welded at a plate thickness of 3 to 10 mm to increase the speed, and the particle shape can be a convex shape of the central portion and a concave portion at the edge portion. Cutting, therefore, it is not easy to increase the speed. There is also a high speed of a single pit pool composed of two torches, but in order to become a single pit pool, it is necessary to greatly tilt the torches, and the magnetic blows due to the arc force and inclination of the mutual pull, It is easy to dissipate the arc and become unstable.

Then, the inventors of the present invention have provided a high-speed welded insert wafer capable of achieving high-temperature cracking or no undercutting with a stable arc and a plasma torch using the insert wafer (Patent Document 5).

This is a plug-in type wafer and a plasma torch in which the electrodes are placed in each electrode arrangement space, and the interposer type wafer has two electrode arrangement spaces and is distributed on the same diameter line and each is connected to each electrode. The space is configured to face the two nozzles that are open in a weld line parallel to the aforementioned diameter line.

When the plasma torch of the insert wafer is mounted, it is possible to perform welding of two arcs of a single pit in which one crater is formed by two arcs. Plasma electricity Since the cross section of the arc is a heat source that is thinner in the direction in which the welding is performed (y), the particle width (x direction) with respect to heat is suppressed from being narrowed, and even if the speed is increased, high temperature cracking does not occur. In addition, the surface particles can be made flat by becoming two arcs in a single pit. It is possible to obtain a slightly similar effect by using the simultaneous welding of two plasma torches that are separated by a certain distance, but the arc interval in the direction in which the welding is performed is widened, and therefore, the workpiece in the short welding length (base metal: welding) Object material), it is impossible to weld in the same channel, and it is necessary to weld two channels, and it is not easy to increase the speed. In addition, the arc interval is widened, and therefore, the rear arc system must re-melt the once solidified particles again, and weld them later, requiring a high degree of heat. When two arc weldings of a single pit of a plug-in wafer having two nozzles in one wafer are used as disclosed in Patent Document 5, the nozzle interval is shortened, and therefore, the problem is solved.

However, in the plasma welding of two arcs of one plug-in wafer, the thermal load applied to the insert wafer becomes large. In order to increase the speed more efficiently, it is necessary to increase the cooling capacity of the interposer wafer.

Then, the inventors of the present invention have provided a plug-in type wafer capable of performing high-temperature-free cracking or no-cutting welding with high cooling capacity with a stable arc (Patent Document 6). The interposer wafer system includes two electrode arrangement spaces, two nozzles each connected to each electrode arrangement space, and a position at a midpoint between the two nozzles in a plane relative to the distribution of the two nozzles The plane of the intersection is turned back to the V-type cooling water flow path of the cooling water. Thereby, the cooling water is smoothly folded back in the vicinity of the wafer leading end surface (the base material facing surface), and water or bubbles are not locally retained, and the cooling ability of the wafer is increased. The V-shaped cooling water flow path can be formed inexpensively by tilting with respect to the end surface of the wafer by the opening and crossing the front end portion. Therefore, the welding power can be increased and the welding can be performed at a higher speed. Patent Document 6 also suggests that a pair of nozzle member insertion type wafers can be detachably coupled to a wafer substrate. in case By this, it is possible to replace the nozzle member with a new one when the nozzle portion at the lower end of the nozzle member is deformed or melted due to high heat, and the wafer base is still directly used, so that the maintenance cost becomes inexpensive.

The present invention relates to an insert wafer for a plasma welding torch, and more particularly to an improvement of a plurality of nozzle members that are detachably coupled to a wafer substrate. The first object is to improve each nozzle member. The second object is to set the direction in which the nozzles are directed, and the third object is to easily and simply perform the operation of combining the nozzle members with respect to the wafer substrate to define the direction in which the nozzles are directed.

(1) A plug-in wafer for a plasma welding torch is provided with a plurality of nozzle members (20a, 20b) having an umbrella portion (21a, 21b) for opening the nozzles (3a, 3b) at the center a continuous portion (22a, 22b) continuous to the umbrella portion and a male thread portion (24a, 24b) continuous with the stem portion, having an O-ring between the aforementioned stem portion and the male thread portion, and having communication inside The electrode arrangement space (2a, 2b) to the nozzle; the wafer base body (1) having the nozzle member insertion holes (18a, 18b) from which the male screw portion of each nozzle member is inserted into the trunk portion The umbrella portion that is inserted into each nozzle member insertion hole of each nozzle member abuts against the front end plane (1d, 1e) to close and form one of the nozzle member insertion holes to form a refrigerant flow between the stem portion and the stem portion. a refrigerant circulation hole, a refrigerant receiving hole, a refrigerant outlet hole, a refrigerant through hole of the refrigerant circulation hole adjacent to each other, and one of the refrigerant circulation holes to connect the refrigerant through hole of the refrigerant receiving hole and the refrigerant circulation The other one of the holes is attached to the foregoing A refrigerant passage hole for the refrigerant outlet hole; and a fixing means for fixing the nozzle member inserted into the nozzle member insertion hole to the wafer base body.

In addition, for the sake of easy understanding, therefore, the brackets are shown in the figure, which will be described later. In the embodiments, the corresponding or equivalent component symbols, or the corresponding items, are attached as a reference. The same is true below.

When the plasma torch of the insert wafer (1) is mounted, it is possible to perform welding of a plurality of arcs in a single pit pool in which a plurality of arcs are formed into one molten pit pool. For example, in a state in which two arcs of a single pit pool forming one molten pit pool are welded by two arcs, the cross section of the plasma torch is a heat source that is thinner in the direction in which the welding is performed (y), and therefore, the relative resistance is suppressed. The particle width (x direction) of the heat is narrowed, and even if the speed is increased, high temperature cracking does not occur. In addition, by making the arc into a single pit, the keyhole is welded by the front arc at a plate thickness of 3 to 10 mm, and the wide-contact contact is welded by the rear arc to make the surface particles flat. In the case where the plate thickness is less than 3 mm, the front arc can be used for the lower excavation welding, and the rear arc is used to make the surface particles flat.

It is possible to obtain a slightly similar effect by using the simultaneous welding of two plasma torches which are separated by a certain distance, but the arc interval in the direction in which the welding is performed is widened, and therefore, the workpiece having a short welding length (welding material) It is impossible to perform welding in the same channel, and it is necessary to weld two channels, and it is not easy to increase the speed. In addition, the arc interval is widened, so that the rear arc system must re-melt the once solidified particles again, and in the latter arc, a high degree of heat is required. If a plurality of arc weldings of a single pit of the insert wafer of the present invention having a plurality of nozzle members in one wafer are used, the nozzle interval is shortened, and thus solving these problems is solved.

Further, the refrigerant circulation hole of the wafer substrate (1) is joined to the peripheral surface of the respective nozzle members (20a, 20b) and flows with a refrigerant (cooling water). Therefore, each nozzle member (20a, 20b) The cooling capacity becomes higher. Further, in the wafer substrate (1), the refrigerant flows through the refrigerant receiving hole, and one refrigerant circulation hole is connected to the refrigerant through hole of the refrigerant receiving hole, and is connected to the refrigerant circulation hole adjacent to each other. The medium through holes and other refrigerant circulation holes are connected to the refrigerant through holes of the refrigerant outlet holes, and therefore, the cooling capacity of the wafer substrate (1) is also increased.

As a result, the welding power can be increased and the welding can be performed at a higher speed. When the nozzle portion at the lower end of the nozzle member is deformed or melted due to high heat, the nozzle member can be replaced with a new one, and the wafer substrate is still directly used, making maintenance cost cheap.

[Embodiment of the Invention]

(1) The above-described fixing means for the plasma welding torch according to the above (1), wherein the fixing means is a part of the male screw portion of the nozzle member and a part of the nozzle member insertion hole (18a, 18b). The screw is used to join the female screw hole of the male thread portion. By doing so, the female screw hole of the male screw portion can be joined to the wafer base body (1), and the nozzle member can be easily attached and detached without causing deformation of the wafer base due to the rotation of the screw.

(2) The insert type wafer for a plasma welding torch according to the above (1), wherein the fixing means is screwed to a nozzle member inserted into the nozzle member insertion hole (18a, 18b) of the wafer base (1). The male thread portion cooperates with the nozzle member to clamp the nut (25a, 25b) of the wafer base.

(3) The insert wafer of the plasma welding torch according to the above (1), wherein the wafer base body (1) prevents rotation of the central axis of the nozzle member (20a, 20b) as a center means.

(4) The plug-in wafer for a plasma welding torch according to the above (3), wherein the rotation preventing means is a part of a side surface of the umbrella portion (21a, 21b) by cutting the nozzle member (20a, 20b) The slit faces (26a, 26b) and the aforementioned wafer substrate (1) have a position between the adjacent nozzle member insertion holes (18a, 18b) to abut the engaging faces of the slit faces (26a, 26b) Front end protrusion (1c) And composed.

(5) The insert wafer of the torch for plasma welding according to the above (3), wherein at least one of the nozzle members has a nozzle (3a, 3b) concentric with a central axis of the nozzle member (a1 to a3 of Fig. 6) .

(6) The insert wafer of the plasma welding torch according to the above (3), wherein the nozzle member insertion holes (18a, 18b) are parallel to a central axis of the wafer substrate, and at least one of the nozzle members (20c) There is a nozzle (3c) inclined to the direction away from the central axis of the wafer substrate (b1 to b3 of Fig. 6).

(7) The insert wafer of the plasma welding torch according to the above (3), wherein the nozzle member insertion holes (18a, 18b) are parallel to a central axis of the wafer substrate, and at least one of the nozzle members (20d) There is a nozzle (3d) inclined to the direction of the central axis of the wafer substrate (c1 to c3 of Fig. 6).

(8) A torch for a plasma welding, comprising: the insert wafer according to any one of (1) to (7), and each of the electrode arrangement spaces (2a, 2b) of the interposer wafer; Electrodes (12a, 12b) at the front end (Fig. 2).

Other objects and features of the present invention will be apparent from the following description of the embodiments.

[Examples]

-First Embodiment -

In Fig. 1, the inside of the plasma torch as the first embodiment is shown in plan view, that is, the plasma arc torch outer tube 14 of the first embodiment. In Fig. 2, II-II of Fig. 1 is shown. Longitudinal section of the line direction. The plasma arc torch of the first embodiment is in the form of plasma welding. Referring to FIG. 2, the wafer substrate 1 of the interposer wafer is fixed to the wafer stage 5 by pressing the inner cover 6 to the wafer stage 5 with screws. The wafer stage 5 is fixed to the insulative housing 7, and the insulative housing 7 is fixed to the electrode pads 10a and 10b and the insulating spacer 11.

The shield cover 8 is fixed to the insulative housing 7. The first electrode stage 10a and the second electrode stage 10b which are separated in the radial direction of the outer tube 14 by two divisions are separated by the insulating spacer 11.

The interposer wafer of the present embodiment is attached to the wafer substrate 1 with two nozzle members 20a, 20b. When referring to Fig. 5 of the detailed description, the nozzle members 20a, 20b have the central opening nozzles 3a, 3b. The umbrella portions 21a and 21b, the trunk portions 22a and 22b continuous with the umbrella portion, and the male screw portions 24a and 24b continuous with the trunk portion have an O-ring 23a serving as a sealing material between the trunk portion and the male screw portion. 23b has an electrode arrangement space 2a, 2b connected to the nozzles 3a, 3b inside.

In the wafer substrate 1, each of the nozzle member insertion holes 18a and 18b that is inserted into the trunk portion from the male screw portion of each nozzle member is attached to the umbrella portion of each nozzle member that is inserted into each nozzle member insertion hole. Cooling water circulation holes 1f, 1g, water receiving holes 1h (Fig. 4), water outlet holes 1i which are closed to the front end planes 1d, 1e and which form part of the nozzle member insertion hole and form a cooling water flow space between the dry portions And the horizontal water hole 1j of the cooling water circulation hole adjacent to each other, the horizontal water hole 1k of the cooling water circulation hole 1f connected to the water receiving hole 1h, and the horizontal water hole of the cooling water circulation hole 1g connected to the water outlet hole 1i 1l.

In this embodiment, as shown in Fig. 5(a), the nozzle member is pressed by screwing the nuts 25a, 25b to the wafer base 1 by the male thread portions 24a, 24b of the nozzle members 20a, 20b. 20a, 20b, bonded to the wafer substrate 1.

Referring again to FIG. 2, the electrode arrangement spaces 2a, 2b of the nozzle members 20a, 20b are distributed on the same diameter line (y) orthogonal to the central axis (z) of the wafer substrate 1, and are equidistant from the central axis. It extends in parallel to the central axis (z). In the embodiment, the nozzles 3a and 3b which are continuous in the electrode arrangement spaces 2a and 2b are concentric with the central axes of the electrode arrangement spaces 2a and 2b, and are opposed to a base material (not shown). These nozzles 3a, 3b are also distributed in the center axis of the wafer substrate (outer tube 14) in this embodiment. The same diameter line (y) of (z) is parallel to the central axis and, thus, begins to be equidistant.

The first electrode 12a and the second electrode 12b which are inserted into the tip end portion of each of the electrode arrangement spaces 2a and 2b are passed through the insulative housing 7, and are fixed to the electrode pads 10a and 10b by screws 13a and 13b, and the space 2a is arranged in each electrode. The axial position of 2b is positioned by the centering stones 9a, 9b. The nozzles 3a and 3b which are connected to the electrode arrangement spaces 2a and 2b are opened to the end surface (lower end surface) of the wafer base 1 facing the base material (not shown). The straight line (y) connecting the nozzles 3a, 3b is in a direction in which the direction of extension is a welding direction. The wafer substrate 1 is in a direction in which the straight line (y) extends (welding direction), and is wide as shown in FIG. 2, but is orthogonal to the direction (x) of the straight line (y), that is, a welded object. The front width direction is wedge-shaped, and the side faces are inclined surfaces 1a and 1b (Fig. 4(a)).

Referring to FIG. 4(a) showing the front end surface of the flare (in FIG. 2, the lower end of the nozzle opening), the front end projection 1c is provided at the central axis position of the front end of the wafer base 1, and is in the y direction which is the welding direction. Both sides of the front end projection 1c have front end front faces 1d, 1e that receive the umbrellas 21a, 21b of the nozzle members 20a, 20b. The nozzle member insertion holes 18a and 18b are provided at the center of each of the front end planes 1d and 1e (Fig. 5(b)). The notched faces 26a and 26b of the umbrella portions 21a and 21b of the nozzle members 20a and 20b inserted into the nozzle member insertion holes 18a and 18b are linearly cut away to closely contact the locking faces that are the side faces of the front end projections 1c. That is to make a snap. Thereby, the rotation of the nozzle members 20a, 20b with respect to the wafer base 1 with the central axis as the center is prevented. This engagement mechanism functions to stop the rotation of the nozzle members 20a and 20b when the nozzle members 20a and 20b are inserted into the wafer base 1 and to be pressed and fixed by the nuts 25a and 25b, and to remove the nozzle member from the wafer substrate 1. The function of stopping the rotation of the nozzle members 20a and 20b when the nuts 25a and 25b are slowly rotated by 20a and 20b. The engagement system also functions as a nozzle axis for the central axis (z) of the wafer substrate The inclination of the nozzle shafts of the inclined nozzle members 20c and 20d (Fig. 6) is fixed (set) in the welding direction (y).

Portions of the nozzle member insertion holes 18a and 18b on the front end planes 1d and 1e are formed as large-diameter cooling water circulation holes 1f and 1g, and are formed between the cooling water circulation holes 1f and 1g and the peripheral faces of the dry portions 22a and 22b penetrating therethrough. Cooling water circulation space (refrigerant circulation space).

In Fig. 4(c), a cross section of the wafer substrate 1 (section IVc-IVc in Fig. 2) is shown. The wafer substrate 1 has a water receiving hole 1h, a water outlet hole 1i, a horizontal water hole 1j that connects the cooling water circulation holes 1f and 1g, a cooling water circulation hole 1f that is connected to the horizontal water hole 1k of the water receiving hole 1j, and cooling. The water circulation hole 1g is connected to the horizontal water hole 11 of the water outlet hole 1i.

In Fig. 3, a longitudinal section of the line III-III in Fig. 1 is shown. The water receiving hole 1h of the wafer substrate 1 is connected to the water flow tube 16a, and the water outlet hole 1i is connected to the water flow tube 16b. Referring to FIG. 4(c), the cooling water injected into the water flow tube 16a enters the water receiving hole 1h of the wafer substrate 1 through the water flow path of the electrode stage 10a, the insulating body 7, and the wafer stage 5, and reaches the bottom of the hole. Here, the horizontal water hole 1k is introduced to enter the cooling water circulation space between the water circulation hole 1f and the outer surface of the trunk portion 22a, and then enters between the water circulation hole 1g and the outer surface of the trunk portion 22b through the horizontal water hole 1j. The cooling water circulation space is then passed through the water hole 11 to the water outlet hole 1i, and then flows to the water flow pipe 16b, and then flows out to the outside of the flare.

The nozzle member 20a, 20b is effectively cooled between the cooling water circulation space between the water circulation hole 1f and the peripheral surface of the trunk portion 22a and the cooling water circulation space between the water circulation hole 1g and the peripheral surface of the trunk portion 22b. The cadres 22a and 22b, and the cooling water flows between the water receiving hole 1h, the horizontal water hole 1k, the water circulation hole 1f, the horizontal water hole 1j, the water circulation hole 1g, the horizontal water hole 11 and the water outlet hole 1i. The wafer substrate 1 is effectively cooled, and therefore, the cooling ability of the interposer wafer becomes high. When welding, The nozzle members 20a and 20b are heated most, but the peripheral surfaces thereof are directly contacted with the cooling water for cooling, and therefore, the service life of the nozzle members 20a and 20b becomes long.

Referring again to FIGS. 1 and 2, the pilot gas system enters the electrode arrangement spaces 2a and 2b through the guide gas tubes 15a and 15b and the electrode insertion space, and becomes plasma at the tip end portion of the electrode, and is torched by the nozzles 3a and 3b. The front end is sprayed out. The shield gas system enters the cylindrical space between the inner cover 7 and the shield cover 8 through the shield gas pipe 17, and is then ejected from the front end of the torch toward the base material (not shown).

A guide arc is generated between the electrodes 12a and 12b and the wafer substrate 1 by the respective guide power sources (not shown), and the flow electrode side is negative and the base material side is between the electrodes 12a and 12b and the base material. A plasma power source (for welding or preheating) that supplies power to the front electrode 12a in the welding direction for the positive plasma arc current and a plasma power source (contact welding or formal welding) that supplies power to the rear electrode 12b in the welding direction. When a welding arc (plasma arc) is generated, the plasma arc current flows between the electrodes 12a and 12b and the base material to realize two arc welding of a single pit. In the welded form, welding or preheating by the plasma arc of the electrode 12a and contact welding or formal welding by the electrode 12b are performed. That is to say, the molten pit pool formed by the welding or preheating of the front electrode 12a is contacted with the plasma arc of the contact welding or the formal welding at the rear electrode 12b, for example, by bonding a keyhole. The pool of molten pits is transported to the rear, and the subsequent contact fusion system is formed by melting the molten particles on the average by the keyholes. Thereby, the contact-welding particles which are smoothly attached to the surface of the base material are formed. In the state of a thin plate of less than 3 mm, it is impossible to perform keyhole welding, and therefore, particles are formed by welding or preheating in the front, which is changed into smooth particles by subsequent contact welding. As always, unlike the wide-width welding of a large current single pit pool, the front and the back are all functions in various ways, and the high-speed welding of the narrow width of the particles can be performed with a minimum necessary minimum current. In addition, even if the front arc is used as the preheating, the formal welding is performed by the rear arc. The method can also be speeded up. Also in any of the states, the insert type wafer, particularly the nozzle member which is easily burned, has a high cooling capacity, so that the welding power can be increased and the welding can be performed at a higher speed.

- Second embodiment -

Fig. 6(b1) shows the front appearance of the nozzle member 20c according to the first modification used in place of the nozzle members 20a and/or 20b shown in Fig. 2, and Fig. 6(b2) shows the longitudinal direction of the nozzle member 20c. In the cross section, the bottom surface (front end surface) of the nozzle member 20c is shown in Fig. 6 (b3). The central axes of the nozzles 3a, 3b of the nozzle members 20a, 20b shown in Fig. 2 are concentric with the central axis of the nozzle member. However, the nozzle 3c of the nozzle member 20c is inclined with respect to the central axis of the nozzle member 20c. Therefore, when the nozzle member 20c is mounted on the wafer substrate 1, the slit surface 26c is engaged with the front end projection 1c of the wafer substrate 1. The state is such that the central axis of the nozzle 3c is inclined in a direction away from the central axis of the wafer substrate (the intermediate point of the nozzle member insertion hole). In other words, it is possible to perform widening between the front and rear sides (the state of the front nozzle) or the rear side (the state of the rear nozzle) with respect to the central axis of the wafer base 1 in the welding direction (y). Splicing of the distance between points).

- Third embodiment one

6(c1), the front view of the nozzle member 20d according to the second modification used in place of the nozzle member 20a and/or 20b shown in Fig. 2 is shown, and the longitudinal direction of the nozzle member 20d is shown in Fig. 6(c2). In the cross section, the bottom surface (front end surface) of the nozzle member 20d is shown in Fig. 6 (c3). The nozzle 3d of the nozzle member 20d is inclined with respect to the central axis of the nozzle member 20d in the opposite direction to the nozzle 3c. When the nozzle member 20d is mounted on the wafer substrate 1, the slit surface 26d is engaged with the wafer substrate 1 The state of the front end projection 1c is such that the central axis of the nozzle 3d is inclined in a direction approaching the central axis of the wafer base 1 (the intermediate point of the nozzle member insertion hole). That is to say, in the welding direction (y), tilting to approach the central axis of the wafer substrate 1 can be advanced The welding of the narrowing poles (the distance between the front and rear welding points).

Further, the interposer wafer to which the nozzle member is mounted on the wafer substrate 1 is in the form of the embodiment shown in Fig. 2; (2) the nozzle member 20a is replaced by the nozzle member 20a shown in Fig. 2, and is welded. The direction (y) causes the nozzle member 20c to be in the form of the front nozzle; (3) the nozzle member 20a shown in Fig. 2 is replaced with the nozzle member 20c, so that the nozzle member 20c becomes the shape of the rear nozzle; (4) the Fig. 2 is made The nozzle members 20a and 20b are all in the state of the nozzle member 20c. (5) The nozzle member 20a is replaced with the nozzle member 20a as shown in Fig. 2, so that the nozzle member 20d is in the form of the front nozzle; (6) replacing Fig. 2 The nozzle member 20a is shown as the nozzle member 20d so that the nozzle member 20d is in the form of a rear nozzle; (7) the nozzle members 20a and 20b shown in Fig. 2 are all in the state of the nozzle member 20d; (8) The nozzle members 20a and 20b shown in Fig. 2 are the nozzle members 20c and 20d, so that the nozzle member 20c is in the form of a front nozzle; and (9) the nozzle member 20a, 20b shown in Fig. 2 is replaced with the nozzle member 20c, 20d, making the nozzle member 20d becomes the shape of the front nozzle. Any one of the above forms (1) to (9) may be selected in accordance with the thickness of the welding target and the required welding current, welding speed, and welding quality (for example, a desired particle shape).

1‧‧‧ wafer base

1a, 1b‧‧‧ sloped surface

1c‧‧‧ front end projection

1d, 1e‧‧‧ front plane

1f, 1g‧‧‧ water circulation hole

1h‧‧‧ water receiving hole

1i‧‧‧Water outlet

1j, 1k, 1l‧‧‧ horizontal water holes

2a-2d‧‧‧electrode configuration space

3a-3d‧‧‧ nozzle

5‧‧‧ wafer station

6‧‧‧ inner cover

7‧‧‧Insulated body

8‧‧‧Shield cover

9a, 9b‧‧‧ centering stone

10a, 10b‧‧‧ electrode table

11‧‧‧Insulation pad

12a, 12b‧‧‧ electrodes

13a, 13b‧‧‧ screws

14‧‧‧Outer tube

15a, 15b‧‧‧ Guided gas tubes

16a, 16b‧‧‧ water flow tube

17‧‧‧Shielding gas pipe

18a, 18b‧‧‧ nozzle member insertion hole

20a-20d‧‧‧Nozzle components

21a-21d‧‧‧ Umbrella Department

22a-22d‧‧‧ cadres

23a-23d‧‧‧O-ring

24a-24d‧‧‧ Male thread

25a, 25b‧‧‧ nuts

26a-26d‧‧‧cut surface

Fig. 1 is a plan view showing the inside of an outer cylinder of a plasma torch according to a first embodiment of the present invention.

Figure 2 is a cross-sectional view taken along line II-II of the plasma torch shown in Figure 1.

Figure 3 is a sectional view taken along line III-III of the plasma torch shown in Figure 1.

Figure 4 (a) is a bottom view of the front end of the plasma torch shown in bottom view 2 in the direction of the IVa-IVa line; Figure 4 (b) is a bottom view of the line IVb-IVb shown in Figure 3; Fig. 4(c) is a cross-sectional view taken along the line IVc-IVc shown in Fig. 2.

Figure 5 (a) is a longitudinal sectional view showing the insert wafer and the inner cover 6 at the front end of the plasma torch shown in Figure 2 removed from the torch body; Figure 5 (b) shows only (a) A longitudinal cross-sectional view of the wafer substrate 1 and the inner cover 6; FIG. 5(c) shows the nuts 25a, 25b together and the nut 25a, 25b shown by (a) is removed from the nozzle members 20a, 20b by the wafer substrate 1 Pull out the front view (appearance view) of the nozzle member.

Figure 6 (a1) is a front view showing the expansion of the nozzle member 20a shown in Figure 5 (c); Figure 6 (a2) is a longitudinal sectional view of the nozzle member 20a; Figure 6 (a3) is a bottom view of the nozzle member 20a Fig. 6(b1) is a front view showing the nozzle member 20c which is attached to the first modification of the wafer substrate 1 in place of or in place of the nozzle members 20a and 20b shown in Fig. 2; Fig. 6(b2) A longitudinal sectional view of the nozzle member 20c; Fig. 6(b3) is a bottom view of the nozzle member 20c; and Fig. 6(c1) shows an alternative to the nozzle members 20a, 20b shown in Fig. 2 Fig. 6(c2) is a longitudinal sectional view of the nozzle member 20d, and Fig. 6(c3) is a bottom view of the nozzle member 20d.

1‧‧‧ wafer base

1c‧‧‧ front end projection

1f, 1g‧‧‧ water circulation hole

1j‧‧‧cross water hole

2a, 2b‧‧‧electrode configuration space

3a, 3b‧‧‧ nozzle

6‧‧‧ inner cover

18a, 18b‧‧‧ nozzle member insertion hole

20a, 20b‧‧‧ nozzle components

21a, 21b‧‧‧ Umbrella Department

22a, 22b‧‧‧ cadres

23a, 23b‧‧‧O-ring

24a, 24b‧‧‧ male thread

25a, 25b‧‧‧ nuts

26a, 26b‧‧‧cut face

Claims (8)

A plug-in wafer for a plasma welding torch, comprising: a plurality of nozzle members, a wafer base body, and a fixing means, wherein the nozzle member has an umbrella portion that opens the nozzle in the center, a stem portion continuous to the umbrella portion, and continuous The male screw portion of the trunk portion has an O-ring between the trunk portion and the male screw portion, and has an electrode arrangement space communicating with the nozzle therein, and the wafer base system has the male screw portion of each nozzle member inserted Each of the nozzle member insertion holes that are opened to the stem portion and the umbrella portion that is inserted into each of the nozzle member insertion holes are abutted against the front end plane to close and form one of the nozzle member insertion holes, and A refrigerant circulation hole, a refrigerant receiving hole, a refrigerant outlet hole, a refrigerant through hole of the refrigerant circulation hole adjacent to each other, and a refrigerant circulation hole adjacent to each other to form a refrigerant circulation space between the cadres to be connected to the refrigerant receiving hole The refrigerant through hole and the other refrigerant circulation hole are connected to the refrigerant through hole of the refrigerant outlet hole, and the fixing means is inserted The nozzle member passing through the nozzle member insertion hole is fixed to the aforementioned wafer base. The insert wafer of a plasma welding torch according to the first aspect of the invention, wherein the fixing means is screwed to the male screw portion of the nozzle member inserted into the nozzle member insertion hole of the wafer base. The nut of the wafer base is clamped by moving the nozzle member. A plug-in wafer for a plasma welding torch according to the first aspect of the invention, wherein the wafer substrate has a rotation preventing means for preventing rotation of a center axis of the nozzle member as a center. The insert wafer of a plasma welding torch according to the third aspect of the invention, wherein the preventing rotation means is a cutting surface of a portion of the umbrella portion of the nozzle member, and the wafer substrate Positioned between adjacent nozzle member insertion holes to abut the abutment surface of the aforementioned cutout surface The front end is composed of protrusions. The insert wafer of a plasma welding torch according to claim 3, wherein at least one of the nozzle members has a nozzle concentric with a central axis of the nozzle member. The insert wafer of a plasma welding torch according to claim 3, wherein each nozzle member insertion hole (18a, 18b) is parallel to a central axis of the wafer substrate, and at least one of the nozzle members has a tilt A nozzle that exits the central axis of the wafer substrate. The insert wafer of a plasma welding torch according to claim 3, wherein each nozzle member insertion hole (18a, 18b) is parallel to a central axis of the wafer substrate, and at least one of the nozzle members has a tilt A nozzle in the direction of the central axis of the wafer substrate. A torch for plasma welding, comprising: the insert wafer according to any one of claims 1 to 7; and each of the electrode arrangement spaces of the insert wafer is inserted into each of the front ends The electrode.