TWI388475B - Pellicle container - Google Patents
Pellicle container Download PDFInfo
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- TWI388475B TWI388475B TW099124595A TW99124595A TWI388475B TW I388475 B TWI388475 B TW I388475B TW 099124595 A TW099124595 A TW 099124595A TW 99124595 A TW99124595 A TW 99124595A TW I388475 B TWI388475 B TW I388475B
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- pellicle
- pellicle frame
- assembly
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Packaging Frangible Articles (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Buffer Packaging (AREA)
Description
本發明係關於一種在製造半導體裝置、印刷基板、液晶顯示器等產品時使用的防塵薄膜組件的收納容器,特別是關於一種在製造液晶顯示器時使用的大型防塵薄膜組件收納容器。The present invention relates to a storage container for a pellicle for use in manufacturing a semiconductor device, a printed substrate, a liquid crystal display, etc., and more particularly to a large pellicle assembly container used in the manufacture of a liquid crystal display.
在LSI、超LSI等半導體或是液晶顯示器等產品的製造過程中,係用光照射半導體晶圓或液晶用原板以製作圖案,惟若此時所使用的光罩或初縮遮罩(以下僅稱光罩)有灰塵附著的話,由於該灰塵會吸收光線或使光線彎曲,故除了會讓轉印的圖案變形、使邊緣變粗糙以外,還會使基底污黑,並損壞尺寸、品質、外觀等。In the manufacturing process of semiconductors such as LSI and super LSI, or liquid crystal displays, the semiconductor wafer or the liquid crystal original plate is irradiated with light to create a pattern, but the mask or the initial mask used at this time (hereinafter only If the dust is attached, the dust will absorb light or bend the light. In addition to deforming the transferred pattern and roughening the edges, the substrate will be stained and the size, quality and appearance will be damaged. Wait.
因此,該等作業通常是在無塵室內進行,惟即使如此欲經常保持光罩清潔仍相當困難。於是,一般採用在光罩表面貼附作為防塵器之用的防塵薄膜組件後再進行曝光的方法。此時,異物並非直接附著於光罩表面上,而係附著於防塵薄膜組件上,故只要在微影時將焦點對準到光罩圖案上,防塵薄膜組件上的異物就不會對轉印造成影響。Therefore, such operations are usually carried out in a clean room, but even if it is so often necessary to keep the reticle clean, it is quite difficult. Therefore, a method of performing exposure after attaching a pellicle film member as a dustproof device to a surface of a photomask is generally employed. At this time, the foreign matter is not directly attached to the surface of the photomask, but is attached to the pellicle film assembly, so that the foreign matter on the pellicle film assembly is not transferred to the photomask as long as the focus is on the photomask. Make an impact.
一般而言,防塵薄膜組件,會在防塵薄膜組件框架的上端面張設透明的防塵薄膜,同時在下端面設置用來貼合到光罩上的粘接劑層。具體而言,係在由鋁、不銹鋼、聚乙烯等物質所構成的防塵薄膜組件框架的上端面塗佈防塵薄膜的良好溶媒,之後將由透光性良好的硝化纖維素、醋酸纖維素、氟系樹脂等物質所構成的透明防塵薄膜風乾接合於其上(專利文獻1:日本特開昭58-219023號公報),或是用丙烯酸樹脂或環氧樹脂等的接合劑接合(專利文獻2:美國專利第4861402號說明書,專利文獻3:日本特公昭63-27707號公報)。然後,在防塵薄膜組件框架的下端面,貼合用來裝設到光罩上而由聚丁烯樹脂、聚醋酸乙烯酯樹脂、丙烯酸樹脂、矽氧樹脂等樹脂所構成的粘接劑層,以及因應需要設置而目的在於保護粘接劑層的脫模層(隔離部)。In general, the pellicle is provided with a transparent pellicle film on the upper end surface of the pellicle frame, and an adhesive layer for attaching to the photomask is provided on the lower end surface. Specifically, a good solvent for the pellicle film is applied to the upper end surface of the pellicle frame made of a material such as aluminum, stainless steel or polyethylene, and then the nitrocellulose, cellulose acetate, and fluorine are excellent in light transmittance. A transparent pellicle film made of a resin or the like is air-dried and bonded thereto (Patent Document 1: JP-A-58-219023) or a bonding agent such as an acrylic resin or an epoxy resin (Patent Document 2: USA) Patent No. 4,861,402, Patent Document 3: Japanese Patent Publication No. 63-27707). Then, on the lower end surface of the pellicle frame, an adhesive layer composed of a resin such as polybutylene resin, polyvinyl acetate resin, acrylic resin, or epoxy resin is attached to the photomask. And a release layer (separator) for protecting the adhesive layer, if necessary.
隔離部,通常係在PET樹脂等厚度100~200μm左右的薄膜上塗佈脫模劑,然後將薄膜切割加工成吾人想要的形狀使用。隔離部,除了很薄之外,還形成與框架的外形幾乎相同的框狀,故會變得像軟性繩帶那樣,除了很難徹底洗淨之外,在將其貼合到粘接劑層的作業中,就使用處理上而言,也是很不方便的。The separator is usually coated with a release agent on a film having a thickness of about 100 to 200 μm such as a PET resin, and then the film is cut into a shape desired by us. The partition portion is formed in a frame shape almost the same as the outer shape of the frame except for being thin, so that it becomes like a soft cord, and it is attached to the adhesive layer in addition to being difficult to thoroughly clean. In the homework, it is also very inconvenient to use.
另外,隔離部必須用沒有接縫、摺痕等的整片原料片材製造。若隔離部有接縫、摺痕等的高低差,則形狀會轉印到所貼合的粘接劑層上,可能會對貼合後的光罩的穩定性造成影響。想要製造這種沒有接縫、摺痕等高低差的大型整片原料片材是很困難的,另外,想要將脫模劑塗佈到整個表面上而沒有缺陷瑕疵也是很困難的。因此,對於大型防塵薄膜組件,特別是1邊長度超過1m的大型防塵薄膜組件而言,製造隔離部是很困難的。In addition, the partition must be made of a single piece of raw material sheet without seams, creases, and the like. If the partition has a difference in height such as seams and creases, the shape is transferred to the bonded adhesive layer, which may affect the stability of the bonded mask. It is difficult to manufacture such a large-sized whole sheet of raw material without seams, creases, and the like, and it is difficult to apply the release agent to the entire surface without defects. Therefore, for a large pellicle assembly, particularly a large pellicle having a length of more than 1 m on one side, it is difficult to manufacture the separator.
隔離部必須具備保護粘接劑層的功能,在防塵薄膜組件使用時會被剝離丟棄,為了解決該等問題亦可不使用隔離部。為了省略使用隔離部,例如,可使用防塵薄膜組件收納容器,通常防塵薄膜組件係以粘接劑層朝向下側(防塵薄膜組件收納容器側)的方式被收納在收納容器中,然而此時可相反地以粘接劑層朝向上側,防塵薄膜側朝向下側的方式載置。但是,在該情況下,防塵薄膜內側在防塵薄膜組件收納容器內朝向上方,最需要保護的部分反而會有異物附著的危險,並非較佳的作法。如是,到現在為止,尚無文獻提出一種在保管中不需要隔離部也能收納防塵薄膜組件的防塵薄膜組件收納容器。The separator must have a function of protecting the adhesive layer, and it is peeled off and discarded when the pellicle is used. In order to solve such problems, the separator may not be used. In order to omit the use of the partition, for example, a pellicle assembly container can be used. Usually, the pellicle is housed in the container so that the adhesive layer faces downward (the pellicle container storage container side). Conversely, the adhesive layer is placed on the upper side, and the dust-proof film side is placed on the lower side. However, in this case, the inside of the pellicle is directed upward in the pellicle container storage container, and the portion that is most in need of protection may be contaminated by foreign matter, which is not preferable. In the past, there has been no document which proposes a pellicle pack storage container that can store a pellicle assembly without requiring a partition in storage.
習知技術揭示在防塵薄膜組件收納容器內設置防塵薄膜組件框架支持體,作為在保管中不需要隔離部的防塵薄膜組件以及防塵薄膜組件收納容器(專利文獻4:日本特開2009-128635號公報)。然而,當防塵薄膜組件框架支持體很軟時,便無法利用固定螺栓等工具確實而充分地將防塵薄膜組件框架支持體固定在防塵薄膜組件收納容器上,當防塵薄膜組件框架支持體很硬時,會發生無法充分吸收移動防塵薄膜組件收納容器時對防塵薄膜組件框架所產生的振動、衝擊等的不良情況,而無法解決問題。In the prior art, a pellicle assembly frame support is provided in a pellicle assembly container, and a pellicle assembly and a pellicle assembly container which do not require a partition during storage are disclosed (Patent Document 4: JP-A-2009-128635) ). However, when the pellicle frame support is very soft, it is impossible to securely and sufficiently fix the pellicle frame support to the pellicle assembly container by means of a fixing bolt or the like, when the pellicle frame support is hard. There is a problem that vibration, impact, and the like which are generated on the pellicle frame when the mobile pellicle container storage container is not sufficiently absorbed, and the problem cannot be solved.
[先行技術文獻][Advanced technical literature]
[專利文獻][Patent Literature]
[專利文獻1]日本特開昭58-219023號公報[Patent Document 1] JP-A-58-219023
[專利文獻2]美國專利第4861402號說明書[Patent Document 2] US Patent No. 4,861,402
[專利文獻3]日本特公昭63-27707號公報[Patent Document 3] Japanese Patent Publication No. 63-27707
[專利文獻4]日本特開2009-128635號公報[Patent Document 4] Japanese Patent Laid-Open Publication No. 2009-128635
為了解決上述問題,本發明之目的在於提供一種防塵薄膜組件收納容器,其對於防塵薄膜組件,特別是至少一邊邊長在500mm以上的大型防塵薄膜組件,使用隔離部以外的粘接劑層保護手段(亦即不使用隔離部)保護粘接劑層,且在保管中或輸送中產生振動、衝擊的情況下也能確實保持防塵薄膜組件。In order to solve the above problems, an object of the present invention is to provide a pellicle pack storage container which uses an adhesive layer protection means other than the partition portion for a pellicle film assembly, particularly a large pellicle film having at least one side longer than 500 mm. (In other words, the separator is not used), the adhesive layer is protected, and the pellicle can be reliably held even during vibration or impact during storage or transportation.
本發明人為了解決前述問題而致力研究,結果發現:若防塵薄膜組件收納容器包含:托盤,其可載置防塵薄膜組件;蓋部,其覆蓋托盤,與托盤共同形成收納防塵薄膜組件的封閉空間;托盤包含:防塵薄膜組件框架支持體,其只與設置在防塵薄膜組件框架的粘接劑塗佈端面的一部分上的未塗佈粘接劑的區域接觸,以支持防塵薄膜組件;以及保持機構,其將防塵薄膜組件框架固定在防塵薄膜組件框架支持體上;而且,防塵薄膜組件框架支持體係由基體部以及與防塵薄膜組件框架接觸的緩衝部所構成,形成由兩個硬度不同的構件所接合而成的接合體,則即使不使用隔離部也能夠保護粘接劑層,而且,在保管中或輸送中即使有振動、衝擊也能確實地保持防塵薄膜組件,故進而完成本發明。The inventors of the present invention have made efforts to solve the above problems, and as a result, have found that the dustproof film module storage container includes a tray on which a pellicle film member can be placed, and a lid portion that covers the tray and forms a closed space for accommodating the pellicle film assembly together with the tray. The tray comprises: a pellicle assembly frame support that is in contact only with an uncoated adhesive region provided on a portion of the adhesive coated end face of the pellicle frame to support the pellicle assembly; and a retention mechanism And fixing the pellicle frame to the pellicle frame support; further, the pellicle frame support system is composed of a base portion and a buffer portion in contact with the pellicle frame, and is formed by two members having different hardnesses. In the joined body, the adhesive layer can be protected even without using the partition, and the pellicle can be reliably held even during vibration or impact during storage or transportation.
因此,本發明提供下述防塵薄膜組件收納容器。Therefore, the present invention provides the following pellicle assembly container.
一種防塵薄膜組件收納容器,包含:托盤,其可載置防塵薄膜組件;以及蓋部,其覆蓋於該托盤,與該托盤共同形成收納防塵薄膜組件的封閉空間;該托盤包含:防塵薄膜組件框架支持體,其只與設置在防塵薄膜組件框架的粘接劑塗佈端面之一部分上的未塗佈粘接劑之區域接觸,而支持著防塵薄膜組件;以及保持機構,其將防塵薄膜組件框架固定在防塵薄膜組件框架支持體上;該防塵薄膜組件框架支持體係由基體部以及與防塵薄膜組件框架接觸的緩衝部所構成,而基體部與緩衝部兩者係由硬度不同的構件的接合體形成;該防塵薄膜組件框架支持體的基體部比緩衝部更硬,該緩衝部的硬度以橡膠硬度計TYPE A量測在10以上80以下。A dustproof film assembly storage container comprising: a tray on which a pellicle assembly can be placed; and a cover portion covering the tray, together with the tray forming an enclosed space for accommodating the pellicle assembly; the tray comprising: a pellicle frame a support body which is only in contact with an uncoated adhesive region provided on a portion of the adhesive coated end face of the pellicle frame, and supports the pellicle assembly; and a holding mechanism which will be a pellicle frame And being fixed to the pellicle frame support; the pellicle frame support system is composed of a base portion and a buffer portion that is in contact with the pellicle frame, and both the base portion and the buffer portion are joined by members having different hardnesses. The base portion of the pellicle frame support is harder than the buffer portion, and the hardness of the cushion portion is measured by a rubber hardness meter TYPE A to be 10 or more and 80 or less.
如請求項1所記載的防塵薄膜組件收納容器,其中,該防塵薄膜組件框架支持體的基體部係由工程塑膠所構成,該防塵薄膜組件框架支持體的緩衝部係由橡膠或合成橡膠所構成。The pellicle assembly container according to claim 1, wherein the base portion of the pellicle frame support is made of engineering plastic, and the cushion portion of the pellicle frame support is made of rubber or synthetic rubber. .
如請求項1或2所記載的防塵薄膜組件收納容器,其中,該緩衝部的硬度以橡膠硬度計TYPE A量測在10以上60以下。The pellicle container storage container according to claim 1 or 2, wherein the hardness of the buffer portion is 10 or more and 60 or less in terms of a rubber hardness meter TYPE A.
如請求項1乃至3中任1項所記載的防塵薄膜組件收納容器,其中,該防塵薄膜組件框架支持體的基體部與緩衝部係以異材成型方式一體成型。The pellicle assembly container according to any one of the first aspect of the present invention, wherein the base portion of the pellicle frame support and the buffer portion are integrally molded by a dissimilar material molding.
本發明的防塵薄膜組件收納容器,即使不使用隔離部也能保護粘接劑層,而且,在保管中或輸送中即使發生振動、衝撃的情況也能確實地保持防塵薄膜組件。再者,由於不使用隔離部,故能夠解決大型防塵薄膜組件的大型隔離部的材料很難取得的問題,而且,除了隔離部本身的成本之外,還能夠節省隔離部的洗淨作業、貼合作業等相關作業,故能夠大幅降低製造成本。由於以上原因,本發明在產業上的利用價值非常高。In the pellicle assembly container of the present invention, the adhesive layer can be protected without using a partition, and the pellicle can be reliably held even during vibration or rinsing during storage or transportation. Further, since the partition portion is not used, it is possible to solve the problem that the material of the large-sized separator of the large pellicle unit is difficult to obtain, and in addition to the cost of the partition portion itself, it is possible to save the cleaning operation and paste of the partition portion. The related operations such as the cooperative industry can significantly reduce manufacturing costs. For the above reasons, the utilization value of the present invention in the industry is very high.
若利用本發明,便能夠提供一種防塵薄膜組件收納容器,防 塵薄膜組件以粘接劑層不接觸防塵薄膜組件收納容器的方式被固定在收納容器內,即使不使用隔離部也能保護粘接劑層,故在保管中不需要隔離部。因此,能夠解決大型防塵薄膜組件的隔離部材料很難取得的問題。另外,也不會發生在輸送中或隔離部的剝離作業中從隔離部本身產生塵屑的問題,故從防止異物附著的觀點來看效果顯著。再者,除了隔離部本身的成本之外,也能夠節省洗淨作業、貼合作業等相關步驟,故能夠大幅降低製造成本。According to the present invention, it is possible to provide a dustproof film assembly storage container The dust film assembly is fixed in the storage container so that the adhesive layer does not contact the pellicle container storage container, and the adhesive layer can be protected without using the partition portion, so that the partition portion is not required for storage. Therefore, it is possible to solve the problem that the material of the partition portion of the large pellicle is difficult to obtain. Further, since there is no problem that dust is generated from the partition portion itself during the conveyance or the separation operation of the partition portion, the effect is remarkable from the viewpoint of preventing foreign matter from adhering. Further, in addition to the cost of the partition portion itself, it is possible to save steps related to the washing operation and the bonding work, and it is possible to significantly reduce the manufacturing cost.
另外,防塵薄膜組件框架支持體係由硬度不同的構件組合而成,故能夠有效地吸收、緩衝在輸送中防塵薄膜組件的振動、衝撃,尤其,當以橡膠或合成橡膠支持防塵薄膜組件框架時,橡膠或合成橡膠會吸收、緩衝在輸送中防塵薄膜組件的振動、衝撃,故能有效防止防塵薄膜組件框架或防塵薄膜與防塵薄膜組件收納容器接觸而損傷。再者,若防塵薄膜組件框架支持體係由基體部以及與防塵薄膜組件框架接觸的緩衝部所構成的話,便能夠各自使用最適合的構件。再者,以異材成型的成型方法一體成型,可節省將基體部與緩衝部接合的步驟,而且能夠接合得很牢固。In addition, the pellicle frame support system is composed of members having different hardnesses, so that the vibration and the punching of the pellicle assembly during transportation can be effectively absorbed and buffered, especially when the pellicle frame is supported by rubber or synthetic rubber. The rubber or the synthetic rubber absorbs and buffers the vibration and the smashing of the dustproof film assembly during transportation, so that the dustproof film assembly frame or the dustproof film can be effectively prevented from coming into contact with the dustproof film assembly storage container and damaged. Further, if the pellicle frame support system is composed of a base portion and a buffer portion that comes into contact with the pellicle frame, the most suitable members can be used. Further, the molding method of the dissimilar material molding is integrally molded, and the step of joining the base portion and the buffer portion can be saved, and the joining can be made very strong.
以下,參照圖面詳細說明本發明,惟本發明並非以此為限。Hereinafter, the present invention will be described in detail with reference to the drawings, but the invention is not limited thereto.
圖1表示本發明之防塵薄膜組件收納容器的一個實施形態,此時,防塵薄膜組件收納容器處於收納著防塵薄膜組件1的狀態。圖1中,(A)是俯視圖,(B)是沿著(A)中的A-A’線段的剖面圖,(C)是沿著(A)中的B-B’線段的剖面圖,(D)是(B)中的C所包圍之部分的放大圖,(E)是處於蓋部被打開之狀態下的俯視圖。Fig. 1 shows an embodiment of a pellicle container storage container according to the present invention. In this case, the pellicle assembly container is in a state in which the pellicle assembly 1 is housed. In Fig. 1, (A) is a plan view, (B) is a cross-sectional view taken along line A-A' in (A), and (C) is a cross-sectional view taken along line BB' in (A). (D) is an enlarged view of a portion surrounded by C in (B), and (E) is a plan view in a state where the lid portion is opened.
本發明的防塵薄膜組件收納容器,如圖1所示的,包含:托盤21,其可載置防塵薄膜組件1;以及蓋部22,其覆蓋托盤21並與托盤21一起形成收納防塵薄膜組件1的封閉空間。托盤與蓋部,係用不易產生塵屑的硬質材料,例如工程塑膠等的樹脂或金屬所構成。防塵薄膜組件以配合光罩形狀的方式製作,通常係四 角形(長方形或正方形),托盤也會配合防塵薄膜組件的形狀以及尺寸,以便收納防塵薄膜組件。在圖1所示的防塵薄膜組件收納容器2中,托盤21製作成約略長方形形狀,此時,在外周壁的內側沿著外周壁圍繞整個周圍凸出設置有堤台部211。As shown in FIG. 1, the pellicle film container of the present invention includes a tray 21 on which a pellicle unit 1 can be placed, and a lid portion 22 that covers the tray 21 and forms a pellicle film assembly together with the tray 21. The enclosed space. The tray and the lid are made of a hard material that is less likely to generate dust, such as a resin or metal such as engineering plastic. The pellicle is made in a manner that matches the shape of the mask, usually four The angle (rectangular or square), the tray also matches the shape and size of the pellicle to accommodate the pellicle assembly. In the pellicle container storage container 2 shown in Fig. 1, the tray 21 is formed in a substantially rectangular shape, and at this time, a bank portion 211 is provided on the inner side of the outer peripheral wall so as to protrude around the entire circumference along the outer peripheral wall.
蓋部22形成覆蓋托盤21的蓋子形狀,此時,蓋部22的外周緣部形成先朝外側然後再向上方折返的形狀,當蓋部22載置在托盤21上時,折返所形成的蓋部22的底面接觸托盤21的外周壁與堤台部211之間的頂面,另外,折返所形成的蓋部22的外周面接觸托盤21的外周壁的內周面,進而形成收納防塵薄膜組件1的封閉空間。The lid portion 22 is formed in a shape of a lid covering the tray 21. At this time, the outer peripheral edge portion of the lid portion 22 is formed to be outwardly turned outward and then folded back upward. When the lid portion 22 is placed on the tray 21, the lid formed by folding back is formed. The bottom surface of the portion 22 contacts the top surface between the outer peripheral wall of the tray 21 and the bank portion 211, and the outer peripheral surface of the lid portion 22 formed by the folding contact contacts the inner peripheral surface of the outer peripheral wall of the tray 21, thereby forming the storage pellicle assembly. 1 enclosed space.
如圖1所示的,防塵薄膜組件收納容器收納著防塵薄膜組件1,該防塵薄膜組件1在配合光罩形狀所形成的四角形環狀(在圖1中是長方形環狀)的防塵薄膜組件框架11的一端面上張設防塵薄膜12,另外通常會在另一端面上將粘接劑(粘接劑層)13塗佈在防塵薄膜組件框架11的整個周圍上。然後,如圖1所示的,在防塵薄膜組件框架11的粘接劑塗佈端面的一部分(其可為外周側、寬度方向中央部、內周側的其中任一處)上設置粘接劑層13(在圖1中是設置在內周側),剩下的部分就是未塗佈粘接劑13的未塗佈區域a。As shown in FIG. 1, the pellicle assembly container houses a pellicle assembly 1 having a quadrangular ring shape (rectangular ring shape in FIG. 1) formed of a reticle shape. A pellicle film 12 is stretched on one end surface of the eleven, and an adhesive (adhesive layer) 13 is usually applied to the entire periphery of the pellicle frame 11 on the other end surface. Then, as shown in FIG. 1, an adhesive is provided on a part of the adhesive-coated end surface of the pellicle frame 11 (which may be any of the outer circumferential side, the width direction central portion, and the inner circumferential side). The layer 13 (provided on the inner peripheral side in Fig. 1), the remaining portion is the uncoated region a where the adhesive 13 is not applied.
在本發明的防塵薄膜組件收納容器的托盤上,設有防塵薄膜組件框架支持體,其與設置在防塵薄膜組件框架的粘接劑塗佈端面的一部分上的未塗佈粘接劑的區域接觸,以支持防塵薄膜組件。防塵薄膜組件框架支持體設置在托盤之上,例如,在圖1所示的情況下,係在托盤21的頂面(在圖1中,係在凸出設置於托盤21之外周緣部上的堤台部211)上設置防塵薄膜組件框架支持體3。防塵薄膜組件框架支持體形成充分的間隔高度,使塗佈於防塵薄膜組件框架上的粘接劑所形成的粘接劑層與托盤不會接觸。另外,在圖1中,係在堤台部211上設置防塵薄膜組件框架支持體3,惟並非以此為限,若未設置堤台部211,則亦可在托盤21之上直接設置具備必要高度的防塵薄膜組件框架支持體3。In the tray of the pellicle assembly container of the present invention, a pellicle frame support is provided in contact with an uncoated adhesive region provided on a portion of the adhesive coated end face of the pellicle frame. To support the pell film assembly. The pellicle frame support body is disposed on the tray, for example, in the case shown in FIG. 1, on the top surface of the tray 21 (in FIG. 1, the projection is provided on the outer peripheral portion of the tray 21). The pellicle frame support 3 is provided on the bank portion 211). The pellicle frame support body is formed to have a sufficient height so that the adhesive layer formed by the adhesive applied to the pellicle frame does not come into contact with the tray. In addition, in FIG. 1, the pellicle frame support body 3 is provided in the bank part 211, but it is not limited by this, and if the bank part 211 is not provided, it can also set directly on the tray 21. High degree of pellicle frame support 3 .
防塵薄膜組件框架支持體3,在托盤21的外周緣的內側(例如,如圖1所示的堤台部211上),沿著外周緣整個周圍設置,或是設置在周圍的一部分上。在圖1中,圓錐台狀的防塵薄膜組件框架支持體3,在堤台部211的托盤21的周圍方向上,以約略等間隔的方式,設置了共8個。The pellicle frame support 3 is disposed on the inner side of the outer periphery of the tray 21 (for example, on the bank portion 211 shown in FIG. 1) along the entire circumference of the outer periphery or on a portion of the periphery. In Fig. 1, a truncated cone-shaped pellicle frame support 3 is provided in a total of eight at approximately equal intervals in the direction around the tray 21 of the bank portion 211.
另外,雖然圖1例示設置8個圓錐台狀的防塵薄膜組件框架支持體的實施例,惟防塵薄膜組件框架支持體的位置、個數、各個的形狀,可根據所收納的防塵薄膜組件或防塵薄膜組件收納容器的形狀適當設定之。基本上,只要達到即使輸送中的振動或衝撃讓防塵薄膜組件框架移動,也能夠確實地確保粘接劑層與防塵薄膜組件收納容器的托盤以及防塵薄膜組件框架支持體之間的間隙即可。當防塵薄膜組件框架支持體設置在托盤的周圍方向上的一部分時,防塵薄膜組件框架支持體的個數並無特別限定,然而為了穩定支持防塵薄膜組件,防塵薄膜組件框架支持體宜設置3個以上,尤其設置4個以上更好。In addition, although FIG. 1 exemplifies an embodiment in which eight truncated cone-shaped pellicle frame support members are provided, the position, number, and shape of the pellicle frame support may be based on the contained pellicle assembly or dustproof. The shape of the film component storage container is appropriately set. Basically, the gap between the adhesive layer and the tray of the pellicle container storage container and the pellicle frame support can be surely ensured even if the vibration or the squeezing during transportation causes the pellicle frame to move. When the pellicle frame support is disposed in a portion of the periphery of the tray, the number of the pellicle frame support is not particularly limited. However, in order to stably support the pellicle assembly, the pellicle frame support should be set to three. Above, it is more preferable to set 4 or more.
防塵薄膜組件框架的粘接劑塗佈端面的未塗佈粘接劑的未塗佈區域接觸並載置在防塵薄膜組件框架支持體上。在圖1中,僅在防塵薄膜組件框架11的粘接劑塗佈端面的內周側設置粘接劑層13,圓錐台狀的防塵薄膜組件框架支持體3的頂面,與防塵薄膜組件框架11的粘接劑塗佈端面的未塗佈粘接劑的未塗佈區域a接觸,防塵薄膜組件受到支持,此時,粘接劑層13與防塵薄膜組件框架支持體3並未接觸。The uncoated region of the uncoated adhesive of the adhesive-coated end face of the pellicle frame is brought into contact with and placed on the pellicle frame support. In Fig. 1, an adhesive layer 13, an upper surface of a truncated cone-shaped pellicle frame support 3, and a pellicle frame are provided only on the inner peripheral side of the adhesive-coated end face of the pellicle frame 11 The uncoated region a of the uncoated adhesive of the adhesive-coated end face of the 11 is contacted, and the pellicle is supported. At this time, the adhesive layer 13 is not in contact with the pellicle frame support 3 .
另外,在本發明的防塵薄膜組件收納容器的托盤上,設有將防塵薄膜組件框架固定在防塵薄膜組件框架支持體上的保持機構。該保持機構,可使用例如夾持框架側面或薄膜接合層側端面的保持機構等,特別宜使用將銷插入設置在防塵薄膜組件框架側面的非貫通孔以固定防塵薄膜組件框架的保持機構。Further, in the tray of the pellicle container storage container of the present invention, a holding mechanism for fixing the pellicle frame to the pellicle frame support is provided. For the holding mechanism, for example, a holding mechanism for holding the side surface of the frame or the end surface of the film joining layer side, etc., it is particularly preferable to use a retaining mechanism for inserting a pin into a non-through hole provided on the side surface of the pellicle frame to fix the pellicle frame.
圖1所示的防塵薄膜組件1在從防塵薄膜組件框架11的周圍面(在圖1中係從外周圍面開始形成,惟從內周圍面開始也是可以)向防塵薄膜組件框架11內部的水平方向設置了既定個數(在 圖1中,於防塵薄膜組件框架11的角落部合計共4個)的非貫通孔11a,該既定個數係對應保持機構4的銷41的數量,用來固定後述防塵薄膜組件框架11的保持機構4的銷41可插入該非貫通孔11a。The pellicle assembly 1 shown in Fig. 1 is horizontally formed from the peripheral surface of the pellicle frame 11 (formed from the outer peripheral surface in Fig. 1, but also from the inner peripheral surface) toward the inside of the pellicle frame 11. The direction is set to a predetermined number (in In Fig. 1, a total of four non-through holes 11a are formed in the corner portions of the pellicle frame 11, and the predetermined number corresponds to the number of the pins 41 of the holding mechanism 4 for fixing the holding of the pellicle frame 11 to be described later. The pin 41 of the mechanism 4 can be inserted into the non-through hole 11a.
另一方面,在托盤21上,於對應非貫通孔11a的位置(在圖1中,係堤台部211上的4個位置)上,設置具備銷41的保持機構4。藉此,便能夠防止於運送防塵薄膜組件的途中防塵薄膜組件在防塵薄膜組件收納容器內移動。圖1係表示防塵薄膜組件1被保持機構4固定在防塵薄膜組件收納容器內的狀態。銷41可在非貫通孔11a內進退,將防塵薄膜組件框架11載置於防塵薄膜組件框架支持體3上,將銷41插入非貫通孔11a,藉此把防塵薄膜組件框架11固定在防塵薄膜組件框架支持體3上,從非貫通孔11a拔出銷41,便能夠從保持機構4放開防塵薄膜組件1。另外,宜在保持機構的銷的前端,設置橡膠等的彈性體,藉此,便能夠讓固定情況更穩定。On the other hand, on the tray 21, a holding mechanism 4 including a pin 41 is provided at a position corresponding to the non-through hole 11a (four positions on the bank portion 211 in Fig. 1). Thereby, it is possible to prevent the pellicle film assembly from moving in the pellicle pack container in the middle of transporting the pellicle. Fig. 1 shows a state in which the pellicle film assembly 1 is fixed in the pellicle assembly container by the holding mechanism 4. The pin 41 can be advanced and retracted in the non-through hole 11a, and the pellicle frame 11 is placed on the pellicle frame support 3, and the pin 41 is inserted into the non-through hole 11a, thereby fixing the pellicle frame 11 to the pellicle. The pellicle assembly 1 can be released from the holding mechanism 4 by pulling out the pin 41 from the non-through hole 11a in the module frame support 3. Further, it is preferable to provide an elastic body such as rubber at the tip end of the pin of the holding mechanism, whereby the fixation can be made more stable.
本發明的防塵薄膜組件收納容器的防塵薄膜組件框架支持體,係由基體部以及與防塵薄膜組件框架接觸的緩衝部所構成的。而且,基體部以及緩衝部二者硬度不同,接合成一接合體。圖2係圖1所示之防塵薄膜組件收納容器2的防塵薄膜組件框架支持體3的放大縱剖面圖,此時,圓錐台狀的防塵薄膜組件框架支持體3的下部(托盤21側)係基體部31,上部(亦即與防塵薄膜組件框架11接觸該側)係緩衝部32。防塵薄膜組件框架支持體的基體部宜比緩衝部更硬。The pellicle frame support of the pellicle assembly container of the present invention is composed of a base portion and a buffer portion that is in contact with the pellicle frame. Further, the base portion and the buffer portion have different hardnesses and are joined into a joint body. Fig. 2 is an enlarged longitudinal sectional view showing the pellicle frame support 3 of the pellicle assembly container 2 shown in Fig. 1. At this time, the lower portion (the tray 21 side) of the frustum-shaped pellicle frame support 3 is The base portion 31 and the upper portion (that is, the side in contact with the pellicle frame 11) are the buffer portions 32. The base portion of the pellicle frame support is preferably harder than the buffer portion.
基體部,亦可與托盤形成一體,惟若考慮到配合防塵薄膜組件的大小或形狀調整防塵薄膜組件框架支持體的位置此點的話,仍宜設置成有別於托盤的獨立構件。此時,基體部31與托盤21的接合必須利用固定螺栓等構件確實地固定,故基體部31宜使用具備足夠硬度、強度的材料來構成,例如,工程塑膠。工程塑膠的材質,只要使用不易產生塵屑,可對表面實施平滑加工的材質即可,例如可使用ABS(丙烯腈-丁二烯-苯二烯共聚物)、PC(聚 碳酸酯)、PI(聚醯亞胺)、PA(聚醯胺)、PBT(聚丁烯對苯二甲酸酯)、PPS(聚苯硫醚)、PEEK(聚醚醚酮)、POM(聚氧化甲烯)、SPS(對位性聚苯乙烯)等材質。The base portion may also be integrally formed with the tray. However, if the position of the pellicle frame support is adjusted in consideration of the size or shape of the pellicle, it is preferable to provide a separate member different from the tray. At this time, the joining of the base portion 31 and the tray 21 must be reliably fixed by a member such as a fixing bolt. Therefore, the base portion 31 is preferably made of a material having sufficient hardness and strength, for example, an engineering plastic. The material of the engineering plastic can be a material that can be smoothly processed on the surface as long as it is not easy to generate dust. For example, ABS (acrylonitrile-butadiene-benzenediene copolymer) or PC (poly) can be used. Carbonate), PI (polyimide), PA (polyamine), PBT (polybutylene terephthalate), PPS (polyphenylene sulfide), PEEK (polyetheretherketone), POM ( Polyoxymethylene), SPS (coordinate polystyrene) and other materials.
另一方面,由於緩衝部必須能夠吸收或緩衝防塵薄膜組件框架的振動或衝撃,故宜為橡膠或合成橡膠。橡膠或合成橡膠的材質只要是能夠對其表面實施平滑加工的材質即可,可使用例如:NBR(丁腈橡膠)、IR(聚異戊二烯橡膠)、EPDM(乙丙三元橡膠)、CR(氯丁二烯橡膠)、Q(矽氧橡膠)、SBR(苯乙烯丁二烯橡膠)、BR(丁二烯橡膠)、FKM(氟橡膠)、IIR(丁基橡膠)等橡膠、PS(聚苯乙烯)系、PE(聚乙烯)系、PP(聚丙烯)系等合成橡膠[PS、PE、PP與PB(聚丁二烯)的共聚物]等材質。On the other hand, since the buffer portion must be capable of absorbing or buffering the vibration or punching of the pellicle frame, it is preferably rubber or synthetic rubber. The material of the rubber or the synthetic rubber may be any material that can smooth the surface thereof, and examples thereof include NBR (nitrile rubber), IR (polyisoprene rubber), and EPDM (ethylene propylene triene rubber). Rubber such as CR (chloroprene rubber), Q (oxygen rubber), SBR (styrene butadiene rubber), BR (butadiene rubber), FKM (fluororubber), IIR (butyl rubber), PS (Polystyrene), PE (polyethylene), PP (polypropylene) or other synthetic rubber [PS, PE, PP and PB (polybutadiene) copolymer] and other materials.
緩衝部所使用的橡膠或合成橡膠,其硬度以橡膠硬度計TYPE A量測宜在10以上80以下,更宜在10以上60以下。若硬度以橡膠硬度計TYPE A量測低於10的話,緩衝部會無法支持防塵薄膜組件框架而崩潰,而且可能會因為太軟而難以加工。另外,若硬度高於80的話,緩衝部會太硬而無法吸收或緩衝防塵薄膜組件框架的振動或衝撃。The rubber or synthetic rubber used in the cushioning portion preferably has a hardness of 10 or more and 80 or less, more preferably 10 or more and 60 or less, based on the rubber hardness meter TYPE A. If the hardness is less than 10 by the rubber hardness meter TYPE A, the buffer portion may not support the pellicle frame collapse and may be too soft to be processed. In addition, if the hardness is higher than 80, the buffer portion may be too hard to absorb or buffer the vibration or the punch of the pellicle frame.
為了對該等工程塑膠賦予靜電防止功能,亦可在橡膠以及合成橡膠內摻合界面活性劑、碳、金屬或金屬氧化物等物質。藉此,便能夠防止防塵薄膜組件於輸送中或從防塵薄膜組件收納容器取出時帶靜電,進而降低發生靜電造成異物附著或在防塵薄膜組件貼合時破壞光罩圖案的危險。In order to impart an antistatic function to the engineering plastics, a surfactant, carbon, metal or metal oxide may be blended in the rubber and the synthetic rubber. Thereby, it is possible to prevent the pellicle film from being electrostatically charged during transportation or when it is taken out from the pellicle container storage container, thereby reducing the risk of foreign matter adhering due to static electricity or damaging the mask pattern when the pellicle is attached.
再者,防塵薄膜組件框架支持體的基體部與緩衝部的接合,可使用雙面膠帶、接合劑或粘接劑等,惟宜利用異材成型方式一體成型比較好。雙面膠帶係以配合基體部與緩衝部的接合面的方式切斷,故有時會很難貼合,接合劑或粘接劑在硬化時有時會產生氣體,或溢出接合面之外。另外,這些步驟是非常精細的步驟,因此很花時間。相對於此,若以異材成型的方式製作成型,便能夠在模具內成型時將基體部與緩衝部製作成一體成型的構件,故製作時間較短,且製作起來比較容易。Further, the bonding between the base portion of the pellicle frame support and the buffer portion can be carried out by using a double-sided tape, a bonding agent, an adhesive or the like, and it is preferable to integrally form the molding by a different material molding method. Since the double-sided tape is cut so as to match the joint surface of the base portion and the buffer portion, it may be difficult to bond the adhesive tape or the adhesive, and the adhesive or the adhesive may generate gas or may overflow the joint surface. In addition, these steps are very elaborate steps and therefore take a lot of time. On the other hand, when molding is performed by molding a different material, the base portion and the buffer portion can be integrally molded at the time of molding in the mold, so that the production time is short and the production is relatively easy.
若使用本發明的防塵薄膜組件收納容器,便能夠在粘接劑層不會接觸到托盤的情況下將防塵薄膜組件收納、固定、保持於防塵薄膜組件收納容器內。因此,便無須設置隔離部保護粘接劑層,而能夠省略使用隔離部。另外,由於欲確保係使用沒有接縫、摺痕等瑕疵的整片原料片材作為隔離部並不容易,故本發明的防塵薄膜組件收納容器特別適合用來當作收納至少一邊邊長在500mm以上,特別是1000mm以上,尤其是1500mm以上的大型防塵薄膜組件的容器。According to the pellicle assembly container of the present invention, the pellicle can be housed, fixed, and held in the pellicle container storage container without the adhesive layer contacting the tray. Therefore, it is not necessary to provide the partition protecting the adhesive layer, and the use of the partition can be omitted. In addition, since it is not easy to ensure that a whole raw material sheet having no seams, creases, or the like is used as the partition portion, the dustproof film unit storage container of the present invention is particularly suitable for use as a storage body with at least one side length of 500 mm. Above, in particular, a container of a large pellicle assembly of 1000 mm or more, especially 1500 mm or more.
以下,揭示實施例以及比較例以具體說明本發明,惟本發明並非以下述實施例為限。Hereinafter, the present invention will be specifically described by way of examples and comparative examples, but the invention is not limited to the following examples.
製作如圖3所示的防塵薄膜組件1。亦即,利用機械加工將5000系鋁合金切削成長邊外部尺寸1600mm、短邊外部尺寸1500mm、高度5.8mm、寬度13mm的防塵薄膜組件框架11,並對其表面實施黑色氧皮鋁處理。在該防塵薄膜組件框架11的外側面的4個既定位置,設置保持機構4的銷41可插入的非貫通孔11a。將該防塵薄膜組件框架用純水洗淨,待其乾燥後,以垂直3軸分注器塗佈用甲苯稀釋過的矽氧粘接劑(信越化學工業股份有限公司製,產品名:X-40-3122)作為粘接劑層13。又,粘接劑層13的剖面形狀為寬度4mm、高度1.5mm的半圓形。此時,防塵薄膜組件框架的寬度為13mm,由於在其內側的4mm設置粘接劑層,故其外側是寬度9mm的未塗佈區域a。A pellicle assembly 1 as shown in Fig. 3 was produced. That is, the 5000 series aluminum alloy was cut into a pellicle frame 11 having an outer dimension of 1600 mm, a short outer dimension of 1500 mm, a height of 5.8 mm, and a width of 13 mm by mechanical processing, and the surface was subjected to black oxygen aluminum treatment. At four predetermined positions on the outer side surface of the pellicle frame 11, a non-through hole 11a into which the pin 41 of the holding mechanism 4 can be inserted is provided. The pellicle frame was washed with pure water, and after drying, a tantalum-adhesive diluted with toluene was applied by a vertical 3-axis dispenser (manufactured by Shin-Etsu Chemical Co., Ltd., product name: X- 40-3122) as the adhesive layer 13. Further, the cross-sectional shape of the adhesive layer 13 is a semicircle having a width of 4 mm and a height of 1.5 mm. At this time, the width of the pellicle frame was 13 mm, and since the adhesive layer was provided at 4 mm inside, the outer side was an uncoated region a having a width of 9 mm.
再者,用甲苯稀釋矽氧粘接劑(信越化學工業股份有限公司製,產品名:KR-3700)作為防塵薄膜接合劑層(未經圖示),將其塗佈在粘接劑塗佈端面的相反面,使其乾燥後的厚度為0.1mm,然後,加熱到130℃使其硬化。防塵薄膜12,係在表面研磨得很平滑的1600mm×1700mm的矩形石英基板上用模塗法塗佈氟樹脂(旭硝子股份有限公司製,產品名:Cytop),待溶媒乾燥後,將其從石英基板撕下,製得厚度4μm的防塵薄膜。然後,將 該防塵薄膜12貼合於防塵薄膜接合劑層上,用切割器切除掉外側的不需要的部分,完成防塵薄膜組件1。Further, a helium-oxygen adhesive (manufactured by Shin-Etsu Chemical Co., Ltd., product name: KR-3700) was diluted with toluene as a dust-proof film adhesive layer (not shown), and applied to a pressure-sensitive adhesive. The opposite side of the end face was dried to a thickness of 0.1 mm, and then heated to 130 ° C to harden it. The pellicle film 12 is coated with a fluororesin (manufactured by Asahi Glass Co., Ltd., product name: Cytop) on a rectangular quartz substrate of 1600 mm × 1700 mm whose surface is polished very smoothly. After the solvent is dried, it is removed from the quartz. The substrate was peeled off to obtain a dust-proof film having a thickness of 4 μm. followed by The pellicle film 12 is attached to the pellicle bonding agent layer, and the unnecessary portion on the outside is cut off by a cutter to complete the pellicle film assembly 1.
另外,利用真空成型法將厚度5mm的黑色防靜電ABS樹脂(TORAY股份有限公司製,產品名:Toyolacparel)製作成如圖1所示的防塵薄膜組件收納容器2的托盤21。另外,同樣地,利用真空成型法將厚度5mm的黑色防靜電ABS樹脂(TORAY股份有限公司製,產品名:Toyolacparel)製作成防塵薄膜組件收納容器2的蓋部22。調整保持機構4的位置,使保持機構4的銷41與設置在防塵薄膜組件框架11上的非貫通孔11a嵌合,然後將保持機構4接合固定在防塵薄膜組件收納容器托盤21上,該銷41係使用ABS樹脂以射出成型方式所製得的構件。In addition, a black antistatic ABS resin (manufactured by TORAY Co., Ltd., product name: Toyolacparel) having a thickness of 5 mm was formed into a tray 21 of the pellicle assembly container 2 shown in Fig. 1 by a vacuum molding method. In the same manner, a black antistatic ABS resin (product name: Toyolacparel, manufactured by Toray Co., Ltd.) having a thickness of 5 mm was produced into a lid portion 22 of the pellicle assembly container 2 by a vacuum molding method. The position of the holding mechanism 4 is adjusted such that the pin 41 of the holding mechanism 4 is fitted into the non-through hole 11a provided in the pellicle frame 11, and then the holding mechanism 4 is joined and fixed to the pellicle container storage container tray 21, the pin 41 is a member obtained by injection molding using ABS resin.
然後更進一步在防塵薄膜組件收納容器2的托盤21的8個位置上,以只接觸防塵薄膜組件框架11的粘接劑的未塗佈區域a的方式,設置防塵薄膜組件框架支持體3。防塵薄膜組件框架支持體3,係將由ABS樹脂所構成的基體部31,以及由PS-(PE/PP/PB)共聚物(KURARAY PLASTICS股份有限公司製,產品名:Septon KC-596,硬度:用橡膠硬度計TYPE A量測為40)所構成的防塵薄膜組件框架緩衝部32,以異材成型方式製作成一體成型的接合體,可安裝在托盤21上。在異材成型時模具溫度保持在40℃,將成型機的缸筒溫度加熱到190℃,進行成型。Further, the pellicle frame support 3 is placed at eight positions of the tray 21 of the pellicle container storage container 2 so as to contact only the uncoated region a of the adhesive of the pellicle frame 11. The pellicle frame support 3 is a base portion 31 made of ABS resin, and a PS-(PE/PP/PB) copolymer (manufactured by KURARAY PLASTICS Co., Ltd., product name: Septon KC-596, hardness: The pellicle frame cushioning portion 32, which is formed by measuring 40) of the rubber hardness meter TYPE A, is integrally molded by a dissimilar material molding method, and can be attached to the tray 21. The mold temperature was maintained at 40 ° C during the molding of the different materials, and the cylinder temperature of the molding machine was heated to 190 ° C to carry out molding.
將該防塵薄膜組件收納容器2在無塵室內用純水洗淨,待其乾燥後,以只接觸防塵薄膜組件框架11的粘接劑的未塗佈區域a的方式載置防塵薄膜組件框架支持體3,用保持機構4固定防塵薄膜組件,將防塵薄膜組件1收納於防塵薄膜組件收納容器2內。The pellicle container storage container 2 is washed with pure water in a clean room, and after drying, the pellicle frame support is placed so as to contact the uncoated region a of the adhesive of the pellicle frame 11 only. In the body 3, the pellicle assembly is fixed by the holding mechanism 4, and the pellicle assembly 1 is housed in the pellicle assembly container 2.
防塵薄膜組件框架支持體的基體部使用聚碳酸酯,緩衝部使用矽氧橡膠(信越化學工業股份有限公司製,產品名:KE-1950-10,硬度:用橡膠硬度計TYPEA量測為10),以異材成型方式成型,除此之外,以跟實施例1同樣的方式製作防塵薄膜組件收納容器,將防塵薄膜組件固定、收納之。The base of the pellicle frame support is made of polycarbonate, and the cushioning part is made of silicone rubber (manufactured by Shin-Etsu Chemical Co., Ltd., product name: KE-1950-10, hardness: 10 measured by rubber hardness meter TYPEA) A pellicle assembly container was produced in the same manner as in Example 1 except that the pellicle was molded, and the pellicle was fixed and housed.
防塵薄膜組件框架支持體的基體部使用ABS,緩衝部使用PS-(PE/PP/PB)共聚物(KURARAY PLASTICS股份有限公司製,產品名:Septon KC-623,硬度:用橡膠硬度計TYPE A量測為80),以異材成型方式成型,除此之外,以跟實施例1同樣的方式製作防塵薄膜組件收納容器,將防塵薄膜組件固定、收納之。ABS is used for the base of the pellicle frame support, and PS-(PE/PP/PB) copolymer is used for the buffer (KURARAY PLASTICS CO., LTD., product name: Septon KC-623, hardness: rubber hardness meter TYPE A A pellicle assembly container was produced in the same manner as in Example 1 except that the measurement was carried out by a dissimilar material molding method, and the pellicle assembly was fixed and housed.
防塵薄膜組件框架支持體的基體部使用ABS,緩衝部使用矽氧膠(信越化學工業股份有限公司製,產品名:KE-1052A/B,硬度:用橡膠硬度計TYPE A量測在1以下,用ASKER C量測為10),以異材成型方式成型,除此之外,以跟實施例1同樣的方式製作防塵薄膜組件收納容器,將防塵薄膜組件固定、收納之。ABS is used for the base of the pellicle frame support, and a silicone rubber is used for the buffer (manufactured by Shin-Etsu Chemical Co., Ltd., product name: KE-1052A/B, hardness: 1 or less with a rubber hardness meter TYPE A, A dust-proof film module storage container was produced in the same manner as in Example 1 except that the ASKER C was measured to have a size of 10), and the pellicle film assembly was fixed and stored.
防塵薄膜組件框架支持體的基體部使用ABS,緩衝部使用矽氧橡膠(信越化學工業股份有限公司製,產品名:KER-2667,硬度:用橡膠硬度計TYPE A量測在90以上,用SHORE D量測為70),以異材成型方式成型,除此之外,以跟實施例1同樣的方式製作防塵薄膜組件收納容器,將防塵薄膜組件固定、收納之。ABS is used for the base of the pellicle frame support, and silicone rubber is used for the buffer (manufactured by Shin-Etsu Chemical Co., Ltd., product name: KER-2667, hardness: 90 or more with rubber hardness meter TYPE A, with SHORE A dust-proof film module storage container was produced in the same manner as in Example 1 except that the amount of D was measured to be 70%, and the pellicle film assembly was fixed and stored.
對實施例1~3以及比較例1、2所製作的防塵薄膜組件收納容器進行評價。評價方法如下。結果顯示於表1。The pellicle container storage containers produced in Examples 1 to 3 and Comparative Examples 1 and 2 were evaluated. The evaluation method is as follows. The results are shown in Table 1.
評價項目1(防塵薄膜組件保持性):以目視確認將防塵薄膜組件收納於防塵薄膜組件收納容器時防塵薄膜組件框架支持體對防塵薄膜組件(防塵薄膜組件框架)的保持性。Evaluation item 1 (pneumatic film module retention): The retention of the pellicle frame support to the pellicle assembly (pneumatic membrane module frame) when the pellicle assembly was housed in the pellicle assembly container was visually confirmed.
評價項目2(異物的附著狀況):將收納著防塵薄膜組件的防塵薄膜組件收納容器垂直立起,維持1分鐘之後,回復水平,進行這樣的動作共3次,以目視確認防塵薄膜、防塵薄膜組件框架的異物附著狀況。Evaluation item 2 (adhesion of foreign matter): The pellicle film storage container in which the pellicle is housed is vertically erected, and after maintaining for one minute, the level is restored, and the operation is performed three times in total to visually confirm the pellicle film and the pellicle film. The foreign matter attachment condition of the component frame.
[表1]
1‧‧‧防塵薄膜組件1‧‧‧Plastic membrane assembly
11‧‧‧防塵薄膜組件框架11‧‧‧Plastic membrane assembly frame
11a‧‧‧非貫通孔11a‧‧‧non-through holes
12‧‧‧防塵薄膜12‧‧‧Dust film
13‧‧‧粘接劑(粘接劑層)13‧‧‧Adhesive (adhesive layer)
2‧‧‧防塵薄膜組件收納容器2‧‧‧Plastic membrane assembly storage container
21‧‧‧托盤21‧‧‧Tray
211‧‧‧堤台部211‧‧‧Department
22‧‧‧蓋部22‧‧‧ 盖部
3‧‧‧防塵薄膜組件框架支持體3‧‧‧Plastic membrane module frame support
31‧‧‧基體部31‧‧‧ Base Department
32‧‧‧緩衝部32‧‧‧ buffer
4‧‧‧保持機構4‧‧‧ Keeping institutions
41‧‧‧銷41‧‧ ‧ sales
a‧‧‧粘接劑的未塗佈區域a‧‧‧Uncoated area of adhesive
A-A’‧‧‧線段A-A’‧‧‧ segment
B-B’‧‧‧線段B-B’‧‧‧ segment
C‧‧‧包圍部分C‧‧‧ bracketing
D-D’‧‧‧線段D-D’‧‧‧ segment
圖1表示本發明的防塵薄膜組件收納容器的一個實施形態,其表示在防塵薄膜組件收納容器內收納防塵薄膜組件的狀態圖,(A)為俯視圖,(B)為沿著(A)的A-A’線段的剖面圖,(C)為沿著(A)的B-B’線段的剖面圖,(D)為(B)中C所包圍部分的放大圖,(E)為蓋部打開狀態的俯視圖。Fig. 1 is a view showing a state in which a pellicle assembly is housed in a pellicle assembly container, in which a (A) is a plan view and (B) is an A along (A). a cross-sectional view of the -A' line segment, (C) is a cross-sectional view along the B-B' line segment of (A), (D) is an enlarged view of the portion enclosed by C in (B), and (E) is the cover portion opened. Top view of the state.
圖2表示本發明的防塵薄膜組件框架支持體的一個實施形態的縱剖面圖。Fig. 2 is a longitudinal sectional view showing an embodiment of a pellicle frame support according to the present invention.
圖3表示在實施例中所使用的防塵薄膜組件,(A)為從粘接劑塗佈端面側觀察的仰視圖,(B)為沿著(A)的D-D’線段的剖面圖。Fig. 3 shows a pellicle film assembly used in the embodiment, (A) is a bottom view seen from the side of the adhesive coated end face, and (B) is a cross-sectional view taken along line D-D' of (A).
1...防塵薄膜組件1. . . Dust-proof film assembly
11...防塵薄膜組件框架11. . . Dust-proof film assembly frame
11a...非貫通孔11a. . . Non-through hole
12...防塵薄膜12. . . Dust film
13...粘接劑(粘接劑層)13. . . Adhesive (adhesive layer)
2...防塵薄膜組件收納容器2. . . Dust-proof film assembly storage container
21...托盤twenty one. . . tray
211...堤台部211. . . Embankment
22...蓋部twenty two. . . Cover
3...防塵薄膜組件框架支持體3. . . PSA module frame support
31...基體部31. . . Base body
32...緩衝部32. . . Buffer section
4...保持機構4. . . Holding mechanism
41...銷41. . . pin
a...粘接劑的未塗佈區域a. . . Uncoated area of adhesive
A-A’...線段A-A’. . . Line segment
B-B’...線段B-B’. . . Line segment
C...包圍部分C. . . Enveloping part
Claims (4)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009183033A JP2011034020A (en) | 2009-08-06 | 2009-08-06 | Pellicle storage container |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201105555A TW201105555A (en) | 2011-02-16 |
TWI388475B true TWI388475B (en) | 2013-03-11 |
Family
ID=43763126
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW099124595A TWI388475B (en) | 2009-08-06 | 2010-07-26 | Pellicle container |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP2011034020A (en) |
KR (1) | KR20110014951A (en) |
CN (1) | CN101995764B (en) |
HK (1) | HK1153825A1 (en) |
TW (1) | TWI388475B (en) |
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JP2011095586A (en) * | 2009-10-30 | 2011-05-12 | Shin-Etsu Chemical Co Ltd | Pellicle and method of manufacturing the same |
JP5586560B2 (en) * | 2011-10-28 | 2014-09-10 | 信越化学工業株式会社 | Pellicle container |
JP5586559B2 (en) * | 2011-10-28 | 2014-09-10 | 信越化学工業株式会社 | Pellicle container |
JP2014009020A (en) * | 2012-06-29 | 2014-01-20 | Sekisui Plastics Co Ltd | Packaging material and packaging body |
JP6382298B2 (en) * | 2013-03-27 | 2018-08-29 | エーエスエムエル ネザーランズ ビー.ブイ. | Lithographic apparatus |
JP5984187B2 (en) * | 2013-04-22 | 2016-09-06 | 信越化学工業株式会社 | Pellicle and photomask assembly |
CN103449025A (en) * | 2013-09-10 | 2013-12-18 | 昆山市巴城镇顺拓工程机械配件厂 | Tray fixing clamp for semiconductor component |
JP6320309B2 (en) | 2015-01-19 | 2018-05-09 | 信越化学工業株式会社 | Pellicle storage container |
JP2016151633A (en) * | 2015-02-17 | 2016-08-22 | 信越化学工業株式会社 | Pellicle-housing container |
JP6275067B2 (en) * | 2015-02-24 | 2018-02-07 | 信越化学工業株式会社 | Pellicle storage container |
JP6351178B2 (en) * | 2015-07-13 | 2018-07-04 | 信越化学工業株式会社 | Pellicle storage container and pellicle removal method |
KR20180094084A (en) | 2015-12-14 | 2018-08-22 | 에이에스엠엘 네델란즈 비.브이. | Membranes for EUV lithography |
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JP6604651B2 (en) * | 2016-02-22 | 2019-11-13 | 信越化学工業株式会社 | Pellicle storage container |
JP6357218B2 (en) * | 2016-12-28 | 2018-07-11 | 積水化成品工業株式会社 | Packing material and package |
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-
2009
- 2009-08-06 JP JP2009183033A patent/JP2011034020A/en active Pending
-
2010
- 2010-05-17 KR KR1020100045920A patent/KR20110014951A/en not_active Application Discontinuation
- 2010-07-21 CN CN2010102350162A patent/CN101995764B/en not_active Expired - Fee Related
- 2010-07-26 TW TW099124595A patent/TWI388475B/en active
-
2011
- 2011-07-29 HK HK11107875.2A patent/HK1153825A1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
HK1153825A1 (en) | 2012-04-05 |
CN101995764A (en) | 2011-03-30 |
TW201105555A (en) | 2011-02-16 |
KR20110014951A (en) | 2011-02-14 |
CN101995764B (en) | 2013-01-23 |
JP2011034020A (en) | 2011-02-17 |
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