1356467 九、發明說明： 【發明所屬之技術領域】 “本發日月侧於-種浮升輪送式基板處 慝理基板在平台上浮起，—面产水 ，^ 一面使矩形之被 施既定處理，尤關於可實現輪‘丄彳其f送，並在基板上實 裝置。 心機構―化•域本化之基板處理 【先前技術】 近年來於用以製造平面孽示哭β 以塗布光阻於被處理基板（坡璃& 域中，用 漸浮升輪送式技術。 ）上之先阻塗布裝置，採取 '採升輸送式技術之習知光阻塗布 揭不，藉由以氣體壓力使矩形之被處理 】如專利文獻1所 之浮升式平台形成浮升輪送道，並且作2玻璃基板）浮起 在平台上之基板移動之輸送機構包含：’、、 、·夕動之方式使漂浮 一對導執’配置於平台左右兩側； 左右-對滑件’沿此科軌平行直進移動； 板左右兩邊i;、及式吸附塾以—疋間隔以可離合之方式吸附在基 板片彈簧等連結部材，分別使此等左 介 於左右滑件，且跟隨基赌升高度上下移3。m式吸附塾連結 【專利文獻1】日本特開平2〇〇5 — 244】π 【發明内容】 55 發明所欲解決的誤顥 習知之浮升輸送式基板處理裝置之輪 f軌、滑件、真空式_墊等，耻變得上=二需一具 特別是在光微影製程中，於塗布製程、 裝i成本非吊向。 其之間作為輔助製程而進行熱處理之供烤心=丽後或 本之浮升輪送機構之出現。.、㈣—’期待簡易且低成 1356467 鑒·於如上述習知技術之問題點，本發明之目的在於提供一種基 板處理裝置，可以簡易、低成本之構成進行浮升輪送式之基板處理。 里來解決問顳的方式 為達成上述目的，本發明之第1基板處理裝置，係一浮升輸送 式基板處理裝置，藉由氣體壓力使矩形之被處理基板在沿大致水平 之既定輸送方向延伸之平台上浮起之狀態沿該輸送方向輪送，並以 沿該平台配置之處理部對該基板供給既定之液體、氣體、 以實施既定處理； …、 a.於該平台兩側以既定間距配置多個側滾輪成一列.，俾使在該平 兩侧端部搭載於滾輪外周面頂部，旋轉驅動^側 --上述構成中’藉由侧滾輪之旋轉運動’將浮 其上接f傳送-面以水平移動之方式沿輸送方向i動。i理 況下，在平台頂面與側滾輪接近之端部設置吸人周圍氣體 之猎由σί人口賦予基板向下之抽吸力以提高基板與側』 ϋϊ ’亦可以橡膠形成侧滾輪之滾輪外周面 蘇，.=之弟2基板處理裝置，係—浮升輸送絲板處理Κ， 错由軋體壓力使矩形之被處理基板在沿大致水平之 ς ϊίίΐΐΓί之狀態沿該輸送方向輸送，並以沿該 體、氣體、錢熱，以實施既定ίί 〜土板在該平。上以朝與該輪送方向如 ， 之既定:歧傾斜之姿態浮起； 方向以姆於水平面 於該浮升平台之一側以既定間距配置多個 =上浮㈣基板較低-邊之邊緣力⑶㈡:俾使 周面且疑轉驅動該侧滾輪以輪送該基板。 β σ之;衰1356467 IX. Description of the invention: [Technical field to which the invention pertains] "The surface of the substrate is floated on the platform at the side of the floating-up substrate, and the surface is water-producing. Processing, in particular, can realize the wheel's transmission, and the actual device on the substrate. The core mechanism---domain-based substrate processing [prior art] In recent years, it has been used to make a plane to show crying β to coat light. Blocking the substrate on the substrate to be processed (in the slope & field, using the progressively rising wheel-feeding technology.) The first-resistance coating device adopts the conventional photoresist coating technique of picking and transporting technology, which is made by gas pressure. The processing of the rectangle is as follows: the floating platform of the patent document 1 forms a floating wheel, and the substrate for moving the substrate on the platform is: 2,, and The floating pair of guides are disposed on the left and right sides of the platform; the left and right-sliding members move in parallel along the track; the left and right sides of the plate are i; and the adsorption 塾 is adsorbed on the substrate in a detachable manner Joint member such as leaf spring The left side is left and right sliders, respectively, and the base gambling height is shifted up and down by 3. m type adsorption 塾 connection [Patent Document 1] Japanese Patent Laid-Open No. 2-5-244] π [Summary] 55 Invention The misunderstanding of the conventional floating substrate processing device, the wheel f rail, the sliding member, the vacuum type _ pad, etc., the shame becomes up=two, especially in the photolithography process, in the coating process, loading i costs are not hoisted. The heat treatment is used as an auxiliary process for the baking heart = the appearance of Lishou or the floating lifting mechanism.., (4) - 'Looking for simplicity and low into 1356467 It is an object of the present invention to provide a substrate processing apparatus which can perform a substrate processing of a floating wheel type in a simple and low-cost configuration. The method for solving the problem is to achieve the above object. A substrate processing apparatus is a floating transport type substrate processing apparatus which rotates a rectangular processed substrate in a direction of being floated on a platform extending substantially in a predetermined transport direction by gas pressure, and is carried along the transport direction. The processing unit of the platform is configured to supply a predetermined liquid and gas to the substrate to perform a predetermined process; a. arranging a plurality of side rollers in a row at a predetermined interval on both sides of the platform. Mounted on the top of the outer peripheral surface of the roller, the rotary drive side--in the above configuration, 'by the rotary motion of the side roller', the upper transfer f-transfer surface is moved horizontally in the transport direction i. At the end of the top surface of the platform and the side of the side roller, the surrounding gas is set by the σί population to give the substrate a downward suction force to increase the substrate and the side 』 'Also can form a roller on the outer peripheral surface of the roller. = Brother 2 substrate processing device, is the floating conveyor wire processing Κ, wrong by the rolling body pressure to make the rectangular substrate to be processed along the conveying direction in a state of substantially horizontal , ΐΐΓ ΐΐΓ ΐΐΓ ΐΐΓ ΐΐΓ ΐΐΓ ΐΐΓ ΐΐΓ ΐΐΓ ΐΐΓ ΐΐΓ ΐΐΓ ΐΐΓ ΐΐΓ Gas, money heat, to implement the established ίί ~ soil plate in the flat. The upward direction and the direction of the wheel are as follows: the attitude of the slanting inclination is raised; the direction is arranged at a predetermined distance on one side of the floating platform in the horizontal plane, and the edge of the lower-side edge of the lower (four) substrate is arranged at a predetermined interval. (3) (2): The peripheral surface is suspected to drive the side roller to rotate the substrate. σ
上述構成中，藉由側滾輪旋轉運動 A 下邊接替傳送於側滚輪，-面心平移=¾ 1356467 “ if明之第3基減理裝置係—浮升輸送絲板處縣置，蔡 力，形之被處理基板在沿大致水平之蚊輸送方向^ .部對;基2ί=ΐ送2輸;;並以沿該平台配置之處理 你二，液讀、光或熱，以實施既定處理. 平面成該輪送方向垂直之方向以相對於水 平台=======該 且驅動該無端皮帶以輸賴基板。外周面， 篇=，下邊以二 由老第4基板處理裝置係—浮讀送式基板處理f置，夢 基板在沿大致水平之既定iSL; 邱t宜Γ起狀該輸送方向輪送，並以沿該+么配班之卢理 .俾使與在該平台上浮板浮升， 载具自後推擠該基板以輸送該基板。 且Μ該第1子升 .上述構成中，浮升輸送驅動力直接及於注曰* .洋升載具間接及於基板。健想之—雜具，透過弟1 J坑狀或溝槽狀之凹部，使浮升用氣體自載具下方形 方喷射。且依另一適當之一態樣，使板面朝輪送方向斜上 升高度浮升，俾使與在平台上基S 弟2浮升载具在設定位置停止以停止輪送：·-邊 依本發明之基板處理裝置，蕻由 低成本之構成f現科輪送式之i域理域成及仙，可以簡易、 1J^0407 【實施方式】 ^了，照附圖説明本發明之適#實施形態。 —ΚΐΓ乍ίΐϊ用本發明之基板處理裝置之—構成例的塗布 之清洗、先阻塗布' 步=影;程中 在雜此錢而κι之外部曝絲置12内進行。 14與介面站（I/F)i8 (方向）兩端部配置找盒站（C/S) （C/S) 14 ’係系統1〇之g盒送入送出口，包含： 板之多以收納基 ’使基板G出入於此平台20上之。 以x、i达z 以1片為單位固持基板G之輸送臂22a，可 :G:。.車動作，可與鄰接之處理站（P/S) 16御j傳遞基板 ^站（P/S) 16巾:’各處理部沿處理 糸統長邊方向(X方向)延伸之平行且方向相反 14«^S^.ClyF) 1δ^ ^ ON PASS) 24 ^ •部3〇及第2熱性處理部32以此順序1置為28、塗布處理 輸送而接1，Λ入單元（IN PASS) 24自11盒站（0) 14之 動^、f 34接I ff理之基板G，㈣定作⑽其導人第1水平移 34依序設有準分子uv照射單元.ϋν) % 38° ^ ^ 5 卩早70 (C〇L) 42。塗布處理部30中，自上游侧依序設有光阻塗 •^兀（COT) 44及減壓乾燥單元（VD) 46。第2熱性處理部32中， 5〇。^則依ΐ設有預焕烤單元（—臓）必及冷卻草元（C0L) 之έ夂軒2 ^性處理部32下游側旁之第1水平移動輸送道34 將遞單元（PASS) 52。自此終點之傳遞單元（PASS) 52 .下游自介面站（I/F) 18側朝匣盒站(C/S) 14側之 CDEV^i ' ^ ，自上游侧沿第2水平移動輸送道64將顯秦單元 Si二T—臓）56、冷卻單元⑽）58、 動機才t ί片^ _輸送空間68 ’藉由未經圖吻 方向»叫雙梅^平承載編之穿梭裝置7G沿處理線 裝置72周圍配置有旋轉平△ ( : f輸基板G，於此輪送 C^S) 74 76 ° 傳遞基板時，用於轉換，係於與曝光裝置12 (TITLE^J.? ^ ^ ^ 動輸送道64。 （EE)等t接於弟2水平移 任-£盒C中取出Γ片站皮自平台2〇上之 /S) 16之處理以側的送入單元(IN _ 2:f=f : 1356467 ==元（IN PASS) 24將基板G移載或導入至第1水平移動輪送道 在清洗處理部26中，先藉由準分子UV/照射單元（E_仍 單元（SCR) 38依序對被導人至第1水平移動輸送道34之 =板_貫施紫外線清洗處理及擦磨清洗處理（步驟S2、s 二月，皁το (SCR) 38藉由對水平移動於水平移動輸送道34工 G貫?刷洗或吹洗自基板表面去除粒子狀讀污，其後施 土 5由取5用士空氣刀等使基板G乾燥。—旦結束擦磨清洗單元（SCR) 下處? ’基板G即直接沿第1水平移動輸送道34而 下以通過弟1熱性處理部28。 於第1熱性處理部28内，先在附著單元（AD) 4〇對美 —用狀醜之附著處理，以疏水化被處_)二 此附著處理後，在冷卻單元(c〇L) 亦沿第1水平移動輸送魏而下；ΐϊΐ: -狭缝中’先在光阻塗布單元（α)Τ) 44内藉由使用 〆理而布法以水平移動之方式對基板6在基板頂面(被 =搂奸阻液’然後馬上在下游側旁之減縣燥單元⑽） 之方式進行之常溫乾_理（步驟S6)。 通過第ί㈣^立30而出之基板G沿第1水平移動輸送道34而下 ㈣内接r棋烤“光二 之溶劑強:二= 使殘餘在基板G上光阻联中 水平移動輪送道34之板溫/ (步驟S8) .。^後自第1 面站（I/F) 18之輪送裝置72 f早7(PASS) 52將基板G交接給介 度之Ϊ二台74使基板G接受例如9Q .门遺裝且76之周邊曝光裝置（EE)，在此接受 1356467 用以在顯影時去除附著於基板G周邊部之光阻之曝亦’ .隔壁之#絲置12(步驟⑻。’ 將其送至 於曝光裝置12內使基板G上之光_光為既定 : 又，結束圖案曝光之基板G -旦自曝光裝置12回到介面站 76 ^TI^)' 水平移動輸送道64之顯影單元⑽）54起^。6處理線B側之第2 雌板G f娜、礙— •其搭之基板G，在維持 bb UP) e"t iiipr°r顧)56中使基板〇接受後烘烤以作為顯ίϊϊϊΐ Sr ^去除之，強化紐義對基板之㈣性。ΐΐ 寬檢查或膜質、膜厚檢轉。之植_之非接觸式線 制62接收自第2水平移動輪送道μ結束全 ίίίϊ 盒站（c/s) 14之輸送機構^ ' 收納於任一（通常係原來）之…内 水第1及第2 1356467 ，3顯示第丨水平移動輪送道34中浮升 於 1熱性處畴28之附著單元⑽4Q及冷卻㈢過弟 ，成例。如圖所# ’使基板G在浮升平台8〇 =之 狀態，藉由未經圖示之輸送機構沿平a IK 紋王水千狀汙升之 向〕以水平移動之方式加。邊方向亦即輪送方向（X方 於附著單元（AD)_40中，於平台80之上方自私 側配置有均熱幸畐射板82、_嗔嘴84、則朝下游 入口^ _在w移動二用吸 』=均，^板82 .自上方使基板G處於輻射熱中以去除^ 滯；i臭:表面吹送膽S氣體，氣體引“將 將自；侧流至 ，冷卻單元（既）42巾， 喊排氧糸。 =巧條冷卻氣體噴嘴9。；由各冷 送方式通過正下方之基板G吹送既定溫心 端起寬度方向（Y方向）涵蓋自基板G之- 84 9〇 ^ 塗布光動輪送道34中’浮升式輪送道適用於通過 基板G以在浮升平/^ (,) 44之區〜㈣冓成例。此時亦使 之輸送機構;^平^、嘉大致呈水平狀浮升之狀態，藉由未經圖示 式加以輪送:於向七亦即輸送方向（X方向）以水平移動之方 光阻噴嘴92，去二·^方，沿輸送方向之既定位置配置有長條形 移動之浮升於、、,$嘴92從狹缝狀流出口使液狀之光阻β朝以水平 毯般在基板^白^正了方之基板6呈帶狀流出，藉此如舖地 圖5顯干爸！ "Γ板刖端朝後端形成一整面光阻1?之液膜。 過第2熱性處理^平移動輸送道34丨，將浮升式輸送道適用於通 處邻32之預烘烤單元(PRE—BAKE)48及冷卻單元(c〇L) 12 1356467 (x方向）以水平移動之方士力邊方向亦即輪送方向 48中，於平台80上方㈣於預焕烤單元（PRE-BAKE) 均熱輻射板94，藉私板有多片加熱器，例如 ，正下方之基糾處於^射，吻方ί 阻瘵發。在此雖將圖示省 合剎自基板G上之光 入溶劑蒸氣之排氣用吸人口 J二’、=平f 8G上方設置用以吸 ^上方，㈣爾1條次 土板G人ι疋/里度之冷卻氣體（例如空氣）。 與周!相同之浮升式，送道，亦可適用於第2水平移動料、首 卻’通frC處理部66之後烘烤單元（P〇ST-BAKE) 5:及ί 二&(日2)1 =間。且姻之浮升式輸送道亦可_於通過準 刀子UV恥射早兀（E~~UV) 36之區間等。 圖6顯示浮升平台8〇之重要部位構成例。於平台刖頂面，以 狀）穿孔形成有喷出壓縮空氣Q(藉此使 吁升力及於基板G)之多數噴出口 1〇〇。各喷出口 1〇〇連通 内之祕空氣供、，路（或緩衝室）1Q2，壓縮空氣供給路1Q2透過外 部配管^未經圖示> 與壓縮機等壓縮空氣供給源（未經圖示〕相通。 +顯示於圖7之構成係設置抽吸口 1〇4，位於浮升平台8〇頂面， 與噴出口 100混雜構成並以負壓吸入空氣（藉此使向下之抽吸力及 ^基板G)。各抽吸口 1〇4連通於平台内之真空通路（或緩衝室）1〇6， 真空通路106透過外部配管（未經圖示）與真空泵等真空源（耒經 圖示）相通。如此自噴出口 1〇〇對通過正上方之基;送出壓縮^ 氣，藉以對其施加垂直向上之力，並同時藉由抽吸口 1〇4施加因負 壓抽吸力所造成之垂直向下之力，即可藉由控制互相對抗之雙方向 力之平衡，而穩定維持浮升量h於設定値附近。 以下詳細説明此實施形態中關於使用於浮升輸送之輪送機構。 13 1356467 亍，第1實施例構成之浮升輸送機構。如圖8所 滾輪多個 所形成，自中心部朝 5持軸m it端部，透過傘齒輪116.連接^ =18透過驅動帶輪122、正時皮帶124及從 丁 ^ 1 驅動源之馬達120。 ▼彻1如化接於方疋轉 輪配置為，俾使滾輪外周面之頂部沿Ζ方向恰較平 ，俾使在平台別上基板G左右兩側端部自ir二 --蚊出。在平台80 土，基板G因自正下方（平二:2 80賴 所受之氣體壓力，成為浮於*中之肤能 口頁面）喷出口 100 .台兩側侧滾輪Π()= 中“ ’其左右兩側端部搭載於平 多ifii近各側滾輪110之處設置有1個或 橡膠構成側滾輪11G滾輪外周面亦在防滑上有效3， 、”=、，但可知亦可使罔以穩定基板浮升量之抽吸口 隹構成於平台頂面之噴出口 100之間。 . νΏ .120 3，f旋轉驅動力透過傳動機構（122、124、126、 (前= ’各側滾輪11Q朝旣定方向In the above configuration, the side roller is rotated and moved to the side roller by the side roller, and the face-to-face translation is changed to 3⁄4 1356467 "If the 3rd base reduction device of the Ming-Yu-Fei-transfer conveyor is at the county level, Cai Li, the shape The substrate to be processed is in the direction of the mosquito in a substantially horizontal direction; the base is 2; the base is 2; the base is processed; the liquid is read, the light or the heat is applied to perform the predetermined treatment. The direction of the wheel is perpendicular to the water platform ======= and the endless belt is driven to transfer the substrate. The outer peripheral surface, the lower side, the lower side is the second fourth substrate processing device system - floating reading The delivery substrate is processed, and the dream substrate is in the approximate level of the iSL; the Qiu t is shaped to rotate in the conveying direction, and the floating plate is floated on the platform along the + l, the carrier pushes the substrate from behind to transport the substrate. In the above configuration, the lifting and transporting driving force is directly related to the injection *. The foreign carrier is indirectly connected to the substrate. The miscellaneous tool, through the dimples of the pit 1 J or the groove shape, causes the floating gas to be sprayed from the lower square of the carrier. In another suitable aspect, the surface of the plate is raised to an upwardly rising height in the direction of the wheel, so that the lifting device on the platform is stopped at the set position to stop the rotation: The substrate processing device is composed of a low-cost one, and the i-domain of the current wheel-transfer type is simplified and can be easily implemented. 1J^0407 [Embodiment] The embodiment of the present invention will be described with reference to the accompanying drawings. ΚΐΓ乍 ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ ΐϊ 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板 基板(I/F) i8 (direction) at both ends of the box (C / S) (C / S) 14 'system 1 〇 g box into the delivery, including: the board to accommodate the base ' The substrate G enters and exits the platform 20. The carrier arm 22a of the substrate G is held in units of x, i, z, and can be: G: .. car action, and can be adjacent to the processing station (P/S) 16御j transmission substrate ^ station (P / S) 16 towel: 'each processing section along the long side of the processing system (X direction) parallel and opposite direction 14 «^S ^.ClyF) 1δ ^ ^ ON PASS) 24 ^ • The third heat treatment unit 32 is set to 28 in this order 1 and is transported by the coating process, and is connected to the first unit. The IN PASS 24 is operated from the 11 box station (0) 14 and the f 34 is connected to the I ff. The substrate G, (4) is defined as (10) the first horizontal shift 34 of the guide is provided with an excimer UV irradiation unit. ϋν) % 38° ^ ^ 5 卩 early 70 (C〇L) 42. In the coating processing unit 30, A photoresist coating (COT) 44 and a vacuum drying unit (VD) 46 are provided in this order from the upstream side, and 5 第 in the second heat treatment unit 32. ^There is a pre-heating unit (-臓) and a cooling grass unit (C0L). The first horizontal moving conveyor 34 next to the downstream side of the cooling treatment unit (C0L) is the delivery unit (PASS) 52 . From this end of the transfer unit (PASS) 52. Downstream self-interface station (I/F) 18 side toward the box station (C/S) 14 side CDEV^i ' ^, from the upstream side along the 2nd horizontal moving conveyor 64 will display the Qin unit Si two T-臓) 56, cooling unit (10) 58, motivation only t ί 片 ^ _ transport space 68 ' by the direction of the unseen kiss » called Shuangmei ^ flat bearing braided device 7G along A rotation flat △ is arranged around the processing line device 72 ( : f transmission substrate G, and this is a C ^ S) 74 76 ° when the substrate is transferred, for conversion, and is connected to the exposure device 12 (TITLE^J.? ^ ^ ^ Moving conveyor 64. (EE) etc. t is connected to the younger 2 horizontal shifting - the box C is taken out of the slab station from the platform 2 / /S) 16 processing to the side of the feeding unit (IN _ 2 :f=f : 1356467 ==元 (IN PASS) 24 Transfer or introduce the substrate G to the first horizontal moving wheel. In the cleaning processing unit 26, first by the excimer UV/irradiation unit (E_ still unit) (SCR) 38 sequentially applies the ultraviolet ray cleaning treatment and the rubbing cleaning treatment to the first horizontal moving transport path 34 (step S2, s February, soap το (SCR) 38 by level Moving on the horizontal moving conveyor 34 Brushing or purging removes particulate smear from the surface of the substrate, and then soiling 5 to dry the substrate G by taking a 5 air knife or the like. - Ending the scrubbing cleaning unit (SCR)? 'The substrate G is directly along The first horizontally moved transport path 34 is passed down to pass through the heat treatment unit 28 of the first heat treatment unit 28. In the first heat treatment unit 28, the adhesion unit (AD) 4 is first attached to the US-use ugly treatment to be hydrophobized. After the adhesion process, the cooling unit (c〇L) is also moved along the first horizontal level; ΐϊΐ: - in the slit 'first in the photoresist coating unit (α) Τ) 44 Using the tampering method, the substrate 6 is horizontally moved to the top surface of the substrate (the = 搂 阻 ' ' and then immediately downstream of the downstream side of the reduction unit (10)) to perform the normal temperature (step S6) The substrate G that passes through the ί (4) 立立30 moves the transport path 34 along the first horizontal direction and the fourth (4) is connected to the r chess. The solvent of the light two is strong: two = the residual light is moved in the light barrier of the substrate G. The plate temperature of the delivery path 34 (step S8). ^ After the first station (I/F) 18 of the wheel transfer device 72 f 7 (PASS) 52, the substrate G is handed over to the medium. The second stage 74 allows the substrate G to receive, for example, a 9Q door-to-door peripheral exposure device (EE), which accepts 1356467 for removing the photoresist attached to the peripheral portion of the substrate G during development. #丝置12 (Step (8).') Send it to the exposure device 12 to make the light_light on the substrate G predetermined: In addition, the substrate G that ends the pattern exposure is returned from the exposure device 12 to the interface station 76 ^TI^ ) 'The developing unit (10) 54 of the horizontal transport path 64 is lifted. 6 The second female board G f Na on the processing line B side, the obstacle - the substrate G of the processing line, in the maintenance bb UP) e"t iiipr°r) 56, the substrate is subjected to post-baking as a display ϊϊϊΐ Sr ^ Remove it, strengthen the (4) nature of the substrate. Ϊ́ΐ Width inspection or film quality, film thickness detection. The non-contact wire system 62 is received from the 2nd horizontal moving wheel. The end of the whole is ίίίϊ. The transport station of the box station (c/s) 14 is stored in any (usually the original)... 1 and 2, 1356, 467, 3 show the attachment unit (10) 4Q and the cooling (3) of the second horizontal moving wheel 34 in the thermal domain 28, as an example. As shown in Fig. #', the substrate G is placed in the state of the floating platform 8〇, and is moved horizontally by the transport mechanism (not shown) along the flat a IK grain water. The side direction, that is, the direction of the wheel (X side in the attachment unit (AD)_40, is disposed on the self-sufficient side of the platform 80 on the self-sufficient side, and is arranged to have a soaking plate 82, a mouthpiece 84, and a downstream inlet ^ _ moving in the w Two use suction 』 = average, ^ plate 82. From the top, the substrate G is in radiant heat to remove stagnation; i odor: surface blowing biliary S gas, gas introduction "will be from; side flow to, cooling unit (both) 42 Towel, shouting oxygen 糸. = Smart cooling gas nozzle 9.; Each cold conveying method is blown through the substrate G directly below the predetermined temperature center end width direction (Y direction) covers from the substrate G - 84 9〇^ Coating light wheel In the delivery channel 34, the 'floating type wheel-passing lane is suitable for passing through the substrate G to be in the area of floating up/^(,) 44~(4)冓. At this time, the conveying mechanism is also made; ^平^, Jia is roughly horizontal In a state in which it is lifted up, it is rotated by a non-illustrated type: a square resistive nozzle 92 that moves horizontally in a direction of transport (X direction), that is, a horizontal direction, and is disposed at a predetermined position along the conveying direction. The long strip moves up and down, and the mouth 92 moves from the slit-like outflow port to make the liquid photoresist β toward the horizontal blanket. ^The base plate 6 of the square is out of the strip, so that the map is displayed as a dry dad! "The slab end of the slab is formed with a liquid film of the whole surface resistor 1 to the rear end. After the second heat treatment ^ flat Moving the transport path 34丨, the floating transport path is applied to the pre-baking unit (PRE-BAKE) 48 and the cooling unit (c〇L) 12 1356467 (in the x direction) to move horizontally to the side of the square The direction is also in the direction of the wheel 48, above the platform 80 (four) in the pre-heating unit (PRE-BAKE) soaking radiant panel 94, the private board has a plurality of heaters, for example, the base correction is directly below, Kissing ί 瘵 瘵 。 。 。 。 。 。 。 。 。 ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί ί The cooling oil (such as air) of the slabs of the earth G 里 里 里 里 里 里 里 里 里 里 里 里 里 里 里 里 里 相同 相同 里 相同 相同 里 里 里 里 里 里 里 冷却 冷却 冷却 冷却 冷却 冷却 冷却 冷却 冷却 冷却 冷却Baking unit (P〇ST-BAKE) 5: and ί 2 & (day 2) 1 = between. And the floating lift lane of the marriage can also be _ through the knife knife UV shame early 兀 (E ~ ~ UV ) 36 intervals, etc. Figure 6 shows An example of the configuration of an important portion of the floating platform 8 is formed. On the top surface of the platform, a plurality of discharge ports 1 are formed by perforating the compressed air Q (by which the lifting force and the substrate G) are sprayed. The air supply to the outlet is connected, the road (or buffer chamber) 1Q2, and the compressed air supply path 1Q2 is transmitted through the external piping (not shown). It is connected to a compressed air supply source (not shown) such as a compressor. The structure shown in Fig. 7 is provided with a suction port 1〇4, which is located at the top surface of the floating platform 8, and is formed by being mixed with the discharge port 100 and sucking air with a negative pressure (by which the downward suction force and ^ Substrate G). Each of the suction ports 1〇4 communicates with a vacuum passage (or a buffer chamber) 1〇6 in the platform, and the vacuum passage 106 communicates with a vacuum source (not shown) such as a vacuum pump through an external pipe (not shown). Thus, the self-discharge port 1 〇〇 is passed through the base immediately above; the compression gas is sent, so that a vertical upward force is applied thereto, and at the same time, the vertical pressure caused by the suction force is applied by the suction port 1〇4. The force can be stabilized by maintaining the balance of the bidirectional forces against each other, and maintaining the float h amount near the set 値. The wheeling mechanism used for the lifting conveyance in this embodiment will be described in detail below. 13 1356467 亍, the floating transport mechanism constructed in the first embodiment. As shown in FIG. 8 , a plurality of rollers are formed, and the end portion of the shaft is moved from the center portion toward the fifth end of the shaft, and is connected through the bevel gear 116. The transmission pulley 122, the timing belt 124, and the motor 120 from the driving source 120 are connected through the bevel gear 116. . ▼ 11, as the 疋 疋 疋 配置 配置 配置 配置 配置 配置 配置 配置 配置 配置 配置 配置 配置 配置 外 外 外 外 外 外 外 外 外 外 外 外 外 外 外 外 外 外 外 外 外 外 外 外 外 外 外 外On the platform 80 soil, the substrate G is ejected from the bottom of the platform by the bottom of the screen (the second is the temperature of the gas that is affected by the gas pressure). 'The left and right ends are mounted on the near side of each side of the flat roller 110. One or the rubber side roller 11G is also effective on the outer surface of the roller. 3), "=, but it can be seen that 罔The suction port 稳定 which stabilizes the amount of lifting of the substrate is formed between the discharge ports 100 on the top surface of the platform. . νΏ .120 3, f rotational driving force through the transmission mechanism (122, 124, 126, (front = ' each side roller 11Q toward the direction of adjustment
Cj方向）旋轉。猎由相關之側滾輪m之旋轉運動，在 亡汙升之基板G，於以側滾輪n。接替傳送狀够 : 施!?中浮升輪送道可適當與滾動輸送道132、134連結，而 距恰# °各_輪送道132 '说’以-定間 距/。輪运方向（X方向）排列舖設有棒狀之滚子136，滾動輸送面^ 14 1356467 度配合平台80上之浮升發详、含上— 136係透過傳動機構連接示省略，但可知各滾子 板動:= 則滾動輸送道132上移動而來之基 方向）移動。又，其—㈣11G之上，沿輸送方向（X 輸送，移至下游側滾動 施例卜構。於此實 面Η成蚊之角度以例如2^( 方向’相對於水平 基板G亦與平台80之職平行，以相同之自H 於平台80上之 (x #^-,i 3構力C平台之滾輪外周面138a。旋轉軸140透過貧 動ΐί&未圖不）而連接馬達等旋轉驅動源（未_示）。夢由 侧滾輪138之旋轉運動，與平台80平行之傾斜姿態浮升之曰 下邊Lg被側滾輪138接替傳送之狀態，沿輸送方向（χ *向 動。 . 秒 如此，此實施例之浮升輸送機構，係藉由僅於平台8〇之 置側滚輪138之構成進行基板g之浮升輸送者，而成為更為簡便之 構成。 · 圖12及圖13顯示以第3實施例構成之浮升輸送機構。此實施 例係以無磕皮帶142取代上述第2實施例中之側滾輪138。更詳細而 言，係於平台80較低之一侧（.右侧）設置沿輸送方向方向）延 伸之無、皮帶142’俾使基板G較低之一邊Lg因重力加壓接觸靠近平 台之皮帶外周面142a。此無端皮帶142係掛設在配置於平台80右 側，具有縱方向旋轉軸144之驅動帶輪146與從動帶輪（未經圖示） 之間。藉由旋轉驅動帶輪146,無端皮帶142直進移動於兩帶輪之間， 15 1356467 S3 142以接觸下邊L之方式 夺升之基板G使其以水平移動之方80千仃之傾斜安恶 圖u〜圖16顯示方向（X方向）移動。 及圖16所示’此實施例係使輪送機構。如圖14 基板G後，浮升至與基板G大致仙位於平台80上， 自後推播基板G而-體移動者。度，浮升載具⑽，係 相同或大致相同之_，4構^之材散具有與基板G 端之邊之細彡。— Τ 了縣為其—之邊完全吻合基板G後 148 、中’為賦予浮升載具148輪送推進力，在浮升載且 使其沿輸送方向（X方向）移動。Φ推擠基板G 一面 所 取代>于升載具148之小凹孔15Q。此時，如圖所二^ 152 ίΐ!52兩？部朝輸送方向前方彎曲’朝内（朝平台中心、)之Vi ti 148 ，示於圖19之變形例，係為賦予浮升· 148 如上述於背面形成小凹孔150,减之以使鎖154“可齡$ J 合於形成在例如浮升載具.148 —端或兩端之孔（開口）， f 示之直進輸送機構，透過鎖154使浮升戴具U8沿輸送f、 矛夕動者。且為任意停止基♦板G之水平移動輸送，亦可於平a 。 棊板G前，使另一板狀浮*升載具156以與基板G大致相同I浮升高 2=i:r56在所期待之位 置停止並以此為障礙物阻止 例係；圖之=:!=，之浮升 方噴出之壓縮空氣Q流量^向义方;）控制自平台80頂面朝上 板G即如同溜滑梯一般會 ^里（壓力）逐漸變小。如此，基 _麻，齡移動。此時.， =縮空氣qe流量（壓力）之 =部，浮升 抑制基板G之橫向偏位。 匕次之該肌里大，可有效防止或 圖22〜圖24顯示以第β者#么丨4&丄、 所示，此實施例係將平台8〇 二冓成送機構。如㈣ 台δ〇上如同溜滑梯-般因重力朝)送m =，使基板g在平 台-傾斜面上4=2==二方=者如 Ξϊί： 的(园防止橫向偏位:以 流量（I力）較内^區域之流.兩端部，浮升職縮空氣仏之 且基板G因在斜面上以浮升輸送之方式滑下而冻 即使平台80自傾斜面變為水平面亦可因慣’_^，因此 板G強制停止於平台8。上所期待之位二欲?基 =置附近形射出〇 1GG，俾使浮升關縮空氣Q自平台8QH /、輪送方向（X方向）相反之一侧往斜上方噴出。. 、. 圖25及圖26顯不以第7實施例構成之浮升輸送機 例係於平台80左右兩側設置沿輸送方肖（x；r向）延伸之無 .160，於無端皮帶160外側面以-定間隔安裝吸附塾丨62。無端皮^ 17 1356467 160水平掛設於驅動帶輪164與從動帶輪166之間。於平台別 兩側面安裝有推壓構件170，用來以推_ 168透端。 吸附墊㈣下往上推。基板G被送入平台8〇上，：端: 2 -旦來到推屢構件170之正上方，推壓構冗二 ^點瞬間將推壓銷168往上頂以賴出該卿墊162内之空氣，、以 附塾162抵接（吸附）於基板G背面。吸附塾162維^固持 =G之狀態’與基板G 一齊沿輸送方向（χ方向）移動，並且為了 在仗動帶輪166附近折返，改變行進方向而自基板G脫離。… 本發财被處理基板並稀於LCD用絲基板，亦可為宜他平 光罩、印刷基板等。塗布於基板上之處理液亦不 =先阻液，亦可為例如層間絕緣材料、介電材料、配線材料等處 【圖式簡單鹗明】 構成ΐϋΐ示可_本發明之基板處理裝置之塗布顯影處理系統 圖乙係，不上述塗布顯影處理系統中處理順序之流程圖； 3係顯示實施形態中基板處理裝置一例之概略侧視圖； 圖4係顯示實施形態中基板處理裝置一例之概略侧視圖； 圖5係顯示實施形態中基板處理裝置一例之概略側視圖； 圖6，顯示實施形態中浮升台重要部位構成之放大部分剖面圖; =7係顯示實施形態中浮升台重要部位之另—構成之放分 曲圖；· • 圖8係顯示第1實施例中浮升輸送機構構成之俯視圖.； 圖9係顯示第1實施例中浮升輸送機構構成之侧視圖； 圖10係顯示第2實施例中浮升輸送機構構成之俯視圖； 圖u係顯示第2實施例中浮升輸送機構構成之側視圖； 18 1356467 圖12係顯示第3實施例中浮升輸送機構構成之俯視圖 圖13係顯示第3實施例中浮升輸送機構構成之側視圖 圖14係顯示第4實施例中浮升輸送機構構成之俯視& . 案例料4實關中設置於浮频料蚊小排靡 圖16係，示第4實施例中浮升輸送機 用 .. 載具;=槽=二為第4實施例之_ = 圖20 (Α)、（Β)、係顯送機構辑成之俯視圖； 作用之侧視圖； ’…、 "^施例中浮升輪送機構構成與一 圖21係顯示第β每〜+ 圖 圖 圖 u lJ中序升輪送機構構成與—作用之後視 圖22係顯示第7九丨a 中浮升輪送機構構成與—作用之側顏 圖23係顯示宽γ ' w料浮升輪送機構構成與—作用之後頑 圖24係顯示笛7 ^ 貫施例中浮升輪送機構構成與-作用之備 圖25係顯示第 _ 圖26係•第7 之俯_ 升輸运機構構成之側視圖。 19 1356467 【主要元件符號說明】 A、B〜處理線（線） C〜匿盒 、EE〜周邊曝光裝置 G〜基板 h〜浮升量 Η〜水平面Cj direction) rotation. Hunting is carried out by the rotation of the associated side roller m, on the substrate G of the dead soil, and on the side roller n. It is sufficient to take over the transfer: the middle float-up wheel can be properly connected to the rolling conveyors 132, 134, and the distance _ wheel traverse 132 'say' to - the distance /. In the direction of rotation (X direction), a rod-shaped roller 136 is arranged, and the rolling conveying surface is 14 14356467 degrees. The lifting and lifting details on the platform 80 are included, and the connection of the upper-136 series transmission transmission mechanism is omitted, but it is known that each roller is rolled. Sub-plate motion: = then moves in the direction of the base on which the transport path 132 moves. In addition, it is above (4) above 11G, in the transport direction (X transport, moving to the downstream side of the rolling application structure. The angle of the solid surface of this solid surface is, for example, 2^ (direction 'relative to horizontal substrate G and platform 80 Parallel to the position, the same as from the H on the platform 80 (x #^-, i 3 force force C platform roller outer peripheral surface 138a. Rotary shaft 140 through the poor ΐ & & 未 未 而 而 而 而 而 而 而Source (not shown). The dream is rotated by the side roller 138, and the lower side Lg is lifted by the inclined posture parallel to the platform 80. The lower side Lg is replaced by the side roller 138, and is conveyed in the conveying direction (χ *向动. In the floating conveying mechanism of this embodiment, the substrate g is lifted and conveyed by the configuration of only the side roller 138 of the platform 8〇, which is a simpler configuration. Fig. 12 and Fig. 13 show The floating conveying mechanism constructed in the third embodiment. This embodiment replaces the side roller 138 in the second embodiment described above with a beltless belt 142. More specifically, it is attached to the lower side of the platform 80. ) setting the extension in the direction of the conveying direction, the belt 142' 俾 makes the substrate G lower The side Lg is pressed by gravity to contact the outer peripheral surface 142a of the belt near the platform. The endless belt 142 is hung on the right side of the platform 80, and has a driving pulley 146 and a driven pulley with a longitudinal rotating shaft 144 (not shown). By rotating the drive pulley 146, the endless belt 142 moves straight between the two pulleys, and the 15 1356467 S3 142 lifts the substrate G in a manner to contact the lower side L so that it moves horizontally 80 thousand. The tilting security map u to Fig. 16 shows the direction (X direction) movement. And the embodiment shown in Fig. 16 is such that the wheeling mechanism is as shown in Fig. 14 after the substrate G, and rises to be substantially equal to the substrate G on the platform 80. From the rear, the substrate G is pushed and the body is moved. The degree, the floating carrier (10) is the same or substantially the same _, and the material of the 4 structure has a fineness with the side of the G end of the substrate. After the edge of the substrate G is completely matched with the substrate G, 148, and the middle is used to impart the propulsive force to the floating carrier 148, and is lifted and moved in the conveying direction (X direction). Φ pushes the substrate G side to replace > Yu Sheng 148 small recessed hole 15Q. At this time, as shown in the figure ^ 152 ΐ ΐ 52 52 The front end (toward the center of the platform) Vi ti 148 is bent forward, and the modification shown in Fig. 19 is to impart a floating recess 148 as described above to form a small recess 150 on the back surface, so that the lock 154 is The age $ J is combined with a hole (opening) formed at the end or end of the lifting device 148, for example, f is a straight-forward conveying mechanism, and the floating wearing U8 is conveyed by the lock 154 along the conveying f and the spear. And the horizontal movement of any stop base ♦ plate G, can also be flat a. Before the slab G, the other plate-shaped floating liter carrier 156 is substantially the same as the substrate G. I float up 2=i: r56 Stop at the expected position and use this as an obstacle to prevent the system; Figure =:!=, the compressed air Q flow from the rising side is sent to the right side;) Control from the top surface of the platform 80 to the upper plate G Like a slippery ladder, the pressure (pressure) gradually becomes smaller. So, base _ hemp, age moves. At this time, = = the portion of the air flow (pressure) of the air is reduced, and the lift suppresses the lateral deviation of the substrate G. In this case, the muscle is large and can be effectively prevented or shown in Fig. 22 to Fig. 24, as shown in Fig. 4, which is shown in Fig. 4, which is the embodiment. For example, (4) δ 〇 on the 如同 如同 如同 如同 - - - - - - - - 般 般 般 般 般 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同 如同(I force) is the flow of the inner area. At both ends, the air is lifted up and the substrate G is slid down by the floating surface on the inclined surface, and even the platform 80 is changed from the inclined surface to the horizontal plane. Because of the customary '_^, the plate G is forcibly stopped at the platform 8. The desired position is the second position. The base is placed near the shape of the 〇1GG, so that the floating up and down air Q from the platform 8QH /, the direction of rotation (X One side of the opposite direction is ejected obliquely upward. Fig. 25 and Fig. 26 show that the floating conveyor constructed in the seventh embodiment is provided on the left and right sides of the platform 80 along the transport side (x; r direction) The extension No. 160, the adsorption 塾丨 62 is mounted at an interval on the outer side of the endless belt 160. The endless skin ^ 17 1356467 160 is horizontally hung between the drive pulley 164 and the driven pulley 166. A pressing member 170 is mounted on the side for pushing the end of the 168. The adsorption pad (4) is pushed up. The substrate G is fed onto the platform 8 ,, the end: 2 - Immediately above the member 170, the pushing pin 168 is pushed up to release the air in the clearing pad 162, and is attached (adsorbed) to the back surface of the substrate G by the attaching 162. The 162-dimensional retention = G state 'moves along with the substrate G in the transport direction (χ direction), and in order to fold back near the tilting pulley 166, the traveling direction is changed and detached from the substrate G. It is thinner than the LCD wire substrate, and may be a flat mask, a printed substrate, etc. The treatment liquid applied to the substrate is not the first liquid barrier, and may be, for example, an interlayer insulating material, a dielectric material, a wiring material, or the like. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 4 is a flow chart showing a processing sequence of a substrate processing apparatus according to the present invention, and a processing procedure in the coating and developing processing system is not provided. FIG. 3 shows an example of a substrate processing apparatus in the embodiment. Fig. 4 is a schematic side view showing an example of a substrate processing apparatus in the embodiment; Fig. 5 is a schematic side view showing an example of a substrate processing apparatus in the embodiment; and Fig. 6 is a view showing a floating table weight in the embodiment. Fig. 8 is a plan view showing the configuration of the floating conveying mechanism in the first embodiment. Fig. 8 is a plan view showing the configuration of the floating conveying mechanism in the first embodiment. Fig. 9 is a side view showing the configuration of the floating conveying mechanism in the first embodiment; Fig. 10 is a plan view showing the configuration of the floating conveying mechanism in the second embodiment; Fig. 9 is a view showing the configuration of the floating conveying mechanism in the second embodiment; Fig. 12 is a plan view showing a configuration of a floating conveying mechanism in a third embodiment. Fig. 13 is a side view showing a configuration of a floating conveying mechanism in a third embodiment. Fig. 14 is a view showing a lifting in the fourth embodiment. Fig. 4 is a plan view of the conveying mechanism. The case material is set in the floating-floating mosquito net. Figure 16 shows the lifting conveyor for the fourth embodiment.. Vehicle; = slot = two is the fourth implementation. Example _ = Fig. 20 (Α), (Β), the top view of the system of the display mechanism; the side view of the function; '..., "^ The configuration of the floating wheel mechanism in the example and the picture shown in Figure 21 β per ~ + map diagram u lJ in the sequence of the lifting mechanism and the role of the rear view 22 The side view of the structure of the floating lift mechanism in the 7th ninth 丨a is shown in Fig. 23, which shows the composition and function of the wide γ' w material floating and hoisting mechanism, and the figure 24 shows the flute. FIG. 25 is a side view showing the configuration of the seventh embodiment of the present invention. 19 1356467 [Description of main component symbols] A, B ~ processing line (line) C ~ hidden box, EE ~ peripheral exposure device G ~ substrate h ~ float amount Η ~ water level
Lc〜基板G較低之一邊（下邊） R〜光阻 S1—S14〜步驟 TITLER〜印字曝光機 Q、QE〜壓縮空氣（高壓空氣） 0、α〜既定之角度 10〜塗布顯影處理系統（系統） .12〜曝光裝置. 16〜處理站（P/S) 14〜医盒站（〇/8) '18〜介面站（I/F) 20〜匣盒平台（平台） 22〜輸送機構 22a〜輸送臂，. 24〜送入單元（IN PASS) _26〜清洗處理部 28〜第1熱性處理部 30〜塗布處理部 -32〜第2熱性處理部 34〜第1水平移動輸送道 36〜準分子UV照射单元（E—UV) 38〜擦磨清洗單元（SCR) 20 1356467 40〜附著單元（AD) 42〜冷卻單元（COL) 44〜光阻塗布單元（COT) 46〜減壓乾燥單元（VD). 48〜預烘烤單元（PRE—BAKE) 50〜冷卻單元（COL) 52〜傳遞單元（PASS) 54〜顯影單元（DEV.) 56〜後烘烤單元（POST — BAKE) 58〜冷卻單元（COL) 60〜檢查單元（AP) 62〜送齿單元（01ΓΤ—PASS) 64〜第2水平移動輸送道 66〜第3熱性處理部 68〜輔助輸送空間 70〜穿梭裝置 72〜輸送裝置 74〜旋轉平台（R/S) 76〜周邊裝置 80〜浮升平台（平台） 82、94〜均熱輻射板 84〜HMDS噴嘴 86〜氣體引導蓋 88〜排氣用吸入口 90、96〜冷卻氣體噴嘴 92〜光阻喷嘴 100〜喷出口 102〜壓縮空氣供給路 104、130〜抽吸口（浮升輸送用抽吸口） 21 1356467 106〜真空通路 110、138〜側滚輪（導引滚輪) 112〜滾輪支持軸 114〜轴承 116〜傘齒輪 118〜共通驅動軸（驅動軸） 120〜馬達 122、146、164〜驅動帶輪 124〜正時皮帶 126、166〜從動帶輪 132、134〜滾動輸送道 136〜滾子 138a〜滾輪外周面 +140、144〜旋轉轴 142、160〜無端皮帶 142a〜皮帶外周面 148、156〜浮升載具 150〜小凹孔 152〜溝槽 154〜銷- 162〜吸附墊 168〜推壓銷 170〜推壓構件 22Lc ~ one lower side of the substrate G (lower side) R ~ photoresist S1 - S14 ~ step TITLER ~ printing exposure machine Q, QE ~ compressed air (high pressure air) 0, α ~ a predetermined angle 10 ~ coating development processing system (system .12~exposure device. 16~ processing station (P/S) 14~ medical box station (〇/8) '18~interface station (I/F) 20~匣 box platform (platform) 22~ conveying mechanism 22a~ Transfer arm, 24 to feeding unit (IN PASS) _26 to cleaning processing unit 28 to first heat processing unit 30 to coating processing unit -32 to second heat processing unit 34 to first horizontal moving transport path 36 to excimer UV irradiation unit (E-UV) 38~ scrub cleaning unit (SCR) 20 1356467 40~ attachment unit (AD) 42~ cooling unit (COL) 44~ photoresist coating unit (COT) 46~ decompression drying unit (VD 48~Pre-baking unit (PRE-BAKE) 50~Cooling unit (COL) 52~Transfer unit (PASS) 54~Developing unit (DEV.) 56~Post-bake unit (POST-BAKE) 58~Cooling unit (COL) 60 to inspection unit (AP) 62 to tooth feed unit (01ΓΤ-PASS) 64 to second horizontal movement conveyance path 66 to third heat treatment unit 68~ Auxiliary transport space 70 to shuttle device 72 to transport device 74 to rotary platform (R/S) 76 to peripheral device 80 to floating platform (platform) 82, 94 to soaking radiation plate 84 to HMDS nozzle 86 to gas guide cover 88 ~Exhaust suction ports 90, 96 to cooling gas nozzle 92 to photoresist nozzle 100 to discharge port 102 to compressed air supply path 104, 130 to suction port (lifting suction port) 21 1356467 106 to vacuum path 110, 138 to side roller (guide roller) 112 to roller support shaft 114 to bearing 116 to bevel gear 118 to common drive shaft (drive shaft) 120 to motor 122, 146, 164 to drive pulley 124 to timing belt 126 166~driven pulleys 132, 134 to rolling conveyor 136 to roller 138a to roller outer peripheral surface +140, 144 to rotating shaft 142, 160 to endless belt 142a to belt outer peripheral surface 148, 156 to floating carrier 150 ~ small recess 152 ~ groove 154 ~ pin - 162 ~ adsorption pad 168 ~ push pin 170 ~ push member 22